ZA851195B - Photoactivated polymerization of vinyl monomer in the presence of polysilanes and amines - Google Patents
Photoactivated polymerization of vinyl monomer in the presence of polysilanes and aminesInfo
- Publication number
- ZA851195B ZA851195B ZA851195A ZA851195A ZA851195B ZA 851195 B ZA851195 B ZA 851195B ZA 851195 A ZA851195 A ZA 851195A ZA 851195 A ZA851195 A ZA 851195A ZA 851195 B ZA851195 B ZA 851195B
- Authority
- ZA
- South Africa
- Prior art keywords
- polysilanes
- amines
- vinyl monomer
- photoactivated
- polymerization
- Prior art date
Links
- 150000001412 amines Chemical class 0.000 title 1
- 239000000178 monomer Substances 0.000 title 1
- 229920000548 poly(silane) polymer Polymers 0.000 title 1
- 238000006116 polymerization reaction Methods 0.000 title 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 title 1
- 229920002554 vinyl polymer Polymers 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
- C08F230/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
- C08F230/08—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
- C08F283/12—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
- C08F283/12—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polysiloxanes
- C08F283/124—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polysiloxanes on to polysiloxanes having carbon-to-carbon double bonds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Polymerisation Methods In General (AREA)
- Silicon Polymers (AREA)
- Paints Or Removers (AREA)
- Graft Or Block Polymers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/584,504 US4548690A (en) | 1984-02-28 | 1984-02-28 | Photoactivated polymerization of vinyl monomers in the presence of polysilanes and amines |
Publications (1)
Publication Number | Publication Date |
---|---|
ZA851195B true ZA851195B (en) | 1986-10-29 |
Family
ID=24337584
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ZA851195A ZA851195B (en) | 1984-02-28 | 1985-02-15 | Photoactivated polymerization of vinyl monomer in the presence of polysilanes and amines |
Country Status (9)
Country | Link |
---|---|
US (1) | US4548690A (ja) |
EP (1) | EP0154519B1 (ja) |
JP (1) | JPH0670089B2 (ja) |
KR (1) | KR910001023B1 (ja) |
AU (1) | AU573781B2 (ja) |
CA (1) | CA1256642A (ja) |
DE (1) | DE3564119D1 (ja) |
DK (1) | DK168955B1 (ja) |
ZA (1) | ZA851195B (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5017406A (en) * | 1988-12-08 | 1991-05-21 | Dow Corning Corporation | UV curable compositions cured with polysilane and peroxide initiators |
JPH0649148A (ja) * | 1992-07-31 | 1994-02-22 | Shin Etsu Chem Co Ltd | ポリシラン−オレフィン系ポリマー共重合体の製造方法 |
US6197844B1 (en) * | 1996-09-13 | 2001-03-06 | 3M Innovative Properties Company | Floor finish compositions |
JP7024532B2 (ja) * | 2018-03-19 | 2022-02-24 | 株式会社リコー | 組成物、硬化物、収容容器、像形成装置、及び像形成方法 |
JP2020015790A (ja) * | 2018-07-24 | 2020-01-30 | 株式会社リコー | 硬化型組成物、硬化型インク、収容容器、2次元又は3次元の像形成装置、2次元又は3次元の像形成方法、硬化物、及び印刷物 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1034902A (en) * | 1973-12-13 | 1978-07-18 | Unisearch Limited | Curable pre-polymer compositions |
JPS52112700A (en) * | 1976-02-28 | 1977-09-21 | Tohoku Daigaku Kinzoku Zairyo | Amorphous organopolysilicone composite for preparing silicone carbide |
US4260780A (en) * | 1979-11-27 | 1981-04-07 | The United States Of America As Represented By The Secretary Of The Air Force | Phenylmethylpolysilane polymers and process for their preparation |
US4276424A (en) * | 1979-12-03 | 1981-06-30 | Petrarch Systems | Methods for the production of organic polysilanes |
US4314956A (en) * | 1980-07-23 | 1982-02-09 | Dow Corning Corporation | High yield silicon carbide pre-ceramic polymers |
US4324901A (en) * | 1981-04-29 | 1982-04-13 | Wisconsin Alumni Research Foundation | Soluble polysilastyrene and method for preparation |
JPS6049647B2 (ja) * | 1981-09-18 | 1985-11-02 | 株式会社日立製作所 | 光又は放射線硬化性ポリオルガノシロキサン組成物 |
-
1984
- 1984-02-28 US US06/584,504 patent/US4548690A/en not_active Expired - Lifetime
-
1985
- 1985-02-15 ZA ZA851195A patent/ZA851195B/xx unknown
- 1985-02-18 CA CA000474512A patent/CA1256642A/en not_active Expired
- 1985-02-25 DK DK084985A patent/DK168955B1/da not_active IP Right Cessation
- 1985-02-26 AU AU39162/85A patent/AU573781B2/en not_active Ceased
- 1985-02-27 JP JP60038633A patent/JPH0670089B2/ja not_active Expired - Lifetime
- 1985-02-28 DE DE8585301378T patent/DE3564119D1/de not_active Expired
- 1985-02-28 EP EP85301378A patent/EP0154519B1/en not_active Expired
- 1985-02-28 KR KR1019850001272A patent/KR910001023B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
AU3916285A (en) | 1985-09-05 |
DE3564119D1 (en) | 1988-09-08 |
CA1256642A (en) | 1989-06-27 |
JPH0670089B2 (ja) | 1994-09-07 |
DK84985A (da) | 1985-08-29 |
AU573781B2 (en) | 1988-06-23 |
EP0154519A3 (en) | 1986-11-12 |
DK168955B1 (da) | 1994-07-18 |
KR850007075A (ko) | 1985-10-30 |
DK84985D0 (da) | 1985-02-25 |
JPS60210604A (ja) | 1985-10-23 |
KR910001023B1 (ko) | 1991-02-19 |
EP0154519A2 (en) | 1985-09-11 |
US4548690A (en) | 1985-10-22 |
EP0154519B1 (en) | 1988-08-03 |
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