WO2024034670A1 - Article comprenant une couche de traitement de surface - Google Patents
Article comprenant une couche de traitement de surface Download PDFInfo
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- WO2024034670A1 WO2024034670A1 PCT/JP2023/029318 JP2023029318W WO2024034670A1 WO 2024034670 A1 WO2024034670 A1 WO 2024034670A1 JP 2023029318 W JP2023029318 W JP 2023029318W WO 2024034670 A1 WO2024034670 A1 WO 2024034670A1
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- 239000002335 surface treatment layer Substances 0.000 title claims abstract description 37
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 75
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 68
- 150000001875 compounds Chemical class 0.000 claims abstract description 44
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims abstract description 43
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 40
- 125000004429 atom Chemical group 0.000 claims abstract description 22
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 20
- 239000011521 glass Substances 0.000 claims abstract description 18
- 125000000962 organic group Chemical group 0.000 claims description 152
- 239000012756 surface treatment agent Substances 0.000 claims description 71
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 45
- 239000010410 layer Substances 0.000 claims description 34
- 239000002904 solvent Substances 0.000 claims description 27
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 21
- 150000001340 alkali metals Chemical group 0.000 claims description 21
- 229910052783 alkali metal Inorganic materials 0.000 claims description 19
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 claims description 15
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 15
- 125000004432 carbon atom Chemical group C* 0.000 claims description 11
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical group C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 claims description 8
- 239000011734 sodium Substances 0.000 claims description 7
- 238000007740 vapor deposition Methods 0.000 claims description 7
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 claims description 6
- CXQXSVUQTKDNFP-UHFFFAOYSA-N octamethyltrisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C CXQXSVUQTKDNFP-UHFFFAOYSA-N 0.000 claims description 6
- 230000003287 optical effect Effects 0.000 claims description 6
- WILBTFWIBAOWLN-UHFFFAOYSA-N triethyl(triethylsilyloxy)silane Chemical compound CC[Si](CC)(CC)O[Si](CC)(CC)CC WILBTFWIBAOWLN-UHFFFAOYSA-N 0.000 claims description 6
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 5
- 229910052708 sodium Inorganic materials 0.000 claims description 5
- XMSXQFUHVRWGNA-UHFFFAOYSA-N Decamethylcyclopentasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 XMSXQFUHVRWGNA-UHFFFAOYSA-N 0.000 claims description 3
- 229920001296 polysiloxane Polymers 0.000 claims description 3
- -1 siloxane, carbonyl Chemical group 0.000 description 73
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 41
- 125000003161 (C1-C6) alkylene group Chemical group 0.000 description 34
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 33
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 28
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 27
- 150000002430 hydrocarbons Chemical group 0.000 description 27
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 21
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 21
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 21
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 20
- 239000003054 catalyst Substances 0.000 description 20
- 229920002545 silicone oil Polymers 0.000 description 20
- 238000000576 coating method Methods 0.000 description 19
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 18
- 229910000077 silane Inorganic materials 0.000 description 17
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 16
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 14
- 230000015572 biosynthetic process Effects 0.000 description 14
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 14
- 239000000203 mixture Substances 0.000 description 14
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 12
- 239000000463 material Substances 0.000 description 11
- 125000001424 substituent group Chemical group 0.000 description 11
- 238000005160 1H NMR spectroscopy Methods 0.000 description 10
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 10
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 10
- 125000002947 alkylene group Chemical group 0.000 description 10
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 10
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 10
- 125000000882 C2-C6 alkenyl group Chemical group 0.000 description 9
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 9
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 9
- 125000003545 alkoxy group Chemical group 0.000 description 9
- 229910052731 fluorine Inorganic materials 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 238000003786 synthesis reaction Methods 0.000 description 9
- 150000003624 transition metals Chemical class 0.000 description 9
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 8
- 150000001298 alcohols Chemical class 0.000 description 8
- 239000002585 base Substances 0.000 description 8
- 125000001153 fluoro group Chemical group F* 0.000 description 8
- 125000005843 halogen group Chemical group 0.000 description 8
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 8
- 239000003921 oil Substances 0.000 description 8
- 235000012239 silicon dioxide Nutrition 0.000 description 8
- 125000000547 substituted alkyl group Chemical group 0.000 description 8
- 239000008096 xylene Substances 0.000 description 8
- 125000003601 C2-C6 alkynyl group Chemical group 0.000 description 7
- 229910052799 carbon Inorganic materials 0.000 description 7
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 7
- 238000006460 hydrolysis reaction Methods 0.000 description 7
- 150000002500 ions Chemical class 0.000 description 7
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 7
- 229960004592 isopropanol Drugs 0.000 description 7
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 7
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 7
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 7
- 125000006273 (C1-C3) alkyl group Chemical group 0.000 description 6
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- MSXVEPNJUHWQHW-UHFFFAOYSA-N 2-methylbutan-2-ol Chemical compound CCC(C)(C)O MSXVEPNJUHWQHW-UHFFFAOYSA-N 0.000 description 6
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- 238000007865 diluting Methods 0.000 description 6
- 229910052736 halogen Inorganic materials 0.000 description 6
- 150000002367 halogens Chemical class 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- AQIXEPGDORPWBJ-UHFFFAOYSA-N pentan-3-ol Chemical compound CCC(O)CC AQIXEPGDORPWBJ-UHFFFAOYSA-N 0.000 description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- 238000005011 time of flight secondary ion mass spectroscopy Methods 0.000 description 6
- 238000002042 time-of-flight secondary ion mass spectrometry Methods 0.000 description 6
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 6
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 5
- 230000006750 UV protection Effects 0.000 description 5
- 125000004122 cyclic group Chemical group 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 229930195733 hydrocarbon Natural products 0.000 description 5
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 229910052723 transition metal Inorganic materials 0.000 description 5
- 150000003623 transition metal compounds Chemical class 0.000 description 5
- XEZVDURJDFGERA-UHFFFAOYSA-N tricosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCCC(O)=O XEZVDURJDFGERA-UHFFFAOYSA-N 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 4
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 4
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 4
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 4
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 4
- VVJKKWFAADXIJK-UHFFFAOYSA-N Allylamine Chemical compound NCC=C VVJKKWFAADXIJK-UHFFFAOYSA-N 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 4
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 4
- ADANNTOYRVPQLJ-UHFFFAOYSA-N [dimethyl(trimethylsilyloxy)silyl]oxy-[[dimethyl(trimethylsilyloxy)silyl]oxy-dimethylsilyl]oxy-dimethylsilane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C ADANNTOYRVPQLJ-UHFFFAOYSA-N 0.000 description 4
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 4
- 239000005345 chemically strengthened glass Substances 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 4
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 4
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 4
- 239000005400 gorilla glass Substances 0.000 description 4
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 4
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 4
- BKIMMITUMNQMOS-UHFFFAOYSA-N nonane Chemical compound CCCCCCCCC BKIMMITUMNQMOS-UHFFFAOYSA-N 0.000 description 4
- 239000002243 precursor Substances 0.000 description 4
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 229940008424 tetradecamethylhexasiloxane Drugs 0.000 description 4
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 4
- RSJKGSCJYJTIGS-UHFFFAOYSA-N undecane Chemical compound CCCCCCCCCCC RSJKGSCJYJTIGS-UHFFFAOYSA-N 0.000 description 4
- 238000001771 vacuum deposition Methods 0.000 description 4
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 3
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 3
- RNNHLXAEVKCLDG-UHFFFAOYSA-N 2,2,4,4,6,6,8,8-octamethyl-1,3,5,7,9,2,4,6,8,10-pentaoxapentasilecane Chemical compound C[Si]1(C)O[SiH2]O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 RNNHLXAEVKCLDG-UHFFFAOYSA-N 0.000 description 3
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 3
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 3
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 3
- FPQQSJJWHUJYPU-UHFFFAOYSA-N 3-(dimethylamino)propyliminomethylidene-ethylazanium;chloride Chemical compound Cl.CCN=C=NCCCN(C)C FPQQSJJWHUJYPU-UHFFFAOYSA-N 0.000 description 3
- MFKRHJVUCZRDTF-UHFFFAOYSA-N 3-methoxy-3-methylbutan-1-ol Chemical compound COC(C)(C)CCO MFKRHJVUCZRDTF-UHFFFAOYSA-N 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- YFCGDEUVHLPRCZ-UHFFFAOYSA-N [dimethyl(trimethylsilyloxy)silyl]oxy-dimethyl-trimethylsilyloxysilane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C YFCGDEUVHLPRCZ-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 150000001408 amides Chemical class 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 3
- FBZANXDWQAVSTQ-UHFFFAOYSA-N dodecamethylpentasiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C FBZANXDWQAVSTQ-UHFFFAOYSA-N 0.000 description 3
- 229940087203 dodecamethylpentasiloxane Drugs 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- WTBAHSZERDXKKZ-UHFFFAOYSA-N octadecanoyl chloride Chemical compound CCCCCCCCCCCCCCCCCC(Cl)=O WTBAHSZERDXKKZ-UHFFFAOYSA-N 0.000 description 3
- 239000008188 pellet Substances 0.000 description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 229920002379 silicone rubber Polymers 0.000 description 3
- 239000004945 silicone rubber Substances 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 238000007738 vacuum evaporation Methods 0.000 description 3
- NOPJRYAFUXTDLX-UHFFFAOYSA-N 1,1,1,2,2,3,3-heptafluoro-3-methoxypropane Chemical compound COC(F)(F)C(F)(F)C(F)(F)F NOPJRYAFUXTDLX-UHFFFAOYSA-N 0.000 description 2
- SJBBXFLOLUTGCW-UHFFFAOYSA-N 1,3-bis(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC(C(F)(F)F)=C1 SJBBXFLOLUTGCW-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- FUWDFGKRNIDKAE-UHFFFAOYSA-N 1-butoxypropan-2-yl acetate Chemical compound CCCCOCC(C)OC(C)=O FUWDFGKRNIDKAE-UHFFFAOYSA-N 0.000 description 2
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- HCGFUIQPSOCUHI-UHFFFAOYSA-N 2-propan-2-yloxyethanol Chemical compound CC(C)OCCO HCGFUIQPSOCUHI-UHFFFAOYSA-N 0.000 description 2
- VATRWWPJWVCZTA-UHFFFAOYSA-N 3-oxo-n-[2-(trifluoromethyl)phenyl]butanamide Chemical compound CC(=O)CC(=O)NC1=CC=CC=C1C(F)(F)F VATRWWPJWVCZTA-UHFFFAOYSA-N 0.000 description 2
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 2
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- 239000004094 surface-active agent Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- ZUEKXCXHTXJYAR-UHFFFAOYSA-N tetrapropan-2-yl silicate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)OC(C)C ZUEKXCXHTXJYAR-UHFFFAOYSA-N 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- FZMJEGJVKFTGMU-UHFFFAOYSA-N triethoxy(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OCC)(OCC)OCC FZMJEGJVKFTGMU-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
- 238000004846 x-ray emission Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
- C03C17/30—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/18—Materials not provided for elsewhere for application to surfaces to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
Definitions
- the present disclosure relates to an article that includes a surface treatment layer.
