ATE439385T1 - Photohärtbare harzzusammensetzung - Google Patents

Photohärtbare harzzusammensetzung

Info

Publication number
ATE439385T1
ATE439385T1 AT04748684T AT04748684T ATE439385T1 AT E439385 T1 ATE439385 T1 AT E439385T1 AT 04748684 T AT04748684 T AT 04748684T AT 04748684 T AT04748684 T AT 04748684T AT E439385 T1 ATE439385 T1 AT E439385T1
Authority
AT
Austria
Prior art keywords
sup
resin composition
component
photohardable
polymerization initiator
Prior art date
Application number
AT04748684T
Other languages
English (en)
Inventor
Takao Yashiro
Ryoji Tatara
Takayoshi Tanabe
Original Assignee
Dsm Ip Assets Bv
Jsr Japan Synthetic Rubber Co
Japan Fine Coatings Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=33535247&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE439385(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Dsm Ip Assets Bv, Jsr Japan Synthetic Rubber Co, Japan Fine Coatings Co Ltd filed Critical Dsm Ip Assets Bv
Application granted granted Critical
Publication of ATE439385T1 publication Critical patent/ATE439385T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/30—Low-molecular-weight compounds
    • C08G18/38—Low-molecular-weight compounds having heteroatoms other than oxygen
    • C08G18/3819—Low-molecular-weight compounds having heteroatoms other than oxygen having nitrogen
    • C08G18/3842—Low-molecular-weight compounds having heteroatoms other than oxygen having nitrogen containing heterocyclic rings having at least one nitrogen atom in the ring
    • C08G18/3851—Low-molecular-weight compounds having heteroatoms other than oxygen having nitrogen containing heterocyclic rings having at least one nitrogen atom in the ring containing three nitrogen atoms in the ring
    • C08G18/3853—Low-molecular-weight compounds having heteroatoms other than oxygen having nitrogen containing heterocyclic rings having at least one nitrogen atom in the ring containing three nitrogen atoms in the ring containing cyanurate and/or isocyanurate groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C08G59/686—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
    • C09D175/04—Polyurethanes
    • C09D175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
    • C09D175/16—Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Epoxy Resins (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Paints Or Removers (AREA)
AT04748684T 2003-06-26 2004-06-25 Photohärtbare harzzusammensetzung ATE439385T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003182094A JP2005015627A (ja) 2003-06-26 2003-06-26 光硬化性液状樹脂組成物
PCT/NL2004/000454 WO2004113395A1 (en) 2003-06-26 2004-06-25 Photocurable resin composition

Publications (1)

Publication Number Publication Date
ATE439385T1 true ATE439385T1 (de) 2009-08-15

Family

ID=33535247

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04748684T ATE439385T1 (de) 2003-06-26 2004-06-25 Photohärtbare harzzusammensetzung

Country Status (8)

Country Link
US (1) US20070096355A1 (de)
EP (1) EP1636274B1 (de)
JP (1) JP2005015627A (de)
KR (1) KR20060026886A (de)
CN (1) CN1813003A (de)
AT (1) ATE439385T1 (de)
DE (1) DE602004022547D1 (de)
WO (1) WO2004113395A1 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007098347A (ja) * 2005-10-07 2007-04-19 Kawamura Inst Of Chem Res マイクロ流体デバイス用重合性組成物、及びマイクロ流体デバイス
HUE037878T2 (hu) * 2008-03-11 2018-09-28 Genomatica Inc Adipátészter vagy tioészter szintézis
EP2406318B1 (de) 2009-03-13 2021-04-21 DSM IP Assets B.V. Strahlungshärtbare harzzusammensetzung und schnelles 3d-bildgebungsverfahren damit
JP5616070B2 (ja) 2010-01-21 2014-10-29 株式会社フジクラ 電子線硬化用導電性ペースト及びこれを用いた回路基板の製造方法
WO2014193903A2 (en) 2013-05-30 2014-12-04 Henkel US IP LLC Primer compositions for injection molding
TWI563006B (en) * 2015-12-31 2016-12-21 Ind Tech Res Inst Curable resin and curing composition comprising the same
US11590692B2 (en) * 2016-11-14 2023-02-28 Covestro Deutschland Ag Method for producing an object from a precursor, and use of a radically crosslinkable resin in an additive production method
WO2019226695A1 (en) * 2018-05-21 2019-11-28 Virginia Polytechnic Institute And State University Selective deposition of materials for composite structures via additive manufacturing
CN109293851B (zh) * 2018-08-24 2021-09-28 长兴特殊材料（苏州）有限公司 一种光固化型树脂组合物及其制备的光学器件
JP6966014B1 (ja) * 2021-05-17 2021-11-10 東洋インキＳｃホールディングス株式会社 光硬化性上塗り塗料、積層体およびその製造方法、包装容器用部材およびその製造方法、並びに包装容器
CN113394573B (zh) * 2021-07-25 2024-10-01 西安安聚德纳米科技有限公司 用于高功率微波暗室的轻量宽频吸波材料及制备方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE161860T1 (de) * 1988-02-19 1998-01-15 Asahi Denka Kogyo Kk Kunststoffzusammensetzung für optisches modellieren
DE69940916D1 (de) * 1998-02-18 2009-07-09 Dsm Ip Assets Bv Fotohärtbare flüssige Harzzusammensetzung
US20050256219A1 (en) * 2002-03-11 2005-11-17 Hideaki Takase Photocurable resin composition and optical component

Also Published As

Publication number Publication date
EP1636274B1 (de) 2009-08-12
DE602004022547D1 (de) 2009-09-24
KR20060026886A (ko) 2006-03-24
EP1636274A1 (de) 2006-03-22
JP2005015627A (ja) 2005-01-20
WO2004113395A1 (en) 2004-12-29
US20070096355A1 (en) 2007-05-03
CN1813003A (zh) 2006-08-02

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Legal Events

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