ATE349559T1 - Ultraschall-füllstandmessung in einem chemischen nachfüllsystem - Google Patents
Ultraschall-füllstandmessung in einem chemischen nachfüllsystemInfo
- Publication number
- ATE349559T1 ATE349559T1 AT99123238T AT99123238T ATE349559T1 AT E349559 T1 ATE349559 T1 AT E349559T1 AT 99123238 T AT99123238 T AT 99123238T AT 99123238 T AT99123238 T AT 99123238T AT E349559 T1 ATE349559 T1 AT E349559T1
- Authority
- AT
- Austria
- Prior art keywords
- chemical
- level measurement
- ultrasonic level
- refilling system
- reservoir
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F13/00—Apparatus for measuring by volume and delivering fluids or fluent solid materials, not provided for in the preceding groups
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases
Landscapes
- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- General Physics & Mathematics (AREA)
- Measurement Of Levels Of Liquids Or Fluent Solid Materials (AREA)
- Investigating Or Analyzing Materials By The Use Of Ultrasonic Waves (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US20100598A | 1998-11-30 | 1998-11-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE349559T1 true ATE349559T1 (de) | 2007-01-15 |
Family
ID=22744091
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT99123238T ATE349559T1 (de) | 1998-11-30 | 1999-11-26 | Ultraschall-füllstandmessung in einem chemischen nachfüllsystem |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP1006219B1 (de) |
JP (1) | JP2000167381A (de) |
KR (1) | KR100297441B1 (de) |
AT (1) | ATE349559T1 (de) |
DE (1) | DE69934565T2 (de) |
IL (2) | IL133102A0 (de) |
TW (1) | TW413729B (de) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1521948A1 (de) | 2002-07-17 | 2005-04-13 | Epichem Limited | Verfahren und vorrichtung zur füllstandsüberwachung in einem behälter |
ITMI20021692A1 (it) * | 2002-07-30 | 2002-10-29 | Indena Spa | Polisaccaride di echinacea angustifolia. |
GB2432371B (en) | 2005-11-17 | 2011-06-15 | Epichem Ltd | Improved bubbler for the transportation of substances by a carrier gas |
WO2011053505A1 (en) | 2009-11-02 | 2011-05-05 | Sigma-Aldrich Co. | Evaporator |
CN102791383B (zh) * | 2010-01-06 | 2017-11-14 | 恩特格里斯公司 | 具有除气和感测能力的液体分配系统 |
US8959998B2 (en) | 2013-05-15 | 2015-02-24 | Air Products And Chemicals, Inc. | Ultrasonic liquid level sensing systems |
US10151618B2 (en) | 2014-01-24 | 2018-12-11 | Versum Materials Us, Llc | Ultrasonic liquid level sensing systems |
TWI651517B (zh) * | 2018-03-02 | 2019-02-21 | 國立臺灣大學 | 串接式超音波水位偵測模組及水位計 |
US11378436B2 (en) | 2018-12-10 | 2022-07-05 | Carrier Corporation | Adjustable liquid level indicators |
KR20200130121A (ko) * | 2019-05-07 | 2020-11-18 | 에이에스엠 아이피 홀딩 비.브이. | 딥 튜브가 있는 화학물질 공급원 용기 |
TWI779280B (zh) * | 2019-06-03 | 2022-10-01 | 日商英達斯特股份有限公司 | 微細物除去系統 |
US20210123134A1 (en) * | 2019-10-24 | 2021-04-29 | Entegris, Inc. | Sublimation ampoule with level sensing |
CN113930738B (zh) * | 2020-06-29 | 2023-09-12 | 宝山钢铁股份有限公司 | 一种真空镀膜用的金属蒸汽调制装置及其调制方法 |
CN112781677A (zh) * | 2020-12-30 | 2021-05-11 | 济南市第三人民医院 | 一种医院检验科实验室试剂用量监控装置 |
KR102565527B1 (ko) * | 2021-03-11 | 2023-08-14 | 포이스주식회사 | 초음파를 이용한 반도체 제조용 화학약품 잔량 관리시스템 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4545245A (en) * | 1983-11-09 | 1985-10-08 | Simmonds Precision Products, Inc. | Liquid level sensor using sonic methods |
US4859375A (en) * | 1986-12-29 | 1989-08-22 | Air Products And Chemicals, Inc. | Chemical refill system |
US4901245A (en) * | 1987-12-01 | 1990-02-13 | Moore Technologies, Inc. | Nonintrusive acoustic liquid level sensor |
US5383574A (en) * | 1993-07-19 | 1995-01-24 | Microbar Sytems, Inc. | System and method for dispensing liquid from storage containers |
-
1999
- 1999-11-24 IL IL13310299A patent/IL133102A0/xx unknown
- 1999-11-24 IL IL150315A patent/IL150315A/en not_active IP Right Cessation
- 1999-11-25 KR KR1019990052646A patent/KR100297441B1/ko active IP Right Grant
- 1999-11-26 AT AT99123238T patent/ATE349559T1/de not_active IP Right Cessation
- 1999-11-26 EP EP99123238A patent/EP1006219B1/de not_active Expired - Lifetime
- 1999-11-26 DE DE69934565T patent/DE69934565T2/de not_active Expired - Lifetime
- 1999-11-26 TW TW088120729A patent/TW413729B/zh not_active IP Right Cessation
- 1999-11-30 JP JP11339894A patent/JP2000167381A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
EP1006219B1 (de) | 2006-12-27 |
KR20000035684A (ko) | 2000-06-26 |
IL133102A0 (en) | 2001-03-19 |
EP1006219A1 (de) | 2000-06-07 |
DE69934565T2 (de) | 2007-10-04 |
KR100297441B1 (ko) | 2001-10-29 |
IL150315A (en) | 2010-12-30 |
DE69934565D1 (de) | 2007-02-08 |
JP2000167381A (ja) | 2000-06-20 |
TW413729B (en) | 2000-12-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |