WO2021229860A1 - Manufacturing assist system and manufacturing assist method - Google Patents

Manufacturing assist system and manufacturing assist method Download PDF

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Publication number
WO2021229860A1
WO2021229860A1 PCT/JP2021/002993 JP2021002993W WO2021229860A1 WO 2021229860 A1 WO2021229860 A1 WO 2021229860A1 JP 2021002993 W JP2021002993 W JP 2021002993W WO 2021229860 A1 WO2021229860 A1 WO 2021229860A1
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WO
WIPO (PCT)
Prior art keywords
evaluation
information
semiconductor manufacturing
manufacturing
semiconductor
Prior art date
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PCT/JP2021/002993
Other languages
French (fr)
Japanese (ja)
Inventor
凜香 東山
昇 早坂
Original Assignee
Towa株式会社
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Publication date
Application filed by Towa株式会社 filed Critical Towa株式会社
Priority to CN202180022986.0A priority Critical patent/CN115315778A/en
Priority to KR1020227043137A priority patent/KR20230009943A/en
Publication of WO2021229860A1 publication Critical patent/WO2021229860A1/en

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    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00Programme-control systems
    • G05B19/02Programme-control systems electric
    • G05B19/418Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06QINFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q10/00Administration; Management
    • G06Q10/06Resources, workflows, human or project management; Enterprise or organisation planning; Enterprise or organisation modelling
    • G06Q10/063Operations research, analysis or management
    • G06Q10/0639Performance analysis of employees; Performance analysis of enterprise or organisation operations
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06QINFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q50/00Information and communication technology [ICT] specially adapted for implementation of business processes of specific business sectors, e.g. utilities or tourism
    • G06Q50/04Manufacturing
    • GPHYSICS
    • G16INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR SPECIFIC APPLICATION FIELDS
    • G16YINFORMATION AND COMMUNICATION TECHNOLOGY SPECIALLY ADAPTED FOR THE INTERNET OF THINGS [IoT]
    • G16Y10/00Economic sectors
    • G16Y10/25Manufacturing
    • GPHYSICS
    • G16INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR SPECIFIC APPLICATION FIELDS
    • G16YINFORMATION AND COMMUNICATION TECHNOLOGY SPECIALLY ADAPTED FOR THE INTERNET OF THINGS [IoT]
    • G16Y20/00Information sensed or collected by the things
    • G16Y20/20Information sensed or collected by the things relating to the thing itself
    • GPHYSICS
    • G16INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR SPECIFIC APPLICATION FIELDS
    • G16YINFORMATION AND COMMUNICATION TECHNOLOGY SPECIALLY ADAPTED FOR THE INTERNET OF THINGS [IoT]
    • G16Y40/00IoT characterised by the purpose of the information processing
    • G16Y40/20Analytics; Diagnosis
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/30Computing systems specially adapted for manufacturing

Definitions

  • the present invention relates to a manufacturing support system and a manufacturing support method that support manufacturing using a semiconductor manufacturing apparatus.
  • Patent Document 1 provides a process engineer of a semiconductor manufacturing equipment vendor and a semiconductor device maker (customer) as a preliminary activity for selling a semiconductor manufacturing equipment. Discloses an electronic conferencing system that allows process engineers in the world to hold conferences on semiconductor device processes or semiconductor manufacturing equipment performance without having to go to each other.
  • Patent Document 1 The electronic conferencing system disclosed in JP-A-2003-259015 (Patent Document 1) is intended for prior activities for selling semiconductor manufacturing equipment, and uses samples provided by semiconductor device manufacturers. The performance is evaluated in advance.
  • An object of the present invention is to provide a new mechanism for supporting the manufacture of a semiconductor device using such a semiconductor manufacturing device.
  • a manufacturing support system that supports manufacturing using a semiconductor manufacturing apparatus.
  • the manufacturing support system is located in the evaluator, which holds the information that identifies the semiconductor manufacturing equipment that will be used or will be used by the user and the information that identifies the manufacturing process performed by the semiconductor manufacturing equipment.
  • the suitability of the material is evaluated based on the information provided by the holding unit, the material supplier that supplies the material used in the semiconductor manufacturing equipment, and the information held by the holding unit.
  • the evaluation unit assigned to the evaluation entity and the evaluation result providing unit that provides the evaluation result by the evaluation entity to the material supply entity.
  • a manufacturing support method for supporting manufacturing using a semiconductor manufacturing apparatus specifies information for identifying the semiconductor manufacturing equipment used or planned to be used by the user, and the manufacturing process executed in the semiconductor manufacturing equipment. Based on the steps to retain the information, the information that identifies the material provided by the material supplier that supplies the material used in the semiconductor manufacturing equipment in the evaluator, and the information that is retained by the retainer. It includes a step of evaluating the suitability of a material and a step of providing an evaluation result by the evaluation step to a material supplier.
  • the manufacturing support system 1 supports manufacturing using a semiconductor manufacturing apparatus.
  • the supply of various materials used in the semiconductor manufacturing apparatus will be mainly described, but the manufacturing support system 1 according to the present embodiment is not limited to these ranges.
  • FIG. 1 is a schematic diagram for explaining an outline of the manufacturing support system 1 according to the present embodiment.
  • the manufacturing support system 1 mainly supplies one or a plurality of users 20 using the semiconductor manufacturing apparatus 50 and one or a plurality of materials used in the semiconductor manufacturing apparatus 50.
  • the supply entity 30 and the evaluation entity 10 that evaluates in advance the suitability of the material 60 supplied by the material supply entity 30 are involved.
  • the user subject 20 is a term that includes a user who uses the semiconductor manufacturing apparatus 50 in any form, and for example, a semiconductor maker, a semiconductor device maker, and an assembly house (undertaking only a package assembly process in semiconductor manufacturing). Includes companies), OSAT (semiconductor contract package testing business), foundry companies (semiconductor chip manufacturing companies), etc.
  • the "material supply entity” includes any entity that manufactures and / or sells any material 60 used in the semiconductor manufacturing apparatus 50, and is referred to as “evaluation entity 10" and "user entity 20". Is a different subject.
  • the semiconductor manufacturing apparatus 50 a molding apparatus for resin-sealing an electronic component including a semiconductor chip and a singing apparatus for individualizing an electronic component including a semiconductor chip are assumed.
  • a resin encapsulation device seals a semiconductor chip mounted on a substrate (lead frame, printed circuit board, ceramics substrate, metal substrate, glass substrate, semiconductor substrate, resin substrate, etc.) with resin. Stop.
  • the material supply main body 30 supplies a resin or a substrate for encapsulating a semiconductor chip as a material 60.
  • the material 60 used in the semiconductor manufacturing apparatus 50 is not limited to such resins and substrates, and includes any consumable material related to the manufacturing process of the semiconductor manufacturing apparatus 50.
  • the user main body 20 manufactures a semiconductor device by the semiconductor manufacturing device 50 using the material 60 supplied by the material supply main body 30.
  • the user main body 20 specifies specifications, quality performance, and the like of the material 60 to be supplied to the material supply main body 30 in consideration of the manufacturing process of its own semiconductor manufacturing apparatus 50.
  • the material supply entity 30 supplies the material 60 that meets the specified specifications and quality performance.
  • the manufacturing process is optimized by repeating trial and error, and the specifications and quality performance of the material 60 to be used are determined.
  • the manufacturing support system 1 provides a means for solving the above-mentioned problems related to the semiconductor manufacturing apparatus 50 used by the user 20. That is, the evaluation subject 10 is in charge of a part or all of the evaluation work performed by the user subject 20, and is also in charge of the preliminary evaluation of the specifications and quality performance of the material 60 supplied by the material supply entity 30. Due to the existence of such an evaluation subject 10 and the services provided, the user entity 20 does not have sufficient knowledge about the manufacturing process itself, and the user entity 20 cannot sufficiently evaluate the quality of the manufacturing process. Also, it is possible to facilitate the manufacture of a semiconductor device using the semiconductor manufacturing device 50.
  • the material supply entity 30 it is possible to increase the certainty that the material suitable for the semiconductor manufacturing apparatus 50 used by the user entity 20 of the supply destination can be supplied, so that a stronger supply system can be realized.
  • the evaluation subject 10 basically has the semiconductor manufacturing apparatus 50 and the evaluation apparatus 12 which are substantially the same as the semiconductor manufacturing apparatus 50 used by the user entity 20. It is preferable that the evaluation subject 10 is basically a manufacturer of the semiconductor manufacturing apparatus 50 or an affiliated company thereof. However, the evaluation subject 10 may be any organization or individual, not limited to the manufacturer of the semiconductor manufacturing apparatus 50 or its affiliated company.
  • the management device 14, the management device 24, and the management device 34 may be arranged in the evaluation main body 10, the user main body 20, and the material supply main body 30, respectively.
  • Device information, evaluation information, process information, and certification information are exchanged between the evaluation subject 10 and the user subject 20.
  • Equipment information, evaluation information, process information, and material information are exchanged between the evaluation subject 10 and the material supply entity 30.
  • Equipment information, evaluation information, process information, and certification information are exchanged between the user entity 20 and the material supply entity 30.
  • the device information includes information that identifies the semiconductor manufacturing device 50 that is used or will be used by the user 20.
  • the device information may further include information for identifying a commutative member or the like used in the target semiconductor manufacturing device 50.
  • the evaluation information includes the evaluation result when the target material 60 is used in the target semiconductor manufacturing apparatus 50 under the target manufacturing conditions.
  • the process information includes information that identifies the manufacturing process executed by the target semiconductor manufacturing apparatus 50.
  • the process information includes information that defines the manufacturing conditions that apply to the semiconductor manufacturing equipment 50 of interest.
  • Material information includes information about the target material 60.
  • the certification information includes the required specifications in the manufacturing process including the target semiconductor manufacturing apparatus 50.
  • the certification information is determined by the user 20.
  • FIG. 2 is a sequence diagram showing a processing procedure executed by the manufacturing support system 1 according to the present embodiment.
  • An example of the processing procedure executed by the manufacturing support system 1 will be described with reference to FIGS. 1 and 2.
  • the evaluation subject 10 is a manufacturer of the semiconductor manufacturing apparatus 50
  • the user entity 20 assumes a situation in which a new semiconductor manufacturing apparatus 50 is introduced.
  • the material supply entity 30 develops the material 60 used in the newly introduced semiconductor manufacturing apparatus 50.
  • the material supply entity 30 develops the material 60 according to the manufacturing conditions and the like presented by the user entity 20 and the like (step S2).
  • the material supply entity 30 provides a part (material sample) of the developed material 60 and material information to the evaluation entity 10 (step S4). If the evaluation subject 10 can analyze the material sample, it is not always necessary to provide the material information.
  • the evaluation subject 10 includes device information (information specifying the semiconductor manufacturing device 50 used or planned to be used by the user body 20) and process information (information specifying the manufacturing process executed by the semiconductor manufacturing device 50). ) Is held in advance.
  • the evaluation subject 10 evaluates using the material sample provided by the material supply entity 30 (step S6). More specifically, the evaluation subject 10 determines the suitability of the material 60 based on the information specifying the material 60 provided by the material supply entity 30 and the information held by the evaluation entity 10 (device information and process information). To evaluate. Then, the evaluation subject 10 provides the device information and the process information to the material supply entity 30 together with the evaluation result obtained by the evaluation (step S8).
  • the processes (* 1) of steps S2 to S8 are repeatedly executed.
  • the evaluation subject 10 may perform processing for evaluating the suitability of the material 60 for each of the plurality of different materials 60.
  • the composition ratio of the material 60 can be used as an example.
  • candidate materials to be supplied to the user main body 20 are determined between the evaluation main body 10 and the material supply main body 30 as necessary (step S10).
  • the evaluation subject 10 provides the device information, the evaluation information, and the process information to the user subject 20 for the material determined as the candidate (step S12).
  • the material supply entity 30 provides device information, evaluation information, and process information to the user entity 20 for the material determined as a candidate (step S14).
  • the device information, evaluation information, and process information provided by the evaluation subject 10 in step S12 basically match the device information, evaluation information, and process information provided by the material supply entity 30 in step S14. ..
  • the purpose of this is to prevent mistakes in information provision by confirming the identity of the information provided by each entity. From the viewpoint of simplifying the process, either step S12 or step S14 may be omitted.
  • the user 20 makes a final performance check with reference to the provided device information, evaluation information, and process information (step S16).
  • the user main body 20 Upon accepting the content of the performance confirmation, the user main body 20 transmits the certification information to the user main body 20 (step S18) and also transmits the certification information to the material supply main body 30 (step S20).
  • step S22 the semiconductor manufacturing apparatus including the certification information from the evaluation subject 10 (in this example, the manufacturer of the semiconductor manufacturing apparatus 50)
  • step S24 the material containing the information
  • the evaluation subject 10 manufactures the semiconductor manufacturing apparatus 50 according to the order from the user entity 20 (step S26), and delivers the manufactured semiconductor manufacturing apparatus 50 to the user entity 20 (step S28). .. Further, the material supply entity 30 manufactures the material 60 according to the order from the user entity 20 (step S30), and delivers the manufactured material 60 to the user entity 20 (step S32).
  • the pre-evaluation of the manufacturing process is completed according to the processing procedure as shown in FIG.
  • FIG. 2 shows a processing procedure for pre-evaluation of the manufacturing process. However, if the user 20 wishes to review the manufacturing process after the semiconductor manufacturing apparatus 50 is delivered, steps S2 to S20 are performed. The process may be executed again.
  • the evaluation subject 10 is a manufacturer of the semiconductor manufacturing apparatus 50 or an affiliated company thereof, and has substantially the same semiconductor manufacturing apparatus 50 as the semiconductor manufacturing apparatus 50 used by the user entity 20.
  • the evaluation subject 10 uses the material sample provided by the material supply entity 30 in the semiconductor manufacturing apparatus 50 that is substantially the same as the semiconductor manufacturing apparatus 50 used or planned to be used by the user entity 20, and the user entity 20 is used. Reproduces the manufacturing process scheduled to be carried out or the manufacturing process being carried out.
  • the product (semiconductor device) or its semi-finished product manufactured by the reproduced manufacturing process is evaluated by the evaluation device 12. Alternatively, it is possible to evaluate the influence of the reproduced manufacturing process on the semiconductor manufacturing apparatus 50 and the like.
  • the evaluation subject 10 has device information (information specifying the semiconductor manufacturing apparatus 50 used or planned to be used by the user entity 20) and process information (manufacturing process executed by the semiconductor manufacturing apparatus 50). Information that identifies the material 60), and the suitability of the material 60 based on the information that identifies the material 60 provided by the material supply entity 30 and the information (device information and process information) that the evaluation entity 10 holds. To evaluate. Then, the evaluation subject 10 provides the evaluation result to the material supply entity 30.
  • Evaluation of the semiconductor device or its semi-finished product manufactured by the reproduced manufacturing process may be performed by shape observation.
  • Evaluation items include (1) external dimensions and warpage amount, (2) cross-sectional observation image, (3) thermal warp amount transition, (4) internal observation result, (5) hardness measurement result, and the like.
  • a measuring device for measuring the shape, a microscope for acquiring a cross-sectional observation image, and an internal observation are performed. It may include any one of the exploration device for measuring the hardness and the hardness meter for measuring the hardness.
  • the evaluation device 12 includes a heating warp measuring device (TSM) and an ultrasonic exploration device (SAT).
  • TSM heating warp measuring device
  • SAT ultrasonic exploration device
  • a measuring device for measuring such a shape is used.
  • An optical microscope, a scanning electron microscope (SEM), or the like is used as the evaluation device 12 for the evaluation of the cross-sectional observation image.
  • An ultrasonic exploration device, an X-ray fluoroscope, or the like is used as the evaluation device 12 for the evaluation of the internal observation result.
  • a hardness tester or the like is used as the evaluation device 12 for evaluating the hardness measurement result.
  • the evaluation of the influence of the reproduced manufacturing process on the semiconductor manufacturing apparatus 50 may be performed by observing the molds and jigs and tools used in the semiconductor manufacturing apparatus 50.
  • the evaluation items include (1) presence / absence of dirt on the mold surface, (2) blade wear state, (3) blade wear amount, and the like.
  • any one of the observation device and the exploration device may be included as a configuration for evaluating the wear of substantially the same semiconductor manufacturing apparatus 50.
  • the presence or absence of dirt on the mold surface may be evaluated visually by a human being, or an observation device or the like may be used as the evaluation device 12.
  • An ultrasonic exploration device, an X-ray fluoroscope, or the like is used as the evaluation device 12 for evaluating the blade wear state.
  • a measuring device for measuring the shape is used for evaluating the amount of blade wear.
  • one or a plurality of evaluation devices 12 may be used depending on any evaluation item.
  • the evaluation unit of the evaluation subject 10 includes the semiconductor manufacturing apparatus 50 substantially the same as the semiconductor manufacturing apparatus 50 used or planned to be used by the user entity 20, and the semiconductor manufacturing apparatus 50 substantially the same. May include a semiconductor device manufactured by the semiconductor device or an evaluation device 12 for evaluating the quality of a semi-finished product of the semiconductor device and / or the wear of the substantially same semiconductor manufacturing device 50.
  • the evaluation is performed by reproducing the manufacturing process using the semiconductor manufacturing apparatus 50, but some or all of the evaluation may be realized by simulation.
  • a simulation of the target manufacturing process can be realized by preparing a model of the semiconductor manufacturing apparatus 50 and generating a model according to the material information supplied from the material supply main body 30. In the case of evaluation by simulation, it is not always necessary to provide the material sample from the material supply main body 30 to the evaluation main body 10.
  • the evaluation unit of the evaluation subject 10 may include a simulation apparatus using a model of the semiconductor manufacturing apparatus 50 used or planned to be used by the user entity 20. By using the simulation, the evaluation can be performed even if the semiconductor manufacturing apparatus 50 is not actually possessed.
  • the device information includes information for identifying the target semiconductor manufacturing device 50, the commutative member to be used, and the like. More specifically, if the semiconductor manufacturing apparatus 50 is a molding apparatus, the apparatus information includes (1) an apparatus type (model number), (2) a mold type (model number), and the like.
  • the apparatus information includes (1) the apparatus type (model number), (2) the model number of the kit (unit part for product type), and (3) the model number of the blade. And so on.
  • the evaluation information includes the evaluation result when the target material 60 is used in the target semiconductor manufacturing apparatus 50 under the target manufacturing conditions. More specifically, the evaluation information includes the evaluation result of the quality of the semiconductor device manufactured by the target semiconductor manufacturing device 50 using the target material 60, the evaluation result of the degree of wear of the semiconductor manufacturing device 50, and the like. include.
  • the shape observation results include (1) external dimensions and amount of warpage of the semiconductor device, (2) cross-sectional observation image of the semiconductor device (observation with an optical microscope or scanning electron microscope (SEM)), and (3) heat of the semiconductor device. Changes in the amount of time warpage, (4) Internal observation results of the semiconductor device by ultrasound (for example, the presence or absence of defects and voids), (5) Internal observation results of the semiconductor device by X-ray (for example, the presence or absence of defects and voids) , (6) Hardness measurement results of semiconductor devices, etc. are included.
  • observation results of the mold and the jig / tool include (1) presence or absence of dirt on the mold surface (visual inspection), (2) blade wear state (observation with an optical microscope or scanning electron microscope), and (3) blade wear amount. , Etc. are included.
  • the process information includes information defining manufacturing conditions applied to the target semiconductor manufacturing apparatus 50. More specifically, if the semiconductor manufacturing apparatus 50 is a molding apparatus, the process information includes (1) mold temperature, (2) resin weight and amount of variation, (3) preheat time, (4) molding pressure, and (4) molding pressure. 5) Includes molding profile (resin injection pressure, time shift of mold position, etc.), etc.
  • the process information regarding the cutting process includes (1) rotation speed, (2) cutting speed, (3) number of cuttings, (4) cutting resistance, and (5) cooling. Including the amount of water, etc.
  • the material information includes information about the material 60 of interest. More specifically, if the material 60 is a resin material, the material information includes (1) spiral flow, which is an index indicating fluidity, (2) gel time, (3) glass transition temperature, and (4) coefficient of linear expansion. , (5) Filler content, (6) Filler particle size distribution, (7) Moisture content, (8) Density, and the like.
  • the material information includes (1) wiring plating thickness and variation measurement results, (2) wiring resist thickness and variation measurement results, and the like.
  • the certification information includes the required specifications in the manufacturing process including the semiconductor manufacturing apparatus 50 of interest. More specifically, the certification information includes (1) a determination result of whether or not the guaranteed value of the semiconductor manufacturing apparatus is satisfied, (2) cpk (process capability index), (3) blade life prediction, and the like.
  • the present invention is not limited to this, and various applications are possible.
  • it may be used to guarantee the quality of the material 60 manufactured by the material supply entity 30.
  • the material supply entity 30 may supply the evaluation result provided by the evaluation entity 10 to the user entity 20 in association with the corresponding material 60.
  • FIG. 3 is a schematic diagram for explaining one of the application examples of the manufacturing support system 1 according to the present embodiment.
  • FIG. 4 is a sequence diagram showing a processing procedure executed in one of the application examples of the manufacturing support system 1 according to the present embodiment.
  • the material supply main body 30 manufactures the material 60 according to the manufacturing conditions and the like previously presented by the user main body 20 and the like (step S52).
  • the material supply entity 30 provides a part of the manufactured material 60 (material sample) and material information to the evaluation entity 10 (step S54).
  • the evaluation subject 10 evaluates using the material sample provided by the material supply entity 30 (step S56). Then, the evaluation subject 10 provides the evaluation result obtained by the evaluation to the material supply entity 30 (step S58).
  • the material supply entity 30 attaches the evaluation result provided by the evaluation entity 10 to the manufactured material 60 and supplies it to the user entity 20 (step S60).
  • the user main body 20 is used for the semiconductor manufacturing apparatus 50 after confirming the evaluation result attached to the material 60 delivered from the material supply main body 30.
  • the evaluation result may be provided to the material supply entity 30 only when the evaluation result by the evaluation entity 10 is appropriate.
  • the quality evaluation shown in FIGS. 3 and 4 may be performed for each production lot of the material 60, for example.
  • Management device Next, the management device 14, the management device 24, and the management device 34 arranged in the evaluation main body 10, the user main body 20, and the material supply main body 30, respectively, will be described. In the manufacturing support system 1, the management device 14, the management device 24, and the management device 34 substantially exchange necessary information.
  • FIG. 5 is a schematic diagram showing an example of the device configuration of the management device 14 constituting the manufacturing support system 1 according to the present embodiment.
  • the management device 24 and the management device 34 have the same device configuration as shown in FIG.
  • the management device 14 is realized by using a computer, and has two main components, a processor 102, a main memory 104, an input unit 106, a display unit 108, and an output unit 110.
  • the next storage device 120 and the communication unit 126 are included. These components are connected to the internal bus 128.
  • the processor 102 is an arithmetic unit that executes processing necessary for the functions provided by the management device 14, and realizes the necessary functions by executing a program or a program module stored in the secondary storage device 120.
  • the processor 102 may be multicore and / or multiprocessor, and the required number of cores or processors is set according to the required load processing capacity.
  • the main memory 104 provides the working memory required for the processor 102 to execute the program.
  • the main memory 104 is a non-volatile memory that temporarily holds the code and working data of the program to be executed.
  • the input unit 106 is a component that receives an operation from an operator or the like, and is implemented by using, for example, a keyboard, a mouse, a touch panel, or the like.
  • the display unit 118 is a component that presents information such as a processing result to an operator or the like, and is implemented by using, for example, a display or the like.
  • the output unit 110 is a component that tangibly outputs the information in the management device 14, and is mounted by using, for example, a printer.
  • the secondary storage device 120 is an example of a holding unit, and is derived from a processing realization module 122 and various data for providing functions required in the manufacturing support system 1 according to the present embodiment, in addition to an operating system (not shown).
  • Data group 124 is stored.
  • the data group 124 of the management device 14 of the evaluator 10 typically includes certification information, device information and process information.
  • the communication unit 126 is a component for communicating with the user main body 20 and / or the material supply main body 30, and is implemented by using, for example, a wired LAN communication interface, a wireless LAN communication interface, a public network communication interface, or the like.
  • a plurality of types or a plurality of communication units 126 may be mounted depending on the number of the user main body 20 and / or the material supply main body 30 to be communicated, the communication form, and the like.
  • a configuration example is shown in which necessary information is directly exchanged between the evaluation subject 10 (management device 14), the user entity 20 (management device 24), and the material supply entity 30 (management device 34). Not limited to such a configuration, a specific entity may manage the information.
  • FIG. 6 is a schematic diagram showing an implementation example of data retention in the manufacturing support system 1 according to the present embodiment.
  • FIG. 6A shows an implementation example in which the evaluation subject 10 manages necessary data
  • FIG. 6B shows an implementation example in which the material supply entity 30 manages necessary data.
  • the evaluation entity 10 manages the evaluation information about the material sample provided by the material supply entity 30, and instead of the evaluation information, the evaluation entity 30 manages the evaluation information. Provide specific information such as a URL for accessing the managed evaluation information. Further, the material supply subject 30 provides the specific information provided by the evaluation subject 10 to the user subject 20.
  • the material supply entity 30 and the user entity 20 can access the evaluation entity managed by the evaluation entity 10 based on the specific information.
  • various restrictions such as an access code (password) may be set for access to the evaluation information managed by the evaluation subject 10.
  • the computing resources in the material supply main body 30 (management device 34) can be reduced, and the processing related to the manufacturing support system 1 can be simplified.
  • the evaluation entity 10 transmits evaluation information about the material sample provided by the material supply entity 30 to the material supply entity 30.
  • the material supply entity 30 manages the evaluation information received from the evaluation entity 10.
  • the material supply entity 30 provides the user entity 20 with specific information such as a URL for accessing the evaluation information managed by the material supply entity 30.
  • the user subject 20 can access the evaluation subject managed by the material supply subject 30 based on the specific information.
  • various restrictions such as an access code (password) may be set for access to the evaluation information managed by the material supply entity 30.
  • the computing resources in the user main body 20 can be reduced, and the processing related to the manufacturing support system 1 can be simplified.
  • the management device 14, the management device 24, and the management device 34 are arranged in the evaluation main body 10, the user main body 20, and the material supply main body 30, respectively, is shown, but the present invention is not limited to this, and the so-called cloud computer is used. As such, a part of a system in which a plurality of computers are connected via a network may be utilized to realize necessary processing and functions.
  • the manufacturing support system 1 can be realized in any computing environment, and the country or country where the known technology at the time of actual implementation is arbitrarily used or actually implemented is used. Any form of implementation can be adopted in accordance with local laws and the like.
  • the technical scope of the present invention is not limited to a specific mounting form, but may include any mounting form.
  • the material supplier can ensure that the material suitable for the manufacturing process desired by the user, who is the customer, is appropriately provided. Further, even if the user does not have sufficient knowledge, the knowledge of the evaluation subject can be used to realize the desired manufacturing process more quickly and reliably. Furthermore, the evaluator can utilize the knowledge it possesses to support various material suppliers and users.

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Abstract

A manufacturing assist system for assisting manufacturing using a semiconductor manufacturing device, comprising: a holding unit that is disposed in an evaluation body and holds information specifying a semiconductor manufacturing device used or to be used in a use body and information specifying a manufacturing process to be executed by the semiconductor manufacturing device; an evaluation unit that is disposed in the evaluation body and evaluates the appropriateness of a material provided from a material supply body for supplying a material used by a semiconductor manufacturing device, on the basis of information specifying the material and information held by the holding unit; and an evaluation result providing unit for providing an evaluation result by the evaluation unit to the material supply body.

Description

製造支援システムおよび製造支援方法Manufacturing support system and manufacturing support method
 本発明は、半導体製造装置を用いた製造を支援する製造支援システムおよび製造支援方法に関する。 The present invention relates to a manufacturing support system and a manufacturing support method that support manufacturing using a semiconductor manufacturing apparatus.
 半導体装置の製造にあたっては、事前の性能評価などにより、リードタイムを短縮する様々なアプローチが提案されている。このようなアプローチの一つとして、特開2003-259015号公報(特許文献1)は、半導体製造装置を販売するための事前活動として、半導体製造装置ベンダーのプロセス技術者と半導体デバイスメーカ(顧客)のプロセス技術者がお互い相手方に出向くことなく、半導体デバイスプロセスまたは半導体製造装置性能についての会議を実現することのできる電子会議システムを開示する。 In the manufacture of semiconductor devices, various approaches to shorten the lead time have been proposed by prior performance evaluation. As one of such approaches, Japanese Patent Application Laid-Open No. 2003-259015 (Patent Document 1) provides a process engineer of a semiconductor manufacturing equipment vendor and a semiconductor device maker (customer) as a preliminary activity for selling a semiconductor manufacturing equipment. Discloses an electronic conferencing system that allows process engineers in the world to hold conferences on semiconductor device processes or semiconductor manufacturing equipment performance without having to go to each other.
特開2003-259015号公報Japanese Patent Application Laid-Open No. 2003-259015
 上述の特開2003-259015号公報(特許文献1)に開示される電子会議システムは、半導体製造装置を販売するための事前活動を想定したものであり、半導体デバイスメーカから提供されるサンプルを用いて事前に性能を評価するものである。 The electronic conferencing system disclosed in JP-A-2003-259015 (Patent Document 1) is intended for prior activities for selling semiconductor manufacturing equipment, and uses samples provided by semiconductor device manufacturers. The performance is evaluated in advance.
 しかしながら、実際の半導体装置の製造プロセスでは、材料メーカなどから提供される様々な材料が用いられるため、半導体デバイスメーカのプロセス技術者が材料選択を含む知識を有していなければ、しかるべき品質の半導体装置を製造できるとは限らない。 However, since various materials provided by material manufacturers are used in the actual manufacturing process of semiconductor devices, if the process engineer of the semiconductor device manufacturer does not have knowledge including material selection, the quality is appropriate. It is not always possible to manufacture semiconductor devices.
 本発明の目的は、このような半導体製造装置を用いた半導体装置の製造を支援する新たな仕組みを提供することである。 An object of the present invention is to provide a new mechanism for supporting the manufacture of a semiconductor device using such a semiconductor manufacturing device.
 本発明のある局面に従えば、半導体製造装置を用いた製造を支援する製造支援システムが提供される。製造支援システムは、使用主体で使用されるもしくは使用される予定の半導体製造装置を特定する情報、および、当該半導体製造装置で実行される製造プロセスを特定する情報を保持する、評価主体に配置された保持部と、半導体製造装置で使用される材料を供給する材料供給主体から提供された当該材料を特定する情報と、保持部により保持される情報とに基づいて、当該材料の適否を評価する、評価主体に配置された評価部と、評価部による評価結果を材料供給主体へ提供する評価結果提供部とを含む。 According to a certain aspect of the present invention, a manufacturing support system that supports manufacturing using a semiconductor manufacturing apparatus is provided. The manufacturing support system is located in the evaluator, which holds the information that identifies the semiconductor manufacturing equipment that will be used or will be used by the user and the information that identifies the manufacturing process performed by the semiconductor manufacturing equipment. The suitability of the material is evaluated based on the information provided by the holding unit, the material supplier that supplies the material used in the semiconductor manufacturing equipment, and the information held by the holding unit. , The evaluation unit assigned to the evaluation entity and the evaluation result providing unit that provides the evaluation result by the evaluation entity to the material supply entity.
 本発明の別の局面に従えば、半導体製造装置を用いた製造を支援する製造支援方法が提供される。製造支援方法は、評価主体に配置された保持部が、使用主体で使用されるもしくは使用される予定の半導体製造装置を特定する情報、および、当該半導体製造装置で実行される製造プロセスを特定する情報を保持するステップと、評価主体において、半導体製造装置で使用される材料を供給する材料供給主体から提供された当該材料を特定する情報と、保持部により保持される情報とに基づいて、当該材料の適否を評価するステップと、評価するステップによる評価結果を材料供給主体へ提供するステップとを含む。 According to another aspect of the present invention, a manufacturing support method for supporting manufacturing using a semiconductor manufacturing apparatus is provided. In the manufacturing support method, the holding unit arranged in the evaluation subject specifies information for identifying the semiconductor manufacturing equipment used or planned to be used by the user, and the manufacturing process executed in the semiconductor manufacturing equipment. Based on the steps to retain the information, the information that identifies the material provided by the material supplier that supplies the material used in the semiconductor manufacturing equipment in the evaluator, and the information that is retained by the retainer. It includes a step of evaluating the suitability of a material and a step of providing an evaluation result by the evaluation step to a material supplier.
 半導体製造装置を用いた半導体装置の製造を支援する新たな仕組みを提供できる。 It is possible to provide a new mechanism to support the manufacture of semiconductor devices using semiconductor manufacturing devices.
本実施の形態に従う製造支援システムの概要を説明するための模式図である。It is a schematic diagram for demonstrating the outline of the manufacturing support system according to this embodiment. 本実施の形態に従う製造支援システムで実行される処理手順を示すシーケンス図である。It is a sequence diagram which shows the processing procedure executed in the manufacturing support system according to this embodiment. 本実施の形態に従う製造支援システムの応用例の一つを説明するための模式図である。It is a schematic diagram for demonstrating one of the application examples of the manufacturing support system according to this Embodiment. 本実施の形態に従う製造支援システムの応用例の一つで実行される処理手順を示すシーケンス図である。It is a sequence diagram which shows the processing procedure executed in one of the application examples of the manufacturing support system according to this embodiment. 本実施の形態に従う製造支援システムを構成する管理装置の装置構成の一例を示す模式図である。It is a schematic diagram which shows an example of the apparatus configuration of the management apparatus which comprises the manufacturing support system according to this embodiment. 本実施の形態に従う製造支援システムにおけるデータ保持の実装例を示す模式図である。It is a schematic diagram which shows the implementation example of the data retention in the manufacturing support system according to this embodiment.
 本発明の実施の形態について、図面を参照しながら詳細に説明する。なお、図中の同一または相当部分については、同一符号を付してその説明は繰返さない。 An embodiment of the present invention will be described in detail with reference to the drawings. The same or corresponding parts in the drawings are designated by the same reference numerals and the description thereof will not be repeated.
 <A.製造支援システムの構成および処理の概要>
 まず、本実施の形態に従う製造支援システム1の構成および製造支援システム1における処理の概要について説明する。製造支援システム1は、半導体製造装置を用いた製造を支援する。以下の説明においては、主として、半導体製造装置で使用される各種の材料の供給に関して説明するが、本実施の形態に従う製造支援システム1はこれらの範囲に限られるものではない。
<A. Overview of manufacturing support system configuration and processing>
First, the configuration of the manufacturing support system 1 and the outline of the processing in the manufacturing support system 1 according to the present embodiment will be described. The manufacturing support system 1 supports manufacturing using a semiconductor manufacturing apparatus. In the following description, the supply of various materials used in the semiconductor manufacturing apparatus will be mainly described, but the manufacturing support system 1 according to the present embodiment is not limited to these ranges.
 図1は、本実施の形態に従う製造支援システム1の概要を説明するための模式図である。図1を参照して、製造支援システム1には、主として、半導体製造装置50を使用する1または複数の使用主体20と、半導体製造装置50で使用される材料60を供給する1または複数の材料供給主体30と、材料供給主体30が供給する材料60の適否を事前に評価する評価主体10とが関与する。 FIG. 1 is a schematic diagram for explaining an outline of the manufacturing support system 1 according to the present embodiment. With reference to FIG. 1, the manufacturing support system 1 mainly supplies one or a plurality of users 20 using the semiconductor manufacturing apparatus 50 and one or a plurality of materials used in the semiconductor manufacturing apparatus 50. The supply entity 30 and the evaluation entity 10 that evaluates in advance the suitability of the material 60 supplied by the material supply entity 30 are involved.
 図1においては、評価主体10と使用主体20の1つである「使用主体X」との間でやり取りされる情報に「X」を付し、評価主体10と材料供給主体30の1つである「材料供給主体A」との間、および、「使用主体X」と「材料供給主体A」との間、でやり取りされる情報に「A」を付している。例えば、「装置情報X」と「装置情報A」とのように、名称が同じで「X」や「A」の符号が異なる情報については同じ内容の情報であってもよいし、異なる内容の情報であってもよい。以下の図2~図4においても同様である。 In FIG. 1, "X" is attached to the information exchanged between the evaluation subject 10 and the "user subject X" which is one of the user subjects 20, and the evaluation subject 10 and the material supply subject 30 are used. "A" is attached to the information exchanged between a certain "material supply subject A" and between the "user subject X" and the "material supply subject A". For example, information having the same name but different signs of "X" and "A", such as "device information X" and "device information A", may have the same content or different contents. It may be information. The same applies to FIGS. 2 to 4 below.
 本明細書において、使用主体20は、半導体製造装置50を任意の形態で使用するユーザを包含する用語であり、例えば、半導体メーカ、半導体デバイスメーカ、アセンブリハウス(半導体製造におけるパッケージ組み立て工程だけを請け負う企業)、OSAT(半導体受託パッケージ・テスト事業を行う企業)、ファウンドリ企業(半導体チップの製造を専門に行う企業)などを包含する。 In the present specification, the user subject 20 is a term that includes a user who uses the semiconductor manufacturing apparatus 50 in any form, and for example, a semiconductor maker, a semiconductor device maker, and an assembly house (undertaking only a package assembly process in semiconductor manufacturing). Includes companies), OSAT (semiconductor contract package testing business), foundry companies (semiconductor chip manufacturing companies), etc.
 本明細書において、「材料供給主体」は、半導体製造装置50で使用される任意の材料60を製造および/または販売する任意の主体を包含し、「評価主体10」および「使用主体20」とは異なる主体である。 In the present specification, the "material supply entity" includes any entity that manufactures and / or sells any material 60 used in the semiconductor manufacturing apparatus 50, and is referred to as "evaluation entity 10" and "user entity 20". Is a different subject.
 例えば、半導体製造装置50としては、半導体チップを含む電子部品を樹脂封止するモールド装置、および、半導体チップを含む電子部品を個片化するシンギュレーション装置を想定する。このような樹脂封止装置は、基板(リードフレーム、プリント基板、セラミックス製基板、金属製基板、ガラス製基板、半導体製基板、樹脂製基板など)の上に装着された半導体チップを樹脂により封止する。材料供給主体30は、半導体チップを封止する樹脂や基板を材料60として供給する。半導体製造装置50で使用される材料60は、このような樹脂や基板に限らず、半導体製造装置50の製造プロセスに関係する任意の消費材を含む。 For example, as the semiconductor manufacturing apparatus 50, a molding apparatus for resin-sealing an electronic component including a semiconductor chip and a singing apparatus for individualizing an electronic component including a semiconductor chip are assumed. Such a resin encapsulation device seals a semiconductor chip mounted on a substrate (lead frame, printed circuit board, ceramics substrate, metal substrate, glass substrate, semiconductor substrate, resin substrate, etc.) with resin. Stop. The material supply main body 30 supplies a resin or a substrate for encapsulating a semiconductor chip as a material 60. The material 60 used in the semiconductor manufacturing apparatus 50 is not limited to such resins and substrates, and includes any consumable material related to the manufacturing process of the semiconductor manufacturing apparatus 50.
 使用主体20は、材料供給主体30が供給する材料60を使用して、半導体製造装置50により半導体装置を製造する。使用主体20は、自身の半導体製造装置50の製造プロセスなどを考慮して、材料供給主体30に対して供給すべき材料60の仕様や品質性能などを指定する。材料供給主体30は、指定された仕様および品質性能を満たす材料60を供給する。 The user main body 20 manufactures a semiconductor device by the semiconductor manufacturing device 50 using the material 60 supplied by the material supply main body 30. The user main body 20 specifies specifications, quality performance, and the like of the material 60 to be supplied to the material supply main body 30 in consideration of the manufacturing process of its own semiconductor manufacturing apparatus 50. The material supply entity 30 supplies the material 60 that meets the specified specifications and quality performance.
 しかしながら、すべての使用主体20が製造プロセスについて十分な知見を有しているとは限らない。また、新たに導入した半導体製造装置50の初期調整段階においては、試行錯誤を繰り返しながら製造プロセスを最適化するとともに、使用する材料60の仕様や品質性能などを決定する作業も発生する。 However, not all users 20 have sufficient knowledge about the manufacturing process. Further, in the initial adjustment stage of the newly introduced semiconductor manufacturing apparatus 50, the manufacturing process is optimized by repeating trial and error, and the specifications and quality performance of the material 60 to be used are determined.
 製造プロセスの最適化にあたっては、評価装置を用いて、半導体製造装置50により製造された半導体装置もしくはその半製品を評価する必要がある。しかしながら、すべての使用主体20が評価装置を保有しているとか限らず、特に、製造される半導体装置の微細化などに伴って、より高性能の評価装置が必要となっている。また、保有していたとしても評価装置から出力される評価結果を製造プロセスに対して適切にフィードバックできない使用主体20も存在し得る。 In optimizing the manufacturing process, it is necessary to evaluate the semiconductor device or its semi-finished product manufactured by the semiconductor manufacturing device 50 using the evaluation device. However, not all users 20 have an evaluation device, and in particular, with the miniaturization of manufactured semiconductor devices, a higher performance evaluation device is required. In addition, there may be a user 20 who cannot properly feed back the evaluation result output from the evaluation device to the manufacturing process even if he / she has it.
 本実施の形態に従う製造支援システム1は、使用主体20が使用する半導体製造装置50に関する上述したような課題に対して、解決手段を提供する。すなわち、評価主体10は、使用主体20が行っていた評価作業の一部または全部を担当するとともに、材料供給主体30が供給する材料60の仕様や品質性能などの事前評価も担当する。このような評価主体10の存在および提供するサービスによって、製造プロセス自体について十分な知見を有していない使用主体20、および、製造プロセスの品質評価を十分に行うことができない使用主体20であっても、半導体製造装置50を使用した半導体装置の製造を容易化できる。 The manufacturing support system 1 according to the present embodiment provides a means for solving the above-mentioned problems related to the semiconductor manufacturing apparatus 50 used by the user 20. That is, the evaluation subject 10 is in charge of a part or all of the evaluation work performed by the user subject 20, and is also in charge of the preliminary evaluation of the specifications and quality performance of the material 60 supplied by the material supply entity 30. Due to the existence of such an evaluation subject 10 and the services provided, the user entity 20 does not have sufficient knowledge about the manufacturing process itself, and the user entity 20 cannot sufficiently evaluate the quality of the manufacturing process. Also, it is possible to facilitate the manufacture of a semiconductor device using the semiconductor manufacturing device 50.
 また、材料供給主体30にとっては、供給先の使用主体20が使用する半導体製造装置50に適した材料を供給できる確実性を高められるので、より強固な供給体制を実現できる。 Further, for the material supply entity 30, it is possible to increase the certainty that the material suitable for the semiconductor manufacturing apparatus 50 used by the user entity 20 of the supply destination can be supplied, so that a stronger supply system can be realized.
 評価主体10は、基本的には、使用主体20が使用する半導体製造装置50と実質的に同じ半導体製造装置50と、評価装置12とを有している。評価主体10は、基本的には、半導体製造装置50のメーカまたはその関連会社であることが好適である。但し、半導体製造装置50のメーカまたはその関連会社に限らず、任意の団体または個人が評価主体10となってもよい。 The evaluation subject 10 basically has the semiconductor manufacturing apparatus 50 and the evaluation apparatus 12 which are substantially the same as the semiconductor manufacturing apparatus 50 used by the user entity 20. It is preferable that the evaluation subject 10 is basically a manufacturer of the semiconductor manufacturing apparatus 50 or an affiliated company thereof. However, the evaluation subject 10 may be any organization or individual, not limited to the manufacturer of the semiconductor manufacturing apparatus 50 or its affiliated company.
 三者の間でやり取りされる情報を管理するために、評価主体10、使用主体20および材料供給主体30には、管理装置14、管理装置24および管理装置34をそれぞれ配置してもよい。 In order to manage the information exchanged between the three parties, the management device 14, the management device 24, and the management device 34 may be arranged in the evaluation main body 10, the user main body 20, and the material supply main body 30, respectively.
 評価主体10と使用主体20との間では、装置情報、評価情報、プロセス情報、および認定情報がやり取りされる。評価主体10と材料供給主体30との間では、装置情報、評価情報、プロセス情報、および材料情報がやり取りされる。使用主体20と材料供給主体30との間では、装置情報、評価情報、プロセス情報、および認定情報がやり取りされる。ここで、三者の間でやり取りされるそれぞれの情報について説明する。 Device information, evaluation information, process information, and certification information are exchanged between the evaluation subject 10 and the user subject 20. Equipment information, evaluation information, process information, and material information are exchanged between the evaluation subject 10 and the material supply entity 30. Equipment information, evaluation information, process information, and certification information are exchanged between the user entity 20 and the material supply entity 30. Here, each information exchanged between the three parties will be described.
 装置情報は、使用主体20で使用されるもしくは使用される予定の半導体製造装置50を特定する情報を含む。装置情報は、対象の半導体製造装置50において利用される可換部材などを特定するための情報をさらに含んでいてもよい。 The device information includes information that identifies the semiconductor manufacturing device 50 that is used or will be used by the user 20. The device information may further include information for identifying a commutative member or the like used in the target semiconductor manufacturing device 50.
 評価情報は、対象の材料60を、対象の製造条件下で、対象の半導体製造装置50で使用したときの評価結果を含む。 The evaluation information includes the evaluation result when the target material 60 is used in the target semiconductor manufacturing apparatus 50 under the target manufacturing conditions.
 プロセス情報は、対象の半導体製造装置50で実行される製造プロセスを特定する情報を含む。典型的には、プロセス情報は、対象の半導体製造装置50に適用される製造条件を定義する情報を含む。 The process information includes information that identifies the manufacturing process executed by the target semiconductor manufacturing apparatus 50. Typically, the process information includes information that defines the manufacturing conditions that apply to the semiconductor manufacturing equipment 50 of interest.
 材料情報は、対象の材料60に関する情報を含む。 Material information includes information about the target material 60.
 認定情報は、対象の半導体製造装置50を含む製造プロセスにおける要求仕様を含む。認定情報は、使用主体20によって定められる。 The certification information includes the required specifications in the manufacturing process including the target semiconductor manufacturing apparatus 50. The certification information is determined by the user 20.
 図2は、本実施の形態に従う製造支援システム1で実行される処理手順を示すシーケンス図である。図1および図2を参照して、製造支援システム1で実行される処理手順の一例について説明する。図2に示す例では、評価主体10が半導体製造装置50のメーカである場合を想定し、使用主体20が新たな半導体製造装置50を導入する局面を想定する。このような局面において、材料供給主体30は、新たに導入される半導体製造装置50で使用される材料60を開発する。 FIG. 2 is a sequence diagram showing a processing procedure executed by the manufacturing support system 1 according to the present embodiment. An example of the processing procedure executed by the manufacturing support system 1 will be described with reference to FIGS. 1 and 2. In the example shown in FIG. 2, it is assumed that the evaluation subject 10 is a manufacturer of the semiconductor manufacturing apparatus 50, and the user entity 20 assumes a situation in which a new semiconductor manufacturing apparatus 50 is introduced. In such an aspect, the material supply entity 30 develops the material 60 used in the newly introduced semiconductor manufacturing apparatus 50.
 材料60の開発の局面において、材料供給主体30は、使用主体20などから提示された製造条件などに従って、材料60の開発を行う(ステップS2)。材料供給主体30は、開発された材料60の一部(材料サンプル)および材料情報を評価主体10へ提供する(ステップS4)。なお、評価主体10が材料サンプルを分析できる場合には、材料情報を必ずしも提供しなくてもよい。 In the phase of developing the material 60, the material supply entity 30 develops the material 60 according to the manufacturing conditions and the like presented by the user entity 20 and the like (step S2). The material supply entity 30 provides a part (material sample) of the developed material 60 and material information to the evaluation entity 10 (step S4). If the evaluation subject 10 can analyze the material sample, it is not always necessary to provide the material information.
 評価主体10は、装置情報(使用主体20で使用されるもしくは使用される予定の半導体製造装置50を特定する情報)、および、プロセス情報(半導体製造装置50で実行される製造プロセスを特定する情報)を予め保持している。 The evaluation subject 10 includes device information (information specifying the semiconductor manufacturing device 50 used or planned to be used by the user body 20) and process information (information specifying the manufacturing process executed by the semiconductor manufacturing device 50). ) Is held in advance.
 評価主体10は、材料供給主体30から提供された材料サンプルを用いて、評価を行う(ステップS6)。より具体的には、評価主体10は、材料供給主体30から提供された材料60を特定する情報と、評価主体10が保持する情報(装置情報およびプロセス情報)とに基づいて、材料60の適否を評価する。そして、評価主体10は、評価により得られた評価結果とともに、装置情報およびプロセス情報を材料供給主体30へ提供する(ステップS8)。 The evaluation subject 10 evaluates using the material sample provided by the material supply entity 30 (step S6). More specifically, the evaluation subject 10 determines the suitability of the material 60 based on the information specifying the material 60 provided by the material supply entity 30 and the information held by the evaluation entity 10 (device information and process information). To evaluate. Then, the evaluation subject 10 provides the device information and the process information to the material supply entity 30 together with the evaluation result obtained by the evaluation (step S8).
 材料60の開発の局面においては、ステップS2~S8の処理(※1)が繰り返し実行される。このように、評価主体10は、異なる複数の材料60について、材料60の適否を評価する処理をそれぞれ行うようにしてもよい。具体的には、適否を評価する処理においては、一例として、材料60の組成比を用いることができる。 In the development phase of the material 60, the processes (* 1) of steps S2 to S8 are repeatedly executed. In this way, the evaluation subject 10 may perform processing for evaluating the suitability of the material 60 for each of the plurality of different materials 60. Specifically, in the process of evaluating suitability, the composition ratio of the material 60 can be used as an example.
 1または複数の材料について評価結果が得られた後、必要に応じて、評価主体10と材料供給主体30との間で、使用主体20へ供給される候補となる材料が決定される(ステップS10)。そして、評価主体10は、候補として決定された材料について、装置情報、評価情報およびプロセス情報を使用主体20へ提供する(ステップS12)。同様に、材料供給主体30は、候補として決定された材料について、装置情報、評価情報およびプロセス情報を使用主体20へ提供する(ステップS14)。 After the evaluation results are obtained for one or more materials, candidate materials to be supplied to the user main body 20 are determined between the evaluation main body 10 and the material supply main body 30 as necessary (step S10). ). Then, the evaluation subject 10 provides the device information, the evaluation information, and the process information to the user subject 20 for the material determined as the candidate (step S12). Similarly, the material supply entity 30 provides device information, evaluation information, and process information to the user entity 20 for the material determined as a candidate (step S14).
 なお、ステップS12において評価主体10から提供される装置情報、評価情報およびプロセス情報と、ステップS14において材料供給主体30から提供される装置情報、評価情報およびプロセス情報とは、基本的には一致する。これは、それぞれの主体から提供される情報の同一性を確認することで、情報提供のミスなどを防止することを目的としている。処理の簡素化の観点からは、ステップS12およびステップS14のいずれか一方を省略するようにしてもよい。 The device information, evaluation information, and process information provided by the evaluation subject 10 in step S12 basically match the device information, evaluation information, and process information provided by the material supply entity 30 in step S14. .. The purpose of this is to prevent mistakes in information provision by confirming the identity of the information provided by each entity. From the viewpoint of simplifying the process, either step S12 or step S14 may be omitted.
 使用主体20は、提供された装置情報、評価情報およびプロセス情報を参照して、最終的な性能確認を行う(ステップS16)。使用主体20は、性能確認の内容を了承すると、使用主体20に対して認定情報を送信する(ステップS18)とともに、材料供給主体30に対して認定情報を送信する(ステップS20)。 The user 20 makes a final performance check with reference to the provided device information, evaluation information, and process information (step S16). Upon accepting the content of the performance confirmation, the user main body 20 transmits the certification information to the user main body 20 (step S18) and also transmits the certification information to the material supply main body 30 (step S20).
 以上の処理によって、製造プロセスの事前評価は完了する。そして、使用主体20は、評価主体10(この例では、半導体製造装置50のメーカ)に対して、認定情報を含む半導体製造装置を発注し(ステップS22)、材料供給主体30に対して、認定情報を含む材料を発注する(ステップS24)。 The above processing completes the pre-evaluation of the manufacturing process. Then, the user 20 orders the semiconductor manufacturing apparatus including the certification information from the evaluation subject 10 (in this example, the manufacturer of the semiconductor manufacturing apparatus 50) (step S22), and certifies the material supply entity 30. Order the material containing the information (step S24).
 評価主体10(半導体製造装置50のメーカ)は、使用主体20からの発注に従って、半導体製造装置50を製造し(ステップS26)、製造した半導体製造装置50を使用主体20へ納入する(ステップS28)。また、材料供給主体30は、使用主体20からの発注に従って、材料60を製造し(ステップS30)、製造した材料60を使用主体20へ納入する(ステップS32)。 The evaluation subject 10 (manufacturer of the semiconductor manufacturing apparatus 50) manufactures the semiconductor manufacturing apparatus 50 according to the order from the user entity 20 (step S26), and delivers the manufactured semiconductor manufacturing apparatus 50 to the user entity 20 (step S28). .. Further, the material supply entity 30 manufactures the material 60 according to the order from the user entity 20 (step S30), and delivers the manufactured material 60 to the user entity 20 (step S32).
 図2に示すような処理手順に従って、製造プロセスの事前評価は完了する。 The pre-evaluation of the manufacturing process is completed according to the processing procedure as shown in FIG.
 なお、図2には、製造プロセスの事前評価の処理手順を示すが、半導体製造装置50を納入した後に、使用主体20が製造プロセスの見直しなどを希望する場合には、ステップS2~S20までの処理が再度実行されてもよい。 Note that FIG. 2 shows a processing procedure for pre-evaluation of the manufacturing process. However, if the user 20 wishes to review the manufacturing process after the semiconductor manufacturing apparatus 50 is delivered, steps S2 to S20 are performed. The process may be executed again.
 <B.評価処理>
 次に、評価主体10による評価処理の一例について説明する。
<B. Evaluation process>
Next, an example of the evaluation process by the evaluation subject 10 will be described.
 典型的には、評価主体10は、半導体製造装置50のメーカまたはその関連会社であり、使用主体20が使用する半導体製造装置50と実質的に同じ半導体製造装置50を有している。あるいは、使用主体20が使用する半導体製造装置50と実質的に同じ半導体製造装置50を用意できる。 Typically, the evaluation subject 10 is a manufacturer of the semiconductor manufacturing apparatus 50 or an affiliated company thereof, and has substantially the same semiconductor manufacturing apparatus 50 as the semiconductor manufacturing apparatus 50 used by the user entity 20. Alternatively, it is possible to prepare a semiconductor manufacturing apparatus 50 that is substantially the same as the semiconductor manufacturing apparatus 50 used by the user 20.
 評価主体10は、材料供給主体30から提供された材料サンプルを用いて、使用主体20で使用されるあるいは使用される予定の半導体製造装置50と実質的に同じ半導体製造装置50において、使用主体20が実施予定の製造プロセスもしくは実施している製造プロセスを再現する。再現された製造プロセスによって製造された製品(半導体装置)もしくはその半製品は評価装置12により評価される。あるいは、再現された製造プロセスによる半導体製造装置50への影響などを評価することもできる。 The evaluation subject 10 uses the material sample provided by the material supply entity 30 in the semiconductor manufacturing apparatus 50 that is substantially the same as the semiconductor manufacturing apparatus 50 used or planned to be used by the user entity 20, and the user entity 20 is used. Reproduces the manufacturing process scheduled to be carried out or the manufacturing process being carried out. The product (semiconductor device) or its semi-finished product manufactured by the reproduced manufacturing process is evaluated by the evaluation device 12. Alternatively, it is possible to evaluate the influence of the reproduced manufacturing process on the semiconductor manufacturing apparatus 50 and the like.
 このように、評価主体10は、装置情報(使用主体20で使用されるもしくは使用される予定の半導体製造装置50を特定する情報)、および、プロセス情報(半導体製造装置50で実行される製造プロセスを特定する情報)を保持しており、材料供給主体30から提供された材料60を特定する情報と、評価主体10が保持する情報(装置情報およびプロセス情報)とに基づいて、材料60の適否を評価する。そして、評価主体10は、評価結果を材料供給主体30へ提供する。 As described above, the evaluation subject 10 has device information (information specifying the semiconductor manufacturing apparatus 50 used or planned to be used by the user entity 20) and process information (manufacturing process executed by the semiconductor manufacturing apparatus 50). Information that identifies the material 60), and the suitability of the material 60 based on the information that identifies the material 60 provided by the material supply entity 30 and the information (device information and process information) that the evaluation entity 10 holds. To evaluate. Then, the evaluation subject 10 provides the evaluation result to the material supply entity 30.
 再現された製造プロセスによって製造された半導体装置もしくはその半製品の評価は、形状観察により行ってもよい。評価項目としては、(1)外形寸法およびそり量、(2)断面観察像、(3)熱時そり量変移、(4)内部観察結果、(5)硬度測定結果、などが挙げられる。このような評価項目に対応して、半導体装置もしくは半導体装置の半製品の品質を評価するための評価装置12としては、形状を測定する測定装置、断面観察像を取得する顕微鏡、内部観察を行うための探査装置、硬度を測定するための硬度計のうち、いずれか1つを含んでいてもよい。 Evaluation of the semiconductor device or its semi-finished product manufactured by the reproduced manufacturing process may be performed by shape observation. Evaluation items include (1) external dimensions and warpage amount, (2) cross-sectional observation image, (3) thermal warp amount transition, (4) internal observation result, (5) hardness measurement result, and the like. Corresponding to such evaluation items, as the evaluation device 12 for evaluating the quality of the semiconductor device or the semi-finished product of the semiconductor device, a measuring device for measuring the shape, a microscope for acquiring a cross-sectional observation image, and an internal observation are performed. It may include any one of the exploration device for measuring the hardness and the hardness meter for measuring the hardness.