- Patent Document 1 It is known that certain silane compounds can provide excellent water and oil repellency when used for surface treatment of substrates.
- An object of the present disclosure is to provide an article provided with a surface treatment layer having higher friction durability.
- R 1 is a straight chain C 11-36 alkyl group
- X 1 is a single bond, -CO-, -COO-, -NR 2 -, -CONR 2 -, -OCONR 2 -, -NR 2 -CO-NR 2 -, -O- or -S-
- a divalent group containing R 2 is a hydrogen atom or a C 1-6 alkyl group
- R Si is a monovalent group containing a Si atom to which a hydroxyl group or a hydrolyzable group is bonded.
- R Si is the following formula (S1), (S2), (S3), or (S4): [In the formula: R 11 is each independently a hydroxyl group or a hydrolyzable group; R 12 is each independently a hydrogen atom or a monovalent organic group; n1 is an integer from 1 to 3; R a1 are each independently -Z 1 -SiR 21 p1 R 22 q1 R 23 r1 ; Z 1 is each independently an oxygen atom or a divalent organic group; R 21 are each independently -Z 1' -SiR 21' p1' R 22' q1' R 23' r1' ; R 22 is each independently a hydroxyl group or a hydrolyzable group; R 23 is each independently a hydrogen atom or a monovalent organic group; p1
- the surface treatment agent includes R 71 OR 72 , R 73 n8 C 6 H 6-n8 , R 74 R 75 R 76 Si-(O-SiR 77 R 78 ) m8 -R 79 , and (OSiR 77 R 78 ) m9
- R 71 to R 79 are each independently a monovalent organic group having 1 to 10 carbon atoms
- m8 is an integer from 1 to 6
- m9 is an integer from 4 to 8
- n8 is an integer from 0 to 6.
- R 1 is a straight chain C 11-36 alkyl group
- X 1 is a single bond, -CO-, -COO-, -NR 2 -, -CONR 2 -, -OCONR 2 -, -NR 2 -CO-NR 2 -, -O- or -S-
- a divalent group containing R 2 is a hydrogen atom or a C 1-6 alkyl group
- R Si is a group containing a Si atom to which a hydroxyl group or a hydrolyzable group is bonded.
- R Si is the following formula (S1), (S2), (S3), or (S4): [In the formula: R 11 is each independently a hydroxyl group or a hydrolyzable group; R 12 is each independently a hydrogen atom or a monovalent organic group; n1 is an integer from 1 to 3; R a1 are each independently -Z 1 -SiR 21 p1 R 22 q1 R 23 r1 ; Z 1 is each independently an oxygen atom or a divalent organic group; R 21 are each independently -Z 1' -SiR 21' p1' R 22' q1' R 23' r1' ; R 22 is each independently a hydroxyl group or a hydrolyzable group; R 23 is each independently a hydrogen atom or a monovalent organic group; p1 is each independently an integer of 0 to 3; q
- monovalent organic group means a monovalent group containing carbon.
- the monovalent organic group is not particularly limited, but may be a hydrocarbon group or a derivative thereof.
- a derivative of a hydrocarbon group is a group having one or more N, O, S, Si, amide, sulfonyl, siloxane, carbonyl, carbonyloxy, etc. at the end of the hydrocarbon group or in the molecular chain. means.
- organic group when simply indicating an "organic group”, it means a monovalent organic group.
- divalent organic group means a divalent group containing carbon. Examples of such divalent organic groups include divalent groups obtained by removing one hydrogen atom from an organic group.
- a trivalent or higher-valent organic group means a group obtained by removing a predetermined number of hydrogen atoms from an organic group.
- hydrocarbon group refers to a group containing carbon and hydrogen, which is obtained by removing a hydrogen atom from a hydrocarbon.
- hydrocarbon groups include, but are not particularly limited to, C 1-20 hydrocarbon groups, such as aliphatic hydrocarbon groups and aromatic hydrocarbon groups.
- aliphatic hydrocarbon group may be linear, branched, or cyclic, and may be saturated or unsaturated.
- the hydrocarbon group may also contain one or more ring structures. Hydrocarbon groups may be substituted with one or more substituents.
- the substituent of the "hydrocarbon group” is not particularly limited, but includes, for example, a halogen atom, and a C 1-6 alkyl which may be substituted with one or more halogen atoms.
- group C 2-6 alkenyl group, C 2-6 alkynyl group, C 3-10 cycloalkyl group, C 3-10 unsaturated cycloalkyl group, 5- to 10-membered heterocyclyl group, 5- to 10-membered unsaturated ring
- One or more groups selected from a saturated heterocyclyl group, a C 6-10 aryl group, and a 5- to 10-membered heteroaryl group are mentioned.
- hydrolyzable group means a group that can undergo a hydrolysis reaction, that is, a group that can be detached from the main skeleton of a compound by a hydrolysis reaction.
- R h examples include unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl, and isobutyl; substituted alkyl groups such as chloromethyl.
- alkyl groups, particularly unsubstituted alkyl groups, are preferred, and methyl groups or ethyl groups are more preferred.
- the article of the present disclosure includes glass and the following formula (1): [In the formula: R 1 is a straight chain C 11-36 alkyl group, X 1 is a single bond, -CO-, -COO-, -NR 2 -, -CONR 2 -, -OCONR 2 -, -NR 2 -CO-NR 2 -, -O- or -S- A divalent group containing R 2 is a hydrogen atom or a C 1-6 alkyl group, R Si is a monovalent group containing a Si atom to which a hydroxyl group or a hydrolyzable group is bonded. ] A surface treatment layer formed from a compound represented by:
- the surface treatment layer included in the article of the present disclosure has both high abrasion durability and fingerprint wiping properties.
- the above-mentioned surface treatment layer may have water repellency, oil repellency, stain resistance, waterproofness (prevents water from entering electronic parts, etc.), and surface slippage, depending on the composition of the surface treatment agent used. (or lubricity, such as good feel to the fingers), chemical resistance, and the like.
- the thickness of the surface treatment layer is not particularly limited, but is preferably 15 nm or less, for example, 1 to 15 nm, 1 to 13 nm, or 1 to 10 nm.
- the article of the present disclosure may include an intermediate layer containing silicon oxide between the glass and the surface treatment layer.
- an intermediate layer containing silicon oxide between the glass and the surface treatment layer.
- the intermediate layer may contain an alkali metal atom in addition to silicon oxide.
- alkali metal atoms examples include lithium, sodium, potassium, and the like.
- the alkali metal atom is preferably sodium.
- the thickness of the intermediate layer is not particularly limited, but is preferably 1 to 200 nm, particularly preferably 1 to 20 nm. By setting the thickness of the intermediate layer to be equal to or greater than the lower limit of the above range, the effect of improving adhesion by the intermediate layer becomes greater.
- the alkali metal atom concentration in the intermediate layer can be measured using various surface analyzers such as TOF-SIMS, XPS, and XRF.
- the ratio of alkali metal atoms to all atoms in the entire intermediate layer can be obtained by XPS depth analysis using ion sputtering, and the surface is etched by XPS measurement and ion sputtering using an ion gun built into the XPS device. This is done by repeating the steps alternately.
- the average value of the alkali metal concentration in a region with a depth of 1 nm or less from the surface in contact with the surface treatment layer is determined by TOF-SIMS (time-of-flight secondary ion mass spectrometry) depth direction analysis using ion sputtering. After obtaining a depth profile of the alkali metal atom concentration, the average value of the alkali metal atom concentration in the profile is calculated.
- TOF-SIMS depth direction analysis using ion sputtering is performed by alternately repeating measurement by TOF-SIMS and surface etching by ion sputtering using an ion gun built into the TOF-SIMS device.
- the article of the present disclosure may be, but is not particularly limited to, an optical member.
- optical members include the following: Lenses such as eyeglasses; Front protection plates, anti-reflection plates, polarizing plates, anti-glare plates of displays such as PDP and LCD; Equipment such as mobile phones and personal digital assistants. Touch panel sheets; disc surfaces of optical discs such as Blu-ray (registered trademark) discs, DVD discs, CD-Rs, MOs; optical fibers; display surfaces of watches, etc.
- the article of the present disclosure may be a medical device or a medical material.
- the article having the surface treatment layer obtained according to the present disclosure may be an interior/exterior member of an automobile.
- exterior materials include: windows, light covers, exterior camera covers.
- interior materials include: instrument panel covers, navigation system touch panels, decorative interior materials.
- R 1 is a straight chain C 11-36 alkyl group.
- the lower limit of the number of carbon atoms is preferably 16, more preferably 18, still more preferably 19, for example 21, or 23. could be.
- the upper limit of carbon number may preferably be 32, more preferably 28, for example 26 or 23.
- R 1 may preferably be a straight chain C 18-36 alkyl group, more preferably a C 18-23 alkyl group.
- the lower limit of the number of carbon atoms in R 1 is preferably 15, more preferably 17, still more preferably 18, for example 20, or 22. could be.
- the upper limit of carbon number may preferably be 31, more preferably 27, for example 25 or 22.
- R 1 may preferably be a straight chain C 17-35 alkyl group, more preferably a C 17-22 alkyl group.
- X 1 is understood to be a linker that connects an alkyl moiety (R 1 ) that mainly provides functions such as water repellency and a silane moiety (R Si ) that provides a bonding ability with a base material. Therefore, X 1 is not particularly limited as long as the compound represented by formula (1) can exist stably.
- X 1 is a single bond, -CO-, -COO-, -NR 2 -, -CONR 2 -, -OCONR 2 -, -NR 2 -CO-NR 2 -, -O- or -S- R 2 is a hydrogen atom or a C 1-6 alkyl group.
