ATE145016T1 - Verfahren zur beschichtung der oberfläche eines geformten objektes mit einem transparenten antistatischen dünnen film, welches zumindest an der oberfläche aus styrolpolymer oder copolymer besteht, um das genannte objekt mit bleibenden antistatischen eigenschaften zu versehen, ohne sein äusseres zu verändern - Google Patents
Verfahren zur beschichtung der oberfläche eines geformten objektes mit einem transparenten antistatischen dünnen film, welches zumindest an der oberfläche aus styrolpolymer oder copolymer besteht, um das genannte objekt mit bleibenden antistatischen eigenschaften zu versehen, ohne sein äusseres zu verändernInfo
- Publication number
- ATE145016T1 ATE145016T1 AT91914684T AT91914684T ATE145016T1 AT E145016 T1 ATE145016 T1 AT E145016T1 AT 91914684 T AT91914684 T AT 91914684T AT 91914684 T AT91914684 T AT 91914684T AT E145016 T1 ATE145016 T1 AT E145016T1
- Authority
- AT
- Austria
- Prior art keywords
- copolymer
- coating
- changing
- thin film
- order
- Prior art date
Links
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 title 2
- 239000011248 coating agent Substances 0.000 title 1
- 238000000576 coating method Methods 0.000 title 1
- 229920001577 copolymer Polymers 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 229920000642 polymer Polymers 0.000 title 1
- 239000010409 thin film Substances 0.000 title 1
- 150000001875 compounds Chemical class 0.000 abstract 2
- 230000005495 cold plasma Effects 0.000 abstract 1
- 230000005684 electric field Effects 0.000 abstract 1
- 230000002045 lasting effect Effects 0.000 abstract 1
- -1 tetramethyl tin Chemical class 0.000 abstract 1
- VXKWYPOMXBVZSJ-UHFFFAOYSA-N tetramethyltin Chemical compound C[Sn](C)(C)C VXKWYPOMXBVZSJ-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Laminated Bodies (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR9009839A FR2665454B1 (fr) | 1990-08-01 | 1990-08-01 | Procede pour deposer un film mince transparent et antistatique a la surface en polymere de styrene d'un objet faconne. |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE145016T1 true ATE145016T1 (de) | 1996-11-15 |
Family
ID=9399318
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT91914684T ATE145016T1 (de) | 1990-08-01 | 1991-07-31 | Verfahren zur beschichtung der oberfläche eines geformten objektes mit einem transparenten antistatischen dünnen film, welches zumindest an der oberfläche aus styrolpolymer oder copolymer besteht, um das genannte objekt mit bleibenden antistatischen eigenschaften zu versehen, ohne sein äusseres zu verändern |
Country Status (8)
| Country | Link |
|---|---|
| EP (1) | EP0495065B1 (de) |
| JP (1) | JPH05502064A (de) |
| KR (1) | KR920702437A (de) |
| AT (1) | ATE145016T1 (de) |
| CA (1) | CA2066585A1 (de) |
| DE (1) | DE69123037D1 (de) |
| FR (1) | FR2665454B1 (de) |
| WO (1) | WO1992002661A1 (de) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4438992C2 (de) * | 1994-10-31 | 1997-04-10 | Fraunhofer Ges Forschung | Verfahren und Vorrichtung zur Aufbringung von antistatischen transparenten Oberflächenbeschichtungen auf elektrisch isolierende Gegenstände |
| EP1176857A1 (de) * | 2000-07-26 | 2002-01-30 | Universiteit Gent | Gleichstrom-Plasmaerzeuger zur Erzeugung eines nicht-lokalen, nicht im thermodynamischen Gleichgewicht, Hochdruck-Plasmas |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4140814A (en) * | 1977-12-01 | 1979-02-20 | Texas Instruments Incorporated | Plasma deposition of transparent conductive layers |
| US4618507A (en) * | 1985-05-07 | 1986-10-21 | Westinghouse Electric Corp. | Method of making a capacitor winding |
| JPH0645888B2 (ja) * | 1985-12-17 | 1994-06-15 | キヤノン株式会社 | 堆積膜形成法 |
| DE3716235C2 (de) * | 1987-05-12 | 1995-11-30 | Atotech Deutschland Gmbh | Herstellung von Polymer-Metallverbindungen durch Abscheidung in Glimmentladungszonen |
| US4873118A (en) * | 1988-11-18 | 1989-10-10 | Atlantic Richfield Company | Oxygen glow treating of ZnO electrode for thin film silicon solar cell |
-
1990
- 1990-08-01 FR FR9009839A patent/FR2665454B1/fr not_active Expired - Fee Related
-
1991
- 1991-07-31 DE DE69123037T patent/DE69123037D1/de not_active Expired - Lifetime
- 1991-07-31 WO PCT/FR1991/000631 patent/WO1992002661A1/fr not_active Ceased
- 1991-07-31 JP JP3514215A patent/JPH05502064A/ja active Pending
- 1991-07-31 CA CA002066585A patent/CA2066585A1/fr not_active Abandoned
- 1991-07-31 EP EP91914684A patent/EP0495065B1/de not_active Expired - Lifetime
- 1991-07-31 KR KR1019920700723A patent/KR920702437A/ko not_active Withdrawn
- 1991-07-31 AT AT91914684T patent/ATE145016T1/de not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| FR2665454B1 (fr) | 1994-04-01 |
| WO1992002661A1 (fr) | 1992-02-20 |
| FR2665454A1 (fr) | 1992-02-07 |
| KR920702437A (ko) | 1992-09-04 |
| EP0495065A1 (de) | 1992-07-22 |
| DE69123037D1 (de) | 1996-12-12 |
| JPH05502064A (ja) | 1993-04-15 |
| EP0495065B1 (de) | 1996-11-06 |
| CA2066585A1 (fr) | 1992-02-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |