ATE266256T1 - Plasma-applikatoren - Google Patents

Plasma-applikatoren

Info

Publication number
ATE266256T1
ATE266256T1 AT97301831T AT97301831T ATE266256T1 AT E266256 T1 ATE266256 T1 AT E266256T1 AT 97301831 T AT97301831 T AT 97301831T AT 97301831 T AT97301831 T AT 97301831T AT E266256 T1 ATE266256 T1 AT E266256T1
Authority
AT
Austria
Prior art keywords
plasma
tube
plasma tube
cylindrically
seal
Prior art date
Application number
AT97301831T
Other languages
German (de)
English (en)
Inventor
Gary C Ettinger
Quanyuan Shang
Kam S Law
Original Assignee
Akt Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Akt Inc filed Critical Akt Inc
Application granted granted Critical
Publication of ATE266256T1 publication Critical patent/ATE266256T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32513—Sealing means, e.g. sealing between different parts of the vessel

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • X-Ray Techniques (AREA)
  • ing And Chemical Polishing (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Discharge Heating (AREA)
  • Manufacture And Refinement Of Metals (AREA)
AT97301831T 1996-03-29 1997-03-18 Plasma-applikatoren ATE266256T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/626,258 US5895548A (en) 1996-03-29 1996-03-29 High power microwave plasma applicator

Publications (1)

Publication Number Publication Date
ATE266256T1 true ATE266256T1 (de) 2004-05-15

Family

ID=24509621

Family Applications (1)

Application Number Title Priority Date Filing Date
AT97301831T ATE266256T1 (de) 1996-03-29 1997-03-18 Plasma-applikatoren

Country Status (6)

Country Link
US (1) US5895548A (fr)
EP (1) EP0800200B1 (fr)
JP (1) JP3989584B2 (fr)
KR (1) KR100491214B1 (fr)
AT (1) ATE266256T1 (fr)
DE (1) DE69728926D1 (fr)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990071626A (ko) * 1996-09-24 1999-09-27 매튜스 죤 씨. 사파이어플라즈마애셔에서기판으로부터잔류물을제거하는방법및그장치
US6055927A (en) * 1997-01-14 2000-05-02 Applied Komatsu Technology, Inc. Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology
US6163007A (en) * 1999-03-19 2000-12-19 Applied Materials, Inc. Microwave plasma generating apparatus with improved heat protection of sealing O-rings
US6263830B1 (en) * 1999-04-12 2001-07-24 Matrix Integrated Systems, Inc. Microwave choke for remote plasma generator
US6450116B1 (en) * 1999-04-22 2002-09-17 Applied Materials, Inc. Apparatus for exposing a substrate to plasma radicals
US6401653B1 (en) * 2000-04-18 2002-06-11 Daihen Corporation Microwave plasma generator
US6603269B1 (en) 2000-06-13 2003-08-05 Applied Materials, Inc. Resonant chamber applicator for remote plasma source
US6939434B2 (en) * 2000-08-11 2005-09-06 Applied Materials, Inc. Externally excited torroidal plasma source with magnetic control of ion distribution
US20050212626A1 (en) * 2002-05-07 2005-09-29 Toshiyuki Takamatsu High frequency reaction processing system
EP1535303A1 (fr) * 2002-08-30 2005-06-01 Axcelis Technologies Inc. Coiffe d'extremite d'un tube a gaz destinee a un generateur de plasma micro-ondes
US7183514B2 (en) * 2003-01-30 2007-02-27 Axcelis Technologies, Inc. Helix coupled remote plasma source
US7358192B2 (en) * 2004-04-08 2008-04-15 Applied Materials, Inc. Method and apparatus for in-situ film stack processing
KR100725105B1 (ko) 2006-07-12 2007-06-04 삼성전자주식회사 반도체 제조설비의 애플리케이터
NL1033783C2 (nl) * 2007-05-01 2008-11-06 Draka Comteq Bv Inrichting voor het uitvoeren van een plasma chemische dampdepositie alsmede werkwijze ter vervaardiging van een optische voorvorm.
US9949321B1 (en) * 2016-03-09 2018-04-17 Linamp Technologies Llc Radio frequency fluid warmer
JP6739201B2 (ja) * 2016-03-25 2020-08-12 スピードファム株式会社 局所ドライエッチング装置

