ATE322989T1 - Ir-empfindliche zusammensetzung und auf der presse entwickelbare ir-empfindliche druckplatten - Google Patents

Ir-empfindliche zusammensetzung und auf der presse entwickelbare ir-empfindliche druckplatten

Info

Publication number
ATE322989T1
ATE322989T1 AT03710835T AT03710835T ATE322989T1 AT E322989 T1 ATE322989 T1 AT E322989T1 AT 03710835 T AT03710835 T AT 03710835T AT 03710835 T AT03710835 T AT 03710835T AT E322989 T1 ATE322989 T1 AT E322989T1
Authority
AT
Austria
Prior art keywords
free radical
sensitive
radical polymerizable
press
printing plates
Prior art date
Application number
AT03710835T
Other languages
English (en)
Inventor
Hans-Joachim Timpe
Gyldenfeldt Friederike Von
Original Assignee
Kodak Polychrome Graphics Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Polychrome Graphics Llc filed Critical Kodak Polychrome Graphics Llc
Application granted granted Critical
Publication of ATE322989T1 publication Critical patent/ATE322989T1/de

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/10Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/10Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B41C1/1016Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/02Cover layers; Protective layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/14Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by macromolecular organic compounds, e.g. binder, adhesives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/04Negative working, i.e. the non-exposed (non-imaged) areas are removed
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/08Developable by water or the fountain solution
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/145Infrared
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146Laser beam
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/165Thermal imaging composition

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Polymerisation Methods In General (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Paints Or Removers (AREA)
AT03710835T 2002-02-04 2003-02-04 Ir-empfindliche zusammensetzung und auf der presse entwickelbare ir-empfindliche druckplatten ATE322989T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/066,874 US6846614B2 (en) 2002-02-04 2002-02-04 On-press developable IR sensitive printing plates

Publications (1)

Publication Number Publication Date
ATE322989T1 true ATE322989T1 (de) 2006-04-15

Family

ID=27732216

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03710835T ATE322989T1 (de) 2002-02-04 2003-02-04 Ir-empfindliche zusammensetzung und auf der presse entwickelbare ir-empfindliche druckplatten

Country Status (8)

Country Link
US (1) US6846614B2 (de)
EP (1) EP1478516B1 (de)
JP (1) JP2005516804A (de)
CN (1) CN1628038A (de)
AT (1) ATE322989T1 (de)
BR (1) BR0307435A (de)
DE (1) DE60304562T2 (de)
WO (1) WO2003066338A1 (de)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
WO2000077575A1 (en) * 1999-06-10 2000-12-21 Alliedsignal Inc. Spin-on-glass anti-reflective coatings for photolithography
US6740464B2 (en) * 2000-01-14 2004-05-25 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor
US6884568B2 (en) * 2000-10-17 2005-04-26 Kodak Polychrome Graphics, Llc Stabilized infrared-sensitive polymerizable systems
US7592128B2 (en) * 2001-04-04 2009-09-22 Eastman Kodak Company On-press developable negative-working imageable elements
US7261998B2 (en) 2001-04-04 2007-08-28 Eastman Kodak Company Imageable element with solvent-resistant polymeric binder
KR20040075866A (ko) * 2001-11-15 2004-08-30 허니웰 인터내셔날 인코포레이티드 포토리소그래피용 스핀-온 무반사 코팅
US7659046B2 (en) * 2002-04-10 2010-02-09 Eastman Kodak Company Water-developable infrared-sensitive printing plate
US7172850B2 (en) * 2002-04-10 2007-02-06 Eastman Kodak Company Preparation of solvent-resistant binder for an imageable element
CN1669130A (zh) * 2002-09-20 2005-09-14 霍尼韦尔国际公司 用于低介电常数材料的夹层增粘剂
JP4458778B2 (ja) 2003-02-20 2010-04-28 富士フイルム株式会社 重合性組成物及びそれを用いた平版印刷版原版
US7368215B2 (en) * 2003-05-12 2008-05-06 Eastman Kodak Company On-press developable IR sensitive printing plates containing an onium salt initiator system
JP2005047181A (ja) * 2003-07-30 2005-02-24 Fuji Photo Film Co Ltd 平版印刷版の製版方法、平版印刷方法および平版印刷原版
JP2005059446A (ja) 2003-08-15 2005-03-10 Fuji Photo Film Co Ltd 平版印刷版原版及び平版印刷方法
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
ATE378174T1 (de) * 2004-01-23 2007-11-15 Fujifilm Corp Lithographiedruckplattenvorläufer und lithographisches druckverfahren
DE102004011347A1 (de) 2004-03-05 2005-09-29 Basf Ag Druckfarben für den Offset- und/oder Hochdruck mit NIR-Absorbern sowie in Offset- und/oder Hochdruckfarben lösliche NIR-Absorber
JP2005329708A (ja) * 2004-03-19 2005-12-02 Fuji Photo Film Co Ltd 平版印刷版原版
US7402374B2 (en) * 2004-05-31 2008-07-22 Fujifilm Corporation Method for colored image formation
US20060255315A1 (en) * 2004-11-19 2006-11-16 Yellowaga Deborah L Selective removal chemistries for semiconductor applications, methods of production and uses thereof
US7189494B2 (en) * 2005-05-26 2007-03-13 Eastman Kodak Company On-press developable imageable element comprising a tetraarylborate salt
GB0511096D0 (en) * 2005-05-31 2005-07-06 Sherwood Technology Ltd Laser imaging
US8129090B2 (en) * 2005-11-04 2012-03-06 Gary Ganghui Teng Process for on-press developable lithographic printing plate involving preheat
US7966934B2 (en) * 2005-11-04 2011-06-28 Gary Ganghui Teng Process for on-press developing overcoat-free lithographic printing plate
BRPI0707574B1 (pt) * 2006-05-17 2017-06-06 American Dye Source Inc novos materiais para revestimentos de placas litográficas, placas litográficas e revestimentos contendo as mesmas, métodos de preparação e uso
JP5593068B2 (ja) * 2006-08-24 2014-09-17 アメリカン・ダイ・ソース・インコーポレーテッド 反応性近赤外吸収性ポリマー粒子、その調製方法、及びその使用
US8642246B2 (en) * 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
TWI409280B (zh) * 2007-07-31 2013-09-21 American Dye Source Inc 聚合物染料、塗覆層組合物及熱微影印刷板
US8240943B2 (en) * 2008-07-09 2012-08-14 Eastman Kodak Company On-press developable imageable elements
US20100151385A1 (en) 2008-12-17 2010-06-17 Ray Kevin B Stack of negative-working imageable elements
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8383319B2 (en) 2009-08-25 2013-02-26 Eastman Kodak Company Lithographic printing plate precursors and stacks
EP2478020A4 (de) 2009-09-15 2015-04-15 Mylan Group Copolymere, polymerpartikel mit diesen copolymeren und copolymerbinder für strahlungsempfindliche beschichtungszusammensetzungen für negativ arbeitende strahlungsempfindliche lithografiedruckplatten
US8932398B2 (en) 2009-10-29 2015-01-13 Mylan Group Gallotannic compounds for lithographic printing plate coating compositions
UA106533C2 (uk) 2010-09-14 2014-09-10 Майлен Груп Співполімери для чутливих у близькій інфрачервоній області випромінювання композицій для покриття позитивних термічних літографічних друкарських форм
EP2428842A1 (de) * 2010-09-14 2012-03-14 Rohm and Haas Electronic Materials LLC Fotolacke mit Multi-Amid-Komponente
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
US10544329B2 (en) 2015-04-13 2020-01-28 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
EP3456547B1 (de) * 2017-02-28 2020-10-28 Fujifilm Corporation Lithografischer druckplattenvorläufer, verfahren zur herstellen einer lithografischen druckplatte und lithografisches druckverfahren
EP3686011A1 (de) * 2019-01-23 2020-07-29 Agfa Nv Lithographiedruckplattenvorläufer
EP4171958B1 (de) * 2020-06-24 2025-08-13 Eco3 Bv Lithographiedruckplattenvorläufer, verfahren zur herstellung eines druckplattenvorläufers und verfahren zur herstellung einer druckplatte
US11760081B2 (en) 2020-09-04 2023-09-19 Eastman Kodak Company Lithographic printing plate precursor and method of use

