WO2024066800A1 - Buffer device suitable for high-viscosity photoresist, and photoresist liquid supply system - Google Patents

Buffer device suitable for high-viscosity photoresist, and photoresist liquid supply system Download PDF

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Publication number
WO2024066800A1
WO2024066800A1 PCT/CN2023/114004 CN2023114004W WO2024066800A1 WO 2024066800 A1 WO2024066800 A1 WO 2024066800A1 CN 2023114004 W CN2023114004 W CN 2023114004W WO 2024066800 A1 WO2024066800 A1 WO 2024066800A1
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WIPO (PCT)
Prior art keywords
buffer device
liquid
guide plate
photoresist
storage tank
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PCT/CN2023/114004
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French (fr)
Chinese (zh)
Inventor
郭振
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颀中科技（苏州）有限公司
合肥颀中科技股份有限公司
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Publication of WO2024066800A1 publication Critical patent/WO2024066800A1/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

Definitions

  • the invention relates to the technical field of semiconductor production, and in particular to a buffer device and a photoresist liquid supply system suitable for high-viscosity photoresist.
  • Photolithography is an important process in the production of semiconductor integrated circuits.
  • a layer of photoresist is usually first covered on the wafer, and then a light source is irradiated through a mask plate to expose the photoresist.
  • the photoresist of the specific pattern becomes hard or soft due to exposure, and finally it is developed with a developer to obtain the corresponding structure.
  • the coating uniformity and adhesion of the photoresist will have a great impact on the overall photolithography manufacturing process. According to field verification, bubbles in the photoresist will cause serious coating abnormalities and low product yield, and the bubble problem of high-viscosity photoresist during the liquid supply process is even more difficult to deal with.
  • the existing buffer device usually uses a pressurizing device to first pressurize the photoresist in the liquid storage device and transport it to the buffer device, and then transports the photoresist in the buffer device from the corresponding pipeline to the nozzle through a photoresist pump for photoresist coating.
  • the high-pressure gas used in the above-mentioned pressurizing device will cause a large number of bubbles to be generated in the photoresist, thereby affecting the uniformity and stability of the photoresist coating, and will also cause abnormal pressure alarms during the coating process, affecting production.
  • the purpose of the present invention is to provide a buffer device and a photoresist liquid supply system suitable for high-viscosity photoresist, which can reduce abnormal risks, improve the uniformity and stability of photoresist coating, and improve production efficiency.
  • the present invention provides a buffer device suitable for high-viscosity photoresist, comprising a liquid storage tank, a liquid inlet pipe and a liquid outlet pipe connected to the liquid storage tank, wherein the liquid storage tank comprises a bottom wall and a side wall;
  • the device also includes a guide plate arranged in the liquid storage tank, the guide plate is arranged in an inclined manner, the liquid inlet pipe extends from top to bottom to below the guide plate; and the guide plate is formed with an exhaust hole.
  • the guide plate is arranged in a flat plate shape, and the inclination angle of the guide plate relative to the horizontal direction is set to 12 to 25 degrees.
  • the guide plate is further provided with a liquid inlet hole, the liquid inlet pipe passes through the liquid inlet hole from top to bottom, and the height of the liquid inlet hole is lower than the height of the exhaust hole.
  • the orthographic projection of the guide plate on the horizontal plane coincides with the orthographic projection of the bottom wall on the horizontal plane; the liquid inlet hole is arranged adjacent to the lowest edge of the guide plate, and the exhaust hole is arranged adjacent to the highest edge of the guide plate.
  • the buffer device also includes a buffer plate arranged below the guide plate, and the end of the liquid inlet pipe is located directly above the buffer plate.
  • a plurality of filter holes are provided on the buffer plate and a portion of the edge of the buffer plate is spaced apart from the side wall.
  • the buffer device also includes an insulation tank arranged on the outside of the liquid storage tank, and a cavity for storing insulation liquid is formed between the insulation tank and the liquid storage tank;
  • the insulation tank includes an insulation bottom wall and an insulation side wall, and the insulation side wall is formed with two through holes, and the two through holes are arranged on both sides of the liquid storage tank, and the buffer device includes an insulation liquid inlet pipe and an insulation liquid outlet pipe respectively connected to the two through holes.
  • the liquid storage tank also includes a top wall formed by folding outward from the upper edge of the side wall, the top wall abuts against the upper edge of the insulation side wall, and the top wall forms a first plane relatively arranged;
  • the buffer device also includes a cover plate pressed downward on the top wall, a second plane is formed on the cover plate, and the cover plate is also provided with a first through hole and a second through hole, the liquid inlet pipe passes through the first through hole, and the buffer device also includes an exhaust pipe passing through the second through hole.
  • the capacity of the liquid storage tank is not less than 500 mL.
  • the present application also provides a photoresist liquid supply system, comprising a storage device, a photoresist pump, and a buffer device as described above and arranged between the storage device and the photoresist pump.
  • the inclined guide plate is more conducive to the upward movement and discharge of bubbles above the photoresist liquid surface, thereby reducing the risk of abnormal pressure inside the photoresist liquid supply system, and avoiding uneven coating caused by bubbles in the photoresist being transported to the nozzle along the pipeline, thereby improving the uniformity and stability of the photoresist coating and facilitating production.
  • FIG1 is a schematic structural diagram of a buffer device of the present application.
  • FIG2 is a schematic plan view of the buffer device of the present application.
  • FIG3 is a top view of the buffer device of the present application.
  • Fig. 4 is a cross-sectional view of the buffer device in Fig. 3 along the A-A direction;
  • FIG5 is a perspective view of a liquid storage tank in the buffer device of the present application.
  • FIG. 6 is a diagram showing the structure of the photoresist liquid supply system of the present application.
  • 100-buffer device 1-liquid storage tank; 101-liquid inlet pipe; 102-liquid outlet pipe; 103-exhaust pipe; 104-insulation liquid inlet pipe; 105-insulation liquid outlet pipe; 11-bottom wall; 12-side wall; 13-top wall; 131-first plane; 14-guide plate; 141-liquid inlet hole; 142-exhaust hole; 15-buffer plate; 151-filter hole; 2-insulation tank; 21-insulation bottom wall; 22-insulation side wall; 221-through hole; 3-cover plate; 31-first through hole; 32-second through hole; 33-second plane; 200-photoresist liquid supply system; 201-storage device; 202-photoresist pump.
  • the buffer device 100 provided by the present invention is used for a photoresist coating device.
  • the buffer device 100 comprises a liquid storage tank 1, a heat preservation tank 2 arranged outside the liquid storage tank 1, and a cover.
  • a cover plate 3 is provided above the liquid storage tank 1 and the heat preservation tank 2 .
  • the liquid storage tank 1 is used to temporarily store a predetermined photoresist and plays a buffering role in the process of photoresist liquid supply; a cavity for storing insulation liquid is formed between the insulation tank 2 and the liquid storage tank 1.
  • the buffer device 100 also includes a liquid inlet pipe 101 and a liquid outlet pipe 102 connected to the liquid storage tank 1, and an insulation liquid inlet pipe 103 and an insulation liquid outlet pipe 104 connected to the insulation tank 2. It should be noted that the liquid inlet pipe 101 and the liquid outlet pipe 102, and the insulation liquid inlet pipe 103 and the insulation liquid outlet pipe 104 can be understood as corresponding pipe joints.
  • the liquid storage tank 1 is generally arranged in a barrel shape, and includes a bottom wall 11, a side wall 12, and a top wall 13 formed by folding outward from the upper edge of the side wall 12.
  • the buffer device 100 also includes a guide plate 14 arranged in the liquid storage tank 1, and the guide plate 14 is arranged in an inclined manner, specifically, the guide plate 14 is arranged in an inclined manner relative to the horizontal plane; the liquid inlet pipe 101 extends from top to bottom to below the guide plate 14.
  • the guide plate 14 can be used as a part of the liquid storage tank 1, or as an independent component assembled in the liquid storage tank 1.
  • the guide plate 14 is formed with a liquid inlet hole 141 and an exhaust hole 142, and the height of the liquid inlet hole 141 is lower than the height of the exhaust hole 142.
  • the liquid inlet pipe 101 passes through the liquid inlet hole 141 from top to bottom to prevent the photoresist from being directly poured on the guide plate 14; the exhaust hole 142 is used to discharge the bubbles precipitated inside the photoresist.
  • the orthographic projection of the guide plate 14 on the horizontal plane coincides with the orthographic projection of the bottom wall 11 on the horizontal plane, that is, the edge of the guide plate 14 is in contact with the side wall 12.
  • the liquid inlet 141 is arranged adjacent to the lowest edge of the guide plate 14, and the exhaust hole 142 is arranged adjacent to the highest edge of the guide plate 14.
  • the edge of the guide plate 14 may be provided with corresponding notches, and the liquid inlet hole 141 and the exhaust hole 142 are formed between the edge of the guide plate 14 and the side wall 12, which will not be described in detail here.
  • the guide plate 14 is arranged in a flat plate shape, and the inclination angle of the guide plate 14 relative to the horizontal direction is set to 12-25 degrees.
  • the setting of the guide plate 14 is conducive to the movement and discharge of the above bubbles after precipitation.
  • the buffer device 100 also includes an exhaust pipe 105 passing through the exhaust hole 142 from top to bottom.
  • the buffer device 100 also includes a buffer plate 15 disposed below the guide plate 14, and the end of the liquid inlet pipe 101 is located directly above the buffer plate 15. It is easy to understand that during normal operation of the liquid storage tank 1, the internal liquid level is kept lower than the buffer plate 15.
  • the buffer plate 15 is provided with a plurality of filter holes 15. After the photoresist leaves the liquid inlet pipe 101, it slowly flows to the bottom of the buffer plate 15 through the filter holes 15, effectively reducing the bubbles generated by the impact of the photoresist. At the same time, considering the smooth precipitation and removal of bubbles, part of the edge of the buffer plate 15 is spaced apart from the side wall 12; for example, the buffer plate 15 can be arranged in a semicircular shape.
  • the insulation tank 2 includes an insulation bottom wall 21 and an insulation side wall 22.
  • the insulation side wall 22 is formed with two through holes 221.
  • the two through holes 221 are respectively arranged on both sides of the liquid storage tank 1; the insulation liquid inlet pipe 103 and the insulation liquid outlet pipe 104 are connected to the two through holes 221.
  • the two through holes 221 are set at different heights to facilitate the circulation of the insulation liquid in the cavity; the insulation liquid inlet pipe 103 can usually be connected to the through hole 221 with a lower height, and the insulation liquid outlet pipe 104 can be connected to the through hole 221 with a higher height.
  • the insulation liquid inlet pipe 103 and the insulation liquid outlet pipe 104 are connected to a corresponding constant temperature box, which stores a predetermined water, organic solution or inorganic solution as the insulation liquid.
  • the temperature of the insulation liquid can be adjusted according to the temperature of the insulation liquid.
  • the photoresist requirements are set.
  • the top wall 13 of the liquid storage tank 1 is pressed downward against the upper edge of the insulation side wall 22, and the outer diameter of the top wall 13 matches the outer diameter of the insulation tank 2 to ensure the overall aesthetics.
  • the liquid storage tank 1 can be directly installed into the insulation tank 2 through the top wall 13, without the need to set up an additional support structure between the two, which is also conducive to the flow of the insulation liquid in the cavity.
  • the top wall 13 is also formed with two first planes 131 arranged opposite to each other, so as to facilitate the movement, placement and removal of the liquid storage tank 1.
  • the cover plate 3 is provided with a first through hole 31 and a second through hole 32.
  • the liquid inlet pipe 101 passes through the first through hole 31, and the exhaust pipe 105 passes through the second through hole 32.
  • the cover plate 3 is also formed with two second planes 33 arranged opposite to each other.
  • the liquid outlet pipe 102 passes through the insulation bottom wall 21 and the bottom wall 11 from the bottom of the liquid storage tank 1 to communicate with the inside of the liquid storage tank 1, effectively avoiding the light resistance residue in the liquid storage tank 1.
  • the liquid outlet pipe 102 can also extend to the inside of the liquid storage tank 1 through the cover plate 3, or pass through the insulation side wall 22 and the side wall 21 in sequence to communicate with the inside of the liquid storage tank 1, which will not be repeated here.
  • the capacity of the liquid storage tank 1 can be designed according to the specific photoresist and the actual photoresist transmission requirements; preferably, the capacity of the liquid storage tank 1 is not less than 500 mL, which is conducive to the discharge of bubbles precipitated from the photoresist.
  • the present application further provides a photoresist liquid supply system 200, comprising a storage device 201, a photoresist pump 202, and a buffer device 100 as described above, which is disposed between the storage device 201 and the photoresist pump 202.
  • the buffer device is connected to the photoresist pump 202 via a corresponding pipeline; the pipeline connected to the rear end of the photoresist pump 202 is also equipped with a corresponding nozzle for photoresist coating operation.
  • the buffer device 100 of the present invention is more conducive to the upward movement and discharge of bubbles above the photoresist liquid surface through the inclined guide plate 14, reducing the risk of abnormal pressure inside the photoresist liquid supply system, and avoiding uneven coating caused by bubbles in the photoresist being transported to the nozzle along the pipeline, thereby improving the uniformity and stability of the photoresist coating and facilitating production.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

A buffer device suitable for a high-viscosity photoresist, and a photoresist liquid supply system. The buffer device comprises a liquid storage tank (1), and a liquid intake pipe (101) and a liquid output pipe (102), which are in communication with the liquid storage tank (1). The liquid storage tank (1) comprises a bottom wall (11) and side walls (12). The buffer device further comprises a guide plate (14) arranged in the liquid storage tank (1), wherein the guide plate (14) is obliquely arranged; the liquid intake pipe (101) extends to a position below the guide plate (14) from top to bottom; and a vent hole (141) is formed in the guide plate (14). The buffer device can reduce bubbles, thereby improving the uniform stability of a photoresist coating operation, and facilitating the production of semiconductors.

Description

适于高粘度光阻的缓冲装置与光阻供液系统Buffer device and photoresist liquid supply system suitable for high viscosity photoresist 技术领域Technical Field
本发明涉及半导体生产技术领域，特别涉及一种适于高粘度光阻的缓冲装置与光阻供液系统。The invention relates to the technical field of semiconductor production, and in particular to a buffer device and a photoresist liquid supply system suitable for high-viscosity photoresist.
背景技术Background technique
光刻是半导体集成电路生产中的一项重要工艺，光刻制造工艺通常先在晶圆上覆盖一层光阻，再通过光源透过一掩膜板照射在光阻上使其曝光，特定图案部分的光阻因为曝光而变硬或变软，最后利用显影液将其显影得到相应的结构。光阻的涂布均匀性及附着性都会对整体光刻制造工艺影响很大，经现场验证，光阻中的气泡会造成严重的涂布异常，造成产品良率低下，而高粘度光阻在供液过程中的气泡问题更是难以处理。Photolithography is an important process in the production of semiconductor integrated circuits. In the photolithography manufacturing process, a layer of photoresist is usually first covered on the wafer, and then a light source is irradiated through a mask plate to expose the photoresist. The photoresist of the specific pattern becomes hard or soft due to exposure, and finally it is developed with a developer to obtain the corresponding structure. The coating uniformity and adhesion of the photoresist will have a great impact on the overall photolithography manufacturing process. According to field verification, bubbles in the photoresist will cause serious coating abnormalities and low product yield, and the bubble problem of high-viscosity photoresist during the liquid supply process is even more difficult to deal with.
现有的缓冲装置通常采用加压装置将储液装置中的光阻先加压输送至缓冲装置，再通过光阻泵将缓冲装置中的光阻自相应的管路输运至喷嘴处进行光阻涂布。上述加压装置所使用高压气体会导致光阻内产生较多气泡，进而影响光阻涂布的均匀稳定性，也会导致涂过程中出现压力异常报警，影响生产。鉴于此，有必要提供一种新的适于高粘度光阻的缓冲装置与光阻供液系统。The existing buffer device usually uses a pressurizing device to first pressurize the photoresist in the liquid storage device and transport it to the buffer device, and then transports the photoresist in the buffer device from the corresponding pipeline to the nozzle through a photoresist pump for photoresist coating. The high-pressure gas used in the above-mentioned pressurizing device will cause a large number of bubbles to be generated in the photoresist, thereby affecting the uniformity and stability of the photoresist coating, and will also cause abnormal pressure alarms during the coating process, affecting production. In view of this, it is necessary to provide a new buffer device and photoresist liquid supply system suitable for high-viscosity photoresists.
发明内容Summary of the invention
本发明的目的是提供一种适于高粘度光阻的缓冲装置与光阻供液系统，能够降低异常风险，提高光阻涂布均匀稳定性，提高生产效率。The purpose of the present invention is to provide a buffer device and a photoresist liquid supply system suitable for high-viscosity photoresist, which can reduce abnormal risks, improve the uniformity and stability of photoresist coating, and improve production efficiency.
本发明提供了一种适于高粘度光阻的缓冲装置，包括储液罐、连通所述储液罐的进液管与出液管，所述储液罐包括底壁与侧壁；所述缓冲 装置还包括设置在所述储液罐内的导引板，所述导引板呈倾斜设置，所述进液管自上向下延伸至所述导引板下方；所述导引板形成有排气孔。The present invention provides a buffer device suitable for high-viscosity photoresist, comprising a liquid storage tank, a liquid inlet pipe and a liquid outlet pipe connected to the liquid storage tank, wherein the liquid storage tank comprises a bottom wall and a side wall; The device also includes a guide plate arranged in the liquid storage tank, the guide plate is arranged in an inclined manner, the liquid inlet pipe extends from top to bottom to below the guide plate; and the guide plate is formed with an exhaust hole.
作为本申请的进一步改进，所述导引板设置呈平板状，且所述导引板相对水平方向的倾斜角度设置为12～25°。As a further improvement of the present application, the guide plate is arranged in a flat plate shape, and the inclination angle of the guide plate relative to the horizontal direction is set to 12 to 25 degrees.
作为本申请的进一步改进，所述导引板还开设有进液孔，所述进液管自上向下穿过所述进液孔，所述进液孔的高度低于所述排气孔的高度。As a further improvement of the present application, the guide plate is further provided with a liquid inlet hole, the liquid inlet pipe passes through the liquid inlet hole from top to bottom, and the height of the liquid inlet hole is lower than the height of the exhaust hole.
作为本申请的进一步改进，所述导引板在水平面的正投影与所述底壁在水平面的正投影相重合；所述进液孔邻近所述导引板位置最低的边缘设置，所述排气孔邻近所述导引板位置最高的边缘设置。As a further improvement of the present application, the orthographic projection of the guide plate on the horizontal plane coincides with the orthographic projection of the bottom wall on the horizontal plane; the liquid inlet hole is arranged adjacent to the lowest edge of the guide plate, and the exhaust hole is arranged adjacent to the highest edge of the guide plate.
作为本申请的进一步改进，所述缓冲装置还包括设置在所述导引板下方的缓冲板，所述进液管的末端位于所述缓冲板的正上方。As a further improvement of the present application, the buffer device also includes a buffer plate arranged below the guide plate, and the end of the liquid inlet pipe is located directly above the buffer plate.
作为本申请的进一步改进，所述缓冲板上开设有若干滤孔且所述缓冲板的部分边缘与所述侧壁间隔设置。As a further improvement of the present application, a plurality of filter holes are provided on the buffer plate and a portion of the edge of the buffer plate is spaced apart from the side wall.
作为本申请的进一步改进，所述缓冲装置还包括设置在所述储液罐外侧的保温罐，所述保温罐与储液罐之间形成用以储放保温液的空腔；所述保温罐包括保温底壁与保温侧壁，所述保温侧壁形成有两个通孔，两个所述通孔分设在所述储液罐的两侧，所述缓冲装置包括分别连接至两个所述通孔的保温液进管与保温液出管。As a further improvement of the present application, the buffer device also includes an insulation tank arranged on the outside of the liquid storage tank, and a cavity for storing insulation liquid is formed between the insulation tank and the liquid storage tank; the insulation tank includes an insulation bottom wall and an insulation side wall, and the insulation side wall is formed with two through holes, and the two through holes are arranged on both sides of the liquid storage tank, and the buffer device includes an insulation liquid inlet pipe and an insulation liquid outlet pipe respectively connected to the two through holes.
作为本申请的进一步改进，所述储液罐还包括自所述侧壁的上缘向外翻折形成的顶壁，所述顶壁与所述保温侧壁的上缘相抵接，所述顶壁形成有相对设置的第一平面；所述缓冲装置还包括向下抵压在所述顶壁上的盖板，所述盖板上形成有第二平面，所述盖板还开设有第一通孔与第二通孔，所述进液管穿过所述第一通孔，所述缓冲装置还包括穿过所述第二通孔的排气管。As a further improvement of the present application, the liquid storage tank also includes a top wall formed by folding outward from the upper edge of the side wall, the top wall abuts against the upper edge of the insulation side wall, and the top wall forms a first plane relatively arranged; the buffer device also includes a cover plate pressed downward on the top wall, a second plane is formed on the cover plate, and the cover plate is also provided with a first through hole and a second through hole, the liquid inlet pipe passes through the first through hole, and the buffer device also includes an exhaust pipe passing through the second through hole.
作为本申请的进一步改进，所述储液罐的容量不低于500mL。As a further improvement of the present application, the capacity of the liquid storage tank is not less than 500 mL.
本申请还提供一种光阻供液系统，包括存储装置、光阻泵及设置在所述存储装置与光阻泵之间并如前所述的缓冲装置。 The present application also provides a photoresist liquid supply system, comprising a storage device, a photoresist pump, and a buffer device as described above and arranged between the storage device and the photoresist pump.
本发明具备的有益效果：采用本发明缓冲装置与光阻供液系统，通过倾斜设置的导引板更有助于光阻液面上方的气泡向上移动排出，降低光阻供液系统内部压力异常风险，也避免光阻内的气泡随管路一并输送至喷嘴所导致的涂布不均，提高光阻涂布的均匀稳定性，利于生产。The beneficial effects of the present invention are as follows: by using the buffer device and the photoresist liquid supply system of the present invention, the inclined guide plate is more conducive to the upward movement and discharge of bubbles above the photoresist liquid surface, thereby reducing the risk of abnormal pressure inside the photoresist liquid supply system, and avoiding uneven coating caused by bubbles in the photoresist being transported to the nozzle along the pipeline, thereby improving the uniformity and stability of the photoresist coating and facilitating production.
附图说明BRIEF DESCRIPTION OF THE DRAWINGS
图1是本申请缓冲装置的结构示意图；FIG1 is a schematic structural diagram of a buffer device of the present application;
图2是本申请缓冲装置的平面示意图；FIG2 is a schematic plan view of the buffer device of the present application;
图3是本申请缓冲装置的俯视图；FIG3 is a top view of the buffer device of the present application;
图4是图3中缓冲装置沿A-A方向的剖视图；Fig. 4 is a cross-sectional view of the buffer device in Fig. 3 along the A-A direction;
图5是本申请缓冲装置中储液罐的透视图；FIG5 is a perspective view of a liquid storage tank in the buffer device of the present application;
图6是本申请光阻供液系统的结构。
100-缓冲装置；1-储液罐；101-进液管；102-出液管；103-排气管；
104-保温液进管；105-保温液出管；11-底壁；12-侧壁；13-顶壁；131-第一平面；14-导引板；141-进液孔；142-排气孔；15-缓冲板；151-滤孔；2-保温罐；21-保温底壁；22-保温侧壁；221-通孔；3-盖板；31-第一通孔；32-第二通孔；33-第二平面；200-光阻供液系统；201-存储装置；202-光阻泵。FIG. 6 is a diagram showing the structure of the photoresist liquid supply system of the present application.
100-buffer device; 1-liquid storage tank; 101-liquid inlet pipe; 102-liquid outlet pipe; 103-exhaust pipe;
104-insulation liquid inlet pipe; 105-insulation liquid outlet pipe; 11-bottom wall; 12-side wall; 13-top wall; 131-first plane; 14-guide plate; 141-liquid inlet hole; 142-exhaust hole; 15-buffer plate; 151-filter hole; 2-insulation tank; 21-insulation bottom wall; 22-insulation side wall; 221-through hole; 3-cover plate; 31-first through hole; 32-second through hole; 33-second plane; 200-photoresist liquid supply system; 201-storage device; 202-photoresist pump.
具体实施方式Detailed ways
以下将结合附图所示的实施方式对本发明进行详细描述。但该实施方式并不限制本发明，本领域的普通技术人员根据该实施方式所做出的结构、方法、或功能上的变换均包含在本发明的保护范围内。The present invention will be described in detail below in conjunction with the embodiments shown in the accompanying drawings. However, the embodiments do not limit the present invention, and any structural, methodological, or functional changes made by a person skilled in the art based on the embodiments are all within the protection scope of the present invention.
参图1所示，本发明提供的缓冲装置100用于光阻涂布设备，所述缓冲装置100包括储液罐1、设置在所述储液罐1外侧的保温罐2、盖设 于所述储液罐1与保温罐2上方的盖板3。As shown in FIG. 1 , the buffer device 100 provided by the present invention is used for a photoresist coating device. The buffer device 100 comprises a liquid storage tank 1, a heat preservation tank 2 arranged outside the liquid storage tank 1, and a cover. A cover plate 3 is provided above the liquid storage tank 1 and the heat preservation tank 2 .
所述储液罐1用以临时存储既定的光阻，并在光阻供液过程中起着缓冲作用；所述保温罐2与储液罐1之间形成用以储放保温液的空腔。所述缓冲装置100还包括连通所述储液罐1的进液管101与出液管102、连通所述保温罐2的保温液进管103与保温液出管104。需要说明的是，所述进液管101与出液管102、所述保温液进管103与保温液出管104可理解为相应的管路接头。The liquid storage tank 1 is used to temporarily store a predetermined photoresist and plays a buffering role in the process of photoresist liquid supply; a cavity for storing insulation liquid is formed between the insulation tank 2 and the liquid storage tank 1. The buffer device 100 also includes a liquid inlet pipe 101 and a liquid outlet pipe 102 connected to the liquid storage tank 1, and an insulation liquid inlet pipe 103 and an insulation liquid outlet pipe 104 connected to the insulation tank 2. It should be noted that the liquid inlet pipe 101 and the liquid outlet pipe 102, and the insulation liquid inlet pipe 103 and the insulation liquid outlet pipe 104 can be understood as corresponding pipe joints.
结合图2至图5所示，所述储液罐1大致设置呈圆桶状，所述储液罐1包括底壁11、侧壁12及自所述侧壁12的上缘向外翻折形成的顶壁13。所述缓冲装置100还包括设置在所述储液罐1内的导引板14，所述导引板14呈倾斜设置，具体是指所述导引板14相对水平面倾斜设置；所述进液管101自上向下延伸至所述导引板14下方。前述“水平”、“上”、“下”的方位是为更清晰地介绍本发明结合附图所做的描述。As shown in Figures 2 to 5, the liquid storage tank 1 is generally arranged in a barrel shape, and includes a bottom wall 11, a side wall 12, and a top wall 13 formed by folding outward from the upper edge of the side wall 12. The buffer device 100 also includes a guide plate 14 arranged in the liquid storage tank 1, and the guide plate 14 is arranged in an inclined manner, specifically, the guide plate 14 is arranged in an inclined manner relative to the horizontal plane; the liquid inlet pipe 101 extends from top to bottom to below the guide plate 14. The aforementioned "horizontal", "upper" and "lower" directions are for a clearer description of the present invention in conjunction with the accompanying drawings.
所述导引板14可作为储液罐1的一部分，亦可作为独立的部件装配在所述储液罐1内。所述导引板14上形成有进液孔141与排气孔142，所述进液孔141的高度低于所述排气孔142的高度。所述进液管101自上向下穿过所述进液孔141，避免光阻直接浇淋在所述导引板14上；所述排气孔142用于光阻内部析出气泡的排出。The guide plate 14 can be used as a part of the liquid storage tank 1, or as an independent component assembled in the liquid storage tank 1. The guide plate 14 is formed with a liquid inlet hole 141 and an exhaust hole 142, and the height of the liquid inlet hole 141 is lower than the height of the exhaust hole 142. The liquid inlet pipe 101 passes through the liquid inlet hole 141 from top to bottom to prevent the photoresist from being directly poured on the guide plate 14; the exhaust hole 142 is used to discharge the bubbles precipitated inside the photoresist.
所述导引板14在水平面的正投影与所述底壁11在水平面的正投影相重合，就是说所述导引板14的边缘所述侧壁12相接。所述进液孔141邻近所述导引板14位置最低的边缘设置，所述排气孔142邻近所述导引板14位置最高的边缘设置。在本申请的其它实施方式中，所述导引板 14的边缘可设置相应的缺口，所述进液孔141、排气孔142形成在所述导引板14的边缘与所述侧壁12之间，此处不再详述。The orthographic projection of the guide plate 14 on the horizontal plane coincides with the orthographic projection of the bottom wall 11 on the horizontal plane, that is, the edge of the guide plate 14 is in contact with the side wall 12. The liquid inlet 141 is arranged adjacent to the lowest edge of the guide plate 14, and the exhaust hole 142 is arranged adjacent to the highest edge of the guide plate 14. The edge of the guide plate 14 may be provided with corresponding notches, and the liquid inlet hole 141 and the exhaust hole 142 are formed between the edge of the guide plate 14 and the side wall 12, which will not be described in detail here.
本实施例中，所述导引板14设置呈平板状，且所述导引板14相对水平方向的倾斜角度设置为12～25°。所述光阻自进液管101进入所述储液罐1时，受冲击、扰动会生成气泡，所述导引板14的设置利于上述气泡析出后的移动与排出。在此，所述缓冲装置100还包括自上向下穿过所述排气孔142的排气管105。In this embodiment, the guide plate 14 is arranged in a flat plate shape, and the inclination angle of the guide plate 14 relative to the horizontal direction is set to 12-25 degrees. When the light resistance enters the liquid storage tank 1 from the liquid inlet pipe 101, bubbles will be generated due to impact and disturbance. The setting of the guide plate 14 is conducive to the movement and discharge of the above bubbles after precipitation. Here, the buffer device 100 also includes an exhaust pipe 105 passing through the exhaust hole 142 from top to bottom.
所述缓冲装置100还包括设置在所述导引板14下方的缓冲板15，并使得所述进液管101的末端位于所述缓冲板15的正上方。容易理解地，所述储液罐1在正常作业过程中，其内部液面保持低于所述缓冲板15。所述缓冲板15上开设有若干滤孔15，所述光阻离开进液管101后，再经所述滤孔15缓慢流动至缓冲板15的下方，有效减少光阻冲击所生成的气泡。同时，考虑到气泡的顺利析出与排除，所述缓冲板15的部分边缘与所述侧壁12间隔设置；示例地，所述缓冲板15可设置呈半圆形。The buffer device 100 also includes a buffer plate 15 disposed below the guide plate 14, and the end of the liquid inlet pipe 101 is located directly above the buffer plate 15. It is easy to understand that during normal operation of the liquid storage tank 1, the internal liquid level is kept lower than the buffer plate 15. The buffer plate 15 is provided with a plurality of filter holes 15. After the photoresist leaves the liquid inlet pipe 101, it slowly flows to the bottom of the buffer plate 15 through the filter holes 15, effectively reducing the bubbles generated by the impact of the photoresist. At the same time, considering the smooth precipitation and removal of bubbles, part of the edge of the buffer plate 15 is spaced apart from the side wall 12; for example, the buffer plate 15 can be arranged in a semicircular shape.
所述保温罐2包括保温底壁21与保温侧壁22，所述保温侧壁22形成有两个通孔221，两个所述通孔221分设在所述储液罐1的两侧；所述保温液进管103与保温液出管104分别连接在两个所述通孔221上。两个通孔221的高度设置不同，以利于所述空腔内保温液的循环流动；通常可将所述保温液进管103连接在高度较低的通孔221上，并将所述保温液出管104连接在高度较高的通孔221上。可选择地，所述保温液进管103、保温液出管104连接至相应的恒温箱，所述恒温箱内存储有既定的水、有机溶液或无机溶液作为保温液，所述保温液的温度可根据 光阻的需求进行设定。The insulation tank 2 includes an insulation bottom wall 21 and an insulation side wall 22. The insulation side wall 22 is formed with two through holes 221. The two through holes 221 are respectively arranged on both sides of the liquid storage tank 1; the insulation liquid inlet pipe 103 and the insulation liquid outlet pipe 104 are connected to the two through holes 221. The two through holes 221 are set at different heights to facilitate the circulation of the insulation liquid in the cavity; the insulation liquid inlet pipe 103 can usually be connected to the through hole 221 with a lower height, and the insulation liquid outlet pipe 104 can be connected to the through hole 221 with a higher height. Optionally, the insulation liquid inlet pipe 103 and the insulation liquid outlet pipe 104 are connected to a corresponding constant temperature box, which stores a predetermined water, organic solution or inorganic solution as the insulation liquid. The temperature of the insulation liquid can be adjusted according to the temperature of the insulation liquid. The photoresist requirements are set.
所述储液罐1的顶壁13向下抵压在所述保温侧壁22的上缘，且所述顶壁13的外径与所述保温罐2的外径相匹配，以保证整体美观性。通过所述顶壁13便可将所述储液罐1直接安装至所述保温罐2中，无需在两者之间设置额外的支撑结构，也利于所述保温液在空腔内流动。此处，所述顶壁13还形成有相对设置的两个第一平面131，以便于所述储液罐1的移动、取放。The top wall 13 of the liquid storage tank 1 is pressed downward against the upper edge of the insulation side wall 22, and the outer diameter of the top wall 13 matches the outer diameter of the insulation tank 2 to ensure the overall aesthetics. The liquid storage tank 1 can be directly installed into the insulation tank 2 through the top wall 13, without the need to set up an additional support structure between the two, which is also conducive to the flow of the insulation liquid in the cavity. Here, the top wall 13 is also formed with two first planes 131 arranged opposite to each other, so as to facilitate the movement, placement and removal of the liquid storage tank 1.
所述盖板3开设有第一通孔31与第二通孔32，所述进液管101穿过所述第一通孔31，所述排气管105穿过所述第二通孔32。同样地，为方便所述盖板3的移动、取放，所述盖板3还形成有相对设置的两个第二平面33。The cover plate 3 is provided with a first through hole 31 and a second through hole 32. The liquid inlet pipe 101 passes through the first through hole 31, and the exhaust pipe 105 passes through the second through hole 32. Similarly, to facilitate the movement and placement of the cover plate 3, the cover plate 3 is also formed with two second planes 33 arranged opposite to each other.
本实施例中，所述出液管102自所述储液罐1的下方贯穿所述保温底壁21、底壁11以连通至储液罐1内部，有效避免所述储液罐1内的光阻残余。当然，所述出液管102亦可通过盖板3延伸至所述储液罐1内部，或依次贯穿所述保温侧壁22与侧壁21连通至所述储液罐1的内部，此处也不再赘述。In this embodiment, the liquid outlet pipe 102 passes through the insulation bottom wall 21 and the bottom wall 11 from the bottom of the liquid storage tank 1 to communicate with the inside of the liquid storage tank 1, effectively avoiding the light resistance residue in the liquid storage tank 1. Of course, the liquid outlet pipe 102 can also extend to the inside of the liquid storage tank 1 through the cover plate 3, or pass through the insulation side wall 22 and the side wall 21 in sequence to communicate with the inside of the liquid storage tank 1, which will not be repeated here.
所述储液罐1的容量可根据光阻的特定以及实际光阻传输需求进行设计；优选地，所述储液罐1的容量不低于500mL，利于所述光阻析出的气泡的排出。The capacity of the liquid storage tank 1 can be designed according to the specific photoresist and the actual photoresist transmission requirements; preferably, the capacity of the liquid storage tank 1 is not less than 500 mL, which is conducive to the discharge of bubbles precipitated from the photoresist.
再参图6所示，本申请还提供一种光阻供液系统200，包括存储装置201、光阻泵202及设置在所述存储装置201与光阻泵202之间并如前所述的缓冲装置100。所述缓冲装置100与存储装置202之间、所述 缓冲装置与光阻泵202之间通过相应的管路相连接；所述光阻泵202后端所连接的管路还配设有相应的喷嘴进行光阻涂布作业。Referring to FIG. 6 , the present application further provides a photoresist liquid supply system 200, comprising a storage device 201, a photoresist pump 202, and a buffer device 100 as described above, which is disposed between the storage device 201 and the photoresist pump 202. The buffer device is connected to the photoresist pump 202 via a corresponding pipeline; the pipeline connected to the rear end of the photoresist pump 202 is also equipped with a corresponding nozzle for photoresist coating operation.
综上所述，本发明缓冲装置100通过倾斜设置的导引板14更有助于光阻液面上方的气泡向上移动排出，降低光阻供液系统内部压力异常风险，也避免光阻内的气泡随管路一并输送至喷嘴所导致的涂布不均，提高光阻涂布的均匀稳定性，利于生产。In summary, the buffer device 100 of the present invention is more conducive to the upward movement and discharge of bubbles above the photoresist liquid surface through the inclined guide plate 14, reducing the risk of abnormal pressure inside the photoresist liquid supply system, and avoiding uneven coating caused by bubbles in the photoresist being transported to the nozzle along the pipeline, thereby improving the uniformity and stability of the photoresist coating and facilitating production.
应当理解，虽然本说明书按照实施方式加以描述，但并非每个实施方式仅包含一个独立的技术方案，说明书的这种叙述方式仅仅是为清楚起见，本领域技术人员应当将说明书作为一个整体，各实施方式中的技术方案也可以经适当组合，形成本领域技术人员可以理解的其他实施方式。It should be understood that although this specification is described according to implementation modes, not every implementation mode contains only one independent technical solution. This description of the specification is only for the sake of clarity. Those skilled in the art should regard the specification as a whole. The technical solutions in each implementation mode may also be appropriately combined to form other implementation modes that can be understood by those skilled in the art.
上文所列出的一系列的详细说明仅仅是针对本发明的可行性实施方式的具体说明，它们并非用以限制本发明的保护范围，凡未脱离本发明技艺精神所作的等效实施方式或变更均应包含在本发明的保护范围之内。 The series of detailed descriptions listed above are only specific descriptions of feasible implementation methods of the present invention. They are not intended to limit the scope of protection of the present invention. Any equivalent implementation methods or changes that do not deviate from the technical spirit of the present invention should be included in the scope of protection of the present invention.

Claims (10)

  1. 一种适于高粘度光阻的缓冲装置，包括储液罐、连通所述储液罐的进液管与出液管，所述储液罐包括底壁与侧壁，其特征在于：所述缓冲装置还包括设置在所述储液罐内的导引板，所述导引板呈倾斜设置，所述进液管自上向下延伸至所述导引板下方；所述导引板形成有排气孔。A buffer device suitable for high-viscosity photoresist, comprising a liquid storage tank, a liquid inlet pipe and a liquid outlet pipe connected to the liquid storage tank, the liquid storage tank comprising a bottom wall and a side wall, characterized in that: the buffer device also includes a guide plate arranged in the liquid storage tank, the guide plate is arranged at an angle, the liquid inlet pipe extends from top to bottom to below the guide plate; the guide plate is formed with an exhaust hole.
  2. 根据权利要求1所述的缓冲装置，其特征在于：所述导引板设置呈平板状，且所述导引板相对水平方向的倾斜角度设置为12～25°。The buffer device according to claim 1 is characterized in that the guide plate is arranged in a flat plate shape, and the inclination angle of the guide plate relative to the horizontal direction is set to 12 to 25 degrees.
  3. 根据权利要求1所述的缓冲装置，其特征在于：所述导引板还开设有进液孔，所述进液管自上向下穿过所述进液孔，所述进液孔的高度低于所述排气孔的高度。The buffer device according to claim 1 is characterized in that: the guide plate is also provided with a liquid inlet hole, the liquid inlet pipe passes through the liquid inlet hole from top to bottom, and the height of the liquid inlet hole is lower than the height of the exhaust hole.
  4. 根据权利要求3所述的缓冲装置，其特征在于：所述导引板在水平面的正投影与所述底壁在水平面的正投影相重合；所述进液孔邻近所述导引板位置最低的边缘设置，所述排气孔邻近所述导引板位置最高的边缘设置。The buffer device according to claim 3 is characterized in that: the orthographic projection of the guide plate on the horizontal plane coincides with the orthographic projection of the bottom wall on the horizontal plane; the liquid inlet hole is arranged adjacent to the lowest edge of the guide plate, and the exhaust hole is arranged adjacent to the highest edge of the guide plate.
  5. 根据权利要求1所述的缓冲装置，其特征在于：所述缓冲装置还包括设置在所述导引板下方的缓冲板，所述进液管的末端位于所述缓冲板的正上方。The buffer device according to claim 1 is characterized in that: the buffer device also includes a buffer plate arranged below the guide plate, and the end of the liquid inlet pipe is located directly above the buffer plate.
  6. 根据权利要求5所述的缓冲装置，其特征在于：所述缓冲板上开设有若干滤孔且所述缓冲板的部分边缘与所述侧壁间隔设置。The buffer device according to claim 5 is characterized in that a plurality of filter holes are opened on the buffer plate and a portion of the edge of the buffer plate is spaced apart from the side wall.
  7. 根据权利要求1所述的缓冲装置，其特征在于：所述缓冲装置还包括设置在所述储液罐外侧的保温罐，所述保温罐与储液罐之间形成用以储放保温液的空腔；所述保温罐包括保温底壁与保温侧壁，所述保温 侧壁形成有两个通孔，两个所述通孔分设在所述储液罐的两侧，所述缓冲装置包括分别连接至两个所述通孔的保温液进管与保温液出管。The buffer device according to claim 1 is characterized in that: the buffer device also includes a heat preservation tank arranged outside the liquid storage tank, and a cavity for storing heat preservation liquid is formed between the heat preservation tank and the liquid storage tank; the heat preservation tank includes a heat preservation bottom wall and a heat preservation side wall, and the heat preservation The side wall is formed with two through holes, which are respectively arranged on both sides of the liquid storage tank. The buffer device includes a thermal insulation liquid inlet pipe and a thermal insulation liquid outlet pipe respectively connected to the two through holes.
  8. 根据权利要求7所述的缓冲装置，其特征在于：所述储液罐还包括自所述侧壁的上缘向外翻折形成的顶壁，所述顶壁与所述保温侧壁的上缘相抵接，所述顶壁形成有相对设置的第一平面；所述缓冲装置还包括向下抵压在所述顶壁上的盖板，所述盖板上形成有第二平面，所述盖板还开设有第一通孔与第二通孔，所述进液管穿过所述第一通孔，所述缓冲装置还包括穿过所述第二通孔的排气管。The buffer device according to claim 7 is characterized in that: the liquid storage tank also includes a top wall formed by folding outward from the upper edge of the side wall, the top wall abuts against the upper edge of the insulation side wall, and the top wall forms a first plane that is relatively set; the buffer device also includes a cover plate that presses downward on the top wall, a second plane is formed on the cover plate, and the cover plate is also provided with a first through hole and a second through hole, the liquid inlet pipe passes through the first through hole, and the buffer device also includes an exhaust pipe passing through the second through hole.
  9. 根据权利要求1所述的缓冲装置，其特征在于：所述储液罐的容量不低于500mL。The buffer device according to claim 1 is characterized in that the capacity of the liquid storage tank is not less than 500 mL.
  10. 一种光阻供液系统，包括存储装置与光阻泵，其特征在于：所述光阻供液系统还包括设置在所述存储装置与光阻泵之间并如权利要求1所述的缓冲装置。 A photoresist liquid supply system comprises a storage device and a photoresist pump, wherein the photoresist liquid supply system further comprises a buffer device as claimed in claim 1 and arranged between the storage device and the photoresist pump.
PCT/CN2023/114004 2022-09-29 2023-08-21 Buffer device suitable for high-viscosity photoresist, and photoresist liquid supply system WO2024066800A1 (en)

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Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115502052A (en) * 2022-09-29 2022-12-23 颀中科技（苏州）有限公司 Buffer device suitable for high-viscosity photoresist and photoresist liquid supply system

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1074742A (en) * 1996-07-27 1998-03-17 Samsung Electron Co Ltd Polyimide coating device
TW497168B (en) * 2000-03-27 2002-08-01 Tokyo Electron Ltd Treatment solution supply apparatus and treatment solution supply method
KR20020074835A (en) * 2001-03-22 2002-10-04 삼성전자 주식회사 apparatus of supplying photoresist for manufacturing semiconductor
CN108975257A (en) * 2018-07-06 2018-12-11 上海至纯洁净系统科技股份有限公司 A kind of paint can for fiber coating
CN208796027U (en) * 2018-10-26 2019-04-26 扬州扬杰电子科技股份有限公司 Developing machine liquid-supplying system
CN209689377U (en) * 2019-01-29 2019-11-26 重庆发琳铝业有限责任公司 Smelting furnace for aluminium ingot melting processing removes oxygen unit
CN114488697A (en) * 2022-02-21 2022-05-13 上海华力微电子有限公司 Photoresist bubble eliminating device and photoetching system
CN114669447A (en) * 2022-04-25 2022-06-28 京东方科技集团股份有限公司 Buffer device of coating equipment and coating equipment
CN115502052A (en) * 2022-09-29 2022-12-23 颀中科技（苏州）有限公司 Buffer device suitable for high-viscosity photoresist and photoresist liquid supply system

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6245148B1 (en) * 1999-01-11 2001-06-12 Mosel Vitelic Inc. SOG dispensing system and its controlling sequences
CN203904304U (en) * 2014-05-23 2014-10-29 山东中坤石油化工有限公司 Degassing tank
CN204763903U (en) * 2015-06-30 2015-11-18 南京信息工程大学 Lunch -box
CN106523086B (en) * 2016-11-25 2019-01-11 铜陵化工集团新桥矿业有限公司 Underground diesel engine exhaust gas processing device
CN107323903A (en) * 2017-06-27 2017-11-07 台山市兰宝磨具有限公司 A kind of liquid material storage device
CN207249353U (en) * 2017-09-19 2018-04-17 上海众鸿电子科技有限公司 A kind of photoresist feeding mechanism
CN109673998A (en) * 2019-02-23 2019-04-26 宁夏十里花蜂产品有限公司 Honey processes sub-packaging system
CN210409963U (en) * 2019-07-18 2020-04-28 四川海盾石油新技术开发有限公司 Hydrogen sulfide eliminating device
CN211481496U (en) * 2020-03-12 2020-09-11 盐城吾荣电器科技有限公司 Electric heater heat preservation device
CN212187898U (en) * 2020-04-22 2020-12-22 苏州市洁力美工业设备有限公司 Gas-liquid separation device for cleaning machine
CN212681017U (en) * 2020-07-08 2021-03-12 福建省梦娇兰日用化学品有限公司 Energy-saving reaction kettle
CN214345500U (en) * 2020-12-07 2021-10-08 曲靖市沾益区祥达建材有限公司 Desulfurization purification device of tunnel kiln tail gas for brickmaking
CN214896208U (en) * 2021-02-03 2021-11-26 昆山龙腾光电股份有限公司 Developing solution storage device
CN215373491U (en) * 2021-05-24 2021-12-31 南通众福新材料科技有限公司 Novel aluminium liquid keeps warm device
CN217505739U (en) * 2021-11-23 2022-09-27 南通辰同智能科技有限公司 Bubble removing device for ultrasonic flaw detection
CN216448981U (en) * 2021-11-27 2022-05-06 沧州市计量测试所 Liquid metering device
CN216487975U (en) * 2021-12-17 2022-05-10 颀中科技（苏州）有限公司 Reaction liquid stirring device for chip packaging
CN216779254U (en) * 2021-12-29 2022-06-21 安徽和怡光电新材料有限公司 Online coating device for optical polyester film
CN217073761U (en) * 2022-04-19 2022-07-29 大姚县彩印有限责任公司 Printing ink save set is used in printing

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1074742A (en) * 1996-07-27 1998-03-17 Samsung Electron Co Ltd Polyimide coating device
TW497168B (en) * 2000-03-27 2002-08-01 Tokyo Electron Ltd Treatment solution supply apparatus and treatment solution supply method
KR20020074835A (en) * 2001-03-22 2002-10-04 삼성전자 주식회사 apparatus of supplying photoresist for manufacturing semiconductor
CN108975257A (en) * 2018-07-06 2018-12-11 上海至纯洁净系统科技股份有限公司 A kind of paint can for fiber coating
CN208796027U (en) * 2018-10-26 2019-04-26 扬州扬杰电子科技股份有限公司 Developing machine liquid-supplying system
CN209689377U (en) * 2019-01-29 2019-11-26 重庆发琳铝业有限责任公司 Smelting furnace for aluminium ingot melting processing removes oxygen unit
CN114488697A (en) * 2022-02-21 2022-05-13 上海华力微电子有限公司 Photoresist bubble eliminating device and photoetching system
CN114669447A (en) * 2022-04-25 2022-06-28 京东方科技集团股份有限公司 Buffer device of coating equipment and coating equipment
CN115502052A (en) * 2022-09-29 2022-12-23 颀中科技（苏州）有限公司 Buffer device suitable for high-viscosity photoresist and photoresist liquid supply system

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