ZA928056B - Method and system for removing contaminants. - Google Patents

Method and system for removing contaminants.

Info

Publication number
ZA928056B
ZA928056B ZA928056A ZA928056A ZA928056B ZA 928056 B ZA928056 B ZA 928056B ZA 928056 A ZA928056 A ZA 928056A ZA 928056 A ZA928056 A ZA 928056A ZA 928056 B ZA928056 B ZA 928056B
Authority
ZA
South Africa
Prior art keywords
hydrogen peroxide
final reaction
reaction bath
initial
contaminants
Prior art date
Application number
ZA928056A
Other languages
English (en)
Inventor
Thomas B Stanford
Jennifer I Shinno
Gifford W Rodine
Richard C George Jr
Dhiren C Mehta
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Publication of ZA928056B publication Critical patent/ZA928056B/xx

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K1/00—Soldering, e.g. brazing, or unsoldering
    • B23K1/20—Preliminary treatment of work or areas to be soldered, e.g. in respect of a galvanic coating
    • B23K1/206—Cleaning
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
    • C23G1/14—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/26—Cleaning or polishing of the conductive pattern
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
    • H05K2203/0786—Using an aqueous solution, e.g. for cleaning or during drilling of holes
    • H05K2203/0793—Aqueous alkaline solution, e.g. for cleaning or etching
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
    • H05K2203/0786—Using an aqueous solution, e.g. for cleaning or during drilling of holes
    • H05K2203/0796—Oxidant in aqueous solution, e.g. permanganate

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Detergent Compositions (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
ZA928056A 1991-11-13 1992-10-19 Method and system for removing contaminants. ZA928056B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US79181991A 1991-11-13 1991-11-13

Publications (1)

Publication Number Publication Date
ZA928056B true ZA928056B (en) 1993-05-07

Family

ID=25154884

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA928056A ZA928056B (en) 1991-11-13 1992-10-19 Method and system for removing contaminants.

Country Status (15)

Country Link
EP (1) EP0566712B1 (ko)
JP (1) JPH06504817A (ko)
KR (1) KR960002638B1 (ko)
AT (1) ATE125885T1 (ko)
AU (1) AU651253B2 (ko)
BR (1) BR9205457A (ko)
CA (1) CA2096546A1 (ko)
DE (1) DE69203851T2 (ko)
DK (1) DK0566712T3 (ko)
ES (1) ES2075718T3 (ko)
GR (1) GR3017956T3 (ko)
MX (1) MX9206559A (ko)
MY (1) MY129926A (ko)
WO (1) WO1993010280A1 (ko)
ZA (1) ZA928056B (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2096452A1 (en) * 1992-06-19 1993-12-20 William E. Elias Inorganic oxidant compositions for removing contaminants
FR2736936B1 (fr) * 1995-07-19 1997-08-14 Air Liquide Procede de degraissage a base de peroxyde d'hydrogene et applications a des articles metalliques
GB2349892A (en) * 1999-05-13 2000-11-15 Warwick Internat Group Ltd Metal cleaning
CN115338181A (zh) * 2022-07-26 2022-11-15 泸州龙芯微科技有限公司 芯片划片后表面清洗装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3046477A1 (de) * 1980-12-10 1982-07-08 Gebr. Schmid Maschinenfabrik GmbH & Co, 7290 Freudenstadt "verfahren zum aetzen von metalloberflaechen"
US4578162A (en) * 1984-05-29 1986-03-25 The Dow Chemical Company Method for dissolving copper in the presence of iron
HU198096B (en) * 1987-05-19 1989-07-28 Gyoergy Schamschula Composition for cleaning furnaces from the combustion side
EP0458948B1 (en) * 1989-12-20 1994-08-31 Hughes Aircraft Company Peroxide composition for removing flux residue and method of using same
US5968039A (en) * 1991-10-03 1999-10-19 Essential Dental Systems, Inc. Laser device for performing canal surgery in narrow channels

Also Published As

Publication number Publication date
JPH06504817A (ja) 1994-06-02
AU2753792A (en) 1993-06-15
GR3017956T3 (en) 1996-02-29
DK0566712T3 (da) 1995-12-18
KR960002638B1 (ko) 1996-02-24
EP0566712B1 (en) 1995-08-02
EP0566712A1 (en) 1993-10-27
ATE125885T1 (de) 1995-08-15
MY129926A (en) 2007-05-31
AU651253B2 (en) 1994-07-14
DE69203851D1 (de) 1995-09-07
MX9206559A (es) 1993-05-01
WO1993010280A1 (en) 1993-05-27
BR9205457A (pt) 1994-06-21
ES2075718T3 (es) 1995-10-01
DE69203851T2 (de) 1995-12-07
CA2096546A1 (en) 1993-05-14

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