ATE392011T1 - Antireflexzusammensetzungen mit triazinverbindungen - Google Patents

Antireflexzusammensetzungen mit triazinverbindungen

Info

Publication number
ATE392011T1
ATE392011T1 AT03770384T AT03770384T ATE392011T1 AT E392011 T1 ATE392011 T1 AT E392011T1 AT 03770384 T AT03770384 T AT 03770384T AT 03770384 T AT03770384 T AT 03770384T AT E392011 T1 ATE392011 T1 AT E392011T1
Authority
AT
Austria
Prior art keywords
light
reflective coating
triazine compounds
antireflex
compositions containing
Prior art date
Application number
AT03770384T
Other languages
English (en)
Inventor
Tomoyuki Enomoto
Keisuke Nakayama
Rama Puligadda
Original Assignee
Brewer Science Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Brewer Science Inc filed Critical Brewer Science Inc
Application granted granted Critical
Publication of ATE392011T1 publication Critical patent/ATE392011T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31855—Of addition polymer from unsaturated monomers
    • Y10T428/31938—Polymer of monoethylenically unsaturated hydrocarbon

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Surface Treatment Of Optical Elements (AREA)
AT03770384T 2002-10-15 2003-09-19 Antireflexzusammensetzungen mit triazinverbindungen ATE392011T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/271,646 US7038328B2 (en) 2002-10-15 2002-10-15 Anti-reflective compositions comprising triazine compounds

Publications (1)

Publication Number Publication Date
ATE392011T1 true ATE392011T1 (de) 2008-04-15

Family

ID=32069181

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03770384T ATE392011T1 (de) 2002-10-15 2003-09-19 Antireflexzusammensetzungen mit triazinverbindungen

Country Status (9)

Country Link
US (1) US7038328B2 (de)
EP (1) EP1556896B1 (de)
JP (1) JP4399364B2 (de)
KR (1) KR101011841B1 (de)
AT (1) ATE392011T1 (de)
AU (1) AU2003278870A1 (de)
DE (1) DE60320292T2 (de)
TW (1) TWI303013B (de)
WO (1) WO2004036311A2 (de)

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US20090042133A1 (en) * 2007-08-10 2009-02-12 Zhong Xiang Antireflective Coating Composition
JP4993139B2 (ja) * 2007-09-28 2012-08-08 信越化学工業株式会社 反射防止膜形成材料、反射防止膜及びこれを用いたパターン形成方法
US8329387B2 (en) * 2008-07-08 2012-12-11 Az Electronic Materials Usa Corp. Antireflective coating compositions
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US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8883407B2 (en) * 2009-06-12 2014-11-11 Rohm And Haas Electronic Materials Llc Coating compositions suitable for use with an overcoated photoresist
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Also Published As

Publication number Publication date
EP1556896B1 (de) 2008-04-09
KR101011841B1 (ko) 2011-01-31
JP4399364B2 (ja) 2010-01-13
WO2004036311A3 (en) 2004-12-09
AU2003278870A8 (en) 2004-05-04
EP1556896A2 (de) 2005-07-27
DE60320292T2 (de) 2009-07-16
DE60320292D1 (de) 2008-05-21
US7038328B2 (en) 2006-05-02
TW200413839A (en) 2004-08-01
TWI303013B (en) 2008-11-11
WO2004036311A2 (en) 2004-04-29
US20040072420A1 (en) 2004-04-15
KR20050074962A (ko) 2005-07-19
JP2006503331A (ja) 2006-01-26
EP1556896A4 (de) 2007-05-09
AU2003278870A1 (en) 2004-05-04

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