ATE247330T1 - Vorrichtung zur erzeugung von homogenen mikrowellenplasmen - Google Patents

Vorrichtung zur erzeugung von homogenen mikrowellenplasmen

Info

Publication number
ATE247330T1
ATE247330T1 AT98928283T AT98928283T ATE247330T1 AT E247330 T1 ATE247330 T1 AT E247330T1 AT 98928283 T AT98928283 T AT 98928283T AT 98928283 T AT98928283 T AT 98928283T AT E247330 T1 ATE247330 T1 AT E247330T1
Authority
AT
Austria
Prior art keywords
chamber
plasms
generating homogeneous
microwave
homogeneous microwave
Prior art date
Application number
AT98928283T
Other languages
English (en)
Inventor
Hildegard Sung-Spitzl
Original Assignee
Hildegard Sung-Spitzl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hildegard Sung-Spitzl filed Critical Hildegard Sung-Spitzl
Application granted granted Critical
Publication of ATE247330T1 publication Critical patent/ATE247330T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
AT98928283T 1997-06-23 1998-05-16 Vorrichtung zur erzeugung von homogenen mikrowellenplasmen ATE247330T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19726663A DE19726663A1 (de) 1997-06-23 1997-06-23 Vorrichtung zur Erzeugung von homogenen Mikrowellenplasmen
PCT/EP1998/002897 WO1998059359A1 (de) 1997-06-23 1998-05-16 Vorrichtung zur erzeugung von homogenen mikrowellenplasmen

Publications (1)

Publication Number Publication Date
ATE247330T1 true ATE247330T1 (de) 2003-08-15

Family

ID=7833413

Family Applications (1)

Application Number Title Priority Date Filing Date
AT98928283T ATE247330T1 (de) 1997-06-23 1998-05-16 Vorrichtung zur erzeugung von homogenen mikrowellenplasmen

Country Status (7)

