WO2024255889A1 - 显示面板及其制备方法，和显示装置 - Google Patents

显示面板及其制备方法，和显示装置 Download PDF

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Publication number
WO2024255889A1
WO2024255889A1 PCT/CN2024/099419 CN2024099419W WO2024255889A1 WO 2024255889 A1 WO2024255889 A1 WO 2024255889A1 CN 2024099419 W CN2024099419 W CN 2024099419W WO 2024255889 A1 WO2024255889 A1 WO 2024255889A1
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WIPO (PCT)
Prior art keywords
light
layer
transmitting
isolation
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2024/099419
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English (en)
French (fr)
Inventor
姚远
许传志
张治超
董正逵
赵莹子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kunshan Govisionox Optoelectronics Co Ltd
Hefei Visionox Technology Co Ltd
Original Assignee
Kunshan Govisionox Optoelectronics Co Ltd
Hefei Visionox Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CN202310730898.7A external-priority patent/CN119156044A/zh
Priority claimed from CN202310721853.3A external-priority patent/CN119156087A/zh
Priority claimed from CN202310775927.1A external-priority patent/CN118678741A/zh
Priority claimed from CN202311029013.7A external-priority patent/CN119497525A/zh
Priority to CN202480001637.4A priority Critical patent/CN121336519A/zh
Application filed by Kunshan Govisionox Optoelectronics Co Ltd, Hefei Visionox Technology Co Ltd filed Critical Kunshan Govisionox Optoelectronics Co Ltd
Priority to DE112024000043.6T priority patent/DE112024000043T5/de
Priority to KR1020257040661A priority patent/KR20260006004A/ko
Priority to US18/938,314 priority patent/US20250063899A1/en
Publication of WO2024255889A1 publication Critical patent/WO2024255889A1/zh
Priority to US19/326,748 priority patent/US20260013338A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/1201—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/40—OLEDs integrated with touch screens
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/60—OLEDs integrated with inorganic light-sensitive elements, e.g. with inorganic solar cells or inorganic photodiodes
    • H10K59/65—OLEDs integrated with inorganic image sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/87—Passivation; Containers; Encapsulations
    • H10K59/873—Encapsulations

Definitions

  • the present disclosure relates to the field of display technology, and in particular, to a display panel and a manufacturing method thereof, and a display device.
  • OLED Organic Light-Emitting Diode
  • a first aspect of the present disclosure provides a display panel, which includes: a substrate; an isolation structure layer located on the substrate, wherein the isolation structure layer includes a light-transmitting portion and a plurality of isolation openings; a display function layer including a light-emitting device located in the isolation opening; and a touch structure located on a side of the isolation structure layer away from the substrate.
  • a display panel which includes: a substrate; an isolation structure layer located on the substrate, the isolation structure layer including an isolation structure and a plurality of isolation openings, a light-transmitting portion being provided on the isolation structure, the isolation structure including a first isolation layer and a second isolation layer which are stacked, the first isolation layer being located between the substrate and the second isolation layer, the first isolation layer including a first end close to the second isolation layer and a second end away from the second isolation layer, the orthographic projection of the first end on the substrate being within the orthographic projection of the second end on the substrate; and a display function layer including a light-emitting device located in the isolation opening.
  • a third aspect of the present disclosure provides a display panel, which includes a first area, and the display panel includes a substrate; a display function layer, which is located on the substrate and at least partially located in the first area, and the display function layer includes a plurality of light-emitting devices, and the light-emitting devices have light-emitting units; and an isolation structure layer, which is located on the substrate and encloses a plurality of isolation openings, wherein at least one light-emitting device is arranged in each isolation opening, the isolation structure layer isolates adjacent light-emitting units, and the portion of the isolation structure layer located in the first area is provided with at least one first light-transmitting opening to allow the area of the display panel where the first light-transmitting openings are distributed to transmit light.
  • the application of the isolation structure layer can make it possible that the mask plate is not required during the preparation process of the light-emitting device, so there is no need to consider the alignment accuracy of the preparation process, which is beneficial to reducing the gap size of the light-emitting device to improve the pixel PPI of the display panel; in addition, in the first area, by setting a first light-transmitting opening in the isolation structure layer, the area of the display panel where the first light-transmitting opening is set can be transparent, so that the first area of the display panel can realize under-screen recognition functions such as fingerprint recognition, under-screen camera, etc.
  • a fourth aspect of the present disclosure provides a display device, comprising an identification device and a display panel according to any one of the embodiments of the first aspect, wherein an orthographic projection of the identification device on a substrate at least partially overlaps with an orthographic projection of a light-transmitting portion on the substrate;
  • the identification device comprises a fingerprint identification sensor and/or a camera, and the fingerprint identification sensor is located inside the substrate;
  • the identification device comprises a camera, and the camera is located on a side of the substrate facing away from the display function layer and/or is located inside the substrate.
  • a fifth aspect of the present disclosure provides a method for preparing a display panel, comprising: preparing a substrate; preparing an isolation structure on the substrate, the isolation structure defining an isolation opening; preparing a display function layer on the substrate, the display function layer comprising a light-emitting device located in the isolation opening; and preparing a first light-transmitting opening on the isolation structure.
  • FIG. 1 is a schematic diagram of a planar structure of a display panel provided in accordance with an embodiment of the present disclosure.
  • FIG. 2 is an enlarged view of the S1 region of the display panel shown in FIG. 1 .
  • FIG. 3 is a schematic diagram showing a planar structure of an isolation structure layer in the display panel shown in FIG. 2 .
  • FIG. 4 is a cross-sectional view of the display panel shown in FIG. 2 along line M1 - N1 .
  • FIG. 5 is a cross-sectional view of the display panel shown in FIG. 2 along M2 - N2 .
  • FIG. 6 is an enlarged view of a portion of the first area of another display panel provided by an embodiment of the present disclosure.
  • FIG. 7 is a schematic diagram showing a planar structure of an isolation structure layer in the display panel shown in FIG. 6 .
  • FIG. 8 is an enlarged view of a partial area of the first region of another display panel provided by an embodiment of the present disclosure.
  • FIG. 9 is a schematic diagram showing a planar structure of an isolation structure layer in the display panel shown in FIG. 8 .
  • FIG. 10 is an enlarged view of a partial area of the first region of another display panel provided by an embodiment of the present disclosure.
  • FIG. 11 is a schematic diagram of a planar structure of an isolation structure layer in the display panel shown in FIG. 10 .
  • FIG. 12 is an enlarged view of a partial area of the first zone of another display panel provided by an embodiment of the present disclosure.
  • FIG. 13 is a schematic diagram showing a planar structure of an isolation structure layer in the display panel shown in FIG. 12 .
  • FIG. 14 is an enlarged view of a partial area of the first zone of another display panel provided by an embodiment of the present disclosure.
  • FIG. 15 is an enlarged view of a partial area of the first zone of another display panel provided by an embodiment of the present disclosure.
  • FIG. 16 is a cross-sectional view of a partial area of another display panel provided by an embodiment of the present disclosure.
  • FIG. 17 is an enlarged view of a partial area of the first zone of another display panel provided by an embodiment of the present disclosure.
  • FIG. 18 is a schematic diagram showing a planar structure of a display panel provided in another embodiment of the present disclosure.
  • FIG. 19 is a schematic diagram of a planar structure of a display panel provided in another embodiment of the present disclosure.
  • FIG. 20 is a schematic diagram of a planar structure of a display panel provided in yet another embodiment of the present disclosure.
  • FIG. 21 is a schematic diagram of a planar structure of a display panel provided in yet another embodiment of the present disclosure.
  • FIG. 22 is a schematic diagram of a planar structure of a display panel provided in yet another embodiment of the present disclosure.
  • FIG. 23 is a schematic diagram of a planar structure of a display panel provided in yet another embodiment of the present disclosure.
  • FIG. 24 is a cross-sectional view of a partial area of a display panel provided in another embodiment of the present disclosure.
  • FIG. 25 is a cross-sectional view of a partial area of a display panel provided in yet another embodiment of the present disclosure.
  • FIG26 is a schematic diagram showing a planar structure of a display panel provided in yet another embodiment of the present disclosure.
  • FIG. 27 is a cross-sectional view of a partial area of a display panel provided in yet another embodiment of the present disclosure.
  • FIG. 28 is a cross-sectional view of a partial area of a display panel provided in yet another embodiment of the present disclosure.
  • FIG. 29 is a cross-sectional view of a partial area of a display panel provided in yet another embodiment of the present disclosure.
  • FIG30 is a cross-sectional view of a partial area of a display panel provided in yet another embodiment of the present disclosure.
  • FIG31 is a cross-sectional view of a partial area of a display panel provided in yet another embodiment of the present disclosure.
  • FIG32 is a cross-sectional view of a partial area of a display panel provided in yet another embodiment of the present disclosure.
  • FIG33 is a cross-sectional view of a partial area of a display panel provided in yet another embodiment of the present disclosure.
  • FIG34 is a cross-sectional view of a partial area of a display panel provided in yet another embodiment of the present disclosure.
  • FIG35 is a cross-sectional view of the display panel shown in FIG23 along M1-N1.
  • FIG. 36 is a schematic diagram showing a planar structure of a touch electrode block having a grid pattern in the touch electrode layer in the display panel shown in FIG. 23 .
  • FIG37 is a schematic diagram showing a planar structure of a touch electrode layer in a display panel provided in yet another embodiment of the present disclosure, wherein the S3 region in FIG37 corresponds to the S1 region in FIG1 .
  • FIG38 is a cross-sectional view of the touch electrode layer shown in FIG37 along M2 - N2 .
  • FIG39 is a schematic diagram showing a planar structure of a touch electrode layer in another display panel provided in yet another embodiment of the present disclosure, wherein the S3 region in FIG35 corresponds to the S1 region in FIG1 .
  • FIG. 40 is a cross-sectional view of the touch electrode layer shown in FIG. 39 along M3 - N3 .
  • FIG. 41 is an enlarged view of the S1 region of the display panel shown in FIG. 1 under another design.
  • FIG. 42 is a schematic diagram showing a planar structure of a touch electrode block having a grid pattern in the touch electrode layer in the display panel shown in FIG. 41 .
  • FIG. 43 is a cross-sectional view of a partial area of a display panel provided in yet another embodiment of the present disclosure.
  • FIG. 44 is a flow chart of a method for manufacturing the display panel shown in FIG. 43 .
  • FIG. 45 is a cross-sectional view of a display device provided according to an embodiment of the present disclosure.
  • FIG. 46 is a process diagram of a method for preparing a display panel provided in an embodiment of the present disclosure as shown in FIG. 49
  • 50 to 53 are process diagrams showing a method for preparing a display panel provided in yet another embodiment of the present disclosure.
  • FIG54 is a cross-sectional view of a partial area of a display panel provided in yet another embodiment of the present disclosure.
  • some functional film layers in light-emitting devices are formed by evaporation.
  • a mask plate such as a fine mask plate
  • multiple alignments are required.
  • sufficient space needs to be reserved between different light-emitting devices, which limits the arrangement density of light-emitting devices (which can be called sub-pixels), making it difficult to further improve the pixel density (PPI, Pixels Per Inch) of the display panel.
  • PPI Pixels Per Inch
  • an isolation structure layer is provided at the gap between the light-emitting devices to separate the functional film layers of adjacent light-emitting devices.
  • the setting of the isolation structure layer will block the gaps of the light-emitting device and prevent light from passing through, making it difficult to apply to scenarios such as under-screen fingerprint recognition and under-screen photography.
  • the embodiments of the present disclosure provide a display panel and a display device to at least solve the above technical problems.
  • the display panel comprises: a substrate; an isolation structure layer located on the substrate, wherein the isolation structure layer comprises a light-transmitting portion and a plurality of isolation openings; a display function layer comprising a light-emitting device located in the isolation openings; and a touch control structure located on a side of the isolation structure layer away from the substrate.
  • the application of the isolation structure layer can make it possible to eliminate the need for a mask plate during the preparation process of the light-emitting device, so there is no need to consider the alignment accuracy of the preparation process, which is beneficial to reducing the gap size of the light-emitting device to increase the pixel PPI of the display panel; in addition, by providing a light-transmitting portion in the isolation structure layer, the area of the display panel where the light-transmitting portion is provided can be transparent, so that the display panel can realize under-screen recognition functions such as fingerprint recognition, under-screen camera, etc.
  • a spatial rectangular coordinate system is established with the substrate in the display panel as a reference to intuitively present the positional relationship of each component in the display panel.
  • the X-axis and the Y-axis are parallel to the surface where the substrate is located, and the Z-axis is perpendicular to the surface where the substrate is located.
  • the plane area of the display panel 10 can be divided into a first area 13, a second area 11, and a frame area 12 surrounding the second area 11.
  • Sub-pixels the entity is a light-emitting device 200
  • R, G, and B can be arranged in the first area 13 and the second area 11.
  • the second area 11 surrounds at least part of the first area 13, and the first area 13 is configured to have a certain light transmittance for
  • part of the wiring in the border area 12 can be arranged in the second area 11, so that the border area 12 can be designed as a single-sided border.
  • the first area 13 is set to be light-transmissive for under-screen identification, that is, the transmittance of the second area 11 is less than that of the first area 13 , or the second area 11 is set to be opaque.
  • the first area can be designed as the entire display area of the display panel, that is, the above-mentioned second area 11 does not exist.
  • the display panel can be applied to full-screen recognition, such as full-screen fingerprint recognition, or a part of it can be used for under-screen camera, and the other parts can be applied to under-screen fingerprint recognition, etc.
  • the first area 13 of the display panel 10 can be set to be located in any area of the display panel.
  • the first area 13 can be set to be located in the middle of the display panel, or can be set to be located in the frame area 12 of the display panel, and the frame area 12 includes the edge or corner area of the display panel.
  • the transmittance of the first area 13 of the display panel under the test light is greater than 0.6%.
  • the transmittance of the first area 13 of the display panel in the visible light wavelength range is greater than 0.6%, so that the display panel can realize functions such as photosensitivity.
  • the transmittance of the first area 13 of the display panel under a light wave of 550nm is greater than 0.6%, so that the display panel can realize functions such as photosensitivity.
  • the light transmittance of the first area 13 of the display panel in the visible light wavelength range is greater than 0.9%; alternatively, the transmittance of the first area 13 of the display panel under a light wave of 550nm is greater than 0.9%.
  • the display panel further includes a light sensing element disposed on the substrate. Further, the orthographic projection of the light sensing element on the substrate at least partially overlaps with the orthographic projection of the first area 13 on the substrate. It should be noted that partial overlap does not include complete overlap.
  • the transmittance of the first area 13 reaching above 0.6% means that the test light passes through the first area 13 of the display panel, and the detected transmittance is above 0.6%.
  • the factors affecting the transmittance include all film layer structures of the display panel.
  • the physical structure of the display panel 10 may include a substrate 100, a display function layer 24 and an isolation structure layer located on the substrate 100, wherein the isolation structure layer includes an isolation structure 300.
  • the display function layer 24 includes a plurality of light emitting devices 200, and the light emitting devices 200 have light emitting units 220.
  • the isolation structure 300 encloses a plurality of isolation openings 301, and at least one light emitting device 200 is disposed in each isolation opening 301.
  • the display function layer 24 is located in the first area 13 and the second area 11.
  • the isolation structure 300 isolates the adjacent light-emitting units 220, and the portion of the isolation structure 300 located in the first area is provided with at least one first light-transmitting opening 302 so that the area of the display panel where the first light-transmitting opening 302 is distributed is light-transmitting for under-screen recognition.
  • the light-emitting device 200 can be classified into light-emitting devices that emit light of different colors. For example, as shown in Figures 2 to 5, the light-emitting device 200 is at least classified into a first light-emitting device R (emitting red light R), a second light-emitting device G (emitting red light G) and a third light-emitting device B (emitting red light B), and the wavelengths of the emitted light of the first light-emitting device R, the second light-emitting device G and the third light-emitting device B decrease successively.
  • a first light-emitting device R emitting red light R
  • a second light-emitting device G emitting red light G
  • a third light-emitting device B emitting red light B
  • the first light-transmitting opening 302 can be set to be multiple, so as to be dispersedly arranged in the gaps of the light-emitting device according to the shape and distribution of the light-emitting device, or the first light-transmitting opening 302 can also be set to be one, so as to have a larger size, thereby increasing the transmittance of the first zone.
  • a plurality of first light-transmitting openings 302 are provided, and in the first area 13, the first light-emitting device R is provided adjacent to the first light-transmitting opening 302.
  • the wavelength of the emitted light of the first light-emitting device R (R) is the largest, so the first light-emitting device R generally has a higher light-emitting efficiency.
  • the adverse effects (area reduction) of the design of the first light-transmitting openings 302 on the second light-emitting device G and/or the third light-emitting device B are reduced or avoided, so that the display device can maintain a good display effect.
  • the area of the orthographic projection of the first light-transmitting opening 302 on the substrate 100 occupies the first area 11 on the substrate 100 is not less than 1%. Further, the ratio of the area of the orthogonal projection of the first light-transmitting opening 302 on the substrate 100 to the area of the orthogonal projection of the first area 11 on the substrate 100 is not less than 6%. Preferably, the ratio of the area of the orthogonal projection of the first light-transmitting opening 302 on the substrate 100 to the area of the orthogonal projection of the first area 11 on the substrate 100 is not less than 10%.
  • the ratio of the area of the orthogonal projection of the first light-transmitting opening 302 on the substrate 100 to the area of the orthogonal projection of the first area 11 on the substrate 100 is not less than 30%. Further preferably, the ratio of the area of the orthogonal projection of the first light-transmitting opening 302 on the substrate 100 to the area of the orthogonal projection of the first area 11 on the substrate 100 is not less than 50%.
  • the ratio of the area of the orthographic projection of the first light-transmitting opening 302 on the substrate 100 to the area of the orthographic projection of the isolation structure 300 on the substrate 100 is 1.50%-9.50%, such as 1.5%, 2%, 3%, 4%, 5% or 5.5%.
  • the ratio of the area of the orthographic projection of the first light-transmitting opening 302 on the substrate 100 to the area of the orthographic projection of the first zone 11 on the substrate 100 is in the range of 6%-10%, such as 6.5%, 7%, 8% or 9%; further preferably, the ratio of the area of the orthographic projection of the first light-transmitting opening 302 on the substrate 100 to the area of the orthographic projection of the first zone 11 on the substrate 100 is in the range of 10%-30%, such as 11%, 12%, 13%, 18%, 20%, 21%, 23%, 25%, 28% or 29%; further preferably, the ratio of the area of the orthographic projection of the first light-transmitting opening 302 on the substrate 100 to the area of the orthographic projection of the first zone 11 on the substrate 100 is in the range of 30%-50%, such as 35%, 40%, 42% or 45%.
  • the first light emitting devices R and the corresponding first light-transmitting openings 302 are sequentially arranged along the length direction of the first light emitting devices R. This method does not need to narrow the width of the first light emitting devices R due to the arrangement of the first light-transmitting openings 302, thereby reducing the difficulty of arranging the first light-transmitting openings 302.
  • the size of the first light emitting device R in the first zone 13 may be reduced to reserve space for the arrangement of the first light-transmitting opening 302 , that is, the length of the first light emitting device R in the first zone is shorter than that of the first light emitting device R in the second zone.
  • the first light-transmitting opening may be provided on one side of one or more of the first light-emitting device, the second light-emitting device, and the third light-emitting device.
  • all the first light-transmitting openings 302 are disposed adjacent to the first light-emitting device R, that is, the provision of the first light-transmitting openings 302 will not affect the light extraction efficiency of the second light-emitting device G and the third light-emitting device B.
  • the lengths of the second light-emitting device G and the third light-emitting device B are equal, and the length of the second light-emitting device G is greater than the length of the first light-emitting device R, that is, in the first region 13 , the provision of the first light-transmitting openings 302 only needs to shorten the length of the first light-emitting device R.
  • all the first light-transmitting openings 302 are arranged adjacent to the first light-emitting device R and the second light-emitting device G, that is, the arrangement of the first light-transmitting openings 302 will not affect the light extraction efficiency of the third light-emitting device B.
  • the first light emitting device R and the adjacent first light-transmitting opening 302 are arranged in sequence, and along the length direction of the second light emitting device G, the second light emitting device G and the adjacent first light-transmitting opening 302 are arranged in sequence.
  • the length of the third light emitting device B is greater than the length of the first light emitting device R and the second light emitting device G, that is, in the first zone 13, the provision of the first light-transmitting opening 302 needs to shorten the length of the first light emitting device R and the second light emitting device G.
  • the area of the first light-transmitting opening corresponding to the second light-emitting device is equal to the area of the first light-transmitting opening corresponding to the first light-emitting device.
  • the area of the first light-transmitting opening 302 corresponding to the second light-emitting device G is smaller than the area of the first light-transmitting opening 302 corresponding to the first light-emitting device R. In this way, the influence of the setting of the first light-transmitting opening 302 on the luminous efficiency of the second light-emitting device G can be reduced.
  • the length of the first light-transmitting opening 302 corresponding to the second light-emitting device G is less than the length of the first light-transmitting opening 302 corresponding to the first light-emitting device R.
  • the first light-transmitting openings 302 corresponding to the first light-emitting device R and the second light-emitting device G and adjacent to each other are connected, thereby increasing the total area of the first light-transmitting openings 302 to increase the transmittance of the first region.
  • the opening pattern formed by the first light-transmitting openings 302 corresponding to the first light-emitting device R and the second light-emitting device G and connected to each other presents a stepped shape (a two-level step in Figure 8).
  • the sizes of the first light-emitting device R and the second light-emitting device G in the first zone can be reduced to reserve space for the arrangement of the first light-transmitting opening 302, that is, the length of the second light-emitting device G located in the first zone is less than the length of the second light-emitting device G located in the second zone.
  • the first light emitting device R, the second light emitting device G and the third light emitting device B are all disposed adjacent to the first light-transmitting opening 302 .
  • the second light-emitting device G and the corresponding first light-transmitting opening 302 are arranged in sequence, and/or, along the length direction of the third light-emitting device B, the third light-emitting device B and the corresponding first light-transmitting opening 302 are arranged in sequence.
  • the area of the first light-transmitting opening 302 corresponding to the second light-emitting device G is smaller than the area of the first light-transmitting opening 302 corresponding to the first light-emitting device R
  • the area of the first light-transmitting opening 302 corresponding to the third light-emitting device B is smaller than the area of the first light-transmitting opening 302 corresponding to the second light-emitting device G, so that the length of the second light-emitting device G is greater than the length of the first light-emitting device R and less than the length of the third light-emitting device B.
  • the length of the first light-transmitting opening 302 corresponding to the second light-emitting device G is less than the length of the first light-transmitting opening 302 corresponding to the first light-emitting device R, and greater than the length of the first light-transmitting opening 302 corresponding to the third light-emitting device B.
  • the shortened lengths of the first light-emitting device R, the second light-emitting device G, and the third light-emitting device B are successively reduced, thereby avoiding the light-emitting efficiency of some light-emitting devices with low light-emitting efficiency, such as the third light-emitting device B, being too low, resulting in color shift in the display device.
  • the first light-transmitting openings 302 corresponding to the first light-emitting device R, the second light-emitting device G, and the third light-emitting device B and adjacent to each other are connected, thereby further increasing the total area of the first light-transmitting openings 302 to further increase the light transmittance of the first area.
  • the opening pattern formed by the first light-transmitting openings 302 corresponding to the first light-emitting device R, the second light-emitting device G, and the third light-emitting device B and connected to each other is in a stepped shape (three steps in Figure 12).
  • the sizes of the first light-emitting device R, the second light-emitting device G and the third light-emitting device B in the first zone can be simultaneously reduced to reserve space for the arrangement of the first light-transmitting opening 302, that is, the length of the second light-emitting device G located in the first zone is smaller than the length of the second light-emitting device G located in the second zone, and the length of the third light-emitting device B located in the first zone is smaller than the length of the third light-emitting device B located in the second zone.
  • the arrangement of the first light-transmitting openings can be adjusted according to the arrangement of the light-emitting devices, which is explained below through several specific examples.
  • the first light-emitting device R, the second light-emitting device G and the third light-emitting device B are arranged in multiple rows and columns, the row direction may be the direction of the X axis, the column direction may be the direction of the Y axis, the first light-emitting device R, the second light-emitting device G and the third light-emitting device B are in different columns, that is, the light-emitting devices in the same column have the same light-emitting color, and each row is arranged with the first light-emitting device R, the second light-emitting device G and the third light-emitting device B, for example, in each row, the adjacent first light-emitting device R, the second light-emitting device G and the third light-emitting device B constitute a pixel (which may be referred to as a pixel unit or a pixel group, etc., and each light-e
  • the first light-emitting device R, the second light-emitting device G and the third light-emitting device B are arranged in multiple rows and columns, the first light-emitting device R and the second light-emitting device G are arranged in a part of the columns, and the third light-emitting device B is arranged in another part of the columns, and in the columns where the first light-emitting device R is arranged, the first light-emitting device R and the second light-emitting device G are arranged alternately along the direction of the column, and the columns where the first light-emitting device R and the second light-emitting device G are arranged are arranged alternately with the columns where the third light-emitting device B is arranged along the direction of the row.
  • first light-emitting devices R, second light-emitting devices G and third light-emitting devices B constitute a pixel (which may be referred to as a pixel unit or a pixel group, etc., and each light-emitting device may be referred to as a sub-pixel or a sub-pixel).
  • This design can increase the design area of the third light-emitting device B (for example, increase the length), thereby ensuring the light extraction efficiency of the third light-emitting device B.
  • the first light-emitting device R, the second light-emitting device G and the third light-emitting device ...
  • the length direction of the light device R, the second light emitting device G and the third light emitting device B is the same as the direction of the column.
  • the first light-transmitting opening 302 can be arranged between the first light emitting device R and the second light emitting device G in the same column.
  • the number of the third light emitting devices B in each column is about 1/2 of the number of the light emitting devices in the adjacent column.
  • the design area of the third light emitting device B can be increased (for example, the length can be increased) to ensure the luminous efficiency of the third light emitting device B; or, in other designs, the design area of the third light emitting device B can be kept unchanged so that there is a larger gap between adjacent third light emitting devices B, so that the first light-transmitting opening can be set between adjacent third light emitting devices B.
  • the isolation openings 301 may be designed to correspond one to one with the light-emitting devices 200 , so that only one light-emitting device 200 is provided in each isolation opening 301 .
  • first light-transmitting openings 302 are arranged in a grid shape
  • one light-emitting device 200 may be arranged in each first light-transmitting opening 302 (corresponding to the isolation opening 301 ), or a plurality of light-emitting devices 200 may be arranged.
  • At least two light-emitting devices 200 are disposed in each isolation opening 301, and the light-emitting devices 200 located in the same isolation opening 301 have the same light-emitting color.
  • the difference in driving voltage of the light-emitting devices 200 with the same light-emitting color is small, and even if they are arranged in the same isolation opening 301, the degree of current crosstalk will be relatively low.
  • the distance between the light-emitting devices 200 located in different isolation openings 301 and adjacent to each other can be increased without reducing the design area and arrangement density (PPI) of the light-emitting devices 200, thereby reducing the difficulty of preparing the first light-transmitting opening 302 in the isolation structure 300, so as to facilitate the design of the first light-transmitting opening 302 into a grid shape.
  • PPI design area and arrangement density
  • the isolation structure 300 includes a plurality of isolation segments 26 whose extension directions intersect with each other, and the first light-transmitting opening 302 is disposed through the isolation segments 26 along the thickness direction of the substrate 100 .
  • the isolation structure 300 includes a plurality of isolation segments 26, and at least some of the different isolation segments 26 have different extension directions, wherein each isolation segment 26 may be a straight segment structure, or each isolation segment 26 may be a curved segment 61 structure, or some isolation segments 26 may be a straight segment structure, and some isolation segments 26 may be a curved segment 61 structure.
  • the extension direction of the isolation segment 26 is the direction of the line connecting its head end and tail end.
  • the isolation structure 300 includes a plurality of isolation segments 26 arranged to intersect, and the plurality of isolation segments 26 can be divided into a first isolation portion and a second isolation portion, and the first light-transmitting opening 302 is arranged at the intersection of the first isolation portion and the second isolation portion.
  • the first light-transmitting opening 302 is arranged in the first isolation portion and extends along the length direction of the first isolation portion.
  • the first light-transmitting opening 302 By disposing the first light-transmitting opening 302 at the intersection of the first isolation portion and the second isolation portion, it helps to increase the distance between the center of the first light-transmitting opening 302 and the center of the adjacent isolation opening 301, thereby reducing the influence of the first light-transmitting opening 302 on the isolation opening 301.
  • the first light-transmitting opening 302 may also be disposed at the isolation segment 26, which is not limited in the embodiments of the present disclosure.
  • the orthographic projection of the first light-transmitting opening 302 on the substrate 100 may be a circular structure, a polygon, a rectangle, or an irregular shape, which is not limited in the present application.
  • the isolation structure 300 includes a plurality of isolation units 31 , the isolation units 31 enclose an isolation opening 301 , and at least some of the connected isolation units 31 are spaced apart to form a first light-transmitting opening 302 .
  • the isolation structure 300 includes a plurality of isolation units 31 arranged at intervals.
  • the structures of different isolation units 31 may be the same or different.
  • the isolation units 31 enclose an isolation opening 301, wherein one isolation unit 31 may be provided with only one isolation opening 301, or one isolation unit 31 may be provided with multiple isolation openings 301 at the same time, which is not limited in the embodiment of the present disclosure.
  • a first light-transmitting opening 302 is formed between adjacent isolation units 31, which helps to further increase the size of the first light-transmitting opening 302 in the display panel, thereby improving the overall transmittance of the display panel, and has strong practicality.
  • the shape of the orthographic projection of the first light-transmitting opening 302 on the substrate 100 is a grid. In this way, the total area of the first light-transmitting openings 302 in the first zone of the isolation structure 300 can be increased, thereby improving the transmittance of the first zone.
  • the isolation structure 300 is divided into isolation units 31 spaced apart from each other by the grid-like first light-transmitting openings 302 , and the isolation units 31 define isolation openings.
  • the isolation unit 31 can be connected by setting a transparent electrode.
  • the display panel can further include a transparent conductive layer 350, which is located between the isolation structure 300 and the substrate 100 and connected to the isolation structure 300.
  • the conductive layer 350 has a third opening 501, which corresponds to the isolation opening 301, and the orthographic projection of the isolation opening 301 on the substrate 100 is located within the orthographic projection of the corresponding third opening 501 on the substrate 100, and the orthographic projection of the first light-transmitting opening 302 on the substrate 100 is located within the orthographic projection of the conductive layer on the substrate 100.
  • the isolation units 31 can be connected through the transparent conductive layer 350, so that the first electrode 210 can still be electrically connected to the conductive layer 350 through the isolation structure 300 to form a common electrode.
  • the display panel 10 further includes a light emitting unit 220 and a second electrode 230 which are stacked in sequence, and are located on a side of the substrate 100 close to the isolation structure 300 and are disposed in the first light-transmitting opening 302.
  • the display panel 10 further includes a thin film formed of an organic material, which is located on a side of the second electrode 230 away from the display function layer 24; or, the display panel 10 further includes a plurality of thin films, which are located on a side of the second electrode 230 away from the display function layer 24, and have different refractive indices.
  • the embodiment of the present disclosure can meet the stretching requirements of the display panel. Specifically, since the isolation units 31 are arranged at intervals from each other, when the display panel needs to be stretched, the relative distance between different isolation units 31 can be increased under the action of external forces and other factors, and the light-emitting device 200 is only arranged corresponding to the isolation opening 301 of the isolation unit 31, and there is no light-emitting device 200 between adjacent isolation units 31. Therefore, when the position of the isolation unit 31 changes, the light-emitting device 200 can move with the isolation unit 31, and the distance between different light-emitting devices 200 located at different isolation units 31 can be increased, thereby realizing the adjustment of the relative position between different light-emitting devices 200 and meeting the stretching requirements.
  • the isolation unit 31 is provided with a plurality of isolation openings 301 , that is, a plurality of light emitting devices 200 may be provided corresponding to the same isolation unit 31 .
  • a plurality of light emitting devices 200 may be provided corresponding to the same isolation unit 31 .
  • at least some of the light emitting devices 200 of different colors are located in the plurality of isolation openings 301 of the same isolation unit 31 .
  • At least some of the light emitting devices 200 are arranged side by side in the first direction X, and at least some of the isolation units 31 are arranged side by side in the first direction X.
  • the light-emitting devices 200 are usually arranged according to a specific rule to improve the display uniformity of the display panel. Further, at least some of the light-emitting devices 200 are arranged side by side in the first direction X. Specifically, "at least some of the light-emitting devices 200 are arranged side by side in the first direction X" means that at least some of the light-emitting devices 200 are arranged at intervals from each other, and the center lines of some of the light-emitting devices 200 are parallel to the first direction X.
  • light-emitting devices 200 of the same color can be arranged side by side in the first direction X, or light-emitting devices 200 of different colors can be arranged side by side in the first direction X, and the embodiments of the present disclosure are not limited to this.
  • the existence of the isolation structure 300 can make the formation of the light-emitting device 200 not require the use of a fine metal mask during the preparation process of the light-emitting device 200, but rather the entire surface is evaporated and then the light-emitting material at a certain position is removed by etching. Therefore, the existence of the isolation structure 300 will have a great impact on the preparation of the light-emitting device 200, and will also have a certain impact on the relative position of the light-emitting device 200.
  • the embodiment of the present disclosure sets the isolation structure 300 so that at least part of the isolation units 31 are arranged side by side in the first direction X, so that the arrangement of the isolation units 31 can follow the arrangement of at least part of the light-emitting devices 200, so that the layout of the isolation units 31 is more regular. Then, during the preparation process of the light-emitting device 200, it is helpful to control at least part of the light-emitting devices 200 to be arranged side by side in the first direction X, so as to improve the display uniformity of the display panel.
  • multiple isolation units 31 are arranged side by side in the first direction X, which can ensure that multiple isolation units 31 can be spaced to form first light-transmitting openings 302 in the first direction X, so as to improve the light-transmitting display effect. And it can also meet the stretching needs of the display panel in the first direction X, so as to achieve a stretching effect.
  • the isolation unit 31 since the plurality of isolation units 31 are spaced apart from each other, the isolation unit 31 also has the function of isolating the water and oxygen from invading the light-emitting device 200 from the side, thereby being able to perform a packaging and protection function for the light-emitting device 200 together with the packaging layer, thereby improving the packaging effect of the light-emitting device 200.
  • All the isolation units 31 may be arranged side by side in the first direction X, or only some of the isolation units 31 may be arranged side by side in the first direction X, and the other isolation units 31 may be arranged side by side in other directions. No restrictions.
  • the display function layer 24 includes a plurality of repeating units D, each of which includes a plurality of light-emitting devices 200 , and at least some of the light-emitting devices 200 in the same repeating unit D are arranged side by side in the first direction X.
  • a plurality of repeating units D are shifted and repeated to form a pixel arrangement structure of a display panel, and the number, type and relative position relationship of the light-emitting devices 200 in each repeating unit D are the same.
  • light-emitting devices 200 of the same color may be arranged side by side in the first direction X, or light-emitting devices 200 of different colors may be arranged side by side in the first direction X.
  • the present embodiment of the present disclosure does not limit the composition and arrangement of the light-emitting devices 200 in the repeating unit D.
  • the multiple light-emitting devices 200 located in the virtual frame in Figure 2 refer to multiple light-emitting devices 200 located in the same repeating unit D, but Figure 20 does not constitute a limitation on the composition and arrangement of the light-emitting devices 200 in the repeating unit D.
  • the specific structure of the repeating unit D needs to be determined according to actual usage requirements, and the present embodiment of the present disclosure does not limit this.
  • the isolation structure 300 and the light-emitting device 200 are arranged along the first direction X, when designing the isolation structure 300 and the light-emitting device 200, different light-emitting devices 200 in the same repeating unit D can be arranged in different isolation units 31, and at least part of the adjacent isolation units 31 can be arranged side by side along the first direction X, so as to ensure that at least part of the light-emitting devices 200 in the same repeating unit D are arranged side by side in the first direction X when the light-emitting device 200 is subsequently prepared.
  • the display function layer 24 includes a repeating unit D
  • the repeating unit D includes a plurality of light-emitting devices 200 , and at least part of the repeating units D are arranged side by side in the first direction X.
  • different light-emitting devices 200 in different repeating units D can be arranged in different isolation units 31, and at least part of the adjacent isolation units 31 can be arranged side by side along the first direction X, so that when the light-emitting device 200 is subsequently prepared, it can be ensured that at least part of the repeated units D formed can be arranged side by side in the first direction X.
  • each light-emitting device 200 in the same repeating unit D is located in a plurality of isolation openings 301 in the same isolation unit 31 .
  • the embodiment of the present disclosure locates the light-emitting devices 200 in the same repeating unit D in multiple isolation openings 301 in the same isolation unit 31, so as to ensure that the relative position relationship between the light-emitting devices 200 in the repeating unit D can be kept fixed during the stretching process of the display panel, so that the light-emitting effect of each repeating unit D can remain unchanged, reduce the risk of color deviation of a single repeating unit D, and improve the light-emitting reliability of the repeating unit D.
  • some of the isolation units 31 are arranged side by side in the second direction Y, and the first direction X intersects the second direction Y.
  • the first direction X is perpendicular to the second direction Y.
  • different isolation units 31 can be arranged side by side along the first direction X and the second direction Y.
  • the display panel has first light-transmitting openings 302 at different positions in the first direction X and the second direction Y, which helps to improve the overall transmittance of the display panel and further meet the light-transmitting display or light-sensing requirements of the display panel.
  • this design can meet the stretching deformation of the display panel at least in the first direction X and the second direction Y, so as to further increase the size of the display panel and have stronger stretching applicability.
  • some isolation units 31 may also be arranged side by side along other directions, depending on factors such as the stretching requirements of the display panel and the arrangement requirements of the light-emitting devices 200 in the display function layer 24, and the embodiments of the present disclosure are not limited to this.
  • the display function layer 24 includes a plurality of repeating units D, the repeating unit D includes a plurality of light emitting devices 200 , and at least some of the light emitting devices 200 in the same repeating unit D are arranged side by side in the second direction Y.
  • the isolation structure 300 and the light-emitting device 200 when designing the isolation structure 300 and the light-emitting device 200, different light-emitting devices 200 in the same repeating unit D can be arranged in different isolation units 31, and at least part of the adjacent isolation units 31 can be arranged side by side along the second direction Y, so as to ensure that at least part of the light-emitting devices 200 in the same repeating unit D are arranged side by side in the second direction Y when the light-emitting device 200 is prepared later.
  • the display function layer 24 includes a plurality of repeating units D, the repeating units D include a plurality of light emitting devices 200 , and at least some of the repeating units D are arranged side by side in the second direction Y.
  • different light-emitting devices 200 in different repeating units D can be arranged in different isolation units 31, and at least part of the adjacent isolation units 31 can be arranged side by side along the second direction Y, so that when the light-emitting device 200 is subsequently prepared, it can be ensured that at least part of the repeated units D formed can be arranged side by side in the second direction Y.
  • any different light emitting devices 200 are disposed in different isolation units 31, that is, each isolation unit 31 is provided with only one isolation opening 301.
  • the orthographic projection of the isolation unit 31 on the substrate 100 is a ring-shaped structure.
  • This design allows the first light-transmitting opening 302 to exist between any adjacent light-emitting devices 200, thereby further increasing the size ratio of the first light-transmitting opening 302 in the display panel, thereby further improving the light-transmitting display effect, or further improving the light-sensitive effect of the display panel.
  • the relative distance between any light-emitting devices 200 can be increased, thereby helping to further increase the overall size of the display panel after stretching, increase the deformation of the display panel, and have greater flexibility.
  • the shape of the isolation opening 301 (equivalent to the shape of the pixel) can be designed to increase the gap between the isolation openings without reducing the light-emitting area of the pixel (the effective light-emitting area of the light-emitting unit) and the pixel density PPI, so as to facilitate the setting of a larger light-transmitting opening, as follows.
  • At least two opposite ends of the isolation opening 301 are arc-shaped.
  • This design allows the design area of the isolation opening 301 to remain unchanged (the light-emitting area of the light-emitting unit remains unchanged) and the pixel density of the display panel to remain unchanged, so that there is a larger size between adjacent isolation openings 301, so as to facilitate the design of a larger area of the first light-transmitting opening 302, so as to further improve the light transmittance of the first area 13.
  • the orthographic projections of the isolation opening 301 and the first light-transmitting opening 302 on the substrate are respectively conformal to the grid outline of the orthographic projection of the grid pattern on the substrate.
  • the first light-transmitting opening 302 is circular; or, the first light-transmitting opening 302 is rectangular; or, the edge of the first light-transmitting opening 302 is conformal to the edge of the adjacent isolation opening 301.
  • at least two opposite ends of the first light-transmitting opening 302 are arc-shaped; at least two opposite ends of the isolation opening 301 are arc-shaped.
  • the display panel further includes a first transparent filling portion T disposed in at least a portion of the first light-transmitting opening 302 .
  • the first transparent filling part T refers to a structure formed by a material with a relatively high transmittance, wherein the first transparent filling part T is disposed in at least a portion of the first light-transmitting opening 302, and the presence of the first transparent filling part T does not have too much influence on the transmittance at the first light-transmitting opening 302, which helps to achieve a transparent display effect.
  • the first transparent filling part T can also play a certain supporting role for the upper part of the film layer, so as to reduce the difficulty of manufacturing the display panel and improve the manufacturing yield.
  • the material composition of the first transparent filling part T is limited by the manufacturing embodiment of the present application.
  • the first transparent filling part T may also include an elastic material, and the presence of the elastic material can meet the stretching requirements of the display panel.
  • the first transparent filling part T may include an organic material.
  • the light-emitting device 200 includes a first electrode layer 2100 and a second electrode layer 2300 on the substrate 100, and the light-emitting unit 220 is located between the first electrode layer 2100 and the second electrode layer 2300.
  • the light-emitting unit 220 may include a first common layer 221, a light-emitting layer 222, and a second common layer 223, which are sequentially stacked on the first electrode layer 2100.
  • the first common layer 221 may include a hole injection layer, a hole transport layer, an electron blocking layer, etc., and the second common layer 223.
  • the second common layer 223 may include an electron injection layer, an electron transport layer, a hole blocking layer, etc.
  • the isolation structure 300 is provided so that the first common layer 221 (the main film layer causing current crosstalk) of each light-emitting device 200 is electrically disconnected from each other.
  • the first electrode layer 2100 is provided with a first electrode 210
  • the second electrode layer 2300 is provided with a second electrode 230.
  • the first electrode 210 and the second electrode 230 jointly drive and control whether the light-emitting unit 220 emits light.
  • the first electrode 210 is a cathode
  • the second electrode 230 is an anode.
  • the first electrode 210 is an anode
  • the second electrode 230 is a cathode.
  • the second electrode 230 may be a transparent electrode.
  • the material of the transparent electrode may be It includes transparent metal oxides, for example, at least one of indium tin oxide (ITO), indium zinc oxide (IZO), aluminum zinc oxide (AZO), FTO, silver-doped indium tin oxide and silver-doped indium zinc oxide, or a three-layer structure can be used, wherein the materials of the first layer and the third layer can be transparent metal oxides, for example, indium tin oxide (ITO), indium zinc oxide (IZO) or aluminum zinc oxide (AZO), and the material of the middle second layer can be metal, such as silver or copper.
  • ITO indium tin oxide
  • IZO indium zinc oxide
  • AZO aluminum zinc oxide
  • the material of the middle second layer can be metal, such as silver or copper.
  • the first electrode 210 can be a reflective electrode or a transparent electrode, and the reflective electrode material can be silver or copper or magnesium-silver alloy.
  • the light-emitting layer 222 can be an organic light-emitting layer, wherein the organic light-emitting layer can include only a single-layer structure, for example, only an organic light-emitting material layer; or it can include a multi-layer structure, for example, it can include functional film layers such as a hole injection layer, a hole transport layer, an organic light-emitting material layer, an electron transport layer and an electron injection layer arranged in sequence from the second electrode 230 to the first electrode 210.
  • the specific structure of the organic light-emitting layer is set according to the actual application and is not specifically limited here.
  • the isolation structure 300 may insulate the functional film layers of the light-emitting units 220 from each other, so as to reduce lateral crosstalk between the light-emitting units 220 .
  • the isolation structure 300 is a conductive structure 32 (e.g., the first isolation layer 310 described below), and the conductive structure 32 is electrically connected to the second electrode 230 of the adjacent light-emitting device 200, and is spaced apart from the first electrode 210.
  • the second electrodes 230 of the light-emitting devices 200 can be electrically connected through the conductive structure 32 of the isolation structure 300 to form a common electrode, so that the driving method of the second electrode 230 of the current display panel (e.g., driven by one or a few common electrode lines) can still be applied.
  • the isolation structure 300 can be designed to be wide at the top and narrow at the bottom, so that the first common layer 221 (the main film layer causing current crosstalk) is disconnected by the isolation structure 300 during evaporation.
  • the orthographic projection of one end of the conductive structure 32 of the isolation structure 300 facing the substrate 100 on the substrate 100 is located within the orthographic projection of one end of the conductive structure 32 facing away from the substrate 100 on the substrate 100.
  • the specific shape of the isolation structure layer is not further restricted. The following briefly describes several configurations of the isolation structure layer through embodiments.
  • the isolation structure 300 includes a stacked first isolation layer 310 and a second isolation layer 320, the first isolation layer 310 is located between the substrate 100 and the second isolation layer 320, the orthographic projection of the first isolation layer 310 on the substrate 100 is located within the orthographic projection of the second isolation layer 320 on the substrate 100, and the first isolation layer 310 is a conductive structure 32.
  • the cross-sectional shape of the first isolation layer 310 is a regular trapezoid, and the second isolation layer 320 is located at the top edge of the first isolation layer 310.
  • the evaporation material of the second electrode 230 it is convenient for the evaporation material of the second electrode 230 to be deposited on the side wall of the first isolation layer 310, so as to improve the overlap yield of the second electrode 230 and the first isolation layer 310.
  • the first isolation layer 310 includes a first end portion close to the second isolation layer 320 and a second end portion away from the second isolation layer 320, and the orthographic projection of the first end portion on the substrate 100 is located within the orthographic projection of the second end portion on the substrate 100.
  • the orthographic projection of the first end portion on the substrate 100 is located within the orthographic projection of the second end portion on the substrate 100, which means that the area of the orthographic projection of the first end portion on the substrate 100 is smaller than the orthographic projection of the second end portion on the substrate 100, and the orthographic projection of the second end portion on the substrate 100 covers the orthographic projection of the first end portion on the substrate 100.
  • the isolation structure 300 is an integrated structure.
  • the cross-sectional shape of the isolation structure 300 is an inverted trapezoid, with the top edge of the inverted trapezoid facing the substrate.
  • the sidewall of the isolation structure 300 is an inscribed structure, thereby increasing the isolation effect of the isolation structure 300.
  • the conductive structure 32 may be a metal conductive structure.
  • the metal material has high conductivity and can reduce the voltage drop when driving the first electrode. Accordingly, the metal material can only be light-transmissive when the thickness is extremely thin, and the isolation structure 300 requires a certain thickness to isolate the light-emitting unit. Therefore, the conductive structure 32 in the isolation structure 300 (such as the first isolation layer 310 described below) is almost opaque. Therefore, the isolation structure 300 can only be made light-transmissive by providing the first light-transmissive opening 302.
  • the material of the first isolation layer 310 includes a transparent metal oxide; wherein the transparent metal oxide is at least one of indium tin oxide and indium zinc oxide.
  • the isolation structure 300 further includes a third isolation layer 330, which is disposed on a side of the first isolation layer 310 adjacent to the substrate 100, and the orthographic projection of the third isolation layer 330 on the substrate 100 covers the orthographic projection of the first isolation layer 310 on the substrate 100.
  • the third isolation layer 330 includes a conductive structure 32. Specifically, the conductive structure 32 is located between the first isolation layer 310 and the substrate 100.
  • the display function layer 24 may further include a pixel defining layer 400, the pixel defining layer 400 is located between the isolation structure 300 and the substrate 100, and includes a plurality of fourth openings 201 for defining the light-emitting device 200, and the fourth openings 201 correspond to the isolation openings 301 for exposing the first electrode 210.
  • the conductive portion of the isolation structure 300 and the first electrode 210 can be spaced apart, so that the first electrode 210 can have a larger design size to increase the area of the main light-emitting region of the light-emitting device 200 (equivalent to increasing the aperture ratio).
  • the area where the fourth openings 201 are located can represent the main light-emitting region of the light-emitting device.
  • the orthographic projection of the isolation structure 300 on the substrate 100 coincides with the orthographic projection of the pixel defining layer 400 on the substrate 100, that is, the fourth opening 201 is opposite to the isolation opening 301 and has the same area, so that the isolation structure 300 completely covers the gap of the light-emitting device.
  • the orthographic projection of the isolation structure 300 on the substrate 100 is located within the orthographic projection of the pixel defining layer 400 on the substrate 100, that is, the area of the fourth opening 201 is smaller than the area of the isolation opening 301, so that the light emission angle of the light-emitting device can be increased to increase the viewing angle of the display image of the display panel.
  • the pixel defining layer 400 is further provided with a second through hole 202, the second through hole 202 is spaced apart from the fourth opening 201, and the second through hole 202 is arranged so that the orthographic projection of the substrate 100 overlaps with the orthographic projection of the first light-transmitting opening 302 on the substrate 100.
  • the orthographic projection of the first light-transmitting opening 302 on the substrate 100 is located within the orthographic projection of the second through hole 202 on the substrate 100.
  • This design can further improve the transmittance of the display panel at the first light-transmitting opening 302, thereby improving the transparent display effect.
  • at least a partial structure of the first transparent filling portion T can also be provided in the second through hole 202.
  • the first isolation layer 310 in the isolation structure 300 is at least partially located in the second through hole 202 and covers at least a portion of the sidewall of the pixel defining layer 400 .
  • At least a portion of the first isolation layer 310 can extend into the second through hole 202 and can cover at least a portion of the side wall of the pixel defining layer 400. This design enables the first isolation layer 310 to protect the side wall of the pixel defining layer 400 facing the second through hole 202, thereby enhancing the structural reliability of the display panel.
  • the display panel also includes a second wiring arranged on one side of the substrate 100, and the orthographic projection of the second wiring on the substrate 100 at least partially overlaps with the orthographic projection of the first light-transmitting opening 302 on the substrate 100.
  • the second trace includes a first signal line 60 disposed on one side of the substrate 100 .
  • the first signal line 60 includes a curved segment 61 .
  • the orthographic projection of the curved segment 61 on the substrate 100 at least partially overlaps with the orthographic projection of the first light-transmitting opening 302 on the substrate 100 .
  • the first signal line 60 and the isolation structure 300 are located on the same side of the substrate 100.
  • the first signal line 60 can be located on the side of the isolation structure 300 facing the substrate 100, or the first signal line 60 can also be arranged on the same layer as part of the structure of the isolation structure 300, which is not limited in the embodiment of the present application.
  • the embodiment of the present application does not limit the type and overall extension direction of the first signal line 60.
  • the first signal line 60 can be a data line for transmitting a data signal; or the first signal line 60 can be a power line for transmitting a power signal to the first electrode 210 or the second electrode 230.
  • the embodiment of the present application provides a curved segment 61 in the first signal line 60. Compared with a straight line structure, the curved segment 61 can have a larger elongation under the action of external force and other factors, thereby meeting the stretching requirements of the display panel.
  • the orthographic projection of the curved segment 61 on the substrate 100 at least partially overlaps with the orthographic projection of the first light-transmitting opening 302 on the substrate 100, that is, the orthographic projection of the curved segment 61 on the substrate 100 is located between the orthographic projections of adjacent isolation units 31 on the substrate 100.
  • This design allows the curved segment 61 to deform and gradually straighten as the distance between adjacent isolation units 31 gradually increases, thereby meeting the stretching requirements of the display panel, thereby reducing the risk of the first signal line 60 being broken due to the stretching of the display panel and improving the reliability of signal transmission inside the display panel.
  • the specific shape and size of the curve segment 61 are not limited in the embodiment of the present application.
  • the orthographic projection of the curve segment 61 on the substrate 100 may be in an "S" shape.
  • the first signal line 60 is electrically connected to the first isolation layer 310, so that a specific signal in the first signal line 60 can be transmitted with the help of the first isolation layer 310.
  • the connection method between the first isolation layer 310 and the first signal line 60 is not limited in the present embodiment.
  • the first signal line 60 is located on the side of the first isolation layer 310 facing the substrate 100, and the first signal line 60 and the first isolation layer 310 are electrically connected to each other through vias.
  • the first signal line 60 is disposed in the same layer as the first isolation layer 310 .
  • adjacent isolation units 31 are spaced apart from each other, and no partial film layers such as the light-emitting unit 220 are disposed between adjacent isolation units 31.
  • a partial support film layer can be filled between adjacent isolation units 31, and then the first signal line 60 can be disposed on the support film layer, so that the first signal line 60 can be disposed on the same layer as the first isolation layer 310 and electrically connected, thereby reducing the occupation of the first signal line 60 on the lower array layer space and meeting the wiring requirements of the display panel.
  • the first signal line 60 includes a plurality of conductive segments disposed at intervals, and the conductive segments are electrically connected to the first isolation layer 310 .
  • the first signal line 60 can be arranged in the same layer as the first isolation layer 310 and be electrically connected, so the first signal line 60 can achieve signal transmission with the help of the first isolation layer 310.
  • the first signal line 60 can include a plurality of conductive segments arranged at intervals, and adjacent conductive segments can achieve signal transmission between each other with the help of the first isolation layer 310.
  • the conductive segment can include a curved segment 61 to meet the stretching requirements of the display panel.
  • the display panel 10 includes: a substrate 100; the substrate 100 is provided with a second light-transmitting opening 110; an isolation structure 300, located on one side of the substrate 100, the isolation structure 300 encloses an isolation opening 301 and a first light-transmitting opening 302, the second light-transmitting opening 110 is connected to the first light-transmitting opening 302, the second light-transmitting opening 110 is projected on the substrate 100 within the projection of the first light-transmitting opening 302 on the substrate 100; a display function layer 24, located on one side of the substrate 100, the display function layer 24 includes a light-emitting unit 220 located at the isolation opening 301.
  • the shape of the first light-transmitting opening 302 on the substrate 100 includes a circle or a square, so that the shape of the first light-transmitting opening 302 is relatively regular, so that the mask plate structure used for the vapor deposition isolation structure 300 is simple, the preparation of the mask plate is convenient, and the development difficulty is reduced.
  • FIG. 27 is a partial cross-sectional view of a display panel in another embodiment.
  • the substrate 100 also includes a substrate 1000 and an array layer 2000, the array layer 2000 is located on the side of the substrate 1000 close to the display function layer 24, and the second light-transmitting opening 110 includes a first through hole 111 that penetrates the array layer 2000, which can improve the transmittance of the display panel 10 at the second light-transmitting opening 110.
  • the orthographic projection of the first through hole 111 on the substrate 100 is within the orthographic projection of the first light-transmitting opening 302 on the substrate 100, and the first through hole 111 is completely connected with the first light-transmitting opening 302, thereby increasing the overlapping area of the orthographic projection of the first through hole 111 on the substrate 100 and the orthographic projection of the first light-transmitting opening 302 on the substrate 100, that is, increasing the area of the position with higher transmittance of the display panel 10, thereby improving the overall transmittance of the display panel 10.
  • the array layer 2000 includes a plurality of routing lines, and the orthographic projections of the plurality of routing lines on the substrate 1000 are misaligned (non-overlapping) or partially overlapped with the orthographic projections of the first light-transmitting opening 302 on the substrate 1000.
  • Partial overlap means that the orthographic projections of the plurality of routing lines on the substrate 1000 and the orthographic projections of the first light-transmitting opening 302 on the substrate 1000 do not completely overlap, and does not include the case where the orthographic projections of the plurality of routing lines on the substrate 1000 and the orthographic projections of the first light-transmitting opening 302 on the substrate 1000 completely overlap, and does not include the case where the orthographic projections of the plurality of routing lines on the substrate 1000 completely cover the orthographic projections of the first light-transmitting opening 302 on the substrate 1000.
  • the array layer 2000 includes a driving transistor T, the source of the driving transistor T receives a data driving signal, the drain of the driving transistor T is electrically connected to the second electrode 230, and after the gate of the driving transistor T receives a gate scanning signal, the source and drain of the driving transistor T are turned on, and the source transmits the data driving signal to the second electrode 230 through the drain, so as to drive the light-emitting device 200 to emit light through the voltage difference between the second electrode 230 and the first electrode 210.
  • the array layer 2000 also includes other transistors and capacitors to realize the transmission of signals to the driving transistor T, etc.
  • the area of the orthographic projection of the light-transmitting portion on the substrate 100 is smaller than the area of the orthographic projection of the light-emitting device 200 on the substrate 10.
  • the present invention is not limited thereto, and in other embodiments, while ensuring that the pixel resolution remains unchanged, the light transmittance of the display panel can be improved by increasing the area of the orthographic projection of the light-transmitting portion on the substrate 100, such as making the area of the orthographic projection of the light-transmitting portion on the substrate 100 greater than or equal to the area of the orthographic projection of the light-emitting device 200 on the substrate 100.
  • the orthographic projection of the second electrode 230 such as an anode on the substrate 100 at least partially covers the orthographic projection of the driving transistor T on the substrate 100, or the orthographic projection of the light-transmitting portion on the substrate 100 at least partially does not cover the orthographic projection of the driving transistor T on the substrate 100, so as to prevent light from irradiating the driving transistor T through the reflection effect of the second electrode 230 such as an anode, and further prevent the driving transistor T from affecting the light transmittance of the light-transmitting portion.
  • the array layer 2000 may further include a plurality of stacked conductive layers and a first insulating layer between adjacent conductive layers, and a circuit structure is provided in the array layer 2000 to meet the use requirements of the display panel.
  • the first signal line 60 may be located in the array layer 2000.
  • the display panel 10 further includes a second transparent filling portion, which is provided to fill the second light-transmitting opening 110.
  • the second transparent filling portion fills the second light-transmitting opening 110, so that the second light-transmitting opening 110 is relatively flat, so as to facilitate the subsequent preparation of other film layers.
  • the second transparent filling portion includes a transparent material, and while flattening the display panel 10 at the second light-transmitting opening 110, it can also ensure that the display panel 10 has a higher transmittance at the second light-transmitting opening 110, thereby improving the performance of the display panel 10.
  • FIG. 28 is a partial cross-sectional view of a display panel provided in an embodiment of the present disclosure.
  • the present disclosure provides a display panel 10, which includes a substrate 100, an isolation structure 300 and a display function layer 24; the isolation structure 300 is located on the substrate 100, and the isolation structure 300 includes a light-transmitting portion, which defines an isolation opening 301. Furthermore, the light-transmitting portion is made of a light-transmitting material.
  • the transmittance of the light-transmitting portion under the test light is greater than 0.6%, such as the transmittance is greater than 1%, 3%, 5%, 8%, 10%, 12%, 15%, 18%, 20% or 25%.
  • the light transmittance of the light-transmitting portion in the visible light wavelength range is greater than 30%, preferably, the light transmittance of the light-transmitting portion in the visible light wavelength range is greater than 50%; preferably, the light transmittance of the light-transmitting portion in the visible light wavelength range is greater than 60%; preferably, the light transmittance of the light-transmitting portion in the visible light wavelength range is greater than 70%, so that the display panel can meet the transmittance requirements of under-screen fingerprints and under-screen cameras.
  • the test light can be visible light or near-infrared light, and the wavelength of the test light can be 550nm or 940nm.
  • the isolation structure 300 includes a first light-transmitting layer 311 and a second light-transmitting layer 321 stacked in a thickness direction, the second light-transmitting layer 321 is located on the side of the first light-transmitting layer 311 away from the substrate 100, and the orthographic projection of the first light-transmitting layer 311 on the substrate 100 is located within the orthographic projection of the second light-transmitting layer 321 on the substrate 100; the display function layer 24 includes light-emitting units 220 that are spaced apart from each other and located in each isolation opening 301.
  • the display panel 10 includes a substrate 100, an isolation structure 300, and a display function layer 24.
  • the isolation structure 300 is disposed on the substrate 100 and encloses a plurality of isolation openings 301.
  • the isolation structure 300 includes a first light-transmitting layer 311 and a second light-transmitting layer 321, and the orthographic projection of the first light-transmitting layer 311 on the substrate 100 is located within the orthographic projection of the second light-transmitting layer 321 on the substrate 100, so that the first light-transmitting layer 311 is concavely disposed relative to the second light-transmitting layer 321 to separate the display function layer 24 to form mutually disconnected light-emitting units 220, thereby reducing the crosstalk of carriers in the display function layer 24, and can reduce the development and use of precision mask plates, and reduce the preparation cost.
  • the light-emitting unit 220 is located in the isolation opening 301 to achieve light-emitting display.
  • the first light-transmitting layer 311 and the second light-transmitting layer 321 have a high transmittance.
  • the light-transmitting isolation structure 300 can improve the photosensitivity effect of the photosensitive component.
  • FIG. 29 is a partial cross-sectional view of a display panel in another embodiment.
  • the isolation structure 300 further includes a third light-transmitting layer 331 , and the third light-transmitting layer 331 is located on a side of the first light-transmitting layer 311 facing the substrate 100 .
  • the third light-transmitting layer 331 also has a high transmittance to ensure the light-transmitting effect of the isolation structure 300.
  • the third light-transmitting layer 331 is located between the first light-transmitting layer 311 and the substrate 100. During etching, the third light-transmitting layer 331 has a certain protective effect on the substrate 100 , reducing the etching waste of the first light-transmitting layer 311 from entering the substrate 100 , thereby improving the problem that the substrate 100 is easily invaded by the etching waste and thus damaged.
  • the display panel 10 also includes a second electrode layer 2300, the second electrode layer 2300 is located on the side of each display function layer 24 away from the substrate 100, the second electrode layer 2300 includes second electrodes 230 that are spaced apart from each other and located in each isolation opening 301, the third light-transmitting layer 331 includes a conductive material, and the second electrode 230 and the third light-transmitting layer 331 are electrically connected.
  • the second electrode layer 2300 is disconnected by the isolation structure 300 to form a second electrode 230 located in each isolation opening 301, and the second electrode 230 and the third light-transmitting layer 331 are electrically connected, so that the second electrodes 230 spaced apart from each other can be electrically connected to each other through the isolation structure 300 to form a full-surface electrode.
  • the third light-transmitting layer 331 includes a light-transmitting conductive layer.
  • the third light-transmitting layer 331 has both high transmittance and good conductivity, which increases the transmittance of the display panel 10 while ensuring that the second electrodes 230 are electrically connected to each other through the third light-transmitting layer 331 .
  • the second light-transmitting layer 321 and the third light-transmitting layer 331 include at least one of indium tin oxide (ITO) and indium zinc oxide (IZO). Both indium tin oxide (ITO) and indium zinc oxide (IZO) have high transmittance and conductivity, which can increase the transmittance of the display panel 10 while ensuring that the second electrodes 230 are electrically connected to each other through the third light-transmitting layer 331.
  • ITO indium tin oxide
  • IZO indium zinc oxide
  • the third light-transmitting layer 331 includes a light-transmitting metal layer, which increases the transmittance of the display panel 10 and ensures that the second electrodes 230 are electrically connected to each other through the third light-transmitting layer 331.
  • the third light-transmitting layer 331 includes a thin silver metal layer.
  • the first light-transmitting layer 311 includes an inorganic light-transmitting layer.
  • the first light-transmitting layer 311 includes silicon nitride (SiN) or silicon oxide (SiO).
  • the first light-transmitting layer 311 is an inorganic light-transmitting material.
  • the first light-transmitting layer 311, the second light-transmitting layer 321, and the third light-transmitting layer 331 of the inorganic material can be etched in different ways, so that the first light-transmitting layer 311 is etched separately, which makes it easier to make the first light-transmitting layer 311 concave relative to the second light-transmitting layer 321, thereby achieving a partitioning effect on the display function layer 24 and the second light-transmitting layer 321.
  • the first light-transmitting layer 311 includes a light-transmitting metal layer, for example, the first light-transmitting layer 311 includes a metal silver (Ag) film, and the first light-transmitting layer 311 also has a high transmittance and good conductivity, and the second electrodes 230 can be electrically connected to each other through the third light-transmitting layer 331, and can also be electrically connected to each other through the first light-transmitting layer 311.
  • the first light-transmitting layer 311 includes a light-transmitting metal layer
  • the first light-transmitting layer 311 includes a metal silver (Ag) film
  • the first light-transmitting layer 311 also has a high transmittance and good conductivity
  • the second electrodes 230 can be electrically connected to each other through the third light-transmitting layer 331, and can also be electrically connected to each other through the first light-transmitting layer 311.
  • the isolation structure 300 is composed of only the first light-transmitting layer 311 and the second light-transmitting layer 321, the first light-transmitting layer 311 includes a light-transmitting conductive layer, and the second electrode 230 is electrically connected to the first light-transmitting layer 311 to achieve mutual electrical connection of each second electrode 230.
  • the second light-transmitting layer 321 includes a light-transmitting metal layer.
  • the second light-transmitting layer 321 and the third light-transmitting layer 331 are both light-transmitting metal layers, which can further improve the transmittance of the display panel 10 .
  • the cross-sectional shape of the first light-transmitting layer 311 along the thickness direction of the display panel 10 includes a trapezoid.
  • the cross-sectional shape of the first light-transmitting layer 311 is a trapezoid
  • the second light-transmitting layer 321 can be stably supported
  • the first light-transmitting layer 311 is equivalent to the concave setting of the second light-transmitting layer 321, which facilitates the disconnection of the second electrode 230 at the isolation structure 300.
  • the orthographic projection of the first light-transmitting layer 311 on the substrate 100 is located within the orthographic projection of the third light-transmitting layer 331 on the substrate 100 .
  • the orthographic projection of the first light-transmitting layer 311 on the substrate 100 is located within the orthographic projection of the third light-transmitting layer 331 on the substrate 100, that is, the bottom surface of the first light-transmitting layer 311 close to the substrate 100 is completely located above the third light-transmitting layer 331, and the side of the first light-transmitting layer 311 facing the isolation opening 301 is concave relative to the third light-transmitting layer 331.
  • the edge of the third light-transmitting layer 331 protrudes from the first light-transmitting layer 311, which can increase the contact area between the third light-transmitting layer 331 and the second electrode 230, so as to improve the overlapping performance between the second electrode 230 and the third light-transmitting layer 331.
  • Figure 30 is a schematic diagram of the cross-sectional structure of another display panel disclosed in an embodiment of the present invention.
  • the display panel 10 includes a overlap portion 250, which is overlapped on the side of the isolation structure 300 facing the isolation opening 301 and is electrically connected to the third light-transmitting layer 331, and the overlap portion 250 is electrically connected to the second electrode 230.
  • the overlapping portion 250 is arranged on the side of the isolation structure 300 facing the isolation opening 301, so that the third light-transmitting layer 331 and the second electrode 230 can be electrically connected through the overlapping portion 250 to improve the overlapping performance of the second electrode 230 and the third light-transmitting layer 331.
  • the overlapping portion 250 overlaps a side of the third light-transmitting layer 331 facing the isolation opening 301 , so that the third light-transmitting layer 331 is electrically connected to the second electrode 230 through the overlapping portion 250 .
  • the overlapping portion 250 is overlapped on the first light-transmitting layer 311 and the third light-transmitting layer 331 on one side facing the isolation opening 301.
  • the first light-transmitting layer 311 and the third light-transmitting layer 331 are both conductive materials
  • the second electrode 230 is overlapped on the first light-transmitting layer 311 and the third light-transmitting layer 331 through the overlapping portion 250, thereby further improving the overlapping performance of the second electrode 230 and the isolation structure 300.
  • the overlapping portion 250 includes a light-transmitting metal material, so that the second electrode 230 overlaps the isolation structure 300 and can also improve the transmittance of the display panel 10.
  • the light-emitting unit 220 and the isolation structure 300 are spaced apart.
  • the light-emitting units 220 and the isolation structure 300 are spaced apart from each other, making it difficult for the light-emitting units 220 to be electrically connected to each other through the isolation structure 300 , further reducing carrier crosstalk between the light-emitting units 220 .
  • the light emitting unit 220 and the isolation structure 300 are spaced apart to form a gap 360 , and part of the overlapping portion 250 is located in the gap 360 .
  • part of the overlapping portion 250 is deposited into the gap 360 to fill the gap 360 and contact the third light-transmitting layer 331 , thereby improving the overlapping performance between the overlapping portion 250 and the third light-transmitting layer 331 .
  • FIG. 31 is a schematic diagram of the cross-sectional structure of another display panel disclosed in an embodiment of the present invention.
  • the isolation structure 300 further includes a non-light-transmitting portion 112 , and the non-light-transmitting portion 112 partially surrounds the light-transmitting portion.
  • the non-light-transmitting portion 112 only surrounds the first light-transmitting layer 311 and the second light-transmitting layer 321, and does not surround the transparent conductive layer in the third light-transmitting layer 331, so that the transparent conductive layer can be electrically connected to the second electrode 230.
  • the present invention is not limited to this.
  • the non-light-transmitting portion 112 only surrounds part of the side walls of the light-transmitting portions such as the first light-transmitting layer 311, the second light-transmitting layer 321 and the third light-transmitting layer 331, so that the exposed side walls can enable the transparent conductive layer to be electrically connected to the second electrode 230.
  • the substrate 100 also includes a second insulating layer 600, the second insulating layer 600 includes a covering portion 610 and a third through hole 620 formed by the covering portion 610, the covering portion 610 covers the side surface of the first electrode 210, a partial area of the first electrode 210 is exposed by the third through hole 620, and the third through hole 620 is connected to the isolation opening 301.
  • the second electrode 230 is exposed by the third through hole 620.
  • One of the second electrode 230 and the first electrode 210 serves as the anode of the light-emitting unit 220, and the other serves as the cathode of the light-emitting unit 220.
  • the disclosed embodiment takes the second electrode 230 as the anode of the light-emitting unit 220 and the first electrode 210 as the cathode of the light-emitting unit 220 as an example.
  • the covering portion 610 of the second insulating layer 600 encloses and forms the third through hole 620 to set the light-emitting unit 220 and realize the normal light emission of the light-emitting unit 220.
