TW202145126A - Manufacturing assist system and manufacturing assist method - Google Patents

Manufacturing assist system and manufacturing assist method Download PDF

Info

Publication number
TW202145126A
TW202145126A TW110114229A TW110114229A TW202145126A TW 202145126 A TW202145126 A TW 202145126A TW 110114229 A TW110114229 A TW 110114229A TW 110114229 A TW110114229 A TW 110114229A TW 202145126 A TW202145126 A TW 202145126A
Authority
TW
Taiwan
Prior art keywords
evaluation
information
semiconductor
semiconductor manufacturing
manufacturing
Prior art date
Application number
TW110114229A
Other languages
Chinese (zh)
Other versions
TWI787790B (en
Inventor
東山凜香
早坂昇
Original Assignee
日商Towa股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商Towa股份有限公司 filed Critical 日商Towa股份有限公司
Publication of TW202145126A publication Critical patent/TW202145126A/en
Application granted granted Critical
Publication of TWI787790B publication Critical patent/TWI787790B/en

Links

Images

Classifications

    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00Programme-control systems
    • G05B19/02Programme-control systems electric
    • G05B19/418Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06QINFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q10/00Administration; Management
    • G06Q10/06Resources, workflows, human or project management; Enterprise or organisation planning; Enterprise or organisation modelling
    • G06Q10/063Operations research, analysis or management
    • G06Q10/0639Performance analysis of employees; Performance analysis of enterprise or organisation operations
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06QINFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q50/00Information and communication technology [ICT] specially adapted for implementation of business processes of specific business sectors, e.g. utilities or tourism
    • G06Q50/04Manufacturing
    • GPHYSICS
    • G16INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR SPECIFIC APPLICATION FIELDS
    • G16YINFORMATION AND COMMUNICATION TECHNOLOGY SPECIALLY ADAPTED FOR THE INTERNET OF THINGS [IoT]
    • G16Y10/00Economic sectors
    • G16Y10/25Manufacturing
    • GPHYSICS
    • G16INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR SPECIFIC APPLICATION FIELDS
    • G16YINFORMATION AND COMMUNICATION TECHNOLOGY SPECIALLY ADAPTED FOR THE INTERNET OF THINGS [IoT]
    • G16Y20/00Information sensed or collected by the things
    • G16Y20/20Information sensed or collected by the things relating to the thing itself
    • GPHYSICS
    • G16INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR SPECIFIC APPLICATION FIELDS
    • G16YINFORMATION AND COMMUNICATION TECHNOLOGY SPECIALLY ADAPTED FOR THE INTERNET OF THINGS [IoT]
    • G16Y40/00IoT characterised by the purpose of the information processing
    • G16Y40/20Analytics; Diagnosis
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/30Computing systems specially adapted for manufacturing

Landscapes

  • Engineering & Computer Science (AREA)
  • Business, Economics & Management (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Human Resources & Organizations (AREA)
  • Economics (AREA)
  • Strategic Management (AREA)
  • General Business, Economics & Management (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Development Economics (AREA)
  • Quality & Reliability (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Theoretical Computer Science (AREA)
  • Tourism & Hospitality (AREA)
  • Marketing (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Computing Systems (AREA)
  • Entrepreneurship & Innovation (AREA)
  • Educational Administration (AREA)
  • General Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Primary Health Care (AREA)
  • Game Theory and Decision Science (AREA)
  • Operations Research (AREA)
  • Biomedical Technology (AREA)
  • Accounting & Taxation (AREA)
  • General Factory Administration (AREA)
  • Management, Administration, Business Operations System, And Electronic Commerce (AREA)
  • Air Bags (AREA)

Abstract

A manufacturing assist system for assisting manufacturing using a semiconductor manufacturing device, comprising: a holding unit that is disposed in an evaluation body and holds information specifying a semiconductor manufacturing device used or to be used in a use body and information specifying a manufacturing process to be executed by the semiconductor manufacturing device; an evaluation unit that is disposed in the evaluation body and evaluates the appropriateness of a material provided from a material supply body for supplying a material used by a semiconductor manufacturing device, on the basis of information specifying the material and information held by the holding unit; and an evaluation result providing unit for providing an evaluation result by the evaluation unit to the material supply body.

Description

製造支援系統以及製造支援方法Manufacturing support system and manufacturing support method

本發明是有關於一種對使用半導體製造裝置的製造進行支援的製造支援系統及製造支援方法。The present invention relates to a manufacturing support system and a manufacturing support method for supporting manufacturing using a semiconductor manufacturing apparatus.

於製造半導體裝置時,提出有一種藉由事先的性能評估等縮短準備時間的各種方法。作為此種方法之一,日本專利特開2003-259015號公報(專利文獻1)揭示一種電子會議系統,該電子會議系統中作為用以銷售半導體製造裝置的事前活動,半導體製造裝置供應商的製程技術人員與半導體設備製造商(顧客)的製程技術人員無需互相去往對方處,即可實現關於半導體設備製程技術人員或半導體製造裝置性能的會議。 [現有技術文獻] [專利文獻]When manufacturing a semiconductor device, various methods have been proposed for shortening the preparation time by performing performance evaluation in advance or the like. As one of such methods, Japanese Unexamined Patent Application Publication No. 2003-259015 (Patent Document 1) discloses an electronic conference system in which a process of a supplier of semiconductor manufacturing equipment is used as a prior activity for selling semiconductor manufacturing equipment. Technicians and process technicians of semiconductor equipment manufacturers (customers) can conduct meetings about the performance of semiconductor equipment process technicians or semiconductor manufacturing equipment without having to travel to each other. [Prior Art Literature] [Patent Literature]

[專利文獻1]日本專利特開2003-259015號公報[Patent Document 1] Japanese Patent Laid-Open No. 2003-259015

[發明所欲解決之課題] 所述日本專利特開2003-259015號公報(專利文獻1)所揭示的電子會議系統是假定了用來銷售半導體製造裝置的事前活動,使用由半導體設備製造商提供的樣品事先對性能進行評估。[The problem to be solved by the invention] The electronic conference system disclosed in Japanese Patent Laid-Open No. 2003-259015 (Patent Document 1) assumes a prior activity for selling semiconductor manufacturing equipment, and evaluates the performance in advance using samples provided by semiconductor equipment manufacturers.

然而,於實際的半導體裝置的製造製程中,由於使用由材料製造商等提供的各種材料,故而若半導體設備製造商的製程技術人員不具有包括材料選擇在內的知識,則未必能夠製造應有品質的半導體裝置。However, in the actual manufacturing process of semiconductor devices, since various materials provided by material manufacturers are used, if the process technicians of the semiconductor equipment manufacturers do not have the knowledge including material selection, they may not be able to manufacture the desired materials. quality semiconductor devices.

本發明的目的在於提供一種對使用此種半導體製造裝置的半導體裝置的製造進行支援的新構造。 [解決課題之手段]An object of the present invention is to provide a new structure that supports the manufacture of a semiconductor device using such a semiconductor manufacturing apparatus. [Means of Solving Problems]

根據本發明的一態樣,提供一種對使用半導體製造裝置的製造進行支援的製造支援系統。製造支援系統包括:保持部,配置於評估主體,保持用於確定由使用主體使用或預定使用的半導體製造裝置的資訊、及用於確定由該半導體製造裝置執行的製造製程的資訊;評估部,配置於評估主體,基於用於確定由供給半導體製造裝置所使用的材料的材料供給主體所提供的該材料的資訊、與由保持部保持的資訊,對該材料的合適與否進行評估;及評估結果提供部,向材料供給主體提供評估部獲得的評估結果。According to one aspect of the present invention, there is provided a manufacturing support system that supports manufacturing using a semiconductor manufacturing apparatus. The manufacturing support system includes: a holding unit, which is arranged in the evaluation body, and holds information for identifying a semiconductor manufacturing apparatus used or intended to be used by the user body, and information for identifying a manufacturing process performed by the semiconductor manufacturing apparatus; and the evaluating unit, It is arranged in the evaluation body to evaluate the suitability of the material based on the information provided by the material supply body for specifying the material used in the semiconductor manufacturing apparatus and the information held by the holding unit; and the evaluation The result providing unit provides the material supply body with the evaluation result obtained by the evaluation unit.

根據本發明的其他態樣,提供一種對使用半導體製造裝置的製造進行支援的製造支援方法。製造支援方法包括:配置於評估主體的保持部保持用於確定由使用主體使用或預定使用的半導體製造裝置的資訊、及用於確定由該半導體製造裝置執行的製造製程的資訊的步驟,於評估主體中,基於用於確定由供給半導體製造裝置所使用的材料的材料供給主體所提供的該材料的資訊、與由保持部保持的資訊,對該材料的合適與否進行評估的步驟;及向材料供給主體提供評估的步驟所獲得的評估結果的步驟。 [發明的效果]According to another aspect of the present invention, a manufacturing support method for supporting manufacturing using a semiconductor manufacturing apparatus is provided. The manufacturing support method includes the step of holding information for specifying a semiconductor manufacturing apparatus used or intended to be used by a user body and information for specifying a manufacturing process performed by the semiconductor manufacturing apparatus in a holding portion disposed in the evaluation body, and performing the evaluation in the evaluation In the main body, a step of evaluating the suitability of the material based on the information provided by the material supply main body for specifying the material used in the semiconductor manufacturing apparatus and the information held by the holding unit; and The step of providing the evaluation result obtained in the step of evaluating by the material supplying body. [Effect of invention]

本發明可提供一種對使用半導體製造裝置的半導體裝置的製造進行支援的新構造。The present invention can provide a new structure for supporting the manufacture of a semiconductor device using a semiconductor manufacturing apparatus.

參照圖式對本發明的實施形態進行詳細說明。再者,對圖中的相同或相當部分標註相同符號,不再重複其說明。Embodiments of the present invention will be described in detail with reference to the drawings. In addition, the same symbols are attached to the same or corresponding parts in the figures, and the description thereof will not be repeated.

〈A.製造支援系統的結構及處理的概要〉 首先,對依照本實施形態的製造支援系統1的結構及製造支援系統1中的處理的概要進行說明。製造支援系統1對使用半導體製造裝置的製造進行支援。於以下說明中,主要對半導體製造裝置所使用的各種材料的供給進行說明,但依照本實施形態的製造支援系統1並不限於該些範圍。<A. Outline of the structure and processing of the manufacturing support system> First, the configuration of the manufacturing support system 1 according to the present embodiment and the outline of the processing in the manufacturing support system 1 will be described. The manufacturing support system 1 supports manufacturing using a semiconductor manufacturing apparatus. In the following description, the supply of various materials used in the semiconductor manufacturing apparatus will be mainly described, but the manufacturing support system 1 according to the present embodiment is not limited to these ranges.

圖1是用來對依照本實施形態的製造支援系統1的概要進行說明的示意圖。參照圖1,製造支援系統1主要關於使用半導體製造裝置50的一個或多個使用主體20、供給半導體製造裝置50所使用的材料60的一個或多個材料供給主體30、及事先對材料供給主體30所供給的材料60的合適與否進行評估的評估主體10。FIG. 1 is a schematic diagram for explaining the outline of the manufacturing support system 1 according to the present embodiment. Referring to FIG. 1 , the manufacturing support system 1 mainly relates to one or more use bodies 20 using a semiconductor manufacturing apparatus 50 , one or more material supply bodies 30 supplying a material 60 used by the semiconductor manufacturing apparatus 50 , and a material supply body in advance 30 The evaluation body 10 that evaluates the suitability of the supplied material 60 .

於圖1中,對在評估主體10與作為使用主體20之一的「使用主體X」之間交換的資訊標註「X」,對在評估主體10與作為材料供給主體30之一的「材料供給主體A」之間、及「使用主體X」與「材料供給主體A」之間交換的資訊標註「A」。例如,關於如「裝置資訊X」與「裝置資訊A」般名稱相同但「X」或「A」的符號不同的資訊,可為內容相同的資訊,亦可為內容不同的資訊。以下的圖2~圖4中亦相同。In FIG. 1 , the information exchanged between the evaluation main body 10 and the “using main body X” which is one of the using main bodies 20 is marked with “X”, and the information exchanged between the evaluation main body 10 and the “material supplying body X” which is one of the material supplying main bodies 30 is marked with “X”. Information exchanged between entities A" and between "using entity X" and "material supply entity A" is marked with "A". For example, information with the same name as "device information X" and "device information A" but different symbols of "X" or "A" may be information with the same content or information with different content. The same applies to the following FIGS. 2 to 4 .

於本說明書中,使用主體20是包含以任意形態使用半導體製造裝置50的使用者在內的用語,例如包含半導體製造商、半導體設備製造商、封裝廠(僅承包半導體製造中的封裝組裝工序的企業)、委外封裝測試(Out-Sourced Assembly and Testing,OSAT)(從事半導體受託封裝、測試的企業)、鑄造工場(專門從事半導體晶片的製造的企業)等。In this specification, the user body 20 is a term that includes a user who uses the semiconductor manufacturing apparatus 50 in any form, and includes, for example, a semiconductor manufacturer, a semiconductor equipment manufacturer, and a packaging factory (which only undertakes the packaging and assembly process in semiconductor manufacturing). Enterprises), Out-Sourced Assembly and Testing (OSAT) (enterprises engaged in entrusted packaging and testing of semiconductors), foundries (enterprises specializing in the manufacture of semiconductor wafers), etc.

於本說明書中,「材料供給主體」包含製造及/或銷售半導體製造裝置50所使用的任意材料60的任意主體,是與「評估主體10」及「使用主體20」不同的主體。In this specification, the "material supply body" includes any body that manufactures and/or sells any material 60 used in the semiconductor manufacturing apparatus 50, and is a body different from the "evaluation body 10" and the "use body 20".

例如,作為半導體製造裝置50,假定將包含半導體晶片的電子組件進行樹脂密封的模封裝置、及將包含半導體晶片的電子組件進行單片化的單切裝置。此種樹脂密封裝置是藉由樹脂密封而安裝於基板(引線框架、印刷基板、陶瓷製基板、金屬製基板、玻璃製基板、半導體製基板、樹脂製基板等)上的半導體晶片。材料供給主體30供給密封半導體晶片的樹脂或基板作為材料60。半導體製造裝置50所使用的材料60不限於此種樹脂或基板,包括與半導體製造裝置50的製造製程相關的任意耗材。For example, as the semiconductor manufacturing apparatus 50, a mold sealing apparatus for resin-sealing an electronic component including a semiconductor wafer, and a singulation apparatus for singulation of an electronic component including a semiconductor wafer are assumed. Such a resin sealing device is a semiconductor wafer mounted on a substrate (a lead frame, a printed circuit board, a ceramic substrate, a metal substrate, a glass substrate, a semiconductor substrate, a resin substrate, etc.) by resin sealing. The material supply main body 30 supplies a resin or a substrate for sealing the semiconductor wafer as the material 60 . The material 60 used by the semiconductor manufacturing apparatus 50 is not limited to such resins or substrates, and includes any consumables related to the manufacturing process of the semiconductor manufacturing apparatus 50 .

使用主體20使用材料供給主體30所供給的材料60,藉由半導體製造裝置50製造半導體裝置。使用主體20考慮自身的半導體製造裝置50的製造製程等,指定應對材料供給主體30供給的材料60的規格或品質性能等。材料供給主體30供給滿足所指定的規格及品質性能的材料60。The semiconductor device is manufactured by the semiconductor manufacturing apparatus 50 using the material 60 supplied from the material supplying body 30 using the main body 20 . The use body 20 specifies the specifications, quality performance, etc. of the material 60 supplied by the material supply body 30 in consideration of the manufacturing process of the semiconductor manufacturing apparatus 50 and the like thereof. The material supply main body 30 supplies the material 60 satisfying the specified specifications and quality properties.

然而,未必所有使用主體20均對製造製程有足夠的見解。又,於新導入的半導體製造裝置50的初始調整階段,也發生以下作業,即一面反複試誤一面將製造製程最佳化,同時決定所使用的材料60的規格或品質性能等。However, not all users 20 have sufficient insight into the manufacturing process. In addition, in the initial adjustment stage of the newly introduced semiconductor manufacturing apparatus 50 , the following work is performed to optimize the manufacturing process while repeating trial and error, and to determine the specifications and quality performance of the material 60 to be used.

於製造製程的最佳化時,需要使用評估裝置對藉由半導體製造裝置50所製造的半導體裝置或其半製品進行評估。然而,未必所有使用主體20均保有評估裝置,特別是伴隨所製造的半導體裝置的微細化等,需要更高性能的評估裝置。又,亦可能存在即便保有評估裝置亦無法對製造製程恰當地反饋從評估裝置輸出的評估結果的使用主體20。In the optimization of the manufacturing process, it is necessary to use an evaluation apparatus to evaluate the semiconductor device or its semi-finished product manufactured by the semiconductor manufacturing apparatus 50 . However, it is not always necessary for all of the user bodies 20 to have an evaluation device, and in particular, with the miniaturization of the manufactured semiconductor device and the like, a higher-performance evaluation device is required. In addition, there may be a user body 20 that cannot properly feed back the evaluation result output from the evaluation device to the manufacturing process even if the evaluation device is retained.

依照本實施形態的製造支援系統1對與使用主體20所使用的半導體製造裝置50相關的如上所述的課題提供解決手段。即,評估主體10負責使用主體20所進行的評估作業的一部分或全部,並且亦負責材料供給主體30所供給的材料60的規格或品質性能等的事前評估。藉由此種評估主體10的存在及所提供的服務,即便為對製造製程本身不具有足夠的見解的使用主體20、及無法充分進行製造製程的品質評估的使用主體20,亦可容易地使用半導體製造裝置50來製造半導體裝置。The manufacturing support system 1 according to the present embodiment provides means for solving the above-described problems related to the semiconductor manufacturing apparatus 50 used in the use body 20 . That is, the evaluation body 10 is in charge of a part or all of the evaluation work performed using the main body 20 , and is also responsible for pre-evaluation of the specifications, quality performance, etc. of the material 60 supplied by the material supply body 30 . The existence of the evaluation body 10 and the services provided can be easily used even by the user body 20 that does not have sufficient knowledge of the manufacturing process itself, and the user body 20 that cannot sufficiently evaluate the quality of the manufacturing process. The semiconductor manufacturing apparatus 50 manufactures a semiconductor device.

又,藉由材料供給主體30,可提高可供給與供給目的地的使用主體20所使用的半導體製造裝置50相適的材料的確實性,因此可實現更穩固的供給體制。In addition, the material supply body 30 can improve the reliability of supplying a material suitable for the semiconductor manufacturing apparatus 50 used by the user body 20 of the supply destination, so that a more stable supply system can be realized.

評估主體10基本上包括與使用主體20所使用的半導體製造裝置50實質上相同的半導體製造裝置50、及評估裝置12。評估主體10基本上適宜為半導體製造裝置50的製造商或其關聯公司。但不限於半導體製造裝置50的製造商或其關聯公司,任意團體或個人亦可為評估主體10。The evaluation main body 10 basically includes the semiconductor production apparatus 50 that is substantially the same as the semiconductor production apparatus 50 used for the main body 20 , and the evaluation apparatus 12 . The evaluation subject 10 is basically suitably the manufacturer of the semiconductor manufacturing apparatus 50 or its affiliates. However, it is not limited to the manufacturer of the semiconductor manufacturing apparatus 50 or its affiliates, and any group or individual may also be the evaluation subject 10 .

為了對三者之間交換的資訊進行管理,可於評估主體10、使用主體20及材料供給主體30分別配置管理裝置14、管理裝置24及管理裝置34。In order to manage the information exchanged between the three, a management device 14 , a management device 24 and a management device 34 can be configured in the evaluation main body 10 , the user main body 20 and the material supply main body 30 , respectively.

於評估主體10與使用主體20之間交換裝置資訊、評估資訊、製程資訊、及認定資訊。於評估主體10與材料供給主體30之間交換裝置資訊、評估資訊、製程資訊、及材料資訊。於使用主體20與材料供給主體30之間交換裝置資訊、評估資訊、製程資訊、及認定資訊。此處,對在三者之間交換的各資訊進行說明。Device information, evaluation information, process information, and certification information are exchanged between the evaluation body 10 and the user body 20 . Device information, evaluation information, process information, and material information are exchanged between the evaluation body 10 and the material supply body 30 . Device information, evaluation information, process information, and certification information are exchanged between the user body 20 and the material supply body 30 . Here, each piece of information exchanged between the three will be described.

裝置資訊包括用於確定使用主體20使用或預定使用的半導體製造裝置50的資訊。裝置資訊可進而包括用來用於確定對象的半導體製造裝置50中所利用的可更換構件等的資訊。The device information includes information for identifying the semiconductor manufacturing device 50 used or scheduled to be used by the user body 20 . The device information may further include information used to identify replaceable components and the like utilized in the target semiconductor manufacturing device 50 .

評估資訊包括於對象的製造條件下由對象的半導體製造裝置50使用對象的材料60時的評估結果。The evaluation information includes evaluation results when the object's material 60 is used by the object's semiconductor manufacturing apparatus 50 under the object's manufacturing conditions.

製程資訊包括用於確定由對象的半導體製造裝置50所執行的製造製程的資訊。典型而言,製程資訊包括對適用於對象的半導體製造裝置50的製造條件進行定義的資訊。The process information includes information for identifying the manufacturing process performed by the target semiconductor manufacturing apparatus 50 . Typically, the process information includes information that defines the manufacturing conditions applicable to the semiconductor manufacturing apparatus 50 of the object.

材料資訊包括與對象的材料60相關的資訊。The material information includes information related to the material 60 of the object.

認定資訊包括包含對象的半導體製造裝置50的製造製程中的要求規格。認定資訊依使用主體20而定。The certification information includes the required specification in the manufacturing process of the semiconductor manufacturing apparatus 50 including the target. The identification information depends on the use subject 20 .

圖2是表示由依照本實施形態的製造支援系統1所執行的處理順序的序列圖。參照圖1及圖2,對由製造支援系統1所執行的處理順序的一例進行說明。於圖2所示的例中,假定評估主體10為半導體製造裝置50的製造商的情形,並假定使用主體20導入新的半導體製造裝置50的態樣。於此種態樣中,材料供給主體30開發新導入的半導體製造裝置50所使用的材料60。FIG. 2 is a sequence diagram showing a processing procedure executed by the manufacturing support system 1 according to the present embodiment. 1 and 2 , an example of the processing sequence executed by the manufacturing support system 1 will be described. In the example shown in FIG. 2 , it is assumed that the evaluation main body 10 is the manufacturer of the semiconductor manufacturing apparatus 50 , and a new semiconductor manufacturing apparatus 50 is introduced using the main body 20 . In this aspect, the material supply body 30 develops the material 60 used in the newly introduced semiconductor manufacturing apparatus 50 .

於材料60的開發的態樣中,材料供給主體30依照由使用主體20等提出的製造條件等進行材料60的開發(步驟S2)。材料供給主體30向評估主體10提供所開發的材料60的一部分(材料樣品)及材料資訊(步驟S4)。再者,於評估主體10可分析材料樣品的情形時,不必提供材料資訊亦可。In the aspect of the development of the material 60 , the material supply body 30 develops the material 60 in accordance with the manufacturing conditions and the like proposed by the use body 20 and the like (step S2 ). The material supply main body 30 supplies a part (material sample) and material information of the developed material 60 to the evaluation main body 10 (step S4 ). Furthermore, when evaluating the situation that the main body 10 can analyze the material sample, it is not necessary to provide material information.

評估主體10預先保持裝置資訊(用於確定使用主體20使用或預定使用的半導體製造裝置50的資訊)、及製程資訊(用於確定由半導體製造裝置50所執行的製造製程的資訊)。The evaluation body 10 previously holds device information (information for determining the semiconductor manufacturing apparatus 50 used or intended to be used by the use body 20 ) and process information (information for determining the manufacturing process performed by the semiconductor manufacturing apparatus 50 ).

評估主體10使用由材料供給主體30提供的材料樣品進行評估(步驟S6)。更具體而言,評估主體10基於用於確定由材料供給主體30提供的材料60的資訊、與評估主體10所保持的資訊(裝置資訊及製程資訊),對材料60的合適與否進行評估。然後,評估主體10將藉由評估所獲得的評估結果與裝置資訊及製程資訊一起向材料供給主體30提供(步驟S8)。The evaluation body 10 performs evaluation using the material samples provided by the material supply body 30 (step S6 ). More specifically, the evaluation body 10 evaluates the suitability of the material 60 based on the information for identifying the material 60 provided by the material supply body 30 and the information (device information and process information) held by the evaluation body 10 . Then, the evaluation main body 10 provides the evaluation result obtained by the evaluation to the material supply main body 30 together with the device information and the process information (step S8 ).

於材料60的開發的態樣中,反覆執行步驟S2~步驟S8的處理(※1)。評估主體10可以所述方式對不同的多種材料60分別進行評估材料60合適與否的處理。具體而言,於評估合適與否的處理中,作為一例,可使用材料60的組成比。In the aspect of the development of the material 60, the process (*1) of step S2 - step S8 is repeatedly performed. The evaluation main body 10 may perform the process of evaluating whether the materials 60 are suitable or not for different kinds of materials 60 in the manner described above. Specifically, in the process of evaluating suitability, the composition ratio of the material 60 can be used as an example.

針對一種或多種材料獲得評估結果後,視需要於評估主體10與材料供給主體30之間決定成為向使用主體20供給的候選的材料(步驟S10)。然後,評估主體10針對決定為候選的材料,向使用主體20提供裝置資訊、評估資訊及製程資訊(步驟S12)。同樣地,材料供給主體30針對決定為候選的材料,向使用主體20提供裝置資訊、評估資訊及製程資訊(步驟S14)。After obtaining the evaluation results for one or more materials, as necessary, a material to be a candidate to be supplied to the user body 20 is determined between the evaluation body 10 and the material supply body 30 (step S10 ). Then, the evaluation body 10 provides device information, evaluation information, and process information to the user body 20 for the material determined as a candidate (step S12 ). Similarly, the material supply body 30 provides device information, evaluation information, and process information to the user body 20 for the material determined as a candidate (step S14 ).

再者,步驟S12中由評估主體10提供的裝置資訊、評估資訊及製程資訊與步驟S14中由材料供給主體30提供的裝置資訊、評估資訊及製程資訊基本一致。其目的在於藉由對各主體所提供的資訊的同一性進行確認而防止資訊提供的錯誤等。就簡化處理的觀點而言,可省略步驟S12及步驟S14中的任一者。Furthermore, the device information, evaluation information and process information provided by the evaluation main body 10 in step S12 are basically the same as the device information, evaluation information and process information provided by the material supply main body 30 in step S14. The purpose of this is to prevent errors in the provision of information by confirming the identity of the information provided by each subject. From the viewpoint of simplifying the processing, either of step S12 and step S14 may be omitted.

使用主體20參照所提供的裝置資訊、評估資訊及製程資訊,進行最終的性能確認(步驟S16)。使用主體20瞭解性能確認的內容後,向評估主體10發送認定資訊(步驟S18),並且向材料供給主體30發送認定資訊(步驟S20)。The use main body 20 refers to the provided device information, evaluation information and process information to perform final performance confirmation (step S16 ). After the user body 20 understands the content of the performance confirmation, the certification information is sent to the evaluation body 10 (step S18 ), and the certification information is sent to the material supply body 30 (step S20 ).

藉由以上處理,製造製程的事前評估結束。然後,使用主體20向評估主體10(本例中為半導體製造裝置50的製造商)定購包含認定資訊的半導體製造裝置(步驟S22),向材料供給主體30定購包含認定資訊的材料(步驟S24)。With the above processing, the pre-assessment of the manufacturing process is completed. Then, the use body 20 orders the semiconductor manufacturing apparatus including the certification information from the evaluation body 10 (in this example, the manufacturer of the semiconductor manufacturing apparatus 50 ) (step S22 ), and orders the material including the certification information from the material supply body 30 (step S24 ) .

評估主體10(半導體製造裝置50的製造商)依照使用主體20的定購製造半導體製造裝置50(步驟S26),並向使用主體20交付所製造的半導體製造裝置50(步驟S28)。又,材料供給主體30依照使用主體20的定購製造材料60(步驟S30),並向使用主體20交付所製造的材料60(步驟S32)。The evaluation body 10 (the manufacturer of the semiconductor manufacturing apparatus 50 ) manufactures the semiconductor manufacturing apparatus 50 according to the order of the use body 20 (step S26 ), and delivers the manufactured semiconductor manufacturing apparatus 50 to the use body 20 (step S28 ). Moreover, the material supply main body 30 manufactures the material 60 according to the order of the use body 20 (step S30 ), and delivers the manufactured material 60 to the use body 20 (step S32 ).

依照圖2所示的處理順序,製造製程的事前評估結束。According to the processing sequence shown in FIG. 2 , the pre-assessment of the manufacturing process ends.

再者,圖2表示製造製程的事前評估的處理順序,但交付半導體製造裝置50後,於使用主體20希望對製造製程重新考慮等的情形時,亦可再次執行步驟S2~步驟S20的處理。2 shows the processing procedure of the pre-assessment of the manufacturing process, but after the semiconductor manufacturing apparatus 50 is delivered, when the user body 20 wishes to reconsider the manufacturing process, the processing of Step S2 to Step S20 may be performed again.

〈B.評估處理〉 繼而,對評估主體10的評估處理的一例進行說明。<B. Evaluation Processing> Next, an example of evaluation processing by the evaluation body 10 will be described.

典型而言,評估主體10為半導體製造裝置50的製造商或其關聯公司,具有與使用主體20所使用的半導體製造裝置50實質上相同的半導體製造裝置50。或者可準備與使用主體20所使用的半導體製造裝置50實質上相同的半導體製造裝置50。Typically, the evaluation body 10 is a manufacturer of the semiconductor manufacturing apparatus 50 or an affiliate thereof, and has a semiconductor manufacturing apparatus 50 that is substantially the same as the semiconductor manufacturing apparatus 50 used by the use body 20 . Alternatively, a semiconductor manufacturing apparatus 50 that is substantially the same as the semiconductor manufacturing apparatus 50 used for the main body 20 may be prepared.

評估主體10使用由材料供給主體30提供的材料樣品,於與使用主體20使用或預定使用的半導體製造裝置50實質上相同的半導體製造裝置50中,再現使用主體20預定實施的製造製程或正實施的製造製程。藉由評估裝置12對利用所再現的製造製程製造的製品(半導體裝置)或其半製品進行評估。或亦可對所再現的製造製程對半導體製造裝置50的影響等進行評估。The evaluation body 10 reproduces a manufacturing process or is being performed using the main body 20 in substantially the same semiconductor manufacturing apparatus 50 as the semiconductor manufacturing apparatus 50 used or intended to be used using the main body 20 using the material samples provided by the material supplying body 30 manufacturing process. The product (semiconductor device) or its semi-product manufactured by the reproduced manufacturing process is evaluated by the evaluation apparatus 12 . Alternatively, the effect of the reproduced manufacturing process on the semiconductor manufacturing apparatus 50 and the like may also be evaluated.

如上所述,評估主體10保持裝置資訊(用於確定使用主體20使用或預定使用的半導體製造裝置50的資訊)、及製程資訊(用於確定由半導體製造裝置50所執行的製造製程的資訊),基於用於確定由材料供給主體30提供的材料60的資訊與評估主體10所保持的資訊(裝置資訊及製程資訊),對材料60的合適與否進行評估。然後,評估主體10向材料供給主體30提供評估結果。As described above, the evaluation body 10 holds device information (information for determining the semiconductor manufacturing apparatus 50 used or intended to be used by the use body 20 ), and process information (information for determining the manufacturing process performed by the semiconductor manufacturing apparatus 50 ) , the suitability of the material 60 is evaluated based on the information for determining the material 60 provided by the material supply body 30 and the information (device information and process information) held by the evaluation body 10 . Then, the evaluation main body 10 provides the evaluation result to the material supply main body 30 .

利用所再現的製造製程製造的半導體裝置或其半製品的評估亦可藉由形狀觀察進行。作為評估項目,可列舉:(1)外形尺寸及翹曲量、(2)截面觀察圖像、(3)熱翹曲量變移、(4)內部觀察結果、(5)硬度測定結果等。對應於此種評估項目,作為用以評估半導體裝置或半導體裝置的半製品的品質的評估裝置12,可包括測定形狀的測定裝置、獲得截面觀察圖像的顯微鏡、用以進行內部觀察的探測裝置、用以測定硬度的硬度計中的任一者。Evaluation of the semiconductor device or its semi-finished product manufactured using the reproduced manufacturing process can also be performed by shape observation. Examples of evaluation items include (1) external dimensions and warpage, (2) cross-sectional observation image, (3) thermal warpage change, (4) internal observation results, and (5) hardness measurement results. Corresponding to such evaluation items, the evaluation device 12 for evaluating the quality of the semiconductor device or the semi-finished product of the semiconductor device may include a measuring device for measuring the shape, a microscope for obtaining a cross-sectional observation image, and a probe device for internal observation. , Any one of the durometers used to measure hardness.

更具體而言,(1)外形尺寸及翹曲量、以及(3)熱翹曲量變移的評估使用加熱翹曲測定裝置(TSM)或超音波探測裝置(Scanning Acoustic Tomography,SAT)等測定形狀的測定裝置作為評估裝置12。(2)截面觀察圖像的評估使用光學顯微鏡或掃描式電子顯微鏡(scanning electron microscope,SEM)等作為評估裝置12。(4)內部觀察結果的評估使用超音波探測裝置或X射線透視裝置等作為評估裝置12。(5)硬度測定結果的評估使用硬度計等作為評估裝置12。More specifically, (1) evaluation of external dimensions and warpage amount, and (3) evaluation of thermal warpage amount change, the shape is measured using a thermal warpage measurement device (TSM), an ultrasonic detection device (Scanning Acoustic Tomography, SAT), or the like The measuring device is used as the evaluation device 12 . (2) Evaluation of the cross-sectional observation image An optical microscope, a scanning electron microscope (SEM), or the like is used as the evaluation device 12 . (4) Evaluation of Internal Observation Results An ultrasonic detection device, an X-ray fluoroscopy device, or the like is used as the evaluation device 12 . (5) Evaluation of Hardness Measurement Results A durometer or the like is used as the evaluation device 12 .

所再現的製造製程對半導體製造裝置50的影響的評估亦可藉由觀察半導體製造裝置50所使用的模具及治具而進行。作為評估項目,可列舉:(1)模具表面有無污垢、(2)刀片磨耗狀態、(3)刀片磨耗量等。對應於此種評估項目,作為用來對實質上相同的半導體製造裝置50的損耗進行評估的結構,亦可包括觀察裝置及探測裝置中的任一者。Evaluation of the impact of the reproduced manufacturing process on the semiconductor manufacturing apparatus 50 can also be performed by observing the molds and jigs used by the semiconductor manufacturing apparatus 50 . Examples of evaluation items include (1) presence or absence of dirt on the die surface, (2) blade wear state, (3) blade wear amount, and the like. Corresponding to such an evaluation item, as a structure for evaluating the loss of substantially the same semiconductor manufacturing apparatus 50, any one of an observation apparatus and a probe apparatus may be included.

更具體而言,(1)模具表面污垢有無的評估可藉由人的目視進行,亦可使用觀察裝置等作為評估裝置12。(2)刀片磨耗狀態的評估使用超音波探測裝置或X射線透視裝置等作為評估裝置12。(3)刀片磨耗量的評估使用測定形狀的測定裝置。More specifically, (1) the evaluation of the presence or absence of contamination on the surface of the mold can be performed by human eyes, or an observation device or the like can be used as the evaluation device 12 . (2) Evaluation of the wear state of the blade An ultrasonic detection device or an X-ray fluoroscopy device or the like is used as the evaluation device 12 . (3) The evaluation of the blade wear amount used a measuring device for measuring the shape.

不限於所述項目,可根據任意的評估項目使用一個或多個評估裝置12。Not limited to the items described, one or more evaluation devices 12 may be used according to any evaluation item.

如上所述,作為評估主體10的評估部,可包括:與使用主體20使用或預定使用的半導體製造裝置50實質上相同的半導體製造裝置50;及對藉由該實質上相同的半導體製造裝置50所製造的半導體裝置或該半導體裝置的半製品的品質、及/或該實質上相同的半導體製造裝置50的損耗進行評估的評估裝置12。As described above, the evaluation unit for evaluating the main body 10 may include: a semiconductor production apparatus 50 that is substantially the same as the semiconductor production apparatus 50 used or intended to be used using the main body 20; The evaluation device 12 for evaluating the quality of the manufactured semiconductor device or the semi-finished product of the semiconductor device, and/or the loss of the substantially identical semiconductor manufacturing device 50 .

典型而言,藉由使用半導體製造裝置50再現製造製程來進行評估,但亦可藉由模擬實現一部分或全部的評估。於藉由模擬進行評估的情形時,準備半導體製造裝置50的模型,並且產生對應於由材料供給主體30供給的材料資訊的模型,藉此可實現與對象的製造製程相關的模擬。再者,於藉由模擬進行評估的情形時,亦可不必由材料供給主體30向評估主體10提供材料樣品。Typically, the evaluation is performed by reproducing the manufacturing process using the semiconductor fabrication apparatus 50, but a part or all of the evaluation can also be accomplished by simulation. In the case of evaluation by simulation, a model of the semiconductor manufacturing apparatus 50 is prepared, and a model corresponding to the material information supplied from the material supplying body 30 is generated, whereby simulation related to the manufacturing process of the object can be realized. Furthermore, in the case of performing the evaluation by simulation, it is not necessary to supply the material sample to the evaluation main body 10 from the material supply main body 30 .

如上所述,作為評估主體10的評估部,可包括利用使用主體20使用或預定使用的半導體製造裝置50的模型的模擬裝置。藉由使用模擬,即便現實中無半導體製造裝置50亦可進行評估。As described above, as the evaluation section for evaluating the main body 10 , a simulation device using a model of the semiconductor manufacturing apparatus 50 used or scheduled to be used by the main body 20 may be included. By using simulation, evaluation can be performed even without the semiconductor fabrication apparatus 50 in reality.

〈C.資訊的詳細情況〉 繼而,對依照本實施形態的製造支援系統1中所交換的資訊的詳細情況進行說明。<C. Details of information> Next, the details of the information exchanged in the manufacturing support system 1 according to the present embodiment will be described.

(c1:裝置資訊) 裝置資訊包括用來用於確定對象的半導體製造裝置50及所利用的可更換構件等的資訊。更具體而言,若半導體製造裝置50為模封裝置,則裝置資訊包括(1)裝置類型(型號)、及(2)模具類型(型號)等。(c1: device information) The apparatus information includes information for specifying the semiconductor manufacturing apparatus 50 to be targeted, the replaceable components used, and the like. More specifically, if the semiconductor manufacturing device 50 is a molding device, the device information includes (1) device type (model number), (2) mold type (model number), and the like.

又,若半導體製造裝置50為單切裝置,則裝置資訊包括(1)裝置類型(型號)、(2)套組(品種用單元組件)的型號、(3)刀片的型號等。In addition, if the semiconductor manufacturing apparatus 50 is a singulation apparatus, the apparatus information includes (1) the type of the apparatus (model number), (2) the model number of the set (unit assembly for variety), and (3) the model number of the blade.

(c2:評估資訊) 評估資訊包括於對象的製造條件下由對象的半導體製造裝置50使用對象的材料60時的評估結果。更具體而言,評估資訊包括使用對象的材料60並藉由對象的半導體製造裝置50所製造的半導體裝置的品質的評估結果、及半導體製造裝置50的損耗程度的評估結果等。(c2: Evaluation Information) The evaluation information includes evaluation results when the object's material 60 is used by the object's semiconductor manufacturing apparatus 50 under the object's manufacturing conditions. More specifically, the evaluation information includes the evaluation result of the quality of the semiconductor device manufactured by the object semiconductor manufacturing apparatus 50 using the target material 60 , the evaluation result of the degree of wear of the semiconductor manufacturing apparatus 50 , and the like.

作為半導體裝置的品質的評估結果的一例,可列舉形狀觀察結果等。作為形狀觀察結果,包括:(1)半導體裝置的外形尺寸及翹曲量、(2)半導體裝置的截面觀察圖像(利用光學顯微鏡的觀察或利用掃描式電子顯微鏡(SEM)的觀察)、(3)半導體裝置的熱翹曲量變移、(4)半導體裝置的利用超音波獲得的內部觀察結果(例如,缺陷或空隙的有無等)、(5)半導體裝置的利用X射線獲得的內部觀察結果(例如,缺陷或空隙的有無等)、(6)半導體裝置的硬度測定結果等。As an example of the evaluation result of the quality of a semiconductor device, the shape observation result etc. are mentioned. The shape observation results include: (1) the external dimensions and the amount of warpage of the semiconductor device, (2) the cross-sectional observation image of the semiconductor device (observation with an optical microscope or observation with a scanning electron microscope (SEM)), ( 3) Variation in the amount of thermal warpage of the semiconductor device, (4) Internal observation results (for example, presence or absence of defects or voids, etc.) of the semiconductor device using ultrasound, (5) Internal observation results using X-rays of the semiconductor device (For example, presence or absence of defects or voids, etc.), (6) Hardness measurement results of semiconductor devices, and the like.

又,作為半導體製造裝置50的損耗程度的評估結果的一例,可列舉模具及治具的觀察結果等。作為模具及治具的觀察結果,包括:(1)模具表面的污垢的有無(目視)、(2)刀片磨耗狀態(利用光學顯微鏡的觀察或利用掃描式電子顯微鏡的觀察)、(3)刀片磨耗量等。Moreover, as an example of the evaluation result of the wear level of the semiconductor manufacturing apparatus 50, the observation result of a mold and a jig, etc. are mentioned. The observation results of the mold and jig include: (1) the presence or absence of dirt on the mold surface (visual inspection), (2) the wear state of the blade (observation with an optical microscope or observation with a scanning electron microscope), (3) blade wear, etc.

(c3:製程資訊) 製程資訊包括對適用於對象的半導體製造裝置50的製造條件進行定義的資訊。更具體而言,若半導體製造裝置50為模封裝置,則製程資訊包括:(1)模具溫度、(2)樹脂重量及偏差量、(3)預熱時間、(4)成形壓力、(5)成形輪廓(樹脂注入壓力及模具位置隨時間的變移等)等。(c3: Process information) The process information includes information that defines the manufacturing conditions applicable to the semiconductor manufacturing apparatus 50 of the object. More specifically, if the semiconductor manufacturing device 50 is a molding device, the process information includes: (1) mold temperature, (2) resin weight and deviation, (3) preheating time, (4) molding pressure, (5) ) molding profile (resin injection pressure and change of mold position with time, etc.), etc.

又,若半導體製造裝置50為單切裝置,則與切割製程相關的製程資訊包括:(1)轉速、(2)切割速度、(3)切割次數、(4)切削阻力、(5)冷卻水量等。In addition, if the semiconductor manufacturing device 50 is a single cutting device, the process information related to the cutting process includes: (1) rotational speed, (2) cutting speed, (3) cutting times, (4) cutting resistance, and (5) cooling water amount Wait.

(c4:材料資訊) 材料資訊包括與對象的材料60相關的資訊。更具體而言,若材料60為樹脂材料,則材料資訊包括:(1)作為表示流動性的指標的螺旋流動、(2)凝膠時間、(3)玻璃轉移溫度、(4)線膨脹係數、(5)填料含量、(6)填料粒徑分佈、(7)水分含有率、(8)密度等。(c4: material information) The material information includes information related to the material 60 of the object. More specifically, if the material 60 is a resin material, the material information includes: (1) helical flow as an indicator of fluidity, (2) gel time, (3) glass transition temperature, and (4) linear expansion coefficient , (5) filler content, (6) filler particle size distribution, (7) moisture content, (8) density, etc.

又,若材料60為基板材料,則材料資訊包括:(1)佈線鍍敷的厚度及偏差測定結果、(2)佈線阻劑的厚度及偏差測定結果等。In addition, when the material 60 is a substrate material, the material information includes (1) the thickness of the wiring plating and the measurement result of variation, (2) the thickness of the wiring resist and the measurement result of variation, and the like.

(c5:認定資訊) 認定資訊包括包含對象的半導體製造裝置50的製造製程中的要求規格。更具體而言,認定資訊包括:(1)是否滿足半導體製造裝置的保證值的判定結果、(2)工序能力指數(Process Capability Index,cpk)、(3)刀片壽命預測等。(c5: Certification information) The certification information includes the required specification in the manufacturing process of the semiconductor manufacturing apparatus 50 including the target. More specifically, the certification information includes: (1) the determination result of whether the guaranteed value of the semiconductor manufacturing apparatus is satisfied, (2) the Process Capability Index (cpk), (3) the prediction of the blade life, and the like.

再者,所述項目為一例,可根據製造製程或材料60的種類等而於各資訊中包含任意項目。In addition, the said item is an example, and arbitrary items may be included in each information according to the manufacturing process, the kind of the material 60, etc. FIG.

〈D.應用例〉 於所述說明中,主要示出適用於事前的性能評估的例,但不限於此,可進行各種應用。例如,亦可用於保證材料供給主體30所製造的材料60的品質。於所述情形時,材料供給主體30可將由評估主體10提供的評估結果與相對應的材料60建立關聯,而向使用主體20供給。<D. Application example> In the above description, the example applied to the performance evaluation in advance is mainly shown, but it is not limited to this, and various applications are possible. For example, it can also be used to ensure the quality of the material 60 produced by the material supply body 30 . In this case, the material supply main body 30 can associate the evaluation result provided by the evaluation main body 10 with the corresponding material 60 and supply it to the user main body 20 .

圖3是用來對依照本實施形態的製造支援系統1的應用例之一進行說明的示意圖。圖4是表示由依照本實施形態的製造支援系統1的應用例之一所執行的處理順序的序列圖。FIG. 3 is a schematic diagram for explaining one example of application of the manufacturing support system 1 according to the present embodiment. FIG. 4 is a sequence diagram showing a processing sequence executed by one of the application examples of the manufacturing support system 1 according to the present embodiment.

參照圖3,假定如下例:於使用主體20使用半導體製造裝置50製造半導體裝置的狀況下,評估主體10事先對材料供給主體30所供給的材料60的品質進行評估。Referring to FIG. 3 , assume an example in which the evaluation body 10 evaluates the quality of the material 60 supplied by the material supply body 30 in advance in a situation where the semiconductor device 50 is used to manufacture a semiconductor device using the body 20 .

參照圖3及圖4,於供給材料60的態樣中,材料供給主體30依照預先由使用主體20等提出的製造條件等製造材料60(步驟S52)。材料供給主體30向評估主體10提供所製造的材料60的一部分(材料樣品)及材料資訊(步驟S54)。3 and 4 , in the aspect of supplying material 60 , material supply main body 30 manufactures material 60 in accordance with the production conditions and the like proposed in advance by using main body 20 and the like (step S52 ). The material supply main body 30 supplies a part (material sample) and material information of the manufactured material 60 to the evaluation main body 10 (step S54 ).

評估主體10使用由材料供給主體30提供的材料樣品進行評估(步驟S56)。然後,評估主體10向材料供給主體30提供藉由評估所獲得的評估結果(步驟S58)。The evaluation body 10 performs evaluation using the material samples supplied from the material supply body 30 (step S56 ). Then, the evaluation body 10 provides the evaluation result obtained by the evaluation to the material supply body 30 (step S58 ).

材料供給主體30將由評估主體10提供的評估結果隨附於所製造的材料60而供向使用主體20(步驟S60)。使用主體20確認隨附於由材料供給主體30交付的材料60中的評估結果後,用於半導體製造裝置50。The material supply body 30 supplies the produced material 60 with the evaluation result provided by the evaluation body 10 to the use body 20 (step S60 ). After confirming the evaluation result attached to the material 60 delivered by the material supplying body 30 using the main body 20 , it is used for the semiconductor manufacturing apparatus 50 .

再者,於步驟S56及步驟S58中,可僅於評估主體10獲得的評估結果合適的情形時向材料供給主體30提供評估結果。Furthermore, in step S56 and step S58, the evaluation result may be provided to the material supply main body 30 only when the evaluation result obtained by the evaluation main body 10 is suitable.

藉由採用如圖3及圖4所示的構造,可更確實地保證從材料供給主體30向使用主體20供給的材料60適於對象的半導體製造裝置50。By adopting the structure shown in FIGS. 3 and 4 , it is possible to more reliably ensure that the material 60 supplied from the material supply body 30 to the use body 20 is suitable for the semiconductor manufacturing apparatus 50 of the target.

再者,圖3及圖4所示的品質評估例如可於每批材料60的製造中進行。Furthermore, the quality evaluation shown in FIGS. 3 and 4 can be performed, for example, in the manufacture of each batch of material 60 .

〈E.管理裝置〉 繼而,對分別配置於評估主體10、使用主體20及材料供給主體30的管理裝置14、管理裝置24及管理裝置34進行說明。於製造支援系統1中,本質上交換管理裝置14、管理裝置24及管理裝置34所需的資訊。<E. Management device> Next, the management apparatus 14, the management apparatus 24, and the management apparatus 34 arrange|positioned at the evaluation main body 10, the usage main body 20, and the material supply main body 30, respectively, are demonstrated. In the manufacturing support system 1, information required by the management device 14, the management device 24, and the management device 34 is essentially exchanged.

圖5是表示構成依照本實施形態的製造支援系統1的管理裝置14的裝置結構的一例的示意圖。再者,管理裝置24及管理裝置34亦與圖1所示的裝置結構相同。FIG. 5 is a schematic diagram showing an example of the device configuration of the management device 14 constituting the manufacturing support system 1 according to the present embodiment. Furthermore, the management device 24 and the management device 34 have the same structure as the device shown in FIG. 1 .

參照圖5,管理裝置14是使用電腦而實現,作為主要的元件,包括處理器102、主記憶體104、輸入部106、顯示部108、輸出部110、二次記憶裝置120、及通信部126。該些元件連接於內部匯流排128。Referring to FIG. 5 , the management device 14 is realized by using a computer, and as main components, includes a processor 102 , a main memory 104 , an input unit 106 , a display unit 108 , an output unit 110 , a secondary memory device 120 , and a communication unit 126 . These elements are connected to the internal bus bar 128 .

處理器102是執行管理裝置14所提供的功能所需的處理的運算主體,藉由執行儲存於二次記憶裝置120中的程式或程式模組而實現所需的功能。處理器102亦可為多核及/或多處理器,可根據所要求的負載處理能力設定所需數量的核或處理器數。The processor 102 is a computing body that executes the processing required for the functions provided by the management device 14 , and realizes the required functions by executing the programs or program modules stored in the secondary memory device 120 . The processor 102 can also be multi-core and/or multi-processor, and the required number of cores or processors can be set according to the required load processing capability.

主記憶體104提供處理器102執行程式所需的工作記憶體。主記憶體104是一次性保存所執行的程式的程式碼或工作資料的非揮發性記憶體。The main memory 104 provides the working memory required by the processor 102 to execute programs. The main memory 104 is a non-volatile memory that once saves the program code or working data of the executed program.

輸入部106是接收來自操作員等的操作的元件,例如使用鍵盤、滑鼠、觸控面板等來實現。顯示部118是向操作員等提示處理結果等資訊的元件,例如使用顯示器等來實現。輸出部110是將管理裝置14內的資訊有形化輸出的元件,例如使用印表機等來實現。The input unit 106 is an element that receives an operation from an operator or the like, and is realized using, for example, a keyboard, a mouse, a touch panel, or the like. The display unit 118 is an element for presenting information such as processing results to an operator or the like, and is implemented using a display or the like, for example. The output unit 110 is a device that outputs the information in the management device 14 in a tangible form, and is realized by, for example, a printer or the like.

二次記憶裝置120是保持部的一例,除了作業系統(未圖示)以外,還儲存資料組124,所述資料組124包括用來提供依照本實施形態的製造支援系統1中所需的功能的處理實現模組122及各種資料。典型而言,評估主體10的管理裝置14的資料組124包括認定資訊、裝置資訊及製程資訊。The secondary memory device 120 is an example of a holding unit, and stores, in addition to the operating system (not shown), a data set 124 including functions for providing the manufacturing support system 1 according to the present embodiment. The processing implements the module 122 and various data. Typically, the data set 124 of the management device 14 of the evaluation body 10 includes authentication information, device information, and process information.

通信部126是用來與使用主體20及/或材料供給主體30進行通信的元件,例如使用有線區域網路(Local Area Network,LAN)通信介面、無線LAN通信介面、公用網路通信介面等來實現。可根據成為通信對象的使用主體20及/或材料供給主體30的數量及通信形態等安裝多種或多個通信部126。The communication unit 126 is an element for communicating with the user body 20 and/or the material supply body 30 , for example, using a wired local area network (LAN) communication interface, a wireless LAN communication interface, a public network communication interface, and the like. accomplish. A plurality of types or a plurality of communication units 126 may be installed in accordance with the number of use bodies 20 and/or material supply bodies 30 to be communicated with, the communication form, and the like.

於所述說明中,示出於評估主體10(管理裝置14)、使用主體20(管理裝置24)及材料供給主體30(管理裝置34)之間直接交換所需的資訊的結構例,但不限於此種結構,亦可由特定的主體管理資訊。In the above description, a configuration example in which necessary information is directly exchanged between the evaluation body 10 (management device 14 ), the user body 20 (management device 24 ), and the material supply body 30 (management device 34 ) is shown, but it is not Limited to this structure, information can also be managed by a specific subject.

圖6中的(A)及圖6中的(B)是表示依照本實施形態的製造支援系統1中的資料保持的安裝例的示意圖。圖6中的(A)表示評估主體10管理所需的資料的安裝例,圖6中的(B)表示材料供給主體30管理所需的資料的安裝例。FIG. 6(A) and FIG. 6(B) are schematic diagrams showing an installation example of data retention in the manufacturing support system 1 according to the present embodiment. (A) in FIG. 6 shows an example of installation of data required for management by the evaluation body 10 , and (B) in FIG. 6 shows an example of installation of data required for management by the material supply body 30 .

參照圖6中的(A),評估主體10對與由材料供給主體30提供的材料樣品相關的評估資訊進行管理,向材料供給主體30提供用來存取所管理的評估資訊的統一資源定位符(Uniform Resource Locator,URL)等特定資訊代替評估資訊。進而,材料供給主體30向使用主體20提供由評估主體10提供的特定資訊。Referring to (A) in FIG. 6 , the evaluation body 10 manages evaluation information related to the material samples provided by the material supply body 30 , and provides the material supply body 30 with a uniform resource locator for accessing the managed evaluation information (Uniform Resource Locator, URL) and other specific information in place of evaluation information. Further, the material supply body 30 provides the user body 20 with the specific information provided by the evaluation body 10 .

材料供給主體30及使用主體20可基於特定資訊對評估主體10所管理的評估主體進行存取。再者,亦可於對評估主體10所管理的評估資訊的存取中設置存取碼(密碼)等各種限制。The material supplying main body 30 and the using main body 20 can access the evaluation main body managed by the evaluation main body 10 based on the specific information. Furthermore, various restrictions, such as an access code (password), may be set in the access to the evaluation information managed by the evaluation body 10 .

藉由採用此種結構,可減少材料供給主體30(管理裝置34)中的計算資源,並且可簡化製造支援系統1的處理。By adopting such a configuration, the computing resources in the material supply body 30 (the management device 34 ) can be reduced, and the processing of the manufacturing support system 1 can be simplified.

參照圖6中的(B),評估主體10向材料供給主體30發送與由材料供給主體30提供的材料樣品相關的評估資訊。材料供給主體30對從評估主體10接收的評估資訊進行管理。材料供給主體30向使用主體20提供用來存取自身所管理的評估資訊的URL等特定資訊。Referring to (B) in FIG. 6 , the evaluation main body 10 transmits evaluation information related to the material sample provided by the material supply main body 30 to the material supply main body 30 . The material supply body 30 manages the evaluation information received from the evaluation body 10 . The material supply body 30 provides the user body 20 with specific information such as a URL for accessing the evaluation information managed by itself.

使用主體20可基於特定資訊對材料供給主體30所管理的評估主體進行存取。再者,亦可於對材料供給主體30所管理的評估資訊的存取中設置存取碼(密碼)等各種限制。The user body 20 can access the evaluation body managed by the material supply body 30 based on specific information. Furthermore, various restrictions, such as an access code (password), may be provided in the access to the evaluation information managed by the material supply main body 30 .

藉由採用此種結構,可減少使用主體20(管理裝置24)中的計算資源,並且可簡化製造支援系統1的處理。By adopting such a configuration, the computing resources in the main body 20 (the management device 24 ) can be reduced, and the processing of the manufacturing support system 1 can be simplified.

於所述說明中,示出分別於評估主體10、使用主體20及材料供給主體30配置管理裝置14、管理裝置24及管理裝置34的結構例,但不限於此,亦可如所謂雲端電腦般,利用如將多台電腦經由網路連結的系統的一部分實現所需的處理及功能。In the above description, a configuration example in which the management device 14 , the management device 24 , and the management device 34 are arranged in the evaluation body 10 , the user body 20 and the material supply body 30 is shown, but it is not limited to this, and a so-called cloud computer may be used. , using part of a system such as connecting a plurality of computers via a network to realize the required processing and functions.

依照本實施形態的製造支援系統1於任意計算環境下均可實現,可任意使用現實安裝的時點的公知的技術,或者依照現實安裝的國家或地區的法律等採用任意的安裝形態。本發明的技術範圍並不限定於特定的安裝形態,可包含任意的安裝形態。The manufacturing support system 1 according to the present embodiment can be implemented in any computing environment, and any known technology at the time of actual installation can be used arbitrarily, or any installation form can be adopted in accordance with the laws of the country or region where the actual installation is performed. The technical scope of the present invention is not limited to a specific installation form, and can include any installation form.

〈F.優點〉 事先對目標製造製程評估半導體製造裝置及半導體製造裝置所使用的材料是否合適需要足夠的見解,且亦需要大量時間。藉由評估主體(典型而言為半導體製造裝置的製造商等)與材料供給主體聯合實施此種需要大量資源的評估處理,可進行包括半導體製造裝置及材料在內的綜合評估。<F. Advantages> Assessing the suitability of a semiconductor manufacturing apparatus and the materials used in the semiconductor manufacturing apparatus in advance for a target manufacturing process requires sufficient insight, and also requires a lot of time. By performing such a resource-intensive evaluation process in conjunction with an evaluation body (typically, a manufacturer of semiconductor manufacturing equipment, etc.) and a material supplier, comprehensive evaluation including semiconductor manufacturing equipment and materials can be performed.

藉由提供可進行此種綜合評估的製造支援系統,材料供給主體可確實地適當提供與作為顧客的使用主體所希望的製造製程相適的材料。又,使用主體即便不具有足夠的見解,亦可利用評估主體的見解更早且確實地實現目標製造製程。進而,評估主體可利用自己保有的見解支援各種材料供給主體及使用主體。By providing the manufacturing support system which can perform such a comprehensive evaluation, the material supplier can appropriately supply the material suitable for the manufacturing process desired by the user as the customer. In addition, even if the user body does not have sufficient knowledge, the target manufacturing process can be realized earlier and surely by using the knowledge of the evaluation body. Furthermore, the evaluation subject can support various material suppliers and users using their own insights.

應認為本次揭示的實施形態於所有方面為例示,並非限制性者。本發明的範圍由申請專利的範圍而非所述實施形態的說明所揭示,意在包含與申請專利的範圍同等含義及範圍內的所有變更。It should be construed that the embodiments disclosed this time are illustrative in all respects and not restrictive. The scope of the present invention is disclosed by the scope of the patent application rather than the description of the above-described embodiments, and it is intended that the scope of the patent application and the equivalent meaning and all changes within the scope are included.

1:製造支援系統 10:評估主體 12:評估裝置 14、24、34:管理裝置 20:使用主體 30:材料供給主體 50:半導體製造裝置 60:材料 102:處理器 104:主記憶體 106:輸入部 108、118:顯示部 110:輸出部 120:二次記憶裝置 122:處理實現模組 124:資料組 126:通信部 128:內部匯流排 S2~S32、S52~S60:步驟1: Manufacturing Support System 10: Evaluation subject 12: Evaluation device 14, 24, 34: Management devices 20: Use Subjects 30: Material supply main body 50: Semiconductor manufacturing equipment 60: Materials 102: Processor 104: main memory 106: Input section 108, 118: Display part 110: Output part 120: Secondary memory device 122: Processing implementation module 124: Data Group 126: Ministry of Communications 128: Internal busbar S2~S32, S52~S60: Steps

圖1是用來對依照本實施形態的製造支援系統的概要進行說明的示意圖。 圖2是表示由依照本實施形態的製造支援系統執行的處理順序的序列圖。 圖3是用來對依照本實施形態的製造支援系統的應用例之一進行說明的示意圖。 圖4是表示由依照本實施形態的製造支援系統的應用例之一執行的處理順序的序列圖。 圖5是表示構成依照本實施形態的製造支援系統的管理裝置的裝置結構的一例的示意圖。 圖6中的(A)及圖6中的(B)是表示依照本實施形態的製造支援系統中的資料保持的安裝例的示意圖。FIG. 1 is a schematic diagram for explaining the outline of the manufacturing support system according to the present embodiment. FIG. 2 is a sequence diagram showing a processing sequence executed by the manufacturing support system according to the present embodiment. FIG. 3 is a schematic diagram for explaining one application example of the manufacturing support system according to the present embodiment. FIG. 4 is a sequence diagram showing a processing sequence executed by one of the application examples of the manufacturing support system according to the present embodiment. FIG. 5 is a schematic diagram showing an example of the device configuration of the management device constituting the manufacturing support system according to the present embodiment. FIG. 6(A) and FIG. 6(B) are schematic diagrams showing an installation example of data retention in the manufacturing support system according to the present embodiment.

1:製造支援系統1: Manufacturing Support System

10:評估主體10: Evaluation subject

12:評估裝置12: Evaluation device

14、24、34:管理裝置14, 24, 34: Management devices

20:使用主體20: Use Subjects

30:材料供給主體30: Material supply main body

50:半導體製造裝置50: Semiconductor manufacturing equipment

60:材料60: Materials

Claims (8)

一種製造支援系統,對使用半導體製造裝置的製造進行支援,包括: 保持部,配置於評估主體,保持用於確定由使用主體使用或預定使用的半導體製造裝置的資訊、及用於確定由所述半導體製造裝置執行的製造製程的資訊; 評估部,配置於所述評估主體,基於用於確定由供給所述半導體製造裝置所使用的材料的材料供給主體所提供的所述材料的資訊與由所述保持部保持的資訊,對所述材料的合適與否進行評估;及 評估結果提供部,向所述材料供給主體提供所述評估部獲得的評估結果。A manufacturing support system that supports manufacturing using semiconductor manufacturing equipment, including: a holding unit, disposed in the evaluation body, to hold information for identifying a semiconductor manufacturing apparatus used or intended to be used by a user, and information for identifying a manufacturing process performed by the semiconductor manufacturing apparatus; An evaluation unit is disposed in the evaluation body, and based on information for specifying the material supplied by a material supply body that supplies the material used in the semiconductor manufacturing apparatus and information held by the holding unit, evaluates the evaluation unit. assess the suitability of the material; and An evaluation result providing unit provides the material supply body with the evaluation result obtained by the evaluation unit. 如請求項1所述的製造支援系統,其中所述評估部包括: 實質上相同的半導體製造裝置,與所述使用主體所使用或預定使用的半導體製造裝置實質上相同;及 評估裝置,對由所述實質上相同的半導體製造裝置所製造的半導體裝置或所述半導體裝置的半製品的品質、及所述實質上相同的半導體製造裝置的損耗中的至少一者進行評估。The manufacturing support system of claim 1, wherein the evaluation section includes: Substantially the same semiconductor manufacturing equipment as the semiconductor manufacturing equipment used or intended to be used by the said user; and The evaluation device evaluates at least one of the quality of a semiconductor device or a semi-finished product of the semiconductor device manufactured by the substantially identical semiconductor fabrication apparatus, and the loss of the substantially identical semiconductor fabrication apparatus. 如請求項2所述的製造支援系統,其中所述評估裝置包括測定形狀的測定裝置、獲得截面觀察圖像的顯微鏡、用以進行內部觀察的探測裝置、用以測定硬度的硬度計中的任一者作為用以對所述半導體裝置或所述半導體裝置的半製品的品質進行評估的結構。The manufacturing support system according to claim 2, wherein the evaluation device includes any of a measuring device for measuring a shape, a microscope for obtaining a cross-sectional observation image, a probe device for performing internal observation, and a durometer for measuring hardness One is a structure for evaluating the quality of the semiconductor device or the semi-finished product of the semiconductor device. 如請求項2所述的製造支援系統,其中所述評估裝置包括觀察裝置及探測裝置中的任一者作為用以對所述實質上相同的半導體製造裝置的損耗進行評估的結構。The manufacturing support system according to claim 2, wherein the evaluation device includes any one of an observation device and a detection device as a structure for evaluating the loss of the substantially identical semiconductor manufacturing device. 如請求項2至請求項4中任一項所述的製造支援系統,其中所述評估裝置包括模擬裝置,所述模擬裝置使用所述使用主體所使用或預定使用的半導體製造裝置的模型。The manufacturing support system according to any one of Claims 2 to 4, wherein the evaluation device includes a simulation device that uses a model of a semiconductor manufacturing device used or intended to be used by the user body. 如請求項1至請求項4中任一項所述的製造支援系統,其中所述材料供給主體將由所述評估主體提供的評估結果與相對應的材料建立關聯,而向所述使用主體供給。The manufacturing support system according to any one of Claims 1 to 4, wherein the material supply body associates the evaluation result provided by the evaluation body with the corresponding material, and supplies the material to the user body. 如請求項1至請求項4中任一項所述的製造支援系統,其中所述評估部對多種不同的材料分別進行評估材料合適與否的處理。The manufacturing support system according to any one of claim 1 to claim 4, wherein the evaluation unit performs a process of evaluating whether the material is suitable or not for a plurality of different materials, respectively. 一種製造支援方法,對使用半導體製造裝置的製造進行支援,包括: 配置於評估主體的保持部保持用於確定由使用主體使用或預定使用的半導體製造裝置的資訊、及用於確定由所述半導體製造裝置執行的製造製程的資訊的步驟, 於所述評估主體中,基於用於確定由供給所述半導體製造裝置所使用的材料的材料供給主體所提供的所述材料的資訊、與由所述保持部保持的資訊,對所述材料的合適與否進行評估的步驟;及 向所述材料供給主體提供所述評估的步驟所獲得的評估結果的步驟。A manufacturing support method for supporting manufacturing using a semiconductor manufacturing apparatus, comprising: a step of holding information for specifying a semiconductor manufacturing apparatus used or intended to be used by a user body and information for specifying a manufacturing process performed by the semiconductor manufacturing apparatus in a holding portion disposed in the evaluation body, In the evaluation body, based on the information for specifying the material supplied by the material supply body that supplies the material used in the semiconductor manufacturing apparatus and the information held by the holding unit, the evaluation of the material is performed. the steps for assessing suitability; and The step of providing the evaluation result obtained by the step of evaluating to the material supply body.
TW110114229A 2020-05-15 2021-04-21 Manufacturing support system and manufacturing support method TWI787790B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020085969A JP7291666B2 (en) 2020-05-15 2020-05-15 Manufacturing support system and manufacturing support method
JP2020-085969 2020-05-15

Publications (2)

Publication Number Publication Date
TW202145126A true TW202145126A (en) 2021-12-01
TWI787790B TWI787790B (en) 2022-12-21

Family

ID=78510602

Family Applications (1)

Application Number Title Priority Date Filing Date
TW110114229A TWI787790B (en) 2020-05-15 2021-04-21 Manufacturing support system and manufacturing support method

Country Status (5)

Country Link
JP (1) JP7291666B2 (en)
KR (1) KR20230009943A (en)
CN (1) CN115315778A (en)
TW (1) TWI787790B (en)
WO (1) WO2021229860A1 (en)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001356148A (en) 2000-06-14 2001-12-26 Sony Corp Part reliability information collecting method, part reliability information storage device, part reliability information providing device, and part reliability information providing method
JP4747415B2 (en) 2000-12-20 2011-08-17 日立化成工業株式会社 System for providing constituent materials for semiconductors
JP2003259015A (en) 2002-02-28 2003-09-12 Hitachi Ltd Electronic conference method and electronic conference system about semiconductor device process utilizing communication line or semiconductor manufacturing apparatus performance
JP2006277426A (en) * 2005-03-30 2006-10-12 Hitachi Ltd Reliability evaluation method, system, and program for component information
US8078552B2 (en) * 2008-03-08 2011-12-13 Tokyo Electron Limited Autonomous adaptive system and method for improving semiconductor manufacturing quality
JP5950861B2 (en) * 2013-04-17 2016-07-13 株式会社日立製作所 Technology evaluation device and technology evaluation method

Also Published As

Publication number Publication date
JP7291666B2 (en) 2023-06-15
TWI787790B (en) 2022-12-21
CN115315778A (en) 2022-11-08
KR20230009943A (en) 2023-01-17
JP2021180286A (en) 2021-11-18
WO2021229860A1 (en) 2021-11-18

Similar Documents

Publication Publication Date Title
TW580624B (en) Product development management system, product development management method, product reliability judging system, and product reliability judging method
US10591898B2 (en) CAD-based design control
Liu Variation reduction for multistage manufacturing processes: a comparison survey of statistical‐process‐control vs stream‐of‐variation methodologies
US7917451B2 (en) Methods, apparatus, and program products to optimize semiconductor product yield prediction for performance and leakage screens
US9117045B2 (en) System and method to predict chip IDDQ and control leakage components
Morse et al. Interoperability: linking design and tolerancing with metrology
TWI787790B (en) Manufacturing support system and manufacturing support method
Verna et al. Defects-per-unit control chart for assembled products based on defect prediction models
US20090082897A1 (en) Method and apparatus for generating metrology tags to allow automatic metrology recipe generation
Doshi et al. Overview of automotive core tools: Applications and benefits
Selvanayagam et al. Comparison of experimental, analytical and simulation methods to estimate substrate material properties for warpage reliability analysis
TWI251133B (en) System and method for wafer acceptance test configuration
Shrouti et al. Root cause analysis of product service failure using computer experimentation technique
JP2019522357A (en) Offset compensation variation of semiconductor die
Shiau Quick decision-making support for inspection allocation planning with rapidly changing customer requirements
JP2004207679A (en) Automated management system
Joshi et al. How well can we assess thermally driven reliability issues in electronic systems today? Summary of panel held at the Therminic 2002
CN109219871A (en) Use the electric placed in connection of the metering target of design analysis
Khong et al. Innovative methodology for predictive reliability of intelligent power devices using extreme electro-thermal fatigue
Muelaner Unsettled Technology Domains in Industrial Metrology
JP2001125945A (en) Method for aiding design of wired board, design aiding tool, design aiding system, and information storage medium
Columbus Seven Ways Gage Management
Aligula et al. International Journal of Lean Six Sigma
WO2005114710A1 (en) Semiconductor product quality control method and quality control system thereof
Liu et al. Design workflow to facilitate support removal in Metal Powder Bed Fusion