AT305378B - Verfahren zur Herstellung von Feldeffekttransistoren mit isolierter Torelektrode - Google Patents

Verfahren zur Herstellung von Feldeffekttransistoren mit isolierter Torelektrode

Info

Publication number
AT305378B
AT305378B AT358170A AT358170A AT305378B AT 305378 B AT305378 B AT 305378B AT 358170 A AT358170 A AT 358170A AT 358170 A AT358170 A AT 358170A AT 305378 B AT305378 B AT 305378B
Authority
AT
Austria
Prior art keywords
production
gate electrode
field effect
effect transistors
insulated gate
Prior art date
Application number
AT358170A
Other languages
English (en)
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Application granted granted Critical
Publication of AT305378B publication Critical patent/AT305378B/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Weting (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
AT358170A 1969-04-22 1970-04-20 Verfahren zur Herstellung von Feldeffekttransistoren mit isolierter Torelektrode AT305378B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19691920400 DE1920400A1 (de) 1969-04-22 1969-04-22 Verfahren zur Herstellung von Feldeffekttransistoren

Publications (1)

Publication Number Publication Date
AT305378B true AT305378B (de) 1973-02-26

Family

ID=5731935

Family Applications (1)

Application Number Title Priority Date Filing Date
AT358170A AT305378B (de) 1969-04-22 1970-04-20 Verfahren zur Herstellung von Feldeffekttransistoren mit isolierter Torelektrode

Country Status (8)

Country Link
JP (1) JPS4826971B1 (de)
AT (1) AT305378B (de)
CH (1) CH501313A (de)
DE (1) DE1920400A1 (de)
FR (1) FR2039341B1 (de)
GB (1) GB1269605A (de)
NL (1) NL7003476A (de)
SE (1) SE355897B (de)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3445924A (en) * 1965-06-30 1969-05-27 Ibm Method for fabricating insulated-gate field effect transistors having controlled operating characteristics
US3426422A (en) * 1965-10-23 1969-02-11 Fairchild Camera Instr Co Method of making stable semiconductor devices
US3474310A (en) * 1967-02-03 1969-10-21 Hitachi Ltd Semiconductor device having a sulfurtreated silicon compound thereon and a method of making the same

Also Published As

Publication number Publication date
FR2039341B1 (de) 1975-01-10
NL7003476A (de) 1970-10-26
FR2039341A1 (de) 1971-01-15
CH501313A (de) 1970-12-31
GB1269605A (en) 1972-04-06
JPS4826971B1 (de) 1973-08-17
DE1920400A1 (de) 1970-11-12
SE355897B (de) 1973-05-07

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