ZA886185B - Radiation sensitive compounds - Google Patents
Radiation sensitive compoundsInfo
- Publication number
- ZA886185B ZA886185B ZA886185A ZA886185A ZA886185B ZA 886185 B ZA886185 B ZA 886185B ZA 886185 A ZA886185 A ZA 886185A ZA 886185 A ZA886185 A ZA 886185A ZA 886185 B ZA886185 B ZA 886185B
- Authority
- ZA
- South Africa
- Prior art keywords
- radiation sensitive
- chem
- aryl
- sensitive compounds
- compounds
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
- C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
- C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
- C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
- C07D251/16—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to only one ring carbon atom
- C07D251/18—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to only one ring carbon atom with nitrogen atoms directly attached to the two other ring carbon atoms, e.g. guanamines
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
- C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
- C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
- C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
- C07D251/22—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to two ring carbon atoms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Pyridine Compounds (AREA)
- Discharge Lamps And Accessories Thereof (AREA)
- Steroid Compounds (AREA)
- Developing Agents For Electrophotography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Materials For Medical Uses (AREA)
- Tents Or Canopies (AREA)
- Plural Heterocyclic Compounds (AREA)
- Nuclear Medicine (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Measurement Of Radiation (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB878719730A GB8719730D0 (en) | 1987-08-20 | 1987-08-20 | Radiation sensitive compounds |
Publications (1)
Publication Number | Publication Date |
---|---|
ZA886185B true ZA886185B (en) | 1989-04-26 |
Family
ID=10622581
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ZA886185A ZA886185B (en) | 1987-08-20 | 1988-08-19 | Radiation sensitive compounds |
Country Status (14)
Country | Link |
---|---|
US (1) | US4933452A (ja) |
EP (1) | EP0305115B1 (ja) |
JP (1) | JP2690056B2 (ja) |
AT (1) | ATE73939T1 (ja) |
AU (1) | AU611472B2 (ja) |
CA (1) | CA1304354C (ja) |
DE (1) | DE3869275D1 (ja) |
ES (1) | ES2034250T3 (ja) |
FI (1) | FI883862A (ja) |
GB (1) | GB8719730D0 (ja) |
GR (1) | GR3004362T3 (ja) |
NO (1) | NO883723L (ja) |
NZ (1) | NZ225869A (ja) |
ZA (1) | ZA886185B (ja) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5153323A (en) * | 1988-09-07 | 1992-10-06 | Minnesota Mining And Manufacturing Company | Halomethyl-1,3,5-triazines containing a photoinitiator moiety |
US5034526A (en) * | 1988-09-07 | 1991-07-23 | Minnesota Mining And Manufacturing Company | Halomethyl-1,3,5-triazines containing a sensitizer moiety |
US5116977A (en) * | 1988-09-07 | 1992-05-26 | Minnesota Mining And Manufacturing Company | Halomethyl-1,3,5-triazines containing an amine-containing moiety |
US4985562A (en) * | 1988-09-07 | 1991-01-15 | Minnesota Mining And Manufacturing Company | Halomethyl-1,3,5-triazines containing an amine-containing moiety |
US5187045A (en) * | 1988-09-07 | 1993-02-16 | Minnesota Mining And Manufacturing Company | Halomethyl-1,3,5-triazines containing a sensitizer moiety |
EP0361682B1 (en) * | 1988-09-07 | 1996-03-27 | Minnesota Mining And Manufacturing Company | Halomethyl-1,3,5-triazines containing a photoinitiator moiety |
US5387682A (en) * | 1988-09-07 | 1995-02-07 | Minnesota Mining And Manufacturing Company | Halomethyl-1,3,5-triazines containing a monomeric moiety |
CA2034274A1 (en) * | 1990-02-07 | 1991-08-08 | James A. Bonham | Polymers containing halomethyl-1,3,5-triazine moieties |
US5298361A (en) * | 1991-08-30 | 1994-03-29 | Minnesota Mining And Manufacturing Company | Light-sensitive article containing migration-resistant halomethyl-1,3,5-triazine photoinitiator |
GB2298209B (en) * | 1992-01-21 | 1996-11-06 | Du Pont | Improvements in or relating to photopolymerisable components of radiation sensitive compositions |
US5364740A (en) * | 1992-12-30 | 1994-11-15 | Minnesota Mining And Manufacturing Company | Bleaching of dyes in photosensitive systems |
US5561029A (en) * | 1995-04-28 | 1996-10-01 | Polaroid Corporation | Low-volatility, substituted 2-phenyl-4,6-bis (halomethyl)-1,3,5-triazine for lithographic printing plates |
US6291619B1 (en) * | 1997-01-30 | 2001-09-18 | Hitachi Chemical Co., Ltd | Photosensitive resin composition, method for forming pattern therefrom, electronic devices produced by using the same, and method for production thereof |
US5837586A (en) * | 1997-02-14 | 1998-11-17 | Kodak Polychrome Graphics Company, Ltd. | 4-(alkoxyhydroxy)styryl triazine photinitiators and photo sensitive composition |
DE102004018546A1 (de) | 2004-04-14 | 2005-11-03 | Basf Ag | Strahlungshärtbare 1,3,5-Triazincarbamate und -harnstoffe |
DE102004018544A1 (de) | 2004-04-14 | 2005-11-03 | Basf Ag | Verfahren zur Herstellung von 1,3,5-Triazincarbamaten und -harnstoffen |
CN109694460B (zh) * | 2018-12-11 | 2021-04-20 | 万华化学集团股份有限公司 | 多官能度不饱和异氰酸酯三聚体及其制备和在分散体稳定剂中的应用 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5928328B2 (ja) * | 1977-11-29 | 1984-07-12 | 富士写真フイルム株式会社 | 光重合性組成物 |
DK163123C (da) * | 1978-05-30 | 1992-06-09 | Du Pont | Benzensulfonylurinstoffer til anvendelse som herbicider eller plantevaekstregulatorer, praeparat indeholdende dem samt deres anvendelse |
DK259280A (da) * | 1979-07-20 | 1981-01-21 | Du Pont | Herbicide sulfonamider |
TR21378A (tr) * | 1981-01-26 | 1984-04-26 | Nihon Tokushu Noyaku Seizo Kk | Yeni substit*e fenilsulfonil*re t*revleri,bunlarin ihzarina mahsus bir usul ve yeni ara maddeler ve bunlarin herbisidler olarak kullanimi |
US4350753A (en) * | 1981-06-15 | 1982-09-21 | Polychrome Corporation | Positive acting composition yielding pre-development high visibility image after radiation exposure comprising radiation sensitive diazo oxide and haloalkyl-s-triazine with novolak and dyestuff |
DE3144480A1 (de) * | 1981-11-09 | 1983-05-19 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial |
DE3507750A1 (de) * | 1985-03-05 | 1986-09-11 | Bayer Ag, 5090 Leverkusen | Verfahren zur herstellung von 4-alkoxy-6-alkyl-2-cyanamino-1,3,5-triazinen |
-
1987
- 1987-08-20 GB GB878719730A patent/GB8719730D0/en active Pending
-
1988
- 1988-08-18 NZ NZ225869A patent/NZ225869A/xx unknown
- 1988-08-18 ES ES198888307672T patent/ES2034250T3/es not_active Expired - Lifetime
- 1988-08-18 US US07/233,673 patent/US4933452A/en not_active Expired - Lifetime
- 1988-08-18 DE DE8888307672T patent/DE3869275D1/de not_active Expired - Lifetime
- 1988-08-18 EP EP88307672A patent/EP0305115B1/en not_active Expired - Lifetime
- 1988-08-18 JP JP63205641A patent/JP2690056B2/ja not_active Expired - Lifetime
- 1988-08-18 AT AT88307672T patent/ATE73939T1/de not_active IP Right Cessation
- 1988-08-19 CA CA000575894A patent/CA1304354C/en not_active Expired - Lifetime
- 1988-08-19 NO NO88883723A patent/NO883723L/no unknown
- 1988-08-19 AU AU21186/88A patent/AU611472B2/en not_active Ceased
- 1988-08-19 ZA ZA886185A patent/ZA886185B/xx unknown
- 1988-08-19 FI FI883862A patent/FI883862A/fi not_active Application Discontinuation
-
1992
- 1992-04-15 GR GR920400730T patent/GR3004362T3/el unknown
Also Published As
Publication number | Publication date |
---|---|
FI883862A (fi) | 1989-02-21 |
AU2118688A (en) | 1989-02-23 |
GB8719730D0 (en) | 1987-09-30 |
US4933452A (en) | 1990-06-12 |
JPH01103602A (ja) | 1989-04-20 |
EP0305115B1 (en) | 1992-03-18 |
EP0305115A3 (en) | 1989-04-26 |
JP2690056B2 (ja) | 1997-12-10 |
ES2034250T3 (es) | 1993-04-01 |
ATE73939T1 (de) | 1992-04-15 |
GR3004362T3 (ja) | 1993-03-31 |
EP0305115A2 (en) | 1989-03-01 |
NZ225869A (en) | 1990-08-28 |
CA1304354C (en) | 1992-06-30 |
AU611472B2 (en) | 1991-06-13 |
NO883723D0 (no) | 1988-08-19 |
NO883723L (no) | 1989-02-21 |
FI883862A0 (fi) | 1988-08-19 |
DE3869275D1 (de) | 1992-04-23 |
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