ZA821611B - Plugged pinhole thin film and method of making same - Google Patents

Plugged pinhole thin film and method of making same

Info

Publication number
ZA821611B
ZA821611B ZA821611A ZA821611A ZA821611B ZA 821611 B ZA821611 B ZA 821611B ZA 821611 A ZA821611 A ZA 821611A ZA 821611 A ZA821611 A ZA 821611A ZA 821611 B ZA821611 B ZA 821611B
Authority
ZA
South Africa
Prior art keywords
plugged
thin film
making same
pinhole
pinhole thin
Prior art date
Application number
ZA821611A
Other languages
English (en)
Inventor
Bulent M Basol
Original Assignee
Monosolar Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Monosolar Inc filed Critical Monosolar Inc
Publication of ZA821611B publication Critical patent/ZA821611B/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1828Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIBVI compounds, e.g. CdS, ZnS, CdTe
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/186Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/543Solar cells from Group II-VI materials
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photovoltaic Devices (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
ZA821611A 1981-03-16 1982-03-26 Plugged pinhole thin film and method of making same ZA821611B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US24415181A 1981-03-16 1981-03-16

Publications (1)

Publication Number Publication Date
ZA821611B true ZA821611B (en) 1983-03-30

Family

ID=22921568

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA821611A ZA821611B (en) 1981-03-16 1982-03-26 Plugged pinhole thin film and method of making same

Country Status (11)

Country Link
EP (1) EP0060487B1 (de)
JP (1) JPS57165832A (de)
AR (1) AR226245A1 (de)
AU (1) AU560650B2 (de)
BR (1) BR8201402A (de)
CA (1) CA1165016A (de)
DE (1) DE3278607D1 (de)
IL (1) IL65164A (de)
IN (1) IN158650B (de)
MX (1) MX158814A (de)
ZA (1) ZA821611B (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4937651A (en) * 1985-08-24 1990-06-26 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device free from the current leakage through a semiconductor layer and method for manufacturing same
AU583423B2 (en) * 1985-09-21 1989-04-27 Semiconductor Energy Laboratory Co. Ltd. Semiconductor device free from the electrical shortage through a semiconductor layer and method for manufacturing same
US4774193A (en) * 1986-03-11 1988-09-27 Siemens Aktiengesellschaft Method for avoiding shorts in the manufacture of layered electrical components
JPH04241576A (ja) * 1991-01-14 1992-08-28 Matsushita Graphic Commun Syst Inc 画像符号化装置
JP4352515B2 (ja) 1999-07-21 2009-10-28 チッソ株式会社 液晶組成物および液晶表示素子
FR3037723B1 (fr) * 2015-06-16 2019-07-12 Commissariat A L'energie Atomique Et Aux Energies Alternatives Procede de realisation d'un empilement du type premiere electrode / couche active / deuxieme electrode.
CN114725242B (zh) * 2022-04-08 2023-06-06 成都中建材光电材料有限公司 一种提高量产化碲化镉薄膜电池发电效率的方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4174217A (en) * 1974-08-02 1979-11-13 Rca Corporation Method for making semiconductor structure
JPS5117671A (en) * 1974-08-05 1976-02-12 Hitachi Ltd Pataanno shuseihoho
DE2503171A1 (de) * 1975-01-27 1976-07-29 Siemens Ag Fotolack-aetzverfahren
JPS51122379A (en) * 1975-04-18 1976-10-26 Fujitsu Ltd Treatment for defect of photo-mask
US4185294A (en) * 1975-12-10 1980-01-22 Tokyo Shibaura Electric Co., Ltd. Semiconductor device and a method for manufacturing the same
GB1532616A (en) * 1976-06-08 1978-11-15 Monsolar Inc Photo-voltaic power generating means and methods
JPS5320863A (en) * 1976-08-11 1978-02-25 Hitachi Ltd Defect correcting method of photo masks and reticles
JPS57124436A (en) * 1981-01-26 1982-08-03 Mitsubishi Electric Corp Correction of pattern defect
JPS57124437A (en) * 1981-01-26 1982-08-03 Mitsubishi Electric Corp Correction of pattern defect

Also Published As

Publication number Publication date
MX158814A (es) 1989-03-15
IL65164A (en) 1985-02-28
AU560650B2 (en) 1987-04-16
EP0060487B1 (de) 1988-06-01
CA1165016A (en) 1984-04-03
EP0060487A1 (de) 1982-09-22
IN158650B (de) 1986-12-27
IL65164A0 (en) 1982-05-31
AR226245A1 (es) 1982-06-15
JPS57165832A (en) 1982-10-13
DE3278607D1 (en) 1988-07-07
BR8201402A (pt) 1983-02-01
AU8156682A (en) 1982-09-23

Similar Documents

Publication Publication Date Title
JPS56137386A (en) Small display element and method of manufacturing same
DE3461302D1 (en) Method of forming thin film
EP0317838A3 (en) Ultra-black film and method of manufacturing the same
JPS5778530A (en) Film strip and making thereof
EP0227183A3 (en) Thin film capacitors and method of making the same
JPS57156032A (en) Method of forming thin film
JPS5573022A (en) Electroooptical display unit and method of making same
DE3278607D1 (en) Plugged pinhole thin film and method of making same
JPS55102219A (en) Method of manufacturing sheathed thin film capacitor and capacitor thereof
AU552461B2 (en) Film coating methol and apparatus
AU546820B2 (en) Lenses and method of making
JPS56164337A (en) Photographic film unit and method of producing same
JPS56134209A (en) Film comprising cellulose ester and method
DE3571725D1 (en) Thin film transistor and method of making the same
GB2108708B (en) Self-processing type film unit and method of manufacturing the same
DE3272345D1 (en) Graphic arts film and method of preparing same
SG70487G (en) Polarizing film and method of making same
DE3272452D1 (en) Medicinal composition and method of making same
JPS5696801A (en) Film resistor and method of manufacturing same
JPS5625736A (en) Photographic product and method of manufacturing same
JPS5573548A (en) Weatherrproof heattcontractible film and making method thereof
JPS5694684A (en) Thin film fine pattern and method of manufacturing same
JPS5697968A (en) Translucent film* use thereof and method of manufacturing same
DE3279014D1 (en) Electro-optic element and method of making the same
JPS5712503A (en) Thin film thermistor and method of producing same