ATE458274T1 - Tiefgrabenisolationsstrukturen in integrierten halbleiterbauelementen - Google Patents
Tiefgrabenisolationsstrukturen in integrierten halbleiterbauelementenInfo
- Publication number
- ATE458274T1 ATE458274T1 AT07012746T AT07012746T ATE458274T1 AT E458274 T1 ATE458274 T1 AT E458274T1 AT 07012746 T AT07012746 T AT 07012746T AT 07012746 T AT07012746 T AT 07012746T AT E458274 T1 ATE458274 T1 AT E458274T1
- Authority
- AT
- Austria
- Prior art keywords
- layer
- conductivity type
- isolation trench
- integrated semiconductor
- trench isolation
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/763—Polycrystalline semiconductor regions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/761—PN junctions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/76224—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using trench refilling with dielectric materials
- H01L21/76237—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using trench refilling with dielectric materials introducing impurities in trench side or bottom walls, e.g. for forming channel stoppers or alter isolation behavior
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
- H01L21/76264—SOI together with lateral isolation, e.g. using local oxidation of silicon, or dielectric or polycristalline material refilled trench or air gap isolation regions, e.g. completely isolated semiconductor islands
- H01L21/76286—Lateral isolation by refilling of trenches with polycristalline material
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Element Separation (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP07012746A EP2009686B1 (de) | 2007-06-29 | 2007-06-29 | Tiefgrabenisolationsstrukturen in integrierten Halbleiterbauelementen |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE458274T1 true ATE458274T1 (de) | 2010-03-15 |
Family
ID=38604852
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT07012746T ATE458274T1 (de) | 2007-06-29 | 2007-06-29 | Tiefgrabenisolationsstrukturen in integrierten halbleiterbauelementen |
Country Status (4)
Country | Link |
---|---|
US (1) | US8115273B2 (de) |
EP (1) | EP2009686B1 (de) |
AT (1) | ATE458274T1 (de) |
DE (1) | DE602007004839D1 (de) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007129085A (ja) * | 2005-11-04 | 2007-05-24 | Texas Instr Japan Ltd | 半導体装置及びその製造方法 |
JP5010660B2 (ja) * | 2009-09-25 | 2012-08-29 | 株式会社東芝 | 半導体装置およびその製造方法 |
US8673723B1 (en) | 2013-02-07 | 2014-03-18 | Globalfoundries Inc. | Methods of forming isolation regions for FinFET semiconductor devices |
US9696736B2 (en) | 2013-03-15 | 2017-07-04 | Fairchild Semiconductor Corporation | Two-terminal current limiter and apparatus thereof |
US9679890B2 (en) * | 2013-08-09 | 2017-06-13 | Fairchild Semiconductor Corporation | Junction-less insulated gate current limiter device |
US9735147B2 (en) | 2014-09-15 | 2017-08-15 | Fairchild Semiconductor Corporation | Fast and stable ultra low drop-out (LDO) voltage clamp device |
US20170373142A1 (en) | 2016-06-23 | 2017-12-28 | Littelfuse, Inc. | Semiconductor device having side-diffused trench plug |
US10607880B2 (en) * | 2018-08-30 | 2020-03-31 | Nxp Usa, Inc. | Die with buried doped isolation region |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4534826A (en) * | 1983-12-29 | 1985-08-13 | Ibm Corporation | Trench etch process for dielectric isolation |
JP3360970B2 (ja) * | 1995-05-22 | 2003-01-07 | 株式会社東芝 | 半導体装置の製造方法 |
US6734524B1 (en) * | 2002-12-31 | 2004-05-11 | Motorola, Inc. | Electronic component and method of manufacturing same |
US7491618B2 (en) * | 2006-01-26 | 2009-02-17 | International Business Machines Corporation | Methods and semiconductor structures for latch-up suppression using a conductive region |
-
2007
- 2007-06-29 DE DE602007004839T patent/DE602007004839D1/de active Active
- 2007-06-29 AT AT07012746T patent/ATE458274T1/de not_active IP Right Cessation
- 2007-06-29 EP EP07012746A patent/EP2009686B1/de not_active Not-in-force
-
2008
- 2008-06-27 US US12/163,909 patent/US8115273B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US20090039460A1 (en) | 2009-02-12 |
US8115273B2 (en) | 2012-02-14 |
DE602007004839D1 (de) | 2010-04-01 |
EP2009686A1 (de) | 2008-12-31 |
EP2009686B1 (de) | 2010-02-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |