TWI787790B - Manufacturing support system and manufacturing support method - Google Patents
Manufacturing support system and manufacturing support method Download PDFInfo
- Publication number
- TWI787790B TWI787790B TW110114229A TW110114229A TWI787790B TW I787790 B TWI787790 B TW I787790B TW 110114229 A TW110114229 A TW 110114229A TW 110114229 A TW110114229 A TW 110114229A TW I787790 B TWI787790 B TW I787790B
- Authority
- TW
- Taiwan
- Prior art keywords
- evaluation
- information
- semiconductor manufacturing
- semiconductor
- manufacturing
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 215
- 238000000034 method Methods 0.000 title claims description 42
- 238000011156 evaluation Methods 0.000 claims abstract description 176
- 239000000463 material Substances 0.000 claims abstract description 166
- 239000004065 semiconductor Substances 0.000 claims abstract description 157
- 239000011265 semifinished product Substances 0.000 claims description 8
- 238000001514 detection method Methods 0.000 claims description 7
- 238000004088 simulation Methods 0.000 claims description 7
- 238000012423 maintenance Methods 0.000 claims 1
- 238000007726 management method Methods 0.000 description 30
- 230000008569 process Effects 0.000 description 30
- 238000012545 processing Methods 0.000 description 22
- 238000010586 diagram Methods 0.000 description 12
- 239000000758 substrate Substances 0.000 description 9
- 238000004891 communication Methods 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- 238000005520 cutting process Methods 0.000 description 5
- 230000015654 memory Effects 0.000 description 5
- 230000006870 function Effects 0.000 description 4
- 238000009434 installation Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 238000000465 moulding Methods 0.000 description 4
- 238000007542 hardness measurement Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000004806 packaging method and process Methods 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 239000013077 target material Substances 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 238000013500 data storage Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 238000002594 fluoroscopy Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 1
- 238000003556 assay Methods 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000012854 evaluation process Methods 0.000 description 1
- 230000004438 eyesight Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000001303 quality assessment method Methods 0.000 description 1
- 238000003325 tomography Methods 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
- 230000003936 working memory Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
- G06Q10/00—Administration; Management
- G06Q10/06—Resources, workflows, human or project management; Enterprise or organisation planning; Enterprise or organisation modelling
- G06Q10/063—Operations research, analysis or management
- G06Q10/0639—Performance analysis of employees; Performance analysis of enterprise or organisation operations
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
- G06Q50/00—Information and communication technology [ICT] specially adapted for implementation of business processes of specific business sectors, e.g. utilities or tourism
- G06Q50/04—Manufacturing
-
- G—PHYSICS
- G16—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR SPECIFIC APPLICATION FIELDS
- G16Y—INFORMATION AND COMMUNICATION TECHNOLOGY SPECIALLY ADAPTED FOR THE INTERNET OF THINGS [IoT]
- G16Y10/00—Economic sectors
- G16Y10/25—Manufacturing
-
- G—PHYSICS
- G16—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR SPECIFIC APPLICATION FIELDS
- G16Y—INFORMATION AND COMMUNICATION TECHNOLOGY SPECIALLY ADAPTED FOR THE INTERNET OF THINGS [IoT]
- G16Y20/00—Information sensed or collected by the things
- G16Y20/20—Information sensed or collected by the things relating to the thing itself
-
- G—PHYSICS
- G16—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR SPECIFIC APPLICATION FIELDS
- G16Y—INFORMATION AND COMMUNICATION TECHNOLOGY SPECIALLY ADAPTED FOR THE INTERNET OF THINGS [IoT]
- G16Y40/00—IoT characterised by the purpose of the information processing
- G16Y40/20—Analytics; Diagnosis
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/30—Computing systems specially adapted for manufacturing
Landscapes
- Engineering & Computer Science (AREA)
- Business, Economics & Management (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Human Resources & Organizations (AREA)
- Economics (AREA)
- Strategic Management (AREA)
- General Business, Economics & Management (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Development Economics (AREA)
- Quality & Reliability (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Theoretical Computer Science (AREA)
- Tourism & Hospitality (AREA)
- Marketing (AREA)
- General Health & Medical Sciences (AREA)
- Health & Medical Sciences (AREA)
- Computing Systems (AREA)
- Entrepreneurship & Innovation (AREA)
- Educational Administration (AREA)
- General Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Primary Health Care (AREA)
- Game Theory and Decision Science (AREA)
- Operations Research (AREA)
- Biomedical Technology (AREA)
- Accounting & Taxation (AREA)
- General Factory Administration (AREA)
- Management, Administration, Business Operations System, And Electronic Commerce (AREA)
- Air Bags (AREA)
Abstract
本發明的對使用半導體製造裝置的製造進行支援的製造支援系統包括:保持部,配置於評估主體,保持用於確定由使用主體使用或預定使用的半導體製造裝置的資訊、及用於確定由該半導體製造裝置執行的製造製程的資訊;評估部,配置於評估主體,基於用於確定由供給半導體製造裝置所使用的材料的材料供給主體所提供的該材料的資訊、與由保持部保持的資訊,對該材料的合適與否進行評估;及評估結果提供部,向材料供給主體提供評估部獲得的評估結果。The manufacturing support system for supporting the manufacture using the semiconductor manufacturing device of the present invention includes: a holding unit disposed on the evaluation body, holding information for specifying the semiconductor manufacturing device used or planned to be used by the user body; Information on the manufacturing process performed by the semiconductor manufacturing device; the evaluation unit is disposed in the evaluation body based on the information provided by the material supply body for specifying the material used in the semiconductor manufacturing device and the information held by the holding unit , evaluating the suitability of the material; and the evaluation result providing department, providing the evaluation result obtained by the evaluation department to the material supplier.
Description
本發明是有關於一種對使用半導體製造裝置的製造進行支援的製造支援系統及製造支援方法。The present invention relates to a manufacturing support system and a manufacturing support method for supporting manufacturing using semiconductor manufacturing equipment.
於製造半導體裝置時,提出有一種藉由事先的性能評估等縮短準備時間的各種方法。作為此種方法之一,日本專利特開2003-259015號公報(專利文獻1)揭示一種電子會議系統,該電子會議系統中作為用以銷售半導體製造裝置的事前活動,半導體製造裝置供應商的製程技術人員與半導體設備製造商(顧客)的製程技術人員無需互相去往對方處,即可實現關於半導體設備製程技術人員或半導體製造裝置性能的會議。 [現有技術文獻] [專利文獻]In the manufacture of semiconductor devices, various methods have been proposed to shorten the preparation time by prior performance evaluation and the like. As one of such methods, Japanese Patent Laid-Open No. 2003-259015 (Patent Document 1) discloses an electronic conference system in which as a pre-event for selling semiconductor manufacturing devices, the semiconductor manufacturing device supplier's process The technical personnel and the process technicians of the semiconductor equipment manufacturer (customer) can realize the meeting about the performance of the semiconductor equipment process technicians or the semiconductor manufacturing equipment without going to each other. [Prior art literature] [Patent Document]
[專利文獻1]日本專利特開2003-259015號公報[Patent Document 1] Japanese Patent Laid-Open No. 2003-259015
[發明所欲解決之課題] 所述日本專利特開2003-259015號公報(專利文獻1)所揭示的電子會議系統是假定了用來銷售半導體製造裝置的事前活動,使用由半導體設備製造商提供的樣品事先對性能進行評估。[Problem to be Solved by the Invention] The electronic conferencing system disclosed in Japanese Patent Application Laid-Open No. 2003-259015 (Patent Document 1) assumes a prior activity for selling semiconductor manufacturing equipment, and evaluates performance in advance using samples provided by semiconductor equipment manufacturers.
然而,於實際的半導體裝置的製造製程中,由於使用由材料製造商等提供的各種材料,故而若半導體設備製造商的製程技術人員不具有包括材料選擇在內的知識,則未必能夠製造應有品質的半導體裝置。However, in the actual manufacturing process of semiconductor devices, since various materials provided by material manufacturers are used, if the process technicians of semiconductor equipment manufacturers do not have knowledge including material selection, they may not be able to manufacture due quality semiconductor devices.
本發明的目的在於提供一種對使用此種半導體製造裝置的半導體裝置的製造進行支援的新構造。 [解決課題之手段]An object of the present invention is to provide a new structure for supporting the manufacture of a semiconductor device using such a semiconductor manufacturing apparatus. [Means to solve the problem]
根據本發明的一態樣,提供一種對使用半導體製造裝置的製造進行支援的製造支援系統。製造支援系統包括:保持部,配置於評估主體,保持用於確定由使用主體使用或預定使用的半導體製造裝置的資訊、及用於確定由該半導體製造裝置執行的製造製程的資訊;評估部,配置於評估主體,基於用於確定由供給半導體製造裝置所使用的材料的材料供給主體所提供的該材料的資訊、與由保持部保持的資訊,對該材料的合適與否進行評估;及評估結果提供部,向材料供給主體提供評估部獲得的評估結果。According to one aspect of the present invention, there is provided a manufacturing support system that supports manufacturing using a semiconductor manufacturing apparatus. The manufacturing support system includes: a holding unit disposed on the evaluation body, holding information for specifying a semiconductor manufacturing device used or planned to be used by the user body, and information for specifying a manufacturing process executed by the semiconductor manufacturing device; the evaluation unit, Arranged in the evaluation body, based on the information for determining the material supplied by the material supply body for supplying the material used in the semiconductor manufacturing device and the information held by the holding unit, the suitability of the material is evaluated; and evaluation The result providing unit provides the evaluation result obtained by the evaluation unit to the material supplier.
根據本發明的其他態樣,提供一種對使用半導體製造裝置的製造進行支援的製造支援方法。製造支援方法包括:配置於評估主體的保持部保持用於確定由使用主體使用或預定使用的半導體製造裝置的資訊、及用於確定由該半導體製造裝置執行的製造製程的資訊的步驟,於評估主體中,基於用於確定由供給半導體製造裝置所使用的材料的材料供給主體所提供的該材料的資訊、與由保持部保持的資訊,對該材料的合適與否進行評估的步驟;及向材料供給主體提供評估的步驟所獲得的評估結果的步驟。 [發明的效果]According to another aspect of the present invention, there is provided a manufacturing support method for supporting manufacturing using a semiconductor manufacturing apparatus. The manufacturing support method includes a step of holding information for specifying a semiconductor manufacturing device used or planned to be used by the user body and information for specifying a manufacturing process executed by the semiconductor manufacturing device in a holding unit disposed in the evaluation body, and in the evaluation In the main body, a step of evaluating the suitability of the material based on the information for determining the material provided by the material supplying main body for supplying the material used in the semiconductor manufacturing device and the information held by the holding unit; and A step in which the material supply subject provides the evaluation result obtained in the evaluation step. [Effect of the invention]
本發明可提供一種對使用半導體製造裝置的半導體裝置的製造進行支援的新構造。The present invention can provide a new structure for supporting the manufacture of semiconductor devices using semiconductor manufacturing equipment.
參照圖式對本發明的實施形態進行詳細說明。再者,對圖中的相同或相當部分標註相同符號,不再重複其說明。Embodiments of the present invention will be described in detail with reference to the drawings. In addition, the same code|symbol is attached|subjected to the same or corresponding part in a figure, and the description is not repeated.
〈A.製造支援系統的結構及處理的概要〉 首先,對依照本實施形態的製造支援系統1的結構及製造支援系統1中的處理的概要進行說明。製造支援系統1對使用半導體製造裝置的製造進行支援。於以下說明中,主要對半導體製造裝置所使用的各種材料的供給進行說明,但依照本實施形態的製造支援系統1並不限於該些範圍。<A. Overview of the structure and processing of the manufacturing support system> First, the configuration of the manufacturing support system 1 according to the present embodiment and the outline of processing in the manufacturing support system 1 will be described. The manufacturing support system 1 supports manufacturing using semiconductor manufacturing equipment. In the following description, supply of various materials used in semiconductor manufacturing equipment will be mainly described, but the manufacturing support system 1 according to this embodiment is not limited to these ranges.
圖1是用來對依照本實施形態的製造支援系統1的概要進行說明的示意圖。參照圖1,製造支援系統1主要關於使用半導體製造裝置50的一個或多個使用主體20、供給半導體製造裝置50所使用的材料60的一個或多個材料供給主體30、及事先對材料供給主體30所供給的材料60的合適與否進行評估的評估主體10。FIG. 1 is a schematic diagram for explaining the outline of a manufacturing support system 1 according to this embodiment. Referring to FIG. 1 , the manufacturing support system 1 mainly relates to one or
於圖1中,對在評估主體10與作為使用主體20之一的「使用主體X」之間交換的資訊標註「X」,對在評估主體10與作為材料供給主體30之一的「材料供給主體A」之間、及「使用主體X」與「材料供給主體A」之間交換的資訊標註「A」。例如,關於如「裝置資訊X」與「裝置資訊A」般名稱相同但「X」或「A」的符號不同的資訊,可為內容相同的資訊,亦可為內容不同的資訊。以下的圖2~圖4中亦相同。In FIG. 1, "X" is marked for the information exchanged between the
於本說明書中,使用主體20是包含以任意形態使用半導體製造裝置50的使用者在內的用語,例如包含半導體製造商、半導體設備製造商、封裝廠(僅承包半導體製造中的封裝組裝工序的企業)、委外封裝測試(Out-Sourced Assembly and Testing,OSAT)(從事半導體受託封裝、測試的企業)、鑄造工場(專門從事半導體晶片的製造的企業)等。In this specification, the subject of
於本說明書中,「材料供給主體」包含製造及/或銷售半導體製造裝置50所使用的任意材料60的任意主體,是與「評估主體10」及「使用主體20」不同的主體。In this specification, the "material supply entity" includes any entity that manufactures and/or sells
例如,作為半導體製造裝置50,假定將包含半導體晶片的電子組件進行樹脂密封的模封裝置、及將包含半導體晶片的電子組件進行單片化的單切裝置。此種樹脂密封裝置是藉由樹脂密封而安裝於基板(引線框架、印刷基板、陶瓷製基板、金屬製基板、玻璃製基板、半導體製基板、樹脂製基板等)上的半導體晶片。材料供給主體30供給密封半導體晶片的樹脂或基板作為材料60。半導體製造裝置50所使用的材料60不限於此種樹脂或基板,包括與半導體製造裝置50的製造製程相關的任意耗材。For example, as the
使用主體20使用材料供給主體30所供給的材料60,藉由半導體製造裝置50製造半導體裝置。使用主體20考慮自身的半導體製造裝置50的製造製程等,指定應對材料供給主體30供給的材料60的規格或品質性能等。材料供給主體30供給滿足所指定的規格及品質性能的材料60。The semiconductor device is manufactured by the
然而,未必所有使用主體20均對製造製程有足夠的見解。又,於新導入的半導體製造裝置50的初始調整階段,也發生以下作業,即一面反複試誤一面將製造製程最佳化,同時決定所使用的材料60的規格或品質性能等。However, not all
於製造製程的最佳化時,需要使用評估裝置對藉由半導體製造裝置50所製造的半導體裝置或其半製品進行評估。然而,未必所有使用主體20均保有評估裝置,特別是伴隨所製造的半導體裝置的微細化等,需要更高性能的評估裝置。又,亦可能存在即便保有評估裝置亦無法對製造製程恰當地反饋從評估裝置輸出的評估結果的使用主體20。When optimizing the manufacturing process, it is necessary to use an evaluation device to evaluate the semiconductor device manufactured by the
依照本實施形態的製造支援系統1對與使用主體20所使用的半導體製造裝置50相關的如上所述的課題提供解決手段。即,評估主體10負責使用主體20所進行的評估作業的一部分或全部,並且亦負責材料供給主體30所供給的材料60的規格或品質性能等的事前評估。藉由此種評估主體10的存在及所提供的服務,即便為對製造製程本身不具有足夠的見解的使用主體20、及無法充分進行製造製程的品質評估的使用主體20,亦可容易地使用半導體製造裝置50來製造半導體裝置。The manufacturing support system 1 according to the present embodiment provides means for solving the above-mentioned problems related to the
又,藉由材料供給主體30,可提高可供給與供給目的地的使用主體20所使用的半導體製造裝置50相適的材料的確實性,因此可實現更穩固的供給體制。In addition, since the
評估主體10基本上包括與使用主體20所使用的半導體製造裝置50實質上相同的半導體製造裝置50、及評估裝置12。評估主體10基本上適宜為半導體製造裝置50的製造商或其關聯公司。但不限於半導體製造裝置50的製造商或其關聯公司,任意團體或個人亦可為評估主體10。The
為了對三者之間交換的資訊進行管理,可於評估主體10、使用主體20及材料供給主體30分別配置管理裝置14、管理裝置24及管理裝置34。In order to manage the information exchanged among the three, a
於評估主體10與使用主體20之間交換裝置資訊、評估資訊、製程資訊、及認定資訊。於評估主體10與材料供給主體30之間交換裝置資訊、評估資訊、製程資訊、及材料資訊。於使用主體20與材料供給主體30之間交換裝置資訊、評估資訊、製程資訊、及認定資訊。此處,對在三者之間交換的各資訊進行說明。Device information, evaluation information, process information, and certification information are exchanged between the
裝置資訊包括用於確定使用主體20使用或預定使用的半導體製造裝置50的資訊。裝置資訊可進而包括用來用於確定對象的半導體製造裝置50中所利用的可更換構件等的資訊。The device information includes information for specifying the
評估資訊包括於對象的製造條件下由對象的半導體製造裝置50使用對象的材料60時的評估結果。The evaluation information includes evaluation results when the
製程資訊包括用於確定由對象的半導體製造裝置50所執行的製造製程的資訊。典型而言,製程資訊包括對適用於對象的半導體製造裝置50的製造條件進行定義的資訊。The process information includes information for specifying the manufacturing process executed by the target
材料資訊包括與對象的材料60相關的資訊。The material information includes information related to the
認定資訊包括包含對象的半導體製造裝置50的製造製程中的要求規格。認定資訊依使用主體20而定。The certification information includes the required specifications in the manufacturing process of the target
圖2是表示由依照本實施形態的製造支援系統1所執行的處理順序的序列圖。參照圖1及圖2,對由製造支援系統1所執行的處理順序的一例進行說明。於圖2所示的例中,假定評估主體10為半導體製造裝置50的製造商的情形,並假定使用主體20導入新的半導體製造裝置50的態樣。於此種態樣中,材料供給主體30開發新導入的半導體製造裝置50所使用的材料60。FIG. 2 is a sequence diagram showing the processing procedure executed by the manufacturing support system 1 according to the present embodiment. An example of the processing procedure executed by the manufacturing support system 1 will be described with reference to FIGS. 1 and 2 . In the example shown in FIG. 2 , it is assumed that the
於材料60的開發的態樣中,材料供給主體30依照由使用主體20等提出的製造條件等進行材料60的開發(步驟S2)。材料供給主體30向評估主體10提供所開發的材料60的一部分(材料樣品)及材料資訊(步驟S4)。再者,於評估主體10可分析材料樣品的情形時,不必提供材料資訊亦可。In the aspect of development of the
評估主體10預先保持裝置資訊(用於確定使用主體20使用或預定使用的半導體製造裝置50的資訊)、及製程資訊(用於確定由半導體製造裝置50所執行的製造製程的資訊)。The
評估主體10使用由材料供給主體30提供的材料樣品進行評估(步驟S6)。更具體而言,評估主體10基於用於確定由材料供給主體30提供的材料60的資訊、與評估主體10所保持的資訊(裝置資訊及製程資訊),對材料60的合適與否進行評估。然後,評估主體10將藉由評估所獲得的評估結果與裝置資訊及製程資訊一起向材料供給主體30提供(步驟S8)。The
於材料60的開發的態樣中,反覆執行步驟S2~步驟S8的處理(※1)。評估主體10可以所述方式對不同的多種材料60分別進行評估材料60合適與否的處理。具體而言,於評估合適與否的處理中,作為一例,可使用材料60的組成比。In the aspect of development of the
針對一種或多種材料獲得評估結果後,視需要於評估主體10與材料供給主體30之間決定成為向使用主體20供給的候選的材料(步驟S10)。然後,評估主體10針對決定為候選的材料,向使用主體20提供裝置資訊、評估資訊及製程資訊(步驟S12)。同樣地,材料供給主體30針對決定為候選的材料,向使用主體20提供裝置資訊、評估資訊及製程資訊(步驟S14)。After the evaluation results are obtained for one or a plurality of materials, a candidate material to be supplied to the
再者,步驟S12中由評估主體10提供的裝置資訊、評估資訊及製程資訊與步驟S14中由材料供給主體30提供的裝置資訊、評估資訊及製程資訊基本一致。其目的在於藉由對各主體所提供的資訊的同一性進行確認而防止資訊提供的錯誤等。就簡化處理的觀點而言,可省略步驟S12及步驟S14中的任一者。Furthermore, the device information, evaluation information and process information provided by the
使用主體20參照所提供的裝置資訊、評估資訊及製程資訊,進行最終的性能確認(步驟S16)。使用主體20瞭解性能確認的內容後,向評估主體10發送認定資訊(步驟S18),並且向材料供給主體30發送認定資訊(步驟S20)。The
藉由以上處理,製造製程的事前評估結束。然後,使用主體20向評估主體10(本例中為半導體製造裝置50的製造商)定購包含認定資訊的半導體製造裝置(步驟S22),向材料供給主體30定購包含認定資訊的材料(步驟S24)。Through the above processing, the pre-evaluation of the manufacturing process is completed. Then, the
評估主體10(半導體製造裝置50的製造商)依照使用主體20的定購製造半導體製造裝置50(步驟S26),並向使用主體20交付所製造的半導體製造裝置50(步驟S28)。又,材料供給主體30依照使用主體20的定購製造材料60(步驟S30),並向使用主體20交付所製造的材料60(步驟S32)。The evaluation body 10 (manufacturer of the semiconductor manufacturing device 50 ) manufactures the
依照圖2所示的處理順序,製造製程的事前評估結束。According to the processing sequence shown in FIG. 2 , the pre-evaluation of the manufacturing process is completed.
再者,圖2表示製造製程的事前評估的處理順序,但交付半導體製造裝置50後,於使用主體20希望對製造製程重新考慮等的情形時,亦可再次執行步驟S2~步驟S20的處理。Furthermore, FIG. 2 shows the processing sequence of the pre-evaluation of the manufacturing process, but after delivery of the
〈B.評估處理〉
繼而,對評估主體10的評估處理的一例進行說明。〈B. Evaluation process〉
Next, an example of evaluation processing by the evaluation
典型而言,評估主體10為半導體製造裝置50的製造商或其關聯公司,具有與使用主體20所使用的半導體製造裝置50實質上相同的半導體製造裝置50。或者可準備與使用主體20所使用的半導體製造裝置50實質上相同的半導體製造裝置50。Typically, the
評估主體10使用由材料供給主體30提供的材料樣品,於與使用主體20使用或預定使用的半導體製造裝置50實質上相同的半導體製造裝置50中,再現使用主體20預定實施的製造製程或正實施的製造製程。藉由評估裝置12對利用所再現的製造製程製造的製品(半導體裝置)或其半製品進行評估。或亦可對所再現的製造製程對半導體製造裝置50的影響等進行評估。The
如上所述,評估主體10保持裝置資訊(用於確定使用主體20使用或預定使用的半導體製造裝置50的資訊)、及製程資訊(用於確定由半導體製造裝置50所執行的製造製程的資訊),基於用於確定由材料供給主體30提供的材料60的資訊與評估主體10所保持的資訊(裝置資訊及製程資訊),對材料60的合適與否進行評估。然後,評估主體10向材料供給主體30提供評估結果。As described above, the
利用所再現的製造製程製造的半導體裝置或其半製品的評估亦可藉由形狀觀察進行。作為評估項目,可列舉:(1)外形尺寸及翹曲量、(2)截面觀察圖像、(3)熱翹曲量變移、(4)內部觀察結果、(5)硬度測定結果等。對應於此種評估項目,作為用以評估半導體裝置或半導體裝置的半製品的品質的評估裝置12,可包括測定形狀的測定裝置、獲得截面觀察圖像的顯微鏡、用以進行內部觀察的探測裝置、用以測定硬度的硬度計中的任一者。The evaluation of the semiconductor device or its semi-finished product manufactured using the reproduced manufacturing process can also be performed by shape observation. Examples of evaluation items include (1) external dimensions and warpage, (2) cross-sectional observation images, (3) thermal warpage change, (4) internal observation results, (5) hardness measurement results, and the like. Corresponding to such evaluation items, as the
更具體而言,(1)外形尺寸及翹曲量、以及(3)熱翹曲量變移的評估使用加熱翹曲測定裝置(TSM)或超音波探測裝置(Scanning Acoustic Tomography,SAT)等測定形狀的測定裝置作為評估裝置12。(2)截面觀察圖像的評估使用光學顯微鏡或掃描式電子顯微鏡(scanning electron microscope,SEM)等作為評估裝置12。(4)內部觀察結果的評估使用超音波探測裝置或X射線透視裝置等作為評估裝置12。(5)硬度測定結果的評估使用硬度計等作為評估裝置12。More specifically, (1) external dimensions and warpage, and (3) evaluation of thermal warpage change, shape measurement using a heating warpage measurement device (TSM) or an ultrasonic detection device (Scanning Acoustic Tomography, SAT) The assay device is used as the
所再現的製造製程對半導體製造裝置50的影響的評估亦可藉由觀察半導體製造裝置50所使用的模具及治具而進行。作為評估項目,可列舉:(1)模具表面有無污垢、(2)刀片磨耗狀態、(3)刀片磨耗量等。對應於此種評估項目,作為用來對實質上相同的半導體製造裝置50的損耗進行評估的結構,亦可包括觀察裝置及探測裝置中的任一者。The influence of the reproduced manufacturing process on the
更具體而言,(1)模具表面污垢有無的評估可藉由人的目視進行,亦可使用觀察裝置等作為評估裝置12。(2)刀片磨耗狀態的評估使用超音波探測裝置或X射線透視裝置等作為評估裝置12。(3)刀片磨耗量的評估使用測定形狀的測定裝置。More specifically, (1) The evaluation of the presence or absence of dirt on the surface of the mold can be performed by human eyesight, and an observation device or the like can also be used as the
不限於所述項目,可根據任意的評估項目使用一個或多個評估裝置12。Without being limited to the items described, one or
如上所述,作為評估主體10的評估部,可包括:與使用主體20使用或預定使用的半導體製造裝置50實質上相同的半導體製造裝置50;及對藉由該實質上相同的半導體製造裝置50所製造的半導體裝置或該半導體裝置的半製品的品質、及/或該實質上相同的半導體製造裝置50的損耗進行評估的評估裝置12。As described above, the evaluation unit of the
典型而言,藉由使用半導體製造裝置50再現製造製程來進行評估,但亦可藉由模擬實現一部分或全部的評估。於藉由模擬進行評估的情形時,準備半導體製造裝置50的模型,並且產生對應於由材料供給主體30供給的材料資訊的模型,藉此可實現與對象的製造製程相關的模擬。再者,於藉由模擬進行評估的情形時,亦可不必由材料供給主體30向評估主體10提供材料樣品。Typically, the evaluation is performed by reproducing the manufacturing process using the
如上所述,作為評估主體10的評估部,可包括利用使用主體20使用或預定使用的半導體製造裝置50的模型的模擬裝置。藉由使用模擬,即便現實中無半導體製造裝置50亦可進行評估。As described above, as the evaluation section of the
〈C.資訊的詳細情況〉 繼而,對依照本實施形態的製造支援系統1中所交換的資訊的詳細情況進行說明。<C. Details of information> Next, details of information exchanged in the manufacturing support system 1 according to this embodiment will be described.
(c1:裝置資訊)
裝置資訊包括用來用於確定對象的半導體製造裝置50及所利用的可更換構件等的資訊。更具體而言,若半導體製造裝置50為模封裝置,則裝置資訊包括(1)裝置類型(型號)、及(2)模具類型(型號)等。(c1: Device Information)
The device information includes information for specifying the target
又,若半導體製造裝置50為單切裝置,則裝置資訊包括(1)裝置類型(型號)、(2)套組(品種用單元組件)的型號、(3)刀片的型號等。Also, if the
(c2:評估資訊)
評估資訊包括於對象的製造條件下由對象的半導體製造裝置50使用對象的材料60時的評估結果。更具體而言,評估資訊包括使用對象的材料60並藉由對象的半導體製造裝置50所製造的半導體裝置的品質的評估結果、及半導體製造裝置50的損耗程度的評估結果等。(c2: assessment information)
The evaluation information includes evaluation results when the
作為半導體裝置的品質的評估結果的一例,可列舉形狀觀察結果等。作為形狀觀察結果,包括:(1)半導體裝置的外形尺寸及翹曲量、(2)半導體裝置的截面觀察圖像(利用光學顯微鏡的觀察或利用掃描式電子顯微鏡(SEM)的觀察)、(3)半導體裝置的熱翹曲量變移、(4)半導體裝置的利用超音波獲得的內部觀察結果(例如,缺陷或空隙的有無等)、(5)半導體裝置的利用X射線獲得的內部觀察結果(例如,缺陷或空隙的有無等)、(6)半導體裝置的硬度測定結果等。As an example of the evaluation result of the quality of a semiconductor device, the shape observation result etc. are mentioned. The shape observation results include: (1) Outer dimensions and warpage of the semiconductor device, (2) Cross-sectional observation images of the semiconductor device (observation with an optical microscope or observation with a scanning electron microscope (SEM)), ( 3) Changes in thermal warpage of semiconductor devices, (4) Internal observation results of semiconductor devices using ultrasonic waves (for example, presence or absence of defects or voids, etc.), (5) Internal observation results of semiconductor devices using X-rays (For example, presence or absence of defects or voids, etc.), (6) Hardness measurement results of semiconductor devices, etc.
又,作為半導體製造裝置50的損耗程度的評估結果的一例,可列舉模具及治具的觀察結果等。作為模具及治具的觀察結果,包括:(1)模具表面的污垢的有無(目視)、(2)刀片磨耗狀態(利用光學顯微鏡的觀察或利用掃描式電子顯微鏡的觀察)、(3)刀片磨耗量等。Moreover, as an example of the evaluation result of the degree of wear of the
(c3:製程資訊)
製程資訊包括對適用於對象的半導體製造裝置50的製造條件進行定義的資訊。更具體而言,若半導體製造裝置50為模封裝置,則製程資訊包括:(1)模具溫度、(2)樹脂重量及偏差量、(3)預熱時間、(4)成形壓力、(5)成形輪廓(樹脂注入壓力及模具位置隨時間的變移等)等。(c3: process information)
The process information includes information defining manufacturing conditions applicable to the target
又,若半導體製造裝置50為單切裝置,則與切割製程相關的製程資訊包括:(1)轉速、(2)切割速度、(3)切割次數、(4)切削阻力、(5)冷卻水量等。In addition, if the
(c4:材料資訊)
材料資訊包括與對象的材料60相關的資訊。更具體而言,若材料60為樹脂材料,則材料資訊包括:(1)作為表示流動性的指標的螺旋流動、(2)凝膠時間、(3)玻璃轉移溫度、(4)線膨脹係數、(5)填料含量、(6)填料粒徑分佈、(7)水分含有率、(8)密度等。(c4: material information)
The material information includes information related to the
又,若材料60為基板材料,則材料資訊包括:(1)佈線鍍敷的厚度及偏差測定結果、(2)佈線阻劑的厚度及偏差測定結果等。Also, if the
(c5:認定資訊)
認定資訊包括包含對象的半導體製造裝置50的製造製程中的要求規格。更具體而言,認定資訊包括:(1)是否滿足半導體製造裝置的保證值的判定結果、(2)工序能力指數(Process Capability Index,cpk)、(3)刀片壽命預測等。(c5: Identification information)
The certification information includes the required specifications in the manufacturing process of the target
再者,所述項目為一例,可根據製造製程或材料60的種類等而於各資訊中包含任意項目。In addition, the said item is an example, and arbitrary items may be included in each piece of information according to a manufacturing process, the kind of
〈D.應用例〉
於所述說明中,主要示出適用於事前的性能評估的例,但不限於此,可進行各種應用。例如,亦可用於保證材料供給主體30所製造的材料60的品質。於所述情形時,材料供給主體30可將由評估主體10提供的評估結果與相對應的材料60建立關聯,而向使用主體20供給。〈D. Application example〉
In the description above, the example applied to the performance evaluation in advance was mainly shown, but it is not limited thereto, and various applications are possible. For example, it can also be used to ensure the quality of the material 60 manufactured by the
圖3是用來對依照本實施形態的製造支援系統1的應用例之一進行說明的示意圖。圖4是表示由依照本實施形態的製造支援系統1的應用例之一所執行的處理順序的序列圖。FIG. 3 is a schematic diagram for explaining one of application examples of the manufacturing support system 1 according to this embodiment. FIG. 4 is a sequence diagram showing the processing procedure executed by one of the application examples of the manufacturing support system 1 according to the present embodiment.
參照圖3,假定如下例:於使用主體20使用半導體製造裝置50製造半導體裝置的狀況下,評估主體10事先對材料供給主體30所供給的材料60的品質進行評估。Referring to FIG. 3 , assume an example in which the
參照圖3及圖4,於供給材料60的態樣中,材料供給主體30依照預先由使用主體20等提出的製造條件等製造材料60(步驟S52)。材料供給主體30向評估主體10提供所製造的材料60的一部分(材料樣品)及材料資訊(步驟S54)。Referring to FIGS. 3 and 4 , in the aspect of supplying the
評估主體10使用由材料供給主體30提供的材料樣品進行評估(步驟S56)。然後,評估主體10向材料供給主體30提供藉由評估所獲得的評估結果(步驟S58)。The
材料供給主體30將由評估主體10提供的評估結果隨附於所製造的材料60而供向使用主體20(步驟S60)。使用主體20確認隨附於由材料供給主體30交付的材料60中的評估結果後,用於半導體製造裝置50。The
再者,於步驟S56及步驟S58中,可僅於評估主體10獲得的評估結果合適的情形時向材料供給主體30提供評估結果。Furthermore, in step S56 and step S58 , the evaluation result may be provided to the
藉由採用如圖3及圖4所示的構造,可更確實地保證從材料供給主體30向使用主體20供給的材料60適於對象的半導體製造裝置50。By adopting the structure shown in FIGS. 3 and 4 , it is possible to ensure more reliably that the material 60 supplied from the
再者,圖3及圖4所示的品質評估例如可於每批材料60的製造中進行。Furthermore, the quality assessment shown in FIGS. 3 and 4 can be performed during the manufacture of each batch of
〈E.管理裝置〉
繼而,對分別配置於評估主體10、使用主體20及材料供給主體30的管理裝置14、管理裝置24及管理裝置34進行說明。於製造支援系統1中,本質上交換管理裝置14、管理裝置24及管理裝置34所需的資訊。<E. Management device>
Next, the
圖5是表示構成依照本實施形態的製造支援系統1的管理裝置14的裝置結構的一例的示意圖。再者,管理裝置24及管理裝置34亦與圖1所示的裝置結構相同。FIG. 5 is a schematic diagram showing an example of the device configuration of the
參照圖5,管理裝置14是使用電腦而實現,作為主要的元件,包括處理器102、主記憶體104、輸入部106、顯示部108、輸出部110、二次記憶裝置120、及通信部126。該些元件連接於內部匯流排128。Referring to Fig. 5, the
處理器102是執行管理裝置14所提供的功能所需的處理的運算主體,藉由執行儲存於二次記憶裝置120中的程式或程式模組而實現所需的功能。處理器102亦可為多核及/或多處理器,可根據所要求的負載處理能力設定所需數量的核或處理器數。The
主記憶體104提供處理器102執行程式所需的工作記憶體。主記憶體104是一次性保存所執行的程式的程式碼或工作資料的非揮發性記憶體。The
輸入部106是接收來自操作員等的操作的元件,例如使用鍵盤、滑鼠、觸控面板等來實現。顯示部118是向操作員等提示處理結果等資訊的元件,例如使用顯示器等來實現。輸出部110是將管理裝置14內的資訊有形化輸出的元件,例如使用印表機等來實現。The
二次記憶裝置120是保持部的一例,除了作業系統(未圖示)以外,還儲存資料組124,所述資料組124包括用來提供依照本實施形態的製造支援系統1中所需的功能的處理實現模組122及各種資料。典型而言,評估主體10的管理裝置14的資料組124包括認定資訊、裝置資訊及製程資訊。The
通信部126是用來與使用主體20及/或材料供給主體30進行通信的元件,例如使用有線區域網路(Local Area Network,LAN)通信介面、無線LAN通信介面、公用網路通信介面等來實現。可根據成為通信對象的使用主體20及/或材料供給主體30的數量及通信形態等安裝多種或多個通信部126。The
於所述說明中,示出於評估主體10(管理裝置14)、使用主體20(管理裝置24)及材料供給主體30(管理裝置34)之間直接交換所需的資訊的結構例,但不限於此種結構,亦可由特定的主體管理資訊。In the description above, an example of the structure in which necessary information is directly exchanged between the evaluation body 10 (management device 14 ), the user body 20 (management device 24 ), and the material supply body 30 (management device 34 ) is shown, but not Limited to this structure, information can also be managed by a specific subject.
圖6中的(A)及圖6中的(B)是表示依照本實施形態的製造支援系統1中的資料保持的安裝例的示意圖。圖6中的(A)表示評估主體10管理所需的資料的安裝例,圖6中的(B)表示材料供給主體30管理所需的資料的安裝例。(A) of FIG. 6 and (B) of FIG. 6 are schematic diagrams showing an implementation example of data storage in the manufacturing support system 1 according to the present embodiment. (A) in FIG. 6 shows an installation example of data required for management by the
參照圖6中的(A),評估主體10對與由材料供給主體30提供的材料樣品相關的評估資訊進行管理,向材料供給主體30提供用來存取所管理的評估資訊的統一資源定位符(Uniform Resource Locator,URL)等特定資訊代替評估資訊。進而,材料供給主體30向使用主體20提供由評估主體10提供的特定資訊。Referring to (A) in FIG. 6 , the
材料供給主體30及使用主體20可基於特定資訊對評估主體10所管理的評估主體進行存取。再者,亦可於對評估主體10所管理的評估資訊的存取中設置存取碼(密碼)等各種限制。The
藉由採用此種結構,可減少材料供給主體30(管理裝置34)中的計算資源,並且可簡化製造支援系統1的處理。By employing such a configuration, the calculation resources in the material supply body 30 (management device 34 ) can be reduced, and the processing of the manufacturing support system 1 can be simplified.
參照圖6中的(B),評估主體10向材料供給主體30發送與由材料供給主體30提供的材料樣品相關的評估資訊。材料供給主體30對從評估主體10接收的評估資訊進行管理。材料供給主體30向使用主體20提供用來存取自身所管理的評估資訊的URL等特定資訊。Referring to (B) in FIG. 6 , the
使用主體20可基於特定資訊對材料供給主體30所管理的評估主體進行存取。再者,亦可於對材料供給主體30所管理的評估資訊的存取中設置存取碼(密碼)等各種限制。The
藉由採用此種結構,可減少使用主體20(管理裝置24)中的計算資源,並且可簡化製造支援系統1的處理。By adopting such a configuration, the use of computing resources in the main body 20 (management device 24 ) can be reduced, and the processing of the manufacturing support system 1 can be simplified.
於所述說明中,示出分別於評估主體10、使用主體20及材料供給主體30配置管理裝置14、管理裝置24及管理裝置34的結構例,但不限於此,亦可如所謂雲端電腦般,利用如將多台電腦經由網路連結的系統的一部分實現所需的處理及功能。In the above description, an example of the structure in which the
依照本實施形態的製造支援系統1於任意計算環境下均可實現,可任意使用現實安裝的時點的公知的技術,或者依照現實安裝的國家或地區的法律等採用任意的安裝形態。本發明的技術範圍並不限定於特定的安裝形態,可包含任意的安裝形態。The manufacturing support system 1 according to this embodiment can be realized in any computing environment, and any known technology at the time of actual installation can be used arbitrarily, or any installation form can be adopted in accordance with the laws of the country or region where it is actually installed. The technical scope of the present invention is not limited to a specific mounting form, but may include arbitrary mounting forms.
〈F.優點〉 事先對目標製造製程評估半導體製造裝置及半導體製造裝置所使用的材料是否合適需要足夠的見解,且亦需要大量時間。藉由評估主體(典型而言為半導體製造裝置的製造商等)與材料供給主體聯合實施此種需要大量資源的評估處理,可進行包括半導體製造裝置及材料在內的綜合評估。<F. Advantages> Evaluating whether the semiconductor manufacturing device and the materials used in the semiconductor manufacturing device are suitable for the target manufacturing process in advance requires sufficient insights and also requires a lot of time. Comprehensive evaluation including semiconductor manufacturing devices and materials can be performed by jointly implementing such resource-intensive evaluation processing by an evaluation subject (typically, a semiconductor manufacturing device manufacturer, etc.) and a material supplier.
藉由提供可進行此種綜合評估的製造支援系統,材料供給主體可確實地適當提供與作為顧客的使用主體所希望的製造製程相適的材料。又,使用主體即便不具有足夠的見解,亦可利用評估主體的見解更早且確實地實現目標製造製程。進而,評估主體可利用自己保有的見解支援各種材料供給主體及使用主體。By providing a manufacturing support system capable of such a comprehensive evaluation, the material supplier can reliably and appropriately provide materials suitable for the manufacturing process desired by the user as a customer. Also, even if the user does not have sufficient knowledge, the knowledge of the evaluation body can be used to realize the target manufacturing process earlier and reliably. Furthermore, the assessment subject can support various material supply subjects and user subjects using their own insights.
應認為本次揭示的實施形態於所有方面為例示,並非限制性者。本發明的範圍由申請專利的範圍而非所述實施形態的說明所揭示,意在包含與申請專利的範圍同等含義及範圍內的所有變更。It should be thought that the embodiment disclosed this time is an illustration in every respect and is not restrictive. The scope of the present invention is indicated by the scope of the patent application rather than the description of the above-mentioned embodiment, and it is intended that all changes within the meaning and range equivalent to the scope of the patent application are included.
1:製造支援系統
10:評估主體
12:評估裝置
14、24、34:管理裝置
20:使用主體
30:材料供給主體
50:半導體製造裝置
60:材料
102:處理器
104:主記憶體
106:輸入部
108、118:顯示部
110:輸出部
120:二次記憶裝置
122:處理實現模組
124:資料組
126:通信部
128:內部匯流排
S2~S32、S52~S60:步驟1: Manufacturing support system
10: Evaluation subject
12:
圖1是用來對依照本實施形態的製造支援系統的概要進行說明的示意圖。 圖2是表示由依照本實施形態的製造支援系統執行的處理順序的序列圖。 圖3是用來對依照本實施形態的製造支援系統的應用例之一進行說明的示意圖。 圖4是表示由依照本實施形態的製造支援系統的應用例之一執行的處理順序的序列圖。 圖5是表示構成依照本實施形態的製造支援系統的管理裝置的裝置結構的一例的示意圖。 圖6中的(A)及圖6中的(B)是表示依照本實施形態的製造支援系統中的資料保持的安裝例的示意圖。FIG. 1 is a schematic diagram for explaining the outline of a manufacturing support system according to this embodiment. FIG. 2 is a sequence diagram showing the processing procedure executed by the manufacturing support system according to the present embodiment. Fig. 3 is a schematic diagram for explaining one of application examples of the manufacturing support system according to the present embodiment. FIG. 4 is a sequence diagram showing the processing procedure executed by one of the application examples of the manufacturing support system according to the present embodiment. FIG. 5 is a schematic diagram showing an example of a device configuration of a management device constituting the manufacturing support system according to the present embodiment. (A) of FIG. 6 and (B) of FIG. 6 are schematic diagrams showing an implementation example of data storage in the manufacturing support system according to this embodiment.
1:製造支援系統1: Manufacturing support system
10:評估主體10: Evaluation subject
12:評估裝置12:Evaluation device
14、24、34:管理裝置14, 24, 34: management device
20:使用主體20: Using principals
30:材料供給主體30:Material supply subject
50:半導體製造裝置50:Semiconductor manufacturing equipment
60:材料60: material
Claims (7)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020085969A JP7291666B2 (en) | 2020-05-15 | 2020-05-15 | Manufacturing support system and manufacturing support method |
JP2020-085969 | 2020-05-15 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW202145126A TW202145126A (en) | 2021-12-01 |
TWI787790B true TWI787790B (en) | 2022-12-21 |
Family
ID=78510602
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW110114229A TWI787790B (en) | 2020-05-15 | 2021-04-21 | Manufacturing support system and manufacturing support method |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP7291666B2 (en) |
KR (1) | KR20230009943A (en) |
CN (1) | CN115315778A (en) |
TW (1) | TWI787790B (en) |
WO (1) | WO2021229860A1 (en) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001356148A (en) * | 2000-06-14 | 2001-12-26 | Sony Corp | Part reliability information collecting method, part reliability information storage device, part reliability information providing device, and part reliability information providing method |
JP2002189896A (en) * | 2000-12-20 | 2002-07-05 | Hitachi Chem Co Ltd | System for providing semiconductor construction material |
CN1848162A (en) * | 2005-03-30 | 2006-10-18 | 株式会社日立制作所 | Method, system and program for evaluating reliability on component |
CN104112178A (en) * | 2013-04-17 | 2014-10-22 | 株式会社日立制作所 | Apparatus And Method For Evaluation Of Engineering Level |
TWI472887B (en) * | 2008-03-08 | 2015-02-11 | Tokyo Electron Ltd | Semiconductor tool system, method for distributing a product asset, and apparatus for semiconductor processing |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003259015A (en) | 2002-02-28 | 2003-09-12 | Hitachi Ltd | Electronic conference method and electronic conference system about semiconductor device process utilizing communication line or semiconductor manufacturing apparatus performance |
-
2020
- 2020-05-15 JP JP2020085969A patent/JP7291666B2/en active Active
-
2021
- 2021-01-28 WO PCT/JP2021/002993 patent/WO2021229860A1/en active Application Filing
- 2021-01-28 KR KR1020227043137A patent/KR20230009943A/en unknown
- 2021-01-28 CN CN202180022986.0A patent/CN115315778A/en active Pending
- 2021-04-21 TW TW110114229A patent/TWI787790B/en active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001356148A (en) * | 2000-06-14 | 2001-12-26 | Sony Corp | Part reliability information collecting method, part reliability information storage device, part reliability information providing device, and part reliability information providing method |
JP2002189896A (en) * | 2000-12-20 | 2002-07-05 | Hitachi Chem Co Ltd | System for providing semiconductor construction material |
CN1848162A (en) * | 2005-03-30 | 2006-10-18 | 株式会社日立制作所 | Method, system and program for evaluating reliability on component |
TWI472887B (en) * | 2008-03-08 | 2015-02-11 | Tokyo Electron Ltd | Semiconductor tool system, method for distributing a product asset, and apparatus for semiconductor processing |
CN104112178A (en) * | 2013-04-17 | 2014-10-22 | 株式会社日立制作所 | Apparatus And Method For Evaluation Of Engineering Level |
Also Published As
Publication number | Publication date |
---|---|
JP7291666B2 (en) | 2023-06-15 |
TW202145126A (en) | 2021-12-01 |
CN115315778A (en) | 2022-11-08 |
KR20230009943A (en) | 2023-01-17 |
JP2021180286A (en) | 2021-11-18 |
WO2021229860A1 (en) | 2021-11-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Kuo et al. | Reliability, yield, and stress burn-in: a unified approach for microelectronics systems manufacturing & software development | |
TW580624B (en) | Product development management system, product development management method, product reliability judging system, and product reliability judging method | |
Kang et al. | A new supplier performance evaluation model: A case study of integrated circuit (IC) packaging companies | |
US7945410B2 (en) | Semiconductor device yield prediction system and method | |
TWI402762B (en) | Method for bin-based control | |
US8082055B2 (en) | Method for a bin ratio forecast at new tape out stage | |
US20090144686A1 (en) | Method and apparatus for monitoring marginal layout design rules | |
US20090265137A1 (en) | Computer-based methods and systems for failure analysis | |
TWI787790B (en) | Manufacturing support system and manufacturing support method | |
US20090082897A1 (en) | Method and apparatus for generating metrology tags to allow automatic metrology recipe generation | |
Verna et al. | Defects-per-unit control chart for assembled products based on defect prediction models | |
Doshi et al. | Overview of automotive core tools: Applications and benefits | |
Shrouti et al. | Root cause analysis of product service failure using computer experimentation technique | |
Morris et al. | Mil-hdbk-217-a favorite target | |
Shiau | Quick decision-making support for inspection allocation planning with rapidly changing customer requirements | |
JP2004207679A (en) | Automated management system | |
Pradhan et al. | Performance characterization of complex manufacturing systems with general distributions and job failures | |
Kock et al. | Lumped parameter modelling of the litho cell | |
JP2001125945A (en) | Method for aiding design of wired board, design aiding tool, design aiding system, and information storage medium | |
Wilcox et al. | Design for manufacturability: a key to semiconductor manufacturing excellence | |
Liu et al. | Design workflow to facilitate support removal in Metal Powder Bed Fusion | |
Aligula et al. | International Journal of Lean Six Sigma | |
JP2002353084A (en) | Information processing system and information processing method | |
Meixner | Enhancing yield learning on SoC designs by tracking IP manufacturability | |
Columbus | Seven Ways Gage Management |