ATE143176T1 - Lichtemittierende halbleitervorrichtung und übergitterstruktur - Google Patents
Lichtemittierende halbleitervorrichtung und übergitterstrukturInfo
- Publication number
- ATE143176T1 ATE143176T1 AT92103465T AT92103465T ATE143176T1 AT E143176 T1 ATE143176 T1 AT E143176T1 AT 92103465 T AT92103465 T AT 92103465T AT 92103465 T AT92103465 T AT 92103465T AT E143176 T1 ATE143176 T1 AT E143176T1
- Authority
- AT
- Austria
- Prior art keywords
- active layer
- layer
- energy gap
- layers
- quantum barrier
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 3
- 230000004888 barrier function Effects 0.000 abstract 8
- 238000005253 cladding Methods 0.000 abstract 4
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/04—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
- H01L33/06—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction within the light emitting region, e.g. quantum confinement structure or tunnel barrier
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34326—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer based on InGa(Al)P, e.g. red laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/2004—Confining in the direction perpendicular to the layer structure
- H01S5/2009—Confining in the direction perpendicular to the layer structure by using electron barrier layers
- H01S5/2013—MQW barrier reflection layers
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- Power Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biophysics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Semiconductor Lasers (AREA)
- Led Devices (AREA)
- Recrystallisation Techniques (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP05544291A JP3181063B2 (ja) | 1991-02-28 | 1991-02-28 | 超格子構造体,それを用いた電子またはホールの閉じ込め構造および半導体発光素子 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE143176T1 true ATE143176T1 (de) | 1996-10-15 |
Family
ID=12998710
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT92103465T ATE143176T1 (de) | 1991-02-28 | 1992-02-28 | Lichtemittierende halbleitervorrichtung und übergitterstruktur |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0502442B1 (de) |
JP (1) | JP3181063B2 (de) |
AT (1) | ATE143176T1 (de) |
DE (1) | DE69213787T2 (de) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5600667A (en) * | 1993-04-05 | 1997-02-04 | Matsushita Electric Industrial Co., Ltd. | Semiconductor laser device |
JPH06334265A (ja) * | 1993-05-19 | 1994-12-02 | Mitsubishi Electric Corp | 量子井戸型半導体レーザ |
JPH0888434A (ja) * | 1994-09-19 | 1996-04-02 | Mitsubishi Electric Corp | 半導体レーザ,及びその製造方法 |
JPH1079554A (ja) * | 1996-09-04 | 1998-03-24 | Mitsubishi Electric Corp | 光半導体装置 |
US6737684B1 (en) | 1998-02-20 | 2004-05-18 | Matsushita Electric Industrial Co., Ltd. | Bipolar transistor and semiconductor device |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0634425B2 (ja) * | 1986-07-25 | 1994-05-02 | 三菱電機株式会社 | 半導体レ−ザ |
JPH0666519B2 (ja) * | 1986-08-14 | 1994-08-24 | 東京工業大学長 | 超格子構造体 |
JP2544378B2 (ja) * | 1987-03-25 | 1996-10-16 | 株式会社日立製作所 | 光半導体装置 |
-
1991
- 1991-02-28 JP JP05544291A patent/JP3181063B2/ja not_active Expired - Fee Related
-
1992
- 1992-02-28 EP EP92103465A patent/EP0502442B1/de not_active Expired - Lifetime
- 1992-02-28 AT AT92103465T patent/ATE143176T1/de active
- 1992-02-28 DE DE69213787T patent/DE69213787T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0502442A3 (en) | 1993-02-03 |
JPH04273491A (ja) | 1992-09-29 |
DE69213787D1 (de) | 1996-10-24 |
EP0502442A2 (de) | 1992-09-09 |
JP3181063B2 (ja) | 2001-07-03 |
EP0502442B1 (de) | 1996-09-18 |
DE69213787T2 (de) | 1997-05-07 |
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