ZA879016B - Device for monitoring characteristics of a film on a substrate - Google Patents

Device for monitoring characteristics of a film on a substrate

Info

Publication number
ZA879016B
ZA879016B ZA879016A ZA879016A ZA879016B ZA 879016 B ZA879016 B ZA 879016B ZA 879016 A ZA879016 A ZA 879016A ZA 879016 A ZA879016 A ZA 879016A ZA 879016 B ZA879016 B ZA 879016B
Authority
ZA
South Africa
Prior art keywords
substrate
film
monitoring characteristics
monitoring
Prior art date
Application number
ZA879016A
Other languages
English (en)
Inventor
D. Mccomb Walter
D. Schave Richard
S. Lee Gregory
W. Rudolph Andrew
Original Assignee
Libbey-Owens-Ford Co.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Libbey-Owens-Ford Co. filed Critical Libbey-Owens-Ford Co.
Publication of ZA879016B publication Critical patent/ZA879016B/xx

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G01N21/896Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/8422Investigating thin films, e.g. matrix isolation method
    • G01N2021/8427Coatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Textile Engineering (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Spectrometry And Color Measurement (AREA)
ZA879016A 1986-12-04 1987-12-01 Device for monitoring characteristics of a film on a substrate ZA879016B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/937,741 US4785336A (en) 1986-12-04 1986-12-04 Device for monitoring characteristics of a film on a substrate

Publications (1)

Publication Number Publication Date
ZA879016B true ZA879016B (en) 1988-05-27

Family

ID=25470339

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA879016A ZA879016B (en) 1986-12-04 1987-12-01 Device for monitoring characteristics of a film on a substrate

Country Status (11)

Country Link
US (1) US4785336A (fi)
EP (1) EP0293446A4 (fi)
JP (1) JPH01501505A (fi)
KR (1) KR960015050B1 (fi)
CN (1) CN87107260A (fi)
AU (1) AU598626B2 (fi)
BR (1) BR8707575A (fi)
ES (1) ES2005961A6 (fi)
FI (1) FI883565A0 (fi)
WO (1) WO1988004402A1 (fi)
ZA (1) ZA879016B (fi)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0781840B2 (ja) * 1988-06-29 1995-09-06 富士写真フイルム株式会社 光学式膜厚測定装置
US5068739A (en) * 1989-02-10 1991-11-26 Optum Corporation Method to image transparent media utilizing integrated scanning
DE4004088A1 (de) * 1990-02-10 1991-08-14 Basf Ag Verfahren zur untersuchung physikalischer eigenschaften duenner schichten
US5148041A (en) * 1991-02-07 1992-09-15 Brain Power, Inc. Reflectometer
US5181080A (en) * 1991-12-23 1993-01-19 Therma-Wave, Inc. Method and apparatus for evaluating the thickness of thin films
DE4201274C2 (de) 1992-01-18 1995-02-23 Ver Glaswerke Gmbh Vorrichtung zum Messen der Reflexionseigenschaften einer mit einer teilreflektierenden Schicht versehenen Glasscheibe
US5264905A (en) * 1992-04-27 1993-11-23 Grumman Aerospace Corporation Electro-optic automated test equipment
GB9219450D0 (en) * 1992-09-15 1992-10-28 Glaverbel Thin film thickness monitoring and control
US5332904A (en) * 1992-10-28 1994-07-26 The United States Of America As Represented By The Department Of Energy Broadband radiometer
US6630947B1 (en) * 1996-04-10 2003-10-07 The United States Of America As Represented By The Secretary Of The Navy Method for examining subsurface environments
US6762838B2 (en) * 2001-07-02 2004-07-13 Tevet Process Control Technologies Ltd. Method and apparatus for production line screening
US6657714B2 (en) * 2001-09-24 2003-12-02 Applied Materials, Inc. Defect detection with enhanced dynamic range
WO2005062804A2 (en) * 2003-12-19 2005-07-14 Applied Color Systems, Inc. Spectrophotometer with digital camera
CN100494991C (zh) * 2004-12-23 2009-06-03 北京源德生物医学工程有限公司 用于单光子计数仪的标准光源
US8982362B2 (en) * 2011-10-04 2015-03-17 First Solar, Inc. System and method for measuring layer thickness and depositing semiconductor layers
US9157729B1 (en) * 2013-01-10 2015-10-13 DST Output West, LLC Light sensor facilitated insert thickness detection system
CN104807495B (zh) * 2014-01-24 2017-12-01 北京智朗芯光科技有限公司 一种监测晶片生长薄膜特性的装置及其用途
US10274307B2 (en) * 2015-03-17 2019-04-30 Toray Engineering Co., Ltd. Film thickness measurement device using interference of light and film thickness measurement method using interference of light
CN104949771A (zh) * 2015-07-13 2015-09-30 天津津航技术物理研究所 一种tdlas气体测温检测方法
CN104949770A (zh) * 2015-07-13 2015-09-30 天津津航技术物理研究所 一种tdlas气体测温检测装置
CN105043589A (zh) * 2015-07-13 2015-11-11 天津津航技术物理研究所 基于扩束聚焦系统的tdlas气体测温检测方法
CN106353282B (zh) * 2016-08-31 2020-04-28 电子科技大学 微区反射率测试系统及其测试方法
CN106441126A (zh) * 2016-10-26 2017-02-22 电子科技大学 一种基于反射率光谱测量光学薄膜厚度的方法及系统
CN107421909A (zh) * 2017-05-17 2017-12-01 上海理工大学 非透射固体表面尿素水溶液液膜多参数的测量装置及方法
CN109084693B (zh) * 2018-07-20 2020-03-31 东莞富亚电子有限公司 彩色图像测膜厚法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2655073A (en) * 1950-09-23 1953-10-13 Celanese Corp Optical thickness gauge
FI45797C (fi) * 1970-04-20 1972-09-11 Nokia Oy Ab Materiaalirainojen säteilymittauslaite.
US3737237A (en) * 1971-11-18 1973-06-05 Nasa Monitoring deposition of films
US3892490A (en) * 1974-03-06 1975-07-01 Minolta Camera Kk Monitoring system for coating a substrate
US3936189A (en) * 1974-03-13 1976-02-03 Sentrol Systems Ltd. On-line system for monitoring the color, opacity and brightness of a moving web
AU8181375A (en) * 1974-06-07 1976-12-09 Decca Ltd Determination of thickness of uniform films
US4012144A (en) * 1975-08-07 1977-03-15 Varian Associates Spectrosorptance measuring system and method
US4003660A (en) * 1975-12-03 1977-01-18 Hunter Associates Laboratory, Inc. Sensing head assembly for multi-color printing press on-line densitometer
US4395126A (en) * 1981-03-12 1983-07-26 Miles Laboratories, Inc. Apparatus for reflectance measurement of fluorescent radiation and composite useful therein
US4479718A (en) * 1982-06-17 1984-10-30 E. I. Du Pont De Nemours And Company Three direction measurements for characterization of a surface containing metallic particles
JPS6052706A (ja) * 1983-08-31 1985-03-26 Nippon Kokan Kk <Nkk> 膜厚測定装置
US4654794A (en) * 1984-02-18 1987-03-31 Colorgen, Inc. Methods for determining the proper coloring for a tooth replica

Also Published As

Publication number Publication date
FI883565A (fi) 1988-07-29
KR890700220A (ko) 1989-03-10
FI883565A0 (fi) 1988-07-29
KR960015050B1 (ko) 1996-10-24
CN87107260A (zh) 1988-08-10
WO1988004402A1 (en) 1988-06-16
US4785336A (en) 1988-11-15
AU598626B2 (en) 1990-06-28
ES2005961A6 (es) 1989-04-01
BR8707575A (pt) 1989-03-14
EP0293446A1 (en) 1988-12-07
AU1053088A (en) 1988-06-30
JPH01501505A (ja) 1989-05-25
EP0293446A4 (en) 1990-04-10

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