WO2025018344A1 - 光学積層体、光学積層体の製造方法および光情報伝達装置 - Google Patents

光学積層体、光学積層体の製造方法および光情報伝達装置 Download PDF

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WO2025018344A1
WO2025018344A1 PCT/JP2024/025512 JP2024025512W WO2025018344A1 WO 2025018344 A1 WO2025018344 A1 WO 2025018344A1 JP 2024025512 W JP2024025512 W JP 2024025512W WO 2025018344 A1 WO2025018344 A1 WO 2025018344A1
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Prior art keywords
optical
optical laminate
adhesive layer
laminate according
substrate
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English (en)
French (fr)
Japanese (ja)
Inventor
暁史 青野
昭宏 村松
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Mitsui Chemicals Inc
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Mitsui Chemicals Inc
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Priority to CN202480018688.8A priority Critical patent/CN120858299A/zh
Priority to KR1020257027522A priority patent/KR20250133964A/ko
Priority to JP2025534067A priority patent/JPWO2025018344A1/ja
Publication of WO2025018344A1 publication Critical patent/WO2025018344A1/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
    • B32B17/10—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/02—Viewing or reading apparatus

Definitions

  • the present invention relates to an optical laminate, a method for manufacturing an optical laminate, and an optical information transmission device.
  • Patent Document 1 discloses an optical member that includes an organic polymer, has an area of 1 mm2 or more, and includes a surface A having a flatness of 80 ⁇ m or less when the flatness of a region of 1 mm2 is measured with a non-contact optical flatness meter, for the purpose of providing an optical member that is lightweight and capable of transmitting optical information with high accuracy.
  • the present invention provides an optical laminate consisting of an optical substrate and a (thio)urethane-based optical resin layer that can suppress warping.
  • an optical laminate a method for producing an optical laminate, and an optical information transmission device, as shown below.
  • An optical substrate a (thio)urethane-based optical resin layer on at least one surface of the optical substrate; an adhesive layer between the optical substrate and the (thio)urethane-based optical resin layer; Including, The adhesive layer has a glass transition temperature of 70° C. or lower.
  • the optical laminate according to 1. wherein the loss modulus of the adhesive layer is 0.001 GPa or more and 1.5 GPa or less, as measured in a tensile measurement mode at a temperature of 25° C. and a measurement frequency of 1 Hz. 3.
  • the adhesive layer contains one or more resins selected from the group consisting of (meth)acrylic resins and epoxy resins.
  • the (thio)urethane-based optical resin layer has a thickness of 2.0 mm or less.
  • the (thio)urethane-based optical resin layer has a refractive index of 1.47 or more at a temperature of 25° C.
  • An optical information transmission device comprising:
  • the present invention provides an optical laminate of an optical substrate and a (thio)urethane-based optical resin layer that can suppress warping.
  • FIG. 1 is a cross-sectional view illustrating an example of an optical laminate according to an embodiment of the present invention.
  • 1 is a cross-sectional view illustrating an example of an optical information transmission device according to an embodiment of the present invention.
  • optical laminate The optical laminate of this embodiment will be described in detail below.
  • the optical laminate of this embodiment will be described with reference to FIG. 1.
  • the optical laminate 10 of this embodiment includes an optical substrate 1, a (thio)urethane-based optical resin layer 2 on at least one surface of the optical substrate 1, and an adhesive layer 3 between the optical substrate 1 and the (thio)urethane-based optical resin layer 2, and the glass transition temperature of the adhesive layer 3 is 70°C or lower.
  • the optical laminate of this embodiment solves the above problems is not clear, but it is speculated that the above problems are solved by the following mechanism.
  • the optical laminate due to the difference in linear expansion coefficient between the optical substrate and the (thio)urethane-based optical resin layer, the optical laminate is prone to distortion, which in turn is prone to warping.
  • the adhesive layer relieves the stress, thereby suppressing the occurrence of warping.
  • the glass transition temperature of the adhesive layer is preferably 65°C or lower, more preferably 60°C or lower, even more preferably 55°C or lower, even more preferably 50°C or lower, and even more preferably 45°C or lower, from the viewpoint of further suppressing warping of the optical laminate and suppressing peeling of the optical laminate in a high temperature environment and/or a high humidity environment, and is preferably -20°C or higher, more preferably -10°C or higher, even more preferably 0°C or higher, even more preferably 10°C or higher, even more preferably 15°C or higher, and even more preferably 20°C or higher.
  • the glass transition temperature of the adhesive layer is preferably -20°C or higher and 70°C or lower, more preferably -10°C or higher and 65°C or lower, even more preferably 0°C or higher and 60°C or lower, even more preferably 10°C or higher and 55°C or lower, even more preferably 15°C or higher and 50°C or lower, and even more preferably 20°C or higher and 45°C or lower.
  • the glass transition temperature of the adhesive layer can be measured by dynamic mechanical analysis (DMA). Specifically, it can be measured under the following ⁇ Measurement Conditions>.
  • DMA dynamic mechanical analysis
  • Apparatus Dynamic viscoelasticity measuring device Sample shape: Width 10 mm x thickness 0.1 mm x length 20 mm Heating rate: 5° C./min Measurement mode: Tensile
  • the glass transition temperature of the adhesive layer can be adjusted by adjusting the composition of the adhesive layer.
  • the ratio of high molecular weight components to low molecular weight components (e.g., additives and hardeners) in the adhesive layer can be adjusted, or the crosslink density of the adhesive layer can be adjusted.
  • the loss modulus of the adhesive layer measured in tension mode at a temperature of 25°C and a measurement frequency of 1 Hz is preferably 0.001 GPa or more, more preferably 0.01 GPa or more, and even more preferably 0.03 GPa or more, from the viewpoint of further suppressing warping of the optical laminate and suppressing peeling of the optical laminate, and is preferably 1.5 GPa or less, more preferably 1.3 GPa or less, even more preferably 1.1 GPa or less, even more preferably 0.9 GPa or less, even more preferably 0.7 GPa or less, even more preferably 0.5 GPa or less, and even more preferably 0.3 GPa or less, from the viewpoint of further suppressing warping of the optical laminate and suppressing peeling of the optical laminate.
  • the loss modulus of the adhesive layer measured under the conditions of a tensile measurement mode, a temperature of 25°C, and a measurement frequency of 1 Hz is preferably 0.001 GPa or more and 1.5 GPa or less, more preferably 0.01 GPa or more and 1.3 GPa or less, even more preferably 0.03 GPa or more and 1.1 GPa or less, even more preferably 0.03 GPa or more and 0.9 GPa or less, even more preferably 0.03 GPa or more and 0.7 GPa or less, even more preferably 0.03 GPa or more and 0.5 GPa or less, and even more preferably 0.03 GPa or more and 0.3 GPa or less.
  • the loss modulus of the adhesive layer can be measured by dynamic mechanical analysis (DMA). Specifically, it can be measured under the following ⁇ Measurement Conditions>.
  • DMA dynamic mechanical analysis
  • ⁇ Measurement conditions> Apparatus: Dynamic viscoelasticity measuring device Sample shape: Width 10 mm x thickness 0.1 mm x length 20 mm Temperature: 25°C Measurement mode: Tensile
  • the loss modulus of the adhesive layer can be adjusted by adjusting the composition of the adhesive layer. For example, the ratio of high molecular weight components to low molecular weight components in the adhesive layer can be adjusted, or the crosslink density of the adhesive layer can be adjusted.
  • the thickness of the adhesive layer is preferably 0.5 ⁇ m or more, more preferably 1 ⁇ m or more, even more preferably 5 ⁇ m or more, even more preferably 10 ⁇ m or more, and even more preferably 15 ⁇ m or more, from the viewpoint of further suppressing warping of the optical laminate and suppressing peeling of the optical laminate, and is preferably 1000 ⁇ m or less, more preferably 500 ⁇ m or less, even more preferably 200 ⁇ m or less, even more preferably 100 ⁇ m or less, even more preferably 80 ⁇ m or less, and even more preferably 60 ⁇ m or less, from the viewpoint of reducing the overall thickness of the optical laminate.
  • the cure shrinkage percentage obtained by the following formula (1) from the density D0 before curing and the density D1 after curing of the adhesive layer measured in accordance with JIS K-5600-2-4:2014 is, from the viewpoint of further suppressing warping of the optical laminate and from the viewpoint of suppressing peeling of the optical laminate, preferably 10% or less, more preferably 9% or less, and even more preferably 8% or less, and may be, for example, 0.01% or more, 0.1% or more, or 1% or more.
  • Curing shrinkage rate (%) (D 1 - D 0 )/D 0 (1)
  • the cure shrinkage rate of the adhesive layer can be adjusted by adjusting the composition of the adhesive layer.
  • the ratio of high molecular weight components to low molecular weight components in the adhesive layer may be adjusted, or the crosslink density of the adhesive layer may be adjusted.
  • the refractive index of the adhesive layer at a temperature of 25°C and a wavelength of 587.6 nm according to JIS K-0062:1992 is preferably 1.47 or more, more preferably 1.49 or more, even more preferably 1.51 or more, and even more preferably 1.53 or more, from the viewpoint of improving the optical properties of the optical laminate, and may be, for example, 1.90 or less, 1.80 or less, or 1.70 or less.
  • the linear expansion coefficient of the adhesive layer measured under the ⁇ Measurement Conditions> below is preferably 200 ⁇ 10 -6 /°C or less, more preferably 150 ⁇ 10 -6 /°C or less, from the viewpoint of further suppressing warping of the optical laminate and suppressing peeling of the optical laminate, and since a smaller linear expansion coefficient with the optical substrate is better from the viewpoint of further suppressing warping of the optical laminate and suppressing peeling of the optical laminate, the linear expansion coefficient is preferably 2 ⁇ 10 -6 /°C or more, more preferably 4 ⁇ 10 -6 /°C or more, even more preferably 6 ⁇ 10 -6 /°C or more, and even more preferably 8 ⁇ 10 -6 /°C or more.
  • Measurement mode TMA compression mode
  • Test load 50 mN Heating rate: 5° C./min
  • Measurement atmosphere nitrogen (100 ml/min)
  • the adhesive layer preferably contains one or more resins selected from the group consisting of (meth)acrylic resins and epoxy resins, and more preferably contains a (meth)acrylic resin.
  • the adhesive layer may further contain a known adhesive.
  • known adhesives include laminating adhesives composed of organic titanium resins, polyethyleneimine resins, urethane resins, polyester resins, oxazoline group-containing resins, modified silicone resins, alkyl titanates, polyester polybutadienes, etc., or one-component or two-component polyols and polyisocyanates, water-based urethanes, ionomers, etc.
  • aqueous adhesives whose main raw materials are acrylic resins, vinyl acetate resins, urethane resins, polyester resins, etc. may be used.
  • other additives such as curing agents and silane coupling agents may be added to the adhesive depending on the application of the gas barrier laminate.
  • the adhesive layer is preferably made of a cured product of an adhesive resin composition, and the adhesive resin composition is a photocurable resin composition or a thermosetting resin composition, and more preferably made of a cured product of an adhesive resin composition, and the adhesive resin composition is a photocurable resin composition.
  • the viscosity of the adhesive resin composition measured at 25°C using a cone-plate viscometer (Brookfield, model name: DV2T) and a CPA-40G cone spindle (angle: 0.8°, radius: 24 mm, sample amount: 0.5 mL, shear rate: 7.5 N/s) is preferably 50 mPa ⁇ s or more, more preferably 100 mPa ⁇ s or more, even more preferably 200 mPa ⁇ s or more, even more preferably 300 mPa ⁇ s or more, even more preferably 400 mPa ⁇ s or more, and preferably 5000 mPa ⁇ s or less, more preferably 2000 mPa ⁇ s or less, even more preferably 1000 mPa ⁇ s or less, even more preferably 800 mPa ⁇ s or less.
  • the (thio)urethane-based optical resin layer contains a (thio)urethane-based resin.
  • the (thio)urethane-based resin can be obtained from an iso(thio)cyanate compound and an active hydrogen compound having two or more functionalities.
  • the active hydrogen compound having two or more functionalities include a polyol compound and a polythiol compound.
  • iso(thio)cyanate compounds include hexamethylene diisocyanate, pentamethylene diisocyanate, xylylene diisocyanate, isophorone diisocyanate, bis(isocyanatomethyl)cyclohexane, bis(isocyanatocyclohexyl)methane, 2,5-bis(isocyanatomethyl)bicyclo-[2.2.1]-heptane, 2,6-bis(isocyanatomethyl)bicyclo-[2.2.1]-heptane, tolylene diisocyanate, phenylene diisocyanate, and 4,4'-diphenylmethane diisocyanate.
  • polythiol compounds include pentaerythritol tetrakis(2-mercaptoacetate), pentaerythritol tetrakis(3-mercaptopropionate), bis(2-mercaptoethyl)sulfide, 4-mercaptomethyl-1,8-dimercapto-3,6-dithiaoctane, 5,7-dimercaptomethyl-1,11-dimercapto-3,6,9-trithiaundecane, 4,7-dimercaptomethyl-1,11-dimercapto-3,6 ,9-trithiaundecane, 4,8-dimercaptomethyl-1,11-dimercapto-3,6,9-trithiaundecane, 2,5-dimercaptomethyl-1,4-dithiane, 1,1,3,3-tetrakis(mercaptomethylthio)propane, 4,6-bis(mercaptomethylthio)-1,3-dithiane
  • polyol compounds include ethylene glycol, diethylene glycol, triethylene glycol, propylene glycol, dipropylene glycol, tripropylene glycol, 1,3-propanediol, 2,2-dimethyl-1,3-propanediol, 2,2-diethyl-1,3-propanediol, 1,2-butanediol, 1,3-butanediol, 1,4-butanediol, 3-methyl-1,3-butanediol, 1,2-pentanediol, 1,3-pentanediol, 1,5-pentanediol, 2,4-pentanediol, 2-methyl-2,4-pentanediol, 3-methyl -1,5-pentanediol, 1,6-hexanediol, 2,5-hexanediol, glycerol, diglycerol, polyglycerol, trimethylo
  • the thickness of the (thio)urethane-based optical resin layer is preferably 2.0 mm or less, more preferably 1.5 mm or less, even more preferably 1.0 mm or less, even more preferably 0.8 mm or less, even more preferably 0.6 mm or less, even more preferably 0.4 mm or less.
  • the refractive index of the (thio)urethane-based optical resin layer at a temperature of 25°C and a wavelength of 587.6 nm according to JIS K-0062:1992 is preferably 1.47 or more, more preferably 1.49 or more, even more preferably 1.51 or more, and even more preferably 1.53 or more, from the viewpoint of improving the optical properties of the optical laminate, and may be, for example, 1.90 or less, 1.80 or less, or 1.70 or less.
  • the linear expansion coefficient of the (thio)urethane-based optical resin layer measured under the ⁇ Measurement Conditions> below is preferably 100 ⁇ 10 -6 /°C or less, more preferably 80 ⁇ 10 -6 /°C or less, from the viewpoint of further suppressing warping of the optical laminate and suppressing peeling of the optical laminate, and since a smaller difference in linear expansion coefficient from the optical substrate is better from the viewpoint of further suppressing warping of the optical laminate and suppressing peeling of the optical laminate, the linear expansion coefficient is preferably 2 ⁇ 10 -6 /°C or more, more preferably 4 ⁇ 10 -6 /°C or more, even more preferably 6 ⁇ 10 -6 /°C or more, and even more preferably 8 ⁇ 10 -6 /°C or more.
  • Measurement mode TMA compression mode
  • Test load 50 mN Heating rate: 5° C./min
  • Test temperature range 23 to 200°C
  • Measurement atmosphere nitrogen (100 ml/min)
  • optical substrate of the optical laminate of this embodiment will be described below.
  • the optical substrate preferably includes one or more selected from the group consisting of a glass substrate and an optical crystal substrate.
  • the optical crystal substrate includes a SiC substrate, a LiNb2O3 substrate (LN substrate), an Al2O3 substrate , a sapphire substrate, a quartz substrate, and the like.
  • the refractive index of the optical substrate at a temperature of 25°C and a wavelength of 587.6 nm according to JIS K-0062:1992 is preferably 1.47 or more, more preferably 1.49 or more, even more preferably 1.51 or more, and even more preferably 1.53 or more, from the viewpoint of improving the optical properties of the optical laminate, and may be, for example, 1.90 or less, 1.80 or less, or 1.70 or less.
  • the linear expansion coefficient of the optical substrate measured under the ⁇ Measurement Conditions> described below is preferably 0.1 ⁇ 10 -6 /°C or more, more preferably 0.5 ⁇ 10 -6 /°C or more, even more preferably 2 ⁇ 10 -6 /°C or more, still more preferably 4 ⁇ 10 -6 /°C or more, and may be, for example, 40 ⁇ 10 -6 / ° C or less, or 20 ⁇ 10 -6 /°C or less, since the difference in linear expansion coefficient between the adhesive layer and the (thio)urethane-based optical resin layer is preferably small, from the viewpoint of further suppressing warping of the optical laminate and suppressing peeling of the optical laminate.
  • Measurement mode TMA compression mode
  • Test load 50 mN Heating rate: 5° C./min
  • Measurement atmosphere nitrogen (100 ml/min)
  • the optical laminate of the present embodiment may include components other than the adhesive layer, the (thio)urethane-based optical resin layer, and the optical substrate.
  • the optical laminate of the present embodiment further includes a transparent inorganic layer between the optical substrate and the adhesive layer.
  • the means for forming the transparent inorganic layer is not particularly limited, but for example, the transparent inorganic layer can be formed by sputtering the surface of the optical substrate. Specifically, the optical substrate is first placed in a vacuum chamber, and a gas such as argon gas is introduced, and then a negative voltage is applied to the surface of the optical substrate to generate a glow discharge and ionize the gas atoms.
  • the ionized gas atoms collide with the surface of the optical substrate, and the particles (atoms and molecules) on the surface of the optical substrate are ejected and adhere to and accumulate on the surface of the optical substrate, forming a transparent inorganic layer.
  • the thickness of the transparent inorganic layer is not particularly limited, but from the viewpoint of further suppressing warping of the optical laminate and suppressing peeling of the optical laminate, it is preferably 5 nm or more, more preferably 10 nm or more, even more preferably 20 nm or more, even more preferably 50 nm or more, and is, for example, 100 nm or less.
  • the optical laminate of this embodiment preferably further includes a coupling agent layer between the optical substrate and the adhesive layer in order to prevent peeling of the optical laminate.
  • the coupling agent contained in the coupling agent layer is not particularly limited, but examples thereof include silane coupling agents.
  • silane coupling agents include vinyl group-containing silane coupling agents such as vinyltrimethoxysilane and vinyltriethoxysilane, epoxy group-containing silane coupling agents such as 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane and 3-glycidoxypropyltriethoxysilane, and (meth)acrylic group-containing silane coupling agents such as 3-methacryloxypropylmethyldimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-methacryloxypropylmethyldiethoxysilane, 3-methacryloxypropyltriethoxysilane and 3-acryloxypropyl
  • the thickness of the coupling agent layer is not particularly limited, but from the viewpoint of further suppressing warping of the optical laminate and suppressing peeling of the optical laminate, it is preferably 1 nm or more, more preferably 2 nm or more, even more preferably 5 nm or more, even more preferably 10 nm or more, and may be, for example, 50 nm or less.
  • the optical laminate of this embodiment may also include layer configurations such as an antistatic layer that prevents the optical laminate from becoming statically charged, a hard coat layer that prevents the optical laminate from being scratched, a moisture barrier layer that blocks the intrusion of moisture into the optical laminate, and an anti-reflection film that reduces the surface reflection of the optical laminate.
  • layer configurations such as an antistatic layer that prevents the optical laminate from becoming statically charged, a hard coat layer that prevents the optical laminate from being scratched, a moisture barrier layer that blocks the intrusion of moisture into the optical laminate, and an anti-reflection film that reduces the surface reflection of the optical laminate.
  • the warpage F A of the surface A on the (thio)urethane-based optical resin layer side in the optical laminate of this embodiment is preferably 350 ⁇ m or less, more preferably 300 ⁇ m or less, even more preferably 250 ⁇ m or less, even more preferably 200 ⁇ m or less, even more preferably 150 ⁇ m or less, even more preferably 100 ⁇ m or less, even more preferably 50 ⁇ m or less, and may be, for example, 0.01 ⁇ m or more.
  • the amount of warpage F A can be measured by an ultra-high precision three-dimensional measuring machine. Specifically, it can be measured under the following conditions.
  • the (thio)urethane-based optical resin layer preferably does not peel off from the optical substrate.
  • the refractive index of the optical laminate at a temperature of 25°C and a wavelength of 587.6 nm according to JIS K-0062:1992 is preferably 1.47 or more, more preferably 1.49 or more, even more preferably 1.51 or more, and even more preferably 1.53 or more, from the viewpoint of improving the optical properties of the optical laminate, and may be, for example, 1.90 or less, 1.80 or less, or 1.70 or less.
  • the optical laminate of this embodiment can be used in any application, but is not limited to this application. More specifically, it can be used in a wearable device, such as a wearable display that displays virtual reality (VR), augmented reality (AR), etc.
  • a wearable device such as a wearable display that displays virtual reality (VR), augmented reality (AR), etc.
  • VR virtual reality
  • AR augmented reality
  • the method for producing the optical laminate of this embodiment includes a step (A) of preparing a laminate including an optical substrate, a (thio)urethane-based optical resin layer on at least one surface of the optical substrate, and an uncured or semi-cured adhesive layer between the optical substrate and the (thio)urethane-based optical resin layer, and a step (B) of curing the uncured or semi-cured adhesive layer to obtain the optical laminate.
  • the method for producing an optical laminate of this embodiment may further include a step (C) of placing the laminate in a reduced pressure environment prior to the step (B). This can prevent misalignment of the components during lamination. This can also prevent air bubbles from being generated between the layers.
  • the method for producing the optical laminate of this embodiment may further include a step of sputtering the surface of the optical substrate. By sputtering the surface of the optical substrate, a transparent inorganic layer can be formed on the surface of the optical substrate.
  • the method for producing an optical laminate of this embodiment may further include a step of subjecting the surface of the optical substrate to surface treatment plasma ashing. By subjecting the surface of the optical substrate to plasma ashing, the surface of the optical substrate can be activated.
  • the method for producing the optical laminate of this embodiment may further include a step of applying a coupling agent to the surface of the optical substrate.
  • a coupling agent layer can be formed on the surface of the optical substrate.
  • the manufacturing method of the optical laminate of this embodiment from the viewpoint of further suppressing warping of the optical laminate and suppressing peeling of the optical laminate, it is preferable to apply a coupling agent to the sputtered surface of the optical substrate.
  • optical information transmission device The optical information transmission device of this embodiment will be described below.
  • the optical information transmission device of this embodiment will be described with reference to FIG. 2.
  • the optical information transmission device 20 of this embodiment includes a light irradiation unit 11 and the optical laminate 10 described above.
  • the light 12 generated from the light emitting unit 11 is reflected by the optical laminate 10, and the reflected light is irradiated to the user's eye 13. As a result, the light generated from the light emitting unit 11 is recognized by the user wearing the optical information transmission device 10.
  • ⁇ Optical laminate> The following materials were prepared: Glass substrate (1) (manufactured by Corning Incorporated, diameter 80 mm, thickness 0.5 mm, refractive index 1.51, linear expansion coefficient 31.7 ⁇ 10 ⁇ 7 /° C.) Thiourethane-based optical resin sheet (1) (manufactured by Mitsui Chemicals, Inc., product name SK-600, diameter 78 mm, thickness 0.35 mm, refractive index 1.67, linear expansion coefficient 6.5 ⁇ 10 ⁇ 5 /° C.) Adhesive resin composition (A) (acrylic, UV-curable) Adhesive resin composition (B) (acrylic, UV-curable) Adhesive resin composition (C) (acrylic, UV-curable) Adhesive resin composition (D) (acrylic, ultraviolet curable) Adhesive resin composition (E) (epoxy-based, thermosetting type) Adhesive resin composition (F) (epoxy-based, thermosetting type)
  • Example 1 to 4 The glass substrate (1) was sputtered to form a transparent inorganic layer on the surface of the glass substrate (1).
  • Metallic Si was used as the sputtering target.
  • Ar and O2 were used as the carrier gas.
  • the sputtering power was 5.5 kW.
  • the method for forming the transparent inorganic layer is not particularly limited, and it may be formed by ion-assisted deposition.
  • a silane coupling agent manufactured by Shin-Etsu Chemical Co., Ltd., product name KBM-5103 was applied to the transparent inorganic layer of the glass substrate (1) to form a silane coupling agent layer having a thickness of 7 nm.
  • the adhesive resin composition shown in Table 1 was applied onto the silane coupling agent layer of the glass substrate (1) so that the thickness after curing would be 50 ⁇ m.
  • a thiourethane-based optical resin sheet (1) was laminated on the surface on which the adhesive resin composition was applied, and ultraviolet light having a wavelength of 405 nm was irradiated at an irradiation intensity of 600 mW/ cm2 for 50 seconds to cure the adhesive resin composition, thereby obtaining optical laminates.
  • Example 5 An optical laminate was obtained in the same manner as in Example 1, except that the thickness of the adhesive layer was 20 ⁇ m.
  • Example 6 An optical laminate was obtained in the same manner as in Example 3, except that the thickness of the adhesive layer was 20 ⁇ m.
  • a thiourethane-based optical resin sheet (1) was laminated on the surface on which the adhesive resin composition was applied, and the sheet was irradiated with ultraviolet light having a wavelength of 405 nm at an irradiation intensity of 600 mW/ cm2 for 50 seconds, and further heated at 80°C for 30 minutes to cure the adhesive resin composition, thereby obtaining optical laminates.
  • ⁇ Viscosity of adhesive resin composition The viscosity of the adhesive resin composition was measured at 25° C. using a cone-plate viscometer (manufactured by Brookfield, model name: DV2T) and a CPA-40G cone spindle (angle: 0.8°, radius: 24 mm, sample amount: 0.5 mL, shear rate: 7.5 N/s). The results are shown in Table 1.
  • the adhesive resin compositions were then cured by irradiating them with ultraviolet light having a wavelength of 405 nm at an irradiation intensity of 600 mW/cm2 for 50 seconds and then heating them at 80°C for 30 minutes.
  • the cured adhesive resin compositions were then peeled off from the PET sheet and cut to a width of 10 mm and a length of 20 mm to obtain adhesive layer evaluation samples.
  • Loss modulus of adhesive layer The loss modulus of elasticity was measured under the following conditions using the adhesive layer evaluation samples obtained by the above method. The results are shown in Table 1. Apparatus: DMA7100 (Hitachi High-Tech Science) Sample shape: width 10 mm x thickness 0.1 mm x length 20 mm Measurement temperature: 25°C Measurement frequency: 1Hz Measurement mode: Tensile
  • Warping was suppressed in the optical laminate of the example. This shows that warping can be suppressed by the optical laminate of this embodiment.
  • Increasing the thickness of the adhesive layer reduced the amount of warping. This shows that increasing the thickness of the adhesive layer can further suppress warping.

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  • Optics & Photonics (AREA)
  • Laminated Bodies (AREA)
  • Adhesives Or Adhesive Processes (AREA)
PCT/JP2024/025512 2023-07-20 2024-07-16 光学積層体、光学積層体の製造方法および光情報伝達装置 Pending WO2025018344A1 (ja)

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KR1020257027522A KR20250133964A (ko) 2023-07-20 2024-07-16 광학 적층체, 광학 적층체의 제조 방법 및 광 정보 전달 장치
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6389343A (ja) * 1986-10-02 1988-04-20 ミノルタ株式会社 複合型光学部材及びその製造方法
JPH07110403A (ja) * 1993-08-20 1995-04-25 Olympus Optical Co Ltd 複合型光学部品
JP2003277697A (ja) * 2002-03-22 2003-10-02 Bridgestone Corp 光硬化性接着シート及びこれを用いた光情報記録媒体の製造方法
JP2014213488A (ja) * 2013-04-24 2014-11-17 住友化学株式会社 光学積層体及びそれを用いた表示装置
JP2017024386A (ja) * 2015-07-17 2017-02-02 三菱樹脂株式会社 ガラス積層体、及び表示装置用保護材
WO2020170801A1 (ja) * 2019-02-18 2020-08-27 三井化学株式会社 光学部材、光学部材の製造方法及び光情報伝達装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6389343A (ja) * 1986-10-02 1988-04-20 ミノルタ株式会社 複合型光学部材及びその製造方法
JPH07110403A (ja) * 1993-08-20 1995-04-25 Olympus Optical Co Ltd 複合型光学部品
JP2003277697A (ja) * 2002-03-22 2003-10-02 Bridgestone Corp 光硬化性接着シート及びこれを用いた光情報記録媒体の製造方法
JP2014213488A (ja) * 2013-04-24 2014-11-17 住友化学株式会社 光学積層体及びそれを用いた表示装置
JP2017024386A (ja) * 2015-07-17 2017-02-02 三菱樹脂株式会社 ガラス積層体、及び表示装置用保護材
WO2020170801A1 (ja) * 2019-02-18 2020-08-27 三井化学株式会社 光学部材、光学部材の製造方法及び光情報伝達装置

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