 より具体的には、(1)外形寸法およびそり量、ならびに、(3)熱時そり量変移の評価には、評価装置12として、加熱そり測定装置(TSM)や超音波探査装置(SAT)などの形状を測定する測定装置が用いられる。(2)断面観察像の評価には、評価装置12として、光学顕微鏡や走査電子顕微鏡(SEM)などが用いられる。(4)内部観察結果の評価には、評価装置12として、超音波探査装置やX線透視装置などが用いられる。(5)硬度測定結果の評価には、評価装置12として、硬度計などが用いられる。 More specifically, for the evaluation of (1) external dimensions and the amount of warpage, and (3) the change in the amount of warpage during heat, the evaluation device 12 includes a heating warp measuring device (TSM) and an ultrasonic exploration device (SAT). A measuring device for measuring such a shape is used. (2) An optical microscope, a scanning electron microscope (SEM), or the like is used as the evaluation device 12 for the evaluation of the cross-sectional observation image. (4) An ultrasonic exploration device, an X-ray fluoroscope, or the like is used as the evaluation device 12 for the evaluation of the internal observation result. (5) A hardness tester or the like is used as the evaluation device 12 for evaluating the hardness measurement result.
 再現された製造プロセスによる半導体製造装置50への影響の評価は、半導体製造装置50に使用される金型および治工具を観察することにより行ってもよい。評価項目としては、(1)金型表面の汚れの有無、(2)ブレード磨耗状態、(3)ブレード磨耗量、などが挙げられる。このような評価項目に対応して、実質的に同じ半導体製造装置50の損耗を評価するための構成として、観察装置および探査装置のうちいずれか1つを含んでいてもよい。 The evaluation of the influence of the reproduced manufacturing process on the semiconductor manufacturing apparatus 50 may be performed by observing the molds and jigs and tools used in the semiconductor manufacturing apparatus 50. The evaluation items include (1) presence / absence of dirt on the mold surface, (2) blade wear state, (3) blade wear amount, and the like. Corresponding to such an evaluation item, any one of the observation device and the exploration device may be included as a configuration for evaluating the wear of substantially the same semiconductor manufacturing apparatus 50.
 より具体的には、(1)金型表面の汚れの有無の評価は、人間の目視で行ってもよいし、評価装置12として、観察装置などを用いてもよい。(2)ブレード磨耗状態の評価には、評価装置12として、超音波探査装置やX線透視装置などが用いられる。(3)ブレード磨耗量の評価には、形状を測定する測定装置が用いられる。 More specifically, (1) the presence or absence of dirt on the mold surface may be evaluated visually by a human being, or an observation device or the like may be used as the evaluation device 12. (2) An ultrasonic exploration device, an X-ray fluoroscope, or the like is used as the evaluation device 12 for evaluating the blade wear state. (3) A measuring device for measuring the shape is used for evaluating the amount of blade wear.
 上述した項目に限られず、任意の評価項目に応じて、1または複数の評価装置12が用いられてもよい。 Not limited to the above-mentioned items, one or a plurality of evaluation devices 12 may be used depending on any evaluation item.
 このように、評価主体10の評価部としては、使用主体20で使用されるもしくは使用される予定の半導体製造装置50と実質的に同じ半導体製造装置50と、当該実質的に同じ半導体製造装置50により製造された半導体装置もしくは当該半導体装置の半製品の品質、および/または、当該実質的に同じ半導体製造装置50の損耗を評価する評価装置12とを含んでいてもよい。 As described above, the evaluation unit of the evaluation subject 10 includes the semiconductor manufacturing apparatus 50 substantially the same as the semiconductor manufacturing apparatus 50 used or planned to be used by the user entity 20, and the semiconductor manufacturing apparatus 50 substantially the same. May include a semiconductor device manufactured by the semiconductor device or an evaluation device 12 for evaluating the quality of a semi-finished product of the semiconductor device and / or the wear of the substantially same semiconductor manufacturing device 50.
 典型的には、半導体製造装置50を用いて製造プロセスを再現することで評価を行うことになるが、一部または全部の評価をシミュレーションにより実現してもよい。シミュレーションにより評価を行う場合、半導体製造装置50のモデルを用意するとともに、材料供給主体30から供給される材料情報に応じたモデルを生成することで、対象の製造プロセスについてのシミュレーションを実現できる。なお、シミュレーションにより評価する場合、材料供給主体30から評価主体10に対して、材料サンプルを必ずしも提供しなくてもよい。 Typically, the evaluation is performed by reproducing the manufacturing process using the semiconductor manufacturing apparatus 50, but some or all of the evaluation may be realized by simulation. When the evaluation is performed by simulation, a simulation of the target manufacturing process can be realized by preparing a model of the semiconductor manufacturing apparatus 50 and generating a model according to the material information supplied from the material supply main body 30. In the case of evaluation by simulation, it is not always necessary to provide the material sample from the material supply main body 30 to the evaluation main body 10.
 このように、評価主体10の評価部としては、使用主体20で使用されるもしくは使用される予定の半導体製造装置50のモデルを用いたシミュレーション装置を含んでいてもよい。シミュレーションを用いることで、現実に半導体製造装置50を有していなくても、評価を行うことができる。 As described above, the evaluation unit of the evaluation subject 10 may include a simulation apparatus using a model of the semiconductor manufacturing apparatus 50 used or planned to be used by the user entity 20. By using the simulation, the evaluation can be performed even if the semiconductor manufacturing apparatus 50 is not actually possessed.
 <C.情報の詳細>
 次に、本実施の形態に従う製造支援システム1においてやり取りされる情報の詳細について説明する。
<C. Information details>
Next, the details of the information exchanged in the manufacturing support system 1 according to the present embodiment will be described.
 (c1:装置情報)
 装置情報は、対象の半導体製造装置50および利用される可換部材などを特定するための情報を含む。より具体的には、半導体製造装置50がモールド装置であれば、装置情報は、(1)装置タイプ(型式番号)、および、(2)金型タイプ(型式番号)などを含む。
(C1: Device information)
The device information includes information for identifying the target semiconductor manufacturing device 50, the commutative member to be used, and the like. More specifically, if the semiconductor manufacturing apparatus 50 is a molding apparatus, the apparatus information includes (1) an apparatus type (model number), (2) a mold type (model number), and the like.
 また、半導体製造装置50がシンギュレーション装置であれば、装置情報は、(1)装置タイプ(型式番号)、(2)キット(品種用ユニット部品)の型式番号、(3)ブレードの型式番号などを含む。 If the semiconductor manufacturing apparatus 50 is a singing apparatus, the apparatus information includes (1) the apparatus type (model number), (2) the model number of the kit (unit part for product type), and (3) the model number of the blade. And so on.
 (c2:評価情報)
 評価情報は、対象の材料60を、対象の製造条件下で、対象の半導体製造装置50で使用したときの評価結果を含む。より具体的には、評価情報は、対象の材料60を用いて、対象の半導体製造装置50により製造された半導体装置の品質の評価結果、および、半導体製造装置50の損耗度合いの評価結果などを含む。
(C2: Evaluation information)
The evaluation information includes the evaluation result when the target material 60 is used in the target semiconductor manufacturing apparatus 50 under the target manufacturing conditions. More specifically, the evaluation information includes the evaluation result of the quality of the semiconductor device manufactured by the target semiconductor manufacturing device 50 using the target material 60, the evaluation result of the degree of wear of the semiconductor manufacturing device 50, and the like. include.
 半導体装置の品質の評価結果の一例として、形状観察結果などが挙げられる。形状観察結果としては、(1)半導体装置の外形寸法およびそり量、(2)半導体装置の断面観察像(光学顕微鏡による観察や走査電子顕微鏡(SEM)による観察)、(3)半導体装置の熱時そり量変移、(4)半導体装置の超音波による内部観察結果(例えば、欠陥や空隙の有無など)、(5)半導体装置のX線による内部観察結果(例えば、欠陥や空隙の有無など)、(6)半導体装置の硬度測定結果、などを含む。 An example of the quality evaluation result of a semiconductor device is a shape observation result. The shape observation results include (1) external dimensions and amount of warpage of the semiconductor device, (2) cross-sectional observation image of the semiconductor device (observation with an optical microscope or scanning electron microscope (SEM)), and (3) heat of the semiconductor device. Changes in the amount of time warpage, (4) Internal observation results of the semiconductor device by ultrasound (for example, the presence or absence of defects and voids), (5) Internal observation results of the semiconductor device by X-ray (for example, the presence or absence of defects and voids) , (6) Hardness measurement results of semiconductor devices, etc. are included.
 また、半導体製造装置50の損耗度合いの評価結果の一例として、金型および治工具の観察結果などが挙げられる。金型および治工具の観察結果としては、(1)金型表面の汚れの有無(目視)、(2)ブレード磨耗状態(光学顕微鏡による観察や走査電子顕微鏡による観察)、(3)ブレード磨耗量、などを含む。 Further, as an example of the evaluation result of the degree of wear of the semiconductor manufacturing apparatus 50, the observation result of the mold and the jig / tool can be mentioned. Observation results of the mold and jigs include (1) presence or absence of dirt on the mold surface (visual inspection), (2) blade wear state (observation with an optical microscope or scanning electron microscope), and (3) blade wear amount. , Etc. are included.
 (c3:プロセス情報)
 プロセス情報は、対象の半導体製造装置50に適用される製造条件を定義する情報を含む。より具体的には、半導体製造装置50がモールド装置であれば、プロセス情報は、(1)金型温度、(2)樹脂重量およびバラツキ量、(3)プレヒート時間、(4)成形圧力、(5)成形プロファイル(樹脂注入圧力および金型位置の時間的変移など)、などを含む。
(C3: Process information)
The process information includes information defining manufacturing conditions applied to the target semiconductor manufacturing apparatus 50. More specifically, if the semiconductor manufacturing apparatus 50 is a molding apparatus, the process information includes (1) mold temperature, (2) resin weight and amount of variation, (3) preheat time, (4) molding pressure, and (4) molding pressure. 5) Includes molding profile (resin injection pressure, time shift of mold position, etc.), etc.
 また、半導体製造装置50がシンギュレーション装置であれば、カットプロセスに関するプロセス情報は、(1)回転数、(2)カットスピード、(3)カット回数、(4)切削抵抗、(5)冷却水量、などを含む。 If the semiconductor manufacturing apparatus 50 is a singing apparatus, the process information regarding the cutting process includes (1) rotation speed, (2) cutting speed, (3) number of cuttings, (4) cutting resistance, and (5) cooling. Including the amount of water, etc.
 (c4:材料情報)
 材料情報は、対象の材料60に関する情報を含む。より具体的には、材料60が樹脂材料であれば、材料情報は、(1)流動性を示す指標であるスパイラルフロー、(2)ゲルタイム、(3)ガラス転移温度、(4)線膨張係数、(5)フィラー含有量、(6)フィラー粒径分布、(7)水分含有率、(8)密度、などを含む。
(C4: Material information)
The material information includes information about the material 60 of interest. More specifically, if the material 60 is a resin material, the material information includes (1) spiral flow, which is an index indicating fluidity, (2) gel time, (3) glass transition temperature, and (4) coefficient of linear expansion. , (5) Filler content, (6) Filler particle size distribution, (7) Moisture content, (8) Density, and the like.
 また、材料60が基板材料であれば、材料情報は、(1)配線めっきの厚さおよびバラツキ測定結果、(2)配線レジストの厚さおよびバラツキ測定結果などを含む。 If the material 60 is a substrate material, the material information includes (1) wiring plating thickness and variation measurement results, (2) wiring resist thickness and variation measurement results, and the like.
 (c5:認定情報)
 認定情報は、対象の半導体製造装置50を含む製造プロセスにおける要求仕様を含む。より具体的には、認定情報は、(1)半導体製造装置の保証値を満たすか否かの判定結果、(2)cpk(工程能力指数)、(3)ブレード寿命予測などを含む。
(C5: Certification information)
The certification information includes the required specifications in the manufacturing process including the semiconductor manufacturing apparatus 50 of interest. More specifically, the certification information includes (1) a determination result of whether or not the guaranteed value of the semiconductor manufacturing apparatus is satisfied, (2) cpk (process capability index), (3) blade life prediction, and the like.
 なお、上述した項目は一例であり、製造プロセスや材料60の種類などに応じて、任意の項目をそれぞれの情報に含めることができる。 Note that the above items are examples, and any item can be included in each information depending on the manufacturing process, the type of material 60, and the like.
 <D.応用例>
 上述の説明においては、主として、事前の性能評価に適用される例を示したが、これに限らず、様々な応用が可能である。例えば、材料供給主体30が製造する材料60の品質を保証するために用いてもよい。この場合、材料供給主体30は、評価主体10から提供された評価結果を対応する材料60と関連付けて、使用主体20へ供給してもよい。
<D. Application example>
In the above description, an example applied mainly to the performance evaluation in advance is shown, but the present invention is not limited to this, and various applications are possible. For example, it may be used to guarantee the quality of the material 60 manufactured by the material supply entity 30. In this case, the material supply entity 30 may supply the evaluation result provided by the evaluation entity 10 to the user entity 20 in association with the corresponding material 60.
 図3は、本実施の形態に従う製造支援システム1の応用例の一つを説明するための模式図である。図4は、本実施の形態に従う製造支援システム1の応用例の一つで実行される処理手順を示すシーケンス図である。 FIG. 3 is a schematic diagram for explaining one of the application examples of the manufacturing support system 1 according to the present embodiment. FIG. 4 is a sequence diagram showing a processing procedure executed in one of the application examples of the manufacturing support system 1 according to the present embodiment.
 図3を参照して、使用主体20が半導体製造装置50を使用して半導体装置を製造している状況において、材料供給主体30が供給する材料60の品質を評価主体10が事前に評価する例を想定する。 With reference to FIG. 3, an example in which the evaluation subject 10 evaluates in advance the quality of the material 60 supplied by the material supply entity 30 in a situation where the user entity 20 manufactures a semiconductor device using the semiconductor manufacturing apparatus 50. Is assumed.
 図3および図4を参照して、材料60を供給する局面において、材料供給主体30は、使用主体20などから予め提示された製造条件などに従って、材料60を製造する(ステップS52)。材料供給主体30は、製造した材料60の一部(材料サンプル)および材料情報を評価主体10へ提供する(ステップS54)。 With reference to FIGS. 3 and 4, in the phase of supplying the material 60, the material supply main body 30 manufactures the material 60 according to the manufacturing conditions and the like previously presented by the user main body 20 and the like (step S52). The material supply entity 30 provides a part of the manufactured material 60 (material sample) and material information to the evaluation entity 10 (step S54).
 評価主体10は、材料供給主体30から提供された材料サンプルを用いて、評価を行う(ステップS56)。そして、評価主体10は、評価により得られた評価結果を材料供給主体30へ提供する(ステップS58)。 The evaluation subject 10 evaluates using the material sample provided by the material supply entity 30 (step S56). Then, the evaluation subject 10 provides the evaluation result obtained by the evaluation to the material supply entity 30 (step S58).
 材料供給主体30は、評価主体10から提供された評価結果を製造した材料60に添付して使用主体20へ供給する(ステップS60)。使用主体20は、材料供給主体30から納入された材料60に添付されている評価結果を確認した上で、半導体製造装置50に使用する。 The material supply entity 30 attaches the evaluation result provided by the evaluation entity 10 to the manufactured material 60 and supplies it to the user entity 20 (step S60). The user main body 20 is used for the semiconductor manufacturing apparatus 50 after confirming the evaluation result attached to the material 60 delivered from the material supply main body 30.
 なお、ステップS56およびS58においては、評価主体10による評価の結果が妥当である場合に限って、材料供給主体30に対して評価結果を提供するようにしてもよい。 In steps S56 and S58, the evaluation result may be provided to the material supply entity 30 only when the evaluation result by the evaluation entity 10 is appropriate.
 図3および図4に示すような仕組みを採用することで、材料供給主体30から使用主体20へ供給される材料60が対象の半導体製造装置50に適合していることをより確実に保証できる。 By adopting the mechanism shown in FIGS. 3 and 4, it is possible to more reliably guarantee that the material 60 supplied from the material supply entity 30 to the user entity 20 is compatible with the target semiconductor manufacturing apparatus 50.
 なお、図3および図4に示される品質評価は、例えば、材料60の製造ロット毎に行ってもよい。 The quality evaluation shown in FIGS. 3 and 4 may be performed for each production lot of the material 60, for example.
 <E.管理装置>
 次に、評価主体10、使用主体20および材料供給主体30にそれぞれ配置される管理装置14、管理装置24および管理装置34について説明する。製造支援システム1においては、実体的には、管理装置14、管理装置24および管理装置34が必要な情報をやり取りする。
<E. Management device>
Next, the management device 14, the management device 24, and the management device 34 arranged in the evaluation main body 10, the user main body 20, and the material supply main body 30, respectively, will be described. In the manufacturing support system 1, the management device 14, the management device 24, and the management device 34 substantially exchange necessary information.
 図5は、本実施の形態に従う製造支援システム1を構成する管理装置14の装置構成の一例を示す模式図である。なお、管理装置24および管理装置34についても図1に示す装置構成と同様である。 FIG. 5 is a schematic diagram showing an example of the device configuration of the management device 14 constituting the manufacturing support system 1 according to the present embodiment. The management device 24 and the management device 34 have the same device configuration as shown in FIG.
 図5を参照して、管理装置14は、コンピュータを用いて実現されており、主たるコンポーネントとして、プロセッサ102と、メインメモリ104と、入力部106と、表示部108と、出力部110と、二次記憶装置120と、通信部126とを含む。これらのコンポーネントは、内部バス128に接続される。 With reference to FIG. 5, the management device 14 is realized by using a computer, and has two main components, a processor 102, a main memory 104, an input unit 106, a display unit 108, and an output unit 110. The next storage device 120 and the communication unit 126 are included. These components are connected to the internal bus 128.
 プロセッサ102は、管理装置14が提供する機能に必要な処理を実行する演算主体であり、二次記憶装置120に格納されているプログラムまたはプログラムモジュールを実行することで、必要な機能を実現する。プロセッサ102は、マルチコアおよび/またはマルチプロセッサであってもよく、要求される負荷処理能力に応じて、必要な数のコアまたはプロセッサ数が設定される。 The processor 102 is an arithmetic unit that executes processing necessary for the functions provided by the management device 14, and realizes the necessary functions by executing a program or a program module stored in the secondary storage device 120. The processor 102 may be multicore and / or multiprocessor, and the required number of cores or processors is set according to the required load processing capacity.
 メインメモリ104は、プロセッサ102がプログラムを実行するために必要なワーキングメモリを提供する。メインメモリ104は、実行されるプログラムのコードやワーキングデータを一次的に保持する不揮発性メモリである。 The main memory 104 provides the working memory required for the processor 102 to execute the program. The main memory 104 is a non-volatile memory that temporarily holds the code and working data of the program to be executed.
 入力部106は、オペレータなどからの操作を受付けるコンポーネントであり、例えば、キーボード、マウス、タッチパネルなどを用いて実装される。表示部118は、オペレータなどへ処理結果などの情報を提示するコンポーネントであり、例えば、ディスプレイなどを用いて実装される。出力部110は、管理装置14内の情報を有形化して出力するコンポーネントであり、例えば、プリンタなどを用いて実装される。 The input unit 106 is a component that receives an operation from an operator or the like, and is implemented by using, for example, a keyboard, a mouse, a touch panel, or the like. The display unit 118 is a component that presents information such as a processing result to an operator or the like, and is implemented by using, for example, a display or the like. The output unit 110 is a component that tangibly outputs the information in the management device 14, and is mounted by using, for example, a printer.
 二次記憶装置120は、保持部の一例であり、オペレーティングシステム(不図示)に加えて、本実施の形態に従う製造支援システム1において必要な機能を提供するための処理実現モジュール122および各種データからなるデータ群124を格納している。評価主体10の管理装置14のデータ群124は、典型的には、認定情報、装置情報およびプロセス情報を含む。 The secondary storage device 120 is an example of a holding unit, and is derived from a processing realization module 122 and various data for providing functions required in the manufacturing support system 1 according to the present embodiment, in addition to an operating system (not shown). Data group 124 is stored. The data group 124 of the management device 14 of the evaluator 10 typically includes certification information, device information and process information.
 通信部126は、使用主体20および/または材料供給主体30と通信するためのコンポーネントであり、例えば、有線LAN通信インターフェイス、無線LAN通信インターフェイス、公衆ネットワーク通信インターフェイスなどを用いて実装される。通信対象となる使用主体20および/または材料供給主体30の数および通信形態などに依存して、複数種類または複数個の通信部126を実装してもよい。 The communication unit 126 is a component for communicating with the user main body 20 and / or the material supply main body 30, and is implemented by using, for example, a wired LAN communication interface, a wireless LAN communication interface, a public network communication interface, or the like. A plurality of types or a plurality of communication units 126 may be mounted depending on the number of the user main body 20 and / or the material supply main body 30 to be communicated, the communication form, and the like.
 上述の説明においては、評価主体10(管理装置14)、使用主体20(管理装置24)および材料供給主体30(管理装置34)の間で、必要な情報を直接やり取りする構成例を示すが、このような構成に限らず、特定の主体が情報を管理するようにしてもよい。 In the above description, a configuration example is shown in which necessary information is directly exchanged between the evaluation subject 10 (management device 14), the user entity 20 (management device 24), and the material supply entity 30 (management device 34). Not limited to such a configuration, a specific entity may manage the information.
 図6は、本実施の形態に従う製造支援システム1におけるデータ保持の実装例を示す模式図である。図6(A)には、評価主体10が必要なデータを管理する実装例を示し、図6(B)には、材料供給主体30が必要なデータを管理する実装例を示す。 FIG. 6 is a schematic diagram showing an implementation example of data retention in the manufacturing support system 1 according to the present embodiment. FIG. 6A shows an implementation example in which the evaluation subject 10 manages necessary data, and FIG. 6B shows an implementation example in which the material supply entity 30 manages necessary data.
 図6(A)を参照して、評価主体10は、材料供給主体30から提供された材料サンプルについての評価情報を管理しており、材料供給主体30に対しては、評価情報に代えて、管理している評価情報へアクセスするためのURLなどの特定情報を提供する。さらに、材料供給主体30は、評価主体10から提供された特定情報を使用主体20へ提供する。 With reference to FIG. 6A, the evaluation entity 10 manages the evaluation information about the material sample provided by the material supply entity 30, and instead of the evaluation information, the evaluation entity 30 manages the evaluation information. Provide specific information such as a URL for accessing the managed evaluation information. Further, the material supply subject 30 provides the specific information provided by the evaluation subject 10 to the user subject 20.
 材料供給主体30および使用主体20は、特定情報に基づいて、評価主体10が管理する評価主体へアクセスすることができる。なお、評価主体10が管理する評価情報へのアクセスには、アクセスコード(パスワード)などの各種制限を設けてもよい。 The material supply entity 30 and the user entity 20 can access the evaluation entity managed by the evaluation entity 10 based on the specific information. In addition, various restrictions such as an access code (password) may be set for access to the evaluation information managed by the evaluation subject 10.
 このような構成を採用することで、材料供給主体30(管理装置34)におけるコンピューティングリソースを低減できるとともに、製造支援システム1に係る処理を簡素化できる。 By adopting such a configuration, the computing resources in the material supply main body 30 (management device 34) can be reduced, and the processing related to the manufacturing support system 1 can be simplified.
 図6(B)を参照して、評価主体10は、材料供給主体30から提供された材料サンプルについての評価情報を材料供給主体30へ送信する。材料供給主体30は、評価主体10から受信した評価情報を管理する。材料供給主体30は、自身が管理する評価情報へアクセスするためのURLなどの特定情報を使用主体20へ提供する。 With reference to FIG. 6B, the evaluation entity 10 transmits evaluation information about the material sample provided by the material supply entity 30 to the material supply entity 30. The material supply entity 30 manages the evaluation information received from the evaluation entity 10. The material supply entity 30 provides the user entity 20 with specific information such as a URL for accessing the evaluation information managed by the material supply entity 30.
 使用主体20は、特定情報に基づいて、材料供給主体30が管理する評価主体へアクセスすることができる。なお、材料供給主体30が管理する評価情報へのアクセスには、アクセスコード(パスワード)などの各種制限を設けてもよい。 The user subject 20 can access the evaluation subject managed by the material supply subject 30 based on the specific information. In addition, various restrictions such as an access code (password) may be set for access to the evaluation information managed by the material supply entity 30.
 このような構成を採用することで、使用主体20(管理装置24)におけるコンピューティングリソースを低減できるとともに、製造支援システム1に係る処理を簡素化できる。 By adopting such a configuration, the computing resources in the user main body 20 (management device 24) can be reduced, and the processing related to the manufacturing support system 1 can be simplified.
 上述の説明においては、評価主体10、使用主体20および材料供給主体30に管理装置14、管理装置24および管理装置34がそれぞれ配置される構成例を示すが、これに限らず、いわゆるクラウドコンピュータのように、複数のコンピュータがネットワークを介して連結されたようなシステムの一部を利用して、必要な処理および機能を実現してもよい。 In the above description, a configuration example in which the management device 14, the management device 24, and the management device 34 are arranged in the evaluation main body 10, the user main body 20, and the material supply main body 30, respectively, is shown, but the present invention is not limited to this, and the so-called cloud computer is used. As such, a part of a system in which a plurality of computers are connected via a network may be utilized to realize necessary processing and functions.
 本実施の形態に従う製造支援システム1は、どのようなコンピューティング環境であっても実現可能であり、現実に実装する時点での公知の技術を任意に用いて、もしくは、現実に実装する国や地域の法律などに従って、任意の実装形態を採用することができる。本発明の技術的範囲は、特定の実装形態に限定されるものではなく、任意の実装形態を包含し得るものである。 The manufacturing support system 1 according to the present embodiment can be realized in any computing environment, and the country or country where the known technology at the time of actual implementation is arbitrarily used or actually implemented is used. Any form of implementation can be adopted in accordance with local laws and the like. The technical scope of the present invention is not limited to a specific mounting form, but may include any mounting form.
 <F.利点>
 目的とする製造プロセスに対して、半導体製造装置および半導体製造装置で使用される材料が適切であるか否かを事前に評価することは、十分な知見が必要であり、また多くの時間も必要とする。このような多くのリソースを必要とする評価処理を、材料供給主体とも連係して、評価主体(典型的には、半導体製造装置のメーカなど)が実施することで、半導体製造装置および材料を含めた総合的な評価を行うことができる。
<F. Advantages>
Preliminary evaluation of the suitability of semiconductor manufacturing equipment and the materials used in semiconductor manufacturing equipment for the desired manufacturing process requires sufficient knowledge and a lot of time. And. The evaluation process, which requires a lot of resources, is carried out by the evaluation entity (typically, the manufacturer of the semiconductor manufacturing equipment, etc.) in cooperation with the material supply entity, including the semiconductor manufacturing equipment and materials. It is possible to make a comprehensive evaluation.
 このような総合的な評価を行える製造支援システムを提供することで、材料供給主体は、顧客である使用主体が希望する製造プロセスに適した材料を適切に提供することを確実化できる。また、使用主体は、十分な知見を有していなくても、評価主体の知見を利用して、より早期かつ確実に、目的とする製造プロセスを実現できる。さらに、評価主体は、自らが保有する知見を利用して、様々な材料供給主体および使用主体を支援することができる。 By providing a manufacturing support system that can perform such a comprehensive evaluation, the material supplier can ensure that the material suitable for the manufacturing process desired by the user, who is the customer, is appropriately provided. Further, even if the user does not have sufficient knowledge, the knowledge of the evaluation subject can be used to realize the desired manufacturing process more quickly and reliably. Furthermore, the evaluator can utilize the knowledge it possesses to support various material suppliers and users.
 今回開示された実施の形態は、すべての点で例示であって制限的なものではないと考えられるべきである。本発明の範囲は、上記した実施の形態の説明ではなくて請求の範囲によって示され、請求の範囲と均等の意味および範囲内でのすべての変更が含まれることが意図される。 The embodiments disclosed this time should be considered to be exemplary in all respects and not restrictive. The scope of the invention is set forth by the claims rather than the description of the embodiments described above, and is intended to include all modifications within the meaning and scope of the claims.
 1 製造支援システム、10 評価主体、12 評価装置、14,24,34 管理装置、20 使用主体、30 材料供給主体、50 半導体製造装置、60 材料、102 プロセッサ、104 メインメモリ、106 入力部、108,118 表示部、110 出力部、120 二次記憶装置、122 処理実現モジュール、124 データ群、126 通信部、128 内部バス。 1 manufacturing support system, 10 evaluation main body, 12 evaluation equipment, 14, 24, 34 management equipment, 20 main body, 30 material supply main body, 50 semiconductor manufacturing equipment, 60 materials, 102 processor, 104 main memory, 106 input unit, 108 , 118 display unit, 110 output unit, 120 secondary storage device, 122 processing realization module, 124 data group, 126 communication unit, 128 internal bus.

Claims (8)

  1.  半導体製造装置を用いた製造を支援する製造支援システムであって、
     使用主体で使用されるもしくは使用される予定の半導体製造装置を特定する情報、および、当該半導体製造装置で実行される製造プロセスを特定する情報を保持する、評価主体に配置された保持部と、
     前記半導体製造装置で使用される材料を供給する材料供給主体から提供された当該材料を特定する情報と、前記保持部により保持される情報とに基づいて、当該材料の適否を評価する、前記評価主体に配置された評価部と、
     前記評価部による評価結果を前記材料供給主体へ提供する評価結果提供部とを備える、製造支援システム。
    A manufacturing support system that supports manufacturing using semiconductor manufacturing equipment.
    A holding unit placed in the evaluation subject that holds information that identifies the semiconductor manufacturing equipment that is used or will be used by the user, and information that identifies the manufacturing process executed by the semiconductor manufacturing equipment.
    The evaluation that evaluates the suitability of the material based on the information that identifies the material provided by the material supply entity that supplies the material used in the semiconductor manufacturing apparatus and the information that is held by the holding unit. The evaluation department placed in the main body and
    A manufacturing support system including an evaluation result providing unit that provides the evaluation result by the evaluation unit to the material supply entity.
  2.  前記評価部は、
      前記使用主体で使用されるもしくは使用される予定の半導体製造装置と実質的に同じ半導体製造装置と、
      当該実質的に同じ半導体製造装置により製造された半導体装置もしくは当該半導体装置の半製品の品質、および、当該実質的に同じ半導体製造装置の損耗のうち、少なくとも一方を評価する評価装置とを含む、請求項1に記載の製造支援システム。
    The evaluation unit
    A semiconductor manufacturing device that is substantially the same as the semiconductor manufacturing device that is used or will be used by the user.
    Includes an evaluation device that evaluates the quality of a semiconductor device or semi-finished product of the semiconductor device manufactured by the substantially same semiconductor manufacturing device, and at least one of the wear and tear of the substantially same semiconductor manufacturing device. The manufacturing support system according to claim 1.
  3.  前記評価装置は、前記半導体装置もしくは前記半導体装置の半製品の品質を評価するための構成として、形状を測定する測定装置、断面観察像を取得する顕微鏡、内部観察を行うための探査装置、硬度を測定するための硬度計のうち、いずれか1つを含む、請求項2に記載の製造支援システム。 The evaluation device includes a measuring device for measuring a shape, a microscope for acquiring a cross-sectional observation image, an exploration device for internal observation, and a hardness as a configuration for evaluating the quality of the semiconductor device or a semi-finished product of the semiconductor device. The manufacturing support system according to claim 2, further comprising any one of the hardness meters for measuring.
  4.  前記評価装置は、前記実質的に同じ半導体製造装置の損耗を評価するための構成として、観察装置および探査装置のうちいずれか1つを含む、請求項2または3に記載の製造支援システム。 The manufacturing support system according to claim 2 or 3, wherein the evaluation device includes any one of an observation device and an exploration device as a configuration for evaluating wear of the substantially same semiconductor manufacturing device.
  5.  前記評価装置は、前記使用主体で使用されるもしくは使用される予定の半導体製造装置のモデルを用いたシミュレーション装置を含む、請求項2~4のいずれか1項に記載の製造支援システム。 The manufacturing support system according to any one of claims 2 to 4, wherein the evaluation device includes a simulation device using a model of a semiconductor manufacturing device used or planned to be used by the user.
  6.  前記材料供給主体は、前記評価主体から提供された評価結果を対応する材料と関連付けて、前記使用主体へ供給する、請求項1~5のいずれか1項に記載の製造支援システム。 The manufacturing support system according to any one of claims 1 to 5, wherein the material supply entity associates the evaluation result provided by the evaluation entity with the corresponding material and supplies the evaluation result to the user entity.
  7.  前記評価部は、異なる複数の材料について、材料の適否を評価する処理をそれぞれ行う、請求項1~6のいずれか1項に記載の製造支援システム。 The manufacturing support system according to any one of claims 1 to 6, wherein the evaluation unit performs processing for evaluating the suitability of a plurality of different materials.
  8.  半導体製造装置を用いた製造を支援する製造支援方法であって、
     評価主体に配置された保持部が、使用主体で使用されるもしくは使用される予定の半導体製造装置を特定する情報、および、当該半導体製造装置で実行される製造プロセスを特定する情報を保持するステップと、
     前記評価主体において、前記半導体製造装置で使用される材料を供給する材料供給主体から提供された当該材料を特定する情報と、前記保持部により保持される情報とに基づいて、当該材料の適否を評価するステップと、
     前記評価するステップによる評価結果を前記材料供給主体へ提供するステップとを備える、製造支援方法。
    It is a manufacturing support method that supports manufacturing using semiconductor manufacturing equipment.
    A step in which a holding unit arranged in an evaluation subject holds information that identifies a semiconductor manufacturing device that is used or will be used by the user, and information that identifies a manufacturing process executed by the semiconductor manufacturing device. When,
    In the evaluation subject, the suitability of the material is determined based on the information for specifying the material provided by the material supply entity that supplies the material used in the semiconductor manufacturing apparatus and the information held by the holding unit. Steps to evaluate and
    A manufacturing support method comprising a step of providing an evaluation result by the evaluation step to the material supply entity.
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