WO2024060667A1 - 一种涂层切削刀具 - Google Patents

一种涂层切削刀具 Download PDF

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Publication number
WO2024060667A1
WO2024060667A1 PCT/CN2023/097591 CN2023097591W WO2024060667A1 WO 2024060667 A1 WO2024060667 A1 WO 2024060667A1 CN 2023097591 W CN2023097591 W CN 2023097591W WO 2024060667 A1 WO2024060667 A1 WO 2024060667A1
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Prior art keywords
coating
layer
cutting tool
coated cutting
tool according
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PCT/CN2023/097591
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English (en)
French (fr)
Inventor
瞿峻
陈响明
王社权
温光华
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株洲钻石切削刀具股份有限公司
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Publication of WO2024060667A1 publication Critical patent/WO2024060667A1/zh

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/04—Making non-ferrous alloys by powder metallurgy
    • C22C1/05—Mixtures of metal powder with non-metallic powder
    • C22C1/051—Making hard metals based on borides, carbides, nitrides, oxides or silicides; Preparation of the powder mixture used as the starting material therefor
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C29/00—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides
    • C22C29/02—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides based on carbides or carbonitrides
    • C22C29/06—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides based on carbides or carbonitrides based on carbides, but not containing other metal compounds
    • C22C29/08—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides based on carbides or carbonitrides based on carbides, but not containing other metal compounds based on tungsten carbide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/36—Carbonitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process

Definitions

  • the invention belongs to the technical field of coated cutting tools, relates to a coated cutting tool, and specifically relates to a coated cutting tool including an AlxTi1 -xN1 - yzCyOz coating.
  • TiAlN coating has excellent properties such as high hardness, high oxidation temperature, good thermal hardness, strong adhesion, small friction coefficient and low thermal conductivity, and has been widely used in the field of high-performance cutting of difficult-to-machine materials. Since Al atoms have good chemical affinity with O atoms, an extremely thin layer of amorphous Al 2 O 3 will be formed in the tool-chip contact area under high temperature, thereby forming a hard inert protective film. Therefore, TiAlN coated tools can still maintain their excellent wear resistance even under high temperature conditions. Research shows that the structure and performance of Ti 1-x Al x N coatings depend largely on the Al content. As the Al content increases, the coating grains become refined, and the hardness and oxidation resistance are improved to a certain extent.
  • the patent application with publication number WO2007003648A1 discloses a single-phase Ti 1-x Al x N (gauging coefficient 0.75 ⁇ x ⁇ 0.93) coating with a cubic NaCl structure through CVD and a preparation method thereof.
  • the CVD method can be used to prepare single-phase cubic phase Ti 1-x Al x N coatings with Al content up to 0.9.
  • the literature (I.Endler, et al. Novel aluminum-rich Ti 1-x Al x N coatings by LPCVD [J]. Surface & Coatings Technology 203 (2008) 530-533) reports the prepared Ti 1-x Al x N coatings It shows excellent performance and is especially suitable for high-speed and efficient processing of cast iron, stainless steel and other materials.
  • CVD-AlTiCN is a typical composition-modified coating with the characteristics of high hardness, high oxidation temperature, good thermal hardness, strong adhesion, small friction coefficient and low thermal conductivity.
  • the structural properties of the coating have been greatly changed, and as the Al content increases, the hardness and heat resistance can be improved to a certain extent.
  • the hardness is increased due to the lattice distortion caused by the addition of C.
  • the technical problem to be solved by the present invention is to overcome the shortcomings of the existing technology and provide a coated cutting tool with a nano-layered crystal structure and excellent wear resistance.
  • the present invention adopts the following technical solutions.
  • a coated cutting tool including a tool base and a wear-resistant coating provided on the tool base, the wear-resistant coating at least includes an Al x Ti 1-x N 1-yz C y O z coating, wherein, 0.45 ⁇ x ⁇ 0.98, 0 ⁇ y ⁇ 0.2, 0 ⁇ z ⁇ 0.18, any section in the Al x Ti 1-x N 1-yz C y O z coating perpendicular to the surface of the tool substrate, along the Al In the growth direction of the x Ti 1-x N 1-yz C y O z coating, the atomic fractions of Al, Ti, and O elements in the Al x Ti 1-x N 1-yz C y O z coating have periodic changes. .
  • the Al Both the Ti-rich layer and the Ti-rich layer have a nano-layered structure.
  • any section in the Al x Ti 1 -x N 1 -yz C y O z coating perpendicular to the surface of the tool substrate is along -yz C y O z
  • the area on the distribution curve of the Al element atomic fraction that is higher than the average atomic fraction of the Al element in the Al x Ti 1-x N 1-yz C y O z coating is an Al-rich layer Period width d Al
  • the area on the Al element atomic fraction distribution curve that is lower than the average atomic fraction of Al element in the Al x Ti 1-x N 1-yz C y O z coating is the period width d Ti of the Ti-rich layer, which satisfies 0.1 nm ⁇ d Al ⁇ 150nm, 0.1nm ⁇ d Ti ⁇ 120nm.
  • any section in the Al x Ti 1 -x N 1 -yz C y O z coating perpendicular to the surface of the tool substrate is along -yz C y O z
  • the width between the two adjacent highest peaks on the O element atomic fraction distribution curve in the Al x Ti 1-x N 1-yz C y O z coating is set to the period Width d O , 0.1nm ⁇ d O ⁇ 150nm.
  • coated cutting tool preferably, 0.5 ⁇ d O /(d Al+ d Ti ) ⁇ 1.5.
  • the O element-rich area in the Al x Ti 1-x N 1-yz C y O z coating is located in the Al-rich layer, and the distance from the nearest Ti-rich layer is d 1 , d 1 ⁇ 0.5d O .
  • the Al x Ti 1-x N 1-yz C y O z coating has at least 85% by volume of face-centered cubic crystals.
  • the microstructure of the Al x Ti 1-x N 1-yz C y O z coating is fibrous.
  • Columnar structure, the average width of columnar grains at 90% thickness along the Al x Ti 1-x N 1-yz C y O z coating growth direction on a cross section perpendicular to the coating surface is d
  • Al x Ti 1 -x N 1-yz C y O z The thickness of the coating is h, and the ratio of h to d h/d ⁇ 8.
  • the nanohardness of the Al x Ti 1-x N 1-yz C y O z coating is ⁇ 28 GPa.
  • the wear-resistant coating has a total thickness of 2 ⁇ m to 25 ⁇ m.
  • the wear-resistant coating further includes a hard base layer located between the AlxTi1 -xN1 -yzCyOz coating and the tool base , so The thickness of the hard base layer is 0.1 ⁇ m to 8 ⁇ m, and the hard base layer includes at least one layer among a TiN layer, a TiCN layer, a TiC layer, and an h-AlN layer deposited by CVD.
  • the thickness of the hard base layer is 0.1 ⁇ m to 5 ⁇ m.
  • the thickness of the hard base layer is 0.1 ⁇ m to 3 ⁇ m.
  • the wear-resistant coating further includes a hard surface layer provided on the Al x Ti 1-x N 1-yz C y O z coating, and the hard surface layer
  • the thickness of the surface layer is >0.1 ⁇ m
  • the hard surface layer includes one or a combination of a CVD deposited TiN layer, a TiC layer, a TiCN layer and an h-AlN layer.
  • any cross section in the Al x Ti 1-x N 1-yz C y O z coating that is perpendicular to the surface of the tool substrate also has periodic concentrations of C and N elements. Variety.
  • the cutting tool substrate includes a substrate made of superhard materials such as cemented carbide, cermet, ceramics, steel or cubic boron nitride.
  • the Al x Ti 1-x N 1-yz C y O z coating has a nanohardness (HV) greater than 28 GPa.
  • HV nanohardness
  • a coating with too low hardness will have lower wear resistance.
  • the high hardness of the AlxTi1 -xN1 -yzCyOz coating of the present invention can be achieved by the implementation method of the present invention.
  • the hard surface layer in the present invention can be used simultaneously with the Al x Ti 1-x N 1-yz C y O z coating and the hard base layer, so that better performance can be obtained.
  • the hard surface layer in the present invention can also be used as a surface coloring layer to obtain better appearance and usage recognition.
  • the coated cutting tool of the present invention has excellent wear resistance, chipping resistance, spalling resistance, high temperature oxidation resistance, high temperature deformation resistance, etc., and is suitable for processing difficult-to-machine materials such as cast iron, stainless steel, alloy steel, cast steel, and high-temperature alloys. Excellent performance in the field.
  • the present invention realizes the deposition of cubic crystal structure AlTiCNO coating with high Al content containing O and periodic concentration changes of O, Ti and Al elements on the surface of the cutting tool.
  • the AlTiCNO coating has an optimized component distribution of O, Ti, and Al elements, which significantly improves the oxidation resistance and coating wear resistance under high-speed and efficient processing.
  • the AlTiCNO coating of the present invention has an Al-rich layer with a rich Al content and a Ti-rich layer with a rich Ti content as modulation cycles.
  • the multi-period coating of nanostructures composed of three phases realizes the optimized structure of Al-rich layer and Ti-rich layer.
  • the coated cutting tool of the present invention has excellent wear resistance and anti-adhesion properties, and has extremely excellent performance in the efficient processing of difficult-to-process materials such as cast iron, stainless steel and high-temperature alloys.
  • Figure 1 is a schematic structural diagram of tool B in Embodiment 1 of the present invention.
  • Figure 2 is a TEM morphology image (STEM-HAADF-BF) of the Al x Ti 1-x N 1-yz C y O z coating in tool B in Example 1 of the present invention.
  • Figure 3 is an energy spectrum analysis diagram of the nano - layered structure region in the Al Al element distribution diagram
  • C is the Ti element distribution diagram
  • D is the O element distribution diagram.
  • Figure 4 is an energy spectrum line scan analysis diagram of the nano-layered structure region in the Al x Ti 1-x N 1-yz C y O z coating of tool B in Example 1 of the present invention.
  • Figure 5 is an energy spectrum line scan analysis diagram of C, N and O elements in the nano-layered structure region of the Al x Ti 1-x N 1-yz C y O z coating in tool B in Example 1 of the present invention.
  • Tool substrate 1. Wear-resistant coating; 3. Hard base layer; 4. Al x Ti 1-x N 1-yz C y O z coating; 5. Hard surface layer; 6. Ti-rich layer ; 7. Al-rich layer; 8. O element-rich area.
  • a coated cutting tool of the present invention comprises a tool substrate 1 and a wear-resistant coating 2 arranged on the tool substrate 1, the wear-resistant coating 2 at least comprising an AlxTi1 -xN1 - yzCyOz coating 4, wherein 0.45 ⁇ x ⁇ 0.98, 0 ⁇ y ⁇ 0.2, 0 ⁇ z ⁇ 0.18, and in any section in the AlxTi1 -xN1 - yzCyOz coating 4 perpendicular to the surface of the tool substrate 1 , along the growth direction of the AlxTi1 -xN1 - yzCyOz coating 4, the atomic fractions of Al, Ti, and O elements in the AlxTi1- xN1 - yzCyOz coating 4 show periodic changes.
  • the Al All are nano-layered structures.
  • any section in the Al x Ti 1-x N 1 -yz C y O z coating 4 that is perpendicular to the surface of the tool base 1 is In the growth direction of layer 4, the area on the Al element atomic fraction distribution curve that is higher than the average atomic fraction of Al element in Al x Ti 1-x N 1-yz C y O z coating 4 is the period width d Al of Al-rich layer 7 , Al element atomic fraction distribution The area on the curve that is lower than the average atomic fraction of Al element in Al nm ⁇ dTi ⁇ 120nm .
  • any section in the Al x Ti 1-x N 1-yz C y O z coating 4 that is perpendicular to the surface of the tool base 1 is In the growth direction of z coating 4, Al x Ti 1-x N 1-yz C y O z
  • the width between the two adjacent highest peaks on the O element atomic fraction distribution curve in coating 4 is set as the period width d O , 0.1nm ⁇ dO ⁇ 150nm .
  • the O element-rich region 8 in the Al x Ti 1-x N 1-yz C y O z coating 4 is located in the Al-rich layer 7 , and the distance from the nearest Ti-rich layer 6 is d 1 , d 1 ⁇ 0.5d O .
  • the Al x Ti 1-x N 1-yz C y O z coating 4 has at least 85% by volume of face-centered cubic crystals. Specifically, in this embodiment, it is 92% of the face-centered cubic crystal structure.
  • the microstructure of the Al x Ti 1-x N 1-yz C y O z coating 4 is a fibrous columnar structure.
  • 1-yz C y O z The average width of columnar grains at 90% of the thickness in the growth direction is d
  • Al x Ti 1-x N 1-yz C y O z The thickness of coating 4 is h, h
  • the ratio h/d to d is ⁇ 8.
  • the nanohardness of the AlxTi1 -xN1 -yzCyOz coating 4 is ⁇ 28 GPa.
  • the wear-resistant coating 2 has a total thickness of 2 ⁇ m to 25 ⁇ m.
  • the wear-resistant coating 2 also includes a hard base layer 3 provided between the Al x Ti 1-x N 1-yz C y O z coating 4 and the tool base 1 .
  • the thickness is 0.1 ⁇ m to 8 ⁇ m
  • the hard base layer 3 includes at least one layer among a TiN layer, a TiCN layer, a TiC layer, and an h-AlN layer deposited by CVD.
  • a TiN layer is specifically used as the hard base layer 3, and the deposition thickness is 1.0 ⁇ m.
  • the wear-resistant coating 2 further comprises a hard surface layer 5 disposed on the AlxTi1 -xN1 -yzCyOz coating 4 , the thickness of the hard surface layer 5 is greater than 0.1 ⁇ m, and the hard surface layer 5 comprises one or a combination of a CVD-deposited TiN layer, a TiC layer, a TiCN layer and an h-AlN layer.
  • the tool B in this embodiment adopts a hard surface layer AlN coating with a thickness of 0.2 ⁇ m.
  • the tool base 1 is a cemented carbide base, but is not limited thereto. It may also be a base made of superhard materials such as cermet, ceramics, steel or cubic boron nitride.
  • LPS low pressure system
  • a hard base layer TiN is deposited on the tool substrate 1 using an existing conventional CVD process, with a deposition thickness of 1.0 ⁇ m.
  • a hard surface layer AlN coating was further deposited on the surface of AlxTi1 -xN1 -yzCyOz coating 4 of tool B in a CVD coating furnace equipped with a low pressure system (LPS), and the reaction gas was introduced into the coating furnace through two gas pipelines, wherein the volume fraction of AlCl3 in the T1 gas was 1.34 %, and the volume fraction of H2 was 98.66%; the volume fraction of NH3 in the T2 gas was 16.67%, and the volume fraction of H2 was 83.33%; the volume ratio of T1/T2 was 1:1.
  • the deposition temperature was 760°C
  • the deposition pressure was 5 mbar
  • the deposition time was 20 min.
  • SEM-EDS was used to analyze the coating composition, as shown in Table 2; the cross-section of the Al x Ti 1-x N 1-yz C y O z coated cutting tool of the present invention was studied by scanning electron microscopy (SEM). Use a diamond saw blade to cut along the direction of the upper and lower surfaces of the vertical blade to obtain a vertical section containing the coating. After mounting, grinding, and polishing, the thickness of each layer of the coating is determined by SEM, as shown in Table 2.
  • the thickness of the Al x Ti 1-x N 1-yz C y O z coating 4 of the present invention has a certain positive correlation with the deposition time, and the coating thickness can be adjusted through the deposition time.
  • the Al content is relatively high
  • the stoichiometric coefficient x value is between 0.45 and 0.98
  • the C content stoichiometric coefficient y value is 0 ⁇ y ⁇ 0.2
  • the O content stoichiometric coefficient z value is between 0.01 and 0.18.
  • Table 4 shows the thickness h of Al x Ti 1-x N 1-yz C y O z coating 4 in the prepared coated cutting insert and the thickness h perpendicular to the coating.
  • the average width d of columnar crystal grains at 90% thickness along the growth direction of Al x Ti 1-x N 1-yz C y O z coating 4 and its ratio on the cross section of the surface.
  • Figure 2 shows the TEM morphology ( STEM -HAADF-BF) of the Al Light and dark stripes of Al-rich layer 7.
  • STEM -HAADF-BF TEM morphology
  • the Al content in Ti-rich layer 6 is lower than the Al content in Al-rich layer 7, the Ti content in Ti-rich layer 6 is higher than the Ti content in Al-rich layer 7, and the highest peak position of the Al content corresponds to The lowest peak position of Ti content.
  • the Al-rich layer 7 has a width period d Al of about 28.5 nm, and the Ti-rich layer 6 has a width period d Ti of about 4 nm.
  • the width of the two complete Ti-rich layer/Al-rich layer 7 periods is about 65nm, and the period width d Al+ d Ti of a single Ti-rich layer/Al-rich layer is about 32.5nm.
  • the width between the three consecutive highest peaks on the O element distribution curve is about 65nm, so the periodic width dO of the periodic concentration change of the O element is about 32.5nm.
  • the O element-rich region 8 is located in the Al-rich layer 7 and the distance d 1 from the nearest Ti-rich layer 6 is about 5 nm. Since the sum of the atomic contents of C, N and O elements is 100%, periodic concentration changes of the O element will inevitably cause one or two elements of C and N to produce corresponding Periodic concentration changes.
  • the Al-rich layer 7 width period d Al in tool A is about 15nm
  • the Ti-rich layer 6 width period d Ti is about 3nm
  • the single Ti-rich layer/Al-rich layer period width d Al+ d Ti is about 3 nm. 18nm.
  • the periodic width dO of the periodic concentration change of the O element is approximately 18nm.
  • the O element-rich region 8 is located in the Al-rich layer 7 and is at a distance d 1 of about 6 nm from the nearest Ti-rich layer 6 .
  • the energy spectrum line scan element content (intensity) distribution diagram of C, N and O elements was drawn, as shown in Figure 5. According to Figure 5, there are periodic concentration changes of C, N and O elements along the growth direction of Al x Ti 1-x N 1-yz C y O z coating 4. However, compared with Al, Ti and O elements, the concentration changes of C and N elements are more complex.
  • the coated blades were polished and then subjected to nanohardness testing, as shown in Table 5.
  • a cutting performance comparison test was conducted between the A and B cutting tools of the present invention produced according to Example 1 and the comparative coated tools H1 and H2 with the same tool base and the same model as in Example 1.
  • the contrast coating tools are H1 tools coated using the existing CVD process: TiN/MT-TiCN/TiN (total thickness 8 ⁇ m) and H2 tools: TiN/MT-TiCN/Al 2 O 3 (total thickness 9 ⁇ m).
  • the service life of the coated tool of the present invention is significantly better than that of the comparative tool, showing excellent wear resistance.
  • a mixture powder of WC with a Co content of 10%, a Cr 3 C 2 content of 0.90%, and a WC particle size of 0.8-1.0 ⁇ m was prepared. After pressing, sintering, and grinding, WC-Co cemented carbide substrates C and D having the blade shape specified by ISO standard WNMG080408-HF are manufactured. Tools C1 and D1 were prepared respectively as follows: Tool C1 used the same CVD process as tool A in Example 1 to deposit a hard base layer of TiN and Al x Ti 1-x N 1-yz C on the tool substrate.
  • TiN and Al x Ti 1-x N 1-yz C y O z thickness are 1.0 microns and 7.3 microns respectively, and then continue to coat h-AlN on its surface using the same CVD process as tool B
  • the thickness of the coating is 0.2 ⁇ m; the tool D1 is deposited with a single layer of TiAlN coating using conventional PVD coating as a comparison tool.
  • the thickness of the TiAlN coating in D1 is 3.2 ⁇ m.
  • the wear life of the coated tool of the present invention is significantly better than that of the comparative tool, and the coated tool of the present invention shows excellent wear resistance.

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  • Engineering & Computer Science (AREA)
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Abstract

本发明公开了一种涂层切削刀具，包括刀具基体(1)以及设于刀具基体上的耐磨涂层(2)，所述耐磨涂层(2)至少包括AlxTi1-xN1-y-zCyOz涂层(4)，其中，0.45≤x≤0.98，0＜y≤0.2，0＜z≤0.18，所述AlxTi1-xN1-y-zCyOz涂层(4)内与所述刀具基体(1)表面垂直的任意剖面，在沿AlxTi1-xN1-y-zCyOz涂层(4)的生长方向上，AlxTi1-xN1-y-zCyOz涂层(4)中Al、Ti、O元素的原子分数存在周期性变化。本发明的涂层切削刀具具有优异的耐磨性能，适用于铸铁、不锈钢及高温合金等难加工材料的高效加工。

Description

一种涂层切削刀具
相关申请的交叉引用
本申请以申请日为“2022年09月20日”、申请号为“202211144578.5”、发明创造名称为“一种涂层切削刀具”的中国专利申请为基础，并主张其优先权，该中国专利申请的全文在此引用至本申请中，以作为本申请的一部分。
【技术领域】
本发明属于涂层切削刀具技术领域，涉及一种涂层切削刀具，具体涉及一种包括AlxTi1-xN1-y-zCyOz涂层的涂层切削刀具。
【背景技术】
在高速和干式切削成为主流的今天，涂层技术的快速发展对刀具性能的改善和切削加工技术的进步起关键作用，涂层切削刀具已成为现代刀具的重要标志。
TiAlN涂层具有硬度高、氧化温度高、热硬性好、附着力强、摩擦系数小和导热率低等优良特性，已在难加工材料的高性能切削领域得到广泛应用。由于Al原子与O原子具有良好的化学亲和性，在高温作用下会在刀具-切屑接触区形成一层极薄的非晶态Al2O3层，从而形成硬质惰性保护膜，因此，TiAlN涂层刀具即使在高温条件下依然可以保持其优良的抗磨损性能。研究显示Ti1-xAlxN涂层结构和性能很大程度上取决于Al含量，随Al含量增加，涂层晶粒细化，硬度和抗氧化性都有一定提高。但超过某一临界值后，密排六方AlN(h-AlN)的出现使其力学性能急剧下降。对于PVD-Ti1-xAlxN涂层，其临界Al含量大致在0.5～0.67at.％，在难加工材料的高性能切削领域得到广泛应用。而采用CVD方法能够制备Al含量高达0.9的单相立方相Ti1-xAlxN涂层。文献(Jie Zhang,et al.Impact of oxygen content on the thermal stability of Ti-Al-O-N coatings based on computational and experimental studies[J].Acta Materialia 227(2022)117706)报道了在PVD TiAlN中通过阴极弧离子镀技术引入O元素，制备出了PVD TiAlNO涂层，其性能优于常规PVD TiAlN涂层。但由于PVD TiAlN中Al含量限制，其对性能影响仍有限。
公开号为WO2007003648A1的专利申请公开了一种通过CVD具有立方体NaCl结构的单相Ti1-xAlxN(计量系数0.75<x≤0.93)涂层及其制备方法。采用CVD方法能够制备Al含量高达0.9的单相立方相Ti1-xAlxN涂层。文献(I.Endler,et al.Novel aluminum-rich Ti1-xAlxN coatings by LPCVD[J].Surface&Coatings Technology 203(2008)530-533)报道了制备的Ti1-xAlxN涂层表现出优异性能，尤其适合于铸铁、不锈钢等材料的高速高效加工。
CVD-AlTiCN是典型的成分改性的涂层，具有硬度高、氧化温度高、热硬性好、附着力强、摩擦系数小和导热率低等特性。相比于常规的MT-TiCN涂层，由于AlTiCN涂层中Al成分的引入，涂层的结构性能发生极大改变，且随着Al含量增加，硬度和耐热性能都能在一定程度得到提高。同时，与AlTiN涂层相比，由于具有由于添加C而引起的晶格畸变，所以硬度提高。但随着现代制造业的发展，对铸铁、钢材高速高效加工、高粘性材料及高温合金等难加工材料的需要日益增多。上述涂层刀具在其应用领域上仍存在涂层抗剥落性能和耐磨性能不足等缺陷。
【发明内容】
本发明要解决的技术问题是克服现有技术的不足，提供一种具有纳米层状晶结构且具有优异的耐磨性能的涂层切削刀具。
为解决上述技术问题，本发明采用以下技术方案。
一种涂层切削刀具，包括刀具基体以及设于刀具基体上的耐磨涂层，所述耐磨涂层至少包括AlxTi1-xN1-y-zCyOz涂层，其中，0.45≤x≤0.98，0＜y≤0.2，0＜z≤0.18，所述AlxTi1-xN1-y-zCyOz涂层内与所述刀具基体表面垂直的任意剖面，在沿AlxTi1-xN1-y-zCyOz涂层的生长方向上，AlxTi1-xN1-y-zCyOz涂层中Al、Ti、O元素的原子分数存在周期性变化。
上述的涂层切削刀具，优选的，所述AlxTi1-xN1-y-zCyOz涂层是由富Al层和富Ti层交替组成的多周期涂层，所述富Al层和富Ti层均为纳米层状结构。
上述的涂层切削刀具，优选的，所述AlxTi1-xN1-y-zCyOz涂层内与所述刀具基体表面垂直的任意剖面，在沿AlxTi1-xN1-y-zCyOz涂层生长方向上，Al元素原子分数分布曲线上高于AlxTi1-xN1-y-zCyOz涂层中Al元素平均原子分数的区域为富Al层的周期宽度dAl，Al元素原子分数分布曲线上低于AlxTi1-xN1-y-zCyOz涂层中Al元素平均原子分数的区域为富Ti层的周期宽度dTi，满足0.1nm≤dAl≤150nm，0.1nm≤dTi≤120nm。
上述的涂层切削刀具，优选的，所述AlxTi1-xN1-y-zCyOz涂层内与所述刀具基体表面垂直的任意剖面，在沿AlxTi1-xN1-y-zCyOz涂层的生长方向上，AlxTi1-xN1-y-zCyOz涂层中O元素原子分数分布曲线上相邻的两个最高峰间的宽度设为周期宽度dO，0.1nm≤dO≤150nm。
上述的涂层切削刀具，优选的，0.5≤dO/(dAl+dTi)≤1.5。
上述的涂层切削刀具，优选的，所述AlxTi1-xN1-y-zCyOz涂层中O元素富集区域位于富Al层中，且离最近的富Ti层的距离为d1，d1≤0.5dO。
上述的涂层切削刀具，优选的，所述AlxTi1-xN1-y-zCyOz涂层具有至少85体积％的面心立方晶体。
上述的涂层切削刀具，优选的，所述AlxTi1-xN1-y-zCyOz涂层的微观结构为呈纤维状的 柱状结构，在垂直于涂层表面的截面上沿AlxTi1-xN1-y-zCyOz涂层生长方向的90％厚度处柱状晶晶粒的平均宽度为d，AlxTi1-xN1-y-zCyOz涂层的厚度为h，h与d的比值h/d≥8。
上述的涂层切削刀具，优选的，所述AlxTi1-xN1-y-zCyOz涂层的纳米硬度≥28GPa。
上述的涂层切削刀具，优选的，所述耐磨涂层具有2μm～25μm的总厚度。
上述的涂层切削刀具，优选的，所述耐磨涂层还包括设于所述AlxTi1-xN1-y-zCyOz涂层与刀具基体之间的硬质基底层，所述硬质基底层的厚度为0.1μm～8μm，所述硬质基底层包括CVD沉积的TiN层、TiCN层、TiC层、h-AlN层中的至少一层。
上述的涂层切削刀具，优选的，所述硬质基底层的厚度为0.1μm～5μm。
上述的涂层切削刀具，优选的，所述硬质基底层的厚度为0.1μm～3μm。
上述的涂层切削刀具，优选的，所述耐磨涂层还包括设于所述AlxTi1-xN1-y-zCyOz涂层之上的硬质表面层，所述硬质表面层的厚度＞0.1μm，所述硬质表面层包括CVD沉积的TiN层、TiC层、TiCN层和h-AlN层中的一种或其组合。
上述的涂层切削刀具，优选的，所述AlxTi1-xN1-y-zCyOz涂层内与所述刀具基体表面垂直的任意剖面，还存在C、N元素的周期性浓度变化。
本发明中，切削刀具基体包括由硬质合金、金属陶瓷、陶瓷、钢或立方氮化硼等超硬材料制成的基体。
本发明中，AlxTi1-xN1-y-zCyOz涂层具有大于28GPa的纳米硬度(HV)。涂层过低的硬度具有较低耐磨性。通过本发明的实施方法可达到本发明的AlxTi1-xN1-y-zCyOz涂层的高硬度。
另外，本发明中的硬质表面层可以和AlxTi1-xN1-y-zCyOz涂层及硬质基底层等同时使用，从而可以获得更优异的性能。同时，本发明中的硬质表面层也可以作为一种表面着色层以获得更好的外观和使用辨识度。
本发明的涂层切削刀具具有优异的耐磨性能、抗崩刃、抗剥落性能和抗高温氧化、抗高温变形等性能，在铸铁、不锈钢、合金钢、铸钢、高温合金等难加工材料加工领域中具有极优异的性能。
与现有技术相比，本发明的优点在于：
1.本发明针对AlTiN涂层中Al含量限制及切削性能不足问题，实现了在切削刀具表面沉积含O的高Al含量的且具有O、Ti、Al元素周期浓度变化的立方晶体结构AlTiCNO涂层，实现了AlTiCNO涂层具有O、Ti、Al元素优化的成分分布，显著提升了高速高效加工下的抗氧化性能和涂层耐磨性能。
2.本发明的AlTiCNO涂层具有以富Al含量的富Al层和富Ti含量的富Ti层为调制周 期组成的纳米结构的多周期涂层，实现了富Al层和富Ti层优化的结构。
本发明的涂层切削刀具，具有优异的耐磨性和抗粘附性，在铸铁、不锈钢及高温合金等难加工材料的高效加工中具有极优异的性能。
【附图说明】
图1为本发明实施例1中刀具B的结构示意图。
图2为本发明实施例1的刀具B中AlxTi1-xN1-y-zCyOz涂层的TEM形貌图(STEM-HAADF-BF)。
图3为本发明实施例1的刀具B中AlxTi1-xN1-y-zCyOz涂层中纳米层状结构区域能谱分析图，其中，A为STEM-HAADF图，B为Al元素分布图，C为Ti元素分布图，D为O元素分布图。
图4为本发明实施例1的刀具B中AlxTi1-xN1-y-zCyOz涂层中纳米层状结构区域能谱线扫描分析图。
图5为本发明实施例1的刀具B中AlxTi1-xN1-y-zCyOz涂层中纳米层状结构区域C、N和O元素能谱线扫描分析图。
图例说明：
1、刀具基体；2、耐磨涂层；3、硬质基底层；4、AlxTi1-xN1-y-zCyOz涂层；5、硬质表
面层；6、富Ti层；7、富Al层；8、O元素富集区域。
【具体实施方式】
以下结合说明书附图和具体优选的实施例对本发明作进一步描述，但并不因此而限制本发明的保护范围。以下实施例中所采用的材料和仪器均为市售。
实施例1
一种本发明的涂层切削刀具，如图1所示，包括刀具基体1以及设于刀具基体1上的耐磨涂层2，耐磨涂层2至少包括AlxTi1-xN1-y-zCyOz涂层4，其中，0.45≤x≤0.98，0＜y≤0.2，0＜z≤0.18，AlxTi1-xN1-y-zCyOz涂层4内与刀具基体1表面垂直的任意剖面，在沿AlxTi1-xN1-y-zCyOz涂层4的生长方向上，AlxTi1-xN1-y-zCyOz涂层4中Al、Ti、O元素的原子分数存在周期性变化。
本实施例中，AlxTi1-xN1-y-zCyOz涂层4是由富Al层7和富Ti层6交替组成的多周期涂层，富Al层7和富Ti层6均为纳米层状结构。
本实施例中，AlxTi1-xN1-y-zCyOz涂层4内与刀具基体1表面垂直的任意剖面，在沿AlxTi1-xN1-y-zCyOz涂层4生长方向上，Al元素原子分数分布曲线上高于AlxTi1-xN1-y-zCyOz涂层4中Al元素平均原子分数的区域为富Al层7的周期宽度dAl，Al元素原子分数分布 曲线上低于AlxTi1-xN1-y-zCyOz涂层4中Al元素平均原子分数的区域为富Ti层6的周期宽度dTi，满足0.1nm≤dAl≤150nm，0.1nm≤dTi≤120nm。
本实施例中，AlxTi1-xN1-y-zCyOz涂层4内与所述刀具基体1表面垂直的任意剖面，在沿AlxTi1-xN1-y-zCyOz涂层4的生长方向上，AlxTi1-xN1-y-zCyOz涂层4中O元素原子分数分布曲线上相邻的两个最高峰间的宽度设为周期宽度dO，0.1nm≤dO≤150nm。
本实施例中，0.5≤dO/(dAl+dTi)≤1.5。
本实施例中，AlxTi1-xN1-y-zCyOz涂层4中O元素富集区域8位于富Al层7中，且离最近的富Ti层6的距离为d1，d1≤0.5dO。
本实施例中，AlxTi1-xN1-y-zCyOz涂层4具有至少85体积％的面心立方晶体，本实施例具体为92％的面心立方晶体结构。
本实施例中，AlxTi1-xN1-y-zCyOz涂层4的微观结构为呈纤维状的柱状结构，在垂直于涂层表面的截面上沿AlxTi1-xN1-y-zCyOz涂层4生长方向的90％厚度处柱状晶晶粒的平均宽度为d，AlxTi1-xN1-y-zCyOz涂层4的厚度为h，h与d的比值h/d≥8。
本实施例中，AlxTi1-xN1-y-zCyOz涂层4的纳米硬度≥28GPa。
本实施例中，耐磨涂层2具有2μm～25μm的总厚度。
本实施例中，耐磨涂层2还包括设于AlxTi1-xN1-y-zCyOz涂层4与刀具基体1之间的硬质基底层3，硬质基底层3的厚度为0.1μm～8μm，硬质基底层3包括CVD沉积的TiN层、TiCN层、TiC层、h-AlN层中的至少一层。本实施例具体采用TiN层为硬质基底层3，沉积厚度为1.0μm。
本实施例中，耐磨涂层2还包括设于所述AlxTi1-xN1-y-zCyOz涂层4之上的硬质表面层5，硬质表面层5的厚度＞0.1μm，硬质表面层5包括CVD沉积的TiN层、TiC层、TiCN层和h-AlN层中的一种或其组合。本实施例的刀具B采用了硬质表面层AlN涂层，厚度为0.2μm。
本实施例中，AlxTi1-xN1-y-zCyOz涂层4内与刀具基体1表面垂直的任意剖面，还存在C、N元素的周期性浓度变化。
本实施例中，刀具基体1为硬质合金基体，但不限于此，还可以为金属陶瓷、陶瓷、钢或立方氮化硼等超硬材料制成的基体。
本实施例的涂层切削刀具的制备方法包括以下步骤：
(1)将Co质量分数为9％、TaNbC质量分数为2.5％、Cr3C2质量分数为0.35％、余量为WC且WC粒度为1.5-1.8μm的混合料粉末经压制、烧结、研磨后，制造出具有ISO标准的SEET12T3-DM所规定的刀片形状的WC-Co硬质合金基体。
(2)为制备可转位涂层切削刀片，在具备低压系统(LPS)的CVD涂层炉中进行涂层，如Bernex BPX530L型CVD涂层设备。采用现有的常规CVD工艺在该刀具基体1上沉积硬质基底层TiN，沉积厚度为1.0μm。
(3)沉积AlxTi1-xN1-y-zCyOz涂层4：在硬质基底层TiN层上继续沉积AlxTi1-xN1-y-zCyOz涂层4，采用低压CVD工艺，以两路气体管路将反应气体导入涂层炉，两路气体T1和T2预热混合后，再通过与预热器连接的中空四周开孔的石墨杆在CVD反应器中沉积AlxTi1-xN1-y-zCyOz涂层4，沉积参数如表1所示。其中，刀具A采用的预热器及石墨杆的旋转速度为1rpm，刀具B采用的预热器及石墨杆的旋转速度为2rpm。
(4)沉积硬质表面层5：对刀具B在AlxTi1-xN1-y-zCyOz涂层4表面进一步在具备低压系统(LPS)的CVD涂层炉中沉积硬质表面层AlN涂层，以两路气体管路将反应气体导入涂层炉，其中，T1路气体中AlCl3体积分数为1.34％，H2体积分数为98.66％；T2路气体中NH3体积分数为16.67％，H2体积分数为83.33％；T1/T2体积比＝1∶1。沉积温度为760℃，沉积压力5mbar，沉积时间为20min。
表1实施例1中AlxTi1-xN1-y-zCyOz涂层的沉积工艺参数
涂层厚度及成分检测：
采用SEM-EDS分析涂层成分，如表2所示；通过扫描电子显微法(SEM)研究本发明的AlxTi1-xN1-y-zCyOz涂层切削刀具的横截面。用金刚石锯片沿垂直刀片上下表面方向切断获得包含涂层的垂直截面，经镶样、研磨、抛光后通过SEM来确定涂层各层厚度，如表2所示。
表2实施例1中涂层厚度
本发明的AlxTi1-xN1-y-zCyOz涂层4的厚度与沉积时间具有一定的正相关性，可通过沉积时间来调整涂层厚度。
采用SEM-EDS分析涂层成分，结果如表3所示。本发明的AlxTi1-xN1-y-zCyOz涂层成分中，Al含量较高，化学计量系数x值在0.45～0.98，C含量化学计量系数y值为0＜y≤0.2，O含量化学计量系数z值在0.01～0.18。
表3实施例1中AlxTi1-xN1-y-zCyOz涂层成分(at％)
使用扫描电镜SEM方法来确定涂层平均粒子宽度d，表4为制备的涂层切削刀片中AlxTi1-xN1-y-zCyOz涂层4的厚度h和在垂直于涂层表面的截面上沿AlxTi1-xN1-y-zCyOz涂层4生长方向的90％厚度处柱状晶晶粒的平均宽度d及其比值。
表4实施例1中AlxTi1-xN1-y-zCyOz涂层厚度及平均粒子宽度d
涂层结构及元素分布检测：
图2为本发明刀具B中AlxTi1-xN1-y-zCyOz涂层TEM形貌(STEM-HAADF-BF)，在明场像模式下，可以看到富Ti层6和富Al层7的明暗条纹。通过在图2中选择包含富Ti层6和富Al层7的区域进行能谱面分析，分析结果如图3所示，根据分析结果，可以观察到富Al和富Ti交替周期变化，且富O区域位于富Al层7中。针对图3区域的能谱分析数据绘制了能谱线扫描元素含量(强度)分布图，如图4所示。根据图4，在沿AlxTi1-xN1-y-zCyOz涂层4生长方向上，由富Ti层6和富Al层7交替构成，且存在Ti和Al交替的周期性浓度变化，在富Ti层6中的Al含量低于富Al层7中的Al含量，富Ti层6中的Ti含量高于富Al层7中的Ti含量，且Al含量的最高峰位置对应着Ti含量的最低峰位置。同时，O元素也存在周期性浓度变化。根据图4，富Al层7宽度周期dAl为约28.5nm，富Ti层6宽度周期dTi为约4nm。由图中两个完整的富Ti层/富Al层7周期的宽度约为65nm，单个富Ti层/富Al层周期宽度dAl+dTi为约32.5nm。O元素分布曲线上连续的三个最高峰间的宽度约为65nm，故O元素周期浓度变化的周期宽度dO约为32.5nm。O元素富集区域8位于富Al层7中且离最近的富Ti层6的距离d1为约5nm。由于C、N和O元素的原子含量之和为100％，故O元素周期性浓度变化必然会引起C、N中的一个或两个元素产生对应的 周期性浓度变化。采用同样的检测方法，测得刀具A中富Al层7宽度周期dAl为约15nm，富Ti层6宽度周期dTi为约3nm，单个富Ti层/富Al层周期宽度dAl+dTi为约18nm。O元素周期浓度变化的周期宽度dO约为18nm。O元素富集区域8位于富Al层7中且离最近的富Ti层6的距离为d1为约6nm。针对图3区域的能谱分析数据绘制了C、N和O元素能谱线扫描元素含量(强度)分布图，如图5所示。根据图5，在沿AlxTi1-xN1-y-zCyOz涂层4生长方向上，C、N和O元素存在周期性浓度变化。但相比Al、Ti和O元素，C和N元素浓度变化的周期更为复杂。
涂层纳米硬度检测：
将涂层刀片经抛光处理后进行纳米硬度测试，如表5所示。
表5实施例1中AlxTi1-xN1-y-zCyOz涂层的纳米硬度测试结果
性能对比试验：
将根据实施例1生产的分别为本发明的A、B切削刀具与跟实施例1具有相同刀具基体和相同型号的对比涂层刀具H1和H2进行切削性能对比试验。其中，对比涂层刀具为采用现有CVD工艺涂覆的H1刀具：TiN/MT-TiCN/TiN(总厚度8μm)和H2刀具：TiN/MT-TiCN/Al2O3(总厚度9μm)。
将上述切削刀具进行如表6中所示的铣削试验。
表6铣削试验条件
表7试验结果对比
根据表7，本发明的涂层刀具寿命显著优于对比刀具，显示出了优异的耐磨性能。
实施例2切削试验
将Co含量为10％、Cr3C2含量为0.90％、WC粒度为0.8-1.0μm的WC的混合料粉末 经压制、烧结、研磨后，制造出具有ISO标准的WNMG080408-HF所规定的的刀片形状的WC-Co硬质合金基体C和D。将其按照如下方法分别制备出刀具C1和D1：刀具C1采用实施例1中与刀具A相同的CVD工艺在该刀具基体上沉积硬质基底层TiN和AlxTi1-xN1-y-zCyOz涂层4，TiN和AlxTi1-xN1-y-zCyOz厚度分别为1.0微米和7.3微米，再在其表面采用与刀具B相同的CVD工艺继续涂覆h-AlN涂层，厚度为0.2μm；将刀具D1采用常规PVD涂层沉积单层TiAlN涂层作为对比刀具，D1中TiAlN涂层厚度3.2微米。
将上述C1、D1刀具进行如表8中所示的车削试验。
表8车削试验条件
表9试验结果对比
根据表9，在加工相同时间下，采用本发明的涂层刀具耐磨寿命明显优于对比刀具，本发明的涂层刀具显示出了优异的耐磨性能。
以上所述，仅是本发明的较佳实施例而已，并非对本发明作任何形式上的限制。虽然本发明已以较佳实施例揭示如上，然而并非用以限定本发明。任何熟悉本领域的技术人员，在不脱离本发明的精神实质和技术方案的情况下，都可利用上述揭示的方法和技术内容对本发明技术方案做出许多可能的变动和修饰，或修改为等同变化的等效实施例。因此，凡是未脱离本发明技术方案的内容，依据本发明的技术实质对以上实施例所做的任何简单修改、等同替换、等效变化及修饰，均仍属于本发明技术方案保护的范围内。

Claims (15)

  1. 一种涂层切削刀具，其特征在于，包括刀具基体以及设于刀具基体上的耐磨涂层，所述耐磨涂层至少包括AlxTi1-xN1-y-zCyOz涂层，其中，0.45≤x≤0.98，0＜y≤0.2，0＜z≤0.18，所述AlxTi1-xN1-y-zCyOz涂层内与所述刀具基体表面垂直的任意剖面，在沿AlxTi1-xN1-y-zCyOz涂层的生长方向上，AlxTi1-xN1-y-zCyOz涂层中Al、Ti、O元素的原子分数存在周期性变化。
  2. 根据权利要求1所述的涂层切削刀具，其特征在于，所述AlxTi1-xN1-y-zCyOz涂层是由富Al层和富Ti层交替组成的多周期涂层，所述富Al层和富Ti层均为纳米层状结构。
  3. 根据权利要求2所述的涂层切削刀具，其特征在于，所述AlxTi1-xN1-y-zCyOz涂层内与所述刀具基体表面垂直的任意剖面，在沿AlxTi1-xN1-y-zCyOz涂层生长方向上，Al元素原子分数分布曲线上高于AlxTi1-xN1-y-zCyOz涂层中Al元素平均原子分数的区域为富Al层的周期宽度dAl，Al元素原子分数分布曲线上低于AlxTi1-xN1-y-zCyOz涂层中Al元素平均原子分数的区域为富Ti层的周期宽度dTi，满足0.1nm≤dAl≤150nm，0.1nm≤dTi≤120nm。
  4. 根据权利要求3所述的涂层切削刀具，其特征在于，所述AlxTi1-xN1-y-zCyOz涂层内与所述刀具基体表面垂直的任意剖面，在沿AlxTi1-xN1-y-zCyOz涂层的生长方向上，AlxTi1-xN1-y-zCyOz涂层中O元素原子分数分布曲线上相邻的两个最高峰间的宽度设为周期宽度dO，0.1nm≤dO≤150nm。
  5. 根据权利要求4所述的涂层切削刀具，其特征在于，0.5≤dO/(dAl+dTi)≤1.5。
  6. 根据权利要求4所述的涂层切削刀具，其特征在于，所述AlxTi1-xN1-y-zCyOz涂层中O元素富集区域位于富Al层中，且离最近的富Ti层的距离为d1，d1≤0.5dO。
  7. 根据权利要求1～6中任一项所述的涂层切削刀具，其特征在于，所述AlxTi1-xN1-y-zCyOz涂层具有至少85体积％的面心立方晶体。
  8. 根据权利要求1～6中任一项所述的涂层切削刀具，其特征在于，所述AlxTi1-xN1-y-zCyOz涂层的微观结构为呈纤维状的柱状结构，在垂直于涂层表面的截面上沿AlxTi1-xN1-y-zCyOz涂层生长方向的90％厚度处柱状晶晶粒的平均宽度为d，AlxTi1-xN1-y-zCyOz涂层的厚度为h，h与d的比值h/d≥8。
  9. 根据权利要求1～6中任一项所述的涂层切削刀具，其特征在于，所述AlxTi1-xN1-y-zCyOz涂层的纳米硬度≥28GPa。
  10. 根据权利要求1～6中任一项所述的涂层切削刀具，其特征在于，所述耐磨涂层具有2μm～25μm的总厚度。
  11. 根据权利要求1～6中任一项所述的涂层切削刀具，其特征在于，所述耐磨涂层还包括设于所述AlxTi1-xN1-y-zCyOz涂层与刀具基体之间的硬质基底层，所述硬质基底层的厚 度为0.1μm～8μm，所述硬质基底层包括CVD沉积的TiN层、TiCN层、TiC层、h-AlN层中的至少一层。
  12. 根据权利要求11所述的涂层切削刀具，其特征在于，所述硬质基底层的厚度为0.1μm～5μm。
  13. 根据权利要求12所述的涂层切削刀具，其特征在于，所述硬质基底层的厚度为0.1μm～3μm。
  14. 根据权利要求1～6中任一项所述的涂层切削刀具，其特征在于，所述耐磨涂层还包括设于所述AlxTi1-xN1-y-zCyOz涂层之上的硬质表面层，所述硬质表面层的厚度＞0.1μm，所述硬质表面层包括CVD沉积的TiN层、TiC层、TiCN层和h-AlN层中的一种或其组合。
  15. 根据权利要求1～6中任一项所述的涂层切削刀具，其特征在于，所述AlxTi1-xN1-y-zCyOz涂层内与所述刀具基体表面垂直的任意剖面，还存在C、N元素的周期性浓度变化。
PCT/CN2023/097591 2022-09-20 2023-05-31 一种涂层切削刀具 WO2024060667A1 (zh)

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