Classifications

• • G—PHYSICS
  • G02—OPTICS
  • G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
  • G02C7/00—Optical parts
  • G02C7/02—Lenses; Lens systems ; Methods of designing lenses
• • G—PHYSICS
  • G02—OPTICS
  • G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
  • G02C7/00—Optical parts
  • G02C7/02—Lenses; Lens systems ; Methods of designing lenses
  • G02C7/021—Lenses; Lens systems ; Methods of designing lenses with pattern for identification or with cosmetic or therapeutic effects
• • G—PHYSICS
  • G02—OPTICS
  • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
  • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
  • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
  • G02B1/11—Anti-reflection coatings
  • G02B1/113—Anti-reflection coatings using inorganic layer materials only
  • G02B1/115—Multilayers

Definitions

• the present invention relates to eyeglass lenses and eyeglasses.
• Some eyeglass lenses are made by coating the optical surface of the lens substrate with a thin film such as a hard coat or anti-reflection film.
• Claim 1 and 4 of Patent Document 1 describe that a laser is applied to an inner layer (preferably consisting essentially of tin) that absorbs the marking wavelength more than any layer between the electromagnetic wave source and the inner layer, thereby removing the inner layer over at least a portion of the thickness of the inner layer and any layer between the electromagnetic wave source and the inner layer.
• an inner layer preferably consisting essentially of tin
• the irradiation step is carried out by emitting a focused beam of pulsed ultraviolet laser radiation having: a radiation wavelength comprised in the interval 200-400 nm, preferably 200-300 nm; a pulse duration comprised in the interval 0.5-5 ns (i.e. of the order of nanoseconds or more); and an energy per pulse comprised in the interval 0.1-10 ⁇ J, preferably in the interval 0.5-3 ⁇ J; and a beam diameter at the marking spot comprised in the interval 5-50 ⁇ m.
• the inner layer that absorbs the marking wavelength is described as follows. Whereas a silica or zirconia based layer is substantially transparent to wavelengths comprised between 200 and 300 nm, a tin based layer absorbs a sufficient amount of energy at these wavelengths for the layer to be locally destroyed and even removed at least in part through its thickness.
• Patent Document 2 raises the following problem.
• heating processing using a laser beam with a pulse width of the order of nanoseconds or more is widely used.
• the energy of the laser beam is absorbed by the processed portion of the thin film due to the relationship between the transmission (absorption) property of the laser beam and the thin film, and thus the thin film is removed.
• the heating processing is applied to an AR film, since each layer of the multilayer structure constituting the AR film has the ability to absorb laser beam, not only the outermost layer of the multilayer structure but also multiple layers including the outermost layer are removed.
• there is a risk of thermal damage occurring around the removed processed portion In particular, there is a concern that damage caused by thermal damage will remain on the surface of the lower layer that will be exposed after removal.
• Patent Document 2 describes a method for manufacturing an optical member, which includes a removal step in which a non-heating process is performed by irradiating an ultrashort pulse laser onto an antireflection film having a multilayer structure in which low-refractive index layers and high-refractive index layers are stacked, the antireflection film being formed so as to cover the optical surface of an optical substrate, to partially remove the low-refractive index layer, which is the outermost layer of the multilayer structure, to expose the high-refractive index layer.
• the laser light source unit 21 emits laser light used for laser processing, and is configured to emit an ultrashort pulse laser.
• the ultrashort pulse laser has a pulse width of, for example, 0.1 picoseconds or more and less than 100 picoseconds, preferably 0.1 picoseconds or more and less than 30 picoseconds, and more preferably 0.1 picoseconds or more and less than 15 picoseconds. In any case, the pulse width is on the order of less than a nanosecond.
• the wavelength of the ultrashort pulse laser is, for example, 355 nm THG (Third Harmonic Generation) or 532 nm SHG (Second Harmonic Generation). However, the wavelength is not limited to this and may be, for example, a fundamental wavelength of 1064 nm or 266 nm FHG (Fourth Harmonic Generation).
• the pulse energy of the ultrashort pulse laser is, for example, 0.1 ⁇ J or more and 30 ⁇ J or less (maximum approximately 60 ⁇ J) at 50 kHz.
• the beam diameter of the ultrashort pulse laser is, for example, 10 ⁇ m or more and 30 ⁇ m or less.
• Patent Document 2 paragraph [0017] describes that marking can be performed on an optical component without causing a deterioration in the quality of the optical component.
• Patent Document 2 paragraph [0022] describes marking a decorative pattern representing a logo, house mark, etc. on the optical surface so that it is positioned within the lens area after frame cutting.
• Patent Document 2 paragraph [0075] describes that non-heating processing using an ultrashort pulse laser can be used to perform some kind of patterning on the optical surface of an optical component.
• the contents not described below can be referred to as appropriate from Patent Document 2.
• Patent Document 2 focuses solely on minimizing thermal damage by performing marking without heating.
• Patent Document 2 does not mention the utilization of the parts that were not subjected to non-heating processing, and only mentions the deterioration of the parts that were not subjected to non-heating processing.
• One embodiment of the present invention aims to improve the wearer's fashion sense when viewed by third parties while ensuring a comfortable field of vision for the wearer.
• non-heat processed processing will also be referred to as laser processing.
• Laser processing shapes are not limited to points or lines, but can also be surfaces (i.e. areas).
• region A As the laser-processed region is as follows. It is desirable that the design pattern formed on the eyeglass lens is easily visible to third parties. Therefore, it is considered preferable that the area is sufficient for the resolution of the human eye, and that the processed portion is sufficiently distinguishable from its surroundings. From the viewpoint of the object-side surface, it is considered effective that region A as a surface is included in the design pattern, which is the region that is the basis for how the eyeglass lens in the worn state will look when viewed by a third party from the object-side surface, and is not composed only of laser-processed parts such as fine dots that have only side walls and a curved bottom. In addition, the provision of region A as a surface may reflect the intention to treat region A and region B equally based on the above viewpoint that the part that was not subjected to non-heat processing (region B) is also composed as part of the design pattern.
• the surface of a typical eyeglass lens is highly smooth. Therefore, if area A formed by the non-heating process described above has the same level of smoothness or even more, the design pattern created by said process will specularly reflect light and the reflected light will be bright enough to be clearly and easily visible to a third party.
• the inventor's research has revealed that this is true not only when light is incident from the processed surface of the lens, but also when light is incident from the back side of the processed surface.
• the inventors discovered that the surface roughness of region A should be at the same level as region B where laser processing was not performed (i.e., smoothness equal to or greater than the surface (Ra of 0.2 ⁇ m or less) obtained by mirror-finishing the lens substrate before each film is formed).
• the inventors discovered that it is possible to take into account the surface roughness of the portion where laser processing was performed and control the surface roughness of the portion where laser processing was performed, thereby making it possible for both portions to form a design pattern when a third party looks at the wearer.
• the surface roughness Ra of region A is more preferably 0.1 ⁇ m or less, and even more preferably 0.05 ⁇ m or less, 0.01 ⁇ m or less, and less than 0.0080 ⁇ m.
• the first aspect is in a spectacle lens having an object side surface and an eyeball side surface, in an area within a spectacle frame, in two areas A and B in a plan view on one surface of the spectacle lens,
• the spectacle lens comprises a film, in one region A at least a part of the film is absent and in another region B the part of the film is present;
• a design pattern is provided that is configured by the difference between how an area A appears and how an area B appears when a third party views the eyeglass lens in a worn state from the object side,
• the luminous transmittance in the region A and the luminous transmittance in the region B are both 80% or more,
• the arithmetic mean roughness RaA of the region A is 0.2 ⁇ m or less in this eyeglass lens.
• the second aspect is a lens substrate having an optical surface; an anti-reflection film covering the optical surface of the lens substrate; the antireflection film has a multilayer structure including a stack of a low refractive index layer and a high refractive index layer, the antireflection film includes a reactive layer having a relatively higher reactivity to irradiation with an ultrashort pulse laser than other layers included in the antireflection film;
• a region A is formed by at least partially removing a predetermined layer including an outermost layer of the multilayer structure, and the high refractive index layer below the reaction layer or a portion of the reaction layer that remains is exposed in the region A.
• the third aspect is The difference between the appearance of area A and the appearance of area B includes the difference in specular gloss due to reflected light,
• the fourth aspect is In the spectacle lens according to any one of the first to third aspects, the difference between how the area A appears and how the area B appears includes a difference in color due to reflected light.
• the fifth aspect is The spectacle lens according to any one of the first to fourth aspects, wherein when the spectacle lens is worn and viewed by a third party from the object side, when area A appears colored due to reflected light a, area B also appears colored due to reflected light b.
• the sixth aspect is a lens substrate having an optical surface; the film comprising an anti-reflection film covering the optical surface of the lens substrate;
• the anti-reflection film has high anti-reflection ability against some wavelengths of visible light
• the color of the reflected light in region B is a color of a wavelength of visible light with low anti-reflection ability
• the spectacle lens according to any one of the first to fifth aspects, wherein the color of the reflected light in region A is a color of a wavelength of visible light that has low antireflection ability when the outermost surface of the antireflection film is partially absent.
• the seventh aspect is The spectacle lens according to any one of the first to sixth aspects, wherein the ratio (RaA/RaB) of the arithmetic mean roughness RaA of the region A to the arithmetic mean roughness RaB of the region B is 3 or less.
• the eighth aspect is The spectacle lens according to any one of the first to seventh aspects, wherein region A and region B are both outermost surface regions.
• the ninth aspect is The spectacle lens according to any one of the first to eighth aspects, wherein RaA is less than 0.0080 ⁇ m.
• a tenth aspect is The spectacle lens according to any one of the first to ninth aspects, wherein region A exists within a region having a radius of 30 mm from the center of the lens.
• An eleventh aspect is The spectacle lens according to any one of the first to tenth aspects, wherein region A is present toward the nose side and downward when viewed from the center of the lens.
• a twelfth aspect is The eyeglass lens according to any one of the first to eleventh aspects, wherein, in a plan view, the area of region A accounts for 5% or more and 99% or less of the entire eyeglass lens.
• a thirteenth aspect is The spectacle lens according to any one of the first to twelfth aspects, wherein in plan view, the maximum overall length of the portion constituting region A is 8 mm or more.
• a fourteenth aspect is The spectacle lens according to any one of the first to thirteenth aspects, wherein the average visible light reflectance in region A is 7% or more.
