ATE132887T1 - Fluorpolymermischungen und anti- reflektionsbeschichtungen und beschichtete gegenstände - Google Patents

Fluorpolymermischungen und anti- reflektionsbeschichtungen und beschichtete gegenstände

Info

Publication number
ATE132887T1
ATE132887T1 AT92920689T AT92920689T ATE132887T1 AT E132887 T1 ATE132887 T1 AT E132887T1 AT 92920689 T AT92920689 T AT 92920689T AT 92920689 T AT92920689 T AT 92920689T AT E132887 T1 ATE132887 T1 AT E132887T1
Authority
AT
Austria
Prior art keywords
blends
fluorpolymer
reflective coatings
coated objects
methacrylate
Prior art date
Application number
AT92920689T
Other languages
English (en)
Inventor
Shaul M Aharoni
Ajay Nahata
James T Yardley
Original Assignee
Allied Signal Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US07/762,998 external-priority patent/US5118579A/en
Application filed by Allied Signal Inc filed Critical Allied Signal Inc
Application granted granted Critical
Publication of ATE132887T1 publication Critical patent/ATE132887T1/de

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D127/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers
    • C09D127/02Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment
    • C09D127/12Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04Homopolymers or copolymers of esters
    • C09D133/14Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
    • C09D133/16Homopolymers or copolymers of esters containing halogen atoms
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L27/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
    • C08L27/02Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L27/12Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04Homopolymers or copolymers of esters
    • C08L33/14Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
    • C08L33/16Homopolymers or copolymers of esters containing halogen atoms
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/3154Of fluorinated addition polymer from unsaturated monomers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/3154Of fluorinated addition polymer from unsaturated monomers
    • Y10T428/31544Addition polymer is perhalogenated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
AT92920689T 1991-09-20 1992-09-16 Fluorpolymermischungen und anti- reflektionsbeschichtungen und beschichtete gegenstände ATE132887T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/762,998 US5118579A (en) 1991-09-20 1991-09-20 Fluoropolymer blends for coatings
US07/796,516 US5139879A (en) 1991-09-20 1991-11-21 Fluoropolymer blend anti-reflection coatings and coated articles

Publications (1)

Publication Number Publication Date
ATE132887T1 true ATE132887T1 (de) 1996-01-15

Family

ID=27117210

Family Applications (1)

Application Number Title Priority Date Filing Date
AT92920689T ATE132887T1 (de) 1991-09-20 1992-09-16 Fluorpolymermischungen und anti- reflektionsbeschichtungen und beschichtete gegenstände

Country Status (6)

Country Link
US (1) US5139879A (de)
EP (1) EP0604565B1 (de)
JP (1) JP3184220B2 (de)
AT (1) ATE132887T1 (de)
DE (1) DE69207605T2 (de)
WO (1) WO1993006170A1 (de)

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DE69323812T2 (de) * 1992-08-14 1999-08-26 Japan Synthetic Rubber Co. Reflexionsverhindernder Film und Verfahren zur Herstellung von Resistmustern
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US5882773A (en) * 1993-10-13 1999-03-16 The Regents Of The University Of California Optical coatings of variable refractive index and high laser-resistance from physical-vapor-deposited perfluorinated amorphous polymer
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US6379788B2 (en) * 1998-02-19 2002-04-30 3M Innovative Properties Company Antireflection film
US20020155265A1 (en) 1998-02-19 2002-10-24 Hyung-Chul Choi Antireflection film
US6800378B2 (en) * 1998-02-19 2004-10-05 3M Innovative Properties Company Antireflection films for use with displays
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US6403223B1 (en) 1999-01-05 2002-06-11 Telspan Services Inc. Circular polarizer comprising anti-reflection material
US6873387B2 (en) * 2000-02-28 2005-03-29 Fuji Photo Film Co., Ltd. Antireflection film, sheet polarizer and liquid crystal display device
KR100481120B1 (ko) * 2001-08-27 2005-04-07 (주) 베스콘 불소-함유 아크릴레이트 또는 메타크릴레이트 단량체,가교제 및 이로부터 제조되는 소프트 렌즈
US20030205317A1 (en) * 2002-05-01 2003-11-06 Ha Chau Thi Minh Method for sealing flat panel displays and bonding optical component parts
US20040006827A1 (en) * 2002-07-03 2004-01-15 Rising Larry Ervin Chemical formulations and methods utilizing NPB(n-propyl bromide) as non-aqueous carrier mediums to apply fluorocarbons and other organic chemicals to substrates
EP1571700A4 (de) * 2002-12-10 2007-09-12 Nikon Corp Optische vorrichtung und projektionsbelichtungsvorrichtung unter verwendung der optischen vorrichtung
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US8149381B2 (en) * 2003-08-26 2012-04-03 Nikon Corporation Optical element and exposure apparatus
US6954256B2 (en) * 2003-08-29 2005-10-11 Asml Netherlands B.V. Gradient immersion lithography
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US7460206B2 (en) * 2003-12-19 2008-12-02 Carl Zeiss Smt Ag Projection objective for immersion lithography
US20050228152A1 (en) * 2004-04-08 2005-10-13 Starry Adam B Anti-reflective coating
US20060051589A1 (en) * 2004-09-07 2006-03-09 Rohlfing John H Fluorinated overcoat to improve chemical and wear resistance of finished surfaces
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JP4322205B2 (ja) * 2004-12-27 2009-08-26 東京応化工業株式会社 レジスト保護膜形成用材料およびこれを用いたレジストパターン形成方法
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EP1887634A3 (de) * 2006-08-11 2011-09-07 OSRAM Opto Semiconductors GmbH Strahlungsemittierendes Halbleiterbauelement
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WO2010150694A1 (ja) * 2009-06-25 2010-12-29 コニカミノルタホールディングス株式会社 白色発光有機エレクトロルミネッセンス素子
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US8558152B2 (en) * 2010-07-22 2013-10-15 Raytheon Company Lens concentrator system for semi-active laser target designation
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Also Published As

Publication number Publication date
EP0604565B1 (de) 1996-01-10
DE69207605T2 (de) 1996-05-23
WO1993006170A1 (en) 1993-04-01
US5139879A (en) 1992-08-18
EP0604565A1 (de) 1994-07-06
JP3184220B2 (ja) 2001-07-09
DE69207605D1 (de) 1996-02-22
JPH06507201A (ja) 1994-08-11

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Legal Events

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RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties