WO2025190018A1 - 干燥装置 - Google Patents

干燥装置

Info

Publication number
WO2025190018A1
WO2025190018A1 PCT/CN2025/076974 CN2025076974W WO2025190018A1 WO 2025190018 A1 WO2025190018 A1 WO 2025190018A1 CN 2025076974 W CN2025076974 W CN 2025076974W WO 2025190018 A1 WO2025190018 A1 WO 2025190018A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
lower cavity
support portion
drying device
cavity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
PCT/CN2025/076974
Other languages
English (en)
French (fr)
Inventor
孙璎南
高宏伟
陶晓峰
贺斌
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ACM Research Shanghai Inc
Original Assignee
ACM Research Shanghai Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ACM Research Shanghai Inc filed Critical ACM Research Shanghai Inc
Publication of WO2025190018A1 publication Critical patent/WO2025190018A1/zh
Pending legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B25/00—Details of general application not covered by group F26B21/00 or F26B23/00
    • F26B25/06—Chambers, containers, or receptacles
    • F26B25/14—Chambers, containers, receptacles of simple construction
    • F26B25/18—Chambers, containers, receptacles of simple construction mainly open, e.g. dish, tray, pan, rack
    • F26B25/185—Spacers; Elements for supporting the goods to be dried, i.e. positioned in-between the goods to build a ventilated stack
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B25/00—Details of general application not covered by group F26B21/00 or F26B23/00
    • F26B25/06—Chambers, containers, or receptacles
    • F26B25/14—Chambers, containers, receptacles of simple construction
    • F26B25/18—Chambers, containers, receptacles of simple construction mainly open, e.g. dish, tray, pan, rack
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01G—WEIGHING
    • G01G19/00—Weighing apparatus or methods adapted for special purposes not provided for in the preceding groups
    • G01G19/52—Weighing apparatus combined with other objects, e.g. furniture
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof

Definitions

  • the present application relates to the field of semiconductor manufacturing technology, and in particular to a drying device.
  • substrates require drying after wet etching or cleaning processes.
  • supercritical fluids with zero surface tension can be used to dry substrates.
  • a substrate covered with IPA is transferred from a cleaning chamber to a drying device.
  • the upper and lower chambers of the drying device are closed to form a sealed chamber.
  • a supercritical fluid is then supplied to the sealed chamber, causing the IPA on the substrate surface to dissolve into the supercritical fluid, forming a mixture of IPA and supercritical fluid.
  • the supercritical fluid is replaced with the IPA covering the substrate surface, achieving the purpose of removing the IPA from the substrate.
  • the supercritical fluid is then vaporized and discharged. After the pressure in the sealed chamber returns to atmospheric pressure, the sealed chamber is opened, and finally, the dried substrate is removed.
  • the substrate covered with IPA is weighed and tested to detect the amount of liquid in the IPA liquid film.
  • the support portion of the drying device rises and moves horizontally inward toward the axis of the lower cavity to the sheet-joining position.
  • the robot places the substrate covered with IPA on the support portion.
  • the weighing sensor connected to the support portion weighs the substrate.
  • the support portion then descends to the sheet placement position, causing the substrate to fall onto the substrate tray of the lower cavity.
  • the support portion then moves horizontally outward away from the axis of the lower cavity to a avoidance position.
  • the lower cavity with the substrate placed thereon then rises and closes with the upper cavity to form a closed chamber.
  • the movement of the support portion descending to place the sheet makes the entire drying process longer. Moreover, when the robot places the substrate, the support portion is subjected to force, causing it to shake, which in turn causes the weighing sensor to fluctuate.
  • the weighing sensor may not have time to fully stabilize before it descends along with the support portion due to process requirements, ultimately causing the weighing sensor to detect fluctuations, bringing adverse effects.
  • the purpose of the present invention is to solve the problem in the prior art that the movement logic of the support assembly not only makes the entire process time longer, but also easily causes the detection value of the weighing sensor moving together with it to fluctuate.
  • an embodiment of the present invention provides a drying device, comprising:
  • the lower cavity is arranged below the upper cavity and is provided with a substrate tray for placing the substrate;
  • a support assembly is provided at a predetermined height, the support assembly comprising a support portion and a driving mechanism, the driving mechanism being used to drive the support portion to move in a horizontal direction, and the support portion being used to receive the substrate;
  • a detection portion disposed on the support assembly, for detecting process parameters of the substrate when the support portion is connected to the substrate;
  • a lifting mechanism is provided below the lower cavity and is used to drive the lower cavity to move in a vertical direction;
  • the drying device is configured as follows: when the support part moves horizontally inward toward the axial direction of the lower cavity to the splicing position and is connected to the substrate, the detection part detects the process parameters of the substrate, and the lifting mechanism drives the lower cavity to move upward in the vertical direction to the splicing position, so that the substrate is transferred from the support part to the substrate tray and carried by the substrate tray, and then the support part moves horizontally outward away from the axial direction of the support part to the avoidance position, and then the lifting mechanism continues to drive the lower cavity to move upward to the process position, so that the lower cavity and the upper cavity are closed to form a closed chamber.
  • An embodiment of the present invention provides a drying device, comprising:
  • the lower cavity is arranged below the upper cavity and is provided with a substrate tray for placing the substrate;
  • a support assembly is provided at a predetermined height, the support assembly comprising a support portion and a driving mechanism, the driving mechanism being used to drive the support portion to move in a horizontal direction, and the support portion being used to receive the substrate;
  • a lifting mechanism is provided below the lower cavity and is used to drive the lower cavity to move in a vertical direction;
  • the drying device is configured as follows: when the support part moves horizontally inward toward the axial direction of the lower cavity to the splicing position and is connected to the substrate, the lifting mechanism drives the lower cavity to move upward in the vertical direction from the initial position to the splicing position, so that the substrate is transferred from the support part to the substrate tray and carried by the substrate tray, and then the support part moves horizontally outward away from the axial direction of the support part to the avoidance position, and then the lifting mechanism continues to drive the lower cavity to move upward to the process position, so that the lower cavity and the upper cavity are closed to form a closed chamber.
  • the driving mechanism of the support assembly of the drying device of the present invention drives the support part to move in the horizontal direction.
  • the detection part on the support assembly detects the process parameters of the substrate.
  • the support assembly no longer moves downward, but waits for the lower cavity to rise and connect the pieces, thereby shortening the entire process time of the drying process.
  • the detection value of the detection part such as the weighing sensor, has more than enough time to stabilize, that is, the stabilization time of the detection part during detection is increased.
  • FIG1 is a schematic front view of a drying device according to an embodiment of the present application.
  • FIGS. 2a to 2e are partial structural schematic diagrams of a drying device according to an embodiment of the present application.
  • FIG3 is a schematic top view of a lower cavity according to an embodiment of the present application.
  • FIG4 is a schematic diagram of a support assembly according to an embodiment of the present application.
  • FIG5 is a schematic front view of a lifting mechanism according to an embodiment of the present application.
  • FIG6 is a bottom view of a lifting mechanism according to an embodiment of the present application.
  • FIG7 is a side view schematic diagram of a lifting mechanism and a guide mechanism according to an embodiment of the present application.
  • FIG1 is a schematic front view of a drying device according to an embodiment of the present application
  • FIG2a to FIG2e are schematic partial structural views of a drying device according to an embodiment of the present application.
  • the drying device includes an upper cavity 110, a lower cavity 120, a support assembly 200, a detection part 300 and a lifting mechanism 400.
  • the lower cavity 120 is arranged below the upper cavity 110 and is provided with a substrate tray 121, which is used to place a substrate (not shown).
  • the support assembly 200 is arranged at a predetermined height position, and the support assembly 200 includes a support part 210 and a driving mechanism 223.
  • the driving mechanism 223 is used to drive the support part 210 to move in a horizontal direction.
  • the support part 210 is used to receive a substrate from a manipulator (not shown) and to hand over the substrate to the substrate tray 121 of the lower cavity 120.
  • the detection part 300 is arranged on the support assembly 200 and is used to detect the process parameters of the substrate when the support part 210 is received by the substrate.
  • the lifting mechanism 400 is disposed below the lower cavity 120 and is used to drive the lower cavity 120 to move in the vertical direction, so that the lower cavity 120 and the upper cavity 110 are closed or opened.
  • the detection unit 300 includes a weighing sensor, and the process parameter of the substrate can be the weight of the substrate.
  • the weighing sensor weighs the substrate covered with IPA on the support assembly 200 before drying. After the substrate is dried, the lower cavity 120 and the upper cavity 110 are opened, and the lifting mechanism 400 drives the lower cavity 120 to descend, and the substrate with the IPA removed is placed on the support assembly 200. At this time, the weighing sensor weighs the substrate on the support assembly 200 after drying. Based on the difference between the two weighings, the removal of IPA on the substrate can be known, and thus the drying state of the substrate can be known.
  • the detection unit 300 detects the process parameters of the substrate 500 before drying.
  • the lifting mechanism 400 drives the lower chamber 120 to move upward vertically from the initial position (e.g., at a constant speed).
  • the substrate 500 is transferred from the support portion 210 to the substrate tray 121 of the lower chamber 120 and carried by the substrate tray 121.
  • the lower chamber 120 pauses its ascent.
  • the drive mechanism 223 drives the support portion 210 to move horizontally outwardly away from the axis of the lower chamber 120 to a retracting position, causing the support portion 210 to exit the lower chamber 120.
  • the lifting mechanism 400 continues to drive the lower cavity 120 to move upward to the process position, so that the lower cavity 120 and the upper cavity 110 are closed to form a closed chamber 123, and the substrate 500 covered with IPA (isopropyl alcohol) is dried inside the closed chamber 123.
  • IPA isopropyl alcohol
  • the support part 210 does not need to descend, but waits for the lower cavity 120 to rise and connect the pieces.
  • the present application omits the action of the support part 210 descending, which will shorten the entire process time of the drying process.
  • the time when the support part 210 waits for the lower cavity 120 to rise and connect the pieces can allow the detection value of the detection part 300 to have sufficient time to stabilize. Therefore, the time for the lower cavity 120 to rise and connect the wafers before drying overlaps with the detection time of the detection unit 300, which not only increases the stabilization time of the detection unit 300 during detection but also saves the entire process time of the drying process.
  • the lifting mechanism 400 drives the lower chamber 120 to move downward from the process position in the vertical direction to the splicing position mentioned above (the splicing position is the position where the substrate 500 is transferred between the lower chamber 120 and the support part 210, and is also the position where the robot takes and places the substrate 500 on the support part 210). Then, the driving mechanism 223 drives the support part 210 to move horizontally inward toward the axis direction of the lower chamber 120 to the splicing position, and then the lifting mechanism 400 drives the lower chamber 120 to move downward from the process position to the splicing position mentioned above.
  • the mechanism 400 continues to drive the lower cavity 120 to move downward to the initial position, wherein during the descent of the lower cavity 120, the substrate 500 is transferred from the substrate tray 121 to the support portion 210 and is carried by the support portion 210, the detection portion 300 detects the process parameters of the dried substrate 500, and after the lower cavity 120 moves downward to the initial position, the robot removes the substrate 500 on the support portion 210, and finally the support portion 210 moves outward in the direction away from the axis of the lower cavity 120 to the avoidance position described above.
  • the lifting mechanism 400 drives the lower cavity 120 to move vertically to the initial position, and then the support portion moves inward horizontally to the position of the substrate tray 121 and is located below the substrate 500, and then the support portion lifts the substrate 500 and rises to the position where the robot takes the sheet, and finally the robot takes the substrate 500.
  • the support portion 210 does not need to rise.
  • this application also eliminates the need for the support portion 210 to rise, which can also shorten the entire drying process time.
  • the time it takes for the lower cavity 120 to descend to its initial position in this application also allows the detection value of the detection portion 300 to have sufficient time to stabilize. Therefore, the time it takes for the lower cavity 120 to descend to its initial position after drying overlaps with the detection time of the detection portion 300, which not only increases the stabilization time of the detection portion 300 during detection but also saves the entire drying process time.
  • Figure 3 shows a schematic top view of the lower cavity of an embodiment of the present application.
  • the drying device further includes a seal 124, a first sensor 125 and a limiter 126.
  • the seal 124 is arranged on the periphery of the substrate tray 121 and is used to seal the closed chamber 123.
  • the seal 124 can be a pan seal.
  • the first sensor 125 is distributed on the side of the lower cavity 120 and is used to monitor the closing distance between the lower cavity 120 and the upper cavity 110, so that the lower cavity 120 moves to the same process position each time and closes with the upper cavity 110 (refer to the position of the lower cavity 120 in Figure 2d).
  • the first sensor 125 can be a displacement sensor.
  • the limiter 126 is arranged between the upper cavity 110 and the lower cavity 120.
  • the material of the limiter 126 needs to have a certain hardness to protect the seal 124.
  • the material of the limiter 126 can be PTFE (Polytetrafluoroethylene).
  • the limiter 126 can be arranged in the lower cavity 120 or the upper cavity 110. Referring to Figure 2d, after the lower cavity 120 moves to the process position and closes with the upper cavity 110, there is a gap d between the upper cavity 110 and the limiter 126.
  • the gap between the upper cavity 110 and the limiter 126 becomes zero.
  • the limiter 126 can prevent the distance between the lower cavity 120 and the upper cavity 110 from being too small, thereby preventing the seal 124 from being crushed due to excessive compression.
  • first sensors 125 there are at least three first sensors 125.
  • two first sensors 125 are provided at intervals on the first side of the lower cavity 120, and one first sensor 125 is provided at intervals on the second side of the lower cavity 120, with the first side of the lower cavity 120 facing the second side.
  • the upper cavity 110 is level, when the readings of the three first sensors 125 are consistent, it means that the levelness of the lower cavity 120 meets the process requirements, thereby monitoring whether the lower cavity 120 is level.
  • the readings output by the three first sensors 125 can be used to quickly provide feedback, thereby avoiding the situation where the seal 124 is not pressed tightly when the tilted lower cavity 120 is closed with the upper cavity 110, resulting in a loose seal.
  • FIG4 shows a schematic diagram of a support assembly according to an embodiment of the present application.
  • the driving mechanism 223 of the support assembly 200 includes a sliding portion 220 and a driving portion 230, and the support assembly 200 further includes a first horizontal adjustment portion 240 and a mounting portion 250.
  • the support portion 210 of the support assembly 200 includes a carrier 211 and a connector 212, wherein the carrier 211 is connected to the first end of the connector 212 for supporting the substrate.
  • the second end of the connector 212 is fixed above the detection portion 300.
  • the vertical distance between the end face of the first end of the connector 212 and the end face of the second end of the connector 212 is less than 10 cm, preferably less than 5 cm.
  • the support portion 210 includes two bearing members 211 and a connecting member 212.
  • the two bearing members 211 are parallel to each other and are arranged horizontally at intervals on the connecting member 212.
  • the connecting member 212 is processed in one piece.
  • the detection portion 300 is arranged on the sliding portion 220.
  • the support portion 210 is connected to the sliding portion 220 through the detection portion 300.
  • the sliding portion 220 is connected to the driving portion 230.
  • the driving portion 230 is used to drive the sliding portion 220 to slide in the horizontal direction, thereby adjusting the horizontal distance between the support portion 210 and the substrate 500.
  • the driving portion 230 adopts a cylinder, an electric cylinder or a linear motor, etc., preferably an electric cylinder or a linear motor, which has higher control accuracy.
  • the first horizontal adjustment portion 240 is arranged between the driving portion 230 and the mounting portion 250.
  • the mounting portion 250 is fixed at a predetermined height position.
  • the mounting portion 250 can be fixed at a predetermined height position on the machine frame (not shown).
  • the upper cavity 110 mentioned above is also fixed on the machine frame.
  • there are two support assemblies 200 and the mounting portions 250 of the two support assemblies 200 are respectively located on two sides of the lower cavity 120 .
  • a first horizontal adjustment portion 240 is used to adjust the horizontality of the support portion 210.
  • the first horizontal adjustment portion 240 is arranged between the driving portion 230 and the mounting portion 250, and is located below the detection portion 300.
  • the first horizontal adjustment portion 240 includes a first base 241, a first fixing member 242 and a first top screw 243.
  • the first fixing member 242 is used to fix the first base 241 on the mounting portion 250, and the first top screw 243 is used to adjust the horizontality of the first base 241. Specifically, when adjusting the levelness of the support portion 210 using the first leveling portion 240, turning the first screw 243 changes the gap between the first base 241 and the mounting portion 250, thereby adjusting the levelness of the first base 241.
  • the levelness of the driving portion 230 and the sliding portion 220 which are sequentially arranged above the first base 241, and the support portion 210 also changes along with the first base 241, thereby achieving the purpose of adjusting the levelness of the support portion 210. After determining the levelness of the support portion 210, the first fixing member 242 is used to fix the first base 241 to the mounting portion 250.
  • the first level adjustment part 240 is arranged below the detection part 300.
  • the operator's force will basically not cause irreversible damage to the upper detection part 300, such as the weighing sensor.
  • Figure 5 shows a front view of a lifting mechanism according to an embodiment of the present application
  • Figure 6 shows a bottom view of a lifting mechanism according to an embodiment of the present application.
  • the needle guide pin structure is not shown in Figure 5 .
  • the lifting and lowering movement of the lower cavity 120 is achieved by a lifting mechanism 400, and the opening and closing distance between the lower cavity 120 and the upper cavity 110 can range from 45 mm to 150 mm.
  • the lifting mechanism 400 includes a drive device 410, a lifting platform 430, a guide rail 440, a second sensor 450, and a grating ruler 460.
  • the drive device 410 is used to drive the lifting platform 430 to move in the vertical direction.
  • the lifting platform 430 is used to lift the lower cavity 120 so that the lower cavity 120 moves in the vertical direction.
  • the second sensor 450 is used to monitor the lifting position of the lifting platform 430. In the example shown in Figure 5, four second sensors 450 are arranged in descending order.
  • the two second sensors 4501 and 4504 at the highest and lowest positions are used to limit the maximum and minimum distances of the lifting platform 430, respectively.
  • a second sensor 4503 located near the bottom of the center, monitors whether the lifting platform 430 has raised the lower chamber 120 to the wafer splicing position. After substrate weighing is complete, the lifting platform 430 raises the lower chamber 120 to this wafer splicing position, and the lower chamber 120 begins splicing.
  • the second sensor 450 can be a photoelectric sensor.
  • the grating ruler 460 is used to measure the moving distance of the lifting platform 430.
  • the driving device 410 includes a driving member 420, a driving wheel 421, a driven wheel 422, a synchronous belt 423, a screw 424 and a moving end 425.
  • the output end of the driving member 420 is connected to the driving wheel 421 to drive the driving wheel 421 to rotate.
  • the synchronous belt 423 connects the driving wheel 421 and the driven wheel 422 so that the driving wheel 421 drives the driven wheel 422 to rotate through the synchronous belt 423.
  • the driven wheel 422 is connected to the screw 424 to drive the screw 424 to rotate.
  • the moving end 425 is connected to the lifting platform 430 and the guide rail 440, and is arranged on the screw 424.
  • the moving end 425 is used to convert rotational motion into linear motion on the screw 424, thereby driving the lifting platform 430 to move linearly along the guide rail 440.
  • the grating ruler 460 is disposed on the moving end 425 , and the grating ruler 460 measures the moving distance of the moving end 425 to obtain the moving distance of the lifting platform 430 .
  • the lifting mechanism 400 further includes a tensioning pulley mechanism 428 to facilitate adjustment of the tightness of the synchronous belt 423 .
  • Figure 7 shows a side view of the lifting mechanism and the guide mechanism according to an embodiment of the present application. It should be noted that in Figure 1 , the guide mechanism and the lifting mechanism overlap in position.
  • the drying device further includes a guide mechanism, which includes a mounting seat 471, a needle guide post 472, and a second horizontal adjustment portion 474.
  • the needle guide post 472 is disposed on the mounting seat 471 and is connected to the lower cavity 120.
  • the needle guide post 472 can be directly connected to the lower cavity 120 or indirectly connected.
  • the upper end of the needle guide post 472 can be provided with an adapter 473 as shown in Figure 7, and the adapter 473 is connected to the lower cavity 120.
  • two needle guide posts 472 are provided, one on each side of the lifting platform 430.
  • the needle guide post 472 is capable of achieving high-precision linear motion, so that the lower cavity 120 can be stably raised and lowered.
  • the second horizontal adjustment portion 474 is disposed at the bottom of the mounting seat 471 and is configured to adjust the horizontality of the mounting seat 471.
  • the second level adjustment portion 474 includes a second base 4741, a second fixing member (not shown), and a second top screw 4742.
  • the mounting base 471 is fixed to the second base 4741.
  • the second fixing member is used to fix the second base 4741 to the installation position, such as on the machine frame.
  • the gap between the second base 4741 and the machine frame can be changed to adjust the level of the second base 4741, thereby adjusting the level of the needle guide 472 and the adapter 473, and further adjusting the level of the lower cavity 120.
  • the second fixing member fixes the second base 4741.
  • the detection part such as a weighing sensor
  • the support assembly 200 is independently provided with the support assembly 200.
  • the detection part can be provided separately or integrated into the manipulator mentioned above, and the specific setting can be combined with the actual process environment.
  • this embodiment proposes a drying device.
  • the structure of the drying device except for the detection part can refer to Figures 1 to 2e.
  • the drying device of this embodiment includes an upper cavity 110, a lower cavity 120, a support assembly 200 and a lifting mechanism 400.
  • the lower cavity 120 is provided below the upper cavity 110 and is provided with a substrate tray 121.
  • the substrate tray 121 is used to place the substrate 500.
  • the support assembly 200 is provided at a predetermined height position.
  • the support assembly 200 includes a support part 210 and a drive mechanism 223.
  • the drive mechanism 223 is used to drive the support part 210 to move in the horizontal direction.
  • the support part 210 is used to receive the substrate 500 from the manipulator and to transfer the substrate 500 to the substrate tray 121 of the lower cavity 120.
  • the lifting mechanism 400 is disposed below the lower cavity 120 and is used to drive the lower cavity 120 to move in a vertical direction, so that the lower cavity 120 and the upper cavity 110 are closed or opened.
  • the robot After the driving mechanism 223 drives the support portion 210 to move horizontally inward toward the axis of the lower chamber 120 to the splicing position, the robot places the substrate 500 covered with IPA (isopropyl alcohol) on the support portion 210, and then the lifting mechanism 400 drives the lower chamber 120 to move upward from the initial position in the vertical direction (for example, at a uniform upward speed).
  • the substrate 500 is transferred from the support portion 210 to the substrate tray 121 and carried by the substrate tray 121. At this time, the lower chamber 120 stops rising.
  • the driving mechanism 223 then drives the support portion 210 to move horizontally outward away from the axis of the lower chamber 120 to the avoidance position, so that the support portion 210 exits the lower chamber 120.
  • the lifting mechanism 400 continues to move the lower chamber 120 upward to the processing position, closing the lower chamber 120 with the upper chamber 110 to form a sealed chamber 123.
  • the IPA (isopropyl alcohol)-coated substrate 500 is dried within this sealed chamber 123.
  • the drying apparatus proposed in this embodiment eliminates the need for the support member 210 to descend, thus shortening the overall drying process time. Furthermore, the lack of a descending motion ensures a uniform and stable IPA film on the surface of the substrate 500 on the support member 210.
  • the lifting mechanism 400 drives the lower chamber 120 to move downward in the vertical direction from the process position to the splicing position (the splicing position is the position for transferring the substrate 500 between the lower chamber 120 and the support part 210, and is also the position for the robot to take and place the substrate 500 on the support part 210). Then the driving mechanism 223 drives the support part 210 to move horizontally inward toward the axial direction of the lower chamber 120 to the splicing position. Then the lifting mechanism 400 continues to drive the lower chamber 120 to move downward, so that the substrate 500 is transferred from the substrate tray 121 to the support part 210 and is carried by the support part 210.
  • the substrate 500 on the support part 210 is taken away by the robot. Finally, the support part 210 moves outward toward the axial direction of the lower chamber 120 to the avoidance position.
  • the drying device proposed in this embodiment eliminates the need for the support portion 210 to rise, and can also shorten the entire drying process time.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Drying Of Solid Materials (AREA)

Abstract

本发明公开了一种干燥装置，包括上腔体、下腔体、支撑组件、检测部和举升机构，支撑组件设置在预定高度位置处，且包括支撑部和驱动机构，驱动机构用于驱动支撑部沿水平方向移动，检测部设置在支撑组件上，举升机构设置在下腔体的下方。当支撑部向内水平移动至接片位置并接到基板时，检测部检测基板的工艺参数，举升机构带动下腔体沿竖直方向向上运动至接片位置，使基板由支撑部移交至基板托盘并由基板托盘承载，接着支撑部向外水平移动至避让位置，之后举升机构继续带动下腔体向上运动至工艺位置，使得下腔体与上腔体闭合形成密闭腔室。本发明能够使得检测部检测数值更准确，同时缩短了干燥处理过程的整个工艺时间。

Description

干燥装置 技术领域
本申请涉及半导体制造技术领域，尤其涉及一种干燥装置。
背景技术
在集成电路制造过程中，基板在进行湿法刻蚀或清洗工艺后需要进行干燥处理。已知可采用表面张力为零的超临界流体对基板进行干燥处理。例如，将覆盖有IPA(Isopropyl alcohol，异丙醇)的基板从清洗腔转运至干燥装置，并使干燥装置的上腔体和下腔体闭合，以形成密闭腔室，然后向密闭腔室供应超临界流体，使基板表面上的IPA溶解到超临界流体，形成IPA和超临界流体的混合物。随着密闭腔室不断供应超临界流体，以及IPA和超临界流体的混合物不断排出，完成超临界流体与基板表面覆盖的IPA之间的置换，达到从基板上去除IPA的目的。接着气化并排出超临界流体，待密闭腔室内压力返回到大气压力后打开密闭腔室，最后将干燥处理后的基板取出。
在进行干燥处理之前，会对覆盖有IPA的基板进行称重检测，以检测IPA液膜的液量。目前，在干燥处理过程中，干燥装置的支撑部上升且朝向下腔体的轴线方向向内水平移动至接片位置，机械手将覆盖有IPA的基板放置在支撑部上，与支撑部连接的称重传感器对基板进行称重，然后支撑部下降至放片位置，使得基板落在下腔体的基板托盘上，接着支撑部背向下腔体的轴线方向向外水平运动至避让位置，然后放置有基板的下腔体上升与上腔体闭合形成密闭腔室。其中，支撑部下降放片的运动过程使得干燥处理过程的整个工艺时间较长，而且机械手放置基板时，会使支撑部受力引起晃动，进而造成称重传感器波动，称重传感器可能还未来得及完全稳定，就因工艺需要而随支撑部一起下降，最终导致了称重传感器检测数值波动，带来不良影响。
发明内容
本发明的目的在于解决现有技术中支撑组件的运动逻辑不仅使整个工艺时间较长，还容易导致与其一起运动的称重传感器的检测数值有波动的问题。
为解决上述问题，本发明的实施方式提出一种干燥装置，包括：
上腔体；
下腔体，设置在上腔体的下方，且设置有基板托盘，基板托盘用于放置基板；
支撑组件，设置在预定高度位置处，支撑组件包括支撑部和驱动机构，驱动机构用于驱动支撑部沿水平方向移动，支撑部用于承接基板；
检测部，设置在支撑组件上，用于在支撑部接到基板时检测基板的工艺参数；
举升机构，设置在下腔体的下方，用于带动下腔体沿竖直方向运动；
干燥装置被配置为：当支撑部朝向下腔体的轴线方向向内水平移动至接片位置并接到基板时，检测部检测基板的工艺参数，举升机构带动下腔体沿竖直方向向上运动至接片位置，使基板由支撑部移交至基板托盘并由基板托盘承载，接着支撑部背向支撑部的轴线方向向外水平移动至避让位置，之后举升机构继续带动下腔体向上运动至工艺位置，使得下腔体与上腔体闭合形成密闭腔室。
本发明的实施方式提出一种干燥装置，包括：
上腔体；
下腔体，设置在上腔体的下方，且设置有基板托盘，基板托盘用于放置基板；
支撑组件，设置在预定高度位置处，支撑组件包括支撑部和驱动机构，驱动机构用于驱动支撑部沿水平方向移动，支撑部用于承接基板；
举升机构，设置在下腔体的下方，用于带动下腔体沿竖直方向运动；
干燥装置被配置为：当支撑部朝向下腔体的轴线方向向内水平移动至接片位置并接到基板时，举升机构带动下腔体沿竖直方向从初始位置向上运动至接片位置，使基板由支撑部移交至基板托盘并由基板托盘承载，接着支撑部背向支撑部的轴线方向向外水平移动至避让位置，之后举升机构继续带动下腔体向上运动至工艺位置，使得下腔体与上腔体闭合形成密闭腔室。
本发明干燥装置的支撑组件的驱动机构驱动支撑部沿水平方向移动，当支撑部接到基板时，支撑组件上的检测部检测基板的工艺参数，这时支撑组件不再作下降运动，而是等待下腔体上升接片，缩短了干燥处理过程的整个工艺时间，同时，下腔体上升接片的这段时间，能让检测部，例如称重传感器的检测数值有比较充足的时间去稳定，即增加了检测部检测时的稳定时间。
本发明其他特征和相应的有益效果在说明书的后面部分进行阐述说明，且应当理解，至少部分有益效果从本发明说明书中的记载变的显而易见。
附图概述
本申请的特征、性能由以下的实施例及其附图进一步描述。
图1为本申请一实施例的干燥装置的主视示意图；
图2a至图2e为本申请一实施例的干燥装置的部分结构示意图；
图3为本申请一实施例的下腔体的俯视示意图；
图4为本申请一实施例的支撑组件的示意图；
图5为本申请一实施例的举升机构的主视示意图；
图6为本申请一实施例的举升机构的仰视示意图；以及
图7为本申请一实施例的举升机构和导向机构的侧视示意图。
本申请的较佳实施方式
以下由特定的具体实施例说明本发明的实施方式，本领域技术人员可由本说明书所揭示的内容轻易地了解本发明的其他优点及功效。虽然本发明的描述将结合较佳实施例一起介绍，但这并不代表此发明的特征仅限于该实施方式。恰恰相反，结合实施方式作发明介绍的目的是为了覆盖基于本发明的权利要求而有可能延伸出的其它选择或改造。为了提供对本发明的深度了解，以下描述中将包含许多具体的细节。本发明也可以不使用这些细节实施。此外，为了避免混乱或模糊本发明的重点，有些具体细节将在描述中被省略。需要说明的是，在不冲突的情况下，本发明中的实施例及实施例中的特征可以相互组合。
应注意的是，在本说明书中，相似的标号和字母在下面的附图中表示类似项，因此，一旦某一项在一个附图中被定义，则在随后的附图中不需要对其进行进一步定义和解释。
下面将结合附图对本发明的技术方案进行清楚、完整地描述，显然，所描述的实施例是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
在本发明的描述中，需要说明的是，术语“中心”、“上”、“下”、“左”、“右”、“竖直”、“水平”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本发明和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本发明的限制。此外，术语“第一”、“第二”、“第三”仅用于描述目的，而不能理解为指示或暗示相对重要性。
在本发明的描述中，需要说明的是，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通。对于本领域的普通技术人员而言，可以具体情况理解上述术语在本发明中的具体含义。
为使本发明的目的、技术方案和优点更加清楚，下面将结合附图对本发明的实施方式作进一步地详细描述。
图1示出了本申请一实施例的干燥装置的主视示意图；图2a至图2e示出了本申请一实施例的干燥装置的部分结构示意图。
参见图1，本申请提供的干燥装置，包括上腔体110、下腔体120、支撑组件200、检测部300和举升机构400。下腔体120设置在上腔体110的下方，且设置有基板托盘121，基板托盘121用于放置基板(图未示)。支撑组件200设置在预定高度位置处，支撑组件200包括支撑部210和驱动机构223，驱动机构223用于驱动支撑部210沿水平方向移动，支撑部210用于接收来自机械手(图未示)上的基板，以及将基板交接至下腔体120的基板托盘121上。检测部300设置在支撑组件200上，用于在支撑部210接到基板时检测基板的工艺参数。举升机构400设置在下腔体120的下方，用于带动下腔体120沿竖直方向运动，使得下腔体120与上腔体110闭合或打开。本申请实施例中，检测部300包括称重传感器，基板的工艺参数可以是基板的重量，示例性地，在对基板进行干燥处理之前，称重传感器对支撑组件200上覆盖IPA的基板进行干燥前称重，在对基板进行干燥处理之后，下腔体120与上腔体110打开，举升机构400带动下腔体120下降，将去除IPA的基板放置在支撑组件200上，这时称重传感器对支撑组件200上的基板进行干燥后称重，根据前后两次称重的差值，可得知基板上IPA的去除情况，进而可得知基板的干燥状态。
首先结合图1和图2a，当驱动机构223驱动支撑部210朝向下腔体120的轴线方向向内水平移动至接片位置，并使得支撑部210从机械手上接到基板500时，检测部300检测干燥前基板500的工艺参数。支撑部210从机械手上接到基板500之后，结合图2b，举升机构400带动下腔体120沿竖直方向从初始位置向上运动(例如向上匀速运动)，当下腔体120运动到支撑部210所在的接片位置处时，基板500由支撑部210移交至下腔体120的基板托盘121并由基板托盘121承载，此时下腔体120暂停上升。接着如图2c所示，驱动机构223驱动支撑部210背向下腔体120的轴线方向向外水平移动至避让位置，使得支撑部210退出下腔体120。支撑部210退出下腔体120之后，如图2d所示，举升机构400继续带动下腔体120向上运动至工艺位置，使得下腔体120与上腔体110闭合形成密闭腔室123，在该密闭腔室123内部对覆盖IPA(异丙醇)的基板500进行干燥处理。在现有的干燥装置中，支撑部需向下运动将基板500移交至下腔体120的基板托盘121。而本申请提出的干燥装置，支撑部210无需下降，而是等待下腔体120上升接片，相比现有的干燥装置，本申请省去了支撑部210下降的动作，这样就会缩短干燥处理的整个工艺时间，同时，支撑部210等待下腔体120上升接片的这段时间，能让检测部300的检测数值有比较充足的时间去稳定。因此，干燥前下腔体120上升接片的时间与检测部300的检测时间有重合，不仅增加了检测部300检测时的稳定时间又节省了干燥处理的整个工艺时间。
当对基板500完成干燥处理，打开密闭腔室123时，举升机构400带动下腔体120沿竖直方向从工艺位置向下运动至前文所述的接片位置(该接片位置是下腔体120与支撑部210之间移交基板500的位置，也是机械手在支撑部210上取放基板500的位置)，然后驱动机构223驱动支撑部210朝向下腔体120的轴线方向向内水平移动至该接片位置，接着举升机构400继续带动下腔体120向下运动至初始位置，其中在下腔体120下降的过程中，基板500由基板托盘121移交至支撑部210并由支撑部210承载，检测部300检测干燥后基板500的工艺参数，当下腔体120向下运动至初始位置后，机械手取走支撑部210上的基板500，最后支撑部210背向下腔体120的轴线方向向外移动至前文所述的避让位置。在现有的干燥装置中，打开密闭腔室123时，举升机构400带动下腔体120沿竖直方向运动到初始位置，然后支撑部向内水平移动至基板托盘121位置处且位于基板500下方，然后支撑部托起基板500并上升至机械手取片的位置，最后机械手取走基板500。而本申请提出的干燥装置，支撑部210无需上升，相比现有的干燥装置，本申请还省去了支撑部210上升的动作，同样可以缩短干燥处理的整个工艺时间，同时，本申请中下腔体120下降至初始位置的这段时间，也能让检测部300的检测数值有比较充足的时间去稳定。因此，干燥后下腔体120下降至初始位置的时间与检测部300的检测时间有重合，不仅增加了检测部300检测时的稳定时间又节省了干燥处理的整个工艺时间。
结合图2a至图2e以及图3，图3示出了本申请一实施例的下腔体的俯视示意图。在一些实施例中，干燥装置还包括密封件124、第一传感器125和限位件126。密封件124设置在基板托盘121的外围，用于对密闭腔室123进行密封，密封件124可以是泛塞封。第一传感器125分布在下腔体120的侧部，用于监测下腔体120和上腔体110之间的合腔距离，以便让下腔体120每次都运动至相同的工艺位置与上腔体110闭合(参考图2d下腔体120所在的位置)，这样在下腔体120被举升到位的同时保护密封件124不被压毁，第一传感器125可以是位移传感器。限位件126设置在上腔体110和下腔体120之间，限位件126的材质需要有一定的硬度，以起到保护密封件124的作用，限位件126的材质可以是PTFE(Polytetrafluoroethylene，聚四氟乙烯)。限位件126可以设置于下腔体120或上腔体110。参考图2d，当下腔体120运动至工艺位置与上腔体110闭合后，上腔体110与限位件126之间具有间隙d。参考图2e，当出现下腔体120运动到工艺位置后还继续向上运动的异常情况时，上腔体110与限位件126之间的间隙变为零，限位件126能够避免下腔体120和上腔体110之间的间距过小，从而防止密封件124因压缩量过大而被压毁。
在一些实施例中，第一传感器125具有至少三个，在图3所示示例中，具有三个第一传感器125，以监测下腔体120的水平度。示例性地，下腔体120的第一侧间隔设置有两个第一传感器125，下腔体120的第二侧间隔设置有一个第一传感器125，下腔体120的第一侧与第二侧相对。在保证上腔体110是水平的前提下，当这三个第一传感器125的读数一致时，说明下腔体120的水平度满足工艺要求，以此对下腔体120是否水平起到监控作用。当下腔体120存在倾斜的情况，可通过三个第一传感器125输出的读数迅速反馈，避免倾斜的下腔体120与上腔体110闭合时密封件124未压紧，导致密封不严的情况。
图4示出了本申请一实施例的支撑组件的示意图。
在一些实施例中，参见图4，支撑组件200的驱动机构223包括滑动部220和驱动部230，支撑组件200还包括第一水平调节部240和安装部250。支撑组件200的支撑部210包括承载件211和连接件212，承载件211与连接件212的第一端连接，用于承载基板。连接件212的第二端固定在检测部300的上方。其中，连接件212的第一端的端面与连接件212的第二端的端面之间的垂直距离小于10cm，较佳地，小于5cm。连接件212的这种结构有利于减少机械手将基板刚放在承载件211上时基板的稳定时间，进而能给检测部300留出更多检测时的稳定时间。具体地，支撑部210包括两个承载件211和一连接件212，两个承载件211相互平行且水平间隔设置在连接件212上，连接件212采用一体式加工。检测部300设置在滑动部220上，支撑部210通过检测部300与滑动部220连接。滑动部220与驱动部230连接，驱动部230用于驱动滑动部220沿水平方向滑动，以此调节支撑部210和基板500之间的水平距离，驱动部230采用气缸、电动缸或直线电机等，优选采用电动缸或直线电机，控制精度较高。第一水平调节部240设置在驱动部230和安装部250之间，安装部250固定在预定高度位置处，例如安装部250可以固定在机台框架(图未示)上的预定高度位置，前文中的上腔体110也固定在该机台框架上。在图1所示示例中，支撑组件200具有两个，两个支撑组件200的安装部250分别位于下腔体120的两侧。
再次参见图4，由于支撑部210的水平度会影响基板的水平度及其上IPA分布的均匀性和检测部300的读数准确性等，所以在工艺过程中不可避免地会调节支撑部210的水平度。本申请实施例中，采用第一水平调节部240调节支撑部210的水平度。第一水平调节部240设置在驱动部230和安装部250之间，位于检测部300的下方。第一水平调节部240包括第一基座241、第一固定件242和第一顶丝243，第一固定件242用于将第一基座241固定在安装部250上，第一顶丝243用于调节第一基座241的水平度。具体地，当通过第一水平调节部240调节支撑部210的水平度时，拧动第一顶丝243，这样可改变第一基座241与安装部250之间的间隙，以此调节第一基座241的水平度，第一基座241上方依次设置的驱动部230和滑动部220以及支撑部210的水平度随第一基座241一起变化，达到调节支撑部210水平度的目的。确定好支撑部210水平度之后，采用第一固定件242将第一基座241固定在安装部250上。
本申请实施例中，将第一水平调节部240设置在检测部300的下方，在进行水平度调节的操作过程中，操作人员的力度基本不会对上方的检测部300，例如称重传感器造成不可逆损伤。
图5示出了本申请一实施例的举升机构的主视示意图；图6示出了本申请一实施例的举升机构的仰视示意图。其中，在图5中未示意出滚针导柱相关结构。
在一些实施例中，结合图1、图5和图6，下腔体120的升降运动通过举升机构400实现，下腔体120与上腔体110之间的开合距离范围可以是45mm～150mm。举升机构400包括驱动装置410、举升平台430、导轨440、第二传感器450和光栅尺460。驱动装置410用于驱动举升平台430沿竖直方向运动，举升平台430用于托举下腔体120，以使下腔体120沿竖直方向运动。第二传感器450用于监测举升平台430的举升位置，在图5所示示例中，第二传感器450由高到低依次设置有四个，其中最高位置和最低位置的两个第二传感器4501、4504分别用来限制举升平台430运行的最大距离和最小距离，到达最高位置或最低位置时，举升平台430不能继续上升或下降。中间位置靠下的一个第二传感器4503用于监测举升平台430是否将下腔体120举升到接片位置，在基板称重完成后举升平台430将下腔体120举升到该接片位置时，下腔体120进行接片动作。中间位置靠上的一个第二传感器4502用于监测举升平台430是否将下腔体120举升到与上腔体110闭合的工艺位置。第二传感器450可以是光电传感器。
光栅尺460用于测量举升平台430的移动距离。结合图5和图6，驱动装置410包括驱动件420、主动轮421、从动轮422、同步带423、丝杠424和移动端425。驱动件420的输出端与主动轮421连接，以驱动主动轮421旋转。同步带423连接主动轮421和从动轮422，以使主动轮421通过同步带423带动从动轮422旋转。从动轮422与丝杠424连接，以带动丝杠424旋转。移动端425与举升平台430和导轨440连接，并设置于丝杠424上，移动端425用于在丝杠424上将旋转运动转换成直线运动，以此带动举升平台430沿导轨440方向作直线运动。其中，光栅尺460设置在移动端425上，光栅尺460通过测量移动端425的移动距离以测量得出举升平台430的移动距离。
在一些实施例中，如图6所示，举升机构400还包括张紧轮机构428，方便调节同步带423的松紧度。
图7示出了本申请一实施例的举升机构和导向机构的侧视示意图。需要说明的是，在图1中，导向机构和举升机构在位置上前后重叠。
在一些实施例中，结合图1和图7，干燥装置还包括导向机构，导向机构包括安装座471、滚针导柱472和第二水平调节部474。滚针导柱472设置在安装座471上，并与下腔体120连接。在一些实施例中，滚针导柱472可以与下腔体120直接连接，也可以间接连接，当滚针导柱472与下腔体120间接连接时，滚针导柱472的上端可设置图7所示的转接件473，转接件473与下腔体120连接。本实施例设置有两个滚针导柱472，分别设置在举升平台430的两侧。利用滚针导柱472能实现高精度直线运动的特点，使得下腔体120稳定升降。第二水平调节部474设置在安装座471的底部，且被配置为用于调节安装座471的水平度。第二水平调节部474包括第二基座4741、第二固定件(图未示)和第二顶丝4742，安装座471固定于第二基座4741，第二固定件用于将第二基座4741固定在待安装位置，例如固定在机台框架上。通过拧动第二顶丝4742，可改变第二基座4741与机台框架之间的间隙，以此调节第二基座4741的水平度，进而调节滚针导柱472及转接件473的水平度，从而进一步调节下腔体120的水平度。当确定好第二基座4741的水平度后，第二固定件对第二基座4741进行固定。
在一些实施例中，检测部，例如称重传感器与支撑组件200分别独立设置，检测部可以单独设置，也可以集成在前文中的机械手上，具体可结合实际工艺环境设置。在检测部与支撑组件200分别独立设置的情况下，本实施例提出一种干燥装置，该干燥装置的结构除了检测部之外的其余结构可参考图1至图2e。本实施例的干燥装置包括上腔体110、下腔体120、支撑组件200和举升机构400。下腔体120设置在上腔体110的下方，且设置有基板托盘121，基板托盘121用于放置基板500。支撑组件200设置在预定高度位置处，支撑组件200包括支撑部210和驱动机构223，驱动机构223用于驱动支撑部210沿水平方向移动，支撑部210用于接收来自机械手上的基板500，以及将基板500交接至下腔体120的基板托盘121上。举升机构400设置在下腔体120的下方，用于带动下腔体120沿竖直方向运动，使得下腔体120与上腔体110闭合或打开。
当驱动机构223驱动支撑部210朝向下腔体120的轴线方向向内水平移动至接片位置后，机械手将覆盖有IPA(异丙醇)的基板500放置在支撑部210上，然后举升机构400带动下腔体120沿竖直方向从初始位置向上运动(例如向上匀速运动)，当下腔体120运动到支撑部210所在的接片位置处时，基板500由支撑部210移交至基板托盘121并由基板托盘121承载，此时下腔体120暂停上升。接着驱动机构223驱动支撑部210背向下腔体120的轴线方向向外水平移动至避让位置，使得支撑部210退出下腔体120。支撑部退出下腔体120之后，举升机构400继续带动下腔体120向上运动至工艺位置，使得下腔体120与上腔体110闭合形成密闭腔室123，在该密闭腔室123内部对覆盖IPA(异丙醇)的基板500进行干燥处理。本实施例提出的干燥装置，省去了支撑部210下降的动作，这样就会缩短干燥处理的整个工艺时间，同时，因无下降动作而保证了支撑部210上基板500表面的IPA液膜的均匀性和稳定性。
当对基板500完成干燥处理，打开密闭腔室123时，举升机构400带动下腔体120沿竖直方向从工艺位置向下运动至接片位置(该接片位置是下腔体120与支撑部210之间移交基板500的位置，也是机械手在支撑部210上取放基板500的位置)，然后驱动机构223驱动支撑部210朝向下腔体120的轴线方向向内水平移动至接片位置，接着举升机构400继续带动下腔体120向下运动，使基板500由基板托盘121移交至支撑部210并由支撑部210承载，当下腔体120向下运动至初始位置后，支撑部210上的基板500被机械手取走，最后支撑部210背向下腔体120的轴线方向向外移动至避让位置。本实施例提出的干燥装置，省去了支撑部210上升的动作，同样可以缩短干燥处理的整个工艺时间。
最后应说明的是：以上各实施例仅用以说明本发明的技术方案，而非对其限制；尽管参照前述各实施例对本发明进行了详细的说明，本领域的普通技术人员应当理解：其依然可以对前述各实施例所记载的技术方案进行修改，或者对其中部分或者全部技术特征进行等同替换；而这些修改或者替换，并不使相应技术方案的本质脱离本发明各实施例技术方案的范围。

Claims (15)

  1. 一种干燥装置，其特征在于，包括：
    上腔体；
    下腔体，设置在所述上腔体的下方，且设置有基板托盘，所述基板托盘用于放置基板；
    支撑组件，设置在预定高度位置处，支撑组件包括支撑部和驱动机构，所述驱动机构用于驱动所述支撑部沿水平方向移动，所述支撑部用于承接所述基板；
    检测部，设置在所述支撑组件上，用于在所述支撑部接到所述基板时检测所述基板的工艺参数；
    举升机构，设置在所述下腔体的下方，用于带动所述下腔体沿竖直方向运动；
    所述干燥装置被配置为：当所述支撑部朝向所述下腔体的轴线方向向内水平移动至接片位置并接到所述基板时，所述检测部检测所述基板的工艺参数，所述举升机构带动所述下腔体沿所述竖直方向从初始位置向上运动至所述接片位置，使所述基板由所述支撑部移交至所述基板托盘并由所述基板托盘承载，接着所述支撑部背向所述支撑部的轴线方向向外水平移动至避让位置，之后所述举升机构继续带动所述下腔体向上运动至工艺位置，使得所述下腔体与所述上腔体闭合形成密闭腔室。
  2. 根据权利要求1所述的干燥装置，其特征在于，所述干燥装置还被配置为：当打开所述密闭腔室时，所述举升机构带动所述下腔体沿所述竖直方向从所述工艺位置向下运动至所述接片位置，然后所述支撑部朝向所述下腔体的轴线方向向内水平移动至所述接片位置，接着所述举升机构继续带动所述下腔体向下运动，使所述基板由所述基板托盘移交至所述支撑部并由所述支撑部承载，所述检测部检测所述基板的工艺参数，当所述下腔体向下运动至所述初始位置后，所述支撑部上的所述基板被取走，最后所述支撑部背向所述下腔体的轴线方向向外移动至所述避让位置。
  3. 根据权利要求1所述的干燥装置，其特征在于，所述基板的工艺参数包括基板的重量，所述检测部包括称重传感器，用于检测所述基板的重量。
  4. 根据权利要求1所述的干燥装置，其特征在于，所述驱动机构包括滑动部和驱动部，所述支撑组件还包括第一水平调节部和安装部，所述第一水平调节部设置在所述驱动部和所述安装部之间，且被配置为：用于调节所述支撑部的水平度，所述支撑部与所述滑动部连接，所述滑动部与所述驱动部连接，所述驱动部用于驱动所述滑动部沿水平方向滑动，所述驱动部安装在所述安装部上，所述安装部固定在所述预定高度位置处。
  5. 根据权利要求4所述的干燥装置，其特征在于，所述检测部设置于所述滑动部，且位于所述第一水平调节部的上方。
  6. 根据权利要求1所述的干燥装置，其特征在于，所述支撑部包括承载件和连接件，所述承载件与所述连接件的第一端连接，用于承载所述基板，所述连接件的第二端固定在所述检测部的上方；其中，
    所述连接件的第一端的端面与所述连接件的第二端的端面之间的垂直距离小于10cm。
  7. 根据权利要求1所述的干燥装置，其特征在于，还包括：
    密封件，设置在所述基板托盘的外围，用于对所述密闭腔室进行密封；
    第一传感器，用于监测所述下腔体和所述上腔体之间的合腔距离。
  8. 根据权利要求7所述的干燥装置，其特征在于，所述第一传感器具有至少三个，至少三个所述第一传感器用于监测所述下腔体的水平度。
  9. 根据权利要求7所述的干燥装置，其特征在于，还包括：
    限位件，设置在所述上腔体和所述下腔体之间。
  10. 根据权利要求1所述的干燥装置，其特征在于，所述举升机构包括驱动装置、举升平台、第二传感器和光栅尺，所述驱动装置用于驱动所述举升平台沿竖直方向运动，所述举升平台用于托举所述下腔体，所述第二传感器用于监测所述举升平台的举升位置，所述光栅尺用于测量所述举升平台的移动距离。
  11. 根据权利要求10所述的干燥装置，其特征在于，所述驱动装置包括丝杠和移动端，所述移动端与所述举升平台连接，并设置于所述丝杠上，所述移动端用于在所述丝杠上作直线运动，所述光栅尺设置在所述移动端上，所述光栅尺通过测量所述移动端的移动距离以测量得出所述举升平台的移动距离。
  12. 根据权利要求1所述的干燥装置，其特征在于，还包括导向机构，所述导向机构包括：
    安装座；
    滚针导柱，设置在所述安装座上，并与所述下腔体连接。
  13. 根据权利要求12所述的干燥装置，其特征在于，所述导向机构还包括：
    第二水平调节部，设置在所述安装座的底部，且被配置为：用于调节所述安装座的水平度。
  14. 一种干燥装置，其特征在于，包括：
    上腔体；
    下腔体，设置在所述上腔体的下方，且设置有基板托盘，所述基板托盘用于放置基板；
    支撑组件，设置在预定高度位置处，支撑组件包括支撑部和驱动机构，所述驱动机构用于驱动所述支撑部沿水平方向移动，所述支撑部用于承接所述基板；
    举升机构，设置在所述下腔体的下方，用于带动所述下腔体沿竖直方向运动；
    所述干燥装置被配置为：当所述支撑部朝向所述下腔体的轴线方向向内水平移动至接片位置并接到所述基板时，所述举升机构带动所述下腔体沿所述竖直方向从初始位置向上运动至所述接片位置，使所述基板由所述支撑部移交至所述基板托盘并由所述基板托盘承载，接着所述支撑部背向所述支撑部的轴线方向向外水平移动至避让位置，之后所述举升机构继续带动所述下腔体向上运动至工艺位置，使得所述下腔体与所述上腔体闭合形成密闭腔室。
  15. 根据权利要求14所述的干燥装置，其特征在于，所述干燥装置还被配置为：当打开所述密闭腔室时，所述举升机构带动所述下腔体沿所述竖直方向从所述工艺位置向下运动至所述接片位置，然后所述支撑部朝向所述下腔体的轴线方向向内水平移动至所述接片位置，接着所述举升机构继续带动所述下腔体向下运动，使所述基板由所述基板托盘移交至所述支撑部并由所述支撑部承载，当所述下腔体向下运动至所述初始位置后，所述支撑部上的所述基板被取走，最后所述支撑部背向所述下腔体的轴线方向向外移动至所述避让位置。
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KR20110080950A (ko) * 2010-01-07 2011-07-13 세메스 주식회사 초임계 유체를 이용한 기판 처리 장치
CN110010512A (zh) * 2018-01-04 2019-07-12 东京毅力科创株式会社 基片处理装置和基片处理方法
KR20210004382A (ko) * 2019-07-04 2021-01-13 세메스 주식회사 기판 건조 장치
KR20210136241A (ko) * 2020-05-07 2021-11-17 안동시(농업기술센터) 건조기용 리프트 장치
JP2023007226A (ja) * 2021-07-01 2023-01-18 東京エレクトロン株式会社 基板処理装置
CN114068364A (zh) * 2021-11-04 2022-02-18 上海至临半导体技术有限公司 一种搭配超临界流体干燥的湿法设备

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