- the C 1-6 alkyl group in R 2 may be a straight chain or a branched chain. In one embodiment, the C 1-6 alkyl group is straight chain. In another embodiment, the C 1-6 alkyl group is branched.
- the C 1-6 alkyl group is preferably a C 1-4 alkyl group, more preferably a C 1-3 alkyl group, even more preferably a methyl group or an ethyl group, and particularly preferably a methyl group.
- R 2 is a hydrogen atom.
- X 1 is a single bond.
- X 1 represents -CO-, -COO-, -NR 2 -, -CONR 2 -, -OCONR 2 -, -NR 2 -CO-NR 2 -, -O- or -S-. It is a divalent group containing.
- the above divalent group is preferably of the following formula: -X 11 -X 12 - [In the formula: X 11 is -CO-, -COO-, -NR 2 -, -CONR 2 - , -OCONR 2 -, -NR 2 -CO-NR 2 -, -O- or -S-, R 2 is a hydrogen atom or a C 1-6 alkyl group, X 12 is a single bond or a C 1-6 alkylene group. ] It is a group represented by
- X 11 is preferably -CO-, -CONR 2 -, or -OCONR 2 -.
- R 2 is preferably a hydrogen atom.
- X 12 is a single bond.
- X 12 is or is a C 1-6 alkylene group.
- the or C 1-6 alkylene group in X 12 may be straight chain or branched. In one embodiment, the C 1-6 alkylene group is straight chain. In another embodiment, the C 1-6 alkylene group is branched. The C 1-6 alkylene group is preferably a C 1-4 alkylene group, more preferably a C 1-3 alkylene group.
- -X 11 -X 12 - is preferably -CO- or -CONR 2 -X 12 -.
- R 2 is preferably a hydrogen atom.
- X 12 is preferably a C 1-6 alkylene group.
- R Si is a monovalent group containing a Si atom to which a hydroxyl group or a hydrolyzable group is bonded.
- R Si preferably has the following formula (S1), (S2), (S3), or (S4): [In the formula: R 11 is each independently a hydroxyl group or a hydrolyzable group; R 12 is each independently a hydrogen atom or a monovalent organic group; n1 is an integer from 1 to 3; R a1 are each independently -Z 1 -SiR 21 p1 R 22 q1 R 23 r1 ; Z 1 is each independently an oxygen atom or a divalent organic group; R 21 are each independently -Z 1' -SiR 21' p1' R 22' q1' R 23' r1' ; R 22 is each independently a hydroxyl group or a hydrolyzable group; R 23 is each independently a hydrogen atom or a monovalent organic group; p1 is each independently an integer of 0 to 3; q1 are each independently an integer of 0 to 3; r1 are each independently an integer of 0 to 3; Z 1' is each independently an oxygen
- Each R 11 is independently a hydroxyl group or a hydrolyzable group.
- R 11 is preferably each independently a hydrolyzable group.
- R h include unsubstituted alkyl groups such as methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, and isobutyl group; and substituted alkyl groups such as chloromethyl group.
- alkyl groups particularly unsubstituted alkyl groups, are preferred, and methyl groups or ethyl groups are more preferred.
- R h is a methyl group, and in another embodiment, R h is an ethyl group.
- Each R 12 is independently a monovalent organic group.
- Such a monovalent organic group is a monovalent organic group other than the above-mentioned hydrolyzable group.
- the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and still more preferably a methyl group.
- n1 is an integer of 1 to 3, preferably an integer of 2 to 3, and more preferably 3.
- R a1 are each independently -Z 1 -SiR 21 p1 R 22 q1 R 23 r1 .
- Z 1 is each independently an oxygen atom or a divalent organic group.
- the right side is bonded to (SiR 21 p1 R 22 q1 R 23 r1 ).
- Z 1 is a divalent organic group.
- Z 1 does not include anything that forms a siloxane bond with the Si atom to which Z 1 is bonded.
- (Si-Z 1 -Si) does not contain a siloxane bond.
- Z 1 is preferably a C 1-6 alkylene group, -(CH 2 ) z1 -O-(CH 2 ) z2 - (wherein z1 is an integer of 0 to 6, for example, an integer of 1 to 6; , z2 is an integer from 0 to 6 , e.g. z4 is an integer from 0 to 6, for example, an integer from 1 to 6).
- Such C 1-6 alkylene group may be a straight chain or a branched chain, but is preferably a straight chain.
- These groups may be substituted with one or more substituents selected from, for example, a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 alkynyl group. is preferably unsubstituted.
- Z 1 is a C 1-6 alkylene group or -(CH 2 ) z3 -phenylene-(CH 2 ) z4 -, preferably -phenylene-(CH 2 ) z4 -.
- Z 1 is a C 1-3 alkylene group. In one embodiment, Z 1 can be -CH 2 CH 2 CH 2 -. In another embodiment, Z 1 can be -CH 2 CH 2 -.
- Each R 21 is independently -Z 1' -SiR 21' p1' R 22' q1' R 23' r1' .
- Z 1' each independently represents an oxygen atom or a divalent organic group.
- the right side is bonded to (SiR 21' p1' R 22' q1' R 23' r1' ).
- Z 1' is a divalent organic group.
- Z 1' does not include anything that forms a siloxane bond with the Si atom to which Z 1' is bonded.
- (Si-Z 1' -Si) does not contain a siloxane bond.
- Z 1' is preferably a C 1-6 alkylene group, -(CH 2 ) z1' -O-(CH 2 ) z2' - (wherein z1' is an integer of 0 to 6, for example 1 to 6 and z2' is an integer of 0 to 6, for example, 1 to 6) or -(CH 2 ) z3' -phenylene-(CH 2 ) z4' - (wherein z3' is , z4' is an integer from 0 to 6, for example an integer from 1 to 6, and z4' is an integer from 0 to 6, for example an integer from 1 to 6).
- Such C 1-6 alkylene group may be a straight chain or a branched chain, but is preferably a straight chain. These groups may be substituted with one or more substituents selected from, for example, a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 alkynyl group. is preferably unsubstituted.
- Z 1' is a C 1-6 alkylene group or -(CH 2 ) z3' -phenylene-(CH 2 ) z4' -, preferably -phenylene-(CH 2 ) z4' -.
- Z 1' is a C 1-3 alkylene group. In one embodiment, Z 1' can be -CH 2 CH 2 CH 2 -. In another embodiment, Z 1' can be -CH 2 CH 2 -.
- R 21' are each independently -Z 1'' -SiR 22'' q1'' R 23'' r1'' .
- Z 1" is each independently an oxygen atom or a divalent organic group.
- the right side is bonded to (SiR 22" q1" R 23" r1" ) do.
- Z 1'' is a divalent organic group.
- Z 1'' does not include anything that forms a siloxane bond with the Si atom to which Z 1'' is bonded.
- Si-Z 1'' -Si does not contain a siloxane bond.
- Z 1" is preferably a C 1-6 alkylene group, -(CH 2 ) z1" -O-(CH 2 ) z2" - (wherein z1" is an integer of 0 to 6, for example 1 to 6 and z2" is an integer of 0 to 6, for example, 1 to 6) or -(CH 2 ) z3" -phenylene-(CH 2 ) z4" - (wherein z3" is , an integer of 0 to 6, for example an integer of 1 to 6, and z4'' is an integer of 0 to 6, for example an integer of 1 to 6).
- Such a C 1-6 alkylene group is a straight-chain It may be a branched chain or a branched chain, but is preferably a straight chain.
- These groups are, for example, a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 It may be substituted with one or more substituents selected from alkynyl groups, but is preferably unsubstituted.
- Z 1" is a C 1-6 alkylene group or -(CH 2 ) z3" -phenylene-(CH 2 ) z4" -, preferably -phenylene-(CH 2 ) z4" -. If Z 1'' is such a group, the light resistance, especially UV resistance, may be higher.
- Z 1" is a C 1-3 alkylene group. In one embodiment, Z 1" can be -CH 2 CH 2 CH 2 -. In another embodiment, Z 1'' can be -CH 2 CH 2 -.
- R 22'' are each independently a hydroxyl group or a hydrolyzable group.
- R 22'' are preferably each independently a hydrolyzable group.
- R h is a methyl group, an ethyl group, a propyl group, an isopropyl group.
- R h is a methyl group, and in another embodiment, R h is an ethyl group.
- R 23'' is each independently a monovalent organic group.
- a monovalent organic group is a monovalent organic group excluding the above-mentioned hydrolyzable group.
- the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and still more preferably a methyl group.
- q1'' are each independently an integer of 0 to 3
- r1'' are each independently an integer of 0 to 3. Note that the sum of q1'' and r1'' is 3 in the unit of (SiR 22'' q1'' R 23'' r1'' ).
- q1'' is preferably an integer of 1 to 3, more preferably 2 to 3, and still more preferably 3, independently for each (SiR 22'' q1'' R 23'' r1'' ) unit.
- Each R 22' is independently a hydroxyl group or a hydrolyzable group.
- R 22' are preferably each independently a hydrolyzable group.
- R h include unsubstituted alkyl groups such as methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, and isobutyl group; and substituted alkyl groups such as chloromethyl group.
- alkyl groups particularly unsubstituted alkyl groups, are preferred, and methyl groups or ethyl groups are more preferred.
- R h is a methyl group, and in another embodiment, R h is an ethyl group.
- R 23' each independently represents a monovalent organic group.
- a monovalent organic group is a monovalent organic group other than the above-mentioned hydrolyzable group.
- the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and still more preferably a methyl group.
- p1' are each independently an integer of 0 to 3
- q1' are each independently an integer of 0 to 3
- r1' are each independently an integer of 0 to 3. . Note that the sum of p', q1', and r1' is 3 in the unit of (SiR 21' p1' R 22' q1' R 23' r1' ).
- p1' is 0.
- p1' is an integer of 1 to 3, an integer of 2 to 3, or 3, independently for each (SiR 21' p1' R 22' q1' R 23' r1' ) unit. It's okay. In a preferred embodiment, p1' is 3.
- q1' is an integer of 1 to 3, preferably an integer of 2 to 3, independently for each (SiR 21' p1' R 22' q1' R 23' r1' ) unit, More preferably it is 3.
- p1' is 0, and q1' is an integer of 1 to 3 independently for each (SiR 21' p1' R 22' q1' R 23' r1' ) unit, preferably is an integer of 2 to 3, more preferably 3.
- Each R 22 is independently a hydroxyl group or a hydrolyzable group.
- R 22 is preferably each independently a hydrolyzable group.
- R h include unsubstituted alkyl groups such as methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, and isobutyl group; and substituted alkyl groups such as chloromethyl group.
- alkyl groups particularly unsubstituted alkyl groups, are preferred, and methyl groups or ethyl groups are more preferred.
- R h is a methyl group, and in another embodiment, R h is an ethyl group.
- the above R 23 are each independently a monovalent organic group.
- a monovalent organic group is a monovalent organic group other than the above-mentioned hydrolyzable group.
- the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and still more preferably a methyl group.
- p1 are each independently an integer of 0 to 3
- q1 are each independently an integer of 0 to 3
- r1 are each independently an integer of 0 to 3. Note that the sum of p1, q1, and r1 is 3 in the unit of (SiR 21 p1 R 22 q1 R 23 r1 ).
- p1 is 0.
- p1 may be an integer of 1 to 3, an integer of 2 to 3, or 3, each independently for each (SiR 21 p1 R 22 q1 R 23 r1 ) unit. In a preferred embodiment, p1 is 3.
- q1 is an integer of 1 to 3, preferably an integer of 2 to 3, more preferably 3, for each (SiR 21 p1 R 22 q1 R 23 r1 ) unit independently.
- p1 is 0, and q1 is an integer of 1 to 3, preferably an integer of 2 to 3, independently for each (SiR 21 p1 R 22 q1 R 23 r1 ) unit, and Preferably it is 3.
- each R b1 is independently a hydroxyl group or a hydrolyzable group.
- R b1 are preferably each independently a hydrolyzable group.
- R h include unsubstituted alkyl groups such as methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, and isobutyl group; and substituted alkyl groups such as chloromethyl group.
- alkyl groups particularly unsubstituted alkyl groups, are preferred, and methyl groups or ethyl groups are more preferred.
- R h is a methyl group, and in another embodiment, R h is an ethyl group.
- each R c1 is independently a monovalent organic group.
- a monovalent organic group is a monovalent organic group other than the above-mentioned hydrolyzable group.
- the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and still more preferably a methyl group.
- k1 are each independently an integer of 0 to 3
- l1 are each independently an integer of 0 to 3
- m1 are each independently an integer of 0 to 3. Note that the sum of k1, l1, and m1 is 3 in the unit of (SiR a1 k1 R b1 l1 R c1 m1 ).
- k1 is an integer of 1 to 3, preferably 2 or 3, more preferably 3, each independently for each (SiR a1 k1 R b1 l1 R c1 m1 ) unit. In a preferred embodiment, k1 is 3.
- At least two Si atoms to which hydroxyl groups or hydrolyzable groups are bonded are present in the terminal portion of formula (S2).
- the group represented by formula (S2) is -Z 1 -SiR 22 q1 R 23 r1 (wherein q1 is an integer of 1 to 3, preferably 2 or 3, more preferably 3 ), -Z 1' -SiR 22' q1' R 23' r1' (wherein q1' is an integer of 1 to 3, preferably 2 or 3, more preferably 3, and r1' is an integer of 0 to 2), or -Z 1" -SiR 22" q1" R 23" r1" (wherein q1" is 1 to 3, preferably 2 or 3, more preferably 3, and r1'' is an integer of 0 to 2.)
- Z 1 , Z 1' , Z 1'' , R 22 , R 23 , R 22' , R 23' , R 22' ' and R 23'' have the same meanings as above.
- q1'' is an integer from 1 to 3, preferably 2 or 3, more Preferably it is 3.
- R 21 when R 21 is present, in at least one, preferably all R 21 , p1' is 0 and q1' is an integer from 1 to 3, preferably is 2 or 3, more preferably 3.
- R a1 when R a1 is present, p1 is 0 in at least one, preferably all R a1 , and q1 is an integer from 1 to 3, preferably 2 or 3, more preferably 3.
- k1 is 2 or 3, preferably 3, p1 is 0, and q1 is 2 or 3, preferably 3.
- Each R d1 is independently -Z 2 -CR 31 p2 R 32 q2 R 33 r2 .
- Z 2 is each independently a single bond, an oxygen atom, or a divalent organic group.
- the right side is bonded to (CR 31 p2 R 32 q2 R 33 r2 ).
- Z 2 is a divalent organic group.
- Z 2 does not contain a siloxane bond.
- Z 2 is preferably a C 1-6 alkylene group, -(CH 2 ) z5 -O-(CH 2 ) z6 - (wherein z5 is an integer of 0 to 6, for example, an integer of 1 to 6; , z6 is an integer from 0 to 6 , e.g. (z8 is an integer from 0 to 6, for example, an integer from 1 to 6).
- Such C 1-6 alkylene group may be a straight chain or a branched chain, but is preferably a straight chain.
- These groups may be substituted with one or more substituents selected from, for example, a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 alkynyl group. is preferably unsubstituted.
- Z 2 is a C 1-6 alkylene group or -(CH 2 ) z7 -phenylene-(CH 2 ) z8 -, preferably -phenylene-(CH 2 ) z8 -. If Z 2 is such a group, the light resistance, especially the UV resistance, may be higher.
- Z 2 is a C 1-3 alkylene group. In one embodiment, Z 2 can be -CH 2 CH 2 CH 2 -. In another embodiment, Z 2 can be -CH 2 CH 2 -.
- Each R 31 is independently -Z 2' -CR 32' q2' R 33' r2' .
- Z 2' is each independently a single bond, an oxygen atom, or a divalent organic group.
- the right side is bonded to (CR 32' q2' R 33' r2' ).
- Z 2' does not contain a siloxane bond.
- Z 2' is preferably a C 1-6 alkylene group, -(CH 2 ) z5' -O-(CH 2 ) z6' - (wherein z5' is an integer of 0 to 6, for example 1 to 6 and z6' is an integer of 0 to 6, for example, 1 to 6) or -(CH 2 ) z7' -phenylene-(CH 2 ) z8' - (wherein z7' is , z8' is an integer from 0 to 6, for example an integer from 1 to 6, and z8' is an integer from 0 to 6, for example an integer from 1 to 6).
- Such C 1-6 alkylene group may be a straight chain or a branched chain, but is preferably a straight chain. These groups may be substituted with one or more substituents selected from, for example, a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 alkynyl group. is preferably unsubstituted.
- Z 2' is a C 1-6 alkylene group or -(CH 2 ) z7' -phenylene-(CH 2 ) z8' -, preferably -phenylene-(CH 2 ) z8' -. If Z 2' is such a group, the light resistance, especially UV resistance, may be higher.
- Z 2' is a C 1-3 alkylene group. In one embodiment, Z 2' can be -CH 2 CH 2 CH 2 -. In another embodiment, Z 2' can be -CH 2 CH 2 -.
- Each R 32' is independently -Z 3 -SiR 34 n2 R 35 3-n2 .
- Z 3 is each independently a single bond, an oxygen atom, or a divalent organic group.
- the right side is bonded to (SiR 34 n2 R 35 3-n2 ).
- Z 3 is an oxygen atom.
- Z 3 is a divalent organic group.
- Z 3 does not contain a siloxane bond.
- Z 3 is preferably a C 1-6 alkylene group, -(CH 2 ) z5" -O-(CH 2 ) z6" - (wherein z5" is an integer of 0 to 6, for example 1 to 6) or -(CH 2 ) z7" -phenylene-(CH 2 ) z8" - (wherein z7" is an integer of 0 to 6, for example, 1 to 6) z8'' is an integer from 0 to 6, for example an integer from 1 to 6, and z8'' is an integer from 0 to 6, for example an integer from 1 to 6).
- Such C 1-6 alkylene group may be a straight chain or a branched chain, but is preferably a straight chain.
- These groups may be substituted with one or more substituents selected from, for example, a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 alkynyl group. is preferably unsubstituted.
- Z 3 is a C 1-6 alkylene group or -(CH 2 ) z7" -phenylene-(CH 2 ) z8" -, preferably -phenylene-(CH 2 ) z8" -.
- Z 3 When is such a group, the light resistance, especially the UV resistance, may be higher.
- Z 3 is a C 1-3 alkylene group. In one embodiment, Z 3 can be -CH 2 CH 2 CH 2 -. In another embodiment, Z 3 can be -CH 2 CH 2 -.
- Each R 34 is independently a hydroxyl group or a hydrolyzable group.
- R 34 are preferably each independently a hydrolyzable group.
- R h include unsubstituted alkyl groups such as methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, and isobutyl group; and substituted alkyl groups such as chloromethyl group.
- alkyl groups particularly unsubstituted alkyl groups, are preferred, and methyl groups or ethyl groups are more preferred.
- R h is a methyl group, and in another embodiment, R h is an ethyl group.
- Each R 35 is independently a monovalent organic group.
- Such a monovalent organic group is a monovalent organic group other than the above-mentioned hydrolyzable group.
- the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and still more preferably a methyl group.
- n2 is an integer of 0 to 3, each independently for each (SiR 34 n2 R 35 3-n2 ) unit. However, in the terminal portion of formula (S3), there are at least two units in which n2 is 1 to 3 (SiR 34 n2 R 35 3-n2 ). In other words, in the terminal portion of formula (S3), there are at least two Si atoms to which a hydroxyl group or a hydrolyzable group is bonded.
- n2 is preferably an integer of 1 to 3, more preferably 2 to 3, and still more preferably 3, independently for each (SiR 34 n2 R 35 3-n2 ) unit.
- R 33' each independently represents a hydrogen atom, a hydroxyl group, or a monovalent organic group.
- a monovalent organic group is a monovalent organic group other than the above-mentioned hydrolyzable group.
- the monovalent organic group is preferably a C 1-20 alkyl group or -(C s H 2s ) t1 -(O-C s H 2s ) t2 (wherein s is 1 to 6 an integer, preferably an integer from 2 to 4, t1 is 1 or 0, preferably 0, and t2 is an integer from 1 to 20, preferably an integer from 2 to 10, more preferably an integer from 2 to 6. ), more preferably a C 1-20 alkyl group, still more preferably a C 1-6 alkyl group, particularly preferably a methyl group.
- R 33' is a hydroxyl group.
- R 33' is a monovalent organic group, preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group.
- q2' are each independently an integer of 0 to 3
- r2' are each independently an integer of 0 to 3. Note that the sum of q2' and r2' is 3 in the unit of (CR 32' q2' R 33' r2' ).
- q2' is preferably an integer of 1 to 3, more preferably 2 to 3, and even more preferably 3, independently for each (CR 32' q2' R 33' r2' ) unit.
- Each R 32 is independently -Z 3 -SiR 34 n2 R 35 3-n2 .
- Such -Z 3 -SiR 34 n2 R 35 3-n2 has the same meaning as described in R 32' above.
- R 33 is each independently a hydrogen atom, a hydroxyl group, or a monovalent organic group.
- a monovalent organic group is a monovalent organic group other than the above-mentioned hydrolyzable group.
- the monovalent organic group is preferably a C 1-20 alkyl group or -(C s H 2s ) t1 -(O-C s H 2s ) t2 (wherein s is an integer of 1 to 6 , preferably an integer of 2 to 4, t1 is 1 or 0, preferably 0, and t2 is an integer of 1 to 20, preferably an integer of 2 to 10, more preferably an integer of 2 to 6. ), more preferably a C 1-20 alkyl group, still more preferably a C 1-6 alkyl group, particularly preferably a methyl group.
- R 33 is a hydroxyl group.
- R 33 is a monovalent organic group, preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group.
- p2 is each independently an integer of 0 to 3
- q2 is each independently an integer of 0 to 3
- r2 is each independently an integer of 0 to 3. Note that the sum of p2, q2, and r2 is 3 in the unit of (CR 31 p2 R 32 q2 R 33 r2 ).
- p2 is 0.
- p2 may be an integer of 1 to 3, an integer of 2 to 3, or 3, each independently for each (CR 31 p2 R 32 q2 R 33 r2 ) unit. In a preferred embodiment, p2 is 3.
- q2 is an integer of 1 to 3, preferably an integer of 2 to 3, more preferably 3, for each (CR 31 p2 R 32 q2 R 33 r2 ) unit independently.
- p2 is 0, and q2 is an integer of 1 to 3, preferably an integer of 2 to 3, independently for each (CR 31 p2 R 32 q2 R 33 r2 ) unit, and Preferably it is 3.
- Each R e1 is independently -Z 3 -SiR 34 n2 R 35 3-n2 .
- Such -Z 3 -SiR 34 n2 R 35 3-n2 has the same meaning as described in R 32' above.
- R f1 is each independently a hydrogen atom, a hydroxyl group, or a monovalent organic group.
- a monovalent organic group is a monovalent organic group other than the above-mentioned hydrolyzable group.
- the monovalent organic group is preferably a C 1-20 alkyl group or -(C s H 2s ) t1 -(O-C s H 2s ) t2 (wherein s is an integer of 1 to 6 , preferably an integer of 2 to 4, t1 is 1 or 0, preferably 0, and t2 is an integer of 1 to 20, preferably an integer of 2 to 10, more preferably an integer of 2 to 6. ), more preferably a C 1-20 alkyl group, still more preferably a C 1-6 alkyl group, particularly preferably a methyl group.
- R f1 is a hydroxyl group.
- R f1 is a monovalent organic group, preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group.
- k2 is each independently an integer from 0 to 3
- l2 is each independently an integer from 0 to 3
- m2 is each independently an integer from 0 to 3. Note that the sum of k2, l2, and m2 is 3 in the unit of (CR d1 k2 R e1 l2 R f1 m2 ).
- two or more (SiR 34 n2 R 35 3-n2 ) units in which n2 is 1 to 3, preferably 2 or 3, more preferably 3 are present in each terminal portion of formula (S3),
- n2 is 1 to 3, preferably 2 or 3, more preferably 3
- n2 is an integer from 1 to 3, preferably 2 or 3, more preferably is 3.
- n2 is an integer from 1 to 3, preferably 2 or 3, more preferably 3 It is.
- R e1 when R e1 is present, in at least one, preferably all R a1 , n2 is an integer from 1 to 3, preferably 2 or 3, more preferably 3 It is.
- k2 is 0, l2 is 2 or 3, preferably 3, and n2 is 2 or 3, preferably 3.
- R g1 and R h1 are each independently -Z 4 -SiR 11 n1 R 12 3-n1 , -Z 4 -SiR a1 k1 R b1 l1 R c1 m1 , -Z 4 -CR d1 k2 R e1 l2 R f1 m2 .
- R 11 , R 12 , R a1 , R b2 , R c1 , R d1 , R e1 , R f1 , n1, k1, l1, m1, k2, l2, and m2 have the same meanings as above.
- R g1 and R h1 are each independently -Z 4 -SiR 11 n1 R 12 3-n1 .
- Z 4 are each independently a single bond, an oxygen atom, or a divalent organic group.
- the right side is bonded to (SiR 11 n1 R 12 3-n1 ).
- Z 4 is an oxygen atom.
- Z 4 is a divalent organic group.
- Z 4 does not contain a siloxane bond.
- Z 4 is preferably a C 1-6 alkylene group, -(CH 2 ) z5" -O-(CH 2 ) z6" - (wherein z5" is an integer from 0 to 6, for example from 1 to 6) or -(CH 2 ) z7" -phenylene-(CH 2 ) z8" - (wherein z7" is an integer of 0 to 6, for example, 1 to 6) z8'' is an integer from 0 to 6, for example an integer from 1 to 6, and z8'' is an integer from 0 to 6, for example an integer from 1 to 6).
- Such C 1-6 alkylene group may be a straight chain or a branched chain, but is preferably a straight chain.
- These groups may be substituted with one or more substituents selected from, for example, a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 alkynyl group. is preferably unsubstituted.
- Z 4 is a C 1-6 alkylene group or -(CH 2 ) z7" -phenylene-(CH 2 ) z8" -, preferably -phenylene-(CH 2 ) z8" -.
- Z 3 When is such a group, the light resistance, especially UV resistance, may be higher.
- Z 4 is a C 1-3 alkylene group. In one embodiment, Z 4 can be -CH 2 CH 2 CH 2 -. In another embodiment, Z 4 can be -CH 2 CH 2 -.
- formulas (S1), (S2), (S3), and (S4) do not contain a siloxane bond.
- R Si is a group represented by formula (S2), (S3), or (S4).
- R Si is a group represented by formula (S3), (S4) or (S5).
- R Si is a group represented by formula (S1).
- n1 is 1-3, preferably 2-3, more preferably 3.
- R Si is a group represented by formula (S2).
- formula (S2) is -SiR a1 2 R c1 or -SiR a1 3
- R a1 is -Z 1 -SiR 22 q1 R 23 r1
- Z 1 is C 1-6 Alkylene group, -(CH 2 ) z1 -O-(CH 2 ) z2 - (wherein z1 is an integer of 0 to 6, for example, 1 to 6, and z2 is an integer of 0 to 6, for example ), or -(CH 2 ) z3 -phenylene-(CH 2 ) z4 - (wherein z3 is an integer of 0 to 6, for example, 1 to 6, and z4 is , an integer of 0 to 6, for example an integer of 1 to 6), preferably a C 1-6 alkylene group, and q1 is 1 to 3, preferably 2 to 3, more preferably 3.
- R Si is a group represented by formula (S3).
- formula (S3) is -CR e1 2 R f1 or -CR e1 3
- R e1 is -Z 3 -SiR 34 n2 R 35 3-n2
- Z 3 is C 1 -6 alkylene group, -(CH 2 ) z5" -O-(CH 2 ) z6" - (wherein z5" is an integer from 0 to 6, for example, from 1 to 6, and z6" is 0 -(CH 2 ) z7" -phenylene-(CH 2 ) z8" - (where z7" is an integer from 0 to 6, e.g.
- z8'' is an integer from 0 to 6, such as an integer from 1 to 6), preferably a C 1-6 alkylene group, and n2 is from 1 to 3, preferably from 2 to 3, and Preferably it is 3.
- R Si is a group represented by formula (S4).
- R g1 and R h1 are -Z 4 -SiR 11 n1 R 12 3-n1
- Z 4 is a C 1-6 alkylene group, -(CH 2 ) z5" -O-(CH 2 ) z6'' - (wherein z5'' is an integer from 0 to 6, for example an integer from 1 to 6, and z6'' is an integer from 0 to 6, for example an integer from 1 to 6) or -( CH 2 ) z7" -phenylene-(CH 2 ) z8" - (wherein z7" is an integer from 0 to 6, for example from 1 to 6, and z8" is an integer from 0 to 6, for example 1 n1 is an integer of 1 to 6), preferably a C 1-6 alkylene group, and n1 is 1 to 3, preferably 2 to 3, and more preferably 3.
- the compound represented by formula (1) is, for example, the following formula (1a) R 1 -X 1a -R i [In the formula: R 1 is a straight chain C 11-36 alkyl group, X 1a is a single bond or a divalent organic group, R i is -R 61 , -CONR 61 2 , -SiR 61 3 or -CR 61 3 , R 61 is a C 2-6 alkenyl group having a double bond at the end.
- the compound represented by the above formula (1a) can be converted into the compound represented by the following formula (1c).
- HSiCl m R 64 (3-m) Formula (1c) [In the formula, R 64 is each independently a monovalent organic group, m is 1-3. ]
- the alkali metal may be sodium or potassium.
- the alkali metal may be sodium or potassium.
- the surface treatment layer of the article of the present disclosure can be formed by applying a compound represented by formula (1) to a glass surface.
- the compound represented by formula (1) can be applied to a glass surface as a surface treatment agent.
- the above surface treatment agent contains at least one compound represented by formula (1).
- the surface treatment agent contains only the compound represented by formula (1).
- the content of the compound represented by the above formula (1) is preferably 0.1 to 50.0% by mass, more preferably 1.0 to 30.0% by mass, based on the entire surface treatment agent. It may be 0% by weight, more preferably 5.0 to 25.0% by weight, particularly preferably 10.0 to 20.0% by weight.
- the content of the compound represented by the above formula (1) is preferably 0.001 to 30% by mass, more preferably 0.01 to 10% by mass, based on the entire surface treatment agent. It may be more preferably 0.05 to 5% by weight, particularly preferably 0.05 to 2% by weight.
- the surface treatment agent contains at least one of the silane compound of the present disclosure and a condensate in which at least a portion of the silane compound of the present disclosure is condensed.
- the content of the condensate may be preferably 40% by mass or less, more preferably 30% by mass or less, based on the total of the silane compound and the condensate.
- the content of the condensate can be determined, for example, from the abundance ratio of the peak position and area in GPC (gel permeation chromatography).
- the above-mentioned surface treatment agents include a solvent, a (non-reactive) silicone compound that can be understood as silicone oil (hereinafter referred to as "silicone oil”), an amine compound, alcohols, a catalyst, a surfactant, a polymerization inhibitor, and an additive. May contain sensitizers, etc.
- the surface treatment agent of the present disclosure includes a compound represented by R 90 —OH.
- R 90 is a monovalent organic group, preferably a C 1-20 alkyl group or a C 3-20 alkylene group, and these groups may be substituted with one or more substituents. Examples of the substituent include a hydroxyl group and -OR 91 (where R 91 is a C 1-10 alkyl group, preferably a C 1-3 alkyl group, such as a methyl group).
- the surface treatment agent of the present disclosure comprises R 71 OR 72 , R 73 n8 C 6 H 6-n8 , R 74 R 75 R 76 Si-(O-SiR 77 R 78 ) m8 -R 79 , and (OSiR 77 R 78 ) m9
- R 71 to R 79 are each independently a monovalent organic group having 1 to 10 carbon atoms
- m8 is an integer from 1 to 6
- m9 is an integer from 3 to 8
- n8 is an integer from 0 to 6.
- It may contain a solvent selected from the compounds represented by:
- the monovalent organic group having 1 to 10 carbon atoms may be linear or branched, and may further include a cyclic structure.
- the monovalent organic group having 1 to 10 carbon atoms may contain an oxygen atom, a nitrogen atom, or a halogen atom.
- the monovalent organic group having 1 to 10 carbon atoms does not contain a halogen atom.
- the monovalent organic group having 1 to 10 carbon atoms is a hydrocarbon group that may be substituted with halogen, preferably a hydrocarbon group that is not substituted with halogen.
- the hydrocarbon group is linear.
- the hydrocarbon group is a branched chain.
- the hydrocarbon group includes a cyclic structure.
- the solvent is R 71 OR 72 .
- R 71 and R 72 may each independently preferably be a hydrocarbon group having 1 to 8 carbon atoms, more preferably a C 1-6 alkyl group, or a C 5-8 cycloalkyl group.
- the solvent is R 73 n8 C 6 H 6-n8 .
- C 6 H 6-n8 is an n8-valent benzene ring. That is, R 73 n8 C 6 H 6-n8 is benzene substituted with n8 R 73s .
- R 73 can each independently be a halogen or a C 1-6 alkyl group optionally substituted with a halogen.
- n8 is preferably an integer of 1 to 3.
- the solvent is R 74 R 75 R 76 Si-(O-SiR 77 R 78 ) m8 -R 79 .
- the solvent is (OSiR 77 R 78 ) m9 .
- (OSiR 77 R 78 ) m9 is a cyclic siloxane formed by cyclically bonding a plurality of OSiR 77 R 78 units.
- R 74 to R 79 are each independently a hydrogen atom or a C 1-6 alkyl group, preferably a C 1-6 alkyl group, more preferably a C 1-3 alkyl group, and even more preferably a methyl group. It is.
- m8 is preferably an integer of 1 to 6, more preferably an integer of 1 to 5, and even more preferably 1 to 2.
- m9 is preferably an integer of 3 to 6, more preferably an integer of 3 to 5.
- the solvent includes, for example, aliphatic hydrocarbons such as hexane, cyclohexane, heptane, octane, nonane, decane, undecane, dodecane, mineral spirit; benzene, toluene, xylene, naphthalene, solvent naphtha, etc.
- Aromatic hydrocarbons methyl acetate, ethyl acetate, propyl acetate, n-butyl acetate, isopropyl acetate, isobutyl acetate, cellosolve acetate, propylene glycol methyl ether acetate, carbitol acetate, diethyl oxalate, ethyl pyruvate, ethyl- Esters such as 2-hydroxybutyrate, ethyl acetoacetate, amyl acetate, methyl lactate, ethyl lactate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 2-hydroxyisobutyrate, ethyl 2-hydroxyisobutyrate Ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, 2-hexanone, cyclohexanone, methyl aminoketone, 2-heptanone;
- glycol ethers examples include butylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, methanol, ethanol, iso-propanol, n-butanol, isobutanol, tert-butanol, sec-butanol, diethylene glycol monomethyl ether, hexamethyldisiloxane, Preferred are hexaethyldisiloxane, octamethyltrisiloxane, decamethyltetrasiloxane, dodecamethylpentasiloxane, tetradecamethylhexasiloxane, octamethylcyclotetrasiloxane, and octamethylcyclopentasiloxane.
- silicone oil is not particularly limited, for example, the following general formula (3a): R 1a -(SiR 3a 2 -O) a1 -SiR 3a 2 -R 1a ...(3a) [In the formula: R 1a is each independently a hydrogen atom or a hydrocarbon group, R 3a is each independently a hydrogen atom or a hydrocarbon group, a1 is 2 to 3000. ] Examples include compounds represented by:
- Each R 3a is independently a hydrogen atom or a hydrocarbon group. Such hydrocarbon groups may be substituted.
- R 3a are each independently preferably an unsubstituted hydrocarbon group or a hydrocarbon group substituted with a halogen atom.
- a halogen atom is preferably a fluorine atom.
- R 3a is each independently preferably a C 1-6 alkyl group or an aryl group which may be substituted with a halogen atom, more preferably a C 1-6 alkyl group or an aryl group.
- the C 1-6 alkyl group may be a straight chain or a branched chain, but is preferably a straight chain.
- the C 1-6 alkyl group is preferably a C 1-3 alkyl group, more preferably a methyl group.
- the above aryl group is preferably a phenyl group.
- each R 3a is independently a C 1-6 alkyl group, preferably a C 1-3 alkyl group, more preferably a methyl group.
- R 3a is a phenyl group.
- R 3a is a methyl group or a phenyl group, preferably a methyl group.
- R 1a each independently represents a hydrogen atom or a hydrocarbon group, and has the same meaning as R 3a .
- R 1a is each independently preferably a C 1-6 alkyl group or an aryl group which may be substituted with a halogen atom, more preferably a C 1-6 alkyl group or an aryl group.
- each R 1a is independently a C 1-6 alkyl group, preferably a C 1-3 alkyl group, more preferably a methyl group.
- R 1a is a phenyl group.
- R 1a is a methyl group or a phenyl group, preferably a methyl group.
- a1 is 2 to 1500.
- a1 is preferably 5 or more, more preferably 10 or more, even more preferably 15 or more, for example 30 or more, or may be 50 or more.
- a1 may be preferably 1000 or less, more preferably 500 or less, even more preferably 200 or less, even more preferably 150 or less, such as 100 or less, or 80 or less.
- a1 is preferably 5 to 1000, more preferably 10 to 500, even more preferably 15 to 200, even more preferably 15 to 150.
- silicone oils include the following (3b): R 1a -R S2 -R 3a ...(3b) [In the formula: R 1a is each independently a hydrocarbon group, R 3a is each independently a hydrocarbon group, R S2 has the same meaning as described in formula (2). ] Examples include compounds represented by:
- the above silicone oil may have an average molecular weight of 500 to 1,000,000, preferably 1,000 to 100,000.
- the molecular weight of silicone oil can be measured using GPC.
- the silicone oil for example, a linear or cyclic silicone oil in which a1 of -(SiR 3a 2 -O) a1 - is 30 or less can be used.
- the linear silicone oil may be a so-called straight silicone oil or a modified silicone oil.
- Straight silicone oils include dimethyl silicone oil, methylphenyl silicone oil, and methyl hydrogen silicone oil.
- the modified silicone oil include straight silicone oils modified with alkyl, aralkyl, polyether, higher fatty acid ester, fluoroalkyl, amino, epoxy, carboxyl, alcohol, and the like.
- Examples of the cyclic silicone oil include cyclic dimethylsiloxane oil.
- the silicone oil may be contained in an amount of, for example, 0 to 50% by mass, preferably 0.001 to 30% by mass, and more preferably 0.1 to 5% by mass, based on the surface treatment agent.
- the silicone oil is, for example, 0 to 300 parts by mass, preferably 0 to 300 parts by mass, based on a total of 100 parts by mass (in the case of two or more types, the total of these, the same applies hereinafter) of the silane compounds of the present disclosure. may be contained in an amount of 0 to 100 parts by weight, more preferably 0 to 50 parts by weight, even more preferably 0 to 10 parts by weight.
- Silicone oil contributes to improving the surface slipperiness of the surface treatment layer.
- Examples of the alcohols include methanol, ethanol, iso-propanol, n-butanol, isobutanol, tert-butanol, sec-butanol, 3-pentanol, octyl alcohol, 3-methyl-3-methoxybutanol, tert-butanol, Examples include amyl alcohol.
- the above-mentioned catalysts include acids (for example, acetic acid, hydrochloric acid, nitric acid, sulfuric acid, phosphoric acid, sulfonic acid, p-toluenesulfonic acid, trifluoroacetic acid, etc.), bases (for example, sodium hydroxide, potassium hydroxide, ammonia, triethylamine, diethylamine, etc.). ), transition metals (e.g.
- Examples of the aliphatic amine compound include diethylamine, triethylamine, and the like.
- Examples of the aromatic amine compound include aniline, pyridine, and the like.
- the transition metal is included as a transition metal compound represented by MR (wherein M is a transition metal atom and R is a hydrolyzable group).
- M is a transition metal atom and R is a hydrolyzable group.
- the above-mentioned hydrolyzable group means a group that can undergo a hydrolysis reaction, like the hydrolysable group related to the above-mentioned silane compound, that is, it means a group that can be detached from a transition metal atom by a hydrolysis reaction.
- the hydrolyzable group is -OR m , preferably methoxy or ethoxy.
- an alkoxy group as a hydrolyzable group, transition metal atoms can be contained in the surface treatment layer more efficiently, and the friction durability and chemical resistance of the surface treatment layer can be further improved.
- the hydrolyzable group may be the same as the hydrolyzable group contained in the silane compound described above.
- the hydrolyzable group may be different from the hydrolyzable group contained in the silane compound described above.
- the reactivity of hydrolysis can be controlled.
- the hydrolyzable group and the hydrolyzable group contained in the silane compound may be exchanged with each other in the surface treatment agent.
- the transition metal compound is Ta(OR m ) 5 (wherein R m is a substituted or unsubstituted C 1-4 alkyl group), preferably Ta(OCH 2 CH 3 ) 5 , or Si(OR m ) 1-m1 R m' m1 (wherein R m is a substituted or unsubstituted C 1-4 alkyl group, R m' is a C 1-4 alkyl group, m1 is 0 or 1), preferably tetraethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, tetraisopropoxysilane, dimethyldiethoxysilane, or dimethyldimethoxysilane.
- the above catalyst may be contained in an amount of, for example, 0.0002% by mass or more based on the entire surface treatment agent.
- the above-mentioned catalyst is preferably contained in an amount of 0.02% by mass or more, more preferably 0.04% by mass or more, based on the entire surface treatment agent.
- the above catalyst may be contained in an amount of, for example, 10% by mass or less, particularly 1% by mass or less, based on the entire surface treatment agent.
- the above-mentioned surface treatment agent can contribute to the formation of a more durable surface-treated layer when the above-mentioned catalyst is included in the above concentration.
- the content of the catalyst is preferably 0 to 10% by mass, more preferably 0 to 5% by mass, and particularly preferably 0 to 1% by mass based on the silane compound of the present disclosure.
- the catalyst promotes hydrolysis and dehydration condensation of the silane compound of the present disclosure, and promotes the formation of the layer formed by the surface treatment agent.
- other components include, for example, tetraethoxysilane, methyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, methyltriacetoxysilane, and the like.
- the surface treatment agent may contain trace amounts of impurities such as Pt, Rh, Ru, 1,3-divinyltetramethyldisiloxane, triphenylphosphine, NaCl, KCl, and a condensate of silane.
- impurities such as Pt, Rh, Ru, 1,3-divinyltetramethyldisiloxane, triphenylphosphine, NaCl, KCl, and a condensate of silane.
- the surface treatment agent is suitable for dry coating, preferably vacuum deposition.
- the surface treatment agent is for wet coating methods, preferably dip coating.
- the above-mentioned surface treatment agent can be made into pellets by impregnating a porous material such as a porous ceramic material or a cotton-like solidified material such as metal fibers such as steel wool.
- the pellets can be used, for example, in vacuum deposition.
- a layer of a surface treatment agent containing the compound represented by formula (1) is formed on the surface of a base material (glass), and this layer is post-treated as necessary. It can be manufactured by forming a layer from the disclosed surface treatment agent.
- the layer formation of the above-mentioned surface treatment agent can be carried out by applying the above-mentioned surface treatment agent to the surface of the base material so as to cover the surface.
- the coating method is not particularly limited. For example, wet coating methods and dry coating methods can be used.
- wet coating methods include dip coating, spin coating, flow coating, spray coating, roll coating, gravure coating, wipe coating, squeegee coating, die coating, inkjet, casting, Langmuir-Blodgett and similar methods. Can be mentioned.
- Examples of dry coating methods include vapor deposition (usually vacuum deposition), sputtering, CVD and similar methods.
- vapor deposition methods usually vacuum vapor deposition methods
- Specific examples of vapor deposition methods include resistance heating, electron beam, high frequency heating using microwaves, etc., ion beam, and similar methods.
- Examples of CVD methods include plasma-CVD, optical CVD, thermal CVD, and similar methods.
- the surface treatment agent can be diluted with a solvent before being applied to the substrate surface.
- the following solvents are preferably used: aliphatic hydrocarbons such as hexane, cyclohexane, heptane, octane, nonane, decane, undecane, dodecane, mineral spirit; Aromatic hydrocarbons such as benzene, toluene, xylene, naphthalene, and solvent naphtha; methyl acetate, ethyl acetate, propyl acetate, n-butyl acetate, isopropyl acetate, isobutyl acetate, cellosolve acetate, propylene glycol methyl ether acetate, carbide acetate Toll, diethyl oxalate, ethyl pyruvate, ethyl-2-hydroxybuty
- Glycol ethers methanol, ethanol, iso-propanol, n-butanol, isobutanol, tert-butanol, sec-butanol, 3-pentanol, octyl alcohol, 3-methyl-3-methoxybutanol, tert-amyl alcohol, etc.
- glycols such as ethylene glycol and propylene glycol
- cyclic ethers such as tetrahydrofuran, tetrahydropyran, and dioxane
- amides such as N,N-dimethylformamide, N,N-dimethylacetamide, and N-methylpyrrolidone
- methyl Ether alcohols such as cellosolve, cellosolve, isopropyl cellosolve, butyl cellosolve, diethylene glycol monomethyl ether; diethylene glycol monoethyl ether acetate
- polyfluoroaromatic hydrocarbons for example, 1,3-bis(trifluoromethyl)benzene
- polyfluoroaliphatic Hydrocarbons for example, C 6 F 13 CH 2 CH 3 (for example, Asahiklin (registered trademark) AC-6000 manufactured by Asahi Glass Co., Ltd.), 1,1,2,2,3,3,4-heptafluorocyclopentane (For example, Zeo
- ether alcohols such as cyclopentyl methyl ether; hexamethyldisiloxane, hexaethyldisiloxane, octamethyltrisiloxane, octamethylcyclotetrasiloxane, octamethylcyclopentasiloxane, decamethyltetrasiloxane, dodecamethyl Siloxanes such as pentasiloxane and tetradecamethylhexasiloxane.
- solvents can be used alone or as a mixture of two or more. Among them, glycol ethers, alcohols, ether alcohols, and siloxanes are preferred.
- propylene glycol monomethyl ether propylene glycol monoethyl ether, propylene glycol monobutyl ether, methanol, ethanol, iso-propanol, n-butanol, isobutanol, tert-butanol, sec-butanol, diethylene glycol monomethyl ether, hexamethyldisiloxane, Particularly preferred are hexaethyldisiloxane, octamethyltrisiloxane, decamethyltetrasiloxane, dodecamethylpentasiloxane, tetradecamethylhexasiloxane, octamethylcyclotetrasiloxane, and octamethylcyclopentasiloxane.
- the surface treatment agent of the present disclosure may be subjected to the dry coating method as is, or may be diluted with the above-mentioned solvent and then subjected to the dry coating method.
- the layer formation of the surface treatment agent is preferably performed such that the surface treatment agent of the present disclosure is present in the layer together with a catalyst for hydrolysis and dehydration condensation.
- the catalyst may be added to the diluted solution of the surface treatment agent of the present disclosure, after diluting the surface treatment agent of the present disclosure with a solvent, immediately before application to the substrate surface.
- the surface treatment agent of the present disclosure with a catalyst added thereto is directly vapor-deposited (usually by vacuum deposition), or the surface treatment agent of the present disclosure with a catalyst added is applied to a porous metal body such as iron or copper.
- a vapor deposition (usually vacuum vapor deposition) treatment may be performed using a pellet-like material impregnated with.
- the catalyst may include any suitable acid or base, transition metal (e.g. Ti, Ni, Sn, Zr, Al, B, etc.), sulfur-containing compound having a lone pair of electrons in its molecular structure, or nitrogen-containing compound (e.g. Sulfoxide compounds, aliphatic amine compounds, aromatic amine compounds, phosphoric acid amide compounds, amide compounds, urea compounds), etc. can be used.
- transition metal e.g. Ti, Ni, Sn, Zr, Al, B, etc.
- nitrogen-containing compound e.g. Sulfoxide compounds, aliphatic amine compounds, aromatic amine compounds, phosphoric acid amide compounds, amide compounds, urea compounds
- the acid catalyst for example, acetic acid, formic acid, trifluoroacetic acid, hydrochloric acid, nitric acid, sulfuric acid, phosphoric acid, sulfonic acid, methanesulfonic acid, p-toluenesulfonic acid,
- the base catalyst for example, ammonia, sodium hydroxide, potassium hydroxide, organic amines such as triethylamine, diethylamine, etc. can be used.
- organic amines such as triethylamine, diethylamine, etc.
- transition metal, aliphatic amine compound, and aromatic amine compound include those mentioned above.
- the intermediate layer containing silicon oxide described above can be formed by applying a silicon oxide precursor to the surface of the base material.
- the intermediate layer can be formed by applying a composition containing a silicon oxide precursor and an alkali metal source to the surface of the substrate.
- Examples of the silicon oxide precursor include silicic acid, a partial condensate of silicic acid, an alkali metal silicate, a silane compound having a hydrolyzable group bonded to a silicon atom, and a partially hydrolyzed condensate of the silane compound. It will be done. Silicic acid and its partial condensates can be dehydrated and condensed to form silicon oxide, and alkali metal silicates can be converted to silicic acid and its partial condensates by using acids and cation exchange resins. can be dehydrated and condensed to form silicon oxide. Examples of the hydrolyzable group in a silane compound having a hydrolyzable group bonded to a silicon atom include an alkoxy group and a chlorine atom.
- the hydrolyzable group of the silane compound can be hydrolyzed to form a hydroxyl group, and the resulting silanol compound can be dehydrated and condensed to form silicon oxide.
- Examples of the silane compound having a hydrolyzable group bonded to a silicon atom include alkoxysilanes such as tetraalkoxysilane and alkyltrialkoxysilane, and tetrachlorosilane.
- alkali metal source examples include alkali metal hydroxides, water-soluble alkali metal salts, and the like.
- water-soluble alkali metal salts include alkali metal carbonates, alkali metal hydrogen carbonates, alkali metal hydrochlorides, alkali metal nitrates, and the like.
- alkali metal source alkali metal hydroxides and alkali metal carbonates are preferred.
- the alkali metal silicate can be used as a silicon oxide precursor and an alkali metal source.
- Alkali metal silicate can be converted into silicon oxide via silicic acid, but in this case, a small amount of alkali metal may remain in the produced silicon oxide. Therefore, silicon oxide containing a predetermined amount of alkali metal atoms can be obtained by adjusting the amount of remaining alkali metal atoms.
- Synthesis example 5 After mixing 5.13 g of stearic acid chloride, 5.7 mL of toluene, and 2.60 g of 2allyl-pent-4-enylamine, the mixture was stirred at room temperature overnight. Thereafter, the mixture was diluted with chloroform, washed with 3N hydrochloric acid, and concentrated under reduced pressure to obtain 3.98 g of Intermediate A.
- Synthesis example 6 3.98 g of Intermediate A, 50 mL of toluene, 0.30 mL of pyridine, 2.3 mL of a xylene solution containing 2% Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane, After each addition, 23 mL of trimethoxysilane was added, and the mixture was stirred at room temperature overnight. Thereafter, by purification, Compound 5 (8.55 g) having a trimethoxysilyl group at the end was obtained.
- Decyltrichlorosilane, octyltriethoxysilane, decyltriethoxysilane, dodecyltriethoxysilane, octadecyltriethoxysilane, tetraethyl orthosilicate, and the solvents hexamethyldisiloxane, ethanol, and ethyl acetate used in the examples were manufactured by Tokyo Chemical Industry Co., Ltd. Purchased and used from.
- sodium hydroxide manufactured by Fuji Film Wako Pure Chemical Industries, Ltd.
- Example 1 Surface treatment agent 1 was vacuum-deposited on chemically strengthened glass (Gorilla Glass, manufactured by Corning, thickness 0.7 mm). Specifically, a molybdenum boat in the vacuum evaporation apparatus was filled with 0.1 g of the surface treatment agent, and the inside of the vacuum evaporation apparatus was evacuated to a pressure of 3.0 ⁇ 10 ⁇ 3 Pa or less. Thereafter, a silicon dioxide film containing Na with a thickness of 7 nm was formed by vapor deposition using the molded body 1 using an electron beam evaporation method, and then a surface treatment layer was formed by heating the boat using a resistance heating method. . Thereafter, a surface treatment layer was obtained by performing a heat treatment in an oven at 150° C. for 2 hours.
- chemically strengthened glass Gorilla Glass, manufactured by Corning, thickness 0.7 mm.
- Example 2 A surface treated layer was obtained in the same manner as in Example 1 except that the surface treatment agent was changed to Surface Treatment Agent 2.
- Example 3 A surface treated layer was obtained in the same manner as in Example 1 except that the surface treatment agent was changed to Surface Treatment Agent 3.
- Example 4 Surface treatment agent 4 was spin-coated onto chemically strengthened glass (Corning Corporation, Gorilla Glass, thickness 0.7 mm). Specifically, a base material on which a silicon dioxide film was formed by vapor depositing silicon dioxide to a thickness of 7 nm in a vacuum evaporation apparatus was subjected to UV ozone treatment for 10 minutes to make it hydrophilic, and then surface treatment agent 4 was applied. Spin coating was performed at 3000 rpm for 30 seconds. Thereafter, a surface treatment layer was obtained by performing a heat treatment in an oven at 150° C. for 2 hours.
- chemically strengthened glass Corning Corporation, Gorilla Glass, thickness 0.7 mm.
- Example 5 A surface treated layer was obtained in the same manner as in Example 4 except that the surface treatment agent was changed to Surface Treatment Agent 5.
- Example 6 A surface treated layer was obtained in the same manner as in Example 1 except that the surface treatment agent was changed to surface treatment agent 6.
- Example 7 A surface treated layer was obtained in the same manner as in Example 4 except that the surface treatment agent was changed to Surface Treatment Agent 7.
- Example 8 A surface treated layer was obtained in the same manner as in Example 1 except that the surface treatment agent was changed to Surface Treatment Agent 11.
- Example 9 A surface treated layer was obtained in the same manner as in Example 1 except that the surface treatment agent was changed to Surface Treatment Agent 12.
- Example 10 A surface treated layer was obtained in the same manner as in Example 4 except that the surface treatment agent was changed to Surface Treatment Agent 13.
- Comparative example 1 A surface treated layer was obtained in the same manner as in Example 4 except that the surface treatment agent was changed to Surface Treatment Agent 8.
- Comparative example 2 Surface treatment agent 9 was prepared by blending and uniformly mixing 3 parts by mass of decyltrichlorosilane (C 10 H 21 SiCl 3 ) and 97 parts by mass of isooctane (boiling point 99° C.). Next, a tissue paper is impregnated with the surface treatment agent 9, and then a chemically strengthened glass (Gorilla Glass, manufactured by Corning Inc., thickness 0.7 mm) is rubbed with the tissue paper, and the surface treatment agent 9 is applied to the surface of the glass plate. was applied. Subsequently, after 5 minutes had passed, the surface of the glass plate was wiped with a clean towel. Thereafter, the glass plate was left at room temperature for 30 minutes. Thereafter, the surface of the glass plate was washed with a sponge impregnated with pure water, and then rinsed with 1000 g of water to make the glass plate water repellent.
- a tissue paper is impregnated with the surface treatment agent 9
- a chemically strengthened glass Gorilla Glass
- Comparative example 3 2.8 parts by mass (0.01 parts by mole) of octyltriethoxysilane, 41.7 parts by mass (0.20 parts by mole) of tetraethyl orthosilicate (tetraethoxysilane), and 84 parts by mass of ethanol as a solvent (C). , and 60 parts by mass of hydrochloric acid (0.01 mol/L aqueous solution) as a catalyst were mixed and stirred at room temperature for 24 hours to obtain surface treatment agent 10.
- the obtained surface treatment agent 10 was spin-coated onto chemically strengthened glass (Corning Corporation, Gorilla Glass, thickness 0.7 mm) using a spin coater at a rotation speed of 3000 rpm for 20 seconds, and then dried to form a coating film. Obtained.
- ⁇ Ink wiping test> After forming the surface treatment layer, the surface was wiped off to obtain an evaluation sample. After drawing a line on the surface layer of the evaluation sample with an oil-based felt-tip pen (Mackie Extra Thick Black, product name, manufactured by Zebra), a line was drawn on the surface layer of the evaluation sample using a Kimwipe as an abrasion element at a moving speed of 70 rpm and a load of 500 g/3 cm2 . After being worn twice, the adhesion state of the oil-based ink (line) was visually observed, and the ink removability (initial ink removability) was evaluated according to the following criteria. ⁇ (Excellent): Removal rate of oil-based ink is 90% or more. ⁇ (Good): The oil-based ink removal rate is 60% or more and less than 90%. ⁇ (Poor): The oil-based ink removal rate is less than 60%.
- ⁇ Film thickness measurement> After forming the surface treatment layer, the surface was wiped off to obtain an evaluation sample. The evaluation sample was sent to J. A. Using a Woollam M-2000D ellipsometer, the film thickness was measured at three angles of incidence: 50°, 60°, and 70°.
- the article of the present disclosure can be suitably used for a variety of purposes.
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Abstract
La présente invention concerne un article qui comprend un élément en verre et une couche de traitement de surface qui est formée d'un composé représenté par la formule (1). (Dans la formule, R1 représente un groupe alkyle en C11-36 linéaire ; X 1 représente une liaison simple ou un groupe divalent qui comprend-CO-, -COO-, -NR2-, -CONR2-, -OCONR2-, -NR2-CO-NR2-, -O-ou-S - ; R2 représente un atome d'hydrogène ou un groupe alkyle en C1-6 ; et RSi représente un groupe monovalent qui comprend un atome de Si auquel un groupe hydroxyle ou un groupe hydrolysable est lié.)
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JP2008222515A (ja) * | 2007-03-14 | 2008-09-25 | Nippon Sheet Glass Co Ltd | 撥水性被膜の形成方法及び撥水性被膜被覆物品 |
CN103087086A (zh) * | 2013-01-15 | 2013-05-08 | 中国科学院化学研究所 | 有机-无机杂化分子及其制备方法与在制备超疏水涂层中的应用 |
JP2013525529A (ja) * | 2010-04-23 | 2013-06-20 | ワッカー ケミー アクチエンゲゼルシャフト | 表面シールのためのコーティング組成物 |
WO2015146103A1 (fr) * | 2014-03-26 | 2015-10-01 | 日本曹達株式会社 | Solution pour formation de membrane organique, et procédé de formation de membrane organique mettant en œuvre celle-ci |
KR20170028205A (ko) * | 2015-09-03 | 2017-03-13 | (주)켐이 | 포토레지스트용 접착증진제 및 이를 포함하는 감광성 수지 조성물 |
WO2019020770A1 (fr) * | 2017-07-27 | 2019-01-31 | Ditecpesa, S.A. | Composés et compositions d'organosilicium |
JP2019116097A (ja) * | 2017-06-21 | 2019-07-18 | Agc株式会社 | 撥水撥油層付き物品およびその製造方法 |
US20200385531A1 (en) * | 2017-09-22 | 2020-12-10 | 3M Innovative Properties Company | Silsesquioxane polymers, compositions, methods, and articles |
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2023
- 2023-08-10 JP JP2023130956A patent/JP2024025759A/ja active Pending
- 2023-08-10 TW TW112130172A patent/TW202423685A/zh unknown
- 2023-08-10 WO PCT/JP2023/029318 patent/WO2024034670A1/fr unknown
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Publication number | Priority date | Publication date | Assignee | Title |
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JPS6475567A (en) * | 1987-09-18 | 1989-03-22 | Kanegafuchi Chemical Ind | Cold curing polymer composition |
JP2007522476A (ja) * | 2004-02-12 | 2007-08-09 | バリアン・インコーポレイテッド | クロマトグラフ分離のための極性修飾結合相材料 |
JP2008222515A (ja) * | 2007-03-14 | 2008-09-25 | Nippon Sheet Glass Co Ltd | 撥水性被膜の形成方法及び撥水性被膜被覆物品 |
JP2013525529A (ja) * | 2010-04-23 | 2013-06-20 | ワッカー ケミー アクチエンゲゼルシャフト | 表面シールのためのコーティング組成物 |
CN103087086A (zh) * | 2013-01-15 | 2013-05-08 | 中国科学院化学研究所 | 有机-无机杂化分子及其制备方法与在制备超疏水涂层中的应用 |
WO2015146103A1 (fr) * | 2014-03-26 | 2015-10-01 | 日本曹達株式会社 | Solution pour formation de membrane organique, et procédé de formation de membrane organique mettant en œuvre celle-ci |
KR20170028205A (ko) * | 2015-09-03 | 2017-03-13 | (주)켐이 | 포토레지스트용 접착증진제 및 이를 포함하는 감광성 수지 조성물 |
JP2019116097A (ja) * | 2017-06-21 | 2019-07-18 | Agc株式会社 | 撥水撥油層付き物品およびその製造方法 |
WO2019020770A1 (fr) * | 2017-07-27 | 2019-01-31 | Ditecpesa, S.A. | Composés et compositions d'organosilicium |
US20200385531A1 (en) * | 2017-09-22 | 2020-12-10 | 3M Innovative Properties Company | Silsesquioxane polymers, compositions, methods, and articles |
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