ZA821611B - Plugged pinhole thin film and method of making same - Google Patents
Plugged pinhole thin film and method of making sameInfo
- Publication number
- ZA821611B ZA821611B ZA821611A ZA821611A ZA821611B ZA 821611 B ZA821611 B ZA 821611B ZA 821611 A ZA821611 A ZA 821611A ZA 821611 A ZA821611 A ZA 821611A ZA 821611 B ZA821611 B ZA 821611B
- Authority
- ZA
- South Africa
- Prior art keywords
- plugged
- thin film
- making same
- pinhole
- pinhole thin
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000010409 thin film Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1828—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIBVI compounds, e.g. CdS, ZnS, CdTe
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/186—Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/543—Solar cells from Group II-VI materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Photovoltaic Devices (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US24415181A | 1981-03-16 | 1981-03-16 |
Publications (1)
Publication Number | Publication Date |
---|---|
ZA821611B true ZA821611B (en) | 1983-03-30 |
Family
ID=22921568
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ZA821611A ZA821611B (en) | 1981-03-16 | 1982-03-26 | Plugged pinhole thin film and method of making same |
Country Status (11)
Country | Link |
---|---|
EP (1) | EP0060487B1 (de) |
JP (1) | JPS57165832A (de) |
AR (1) | AR226245A1 (de) |
AU (1) | AU560650B2 (de) |
BR (1) | BR8201402A (de) |
CA (1) | CA1165016A (de) |
DE (1) | DE3278607D1 (de) |
IL (1) | IL65164A (de) |
IN (1) | IN158650B (de) |
MX (1) | MX158814A (de) |
ZA (1) | ZA821611B (de) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4937651A (en) * | 1985-08-24 | 1990-06-26 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device free from the current leakage through a semiconductor layer and method for manufacturing same |
AU583423B2 (en) * | 1985-09-21 | 1989-04-27 | Semiconductor Energy Laboratory Co. Ltd. | Semiconductor device free from the electrical shortage through a semiconductor layer and method for manufacturing same |
US4774193A (en) * | 1986-03-11 | 1988-09-27 | Siemens Aktiengesellschaft | Method for avoiding shorts in the manufacture of layered electrical components |
JPH04241576A (ja) * | 1991-01-14 | 1992-08-28 | Matsushita Graphic Commun Syst Inc | 画像符号化装置 |
JP4352515B2 (ja) | 1999-07-21 | 2009-10-28 | チッソ株式会社 | 液晶組成物および液晶表示素子 |
FR3037723B1 (fr) * | 2015-06-16 | 2019-07-12 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Procede de realisation d'un empilement du type premiere electrode / couche active / deuxieme electrode. |
CN114725242B (zh) * | 2022-04-08 | 2023-06-06 | 成都中建材光电材料有限公司 | 一种提高量产化碲化镉薄膜电池发电效率的方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4174217A (en) * | 1974-08-02 | 1979-11-13 | Rca Corporation | Method for making semiconductor structure |
JPS5117671A (en) * | 1974-08-05 | 1976-02-12 | Hitachi Ltd | Pataanno shuseihoho |
DE2503171A1 (de) * | 1975-01-27 | 1976-07-29 | Siemens Ag | Fotolack-aetzverfahren |
JPS51122379A (en) * | 1975-04-18 | 1976-10-26 | Fujitsu Ltd | Treatment for defect of photo-mask |
US4185294A (en) * | 1975-12-10 | 1980-01-22 | Tokyo Shibaura Electric Co., Ltd. | Semiconductor device and a method for manufacturing the same |
GB1532616A (en) * | 1976-06-08 | 1978-11-15 | Monsolar Inc | Photo-voltaic power generating means and methods |
JPS5320863A (en) * | 1976-08-11 | 1978-02-25 | Hitachi Ltd | Defect correcting method of photo masks and reticles |
JPS57124436A (en) * | 1981-01-26 | 1982-08-03 | Mitsubishi Electric Corp | Correction of pattern defect |
JPS57124437A (en) * | 1981-01-26 | 1982-08-03 | Mitsubishi Electric Corp | Correction of pattern defect |
-
1982
- 1982-03-02 IN IN171/DEL/82A patent/IN158650B/en unknown
- 1982-03-02 CA CA000397365A patent/CA1165016A/en not_active Expired
- 1982-03-03 IL IL65164A patent/IL65164A/xx unknown
- 1982-03-08 DE DE8282101832T patent/DE3278607D1/de not_active Expired
- 1982-03-08 EP EP82101832A patent/EP0060487B1/de not_active Expired
- 1982-03-15 JP JP57039592A patent/JPS57165832A/ja active Pending
- 1982-03-15 MX MX191799A patent/MX158814A/es unknown
- 1982-03-15 BR BR8201402A patent/BR8201402A/pt not_active IP Right Cessation
- 1982-03-15 AR AR228741A patent/AR226245A1/es active
- 1982-03-16 AU AU81566/82A patent/AU560650B2/en not_active Expired
- 1982-03-26 ZA ZA821611A patent/ZA821611B/xx unknown
Also Published As
Publication number | Publication date |
---|---|
MX158814A (es) | 1989-03-15 |
IL65164A (en) | 1985-02-28 |
AU560650B2 (en) | 1987-04-16 |
EP0060487B1 (de) | 1988-06-01 |
CA1165016A (en) | 1984-04-03 |
EP0060487A1 (de) | 1982-09-22 |
IN158650B (de) | 1986-12-27 |
IL65164A0 (en) | 1982-05-31 |
AR226245A1 (es) | 1982-06-15 |
JPS57165832A (en) | 1982-10-13 |
DE3278607D1 (en) | 1988-07-07 |
BR8201402A (pt) | 1983-02-01 |
AU8156682A (en) | 1982-09-23 |
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