ATE117103T1 - Lichtempfindliche flexodruckplatte. - Google Patents
Lichtempfindliche flexodruckplatte.Info
- Publication number
- ATE117103T1 ATE117103T1 AT87109188T AT87109188T ATE117103T1 AT E117103 T1 ATE117103 T1 AT E117103T1 AT 87109188 T AT87109188 T AT 87109188T AT 87109188 T AT87109188 T AT 87109188T AT E117103 T1 ATE117103 T1 AT E117103T1
- Authority
- AT
- Austria
- Prior art keywords
- printing plate
- photosensitive
- resin layer
- photo sensitive
- flexo printing
- Prior art date
Links
- 239000011347 resin Substances 0.000 abstract 5
- 229920005989 resin Polymers 0.000 abstract 5
- 239000002245 particle Substances 0.000 abstract 2
- 239000003999 initiator Substances 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- 239000011342 resin composition Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61152009A JPH0746224B2 (ja) | 1986-06-27 | 1986-06-27 | 感光性フレキソ印刷版 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE117103T1 true ATE117103T1 (de) | 1995-01-15 |
Family
ID=15531068
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT87109188T ATE117103T1 (de) | 1986-06-27 | 1987-06-26 | Lichtempfindliche flexodruckplatte. |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US4957850A (de) |
| EP (1) | EP0251228B1 (de) |
| JP (1) | JPH0746224B2 (de) |
| AT (1) | ATE117103T1 (de) |
| AU (1) | AU603589B2 (de) |
| CA (1) | CA1298145C (de) |
| DE (1) | DE3750971T2 (de) |
| ES (1) | ES2069525T3 (de) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| PT85756A (pt) * | 1986-09-22 | 1988-10-14 | Napp Systems Inc | Processo para a preparacao de chapas fotossensiveis e revelaveis com agua |
| JPH07113767B2 (ja) * | 1986-10-02 | 1995-12-06 | 旭化成工業株式会社 | 段ボ−ル印刷用感光性樹脂印刷版 |
| JPS63285551A (ja) * | 1987-05-18 | 1988-11-22 | Nippon Paint Co Ltd | 水現像性印刷用版材 |
| US4894315A (en) * | 1988-08-30 | 1990-01-16 | E. I. Du Pont De Nemours And Company | Process for making flexographic printing plates with increased flexibility |
| US5171655A (en) * | 1989-08-03 | 1992-12-15 | Fuji Photo Film Co., Ltd. | Photohardenable light-sensitive composition |
| JPH03161753A (ja) * | 1989-11-20 | 1991-07-11 | Fuji Photo Film Co Ltd | 湿し水不要感光性平版印刷版 |
| EP0468002A4 (en) * | 1989-12-15 | 1995-08-09 | Grace W R & Co | Autodeposition emulsion for selectively protecting metallic surfaces |
| CA2040619A1 (en) * | 1990-04-19 | 1991-10-20 | Yoshichi Hagiwara | Photocurable self-retainable gel, shaped article prepared therefrom, applications and preparations thereof |
| NZ237919A (en) * | 1990-04-26 | 1994-09-27 | Grace W R & Co | Photocurable element comprising photocurable base layer and a photocurable printing layer which comprises two incompatible elastomeric polymers and a photopolymerisable monomer, base layer comprising elastomer, monomer and photoinitiator; relief printing plates |
| US6060214A (en) * | 1990-07-02 | 2000-05-09 | Armstrong World Industries, Inc. | Photopolymerizable, coatable plastisol |
| DE4032238A1 (de) * | 1990-10-11 | 1992-04-23 | Hoechst Ag | Lichthaertbares elastomeres gemisch und daraus erhaltenes aufzeichnungsmaterial fuer die herstellung von reliefdruckplatten |
| JPH04274428A (ja) * | 1991-03-01 | 1992-09-30 | Nippon Paint Co Ltd | オフセット印刷用感光性組成物 |
| JP2793068B2 (ja) * | 1991-04-24 | 1998-09-03 | 日本ペイント株式会社 | 感光性樹脂組成物 |
| DE4211390A1 (de) * | 1992-04-04 | 1993-10-07 | Hoechst Ag | Lichthärtbares elastomeres Gemisch und daraus erhaltenes Aufzeichnungsmaterial für die Herstellung von Reliefdruckplatten |
| DE4211391A1 (de) | 1992-04-04 | 1993-10-07 | Hoechst Ag | Lichthärtbares elastomeres Gemisch und daraus erhaltenes Aufzeichnungsmaterial für die Herstellung von Reliefdruckplatten |
| JPH06214386A (ja) * | 1993-01-20 | 1994-08-05 | Japan Synthetic Rubber Co Ltd | 感光性樹脂組成物 |
| US5496684A (en) * | 1993-09-17 | 1996-03-05 | Chase Elastomer Corporation | Photosensitive compositions and elements for flexographic printing |
| US5780202A (en) * | 1994-04-08 | 1998-07-14 | Toyo Boseki Kabushiki Kaisha | Antistatic photosensitive multilayered structure and method for producing the same |
| US5422225A (en) * | 1994-06-23 | 1995-06-06 | Shell Oil Company | Photopolymerizable recording composition for water-washable printing plates containing a water-dispersible elastomeric polymer blend |
| CA2430101C (en) | 2000-11-28 | 2009-05-26 | Asahi Kasei Kabushiki Kaisha | Improved photosensitive resin for flexographic printing developable with an aqueous developer solution |
| US6881533B2 (en) * | 2003-02-18 | 2005-04-19 | Kodak Polychrome Graphics Llc | Flexographic printing plate with ink-repellent non-image areas |
| DE102006028640A1 (de) | 2006-06-22 | 2008-01-03 | Flint Group Germany Gmbh | Fotopolymerisierbarer Schichtenverbund zur Herstellung von Flexodruckelementen |
| US8906593B1 (en) * | 2012-09-23 | 2014-12-09 | Hrl Laboratories, Llc | Unsaturated monomeric formulations for the fabrication of polymeric waveguides |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE603930A (de) * | 1960-05-19 | |||
| CA1099435A (en) * | 1971-04-01 | 1981-04-14 | Gwendyline Y. Y. T. Chen | Photosensitive block copolymer composition and elements |
| US4177074A (en) * | 1978-01-25 | 1979-12-04 | E. I. Du Pont De Nemours And Company | Butadiene/acrylonitrile photosensitive, elastomeric polymer compositions for flexographic printing plates |
| US4251618A (en) * | 1978-10-11 | 1981-02-17 | E. I. Du Pont De Nemours And Company | Positive and negative working imaging systems from photoactive plastisols |
| US4330612A (en) * | 1979-01-23 | 1982-05-18 | Japan Synthetic Rubber Co., Ltd. | Laminate of monolayer film of cyclized butadiene polymer and other photosensitive layer |
| BR8103183A (pt) * | 1980-05-27 | 1982-02-09 | Du Pont | Camada foto-sensivel fina;elemento foto-resistor;substrato com uma camada foto-sensivel fina laminada;e processo para aparacao de camada foto-sensivel e de um material polimerico fino |
| US4415649A (en) * | 1981-02-25 | 1983-11-15 | E. I. Du Pont De Nemours & Co. | Flexographic printing plates containing blended adhesives |
| US4400460A (en) * | 1981-05-07 | 1983-08-23 | E. I. Du Pont De Nemours And Compamy | Process for surface treatment of flexographic printing plates containing butadiene/acrylonitrile copolymers |
| US4400459A (en) * | 1981-05-07 | 1983-08-23 | E. I. Du Pont De Nemours And Company | Process for bromine surface treatment of photosensitive elastomeric flexographic printing plates |
| JPS58129066A (ja) | 1982-01-27 | 1983-08-01 | Nippon Paint Co Ltd | 塗料組成物 |
| US4551415A (en) * | 1982-04-22 | 1985-11-05 | E. I. Du Pont De Nemours And Company | Photosensitive coatings containing crosslinked beads |
| US4414278A (en) * | 1982-04-22 | 1983-11-08 | E. I. Du Pont De Nemours And Company | Crosslinked triacrylate polymer beads |
| DE3374450D1 (en) * | 1982-04-22 | 1987-12-17 | Du Pont | Photosensitive coatings containing crosslinked beads |
| AU562579B2 (en) * | 1982-09-10 | 1987-06-11 | Mitsubishi Rayon Company Limited | Abrasion resistant delustering coating composition |
| US4478931A (en) * | 1982-09-27 | 1984-10-23 | E. I. Du Pont De Nemours And Company | Precurled flexographic printing plate |
| JPS61162501A (ja) * | 1985-01-10 | 1986-07-23 | Nippon Paint Co Ltd | 高エネルギ−線硬化樹脂組成物 |
| JPH0764042B2 (ja) * | 1989-09-04 | 1995-07-12 | 株式会社袋谷製作所 | 金属フィルムとカーボン繊維を組み合わせた軸状部材の製造方法 |
-
1986
- 1986-06-27 JP JP61152009A patent/JPH0746224B2/ja not_active Expired - Lifetime
-
1987
- 1987-06-26 DE DE3750971T patent/DE3750971T2/de not_active Expired - Fee Related
- 1987-06-26 EP EP87109188A patent/EP0251228B1/de not_active Expired - Lifetime
- 1987-06-26 AU AU74774/87A patent/AU603589B2/en not_active Ceased
- 1987-06-26 CA CA000540716A patent/CA1298145C/en not_active Expired - Lifetime
- 1987-06-26 AT AT87109188T patent/ATE117103T1/de not_active IP Right Cessation
- 1987-06-26 ES ES87109188T patent/ES2069525T3/es not_active Expired - Lifetime
-
1990
- 1990-02-12 US US07/478,562 patent/US4957850A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| EP0251228A2 (de) | 1988-01-07 |
| DE3750971D1 (de) | 1995-02-23 |
| DE3750971T2 (de) | 1995-05-18 |
| ES2069525T3 (es) | 1995-05-16 |
| JPH0746224B2 (ja) | 1995-05-17 |
| EP0251228B1 (de) | 1995-01-11 |
| EP0251228A3 (en) | 1988-09-21 |
| CA1298145C (en) | 1992-03-31 |
| AU7477487A (en) | 1988-01-07 |
| JPS638648A (ja) | 1988-01-14 |
| AU603589B2 (en) | 1990-11-22 |
| US4957850A (en) | 1990-09-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| UEP | Publication of translation of european patent specification | ||
| REN | Ceased due to non-payment of the annual fee |