ATE180841T1 - Verfahren und vorrichtung zum kontinuierlichen beschichten eines metallischen materials - Google Patents

Verfahren und vorrichtung zum kontinuierlichen beschichten eines metallischen materials

Info

Publication number
ATE180841T1
ATE180841T1 AT94470005T AT94470005T ATE180841T1 AT E180841 T1 ATE180841 T1 AT E180841T1 AT 94470005 T AT94470005 T AT 94470005T AT 94470005 T AT94470005 T AT 94470005T AT E180841 T1 ATE180841 T1 AT E180841T1
Authority
AT
Austria
Prior art keywords
polymer
deposit
vessel
metal material
produce
Prior art date
Application number
AT94470005T
Other languages
English (en)
Inventor
Frederic Schuster
Gerard Piet
Original Assignee
Lorraine Laminage
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lorraine Laminage filed Critical Lorraine Laminage
Application granted granted Critical
Publication of ATE180841T1 publication Critical patent/ATE180841T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C23C16/029—Graded interfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Laminated Bodies (AREA)
  • Paints Or Removers (AREA)
AT94470005T 1993-03-26 1994-03-16 Verfahren und vorrichtung zum kontinuierlichen beschichten eines metallischen materials ATE180841T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9303709A FR2703073B1 (fr) 1993-03-26 1993-03-26 Procédé et dispositif pour le revêtement en continu d'un matériau métallique en défilement par un dépôt de polymère à gradient de composition, et produit obtenu par ce procédé.

Publications (1)

Publication Number Publication Date
ATE180841T1 true ATE180841T1 (de) 1999-06-15

Family

ID=9445535

Family Applications (1)

Application Number Title Priority Date Filing Date
AT94470005T ATE180841T1 (de) 1993-03-26 1994-03-16 Verfahren und vorrichtung zum kontinuierlichen beschichten eines metallischen materials

Country Status (9)

Country Link
US (1) US5437725A (de)
EP (1) EP0617143B1 (de)
JP (1) JP3523321B2 (de)
KR (1) KR100285377B1 (de)
AT (1) ATE180841T1 (de)
CA (1) CA2119852C (de)
DE (1) DE69418757T2 (de)
ES (1) ES2133156T3 (de)
FR (1) FR2703073B1 (de)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3175894B2 (ja) * 1994-03-25 2001-06-11 株式会社半導体エネルギー研究所 プラズマ処理装置及びプラズマ処理方法
US5679167A (en) * 1994-08-18 1997-10-21 Sulzer Metco Ag Plasma gun apparatus for forming dense, uniform coatings on large substrates
DE19523208A1 (de) * 1995-06-27 1997-01-02 Behr Gmbh & Co Wärmeübertrager, insbesondere Verdampfer für eine Kraftfahrzeug-Klimaanlage
KR100296692B1 (ko) * 1996-09-10 2001-10-24 사토 도리 플라즈마cvd장치
US6106659A (en) * 1997-07-14 2000-08-22 The University Of Tennessee Research Corporation Treater systems and methods for generating moderate-to-high-pressure plasma discharges for treating materials and related treated materials
US6083355A (en) * 1997-07-14 2000-07-04 The University Of Tennessee Research Corporation Electrodes for plasma treater systems
FR2770425B1 (fr) * 1997-11-05 1999-12-17 Air Liquide Procede et dispositif pour le traitement de surface d'un substrat par decharge electrique entre deux electrodes dans un melange gazeux
JP2000064047A (ja) 1998-06-26 2000-02-29 James A Mclaughlin ダイヤモンド様炭素（ｄｌｃ）又は他の真空蒸着被膜を基体に被覆する装置及び方法
DE19830402C2 (de) * 1998-07-08 2001-02-22 Ardenne Anlagentech Gmbh Verfahren und Vorrichtung zur Abscheidung von Funktionsschichten auf bewegten Substraten in einem PECVD-Prozeß
FR2784693B1 (fr) * 1998-10-14 2001-01-19 Lorraine Laminage Procede et dispositif de revetement en continu d'une bande metallique par une composition polymere
JP4264475B2 (ja) 2001-04-20 2009-05-20 ジェネラル・プラズマ・インコーポレーテッド 磁気ミラープラズマ源
US7294283B2 (en) * 2001-04-20 2007-11-13 Applied Process Technologies, Inc. Penning discharge plasma source
US7023128B2 (en) 2001-04-20 2006-04-04 Applied Process Technologies, Inc. Dipole ion source
US7887889B2 (en) * 2001-12-14 2011-02-15 3M Innovative Properties Company Plasma fluorination treatment of porous materials
EP1388593B1 (de) * 2002-08-07 2015-12-30 Schott AG Schnelles Verfahren zur Herstellung von Mehrfachlagen-Barriereschichten
US7399500B2 (en) * 2002-08-07 2008-07-15 Schott Ag Rapid process for the production of multilayer barrier layers
EP1388594B1 (de) * 2002-08-07 2010-01-06 Schott Ag Verfahren zum Herstellen von glatten Barriereschichten und Verbundmaterial mit glatter Barriereschicht
AU2003304125A1 (en) * 2002-12-18 2004-12-03 Cardinal Cg Company Plasma-enhanced film deposition
WO2005028697A1 (en) 2003-09-12 2005-03-31 Applied Process Technologies, Inc. Magnetic mirror plasma source and method using same
ITPD20030312A1 (it) 2003-12-30 2005-06-30 Geox Spa Suola traspirante ed impermeabile per calzature
DE102006047060A1 (de) * 2006-05-18 2007-11-22 Thyssenkrupp Steel Ag Mit einem Korrosionsschutzsystem versehenes Stahlblech und Verfahren zum Beschichten eines Stahlblechs mit einem solchen Korrosionsschutzsystem
US20080081126A1 (en) * 2006-09-29 2008-04-03 Chu-Liang Ho Method for forming a dielectric film on a substrate
DE112009002631A5 (de) * 2008-11-05 2011-09-15 Ulvac, Inc. Aufwickel-Vakuumverarbeitungsvorrichtung
JP5270505B2 (ja) * 2009-10-05 2013-08-21 株式会社神戸製鋼所 プラズマｃｖｄ装置
JP5641877B2 (ja) * 2010-10-29 2014-12-17 株式会社神戸製鋼所 プラズマｃｖｄ装置
DE102013110328B4 (de) * 2013-09-19 2018-05-09 VON ARDENNE Asset GmbH & Co. KG Beschichtungsanordnung und Beschichtungsverfahren
EP2926951B1 (de) 2014-04-01 2016-10-05 Technische Universität Kaiserslautern Verfahren zur gleichzeitigen Reinigung und Aktivierung von Bauteiloberflächen durch eine Kombination aus Kohlendioxidschneestrahlen und dem Auftrag von haftvermittelnden Substanzen
DE102015222556B3 (de) * 2015-11-16 2017-05-04 FAP Forschungs- und Applikationslabor Plasmatechnik GmbH Dresden Vorrichtung zur Modifizierung von Oberflächen von Folien

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4440107A (en) * 1982-07-12 1984-04-03 Energy Conversion Devices, Inc. Magnetic apparatus for reducing substrate warpage
JPS6063724A (ja) * 1983-09-16 1985-04-12 Hitachi Maxell Ltd 磁気記録媒体の製造方法
DE3521318A1 (de) * 1985-06-14 1986-12-18 Leybold-Heraeus GmbH, 5000 Köln Verfahren und vorrichtung zum behandeln, insbesondere zum beschichten, von substraten mittels einer plasmaentladung
ZA884511B (en) * 1987-07-15 1989-03-29 Boc Group Inc Method of plasma enhanced silicon oxide deposition
JPH02281420A (ja) * 1989-04-21 1990-11-19 Matsushita Electric Ind Co Ltd 金属薄膜型磁気記録媒体の保護膜製造方法およびその装置
US5224441A (en) * 1991-09-27 1993-07-06 The Boc Group, Inc. Apparatus for rapid plasma treatments and method

Also Published As

Publication number Publication date
DE69418757D1 (de) 1999-07-08
JP3523321B2 (ja) 2004-04-26
ES2133156T3 (es) 1999-09-01
DE69418757T2 (de) 2000-01-13
CA2119852A1 (fr) 1994-09-27
EP0617143B1 (de) 1999-06-02
FR2703073A1 (fr) 1994-09-30
CA2119852C (fr) 2003-11-25
KR100285377B1 (ko) 2001-04-02
US5437725A (en) 1995-08-01
KR940021219A (ko) 1994-10-17
EP0617143A1 (de) 1994-09-28
FR2703073B1 (fr) 1995-05-05
JPH06299331A (ja) 1994-10-25

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