ZA877008B - Photoresist stripper composition - Google Patents

Photoresist stripper composition

Info

Publication number
ZA877008B
ZA877008B ZA877008A ZA877008A ZA877008B ZA 877008 B ZA877008 B ZA 877008B ZA 877008 A ZA877008 A ZA 877008A ZA 877008 A ZA877008 A ZA 877008A ZA 877008 B ZA877008 B ZA 877008B
Authority
ZA
South Africa
Prior art keywords
stripper composition
photoresist stripper
photoresist
composition
stripper
Prior art date
Application number
ZA877008A
Other languages
English (en)
Inventor
A. Martin Theodore Jr.
Bach Wolf
Original Assignee
Macdermid, Incorporated
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Macdermid, Incorporated filed Critical Macdermid, Incorporated
Publication of ZA877008B publication Critical patent/ZA877008B/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C11D7/04—Water-soluble compounds
    • C11D7/06—Hydroxides
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5013—Organic solvents containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/263—Ethers
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/267—Heterocyclic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3281—Heterocyclic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
ZA877008A 1987-02-05 1987-09-17 Photoresist stripper composition ZA877008B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US1091387A 1987-02-05 1987-02-05

Publications (1)

Publication Number Publication Date
ZA877008B true ZA877008B (en) 1988-03-23

Family

ID=21748000

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA877008A ZA877008B (en) 1987-02-05 1987-09-17 Photoresist stripper composition

Country Status (5)

Country Link
EP (1) EP0301044A4 (ja)
JP (1) JPH01502059A (ja)
AU (1) AU1158288A (ja)
WO (1) WO1988005813A1 (ja)
ZA (1) ZA877008B (ja)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5091103A (en) * 1990-05-01 1992-02-25 Alicia Dean Photoresist stripper
US5268260A (en) * 1991-10-22 1993-12-07 International Business Machines Corporation Photoresist develop and strip solvent compositions and method for their use
AU2494092A (en) * 1992-09-03 1994-03-29 Circuit Chemical Products Gmbh Cleaning-agent mixture for cleaning printed circuits and a method of cleaning such circuits
US5407866A (en) * 1994-02-02 1995-04-18 Motorola, Inc. Method for forming a dielectric layer on a high temperature metal layer
US5817610A (en) * 1996-09-06 1998-10-06 Olin Microelectronic Chemicals, Inc. Non-corrosive cleaning composition for removing plasma etching residues
US5759973A (en) * 1996-09-06 1998-06-02 Olin Microelectronic Chemicals, Inc. Photoresist stripping and cleaning compositions
US5780406A (en) * 1996-09-06 1998-07-14 Honda; Kenji Non-corrosive cleaning composition for removing plasma etching residues
US6030932A (en) * 1996-09-06 2000-02-29 Olin Microelectronic Chemicals Cleaning composition and method for removing residues
JPH10289891A (ja) * 1997-04-11 1998-10-27 Mitsubishi Gas Chem Co Inc 半導体回路用洗浄剤及びそれを用いた半導体回路の製造方法
US6060439A (en) * 1997-09-29 2000-05-09 Kyzen Corporation Cleaning compositions and methods for cleaning resin and polymeric materials used in manufacture
US6440647B1 (en) * 1998-02-26 2002-08-27 Alpha Metals, Inc. Resist stripping process
US6103680A (en) * 1998-12-31 2000-08-15 Arch Specialty Chemicals, Inc. Non-corrosive cleaning composition and method for removing photoresist and/or plasma etching residues
US6413923B2 (en) 1999-11-15 2002-07-02 Arch Specialty Chemicals, Inc. Non-corrosive cleaning composition for removing plasma etching residues
US6274296B1 (en) 2000-06-08 2001-08-14 Shipley Company, L.L.C. Stripper pretreatment
US6350560B1 (en) 2000-08-07 2002-02-26 Shipley Company, L.L.C. Rinse composition
MY139607A (en) * 2001-07-09 2009-10-30 Avantor Performance Mat Inc Ammonia-free alkaline microelectronic cleaning compositions with improved substrate compatibility
MY143399A (en) 2001-07-09 2011-05-13 Avantor Performance Mat Inc Microelectronic cleaning compositons containing ammonia-free fluoride salts for selective photoresist stripping and plasma ash residue cleaning
US20030138737A1 (en) 2001-12-27 2003-07-24 Kazumasa Wakiya Photoresist stripping solution and a method of stripping photoresists using the same
JP3799026B2 (ja) * 2002-03-29 2006-07-19 三洋化成工業株式会社 アルカリ洗浄剤
US7393819B2 (en) 2002-07-08 2008-07-01 Mallinckrodt Baker, Inc. Ammonia-free alkaline microelectronic cleaning compositions with improved substrate compatibility
JP2006169442A (ja) * 2004-12-17 2006-06-29 Tokuyama Corp 洗浄剤

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3673099A (en) * 1970-10-19 1972-06-27 Bell Telephone Labor Inc Process and composition for stripping cured resins from substrates
US4594176A (en) * 1984-04-25 1986-06-10 Economics Laboratory, Inc. Polyalkylene polyamine-glycol accelerators for paint removal compositions
DE3434128A1 (de) * 1984-09-18 1986-03-20 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zur oberflaechenbehandlung von metall-, glas- oder keramikteilen
US4592787A (en) * 1984-11-05 1986-06-03 The Dow Chemical Company Composition useful for stripping photoresist polymers and method
JPS61159499A (ja) * 1985-01-07 1986-07-19 ポリプラスチックス株式会社 金型付着物の除去方法

Also Published As

Publication number Publication date
EP0301044A4 (en) 1989-03-29
WO1988005813A1 (en) 1988-08-11
JPH01502059A (ja) 1989-07-13
EP0301044A1 (en) 1989-02-01
AU1158288A (en) 1988-08-24

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