WO2024198130A1 - 显示面板和电子终端 - Google Patents

显示面板和电子终端 Download PDF

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Publication number
WO2024198130A1
WO2024198130A1 PCT/CN2023/104135 CN2023104135W WO2024198130A1 WO 2024198130 A1 WO2024198130 A1 WO 2024198130A1 CN 2023104135 W CN2023104135 W CN 2023104135W WO 2024198130 A1 WO2024198130 A1 WO 2024198130A1
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WIPO (PCT)
Prior art keywords
layer
substrate
color
color filter
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2023/104135
Other languages
English (en)
French (fr)
Inventor
张桂洋
朱九慧
罗成志
张鹏飞
何瑞
查国伟
刘广辉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wuhan China Star Optoelectronics Technology Co Ltd
Original Assignee
Wuhan China Star Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wuhan China Star Optoelectronics Technology Co Ltd filed Critical Wuhan China Star Optoelectronics Technology Co Ltd
Priority to US18/289,035 priority Critical patent/US12449691B2/en
Publication of WO2024198130A1 publication Critical patent/WO2024198130A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133345—Insulating layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133357—Planarisation layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133504—Diffusing, scattering, diffracting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133504—Diffusing, scattering, diffracting elements
    • G02F1/133507—Films for enhancing the luminance
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133526—Lenses, e.g. microlenses or Fresnel lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528—Polarisers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/50—Protective arrangements

Definitions

  • the present application relates to the field of display technology, in particular to the manufacture of display devices, and specifically to display panels and electronic terminals.
  • Liquid crystal displays can be used in small-sized mobile phone screens as well as large-sized computer and TV screens, and have become the mainstream product in the display field.
  • LCD screens contain more optical film layers, which causes the light emitted at a large angle (such as greater than 45°) to usually form interference light between the optical film layers, affecting the display effect.
  • the purpose of the present application is to provide a display panel and an electronic terminal to solve the technical problem of poor display effect caused by large-angle light when the existing liquid crystal display screen is applied to AR technology.
  • the embodiment of the present application provides a display panel, comprising a plurality of opening areas, including:
  • a color filter substrate arranged opposite to the array substrate, comprising a plurality of color resist portions respectively located in the plurality of opening areas;
  • a backlight module is located on a side of the array substrate away from the color filter substrate;
  • the optical layer is located in at least one of the color filter substrate and the array substrate, and is at least arranged opposite to the plurality of color resistance portions.
  • the optical layer is used for focusing light.
  • the optical layer comprises:
  • An optical structure layer including a protrusion
  • An optical protection layer at least located on a first side of the optical structure layer, the first side being a side where the protrusion is protruding;
  • the refractive index of the protrusion is greater than the refractive index of the optical protective layer.
  • the color filter substrate comprises:
  • a color filter layer located on a side of the first substrate close to the array substrate, including a plurality of color resistance portions
  • the optical layer is located between the first substrate and the color filter layer, or the optical layer is located on a side of the color filter layer close to the array substrate.
  • the color filter substrate comprises:
  • An upper polarizer located on a side of the plurality of color resist portions away from the array substrate;
  • the optical layer is located on a side of the upper polarizer away from the plurality of color resist portions, or the optical layer is located on a side of the upper polarizer close to the color resist portions.
  • the array substrate comprises:
  • a circuit layer located on a side of the second substrate close to the color filter substrate, comprising a plurality of driving transistors corresponding to the plurality of color resistors;
  • the optical layer is located on a side of the circuit layer close to the color filter substrate, or the optical layer is located on a side of the second substrate away from the color filter substrate.
  • the array substrate comprises:
  • An insulating layer located on at least one side of the metal layer and arranged in the same layer as the optical structure layer;
  • the flat layer is located on at least one side of the insulating layer and is disposed on the same layer as the optical protection layer.
  • the protrusion includes a first protrusion that is a column, the top of the first protrusion is parallel to the bottom, and at least one side of the first protrusion is parallel to and close to the array substrate or the color filter substrate;
  • the orthographic projection of the first protrusion on the color filter substrate covers n color resistance portions of the same color in the length direction, wherein n is a positive integer, and the orthographic projection of the top on the color filter substrate is located between the corresponding two color resistance portions, and the orthographic projection of the bottom on the color filter substrate is located between the corresponding two color resistance portions.
  • the color resist portion is covered in the width direction by the orthographic projections of m first protrusions arranged continuously and in parallel on the color film substrate, where m is a positive integer, and the orthographic projections of the side portions of the m first protrusions on the color film substrate are located between the corresponding two color resist portions.
  • a boundary of the orthographic projection of the first protrusion on the color filter substrate is located between the corresponding color resist portion and an adjacent color resist portion, and an orthographic projection of the first protrusion on the color filter substrate has an angle with the corresponding color resist portion.
  • the protrusion includes a second protrusion that is a cone, a table, or a hemispherical shape, and at least one of a top and a bottom of the second protrusion is parallel to the array substrate;
  • the orthographic projection of the second protrusion on the color filter substrate covers the corresponding color resist portion, and the boundary of the orthographic projection of the second protrusion on the color filter substrate is located between the plurality of color resist portions.
  • a side of the optical protection layer away from the optical structure layer is a plane
  • a portion of the optical protective layer on a side away from the optical structure layer, corresponding to a gap between two adjacent raised portions, is recessed toward a side close to the optical protective layer to form a recessed area compared to a portion corresponding to the raised portions, and the black portion between two adjacent color resistance portions is filled into the recessed area.
  • the array substrate comprises:
  • the circuit layer is located on a side of the second substrate close to the color filter substrate, and includes a first metal layer and a second metal layer located on a side of the first metal layer close to the color filter substrate;
  • the reflectivity of the first metal layer is greater than the reflectivity of the second metal layer.
  • An embodiment of the present application provides an electronic terminal, comprising any display panel as described above.
  • the present application provides a display panel and an electronic terminal, comprising a plurality of opening areas, including: an array substrate; a color film substrate, arranged opposite to the array substrate, comprising a plurality of color resistance portions respectively located in the plurality of the opening areas; a backlight module, located on a side of the array substrate away from the color film substrate; wherein, by arranging at least one of the two, located inside the color film substrate and inside the array substrate, at least an optical layer is arranged opposite to the plurality of the color resistance portions and is used for focusing light, so that light with a large angle is converged toward the middle of the display panel, so that the light after passing through the optical layer is light with a small angle, so as to reduce the amount of interference light and improve the display effect of the display panel.
  • 1 to 8 are cross-sectional schematic diagrams of eight display panels provided in embodiments of the present application.
  • 9 to 14 are schematic diagrams of the three-dimensional structures of six types of protrusions provided in embodiments of the present application.
  • FIG. 15 is a schematic top view of a protrusion and a color filter substrate provided in an embodiment of the present application.
  • FIG. 16 is a cross-sectional schematic diagram of another protrusion and a color filter substrate provided in an embodiment of the present application.
  • the present application provides a display panel, which includes but is not limited to the following embodiments and combinations of the following embodiments.
  • the display panel 100 includes a plurality of opening areas A, including: an array substrate 10; a color filter substrate 20, which is arranged opposite to the array substrate 10, and includes a plurality of color resist portions 01 respectively located in the plurality of opening areas A; a backlight module 30, which is located on the side of the array substrate 10 away from the color filter substrate 20; an optical layer 40, which is located in at least one of the color filter substrate 20 and the array substrate 10 (in FIG. 1 , the optical layer 40 is only taken as an example that the optical layer 40 is located in the color filter substrate 20), and is at least arranged opposite to the plurality of color resist portions 01, and the optical layer 40 is used for focusing light.
  • the color filter layer 202 may also include a black matrix 02, which can be understood as a plurality of gaps formed by the plurality of color resist portions 01 filled with the black matrix 02, and the portion of the black matrix 02 located between two adjacent color resist portions 01 of different colors can block and absorb light of different colors generated after passing through the two color resist portions 01 of different colors, thereby reducing the risk of crosstalk of different colors.
  • a black matrix 02 which can be understood as a plurality of gaps formed by the plurality of color resist portions 01 filled with the black matrix 02, and the portion of the black matrix 02 located between two adjacent color resist portions 01 of different colors can block and absorb light of different colors generated after passing through the two color resist portions 01 of different colors, thereby reducing the risk of crosstalk of different colors.
  • the display panel 100 may further include a non-opening area B, which may be understood as a plurality of inner boundaries of the non-opening area B respectively constituting outer boundaries of a plurality of opening areas A.
  • the array substrate 10 may include a plurality of pixel electrodes respectively located in the plurality of opening areas A, a plurality of pixel driving circuits located in the non-opening area B, a plurality of cross-arranged gate lines and a plurality of data lines, each pixel driving circuit being electrically connected to a corresponding gate line, a corresponding data line and a corresponding pixel electrode, so as to generate a corresponding pixel voltage on the corresponding pixel electrode under the action of the corresponding gate line and the corresponding data line; further, a liquid crystal layer 50 may be provided between the array substrate 10 and the color film substrate 20, and the color film substrate 20 may include a common electrode at least arranged corresponding to the plurality of pixel electrodes and loaded with a common voltage, and of course, it
  • a large number of optical film layers including but not limited to a reflective layer, a light guide layer, a diffusion layer, a prism layer, etc. will be provided in the backlight module 30, resulting in interference light between the optical film layers at a large angle (such as greater than 45°) emitted by the backlight module 30, affecting the display effect.
  • the optical layer 40 for focusing light in at least one of the color filter substrate 20 and the array substrate 10 at least the light emitted by the backlight module 30 toward the light-emitting surface of the display panel 100 can pass through the optical layer 40, so as to converge through the focusing effect of the optical layer 40, and in particular, the large-angle light can be converged toward the middle of the display panel 100, so that the light after passing through the optical layer 40 is a small-angle light, so as to reduce the amount of interference light and improve the display effect of the display panel 100.
  • the power consumption of the display panel 100 and the battery life of the product can also be reduced, which is conducive to the high-resolution development of the product.
  • the optical layer 40 includes: an optical structure layer, including a protrusion 401; an optical protective layer 402, at least located on a first side of the optical structure layer, the first side being a side where the protrusion 401 is protruding; wherein the refractive index of the protrusion 401 is greater than the refractive index of the optical protective layer 402.
  • the protrusion 401 can be understood as a structure that has a convergence effect on light and is in a convex shape, and the specific structure and the protrusion direction of the protrusion 401 are not limited here.
  • the refractive index of the protrusion 401 can be greater than the refractive index of the film layer below the protrusion 401, and the light entering the protrusion 401 can be converged once regardless of whether the protrusion direction of the protrusion 401 is upward or downward. Further, the refractive index of the protrusion 401 can be greater than the refractive index of the film layer above the protrusion 401, so that the light emitted from the protrusion 401 is converged again, further enhancing the convergence effect on the light.
  • the optical protective layer 402 in this embodiment can cover the protrusion side of the protrusion 401 in the optical structure layer, and has a certain flattening "protrusion" effect, and can effectively block the protrusion 401, which can facilitate the combination of the optical layer 40 and the adjacent film layer, and improve the reliability of the display panel 100 process.
  • the number of the protrusions 401 may be 1, or may be equal to the number of the color resist portions 01 , so as to achieve a one-to-one correspondence with the plurality of color resist portions 01 .
  • the protrusion 401 includes a first protrusion 4011 which is a column, the top S1 of the first protrusion 4011 is parallel to the bottom S2, and in combination with FIGS. 1 to 8 , at least one side S3 of the first protrusion 4011 is arranged parallel to and close to the array substrate 10 or the color filter substrate 20; wherein the orthographic projection of the first protrusion 4011 on the color filter substrate 20 covers n color resist portions 01 of the same color in the length direction, wherein n is a positive integer, and the orthographic projection of the top S1 on the color filter substrate 20 is located between two corresponding color resist portions 01, and the orthographic projection of the bottom S2 on the color filter substrate 20 is located between two corresponding color resist portions 01. wherein the orthographic projection of the top S1 of the first protrusion 4011 may be 5 ⁇ m to 21 ⁇ m in diameter, and the thickness of the first protrusion 4011 may be 2 ⁇ m to 7 ⁇ m
  • the first protrusion 4011 in the columnar form in this embodiment may be a prism as shown in FIG9 and FIG10, or may be a semi-cylinder or a semi-elliptical cylinder as shown in FIG11.
  • the optical protective layer 402 may be disposed close to the lower bottom side (short side) of the trapezoid in FIG9, or may be disposed close to one of the apex angles in FIG10, or may be disposed close to the protrusion vertex of the semicircle or semi-ellipse in FIG11.
  • the size of the side S3 of the first protrusion 4011 may be greater than the size of the top S1 and the bottom S2.
  • the top S1 and the bottom S2 are both perpendicular to the array substrate 10 (that is, perpendicular to the color film substrate 20), so that the side portion S3 can be parallel to the array substrate 10, and the side portion S3 is arranged close to the array substrate 10 or the color film substrate 20, which is conducive to the combination of the first raised portion 4011 and other film layers in the array substrate 10 or the color film substrate 20, and also maximizes the role of the first raised portion 4011; further, in this embodiment, the columnar first raised portion 4011 can just cover an integer number of color resist portions 01 in the length direction, and while reducing the edge effect of the first raised portion 4011, the uniformity of light passing through adjacent and identically colored color resist portions 01 can be improved.
  • the first protrusion 4011 with an “orthographic projection” size close to the sub-pixel size can be used to directly cover the sub-pixel.
  • the first protrusion 4011 with an orthographic projection size of 7 ⁇ m at the top S1 in FIG11 is used, three first protrusions 4011 need to be arranged in the width direction of the pixel to cover the entire sub-pixel.
  • the color resist portion 01 is covered in the width direction by the orthographic projections of the m first protrusions 4011 arranged continuously and in parallel on the color filter substrate 20, wherein m is a positive integer, and the orthographic projections of the side portions S3 of the m first protrusions 4011 on the color filter substrate 20 are located between the corresponding two color resist portions 01.
  • the orthographic projections of the first protrusions 4011 on the color filter substrate 20 can just cover an integer number of color resist portions 01 of the same color in the length direction, and there is no limitation on whether the “orthographic projection” just covers an integer number of color resist portions 01 of the same or different colors in the width direction.
  • the color resist portion 01 can be covered by an integer number of first protrusions 4011 arranged continuously and in parallel, and multiple convergence points can be formed.
  • the boundary of the orthographic projection of the first protrusion 4011 on the color filter substrate 20 is located between the corresponding color resist portion 01 and the adjacent color resist portion 01, and the orthographic projection of the first protrusion 4011 on the color filter substrate 20 has an angle a (5 to 15 degrees) with the corresponding color resist portion 01. It can be understood that there may be moiré interference between at least a plurality of sub-pixels respectively composed of a plurality of color resist portions 01 and a plurality of first protrusions 4011 in a columnar shape.
  • the orthographic projection of the first protrusion 4011 on the color filter substrate 20 is set to have an angle a with the corresponding color resist portion 01, which can reduce the probability that the "orthographic projection" corresponding to the side portion S3 is parallel to the boundary of the color resist portion 01, so as to reduce the moiré effect.
  • the raised portion 401 includes a second raised portion 4012 which is a cone, a table or a hemispherical shape. Further in combination with Figures 1 to 8, at least one of the top S4 and the bottom S5 of the second raised portion 4012 is parallel to the array substrate 10; wherein the orthographic projection of the second raised portion 4012 on the color film substrate 20 covers the corresponding color resist portion 01, and the boundary of the orthographic projection of the second raised portion 4012 on the color film substrate 20 is located between the multiple color resist portions 01.
  • the top S4 and the bottom S5 of the second protrusion 4012 in this embodiment is parallel to the array substrate 10. It can be considered that the cross section of the second protrusion 4012 parallel to the array substrate 10 is polygonal, circular or elliptical, which is also conducive to the combination of the second protrusion 4012 with the array substrate 10 or other film layers in the color filter substrate 20, and also maximizes the role of the second protrusion 4012. In this embodiment, whether the plurality of second protrusions 4012 and the plurality of color resist portions 01 correspond to each other is not limited.
  • the orthographic projection of the second protrusion 4012 on the color filter substrate 20 can just cover the corresponding at least one color resist portion 01, and the boundary of the orthographic projection of the second protrusion 4012 on the color filter substrate 20 is located between the plurality of color resist portions 01 (for example, it can exceed the boundary of the corresponding sub-pixel by 1 ⁇ m to 3 ⁇ m), which can also reduce the edge effect of the second protrusion 4012.
  • the sizes of the multiple second protrusions 4012 can also be set corresponding to the sizes of the corresponding multiple sub-pixels to achieve exceeding the boundaries of the corresponding sub-pixels.
  • the sub-pixel size is 21 ⁇ m ⁇ 63 ⁇ m
  • the second protrusions 4012 with a diameter of 21 ⁇ m in "orthographic projection" can be arranged as three along the length direction of the sub-pixel.
  • the side of the optical protective layer 402 away from the optical structural layer is a plane; or, as shown in FIG. 16 , the portion between two adjacent raised portions 401 of the optical protective layer 402 away from the optical structural layer is recessed toward the side close to the optical protective layer 402 to form a recessed area compared to the portion corresponding to the raised portion 401, and the black portion 021 provided between two adjacent color resist portions 01 is filled into the recessed area.
  • the black matrix 02 fills the multiple gaps formed by the multiple color resist portions 01, that is, the black portion 021 provided between each two adjacent color resist portions 01 is at least used to form the black matrix 02.
  • the combination of the optical protective layer 402 and other film layers can be facilitated; or in this embodiment, by using the optical protective layer 402 to form a recessed area and filling the recessed area with the black portion 021, the crosstalk between light of different colors passing through two adjacent raised portions 401 can be reduced, thereby improving color deviation, wherein the black portion 021 can be realized using a self-leveling process.
  • the color filter substrate 20 includes: a first substrate 201; a color filter layer 202, which is located on a side of the first substrate 201 close to the array substrate 10 and includes a plurality of color resist portions 01; wherein, as shown in FIG. 2 , the optical layer 40 is located between the first substrate 201 and the color filter layer 202, or as shown in FIG. 3 , the optical layer 40 is located on a side of the color filter layer 202 close to the array substrate 10.
  • the refractive index of the protrusion 401 may be 1.6 to 18, and the refractive index of the optical protection layer 402 may be 1.3 to 1.5, and the difference in refractive index between the two may be greater than 0.1.
  • the color filter layer 202 and the optical layer 40 can be directly manufactured on the first substrate 201 in sequence, wherein the manufacturing of the optical layer 40 can be understood as first manufacturing a portion of the optical protective layer 402 on the first substrate 201, and then manufacturing the protrusion 401 and another portion of the optical protective layer 402 in sequence on the portion of the optical protective layer 402.
  • the use of this embodiment can also improve the accuracy of alignment of the optical layer 40 with the multiple color resist portions 01.
  • the thickness of the optical layer 40 can be less than 5 ⁇ m, for example, the maximum value of the width of the side portion of the protrusion 401 parallel to the color filter substrate 20 in the cross section can be 1/3 of the width of the corresponding sub-pixel, that is, it can be understood that the sub-pixel can be covered by at least three protrusions 401 in the width direction, reducing the risk of light leakage due to the excessive thickness of the optical layer 40.
  • the protrusion 401 for example, but not limited to the yellow light process
  • the optical protection layer 402 and the color filter layer 202 can be directly manufactured on the first substrate 201 in sequence.
  • the use of this embodiment can also improve the accuracy of alignment of the optical layer 40 with the plurality of color resist portions 01 .
  • the thickness of the optical layer 40 can be less than 10 ⁇ m, reducing the risk of warping of the first substrate 201 due to excessive thickness.
  • FIG. 2 compared with the embodiment of FIG.
  • the distance between the color filter layer 202 and the array substrate 10 can be reduced in the embodiment of FIG. 2 , and the risk of light leakage and color crosstalk when light enters the color filter layer 202 can be reduced.
  • the color film substrate 20 includes: an upper polarizer 203, as shown in Figure 1, located on a side of the multiple color resist portions 01 away from the array substrate 10; wherein, as shown in Figure 4, the optical layer 40 is located on a side of the upper polarizer 203 away from the multiple color resist portions 01, or, as shown in Figure 5, the optical layer 40 is located on a side of the upper polarizer 203 close to the color resist portion 01.
  • the optical layer 40 in this embodiment is located above the second substrate 101.
  • the optical layer 40 can be directly manufactured on the first substrate 201 or manufactured by directly bonding the optical layer 40.
  • the bonding accuracy can be required to be within ⁇ 3 ⁇ m. It should be noted that, as compared with the embodiments shown in Figures 4 and 5, since the optical layer 40 can be disposed adjacent to a plurality of color resist portions 01, the protrusion portion and the corresponding color resist portion 01 can have a higher alignment accuracy.
  • the array substrate 10 includes: a second substrate 101; a circuit layer 102, located on a side of the second substrate 101 close to the color film substrate 20, including a plurality of opening areas A corresponding to the plurality of color resist portions 01; wherein, as shown in Figure 6, the optical layer 40 is located on a side of the circuit layer 102 close to the color film substrate 20, or, as shown in Figure 8, the optical layer 40 is located on a side of the second substrate 101 away from the color film substrate 20.
  • the array substrate 10 may include a plurality of pixel electrodes respectively located in a plurality of opening areas A, a plurality of pixel driving circuits located in a non-opening area B, a plurality of gate lines and a plurality of data lines arranged crosswise, and each pixel driving circuit is electrically connected to a corresponding gate line, a corresponding data line and a corresponding pixel electrode, so as to generate a corresponding pixel voltage on a corresponding pixel electrode under the action of a corresponding gate line and a corresponding data line.
  • the circuit layer 102 may include a pixel driving circuit, a gate line, and a data line
  • the pixel driving circuit may include a driving transistor
  • the gate line and the data line may be arranged in the same layer as a part of the structure in the driving transistor, respectively, and an insulating layer, a flat layer and a plurality of pixel electrodes may be arranged in sequence above the plurality of driving transistors.
  • a via hole may be provided in the optical layer 40 to bridge the pixel electrode located on the circuit layer 102 and the pixel driving circuit located thereunder.
  • the thickness of the optical layer 40 may be less than 3 ⁇ m to reduce the risks of hole-digging process accuracy and electrical abnormality of the bridge.
  • the array substrate 10 may further include a lower polarizer 103 located on the second substrate 101 away from the color filter substrate 20, and the optical layer 40 may be located below the lower polarizer 103.
  • the maximum value of the width of the side portion of the raised portion 401 parallel to the color filter substrate 20 in the cross section may be 1/3 of the width of the corresponding sub-pixel, that is, it can be understood that the sub-pixel can be covered by at least three raised portions 401 in the width direction, and the thickness of the optical layer 40 may be equal to half of the "width of the side portion of the raised portion 401 parallel to the color filter substrate 20 in the cross section".
  • the optical protective layer 402 may be provided or not.
  • the difference between the refractive index of the raised portion 401 and the refractive index of the optical protective layer 402 may be at least greater than 0.1. If the optical protective layer 402 is not provided, the refractive index of the raised portion 401 may be 1.3 to 1.8.
  • the array substrate 10 includes: a metal layer (belonging to the circuit layer 102); the insulating layer discussed above, located on at least one side of the metal layer, and arranged in the same layer as the optical structure layer (including the protrusion 401); the flat layer discussed above, located on at least one side of the insulating layer, and arranged in the same layer as the optical protection layer 402.
  • the optical layer 40 can be arranged inside the array substrate 10, wherein the optical protection layer 402 and the flat layer can be made by the same process and the same material (including but not limited to resin), the refractive index of the protrusion 401 can be 1.6 to 1.8, the protrusion 401 can be made of high temperature resistant adhesive, or made by the same process and the same material (including but not limited to silicon nitride) as the insulating layer.
  • the optical protection layer 402 and the flat layer can be made by the same process and the same material (including but not limited to resin)
  • the refractive index of the protrusion 401 can be 1.6 to 1.8
  • the protrusion 401 can be made of high temperature resistant adhesive, or made by the same process and the same material (including but not limited to silicon nitride) as the insulating layer.
  • the array substrate 10 includes: the second substrate discussed above; the circuit layer discussed above, located on the side of the second substrate 101 close to the color film substrate 20, including a first metal layer, and a second metal layer located on the side of the first metal layer close to the color film substrate 20; wherein the reflectivity of the first metal layer is greater than the reflectivity of the second metal layer.
  • the constituent materials of the first metal layer with a higher reflectivity may include metal Al, Ti or a combination thereof, wherein the reflectivity of Al may be as high as 90% or more, which can greatly improve the light return efficiency of the backlight module 30;
  • the constituent materials of the second metal layer with a lower reflectivity may include metal Mo or copper, the absorption rate of metal Mo reaches 40% to 50%, and the reflectivity of metal copper is also relatively low, so the reflectivity of the second metal layer can be reduced to prevent the screen from reflecting too much ambient light.
  • the light shielding layer below the active layer in the driving transistor can use metal Mo or MoOx to shield the driving transistor, preventing the light emitted by the backlight module 30 from directly irradiating the driving transistor to increase the leakage current of the driving transistor, thereby reducing its switching characteristics.
  • the present application provides an electronic terminal, which includes any display panel as described above.
  • the present application provides a display panel and an electronic terminal, comprising a plurality of opening areas, including: an array substrate; a color film substrate, arranged opposite to the array substrate, comprising a plurality of color resistance portions respectively located in the plurality of the opening areas; a backlight module, located on a side of the array substrate away from the color film substrate; wherein, by arranging at least one of the two, located inside the color film substrate and inside the array substrate, at least an optical layer is arranged opposite to the plurality of the color resistance portions and is used for focusing light, so that light with a large angle is converged toward the middle of the display panel, so that the light after passing through the optical layer is light with a small angle, so as to reduce the amount of interference light and improve the display effect of the display panel.

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Abstract

显示面板（100）和电子终端，包括多个开口区A、阵列基板（10）、与阵列基板（10）相对设置的彩膜基板（20）、位于阵列基板（10）远离彩膜基板（20）的一侧的背光模组（30），以及位于彩膜基板（20）之内、阵列基板（10）之内两者中的至少一者的光学层（40），彩膜基板（20）包括分别位于多个开口区A的多个色阻部（01），光学层（40）用于聚光，且至少与多个色阻部（01）相对设置。

Description

显示面板和电子终端 技术领域
本申请涉及显示技术领域，尤其涉及显示器件的制造，具体涉及显示面板和电子终端。
 背景技术
液晶显示屏可以应用于小尺寸的手机屏幕以及大尺寸的电脑、电视屏幕，已经成为显示领域的主流产品。
其中，在AR（Augmented Reality，增强现实）技术中，液晶显示屏含有较多光学膜层，导致出射的大角度（如大于45°）的光线通常会在光学膜层间形成干扰光，影响显示效果。
因此，现有的液晶显示屏应用于AR技术存在显示效果较差的问题，急需改进。
 发明概述
本申请的目的在于提供显示面板和电子终端，以解决现有的液晶显示屏应用于AR技术时由于大角度光线造成的显示效果不佳的技术问题。
本申请实施例提供显示面板，包括多个开口区，包括：
阵列基板；
彩膜基板，与所述阵列基板相对设置，包括分别位于多个所述开口区的多个色阻部；
背光模组，位于所述阵列基板远离所述彩膜基板的一侧；
光学层，位于所述彩膜基板之内、所述阵列基板之内两者中的至少一者，至少与多个所述色阻部相对设置，所述光学层用于聚光。
在一实施例中，所述光学层包括：
光学结构层，包括凸起部；
光学保护层，至少位于所述光学结构层的第一侧，所述第一侧为所述凸起部凸起的一侧；
其中，所述凸起部的折射率大于所述光学保护层的折射率。
在一实施例中，所述彩膜基板包括：
第一基板；
彩膜层，位于所述第一基板靠近所述阵列基板的一侧，包括多个所述色阻部；
其中，所述光学层位于所述第一基板和所述彩膜层之间，或者所述光学层位于所述彩膜层靠近所述阵列基板的一侧。
在一实施例中，所述彩膜基板包括：
上偏光片，位于多个所述色阻部远离所述阵列基板的一侧；
其中，所述光学层位于所述上偏光片远离多个所述色阻部的一侧，或者所述光学层位于所述上偏光片靠近所述色阻部的一侧。
在一实施例中，所述阵列基板包括：
第二基板；
电路层，位于所述第二基板靠近所述彩膜基板的一侧，包括与多个所述色阻对应的多个驱动晶体管；
其中，所述光学层位于所述电路层靠近所述彩膜基板的一侧，或者所述光学层位于所述第二基板远离所述彩膜基板的一侧。
在一实施例中，所述阵列基板包括：
金属层；
绝缘层，位于所述金属层的至少一侧，与所述光学结构层同层设置；
平坦层，位于所述绝缘层的至少一侧，与所述光学保护层同层设置。
在一实施例中，所述凸起部包括为柱体的第一凸起部，所述第一凸起部的顶部平行于底部，所述第一凸起部中的至少一侧部平行且靠近所述阵列基板或者所述彩膜基板而设置；
其中，所述第一凸起部在所述彩膜基板上的正投影在长度方向覆盖颜色相同的n个所述色阻部，所述n为正整数，且所述顶部在所述彩膜基板上的正投影位于对应的两所述色阻部之间，所述底部在所述彩膜基板上的正投影位于对应的两所述色阻部之间。
在一实施例中，所述色阻部被连续且平行排列的m个所述第一凸起部在所述彩膜基板上的正投影在宽度方向覆盖，所述m为正整数，且m个所述第一凸起部的所述侧部在所述彩膜基板上的正投影位于对应的两所述色阻部之间。
在一实施例中，所述第一凸起部在所述彩膜基板上的正投影的边界位于对应的所述色阻部与相邻的所述色阻部之间，且所述第一凸起部在所述彩膜基板上的正投影与对应的所述色阻部的具有夹角。
在一实施例中，所述凸起部包括为锥体、台体或者类半球体的第二凸起部，所述第二凸起部的顶部、底部中的至少一者平行于所述阵列基板；
其中，所述第二凸起部在所述彩膜基板上的正投影覆盖对应的所述色阻部，且所述第二凸起部在所述彩膜基板上的正投影的边界位于多个所述色阻部之间。
在一实施例中，所述光学保护层远离所述光学结构层的一侧为平面；
或者，所述光学保护层远离所述光学结构层的一侧中，对应于相邻两所述凸起部的间隙处的部分，相比较对应于所述凸起部的部分，向靠近所述光学保护层的一侧凹陷形成凹陷区域，相邻两所述色阻部之间设有的黑色部填充至所述凹陷区域。
在一实施例中，所述阵列基板包括：
第二基板；
电路层，位于所述第二基板靠近所述彩膜基板的一侧，包括第一金属层、位于所述第一金属层靠近所述彩膜基板的一侧的第二金属层；
其中，所述第一金属层的反射率大于所述第二金属层的反射率。
本申请实施例提供电子终端，包括如上文任一所述的显示面板。
有益效果
本申请提供了显示面板和电子终端，包括多个开口区，包括：阵列基板；彩膜基板，与所述阵列基板相对设置，包括分别位于多个所述开口区的多个色阻部；背光模组，位于所述阵列基板远离所述彩膜基板的一侧；其中，通过设置位于所述彩膜基板之内、所述阵列基板之内两者中的至少一者，至少与多个所述色阻部相对设置，且用于聚光的光学层，以将大角度的光线往靠近显示面板的中部汇聚，使得通过光学层之后的光线为小角度的光线，以降低干扰光的量，提升显示面板的显示效果。
 附图说明
下面通过附图来对本申请进行进一步说明。需要说明的是，下面描述中的附图仅仅是用于解释说明本申请的一些实施例，对于本领域技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1至图8为本申请实施例提供的八种显示面板的截面示意图。
图9至图14为本申请实施例提供的六种凸起部的立体结构示意图。
图15为本申请实施例提供的一种凸起部和彩膜基板的俯视示意图。
图16为本申请实施例提供的另一凸起部和彩膜基板的截面示意图。
 本发明的实施方式
下面将结合本申请实施例中的附图，对本申请实施例中的技术方案进行清楚、完整的描述。显然，所描述的实施例仅仅是本申请一部分实施例，而不是全部的实施例。基于本申请中的实施例，本领域技术人员在没有作出创造性劳动前提下所获得的所有其他实施例，都属于本申请保护的范围。
在本申请的描述中，需要理解的是，术语“上”、“靠近”、“远离”等指示的方位或位置关系为基于附图所示的方位或位置关系，例如，“上”只是表面在物体上方，具体指代正上方、斜上方、上表面都可以，只要居于物体水平之上即可；“两侧”是指代图中可以体现出的物体的相对的两个位置，所述两个位置可以于物体直接或者间接接触，以上方位或位置关系仅是为了便于描述本申请和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请的限制。此外，术语“第一”、“第二”等仅用于描述目的，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个所述特征。
另外，还需要说明的是，附图提供的仅仅是和本申请关系比较密切的结构和步骤，省略了一些与申请关系不大的细节，目的在于简化附图，使申请点一目了然，而不是表明实际中装置和方法就是和附图一模一样，不作为实际中装置和方法的限制。
本申请提供显示面板，所述显示面板包括但不限于以下实施例以及以下实施例的组合。
在一实施例中，结合图1至图8所示，显示面板100，包括多个开口区A，包括：阵列基板10；彩膜基板20，与所述阵列基板10相对设置，包括分别位于多个所述开口区A的多个色阻部01；背光模组30，位于所述阵列基板10远离所述彩膜基板20的一侧；光学层40，位于所述彩膜基板20之内、所述阵列基板10之内两者中的至少一者（图1中仅以光学层40位于彩膜基板20之内为例），至少与多个所述色阻部01相对设置，所述光学层40用于聚光。其中，彩膜层202还可以包括黑色矩阵02，可以理解为黑色矩阵02填充多个色阻部01形成的多个间隙，黑色矩阵02中位于相邻且颜色不同的两色阻部01之间的部分可以阻挡并吸收经由颜色不同的两色阻部01之后产生的不同颜色的光线，降低不同颜色串扰的风险。
具体的，如图1所示，显示面板100还可以包括非开口区B，可以理解为非开口区B的多个内边界分别构成多个开口区A的外边界，阵列基板10上可以包括分别位于多个开口区A的多个像素电极、位于非开口区B的多个像素驱动电路、交叉设置的多条栅极线和多条数据线，每一像素驱动电路电性连接于对应的栅极线、对应的数据线和对应的像素电极，以在对应的栅极线和对应的数据线的作用下在对应的像素电极上产生对应的像素电压；进一步的，阵列基板10和彩膜基板20之间可以设有液晶层50，且彩膜基板20可以包括至少与多个像素电极对应设置且加载有公共电压的公共电极，当然，也可以是整层设置的公共电极，液晶层50中位于每一像素电极之上的液晶分子可以在公共电压和对应的像素电压的作用下，偏转相应的角度，以透过背光模组30发出的对应量的光线，结合对应的色阻部01的滤光作用，最终呈现对应亮度的颜色。
需要注意的是，针对例如AR技术，例如背光模组30中会设置包括但不限于反射层、导光层、扩散层、棱镜层等较多的光学膜层，导致背光模组30发出的大角度（如大于45°）的光线会在光学膜层间形成干扰光，影响显示效果。可以理解的，本实施例中通过在彩膜基板20之内、阵列基板10之内两者中的至少一者设置用于聚光的光学层40，至少可以使背光模组30朝向显示面板100的出光面一侧发出的光线穿过光学层40，以通过光学层40的聚光作用发生收敛，尤其可以将大角度的光线往靠近显示面板100的中部汇聚，使得通过光学层40之后的光线为小角度的光线，以降低干扰光的量，提升显示面板100的显示效果。并且通过降低利用率较低的大角度的光线，也可以降低显示面板100的功耗和产品的续航能力，有利于产品的高分辨率发展。
在一实施例中，结合图1至图8所示，所述光学层40包括：光学结构层，包括凸起部401；光学保护层402，至少位于所述光学结构层的第一侧，所述第一侧为所述凸起部401凸起的一侧；其中，所述凸起部401的折射率大于所述光学保护层402的折射率。其中，凸起部401可以理解为对光线具有汇聚作用且呈凸起状的结构，此处对凸起部401的具体结构以及凸起方向不做限定。其中，凸起部401的折射率可以大于位于凸起部401之下的膜层的折射率，无论凸起部401的凸起方向朝上或者朝下，进入凸起部401的光线均可以被汇聚一次，进一步的，凸起部401的折射率可以大于位于凸起部401之上的膜层的折射率，以使射出凸起部401的光线再次被汇聚，进一步提升对于光线的汇聚作用。
可以理解的，结合上文论述，光学保护层402至少位于光学结构层的第一侧，第一侧为凸起部401凸起的一侧，一方面，本实施例中的凸起部401的折射率大于光学保护层402的折射率，无论光线由光学保护层402进入凸起部401，还是由凸起部401进入光学保护层402，均可以至少对光线进行一次汇聚，另一方面，本实施例中的光学保护层402可以覆盖光学结构层中凸起部401凸起的一侧，具有一定的平坦化“凸起”的作用，且可以有效阻隔凸起部401，可以便于光学层40与相邻的膜层的组合，提高显示面板100制程的可靠性。
其中，凸起部401的数量可以为1，也可以等于色阻部01的数量，以实现和多个色阻部01的一一对应。
在一实施例中，如图9至图11所示，所述凸起部401包括为柱体的第一凸起部4011，所述第一凸起部4011的顶部S1平行于底部S2，结合图1至图8，所述第一凸起部4011中的至少一侧部S3平行且靠近所述阵列基板10或者所述彩膜基板20而设置；其中，所述第一凸起部4011在所述彩膜基板20上的正投影在长度方向覆盖颜色相同的n个所述色阻部01，所述n为正整数，且所述顶部S1在所述彩膜基板20上的正投影位于对应的两所述色阻部01之间，所述底部S2在所述彩膜基板20上的正投影位于对应的两所述色阻部01之间。其中，第一凸起部4011的顶部S1的正投影的尺寸可以为直径5μm至21μm，第一凸起部4011的厚度可以为2μm至7μm。
具体的，本实施例中呈柱状的第一凸起部4011可以例如图9和图10呈棱柱，也可以例如图11呈半圆柱或者半椭圆柱，需要注意的是，结合上文关于凸起方向的论述可知，从截面视角而言，光学保护层402可以靠近图9中梯形下底边（短边）而设置，也可以靠近图10中的其中一顶角而设置，也可以靠近图11中的半圆或者半椭圆的凸起顶点而设置。进一步的，第一凸起部4011的侧部S3的尺寸可以大于顶部S1、底部S2两者的尺寸。
可以理解的，第一凸起部4011中，顶部S1、底部S2均垂直于阵列基板10（也即垂直于彩膜基板20），可以实现侧部S3平行于阵列基板10，并且侧部S3靠近阵列基板10或者彩膜基板20而设置，有利于实现第一凸起部4011与阵列基板10或者彩膜基板20中其它膜层的组合，也较大化发挥了第一凸起部4011的作用；进一步的，本实施例中呈柱状的第一凸起部4011在长度方向可以刚好覆盖整数个色阻部01，在降低第一凸起部4011的边缘效应的同时，可以提高穿过相邻且相同颜色的色阻部01的光线的均一性。
例如子像素尺寸为21μm×63μm，可以采用“正投影”的尺寸接近子像素尺寸的第一凸起部4011直接覆盖子像素，如采用图11中顶部S1正投影尺寸为7μm的第一凸起部4011时，则需要在像素的宽度方向排列3个第一凸起部4011以覆盖整个子像素。
在一实施例中，结合图1至图11所示，所述色阻部01被连续且平行排列的m个所述第一凸起部4011在所述彩膜基板20上的正投影在宽度方向覆盖，所述m为正整数，且m个所述第一凸起部4011的所述侧部S3在所述彩膜基板20上的正投影位于对应的两所述色阻部01之间。需要注意的是，在上文论述中，第一凸起部4011在彩膜基板20上的正投影在长度方向可以刚好覆盖整数个颜色相同的色阻部01，并且对“正投影”在宽度方向上是否刚好覆盖整数个颜色相同或者不同的色阻部01不做限定。具体的，本实施例中在“正投影”的宽度方向上，色阻部01可以被整数个连续且平行排列的第一凸起部4011覆盖，可以形成多个汇聚点。
在一实施例中，如图15所示，结合图1至图8所示，所述第一凸起部4011在所述彩膜基板20上的正投影的边界位于对应的所述色阻部01与相邻的所述色阻部01之间，且所述第一凸起部4011在所述彩膜基板20上的正投影与对应的所述色阻部01的具有夹角a（5度至15度）。可以理解的，至少分别由多个色阻部01所组成的多个子像素与多个呈柱状的第一凸起部4011之间可能存在莫尔纹干扰，本实施例中将第一凸起部4011在彩膜基板20上的正投影设置为与对应的色阻部01的具有夹角a，可以降低侧部S3对应的“正投影”与色阻部01的边界平行的概率，以降低摩尔纹效应。
在一实施例中，如图12至图14所示，所述凸起部401包括为锥体、台体或者类半球体的第二凸起部4012，进一步结合图1至图8，所述第二凸起部4012的顶部S4、底部S5中的至少一者平行于所述阵列基板10；其中，所述第二凸起部4012在所述彩膜基板20上的正投影覆盖对应的所述色阻部01，且所述第二凸起部4012在所述彩膜基板20上的正投影的边界位于多个所述色阻部01之间。
具体的，本实施例中的第二凸起部4012的顶部S4、底部S5中的至少一者平行于阵列基板10，可以认为第二凸起部4012中平行于所述阵列基板10的横截面为多边形、圆形或者椭圆形，同样有利于实现第二凸起部4012与阵列基板10或者彩膜基板20中其它膜层的组合，也较大化发挥了第二凸起部4012的作用。其中，本实施例中对多个第二凸起部4012和多个色阻部01是否一一对应不做限定，第二凸起部4012在彩膜基板20上的正投影刚好可以覆盖对应的至少一色阻部01，并且第二凸起部4012在彩膜基板20上的正投影的边界位于多个色阻部01之间（例如可以超出对应的子像素的边界1μm至3μm），同样可以降低第二凸起部4012的边缘效应。
特别的，若多个子像素的尺寸不同，相应的，多个第二凸起部4012的尺寸也可以与对应的多个子像素的尺寸对应设置，以实现超出对对应的子像素的边界。例如子像素尺寸为21μm×63μm，可以采用“正投影”的直径为21μm的第二凸起部4012沿着子像素的长度方向排列为3个。
在一实施例中，如图2至图8所示，所述光学保护层402远离所述光学结构层（包括凸起部401）的一侧为平面；或者，如图16所示，所述光学保护层402远离所述光学结构层的一侧中，对应于相邻两所述凸起部401的之间的部分，相比较对应于所述凸起部401的部分，向靠近所述光学保护层402的一侧凹陷形成凹陷区域，相邻两所述色阻部01之间设有的黑色部021填充至所述凹陷区域。具体的，结合上文论述，黑色矩阵02填充多个色阻部01形成的多个间隙，即每相邻两色阻部01之间设有的黑色部021至少用于组成黑色矩阵02。
可以理解的，本实施例中通过将光学保护层402远离光学结构层（包括凸起部401）的一侧设置为平面，可以便于光学保护层402与其它膜层的组合；或者本实施例中通过利用光学保护层402形成凹陷区域，并在凹陷区域中填充黑色部021，可以降低通过相邻两凸起部401的不同颜色的光线之间的串扰，改善色偏，其中，黑色部021可以利用自流平工艺实现。
在一实施例中，结合图2至图8所示，所述彩膜基板20包括：第一基板201；彩膜层202，位于所述第一基板201靠近所述阵列基板10的一侧，包括多个所述色阻部01；其中，如图2所示，所述光学层40位于所述第一基板201和所述彩膜层202之间，或者如图3所示，所述光学层40位于所述彩膜层202靠近所述阵列基板10的一侧。其中，凸起部401的折射率可以为1.6至18，光学保护层402的折射率可以为1.3至1.5，两者的折射率差值可以大于0.1。
具体的，如图3所示，基于光学层40位于彩膜层202靠近阵列基板10的一侧这一结构，可以直接在第一基板201上依次制作彩膜层202和光学层40，其中制作光学层40可以理解为先在第一基板201上制作部分光学保护层402，再在该部分光学保护层402上依次制作凸起部401和另一部分光学保护层402，采用本实施例也可以提高光学层40与多个色阻部01对齐的精准度。其中，光学层40的厚度可以小于5μm，例如凸起部401中平行于彩膜基板20的侧部在横截面中的宽度的最大值可以为对应的子像素的宽度的1/3，即可以理解为子像素在宽度方向可以被至少三个凸起部401所覆盖，降低因光学层40的厚度过高会产生漏光的风险。
具体的，如图2所示，基于光学层40位于第一基板201和彩膜层202之间这一结构，可以直接在第一基板201上依次制作凸起部401（例如但不限于黄光制程）、光学保护层402和彩膜层202，如上文论述，由于光学层40至少与多个色阻部01相对设置，采用本实施例还可以提高光学层40与多个色阻部01对齐的精准度。其中，光学层40的厚度可以小于10μm，降低由于厚度太大导致的第一基板201翘曲的风险。但是图2的实施例相比较图3的实施例而言，由于光学层40远离液晶层50而设置，可以减小彩膜层202和阵列基板10之间的距离，降低光线在进入至彩膜层202发生漏光和颜色串扰的风险。
在一实施例中，如图4和图5所示，所述彩膜基板20包括：上偏光片203，结合图1所示，位于多个所述色阻部01远离所述阵列基板10的一侧；其中，如图4所示，所述光学层40位于所述上偏光片203远离多个所述色阻部01的一侧，或者，如图5所示，所述光学层40位于所述上偏光片203靠近所述色阻部01的一侧。
具体的，本实施例中的光学层40位于第二基板101的上方，可以在阵列基板10和彩膜基板20对组成盒后，在第一基板201的上方直接制作光学层40或者通过直接贴合光学层40的方式进行制作，可以要求贴合精度为±3μm以内。需要注意的是，如图2和图3所示的实施例相比较如图4和图5所示的实施例，由于光学层40可以相邻于多个色阻部01而设置，可以使得凸起部和对应的色阻部01具有较高的对齐精度。
在一实施例中，如图6和图8所示，所述阵列基板10包括：第二基板101；电路层102，位于所述第二基板101靠近所述彩膜基板20的一侧，包括与多个所述色阻部01对应的多个开口区A；其中，如图6所示，所述光学层40位于所述电路层102靠近所述彩膜基板20的一侧，或者，如图8所示，所述光学层40位于所述第二基板101远离所述彩膜基板20的一侧。
其中，结合上文论述可知，阵列基板10上可以包括分别位于多个开口区A的多个像素电极、位于非开口区B的多个像素驱动电路、交叉设置的多条栅极线和多条数据线，每一像素驱动电路电性连接于对应的栅极线、对应的数据线和对应的像素电极，以在对应的栅极线和对应的数据线的作用下在对应的像素电极上产生对应的像素电压。其中，电路层102可以包括像素驱动电路、栅极线、数据线，像素驱动电路可以包括驱动晶体管，栅极线、数据线可以分别和驱动晶体管中的部分结构同层设置，多个驱动晶体管上方可以依次设置绝缘层、平坦层和多个像素电极。
具体的，如图6所示，光学层40位于电路层102之上时，为保证像素电极和像素驱动电路的电性连接，可以在光学层40中设置过孔，以桥接分别位于电路层102之上的像素电极和之下的像素驱动电路。其中，光学层40的厚度可以小于3μm，以降低对于挖孔工艺精度及桥接电性异常等风险。
具体的，如图8所示，阵列基板10还可以包括位于第二基板101远离彩膜基板20的下偏光片103，光学层40可以位于下偏光片103之下，例如凸起部401中平行于彩膜基板20的侧部在横截面中的宽度的最大值可以为对应的子像素的宽度的1/3，即可以理解为子像素在宽度方向可以被至少三个凸起部401所覆盖，光学层40的厚度可以等于“凸起部401中平行于彩膜基板20的侧部在横截面中的宽度”的一半。此时可以设置或者不设置光学保护层402，若设置光学保护层402，凸起部401的折射率和光学保护层402的折射率差值至少可以大于0.1，若不设置光学保护层402，凸起部401的折射率可以为1.3至1.8。
在一实施例中，如图7所示，所述阵列基板10包括：金属层（属于电路层102）；上文论述的绝缘层，位于所述金属层的至少一侧，与所述光学结构层（包括凸起部401）同层设置；上文论述的平坦层，位于所述绝缘层的至少一侧，与所述光学保护层402同层设置。具体的，本实施例中在阵列制程中，可以将光学层40设置在阵列基板10内部，其中，光学保护层402和平坦层可通过同一制程和同一材料（包括但不限于树脂）制作，凸起部401的折射率可以为1.6至1.8，凸起部401可采用耐高温胶材制作，或者与绝缘层通过同一制程和同一材料（包括但不限于氮化硅）制作。
在一实施例中，结合图1至图8所示，所述阵列基板10包括：上文论述的第二基板；上文论述的电路层，位于所述第二基板101靠近所述彩膜基板20的一侧，包括第一金属层、位于所述第一金属层靠近所述彩膜基板20的一侧的第二金属层；其中，所述第一金属层的反射率大于所述第二金属层的反射率。
具体的，反射率较大的第一金属层的组成材料可以包括金属Al、Ti或者它们的组合，其中Al的反射率可以高达90%以上，能够极大提升背光模组30的回光效率；反射率较小的第二金属层的组成材料可以包括金属Mo或者铜，金属Mo的吸收率达到40%至50%，金属铜的反射率也较小，因此可以降低第二金属层的反射率，避免屏幕反射过多的环境光。当然，驱动晶体管中的有源层的下方的遮光层可以采用金属Mo或者MoOx来遮挡驱动晶体管，防止背光模组30发出的光线直接照射到驱动晶体管上面增加驱动晶体管的漏电流，从而降低其开关特性。
本申请提供电子终端，所述电子终端包括如上文任一所述的显示面板。
本申请提供了显示面板和电子终端，包括多个开口区，包括：阵列基板；彩膜基板，与所述阵列基板相对设置，包括分别位于多个所述开口区的多个色阻部；背光模组，位于所述阵列基板远离所述彩膜基板的一侧；其中，通过设置位于所述彩膜基板之内、所述阵列基板之内两者中的至少一者，至少与多个所述色阻部相对设置，且用于聚光的光学层，以将大角度的光线往靠近显示面板的中部汇聚，使得通过光学层之后的光线为小角度的光线，以降低干扰光的量，提升显示面板的显示效果。
以上对本申请实施例所提供的显示面板和电子终端进行了详细介绍，本文中应用了具体个例对本申请的原理及实施方式进行了阐述，以上实施例的说明只是用于帮助理解本申请的技术方案及其核心思想；本领域的普通技术人员应当理解：其依然可以对前述各实施例所记载的技术方案进行修改，或者对其中部分技术特征进行等同替换；而这些修改或者替换，并不使相应技术方案的本质脱离本申请各实施例的技术方案的范围。

Claims (20)

  1. 一种显示面板，其中，包括多个开口区，包括：
    阵列基板；
    彩膜基板，与所述阵列基板相对设置，包括分别位于多个所述开口区的多个色阻部；
    背光模组，位于所述阵列基板远离所述彩膜基板的一侧；
    光学层，位于所述彩膜基板之内、所述阵列基板之内两者中的至少一者，至少与多个所述色阻部相对设置，所述光学层用于聚光；
    其中，所述光学层包括：
    光学结构层，包括凸起部；
    光学保护层，至少位于所述光学结构层的第一侧，所述第一侧为所述凸起部凸起的一侧；
    其中，所述凸起部的折射率大于所述光学保护层的折射率；
    其中，所述凸起部包括为柱体的第一凸起部，所述第一凸起部的顶部平行于底部，所述第一凸起部中的至少一侧部平行且靠近所述阵列基板或者所述彩膜基板而设置；
    其中，所述第一凸起部在所述彩膜基板上的正投影在长度方向覆盖颜色相同的n个所述色阻部，所述n为正整数，且所述顶部在所述彩膜基板上的正投影位于对应的两所述色阻部之间，所述底部在所述彩膜基板上的正投影位于对应的两所述色阻部之间。
  2. 如权利要求1所述的显示面板，其中，所述彩膜基板包括：
    第一基板；
    彩膜层，位于所述第一基板靠近所述阵列基板的一侧，包括多个所述色阻部；
    其中，所述光学层位于所述第一基板和所述彩膜层之间，或者所述光学层位于所述彩膜层靠近所述阵列基板的一侧。
  3. 如权利要求1所述的显示面板，其中，所述彩膜基板包括：
    上偏光片，位于多个所述色阻部远离所述阵列基板的一侧；
    其中，所述光学层位于所述上偏光片远离多个所述色阻部的一侧，或者所述光学层位于所述上偏光片靠近所述色阻部的一侧。
  4. 如权利要求1所述的显示面板，其中，所述阵列基板包括：
    第二基板；
    电路层，位于所述第二基板靠近所述彩膜基板的一侧，包括与多个所述色阻对应的多个驱动晶体管；
    其中，所述光学层位于所述电路层靠近所述彩膜基板的一侧，或者所述光学层位于所述第二基板远离所述彩膜基板的一侧。
  5. 如权利要求1所述的显示面板，其中，所述阵列基板包括：
    金属层；
    绝缘层，位于所述金属层的至少一侧，与所述光学结构层同层设置；
    平坦层，位于所述绝缘层的至少一侧，与所述光学保护层同层设置。
  6. 如权利要求1所述的显示面板，其中，所述色阻部被连续且平行排列的m个所述第一凸起部在所述彩膜基板上的正投影在宽度方向覆盖，所述m为正整数，且m个所述第一凸起部的所述侧部在所述彩膜基板上的正投影位于对应的两所述色阻部之间。
  7. 如权利要求1所述的显示面板，其中，所述第一凸起部在所述彩膜基板上的正投影的边界位于对应的所述色阻部与相邻的所述色阻部之间，且所述第一凸起部在所述彩膜基板上的正投影与对应的所述色阻部的具有夹角。
  8. 一种显示面板，其中，包括多个开口区，包括：
    阵列基板；
    彩膜基板，与所述阵列基板相对设置，包括分别位于多个所述开口区的多个色阻部；
    背光模组，位于所述阵列基板远离所述彩膜基板的一侧；
    光学层，位于所述彩膜基板之内、所述阵列基板之内两者中的至少一者，至少与多个所述色阻部相对设置，所述光学层用于聚光。
  9. 如权利要求8所述的显示面板，其中，所述光学层包括：
    光学结构层，包括凸起部；
    光学保护层，至少位于所述光学结构层的第一侧，所述第一侧为所述凸起部凸起的一侧；
    其中，所述凸起部的折射率大于所述光学保护层的折射率。
  10. 如权利要求9所述的显示面板，其中，所述彩膜基板包括：
    第一基板；
    彩膜层，位于所述第一基板靠近所述阵列基板的一侧，包括多个所述色阻部；
    其中，所述光学层位于所述第一基板和所述彩膜层之间，或者所述光学层位于所述彩膜层靠近所述阵列基板的一侧。
  11. 如权利要求9所述的显示面板，其中，所述彩膜基板包括：
    上偏光片，位于多个所述色阻部远离所述阵列基板的一侧；
    其中，所述光学层位于所述上偏光片远离多个所述色阻部的一侧，或者所述光学层位于所述上偏光片靠近所述色阻部的一侧。
  12. 如权利要求9所述的显示面板，其中，所述阵列基板包括：
    第二基板；
    电路层，位于所述第二基板靠近所述彩膜基板的一侧，包括与多个所述色阻对应的多个驱动晶体管；
    其中，所述光学层位于所述电路层靠近所述彩膜基板的一侧，或者所述光学层位于所述第二基板远离所述彩膜基板的一侧。
  13. 如权利要求9所述的显示面板，其中，所述阵列基板包括：
    金属层；
    绝缘层，位于所述金属层的至少一侧，与所述光学结构层同层设置；
    平坦层，位于所述绝缘层的至少一侧，与所述光学保护层同层设置。
  14. 如权利要求8任一所述的显示面板，其中，所述凸起部包括为柱体的第一凸起部，所述第一凸起部的顶部平行于底部，所述第一凸起部中的至少一侧部平行且靠近所述阵列基板或者所述彩膜基板而设置；
    其中，所述第一凸起部在所述彩膜基板上的正投影在长度方向覆盖颜色相同的n个所述色阻部，所述n为正整数，且所述顶部在所述彩膜基板上的正投影位于对应的两所述色阻部之间，所述底部在所述彩膜基板上的正投影位于对应的两所述色阻部之间。
  15. 如权利要求14所述的显示面板，其中，所述色阻部被连续且平行排列的m个所述第一凸起部在所述彩膜基板上的正投影在宽度方向覆盖，所述m为正整数，且m个所述第一凸起部的所述侧部在所述彩膜基板上的正投影位于对应的两所述色阻部之间。
  16. 如权利要求14所述的显示面板，其中，所述第一凸起部在所述彩膜基板上的正投影的边界位于对应的所述色阻部与相邻的所述色阻部之间，且所述第一凸起部在所述彩膜基板上的正投影与对应的所述色阻部的具有夹角。
  17. 如权利要求8所述的显示面板，其中，所述凸起部包括为锥体、台体或者类半球体的第二凸起部，所述第二凸起部的顶部、底部中的至少一者平行于所述阵列基板；
    其中，所述第二凸起部在所述彩膜基板上的正投影覆盖对应的所述色阻部，且所述第二凸起部在所述彩膜基板上的正投影的边界位于多个所述色阻部之间。
  18. 如权利要求9所述的显示面板，其中，所述光学保护层远离所述光学结构层的一侧为平面；
    或者，所述光学保护层远离所述光学结构层的一侧中，对应于相邻两所述凸起部的间隙处的部分，相比较对应于所述凸起部的部分，向靠近所述光学保护层的一侧凹陷形成凹陷区域，相邻两所述色阻部之间设有的黑色部填充至所述凹陷区域。
  19. 如权利要求8所述的显示面板，其中，所述阵列基板包括：
    第二基板；
    电路层，位于所述第二基板靠近所述彩膜基板的一侧，包括第一金属层、位于所述第一金属层靠近所述彩膜基板的一侧的第二金属层；
    其中，所述第一金属层的反射率大于所述第二金属层的反射率。
  20. 一种电子终端，其中，包括显示面板，所述显示面板包括多个开口区，包括：
    阵列基板；
    彩膜基板，与所述阵列基板相对设置，包括分别位于多个所述开口区的多个色阻部；
    背光模组，位于所述阵列基板远离所述彩膜基板的一侧；
    光学层，位于所述彩膜基板之内、所述阵列基板之内两者中的至少一者，至少与多个所述色阻部相对设置，所述光学层用于聚光。
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