ATE352799T1 - Vorrichtung zur reinigung und inspektion von retikeln - Google Patents

Vorrichtung zur reinigung und inspektion von retikeln

Info

Publication number
ATE352799T1
ATE352799T1 AT03771999T AT03771999T ATE352799T1 AT E352799 T1 ATE352799 T1 AT E352799T1 AT 03771999 T AT03771999 T AT 03771999T AT 03771999 T AT03771999 T AT 03771999T AT E352799 T1 ATE352799 T1 AT E352799T1
Authority
AT
Austria
Prior art keywords
cleaning
cleaning chamber
detection
detection unit
reticle
Prior art date
Application number
AT03771999T
Other languages
English (en)
Inventor
Jakob Blattner
Rudy Federici
Original Assignee
Brooks Automation Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Brooks Automation Inc filed Critical Brooks Automation Inc
Application granted granted Critical
Publication of ATE352799T1 publication Critical patent/ATE352799T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00—Cleaning by methods involving the use of air flow or gas flow
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning In General (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AT03771999T 2002-07-29 2003-07-28 Vorrichtung zur reinigung und inspektion von retikeln ATE352799T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH01330/02A CH696188A5 (de) 2002-07-29 2002-07-29 Detektions- und Reinigungsvorrichtung in einer Handhabungsvorrichtung für Photomasken.

Publications (1)

Publication Number Publication Date
ATE352799T1 true ATE352799T1 (de) 2007-02-15

Family

ID=30774632

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03771999T ATE352799T1 (de) 2002-07-29 2003-07-28 Vorrichtung zur reinigung und inspektion von retikeln

Country Status (8)

Country Link
US (1) US7478454B2 (de)
EP (1) EP1539386B1 (de)
JP (1) JP4477495B2 (de)
AT (1) ATE352799T1 (de)
AU (1) AU2003259273A1 (de)
CH (1) CH696188A5 (de)
DE (1) DE60311479T2 (de)
WO (1) WO2004011161A2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2422840B (en) * 2003-10-21 2008-08-27 Champion Technology Inc Methods for inhibiting hydrate blockage in oil and gas pipelines using simple quaternary ammonium and phosphonium compounds
CN100437279C (zh) * 2005-08-15 2008-11-26 友达光电股份有限公司 有源光罩除尘设备
DE102008045369B4 (de) 2008-09-02 2013-11-21 Grenzebach Maschinenbau Gmbh Vorrichtung und Verfahren zum Aufnehmen von Glasplatten
US11181448B2 (en) 2012-11-06 2021-11-23 Biodot, Inc. Controlled printing of a cell sample for karyotyping
JP5881590B2 (ja) 2012-12-12 2016-03-09 株式会社東芝 マスククリーナー及びクリーニング方法
CN113044563A (zh) * 2021-03-01 2021-06-29 大族激光科技产业集团股份有限公司 进料机构及清洗装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5846338A (en) * 1996-01-11 1998-12-08 Asyst Technologies, Inc. Method for dry cleaning clean room containers
US6115867A (en) * 1997-08-18 2000-09-12 Tokyo Electron Limited Apparatus for cleaning both sides of substrate
US6629638B1 (en) * 1997-12-11 2003-10-07 Ceyx Technologies Electro-optic system controller and method of operation
JP3998790B2 (ja) * 1998-01-16 2007-10-31 大日本印刷株式会社 マスク準備装置
JP3772056B2 (ja) * 1998-10-12 2006-05-10 株式会社東芝 半導体基板の洗浄方法
WO2002001292A1 (de) * 2000-06-27 2002-01-03 Brooks-Pri Automation (Switzerland) Gmbh Vorrichtung und verfahren zur reinigung von in der produktion von halbleiterelementen benutzten objekten
JP3925088B2 (ja) 2001-01-16 2007-06-06 株式会社日立製作所 ドライ洗浄方法
JP2002217156A (ja) 2001-01-16 2002-08-02 Hitachi Ltd ドライ洗浄装置
US6656017B2 (en) * 2001-04-24 2003-12-02 David P. Jackson Method and apparatus for creating an open cell micro-environment for treating a substrate with an impingement spray

Also Published As

Publication number Publication date
US7478454B2 (en) 2009-01-20
AU2003259273A1 (en) 2004-02-16
DE60311479D1 (de) 2007-03-15
WO2004011161A3 (en) 2005-04-21
EP1539386A4 (de) 2006-02-22
EP1539386B1 (de) 2007-01-24
US20040111823A1 (en) 2004-06-17
EP1539386A2 (de) 2005-06-15
JP4477495B2 (ja) 2010-06-09
WO2004011161A2 (en) 2004-02-05
JP2006511063A (ja) 2006-03-30
DE60311479T2 (de) 2007-11-08
CH696188A5 (de) 2007-02-15
AU2003259273A8 (en) 2004-02-16

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Legal Events

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RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties