AT296657B - Einrichtung zur Überwachung der Dampfdichte - Google Patents

Einrichtung zur Überwachung der Dampfdichte

Info

Publication number
AT296657B
AT296657B AT985867A AT985867A AT296657B AT 296657 B AT296657 B AT 296657B AT 985867 A AT985867 A AT 985867A AT 985867 A AT985867 A AT 985867A AT 296657 B AT296657 B AT 296657B
Authority
AT
Austria
Prior art keywords
monitoring
vapor density
vapor
density
Prior art date
Application number
AT985867A
Other languages
English (en)
Original Assignee
Libbey Owens Ford Glass Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Libbey Owens Ford Glass Co filed Critical Libbey Owens Ford Glass Co
Application granted granted Critical
Publication of AT296657B publication Critical patent/AT296657B/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/544—Controlling the film thickness or evaporation rate using measurement in the gas phase
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
    • H01J41/02—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas
    • H01J41/04—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas with ionisation by means of thermionic cathodes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Physical Vapour Deposition (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
AT985867A 1966-10-31 1967-10-31 Einrichtung zur Überwachung der Dampfdichte AT296657B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US59073666A 1966-10-31 1966-10-31

Publications (1)

Publication Number Publication Date
AT296657B true AT296657B (de) 1972-02-25

Family

ID=24363478

Family Applications (1)

Application Number Title Priority Date Filing Date
AT985867A AT296657B (de) 1966-10-31 1967-10-31 Einrichtung zur Überwachung der Dampfdichte

Country Status (9)

Country Link
US (1) US3609378A (de)
AT (1) AT296657B (de)
BE (1) BE705816A (de)
CH (1) CH487264A (de)
DE (1) DE1648808C3 (de)
GB (1) GB1189680A (de)
LU (1) LU54739A1 (de)
NL (1) NL6714765A (de)
SE (1) SE348620B (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013106788A1 (de) * 2013-06-28 2014-12-31 Von Ardenne Gmbh Vakuumkammerdurchführung, Vakuumbehandlungsanlage mit Vakuumkammerdurchführung und Verwendung einer Vakuumkammerdurchführung

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4988871A (en) * 1989-05-08 1991-01-29 Leybold Inficon, Inc. Gas partial pressure sensor for vacuum chamber
DE3921040C2 (de) * 1989-06-27 1994-03-10 Balzers Hochvakuum Verfahren und Anordnung zum Steuern der Verdampfung von Material von einem Zielobjekt durch einen Strahl geladener Teilchen und Verwendung, sowie Verfahren und Meßanordnung zum selektiven Messen einer verdampften Partikelmenge zur Durchführung des Verfahrens
DE3929475A1 (de) * 1989-09-05 1991-03-14 Balzers Hochvakuum Verfahren und vorrichtung zur umlenkung eines strahls
DE4304612C2 (de) * 1993-02-16 1995-03-16 Fraunhofer Ges Forschung Verfahren zur kontinuierlichen Messung der stofflichen Zusammensetzung des Dampfes einer Schmelze oder eines zu verdampfenden Materials im Vakuum
US6542831B1 (en) 2001-04-18 2003-04-01 Desert Research Institute Vehicle particulate sensor system
US7320733B2 (en) * 2003-05-09 2008-01-22 Sukegawa Electric Co., Ltd. Electron bombardment heating apparatus and temperature controlling apparatus and control method thereof
US7719681B2 (en) * 2007-10-12 2010-05-18 Inficon Apparatus and method for measuring vapor flux density

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013106788A1 (de) * 2013-06-28 2014-12-31 Von Ardenne Gmbh Vakuumkammerdurchführung, Vakuumbehandlungsanlage mit Vakuumkammerdurchführung und Verwendung einer Vakuumkammerdurchführung
DE102013106788B4 (de) * 2013-06-28 2019-07-11 VON ARDENNE Asset GmbH & Co. KG Vakuumbehandlungsanlage mit Vakuumkammerdurchführung

Also Published As

Publication number Publication date
LU54739A1 (de) 1968-01-26
BE705816A (de) 1968-03-01
DE1648808B2 (de) 1973-08-30
GB1189680A (en) 1970-04-29
DE1648808A1 (de) 1972-04-06
SE348620B (de) 1972-09-04
DE1648808C3 (de) 1974-04-04
CH487264A (de) 1970-03-15
NL6714765A (de) 1968-05-01
US3609378A (en) 1971-09-28

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Legal Events

Date Code Title Description
ELJ Ceased due to non-payment of the annual fee