Country Link
US (1) US6543380B1 (de)
EP (1) EP0992058B1 (de)
AT (1) ATE247330T1 (de)
AU (1) AU736861B2 (de)
CA (1) CA2294197C (de)
DE (2) DE19726663A1 (de)
WO (1) WO1998059359A1 (de)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11214196A (ja) * 1998-01-29 1999-08-06 Mitsubishi Electric Corp プラズマ発生装置
WO2002077319A1 (en) * 2001-03-27 2002-10-03 Small & Medium Industry Promotion Corporation Diamond film depositing apparatus using microwaves and plasma
DE10239875B4 (de) * 2002-08-29 2008-11-06 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zur großflächigen Beschichtung von Substraten bei Atmosphärendruckbedingungen
WO2005089818A1 (ja) * 2004-03-19 2005-09-29 Japan Science And Technology Agency マイクロ波プラズマ滅菌方法および装置
US7557364B2 (en) * 2004-05-25 2009-07-07 Panasonic Corporation Charge neutralizing device
DE102004060068B4 (de) * 2004-12-06 2009-04-16 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Mikrowellenplasmaquelle
US8232728B2 (en) 2005-09-09 2012-07-31 Inp Institut Fuer Niedertemperatur-Plasmaphysik E.V. Method and device for igniting and generating an expanding diffuse microwave plasma and method and device for plasma treating surfaces and substances by using this plasma
DE102005043278B4 (de) * 2005-09-09 2011-02-03 Leibniz-Institut für Plasmaforschung und Technologie e.V. Verfahren und Vorrichtung zum Erzeugen eines sich ausdehnenden, diffusen Mikrowellenplasmas
EP1845179B1 (de) * 2006-04-15 2010-07-28 Toho Tenax Co., Ltd. Verfahren zur kontinuierlichen Herstellung von Kohlenstofffasern
DE102006048814B4 (de) * 2006-10-16 2014-01-16 Iplas Innovative Plasma Systems Gmbh Vorrichtung und Verfahren zur Erzeugung von Mikrowellenplasmen hoher Plasmadichte
DE102006048816A1 (de) * 2006-10-16 2008-04-17 Iplas Innovative Plasma Systems Gmbh Vorrichtung und Verfahren zur lokalen Erzeugung von Mikrowellenplasmen
DE102006048815B4 (de) * 2006-10-16 2016-03-17 Iplas Innovative Plasma Systems Gmbh Vorrichtung und Verfahren zur Erzeugung von Mikrowellenplasmen hoher Leistung
US20110104489A1 (en) * 2007-10-11 2011-05-05 Toho Tenax Co., Ltd. Hollow carbon fibres and process for their production
DE102008013166A1 (de) 2008-03-07 2009-09-10 Iplas Innovative Plasma Systems Gmbh Verfahren zur Herstellung einer interferenzfarbenfreien Schutzschicht
DE102008062619B8 (de) 2008-12-10 2012-03-29 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Mikrowellenplasmaquelle und Verfahren zur Bildung eines linear langgestreckten Plasmas beiAtmosphärendruckbedingungen
NL2007968C2 (en) * 2011-12-14 2013-06-17 Draka Comteq Bv An apparatus for performing a plasma chemical vapour deposition process.
US10477665B2 (en) 2012-04-13 2019-11-12 Amastan Technologies Inc. Microwave plasma torch generating laminar flow for materials processing
US9023259B2 (en) 2012-11-13 2015-05-05 Amastan Technologies Llc Method for the densification and spheroidization of solid and solution precursor droplets of materials using microwave generated plasma processing
US9206085B2 (en) 2012-11-13 2015-12-08 Amastan Technologies Llc Method for densification and spheroidization of solid and solution precursor droplets of materials using microwave generated plasma processing
US8951496B2 (en) 2012-12-04 2015-02-10 Amastan Technologies Llc Method for making amorphous particles using a uniform melt-state in a microwave generated plasma torch
US9242224B2 (en) 2012-12-04 2016-01-26 Amastan Technologies Llc Method for the production of multiphase composite materials using microwave plasma process
ES2964898T3 (es) 2015-12-16 2024-04-10 6K Inc Metales deshidrogenados esferoidales y partículas de aleaciones metálicas
US10987735B2 (en) 2015-12-16 2021-04-27 6K Inc. Spheroidal titanium metallic powders with custom microstructures
NL2017575B1 (en) 2016-10-04 2018-04-13 Draka Comteq Bv A method and an apparatus for performing a plasma chemical vapour deposition process and a method
DE102018103949A1 (de) * 2018-02-21 2019-08-22 Christof-Herbert Diener Niederdruckplasmakammer, Niederdruckplasmaanlage und Verfahren zur Herstellung einer Niederdruckplasmakammer
AU2019290663B2 (en) 2018-06-19 2023-05-04 6K Inc. Process for producing spheroidized powder from feedstock materials
CA3134573A1 (en) 2019-04-30 2020-11-05 Sunil Bhalchandra BADWE Mechanically alloyed powder feedstock
AU2020266556A1 (en) 2019-04-30 2021-11-18 6K Inc. Lithium lanthanum zirconium oxide (LLZO) powder
CN114641462A (zh) 2019-11-18 2022-06-17 6K有限公司 用于球形粉末的独特原料及制造方法
US11590568B2 (en) 2019-12-19 2023-02-28 6K Inc. Process for producing spheroidized powder from feedstock materials
AU2021297476A1 (en) 2020-06-25 2022-12-15 6K Inc. Microcomposite alloy structure
WO2022067303A1 (en) 2020-09-24 2022-03-31 6K Inc. Systems, devices, and methods for starting plasma
KR20230095080A (ko) 2020-10-30 2023-06-28 6케이 인크. 구상화 금속 분말을 합성하는 시스템 및 방법
US12042861B2 (en) 2021-03-31 2024-07-23 6K Inc. Systems and methods for additive manufacturing of metal nitride ceramics
US12040162B2 (en) 2022-06-09 2024-07-16 6K Inc. Plasma apparatus and methods for processing feed material utilizing an upstream swirl module and composite gas flows
WO2024044498A1 (en) 2022-08-25 2024-02-29 6K Inc. Plasma apparatus and methods for processing feed material utilizing a powder ingress preventor (pip)