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4228232A (en) * 1979-02-27 1980-10-14 Minnesota Mining And Manufacturing Company Photopolymerizable composition containing ethylenically unsaturated oligomers
CA1323949C (en) 1987-04-02 1993-11-02 Michael C. Palazzotto Ternary photoinitiator system for addition polymerization
US5204222A (en) 1988-07-16 1993-04-20 Hoechst Aktiengesellschaft Photocurable elastomeric mixture and recording material, obtained therefrom, for the production of relief printing plates
JPH0820734B2 (ja) 1988-08-11 1996-03-04 富士写真フイルム株式会社 感光性組成物及びそれを用いた光重合性組成物
US4971892A (en) * 1988-11-23 1990-11-20 Minnesota Mining And Manufacturing Company High sensitivity photopolymerizable composition
JP2677457B2 (ja) 1991-01-22 1997-11-17 日本ペイント株式会社 光重合性組成物
US5756258A (en) 1992-07-13 1998-05-26 Kyowa Hakko Co., Ltd. Photopolymerizable composition containing an addition polymerizable compound, a radical-producing agent and a squarylium compound
EP0672954B1 (de) 1994-03-14 1999-09-15 Kodak Polychrome Graphics LLC Strahlungsempfindliche Zusammensetzung, enthaltend ein Resolharz, ein Novolakharz, einen Infrarotabsorber und ein Triazin, und seine Verwendung in lithographischen Druckplatten
EP0672544B1 (de) 1994-03-16 1998-05-06 Eastman Kodak Company Wärmeempfindliches Aufzeichnungselement mit klebender Zwischenschicht
JP3321288B2 (ja) 1994-04-25 2002-09-03 日本ペイント株式会社 近赤外光重合性組成物
US5491046A (en) 1995-02-10 1996-02-13 Eastman Kodak Company Method of imaging a lithographic printing plate
US5629354A (en) 1995-02-28 1997-05-13 Eastman Kodak Company Photopolymerization initiator system comprising a spectral sensitizer and a polycarboxylic acid co-initiator
US5599650A (en) 1995-04-28 1997-02-04 Polaroid Corporation Photoreaction quenchers in on-press developable lithographic printing plates
JPH0934110A (ja) 1995-07-17 1997-02-07 Konica Corp 光重合性組成物、ラジカル発生方法、平版印刷版作成用感光材料及びそれを用いた平版印刷版の作成方法
AU717137B2 (en) 1995-11-24 2000-03-16 Ciba Specialty Chemicals Holding Inc. Borate coinitiators for photopolymerization
US5800965A (en) 1996-02-29 1998-09-01 Mitsubishi Chemical Corporation Photopolymerizable composition for a photosensitive lithographic printing plate and photosensitive lithographic printing plate employing it
US5763134A (en) 1996-05-13 1998-06-09 Imation Corp Composition comprising photochemical acid progenitor and specific squarylium dye
EP0819985B1 (de) 1996-07-19 2002-06-05 Agfa-Gevaert Strahlungsempfindliches Bildaufzeichnungselement und Verfahren zur Herstellung von lithographischen Druckplatten mit diesem Element
JP3844853B2 (ja) 1997-07-22 2006-11-15 富士写真フイルム株式会社 ネガ型画像記録材料
DE19906823C2 (de) 1999-02-18 2002-03-14 Kodak Polychrome Graphics Gmbh IR-Empfindliche Zusammensetzung und deren Verwendung zur Herstellung von Druckplatten
US6071675A (en) 1999-06-05 2000-06-06 Teng; Gary Ganghui On-press development of a lithographic plate comprising dispersed solid particles
US6245481B1 (en) 1999-10-12 2001-06-12 Gary Ganghui Teng On-press process of lithographic plates having a laser sensitive mask layer
US6638686B2 (en) 1999-12-09 2003-10-28 Fuji Photo Film Co., Ltd. Planographic printing plate
JP2001270919A (ja) 2000-01-17 2001-10-02 Toyo Gosei Kogyo Kk 高分子化合物及びその製造方法並びに感光性組成物及びパターン形成方法
US6309792B1 (en) * 2000-02-18 2001-10-30 Kodak Polychrome Graphics Llc IR-sensitive composition and use thereof for the preparation of printing plate precursors
US6242156B1 (en) 2000-06-28 2001-06-05 Gary Ganghui Teng Lithographic plate having a conformal radiation-sensitive layer on a rough substrate
US6245486B1 (en) 2000-06-30 2001-06-12 Gary Ganghui Teng Method for imaging a printing plate having a laser ablatable mask layer
US6864040B2 (en) * 2001-04-11 2005-03-08 Kodak Polychrome Graphics Llc Thermal initiator system using leuco dyes and polyhalogene compounds
US6884568B2 (en) * 2000-10-17 2005-04-26 Kodak Polychrome Graphics, Llc Stabilized infrared-sensitive polymerizable systems
US6899994B2 (en) * 2001-04-04 2005-05-31 Kodak Polychrome Graphics Llc On-press developable IR sensitive printing plates using binder resins having polyethylene oxide segments
US20030118939A1 (en) * 2001-11-09 2003-06-26 Kodak Polychrome Graphics, L.L.C. High speed negative working thermal printing plates

