ZA876100B - Process for the production of polycrystalline silicon coatings by electrolytic deposition of silicon - Google Patents

Process for the production of polycrystalline silicon coatings by electrolytic deposition of silicon

Info

Publication number
ZA876100B
ZA876100B ZA876100A ZA876100A ZA876100B ZA 876100 B ZA876100 B ZA 876100B ZA 876100 A ZA876100 A ZA 876100A ZA 876100 A ZA876100 A ZA 876100A ZA 876100 B ZA876100 B ZA 876100B
Authority
ZA
South Africa
Prior art keywords
silicon
production
electrolytic deposition
coatings
polycrystalline silicon
Prior art date
Application number
ZA876100A
Other languages
English (en)
Inventor
Rudolf Grueniger Hans
Kern Rudolf
Rys Paul
Original Assignee
Ciba-Geigy Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba-Geigy Ag filed Critical Ciba-Geigy Ag
Publication of ZA876100B publication Critical patent/ZA876100B/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/66—Electroplating: Baths therefor from melts
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S205/00—Electrolysis: processes, compositions used therein, and methods of preparing the compositions
    • Y10S205/915—Electrolytic deposition of semiconductor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
ZA876100A 1986-08-19 1987-08-18 Process for the production of polycrystalline silicon coatings by electrolytic deposition of silicon ZA876100B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH332086 1986-08-19

Publications (1)

Publication Number Publication Date
ZA876100B true ZA876100B (en) 1988-02-19

Family

ID=4253438

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA876100A ZA876100B (en) 1986-08-19 1987-08-18 Process for the production of polycrystalline silicon coatings by electrolytic deposition of silicon

Country Status (8)

Country Link
US (2) US4759830A (ja)
EP (1) EP0260223B1 (ja)
JP (1) JPS6350496A (ja)
AU (1) AU587713B2 (ja)
DE (1) DE3769252D1 (ja)
ES (1) ES2021751B3 (ja)
IL (1) IL83570A (ja)
ZA (1) ZA876100B (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5270229A (en) * 1989-03-07 1993-12-14 Matsushita Electric Industrial Co., Ltd. Thin film semiconductor device and process for producing thereof
US6039857A (en) * 1998-11-09 2000-03-21 Yeh; Ching-Fa Method for forming a polyoxide film on doped polysilicon by anodization
US6214194B1 (en) * 1999-11-08 2001-04-10 Arnold O. Isenberg Process of manufacturing layers of oxygen ion conducting oxides
EP1780803A1 (en) * 2005-10-28 2007-05-02 Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO A method for applying at least one silicon containing layer onto an electron conductive layer
DE102013201608A1 (de) 2013-01-31 2014-07-31 Wacker Chemie Ag Verfahren zur Abscheidung von polykristallinem Silicium

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3983012A (en) * 1975-10-08 1976-09-28 The Board Of Trustees Of Leland Stanford Junior University Epitaxial growth of silicon or germanium by electrodeposition from molten salts
US4192720A (en) * 1978-10-16 1980-03-11 Exxon Research & Engineering Co. Electrodeposition process for forming amorphous silicon

Also Published As

Publication number Publication date
EP0260223B1 (de) 1991-04-10
EP0260223A1 (de) 1988-03-16
AU587713B2 (en) 1989-08-24
JPS6350496A (ja) 1988-03-03
DE3769252D1 (de) 1991-05-16
IL83570A0 (en) 1988-01-31
ES2021751B3 (es) 1991-11-16
AU7715587A (en) 1988-02-25
US4759830A (en) 1988-07-26
US4773973A (en) 1988-09-27
IL83570A (en) 1991-01-31

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