• a fifteenth aspect is The spectacle lens according to any one of the first to fourteenth aspects, wherein the lightness in region A is higher than that in region B.
• the anti-reflection film has a high anti-reflection ability in a predetermined wavelength range of visible light
• the color of the reflected light for region B is a color of a wavelength that has a relatively low anti-reflection ability among visible light wavelengths
• the color of the reflected light in the region A is a color of a wavelength of visible light that has low antireflection ability when the outermost surface of the antireflection film is partially absent
• the difference between the appearance of the region A and the appearance of the region B from which a predetermined layer including the outermost layer of the multilayer structure has not been removed includes a difference in specular gloss due to reflected light and a difference in color
• the specular gloss of region A is equal to or greater than the specular gloss of region B, RaA is less than 0.0080 ⁇ m; a ratio (RaA/RaB) of the arithmetic mean roughness RaA of the region A to the arithmetic mean roughness RaB of the region B is 3 or less;
• a seventeenth aspect is A pair of spectacles comprising a spectacle frame and a shaped spectacle lens having an object side surface and an eyeball side surface, In two regions A and B in a plan view on one surface of the eyeglass lens after edging,
• the spectacle lens after edging has a film, in one region A, at least a part of the film is absent, and in the other region B, the part of the film is present;
• the design pattern is configured by the difference between how an area A looks and how an area B looks when the eyeglass lens is worn and viewed by a third party from the object side,
• the luminous transmittance in the region A and the luminous transmittance in the region B are both 80% or more,
• the arithmetic mean roughness RaA of region A is 0.2 ⁇ m or less.
• the eighteenth aspect is a lens substrate having an optical surface; an anti-reflection film covering the optical surface of the lens substrate; the antireflection film has a multilayer structure including a stack of a low refractive index layer and a high refractive index layer, the antireflection film includes a reactive layer having a relatively higher reactivity to irradiation with an ultrashort pulse laser than other layers included in the antireflection film;
• the eyeglasses of the seventeenth aspect wherein a region A is formed by at least partially removing a specific layer including the outermost layer of the multilayer structure, and the high refractive index layer below the reaction layer or a portion of the reaction layer that remains is exposed in the region A.
• a nineteenth aspect is The difference between the appearance of area A and the appearance of area B includes the difference in specular gloss due to reflected light,
• the specular gloss of region A is equal to or greater than the specular gloss of region B.
• a twentieth aspect is in the eyeglasses according to any one of the seventeenth to nineteenth aspects, the difference between the appearance in area A and the appearance in area B includes a difference in color due to reflected light.
• a twenty-first aspect is The eyeglasses are as described in any one of the seventeenth to twentieth aspects, in which when the eyeglass lens is worn and viewed by a third party from the object side, when area A appears colored due to reflected light a, area B also appears colored due to reflected light b.
• a twenty-second aspect is a lens substrate having an optical surface; the film comprising an anti-reflection film covering the optical surface of the lens substrate;
• the anti-reflection film has high anti-reflection ability against some wavelengths of visible light
• the color of the reflected light in region B is a color of a wavelength of visible light with low anti-reflection ability
• the eyeglasses according to any one of the seventeenth to twenty-first aspects, wherein the color of the reflected light in region A is a color of a wavelength of visible light that has low anti-reflection ability when the outermost surface of the anti-reflection film is partially absent.
• a twenty-third aspect is The eyeglasses according to any one of the seventeenth to twenty-second aspects, wherein a ratio (RaA/RaB) of the arithmetic mean roughness RaA of the region A to the arithmetic mean roughness RaB of the region B is 3 or less.
• a twenty-fourth aspect is The eyeglasses according to any one of the seventeenth to twenty-third aspects, wherein region A and region B are both outermost regions on the object side surface or eyeball side surface of the eyeglass lens after edging.
• a twenty-fifth aspect is The eyeglasses according to any one of the seventeenth to twenty-fourth aspects, wherein RaA is less than 0.0080 ⁇ m.
• a twenty-sixth aspect is The eyeglasses according to any one of the seventeenth to twenty-fifth aspects, wherein in the eyeglass lens after edging, region A is present toward the nose side and downward as viewed from the center of the lens.
• a twenty-seventh aspect is The eyeglasses according to any one of the seventeenth to twenty-sixth aspects, wherein in a plan view, the area of region A occupies 5% or more and 99% or less of the entire eyeglass lens after edging.
• a twenty-eighth aspect is The eyeglasses according to any one of the seventeenth to twenty-seventh aspects, wherein in a plan view, the maximum overall length of the portion constituting region A is 8 mm or more.
• the anti-reflection film has high anti-reflection ability against some wavelengths of visible light
• the color of the reflected light in region B is a color of a wavelength of visible light with low anti-reflection ability
• the color of the reflected light in the region A is a color of a wavelength of visible light that has low antireflection ability when the outermost surface of the antireflection film is partially absent
• the difference between the appearance of the region A and the appearance of the region B from which a predetermined layer including the outermost layer of the multilayer structure has not been removed includes a difference in specular gloss due to reflected light and a difference in color
• the specular gloss of region A is equal to or greater than the specular gloss of region B, RaA is less than 0.0080 ⁇ m; a ratio (RaA/RaB) of the arithmetic mean roughness RaA of the region A to the arithmetic mean roughness RaB of the region B is 3 or less; In the eyeglass lens after edging
• An example of a specific position of "near the nose and downward when viewed from the center of the lens” is either one of the following (1) and (2), or an overlapping region of these two.
• (1) In a rectangle (boxing) that circumscribes the spherical lens and contains the spherical lens, the width in the horizontal direction (horizontal direction, x direction) is ⁇ , and the area is 0.90 ⁇ (preferably 0.80 ⁇ ) from the nose end.
• Area A may be present toward the nose and downward when viewed from the center of the lens, and from the standpoint of improving fashionability, the area of area A may be 5% or more (or 10% or more, 15% or more, 20% or more) and 99% or less (or 70% or less, 50% or less) of the entire spectacle lens in a plan view.
• the area of the solid processing of the region A is 10 mm2 or more (or 20 mm2 or more, 30 mm2 or more, 50 mm2 or more) in a plan view.
• at least one region A is 10 mm2 or more (or 20 mm2 or more, 30 mm2 or more, 50 mm2 or more).
• the maximum overall length is 8 mm or more (or 10 mm or more, 15 mm or more).
• the overall length of at least one region A is at least 8 mm (or 10 mm or more, 15 mm or more).
• its width is 100 ⁇ m or more, and more preferably 1 mm or more.
• T1 is 80 or more, preferably 85 or more
• T2 is 80 or more, preferably 90 or more, more preferably 95 or more
• the difference between T2 and T1 is 15 or less
• T1/T2 is 0.8 or more
• T1 is 80 or more
• T1 - T2 is 20 or less, preferably 15 or less, 13 or less, or 10 or less
• T1 - T2 is 18 or less.
• R1f is 7% or more, or 20% or less, and more specifically 15% or less. More preferably, it is 10% or more and 15% or less.
• the average reflectance of R1f over the wavelength range of 500 to 650 nm is 10% or more.
• the reflectance of region B on the object side surface is R2f
• the difference between R1f and R2f is 5% or more, and R2f ⁇ 12%.
• R2f ⁇ 3% For wavelengths between 500 and 600 nm, R1f - R2f ⁇ 10%.
• R1b If the reflectance of area A on the side of the eye is R1b, then for wavelengths from 430 to 770 nm, R1b is 7% or more, or 20% or less, more specifically 9% or more and 15% or less.
• the average reflectance of R1b over wavelengths from 430 to 770 nm is 10% or more.
• the average reflectance of R1b over wavelengths from 500 to 650 nm is 10% or more.
• the reflectance of area B on the side of the eye is R2b
• the difference between R1b and R2b is 7% or more, and R2b ⁇ 12%.
• R1b - R2fb For wavelengths between 500 and 600 nm, R1b - R2fb ⁇ 10%.
• the average value of R1f (the processed portion when viewed from the object side) across all wavelengths of visible light, i.e., the average visible light reflectance, is preferably 7% or more, and more preferably 8% or more.
• the average value of R2f (the unprocessed portion when viewed from the object side) across all wavelengths of visible light, i.e., the average visible light reflectance, is preferably 3% or less.
• the difference between the two average visible light reflectances is preferably 5% or more.
• the light intensity is L * 1
• the light intensity of the reflected light from the unprocessed portion (area B) is L * 2. It is preferable that L * 1>L * 2.
• L * 1 is preferably 30 or more, and more preferably 35 or more.
• the lightness L * 2 of the reflected light when light normal to the object-side surface is irradiated onto the unprocessed portion (area B) is preferably 10 or less, and more preferably 5 or less.
• the lightness of area A can be 20 or more, preferably 30 or more, higher than that of area B.
• the conductivity of the processed area even if the amount of charge increases from before laser processing (e.g. -100 to +100V), it is desirable to maintain the anti-static ability of the lens by keeping the absolute value at less than 400V. Specifically, about -300 to +300V is preferable. More preferably, it is -200 to +200V, and even more preferably, it is -100 to +100V.
• One embodiment of the present invention ensures a comfortable field of vision for the wearer while improving the wearer's fashion sense when viewed by third parties.
• FIG. 1 is a front view showing a spectacle lens according to an embodiment of the present invention.
• 2A is a schematic cross-sectional view (upper side) illustrating a processed portion and an unprocessed portion of a spectacle lens, and the lower side is an enlarged view of the portion surrounded by a dashed line.
• Fig. 2B is a schematic cross-sectional view illustrating the definition of "parallel to region B as a surface" based on Fig. 2A.
• FIG. 3 is a schematic plan view showing an example of a specific position of "near the nose side and downward when viewed from the lens center" in this embodiment.
• FIG. 1 is a front view showing a spectacle lens according to an embodiment of the present invention.
• 2A is a schematic cross-sectional view (upper side) illustrating a processed portion and an unprocessed portion of a spectacle lens, and the lower side is an enlarged view of the portion surrounded by a dashed line.
• Fig. 2B is a
• FIG. 4 is a flow diagram showing an example of the procedure of the method for manufacturing a spectacle lens according to this embodiment.
• FIG. 5 is a side cross-sectional view showing an example of a laminated structure of thin films according to this embodiment.
• FIG. 6A is an explanatory diagram (part 1) showing a schematic configuration example of a laser processing device used in the manufacturing method of a spectacle lens according to this embodiment.
• FIG. 6B is an explanatory diagram (part 2) showing a schematic configuration example of a laser processing device used in the manufacturing method of a spectacle lens according to this embodiment.
• FIG. 7A is an explanatory diagram showing an example of the main configuration of a spectacle lens according to this embodiment.
• FIG. 7B shows a specific example of the cross section of the AR film 13 observed by an electron microscope.
• FIG. 8A is a photograph taken from the object-side surface of the spectacle lens of the specific example having the anti-reflection film shown in FIG. 7A provided on both sides thereof, showing processing performed using pulsed laser light having a wavelength of 355 nm and a pulse width of 10 picoseconds or more and less than 20 picoseconds.
• FIG. 8B is a plot showing the transmittance (T'1) of region A and the transmittance (T'2) of region B in a specific example of a spectacle lens, with the vertical axis representing transmittance (%) and the horizontal axis representing wavelength (nm).
• FIG. 8C is a plot showing the reflectance (R1f, R2f, R1b, R2b) of the spectacle lens of the above specific example, with the vertical axis representing reflectance (%) and the horizontal axis representing wavelength (nm).
• FIG. 9 is a bar graph showing the luminous transmittance (vertical axis is transmittance (%)) of a sample of a spectacle lens according to one specific example, in which an anti-reflection film is provided on both the object side and the eyeball side.
• FIG. 10 is a bar graph (vertical axis is reflectance (%)) showing the average reflectance of visible light wavelengths for a specific example of a spectacle lens sample having an anti-reflection coating on both the object side and the eyeball side when light is irradiated from the normal direction of the object-side surface towards the object-side surface and reflected in the normal direction.
• FIG. 11 is a bar graph (vertical axis is lightness) showing lightness L* when light is irradiated from the normal direction of the object-side surface towards the object-side surface for a sample of a specific example of a spectacle lens having an anti-reflection coating on both the object-side and eyeball-side surfaces.
• FIG. 11 is a bar graph (vertical axis is lightness) showing lightness L* when light is irradiated from the normal direction of the object-side surface towards the object-side surface for a sample of a specific example of a spectacle lens having an anti-reflection coating on both the object-side and eye
• FIG. 12 is a bar graph (vertical axis is chromaticity) showing chromaticity a* and b* when light is irradiated from the normal direction of the object-side surface towards the object-side surface for a specific example of a spectacle lens sample having an anti-reflection coating on both the object side and the eyeball side.
• FIG. 13 is a bar graph (vertical axis is the amount of charge) showing the amount of charge (unit: V) on the eyeball side surface (laser processing side) for a sample of a specific example of a spectacle lens in which an anti-reflection film is provided on both the object side and the eyeball side.
• FIG. 1 is a front view showing a spectacle lens according to an embodiment of the present invention.
• the eyeglass lens according to this embodiment has an object-side surface and an eyeball-side surface as optical surfaces.
• the "object-side surface” is the surface that is located on the object side when eyeglasses equipped with the eyeglass lens are worn by a wearer.
• the "eyeball-side surface” is the opposite, that is, the surface that is located on the eyeball side when eyeglasses equipped with the eyeglass lens are worn by a wearer.
• the object-side surface is generally a convex surface and the eyeball-side surface is generally a concave surface, in other words, the eyeglass lens is a meniscus lens. This is also true for eyeglass lenses (machined lenses) that have been subjected to edging, in which the periphery is cut to match the shape of the eyeglass frame.
• the side of the optical center of the eyeglass lens is called the inside, and the side of the outermost edge of the eyeglass lens is called the outside.
• the optical center coincides with the geometric center and centering center.
• the optical center is also called the lens center.
• the left-right direction in the direction when a third party faces the object side surface from the front is the x direction
• the up-down direction is the y direction
• the thickness direction of the eyeglass lens perpendicular to the x and y directions is the z direction.
• the z direction is also the optical axis direction of the eyeglass lens.
• the origin is the lens center.
• the lens center refers to the optical center or geometric center of the eyeglass lens. In this specification, the optical center and the geometric center are approximately the same as each other.
• the right side (3 o'clock direction) is the +x direction
• the left side (9 o'clock direction) is the -x direction
• the top (0 o'clock direction) is the +y direction
• the bottom (6 o'clock direction) is the -y direction
• the object side direction is the +z direction
• the opposite direction (rear direction) is the -z direction.
• the x direction is also called the x axis
• the y direction is the y axis
• the z direction is the z axis.
• the axis passing through the lens center from the object side toward the eyeball side is the z-axis
• the axis going from bottom to top and perpendicular to the z-axis is the y-axis
• the axis going from left to right and perpendicular to the z-axis is the x-axis.
• this specification discusses the situation when a third party looks straight at the glasses while they are being worn.
• “how area A and area B appear when a third party views the eyeglass lens from the object side while it is being worn” includes how the eyeglass lens appears when viewed by a third party in a state in which light (illumination light, sunlight, etc.) is incident on the object side of the eyeglass lens and the reflected light enters the third party's eye.
• the side of the frame center is called the inside, and the side of the outermost edge of the spherical lens is called the outside.
• the outline of the outermost edge of the spherical lens coincides with the outline of the spherical shape of the spectacle lens before the frame is cut (in other words, the uncut lens).
• the frame center is the center position of the spherical lens (i.e., the area inside the rim) when a third person looks at the state of wearing the glasses from the front.
• the center position of the spherical lens may be the geometric center of a rectangle (boxing) that circumscribes the spherical lens and contains the spherical lens.
• the frame center may coincide with the optical center and the centering center.
• the eyeglass lens according to this embodiment is In a spectacle lens having an object side surface and an eyeball side surface, in an area within a spectacle frame, in two areas A and B in a plan view on one surface of the spectacle lens,
• the spectacle lens comprises a film, in one region A at least a part of the film is absent and in another region B the part of the film is present;
• a design pattern is provided that is configured by the difference between how an area A appears and how an area B appears when a third party views the eyeglass lens in a worn state from the object side, an average transmittance of visible light across all wavelengths in region A and an average transmittance of visible light across all wavelengths when the light passes through region B are both 80% or more;
• the spectacle lens preferably has an arithmetic mean roughness RaA of 0.2 ⁇ m or less in the region A (Configuration 1).
• One of the characteristics of the eyeglass lenses described below is the configuration within the area of the eyeglass frame. Even if the eyeglass lenses are uncut lenses, if the purchaser (future wearer) has already decided on the type of eyeglass lens and frame (rim type) at the eyeglass store, it is possible to identify the area within the eyeglass frame from the eyeglass lens.
• the eyeglass lens of this embodiment has a film, and at least a portion of the film is absent in one region A, and at least a portion of the film is present in the other region B.
• the film does not have to be an anti-reflection film as described below, and may be an optical interference film such as a film that enhances reflectivity.
• an optical interference film such as a film that enhances reflectivity.
• the film satisfies the above configuration 1 and the arithmetic mean roughness RaA of region A is 0.2 ⁇ m or less, it may be a metal film that does not have an anti-reflection function or has a low anti-reflection function.
• the metal film may be a multilayer film or a single layer film. In the multilayer film, the compositions of adjacent layers may be different from each other. In the case of a single layer film, part of the single layer film may be removed.
• the film may be an existing anti-reflection film with an optional film formed on top of it.
• region A may be made of the existing anti-reflection film
• region B may be made of the optional film.
• a known method of wet or dry film formation may be used.
• Two areas A and B in a planar view on one surface of the eyeglass lens refers to the two areas A and B in a planar view on the surface that is causing changes to the film (the surface on the eyeball side in this example), but the areas on the back surface side (object side) that correspond to areas A and B may also be called areas A and B in the same way.
• the film is an anti-reflection film
• the anti-reflection film will also be referred to as an AR film.
• the eyeglass lens according to this embodiment has the following: a lens substrate having an optical surface; an anti-reflection film covering the optical surface of the lens substrate; the antireflection film has a multilayer structure including a stack of a low refractive index layer and a high refractive index layer, the antireflection film includes a reactive layer having a relatively higher reactivity to irradiation with an ultrashort pulse laser than other layers included in the antireflection film; In region A, which is a removal site formed by at least partially removing a specific layer including the outermost layer of the multilayer structure, the high refractive index layer below the reaction layer or a portion of the reaction layer that remains is exposed.
• area A is where the AR film is incomplete because part of the film has been removed.
• Area B is where the specified layer has not been removed (where the AR film is complete).
• the average transmittance across all wavelengths of visible light in region A and the average transmittance across all wavelengths of visible light when the light passes through region B are both 80% or more.
• the visual transmittance of both region A and region B can preferably be 80% or more, more preferably 85% or more.
• visible transmittance is a value obtained by measurement in accordance with JIS T 7333:2018 (ISO 8980-3:2013).
• “Visual transmittance in area A” refers to the visual transmittance when the wearer looks ahead through area A
• visible transmittance in area B refers to the visual transmittance when the wearer looks ahead through area B, and is significant in ensuring a clear field of vision for the wearer.
• visible light refers to light with a wavelength of 380 to 780 nm.
• average transmittance across all wavelengths of visible light refers to the average value of the transmittance at each wavelength from 380 to 780 nm.
• the average transmittance across all wavelengths of visible light is 80% or more, but preferably, the transmittance is 80% or more at all wavelengths from 380 to 780 nm, and the transmittance across all wavelengths of visible light is 80% or more.
• the average transmittance is naturally high in region B where the AR film is complete. Although the AR film in region A is incomplete, it is still an AR film, and a high average transmittance can be ensured by removing only a specific layer near the outermost surface of the AR film.
• the number of layers or layer thickness to be removed in region A should be set to an extent that the average transmittance is 80% or more (an extent that does not excessively inhibit the transmission ability of the anti-reflection film).
• the anti-reflective coating is removed layer by layer (even if some of it remains or some of the layers further below are removed).
• area A where laser processing has been performed takes on a shape that mimics area B, which is a complete anti-reflective coating (in fact, both areas A and B have shapes that mimic the surface of the lens substrate).
• the thickness of each layer that makes up the anti-reflective coating is on the order of nanometers, and moreover, in area A, at most a few layers have been removed, so the surface shapes of area A and area B are similar. This similar state is expressed as "parallel to area B as a surface.”
• region A that falls within a space where the distance t from the virtual plane p in the lens thickness direction (or optical axis direction, z direction) is 0.2 ⁇ m or less, 0.1 ⁇ m or less, 0.05 ⁇ m or less, 0.01 ⁇ m or less, less than 0.0080 ⁇ m, 0.005 ⁇ m or less, or 0.003 ⁇ m or less (the sum of the distance t from p in the +z direction and the distance t from p in the -z direction is 2t) may be considered to be a "region parallel to region B as a surface".
• Figure 2A is a schematic cross-sectional view (upper side) explaining the processed and unprocessed portions of a spectacle lens, and the lower side is an enlarged view of the portion surrounded by the dashed line.
• the configuration and symbols in Figure 2A conform to ⁇ Further specific example of spectacle lens>.
• Figure 2B is a schematic cross-sectional view explaining the definition of "parallel to region B as a surface" based on Figure 2A.
• the arithmetic mean roughness RaA of region A is 0.2 ⁇ m or less.
• the surface roughness of region A is made equal to or smoother than that of region B where laser processing was not performed.
• regular reflection is predominantly generated in region A, and sufficient light reaches the pupil for a third party to visually recognize the design created by region A, while also taking into account the surface roughness of the portion where laser processing was performed and controlling the surface roughness of the portion where laser processing was performed, so that both portions form a design pattern when a third party looks at the wearer.
• the parts that have been laser processed will be referred to as the processed parts, and the parts that have not been laser processed will be referred to as the unprocessed parts.
• Patent Document 2 describes marking of decorative patterns representing logos, house marks, etc. onto the optical surface. If these are intended to indicate the manufacturer of the eyeglass lenses, then at least for the wearer, it is desirable to make the logos and house marks placed within the frame area as inconspicuous as possible unless there is a special intention.
• the processed portion is distinguished from the unprocessed portion to achieve a design effect, or both the processed portion and the unprocessed portion form a design pattern.
• the arithmetic mean roughness RaA of area A is set to a smoothness (mirror surface) equal to or greater than the surface roughness of a normal eyeglass lens, which is 0.2 ⁇ m or less.
• the arithmetic mean roughness RaA of region A is 0.2 ⁇ m or less. It is preferable that region A has an area that allows the arithmetic mean roughness to be measured alone. Of course, it is possible that processed parts are scattered, such as the triangles around the circle in the center of the sun in Figure 1. Even in that case, it is preferable that even one of the scattered parts (solid processing, continuous processing) has an area or length that allows the arithmetic mean roughness to be measured. For example, the proportion of region A in the area of region A in a plan view may be 80% or more, 85% or more, or 90% or more.
• the arithmetic mean roughness in this specification may be a value obtained using a known surface roughness measuring device (e.g., Talysurf (registered trademark)).
• a known surface roughness measuring device e.g., Talysurf (registered trademark)
• an Ra of 0.2 ⁇ m or less means a mirror surface state with a smoothness equal to or greater than the surface roughness after mirror finishing is performed on the lens substrate before each film is deposited.
• This mirror surface state is achieved on a surface called region A, which is different from achieving it in a processed part such as a pinhole that only has a side wall and a curved bottom.
• the film When creating a surface called region A with an ultrashort pulse laser, the film is irradiated with a laser that forms a roughly circular irradiation spot in a planar view, the film is moved slightly (a specified pitch) in one direction (e.g., the x direction), and the film at the moved position is irradiated with the laser. After repeating this process, the film is moved in another direction (e.g., the y direction), and the laser irradiation is repeated again in that direction (e.g., the x direction).
• the spots are overlapped in order to create the surface area A. If there is no thought given to controlling the Ra on the surface area A, differences will arise in the integrated light quantity of the laser at various points on the surface area A, making it difficult to obtain an Ra equivalent to that of a mirror finish.
• Such control can generally be achieved by taking into consideration the characteristics of the beam produced by the laser irradiation and the physical properties of the workpiece.
• the workpiece in this embodiment is a spectacle lens, and in a preferred embodiment is part of a thin film formed on its surface, and this is formed on a curved surface, irradiation must be carried out accordingly.
• the processed portion can be visually distinguished from the unprocessed portion, and based on the technical idea that the unprocessed portion can also be configured as part of the design pattern, area A and area B are treated equally. For this reason, area A is required to have a surface roughness equal to or greater than that of area B, which is the complete anti-reflective coating.
• the average transmittance across all wavelengths of visible light passing through region A and the average transmittance across all wavelengths of visible light when the light passes through region B are both 80% or more.
• both luminous transmittances can be 80% or more, and preferably 85% or more.
• the eyeglass lens according to this embodiment has a design pattern that is configured by the difference between how region A and region B appear when a third party views the eyeglass lens in a worn state from the object side.
• This design pattern is visible because, for example, the reflection characteristics in area A are different from those in area B. In this case, in area A, regular reflection occurs due to the extremely smooth mirror surface caused by the Ra value of area A as described above. Therefore, when a third party looks at the lens of the wearer, if they are in a position that receives reflected light from the light source (illumination light or external light) that occurs in the decorative design pattern, the design pattern can be clearly seen. On the other hand, if they are in a position where the reflected light does not substantially reach them, the design pattern cannot be seen. In other words, the design pattern according to this embodiment can be designed to be easily or difficult to see (visibility changes) depending on the positional relationship (often an accidental positional relationship) between the light source, the wearer, and the third party, thereby realizing design innovation.
• the design pattern can be seen over a wide area, so the visibility of the design pattern in external light may differ from that under indoor lighting, making it possible to incorporate varied designs into fashion.
• area A In order for a third party to be able to clearly distinguish area A from area B and to easily recognize the design pattern, area A must have a reflectance greater than a certain level, and area A must have a high level of smoothness and strong regular reflection, causing it to shine differently from area B. Area A must also have a higher brightness than area B, or the color tone (hue and/or saturation) of area A must be different from that of area B. For example, area A can have a contrast of warm colors and area B a cool color. These design effects can be achieved by designing the anti-reflective coating, and the material and thickness of the film that is removed from area A (thin film design software can be used). As mentioned above, it is also important that area A has a certain or greater "area" that is easy to see, rather than a very small area.
• the reflection characteristics in area B also show a relatively high reflectance for certain wavelengths of visible light, making it possible to control the reflected color of the anti-reflective film.
• a third party can simultaneously receive reflected light from areas A and B and visually see the differences in color and brightness according to the respective wavelength characteristics.
• area A has high specularity (i.e., little diffuse reflection), it also has the effect of allowing the outline of an intricate design to be clearly seen.
• the difference between the appearance of area A and the appearance of area B includes the difference in specular gloss due to reflected light, and the specular gloss of area A may be equal to or greater than the specular gloss of area B.
• specular gloss may be the specular gloss specified in ISO 2813/JIS K 5600-4-7.
• the angle of incidence may be, for example, 60 degrees.
• specular gloss of area A may be, for example, 80 or more, more preferably 90 or more.
• "the specular gloss of area A is equal to the specular gloss of area B" may mean that the difference in the specular gloss of both areas is less than 5.
• color can be defined by the CIE 1976L * a * b * color space and can be defined by values obtained by measurement in accordance with JIS Z 8781-4:2013 (ISO 11664-4).
• the difference between how area A appears and how area B appears may include a difference in color due to reflected light.
• Area A or area B may be colorless when a third party looks at the wearer, but it is preferable for both areas to appear colored in terms of ease of identification and improved fashionability. In other words, when a third party looks at the worn spectacle lens from the object side, if area A appears colored due to reflected light a, it is preferable that area B also appears colored due to reflected light b.
• the anti-reflective film is a film that has high anti-reflective ability for a certain range of wavelengths of visible light (in other words, a certain wavelength region).
• the anti-reflective film may have a portion where the anti-reflective ability is low to a certain degree for some wavelengths of visible light, and the reflectance at those wavelengths may be relatively higher than the reflectance at other wavelengths.
• the average transmittance across all wavelengths of visible light in region B is 80% or more, and this characteristic is also the same in region A where no part of the film is present.
• the color of the reflected light in area B may be a wavelength of visible light that has a relatively low anti-reflection ability
• the color of the reflected light in area A is a wavelength of visible light that has a low anti-reflection ability when the outermost surface of the anti-reflection film is partially absent.
• the "colors with wavelengths of low anti-reflection ability" referred to here means that when the reflectance is relatively high in one specified range, the color corresponding to the wavelengths in that range is visually recognized by a third party. On the other hand, it is of course possible that the reflectance is relatively high in multiple specified ranges. In that case, a color that is a mixture of the colors corresponding to the wavelengths in those multiple ranges is visually recognized by a third party. In this specification, "colors with wavelengths of low anti-reflection ability" also includes such a mixture of colors.
• colored includes colors (e.g. blue, green, purple, pearl) due to the action of the AR film, as well as the color of the decorative part (gold, silver, or other colors that appear when viewed).
• the brilliance that is seen is due to the combination of the difference in reflectivity between A and B (A is more reflective) and the Ra factor (high smoothness and mirror-like condition).
• the ratio (RaA/RaB) of the arithmetic mean roughness RaA of area A to the arithmetic mean roughness RaB of area B is 3 or less.
• the lower limit is 1.
• both area A and area B are the outermost surface areas.
• an anti-soiling film may be provided separately, either wet or dry, on area A, which is the processed area, and area B, which is the unprocessed area.
• the thickness of the new film is 100 nm or less (or 50 nm or less, 30 nm or less, 20 nm or less). Incidentally, with this thinness, the arithmetic mean roughness of area A and area B will be approximately the same value as the arithmetic mean roughness through the new film.
• RaA is preferably less than 0.0080 ⁇ m.
• RaA may be 0.1 ⁇ m or less, 0.05 ⁇ m or less, 0.01 ⁇ m or less, 0.005 ⁇ m or less, or 0.003 ⁇ m or less.
• the numerical range described in this paragraph may also apply to RaB.
• the eyeglass lens according to this embodiment ensures a comfortable field of vision for the wearer while improving the fashionability of the wearer when viewed by a third party.
• the present invention significantly expands the freedom of design patterns. That is, in the past, when decorative parts or motifs were applied to eyeglass lenses, it was necessary to avoid areas where the wearer's line of sight frequently passes (specifically, areas closer to the wearer's nose and/or lower when viewed from the center of the lens).
• the decorative processing of this embodiment does not obstruct the wearer's field of vision, so it is possible to freely design the lens surface without considering such constraints, and there is no problem even if part or all of the design is located in the area where the wearer's line of sight passes. In other words, area A may be located closer to the nose and lower when viewed from the center of the lens, and is preferable from the perspective of improving fashionability.
• directions such as the nose side and downward direction can be identified from a hidden mark provided on the eyeglass lens.
• the lens center can also be identified in a similar manner.
• This hidden mark like the design pattern, may be formed by applying a specific example of laser processing as a manufacturing method for eyeglass lenses, which will be described later.
• the prescription data for the wearer is written on the lens bag of the uncut lens.
• the lens bag at least indicates whether it is for the right eye or the left eye. With the lens bag, it is possible to determine which side is on the nose side when the eyeglass lens is viewed in a flat view.
• FIG. 3 is a schematic plan view showing an example of a specific position of "the area closer to the nose and lower when viewed from the lens center” in this embodiment.
• An example of a specific position of "the area closer to the nose and lower when viewed from the lens center” is either one of the following (1) and (2), or an overlapping area thereof.
• Area A may be present toward the nose and/or downward when viewed from the center of the lens, and from the viewpoint of improving fashionability, the area of area A may occupy 5% or more (or 10% or more, 15% or more, 20% or more) and 99% or less (or 70% or less, 50% or less) of the entire spectacle lens in a plan view.
• the processed portion of this embodiment does not hinder transparency even when it is within the field of vision of the wearer.
• the surface roughness is high, the refraction and diffuse reflection of incident light at that part may be seen as distortion or scratches in the field of vision.
• the surface roughness is high, light interference occurs at that part, and glare due to unevenness appears in the design pattern when viewed by a third party.
• Another advantage is that, due to the excellent smoothness, the outline of even a fine and intricate design pattern can be clearly seen by a third party.
• the region A In order for the design pattern by the region A to be easily visible to a third party, it is desirable for the region A to include a solid processing (a continuous processed surface) of a predetermined area. From this viewpoint, it is preferable that the region A includes a portion in which the area of the solid processing is 10 mm2 or more (or 20 mm2 or more, 30 mm2 or more, 50 mm2 or more) in a plan view. In other words, it is preferable that at least one region A is 10 mm2 or more (or 20 mm2 or more, 30 mm2 or more, 50 mm2 or more).
• the maximum overall length is 8 mm or more (or 10 mm or more, 15 mm or more). In other words, it is preferable that the overall length of at least one region A is at least 8 mm (or 10 mm or more, 15 mm or more). Furthermore, when the portions constituting region A are formed in a straight line or curved line, it is preferable that the width is 100 ⁇ m or more, and more preferably 1 mm or more.
• ⁇ T1 is 80 or more, preferably 85 or more ⁇ T2 is 80 or more, preferably 90 or more, more preferably 95 or more ⁇
• R1f reflectance of light reflected from the object-side surface when light normal to the object-side surface is irradiated onto the processed area
• R2f reflectance of light reflected from the object-side surface when light normal to the object-side surface is irradiated onto the unprocessed area
• R1b reflectance of light reflected from the eyeball-side surface when light normal to the eyeball-side surface (surface where laser processing has been performed) is irradiated onto the processed area (area A)
• R2b reflectance of light reflected from the eyeball-side surface when light normal to the eyeball-side surface (surface where laser processing has been performed) is irradiated onto the unprocessed area (area B)
• each reflectance meets the following regulations.
• R1f is 7% or more, or 20% or less, more specifically 15% or less. More preferably, it is 10% or more and 15% or less.
• the average reflectance of R1f in the wavelength range of 500 to 650 nm is 10% or more.
• R1f ⁇ R2f For wavelengths between 430 and 770 nm, R1f ⁇ R2f, the difference between R1f and R2f is 5% or more, and R2f ⁇ 12%. For wavelengths between 500 and 650 nm, R2f ⁇ 3%. For wavelengths between 500 and 600 nm, R1f - R2f ⁇ 10%.
• R1b is 7% or more, or 20% or less, more specifically 9% or more and 15% or less.
• the average reflectance of R1b in the wavelength range of 430 to 770 nm is 10% or more.
• the average reflectance of R1b in the wavelength range of 500 to 650 nm is 10% or more.
• R1b - R2fb 10%.
• the surface facing the eye is described as a decorated surface that has been processed, but even if the object side surface is also decorated, the reflection characteristics on the object side can be made to have similar values.
• the average value of R1f (the processed portion when viewed from the object side) across all wavelengths of visible light, i.e., the average visible light reflectance, is preferably 7% or more, and more preferably 8% or more.
• the average value of R2f (the unprocessed portion when viewed from the object side) across all wavelengths of visible light, i.e., the average visible light reflectance, is preferably 3% or less.
• the difference between the two average visible light reflectances is preferably 5% or more.
• the lightness of the reflected light is L * 1
• the light reflected from the unprocessed portion (area B) is L * 2. It is preferable that L * 1>L * 2.
• L * 1 is preferably 30 or more, and more preferably 35 or more.
• the lightness L * 1 of the reflected light is preferably 10 or less (or less), and more preferably 5 or less (or less).
• the lightness of area A can be 20 or more, preferably 30 or more, higher than that of area B. It is preferable that the above-mentioned preferable aspect of lightness is the same when measured on the eyeball-side surface.
• the conductivity of the processed area even if the charge amount increases from before laser processing (e.g. -100 to +100 V), it is desirable to maintain the anti-static ability of the lens by keeping the absolute value at less than 400 V. Approximately -300 to +300 V is preferable. More preferably, it is -200 to +200 V, and even more preferably, it is -100 to +100 V. From this perspective, if the above-mentioned reaction layer is conductive, it is desirable for this layer to partly remain.
• the technical concept of the present invention can also be applied to glasses comprising a glasses frame and a post-edged glasses lens having an object-side surface and an eyeball-side surface.
• glasses comprising a glasses frame and a post-edged glasses lens having an object-side surface and an eyeball-side surface.
• eyeglass frames can also be rimless or half-rimmed (this type includes eyeglass lenses that have no rim even on a part of the periphery after shaping).
• FIG. 4 is a flow diagram showing an example of the procedure of the method for manufacturing a spectacle lens according to this embodiment.
• a lens substrate which is an optical base material
• the lens substrate is polished according to the eyeglass wearer's prescription information, and dyed as necessary (step 101, hereafter step is abbreviated as "S").
• a resin material with a refractive index (nD) of about 1.50 to 1.74 is used as the lens substrate.
• the resin material include allyl diglycol carbonate, urethane resin, polycarbonate, thiourethane resin, and episulfide resin.
• the lens substrate has optical surfaces for forming a predetermined lens shape on both the object side surface and the eyeball side surface.
• the predetermined lens shape may be a single-focus lens, a multifocal lens, a progressive power lens, or the like, but in any case, each optical surface is formed by a curved surface specified based on the prescription information of the eyeglass wearer.
• the optical surface is formed, for example, by a polishing process, but may also be a cast (molded) product that does not require polishing. Note that the polishing and dyeing processes for the lens substrate can be performed using known techniques, and detailed explanations thereof will be omitted here.
• a hard coat film is formed on at least one optical surface of the lens substrate, preferably on both optical surfaces (S102).
• the HC film is, for example, formed using a curable material containing a silicon compound, and is a film formed to a thickness of about 3 ⁇ m to 4 ⁇ m.
• the refractive index (nD) of the HC film is close to the refractive index of the material of the lens substrate described above, for example, about 1.49 to 1.74, and the film configuration is selected according to the material of the lens substrate.
• Such a HC film coating can improve the durability of the eyeglass lens.
• the HC film can be formed, for example, by a dipping method using a solution in which a curable material containing a silicon compound is dissolved.
• an anti-reflection film (AR film) is subsequently formed so as to overlap the HC film (S103).
• the AR film has a multi-layer structure in which films with different refractive indices are stacked, and is a film that prevents light reflection by interference.
• the AR film has a multi-layer structure in which a low refractive index layer and a high refractive index layer are stacked.
• the low refractive index layer is made of silicon dioxide (SiO 2 ), for example, with a refractive index of about 1.43 to 1.47.
• the high refractive index layer is made of a material having a higher refractive index than the low refractive index layer, and is formed using, for example, zirconium oxide ( ZrO2 ), tin oxide ( SnO2 ), niobium oxide ( Nb2O5 ), tantalum oxide ( Ta2O5 ), titanium oxide (TiO2), yttrium oxide ( Y2O3 ), aluminum oxide ( Al2O3 ), or a mixture thereof (e.g. , indium tin oxide (ITO)).
• ZrO2 zirconium oxide
• SnO2 tin oxide
• Nb2O5 niobium oxide
• Ta2O5 tantalum oxide
• TiO2 titanium oxide
• Y2O3 yttrium oxide
• Al2O3 aluminum oxide
• ITO indium tin oxide
• the high refractive index layer containing Sn and O functions as a reactive layer because it has a higher reactivity to the ultrashort pulse laser described below than other layers.
• the above-mentioned SnO2 and ITO correspond to this.
• the term "reactive layer” in this specification refers to a layer having low excitation energy when irradiated with a laser.
• an ultrashort pulse laser is irradiated.
• the SnO 2 layer which can be a reactive layer, has extremely low excitation energy and is highly reactive due to multiphoton absorption (e.g., two-photon absorption). This is also true for an ITO layer, and an ITO layer can also be a reactive layer in this specification.
• at least a part of the SnO 2 layer (or ITO layer) sublimes or evaporates, and disappears from the irradiated area together with the SiO 2 layer on the upper side.
• a reactive layer that is relatively more reactive than other layers included in the multilayer structure refers to a SnO 2 layer or an ITO layer.
• the reactive layer may be set as a reactive layer that is most reactive than other layers included in the multilayer structure.
• the outermost layer of the multi-layered AR film is configured to be a low refractive index layer (e.g., a SiO2 layer).
• a low refractive index layer e.g., a SiO2 layer.
• the bottom layer (on the substrate side) of the multi-layer structure is also a low refractive index layer (for example, a SiO2 layer).
• the AR film can be formed, for example, by applying ion-assisted deposition.
• a water-repellent film may be formed on the low refractive index layer, which is the outermost layer of the AR film.
• the water-repellent film may be called an antifouling film.
• the water-repellent film may be formed before or after the design pattern according to this embodiment is formed.
• the water-repellent film is a film that imparts water repellency to the surface, and can be formed by applying a solution of a fluorine-based compound such as metaxylene hexafluoride.
• the water-repellent film may be formed by applying ion-assisted deposition, for example, in the same manner as in the case of the AR film.
• other functional layers may be formed on the AR film. There is no problem whether such functional layers contain metal components or not, as long as the effect of precise processing by laser irradiation is obtained. In addition, such functional layers may be uniform films or may be scattered on the surface.
• FIG. 5 is a side cross-sectional view showing an example of the laminated structure of the thin film according to this embodiment.
• the laminated structure of the illustrated example is configured by sequentially laminating an HC film 12, an AR film 13, and a water-repellent film 14 on the optical surface of the lens substrate 11.
• the AR film 13 has a multilayer structure in which a SiO 2 layer 13a, which is a low refractive index layer, and a SnO 2 layer 13b and a ZrO 2 layer 13c, which are high refractive index layers, are laminated, and the outermost layer (i.e., the surface layer on the water-repellent film 14 side) is configured to be the SiO 2 layer 13a.
• the SnO 2 layer is both a high refractive index layer and a reaction layer.
• jig blocking is performed by mounting one optical surface of the eyeglass lens to be processed (specifically, the optical surface that is not to be decorated, which will be described later) on a dedicated jig (S105). Then, the blocked eyeglass lens is set in an edge processing machine, edge processing (frame cutting processing) is performed on the eyeglass lens, and the outer shape of the eyeglass lens is cut into the frame shape (S106). Since jig blocking and frame cutting can be performed using publicly known technology, detailed explanations are omitted here. Then, while still in the blocked state, the lens height of the processing area is measured for the processing surface of the eyeglass lens to be processed. Then, laser processing is performed by irradiating the processing area with laser light.
• the eyeglass lens is removed from the dedicated jig by deblocking (S109), and the removed eyeglass lens is cleaned to remove any remaining material or foreign matter (foreign matter) from the laser processing (S110). After a final lens appearance inspection (S111), the manufacture of the eyeglass lens is completed.
• laser processing is performed by irradiating the processing area with laser light, and raster scanning is performed by moving the irradiation position of the laser light based on previously prepared pattern data (S108 on the right side of Figure 4).
• Vector scanning may be used instead of raster scanning. In this way, laser processing is performed on the processing area of the processing surface of the eyeglass lens.
• the eyeglass lens after laser processing is subjected to frame cutting processing. That is, the blocked eyeglass lens is set in an edge processing machine, and the eyeglass lens is edged (frame cutting processing) and the outer shape of the eyeglass lens is cut into the frame shape (S115).
• frame cutting processing jig deblocking is performed to remove the eyeglass lens from the dedicated jig (S116), and the removed eyeglass lens is cleaned to remove any remaining material from processing and any adhering matter (foreign matter) (S117). Then, after a final lens appearance inspection (S118), the manufacture of the eyeglass lens is completed.
• the AR film 13 covering the optical surface of the lens substrate 11 is irradiated with laser light, and a predetermined layer including the SiO 2 layer 13a, which is the outermost layer of the AR film 13, is partially removed, thereby forming a design pattern (laser processing).
• laser processing when the laser light that has passed through the outermost SiO 2 layer reaches the SnO 2 layer on the lower side, the SnO 2 layer is sublimated or evaporated by the energy of the irradiation, and at least a part of it disappears from the irradiated area together with the SiO 2 layer on the upper side.
• the predetermined layer including the outermost SiO 2 layer 13a is partially removed by laser processing that irradiates the laser light.
• the irradiated area is subjected to a removal process that exposes the high refractive index layer on the lower side, and a design pattern is formed.
• the exposed high refractive index layer is, for example, the ZrO 2 layer 13c.
• the SnO 2 layer 13b can be formed to a small thickness (for example, 3 to 20 nm, more preferably, 3 to 10 nm). In this embodiment, the thickness is set to 5 nm.
• SnO2 functions as a reactive layer that is most reactive to laser irradiation.
• This reactive layer preferably contains Sn and O, and in addition to SnO2 , ITO can be used.
• the reaction layer does not necessarily need to be completely removed, and a part of it may remain at the irradiated location.
• the reaction layer may be at least partially removed in the thickness direction of the layer by laser irradiation.
• the reaction layer may remain partially at the laser irradiated location when viewed not only in the thickness direction of the layer but also from the laser irradiation direction (when viewed from the front by a third party).
• ZrO 2 may be only partially exposed.
• SnO 2 (or ITO) is also a high refractive index material, and there is no problem with visibility even if ZrO 2 is not completely exposed due to SnO 2 when viewed from the front by a third party. Therefore, it is sufficient that the high refractive index layer on the lower layer side of the reaction layer, or the reaction layer that remains partially together with the high refractive index layer, is exposed.
• the reactive layer ( SnO2 , ITO, etc.) is preferably a conductive layer having a higher conductivity than other layers included in the laminated structure.
• the reaction layer made of SnO2 has smaller energy corresponding to the band gap where excitation occurs when irradiated with a laser under the conditions described below than the SiO2 on the upper layer side (outermost surface side) and the ZrO2 layer on the lower layer side. Therefore, it is more likely to disappear due to sublimation/evaporation more quickly than the adjacent layers on the upper and lower layers.
• Figure 6 is an explanatory diagram showing an example of the schematic configuration of a laser processing device used in the manufacturing method of eyeglass lenses according to this embodiment.
• the laser processing device used in this embodiment includes a laser light source unit 21, an aperture 22, a galvanometer scanner unit 24, and an optical system 25, and is configured to irradiate the AR film 13 with laser light via each of these units 21 to 25.
• the laser light source unit 21 emits laser light used for laser processing, and is configured to emit an ultrashort pulse laser.
• the lower limit of the pulse width of the ultrashort pulse laser is not particularly limited as long as it exceeds 0 femtoseconds, but it is preferable that it is 0.01 picoseconds (10 femtoseconds) or more, and using one that is 0.1 picoseconds or more (including one picosecond or more) is advantageous in terms of equipment maintenance and costs, and is more suitable for commercial use.
• a pulse width of 0.01 picoseconds (10 femtoseconds) or more and less than 100 picoseconds, preferably a pulse width of 0.01 picoseconds or more and less than 50 picoseconds, and more preferably a pulse width of 0.01 picoseconds or more and less than 15 picoseconds, can be used.
• a pulse width of 0.1 picoseconds or more and less than 100 picoseconds preferably a pulse width of 0.1 picoseconds or more and less than 50 picoseconds, and more preferably a pulse width of 0.1 picoseconds or more and less than 15 picoseconds can be used.
• the wavelength of the ultrashort pulse laser can be, for example, 355 nm THG (Third Harmonic Generation) or 532 nm SHG (Second Harmonic Generation), or a fundamental wavelength of 1064 nm.
• the irradiation beam diameter can be selected according to the desired processing design. In order to process fine designs with high resolution, it is effective to narrow the beam diameter, but in this case, shorter wavelengths are more advantageous, so of the above wavelengths, 532 nm is preferable, and 355 nm is more preferable. Or, 266 nm FHG (Fourth Harmonic Generation) can also be applied.
• the pulse energy of the ultrashort pulse laser is, for example, 0.1 ⁇ J to 30 ⁇ J (maximum of about 60 ⁇ J) at 50 kHz. More preferably, it is 0.5 to 10 ⁇ J, and even more preferably 1 to 6 ⁇ J.
• the beam diameter of the ultrashort pulse laser is, for example, 10 ⁇ m or more and 30 ⁇ m or less.
• the machining diameter per pulse can be 10 ⁇ m or more and 30 ⁇ m or less.
• a machining diameter of about 500 ⁇ m may be applied depending on the design pattern shape.
• the machining diameter can be made smaller, to about 50 ⁇ m, 30 ⁇ m, or 20 ⁇ m.
• the pulse width of the ultrashort pulse laser is less than 0.1 picoseconds, good processing can be performed with any wavelength between 266 and 1064 nm. The shorter the wavelength, the more advantageous it is for fine processing. However, the production load is large in terms of the maintenance and management of the equipment and the cost.
• the pulse width of the ultrashort pulse laser is 0.1 picoseconds or more and less than 1 picosecond, good processing can be performed with any wavelength of 266 to 1064 nm. The shorter the wavelength, the more advantageous it is for fine processing.
• the pulse width of the ultrashort pulse laser is 1 picosecond or more and less than 100 picoseconds, good processing can be performed with any wavelength between 266 and 1064 nm.
• the pulse width of the ultrashort pulse laser is 100 picoseconds or more and less than 1 nanosecond, the processing stability becomes non-uniform depending on the applied wavelength. For example, when the short wavelength of 266 nm is used as the applied wavelength, damage is likely to occur on the lower layer side along with the reaction of SnO2 , and it is difficult to obtain smoothness. Even with 355 nm, even a slight change in the irradiation conditions can cause the processing uniformity to be lost, and the phenomenon that the removal processing reaches the lower layer side of SnO2 cannot be prevented. (5) When the pulse width of the ultrashort pulse laser is 1 nanosecond or more, it is not possible to selectively remove the SnO2 and the layers on the surface side thereof. Damage occurs on the lower layer side, and smoothness cannot be obtained.
• the removal process using an ultrashort pulse laser is uniform in terms of the processing diameter and processing depth. To achieve this, it is considered useful to apply a specific ultrashort pulse width to control and utilize the duration of the energy emitted by the irradiation and the delay in ablation of the underlying material.
• the laser processing device may further include a beam shaper unit.
• a beam shaper to convert the laser light from the laser light source unit 21 from a Gaussian-type energy distribution to a top-hat-type energy distribution, it becomes possible to realize laser processing using laser light with a uniform energy distribution.
• a top-hat-type distribution when a top-hat-type distribution is applied, stable and uniform processing can be performed when multiple beam spots are partially overlapped to form a processing region of a specified area. This is because localized excessive addition of energy caused by spot overlapping is suppressed.
• the design pattern may be formed by applying Gaussian distribution energy irradiation without using a beam shaper.
• the inventors have further discovered that a more significant effect can be obtained by adding the following innovation. Specifically, it has been discovered that it is possible to stably process the RaA to less than 0.0080 ⁇ m.
• the configuration include satisfying at least one of the following: -
• the beam divergence angle of the ultrashort pulse laser is less than 0.300 mrad.
• the mode quality M2 of the ultrashort pulse laser shall be 1.1 or less.
• An aperture is applied to the ultrashort pulse laser beam, and the aperture diameter is set to 80 ⁇ m or less, or 60 ⁇ m or less, or even 30 ⁇ m or less, or 25 ⁇ m or less.
• the necessary and sufficient energy can be applied to the thin film for eyeglass lenses, which is the workpiece, while maintaining uniformity of the surface. Furthermore, the inventors have found that no matter what the design pattern, the design pattern is not easily visible to the wearer. In particular, the inventors have found that even when a single portion of the removed portion of the low refractive index layer is relatively large in area, the wearer can still obtain a comfortable field of vision.
• eyeglass lenses are usually constructed with curved surfaces. Therefore, by adopting the above configuration, it is possible to provide more leeway in the focal depth compared to when a top-hat distribution is directly adopted. This means that, as mentioned above, it is advantageous for stably obtaining smoothness as an area.
• the galvano scanner unit 24 moves the irradiation position of the laser light from the laser light source unit 21 in two or three dimensions, thereby enabling scanning with the laser light to be performed, thereby enabling the formation of a desired design pattern by laser processing.
• the scannable range of the laser light by the galvano scanner unit 24 i.e., the maximum laser processing area 4 is set to a size and shape that can completely encompass the outer shape of the eyeglass lens to be processed (see Figure 1).
• the optical system 25 can be constructed by combining optical lenses such as telecentric lenses and mirrors, and guides the laser light from the laser light source unit 21 so that the laser light reaches the area of the eyeglass lens to be processed.
• the laser processing device used in this embodiment is configured to irradiate the AR film 13 with laser light (i.e., ultrashort pulse laser) through an optical system 25 or the like in a defocused setting, as shown in FIG. 6B.
• the defocused setting means that the focal position F of the irradiated laser light is set a predetermined defocus distance away from the surface of the AR film 13, which is the area to be processed by the laser light. If the laser light is irradiated in such a defocused setting, the beam energy can be dispersed on the surface of the AR film 13 irradiated with the laser light, thereby making it possible to perform uniform film removal processing.
• the laser light may be irradiated in a focus setting in which the focal position F coincides with the surface of the AR film 13, or in a focus setting in which the focal position F is away in the opposite direction to the defocused setting.
• the region A which is the processed portion, may be divided into a plurality of regions, such as the region A1 from which a predetermined layer including the SiO2 layer 13a has been partially removed as described above, and the region A2 from which at least the ZrO2 layer below the region A1 has also been removed.
• the eyeglass lens to be processed is set in the laser processing device. At this time, the eyeglass lens is set so that the optical surface of the eyeglass lens, more specifically the surface of the AR film 13 on that optical surface, becomes the surface to be processed.
• the optical surface to be processed may be either the surface on the object side or the surface on the eyeball side, but here, for example, the surface on the eyeball side is taken as the surface to be processed.
• the laser light source unit 21 and the galvano scanner unit 24 are operated based on the prepared pattern data (i.e., pattern data of a specified resolution created based on the design pattern to be obtained).
• the ultrashort pulse laser is irradiated onto the processing area of the processing surface of the eyeglass lens so as to form the shape of the processing portion, which is part of the design pattern.
• the ultrashort pulse laser When the ultrashort pulse laser is irradiated, it passes through the water-repellent film 14 on the surface of the eyeglass lens to be processed and reaches the AR film 13 on the surface to be processed. When the ultrashort pulse laser reaches the AR film 13, laser processing is performed by the ultrashort pulse laser.
• the ablation processing of this embodiment is a technology that allows for highly energy-efficient processing by utilizing the multiphoton absorption phenomenon of an ultrashort pulse laser. More specifically, it is a removal process in which the heat effect around the processing area is minimized and the irradiated area of the laser light is instantly melted, evaporated, or sublimated, and scattered. With this type of laser processing, highly reactive materials are instantly removed from the irradiated area, so that processing can be performed with less heat effect around the processing area and less thermal damage (such as deformation due to heat).
• the laser processing according to this embodiment can be ablation processing as a non-heating processing.
• This type of processing can cause a multi-photon absorption process (e.g., a two-photon absorption process) that brings about the multi-photon absorption phenomenon mentioned above. Therefore, even for materials that are relatively transparent (high transmittance) to lasers, multi-photon absorption can provide efficient and good processing.
• the range of applicable laser wavelengths is wide, and as the wavelength of the laser light, 355 nm (THG), 532 nm (SHG), and 1064 nm can be advantageously used.
• picosecond and femtosecond lasers with short pulse widths are advantageous for inducing the multiphoton absorption.
• Specific values include a pulse width of less than 100 picoseconds, preferably less than 50 picoseconds, and more preferably less than 1 picosecond (i.e., femtoseconds).
• the laser penetrates the SiO2 of the multilayer structure constituting the AR film 13 and reaches the reactive layer ( SnO2 in this embodiment), and the reactive layer reacts instantaneously and sublimes/evaporates, removing the SiO2 layer 13a, which is the outermost layer.
• the reactive layer SnO2 in this embodiment
• the reactive layer reacts instantaneously and sublimes/evaporates, removing the SiO2 layer 13a, which is the outermost layer.
• the reactive layer SnO2 in this embodiment
• the predetermined layers including the SiO2 layer 13a, which is the outermost layer of the AR film 13, are partially removed (removed portions are formed), and the ZrO2 layer 13c, which is the high refractive index layer, is exposed, whereby the design pattern is formed (laser processing) on the processed surface of the eyeglass lens.
• the irradiated portion where the predetermined laser irradiation is performed is partially processed on the processed surface.
• FIG. 7A is an explanatory diagram showing an example of the essential configuration of a spectacle lens according to this embodiment.
• FIG. 7B shows a specific example of the results of observation of a cross section of an AR film 13 using an electron microscope.
• the example shows an enlarged view of parts A and B in FIG. 7A, showing electron microscope images of the laser scan area 16 (i.e. area A) and the unprocessed area 15 (i.e. area B).
• the eyeglass lens according to this embodiment is configured by sequentially laminating an HC film 12, an AR film 13, and a water-repellent film 14 on the optical surface of a lens substrate 11.
• the AR film 13 has a multilayer structure in which a low refractive index layer, a SiO2 layer 13a, and high refractive index layers, a SnO2 layer 13b and a ZrO2 layer 13c, are laminated, and a predetermined layer including the SiO2 layer 13a, which is the outermost layer of the multilayer structure (specifically, the SnO2 layer, which is a reaction layer, and layers on the surface side thereof) is partially removed to expose the high refractive index layer, the ZrO2 layer 13c.
• the eyeglass lens according to this embodiment is configured to include an unprocessed region 15 in which the optical surface of the lens substrate 11 is covered with the HC film 12, the AR film 13, and the water-repellent film 14, and a laser scan region (patterned region) 16 in which the outermost SiO2 layer 13a in the AR film 13, the SnO2 layer 13b immediately below it, and the water-repellent film 14 are partially removed to expose the ZrO2 layer 13cb, which is a high refractive index layer.
• an unprocessed region 15 in which the optical surface of the lens substrate 11 is covered with the HC film 12, the AR film 13, and the water-repellent film 14, and a laser scan region (patterned region) 16 in which the outermost SiO2 layer 13a in the AR film 13, the SnO2 layer 13b immediately below it, and the water-repellent film 14 are partially removed to expose the ZrO2 layer 13cb, which is a high refractive index layer.
• One of the unprocessed area 15 and the laser scan area 16 is covered with the SiO 2 layer 13a, and the other is exposed with the ZrO 2 layer 13c (or the reaction layer, which is a high refractive layer, if a part of the reaction layer remains), so the light reflectance in each area differs depending on the presence or absence of the SiO 2 layer 13a. Therefore, when the state in which the illumination light is irradiated onto the eyeglass lens is viewed from the outside, the pattern shape formed by the laser scan area 16 can be visually recognized. In other words, if the laser scan area 16 is formed in the shape of the processed part, which is a part of the design pattern configuration, the area A, which is the processed part, can be visually recognized. In this way, the removed part of the predetermined layer of the AR film 13 can be used as a part of the design pattern.
• the laser scan area 16 constituting the design pattern is formed by removing at least a part of the SiO2 layer 13a, which is the outermost layer of the AR film 13, and the SnO2 layer 13b, which is the layer immediately below it.
• the removal target is limited to a predetermined layer containing SnO2, which is a reactive layer. Therefore, it is possible to suppress peeling caused by the formation of the laser scan area 16 for each layer of the multilayer structure constituting the AR film 13.
• the removal of the SiO2 layer 13a which is the top layer of the AR film 13
• This type of laser processing reduces the thermal impact on the periphery of the processing area, and can suppress the occurrence of thermal damage.
• by applying the above-mentioned predetermined pulse width stable processing can be performed while suppressing damage to the layer below the reaction layer. This exposes the ZrO2 layer 13c as a high refractive index layer, but it is possible to suppress damage to the exposed surface of the ZrO2 layer 13c.
• the film thicknesses of the SiO2 layer 13a, ZrO2 layer 13c, etc. can be specified by acquiring an electron microscope image of the cross section of the AR film 13 and analyzing the acquired image.
• Fig. 7B shows a specific example of the observation result of the cross section of the AR film 13 by an electron microscope.
• the example shows an electron microscope image of the laser scan area 16 and the unprocessed area 15 by enlarging the A and B parts in Fig. 7A.
• the SiO2 layer 13a, the SnO2 layer 13b, and the ZrO2 layer 13c are laminated, but since the SnO2 layer 13b is thin (for example, about 5 nm), it is difficult to recognize it in the image.
• the SnO2 layer 13b and the SiO2 on the surface side thereof are removed, thereby exposing the ZrO2 layer 13c.
• the ratio t1/t2 of the thickness t1 of the removed portion to the thickness t2 of the non-removed portion is, for example, in the range of 0.90 to 1.00, preferably in the range of 0.95 to 1.00, and more preferably in the range of 0.99 to 1.00.
• the laser scan area 16 is formed by laser processing by irradiation with an ultrashort pulse laser, and no damage is caused to the underlying ZrO2 layer 13c. This means that if the thickness ratio t1/t2 of the exposed ZrO2 layer 13c falls within the above-mentioned range, the laser scan area 16 is formed without damaging the ZrO2 layer 13c, and it can be assumed that the formation of the laser scan area 16 was performed using laser processing with an ultrashort pulse laser.
• the reason why the ZnO 2 layer 13 is not damaged is because the reactivity of the reactive layer (here, the SnO 2 layer) by the ultrashort pulse laser is higher than that of ZnO 2. And, this difference in reactivity can be significantly obtained by applying an ultrashort pulse laser with a predetermined pulse width, as described later.
• the thickness of the ZrO2 layer is 10 times or more, preferably 15 times or more, the thickness of the SnO2 layer, even if the ZrO2 layer is slightly reduced after the SnO2 layer disappears, there is no risk of film peeling or an effect on the visibility of the design pattern.
• the melting point of SnO2 is about 1127°C, which is lower than that of SiO2 on the upper layer and that of ZrO2 on the lower layer, and this is also thought to be related to the ease of control of ablation.
• the outermost layer of the AR film 13 is a SiO 2 layer 13a as a low refractive index layer
• the layer below the SiO 2 layer 13a is a SnO 2 layer 13b as a high refractive index layer
• the ZrO 2 layer 13c as a high refractive index layer is further below, and when SnO 2 reacts by laser irradiation and is partially removed, SiO 2 is also removed accordingly, thereby exposing the ZrO 2 layer 13c as a high refractive index layer, but the present invention is not limited to this.
• the AR film 13 may be configured by laminating layers other than the SiO 2 layer 13a, SnO 2 layer 13b, and ZrO 2 layer 13c.
• the outermost layer of the AR film 13 may be a layer other than the SiO 2 layer 13a as long as it is a low refractive index layer.
• the high refractive index layer may be a layer other than the SnO 2 layer 13b or ZrO 2 layer 13c.
• the SnO2 layer 13b serving as the reactive layer may be replaced with a thin ITO layer having electrical conductivity.
• each multilayer film on each surface of the eyeglass lens includes one or more high refractive index layers and one or more low refractive index layers, and that the total number of layers is 10 or less (preferably 9 or less, and more preferably 8 or less).
• the case where the SnO2 layer, which is the reactive layer included in the AR film 13, and the SiO2 layer 13a, which is the top layer immediately above the SnO2 layer, which is the top layer immediately above the SnO2 layer, are removed by laser processing using an ultrashort pulse laser, is taken as an example.
• This has the effect of suppressing film peeling.
• it is possible to realize laser processing using an ultrashort pulse laser so as to remove a predetermined number of layers including the top layer. Even when removing a number of layers including the top layer, laser processing using an ultrashort pulse laser can suppress damage to the exposed surface of the layer that will be exposed by the removal, so that the reduction in film thickness associated with the removal processing can also be suppressed.
• the ratio t1/t2 of the thickness t1 of the removed portion to the thickness t2 of the non-removed portion of the layer immediately below the removed layer falls within the range of, for example, 0.90 or more and 1.00 or less, preferably 0.95 or more and 1.00 or less, more preferably 0.99 or more and 1.00 or less.
• the spectacle lens before laser processing in this embodiment may be provided with an anti-reflection film on both sides.
• the anti-reflection film in this embodiment the one shown in Figure 7 can be an interference layer with a 6-9 layer structure, and can have the following structure, for example. From the substrate side, SiO 2 (film thickness 20-40 nm) / ZrO 2 (film thickness 3-10 nm) / SiO 2 (film thickness 350-450 nm) / ZrO 2 (film thickness 10-35 nm) / SiO 2 (film thickness 10-50 nm) / ZrO 2 (film thickness 30-55 nm) / SnO 2 (film thickness 3-20 nm) / SiO 2 (film thickness 80-150 nm) can be used.
• the contents described in International Publication WO2020/067407 can be mentioned.
• the description of the publication can be referred to in its entirety in this specification.
• the eyeglass lens having the configurations of Examples 1 and 2 described in the publication (Example 1 if one of them is to be mentioned) may be adopted as a specific example.
• a specific example of the eyeglass lens before decoration in this embodiment is as follows.
• the eyeglass lens comprises: A spectacle lens having a multilayer film on both sides of a lens substrate, at least in region B (unprocessed portion), the sum of the average reflectances in the wavelength band of 360 to 400 nm on each surface of the spectacle lens is 6.0% or less; the sum of the average reflectances in the wavelength band of 400 to 440 nm on each surface of the spectacle lens is 20.0% or more; The sum of the average reflectances of the respective surfaces of the spectacle lens in the wavelength band of 480 to 680 nm is 2.0% or less.
• the sum of the average reflectance of each surface is set to 20.0% or more (preferably more than 20.0%, and even more preferably 25.0% or more). In other words, the reflectance is locally increased in the purple region.
• the sum of the average reflectance of each surface is set to 6.0% or less (preferably less than 6.0%, and more preferably 5.0% or less), and the reflectance is locally reduced, in contrast to the case of the violet region (400-440 nm).
• the sum of the average reflectance of each surface is set to 2.0% or less (preferably less than 2.0%, and more preferably 1.5% or less), and the reflectance is reduced locally, particularly in the main wavelength band of visible light, in order to aim for the transmission of visible light.
• the laser processing according to the present embodiment is performed on the spectacle lens of this specific example, the following advantageous effects are achieved.
• the region B (unprocessed portion) of the spectacle lens of this specific example the blocking effect against light in the blue region is ensured, that is, the reflectance of light in the blue region is high. Therefore, when a third party looks at the object side surface of the spectacle lens 1, the region B (unprocessed portion) of the spectacle lens appears blue.
• the portion where the laser processing has been performed appears to be the color of the layer exposed by the laser processing (yellow, gold, or silver, which is the color of the ZrO 2 layer in this specific example).
• the processed portion, region A appears to emerge against a blue background.
• the background is not blue, that is, when the reflectance of light in the blue region is not high but the reflectance of light in other color regions is high.
• the color when a third party looks at the region B (unprocessed portion) from the object side surface of the spectacle lens 1 is green or pearl color.
• the above-mentioned good contrast when viewing the processed portion can be achieved whether the laser processing is performed on the multilayer film on the object side of the eyeglass lens or on the eye side.
• the eyeglass lens with the design pattern of this embodiment does not obstruct the wearer's clear field of vision.
• area A which is the processed portion in this embodiment, has a high transmittance for visible light, and since the difference in transmittance between it and area B, which has not been processed, is small, its presence is virtually unnoticeable even when it comes into the wearer's field of vision.
• this embodiment when this embodiment is applied to rimless or half-rimmed glasses, the following advantages are obtained. That is, while applying rimless or half-rimmed glasses, it is also possible to create a pseudo-rim by drawing a pseudo-rim near the outer edge of the lens using a coloring material such as a known pigment, or by forming irregularities on the lens surface.
• a coloring material such as a known pigment
• the design pattern of this embodiment formed by the above-mentioned laser irradiation is advantageous in that it is free from the restrictions experienced with glasses with rims, that is, the impression that the field of view is limited to a certain area, and the outer edge of the field of view feels dark due to the rim, and allows the wearer to feel a wide and bright field of view.
• the design pattern of this embodiment (particularly area A, which is the processed portion) can be formed within the frame-cut lens area, allowing the lens to carry desired letters, symbols, or patterns, or to have the desired design applied, without affecting the functionality of the eyeglasses.
• the laser processing of this embodiment is processing that can be seen from both the processed surface side and the back side of the lens. This is because the designed antireflection property is reduced in the removed portion where a part of the multi-layered antireflection film is removed (in this embodiment, SnO2 and the SiO2 on the upper layer thereof are removed), and a contrast in the amount of reflected light is obtained between the removed portion and the non-removed portion.
• Figure 8 shows the surface of the processed area of a specific example of a spectacle lens, in which a sample has an anti-reflection film on both the object side and the eyeball side, when processed with a pulsed laser.
• Figure 8A is a photograph taken from the object side of the specific example of a spectacle lens having an anti-reflection film on both sides shown in Figure 7A, showing the processing of the eyeball side surface of the spectacle lens using pulsed laser light with a wavelength of 355 nm and a pulse width of 10 picoseconds or more and less than 20 picoseconds.
• the light colored area corresponds to the laser scan area 16, and the dark colored area indicates the unprocessed area.
• FIG. 8B is a plot showing the transmittance (T'1) in area A and the transmittance (T'2) when passing through area B, with the vertical axis being transmittance (%) and the horizontal axis being wavelength (nm).
• FIG. 8C is a plot showing the reflectance (R1f, R2f, R1b, and R2b) of the spectacle lens of the above specific example, with the vertical axis representing reflectance (%) and the horizontal axis representing wavelength (nm).
• the laser is irradiated and moved horizontally using a raster scan, eventually processing the entire surface.
• Figure 9 is a bar graph (vertical axis is transmittance (%)) showing the luminous transmittance of a specific example of a spectacle lens sample with anti-reflection coatings on both the object side and the eyeball side when laser processing is performed from the eyeball side.
• one specific example of a spectacle lens can maintain a transmittance of 80% or more regardless of whether the unprocessed or processed part is involved.
• Figure 10 is a bar graph (vertical axis is reflectance (%)) showing the reflectance when light is irradiated from the normal direction of the object-side surface toward the object-side surface and reflected in the normal direction when laser processing is performed on a sample of an eyeglass lens with an anti-reflection film on both the object side and the eyeball side, as an example of the lens.
• FIG. 11 is a bar graph (vertical axis is lightness) showing lightness L* when a sample of a spectacle lens according to one specific example has an anti-reflection film provided on each of the object side and eyeball side, and when laser processing is performed from the eyeball side, light is irradiated towards the object-side surface from the normal direction of the object - side surface.
• FIG. 12 is a bar graph (vertical axis is lightness) showing chromaticity a* and b* when light is irradiated toward the object-side surface from the normal direction of the object-side surface for a specific example of a spectacle lens sample having an anti-reflection film on each of the object side and eyeball side , when laser processing is performed from the eyeball side.
• FIG. 13 is a bar graph (vertical axis is charge amount) showing the charge amount (unit: V) on the eyeball side surface (laser processing side) of a specific example of a spectacle lens sample in which an anti-reflection film is provided on both the object side and the eyeball side.
• the hatched bar graph is the first measurement value.
• the solid black bar graph is the second measurement value.
• the charge amount was measured using an apparatus named SK-H050.

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