TWI463177B - 使用頻率域干涉法用以執行光學成像之方法及設備 - Google Patents

使用頻率域干涉法用以執行光學成像之方法及設備 Download PDF

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TWI463177B
TWI463177B TW101113267A TW101113267A TWI463177B TW I463177 B TWI463177 B TW I463177B TW 101113267 A TW101113267 A TW 101113267A TW 101113267 A TW101113267 A TW 101113267A TW I463177 B TWI463177 B TW I463177B
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frequency
signal
format
light
wavelength
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TW101113267A
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TW201237457A (en
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Seok-Hyun Yun
Brett Eugene Bouma
Guillenno J Tearney
Johannes Fitzgerald Deboer
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Gen Hospital Corp
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    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
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    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
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    • H01S5/50—Amplifier structures not provided for in groups H01S5/02 - H01S5/30
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    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
    • H01S3/1068—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using an acousto-optical device
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/14—External cavity lasers
    • H01S5/141—External cavity lasers using a wavelength selective device, e.g. a grating or etalon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/14—External cavity lasers
    • H01S5/146—External cavity lasers using a fiber as external cavity

Description

使用頻率域干涉法用以執行光學成像之方法及設備
本發明廣義上關於光學成像，且尤其是關於使用頻率域干涉法用以執行光學成像之方法及設備。
如同此項技術中為人所知，光學干涉式反射法係一用以執行非侵入性、高解析度(約10微米)、生物或其他樣本之橫截面成像的強力工具，以便目視觀察微結構性光學特性，諸如反射、吸收、散射、衰減、雙折射及分光鏡分析。在此項技術中有許多已知之干涉成像技藝。此等技藝一般而言係可分為二個主要類型：(i)時間域技藝，及(ii)頻率域技藝。
低同調干涉法(LCT)係時間域技藝中之一。此技藝使用一掃描系統以變化參考臂長度，且在一偵測器取得該干涉信號。接著，該條紋圖案經解調以獲得來源交聯函數之同調包絡。光學同調斷層攝影法(OCT)係一種使用LCT以獲得二或三維影像之技藝。OCT係描述於Swanson等人之美國專利第5,321,501號中。OCT技藝之多種變化業經揭示，但其中許多遭遇低於最佳信號對雜訊比(SNR)，導致非最佳之解析度、低成像圖框速率及不佳之穿透深度。電力使用係此成像技藝的一因數。例如在眼科使用中，在熱損害出現前只能忍受數毫瓦之功率。因此，在此環境中提高功率以增加SNR係不可行。因而，需求能有一成像方法，其具有絕佳SNR而不明顯地增加功率要求。
不足之SNR也可能妨礙將OCT技藝使用在高圖框速率，高圖框速率對於避免動作假影及克服較短之可用量測時間窗口係重要的(例如，對於在活的有機體內之血管成像)。因此，需求能增進SNR及成像速度(如，圖框速率)之方法。
頻譜干涉法(或頻譜雷達)係頻率域成像技藝中之一。在頻譜雷達中，樣本與參考臂光之交叉頻譜密度係以一光譜儀量測出。深度輪廓資訊可編碼於該交叉頻譜密度調變上。
先前業已揭示使用頻譜雷達概念以增加LCI及OCT之SNR。此技藝使用具有大量像素(為1000之規模)的電荷耦合裝置(CCD)，以達到毫米規模之掃描範圍。CCD裝置之快速讀出使得高速成像可行。
然而，有些缺點係與使用CCD裝置有關。首先，CCD裝置與單一元件光接收器相比係較昂貴。其次，先前描述之方法使用一單一CCD以取得資料。由於電荷儲存容量受限，其需要減少參考臂功率至將近如樣本臂功率之相同位準，造成在樣本臂光上之自動相關雜訊。此外，因為未產生載波，1/f雜訊將控制在此系統中之雜訊。第三，即使具有目前發展之CCD技藝中的短積分時間，在干涉儀中之相位不穩定會減少交叉頻譜(cross spectral)密度調變之條紋能見度。此缺點使得該技藝受動作假影之害。
同調頻率調變連續波干涉法(C-FMCW)係此項技術中已知之另一頻率域技藝。Swanson等人之美國專利第5,956,355及6,160,826號中描述一使用此技藝之光學成像方法及設備。先前描述成像方法係基於使用一連續調整單頻雷射作為光源。該調整波長範圍係需要為數十奈米，以達到少於100微米之測距解析度。該雷射之瞬間線寬必須少於將近0.1奈米，以達到1.0毫米規模之偵測範圍。對於高速(如視頻速率)成像，該調整速率應大於10千赫。雖然可配置一腔外半導體雷射以達到在數十奈米範圍之無跳躍模態單頻調整，由於在機械穩定性上之嚴格要求，該調整速率已少於1赫。一克服此速度困難度之方法係較佳。
因此需求提供克服習知LCI及OCT之來源可用性及掃描速度缺點的系統及方法。
依據本發明之範例性具體實施例，一範例性光學頻率域成像(OFDI)系統可包括一多頻模態(或多縱或軸向模態)波長掃描雷射源，係光學性耦合至一包含研究中樣本之干涉儀。該系統可更包括一配置，其經設置以在從一樣本反射之光與一參考光間產生正交之干涉信號；及一經置放以接收該干涉信號之偵測器。
以此範例性特定配置可提供一OFDI系統，其與一習知系統之來源功率相比，可以相對低許多之來源功率操作，且/或其可以一比習知系統之擷取速度相對高許多的擷取速度操作。使用一掃描來源產生具有已減低散粒雜訊(shot noise)之成像系統，其允許用於比習知系統更低之來源功率，或更高之擷取速率。此可造成增加偵測靈敏度，導致提供即時成像之能力。此成像速度可協助在腸胃、眼科及動脈成像領域中之醫療人士，在該等領域中動作假影係一持續性問題。藉由增加圖框速率同時維持或增進信號對雜訊比，使此等假影可最少化或在某些情況下可消除。本發明之範例性具體實施例也可使得能以OFDI篩選大範圍之組織，且允許能使用臨床可實行篩選協定。
在本發明一範例性具體實施例中提供之波長掃描雷射，可在該雷射腔中使用一光學帶通掃描濾波器，以產生一快速掃描多頻模態輸出。藉由在該雷射腔中使用一光學帶通掃描濾波器，其將不需要調整該雷射腔長度，以提供雷射頻譜之同步調整。換句話說，其無須將該雷射之縱向腔模態調整為與該雷射之中心波長相同的速率。
在本發明另一範例性具體實施例中，該偵測器可為一雙平衡(dual-balanced)接收器，其經置放以接受干涉信號且在該干涉信號中抑制相對強度之雜訊。
經由一在傅利葉(Fourier)域中信號處理之執行，依據本發明之範例性具體實施例的信號對雜訊比(SNR)中之增益係比諸如OCT之時間域方法具優勢。該SNR強化係為N之倍數，N即深度範圍對空間解析度之比。強化之倍數N可達到數百至數千。SNR之增加使得成像快N倍，或者是允許以一低N倍功率之來源在相同速度下成像。結果，本發明之範例性具體實施例克服了習知LCI及OCT的二個重要缺點，如來源可用性及掃描速度。倍數N可達到超過1000，且允許OFDI系統之建構可比目前實行之OCT與LCI技藝增進超過三倍大小。
達到SNR之增益係因為該散粒雜訊具有一白雜訊頻譜。以頻率ω(或波長λ)出現在偵測器處之信號強度只促成在頻率ω處之信號，但散粒雜訊係產生在所有頻率處。藉由使每一偵測器之光學帶寬變窄，在各頻率處促成之散粒雜訊可減少，而信號分量維持相同。
依據本發明之範例性具體實施例與OCT相比，可增進目前資料擷取速度及來源之可用性。散粒雜訊係由於電流之統計性變動(其係由於量化或離散之電荷)。散粒雜訊之減少允許更低之來源功率或更高之擷取速率。在目前資料擷取速率中之限制(約4圖框/秒)係由可用來源功率及用於掃描延遲之快速機制的可用性所造成。在偵測之靈敏度上增加8倍，將允許在一約每秒30圖框之速度下即時成像。在靈敏度上增加約1000至2000倍允許使用具有更低功率及更高頻帶寬之來源，其係可易於使用、製造費用低廉且可產生更高解析度OFDI影像。
對於OFDI之眼科應用，有效偵測更能允許明顯增加擷取速度。在眼科應用中之限制在於允許進入眼睛之功率須依據ANSI標準(在830奈米約700微瓦)。目前在眼科應用中之資料擷取速度係約每秒100至500 A-line。本發明之功率有效偵測技藝允許在每秒約100,000 A-line規模之A-line擷取速率，或在約每影像約3000 A-line之視訊速率成像。
為達到本發明至少一些目標，會提供依據本發明一範例性具體實施例之設備及方法。尤其是會提供至少一第一電磁輻射至一樣本，且提供至少一第二電磁輻射至一非反射性參考。該第一及/或第二輻射之頻率隨時間變化。一干涉會在與第一輻射有關之至少一第三輻射，及與第二輻射有關之至少一第四輻射間偵測到。另一選擇是，該第一電磁輻射及/或第二電磁輻射具有一隨時間變化之頻譜。該頻譜在一特定時間可含有多數頻率。此外，可在一第一極化狀態中偵測介於第三輻射與第四輻射間之干涉信號。再者，最好於與第一極化狀態不同之第二極化狀態中，偵測在第三輻射與第四輻射間的一進一步干涉信號。該第一及/或第二電磁輻射可具有一頻譜，其平均頻率實質上以一大於每毫秒100兆赫之調整速度連續地隨時間改變。
在本發明一範例性具體實施例中，該第三輻射可為一自該樣本返回之輻射，而該至少一第四輻射係一自該參考返回之輻射。第一、第二、第三及/或第四輻射之頻率可被轉變。一影像可根據所偵測之干涉產生。一探針可用以掃描樣本之橫向位置以產生掃描資料，且提供該掃描資料至該第三配置，以產生該影像。該掃描資料可包括在樣本上多數橫向位置處獲得之偵測到干涉。可使用至少一光偵測器及至少一電性濾波器，該至少一光偵測器後係接著一電性濾波器。該電性濾波器可為一帶通濾波器，其具有之中心頻率與由頻率轉變配置所轉變之頻率大約相同。該電性濾波器之透射輪廓可實質上在其通過頻帶上改變。該探針可包括一旋轉接面及一光纖導管。該導管可以一高於每秒30轉之速度旋轉。會提供至少一極化調變器。
可使用至少一極化分集接收及/或一極化分集與雙平衡接收器。進一步可追蹤之相位差係介於：
●　第一電磁輻射與第二電磁輻射間，及/或
●　第三電磁輻射與第四電磁輻射間。
依據本發明又另一範例性具體實施例，可放射該第一及第二電磁輻射，其等中至少一者具有之平均頻率實質上以一大於每毫秒100兆赫之調整速度連續地隨時間變化。
依據本發明又一進一步範例性具體實施例會提供一設備。此設備包括至少一第一配置，其提供至少一第一電磁輻射至一樣本，及至少一第二電磁輻射至一參考。該設備也包括至少一第二配置，其適於轉變該第一電磁輻射及第二電磁輻射之頻率，及一干涉儀，其干涉該第一及第二電磁輻射以產生一干涉信號。再者，該設備包括至少一第二配置，其偵測第一與第二電磁輻射間之干涉。
再者，依據本發明另一範例性具體實施例，會提供系統、方法、軟體配置及儲存媒體，用以決定與一組織之構造與組成中至少一者有關之特定資料。尤其是，與一干涉信號有關之資訊會被接收，其係從自一樣本獲得之至少一第一電磁輻射與自一參考獲得之至少一第二電磁輻射形成。該第一及/或第二電磁輻射係經頻率轉變。該資訊經取樣以依第一格式產生已取樣資料。再者，已取樣資料係轉換成為依第二格式之特定資料，該第一與第二格式係彼此不同。
第1圖顯示一範例性先前技術時間域光學同調攝影(OCT)系統10，其包括一寬頻來源12，提供一信號至二對二分光器14中之第一臂14a。該分光器將在連接埠14a劃分提供予其之信號，且在連接埠14b提供該信號之第一部份耦合至一參考臂16。分光器14也在連接埠14c提供該信號之第二部份耦合至一取樣臂18。
取樣臂18結束在一取樣容積19處，而一用以提供該取樣容積之縱向掃描的配置22係置於取樣容積19前之取樣臂18中。參考臂16結束於一用於提供一軸向掃描之配置20中。該配置20及22之操作大體上係此項技術中為人已知。
從構件20及取樣容積19分別沿參考及取樣臂16、18反射回之信號，係耦合回到分光器14之各自的連接埠14b、14c，且係耦合至一偵測器24，其產生如大體上習知之軸向掃描資料26。美國專利6,341,036號(其全部揭露書以引用方式併入本文)描述類似以上第1圖中所示之系統。
一般而言，在掃描參考臂路徑長度16時，干涉條紋會對應於配合至取樣容積19中三構造19a、19b、19c之位置的距離而形成。單一偵測器24係用以偵測該等干涉條紋。藉由該等偵測圖案之包絡偵測，會構成一映射組織反射率至一給定位置之影像26。
如同從以下描述之某些範例性具體實施例中可瞭解，本發明的一範例性具體實施例關於使用一偵測原理之系統，該原理依據頻譜雷達概念(進一步稱為頻譜域OCT)及/或一介於頻譜域與時間域OCT間之混合方法(其比目前技術水準中之時間域OCT更靈敏)，其允許實質增進擷取速度對解析度之比。
在時間域OCT中之信號對雜訊比(SNR)分析，先前已揭示於相關公告物中。在時間域OCT中，干涉條紋峰值幅度係給定為：
其中P ref ，P sample 分別為以瓦為單位之參考及取樣功率。對於在該偵測器處之電功率，單位為[A 2 ]之信號係定義為：
S =η 2 e 2 P ref P sample /E 2 v 　(2)
其中η係量子效率，e 為電荷量子，而E v =hc/λ 為光子能。該等參考及取樣臂功率係由各自的反射頻譜密度所給定，
P ref , sample =∫S ref , sample (ω)d ω　(3)
假設該等參考及取樣頻譜密度係等於來源頻譜密度S( ω) ，其中該取樣臂頻譜密度係由一大倍數加以衰減，即S ref ( ω) =S( ω) ，S sample ( ω) =αS( ω) 而α<<1，且將以上參考及取樣臂之表示式插入該信號的原始定義，會得到：
促成對OCT信號之整體雜訊的三個作用係：(i)熱雜訊，(ii)散粒雜訊及(iii)相對強度雜訊。熱雜訊係由回授電阻器所產生，散粒雜訊係有關在電流上導致統計性變動之電荷量子的有限本質，而相對強度雜訊係關於由於標準光源之混亂特徵造成的臨時變動。此三者造成單位為[A 2 /Hz ]之雜訊密度，係定為：
k 係波茲曼(Boltzmann)常數，T 為克氏(Kelvin)溫度，R fb 係回授電阻器之值，而τ coh 係來源之同調時間。同調時間係與在一高斯(Gaussian)來源最大值Δλ之半處的全頻寬有關，如以下關係τ coh =/(c Δλ )。當方程式(5)中第二項控制其他雜訊作用時，可達到限制散粒雜訊之偵測。
該信號對雜訊比(SNR)係給定為：
其中BW 為信號帶寬，而參數S 及N noise (f) 如上述。
使用一光譜儀及CCD陣列偵測器之頻譜域OCT
當該雜訊係散粒雜訊限制時，可獲得時間域OCT系統之最佳信號對雜訊效能。可藉由以一多元件陣列偵測器取代單元件偵測器而明顯地減少散粒雜訊。當偵測臂光係在光譜上分散於陣列偵測器上時，該陣列之各元件偵測到該來源之頻寬的一小波長分量。該散粒雜訊最好能依一等於該陣列之元件數的倍數減少。改進信號對雜訊比之原理係基於散粒雜訊之白雜訊特徵，及只有相同波長之電磁波會產生干涉條紋的觀察。
散粒雜訊功率密度N noise (f) (單位為[W/Hz ]、[A 2 /Hz ]或[V 2 /Hz ])係正比於偵測器中產生之電流(或等於光學功率乘以量子效率)。對於波長為λ l 之單色光束進入干涉儀，在該偵測器處之條紋頻率或載波f 係由鏡面之速度v 決定，f l =2v/λ 1 。散粒雜訊係正比於波長λ l 處之功率(或頻譜密度S(ω) )。一第二波長λ 2 最好是耦合至該干涉儀。在頻率f 2 =2v/λ 2 處之第二條紋頻率或載波會同時出現。在此第二頻率處之散粒雜訊最好是由在波長λ l 與λ 2 處之光學功率所產生之散粒雜訊的加總。同時，在頻率f 1 處，該散粒雜訊最好是由在波長λ l 與λ 2 處之光學功率所產生之散粒雜訊的加總。因此，在二頻率處，一交叉-散粒雜訊項係因二波長之同時出現而產生在偵測器。藉由在光譜上分散各波長至一分離之偵測器，該交叉散粒雜訊項可被消除。以此方式，頻譜域OCT提供在信號對雜訊比上，比時間域OCT系統明顯之增進。
該OCT信號在空間域中係最容易描述。對於在該取樣臂中的一單一物件，OCT信號之干涉項係正比於來源頻譜S(ω) 之傅利葉轉換的實數部份，
I (Δz ) oc R e ∫exp(ik Δz )S (k )dk 　(7)
其中Δz 係介於樣本及參考臂間之路徑長度差且k 係波向量。隨著時間之函數，OCT信號係定為，
I (t ) OC R e ∫exp(2iωrv /c )S (ω)d ω　(8)
其中v 係參考臂鏡面速度。該信號之頻譜係由一在時間域中之信號的傅利葉轉換提供，導致一複數函數。此函數之絕對值係等於頻譜密度，
|I (f )|=|∫I (t )e 2 i π∫ i dt |=S (πfc /v )　(9)
其顯示信號帶寬係直接正比於來源頻譜寬，且隨著參考臂鏡面速度(即，成像速度)線性比例縮放。方程式(9)最好也直接與頻率頻譜之絕對值相關，對於信號S其為|I(f) |(參見方程(4))。方程式(9)也顯示出光源之各角速度或相等地，該來源之各波長係呈現在所量測干涉信號中其本身之頻率處。深度輪廓資訊I(t)可從複數交叉頻譜密度|I(f) |經由傅利葉轉換獲得。
複數交叉頻譜密度也可使用一分散或干涉元件將信號I(t)分成數個頻帶而獲得。在各偵測器處，只會決定該複數交叉頻譜密度之部份。結合各偵測器處之交叉頻譜密度，會取得該信號之全頻譜密度。因此，相同資訊可藉由將頻譜分量分離至個別偵測器而獲得。以軟體或硬體結合所有偵測器之信號，將產生如以單一偵測器獲得之相同信號。
在偵測臂中，該頻譜可被分為相同的二半，其中二偵測器各偵測該頻譜之半。依據方程式(9)，在偵測器1及2處之頻譜係分別定為
對於f <f 0 ，|I 1 (f) |=S( πfc/v) ，對於f >f 0 ，I 1 (f) =0，及
對於f <f 0 ，I 2 (f) =0 ，對於f >f 0 ， |I 2 (f) |=S( πfc/v) 。
在時間域OCT中將由一單一偵測器擷取之頻譜係由I 1 (f) 及I 2 (f) 相加而得；即I(f) =I 1 (f) +I 2 (f) 。因此在結合該等頻譜後之信號S係相等，然而對於f >f 0 ，I 1 (f) =0且對於f <f 0 ，I 2 (f) =0，每一偵測器之帶寬BW可減少2之倍數。
雜訊係藉著將在偵測器1及2處之散粒雜訊作用相加而決定。從方程式(5)、(6)中，每一偵測器之散粒雜訊係正比於該偵測器處之參考臂功率，乘以用於該偵測器之頻寬。由於該頻譜被分為相等二半，在偵測器1及2處之參考功率分別為，
作用於二偵測器之散粒雜訊的加總係，
其可與在時間域OCT中之單一偵測器的散粒雜訊相比，
因此，藉著透過二分離偵測器光譜上分散該偵測及光，信號會維持相同，同時雜訊會以2之倍數減低，導致2倍之淨SNR增益。
延伸以上之分析，其可顯示出散粒雜訊作用係減少等於偵測器之數目的倍數。對於N 偵測器元件之散粒雜訊的加總(其中各偵測器元件接收全參考功率之N 分之一)係為
該信號係與在時間域OCT中相同，且用於頻譜域OCT之SNR比係如下，
因此頻譜域OCT使得SNR之改進比時間域OCT超過百至千倍，此係取決於偵測器元件N之數目。使用一電荷耦合陣列或一積體化裝置作為偵測器，諸如(但不限於)一線掃描照相機，該比值N/BCW係由該陣列之積分時間τ l 所取代，此導致
第2圖顯示一範例性頻譜域OCT系統100，其包括一干涉儀102，係具有一來源臂104、一取樣臂106、一參考臂108、及一具有一頻譜分離單元112之偵測臂110、一由複數個偵測器與一相同複數個放大器116構成之偵測器陣列114。該等放大器116係經由附加類比處理電子系統(未顯示，但對具有此項技術之人士係已知)及A/D轉換器(未顯示，但對熟習此項技術人士係已知)耦合，用以轉換信號，且經由數位帶通濾波(BPF)單元122耦合至一處理及顯示單元124。
該處理及顯示單元124執行資料處理及顯示技藝，且可視需要包括數位帶通濾波(BPF)單元122，以及數位快速傅利葉轉換(DFFT)電路(未顯示)，以便提供信號之同調性結合，且執行資料處理及顯示功能。對於簡單強度測距與成像及/或都卜勒(Doppler)感應偵測，該偵測器陣列114可為1xN，對於雙平衡偵測為2xN，對於簡單強度測距及/或極化及/或都卜勒感應偵測為2xN，或對於結合雙平衡及極化及/或都卜勒感應偵測為4xN。或者是，可使用一MxN陣列用於任何數目「M」之偵測器114，以允許偵測在樣本130上之橫向空間資訊。
電磁輻射(如光)係從來源沿著來源臂104發射至分光單元通道，且在參考臂108及取樣臂106間分開。光沿著取樣臂傳播至組織樣本130，且經由參考臂108到達一波長相關相位配置。光係從該樣本及波長相關相位配置反射回該分光單元，在該處至少部份反射光係直接朝向頻譜分離單元112(其例如可設置成一光柵)。該偵測臂光係藉由頻譜分離單元112分散，且該頻譜係成像至偵測陣列114上。藉由使參考臂108長度步進一λ/8之距離，可決定參考臂108及取樣臂106光之交叉頻譜密度。處理及顯示單元接收饋入其中之信號，且執行該交叉頻譜密度之傅利葉轉換，以產生深度輪廓資訊。
第3A圖顯示依據本發明的一範例性系統之方塊圖，其顯示使用一單頻調整來源之同調頻率調變連續波(C-FMCW)系統。可操作為頻擾雷射系統的一單色雷射光70提供一光信號至一耦合器72之輸入72a。耦合器72將光信號分為一終止於一參考鏡面82之參考臂80，及一終止於一樣本86之取樣臂84。光傳下經路徑80、84，且從參考鏡面82與取樣鏡面86反射回，以經由耦合器72提供可由光偵測器88偵測之干涉信號。
如第3B至3D圖所示，當在二分別反射的光信號90(第3B圖)與92(第3C圖)間有一光學延遲時，一具有頻率f之拍(beat)信號94(見第3D圖)，可於光偵測器88處偵測到。沿該軸之樣本中有多數反射點處，由拍交叉點(beat notes)組成之該干涉具有正比於光學延遲差的頻率，該光學延遲差係介於樣本之反射(散射)點與參考鏡面間。各拍頻率分量之功率係正比於該散射器之反射率。因此，該樣本之影像可藉由該干涉資料之傅利葉轉換構成。
現請參考第4A至4D圖，其中與上述及第3A至3D圖中所示相似之元件係具有相同參考指示，依據本發明的一範例性具體實施例之光學頻率域成像(OFDI)系統包括一波長掃描雷射源95(在此也稱為頻率掃描來源95)，其提供一由多縱向模態構成之雷射輸出頻譜至一耦合器72之輸入。耦合器72將饋入其內之信號分為終止於參考鏡面82之參考臂80，及終止於樣本86之取樣臂84。從參考鏡面82與取樣鏡面86反射回之光信號，經由耦合器72提供一可由光偵測器88偵測之信號的頻譜。
信號頻譜之中心(或平均)波長藉由在該頻譜之前側處產生之新縱向模態，及在頻譜的尾側處之該模態消失而及時調整。
以上參考如第3A至3D圖描述之相同原理，也可應用於使用波長掃描雷射來源95之OFDI技藝。與一C-FMCW系統(上述第3A圖之系統)之案例相同的是，可產生一拍信號94。在使用一波長掃描雷射源之OFDI系統案例中，所可產生之拍信號94具有一拍頻率f，其對應於分別來自參考與取樣之光96及98之中心頻率的差。
介於縱向模態間之頻率間距應實質上大於偵測帶寬。該模態拍頻率(相對強度雜訊峰值)可在數位化前藉由一適當之電性濾波器(諸如低通濾波器)加以移除。該干涉信號94含有一正比於光學延遲之頻率分量。再者，該樣本之影像可藉由該已數位化干涉資料之傅利葉轉換構成。
在本發明一範例性具體實施例中，可使用一在雷射腔中之光學帶通掃描濾波器產生一快速掃描多頻模態輸出，以提供波長掃描雷射95。依據本發明之範例性濾波器係在下文中結合第6與9A圖說明。藉由在雷射腔中使用一光學帶通掃描濾波器，將無須調整該雷射腔長度，以提供該雷射頻譜之同步調整。確實，此配置無須將該雷射之縱向腔模態調整為與該雷射之中心波長相同的速率。
使用該OFDI技藝，該影像之單一像素可從該信號構成，該信號係在一A掃描期間記錄為時間之函數(經由傅利葉轉換)。此係與其中一單一像素係從一A掃描中短週期時間處量測到之資料所構成的TD OCT技藝不同。在相同A掃描期間中獲得相同數目之資料的偵測帶寬，係將近與TD與FD OCT二者相同。然而，藉由從在整個A掃描期間獲得的許多資料點中構成一單一影像像素，用於OFDI技藝之傅利葉轉換比TD OCT更有效地改進信號對雜訊比。此效應可導致一「有效」偵測帶寬，其係N倍大於實際偵測帶寬。因此，該SNR可增進N倍，其中N係在傅利葉轉換中(經數位化)資料點之數目。可顯示出在一限制散粒雜訊例中之SNR係如下：
然而，由於波長掃描來源之窄頻帶輸出頻譜，該相對強度雜訊(RIN)可明顯高於一CW寬頻光源。對於一熱光，RIN係定為1/Δv ，其中Δv =cΔλ/λ2 係(瞬間)來源輸出之光學帶寬。對於一雷射光，RIN來自不同統計值且因此具有一與熱光不同之值。對於FD-OCT，一具有低RIN位準之波長掃描雷射係較佳。具有多縱向模態之雷射光可與具有相同線寬之熱光具有類似RIN位準。在此例中，一抑制RIN之方法重要的是具有足夠SNR，諸如該雙平衡偵測。
使用一掃描來源造成具有減少散粒雜訊及其他形式雜訊的系統，其允許比目前系統更低之來源功率或更高之擷取速率。所增加之偵測靈敏度允許即時成像。此成像速度可協助解決諸如在腸胃、眼科及動脈成像領域中之動作假影的問題。藉由增加圖框速率同時維持或增進信號對雜訊比，此假影可最少。本發明也可使得能以OFDI技藝篩選大範圍組織，且允許能使用臨床可實行之篩選協定。
對於OFDI之眼科應用，該有效偵測較佳是允許明顯增加擷取速度。在眼科應用中可能之限制在於允許進入眼睛之功率須依據ANSI標準(在830奈米約700微瓦)。目前在眼科應用中之資料擷取速度係約每秒100至500 A-line。該功率有效偵測允許在每秒約100,000 A-line規模之A-line擷取，或在約每影像約3000 A-line之視頻速率成像。
達到SNR之增益係因為該散粒雜訊具有白雜訊頻譜。在頻率ω(或波長λ)出現於偵測器處之信號強度只促成在頻率ω處之信號，但該散粒雜訊係產生在所有頻率處。藉由使每一偵測器之光學帶寬變窄，在各頻率處造成之散粒雜訊可減少，而信號分量維持相同。
第5圖顯示用於使用頻率域干涉(OFDI)執行光學成像之系統99的一範例性具體實施例，其包括一放射一窄頻頻譜之頻率掃描來源100，在該來源中橫跨該增益媒體之頻寬的中心波長係連續地且重覆地調整。該瞬間放射頻譜由該光源之複數個頻率模態所組成。頻率掃描來源100可以各種不同方式提供，以下將說明其中一些方式。該來源100(例如)可從各種增益媒體、可調整波長濾波器、雷射腔組態提供。在此項技術中之已知裝置及方法可提供一快速調整波長掃描雷射來源，諸如固態雷射、主動離子摻雜波導雷射及光纖雷射。依一鎖模方式之波長掃描雷射也可使用，其在一縱向模態拍頻率之諧波間的頻率區域中具有低相對強度雜訊(RIN)之潛在優勢。可將一光學可飽和吸收器併入一雷射腔中，或在該來源之輸出埠後以降低RIN位準。
自掃描來源100提供之光係直接導向一光纖耦合器102，其將饋入其內之信號分為進入一參考臂103及一取樣臂104。在此範例性具體實施例中，耦合器102具有一90：10功率分光比，其中功率之90%直接向該取樣臂。然而，熟習此項技術之人士應瞭解也可使用其他耦合比用於耦合器102。使用在任何特定應用中之特定耦合比應加以選擇，使得一定量之功率會提供至參考臂及取樣臂二者，以允許依據本發明之範例性具體實施例之適當操作。
提供至取樣臂之功率通過一循環器111，且經由一橫向掃描成像探針照明一將成像之樣本136。參考臂較佳是提供一固定光學延遲。從一參考鏡面124及自樣本136內反射之該等光，可經由各自的循環器110、111導向一光纖分光器(或熔合式耦合器)150，且彼此干涉以產生干涉信號。
最好熔合式耦合器150具有一相等之分光比，其在該來源之波長調整範圍具有最小之極化相關性及波長相關性。來自相等分光之偏差導致該雙平衡偵測之共模抑制比(CMRR)的減低。在一具體實施例中，熔合式耦合器150最好設置為一主要寬頻分光器。熟習此項技術人士應瞭解可使用其他型式之耦合器(包括但不限於波長扁平光纖熔合式耦合器)。
干涉信號係由一雙平衡接收器151接收。接收器151之輸出係提供至一計算配置(如一資料擷取板及電腦160)，使得輸出係由該電腦配置數位化及處理，以產生影像。該資料擷取、橫向掃描及波長調整係同步地控制。
第6圖顯示(例如)可適用為一頻率掃描來源(諸如上述參考第5圖之頻率掃描來源100)之範例性光源100’，其係從一光纖170提供，經由一透鏡172及一光路徑174耦合至一光源/控制器176(以下稱為「光控制器176」)。光控制器176隨後被耦合至一或多數應用178中。應用178可(例如)對應於光學成像處理及/或光學成像系統、雷射加工處理及系統、光學微影及光學微影系統、雷射成形系統、電信處理及系統。因此，自濾波器170及光控制器176提供之範例性光源100’可被用於相當多種之不同應用，其某些一般性實例說明於下。
如以下將進一步說明，濾波器170允許光源100’操作成一頻率掃描來源，其放射之頻譜的中心波長在橫跨光控制器176之帶寬中可即時連續且重覆地調整。因此，光源100’可具有一由光源/控制器176之複數個頻率模態構成之即時放射頻譜。在此具體實施例中，光學波長濾波器170係配置成為一反射型濾波器，在其中輸入與輸出埠係相同。因此，光路徑174可(例如)設置成一輸入/輸出光纖，而透鏡172可對應於一準直透鏡。雖然在第6圖中濾波器170係顯示為經由光控制器176耦合至一或所有之應用178，也可能直接耦合濾波器170至一或多數應用178。另一選擇是，可能經由除光控制器外之裝置將濾波器170耦合至一或多數應用178。
在依據本發明之具體實施例中，光控制器176可包括一些特別適於發射一具有寬頻(f)頻譜的光束之系統(在一具體實施例，為光的已準直光束)。尤其是，該束光可包括在可見光譜(如，紅、藍、綠)中之複數個波長。由光控制器提供之該束光也可包括在可見光譜外界定之複數個波長(如，紅外光)。
如以下將參考第7圖更詳加說明，在本發明的一範例性具體實施例中，光控制器176可包括一單向光發射環。在將結合第9圖詳加說明之另一範例性具體實施例中，光控制器176可包括一線性共振器系統。該濾波器170包括一適於自光控制器176接收該束光之波長分散元件180，且將該束光分離成光之複數個不同波長，使其各沿著一已知之光路徑。該波長分散元件180可包括一或多數元件，係適於自光控制器176接收該束光，且將該束光分離成光之複數個波長，使其各導向一光路徑。該波長分散元件180係可進一步操作以將光之複數個波長導入相對於一光學軸182之複數個角方向或位置。在本發明一範例性具體實施例中，該波長分散元件180可包括一光分散元件，諸如一反射光柵184。該波長分散元件180另外可設置成一發射光柵(如一發射型式之光柵，諸如狄克生(Dickson)型式之全像光柵)、一稜鏡、一繞射光柵及一聲光繞射單元或此等元件的一或多數結合。
波長分散元件180將光以各波長沿相對光學軸182的一角度導向一透鏡系統186。各角度係由波長分散元件180決定。透鏡系統186可包括一或多數光學元件，其等適於自波長分散元件180接收光的已分離波長，且將該等波長之光導向或帶向及/或聚焦於一位於一光束偏向裝置188之預定位置上。該光束偏向裝置188可經控制以接收光之一或多數離散波長，且選擇性地將其等經由透鏡系統186再沿著光學軸182導回波長分散元件180及導回光控制器176。之後，光控制器176可將接收到之光的離散波長導向任一或多數之應用178。光束偏向裝置188可以各種方式形成及/或配置。例如，光束偏向裝置188可從包括(但不限於)一多邊形鏡面、一置於一旋轉軸上之平面鏡、一置於一檢流器上之鏡面，或一聲光調變器之元件中提供。
在第6圖所示之範例性具體實施例中，分散元件186包括一繞射光柵184、一透鏡系統186(其具有第一及第二透鏡190、192以形成一望遠鏡193)，及顯示成一多邊形鏡面掃描器194之光束偏向裝置188係。該望遠鏡193係由具有4-f組態之第一及第二透鏡190、192提供。望遠鏡193之第一及第二透鏡190、192之中心實質上係各位於光學軸182上。第一透鏡190係位於離波長分散元件180(如，繞射光柵184)之第一距離處，其係將近等於第一透鏡190之焦距F1。第二透鏡192係位於離第一透鏡190之第二距離處，該距離係將近等於第一透鏡190之焦距F1及第二透鏡192之焦距F2的加總。在此範例性配置中，第一透鏡190可接收來自波長分散元件180之光的已準直離散波長，且可有效地在光已準直之各個一或多數波長上執行傅利葉轉換，以提供投射至一影像平面(如第6圖之IP所指)上的相等一或多數匯聚光束。該影像平面IP係位於第一及第二透鏡間且距第一透鏡一預定距離，該預定距離係由第一透鏡之焦距F1所界定。在傳播通過影像平面IP後，該等匯聚光束形成由第二透鏡接收之相等的一或多數發散光束。第二透鏡係操作以接收該等一或多數發散光束，且提供相等數量具有相對於光學軸182之預定角位移的準直光束，用以將已準直光束導向或帶向光束偏向裝置188之預定部位。
望遠鏡193係配置以提供如上述的一些特徵，且進一步從光柵轉換發散角度分集至第二透鏡192後之匯聚角度分集，其係用於濾波器170之適當操作所需。此外，望遠鏡193提供一有用程度之自由度，其在多邊形鏡面194處控制調整範圍且減少光束尺寸，以避免一光束裁切。
如第6圖中所示，多邊形鏡面194較佳是只將在一窄通帶內之頻譜分量反射回，成為該多邊形之前鏡面的角度相對於該光學軸的一函數。
入射光束相對於光學軸之方位，及多邊形鏡面194之旋轉方向198決定了波長調整之方向：波長向上(正)掃描或向下(負)掃描。第6圖之配置產生一正波長掃描。應瞭解雖然在第6圖中顯示鏡面194為具有二半面，可使用少於或多於二半面。使用於任何應用之特定數目的面可取決於用於一特定應用的需求掃描速率及掃描範圍。再者，鏡面之尺寸係依據一特定應用之需求，其考慮因素包括(但不限於)可製造性及鏡面194之重量。也應瞭解透鏡190、192可以不同焦距設置。透鏡190、192應加以選擇以提供在將近鏡面194中心點200處的一焦點。
考慮具有從光纖準直器172入射至光柵之寬光譜的一高斯光束。該已習知光柵方程式係表為λ =p ‧(sinα+sinβ)，其中λ 係該光學波長，p 係光柵間距，且α及β係該光束相對於該光柵之標稱軸202的入射與繞射角。該濾波器之調整範圍的中心波長係由λ 0 =p ‧(sinα+sinβ 0 )給定，其中λ 0 係介於望遠鏡之光學軸38及光柵法線軸間的角度。其顯示濾波器之FWHM帶寬係為(δλ ) FWHM /λ 0 =A ‧(p/m )cosα/W )，其中對於雙倍通過A = 4I2/ π，m 係繞射階乘，且W 係1/e 2 (在光纖準直器處之高斯光束寬度)。當複數頻譜密度之實數部份已決定時，深度z係由z =所定。
該濾波器之調整範圍基本上受限於lens1 20之有限數值孔徑。無光束裁切之lens1的接受角度係定為Δ β=(D 1 -Wcos β 0 /cos α)/F 1 ，其中D 1 及F 1 係lens1之直徑與焦距。其經由Δλ =pcos β 0 ‧Δ β與該濾波器調整範圍產生關連。濾波器的一重要設計參數(起源於該多邊形鏡面之多面本質)係自由頻譜範圍，其將說明於下。在傳播通過lens1 20及lens2 22後之頻譜分量，將在相對於光學軸38之角度β’處具有一光束傳播軸：β’=-(β-β 0 )‧(F 1 /F 2 )其中F 1 及F 2 分別係lens1與lens2之焦距。該多邊形具有一由θ=2 π/N ~L/R 所定之面對面極角度，其中L 係面寬度，R 係多邊形半徑，且N係面之數目。如果入射頻譜之β’的範圍係大於該面角度，即Δβ’=Δβ‧(F 1 /F 2 )>θ，該多邊形鏡面在一定時間內會向後反射超過一頻譜分量。同時地反射之多頻譜分量的間距(或自由頻譜範圍)，可顯示為：(Δλ ) FSR =pcos β 0 (F 2 /F 1 )‧θ。
在如一腔內掃描濾波器之應用中，如果該增益媒體已均勻地加寬時，因為該雷射選擇最高增益之波長，該雷射之調整範圍不能超過自由頻譜範圍。藉由該濾波器調整之雷射的工作循環原則上可為100%，其中沒有由光束裁切造成之過量損耗(如果符合以下二必要條件)：
第一方程式係從透鏡192後之光束寬應小於面寬度的條件推導出。第二方程式係由於分別在該調整範圍之最高波長204、206處的二光束，在該多邊形鏡面處不應彼此重疊。在方程式(17)中之S 指透鏡192與該多數形之前鏡面間之距離。
在一實驗中，會選擇具有以下參數之光學組件：W =1.9毫米、p =1/1200毫米、α=1.2徑度、β 0 =0.71徑度、m =1、D 1 =D 2 =25毫米、F 1 =100毫米、F 2 =45毫米、N =24、R =25毫米、L =6.54、S =5毫米、θ=0.26徑度、λ 0 =1320奈米。從該等參數中，該理論FWHM帶寬、濾波器之自由頻譜範圍及調整範圍可經計算為：(δλ) FWHM =0.09奈米，Δλ=126奈米及(Δλ) FSR =74奈米。在(17)中之二條件均滿足於裕度。該濾波器之特徵係使用一從一半導體光學放大器(SOA)自發性放射光之寬頻帶放大器，及一光譜分析儀量測出。該光譜分析儀記錄在保持峰值模態中之經正常化通量(經反射)頻譜，而該多邊形鏡面係以其15.7赫之最高速度旋轉。所量測到之調整範圍係90奈米，係實質上小於126奈米之理論值。此差異係由於該望遠鏡之像差、主要場曲度，與來自光柵之光束的相當大角度發散有關。可預期能藉由使用最佳化透鏡改進該像差。該自由頻譜範圍係與理論計算一致之73.5奈米。FWHM帶寬經量測為0.12奈米。與理論極限0.11奈米之差異在考慮到該等光學元件之像差及不完美處時，可視為合理。
第7圖顯示一依據本發明一範例性具體實施例之延伸腔半導體雷射208，其可包括一(例如)與上述參考第6圖之濾波器170相同的濾波器210。濾波器210係經由一光導元件212及一光路徑214耦合至一法拉第(Faraday)循環器216。在此範例性具體實施例中，濾波器210包括一光柵232及一多邊形鏡面236。因此，濾波器210可對應於一以多邊為基礎之濾波器。一馬達234會驅動該鏡面。
此範例性具體實施例之法拉第循環器216係經由極化控制器220、222耦合至一增益媒體224，其在一範例性具體實施例中可為一半導體光學放大器(如，SOA，Philips，CQF 882/e型))，係從其耦合至提供一注入電流至該SOA 224之電流來源226。該腔內元件可(例如)由單模光纖連接。二極化控制器220、222可對準該腔內光之極化狀態，以對準光柵232之最大效率的軸，及SOA 224之最大增益。
一雷射輸出228可經由一光纖熔合式耦合器230之90%埠獲得。為產生一可用於潛在應用之同步信號，雷射輸出之5%可經由一具有0.12奈米帶寬之可變波長濾波器237耦合，且導向一光偵測器238。在一範例性具體實施例中，該濾波器之中心波長可固定在1290奈米。當該雷射之輸出波長係掃描通過該固定波長濾波器之窄頻帶通帶時，該偵測器信號會產生短脈衝。該同步脈衝之時序係藉由改變該濾波器之中心波長而加以控制。
第8A圖顯示一如上述參考第7圖型式的雷射輸出頻譜之圖表240，該圖表係在多邊形鏡面(即第7圖中之鏡面236)以15.7千赫之速率旋轉時，由一在保持峰值模態之光譜分析儀所量測。該邊至邊掃描範圍可從1282奈米至1355奈米，分佈在等於該濾波器之自由頻譜範圍的73奈米寬度。所量測頻譜之高斯狀輪廓(而非方形輪廓)，可能係由於因濾波器之極化靈敏度及腔內之雙折射造成的極化相關腔損耗。最好是調整該極化控制器，以獲得最大掃描範圍及輸出功率。
第8B圖顯示在時間域內之雷射輸出的曲線242。圖中上方之跡線244對應於一經由固定波長濾波器獲得的同步信號。來自面至面之功率變異的幅度係少於3.5%。峰值及平均輸出功率分別係9毫瓦及6毫瓦。應提及的是曲線240之y軸比例須由該時間域量測值校正，因為該雷射調整速度遠快於頻譜分析儀之掃描速度，因此該光譜分析儀只記錄一平均時間頻譜。
當光通過一SOA增益媒體(如，在第7圖中之SOA 224)時，可形成在該腔內雷射光之光譜中的頻率下移，成為頻帶內四波混合現象。在出現頻率下移時，該正波長掃描可有助於調整雷射頻譜，且據以產生更高輸出功率。該雷射輸出之峰值功率可量測為該調整速度的函數。該負調整速度可藉由反轉相對於一光學軸(如，第6圖中軸182)之該準直器位置及光柵方位而獲得。最好是使該濾波器之物理參數在二調整方向中約相同。因此，自我頻率偏移及正調整之結合動作允許獲得更高輸出，且使得該雷射能夠在更高調整速度下操作。因此，正波長掃描可為較佳之操作。輸出功率可隨著調整速度增加而降低。如此，一短腔長度可符合需求，以降低輸出功率相對調整速度之靈敏度。在此例中，一自由空間雷射腔係較佳。
第9A圖顯示依據本發明一範例性具體實施例之自由空間延伸腔半導體可調雷射250，其包括一半導體波導252，係製造於一經由一準直透鏡256耦合至一多邊形掃描濾波器255之基材晶片254上。一前鏡面258可為一抗反射塗層，且一輸出面260係黏有或較佳是塗佈介電質以具有一最佳反射率。該雷射之輸出262係經由輸出耦合透鏡264獲得。準直透鏡256、264最好設置為非球形透鏡。
濾波器255包括一適於接收從透鏡256導引至其之光束的波長分散元件180’。該波長分散元件180’可類似於以上參考第6圖說明之波長分散元件180。透鏡系統186’可置於波長分散元件180’及一光束偏向裝置188’間。波長分散元件180’及光束偏向裝置188’可類似於以上參考第6圖說明之波長分散元件180及光束偏向裝置188。透鏡系統186’包括一對透鏡187a、187b，其最好是設置成尤其是在場曲度具有低像差及慧發之消像差透鏡(achromat)。
一同步輸出可藉由使用位於該光之第0階繞射路徑上的一透鏡266、一針孔268及一光偵測器270獲得，該光係在來自一多邊形掃描器272之向後反射上。當一特定波長之光束的焦點掃描通過針孔268時，該偵測器產生一短脈衝。其他型式之增益媒體可包括(但不限於)稀土族離子摻雜光纖，Ti：Al2 O3 及Cr4+ ：鎂橄欖石。
第9B圖顯示依據本發明之波長可調濾波器280的另一範例性具體實施例，其可包括一耦合至一輸入準直透鏡282(光學上耦合至一繞射光柵284)之光纖281、一聚焦透鏡286及一旋轉碟288。繞射光柵284可由其他諸如一稜鏡之角度分散元件取代。在一範例性具體實施例中，繞射光柵284可有一具有已選定焦距之凹狀曲度，因此可無須聚焦透鏡286。
較佳是將多於一個反射器290置於旋轉碟288之表面288a上。較佳的是，反射器290包含多數週期性且徑向圖案化之窄條紋。反射器之材料最好是金。碟288可由一輕質塑膠或矽基材構成。除將該反射器置於該碟之上表面上外，該碟可具有一系列通孔，跟著為裝附至該碟後表面上之單一反射器。從光纖281入射之不同波長的光束可照射於該碟之表面上，由該光柵繞射及由透鏡286(在包括透鏡286之系統中)聚焦成一線。較佳的是，只有撞擊旋轉碟之反射器之光束可向後反射，且由光纖281接收。可使用一鏡面292以有助於該光束到該碟上。
從透鏡286至碟288之反射器的距離係等於該等透鏡之焦距F 。從光柵方程式可顯示出濾波器之調整範圍係由Δλ =pcos β 0 (D/F )所定，其中D 表示該等條紋間之距離。條紋之寬度(w )最好是製成實質上等於在該碟之表面上的光束點大小w s ，其中：
此導致由(δλ ) FwHM /λ 0 =A ‧(p /m )cosα/W )所定之FWHM濾波器帶寬，其中A =。對於w >w s ,濾波器帶寬變得更大，且對於w <w s ，濾波器之效率(反射率)係由於光束裁切而降低。入射光束294相對於透鏡286之光學軸的方位及旋轉方向288較佳地決定波長調整之感覺。正波長掃描係較佳，其係藉由以第9B圖中所示之順時針方向旋轉該碟288。
a.干涉儀
第10A圖顯示依據本發明之OFDI系統300的一範例性具體實施例，用以使用頻率域干涉法以執行光學成像，其包括一頻率掃描來源301，該頻率掃描來源301放射一具有由該光之複數個頻率模態構成的即時放射頻譜的光信號。來源301可(例如)設置成上述參考第4A、5、6、7、9及9B圖說明之該等來源中之一。來自來源301之光可被導向一光纖耦合器302，其將饋入其中之光分至一參考臂303及一取樣臂304。
參考臂303較佳是包括一極化電路306及一循環器308。因此，光從來源301傳播通過耦合器302、極化電路306及循環器308到達一光學動作假影電路309。該光學動作假影電路309可從一透鏡310提供，其將光導向移頻器311、一相位追蹤器312及一分散補償器314。光通過光學電路309且係入射在一參考鏡面316上。應瞭解電路309之功能在於移除或減少動作假影。也應瞭解的是電路309可包括所有元件310至314，及/或電路元件310至314中之一或多數。
取樣臂304可包括一循環器318。因此，一從來源301發射之光信號從來源301傳播經過耦合器302及循環器308至一透鏡320，透鏡320將光導至一掃描鏡面322。掃描鏡面322可從相當多種之光學元件中提供，包括(但不限於)一檢流計、一壓電致動器或另一功能上等效之裝置。一橫向掃描器324係耦合至掃描鏡面322及一資料擷取板與電腦326。該資料擷取板與電腦326也是耦合至頻率掃描來源301。
顯示於第10A圖中之OFDI系統300也可包括一經配置以從參考臂303及/或取樣臂304接收信號的極化分集平衡偵測(PDBD)電路334。尤其是，參考臂303係經由循環器308及極化控制電路330連接至該PDBD電路334的一參考埠。同樣地，取樣臂304係經由循環器318及極化控制電路332連接至該PDBD電路334的一取樣埠。
b.干涉儀
取樣臂304收集自組織樣本328反射之光，且係與來自參考臂303之光在極化分集平衡偵測(PDBD)電路334中結合，以形成干涉條紋。
例如，OFDI技藝無須在參考臂中之光學路徑長度被即時掃描。因此在本發明某些範例性具體實施例中，最好可將該參考臂設置成一固定延遲參考臂。此固定延遲參考臂可具有熟習此項技術人士已知之各種組態。
參考臂303可為反射及/或透射型式，且可使光從鏡面316返回。所返回之光係經由循環器308導向極化控制電路330。同樣地，自樣本338返回之光可經由循環器318導向極化控制電路332。參考臂也可透射而無反射。極化控制電路330可用以匹配參考臂光之極化狀態與取樣臂。在干涉儀中之整體雙折射應最小化，而不感生波長相關雙折射。該極化控制器可包括(但不限於)一根據彎折而感生雙折射或壓擠之光纖極化控制器。
較佳的是，該彩色分散應實質上在參考及取樣臂間匹配。強烈分散失配之結果可能是在軸向解析度上之損耗。任何殘餘分散可能由適當信號處理加以補償，諸如在傅利葉轉換前根據該偵測器資料之內插的非線性映射。此映射也可藉由調整波長掃描來源之光學佈置而達成(至少部份)。在其中該來源301包括一多邊形掃描器及一望遠鏡之實例中，在多邊形掃描器及望遠鏡間之距離可調整以在傅利葉轉換前轉換波長空間至波向量空間。
c.取樣臂
對於某些OFDI應用，該取樣臂可以一由一分裂(有角度、扁平或經拋光)光纖或自由空間光束構成之光學探針終止。可使用一透鏡336(諸如但不限於非球狀、傾斜指針、圓球狀、繞射狀、球、鼓狀或其類似者)將該光束聚焦於該樣本上或其內。光束導引元件(諸如但不限於鏡面、稜鏡、繞射光學元件或其類似者)也可包含在該探針中，以將已聚焦光束導至該樣本上的一需求位置。該光束之位置可為一時間之函數在該樣本上變化，此允許重建一2維影像。改變該已聚焦光束在樣本上之位置，可藉由掃描鏡面322而達成。掃描鏡面322可從各種不同裝置(包括但不限於一檢流計、壓電致動器、一光電致動器或其類似者)提供。
取樣臂探針可為一具有一內部移動元件之光纖探針，使得動作係在該探針的一近端開始，且該動作係藉由一動作轉變配置傳送(諸如，但不限於線、導線、轉速計電纜、彈簧、光纖或其類似者)至末端。該光纖探針可封入一光學透明固定護套中，光在該末端處離開探針。因此，掃描方式也可藉由移動該光纖而達成。例如，藉由旋轉該光纖或線性轉變該光纖。第10B圖顯示探針359之範例性具體實施例，其包括一內部電纜360(可沿該探針之軸旋轉或線性轉變)、一外部透明或半透明護套362、末端光學配件364及一REMIT光366(其可在相對於導管之任何角度)。
d.偵測
PDBD電路334可包括經置放以提供雙平衡偵測之複數個偵測器370。雙平衡偵測因以下原因而可能較適於某些應用。首先，大多數光源在相當低頻率產生1/f雜訊(f=頻率)且平衡偵測將消除1/f來源雜訊。其次，該取樣臂光與其本身之干涉項(即，一自動關連項)可出現在該真實信號項之上，其最好是取樣及參考項間之干涉。此自動關連項可藉由一差分技藝加以消除，且平衡偵測可自所量測之信號中消除此自動關連項。第三，RIN可減低。
偵測器370最好包括光二極體(諸如(但不限於)矽、砷化鎵銦、已延伸砷化鎵銦及其類似者)。平衡偵測可藉由減去相對最大及最小圖案係實際離相之二極體信號而實施。介於二偵測器信號間之差係藉由包括在PDBD電路334中之差分電路獲得，且由轉阻抗(Trans-Impedance)放大器(TIA)360放大。該雙平衡接收器可進一步跟著一低通或帶通濾波器，以去除偵測帶寬外之雜訊。
在本發明某些範例性具體實施例中，雙平衡偵測可實作如下：該極化分光器362自該參考及取樣臂接收信號，且提供二輸出信號。該等二輸出信號係進一步分別地由二非極化分光器364a、364b分開。來自各分光器364a、364b之輸出係由一從四個偵測器370提供之雙平衡接收器偵測。再者，該等雙平衡接收器的二輸出係在一電腦配置中經數位化且處理，以獲得一極化分集。
該接收器輸出會提供至電路326，其獲得且數位化經由A/D轉換器饋入其內之信號，且儲存該已數位化信號於電腦中用於進一步處理。該TIA之帶寬最好與取樣速率之半匹配。TIA之增益最好經選定，使得最大接收器輸出範圍係與該A/D轉換器之電壓範圍匹配。
e.處理
如果使用超過二偵測器，該等信號可選擇性相減且可獲得複數頻譜密度。使用傅利葉轉換，該複數交叉頻譜密度可轉換成組織中之深度輪廓。處理該複數交叉頻譜密度以獲得深度輪廓資訊之數個方法係此項技術中為人已知，諸如(但不限於)藉由在參考臂中獲得具有一Pi/2相位轉變的至少二信號，且接著藉由該等二信號的一些線性結合或藉由將頻譜密度平方，重新連接該複數交叉頻譜密度。
在偵測後，類比處理可包括一轉阻抗放大器、低通(帶通)濾波器及該信號之數位化。此信號可接著藉由傅利葉轉換操作轉成反射率，成為深度之函數。數位處理包括數位化、在頻率域或時間域中(FIR或TIR濾波器)之數位帶通濾波器、及逆傅利葉轉換，以將組織反射率回復成深度之函數。
在傅利葉轉換前，所偵測之非線性波長座標最好轉換成定期取樣波長向量空間。通常將信號補零(zero padding)、傅利葉轉換及再取樣之逆傅利葉轉換可用於再映射。其他此項技術中已知之內插法，諸如資料之線性、雙線性及立方樣條函數內插，也可用以轉換波長空間成為定期取樣k空間。此映射也可藉由調整該波長掃描來源之光學佈置而部份地達成。在一實例中，介於多邊形掃描器及望遠鏡間之距離，可經調整以在傅利葉轉換前轉換波長空間成為波向量空間。
本發明另一範例性具體實施例可使用以下所述一或多種技藝，以進一步強化成像之效能及功能性。此等技藝不限於使用一多頻模態調整來源之OFDI技藝，而是可應用於使用一單頻調整來源之OFDI技藝中。
a.極化分集
對於極化衰減係一問題之應用而言，可使用一極化分集方法。用於極化分集之各種組態係此項技術中為人已知。
在第10A圖所示之系統中，極化分集電路之操作如下。極化分光器362根據其等之極化狀態分隔該參考臂及取樣臂光信號。極化控制器330最好經調整，使得參考臂功率係由極化控制器分成相同大小。該取樣臂功率之極化狀態由於探針或取樣動作可假設是隨機地變化，因此藉由極化分光器分隔之樣本臂功率的比率可依時間變化。然而，在極化分光器362的二輸出埠處之二輸出信號可由一光接收器偵測到(如平方及加總)。所產生之信號係與取樣臂光之極化狀態無關。
b.載波頻率外差式偵測
光學移頻器311可位於參考臂303中以轉變光學頻率，用於載波頻率外差式偵測。結果，該信號頻帶係由該頻率轉變之大小轉變。以此方式，可避免圍繞DC之相當大的1/f雜訊(f=頻率)及RIN。該移頻器可為(但不限於)一聲光移頻器。在該偵測中，應使用一適當電子裝置以解調該載波頻率。
使用移頻器311的優勢之一係有效測距深度可加倍。此可在如第10C圖中所示之電性頻率域中顯示，其中圖形380例示由該來源之瞬間輸出頻譜所給定的條紋能見度曲線。如果該來源之瞬間頻譜係高斯，則該能見度曲線具有一高斯輪廓。曲線390例示一濾波器之透射效率輪廓，其對於定義為取樣頻率之半的給定奈氏(Nyquist)頻率係最佳。第10C圖之(a)部份顯示一典型情況，其中在干涉儀中沒有移頻器，且該濾波器係一低通濾波器。因為該正及負頻帶係不可區分，分別與正及負頻帶關連之影像係重疊。因為此不明確性，在此例中只有一半之頻率範圍(0至fN)或(0至-fN)可使用。然而，使用一移頻器導致能見度曲線轉變fFS，如第10C圖之部份(b)所示。當具有一帶通濾波器(或一低通濾波器)時，在二側之頻率中心處的fFS會產生明確之影像，導致二倍大於第10C圖部份(a)之測距深度。
除方形頂之帶通濾波器外，可使用一斜率式濾波器。在第10C圖部份(c)所示之實例中，濾波器之透射效率曲線390在其低頻帶中具有一指數上昇(下降)斜率。此濾波器在衰減明顯且產生信號強度隨深度衰退時相當有用。該斜率式濾波器可藉由有效抑制來自表面相對於較大深度處之大信號而改進該偵測之動態響應範圍。
c.參考臂延遲(相位追蹤及自動測距)
如上述，該OFDI技藝無須即時掃描在參考臂中之光學路徑長度。一固定延遲參考臂可以熟習此項技術人士所知之各種組態製成。該參考臂可為反射或透射型式。
在某些應用中，當需要一較大測距深度時，變化在參考臂中之光學延遲的能力將會有用，無須增加資料擷取速率或減低該光源之瞬間線寬。此能力在距成像透鏡與樣本前表面之距離可明顯變化的一臨床研究上將會有用。此變異可起因於一探針導管之動作或未經控制之位置。例如，在血管內的一旋轉導管在一單一A-掃描中可具有數毫米之距離變異。
一在參考臂303中之機制可允許用以掃描參考臂303之群組延遲。此群組延遲可藉由熟習此項技術人士所知之任何一些技藝產生，諸如(但不限於)伸張一光纖、使用一壓電轉換器之自由空間轉變掃描、或經由一以光柵為基礎之脈衝成形光學延遲線。較佳的是，該延遲可藉由一非機械式或無動作配置導入。至於名詞「非機械式」，其意指未使用機械式移動零件。缺乏機械式移動零件咸信可減少習知使用機械式裝置以導入延遲之缺點。與傳統LCI或OCT系統相反的是，依據本發明一範例性具體實施例之參考臂303不一定需要掃描過該樣本中全程深度，且較佳是可掃描等於佔偵測器數目分之一(1/N)的至少一部份測距深度。此掃描特徵係與使用在LCI及OCT系統中之習知延遲掃描方法不同。參考臂303視需要可具有一相位調變器機制，諸如(但不限於)一聲光調變器、光電相位調變器或其類似者，以產生一載波頻率。
最好執行相位追蹤以消除在干涉儀中之相位不穩定性。相位不穩定性可造成個別干涉條紋移位。如果偵測相對於該條紋之移位係較慢，所產生之平均會導致干涉信號之頻擾。10至40千赫之A-掃描速率導致一100至25微秒之有效積分時間。在一短於積分時間之時間架構上引起的相位不穩定性應加以補償。相位鎖定電路係一般用於電子裝置中，且係經常用於雷達及超音波中。主動相位追蹤可執行藉由以一在參考臂中之光電相位調變器，對該波長的一分量調變於10MHz之干涉儀路徑長度差。藉由在該路徑長度調變之頻率解調變在該干涉儀之輸出處，由一偵測器所量測的強度，可產生一誤差信號以指出該相位調變器應移位以鎖定在一條紋幅度最大值上之方向。藉由增加一如該誤差信號所決定之偏移至該相位調變器，該相位追蹤器主動地鎖定在一條紋最大值上。
該相位調變器可在一些波長上調變該路徑長度差。該處理單元可決定該相位調變器是否已達到其範圍限制，且在相位中跳躍一全波，以維持鎖定在一不同條紋最大值。此方式利用相位只應控制模數2π之事實。此外，該處理驅動一較慢組件(如，快速掃描光學延遲(RSOD)線)，以延伸該相位調變器/RSOD結合之路徑長度範圍數毫米。相位鎖定可根據在解調變電路中執行之混合型式在一條紋最大值、最小值或零交越上執行。
本發明之另一範例性具體實施例也可使用自動測距技藝，包括描述於美國專利申請公開案第2002/0198457號中之處理技藝，其揭露書在此以引用方式全數併入。在一範例性具體實施例中，該自動測距機制包括一處理器單元，用以(a)獲得一第一掃描線；(b)尋找一樣本之表面位置「S」；(c)尋找該樣本之最佳掃描範圍「R」；(d)修改一參考臂延遲波形以提供一輸出；(e)將該輸出輸出至一參考臂；(f)決定該影像是否完整；及/或(g)如果該影像係不完整，則移至下一掃描線，或如果該影像係完整，使用儲存在記憶體儲存裝置中之表面S資料及波形資料再映射該影像。
如果來自該樣本之光信號具有一低幅度，相位鎖定可能由於雜訊之出現而不穩定。在本發明另一範例性具體實施例中，一分離、較佳是單色之光源可被發射至該干涉儀中。該分離來源波長可在該OFDI來源之波長調整範圍中，或可位於一與該OFDI來源頻譜之不同波長的中心處。該分離來源最好有更高功率，且可與行至參考及取樣臂之來源臂結合(使用波長區分、多工器、光柵、稜鏡、濾波器或其類似者)，且回到光束再結合元件。已返回之分離來源光可接著在經由光束再結合元件(即，分光器輸出)透射回，而從OFDI光分離。一分離配置可藉由一分散元件(諸如二色性鏡面、濾波器、光柵、稜鏡、波長區分多工器或其類似者)執行頻譜分離。該分離來源可使用一或多數偵測器自OFDI光分別加以偵測。由此分離來源提供之更高功率可使得能夠偵測一較高幅度干涉圖案，且提供一經增進之輸入至該相位追蹤器，因此能有更穩定之相位追蹤。
現請參考第11圖，其顯示一在15.7千赫之A-line掃描速率處獲得之實驗對象手指的一活有機體影像(300x500像素)，係使用依據本發明之系統及過程的範例性具體實施例。該光學靈敏度經量測為約-100分貝。SNR係優於一相等A-line掃描速率之等同TD OCT。當有來自組織表面之強鏡面狀反射時，垂直線雜訊會由於一未最佳化偵測而引起，但最好是藉由一偵測最佳化及/或一適當信號處理實質上加以消除。
第12圖顯示提供依據本發明之相位追蹤系統600的另一範例性具體實施例，其具有一已延伸相位鎖定範圍。此係藉由將一快速元件602(其可例如設置成一光電(EO)相位調變器602)，以便在一小範圍上調變路徑長度差，及一較慢元件604(其可例如設置成一快速掃描光學延遲(RSOD)線604)，以便在一已延伸範圍上調變路徑長度。偵測器606信號可藉由一混合器610與相位調變器調變頻率608混合，且經低通濾波(濾波器未顯示)以產生一誤差信號。處理單元612較佳是處理該誤差信號以產生一偏移電壓，且將此偏移電壓加至調變信號608中，以產生用於相位調變器驅動器614之輸出。此外，處理單元612可產生一信號至RSOD 604，以提供橫跨數毫米距離的相位之已延伸範圍追蹤。光源616、光纖分光器618、取樣臂620及參考臂622係顯示及在此描述。
在該條紋圖案的一單一振盪中之特定時間，於偵測器處之強度I(t)係給定如下
I(t) =cos[ψ(t )]
其中相位ψ提供在條紋中之位置。對於ψ=0，該信號係在條紋最大氫，對於ψ=π，該信號係在條紋最小值。在任何時間t，相位ψ(t)係定為，
ψ(t)=α+βsin(ωt )
其中α描述該條紋圖案之單一振盪中的位置，而β*sin(ωt )係由相位調變器導入之相位調變，β為相位調變之幅度，而ω為相位調變信號之頻率。在光偵測器處之強度I(t)可與在頻率ω及2ω之載波混合，產生混合器信號MixerC(t)、MixerS(t)、Mixer2ωC(t)及Mixer2ωS(t)，
MixerC (t)=cos(ωt)*cos(α+βsin(ωt))；
MixerS (t)=sin(ωt)*cos(α+βsin(ωt))；
Mixer2 ωC (t)=cos(2ωt)*cos(α+βsin(ωt))；
Mixer2 ωS (t)=sin(2ωt)*cos(α+βsin(ωt))。
分佈在MixerC、MixerS、Mixer2ωC及Mixer2ωS之載波頻率ω的單一振盪上之時間平均係定為=0;=sin(α)*J 1 (β);=cos(α)*J 2 (β)；=0，其中J 1 (β)及J 2 (β)係第一類之貝索(Bessel)函數；其值取決於β(相位調變之幅度)。因此，該信號及係分別正比於sin(α)及cos(α)，其中α為該條紋圖案之單一振盪中的位置。該混合器輸出而Mixer2 ωC(t) 係用作產生一偏移電壓之誤差信號，以將該相位調變器帶至一使誤差信號最小化之新中心位置，且鎖定該干涉儀輸出分別在一條紋最大值或最小值、或一零交越上。該複數頻譜密度現可藉由二連續調整掃描決定，一者使誤差信號sin(α)最小化，而次一者使誤差信號cos(α)最小化，導致在二干涉圖案間之90度相位轉變。使用此混合配置，該複數頻譜密度可快速地獲得且無須依靠一額外的機械配置用以改變參考臂光之相位。
第13圖顯示一包括一相位追蹤器之OFDI系統700的進一步範例性具體實施例，其用以提供依據本發明之平衡偵測。在此範例性具體實施例中，來源702提供一通過分光器704之電磁輻射(如，光)，分光器704傳送部份的光至一取樣探針706，及其餘的光至一快速掃描光學延遲(RSOD)線708。光係從RSOD 708傳至相位調變器PM 710。來自相位調變器PM 710之光係傳過分光器712，而後通過二額外分光器714及716，其輸出的一部份被當作平衡偵測輸出傳送至頻譜偵測單元(未顯示，但說明於本文別處中)，且剩餘之輸出係傳送至相位追蹤器組件720。在相位追蹤器組件720中，相位追蹤器偵測D1 及D2 (722及724)、接收該對分光器714及716之部份輸出，其最終傳送信號至一混合器726，以產生一誤差信號。處理單元728處理該誤差信號，其中該加總產生偏移電壓且將此加至調變信號730中，以產生用於相位調變器驅動器732之輸出。在方塊730處顯示之調變信號，被轉送至混合器726及處理單元728。此外，條紋幅度可能太小以致相位追蹤器無法鎖定。或者是，一具有較長同調長度之第二來源可耦合至系統700(如提供一較大條紋幅度至該相位追蹤器)。
第14A至14C圖顯示依據本發明用以在一成像系統中追蹤相位之方法的一範例性具體實施例，係由處理步驟750及752開始，藉由量測接收自取樣臂之信號而後增加該信號的一相位。此範例性方法之處理接著前進至步驟754，其中會在定義為x1 之信號的一第一信號分區量測該信號的至少一峰值。在判斷步驟756，會決定是否已在定義為x1 之信號量測該信號之至少一峰值。如果在判斷步驟756中，其決定已在定義為x1 之信號量測該信號之至少一峰值，則處理回到步驟754且再量測該信號。
另一方面，如果在判斷步驟756中決定未在定義為x1 之信號量測該信號之至少一峰值，則處理流向一判斷步驟758，在其中會作成是否調整該信號之決定。該調整可(例如)藉由如步驟760及762中所示之增量，在該信號之相位中增加或減少。不管是在該信號之相位中進行增加或減少，處理會回到處理步驟754，其中會在其峰值處量測該信號的一第二信號分區。步驟756至762接著係針對此量測信號重覆。應瞭解步驟750至762之功能可與其他成像過程並行及/或接續地執行。
相位「ψ」之調整可定義為A(x2 -x1 )，其中「A」係一常數，而決定是否以一增量增加或減少該信號之相位的過程，可更包含下列子步驟：(1)決定A(x2 -x1 )是否在相位調變器之範圍內；及(2)如果A(x2 -x1 )是在範圍中，則以一等於A(x2 -x1 )之量改變ψ，或如果A(x2 -x1 )是在範圍之外，則以等於A(x2 -x1 )-m2π之量改變ψ，其中m係大於1之整數。該方法視需要可更包含一子步驟(3)：再量測信號x1 。
d.資料處理
一般而言，由偵測器即時記錄之資料可能無法被取樣為一光學頻率ω或波數k之嚴格線性函數。然而，傅利葉轉換可連結z及k空間(或t及ω)。因為在k中之非線性取樣，所獲得之頻譜會被內插以產生在k域中之均勻分佈樣本。另一選擇是，該雷射之調整斜率的調整方式可使得在k空間中光是以相同間隔地取樣，因此不需要該內插。另一選擇是，偵測時序可經設計以在k域中均勻取樣該光，使得該內插不需要。為達到最佳點展開函數，在干涉儀之取樣及參考臂中之分散最好能平衡。分散不平衡也可藉由數位化處理加以修正。由動作感生之相位干擾也可藉著數位化修正。對於動作假影修正，會量測該樣本之軸向動作，且可從該動作之速度計算適當非線性映射。
各種內插法技藝對熟習此項技術人士係已知。此包括(但不限於)簡單二點內插法、FFT補零接著二點內插法、及具有由奈氏理論支配之正弦函數的精確內插法。
本發明的一範例性具體實施例也可提供一探針，用以在血管中尋找動脈硬化血小板，其至少包含：一干涉儀；一頻譜分離單元，其將從干涉儀接收之信號分成複數個光學頻率；及一偵測器配置，其能夠偵測自該頻譜分離單元接收之光學頻率的至少一部份。
e.移頻技藝
對於高速OFDI技藝，最大測距深度可能會受限於雷射輸出之同調函數的有限寬度，因為該同調長度通常須妥協以獲得較高調整速度、較高輸出功率或較寬之調整範圍。當干涉儀之路徑長度差增加時，該有限同調長度可造成干涉條紋之能見度降低。此導致SNR之退化，且因此限制了最大測距深度。再者，無法在一習知干涉法中區分一正及負頻率，可能導致正及負深度間之模糊不明確。為避免此影像重疊假影，干涉儀之參考延遲應調整，使得該影像只呈現在正或負深度中之一。此進一步可對於該來源的一給定同調長度限制該測距深度。
為避免此可能的限制，業已使用一壓電致動器、雙折射板或3x3耦合器，根據主動或被動相位偏置量測正交干涉信號。此等技藝或可提供與正及負深度有關之重疊影像，但易於因為難以產生穩定正交信號而留下殘餘假影。在此文件中，本發明人提出且示範一簡單技藝，可有效地消除正及負深度間之不明顯。
依據本發明之範例性具體實施的一範例性技藝使用在干涉儀中之光學移頻器，以提供該偵測器信號之固定移頻。此允許使用同調範圍之二側而無串音，且將可達深度加倍。相同之概念已在以上使用於58赫處之旋轉雙折射板或一再循環移頻環之一維光學頻率域干涉法的文脈中描述。在此範例性具體實施例中，係使用一聲光移頻器，且該技藝係應用至具有數倍快之測距速度的高速OFDI。再者，會提供一依據本發明進一步範例性具體實施例之信號處理技藝，以容納在該移頻技藝中掃描來源的一非線性調整斜率。
A.　原理
移頻
第15圖顯示依據本發明之OFDI系統的一高階圖形，其包括一波長掃描來源95、利用一在參考臂80中之光學移頻器311的單模光纖干涉儀、一光偵測器88及一信號處理器160。以一在參考臂中Δf之來回移頻，與介於參考及取樣臂光間之干涉有關的光電流可表示成：
其中η表示偵測器之量子效率，Pr(t)及Ps(t)分別為參考及取樣臂光之光學功率，R(Z)係該樣本之反射率輪廓，而G(|z|)係對應於條紋能見度之同調函數，c為光速，v(t)為光學頻率，且ψ(t)係背向散射之相位。在一線性調整之例中(即，v(t)=0-1t)，偵測器信號之頻率係給定為
零信號頻率對應於一深度z=cΔf/(2v1)。因此，藉由選出與掃描來源方向相同之移頻方向，零信號頻率可用以指向一負深度。第16(a)及16(b)圖示範移頻之效果。該條紋能見度或同調函數在零深度具有一峰值且隨深度增加而降低。該同調長度zc 指能見度降至0.5之深度，且因此SNR下降達6分貝。可定義該有效測距深度為最大深度範圍，其中該SNR損失係少於6分貝。例如，在第16(a)圖中，由於該信號頻率之符號不明確而可使用該同調範圍之單側(有陰影線區域)。相反地，如第16(b)圖中所示，以一適當之移頻，即可使用同調範圍從-zc 至zc 的二側，而負及正深度間無影像干擾。
非線性調整
v(t)中相對於時間之非線性導致該信號在一固定深度處之頻擾，且造成軸向解析度之退化。至於此問題之解答，該偵測器信號可以非線性時間間隔取樣以補償頻擾。另一選擇是，該偵測器信號可以一固定時間間隔取樣，且接著該已取樣資料可在離散傅利葉轉換(DFT)前藉由內插法映射至一均勻v空間。二方法均經驗證以得到一轉換限制(transform limited)軸向解析度。然而，此等方法不能直接應用於移頻技藝中。非線性取樣及內插法二者均可導致移頻之假影頻擾，導致次最佳軸向解析度。因此，一經改進之內插方法可用以在整個測距深度上達成近乎轉換限制軸向解析度。該範例性技藝可如下：
步驟1.在該來源的各波長掃描時，以均勻時間間隔獲得N個樣本。
步驟2.在該電性頻率域中產生N資料點之DFT。
步驟3.分別對應於負及正深度，分離在Δf下及上之二頻帶。
步驟4.轉變各頻帶，使得零深度係對準該零頻率。
步驟5.應用補零至各頻帶且執行逆DFT，在時間域中以用於各頻帶之較小時間間隔產生增加數目之樣本的一陣列。
步驟6.使用由該掃描來源之非線性提供的一適當映射函數，將在時間域內之各陣列內插至一均勻v空間。
步驟7.實行各個已內插陣列之DFT。
步驟8.藉由轉變該陣列指數結合該二陣列(影像)。
結果，該零深度會出現在Δf之頻率中。
B.　實驗
OFDI系統
第17圖例示依據本發明之範例性具體實施例利用二聲光移頻器(FS1 800及FS2 802，Brimrose公司AMF-25-1.3)之範例性OFDI系統的實驗設置。該等二移頻器能以電壓控制之振盪器驅動，以產生一Δf=FS2-FS1之淨轉變。二移頻器之使用自動地平衡聲光晶體之材料分散。包括光纖耦合之各裝置的插入損耗可少於2.5分貝。數位器之取樣速率可為10MHz。可建構該掃描雷射100以提供108奈米之調整範圍及從1271奈米至1379奈米(v1=135GHz/μs)之集中掃描。雖然可達到高達36千赫之重覆速率，該雷射係在較低之7千赫操作，且在單一波長掃描期間獲得1300樣本。此導致在對應於5MHz奈氏頻率的影像中之5.8毫米深度。探針810可包括一檢流計鏡面及一成像透鏡，產生一具有1.1毫米之共焦參數的探針光束。一光學分接頭耦合器820可與一窄頻帶濾波器830及一光偵測器834結合使用，以在電路836中產生一TTL觸發信號。該TTL信號可被用作在類比對數位轉換中的一觸發器。
該干涉信號可使用一雙平衡偵測器151量測。該偵測器信號在數位化前會使用一低通濾波器840進一步處理。其他型式之濾波器諸如一帶通濾波器及一斜率式濾波器。斜率式濾波器之透射在其低頻帶中可具有一指數上升(下降)斜率。此濾波器在衰減明顯且產生信號強度隨深度衰退時將會有用。該斜率式濾波器可藉由有效抑制來自表面相對於較大深度之大信號而增進該偵測之動態響應範圍。
為特徵化掃描雷射100之同調函數，該系統之點展開函數可在該參考鏡面之各種位置處以一部份反射器於Δf=0(FS1=-25MHz，FS2=-25MHz)處量測。比較時，在各深度獲得之取樣資料係具有或不具有映射過程處理。第18(a)及18(b)圖顯示範例性結果，其中y軸表示對在零頻率之值正常化的DFT幅度之平方，而底或頂部x軸分別表示信號頻率及深度z。沒有映射時，點展開函數在深度增加時會遭遇峰值功率之明顯加寬及大幅度退化，此係因為掃描雷射之非線性[參見第18(a)圖]。然而有映射時，展開函數顯現近乎轉換限制軸向解析度，如第18(b)圖中所示。該雷射輸出之有限同調長度說明信號功率深度之降低。在5.8毫米之整個深度範圍，SNR係減少超過11分貝。依據先前介紹之有效測距深度的標準，對應於同調長度之深度可能只有2.9毫米(影像中全數之半)。相同之實驗係以Δf=-2.5MHz(FS1=-22.5MHz，FS2=-25MHz)之非零移頻實行。第18(c)及18(d)圖分別顯示具有或不具有映射過程時之點展開函數。如此等圖形中所示，在2.5MHz之頻率於零深度出現之信號功率的峰值，係至少將近等於該淨聲光頻率轉變。在第18(d)圖中觀察到之將近轉換限制軸向解析度驗證了映射技藝。在5.8毫米之整個深度範圍中信號功率之減低係少於5分貝，示範了移頻技藝就延伸測距深度而言之優勢。
影像
一已取出之人體肺部組織的範例性成像係以OFDI系統實行。第19圖例示在相同實驗條件下獲得的二影像(A及B)，除了對於A，Δf=0，而對於B，Δf=-2.5MHz。各影像均以上述映射技藝取得。組織之表面係以相對於探針光束軸成一角度置放，且參考鏡面之位置使得該信號係出現在影像中之正及負深度。在A中，該組織影像係包含在2.8毫米之有效測距深度中，即全部深度範圍之上半部。然而，在取樣位置中之相當大差異導致成像重疊假影。相反地，在B中，利用移頻技藝增加測距深度至5.8毫米，使得整個正及負深度可顯示出而無不明確。
以上僅示範本發明之原理。對於已瞭解本文教示之熟習此項技術人士，將明白已描述具體實施例之各種修改及改變。因此應瞭解熟習此項技術人士將能提出各種系統、配置及方法，其(雖然未明白顯示或說明)具體化本發明之原理，且因此落入本發明之精神及範疇中。
10．．．系統
12．．．寬頻來源
14．．．分光器
14a．．．第一臂
14b．．．連接埠
14c．．．連接埠
16．．．參考臂
18．．．取樣臂
19．．．取樣容積
19a．．．構造
19b．．．構造
19c．．．構造
20．．．配置/lens1
22．．．配置/lens2
24．．．偵測器
26．．．軸向掃描資料/影像
38．．．光學軸
70．．．單色雷射光
72．．．耦合器
72a．．．輸入
80．．．參考臂
82．．．參考鏡面
84．．．取樣臂
86．．．樣本
88．．．光偵測器
90．．．反射光信號
92．．．反射光信號
94．．．拍信號
95．．．波長掃描雷射來源
96．．．光
98．．．光
99．．．系統
100．．．頻率掃描來源/頻譜域OCT系統
100’．．．光源
102．．．干涉儀/光纖耦合器
103．．．參考臂
104．．．來源臂/取樣臂
106．．．取樣臂
108．．．參考臂
110．．．偵測臂/循環器
111．．．循環器
112．．．頻譜分離單元
114．．．偵測器陣列
116．．．放大器
122．．．數位帶通濾波單元
124．．．處理及顯示單元
130．．．樣本/組織
136．．．樣本
150．．．分光器/耦合器
151．．．雙平衡接收器
160．．．電腦/信號處理器
170．．．光纖/濾波器
172．．．透鏡
174．．．光學路徑
176．．．光學控制器
178．．．應用
180．．．波長分散元件
180’．．．波長分散元件
187a．．．透鏡
187b．．．透鏡
182．．．光學軸
184．．．反射光柵
186．．．透鏡系統/分散元件
186’．．．透鏡系統
188．．．光束偏向裝置
188’．．．光束偏向裝置
190．．．第一透鏡
192．．．第二透鏡
193．．．望遠鏡
194．．．多邊形鏡面掃描器
198．．．旋轉方向
200．．．中心點
202．．．標稱軸
204．．．最高波長
206．．．最高波長
208．．．半導體雷射
210．．．濾波器
212．．．光導元件
214．．．光路徑
216．．．法拉第循環器
220．．．極化控制器
222．．．極化控制器
224．．．增益媒體/SOA
226．．．電流來源
228．．．雷射輸出
230．．．耦合器
232．．．光柵
234．．．馬達
236．．．多邊形鏡面
237．．．可變波長濾波器
238．．．光偵測器
240．．．圖表
242．．．曲線
244．．．跡線
250．．．半導體可調雷射
252．．．半導體波導
254．．．基材晶片
255．．．多邊形掃描濾波器
256．．．準直透鏡
258．．．前鏡面
260．．．輸出面
262．．．輸出
264．．．輸出耦合透鏡
266．．．透鏡
268．．．針孔
270．．．光偵測器
272．．．多邊形掃描器
280．．．濾波器
281．．．光纖
282．．．準直透鏡/輸入
284．．．繞射光柵
286．．．聚焦透鏡
288．．．旋轉碟/旋轉方向
288a．．．表面
290．．．反射器
292．．．鏡面
294．．．入射光束
300．．．OFDI系統
301．．．頻率掃描來源
302．．．光纖耦合器
303．．．參考臂
304．．．取樣臂
306．．．極化電路
308．．．循環器
309．．．光導向移頻器
310．．．透鏡
311．．．光學動作假影電路
312．．．相位追蹤器
314．．．分散補償器
316．．．參考鏡面
318．．．循環器
320．．．透鏡
322．．．掃描鏡面
324．．．橫向掃描
326．．．資料擷取板與電腦
328．．．組織樣本
330．．．極化控制器電路
332．．．極化控制器電路
334．．．PDBD電路
336．．．透鏡
359．．．探針
360．．．內部電纜/轉阻抗放大器
362．．．護套/分光器
364．．．末端光學配件/分光器
364a．．．非極化分光器
364b．．．非極化分光器
366．．．REMIT光
370．．．偵測器
380．．．圖形
390．．．圖形
600．．．相位追蹤系統
602．．．快速元件/光電相位調變器
604．．．較慢元件/RSOD線
606．．．偵測器
608．．．相位調變器調變頻率
610．．．混合器
612．．．處理單元
614．．．相位調變器驅動器
616．．．光源
618．．．光纖分光器
620．．．取樣臂
622．．．參考臂
700．．．OFDI系統
702．．．來源
704．．．分光器
706．．．取樣探針
708．．．快速掃描光學延遲線
710．．．相位調變器
712．．．分光器
714．．．分光器
716．．．分光器
720．．．相位追蹤器組件
722．．．相位追蹤器
724．．．相位追蹤器
726．．．混合器
728．．．處理單元
730．．．調變信號
732．．．相位調變器驅動器
800．．．聲光移頻器
802．．．聲光移頻器
810．．．探針
820．．．光學分接頭耦合器
830．．．窄頻濾波器
834．．．光偵測器
836．．．電路
840．．．低通濾波器
為更完整瞭解本發明及其優勢，現將參考以下結合附圖之說明，其中：
第1圖係時間域光學同調攝影(OCT)系統之方塊圖；
第2圖係使用頻譜雷達技藝執行頻率域成像之系統的方塊圖；
第3A圖係依據本發明一範例性具體實施例使用同調單頻調整來源執行頻率域成像之系統的方塊圖；
第3B與3C圖係波長相對於幅度之圖形，其配合顯示由第3A圖中系統產生之頻率轉變的出現；
第3D圖係由第3A圖之系統產生的拍信號之圖形；
第4A圖係依據本發明另一範例性具體實施例使用多縱向模態波長掃描來源，執行頻率域成像之系統的方塊圖；
第4B與4C圖係波長頻譜之圖形，其配合顯示由第4A圖的系統產生之頻譜中之一轉變的出現；
第4D圖係由第4A圖之系統產生的拍信號之圖形；
第5圖係依據本發明另一範例性具體實施例使用波長掃描來源執行頻率域成像之系統的方塊圖；
第6圖係依據本發明一範例性具體實施例之光學波長可調整濾波器配置的方塊圖；
第7圖係依據本發明一範例性具體實施例之波長掃描雷射配置的方塊圖；
第8A圖係在第7圖之波長掃描雷射輸出處量測的一雷射輸出頻譜之範例性圖形；
第8B圖係在第7圖之波長掃描雷射輸出處量測的一雷射輸出頻譜之範例性圖形；
第9A圖係依據本發明又另一範例性具體實施例具有一多邊形鏡面之波長可調整濾波器配置的方塊圖；
第9B圖係依據本發明再另一範例性具體實施例一具有反射碟之波長可調整濾波器配置的方塊圖；
第10A圖係依據本發明進一步範例性具體實施例的一光學頻率域成像(OCT)系統之方塊圖，其包括一波長掃描雷射及一極化分集平衡偵測(PDBD)電路；
第10B圖係第10A圖中所示的一範例性探針配置之方塊圖；
第10C圖係顯示使用第10A圖系統的一載波頻率外差式偵測之範例性輸出的複數個圖形；
第11圖係使用本發明之範例性具體實施例獲得之人指尖的一範例性活體影像；
第12圖係依據本發明一範例性具體實施例之相位追蹤器配置的方塊圖；
第13圖係依據具有該相位追蹤器之OFDI系統的一範例性具體實施例之方塊圖；
第14A至14C圖係顯示用於一依據本發明之相位追蹤器操作的範例性技藝之流程圖；
第15圖係依據本發明另一範例性具體實施例之OFDI系統的簡化圖式；
第16(a)與16(b)圖係依據本發明之移頻效果之圖形，即深度對信號頻率；
第17圖係依據本發明再另一範例性具體實施例利用二個聲光移頻器之OFDI系統的方塊圖；
第18(a)與18(c)圖係依據本發明無須一映射過程所量測之點展開函數之圖形；
第18(b)與18(d)圖係依據本發明以該映射過程所量測之點展開函數之圖形。
第19圖係依據本發明以映射技術所獲得之影像。
在全部圖式中，除非另行說明，相同之參考數字與字符係用以指所顯示具體實施例之相似特徵、元件、組件或部位。再者，雖然本發明現將參考圖式詳細說明，其係結合所示具體實施例進行。
70．．．單色雷射光
72．．．耦合器
72a．．．輸入
80．．．參考臂
82．．．參考鏡面
84．．．取樣臂
86．．．樣本
88．．．光偵測器
90．．．反射光信號
92．．．反射光信號
94．．．拍信號

Claims (13)

  1. 一種用以決定有關一組織之結構及組成中至少一者的特定資料之系統，其至少包含：一處理配置，其在執行一預定技藝時係設置用以：(a)接收與一干涉信號有關之資訊，該干涉信號係從由一樣本獲得之至少一第一電磁輻射，及由一參考獲得之至少一第二電磁輻射形成，其中該第一及第二電磁輻射中至少一者係經移頻，(b)將該資訊取樣，以產生在第一格式中之已取樣資料，及(c)將該已取樣資料轉換成第二格式中之特定資料，該第一及第二格式係彼此不同。
  2. 如申請專利範圍第1項所述之系統，其中該第二格式具有至少二取樣間隔，該等間隔表示實質上相同電磁頻率差。
  3. 如申請專利範圍第2項所述之系統，其中各個該等取樣間隔表示實質上相同電磁頻率差。
  4. 如申請專利範圍第1項所述之系統，其中程序(c)包括內插該已取樣資料。
  5. 如申請專利範圍第4項所述之系統，其中該第一及第二電磁輻射中至少一者係由一特定頻率移頻，且其中該內插法包括傅利葉轉換該已取樣資料成為在一頻率域中之一陣列，且根據該特定頻率分離該陣列成為至少二頻帶。
  6. 如申請專利範圍第5項所述之系統，其中該內插法包括傅利葉轉換該已取樣資料成為在一頻率域中之陣列，且增加該陣列之大小及將一預定值插入該陣列的一增加部份之各元件中。
  7. 如申請專利範圍第1項所述之系統，其中該處理配置係進一步設置以根據該特定資料產生該組織之至少一部份的影像。
  8. 如申請專利範圍第7項所述之系統，其中該影像具有一特定解析度，其中有關該已取樣資料之電磁頻率的一頻譜與該特定解析度相關連，且其中該特定解析度係實質上接近該電磁頻率之頻譜的傅利葉轉換極限。
  9. 如申請專利範圍第5項所述之系統，其中該第二格式具有至少二取樣間隔，該等間隔表示實質上相同電磁頻率差，且其中該特定頻率之大小係約大於該等取樣間隔中至少一者之倒數的四分之一。
  10. 如申請專利範圍第7項所述之系統，其中該第二格式係一影像格式，且其中該影像係根據該已轉換取樣資料。
  11. 如申請專利範圍第4項所述之系統，其中該第二格式係一包括將近固定k-空間間隔之格式。
  12. 一種用以決定有關一組織之結構及組成中至少一者的特定資料之方法，至少包含下列步驟：接收與一干涉信號有關之資訊，該干涉信號係從由一樣本獲得之至少一第一電磁輻射，及由一參考獲得之至少一第二電磁輻射形成，其中該第一及第二電磁輻射中至少一者係經移頻，將該資訊取樣，以產生在一第一格式中之已取樣資料，及將該已取樣資料轉換成一在第二格式中之特定資料，該第一及第二格式係彼此不同。
  13. 一種用以決定有關一組織之結構及組成中至少一者的特定資料之儲存媒體，該儲存媒體維持一程式於其上，當由一處理配置執行時，該儲存媒體係設置以執行至少包含下列之指令：接收與一干涉信號有關之資訊，該干涉信號係從由一樣本獲得之至少一第一電磁輻射，及由一參考獲得之至少一第二電磁輻射形成，其中該第一及第二電磁輻射中至少一者係經移頻，將該資訊取樣，以產生在一第一格式中之已取樣資料，及將該已取樣之資料轉換成一在第二格式中之特定資料，該第一及第二格式係彼此不同。
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