  • the covering portion 610 defines the setting area of each light-emitting unit 220 to reduce the cross-color poor between each light-emitting unit 220.
  • the covering portion 610 covers the side surface of the first electrode 210 to realize that the covering portion 610 insulates the side surface of the first electrode 210 to reduce the invasion of water vapor through the covering portion 610 and improve the service life of the display panel 10.
  • the isolation structure 300 is located on the cover portion 610.
  • the isolation structure 300 is disposed on the cover portion 610, and the isolation structure 300 is equivalent to having a large height difference of the third through hole 620.
  • the display function layer 24 is more easily disconnected at the isolation structure 300 position, thereby reducing the difficulty of preparing the display function layer 24.
  • the isolation structure 300 is located on the covering portion 610 .
  • an accommodating opening 640 is provided on the covering portion 610 of the isolation structure 300, and the isolation structure 300 is located in the accommodating opening 640.
  • the isolation structure 300 is arranged in the accommodating opening 640 on the covering portion 610.
  • the preparation step of the isolation structure 300 is before the preparation of the first electrode 210, that is, after the isolation structure 300 is prepared on the substrate 100, the first electrode 210 is prepared on the substrate 100, so as to reduce the influence of the preparation of the isolation structure 300 on the first electrode 210 and ensure that the first electrode 210 is not damaged.
  • the number of the covering parts 610 is multiple, and one covering part 610 covers one first electrode.
  • the side of the first electrode 210 is arranged in a ring shape around the side of the first electrode 210, the isolation structure 300 is located in the interval between the adjacent covering parts 610, and the isolation structure 300 is arranged in the interval between the adjacent covering parts 610.
  • the preparation step of the isolation structure 300 is before the preparation of the first electrode 210, that is, after the isolation structure 300 is prepared on the substrate 100, the first electrode 210 is prepared on the substrate 100 to reduce the impact of the preparation of the isolation structure 300 on the first electrode 210 and ensure that the first electrode 210 is not damaged.
  • the multiple covering parts 610 are arranged at intervals, so that it is difficult for water vapor to extend and invade between the covering parts 610, thereby improving the service life of the display panel 10.
  • the second insulating layer 600 includes a pixel defining layer 400, the second insulating layer 600 is reused as the pixel defining layer 400, the covering portion 610 is reused as the pixel defining portion, the third through hole 620 is reused as the fourth opening 201, and the isolation structure 300 is located on the side of the pixel defining portion away from the substrate 100.
  • the isolation structure 300 is disposed on the pixel defining portion, and the isolation structure 300 is equivalent to a pixel opening having a large height difference.
  • the second insulating layer 600 includes organic material and/or inorganic material.
  • the inorganic material has better compactness and higher packaging performance.
  • the substrate 100 may include a substrate and a driving circuit layer located on the substrate, the driving circuit layer includes a plurality of pixel driving circuits located in the second area 11, and the display function layer 24 is located on the driving circuit layer.
  • the pixel driving circuit may include a plurality of transistors TFT, capacitors, etc., for example, formed in various forms such as 2T1C (i.e., 2 transistors (TFT) and 1 capacitor (C)), 3T1C or 7T1C.
  • the pixel driving circuit is connected to the light emitting device 200 to control the switching state and light emitting brightness of the light emitting device 200.
  • the substrate 100 may include a substrate 1000 for carrying a driving circuit layer, and the substrate 100 may further include a buffer layer 120 located between the driving circuit layer and the substrate 1000, and the buffer layer 120 is used to isolate harmful ions (such as hydrogen ions, etc.) in the substrate 1000.
  • the driving circuit layer also includes an insulating film layer for limiting various structures of the driving circuit (such as various signal lines, electrodes of capacitors, active layers, source-drain electrodes, gate electrodes, etc. in TFTs), and these insulating film layers may include a gate insulating layer 130, an interlayer dielectric layer 140, a planar layer 150, etc.
  • the first light-transmitting opening 302 may be deepened to increase the light transmittance of the first region 13, that is, at least one of the pixel defining layer, the substrate, the buffer layer, the gate insulating layer, the interlayer dielectric layer, and the planar layer is provided with a via hole, and the via hole corresponds to and is connected to the first light-transmitting opening 302. For example, as shown in FIG.
  • the pixel defining layer 400, the buffer layer 120, the gate insulating layer 130, the interlayer dielectric layer 140, and the planar layer 150 are defined with a via hole 303, and the via hole 303 corresponds to and is connected to the first light-transmitting opening 302, that is, the provision of the via hole 303 is equivalent to increasing the depth of the first light-transmitting opening 302.
  • a plurality of vias may be provided, and the depths of the vias at different positions may be the same, or may be provided differently.
  • the depth of some vias may extend through the substrate, and the depth of some vias may only pass through the pixel defining layer 400.
  • a via may be provided under each first light-transmitting opening 302, or vias may be provided only under some of the first light-transmitting openings 302.
  • the vias are not limited to being in a grid shape.
  • the vias may be provided in a grid shape, and the grid-shaped vias may be provided to only pass through the pixel defining layer 400, or to pass through the pixel defining layer 400 and the planarizing layer 150, so as to avoid the setting of the vias affecting the circuit structure in the driving circuit layer.
  • a plurality of vias may be provided to be dispersedly arranged under the grid-shaped first light-transmitting openings.
  • the display panel 10 may further include a protective layer 800, which at least covers the light-emitting device 200 to protect the film layer of the light-emitting device 200 during the manufacturing process of the display panel.
  • the light-emitting devices 200 with different emission lights are independently manufactured, but the film layer (evaporated film layer such as a light-emitting unit, etc.) in each light-emitting device 200 is evaporated on the entire surface of the display panel during evaporation.
  • the light-emitting device 200 is classified into a light-emitting device that emits red light (R), green light (G) and blue light (B), respectively.
  • the light-emitting devices R, G and B are prepared in sequence.
  • the light-emitting device R is prepared, the light-emitting device R is formed in each isolation opening.
  • a protective layer 800 is prepared on the display panel to cover the light-emitting device G.
  • the protective layer 800 in some isolation openings used to form the light-emitting devices G and B in the final product
  • the first electrode and the light-emitting unit of the light-emitting device R are removed.
  • the protective layer 800 is used to protect the light-emitting devices R in other isolation openings.
  • the light-emitting devices G and B are prepared in sequence.
  • a protective layer 800 as shown in FIG. 35 is formed.
  • the protective layer has played a packaging effect on the light-emitting device, so the protective layer can also be called a packaging layer (only one film layer is provided) or one of the packaging layers (when there are multiple packaging film layers).
  • the display panel 10 may further include a touch electrode layer 700 .
  • the touch electrode layer 700 includes a plurality of touch electrode blocks 710, which are connected to each other to form a grid pattern having mesh holes. Accordingly, the mesh holes of the grid pattern are surrounded by a plurality of touch electrode blocks 710 connected to each other.
  • the mesh holes of the grid pattern correspond to the isolation opening 301 and the first light-transmitting opening 302, respectively, and the orthographic projections of the isolation opening 301 and the first light-transmitting opening 302 on the substrate 100 at least partially overlap with the orthographic projections of the corresponding mesh holes on the substrate 100.
  • the touch electrode layer 700 includes a plurality of parallel first touch electrodes 741 and a plurality of parallel second touch electrodes 742, the first touch electrodes 741 are formed by a plurality of touch electrode blocks 710 connected to each other along a row direction (the direction of the X-axis in FIG. 37 ), the second touch electrodes 742 are formed by a plurality of touch electrode blocks 710 connected to each other along a column direction (the direction of the Y-axis in FIG.
  • the first touch electrodes 741 and the second touch electrodes 742 are spaced apart from each other and cross each other to form a touch unit at the intersection, and the first touch electrodes 741 and the second touch electrodes 742 are arranged in a grid pattern.
  • the first touch electrode 741 is located between the second touch electrode 742 and the isolation structure 300.
  • a first conductive material layer may be deposited first, and patterned to form a plurality of first touch electrodes 741, wherein the first conductive material layer is formed into a plurality of meshes so that the first touch electrodes 741 are formed into a mesh pattern;
  • a touch insulating layer 743 is deposited on the first touch electrode 741 to cover the first touch electrode 741;
  • a second conductive material layer is deposited on the touch insulating layer 743, and patterned to form a plurality of second touch electrodes 742, wherein the second conductive material layer is formed into a plurality of meshes so that the second touch electrodes 742 are formed into a mesh pattern.
  • the area where the first touch electrode 741 and the second touch electrode 742 cross and overlap is the area where the touch unit is located, and in the overlapping area, the first
  • the orthographic projection of the mesh in the first touch electrode 741 on the substrate 100 partially overlaps with the orthographic projection of the mesh in the second touch electrode 742 on the substrate 100 to improve the transmittance of the touch electrode layer 700 .
  • the first touch electrode 741 includes a plurality of first sub-touch electrodes 7411 spaced apart from each other and a plurality of first connecting portions 7412, the plurality of first sub-touch electrodes 7411 of the same first touch electrode 741 are connected via the first connecting portions 7412, the second touch electrode 742 includes a plurality of second sub-touch electrodes 7421 spaced apart from each other and a plurality of second connecting portions 7422, the plurality of second sub-touch electrodes 7421 of the same second touch electrode 742 are connected via the second connecting portions 7422, the first connecting portions 7412 and the second connecting portions 7422 intersect and are spaced apart from each other, wherein the first sub-touch electrode 7411, the first connecting portion 7412 and the second touch electrode 742 are in the same layer, and the second connecting portion 7422 is located between the first connecting portion 7412 and the isolation structure 300, or the second connecting portion 74
  • the touch electrode layer 700 of this design has high light transmittance, and the alignment accuracy between the mesh, the isolation opening 301 and the first light-transmitting opening 302 is high, thereby improving the light transmittance of the first area 13 .
  • a first conductive material layer may be deposited first and patterned to form a plurality of first touch electrodes 741 and a second sub-touch electrode 7421 in a plurality of second touch electrodes 742, wherein the first conductive material layer is formed into a plurality of meshes so that the first touch electrodes 741 and the second sub-touch electrodes 7421 in the plurality of second touch electrodes 742 are both formed into a grid pattern;
  • a touch insulating layer 743 is deposited to cover the first touch electrode 741 and the second sub-touch electrode 7421 in the plurality of second touch electrodes 742; the touch insulating layer 743 is patterned to form a through hole exposing the second sub-touch electrode 7421; a second conductive material layer is deposited on
  • the width of the touch electrode block 710 of the grid pattern needs to be designed to be smaller than the spacing of the light-emitting units 220, that is, the orthographic projection of the touch electrode block 710 of the grid pattern on the substrate 100 is located within the orthographic projection of the isolation structure 300 on the substrate 100, so that the orthographic projections of the isolation opening 301 and the first light-transmitting opening 302 on the substrate 100 are located within the orthographic projections of the corresponding mesh holes on the substrate 100.
  • This design allows the light emitted from the display panel to have a larger angle of incidence, thereby allowing the display panel to have a larger viewing angle.
  • the distances from the touch electrode block of the grid pattern located between two adjacent isolation openings 301 to the isolation opening 301 are equal.
  • the minimum distances from the orthographic projection of any point on the touch electrode block on the substrate to the orthographic projection of the isolation opening 301 on the substrate are equal; and/or, the distances from the touch electrode block of the grid pattern located between an adjacent isolation opening 301 and a first light-transmitting opening 302 to the isolation opening 301 and the first light-transmitting opening 302 are equal.
  • the minimum distances from the orthographic projection of any point on the touch electrode block on the substrate to the orthographic projection of the isolation opening 301 and the first light-transmitting opening 302 on the substrate are equal.
  • This design can make the maximum viewing angles of the light-emitting unit in different directions roughly equal, thereby alleviating the color shift phenomenon.
  • the touch electrode block 710 of the grid pattern can be designed as a linear structure as shown in Figures 23 and 35 to 36, which is composed of straight line segments and curved line segments, and the widths of the straight line segments and the curved line segments are substantially equal.
  • “the distances from the touch electrode block to the isolation opening 301 are equal” can be understood as: the shortest distances from any point on the touch electrode block to the adjacent isolation opening 301 are equal, that is, the touch electrode block is located on the central dividing line of the adjacent isolation openings 301.
  • the meshes enclosed by the touch electrode block 710 of the grid pattern are conformal to the corresponding isolation opening and/or the first light-transmitting opening, so that the orthographic projections of different points of the touch electrode block 710 enclosing the same mesh on the substrate are equal to the minimum distance of the orthographic projections of the isolation opening or the first light-transmitting opening on the substrate.
  • the shape of the touch electrode block 710 is shown in FIG42.
  • the edge of the mesh may have a first spacing with the edge of the corresponding isolation opening, and the first spacing may be a preset value, so that the maximum viewing angles of the light-emitting unit in all directions are approximately equal.
  • the display panel 10 may further include an encapsulation layer covering the display function layer 24, which may isolate the light-emitting device 200 in the display function layer 24 and has a flattening function, so as to facilitate the setting of functional structures such as a touch function layer, a polarizer, a lens layer, and a cover plate on the encapsulation layer.
  • an encapsulation layer covering the display function layer 24 which may isolate the light-emitting device 200 in the display function layer 24 and has a flattening function, so as to facilitate the setting of functional structures such as a touch function layer, a polarizer, a lens layer, and a cover plate on the encapsulation layer.
  • the encapsulation layer may include a first inorganic encapsulation layer, an organic encapsulation layer, and a second inorganic encapsulation layer sequentially stacked on the display function layer 24, the first inorganic encapsulation layer and the second inorganic encapsulation layer having high compactness to isolate water, oxygen, etc., the organic encapsulation layer having a large thickness and having a flattening function.
  • the protective layer may be independently provided to be located between the first encapsulation layer and the display function layer 24, or may serve as the first inorganic encapsulation layer.
  • the display panel further includes a first encapsulation layer 71 on the side of the display function layer 24 facing away from the substrate 100 , and the first encapsulation layer 71 includes a first encapsulation portion 711 disposed in a plurality of isolation openings 301 .
  • the first encapsulation layer 71 is used to encapsulate and protect the light-emitting unit 220.
  • the first encapsulation layer 71 includes a plurality of first encapsulation parts 711.
  • the plurality of first encapsulation parts 711 are arranged corresponding to the plurality of isolation openings 301, that is, the plurality of first encapsulation parts 711 can be arranged corresponding to the plurality of light-emitting units 220. This design enables the plurality of first encapsulation parts 711 in the first encapsulation layer 71 to independently encapsulate the plurality of light-emitting units 220, which helps to improve the encapsulation reliability.
  • the first encapsulation portion 711 is arranged corresponding to the light-emitting unit 220, so the first encapsulation portion 711 can move together with the light-emitting unit 220 and the isolation unit 31 to meet the stretching requirements of the display panel.
  • the present embodiment does not limit the material composition of the first encapsulation layer 71.
  • the first encapsulation layer 71 includes an inorganic material.
  • the display panel further includes a second encapsulation layer 72 disposed on a side of the first encapsulation layer 71 away from the substrate 100 , and the second encapsulation layer 72 includes second encapsulation portions 721 disposed in a plurality of isolation openings 301 .
  • the first encapsulation layer 71 and the second encapsulation layer 72 are both used to achieve an encapsulation effect.
  • the structure of the second encapsulation layer 72 is similar to that of the first light-transmitting opening 302.
  • the second encapsulation layer 72 also includes a second encapsulation portion 721 corresponding to the plurality of light-emitting units 220. Therefore, the second encapsulation portion 721 can be displaced together with the isolation opening 301 and the isolation unit 31 to meet the stretching requirements of the display panel.
  • the material composition of the second encapsulation layer 72 is not limited in the embodiment of the present application.
  • the second encapsulation layer 72 includes an organic material. It should be noted that the second encapsulation portion 721 can also be filled in the first light-transmitting opening 302, and the material of the second encapsulation portion 721 and the first transparent filling portion T can be the same or different.
  • the display device 1 includes an identification device 20 and a display panel 10 in any of the above embodiments, and the orthographic projection of the identification device 20 on the substrate 100 at least partially overlaps with the first area 13 .
  • the identification device 20 includes at least one fingerprint identification sensor 21.
  • the fingerprint identification sensor 21 can be disposed on a side of the substrate 100 away from the display function layer 24, or the fingerprint identification sensor 21 can also be disposed within the substrate 100.
  • the identification device 20 may be a camera, and the camera is located on a side of the substrate 100 away from the display function layer 24 , or the camera may also be disposed inside the substrate 100 .
  • the display device may be any product or component with a display function, such as a television, a digital camera, a mobile phone, a watch, a tablet computer, a laptop computer, a navigator, or the like.
  • At least one embodiment of the present disclosure provides a method for manufacturing a display panel.
  • the following describes the manufacturing process of the display panel 10 shown in Figure 43.
  • a method for manufacturing a display panel provided by the present disclosure includes the following steps.
  • Step S10 preparing a substrate.
  • an array of first electrodes 210 may be formed on the substrate 100; an insulating material film layer (e.g., an inorganic material film layer) may be deposited on the substrate 100 on which the first electrodes 210 are formed.
  • the insulating material film layer is patterned to form a pixel defining layer 400 (with a grid-like planar shape), and the pixel defining layer 400 covers the gaps between adjacent first electrodes 210, so that the pixel defining layer 400 has a grid-like planar shape.
  • Step S20 preparing an isolation structure on the substrate, wherein the isolation structure defines an isolation opening.
  • the isolation structure defines an isolation opening.
  • a first isolation layer 310 and a second isolation layer 320 are formed on the display panel, wherein the isolation opening is formed.
  • Step S30 preparing a display function layer on the substrate, the display function layer including a light emitting device located in the isolation opening.
  • Step S40 preparing a first light-transmitting opening on the isolation structure.
  • At least one embodiment of the present disclosure further provides a method for manufacturing a display panel. The following describes the manufacturing process of the display panel 10 shown in FIG. 43 in conjunction with FIGS. 46 to 49 .
  • a substrate 100 is provided and first electrodes 210 arranged in an array are formed on the substrate 100; an insulating material film layer (e.g., an inorganic material film layer) is deposited on the substrate 100 on which the first electrodes 210 are formed; a first isolation layer 310 and a second isolation layer 320 are formed on the display panel, wherein isolation openings and first light-transmitting openings are formed (not shown in the figure, refer to the previous series of figures); a composition process is performed on the insulating material film layer to form a pixel defining layer 400 (the plane shape is a grid shape), and the pixel defining layer 400 covers the gaps between adjacent first electrodes 210, so that the plane shape of the pixel defining layer 400 is a grid shape.
  • an insulating material film layer e.g., an inorganic material film layer
  • the patterning process may be a photolithography patterning process, which may include, for example, coating a photoresist on a structure layer to be patterned, exposing the photoresist using a mask, developing the exposed photoresist to obtain a photoresist pattern, etching the structure layer using the photoresist pattern (optionally wet etching or dry etching), and then optionally removing the photoresist pattern.
  • the material of the structure layer e.g., the photoresist pattern 701 described below
  • the structure layer may be directly exposed through a mask to form a desired pattern.
  • the light-emitting unit 220 and the second electrode 230 are evaporated on the substrate 100 to form a light-emitting device 200 in each isolation opening of the isolation structure 300.
  • the evaporation in this process does not use a mask plate, so the evaporated material is also deposited on the second isolation layer 320 and in the first light-transmitting opening; then, a protective layer 800 is deposited to cover the light-emitting device 200.
  • the protective layer 800 will cover the entire second display area at this stage.
  • the evaporated light-emitting unit The light emitting layer 222 in 220 may emit red light (R), that is, at this stage, a light emitting device 200 (the first light emitting device described above) emitting red light is formed in each isolation opening of the isolation structure 300 .
  • a photoresist is formed (e.g., coated) on a substrate 100 formed with a protective layer 800, and then a composition process is performed to form a photoresist pattern 701.
  • the photoresist pattern 701 only covers a portion of the isolation opening of the isolation structure 300 (the isolation opening corresponding to the first light-emitting device after the display panel is prepared).
  • the surface of the display panel is etched using the photoresist pattern 701 as a mask to remove the protective layer 800 , the second electrode 230 and the light-emitting unit 220 covered by the photoresist pattern 701 ; and then the remaining photoresist pattern 701 is removed.
  • FIG. 46 to FIG. 49 are repeated to form a light emitting device 200 emitting green light and a light emitting device 200 emitting blue light in other isolation openings, respectively, and form a display panel as shown in FIG. 34 .
  • the embodiment of the present disclosure further provides a method for manufacturing a display panel 10.
  • the manufacturing process of the display panel 10 shown in FIG. 27 is described below in conjunction with FIG. 50 to FIG. 53.
  • the manufacturing method includes:
  • Step S01 a first light-transmitting material layer and a second light-transmitting material layer are disposed on a substrate, wherein the second light-transmitting material layer is located on a side of the first light-transmitting material layer facing away from the substrate.
  • Step S02 patterning the first light-transmitting material layer and the second light-transmitting material layer to form a first light-transmitting layer and a second light-transmitting layer, wherein the orthographic projection of the first light-transmitting layer on the substrate is within the orthographic projection of the second light-transmitting layer on the substrate, and the first light-transmitting layer and the second light-transmitting layer are stacked to form an isolation structure.
  • Step S03 preparing a light-emitting layer, wherein the light-emitting layer comprises light-emitting units spaced apart from each other and located in each isolation opening.
  • a first light-transmitting material layer and a second light-transmitting material layer are provided through step S01.
  • a first light-transmitting layer 311 and a second light-transmitting layer 321 are prepared through step S02.
  • a display function layer 24 is finally prepared through step S03, and the light-emitting unit 220 is located in the isolation opening 301 to realize light-emitting display.
  • the isolation structure 300 includes a first light-transmitting layer 311 and a second light-transmitting layer 321, and the orthographic projection of the first light-transmitting layer 311 on the substrate 100 is located within the orthographic projection of the second light-transmitting layer 321 on the substrate 100, so that the first light-transmitting layer 311 is concavely arranged relative to the second light-transmitting layer 321, so as to separate the display function layer 24 to form mutually disconnected light-emitting units 220, thereby reducing the crosstalk of carriers in the display function layer 24, and can reduce the development and use of precision mask plates, and reduce the preparation cost.
  • the first light-transmitting layer 311 and the second light-transmitting layer 321 have a high transmittance.
  • the light-transmitting isolation structure 300 can improve the photosensitivity effect of the photosensitive component.
  • the method further includes:
  • the second light-transmitting material layer is wet-etched to form a second light-transmitting layer.
  • the second light-transmitting layer 321 and the first light-transmitting layer 311 are etched in different ways, so that the etching of the first light-transmitting layer 311 and the second light-transmitting layer 321 do not affect each other, making it easier for the first light-transmitting layer 311 to be concave relative to the second light-transmitting layer 321, thereby achieving a partitioning effect on the display function layer 24 and the second electrode layer 2300.
  • a third light-transmitting material layer is disposed on the substrate 100, and the third light-transmitting material layer is located between the first light-transmitting material layer and the substrate 100.
  • the first light-transmitting layer is dry-etched so that the orthographic projection of the first light-transmitting layer on the substrate is located within the orthographic projection of the third light-transmitting layer on the substrate.
  • a third light-transmitting material layer is provided between the first light-transmitting material layer and the substrate 100.
  • the third light-transmitting material layer has a certain protective effect on the substrate 100, reducing the etching waste of the first light-transmitting material layer from entering the substrate 100, so as to improve the problem that the substrate 100 is easily invaded by the etching waste and thus damaged.
  • the orthographic projection of the first light-transmitting layer 311 on the substrate 100 is located within the orthographic projection of the third light-transmitting layer 331 on the substrate 100, that is, the bottom surface of the first light-transmitting layer 311 close to the substrate 100 is completely located in the third light-transmitting layer 331.
  • the edge of the third light-transmitting layer protrudes from the first light-transmitting layer 311, which can increase the distance between the third light-transmitting layer and the second electrode.
  • the contact area of the second electrode 230 is increased to improve the overlapping performance between the second electrode 230 and the third light-transmitting layer.
  • the method before the step of preparing the display function layer 24 on the substrate 100, the method further includes:
  • a light-transmitting metal material layer is deposited on a side of the isolation structure facing away from the substrate, and the light-transmitting metal material is wet-etched to form an overlapping portion, which overlaps a side of the isolation structure facing the isolation opening.
  • the overlapping portion 250 is arranged on the side of the isolation structure 300 facing the isolation opening 301, so that the third light-transmitting layer 331 and the second electrode 230 can be electrically connected through the overlapping portion 250 to improve the overlapping performance of the second electrode 230 and the third light-transmitting layer 331.
  • the deposited light-transmitting metal material layer can be retained on the side of the isolation structure 300 away from the substrate 100 , without affecting its light-transmitting performance.
  • some film layers in the light-emitting unit can be prepared by non-evaporation methods such as inkjet printing.
  • the specific method can be selected according to the materials of the film layers. For example, when the film layers are made of polymer materials and are not suitable for evaporation, inkjet printing can be used to prepare them.

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Abstract

本公开提供了一种显示面板和显示装置，该显示面板包括第一区，且显示面板包括基板以及位于基板上的显示功能层和隔离结构层。隔离结构层包括透光部和多个隔离开口；显示功能层，包括位于隔离开口内的发光器件；触控结构，位于隔离结构层远离基板的一侧。该显示面板可以应用至屏下识别领域。

Description

显示面板及其制备方法，和显示装置
相关申请的交叉引用
本申请要求享有于2023年6月16日提交的中国专利申请No.202310730898.7、2023年6月16日提交的中国专利申请No.202310721853.3、2023年6月27日提交的中国专利申请202310775927.1、2023年8月14日提交的中国专利申请202311029013.7的中国专利申请的优先权，该申请的全部内容通过引用结合在本申请中。
技术领域
本公开涉及显示技术领域，具体地，涉及一种显示面板及其制备方法和显示装置。
发明背景
有机发光二极管(OLED，Organic Light-Emitting Diode)是一种有机薄膜电致发光器件，其因具有制备工艺简单、成本低、功耗小、亮度高、视角宽、对比度高及可实现柔性显示等优点，而受到人们极大的关注并在电子显示产品中得到广泛应用。
然而，当前的电子显示产品限于自身结构的设计，难以再进一步减小像素间隙，进一步应用于屏下识别领域。
发明内容
本公开第一方面提供一种显示面板，该显示面板包括：基板；隔离结构层，位于基板上，其中，隔离结构层包括透光部和多个隔离开口；显示功能层，包括位于所述隔离开口内的发光器件；触控结构，位于隔离结构层远离基板的一侧。
本公开第二方面提供一种显示面板，显示面板包括：基板；隔离结构层，位于基板上，隔离结构层包括隔离结构和多个隔离开口，隔离结构上设置有透光部，隔离结构包括层叠设置的第一隔离层和第二隔离层，第一隔离层位于基板和第二隔离层之间，第一隔离层包括靠近第二隔离层的第一端部和远离第二隔离层的第二端部，第一端部在基板上的正投影位于第二端部在基板上的正投影内；显示功能层，包括位于隔离开口内的发光器件。
本公开第三方面提供一种显示面板，该显示面板包括第一区，且显示面板包括基板；显示功能层，位于基板上且至少部分位于第一区中，显示功能层包括多个发光器件，发光器件具有发光单元；以及隔离结构层，位于基板上且围合成多个隔离开口，其中，每个隔离开口中设置有至少一个发光器件，隔离结构层隔离相邻发光单元，且隔离结构层的位于第一区的部分设置有至少一个第一透光开口以使得显示面板的分布有第一透光开口的区域透光。
在上述方案中，隔离结构层的应用可以使得发光器件的制备工艺过程中不需要掩膜板，因此不需要考虑制备工艺的对位精度问题，有利于减小发光器件的间隙尺寸，以提高显示面板的像素PPI；此外，在第一区，通过在隔离结构层中设置第一透光开口，可以使得显示面板的设置有第一透光开口的区域透过，以使得显示面板的第一区可以实现屏下识别功能例如指纹识别、屏下摄像等。
本公开第四方面提供一种显示装置，该显示装置包括识别器件和上述第一方面中任一实施方式中的显示面板，识别器件在基板上的正投影与透光部在基板上的正投影至少部分重叠；优选地，识别器件包括指纹识别传感器和/或摄像头，指纹识别传感器位于基板之内； 或者，优选地，识别器件包括摄像头，摄像头位于基板的背离显示功能层的一侧和/或位于所述基板之内。
本公开第五方面提供一种显示面板的制备方法，包括：制备基板；在基板上制备隔离结构，隔离结构限定出隔离开口；在基板上制备显示功能层，显示功能层包括位于隔离开口内的发光器件；在隔离结构上制备第一透光开口。
附图简要说明
图1所示为本公开一实施例提供的一种显示面板的平面结构示意图。
图2所示为图1所示显示面板的S1区域的放大图。
图3所示为图2所示的显示面板中的隔离结构层的平面结构示意图。
图4所示为图2所示显示面板沿着M1-N1的截面图。
图5所示为图2所示显示面板沿着M2-N2的截面图。
图6为本公开一实施例提供的另一种显示面板的第一区的部分区域的放大图。
图7所示为图6所示显示面板中的隔离结构层的平面结构示意图。
图8所示为本公开一实施例提供的另一种显示面板的第一区的部分区域的放大图。
图9所示为图8所示显示面板中的隔离结构层的平面结构示意图。
图10所示为本公开一实施例提供的另一种显示面板的第一区的部分区域的放大图。
图11所示为图10所示显示面板中的隔离结构层的平面结构示意图。
图12所示为本公开一实施例提供的另一种显示面板的第一区的部分区域的放大图。
图13所示为图12所示显示面板中的隔离结构层的平面结构示意图。
图14所示为本公开一实施例提供的另一种显示面板的第一区的部分区域的放大图。
图15所示为本公开一实施例提供的另一种显示面板的第一区的部分区域的放大图。
图16所示为本公开一实施例提供的另一种显示面板的部分区域的截面图。
图17所示为本公开一实施例提供的另一种显示面板的第一区的部分区域的放大图。
图18所示为本公开另一实施例提供的一种显示面板的平面结构示意图。
图19所示为本公开另一实施例提供的一种显示面板的平面结构示意图。
图20所示为本公开再一实施例提供的一种显示面板的平面结构示意图。
图21所示为本公开又一实施例提供的一种显示面板的平面结构示意图。
图22所示为本公开又一实施例提供的一种显示面板的平面结构示意图。
图23所示为本公开又一实施例提供的一种显示面板的平面结构示意图。
图24所示为本公开另一实施例提供的一种显示面板的部分区域的截面图。
图25所示为本公开再一实施例提供的一种显示面板的部分区域的截面图。
图26所示为本公开又一实施例提供的一种显示面板的平面结构示意图。
图27所示为本公开又一实施例提供的一种显示面板的部分区域的截面图。
图28所示为本公开又一实施例提供的一种显示面板的部分区域的截面图。
图29所示为本公开又一实施例提供的一种显示面板的部分区域的截面图。
图30所示为本公开又一实施例提供的一种显示面板的部分区域的截面图。
图31所示为本公开又一实施例提供的一种显示面板的部分区域的截面图。
图32所示为本公开又一实施例提供的一种显示面板的部分区域的截面图。
图33所示为本公开又一实施例提供的一种显示面板的部分区域的截面图。
图34所示为本公开又一实施例提供的一种显示面板的部分区域的截面图。
图35所示为图23所示显示面板沿着M1-N1的截面图。
图36所示为图23所示显示面板中的触控电极层的一种网格图案的触控电极块的平面结构示意图。
图37所示为本公开又一实施例提供的一种显示面板中的触控电极层的平面结构示意图，其中图37中的S3区域对应于图1中的S1区域。
图38所示为图37所示触控电极层沿着M2-N2的截面图。
图39所示为本公开又一实施例提供的另一种显示面板中的触控电极层的平面结构示意图，其中图35中的S3区域对应于图1中的S1区域。
图40所示为图39所示触控电极层沿着M3-N3的截面图。
图41所示为图1所示显示面板在另一种设计下的S1区域的放大图。
图42所示为图41所示显示面板中的触控电极层的网格图案的触控电极块的平面结构示意图。
图43所示为本公开又一实施例提供的一种显示面板的部分区域的截面图。
图44为图43所示的显示面板的制备方法的流程图。
图45所示为本公开一实施例提供的一种显示装置的截面图。
图46为图49所示为本公开一实施例提供的显示面板的制备方法的过程图
图50至图53所示为本公开又一实施例提供的显示面板的制备方法的过程图。
图54所示为本公开又一实施例提供的一种显示面板的部分区域的截面图。
具体实施方式
下面将结合本说明书实施例中的附图，对本说明书实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅是本说明书一部分实施例，而不是全部的实施例。基于本说明书中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本说明书保护的范围。
在显示产品中，发光器件中的一些功能膜层会通过蒸镀的方式形成，而每个发光器件中的功能膜层有多种，且出射不同光线的发光器件中的一些功能膜层(例如发光层)的材料不同，因此，在通过掩膜板(例如精细掩膜板)进行蒸镀该些功能膜层时，需要进行多次对位，为了保证对位精度，不同发光器件之间需要预留足够的空间，这使得发光器件(可称为子像素)的排布密度有限，从而难以进一步提升显示面板的像素密度(PPI，Pixels Per Inch)。
在本公开中，通过在发光器件的间隙处设置隔离结构层，以对相邻发光器件的功能膜层进行隔断，如此，在功能膜层的蒸镀工艺中，只需要在显示面板上进行整面蒸镀，而不用借助掩膜板对每个发光器件的功能膜层进行单独制备，该工艺不需要考虑蒸镀时的对位精度问题，从而可以使得发光器件的间隙设计为更小的尺寸，以增加PPI。
然而，隔离结构层的设置会对发光器件的间隙进行遮挡而不能透光，从而难以应用至屏下指纹识别、屏下摄像等场景中。
本公开的实施例提供一种显示面板和显示装置，以至少解决上述技术问题。该显示面板，包括：基板；隔离结构层，位于基板上，其中，隔离结构层包括透光部和多个隔离开口；显示功能层，包括位于所述隔离开口内的发光器件；触控结构，位于隔离结构层远离基板的一侧。
在该设计中，隔离结构层的应用可以使得发光器件的制备工艺过程中不需要掩膜板，因此不需要考虑制备工艺的对位精度问题，有利于减小发光器件的间隙尺寸，以提高显示面板的像素PPI；此外，通过在隔离结构层中设置透光部，可以使得显示面板的设置有透光部的区域透过，以使得显示面板可以实现屏下识别功能例如指纹识别、屏下摄像等。
下面，结合附图对根据本公开至少一个实施例中的显示面板和显示装置的结构进行详细地说明。此外，在该些附图中，以显示面板中的基板为基准建立空间直角坐标系，以直观地呈现显示面板中各个元件的位置关系。在该空间直角坐标系中，X轴和Y轴与基板所在面平行，Z轴与基板所在面垂直。
如图1所示，显示面板10的平面区域可以划分为第一区13、第二区11和环绕第二区11的边框区12，第一区13和第二区11中可以排布有子像素(实体为发光器件200)例如R、G、B。第二区11环绕至少部分第一区13，第一区13设置为具有一定的透光率以用于 屏下识别。在本公开一些实施例中，边框区12中的部分走线可以排布至第二区11中，从而使得边框区12可以设计为单侧边框。
在本公开一些实施例中，如图1所示，在显示面板中，只有第一区13设置为透光，以用于屏下识别，即，第二区11的透光率小于第一区13的透光率，或者第二区11设置为不透光。
在本公开另一些实施例中，第一区可以设计为显示面板的全部显示区，即，不存在上述的第二区11。如此，显示面板可以应用至全屏识别，例如全屏指纹识别，或者一部分用于屏下摄像，其它部分可以都应用至屏下指纹识别等。
如图1所示，显示面板10的第一区13可以设置为位于显示面板的任意区域。例如，第一区13可以设置为位于显示面板的中间位置，也可以设置为位于显示面板的边框区12，边框区12包括显示面板的边或角区域。
在本公开一些实施例中，显示面板的第一区13在测试光下的透过率达到0.6％以上。显示面板的第一区13在可见光波长范围内的透过率达到0.6％以上，以使显示面板可以实现感光等功能。或者，显示面板的第一区13在550nm的光波下的透过率达到0.6％以上，以使显示面板可以实现感光等功能。优选的，显示面板的第一区13在可见光波长范围内的光透过率大于0.9％；或者，显示面板的第一区13在550nm的光波下的透过率达到0.9％以上。
在本公开一些实施例中，显示面板还包括设置于基板的光感元件。进一步地，光感元件在基板上的正投影与第一区13在基板上的正投影至少部分重叠。需要说明的是，部分重叠不包括完全重叠。
第一区13的透过率达到0.6％以上指测试光从显示面板的第一区13透过，检测到的透过率为0.6％以上，透过率的影响因素包括显示面板的所有膜层结构。
下面，以图1至图5所示的显示面板为例，对本公开提供的一种设计下的显示面板的具体结构进行详细地说明。
显示面板10的实体结构可以包括基板100以及位于基板100上的显示功能层24和隔离结构层，隔离结构层包括隔离结构300。显示功能层24包括多个发光器件200，发光器件200具有发光单元220。隔离结构300围合成多个隔离开口301，每个隔离开口301中设置有至少一个发光器件200。
在本公开至少一个实施例中，显示功能层24位于第一区13和第二区11中。隔离结构300隔离相邻发光单元220，且隔离结构300的位于第一区的部分设置有至少一个第一透光开口302以使得显示面板的分布有第一透光开口302的区域透光以用于进行屏下识别。
在本公开至少一个实施例中，发光器件200可以分类为出射不同颜色光线的发光器件，例如，如图2至图5所示，发光器件200至少分类为第一发光器件R(出射红光R)、第二发光器件G(出射红光G)和第三发光器件B(出射红光B)，第一发光器件R、第二发光器件G和第三发光器件B的出射光的波长依次减小。
在本公开的实施例中，第一透光开口302可以设置为多个，以根据发光器件的形状、分布方式等分散布置在发光器件的间隙处，或者，第一透光开口302也可以设置为一个，以具备更大的尺寸，从而增加第一区的透光率。
下面，通过不同的实施例，对上述两种设计下的第一透光开口302的布置情况以及对应的显示面板的结构进行详细的说明。
在本公开一些实施例中，如图1至图5所示，第一透光开口302设置为多个，且在第一区13中，第一发光器件R与第一透光开口302相邻设置。第一发光器件R(R)的出射光的波长最大，那么第一发光器件R一般具备较高的发光效率，在实际工艺中，通过优先保证在第一发光器件R的周边设置第一透光开口302，以降低或者避免第一透光开口302的设计对第二发光器件G和/或第三发光器件B的不利影响(面积减小)，从而使得显示装置可以维持良好的显示效果。
在本公开一些实施例中，第一透光开口302在基板100上的正投影的面积占第一区 11在基板100上的正投影的面积的比值不小于1％。进一步地，第一透光开口302在基板100上的正投影的面积占第一区11在基板100上的正投影的面积的比值不小于6％。优选地，第一透光开口302在基板100上的正投影的面积占第一区11在基板100上的正投影的面积的比值不小于10％。进一步优选地，第一透光开口302在基板100上的正投影的面积占第一区11在基板100上的正投影的面积的比值不小于30％。进一步优选地，第一透光开口302在基板100上的正投影的面积占第一区11在基板100上的正投影的面积的比值不小于50％。
在本公开另一些实施例中，第一透光开口302在基板100上的正投影的面积占隔离结构300在基板100上的正投影的面积的比值为1.50％-9.50％，如1.5％、2％、3％、4％、5％或5.5％。进一步地，第一透光开口302在基板100上的正投影的面积占第一区11在基板100上的正投影的面积的比值范围在6％-10％之间，如6.5％、7％、8％或9％；进一步优选地，第一透光开口302在基板100上的正投影的面积占第一区11在基板100上的正投影的面积的比值范围在10％-30％之间，如11％、12％、13％、18％、20％、21％、23％、25％、28％或29％；进一步优选地，第一透光开口302在基板100上的正投影的面积占第一区11在基板100上的正投影的面积的比值范围在30％-50％之间，如35％、40％、42％或45％。
在本公开一些实施例中，如图2和图3所示，沿第一发光器件R的长度方向，第一发光器件R和对应的第一透光开口302依次排布。该方式不需要因排布第一透光开口302而缩窄第一发光器件R的宽度，从而降低第一透光开口302的布置难度。
例如，可以通过缩减第一区13中的第一发光器件R的尺寸以为第一透光开口302的布置预留空间，即，位于第一区中的第一发光器件R的长度小于位于第二区中的第一发光器件R的长度。
在发光器件的一侧设置第一透光开口会对发光器件的尺寸(例如长度)产生影响，因此，可以选择在第一发光器件、第二发光器件和第三发光器件中的一个或者多个的一侧设置第一透光开口。下面，针对上述不同选择，通过不同的实施例进行说明。
在本公开一些实施例中，如图1至图5所示，在第一区13中，所有的第一透光开口302与第一发光器件R相邻设置，即，第一透光开口302的设置不会对第二发光器件G和第三发光器件B的出光效率造成影响。例如，在第一区13中，第二发光器件G和第三发光器件B的长度相等，且第二发光器件G的长度大于第一发光器件R的长度，即，在第一区13中，第一透光开口302的设置仅需要缩短第一发光器件R的长度。
在本公开另一些实施例中，如图6和图7所示，在第一区中，所有的第一透光开口302与第一发光器件R和第二发光器件G相邻设置，即，第一透光开口302的设置不会对第三发光器件B的出光效率造成影响。
例如，如图6和图7所示，沿第一发光器件R的长度方向，第一发光器件R和相邻的第一透光开口302依次排布，且沿第二发光器件G的长度方向，第二发光器件G和相邻的第一透光开口302依次排布。例如，在第一区中，第三发光器件B的长度大于第一发光器件R和第二发光器件G的长度，即，在第一区13中，第一透光开口302的设置需要缩短第一发光器件R和第二发光器件G的长度。
例如，在一些实施例中，与第二发光器件对应的第一透光开口的面积等于与第一发光器件对应的第一透光开口的面积。
例如，在另一些实施例中，如图6和图7所示，与第二发光器件G对应的第一透光开口302的面积小于与第一发光器件R对应的第一透光开口302的面积，如此，可以降低因设置第一透光开口302而对第二发光器件G的发光效率的影响程度。
例如，如图6和图7所示，沿着Y轴的方向(发光器件的长度方向)，与第二发光器件G对应的第一透光开口302的长度，小于与第一发光器件R对应的第一透光开口302的长度。
例如，如图8和图9所示，与第一发光器件R和第二发光器件G分别对应且彼此相邻的第一透光开口302连通，从而增加第一透光开口302的总面积，以增加第一区的透光率。 如此，在与第一发光器件R和第二发光器件G对应的第一透光开口302的长度不同的情况下，与第一发光器件R和第二发光器件G对应且彼此连通的第一透光开口302构成的开口图案呈现为阶梯状(图8中为二级阶梯)。
对于如图6至图9所示的第一透光开口302，可以通过缩减第一区中的第一发光器件R和第二发光器件G的尺寸以为第一透光开口302的布置预留空间，即，位于第一区中的第二发光器件G的长度小于位于第二区中的第二发光器件G的长度。
在本公开另一些实施例中，如图10至图11所示，在第一区中，第一发光器件R、第二发光器件G和第三发光器件B都与第一透光开口302相邻设置。
例如，如图10和图11所示，沿第二发光器件G的长度方向，第二发光器件G和对应的第一透光开口302依次排布，和/或，沿第三发光器件B的长度方向，第三发光器件B和对应的第一透光开口302依次排布。
例如，进一步地，与第二发光器件G对应的第一透光开口302的面积小于与第一发光器件R对应的第一透光开口302的面积，且与第三发光器件B对应的第一透光开口302的面积小于与第二发光器件G对应的第一透光开口302的面积，以使得第二发光器件G的长度大于第一发光器件R的长度且小于第三发光器件B的长度。例如，如图10和图11所示，沿着Y轴的方向(发光器件的长度方向)，与第二发光器件G对应的第一透光开口302的长度，小于与第一发光器件R对应的第一透光开口302的长度，且大于与第三发光器件B对应的第一透光开口302的长度。如此，在第一区中，第一发光器件R、第二发光器件G和第三发光器件B缩短的长度依次减小，从而避免部分发光效率低的发光器件例如第三发光器件B的发光效率过低而导致显示装置出现色偏。
例如，如图12和图13所示，与第一发光器件R、第二发光器件G和第三发光器件B分别对应且彼此相邻的第一透光开口302连通，从而进一步增加第一透光开口302的总面积，以进一步增加第一区的透光率。如此，与第一发光器件R、第二发光器件G和第三发光器件B对应且彼此连通的第一透光开口302构成的开口图案呈现为阶梯状(图12中为三级阶梯)。
对于如图10至图13所示的第一透光开口302，可以通过同步缩减第一区中的第一发光器件R、第二发光器件G和第三发光器件B的尺寸以为第一透光开口302的布置预留空间，即，位于第一区中的第二发光器件G的长度小于位于第二区中的第二发光器件G的长度，且位于第一区中的第三发光器件B的长度小于位于第二区中的第三发光器件B的长度。
在本公开的实施例中，在第一透光开口设置为多个的情况下，第一透光开口的布置可以根据发光器件的排布方式来进行调整，下面，通过几个具体的示例进行说明。
在本公开一些实施例中，可重新参见图2、图7至图13所示，第一发光器件R、第二发光器件G和第三发光器件B排布为多行多列，行方向可以为X轴的方向，列方向可以为Y轴的方向，第一发光器件R、第二发光器件G和第三发光器件B所在列不同，即，同一列中的发光器件的出光颜色相同，且每一行排布有第一发光器件R、第二发光器件G和第三发光器件B，例如，每一行中，相邻的第一发光器件R、第二发光器件G和第三发光器件B构成一个像素(可称为像素单元或者像素组等，每个发光器件可以称为一个子像素或者亚像素)。例如，进一步地，第一发光器件R、第二发光器件G和第三发光器件B的长度方向与列的方向相同。
在本公开另一些实施例中，如图14所示，第一发光器件R、第二发光器件G和第三发光器件B排布为多行多列，一部分列中排布有第一发光器件R和第二发光器件G，另一部分列中排布有第三发光器件B，排布有第一发光器件R的列中，第一发光器件R和第二发光器件G沿着列的方向交替排布，且排布有第一发光器件R和第二发光器件G的列，与排布有第三发光器件B的列沿着行的方向交替排布。例如，三个彼此相邻的第一发光器件R、第二发光器件G和第三发光器件B构成一个像素(可称为像素单元或者像素组等，每个发光器件可以称为一个子像素或者亚像素)。该设计可以增加第三发光器件B的设计面积(例如长度增加)，从而保证第三发光器件B的出光效率。例如，进一步地，第一发 光器件R、第二发光器件G和第三发光器件B的长度方向与列的方向相同。在该设计中，同列的第一发光器件R和第二发光器件G之间可以排布第一透光开口302。在如图14所示的设计中，每列中的第三发光器件B的数量是相邻列中的发光器件的数量的1/2左右，因此，在一些设计中，可以增加第三发光器件B的设计面积(例如增加长度)，以保证第三发光器件B的发光效率；或者，在另一些设计中，也可以保持第三发光器件B的设计面积不变，以使得相邻的第三发光器件B之间存在较大的间隙，如此，可以在相邻的第三发光器件B之间设置第一透光开口。
如图2至图14所示，针对第一透光开口302设置为多个情况，可以将隔离开口301设计为与发光器件200一一对应，以使得每个隔离开口301中只设置有一个发光器件200。
在第一透光开口302设置为网格状的情况下，每个第一透光开口302(对应于隔离开口301)中可以设置一个发光器件200(如图15所示)，也可以设置多个发光器件200。
例如，如图17所示，每个隔离开口301中设置有至少两个发光器件200，且位于同一个隔离开口301中的发光器件200的出光颜色相同。出光颜色相同的发光器件200的驱动电压的差异程度小，即便设置在同一个隔离开口301中，电流串扰的程度也会比较低。如此，通过将出射光相同的发光器件200集中在一个隔离开口301中，在不降低发光器件200的设计面积和排布密度(PPI)的情况下，可以增加位于不同的隔离开口301中且彼此相邻的发光器件200之间的距离，从而降低第一透光开口302在隔离结构300中的制备难度，以更替有利于将第一透光开口302设计为网格状。
下面，以图18至图22所示的显示面板为例，对本公开提供的另一种设计下的显示面板的具体结构进行详细地说明。
在本公开一些实施例中，如图18所示，隔离结构300包括延伸方向相交的多个隔离段26，第一透光开口302沿基板100厚度方向贯穿隔离段26设置。
隔离结构300包括多个隔离段26，至少部分不同隔离段26的延伸方向并不相同，其中，各隔离段26可以为直线段结构，或者各隔离段26也可以为曲线段61结构，或者部分隔离段26可以为直线段结构，部分隔离段26可以为曲线段61结构。当隔离段26为曲线或其他非直线结构时，该隔离段26的延伸方向为其首端与尾端的连线方向。
在本公开另一些实施例中，如图18所示，隔离结构300包括相交设置的多个隔离段26，多个隔离段26可以分为第一隔离部和第二隔离部，第一透光开口302设置于第一隔离部和第二隔离部的相交处。或者，在本公开另一些实施例中，如图19所示，第一透光开口302设置于第一隔离部，且沿第一隔离部的长度方向延伸。
通过将第一透光开口302设置在第一隔离部和第二隔离部的相交处，从而有助于提高第一透光开口302中心与相邻隔离开口301中心之间的距离，进而降低第一透光开口302对于隔离开口301的影响。当然，在另一些实施例中，第一透光开口302也可以设置在隔离段26处，本公开实施例对此不作限制。
可选地，第一透光开口302在基板100的正投影可以呈圆形结构、多边形、矩形或不规则形状。本申请对此不作限制。
在一些实施例中，如图20所示，隔离结构300包括多个隔离单元31，隔离单元31围合形成隔离开口301，至少部分相连隔离单元31间隔设置以形成第一透光开口302。
隔离结构300包括间隔设置的多个隔离单元31，不同隔离单元31的结构可以相同，也可以不同，隔离单元31围合形成隔离开口301，其中，一个隔离单元31可以仅设置有一个隔离开口301，或者一个隔离单元31也可以同时设置有多个隔离开口301，本公开实施例对此不作限制。在本公开实施例中，通过将隔离结构300设置包括多个间隔设置的隔离单元31，以在相邻隔离单元31之间形成第一透光开口302，这样有助于进一步提高显示面板中第一透光开口302的尺寸，以此提高显示面板的整体透过率，具有较强实用性。
在本公开另一些实施例中，如图15和图16所示，第一透光开口302在基板100上的正投影的形状为网格状，如此，可以增加隔离结构300在第一区的第一透光开口302的总面积，从而提高第一区的透光率。
如图15所示，在第一区中，隔离结构300会被网格状的第一透光开口302分割为彼此间隔的隔离单元31，该隔离单元31限定出隔离开口。
在本公开的实施例中，可以通过设置透明电极以将该隔离单元31连接起来，例如，如图16所示，显示面板还可以包括透明的导电层350，透明的导电层350位于隔离结构300和基板100之间，且与隔离结构300连接。导电层350具有第三开口501，第三开口501与隔离开口301对应，且隔离开口301在基板100上的正投影，位于对应的第三开口501在基板100上的正投影之内，第一透光开口302在基板100上的正投影，位于导电层在基板100上的正投影之内。如此，通过透明的导电层350可以将该些隔离单元31连接起来，以使得第一电极210仍能够通过隔离结构300和导电层350电连接以构成公共电极。
在本公开另一些实施例中，如图54所示，显示面板10还包括依次层叠设置的发光单元220和第二电极230，位于基板100靠近隔离结构300一侧且设置于第一透光开口302中。在一些实施例中，显示面板10还包括有机材料形成的一层薄膜，位于第二电极230背离显示功能层24一侧；或者，显示面板10还包括多层薄膜，位于第二电极230背离显示功能层24一侧，且具有相互不同的折射率。
同时本公开实施例可以满足显示面板的拉伸需要，具体地说，由于隔离单元31彼此间隔设置，因此当显示面板需要拉伸处理时，不同隔离单元31之间的相对距离可以在外力等因素的作用下增大，而发光器件200仅对应于隔离单元31的隔离开口301设置，相邻隔离单元31之间并不存在有发光器件200。因此当隔离单元31位置发生改变时，发光器件200能够随隔离单元31一同移动，并使得位于不同隔离单元31处的不同发光器件200之间的距离能够增大，以此实现不同发光器件200之间相对位置的调整，满足拉伸需要。
在一些实施例中，隔离单元31设有多个隔离开口301。即多个发光器件200可以对应同一隔离单元31设置。可选地，至少部分不同颜色的发光器件200位于同一隔离单元31的多个隔离开口301内。
在一些实施例中，至少部分发光器件200在第一方向X上并排设置，至少部分隔离单元31在第一方向X上并排设置。
为了提高显示面板的显示效果，通常情况下，发光器件200会按照特定的规律进行排布，以提高显示面板的显示均一性。进一步地，至少部分发光器件200会在第一方向X上并排设置。具体地，这里提到“至少部分发光器件200会在第一方向X上并排设置”指的是：至少部分发光器件200彼此间隔设置，且部分发光器件200的中心连线平行与第一方向X。其中，可以相同颜色的发光器件200在第一方向X上并排设置，或者也可以是不同颜色的发光器件200在第一方向X上并排设置，本公开实施例对此不作限制。
结合前述内容可知，隔离结构300的存在可以在发光器件200制备过程中，使得发光器件200的形成，无需借助精细金属掩膜板，而是整面蒸镀然后通过刻蚀去除部分位置处的发光材料。因此隔离结构300的存在会对发光器件200的制备产生较大影响，同时会对发光器件200的相对位置产生一定的影响。
在此基础上，本公开实施例将隔离结构300设置为至少部分隔离单元31在第一方向X上并排设置，从而使得隔离单元31的排布方式可以遵循至少部分发光器件200的排布方式，以此使得隔离单元31的布局更具规律性。然后在发光器件200制备过程中，有助于控制至少部分发光器件200能够在第一方向X上并排设置，以此提高显示面板的显示均一性。此外，多个隔离单元31在第一方向X上并排设置，可以确保多个隔离单元31在第一方向X上能够间隔形成第一透光开口302，以此提高透光显示效果。并且还可以满足显示面板在第一方向X上的拉伸需要，以此实现拉伸效果。
此外，在本公开实施例中，由于多个隔离单元31彼此间隔设置，因此隔离单元31也有从侧面隔绝水氧入侵至发光器件200的作用，从而能够与封装层一同对发光器件200起到封装保护作用，提高对发光器件200的封装效果。
可以是全部隔离单元31均在第一方向X上并排设置，或者也可以是仅部分隔离单元31在第一方向X上并排设置，其他隔离单元31沿其他方向并排设置，本公开实施例对此 不作限制。
在一些实施例中，显示功能层24包括多个重复单元D，重复单元D包括多个发光器件200，同一重复单元D中的至少部分发光器件200在第一方向X上并排设置。
多个重复单元D平移重复以形成显示面板的像素排布结构，各重复单元D中发光器件200的数量、种类以及相对位置关系均相同。其中，在同一重复单元D中，可以是相同颜色的发光器件200在第一方向X上并排设置，也可以是不同颜色的发光器件200在第一方向X上并排设置。
对于重复单元D中发光器件200的组成以及排布规律，本公开实施例不作限制，图2中位于虚框内的多个发光器件200指的是位于同一重复单元D中的多个发光器件200，但是图20中并不构成对重复单元D中发光器件200的组成以及排布规律的限制，具体重复单元D的结构需要根据实际使用需要决定，本公开实施例对此不作限制。
进一步地，由于同一重复单元D中的至少部分发光器件200以及至少部分隔离单元31均沿第一方向X排布，因此在设计隔离结构300以及发光器件200时，可以将同一重复单元D中的不同发光器件200分设在不同隔离单元31中，并将至少部分相邻隔离单元31设置为沿第一方向X并排设置，以便后续发光器件200制备时，确保同一重复单元D中的至少部分发光器件200在第一方向X上并排设置。
当然在另一些实施例中，显示功能层24包括重复单元D，重复单元D包括多个发光器件200，至少部分重复单元D在第一方向X上并排设置。
这样的话，可以在设计隔离结构300以及发光器件200时，将不同重复单元D中的不同发光器件200分设在不同隔离单元31中，并将至少部分相邻隔离单元31设置为沿第一方向X并排设置，以便后续发光器件200制备时，确保形成的至少部分重复单元D能够在第一方向X上并排设置。
进一步可选地，同一重复单元D内的各发光器件200位于同一隔离单元31内的多个隔离开口301。
由于单个隔离单元31本身为连续结构且自身很难发生形变，因此在显示面板拉伸过程中，位于同一隔离单元31内的多个发光器件200能够保持相对位置固定。在此基础上，本公开实施例将同一重复单元D内的各发光器件200位于同一隔离单元31内的多个隔离开口301，从而在显示面板拉伸过程中，确保重复单元D内的各发光器件200之间的相对位置关系能够保持固定，以使各重复单元D的发光效果能够保持不变，降低单个重复单元D出现色偏的风险，提高重复单元D的发光可靠性。
在一些实施例中，请参阅图21，部分隔离单元31在第二方向Y上并排设置，第一方向X与第二方向Y相交。示例性地，第一方向X与第二方向Y垂直。
在本公开实施例中，不同隔离单元31可以分别沿第一方向X以及第二方向Y并排设置。这样使得显示面板在第一方向X以及第二方向Y上的不同位置处均存在有第一透光开口302，以此有助于提高显示面板的整体透过率，进一步满足透光显示或显示面板的感光需要。此外，这种设计可以满足显示面板至少在第一方向X以及第二方向Y上的拉伸变形，以便进一步增大显示面板的尺寸，具有更强的拉伸适用性。
除了第一方向X以及第二方向Y外，部分隔离单元31也可以沿其他方向并排设置，具体取决于显示面板的拉伸需要以及显示功能层24中发光器件200的排布需要等因素，本公开实施例对此不作限制。
在一些实施例中，显示功能层24包括多个重复单元D，重复单元D包括多个发光器件200，同一重复单元D中的至少部分发光器件200在第二方向Y上并排设置。
由于同一重复单元D中的至少部分发光器件200以及部分隔离单元31均沿第二方向Y排布，因此在设计隔离结构300以及发光器件200时，可以将同一重复单元D中的不同发光器件200分设在不同隔离单元31中，并将至少部分相邻隔离单元31设置为沿第二方向Y并排设置，以便后续发光器件200制备时，确保同一重复单元D中的至少部分发光器件200在第二方向Y上并排设置。
在一些实施例中，显示功能层24包括多个重复单元D，重复单元D包括多个发光器件200，至少部分重复单元D在第二方向Y上并排设置。
这样的话，可以在设计隔离结构300以及发光器件200时，将不同重复单元D中的不同发光器件200分设在不同隔离单元31中，并将至少部分相邻隔离单元31设置为沿第二方向Y并排设置，以便后续发光器件200制备时，确保形成的至少部分重复单元D能够在第二方向Y上并排设置。
在一些实施例中，请参阅图22，任意不同发光器件200分设在不同隔离单元31中，即各隔离单元31中仅设置有一个隔离开口301。示例性地，隔离单元31在基板100的正投影呈环状结构。
这样设计使得任意相邻发光器件200之间均存在有第一透光开口302，以此能够进一步增大第一透光开口302在显示面板中的尺寸占比，从而进一步提高透光显示效果，或者进一步提高显示面板的感光效果。此外，还能够在显示面板拉伸过程中，实现任意发光器件200之间相对距离的增大，以此有助于进一步提高显示面板拉伸后的整体尺寸，提高显示面板的变形量，具有更强的灵活性。
在本公开至少一个实施例中，可以对隔离开口301的形状(相当于像素的形状)进行设计，以在不降低像素的发光面积(发光单元的有效发光面积)和像素密度PPI的情况下，增加隔离开口之间的间隙，以便于设置较大面积的透光开口，具体如下。
在本公开至少一个实施例中，可参见图23，隔离开口301的至少两个相对的端部为弧形。该设计可以使得隔离开口301的设计面积不变(发光单元的发光面积不变)以及显示面板的像素密度不变的情况下，使得相邻隔离开口301之间存在较大的尺寸，以便于设计更大面积的第一透光开口302，以进一步提高第一区13的透光率。
在本公开至少一个实施例中，隔离开口301和第一透光开口302分别在基板上的正投影与网格图案在基板的正投影的网格轮廓共形。在某些实施例中，第一透光开口302为圆形；或者，第一透光开口302为矩形；或者，第一透光开口302的边缘与相邻的隔离开口301的边缘共形。在某些实施例中，第一透光开口302的至少两个相对的端部为弧形；隔离开口301的至少两个相对的端部为弧形。
在本公开至少一个实施例中，如图24所示，显示面板还包括设置于至少部分第一透光开口302内的第一透明填充部T。
第一透明填充部T指的是由较高透过率材料形成的结构，其中，第一透明填充部T设置在至少部分第一透光开口302内，第一透明填充部T的存在不会对第一透光开口302处的透过率产生过多影响，有助于实现透明显示效果。并且第一透明填充部T还可以对上方部分膜层起到一定的支撑作用，以降低显示面板的制备难度并提高制备良率。
需要说明的是，对于第一透明填充部T的材料组成，本申请实施例制作限制。可选地，第一透明填充部T还可以包括有弹性材料，弹性材料的存在可以满足显示面板的拉伸需要。可选地，第一透明填充部T可以包括有机材料。
在本公开至少一个实施例中，如图1至图5所示发光器件200包括在基板100包括在基板100的第一电极层2100和第二电极层2300，发光单元220位于第一电极层2100和第二电极层2300之间。发光单元220可以包括第一共通层221、发光层222和第二共通层223，第一共通层221、发光层222和第二共通层223依次叠置在第一电极层2100上。第一共通层221可以包括空穴注入层、空穴传输层、电子阻挡层等，第二共通层223。第二共通层223可以包括电子注入层、电子传输层、空穴阻挡层等。隔离结构300的设置需要使得各个发光器件200的第一共通层221(导致电流串扰的主要膜层)在电性上彼此断开。
第一电极层2100设有第一电极210，第二电极层2300设有第二电极230，第二电极230的数量为多个，多个第二电极230与发光单元220对应设置，第一电极210与第二电极230共同驱动控制发光单元220的发光与否。示例性地，第一电极210为阴极，第二电极230为阳极。或者，第一电极210为阳极，第二电极230为阴极。
在一些实施例中，第二电极230如阴极可以为透明电极。进一步地，透明电极的材料 包括透明金属氧化物，例如包括铟锡氧化物(ITO)、铟锌氧化物(IZO)、铝锌氧化物(AZO)、FTO、掺杂银的氧化铟锡及掺杂银的氧化铟锌中的至少一种，或者也可以采用三层结构，其中的第一层与第三层的材料可为透明金属氧化物，例如可以是铟锡氧化物(ITO)、铟锌氧化物(IZO)或铝锌氧化物(AZO)，中间的第二层的材料可为金属，如银或铜。第一电极210可以为反射电极或透明电极，反射电极材料可以是银或铜或镁银合金。发光层222可以为有机发光层，其中，有机发光层可以只包括单层结构，例如只包括有机发光材料层；也可以包括多层结构，例如可以包括从第二电极230至第一电极210依次设置的空穴注入层、空穴传输层、有机发光材料层、电子传输层和电子注入层等功能膜层，有机发光层的具体结构根据实际应用设置，在此不做具体限定。可选的，隔离结构300可以使得各个发光单元220的功能膜层相互绝缘，以减少各个发光单元220之间的横向串扰。
在本公开至少一个实施例中，隔离结构300的至少部分为导电结构32(例如下述的第一隔离层310)，导电结构32与相邻的发光器件200的第二电极230电连接，且与第一电极210间隔。如此，各个发光器件200的第二电极230可以通过隔离结构300的导电结构32电连接起来以构成公共电极，从而仍可以适用当前显示面板的第二电极230的驱动方式(例如通过一条或者少量几条公共电极线驱动)。
在本公开的实施例中，隔离结构300可以设计为上宽下窄，以使得第一共通层221(导致电流串扰的主要膜层)在蒸镀时被隔离结构300断开。例如，如图4和图5所示，隔离结构300的导电结构32的面向基板100的一端在基板100上的正投影，位于导电结构32的背离基板100的一端在基板100上的正投影之内。
在本公开的实施例中，在保证隔离结构层为上宽下窄的情况下，对隔离结构层的具体形状不作进一步限制，下面，通过实施例对隔离结构层的几种设置方式进行简述。
例如，在本公开一些实施例中，如图4和图5所示，隔离结构300包括层叠的第一隔离层310和第二隔离层320，第一隔离层310位于基板100和第二隔离层320之间，第一隔离层310在基板100上的正投影位于第二隔离层320在基板100上的正投影之内，且第一隔离层310为导电结构32。例如，进一步地，沿与基板100垂直的方向，第一隔离层310的截面形状为正梯形，且第二隔离层320位于第一隔离层310的顶边。在此情况下，可以便于第二电极230的蒸镀材料在第一隔离层310的侧壁上沉积，以提高第二电极230和第一隔离层310的搭接良率。
在本公开一些实施例中，第一隔离层310包括靠近第二隔离层320的第一端部和远离所述第二隔离层320的第二端部，第一端部在基板100上的正投影位于第二端部在基板100上的正投影内。第一端部在基板100上的正投影位于第二端部在基板100上的正投影内表示第一端部在基板100上的正投影的面积小于第二端部在基板100上的正投影且第二端部在基板100上的正投影覆盖第一端部在基板100上的正投影。
在本公开另一些实施例中，隔离结构300为一体化结构。例如，进一步地，沿与基板垂直的方向，隔离结构300的截面形状为倒梯形，倒梯形的顶边朝向基板。该设计下，隔离结构300的侧壁为内切结构，从而增加隔离结构300的隔断效果。
例如，在本公开的实施例中，导电结构32可以为金属导电结构，金属材料的导电率高，可以降低驱动第一电极时的压降。相应地，金属材料只有厚度极薄的情况下才可能透光，而隔离结构300需要一定的厚度以用于隔断发光单元，因此隔离结构300中的导电结构32(例如下述第一隔离层310)几乎为不透光的，因此，只有通过设置第一透光开口302才可以使得隔离结构300透光。
在本公开一些实施例中，第一隔离层310的材料包括透明金属氧化物；其中，透明金属氧化物为氧化铟锡、氧化铟锌中的至少一种。
在本公开另一些实施例中，隔离结构300还包括第三隔离层330，第三隔离层330设置在第一隔离层310紧邻基板100的一侧，第三隔离层330在基板100上的正投影覆盖第一隔离层310在基板100上的正投影。优选的，第三隔离层330包括导电结构32。具体地，导电结构32位于第一隔离层310与基板100之间。
在本公开至少一个实施例中，如图4和图5所示，显示功能层24还可以包括像素界定层400，像素界定层400位于隔离结构300和基板100之间，且包括用于限定发光器件200的多个第四开口201，第四开口201与隔离开口301对应以用于暴露第一电极210。如此，通过设置像素界定层400可以间隔隔离结构300的导电部分和第一电极210，从而使得第一电极210可以具备更大的设计尺寸，以提高发光器件200的主发光区域的面积(相当于提高开口率)。需要说明的是，第四开口201所在的区域可以表示发光器件的主发光区域。
例如，在本公开一些实施例中，隔离结构300在基板100上的正投影与像素界定层400在基板100上的正投影重合，即，第四开口201与隔离开口301正对且面积相等，以使得隔离结构300完全覆盖发光器件的间隙。
例如，在本公开另一些实施例中，隔离结构300在基板100上的正投影位于像素界定层400在基板100上的正投影之内，即，第四开口201的面积小于隔离开口301的面积，如此可以增加发光器件的出光角度，以增加显示面板的显示图像的视角。
在本公开一些实施例中，除了第四开口201外，如图5所示，像素界定层400还增设了第二通孔202，第二通孔202与第四开口201间隔设置，第二通孔202在所述基板100的正投影与第一透光开口302在基板100的正投影交叠设置。第一透光开口302在基板100的正投影位于第二通孔202在基板100的正投影内。这种设计可以进一步提高显示面板在第一透光开口302处的透过率，以此提高透明显示效果。进一步可选地，第二通孔202内也可以设置有第一透明填充部T的至少部分结构。
在一些实施例中，隔离结构300中的第一隔离层310至少部分位于第二通孔202内，并覆盖像素界定层400侧壁的至少部分。
在本公开实施例中，第一隔离层310的至少部分可以延伸至第二通孔202中，并能够覆盖像素界定层400侧壁的至少部分，这样设计使得第一隔离层310能够对像素界定层400朝向第二通孔202的侧壁起到保护作用，增强显示面板的结构可靠性。
在本公开至少一个实施例中，如图20至图22所示，显示面板还包括设置于基板100一侧的第二走线，第二走线在基板100的正投影与第一透光开口302在基板100的正投影至少部分交叠。
具体地，第二走线包括设置于基板100一侧的第一信号线60，第一信号线60包括曲线段61，曲线段61在基板100的正投影与第一透光开口302在基板100的正投影至少部分交叠。
第一信号线60与隔离结构300位于基板100的同一侧，第一信号线60可以位于隔离结构300朝向基板100的一侧，或者第一信号线60也可以与隔离结构300中部分结构同层设置，本申请实施例对此不作限制。并且对于第一信号线60的种类以及整体延伸方向等，本申请实施例也不作限制。可选地，第一信号线60可以为数据线，用于传输数据信号；或者第一信号线60可以为电源线，用于传输电源信号给第一电极210或第二电极230。
由前述内容可知，由于隔离单元31彼此间隔设置，当显示面板拉伸时，相邻隔离单元31之间的距离逐渐增大，整个显示面板的尺寸逐渐增大。在此基础上，本申请实施例在第一信号线60中设置有曲线段61，相较于直线结构，曲线段61能够在外力等因素的作用下具有较大的伸长量，从而能够满足显示面板的拉伸需要。
进一步地，曲线段61在基板100的正投影与第一透光开口302在基板100的正投影至少部分交叠，即曲线段61在基板100的正投影位于相邻隔离单元31在基板100的正投影之间。这种设计可以在相邻隔离单元31之间距离逐渐增大的同时，使得曲线段61可以随隔离单元31的移动发生变形并逐渐伸直，从而满足显示面板的拉伸需要，以此降低因显示面板拉伸导致第一信号线60出现断裂的风险，提高显示面板内部信号传递的可靠性。
对于曲线段61的具体形状以及尺寸，本申请实施例不作限制。示例性地，曲线段61在基板100的正投影可以呈“S”形。本申请实施例将第一信号线60与第一隔离层310电连接设置，使得第一信号线60中的特定信号可以借助第一隔离层310实现传递。对于第 一隔离层310与第一信号线60之间的连接方式，本申请实施例不作限制。示例性地，第一信号线60位于第一隔离层310朝向基板100的一侧，第一信号线60与第一隔离层310通过过孔实现相互电连接。
在一些实施例中，第一信号线60与第一隔离层310同层设置。
由前述内容可知，相邻隔离单元31彼此间隔设置，而相邻隔离单元31之间并不会设置有发光单元220等部分膜层。在此基础上，可以在相邻隔离单元31之间填充部分支撑膜层，然后将第一信号线60设置在该支撑膜层上，以使第一信号线60能够与第一隔离层310同层且电连接设置，以此能够降低第一信号线60对下方阵列层空间的占用，满足显示面板的布线需要。
在一些实施例中，第一信号线60包括间隔设置的多个导电分段，导电分段与第一隔离层310电连接。
在本申请实施例中，第一信号线60可以与第一隔离层310同层且电连接设置，因此第一信号线60可以借助第一隔离层310实现信号传递，在此基础上，第一信号线60可以包括间隔设置的多个导电分段，相邻导电分段可以借助第一隔离层310实现彼此之间信号的传递。进一步地，导电分段可以包括有曲线段61，用以满足显示面板的拉伸需要。
下面，以图25至图27所示的显示面板为例，对本公开提供的另一种设计下的显示面板的具体结构进行详细地说明。
在本公开至少一个实施例中，如图25和图26所示，显示面板10包括：基板100；基板100开设有第二透光开口110；隔离结构300，位于基板100的一侧，隔离结构300围合形成隔离开口301和第一透光开口302，第二透光开口110和第一透光开口302连通，第二透光开口110在基板100正投影在第一透光开口302在基板100正投影之内；显示功能层24，位于基板100的一侧，显示功能层24包括位于隔离开口301的发光单元220。
在一些实施例中第一透光开口302在所述基板100上的形状包括圆形或者方形，使得第一透光开口302形状较为规律，使得用于蒸镀隔离结构300的掩膜板结构简单，便于掩膜板的制备，降低开发难度。
在一些实施例中，第二透光开口110为多个，显示面板10设置多个第二透光开口110，以提高显示面板10的整体透过率，从而提升显示面板10的使用性能。
请参阅图27，图27是另一实施例中显示面板的局部剖视图。
在一些实施例中，如图27所示，基板100还包括衬底1000和阵列层2000，阵列层2000位于衬底1000靠近显示功能层24的一侧，第二透光开口110包括贯穿阵列层2000的第一通孔111，能够提高显示面板10在第二透光开口110处的透过率。
在一些实施例中，第一通孔111在基板100的正投影在第一透光开口302在基板100的正投影之内，第一通孔111与第一透光开口302完全连通，增大第一通孔111在基板100的正投影与第一透光开口302在基板100的正投影的交叠区域面积，即增大显示面板10透过率较高的位置面积，从而提高显示面板10整体透过率。
在本公开一些实施例中，阵列层2000包括多条走线，多条走线在衬底1000上的正投影与第一透光开口302在衬底1000上的正投影错位(不重叠)或部分重叠。其中，部分重叠指多条走线在衬底1000上的正投影与第一透光开口302在衬底1000上的正投影不完全重叠，不包括多条走线在衬底1000上的正投影与第一透光开口302在衬底1000上的正投影完全重叠的情况，不包括多条走线在衬底1000上的正投影完全覆盖第一透光开口302在衬底1000上的正投影的情况。
此外，在一些实施例中，阵列层2000包括驱动晶体管T，驱动晶体管T的源极接收数据驱动信号，驱动晶体管T的漏极与第二电极230电连接，驱动晶体管T的栅极接收到栅极扫描信号之后，驱动晶体管T的源极和漏极导通，源极将数据驱动信号通过漏极传输至第二电极230，以通过第二电极230与第一电极210之间的电压差，驱动发光器件200发光。当然，阵列层2000还包括其他晶体管和电容，以实现信号向驱动晶体管T的传输等。
在本公开一些实施例中，透光部在基板100上的正投影的面积小于发光器件200在基板10上的正投影的面积。当然，本发明并不仅限于此，在另一些实施例中，在保证像素分辨率不变的情况下，也可以通过增大透光部在基板100上的正投影的面积，如使得透光部在基板100上的正投影的面积大于或等于发光器件200在基板100上的正投影的面积，来提高显示面板的光透过率。
在本公开一些实施例中，第二电极230如阳极在基板100上的正投影至少部分覆盖驱动晶体管T在基板100上的正投影，或者，透光部在基板100上的正投影至少部分不覆盖驱动晶体管T在基板100上的正投影，以通过第二电极230如阳极的反射作用避免光线照射到驱动晶体管T的同时，进一步避免驱动晶体管T影响透光部的光透过率。
在本公开一些实施例中，阵列层2000还可以包括多个层叠设置的导电层，以及位于相邻导电层之间的第一绝缘层，阵列层2000内设有电路结构，用于满足显示面板的使用需要。示例性地，第一信号线60可以位于阵列层2000中。
在一些实施例中，显示面板10还包括第二透明填充部，第二透明填充部填充第二透光开口110设置。第二透明填充部对第二透光开口110进行填充，使得第二透光开口110处较为平坦，以便于后续制备其他膜层。第二透明填充部包括透明材料，在使得显示面板10在第二透光开口110平坦化的情况下，还能够保证显示面板10在第二透光开口110处具有较高的透过率，提高显示面板10的使用性能。
下面，以图28至图30所示的显示面板为例，对本公开提供的另一种设计下的显示面板的具体结构进行详细地说明。
请参阅图28，图28是本公开实施例提供的一种显示面板的局部剖视图。
如图28所示，本公开提供一种显示面板10，显示面板10包括基板100、隔离结构300和显示功能层24；隔离结构300位于基板100上，隔离结构300包括透光部，透光部限定隔离开口301。进一步地，透光部采用透光材料。
在本公开一些实施例中，透光部在测试光下的透过率大于0.6％，如透过率大于1％、3％、5％、8％、10％、12％、15％、18％、20％或25％。透光部在可见光波长范围内的光透过率大于30％，优选的，透光部在可见光波长范围内的光透过率大于50％；优选的，透光部在可见光波长范围内的光透过率大于60％；优选的，透光部在可见光波长范围内的光透过率大于70％，以使显示面板可以满足屏下指纹和屏下摄像头等对透过率的要求。其中测试光可以为可见光或近红外光，测试光的波长可以为550nm或940nm。
在本公开一些实施例中，隔离结构300包括沿厚度方向层叠设置的第一透光层311和第二透光层321，第二透光层321位于第一透光层311背离基板100的一侧，第一透光层311在基板100的正投影位于第二透光层321在基板100的正投影之内；显示功能层24包括相互间隔设置并位于各隔离开口301的发光单元220。
根据本公开实施例的显示面板10，显示面板10包括基板100、隔离结构300、显示功能层24。隔离结构300设置于基板100上并围合形成多个隔离开口301。隔离结构300包括第一透光层311和第二透光层321，第一透光层311在基板100的正投影位于第二透光层321在基板100的正投影之内，使得第一透光层311相对于第二透光层321内凹设置，以将显示功能层24进行隔断形成相互断开的发光单元220，从而减少载流子在显示功能层24内的串扰，并可能够减少精密掩膜版的开发和使用，降低制备成本。发光单元220位于隔离开口301内以实现发光显示。第一透光层311和第二透光层321具有较高的透过率，当显示面板10设置有感光组件时，透光的隔离结构300能够提高感光组件的感光效果。
请参阅图29，图29是另一实施例中显示面板的局部剖视图。
如图29所示，在一些可选的实施例中，隔离结构300还包括第三透光层331，第三透光层331位于第一透光层311朝向基板100的一侧。
在本公开一些实施例中，第三透光层331同样具有较高的透过率，保证隔离结构300的透光效果。第三透光层331位于第一透光层311与基板100之间，当对第一透光层311 进行刻蚀时，第三透光层331对基板100具有一定保护作用，减少第一透光层311的刻蚀废料进入基板100，以改善基板100容易受到刻蚀废料的入侵从而造成损害问题。
在一些可选的实施例中，显示面板10还包括第二电极层2300，第二电极层2300位于各显示功能层24背离基板100的一侧，第二电极层2300包括相互间隔设置并位于各隔离开口301的第二电极230，第三透光层331包括导电材料，第二电极230和第三透光层331电连接。
在本公开一些实施例中，第二电极层2300通过隔离结构300断开形成位于各隔离开口301内的第二电极230，第二电极230和第三透光层331电连接，使得相互间隔的第二电极230能够通过隔离结构300相互电连接以形成整面电极。
可选的，第三透光层331包括透光导电层，第三透光层331既具有较高的透过率也具有较好的导电性，增大显示面板10透过率的同时，还能够保证第二电极230通过第三透光层331相互电连接。
可选的，第二透光层321和第三透光层331包括氧化铟锡(ITO)和氧化铟锌(IZO)中的至少一者，氧化铟锡(ITO)、氧化铟锌(IZO)均具有较高的透过率和导电性，增大显示面板10透过率的同时，还能够保证第二电极230通过第三透光层331相互电连接。
可选的，第三透光层331包括透光金属层，增大显示面板10透过率的同时，还能够保证第二电极230通过第三透光层331相互电连接。例如，第三透光层331包括厚度较小的银金属层。
可选的，第一透光层311包括无机透光层，例如，第一透光层311包括氮化硅(SiN)或者氧化硅(SiO)，第一透光层311为无机透光材料，增大显示面板10透过率的同时，无机材料的第一透光层311与第二透光层321以及第三透光层331可采用不同的刻蚀方式，使得第一透光层311单独刻蚀，便于使得第一透光层311相对于第二透光层321内凹设置，从而实现对显示功能层24和第二透光层321的隔断作用。
可选的，第一透光层311包括透光金属层，例如，第一透光层311包括金属银(Ag)薄膜，第一透光层311同样具有较高的透过率和较好的导电性，第二电极230既可以通过第三透光层331相互电连接，也可以通过第一透光层311相互电连接。当隔离结构300仅由第一透光层311和第二透光层321组成时，第一透光层311包括透光导电层，第二电极230与第一透光层311电连接，以实现各第二电极230的相互电连接。
可选的，第二透光层321包括透光金属层，第二透光层321与第三透光层331同样为透光金属层，能够进一步提高显示面板10的透过率。
可选的，第一透光层311沿显示面板10厚度方向的横截面形状包括梯形。第一透光层311横截面形状为梯形时，一方面能够稳固的对第二透光层321进行支撑，另一方面，实现第一透光层311相当于第二透光层321的内凹设置，便于第二电极230在隔离结构300位置断开。
在一些可选的实施例中，第一透光层311在基板100的正投影位于第三透光层331在基板100的正投影之内。
在这些可选的实施例中，第一透光层311在基板100的正投影位于第三透光层331在基板100的正投影之内，即第一透光层311靠近基板100一侧的底面完全位于第三透光层331之上，第一透光层311朝向隔离开口301的侧面相对第三透光层331内凹设置，当制备第二电极230时，第三透光层331边缘突出第一透光层311设置，能够增大第三透光层331与第二电极230的接触面积，以提高第二电极230与第三透光层331的搭接性能。
如图30所示，图30为本发明实施例公开的另一种显示面板的剖面结构示意图，在一些可选的实施例中，显示面板10包括搭接部250，搭接部250搭接于隔离结构300朝向隔离开口301的一侧且与第三透光层331电连接，搭接部250与第二电极230电连接。
在这些可选的实施例中，搭接部250设置于隔离结构300朝向隔离开口301的一侧，使得第三透光层331和第二电极230能通过搭接部250进行电连接，以提高第二电极230与第三透光层331的搭接性能。
可选的，搭接部250搭接于第三透光层331朝向隔离开口301的一侧，以使第三透光层331通过搭接部250和第二电极230电连接。
可选的，搭接部250同时搭接于第一透光层311和第三透光层331朝向隔离开口301的一侧，当第一透光层311和第三透光层331均为导电材料时，第二电极230通过搭接部250同时搭接第一透光层311和第三透光层331，进一步提高第二电极230与隔离结构300的搭接性能。
可选的，搭接部250包括透光金属材料，使得第二电极230与隔离结构300搭接的同时，还能够提高显示面板10的透过率。在一些可选的实施例中，发光单元220与隔离结构300间隔设置。
在这些可选的实施例中，发光单元220与隔离结构300相互间隔，使得各发光单元220难以通过隔离结构300相互电连接，进一步减少载流子在各发光单元220之间的串扰。
在一些可选的实施例中，发光单元220与隔离结构300间隔设置形成间隙360，部分搭接部250位于间隙360。
在这些可选的实施例中，当制备搭接部250时，部分搭接部250沉积至间隙360内，以填充间隙360并与第三透光层331接触，提高搭接部250和第三透光层331之间的搭接性能。
如图31所示，图31为本发明实施例公开的另一种显示面板的剖面结构示意图，隔离结构300还包括非透光部112，非透光部112部分包围透光部。
在一些实施例中，非透光部112仅包围第一透光层311和第二透光层321，并未包围第三透光层331中的透明导电层，以使透明导电层能够与第二电极230电连接，当然，本发明并不仅限于此，在另一些实施例中，非透光部112仅包围透光部如第一透光层311、第二透光层321和第三透光层331的部分侧壁，以使暴露出的侧壁能够使透明导电层与第二电极230电连接。
在一些可选的实施例中，如图32所示，基板100还包括第二绝缘层600，第二绝缘层600包括遮盖部610和由遮盖部610围合形成的第三通孔620，遮盖部610覆盖第一电极210的侧表面，第一电极210的部分区域由第三通孔620露出，第三通孔620与隔离开口301连通。
在一些实施例中，第二电极230由第三通孔620露出。第二电极230和第一电极210中的一者作为发光单元220的阳极，另一者作为发光单元220的阴极。本公开实施例以第二电极230作为发光单元220的阳极，第一电极210作为发光单元220的阴极进行举例说明。第二绝缘层600的遮盖部610围合形成第三通孔620，以设置发光单元220，实现发光单元220的正常发光。并且遮盖部610定义各发光单元220的设置区域，减少各发光单元220之间的串色不良。遮盖部610覆盖第一电极210的侧表面，以实现遮盖部610对第一电极210的侧表面进行绝缘包边，以减少水汽通过遮盖部610入侵，提高显示面板10的使用寿命。
如图32所示，在一些可选的实施例中，隔离结构300位于遮盖部610上。在这些可选的实施例中，隔离结构300设置于遮盖部610上，隔离结构300相当于第三通孔620具有较大的高度落差。当制备显示功能层24时，由于落差较大，显示功能层24在隔离结构300位置更容易断开，降低显示功能层24的制备难度。
如图33所示，在一些可选的实施例中，隔离结构300位于遮盖部610上。
在这些可选的实施例中，隔离结构300遮盖部610上设有容纳开口640，隔离结构300位于容纳开口640内，隔离结构300设置在遮盖部610上的容纳开口640内，在制备过程中，隔离结构300制备步骤在第一电极210的制备之前，即在基板100上制备完隔离结构300之后，再在基板100上制备第一电极210，以减小隔离结构300的制备对第一电极210的影响，保证第一电极210不被损坏。
在一些可选的实施例中，遮盖部610的数量为多个，一个遮盖部610覆盖一个第一电 极210的侧边并围绕第一电极210的侧边呈环形设置，隔离结构300位于相邻遮盖部610之间的间隔内，隔离结构300设置相邻遮盖部610之间的间隔内，在制备过程中，隔离结构300制备步骤在第一电极210的制备之前，即在基板100上制备完隔离结构300之后，再在基板100上制备第一电极210，以减小隔离结构300的制备对第一电极210的影响，保证第一电极210不被损坏。且多个遮盖部610间隔设置，使得水汽难以在各遮盖部610之间进行延伸入侵，提高显示面板10的使用寿命。
在一些可选的实施例中，第二绝缘层600包括像素限定层400，第二绝缘层600复用为像素界定层400，遮盖部610复用为像素限定部，第三通孔620复用为第四开口201，隔离结构300位于像素限定部背离基板100的一侧。在这些可选的实施例中，隔离结构300设置于像素限定部上，隔离结构300相当于像素开口具有较大的高度落差。当制备显示功能层24时，由于落差较大，显示功能层24在隔离结构300位置更容易断开，降低显示功能层24的制备难度。
可选的，第二绝缘层600包括有机材料和/或无机材料，第二绝缘层600包括无机材料时，无机材料致密性较好，封装性能更高。
在一些可选的实施例中，基板100可以包括衬底以及位于衬底上的驱动电路层，驱动电路层包括位于第二区11中的多个像素驱动电路，显示功能层24位于该驱动电路层上。例如，像素驱动电路可以包括多个晶体管TFT、电容等，例如形成为2T1C(即2个晶体管(TFT)和1个电容(C))、3T1C或者7T1C等多种形式。像素驱动电路与发光器件200连接，以控制发光器件200的开关状态以及发光亮度。
例如，如图34所示，基板100可以包括衬底1000以用于承载驱动电路层，且基板100还可以包括位于驱动电路层和衬底1000之间的缓冲层120，缓冲层120用于隔离衬底1000中的有害离子(例如氢离子等)。驱动电路层还包括用于限位驱动电路的各个结构(例如各个信号线、电容的电极、TFT中的有源层、源漏电极、栅电极等)的绝缘膜层，该些绝缘膜层可以包括栅绝缘层130、层间介质层140和平坦层150等。
在本公开的实施例中，可以加深第一透光开口302以增加第一区13的透光率，即，像素界定层、衬底、缓冲层、栅绝缘层、层间介质层和平坦层中的至少一个设置有过孔，过孔与第一透光开口302对应且彼此连通。例如，如图34所示，像素界定层400、缓冲层120、栅绝缘层130、层间介质层140和平坦层150限定有过孔303，该过孔303与第一透光开口302对应且彼此连通，即，过孔303的设置等效于增加了第一透光开口302的深度。
在本公开的实施例中，过孔可以设置为多个，不同位置的过孔的深度可以相同，或者可以设置为不同，例如，部分过孔的深度可以延伸至透过衬底，部分过孔的深度可以仅仅透过像素界定层400；此外，在第一透光开口302设置为多个的情况下，可以选择每个第一透光开口302之下都设置有过孔，或者，可以选择仅在部分第一透光开口302之下设置过孔；另外，在第一透光开口302设置网格状的情况下，过孔不限于为网格状，例如，过孔可以设置为网格状，该网格状的过孔设置为仅透过像素界定层400，或者透过像素界定层400和平坦层150，以免过孔的设置对驱动电路层中的电路结构造成影响，或者，过孔可以设置为多个，以分散布置在网格状第一透光开口之下。
在本公开至少一个实施例中，如图35所示，显示面板10还可以包括保护层800，该保护层800至少覆盖发光器件200以在显示面板的制备工艺过程中对发光器件200的膜层进行保护。出射光不同的发光器件200是独立制作的，但是每个发光器件200中的膜层(蒸镀膜层例如发光单元等)在蒸镀时是在显示面板上整面蒸镀的。例如，发光器件200分类为分别出射红光(R)、绿光(G)和蓝光(B)的发光器件，在制备过程中，发光器件R、G、B依次制备，在制备发光器件R时，每个隔离开口中都形成发光器件R，在显示面板上制备保护层800以覆盖发光器件G，然后将部分隔离开口(最终产品中用于形成发光器件G、B)中的保护层800以及发光器件R的第一电极和发光单元去除，在此过程中，保护层800用于保护其它隔离开口中的发光器件R，基于该方式再依次制备发光器件G、B， 最终形成如图35所示的保护层800。
保护层对于发光器件来说已经起到了封装的效果，因此保护层也可以称为封装层(仅设置一个膜层)或者封装层(多个封装膜层时)中的一个膜层。
在本公开的至少实施例中，如图23所示，显示面板10还可以包括触控电极层700。
触控电极层700包括多个触控电极块710，触控电极块710彼此连接以构成具有网孔的网格图案，相应地，该网格图案的网孔由多个彼此连接的触控电极块710围设而成，网格图案的网孔与隔离开口301和第一透光开口302分别对应，且隔离开口301和第一透光开口302分别在基板100上的正投影都与对应的网孔在基板100上的正投影至少部分重叠。
在本公开至少一个实施例中，如图23以及图35至图38所示，触控电极层700包括多条并列的第一触控电极741和多条并列的第二触控电极742，第一触控电极741由多个触控电极块710沿着行的方向(图37中X轴的方向)彼此连接构成，第二触控电极742由多个触控电极块710沿着列的方向(图37中Y轴的方向)彼此连接构成，第一触控电极741和第二触控电极742彼此间隔且彼此交叉以在交叉处构成触控单元，且第一触控电极741和第二触控电极742设置为网格图案。
例如，在本公开一些实施例中，如图37和图38所示，第一触控电极741位于第二触控电极742和隔离结构300之间。例如，可以先沉积第一导电材料层，对其进行构图以形成多条第一触控电极741，其中，将第一导电材料层形成为多个网孔，以使得第一触控电极741形成为网格图案；在第一触控电极741上沉积触控绝缘层743以覆盖第一触控电极741；在触控绝缘层743上沉积第二导电材料层，对其进行构图以形成多条第二触控电极742，其中，将第二导电材料层形成为多个网孔，以使得第二触控电极742形成为网格图案。在宏观上，第一触控电极741和第二触控电极742交叉重叠的区域为触控单元所在的区域，而在该重叠区域，第一触控电极741和第二触控电极742都呈现透明。
例如，在如图37和图38所示的结构中，第一触控电极741中的网孔在基板100上的正投影和第二触控电极742中的网孔在基板100上的正投影部分重合，以提高触控电极层700的透光率。
例如，在本公开另一些实施例中，如图39和图40所示，第一触控电极741包括多个彼此间隔的第一子触控电极7411和多个第一连接部7412，同一条第一触控电极741的多个第一子触控电极7411通过第一连接部7412连接，第二触控电极742包括多个彼此间隔的第二子触控电极7421和多个第二连接部7422，同一条第二触控电极742的多个第二子触控电极7421通过第二连接部7422连接，第一连接部7412和第二连接部7422交叉且彼此间隔，其中，第一子触控电极7411、第一连接部7412和第二触控电极742同层，且第二连接部7422位于第一连接部7412和隔离结构300之间，或者，第二连接部7422位于第一连接部7412背离隔离结构300的一侧。该设计下的触控电极层700的透光率高，且网孔与隔离开口301和第一透光开口302的对位精度高，从而可以提高第一区13的透光率。例如，可以先沉积第一导电材料层，对其进行构图以形成多条第一触控电极741和多条第二触控电极742中的第二子触控电极7421，其中，将第一导电材料层形成为多个网孔，以使得第一触控电极741和多条第二触控电极742中的第二子触控电极7421都形成为网格图案；沉积触控绝缘层743以覆盖第一触控电极741和多条第二触控电极742中的第二子触控电极7421；对触控绝缘层743进行构图以形成暴露第二子触控电极7421的通孔；在触控绝缘层743上沉积第二导电材料层，对其进行构图以形成第二触控电极742中的第二连接部7422，第二连接部7422通过通孔与第二子触控电极7421连接。在该设计中，第一触控电极741和第二触控电极742的主体部分同层设计，从而不需要考虑两者的网孔对位问题，有利于提高，触控电极层700的透光率。
在本公开至少一个实施例中，可重新参见图23和图35至图36，网格图案的触控电极块710的宽度需要设计为小于发光单元220的间距，即，网格图案的触控电极块710在基板100上的正投影，位于隔离结构300在基板100上的正投影之内，以使得隔离开口301和第一透光开口302在基板100上的正投影，位于对应的网孔在基板100上的正投影之内。 该设计可使得显示面板出射的光线具有较大的射角，从而使得显示面板具备较大的视角。
在本公开至少一个实施例中，可重新参见图23和图35至图36，位于相邻两个隔离开口301之间的网格图案的触控电极块至隔离开口301的距离相等对于相邻的两个隔离开口301以及位于相邻两个隔离开口301之间的网格图案的触控电极块，触控电极块上的任一点在基板上的正投影分别至隔离开口301在基板上的正投影的最小距离相等；和/或，位于相邻隔离开口301和第一透光开口302之间的网格图案的触控电极块至隔离开口301和第一透光开口302的距离相等对于相邻的两个隔离开口301和第一透光开口302以及位于相邻两个隔离开口301和第一透光开口302之间的网格图案的触控电极块，触控电极块上的任一点在基板上的正投影分别至隔离开口301和第一透光开口302在基板上的正投影的最小距离相等。该设计可以使得发光单元在不同方向的最大视角大致相等，从而可以缓解色偏现象。
例如，在本公开一些实施例中，网格图案的触控电极块710可以设计为如图23和图35至图36所示的线性结构，该线性结构由直线段和曲线段连接构成，直线段和曲线段的各个部分的宽度基本相等。例如，“触控电极块至隔离开口301的距离相等”，可以理解为：触控电极块上的任一点至相邻隔离开口301的最短距离相等，即，触控电极块位于相邻隔离开口301的中心分界线上。
例如，在本公开另一些实施例中，如图41和图42所示，网格图案的触控电极块710围设的网孔与对应的隔离开口和/或第一透光开口共形，以使得围设同一个网孔的触控电极块710的不同点在基板上的正投影，与隔离开口或者第一透光开口在基板上的正投影的最小距离相等。在此情况下，触控电极块710的形状如图42所示。在此情况下，为了保证显示面板的视角，可以将网孔的边缘与对应的隔离开口的边缘具有第一间距，该第一间距可以为预设值，以使得发光单元在各个方向上的最大视角大致相等。
在本公开的至少实施例中，显示面板10还可以包括覆盖显示功能层24的封装层，该封装层可以隔绝显示功能层24中的发光器件200，并且具有平坦化功能，以便于在封装层上设置触控功能层、偏光片、透镜层、盖板等功能结构。例如，该封装层可以包括依次叠置在显示功能层24上的第一无机封装层、有机封装层和第二无机封装层，第一无机封装层和第二无机封装层的致密性高以隔绝水氧等，有机封装层具有较大的厚度，且具有平坦化功能。例如，在显示面板中设置前述提及的保护层的情况下，该保护层可以独立设置以位于第一封装层和显示功能层24之间，或者，可以充当第一无机封装层。
具体地，在本公开的实施例中，如图24所述，在一些实施例中，显示面板还包括显示功能层24背离基板100一侧的第一封装层71，第一封装层71包括分设于多个隔离开口301内的第一封装部711。
第一封装层71用于对发光单元220起到封装保护作用，第一封装层71包括多个第一封装部711，多个第一封装部711与多个隔离开口301对应设置即多个第一封装部711能够与多个发光单元220对应设置。这种设计使得第一封装层71中的多个第一封装部711能够对多个发光单元220进行独立封装，有助于提高封装可靠性。
同时相邻隔离单元31之间位置处不会连续存在有第一封装层71中的材料，因此第一封装层71的存在不会对显示面板的拉伸产生较大影响。而第一封装部711与发光单元220对应设置，因此第一封装部711可以随发光单元220以及隔离单元31一同位移，满足显示面板的拉伸需要。
对于第一封装层71的材料组成，本申请实施例不作限制。示例性地，第一封装层71包括无机材料。
同理在一些实施例中，如图24所示，显示面板还包括设置于第一封装层71背离基板100一侧的第二封装层72，第二封装层72包括分设于多个隔离开口301内的第二封装部721。
第一封装层71与第二封装层72均用于实现封装效果，第二封装层72与第一封装层 71的结构类似，第二封装层72同样包括对应多个发光单元220设置的第二封装部721，因此第二封装部721可以随隔离开口301以及隔离单元31一同位移，满足显示面板的拉伸需要。对于第二封装层72的材料组成，本申请实施例不作限制。示例性地，第二封装层72包括有机材料。需要说明的是，第二封装部721也可填充于第一透光开口302中，第二封装部721与第一透明填充部T的材料可以相同也可以不同。
本公开至少一个实施例提供一种显示装置，如图45所示，显示装置1包括识别器件20和上述任一实施例中的显示面板10，识别器件20在基板100上的正投影与第一区13至少部分重叠。
例如，在本公开一些实施例中，识别器件20包括至少一个指纹识别传感器21。例如，指纹识别传感器21可以设置在基板100的背离显示功能层24的一侧，或者，指纹识别传感器21也可以设置在基板100之内。
例如，在本公开另一些实施例中，识别器件20可以为摄像头，摄像头位于基板100的背离显示功能层24的一侧，或者，指摄像头也可以设置在基板100之内。
例如，在本公开的实施例中，显示装置可以为电视、数码相机、手机、手表、平板电脑、笔记本电脑、导航仪等任何具有显示功能的产品或者部件。
以上仅为本说明书的较佳实施例而已，并不用以限制本说明书，凡在本说明书的精神和原则之内，所作的任何修改、等同替换等，均应包含在本说明书的保护范围之内。
本公开至少一个实施例提供一种显示面板的制备方法，下面，对图43所示的显示面板10的制备过程进行描述。如图44所示，本公开提供的一种显示面板的制备方法包括下述步骤。
步骤S10，制备基板。其中，制备基板100后，可以在基板100上形成阵列排布的第一电极210；在形成有第一电极210的基板100上沉积绝缘材料膜层(例如无机材料膜层)。可选地，对绝缘材料膜层进行构图工艺以形成像素界定层400(平面形状为网格状)，像素界定层400覆盖相邻第一电极210的间隙，如此，像素界定层400的平面形状为网格状。
步骤S20，在基板上制备隔离结构，隔离结构限定出隔离开口。例如，在显示面板上形成第一隔离层310和第二隔离层320，其中形成隔离开口。
步骤S30，在基板上制备显示功能层，显示功能层包括位于隔离开口内的发光器件。步骤S40，在隔离结构上制备第一透光开口。
本公开至少一个实施例还提供一种显示面板的制备方法，下面，结合图46至图49对图43所示的显示面板10的制备过程进行描述。
如图46所示，提供基板100并在基板100上形成阵列排布的第一电极210；在形成有第一电极210的基板100上沉积绝缘材料膜层(例如无机材料膜层)；在显示面板上形成第一隔离层310和第二隔离层320，其中形成隔离开口和第一透光开口(图中未示出，可参见前面系列的附图)；对绝缘材料膜层进行构图工艺以形成像素界定层400(平面形状为网格状)，像素界定层400覆盖相邻第一电极210的间隙，如此，像素界定层400的平面形状为网格状。
在本公开的实施例中，构图工艺可以为光刻构图工艺，例如可以包括：在需要被构图的结构层上涂覆光刻胶，使用掩模板对光刻胶进行曝光，对曝光的光刻胶进行显影以得到光刻胶图案，使用光刻胶图案对结构层进行蚀刻(可选湿刻或者干刻)，然后可选地去除光刻胶图案。在结构层(例如下述的光刻胶图案701)的材料包括光刻胶的情况下，可以通过掩模板对该结构层直接曝光以形成所需要的图案。
如图47所示，在基板100上蒸镀发光单元220和第二电极230，以在隔离结构300的每个隔离开口中都形成发光器件200，该过程中的蒸镀未采用掩膜板，因此蒸镀的材料也会在第二隔离层320上沉积，且也会在第一透光开口中沉积；然后沉积形成保护层800以覆盖发光器件200，保护层800在该阶段会覆盖整个第二显示区。例如，蒸镀的发光单元 220中的发光层222可以为出射红光(R)，即，在该阶段，隔离结构300的每个隔离开口中都形成有出射红光的发光器件200(上述的第一发光器件)。
如图48所示，在形成有保护层800的基板100上形成(例如涂覆等)光刻胶，然后对其进行构图工艺以形成光刻胶图案701，光刻胶图案701仅覆盖隔离结构300的一部分隔离开口(显示面板制备完成后的第一发光器件对应的隔离开口)。
如图49所示，以光刻胶图案701为掩膜对显示面板的表面进行刻蚀，去除为被光刻胶图案701覆盖的保护层800、第二电极230和发光单元220；然后去除残留的光刻胶图案701。
重复上述图46至图49的步骤，以在其它隔离开口中分别形成出射绿光的发光器件200和出射蓝光的发光器件200，并形成如图34所示的显示面板。
本公开实施例还提供一种显示面板10的制备方法，下面，结合图50至图53对图27所示的显示面板10的制备过程进行描述。制备方法包括：
步骤S01：在基板上设置第一透光材料层和第二透光材料层，第二透光材料层位于第一透光材料层背离基板的一侧。
步骤S02：对第一透光材料层和第二透光材料层进行图案化处理形成第一透光层和第二透光层，第一透光层在基板的正投影位于第二透光层在基板的正投影之内，第一透光层和第二透光层层叠形成隔离结构。
步骤S03：制备发光层，发光层包括相互间隔设置并位于各隔离开口的发光单元。
根据本申请实施例的制备方法，如图50所示，通过步骤S01设置第一透光材料层和第二透光材料层。如图51和图52所示，通过步骤S02制备第一透光层311和第二透光层321。如图53所示，最后通过步骤S03制备显示功能层24，发光单元220位于隔离开口301内以实现发光显示。隔离结构300包括第一透光层311和第二透光层321，第一透光层311在基板100的正投影位于第二透光层321在基板100的正投影之内，使得第一透光层311相对于第二透光层321内凹设置，以将显示功能层24进行隔断形成相互断开的发光单元220，从而减少载流子在显示功能层24内的串扰，并可能够减少精密掩膜版的开发和使用，降低制备成本。第一透光层311和第二透光层321具有较高的透过率，当显示面板10设置有感光组件时，透光的隔离结构300能够提高感光组件的感光效果。
在一些可选的实施例中，在对第一透光材料层和第二透光材料层进行图案化处理形成第一透光层311和第二透光层321步骤中，方法还包括：
对第一透光材料层进行干刻形成第一透光层；
对第二透光材料层进行湿刻形成第二透光层。
在这些可选的实施例中，第二透光层321与第一透光层311采用不同的刻蚀方式，使得第一透光层311与第二透光层321的刻蚀互不影响，便于使得第一透光层311相对于第二透光层321内凹设置，从而实现对显示功能层24和第二电极层2300的隔断作用。
在一些可选的实施例中，基板100上设置有第三透光材料层，第三透光材料层位于第一透光材料层与基板100之间，在对第一透光材料层进行干刻形成第一透光层311步骤之后，方法还包括：
对第三透光材料层层进行湿刻形成第三透光层；
对第一透光层进行干刻，以使第一透光层在基板的正投影位于第三透光层在基板的正投影之内。
在这些可选的实施例中，在第一透光材料层和基板100之间设置有第三透光材料层，当对第一透光材料层进行刻蚀时，第三透光材料层对基板100具有一定保护作用，减少第一透光材料层的刻蚀废料进入基板100，以改善基板100容易受到刻蚀废料的入侵从而造成损害问题。第一透光层311在基板100的正投影位于第三透光层331在基板100的正投影之内，即第一透光层311靠近基板100一侧的底面完全位于第三透光层331，当制备第一电极410时，第三透光层边缘突出第一透光层311设置，能够增大第三透光层与第二电 极230的接触面积，以提高第二电极230与第三透光层的搭接性能。
在一些可选的实施例中，在基板100上制备显示功能层24步骤之前，方法还包括：
在隔离结构背离基板的一侧沉积透光金属材料层，对透光金属材料进行湿刻形成搭接部，搭接部搭接于隔离结构朝向隔离开口的一侧。
在这些可选的实施例中，搭接部250设置于隔离结构300朝向隔离开口301的一侧，使得第三透光层331和第二电极230能通过搭接部250进行电连接，以提高第二电极230与第三透光层331的搭接性能。
当然，在对透光金属材料进行湿刻形成搭接部250，位于隔离结构300背离基板100的一侧可保留沉积的透光金属材料层，并不影响其透光性能。
依照本申请如上文所述的实施例，这些实施例并没有详尽叙述所有的细节，也不限制该发明仅为所述的具体实施例。显然，根据以上描述，可作很多的修改和变化。本说明书选取并具体描述这些实施例，是为了更好地解释本申请的原理和实际应用，从而使所属技术领域技术人员能很好地利用本申请以及在本申请基础上的修改使用。本申请仅受权利要求书及其全部范围和等效物的限制。
在本公开的一些实施例中，发光单元中的部分膜层例如发光层，可以使用非蒸镀的方式例如喷墨打印来制备，具体可以根据该些膜层的材料来选择，例如，在该些膜层为高分子材料而不适用蒸镀的情况下，可以使用喷墨打印来制备。

Claims (31)

  1. 一种显示面板，包括：
    基板；
    隔离结构层，位于所述基板上，其中，所述隔离结构层包括透光部和多个隔离开口；
    显示功能层，包括位于所述隔离开口内的发光器件；
    触控结构，位于所述隔离结构层远离所述基板的一侧。
  2. 根据权利要求1所述的显示面板，其中，所述透光部包括第一透光开口，所述隔离结构层包括隔离结构，所述隔离结构限定所述隔离开口，所述第一透光开口设置于所述隔离结构。
  3. 根据权利要求2所述的显示面板，其中，沿所述发光器件的出光方向，所述第一透光开口贯穿所述隔离结构，所述第一透光开口与所述隔离开口间隔设置。
  4. 根据权利要求2所述的显示面板，其中，所述显示面板包括第一区，所述透光部设置于所述第一区，所述第一透光开口在所述基板上的正投影的面积占所述第一区在所述基板上的正投影的面积的比值不小于1％。
  5. 根据权利要求2所述的显示面板，其中，所述显示面板包括第一区，所述透光部设置于所述第一区，在所述第一区内，所述透光部在所述基板上的正投影的面积占所述隔离结构在所述基板上的正投影的面积的比值为1.50％-9.50％。
  6. 根据权利要求2所述的显示面板，其中，所述显示面板的第一区在测试光下的透过率达到0.6％以上。
  7. 根据权利要求6所述的显示面板，其中，所述显示面板的第一区在可见光波长下的透过率达到0.6％以上。
  8. 根据权利要求6所述的显示面板，其中，所述显示面板的第一区在940nm的光波下的透过率达到0.9％以上。
  9. 根据权利要求2所述的显示面板，其中，所述显示面板包括第一区，所述透光部设置于所述第一区，所述显示面板还包括设置于基板的光感元件，所述光感元件在所述基板上的正投影与所述第一区在所述基板上的正投影至少部分重叠。
  10. 根据权利要求2所述的显示面板，其中，所述隔离结构包括相交设置的第一隔离部和第二隔离部，所述第一透光开口设置于所述第一隔离部和所述第二隔离部的相交处。
  11. 根据权利要求2所述的显示面板，其中，所述隔离结构包括沿第一方向延伸的第一隔离部，所述第一透光开口设置于所述第一隔离部，且沿所述第一隔离部的长度方向延伸；
    所述第一透光开口为圆形、多边形、矩形或不规则形状。
  12. 根据权利要求2所述的显示面板，其中，所述第一透光开口与所述隔离开口内的发光器件间隔设置，所述发光器件包括第一发光器件、第二发光器件和第三发光器件，所述第一发光器件与所述第一透光开口相邻设置；
    所述第一发光器件、所述第二发光器件和所述第三发光器件的出射光的波长依次减小；所述第一发光器件、所述第二发光器件和所述第三发光器件在列排布方向上的长度不相等且依次增大；分别与所述第一发光器件、所述第二发光器件和所述第三发光器件对应的所述第一透光开口的面积依次减小并连通。
  13. 根据权利要求2所述的显示面板，其中，所述显示面板还包括第二电极层，位于所述显示功能层背离所述基板的一侧，所述第二电极层包括相互间隔设置并位于各所述隔离开口的第二电极，以及
    所述隔离结构包括层叠的第一隔离层和第二隔离层，所述第一隔离层位于所述基板和所述第二隔离层之间，所述第一隔离层在所述基板上的正投影位于所述第二隔离层在所述基板上的正投影之内，所述第一隔离层与所述第二电极电连接。
  14. 根据权利要求13所述的显示面板，其中，所述隔离结构还包括第三隔离层，所述第三隔离层设置于所述第一隔离层靠近所述基板的一侧，所述第一隔离层在所述基板上的正投影位于所述第三隔离层在所述基板上的正投影之内。
  15. 根据权利要求2所述的显示面板，还包括：第一透明填充部，填充于所述第一透光开口。
  16. 根据权利要求2所述的显示面板，其中，所述显示功能层包括有机材料层和第二电极层，部分所述有机材料层和部分所述第二电极层设置于所述第一透光开口内。
  17. 根据权利要求2所述的显示面板，其中，所述基板包括：
    衬底；
    阵列层，位于所述衬底靠近所述显示功能层的一侧，所述阵列层包括第一走线，所述第一走线在所述衬底上的正投影与所述第一透光开口在所述衬底上的正投影不重叠或部分重叠。
  18. 根据权利要求2所述的显示面板，其中，所述基板包括设于所述基板上的第二透光开口，所述第二透光开口与所述第一透光开口连通；
    所述第二透光开口在所述基板上的正投影与所述第一透光开口在所述基板正投影至少部分重叠。
  19. 根据权利要求1所述的显示面板，其中，所述透光部采用透光材料，所述透光部限定所述隔离开口。
  20. 根据权利要求19所述的显示面板，其中，所述透光部在测试光下的透过率大于0.6％。
  21. 根据权利要求19所述的显示面板，其中，所述透光部包括层叠的第一透光层和第二透光层，所述第一透光层位于所述基板和所述第二透光层之间，所述第一透光层在所述基板上的正投影位于所述第二透光层在所述基板上的正投影之内；
    所述第一透光层和第二透光层包括透光导电材料，或者，所述第二透光层包括所述透光导电材料，所述第一透光层包括透明有机层和透明无机层中的至少一种
    所述透光导电材料包括铟锡氧化物、铟锌氧化物、铝锌氧化物、掺杂银的氧化铟锡及掺杂银的氧化铟锌中的至少一种。
  22. 根据权利要求1所述的显示面板，其中，所述隔离结构层还包括隔离结构，所述隔离结构包围至少部分所述透光部。
  23. 根据权利要求1所述的显示面板，其中，所述显示面板还包括：
    像素界定层，位于所述隔离结构层和所述基板之间，且包括用于限定所述发光器件的多个第四开口，所述隔离开口在所述基板上的正投影与所述第四开口在所述基板上的正投影至少部分重合，所述第四开口暴露所述第一电极；
    所述隔离结构层在所述基板上的正投影与所述像素界定层在所述基板上的正投影至少部分重合。
  24. 根据权利要求1所述的显示面板，其中，还包括：封装层，所述封装层位于所述隔离结构层和所述显示功能层背离所述基板的一侧；所述封装层包括在远离所述基板的方向上依次层叠设置的第一封装层、第二封装层和第三封装层；
    所述透光部包括第一透光开口，所述隔离结构层包括隔离结构，所述第一透光开口设置于所述隔离结构；部分所述第二封装层设置于所述第一透光开口内。
  25. 根据权利要求1所述的显示面板，其中，还包括触控电极层，所述触控电极层包括若干个触控电极，所述触控电极限定出至少一个触控开口，所述触控开口在所述基板上的正投影与所述透光部在所述基板上的正投影至少部分重叠。
  26. 一种显示面板，所述显示面板包括：
    基板；
    隔离结构层，位于所述基板上，所述隔离结构层包括隔离结构和多个隔离开口，所述隔离结构上设置有透光部，所述隔离结构包括层叠设置的第一隔离层和第二隔离层，所述 第一隔离层位于所述基板和所述第二隔离层之间，所述第一隔离层包括靠近所述第二隔离层的第一端部和远离所述第二隔离层的第二端部，所述第一端部在所述基板上的正投影位于所述第二端部在所述基板上的正投影内；
    显示功能层，包括位于所述隔离开口内的发光器件。
  27. 一种显示面板，包括第一区，其中，所述显示面板包括：
    基板；
    显示功能层，位于所述基板上且至少部分位于所述第一区中，所述显示功能层包括多个发光器件，所述发光器件具有发光单元；以及
    隔离结构层，位于所述基板上且围合成多个隔离开口，其中，每个所述隔离开口中设置有至少一个发光器件，所述隔离结构层隔离相邻所述发光单元，且所述隔离结构层的位于所述第一区的部分设置有至少一个第一透光开口以使得所述显示面板的分布有所述第一透光开口的区域透光。
  28. 根据权利要求27所述的显示面板，其中，
    在所述第一区中，所有的所述第一透光开口与所述第一发光器件相邻设置，优选地，在所述第一区中，所述第二发光器件和所述第三发光器件在列排布方向上的长度相等，且所述第二发光器件在列排布方向上的长度大于所述第一发光器件在列排布方向上的长度；
    或者，
    在所述第一区中，所有的所述第一透光开口与所述第一发光器件和所述第二发光器件相邻设置；沿所述第一发光器件的列排布方向，所述第一发光器件和相邻的所述第一透光开口依次交替排布，且沿所述第二发光器件的列排布方向，所述第二发光器件和相邻的所述第一透光开口依次交替排布；与所述第一发光器件和所述第二发光器件分别对应且彼此相邻的所述第一透光开口连通；
    或者，
    在所述第一区中，所述第一发光器件、所述第二发光器件和所述第三发光器件都与所述第一透光开口相邻设置；沿所述第二发光器件的列排布方向，所述第二发光器件和对应的所述第一透光开口依次交替排布，和/或，沿所述第三发光器件的列排布方向，所述第三发光器件和对应的所述第一透光开口依次交替排布；与所述第一发光器件、所述第二发光器件和所述第三发光器件分别对应且彼此相邻的所述第一透光开口连通；
    所述显示面板还包括第二区，所述第二区环绕所述第一区的至少部分，且所述第二区的透光率小于所述第一区的透光率。
  29. 一种显示装置，包括识别器件和如权利要求1-28中任一项所述的显示面板，其中，所述识别器件在所述基板上的正投影与所述透光部在所述基板上的正投影至少部分重叠。
  30. 根据权利要求29所述的显示装置，其中，所述识别器件包括指纹识别传感器和/或摄像头，所述识别器件位于所述基板的背离所述显示功能层的一侧或位于所述基板内。
  31. 一种显示面板的制备方法，包括：
    制备基板；
    在所述基板上制备隔离结构，所述隔离结构限定出隔离开口；
    在所述基板上制备显示功能层，所述显示功能层包括位于所述隔离开口内的发光器件；
    在所述隔离结构上制备第一透光开口；或者
    制备基板；
    在所述基板上制备隔离结构，所述隔离结构限定出隔离开口和第一透光开口；
    在所述基板上制备显示功能层，所述显示功能层包括位于所述隔离开口内的发光器件。
PCT/CN2024/099419 2023-06-16 2024-06-14 显示面板及其制备方法，和显示装置 Ceased WO2024255889A1 (zh)

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