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3373357A (en) * 1965-01-04 1968-03-12 Lockheed Aircraft Corp Controlled mode plasma diagnostic apparatus
JPS56136646A (en) 1980-03-26 1981-10-26 Toshiba Corp Treating apparatus for surface of microwave plasma
US4795113A (en) * 1984-02-06 1989-01-03 Minovitch Michael Andrew Electromagnetic transportation system for manned space travel
US4893584A (en) 1988-03-29 1990-01-16 Energy Conversion Devices, Inc. Large area microwave plasma apparatus
US5015349A (en) * 1988-12-23 1991-05-14 University Of Connecticut Low power density microwave discharge plasma excitation energy induced chemical reactions
US5131993A (en) * 1988-12-23 1992-07-21 The Univeristy Of Connecticut Low power density plasma excitation microwave energy induced chemical reactions
US5130170A (en) * 1989-06-28 1992-07-14 Canon Kabushiki Kaisha Microwave pcvd method for continuously forming a large area functional deposited film using a curved moving substrate web with microwave energy with a directivity in one direction perpendicular to the direction of microwave propagation
US5629054A (en) * 1990-11-20 1997-05-13 Canon Kabushiki Kaisha Method for continuously forming a functional deposit film of large area by micro-wave plasma CVD method
FR2689717B1 (fr) * 1992-04-03 1994-05-13 Commissariat A Energie Atomique Dispositif d'application de micro-ondes et reacteur a plasma utilisant ce dispositif.
US5466295A (en) * 1993-10-25 1995-11-14 Board Of Regents Acting For The Univ. Of Michigan ECR plasma generation apparatus and methods
US5611864A (en) * 1994-03-24 1997-03-18 Matsushita Electric Industrial Co., Ltd. Microwave plasma processing apparatus and processing method using the same
US5714009A (en) 1995-01-11 1998-02-03 Deposition Sciences, Inc. Apparatus for generating large distributed plasmas by means of plasma-guided microwave power
US6096389A (en) * 1995-09-14 2000-08-01 Canon Kabushiki Kaisha Method and apparatus for forming a deposited film using a microwave CVD process
US5916259A (en) * 1995-09-20 1999-06-29 Sun Microsystems, Inc. Coaxial waveguide applicator for an electromagnetic wave-activated sorption system
DE19608949A1 (de) 1996-03-08 1997-09-11 Ralf Dr Spitzl Vorrichtung zur Erzeugung von leistungsfähigen Mikrowellenplasmen
US5838108A (en) * 1996-08-14 1998-11-17 Fusion Uv Systems, Inc. Method and apparatus for starting difficult to start electrodeless lamps using a field emission source
JP3217274B2 (ja) * 1996-09-02 2001-10-09 株式会社日立製作所 表面波プラズマ処理装置
DE69807006T2 (de) * 1997-05-22 2003-01-02 Canon K.K., Tokio/Tokyo Plasmabehandlungsvorrichtung mit einem mit ringförmigem Wellenleiter versehenen Mikrowellenauftragsgerät und Behandlungsverfahren
DE19722205A1 (de) * 1997-05-27 1998-12-03 Leybold Systems Gmbh Verfahren und Vorrichtung zur Beschichtung von Kunststoff- oder Glasbehältern mittels eines PCVD-Beschichtungsverfahrens
DE19825125A1 (de) * 1998-06-05 1999-12-09 Leybold Systems Gmbh Vorrichtung zur Erzeugung von Plasma

Also Published As

Publication number Publication date
AU736861B2 (en) 2001-08-02
AU8018398A (en) 1999-01-04
EP0992058A1 (de) 2000-04-12
DE59809289D1 (de) 2003-09-18
CA2294197C (en) 2004-03-16
US6543380B1 (en) 2003-04-08
EP0992058B1 (de) 2003-08-13
CA2294197A1 (en) 1998-12-30
WO1998059359A1 (de) 1998-12-30
DE19726663A1 (de) 1999-01-28

Similar Documents

Publication Publication Date Title
ATE247330T1 (de) Vorrichtung zur erzeugung von homogenen mikrowellenplasmen
ATE187033T1 (de) Vorrichtung zur erzeugung von plasmen mittels mikrowellen
ATE271717T1 (de) Vorrichtung zur erzeugung von leistungsfähigen mikrowellenplasmen
DE59308435D1 (de) Vorrichtung zur Erzeugung von Mikrowellenplasmen
SE0003873L (sv) Förfarande för matning av mikrovågor samt mikrovågsugn
DE50203097D1 (de) Vorrichtung zum beschichten von gegenständen
DE19781667T1 (de) Plasmaerzeugungsverfahren und -gerät mit einer induktiv gekoppelten Plasmaquelle
BR9702208A (pt) Dispositivo de aquecimento dielétrico.
TW358864B (en) Lighting device, LCD and electronic machine
EP0279895A3 (en) Device for producing a plasma and for treating substrates in said plasma
ZA9710516B (en) Process for the production of recombinant viruses.
DE59810077D1 (de) Vorrichtung zur erzeugung von plasma
SE9702235L (sv) Hornantenn
DE59915175D1 (de) Vorrichtung zur Erzeugung von Plasma
BG104117A (en) Universally applicable blood plasma
ATE223616T1 (de) Vorrichtung zur erzeugung angeregter/ionisierter teilchen in einem plasma
SE9201786D0 (sv) Mikrovaagsugn
DE60004073D1 (de) Leistungsverteiler in einer plasmavorrichtung
EP0285020A3 (de) Vorrichtung zur Einbringung von Mikrowellenenergie mit einem offenen Mikrowellenleiter
JPS57177975A (en) Ion shower device
DE50112190D1 (de) Vorrichtung zur einstellung einer mikrowellen-energiedichteverteilung in einem applikator und verwendung dieser vorrichtung
DE69737311D1 (de) Vorrichtung zur Erzeugung eines Plasmas mit Entladung entlang einer magnetisch-neutralen Linie
ATE360718T1 (de) Haushaltsgerät
WO2002027917A3 (en) Random frequency clock generator
DE69904566D1 (de) Plasmabehandlung zur erzeugung von elektronenquellen

Legal Events

Date Code Title Description
REN Ceased due to non-payment of the annual fee