Family Cites Families (23)

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Publication number Priority date Publication date Assignee Title
US2964679A (en) * 1959-06-26 1960-12-13 Gen Electric Arc plasma generator
US3221212A (en) * 1961-10-27 1965-11-30 Gen Electric Plasma accelerator
GB1240031A (en) * 1969-01-08 1971-07-21 Nat Res Dev Improvements in or relating to gas discharge tubes
CH526249A (de) * 1970-12-21 1972-07-31 Bbc Brown Boveri & Cie Einrichtung zur elektrodenlosen Plasmaerzeugung mittels Hochfrequenzenergie
US3753144A (en) * 1971-10-18 1973-08-14 W Kearns Gas laser structure
EP0103461B1 (fr) * 1982-09-10 1988-11-17 Nippon Telegraph And Telephone Corporation Appareil et procédé de dépôt à plasma
US4654504A (en) * 1983-11-30 1987-03-31 Hewlett-Packard Company Water-cooled gas discharge detector
JPS6287268A (ja) * 1985-10-02 1987-04-21 ザ・パ−キン−エルマ−・コ−ポレイシヨン プラズマスプレ−ガン用ノズル組立体
JPS63199471A (ja) * 1987-02-16 1988-08-17 Toshiba Corp 金属蒸気レ−ザ発振管
JP2505489B2 (ja) * 1987-09-18 1996-06-12 三菱重工業株式会社 プラズマト―チ放射光の減光方法
KR920003789B1 (ko) * 1988-02-08 1992-05-14 니뽄 덴신 덴와 가부시끼가이샤 플라즈마 스퍼터링을 이용한 박막 형성 장치 및 이온원
US4918031A (en) * 1988-12-28 1990-04-17 American Telephone And Telegraph Company,At&T Bell Laboratories Processes depending on plasma generation using a helical resonator
US5124998A (en) * 1990-05-21 1992-06-23 Coherent, Inc. Laser plasma tube having a window sealed end and a mirror sealed end
US5008593A (en) * 1990-07-13 1991-04-16 The United States Of America As Represented By The Secretary Of The Air Force Coaxial liquid cooling of high power microwave excited plasma UV lamps
US5055741A (en) * 1990-07-13 1991-10-08 The United States Of America As Represented By The Secretary Of The Air Force Liquid coolant for high power microwave excited plasma tubes
US5082517A (en) * 1990-08-23 1992-01-21 Texas Instruments Incorporated Plasma density controller for semiconductor device processing equipment
JPH04259378A (ja) * 1990-09-10 1992-09-14 Applied Sci & Technol Inc 再循環高速対流リアクター
US5235251A (en) * 1991-08-09 1993-08-10 The United States Of America As Represented By The Secretary Of The Air Force Hydraulic fluid cooling of high power microwave plasma tubes
US5361016A (en) * 1992-03-26 1994-11-01 General Atomics High density plasma formation using whistler mode excitation in a reduced cross-sectional area formation tube
US5501740A (en) * 1993-06-04 1996-03-26 Applied Science And Technology, Inc. Microwave plasma reactor
US5722668A (en) * 1994-04-29 1998-03-03 Applied Materials, Inc. Protective collar for vacuum seal in a plasma etch reactor
EP0726593A1 (fr) * 1995-02-13 1996-08-14 Applied Materials, Inc. Générateur d'espèces réactives, de haute puissance et à base de plasma
US5625259A (en) * 1995-02-16 1997-04-29 Applied Science And Technology, Inc. Microwave plasma applicator with a helical fluid cooling channel surrounding a microwave transparent discharge tube

Also Published As

Publication number Publication date
KR100491214B1 (ko) 2005-08-04
JPH1032099A (ja) 1998-02-03
EP0800200A2 (fr) 1997-10-08
US5895548A (en) 1999-04-20
EP0800200B1 (fr) 2004-05-06
EP0800200A3 (fr) 1998-01-28
DE69728926D1 (de) 2004-06-09
JP3989584B2 (ja) 2007-10-10
KR970068752A (ko) 1997-10-13

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Legal Events

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