ZA877008B - Photoresist stripper composition - Google Patents
Photoresist stripper compositionInfo
- Publication number
- ZA877008B ZA877008B ZA877008A ZA877008A ZA877008B ZA 877008 B ZA877008 B ZA 877008B ZA 877008 A ZA877008 A ZA 877008A ZA 877008 A ZA877008 A ZA 877008A ZA 877008 B ZA877008 B ZA 877008B
- Authority
- ZA
- South Africa
- Prior art keywords
- stripper composition
- photoresist stripper
- photoresist
- composition
- stripper
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/02—Inorganic compounds
- C11D7/04—Water-soluble compounds
- C11D7/06—Hydroxides
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
- C11D7/5004—Organic solvents
- C11D7/5013—Organic solvents containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/263—Ethers
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/267—Heterocyclic compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3281—Heterocyclic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US1091387A | 1987-02-05 | 1987-02-05 |
Publications (1)
Publication Number | Publication Date |
---|---|
ZA877008B true ZA877008B (en) | 1988-03-23 |
Family
ID=21748000
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ZA877008A ZA877008B (en) | 1987-02-05 | 1987-09-17 | Photoresist stripper composition |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP0301044A4 (en) |
JP (1) | JPH01502059A (en) |
AU (1) | AU1158288A (en) |
WO (1) | WO1988005813A1 (en) |
ZA (1) | ZA877008B (en) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5091103A (en) * | 1990-05-01 | 1992-02-25 | Alicia Dean | Photoresist stripper |
US5268260A (en) * | 1991-10-22 | 1993-12-07 | International Business Machines Corporation | Photoresist develop and strip solvent compositions and method for their use |
AU2494092A (en) * | 1992-09-03 | 1994-03-29 | Circuit Chemical Products Gmbh | Cleaning-agent mixture for cleaning printed circuits and a method of cleaning such circuits |
US5407866A (en) * | 1994-02-02 | 1995-04-18 | Motorola, Inc. | Method for forming a dielectric layer on a high temperature metal layer |
US5759973A (en) * | 1996-09-06 | 1998-06-02 | Olin Microelectronic Chemicals, Inc. | Photoresist stripping and cleaning compositions |
US6030932A (en) * | 1996-09-06 | 2000-02-29 | Olin Microelectronic Chemicals | Cleaning composition and method for removing residues |
US5817610A (en) * | 1996-09-06 | 1998-10-06 | Olin Microelectronic Chemicals, Inc. | Non-corrosive cleaning composition for removing plasma etching residues |
US5780406A (en) * | 1996-09-06 | 1998-07-14 | Honda; Kenji | Non-corrosive cleaning composition for removing plasma etching residues |
JPH10289891A (en) * | 1997-04-11 | 1998-10-27 | Mitsubishi Gas Chem Co Inc | Semiconductor circuit cleaning agent and manufacture of semiconductor circuit by use thereof |
US6060439A (en) * | 1997-09-29 | 2000-05-09 | Kyzen Corporation | Cleaning compositions and methods for cleaning resin and polymeric materials used in manufacture |
US6440647B1 (en) * | 1998-02-26 | 2002-08-27 | Alpha Metals, Inc. | Resist stripping process |
US6103680A (en) * | 1998-12-31 | 2000-08-15 | Arch Specialty Chemicals, Inc. | Non-corrosive cleaning composition and method for removing photoresist and/or plasma etching residues |
US6413923B2 (en) | 1999-11-15 | 2002-07-02 | Arch Specialty Chemicals, Inc. | Non-corrosive cleaning composition for removing plasma etching residues |
US6274296B1 (en) | 2000-06-08 | 2001-08-14 | Shipley Company, L.L.C. | Stripper pretreatment |
US6350560B1 (en) | 2000-08-07 | 2002-02-26 | Shipley Company, L.L.C. | Rinse composition |
MY139607A (en) * | 2001-07-09 | 2009-10-30 | Avantor Performance Mat Inc | Ammonia-free alkaline microelectronic cleaning compositions with improved substrate compatibility |
MY143399A (en) | 2001-07-09 | 2011-05-13 | Avantor Performance Mat Inc | Microelectronic cleaning compositons containing ammonia-free fluoride salts for selective photoresist stripping and plasma ash residue cleaning |
US20030138737A1 (en) | 2001-12-27 | 2003-07-24 | Kazumasa Wakiya | Photoresist stripping solution and a method of stripping photoresists using the same |
JP3799026B2 (en) * | 2002-03-29 | 2006-07-19 | 三洋化成工業株式会社 | Alkaline cleaner |
US7393819B2 (en) | 2002-07-08 | 2008-07-01 | Mallinckrodt Baker, Inc. | Ammonia-free alkaline microelectronic cleaning compositions with improved substrate compatibility |
JP2006169442A (en) * | 2004-12-17 | 2006-06-29 | Tokuyama Corp | Cleaning agent |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3673099A (en) * | 1970-10-19 | 1972-06-27 | Bell Telephone Labor Inc | Process and composition for stripping cured resins from substrates |
US4594176A (en) * | 1984-04-25 | 1986-06-10 | Economics Laboratory, Inc. | Polyalkylene polyamine-glycol accelerators for paint removal compositions |
DE3434128A1 (en) * | 1984-09-18 | 1986-03-20 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Process for the surface treatment of metal parts, glass parts or ceramic parts |
US4592787A (en) * | 1984-11-05 | 1986-06-03 | The Dow Chemical Company | Composition useful for stripping photoresist polymers and method |
JPS61159499A (en) * | 1985-01-07 | 1986-07-19 | ポリプラスチックス株式会社 | Removal of metal dehered substance |
-
1987
- 1987-09-10 WO PCT/US1987/002291 patent/WO1988005813A1/en not_active Application Discontinuation
- 1987-09-10 AU AU11582/88A patent/AU1158288A/en not_active Abandoned
- 1987-09-10 EP EP19880900899 patent/EP0301044A4/en not_active Withdrawn
- 1987-09-10 JP JP63501060A patent/JPH01502059A/en active Pending
- 1987-09-17 ZA ZA877008A patent/ZA877008B/en unknown
Also Published As
Publication number | Publication date |
---|---|
AU1158288A (en) | 1988-08-24 |
JPH01502059A (en) | 1989-07-13 |
WO1988005813A1 (en) | 1988-08-11 |
EP0301044A4 (en) | 1989-03-29 |
EP0301044A1 (en) | 1989-02-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
IL84255A0 (en) | Photoresist | |
JPS6433104A (en) | Photopolymerizable composition | |
GB8530883D0 (en) | Stripping mechanism | |
GB8724763D0 (en) | Sustained-release formulations | |
EP0276016A3 (en) | Photopolymerizable composition | |
ZA877008B (en) | Photoresist stripper composition | |
EP0284868A3 (en) | Photoresist compositions | |
EP0275970A3 (en) | Positive-working photoresist composition | |
EP0300410A3 (en) | Photopolymerizable composition | |
GB8710397D0 (en) | Photoresist composition | |
EP0295211A3 (en) | Photoresist composition | |
EP0315988A3 (en) | Photopolymerizable composition | |
EP0304136A3 (en) | Novel photosensitive composition | |
GB8827542D0 (en) | Positive-working photoresist composition | |
HK1006598A1 (en) | Dye-sensitive photopolymerizable compositions | |
EP0249468A3 (en) | Photopolymerizable composition | |
GB8716378D0 (en) | Photopolymerisable compositions | |
GB2205843B (en) | Photosensitive composition | |
GB8728389D0 (en) | Photopolymerisable composition | |
ZA87922B (en) | Photoresist stripper composition | |
JPS6433108A (en) | Photopolymerizable composition | |
IL94353A0 (en) | Novolak-containing photoresist composition | |
EP0163202A3 (en) | Photoresist stripper | |
GB8718528D0 (en) | Photopolymerisable composition | |
GB8728587D0 (en) | Stripping compositions & use thereof |