Also Published As

Publication number Publication date
CN1628038A (zh) 2005-06-15
DE60304562D1 (de) 2006-05-24
JP2005516804A (ja) 2005-06-09
US6846614B2 (en) 2005-01-25
EP1478516A1 (de) 2004-11-24
DE60304562T2 (de) 2006-09-14
EP1478516B1 (de) 2006-04-12
US20030157433A1 (en) 2003-08-21
WO2003066338A1 (en) 2003-08-14
BR0307435A (pt) 2004-12-28

Similar Documents

Publication Publication Date Title
ATE322989T1 (de) Ir-empfindliche zusammensetzung und auf der presse entwickelbare ir-empfindliche druckplatten
WO2007019031A3 (en) Radiation-sensitive compositions and imageable materials
ATE400838T1 (de) Lichtaushärtbare und hitzehärtbare harzzusammensetzung
DE60327378D1 (de) Metallkomplexe für die Metathese, Atomtransferradikalreaktionen. Additionspolymerisation und Vinylationreaktionen, Verfahren und Zwischenprodukte für deren Herstellung.
WO2003087939A3 (en) On-press developable ir sensitive printing plates using binder resins having polyethylene oxide segments
ATE407155T1 (de) Pyridin-imin polymerisationskatalysator
WO2008002393A3 (en) Negative-working radiation-sensitive compositions and imageable element
PT1003504E (pt) Compostos quimicos
DE59406157D1 (de) Cyclische Derivate, diese Verbindungen enthaltende Arzneimittel und Verfahren zu ihrer Herstellung
ATE514729T1 (de) Biomaterialien die durch nukleophile reaktion auf konjugierten ungesättigten gruppen addiert sind
DE60326990D1 (de) Partikeln
DE59309902D1 (de) Azachinoxaline, Verfahren zu ihrer Herstellung und ihre Verwendung
ATE129503T1 (de) Amidinophenylalaninderivate, verfahren zu deren herstellung, deren verwendung und diese enthaltende mittel als antikoagulantien.
DK1260563T3 (da) UV-hærdende dybtryksfarve
ATE541700T1 (de) Tintenzusammensetzung, tintenstrahlaufzeichnungsverfahren, verfahren zur herstellung einer flachdruckplatte und flachdruckplatte
EP1857276A3 (de) Flachdruckplattenvorläufer
DE60000442D1 (de) Aus beta-phosphorylierte nitroxiden abkömmige alkoxyamine, ihre verwendung fur radikal polymerisation
DE60116121D1 (de) Imidate enthaltende fluorpolymerzusammensetzungen
MX9304720A (es) Composiciones endurecibles mediante radicales a temperatura ambiente.
ATE333472T1 (de) Azlacton -initiatoren für atomtransferradikalpolymerisation
BR9606599A (pt) Componente de catalisador e catalisador para polimerizar olefinas
DE602004019074D1 (de) Azlacton-kettenübertragungsmittel für die radikalpolymerisation
DE59408308D1 (de) Nukleinsäure-bindende Oligomere mit C-Verzweigung für Therapie und Diagnostik
DE602004025061D1 (de) Lichtempfindliche Zusammensetzung und damit hergestellte Flachdruckplatte-Vorstufe
ATE415457T1 (de) Tintenzusammensetzung, verfahren zum tintenstrahldruck, bedrucktes material, verfahren zum herstellen einer planographischen druckplatte,planographische druckplatte

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties