WO2024032023A1 - Package structure and preparation method therefor - Google Patents
Package structure and preparation method therefor Download PDFInfo
- Publication number
- WO2024032023A1 WO2024032023A1 PCT/CN2023/089746 CN2023089746W WO2024032023A1 WO 2024032023 A1 WO2024032023 A1 WO 2024032023A1 CN 2023089746 W CN2023089746 W CN 2023089746W WO 2024032023 A1 WO2024032023 A1 WO 2024032023A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- chip
- pad
- substrate
- stacked
- group
- Prior art date
Links
- 238000002360 preparation method Methods 0.000 title abstract description 7
- 239000000758 substrate Substances 0.000 claims abstract description 161
- 238000004806 packaging method and process Methods 0.000 claims description 88
- 239000010410 layer Substances 0.000 claims description 69
- 230000008054 signal transmission Effects 0.000 claims description 52
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 claims description 42
- 238000000034 method Methods 0.000 claims description 17
- 239000012790 adhesive layer Substances 0.000 claims description 12
- 238000005520 cutting process Methods 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 230000000149 penetrating effect Effects 0.000 abstract 1
- 229910000679 solder Inorganic materials 0.000 description 19
- 239000004065 semiconductor Substances 0.000 description 13
- 238000005516 engineering process Methods 0.000 description 10
- 239000000463 material Substances 0.000 description 8
- 230000005540 biological transmission Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 5
- 239000007769 metal material Substances 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000003292 glue Substances 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 230000010354 integration Effects 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 229910052721 tungsten Inorganic materials 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76877—Filling of holes, grooves or trenches, e.g. vias, with conductive material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76895—Local interconnects; Local pads, as exemplified by patent document EP0896365
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
- H01L23/13—Mountings, e.g. non-detachable insulating substrates characterised by the shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/535—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including internal interconnections, e.g. cross-under constructions
Definitions
- the present disclosure relates to the field of integrated circuit technology, and in particular to a packaging structure and a preparation method thereof.
- Three-dimensional stacking technology stacks chips in the vertical direction. Each vertically stacked chip is connected to the first substrate pad on the packaging substrate through wires.
- a packaging structure and a preparation method thereof are provided.
- a packaging structure including:
- the packaging substrate has a groove inside and includes a first substrate pad
- a stacked chipset, placed in the groove includes:
- the first chip includes a first chip bonding pad and a first contact pad.
- the first contact pad and the first chip bonding pad are respectively located on opposite sides of the first chip, and the first contact pad is the signal transmission end of the first chip, the first chip is provided with a first through hole, the first through hole is connected to the first contact pad, and the first through hole is filled with a first conductive An interconnection structure, the first conductive interconnection structure is electrically connected to the first chip pad;
- the second chip includes a second contact pad.
- the second contact pad is located on a side of the second chip close to the first chip and is bonded to the first contact pad.
- the second contact pad is The signal transmission end of the second chip;
- the first contact pad is located on the front side of the first chip, and the second contact pad is located on the front side of the second chip.
- the first chip pad covers the first via.
- the first chip also includes a first dielectric layer, the first dielectric layer and the first contact pad are located on the same side of the first chip,
- the second chip further includes a second dielectric layer, the first dielectric layer and the second contact pad are located on the same side of the second chip;
- the first dielectric layer is bonded to the second dielectric layer while the first contact pad is bonded to the second contact pad.
- the packaging substrate is further provided with wiring holes inside, and the wiring holes are located below the groove and connected with the groove.
- the stacked chip set includes a stacked first stacked stack and a second stacked stack, and the second chip of the first stacked stack is connected to the second chip of the second stacked stack. , and the first chip of the second laminate group is bonded to the bottom of the groove;
- the first substrate pad includes a first pad and a second pad, the first pad is located on the front side of the packaging substrate, and the second pad is located on the back side of the packaging substrate;
- the lead wires include a first lead wire and a second lead wire.
- the first lead wire connects the first bonding pad and the first chip pad of the first stacked group.
- the second lead wire passes through the lead wire.
- the wire hole connects the second bonding pad and the first chip bonding pad of the second stacked group.
- the packaging structure includes an adhesive layer, the second chip of the first stacked group is located on one side of the adhesive layer, and the second chip of the second stacked group The chip is located on the other side of the adhesive layer.
- the packaging substrate further includes a second substrate pad and a substrate through hole.
- the second substrate pad is located on the back side of the packaging substrate and is connected to the first solder pad through the substrate through hole. disk connection.
- the length of the second lead is greater than the length of the first lead.
- a conductive layer is provided inside the packaging substrate.
- the conductive layer includes a first conductive part and a second conductive part.
- the first conductive part is connected to the first pad through an interconnection hole located above it.
- the third conductive part is connected to the first pad through an interconnection hole located above it.
- the two conductive parts are connected to the second pad through interconnect holes located below them.
- the distance between the conductive layer and the front side of the packaging substrate is a first distance
- the distance between the conductive layer and the back side of the packaging substrate is a second distance
- the first distance is equal to the second distance
- the length of the second lead is equal to the length of the first lead.
- the stacked chip set includes a first stacked stack group and a third stacked stacked group, and the first chip pad of the first stacked stack group and the first stacked stacked panel of the third stacked stacked group are chip pad bonding;
- the lead wire connects the first substrate pad and the first chip pad of the first stack group.
- the first chip is further provided with a third dielectric layer on the side provided with the first chip pad, and the third dielectric layer of the first stacked group is Three dielectric layers are bonded to the third dielectric layer of the third stacked layer group.
- the packaging structure further includes a packaging layer covering the stacked chipset and the wiring.
- a method for preparing a packaging structure including:
- a first wafer, a second wafer and a packaging substrate are provided.
- the first wafer includes a plurality of first chips.
- a first contact pad is provided on one side of the first chip.
- the second wafer includes a plurality of second chips.
- the second A second contact pad is provided on one side of the chip, a groove is provided inside the packaging substrate, and includes a first substrate pad;
- the first wafer and the second wafer are bonded through the first contact pad and the second contact pad, and a first through hole is formed in the first chip, and the first through hole is formed in the first chip.
- a first conductive interconnect structure is formed in the through hole, and a first chip pad is formed on the other side of the first chip. The first through hole is connected to the first contact pad, and the first chip pad is electrically connected. the first conductive interconnect structure;
- the first substrate pad and the first chip pad are connected by wire bonding.
- the packaging substrate is also provided with wiring holes inside, the wiring holes are located below the groove and communicate with the groove, and the stacked chip set includes a first stacked set. And a second stacked group, the first substrate pad includes a first pad and a second pad, and the lead wire includes a first lead and a second lead;
- the method further includes:
- the step of placing the stacked chipset in the groove includes:
- the method of connecting the first substrate pad and the first chip pad by wiring includes:
- the second bonding pad is connected to the first chip bonding pad of the second stacked group by passing the second lead wire through the wiring hole.
- the stacked chipset includes a first stacked group and a third stacked group
- the method further includes:
- the method of connecting the first substrate pad and the first chip pad by wiring includes:
- the first substrate pad and the first chip pad of the first stacked group are connected by wire bonding.
- Figures 1 to 6 are structural schematic diagrams of packaging structures provided in different embodiments
- Figure 7 is a schematic view of the back of the first pad provided in an embodiment
- Figure 8 is a schematic diagram of the preparation process of the packaging structure provided in an embodiment
- Figure 9 is a schematic structural diagram of a packaging substrate provided in an embodiment
- Figure 10 is a schematic diagram of the bonding of the first wafer and the second wafer in an embodiment
- FIG. 11 is a schematic diagram of cutting the first wafer and the second wafer bonded together in one embodiment.
- first, second, third, etc. may be used to describe various elements, components, regions, layers, doping types and/or sections, these elements, components, regions, layers, doping types and/or Sections should not be limited by these terms. These terms are only used to distinguish one element, component, region, layer, doping type or section from another element, component, region, layer, doping type or section. Thus, a first element, component, region, layer, doping type or section discussed below could be termed a second element, component, region, layer or section without departing from the teachings of the present disclosure.
- Spatial relational terms such as “under”, “under”, “under”, “under”, “on”, “above”, etc., in This may be used to describe the relationship of one element or feature to other elements or features shown in the figures. It will be understood that the spatially relative terms encompass different orientations of the device in use and operation in addition to the orientation depicted in the figures. For example, if the device in the figures is turned over, elements or features described as “below” or “under” or “beneath” other elements or features would then be oriented “above” the other elements or features. Thus, the exemplary terms “below” and “under” may include both upper and lower orientations. Additionally, the device may be otherwise oriented (eg, rotated 90 degrees or at other orientations) and the spatial descriptors used herein interpreted accordingly.
- connection in the following embodiments should be understood as “electrical connection” if there is transmission of electrical signals or data between the connected objects.
- Embodiments of the present disclosure should not be limited to the specific shapes illustrated in the drawings of the specification but include deviations in shapes due to, for example, manufacturing techniques.
- a packaging structure including a packaging substrate 100 , a stacked chipset 200 and leads 300 .
- the packaging substrate 100 may include, but is not limited to, a ceramic substrate. For example, it may also be a glass substrate or the like.
- the package substrate 100 is provided with a groove 100a inside.
- the groove 100a may be formed by machining the package substrate 100.
- the package substrate 100 includes a first substrate pad 110 .
- the first substrate pad 110 is used for wire bonding with the chips in the stacked chipset 200 .
- the stacked chipset 200 is placed in the groove 100a, and may include a plurality of stacked chips. As an example, some chips in the stacked chipset 200 may be located inside the groove 100a. Of course, it is also possible to arrange that all chips in the stacked chipset 200 are located inside the groove 100a. The comparison here is not limited. The arrangement form of each chip in the laminated chip set 200 in the groove can be adjusted according to actual needs.
- the stacked chipset 200 includes a first chip 210 and a second chip 220 .
- the first chip 210 and the second chip 220 are bonded together.
- the first chip 210 includes a first chip pad 211 and a first contact pad 212 .
- the first chip pad 211 is used for wire connection with the packaging substrate 100 .
- the first contact pad 212 is used for bonding with the second chip 220 .
- the first contact pad 212 and the first chip pad 211 are respectively located on opposite sides of the first chip 210 .
- the first chip 210 is also provided with a first through hole 210a.
- the first through hole 210a may be a through silicon via.
- the first through hole 210a is connected to the first contact pad 212. Moreover, the first through hole 210a fills the first conductive interconnection structure 213, so that the first conductive interconnection structure 213 and the first contact pad 212 are in contact and conductive. At the same time, the first conductive interconnection structure 213 is electrically connected to the first chip pad 211, so that the signal on the first chip pad 211 can be transmitted to the first contact pad 212, or the signal on the first contact pad 212 can be transmitted to on the first chip pad 211.
- a plurality of first through holes 210a can be provided on the first chip 210, so that various signals (such as input and output signals of the chip, control signals, etc.) can be transmitted.
- two rows of multiple first through holes 210a are provided.
- the figure shows that in addition to the two first through holes 210a located on the same cross-section, the two first through holes 210a may be located in two rows of first through holes 210a respectively.
- the first chip pad 211 may cover the first through hole 210a, so that the first chip pad 211 and the first conductive interconnection structure 213 may be directly connected.
- the first chip pad 211 and the first conductive interconnection structure 213 can also be connected through other conductive lines, which is not limited here.
- the materials of the first chip pad 211, the first contact pad 212 and the first conductive interconnection structure 213 may include metal materials, such as Au, Ni, W, Cu, Al, etc. Among them, the materials of any two materials may be the same or different, and the comparison is not limited here.
- the second chip 220 includes second contact pads 221 .
- the material of the second contact pad 221 may also include a metal material, which may be the same as the material of the first contact pad 212 or may be different.
- the second contact pad 221 is located on a side of the second chip 220 close to the first chip 210 and is bonded to the first contact pad 212 .
- the second contact pad 221 and the first contact pad 212 may be directly bonded, or may be bonded through bumps formed of solder or the like (not shown).
- bumps can be formed on the second contact pad 221 before bonding, bumps can also be formed on the first contact pad 212, or bumps can be formed between the second contact pad 221 and the first contact pad 212.
- Bumps are formed on the pads 212 .
- the first chip 210 may also include a first dielectric layer 214 , and the first dielectric layer 214 and the first contact pad 212 are located on the same surface of the first chip 210 .
- the second chip 220 may further include a second dielectric layer 222 , and the second dielectric layer 222 and the second contact pad 221 are located on the same surface of the second chip 220 . While the first contact pad 212 and the second contact pad 221 are bonded, the first dielectric layer 214 can be bonded with the second dielectric layer 222, so that the first chip 210 and the second chip 220 are reliably connected and stacked.
- the first chip 210 and the second chip 220 are connected together, and on the other hand, the first contact pad 212 and the second contact pad 221 are conductively connected. Therefore, the signal on the first chip pad 211 can be transmitted to the second contact pad 221 , or the signal on the second contact pad 221 can be transmitted to the first chip pad 211 .
- the first contact pad 212 can be used as a signal transmission end of the first chip 210
- the second contact pad 221 can be used as a signal transmission end of the second chip 220 . Therefore, the first chip pad 211 can transmit signals with the first chip 210 and the second chip 220 at the same time.
- the number of the first contact pads 212 may be multiple, and the first contact pads 212 serving as the signal transmission end of the first chip 210 may be part of the first contact pads 212 therein. And the first through holes 210a are connected to the first contact pads 212 serving as signal transmission ends. The other part of the first contact pads 212 may be used only for bonding. Of course, in some embodiments, the first contact pad 212 which is only used for bonding may not be provided. At this time, all first contact pads 212 serve as signal transmission terminals.
- the number of second contact pads 221 may be multiple, and the second contact pads 221 serving as the signal transmission end of the second chip 220 may be part of the second contact pads 221 therein.
- the other part of the second contact pads 221 may be used only for bonding.
- the second contact pad 221 which is only used for bonding may not be provided.
- all the second contact pads 221 serve as signal transmission terminals.
- the lead wire 300 may be a gold wire, for example.
- the lead wire 300 connects the first substrate pad 110 and the first chip pad 211 .
- the first substrate pad 110 can be connected to the first chip 210 through the lead wire 300, the first chip pad 211, the first conductive interconnection structure 213 in the first through hole 210a, and the first contact pad 212 in sequence. signal transmission between. Furthermore, the first substrate pad 110 may be connected to the first substrate pad 110 by sequentially connecting the leads 300, the first chip pad 211, the first conductive interconnection structure 213 in the first through hole 210a, the first contact pad 212, and the second contact pad 221. Signal transmission is performed between the second chips 220 .
- the first chip 210 and the second chip 220 can be connected to the same first substrate pad 110 of the same signal channel, and the first substrate pad 110 is connected to the first chip 210 and the second chip 220
- the length of the signal transmission path between them is basically the same, which can effectively improve the time delay problem.
- the first chip pad 211 on the first chip 210 and the first chip pad 211 on the packaging substrate 100 can be effectively reduced.
- the length of the lead wire 300 connecting the first chip pad 211 and the first substrate pad 110 The degree can be effectively reduced, thereby reducing the length of the signal transmission path between the first substrate pad 110 and the first chip 210 and the second chip 220 connected thereto, thereby effectively reducing the resistance in the signal transmission path.
- the first contact pad 212 is located on the front side of the first chip 210
- the second contact pad 221 is located on the front side of the second chip 220 .
- conductive circuits may also be provided on the front side of the first chip 210, and the conductive circuits are connected to semiconductor devices (such as memory cells) in the first chip 210 for signal transmission therewith.
- Conductive circuits may also be provided on the front side of the second chip 220, and the conductive circuits are connected to the semiconductor devices (such as memory cells) in the second chip 220 for signal transmission therewith.
- Disposing the first contact pad 212 on the front surface of the first chip 210 and the second contact pad 221 on the front surface of the second chip 220 can ensure the signal reception or output of the semiconductor devices in the first chip 210 and the second chip 220 .
- the transmission times of the signals are consistent.
- the first contact pad 212 is disposed on the front side of the first chip 210, so that external signals can be quickly transmitted to the semiconductor device in the first chip 210 through the first substrate pad 110.
- the semiconductor device in the first chip 210 can Signals can also be quickly transmitted to the outside, thus effectively reducing the length of the signal transmission path.
- the second contact pad 221 is disposed on the front surface of the second chip 220, which allows external signals to be quickly transmitted to the semiconductor device in the second chip 220 via the first substrate pad 110.
- the semiconductor device in the second chip 220 The signal can also be quickly transmitted to the outside, so the length of the signal transmission path can be effectively reduced.
- the arrangement forms of the first contact pad 212 and the second contact pad 221 may also be different.
- the first contact pad 212 can also be disposed on the back of the first chip 210 , and the second contact pad 221 can be disposed on the back of the second chip 220 .
- the first chip bonding pad 211 is provided on the front side of the first chip 210 .
- the signal on the first chip pad 211 can be transmitted from the first through hole 210a to the first contact pad 212 connected thereto.
- the first contact pad 212 can be connected to another first contact pad 212 by providing conductive traces on the back of the first chip 210 .
- the first chip 210 and the second chip 220 may form second through holes 20b on both sides of the other first contact pad 212, and through the second through holes 20b, signals can be led to the first chip 210 and the second chip 220.
- the front side of chip 220 At this time, it can also be ensured that the transmission time of the received signal or the output signal of the semiconductor devices in the first chip 210 and the second chip 220 is consistent.
- the first contact pad 212 can also be provided on the back side of the first chip 210
- the second contact pad 221 can be provided on the front side of the second chip 220 .
- the first chip bonding pad 211 is disposed on the front side of the first chip 210, so that signals can be directly transmitted to the semiconductor device in the first chip 210 through the conductive lines on the front side.
- the first chip pad 211 can perform signal transmission with the semiconductor device in the second chip 220 through the first conductive interconnection structure 213, the first contact pad 212, and the second contact pad 221 in the first through hole 210a.
- the signal transmission path of the second chip 220 mainly includes the first conductive interconnection structure 213 in the first through hole 210a.
- the chip thickness is relatively thin, which is much smaller than the length of the lead wire. That is, the length of the first through hole 210a is much shorter than the length of the lead wire. Therefore, the first conductive interconnection structure 213 in the first through hole 210a has less influence on transmission signal transmission. Therefore, at this time, the signals of the first chip 210 and the second chip 220 Transmission time consistency will also be improved relative to traditional technology.
- the first contact pad 212 is located on the front side of the first chip 210 and the second contact pad 221 is located on the back side of the second chip 220 .
- the first chip bonding pad 211 is provided on the back side of the first chip 210, and can communicate with the semiconductor in the first chip 210 through the first conductive interconnection structure 213 and the first contact pad 212 in the first through hole 210a. device for signal transmission.
- a second through hole 20b may be provided in the second chip 220 to be connected to the second contact pad 221 and form a second conductive interconnection structure with the second through hole.
- the first chip pad 211 can pass through the first conductive interconnection structure 213 in the first through hole 210a, the first contact pad 212, the second contact pad 221, and the second conductive interconnection in the second through hole 20b. structure to perform signal transmission with the semiconductor device in the second chip 220 .
- the second conductive interconnection structure in the second through hole is mainly added to the signal transmission path of the second chip 220 .
- the chip thickness is relatively thin, which is much smaller than the length of the lead wire. That is, the length of the second through hole is much shorter than the length of the lead wire. Therefore, the second conductive interconnection structure in the second through hole has less influence on transmission signal transmission. Therefore, at this time, the signal transmission time consistency between the first chip 210 and the second chip 220 will also be improved compared to the traditional technology.
- the packaging substrate 100 is also provided with wiring holes 100b inside, and the wiring holes 100b are located below the groove 100a and connected with the groove 100a.
- both sides of the packaging substrate 100 can be connected by wire bonding, thereby making the wire bonding more flexible.
- the stacked chipset 200 includes a first stacked group 200a and a second stacked group 200b arranged in a stack.
- the first chip 210 of the second lamination group 200b is bonded to the bottom of the groove 100a.
- the first chip 210 of the second stack group 200b can be bonded to the bottom of the groove 100a through conductive glue.
- Conductive adhesive contains silver components, which are good conductors of heat and have good heat dissipation properties. Therefore, at this time, while connecting the first chip 210 of the second stacked group 200b and the packaging substrate 100, the heat dissipation performance can also be taken into consideration.
- the first chip 210 of the second stacked group 200b can also be bonded to the bottom of the groove 100a through non-conductive glue, which is not limited here.
- the second chip 220 of the first stacked group 200a is connected to the second chip 220 of the second stacked group 200b, so that the first stacked group 200a and the second stacked group 200b are stacked together.
- the packaging structure may be provided to include an adhesive layer 400 .
- the adhesive layer may be a DAF (Die attach film) layer.
- the second chip 220 of the first laminated group 200a is located on one side of the adhesive layer 400, and the second chip 220 of the second laminated group 200b is located on the other side of the adhesive layer 400.
- the first laminate group 200a and the second laminate group 200b can be reliably connected through the adhesive layer 400.
- the first laminate group 200a and the second laminate group 200b can also be connected through other methods (such as bonding methods). This is not limited here.
- the first stacked group 200a and the second stacked group 200b can be connected to different substrate pads of different signal channels.
- the first substrate pad 110 includes a first pad 111 and a second pad 112 .
- the first pad 111 is located on the front side of the package substrate 100 to provide signals to the chips in the first stack group 200a or to receive signals on the chips in the first stack group 200a.
- the second pad 112 is located on the back side of the package substrate 100 to provide signals to the chips in the second stack group 200b or to receive signals on the chips in the second stack group 200b.
- the first substrate pad 110 may include a plurality of first pads 111 and a corresponding plurality of second pads 112 .
- the plurality of first bonding pads 111 can transmit multiple different signals, and each first bonding pad 111 independently transmits a signal.
- the same signal transmitted through the same first pad 111 can be provided to the first chip 210 and the second chip 220 in the first stack group 200a at the same time.
- the plurality of second bonding pads 112 may transmit a plurality of different signals, with each first bonding pad 112 independently transmitting a signal.
- the same signal transmitted through the same second pad 112 can be provided to the first chip 210 and the second chip 220 in the second stack group 200b at the same time.
- the lead wire 300 includes a first lead wire 310 and a second lead wire 320 .
- the first lead 310 connects the first bonding pad 111 to the first chip bonding pad 211 of the first stacked group 200a, thereby realizing signal transmission between the first bonding pad 111 and the chips in the first stacked group 200a.
- the second lead 320 passes through the wiring hole 100b to connect the second bonding pad 112 and the first chip bonding pad 211 of the second stacked group 200b, thereby realizing the connection between the second bonding pad 112 and the chip in the second stacked group 200b.
- the package structure may be provided with a plurality of second bonding pads 112, and the bonding wires 300 connected to the plurality of second bonding pads 112 may pass through the same bonding hole 100b and be connected to the corresponding first chip bonding pad of the second stack group 200b. 211.
- the lengths of the signal transmission paths between the first chip 210 and the second chip 220 of each stacked chip set are basically the same.
- the two stacked chip groups (the first stacked group 200a and the second stacked group 200b) are connected, which can effectively improve the signal time delay problem and effectively increase the packaging integration level.
- the arrangement of the wiring holes 100b allows both sets of stacked chips to be connected to the first substrate pad 110 on the packaging substrate 100 at a nearby location, thereby enabling simple and effective signal transmission.
- the package substrate 100 further includes a second substrate pad 120 and a substrate through hole 100c.
- the second substrate pad 120 is located on the back side of the packaging substrate 100, and is located on the same surface of the packaging substrate 100 as the second pad 112 of the first substrate pad 110, and can be processed and formed at the same time.
- the second substrate pad 120 is connected to the first pad 111 of the first substrate pad 110 through the substrate through hole 100c, so that the signal can be introduced to the first pad 111 or the signal on the first pad 111 can be received. .
- a third conductive interconnection structure 130 may be disposed in the substrate through hole 100c, and the third conductive interconnection structure 130 connects the second substrate pad 120 and the first pad 111 of the first substrate pad 110 .
- the first solder ball 140 and the second solder ball 150 may also be provided on the package substrate 100 .
- the first solder ball 140 may be located under the second pad 112 of the first substrate pad 110
- the second solder ball 150 may be located under the second substrate pad 120 .
- the package structure can be soldered to the printed circuit board through the first solder ball 140 and the second solder ball 150 to connect with an external circuit.
- the length of the second lead wire 320 may be set to be greater than the length of the first lead wire 310 .
- the second solder ball 150 sequentially passes through the second substrate pad 120, the third conductive interconnection structure 130 in the substrate through hole 100c, the first pad 111, the first The lead 310 is connected to the first chip pad 211 to perform signal transmission with the first chip 210 and the second chip 220 of the first stacked group 200a.
- the first solder ball 140 is connected to the first chip pad 211 through the second pad 112 and the second lead 320, thereby connecting with the second stacked group 200b. Signal transmission is performed between the first chip 210 and the second chip 220 .
- the second substrate pad 120 and the third conductive interconnection structure 130 in the substrate through hole 100c are required to guide the signal on the second solder ball 150 to the first pad 111.
- the signal transmission path of the second stacked group 200b there is no need for the second substrate pad 120 and the third conductive interconnection structure 130 in the substrate through hole 100c to guide the signal on the first solder ball 140 to the second pad. 112.
- setting the length of the second lead 320 to be greater than the length of the first lead 310 can facilitate signal transmission between the two stacked chip groups (the first stacked group 200a and the second stacked group 200b).
- the lengths of the transmission paths are basically the same, which can more effectively improve the signal time delay problem.
- the thickness of the packaging substrate 100, the thickness of the wiring hole 100b, etc. can be adjusted to achieve the length of the signal transmission path between the two stacked chip groups (the first stacked group 200a and the second stacked group 200b). are basically consistent.
- a conductive layer 160 is provided inside the packaging substrate 100 .
- the conductive layer 160 includes a first conductive part 161 and a second conductive part 162 .
- the first conductive part 161 may be connected to the first pad 111 through an interconnection hole above it.
- the second conductive part 162 may be connected to the second pad 112 through an interconnection hole thereunder.
- the packaging substrate 100 may also be provided with a third substrate pad 170 .
- a third solder ball 180 may be provided under the third substrate pad 170 .
- the third solder ball 180 can solder the package structure to the printed circuit board to connect with external circuits.
- the third substrate pad 170 can connect the first conductive part 161 and the second conductive part 162 through the interconnection hole, so that signals can be obtained from the conductive layer 160 or signals can be transmitted to the conductive layer 160 .
- the third solder ball 180 passes through the third substrate pad 170, the first conductive part 161, the first pad 111, and the first lead 310 in order to connect with the first lead 310.
- a chip pad 211 is connected to perform signal transmission with the first chip 210 and the second chip 220 of the first stack group 200a.
- the third solder ball 180 passes through the third substrate pad 170, the second conductive part 162, the second pad 112, and the second lead 320 in order to be bonded to the first chip.
- the disk 211 is connected to perform signal transmission with the first chip 210 and the second chip 220 of the second stacked group 200b.
- the distance between the conductive layer 160 and the front surface of the packaging substrate 100 may be a first distance.
- the distance between the conductive layer 160 and the back surface of the packaging substrate 100 is the second distance.
- the first distance may be set equal to the second distance.
- the length of the second lead 320 is equal to the length of the first lead 310 .
- the lengths of the signal transmission paths between the two stacked chip groups can also be basically the same, so that the signal can be improved more effectively. Time delay issue.
- the first preset range can be set according to actual requirements.
- the second preset range can be set according to actual requirements.
- the stacked chipset 200 includes a stacked first stacked set 200a and The third stack group 200c.
- the first chip pads 211 of the first laminate group 200a and the third laminate group 200c are bonded to each other.
- the first chip pads 211 of the first stacked group 200a and the third stacked group 200c may be directly bonded, or may be bonded through bumps formed of solder or the like (not shown).
- bumps may be formed on the first chip pad 211 of the first stack group 200a before bonding, or may be formed on the first chip pad 211 of the third stack group 200c. Bumps can be formed on both.
- the first chip 210 of the first stacked group 200a may also be provided with a third dielectric layer 215 on the side where the first chip pad 211 is provided.
- the first chip 210 of the third stacked group 200c may also be provided with a third dielectric layer 215 on the side where the first chip pad 211 is provided.
- the third dielectric layers 215 of the two can also be bonded at the same time, so that the first stacked group is 200a and the third stack group 200c are reliably connected together.
- the first chip pad 211 of the first stack group 200a can be used for wire bonding, and its length can be greater than the length of the first chip pad 211 of the third stack group 200c, so that the first stack group The same first chip pad 211 on the first chip pad 211 of 200a can also be conveniently used for wire bonding while bonding.
- the edge of the third stack group 200c can be cut off, thereby exposing the first chip pad 211 of the first stack group 200a for wiring.
- the third dielectric layer 215 at the edge of the third stack group 200c can be removed, thereby exposing the first chip pad 211 of the first stack group 200a for wiring.
- the first chip pads 211 of the first stacked group 200a and the third stacked group 200c can be stacked.
- the mutually bonded first chip pads 211 can make the lengths of the signal transmission paths between the stacked first stack group 200a and the third stack group 200c substantially consistent.
- the signal time delay problem can be effectively improved, and the packaging integration level can be effectively improved.
- the package structure illustrated in the figure simultaneously includes a first stack group 200a, a second stack group 200b, and a third stack group 200c.
- the packaging structure may also include only the first stack group 200a and the third stack group 200c.
- the packaging structure further includes an packaging layer 500 .
- the encapsulation layer 500 covers the stacked chipset 200 and the lead wires 300, thereby insulating oxygen and water to the chips in the stacked chipset 200 and the lead wires 300, thereby protecting them.
- a method for preparing a packaging structure including:
- Step S10 please refer to FIG. 9 and FIG. 10 to provide a first wafer 10, a second wafer 20 and a packaging substrate 100.
- the first wafer 10 includes a plurality of first chips 210, and a first contact pad is provided on one side of the first chip 210. 212.
- the second chip 20 includes a plurality of second chips 220.
- the second chip 220 is provided with a second contact pad 221 on one side.
- the package substrate 100 is provided with a groove 100a inside and includes the first substrate pad 110;
- Step S20 please refer to FIG. 10, the first chip 10 and the second chip 20 are bonded through the first contact pad 221 and the second contact pad 212, and the first through hole 210a is formed in the first chip 210, and A first conductive interconnection structure 213 is formed in the first through hole 210a, and a first chip bonding pad 211 is formed on the other side of the first chip 210.
- the first through hole 210a is connected to the first contact pad 212, and the first chip bonding pad 211 electrically connects the first conductive interconnection structure 213;
- Step S30 please refer to FIG. 11, cutting the first wafer 10 and the second wafer 20 bonded together to form a stacked chipset 200;
- Step S60 please refer to Figure 1, place the stacked chipset 200 in the groove 100a;
- Step S70 please refer to FIG. 1 , connecting the first substrate pad 110 and the first chip pad 211 through the lead wire 300 .
- step S10 please refer to FIG. 9 .
- the materials of the first contact pad 212 and the second contact pad 221 may include metal materials, such as Au, Ni, W, Cu, Al, etc. The two can be the same or different, and there is no restriction on the comparison here.
- the first contact pad 212 is located on the front side of the first chip 210
- the second contact pad 221 is located on the front side of the second chip 220 .
- the packaging substrate 100 may include, but is not limited to, a ceramic substrate. For example, it may also be a glass substrate or the like.
- the package substrate 100 is provided with a groove 100a inside.
- the groove 100a may be formed by machining the package substrate 100.
- step S20 please refer to FIG. 10 .
- step S20 There is no necessary sequence between the steps of bonding the first wafer 10 and the second wafer 20 , forming the first through hole 210 a , and forming the first chip pad 211 . Choose based on your needs.
- the second contact pad 221 and the first contact pad 212 may be bonded directly or through bumps formed by solder or the like (not shown).
- bumps can be formed on the second contact pad 221 before bonding, bumps can also be formed on the first contact pad 212, or bumps can be formed between the second contact pad 221 and the first contact pad 212. Bumps are formed on the pads 212 .
- the side of the first chip 210 provided with the first contact pad 212 may also be provided with a first dielectric layer 214
- the side of the second chip 220 provided with the second contact pad 221 may also be provided with a second dielectric layer 222 .
- first wafer 10 and the second wafer 20 are bonded through the first contact pad 212 and the second contact pad 221 , they can also be bonded through the first dielectric layer 214 and the second dielectric layer 222 .
- the first through hole 210a may be a through silicon via.
- the material of the first conductive interconnection structure 213 filled in the first through hole 210a may also include metal materials, such as Au, Ni, W, Cu, Al, etc.
- the material of the first chip pad 211 may also include metal materials, such as Au, Ni, W, Cu, Al, etc.
- the first chip pad 211 may cover the first through hole 210a, so that the first chip pad 211 and the first conductive interconnection structure 213 may be directly connected.
- the first chip pad 211 and the first conductive interconnection structure 213 can also be connected through other conductive lines, which is not limited here.
- step S30 please refer to FIG. 11 , after performing the cutting process, multiple stacked chip sets 200 may be formed.
- step S60 please refer to FIG. 1 , the stacked chipset 200 can be bonded in the groove 100 a through conductive glue or non-conductive glue.
- step S70 referring to FIG. 1 , a wiring process is performed to form a wiring line connecting the first substrate pad 110 and the first chip pad 211 .
- step S70 it may also include:
- Step S80 forming a packaging layer 500 on the stacked chipset 200 and the lead wires 300 .
- the lengths of the signal transmission paths between the same first substrate pad 110 and the first chip 210 and the second chip 220 connected thereto are basically the same, thereby effectively improving the time delay problem.
- the first chip pad 211 on the first chip 210 and the first chip pad 211 on the packaging substrate 100 can be effectively reduced.
- the length of the lead wire 300 connecting the first chip bonding pad 211 and the first substrate bonding pad 110 can be effectively reduced, thereby reducing the length of the first chip 210 and the second chip 220 connected to the first substrate bonding pad 110.
- the length of the signal transmission path between them effectively reduces the resistance in the signal transmission path.
- the packaging substrate 100 is also provided with wiring holes 100b inside, and the wiring holes 100b are located below the groove 100a and connected with the groove 100a.
- the stacked chipset 200 includes a first stacked group 200a and a second stacked group 200b.
- the first stacked group 200a and the second stacked group 200b may be two of the plurality of stacked chip groups 200 formed after the cutting process in step S30.
- the first substrate pad 110 includes a first pad 111 and a second pad 112 .
- the first bonding pad 111 is located on the front side of the packaging substrate 100
- the second bonding pad 112 is located on the back side of the packaging substrate 100 .
- the lead wire 300 includes a first lead wire 310 and a second lead wire 320 .
- step S30 it also includes:
- Step S40 Connect the second chip 220 of the first stacked group 200a to the second chip 220 of the second stacked group 200b.
- the two may be connected through an adhesive layer 400 .
- Step S60 includes: bonding the first chip 210 of the second stack group 200b to the bottom of the groove 100a.
- Step S70 includes:
- Step S71 connect the first bonding pad 111 and the first chip bonding pad 211 of the first stacked group 200a through the first lead 310;
- Step S72 Connect the second bonding pad 112 to the first chip bonding pad 211 of the second stacked group 200b by passing the second lead wire 320 through the wiring hole 100b.
- step S71 and step S72 There is no necessary sequence between step S71 and step S72 and can be set according to the actual situation.
- the package substrate 100 may further include a second substrate pad 120 and a substrate through hole 100c.
- the second substrate pad 120 is located on the back side of the packaging substrate 100, and is located on the same surface of the packaging substrate 100 as the second pad 112 of the first substrate pad 110, and can be processed and formed at the same time.
- the second substrate pad 120 is connected to the first pad 111 of the first substrate pad 110 through the substrate through hole 100c, so that the signal can be introduced to the first pad 111 or the signal on the first pad 111 can be received. .
- a third conductive interconnection structure 130 may be disposed in the substrate through hole 100c, and the third conductive interconnection structure 130 connects the second substrate pad 120 and the first pad 111 of the first substrate pad 110 .
- the length of the second lead 320 can be set to be greater than the length of the first lead 310, and the thickness of the packaging substrate, the thickness of the wiring hole 100b, etc. can be adjusted to realize two sets of stacked chips (the first stack).
- the lengths of the signal transmission paths between the group 200a and the second stacked group 200b) are basically the same, so that the signal time delay problem can be more effectively improved.
- the stacked chipset 200 includes a first stacked group 200a and a third stacked group 200c.
- the first stacked group 200a and the third stacked group 200c may be two of the plurality of stacked chip groups 200 formed after the cutting process in step S30.
- step S30 it also includes:
- Step S50 Bond the first chip pad 211 of the first stack group 200a to the first chip of the third stack group 200c. Disk 211 bonding.
- the first chip 210 of the first stack group 200a may also be provided with a third dielectric layer 215 on the side where the first chip pad 211 is provided.
- the first chip 210 of the third stacked group 200c may also be provided with a third dielectric layer 215 on the side where the first chip pad 211 is provided.
- the third dielectric layers 215 of the two can also be bonded at the same time, so that the first stacked group is 200a and the third stack group 200c are reliably connected together.
- step S70 includes:
- Step S73 connect the first substrate pad 110 and the first chip pad 211 of the first stacked group 200a through the wire 300.
- the first chip pads 211 of the first stacked group 200a and the third stacked group 200c can be stacked.
- the mutually bonded first chip pads 211 can make the lengths of the signal transmission paths between the stacked first stack group 200a and the third stack group 200c substantially consistent.
- the signal time delay problem can be effectively improved, and the packaging integration level can be effectively improved.
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Abstract
A package structure and a preparation method therefor. The package structure comprises a package substrate (100), a stacked-chip group (200), and wires (300). The stacked-chip group (200) is arranged inside the package substrate (100). The stacked-chip group (200) comprises a first chip (210) and a second chip (220). The first chip (210) comprises first chip bonding pads (211) and first contact pads (212). The first contact pads (212) and the first chip bonding pads (211) are respectively located on two opposite faces of the first chip (210). The first chip (210) is provided with first conductive interconnection structures (213) penetrating to the first contact pads (212). The first conductive interconnection structures (213) are electrically connected to the first chip bonding pads (211). The second chip (220) comprises second contact pads (221). The second contact pads (221) are located on one face of the second chip (220) and are bonded to the first contact pads (212). The wires (300) are connected to a first substrate bonding pad (110) and the first chip bonding pads (211).
Description
相关申请的交叉引用Cross-references to related applications
本公开要求于2022年08月08日提交中国专利局、申请号为2022109460433、发明名称为“封装结构及其制备方法”的中国专利申请的优先权,其全部内容通过引用结合在本公开中。This disclosure claims priority to the Chinese patent application filed with the China Patent Office on August 8, 2022, with application number 2022109460433 and the invention title "Packaging Structure and Preparation Method thereof", the entire content of which is incorporated into this disclosure by reference.
本公开涉及集成电路技术领域,特别是涉及一种封装结构及其制备方法。The present disclosure relates to the field of integrated circuit technology, and in particular to a packaging structure and a preparation method thereof.
随着半导体技术的发展,出现了可以有效提高封装集成度的三维堆叠技术。三维堆叠技术在垂直方向进行的芯片叠放。垂直叠放的各芯片通过打引线与封装基板上的第一基板焊盘连接。With the development of semiconductor technology, three-dimensional stacking technology has emerged that can effectively improve packaging integration. Three-dimensional stacking technology stacks chips in the vertical direction. Each vertically stacked chip is connected to the first substrate pad on the packaging substrate through wires.
然而,传统三维堆叠技术中,由于芯片堆叠高度不同,导致连接至同一个第一基板焊盘的各芯片的打引线长度也不同。此时,同一第一基板焊盘与其连接的各芯片之间的信号传输时间不一致,从而会产生信号时间延迟问题。However, in traditional three-dimensional stacking technology, due to different chip stacking heights, the lead lengths of each chip connected to the same first substrate pad are also different. At this time, the signal transmission time between the same first substrate pad and the chips connected thereto is inconsistent, thus causing a signal time delay problem.
发明内容Contents of the invention
根据本公开的各种实施例,提供一种封装结构及其制备方法。According to various embodiments of the present disclosure, a packaging structure and a preparation method thereof are provided.
根据本公开的各种实施例,提供一种封装结构,包括:According to various embodiments of the present disclosure, a packaging structure is provided, including:
封装基板,内部设有凹槽,且包括第一基板焊盘;The packaging substrate has a groove inside and includes a first substrate pad;
叠层芯片组,放置于所述凹槽内,包括:A stacked chipset, placed in the groove, includes:
第一芯片,包括第一芯片焊盘与第一接触垫,所述第一接触垫与所述第一芯片焊盘分别位于所述第一芯片的相背的两面,且所述第一接触垫为所述第一芯片的信号传输端,所述第一芯片设有第一通孔,所述第一通孔连通至所述第一接触垫,且所述第一通孔内填充第一导电互连结构,所述第一导电互连结构电连接所述第一芯片焊盘;The first chip includes a first chip bonding pad and a first contact pad. The first contact pad and the first chip bonding pad are respectively located on opposite sides of the first chip, and the first contact pad is the signal transmission end of the first chip, the first chip is provided with a first through hole, the first through hole is connected to the first contact pad, and the first through hole is filled with a first conductive An interconnection structure, the first conductive interconnection structure is electrically connected to the first chip pad;
第二芯片,包括第二接触垫,所述第二接触垫位于所述第二芯片靠近所述第一芯片的一面,并与所述第一接触垫键合,且所述第二接触垫为所述第二芯片的信号传输端;The second chip includes a second contact pad. The second contact pad is located on a side of the second chip close to the first chip and is bonded to the first contact pad. The second contact pad is The signal transmission end of the second chip;
打引线,连接所述第一基板焊盘与所述第一芯片焊盘。Draw leads to connect the first substrate pad and the first chip pad.
在一些实施例中,所述第一接触垫位于所述第一芯片的正面,所述第二接触垫位于所述第二芯片的正面。In some embodiments, the first contact pad is located on the front side of the first chip, and the second contact pad is located on the front side of the second chip.
在一些实施例中,所述第一芯片焊盘覆盖所述第一通孔。In some embodiments, the first chip pad covers the first via.
在一些实施例中,In some embodiments,
所述第一芯片还包括第一介质层,所述第一介质层与所述第一接触垫位于所述第一芯片的同一面,
The first chip also includes a first dielectric layer, the first dielectric layer and the first contact pad are located on the same side of the first chip,
所述第二芯片还包括第二介质层,所述第一介质层与所述第二接触垫位于所述第二芯片的同一面;The second chip further includes a second dielectric layer, the first dielectric layer and the second contact pad are located on the same side of the second chip;
在所述第一接触垫与所述第二接触垫键合的同时,所述第一介质层与所述第二介质层键合。The first dielectric layer is bonded to the second dielectric layer while the first contact pad is bonded to the second contact pad.
在一些实施例中,所述封装基板内部还设有打线孔,所述打线孔位于所述凹槽下方,且与所述凹槽连通。In some embodiments, the packaging substrate is further provided with wiring holes inside, and the wiring holes are located below the groove and connected with the groove.
在一些实施例中,In some embodiments,
所述叠层芯片组包括堆叠设置的第一叠层组以及第二叠层组,所述第一叠层组的所述第二芯片与所述第二叠层组的所述第二芯片连接,且所述第二叠层组的第一芯片粘接于所述凹槽底部;The stacked chip set includes a stacked first stacked stack and a second stacked stack, and the second chip of the first stacked stack is connected to the second chip of the second stacked stack. , and the first chip of the second laminate group is bonded to the bottom of the groove;
所述第一基板焊盘包括第一焊盘以及第二焊盘,所述第一焊盘位于所述封装基板的正面,所述第二焊盘位于所述封装基板的背面;The first substrate pad includes a first pad and a second pad, the first pad is located on the front side of the packaging substrate, and the second pad is located on the back side of the packaging substrate;
所述打引线包括第一引线以及第二引线,所述第一引线连接所述第一焊盘与所述第一叠层组的第一芯片焊盘,所述第二引线穿过所述打线孔而连接所述第二焊盘与所述第二叠层组的第一芯片焊盘。The lead wires include a first lead wire and a second lead wire. The first lead wire connects the first bonding pad and the first chip pad of the first stacked group. The second lead wire passes through the lead wire. The wire hole connects the second bonding pad and the first chip bonding pad of the second stacked group.
在一些实施例中,所述封装结构包括粘接层,所述第一叠层组的所述第二芯片位于所述粘接层的一侧,所述第二叠层组的所述第二芯片位于所述粘接层的另一侧。In some embodiments, the packaging structure includes an adhesive layer, the second chip of the first stacked group is located on one side of the adhesive layer, and the second chip of the second stacked group The chip is located on the other side of the adhesive layer.
在一些实施例中,所述封装基板还包括第二基板焊盘以及基板通孔,所述第二基板焊盘位于所述封装基板的背面,且通过所述基板通孔与所述第一焊盘连接。In some embodiments, the packaging substrate further includes a second substrate pad and a substrate through hole. The second substrate pad is located on the back side of the packaging substrate and is connected to the first solder pad through the substrate through hole. disk connection.
在一些实施例中,所述第二引线的长度大于所述第一引线的长度。In some embodiments, the length of the second lead is greater than the length of the first lead.
在一些实施例中,In some embodiments,
所述封装基板内部设有导电层,所述导电层包括第一导电部以及第二导电部,所述第一导电部通过位于其上方的互连孔连接所述第一焊盘,所述第二导电部通过位于其下方的互连孔连接所述第二焊盘。A conductive layer is provided inside the packaging substrate. The conductive layer includes a first conductive part and a second conductive part. The first conductive part is connected to the first pad through an interconnection hole located above it. The third conductive part is connected to the first pad through an interconnection hole located above it. The two conductive parts are connected to the second pad through interconnect holes located below them.
在一些实施例中,所述导电层与所述封装基板正面的距离为第一距离,所述导电层与所述封装基板背面的距离为第二距离,所述第一距离等于所述第二距离,所述第二引线的长度等于所述第一引线的长度。In some embodiments, the distance between the conductive layer and the front side of the packaging substrate is a first distance, the distance between the conductive layer and the back side of the packaging substrate is a second distance, and the first distance is equal to the second distance. distance, the length of the second lead is equal to the length of the first lead.
在一些实施例中,In some embodiments,
所述叠层芯片组包括堆叠设置的第一叠层组以及第三叠层组,所述第一叠层组的所述第一芯片焊盘与所述第三叠层组的所述第一芯片焊盘键合;The stacked chip set includes a first stacked stack group and a third stacked stacked group, and the first chip pad of the first stacked stack group and the first stacked stacked panel of the third stacked stacked group are chip pad bonding;
所述打引线连接所述第一基板焊盘与所述第一叠层组的所述第一芯片焊盘。The lead wire connects the first substrate pad and the first chip pad of the first stack group.
在一些实施例中,In some embodiments,
所述第三叠层组以及所述第一叠层组中,所述第一芯片在设有第一芯片焊盘的一侧还设有第三介质层,所述第一叠层组的第三介质层与所述第三叠层组的所述第三介质层键合。In the third stacked group and the first stacked group, the first chip is further provided with a third dielectric layer on the side provided with the first chip pad, and the third dielectric layer of the first stacked group is Three dielectric layers are bonded to the third dielectric layer of the third stacked layer group.
在一些实施例中,所述封装结构还包括封装层,所述封装层覆盖所述叠层芯片组以及所述打引线。
In some embodiments, the packaging structure further includes a packaging layer covering the stacked chipset and the wiring.
根据本公开的各种实施例,还提供一种封装结构的制备方法,包括:According to various embodiments of the present disclosure, a method for preparing a packaging structure is also provided, including:
提供第一晶片、第二晶片以及封装基板,第一晶片包括多个第一芯片,所述第一芯片的一面设有第一接触垫,所述第二晶片包括多个第二芯片,第二芯片的一面设有第二接触垫,所述封装基板内部设有凹槽,且包括第一基板焊盘;A first wafer, a second wafer and a packaging substrate are provided. The first wafer includes a plurality of first chips. A first contact pad is provided on one side of the first chip. The second wafer includes a plurality of second chips. The second A second contact pad is provided on one side of the chip, a groove is provided inside the packaging substrate, and includes a first substrate pad;
通过所述第一接触垫与所述第二接触垫,将所述第一晶片与所述第二晶片键合,且于所述第一芯片内形成第一通孔,且于所述第一通孔内形成第一导电互连结构,并于所述第一芯片的另一面形成第一芯片焊盘,所述第一通孔连通至第一接触垫,所述第一芯片焊盘电连接所述第一导电互连结构;The first wafer and the second wafer are bonded through the first contact pad and the second contact pad, and a first through hole is formed in the first chip, and the first through hole is formed in the first chip. A first conductive interconnect structure is formed in the through hole, and a first chip pad is formed on the other side of the first chip. The first through hole is connected to the first contact pad, and the first chip pad is electrically connected. the first conductive interconnect structure;
将键合在一起的所述第一晶片与所述第二晶片进行切割,从而形成叠层芯片组;Cutting the first wafer and the second wafer bonded together to form a stacked chip set;
将所述叠层芯片组放置于所述凹槽内;Place the stacked chipset in the groove;
通过打引线连接所述第一基板焊盘与所述第一芯片焊盘。The first substrate pad and the first chip pad are connected by wire bonding.
在一些实施例中,所述封装基板内部还设有打线孔,所述打线孔位于所述凹槽下方,且与所述凹槽连通,所述叠层芯片组包括第一叠层组以及第二叠层组,所述第一基板焊盘包括第一焊盘以及第二焊盘,所述打引线包括第一引线以及第二引线;In some embodiments, the packaging substrate is also provided with wiring holes inside, the wiring holes are located below the groove and communicate with the groove, and the stacked chip set includes a first stacked set. And a second stacked group, the first substrate pad includes a first pad and a second pad, and the lead wire includes a first lead and a second lead;
所述将键合在一起的所述第一晶片与所述第二晶片进行切割之后,还包括:After cutting the first wafer and the second wafer that are bonded together, the method further includes:
将所述第一叠层组的所述第二芯片与所述第二叠层组的所述第二芯片连接;Connect the second chip of the first laminate group to the second chip of the second laminate group;
所述将所述叠层芯片组放置于所述凹槽内,包括:The step of placing the stacked chipset in the groove includes:
将所述第二叠层组的第一芯片粘接于所述凹槽底部;Bond the first chip of the second laminate group to the bottom of the groove;
所述通过打引线连接所述第一基板焊盘与所述第一芯片焊盘,包括:The method of connecting the first substrate pad and the first chip pad by wiring includes:
通过所述第一引线连接所述第一焊盘与所述第一叠层组的第一芯片焊盘;Connect the first bonding pad and the first chip bonding pad of the first stacked group through the first lead;
通过所述第二引线穿过所述打线孔而连接所述第二焊盘与所述第二叠层组的第一芯片焊盘。The second bonding pad is connected to the first chip bonding pad of the second stacked group by passing the second lead wire through the wiring hole.
在一些实施例中,所述叠层芯片组包括第一叠层组以及第三叠层组,In some embodiments, the stacked chipset includes a first stacked group and a third stacked group,
所述将键合在一起的所述第一晶片与所述第二晶片进行切割之后,还包括:After cutting the first wafer and the second wafer that are bonded together, the method further includes:
将所述第一叠层组的所述第一芯片焊盘与所述第三叠层组的所述第一芯片焊盘键合;bonding the first chip pad of the first stack group to the first chip pad of the third stack group;
所述通过打引线连接所述第一基板焊盘与所述第一芯片焊盘,包括:The method of connecting the first substrate pad and the first chip pad by wiring includes:
通过打引线连接所述第一基板焊盘与所述第一叠层组的所述第一芯片焊盘。The first substrate pad and the first chip pad of the first stacked group are connected by wire bonding.
本公开的一个或多个实施例的细节在下面的附图和描述中提出。本公开的其他特征、目的和优点将从说明书、附图以及权利要求书变得明显。The details of one or more embodiments of the disclosure are set forth in the accompanying drawings and the description below. Other features, objects, and advantages of the disclosure will become apparent from the description, drawings, and claims.
为了更清楚地说明本公开实施例或传统技术中的技术方案,下面将对实施例或传统技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本公开的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to more clearly explain the embodiments of the present disclosure or the technical solutions in the traditional technology, the drawings needed to be used in the description of the embodiments or the traditional technology will be briefly introduced below. Obviously, the drawings in the following description are only for the purpose of explaining the embodiments or the technical solutions of the traditional technology. For some disclosed embodiments, those of ordinary skill in the art can also obtain other drawings based on these drawings without exerting creative efforts.
图1至图6为不同实施例中提供的封装结构的结构示意图;Figures 1 to 6 are structural schematic diagrams of packaging structures provided in different embodiments;
图7为一实施例中提供的第一焊盘的背面示意图;
Figure 7 is a schematic view of the back of the first pad provided in an embodiment;
图8为一实施例中提供的封装结构的制备流程示意图;Figure 8 is a schematic diagram of the preparation process of the packaging structure provided in an embodiment;
图9为一实施例中提供的封装基板的结构示意图;Figure 9 is a schematic structural diagram of a packaging substrate provided in an embodiment;
图10为一实施例中第一晶片与第二晶片键合示意图;Figure 10 is a schematic diagram of the bonding of the first wafer and the second wafer in an embodiment;
图11为一实施例中将键合在一起的第一晶片与第二晶片进行切割示意图。FIG. 11 is a schematic diagram of cutting the first wafer and the second wafer bonded together in one embodiment.
为了更好地描述和说明这里公开的那些发明的实施例和/或示例,可以参考一幅或多幅附图。用于描述附图的附加细节或示例不应当被认为是对所公开的发明、目前描述的实施例和/或示例以及目前理解的这些发明的最佳模式中的任何一者的范围的限制。To better describe and illustrate embodiments and/or examples of those inventions disclosed herein, reference may be made to one or more of the accompanying drawings. The additional details or examples used to describe the drawings should not be construed as limiting the scope of any of the disclosed inventions, the embodiments and/or examples presently described, and the best modes currently understood of these inventions.
为了便于理解本公开,下面将参照相关附图对本公开进行更全面的描述。附图中给出了本公开的首选实施例。但是,本公开可以以许多不同的形式来实现,并不限于本文所描述的实施例。相反地,提供这些实施例的目的是使对本公开的公开内容更加透彻全面。To facilitate understanding of the present disclosure, the present disclosure will be described more fully below with reference to the relevant drawings. There is illustrated in the accompanying drawings a preferred embodiment of the present disclosure. However, the present disclosure may be embodied in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.
除非另有定义,本文所使用的所有的技术和科学术语与属于本公开的技术领域的技术人员通常理解的含义相同。本文中在本公开的说明书中所使用的术语只是为了描述具体的实施例的目的,不是旨在于限制本公开。Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this disclosure belongs. The terminology used herein in the description of the disclosure is for the purpose of describing specific embodiments only and is not intended to limit the disclosure.
应当明白,当元件或层被称为“在...上”、“与...相邻”、“连接到”或“耦合到”其它元件或层时,其可以直接地在其它元件或层上、与之相邻、连接或耦合到其它元件或层,或者可以存在居间的元件或层。相反,当元件被称为“直接在...上”、“与...直接相邻”、“直接连接到”或“直接耦合到”其它元件或层时,则不存在居间的元件或层。It will be understood that when an element or layer is referred to as being "on," "adjacent," "connected to" or "coupled to" another element or layer, it can be directly on the other element or layer. A layer may be on, adjacent to, connected to, or coupled to other elements or layers, or intervening elements or layers may be present. In contrast, when an element is referred to as being "directly on," "directly adjacent," "directly connected to" or "directly coupled to" another element or layer, there are no intervening elements or layers present. layer.
应当明白,尽管可使用术语第一、第二、第三等描述各种元件、部件、区、层、掺杂类型和/或部分,这些元件、部件、区、层、掺杂类型和/或部分不应当被这些术语限制。这些术语仅仅用来区分一个元件、部件、区、层、掺杂类型或部分与另一个元件、部件、区、层、掺杂类型或部分。因此,在不脱离本公开教导之下,下面讨论的第一元件、部件、区、层、掺杂类型或部分可表示为第二元件、部件、区、层或部分。It will be understood that although the terms first, second, third, etc. may be used to describe various elements, components, regions, layers, doping types and/or sections, these elements, components, regions, layers, doping types and/or Sections should not be limited by these terms. These terms are only used to distinguish one element, component, region, layer, doping type or section from another element, component, region, layer, doping type or section. Thus, a first element, component, region, layer, doping type or section discussed below could be termed a second element, component, region, layer or section without departing from the teachings of the present disclosure.
空间关系术语例如“在...下”、“在...下面”、“下面的”、“在...之下”、“在...之上”、“上面的”等,在这里可以用于描述图中所示的一个元件或特征与其它元件或特征的关系。应当明白,除了图中所示的取向以外,空间关系术语还包括使用和操作中的器件的不同取向。例如,如果附图中的器件翻转,描述为“在其它元件下面”或“在其之下”或“在其下”元件或特征将取向为在其它元件或特征“上”。因此,示例性术语“在...下面”和“在...下”可包括上和下两个取向。此外,器件也可以包括另外地取向(譬如,旋转90度或其它取向),并且在此使用的空间描述语相应地被解释。Spatial relational terms such as "under", "under", "under", "under", "on", "above", etc., in This may be used to describe the relationship of one element or feature to other elements or features shown in the figures. It will be understood that the spatially relative terms encompass different orientations of the device in use and operation in addition to the orientation depicted in the figures. For example, if the device in the figures is turned over, elements or features described as "below" or "under" or "beneath" other elements or features would then be oriented "above" the other elements or features. Thus, the exemplary terms "below" and "under" may include both upper and lower orientations. Additionally, the device may be otherwise oriented (eg, rotated 90 degrees or at other orientations) and the spatial descriptors used herein interpreted accordingly.
在此使用时,单数形式的“一”、“一个”和“所述/该”也可以包括复数形式,除非上下文清楚指出另外的方式。还应明白,当术语“组成”和/或“包括”在该说明书中使用时,可以确定所述特征、整数、步骤、操作、元件和/或部件的存在,但不排除一个或更多其它的特征、整数、步骤、操作、元件、部件和/或组的存在或添加。同时,在此使用时,术语“和/或”包括相关所列项目的任何及所有组合。As used herein, the singular forms "a," "an," and "the" may include the plural forms as well, unless the context clearly dictates otherwise. It will also be understood that when the terms "consist" and/or "comprise" are used in this specification, the presence of stated features, integers, steps, operations, elements and/or parts may be identified but not to the exclusion of one or more other The presence or addition of features, integers, steps, operations, elements, parts and/or groups. Also, as used herein, the term "and/or" includes any and all combinations of the associated listed items.
需要说明的是,当一个元件被认为是“连接”另一个元件时,它可以是直接连接到另
一个元件,或者通过居中元件连接另一个元件。此外,以下实施例中的“连接”,如果被连接的对象之间具有电信号或数据的传递,则应理解为“电连接”等。It should be noted that when a component is considered to be "connected" to another component, it can be directly connected to the other component. A component, or connected to another component via a centered component. In addition, "connection" in the following embodiments should be understood as "electrical connection" if there is transmission of electrical signals or data between the connected objects.
本公开的实施例不应当局限于说明书附图所示意的特定形状,而是包括由于例如制造技术导致的形状偏差。Embodiments of the present disclosure should not be limited to the specific shapes illustrated in the drawings of the specification but include deviations in shapes due to, for example, manufacturing techniques.
在一个实施例中,请参阅图1,提供一种封装结构,包括封装基板100、叠层芯片组200以及打引线300。In one embodiment, please refer to FIG. 1 , a packaging structure is provided, including a packaging substrate 100 , a stacked chipset 200 and leads 300 .
封装基板100可以包括但不限于为陶瓷基板。例如,其还可以为玻璃基板等。封装基板100内部设有凹槽100a。凹槽100a可以通过对封装基板100进行机械加工形成。封装基板100包括第一基板焊盘110。第一基板焊盘110用于与叠层芯片组200中的芯片打线连接。The packaging substrate 100 may include, but is not limited to, a ceramic substrate. For example, it may also be a glass substrate or the like. The package substrate 100 is provided with a groove 100a inside. The groove 100a may be formed by machining the package substrate 100. The package substrate 100 includes a first substrate pad 110 . The first substrate pad 110 is used for wire bonding with the chips in the stacked chipset 200 .
叠层芯片组200放置于凹槽100a内,其可以包括多个堆叠设置的芯片。作为示例,可以设置叠层芯片组200中的部分芯片位于凹槽100a内部。当然,也可以设置叠层芯片组200中的所有芯片均位于凹槽100a内部。这里对比并不做限制。叠层芯片组200中的各芯片在凹槽内的设置形式具体可以根据实际需求调整。The stacked chipset 200 is placed in the groove 100a, and may include a plurality of stacked chips. As an example, some chips in the stacked chipset 200 may be located inside the groove 100a. Of course, it is also possible to arrange that all chips in the stacked chipset 200 are located inside the groove 100a. The comparison here is not limited. The arrangement form of each chip in the laminated chip set 200 in the groove can be adjusted according to actual needs.
具体地,叠层芯片组200包括第一芯片210以及第二芯片220。第一芯片210与第二芯片220相互键合在一起。Specifically, the stacked chipset 200 includes a first chip 210 and a second chip 220 . The first chip 210 and the second chip 220 are bonded together.
第一芯片210包括第一芯片焊盘211与第一接触垫212。第一芯片焊盘211用于与封装基板100打线连接。第一接触垫212用于与第二芯片220进行键合。第一接触垫212与第一芯片焊盘211分别位于第一芯片210的相背的两面。The first chip 210 includes a first chip pad 211 and a first contact pad 212 . The first chip pad 211 is used for wire connection with the packaging substrate 100 . The first contact pad 212 is used for bonding with the second chip 220 . The first contact pad 212 and the first chip pad 211 are respectively located on opposite sides of the first chip 210 .
同时,第一芯片210还设有第一通孔210a。作为示例,第一通孔210a可以为硅通孔。At the same time, the first chip 210 is also provided with a first through hole 210a. As an example, the first through hole 210a may be a through silicon via.
第一通孔210a连通至第一接触垫212。并且,第一通孔210a填充第一导电互连结构213,从而使得第一导电互连结构213与第一接触垫212之间接触导电。同时,第一导电互连结构213电连接第一芯片焊盘211,从而可以将第一芯片焊盘211上的信号传输至第一接触垫212,或者将第一接触垫212上的信号传输至第一芯片焊盘211上。The first through hole 210a is connected to the first contact pad 212. Moreover, the first through hole 210a fills the first conductive interconnection structure 213, so that the first conductive interconnection structure 213 and the first contact pad 212 are in contact and conductive. At the same time, the first conductive interconnection structure 213 is electrically connected to the first chip pad 211, so that the signal on the first chip pad 211 can be transmitted to the first contact pad 212, or the signal on the first contact pad 212 can be transmitted to on the first chip pad 211.
具体地,第一芯片210上可以设有多个第一通孔210a,从而可以传输多种信号(如芯片的输入输出信号、控制信号等)。Specifically, a plurality of first through holes 210a can be provided on the first chip 210, so that various signals (such as input and output signals of the chip, control signals, etc.) can be transmitted.
例如图1所示,设置两排多个第一通孔210a。图中示意除了位于同一截面上的两个第一通孔210a,该两个第一通孔210a可以分别位于两排第一通孔210a中。For example, as shown in FIG. 1 , two rows of multiple first through holes 210a are provided. The figure shows that in addition to the two first through holes 210a located on the same cross-section, the two first through holes 210a may be located in two rows of first through holes 210a respectively.
作为示例,第一芯片焊盘211可以覆盖第一通孔210a,从而使得第一芯片焊盘211与第一导电互连结构213可以直接连接。当然,第一芯片焊盘211与第一导电互连结构213也可以通过其他的导电线路连接,这里对此不作限制。As an example, the first chip pad 211 may cover the first through hole 210a, so that the first chip pad 211 and the first conductive interconnection structure 213 may be directly connected. Of course, the first chip pad 211 and the first conductive interconnection structure 213 can also be connected through other conductive lines, which is not limited here.
同时,第一芯片焊盘211、第一接触垫212以及第一导电互连结构213的材料均可以包括金属材料,如Au、Ni、W、Cu、Al等。其中,任意两者的材料可以相同,也可以不同,这里对比不作限制。At the same time, the materials of the first chip pad 211, the first contact pad 212 and the first conductive interconnection structure 213 may include metal materials, such as Au, Ni, W, Cu, Al, etc. Among them, the materials of any two materials may be the same or different, and the comparison is not limited here.
第二芯片220包括第二接触垫221。第二接触垫221的材料也可以包括金属材料,其与第一接触垫212的材料可以相同,也可以不同。
The second chip 220 includes second contact pads 221 . The material of the second contact pad 221 may also include a metal material, which may be the same as the material of the first contact pad 212 or may be different.
第二接触垫221位于第二芯片220靠近第一芯片210的一面,且与第一接触垫212键合。具体地,第二接触垫221与第一接触垫212可以直接键合,也可以通过焊料等形成的凸点键合(未图示)。当采用凸点键合方式时,键合前,可以在第二接触垫221上形成凸点,也可以在第一接触垫212上形成凸点,也可以在第二接触垫221与第一接触垫212上均形成凸点。The second contact pad 221 is located on a side of the second chip 220 close to the first chip 210 and is bonded to the first contact pad 212 . Specifically, the second contact pad 221 and the first contact pad 212 may be directly bonded, or may be bonded through bumps formed of solder or the like (not shown). When bump bonding is used, bumps can be formed on the second contact pad 221 before bonding, bumps can also be formed on the first contact pad 212, or bumps can be formed between the second contact pad 221 and the first contact pad 212. Bumps are formed on the pads 212 .
同时,作为示例,第一芯片210还可以包括第一介质层214,第一介质层214与第一接触垫212位于第一芯片210的同一面。第二芯片220还可以包括第二介质层222,第二介质层222与第二接触垫221位于第二芯片220的同一面。在第一接触垫212与第二接触垫221键合的同时,第一介质层214可以与第二介质层222键合,从而将第一芯片210与第二芯片220可靠连接堆叠。Meanwhile, as an example, the first chip 210 may also include a first dielectric layer 214 , and the first dielectric layer 214 and the first contact pad 212 are located on the same surface of the first chip 210 . The second chip 220 may further include a second dielectric layer 222 , and the second dielectric layer 222 and the second contact pad 221 are located on the same surface of the second chip 220 . While the first contact pad 212 and the second contact pad 221 are bonded, the first dielectric layer 214 can be bonded with the second dielectric layer 222, so that the first chip 210 and the second chip 220 are reliably connected and stacked.
此时,一方面将第一芯片210与第二芯片220连接在一起,另一方面第一接触垫212与第二接触垫221导电连接。因此,可以将第一芯片焊盘211上的信号传输至第二接触垫221,或者将第二接触垫221上的信号传输至第一芯片焊盘211上。At this time, on the one hand, the first chip 210 and the second chip 220 are connected together, and on the other hand, the first contact pad 212 and the second contact pad 221 are conductively connected. Therefore, the signal on the first chip pad 211 can be transmitted to the second contact pad 221 , or the signal on the second contact pad 221 can be transmitted to the first chip pad 211 .
同时,第一接触垫212可以作为第一芯片210的信号传输端,第二接触垫221可以作为第二芯片220的信号传输端。因此,第一芯片焊盘211可以同时与第一芯片210、第二芯片220进行信号传输。At the same time, the first contact pad 212 can be used as a signal transmission end of the first chip 210 , and the second contact pad 221 can be used as a signal transmission end of the second chip 220 . Therefore, the first chip pad 211 can transmit signals with the first chip 210 and the second chip 220 at the same time.
可以理解的是,第一接触垫212的数量可以为多个,而作为第一芯片210的信号传输端的第一接触垫212可以为其中的部分第一接触垫212。且第一通孔210a连通的是在这些作为信号传输端的第一接触垫212。而另一部分第一接触垫212可以只用于键合。当然,在一些实施例中,也可以不设置只用于键合的第一接触垫212。此时,所有的第一接触垫212均作为信号传输端。It can be understood that the number of the first contact pads 212 may be multiple, and the first contact pads 212 serving as the signal transmission end of the first chip 210 may be part of the first contact pads 212 therein. And the first through holes 210a are connected to the first contact pads 212 serving as signal transmission ends. The other part of the first contact pads 212 may be used only for bonding. Of course, in some embodiments, the first contact pad 212 which is only used for bonding may not be provided. At this time, all first contact pads 212 serve as signal transmission terminals.
相应地,第二接触垫221的数量可以为多个,而作为第二芯片220的信号传输端的第二接触垫221可以为其中的部分第二接触垫221。而另一部分第二接触垫221可以只用于键合。当然,在一些实施例中,也可以不设置只用于键合的第二接触垫221。此时,所有的第二接触垫221均作为信号传输端。打引线300例如可以为金线等。打引线300连接第一基板焊盘110与第一芯片焊盘211。Correspondingly, the number of second contact pads 221 may be multiple, and the second contact pads 221 serving as the signal transmission end of the second chip 220 may be part of the second contact pads 221 therein. The other part of the second contact pads 221 may be used only for bonding. Of course, in some embodiments, the second contact pad 221 which is only used for bonding may not be provided. At this time, all the second contact pads 221 serve as signal transmission terminals. The lead wire 300 may be a gold wire, for example. The lead wire 300 connects the first substrate pad 110 and the first chip pad 211 .
此时,第一基板焊盘110可以依次通过打引线300、第一芯片焊盘211、第一通孔210a内的第一导电互连结构213、第一接触垫212而与第一芯片210之间进行信号传输。并且,第一基板焊盘110可以依次通过打引线300、第一芯片焊盘211、第一通孔210a内的第一导电互连结构213、第一接触垫212、第二接触垫221而与第二芯片220之间进行信号传输。At this time, the first substrate pad 110 can be connected to the first chip 210 through the lead wire 300, the first chip pad 211, the first conductive interconnection structure 213 in the first through hole 210a, and the first contact pad 212 in sequence. signal transmission between. Furthermore, the first substrate pad 110 may be connected to the first substrate pad 110 by sequentially connecting the leads 300, the first chip pad 211, the first conductive interconnection structure 213 in the first through hole 210a, the first contact pad 212, and the second contact pad 221. Signal transmission is performed between the second chips 220 .
因此,在本实施例中,第一芯片210和第二芯片220可以连接同一信号通道的同一第一基板焊盘110,而第一基板焊盘110与其连接的第一芯片210以及第二芯片220之间的信号传输路径的长度基本一致,从而可以有效改善时间延迟问题。Therefore, in this embodiment, the first chip 210 and the second chip 220 can be connected to the same first substrate pad 110 of the same signal channel, and the first substrate pad 110 is connected to the first chip 210 and the second chip 220 The length of the signal transmission path between them is basically the same, which can effectively improve the time delay problem.
同时,在本实施例中,由于叠层芯片组200放置于封装基板100的凹槽100a内,从而从可以有效降低第一芯片210上的第一芯片焊盘211与封装基板100上的第一基板焊盘110之间的高度差。此时,连接第一芯片焊盘211与第一基板焊盘110的打引线300的长
度可以被有效降低,从而减少了第一基板焊盘110与其连接的第一芯片210以及第二芯片220之间的信号传输路径的长度,从而有效降低了信号传输路径中的电阻。At the same time, in this embodiment, since the stacked chipset 200 is placed in the groove 100a of the packaging substrate 100, the first chip pad 211 on the first chip 210 and the first chip pad 211 on the packaging substrate 100 can be effectively reduced. The height difference between the substrate pads 110. At this time, the length of the lead wire 300 connecting the first chip pad 211 and the first substrate pad 110 The degree can be effectively reduced, thereby reducing the length of the signal transmission path between the first substrate pad 110 and the first chip 210 and the second chip 220 connected thereto, thereby effectively reducing the resistance in the signal transmission path.
在一个实施例中,请参阅图1,第一接触垫212位于第一芯片210的正面,第二接触垫221位于第二芯片220的正面。In one embodiment, please refer to FIG. 1 , the first contact pad 212 is located on the front side of the first chip 210 , and the second contact pad 221 is located on the front side of the second chip 220 .
具体地,第一芯片210正面还可以设置导电线路,导电线路连接第一芯片210内的半导体器件(如存储单元),从而与其进行信号传输。Specifically, conductive circuits may also be provided on the front side of the first chip 210, and the conductive circuits are connected to semiconductor devices (such as memory cells) in the first chip 210 for signal transmission therewith.
第二芯片220正面还可以设置导电线路,导电线路连接第二芯片220内的半导体器件(如存储单元),从而与其进行信号传输。Conductive circuits may also be provided on the front side of the second chip 220, and the conductive circuits are connected to the semiconductor devices (such as memory cells) in the second chip 220 for signal transmission therewith.
将第一接触垫212设置于第一芯片210的正面,第二接触垫221设置于第二芯片220的正面,可以使得保证第一芯片210与第二芯片220内的半导体器件的接收信号或者输出信号的传输时间一致。Disposing the first contact pad 212 on the front surface of the first chip 210 and the second contact pad 221 on the front surface of the second chip 220 can ensure the signal reception or output of the semiconductor devices in the first chip 210 and the second chip 220 . The transmission times of the signals are consistent.
同时,第一接触垫212设置于第一芯片210的正面,可以使得外部信号经由第一基板焊盘110,可以快速传输至第一芯片210内的半导体器件,第一芯片210内的半导体器件的信号也可以快速传输至外部,因此,可以有效降低信号传输路径的长度。At the same time, the first contact pad 212 is disposed on the front side of the first chip 210, so that external signals can be quickly transmitted to the semiconductor device in the first chip 210 through the first substrate pad 110. The semiconductor device in the first chip 210 can Signals can also be quickly transmitted to the outside, thus effectively reducing the length of the signal transmission path.
类似地,第二接触垫221设置于第二芯片220的正面,可以使得外部信号经由第一基板焊盘110,可以快速传输至第二芯片220内的半导体器件,第二芯片220内的半导体器件的信号也可以快速传输至外部,因此,可以有效降低信号传输路径的长度。Similarly, the second contact pad 221 is disposed on the front surface of the second chip 220, which allows external signals to be quickly transmitted to the semiconductor device in the second chip 220 via the first substrate pad 110. The semiconductor device in the second chip 220 The signal can also be quickly transmitted to the outside, so the length of the signal transmission path can be effectively reduced.
当然,在其他实施例中,也可以第一接触垫212以及第二接触垫221的设置形式也可以与其不同。Of course, in other embodiments, the arrangement forms of the first contact pad 212 and the second contact pad 221 may also be different.
例如,请参阅图4中的第一叠层组200a,也可以设置第一接触垫212在第一芯片210的背面,且第二接触垫221在第二芯片220的背面。此时,第一芯片焊盘211设置在第一芯片210的正面。可以使得第一芯片焊盘211上的信号由第一通孔210a传输至与其连接的第一接触垫212。同时,该第一接触垫212可以通过在第一芯片210背面设置导电线路,而连接至另一第一接触垫212。第一芯片210以及第二芯片220可以在该另一第一接触垫212两侧形成均形成第二通孔20b,且通过第二通孔20b,将信号再引至第一芯片210以及第二芯片220的正面。此时,亦可以保证第一芯片210与第二芯片220内的半导体器件的接收信号或者输出信号的传输时间一致。For example, please refer to the first stack group 200a in FIG. 4 , the first contact pad 212 can also be disposed on the back of the first chip 210 , and the second contact pad 221 can be disposed on the back of the second chip 220 . At this time, the first chip bonding pad 211 is provided on the front side of the first chip 210 . The signal on the first chip pad 211 can be transmitted from the first through hole 210a to the first contact pad 212 connected thereto. At the same time, the first contact pad 212 can be connected to another first contact pad 212 by providing conductive traces on the back of the first chip 210 . The first chip 210 and the second chip 220 may form second through holes 20b on both sides of the other first contact pad 212, and through the second through holes 20b, signals can be led to the first chip 210 and the second chip 220. The front side of chip 220. At this time, it can also be ensured that the transmission time of the received signal or the output signal of the semiconductor devices in the first chip 210 and the second chip 220 is consistent.
或者,在一些实施例中,请参阅图5中的第一叠层组200a,也可以设置第一接触垫212位于第一芯片210背面,第二接触垫221位于第二芯片220正面。此时,第一芯片焊盘211设置在第一芯片210的正面,从而可以直接通过正面的导电线路与第一芯片210内的半导体器件进行信号传输。同时,第一芯片焊盘211可以通过第一通孔210a内的第一导电互连结构213、第一接触垫212、第二接触垫221而与第二芯片220内的半导体器件进行信号传输。Alternatively, in some embodiments, please refer to the first stack group 200a in FIG. 5 , the first contact pad 212 can also be provided on the back side of the first chip 210 , and the second contact pad 221 can be provided on the front side of the second chip 220 . At this time, the first chip bonding pad 211 is disposed on the front side of the first chip 210, so that signals can be directly transmitted to the semiconductor device in the first chip 210 through the conductive lines on the front side. At the same time, the first chip pad 211 can perform signal transmission with the semiconductor device in the second chip 220 through the first conductive interconnection structure 213, the first contact pad 212, and the second contact pad 221 in the first through hole 210a.
此时,相对于第一芯片210,第二芯片220的信号传输路径中主要增加了多了第一通孔210a内的第一导电互连结构213。但是,芯片厚度相对较薄,其远小于打引线的长度。即第一通孔210a的长度远小于打引线的长度。因此,第一通孔210a内的第一导电互连结构213对传输信号传输影响作用较小。因此,此时,第一芯片210与第二芯片220的信号
传输时间一致性,也会相对于传统技术而有所改善。At this time, compared to the first chip 210, the signal transmission path of the second chip 220 mainly includes the first conductive interconnection structure 213 in the first through hole 210a. However, the chip thickness is relatively thin, which is much smaller than the length of the lead wire. That is, the length of the first through hole 210a is much shorter than the length of the lead wire. Therefore, the first conductive interconnection structure 213 in the first through hole 210a has less influence on transmission signal transmission. Therefore, at this time, the signals of the first chip 210 and the second chip 220 Transmission time consistency will also be improved relative to traditional technology.
或者,在一些实施例中,请参阅图6中的第一叠层组200a,设置第一接触垫212位于第一芯片210正面,第二接触垫221位于第二芯片220背面。此时,第一芯片焊盘211设置在第一芯片210的背面,其可以通过第一通孔210a内的第一导电互连结构213、第一接触垫212而与第一芯片210内的半导体器件进行信号传输。同时,第二芯片220内可以设置第二通孔20b,以连通至第二接触垫221,且与第二通孔内形成第二导电互连结构。此时,第一芯片焊盘211可以通过第一通孔210a内的第一导电互连结构213、第一接触垫212、第二接触垫221、第二通孔20b内的第二导电互连结构,而与第二芯片220内的半导体器件进行信号传输。Alternatively, in some embodiments, referring to the first stacked group 200a in FIG. 6 , the first contact pad 212 is located on the front side of the first chip 210 and the second contact pad 221 is located on the back side of the second chip 220 . At this time, the first chip bonding pad 211 is provided on the back side of the first chip 210, and can communicate with the semiconductor in the first chip 210 through the first conductive interconnection structure 213 and the first contact pad 212 in the first through hole 210a. device for signal transmission. At the same time, a second through hole 20b may be provided in the second chip 220 to be connected to the second contact pad 221 and form a second conductive interconnection structure with the second through hole. At this time, the first chip pad 211 can pass through the first conductive interconnection structure 213 in the first through hole 210a, the first contact pad 212, the second contact pad 221, and the second conductive interconnection in the second through hole 20b. structure to perform signal transmission with the semiconductor device in the second chip 220 .
此时,相对于第一芯片210,第二芯片220的信号传输路径中主要增加了多了第二通孔内的第二导电互连结构。但是,芯片厚度相对较薄,其远小于打引线的长度。即第二通孔的长度远小于打引线的长度。因此,第二通孔内的第二导电互连结构对传输信号传输影响作用较小。因此,此时,第一芯片210与第二芯片220的信号传输时间一致性,也会相对于传统技术而有所改善。At this time, compared to the first chip 210 , the second conductive interconnection structure in the second through hole is mainly added to the signal transmission path of the second chip 220 . However, the chip thickness is relatively thin, which is much smaller than the length of the lead wire. That is, the length of the second through hole is much shorter than the length of the lead wire. Therefore, the second conductive interconnection structure in the second through hole has less influence on transmission signal transmission. Therefore, at this time, the signal transmission time consistency between the first chip 210 and the second chip 220 will also be improved compared to the traditional technology.
在一个实施例中,请参阅图9,封装基板100内部还设有打线孔100b,打线孔100b位于凹槽100a下方,且与凹槽100a连通。In one embodiment, please refer to FIG. 9 , the packaging substrate 100 is also provided with wiring holes 100b inside, and the wiring holes 100b are located below the groove 100a and connected with the groove 100a.
此时,封装基板100的两面均可以进行打线连接,从而可以使得打线更加的灵活。At this time, both sides of the packaging substrate 100 can be connected by wire bonding, thereby making the wire bonding more flexible.
在一个实施例中,请参阅图1或图2,叠层芯片组200包括堆叠设置的第一叠层组200a以及第二叠层组200b。In one embodiment, please refer to FIG. 1 or FIG. 2 , the stacked chipset 200 includes a first stacked group 200a and a second stacked group 200b arranged in a stack.
第二叠层组200b的第一芯片210粘接于凹槽100a底部。The first chip 210 of the second lamination group 200b is bonded to the bottom of the groove 100a.
具体地,可以通过导电胶将第二叠层组200b的第一芯片210粘接于凹槽100a底部。导电胶中有银组分,是热的良导体,具有良好的散热性能。因此,此时,连接第二叠层组200b的第一芯片210与封装基板100的同时,还可以兼顾散热性能。当然,也可以通过非导电胶将第二叠层组200b的第一芯片210粘接于凹槽100a底部,这里对此并不做限定。Specifically, the first chip 210 of the second stack group 200b can be bonded to the bottom of the groove 100a through conductive glue. Conductive adhesive contains silver components, which are good conductors of heat and have good heat dissipation properties. Therefore, at this time, while connecting the first chip 210 of the second stacked group 200b and the packaging substrate 100, the heat dissipation performance can also be taken into consideration. Of course, the first chip 210 of the second stacked group 200b can also be bonded to the bottom of the groove 100a through non-conductive glue, which is not limited here.
同时,第一叠层组200a的第二芯片220与第二叠层组200b的第二芯片220连接,从而将第一叠层组200a与第二叠层组200b堆叠在一起。At the same time, the second chip 220 of the first stacked group 200a is connected to the second chip 220 of the second stacked group 200b, so that the first stacked group 200a and the second stacked group 200b are stacked together.
作为示例,可以设置封装结构包括粘接层400。粘接层可以为DAF(Die attach film,芯片粘接薄膜)层。As an example, the packaging structure may be provided to include an adhesive layer 400 . The adhesive layer may be a DAF (Die attach film) layer.
第一叠层组200a的第二芯片220位于粘接层400的一侧,第二叠层组200b的第二芯片220位于粘接层400的另一侧。通过粘接层400可以将第一叠层组200a与第二叠层组200b可靠连接。当然,也可以通过其他方式(例如键合方式)将第一叠层组200a与第二叠层组200b连接。这里对此并不做限定。The second chip 220 of the first laminated group 200a is located on one side of the adhesive layer 400, and the second chip 220 of the second laminated group 200b is located on the other side of the adhesive layer 400. The first laminate group 200a and the second laminate group 200b can be reliably connected through the adhesive layer 400. Of course, the first laminate group 200a and the second laminate group 200b can also be connected through other methods (such as bonding methods). This is not limited here.
此时,第一叠层组200a与第二叠层组200b可以连接不同的信号通道的不同基板焊盘。At this time, the first stacked group 200a and the second stacked group 200b can be connected to different substrate pads of different signal channels.
具体地,此时,第一基板焊盘110包括第一焊盘111以及第二焊盘112。Specifically, at this time, the first substrate pad 110 includes a first pad 111 and a second pad 112 .
第一焊盘111位于封装基板100的正面,从而为第一叠层组200a内的芯片提供信号,或者接收第一叠层组200a内的芯片上的信号。第二焊盘112位于封装基板100的背面,从而为第二叠层组200b内的芯片提供信号,或者接收第二叠层组200b内的芯片上的信号。
The first pad 111 is located on the front side of the package substrate 100 to provide signals to the chips in the first stack group 200a or to receive signals on the chips in the first stack group 200a. The second pad 112 is located on the back side of the package substrate 100 to provide signals to the chips in the second stack group 200b or to receive signals on the chips in the second stack group 200b.
具体地,请参阅图7,第一基板焊盘110可以包括多个第一焊盘111以及对应的多个第二焊盘112。Specifically, referring to FIG. 7 , the first substrate pad 110 may include a plurality of first pads 111 and a corresponding plurality of second pads 112 .
多个第一焊盘111可以传输多个不同信号,每个第一焊盘111均独立传输一个信号。经过同一第一焊盘111传输的同一信号,可以同时提供给第一叠层组200a中的第一芯片210与第二芯片220。The plurality of first bonding pads 111 can transmit multiple different signals, and each first bonding pad 111 independently transmits a signal. The same signal transmitted through the same first pad 111 can be provided to the first chip 210 and the second chip 220 in the first stack group 200a at the same time.
类似地,多个第二焊盘112可以传输多个不同信号,每个第一焊盘112均独立传输一个信号。经过同一第二焊盘112传输的同一信号,可以同时提供给第二叠层组200b中的第一芯片210与第二芯片220。Similarly, the plurality of second bonding pads 112 may transmit a plurality of different signals, with each first bonding pad 112 independently transmitting a signal. The same signal transmitted through the same second pad 112 can be provided to the first chip 210 and the second chip 220 in the second stack group 200b at the same time.
打引线300包括第一引线310以及第二引线320。The lead wire 300 includes a first lead wire 310 and a second lead wire 320 .
第一引线310连接第一焊盘111与第一叠层组200a的第一芯片焊盘211,从而实现第一焊盘111与第一叠层组200a内的芯片的信号传输。The first lead 310 connects the first bonding pad 111 to the first chip bonding pad 211 of the first stacked group 200a, thereby realizing signal transmission between the first bonding pad 111 and the chips in the first stacked group 200a.
第二引线320穿过打线孔100b而连接第二焊盘112与第二叠层组200b的第一芯片焊盘211,从而实现第二焊盘112与第二叠层组200b内的芯片的信号传输。具体地,封装结构可以设置多个第二焊盘112,多个第二焊盘112连接的打引线300可以穿过同一打线孔100b而与第二叠层组200b的相应第一芯片焊盘211。The second lead 320 passes through the wiring hole 100b to connect the second bonding pad 112 and the first chip bonding pad 211 of the second stacked group 200b, thereby realizing the connection between the second bonding pad 112 and the chip in the second stacked group 200b. Signal transmission. Specifically, the package structure may be provided with a plurality of second bonding pads 112, and the bonding wires 300 connected to the plurality of second bonding pads 112 may pass through the same bonding hole 100b and be connected to the corresponding first chip bonding pad of the second stack group 200b. 211.
在本实施例中,每组叠层芯片组的第一芯片210以及第二芯片220之间的信号传输路径的长度均基本一致。同时,将两组叠层芯片组(第一叠层组200a以及第二叠层组200b)连接,此时可以在有效改善信号时间延迟问题的同时,有效提高封装集成度。In this embodiment, the lengths of the signal transmission paths between the first chip 210 and the second chip 220 of each stacked chip set are basically the same. At the same time, the two stacked chip groups (the first stacked group 200a and the second stacked group 200b) are connected, which can effectively improve the signal time delay problem and effectively increase the packaging integration level.
同时,打线孔100b的设置使得两组叠层芯片组均可以就近与封装基板100上的第一基板焊盘110连接,从而简便有效进行信号传输。At the same time, the arrangement of the wiring holes 100b allows both sets of stacked chips to be connected to the first substrate pad 110 on the packaging substrate 100 at a nearby location, thereby enabling simple and effective signal transmission.
在一个实施例中,请参阅图1,封装基板100还包括第二基板焊盘120以及基板通孔100c。In one embodiment, referring to FIG. 1 , the package substrate 100 further includes a second substrate pad 120 and a substrate through hole 100c.
第二基板焊盘120位于封装基板100的背面,其与第一基板焊盘110中的第二焊盘112位于封装基板100的同一面,可以同时加工形成。The second substrate pad 120 is located on the back side of the packaging substrate 100, and is located on the same surface of the packaging substrate 100 as the second pad 112 of the first substrate pad 110, and can be processed and formed at the same time.
同时,第二基板焊盘120通过基板通孔100c与第一基板焊盘110的第一焊盘111连接,从而可将信号引入至第一焊盘111,或者接收第一焊盘111上的信号。At the same time, the second substrate pad 120 is connected to the first pad 111 of the first substrate pad 110 through the substrate through hole 100c, so that the signal can be introduced to the first pad 111 or the signal on the first pad 111 can be received. .
具体地,基板通孔100c内可以设置第三导电互连结构130,第三导电互连结构130连接第二基板焊盘120与第一基板焊盘110的第一焊盘111。Specifically, a third conductive interconnection structure 130 may be disposed in the substrate through hole 100c, and the third conductive interconnection structure 130 connects the second substrate pad 120 and the first pad 111 of the first substrate pad 110 .
此时,封装基板100上还可以设有第一焊球140与第二焊球150。第一焊球140可以位于第一基板焊盘110的第二焊盘112下,第二焊球150可以位于第二基板焊盘120下。通过第一焊球140与第二焊球150可以将封装结构焊接在印刷电路板上,从而与外部电路连接。At this time, the first solder ball 140 and the second solder ball 150 may also be provided on the package substrate 100 . The first solder ball 140 may be located under the second pad 112 of the first substrate pad 110 , and the second solder ball 150 may be located under the second substrate pad 120 . The package structure can be soldered to the printed circuit board through the first solder ball 140 and the second solder ball 150 to connect with an external circuit.
作为示例,可以设置第二引线320的长度大于第一引线310的长度。As an example, the length of the second lead wire 320 may be set to be greater than the length of the first lead wire 310 .
对于第一叠层组200a,其信号传输路径中,第二焊球150依次通过第二基板焊盘120、基板通孔100c内的第三导电互连结构130、第一焊盘111、第一引线310而与第一芯片焊盘211连接,从而与第一叠层组200a的第一芯片210以及第二芯片220之间进行信号传输。
For the first stacked group 200a, in its signal transmission path, the second solder ball 150 sequentially passes through the second substrate pad 120, the third conductive interconnection structure 130 in the substrate through hole 100c, the first pad 111, the first The lead 310 is connected to the first chip pad 211 to perform signal transmission with the first chip 210 and the second chip 220 of the first stacked group 200a.
对于第二叠层组200b,其信号传输路径中,第一焊球140依次通过第二焊盘112、第二引线320而与第一芯片焊盘211连接,从而与第二叠层组200b的第一芯片210以及第二芯片220之间进行信号传输。For the second stacked group 200b, in its signal transmission path, the first solder ball 140 is connected to the first chip pad 211 through the second pad 112 and the second lead 320, thereby connecting with the second stacked group 200b. Signal transmission is performed between the first chip 210 and the second chip 220 .
第一叠层组200a的信号传输路径中,需要第二基板焊盘120与基板通孔100c内的第三导电互连结构130将第二焊球150上的信号引至第一焊盘111。而第二叠层组200b的信号传输路径中,不需要第二基板焊盘120与基板通孔100c内的第三导电互连结构130将第一焊球140上的信号引至第二焊盘112。In the signal transmission path of the first stacked group 200a, the second substrate pad 120 and the third conductive interconnection structure 130 in the substrate through hole 100c are required to guide the signal on the second solder ball 150 to the first pad 111. In the signal transmission path of the second stacked group 200b, there is no need for the second substrate pad 120 and the third conductive interconnection structure 130 in the substrate through hole 100c to guide the signal on the first solder ball 140 to the second pad. 112.
此时,设置第二引线320的长度大于第一引线310的长度,可以便于使得堆叠在一起的两组叠层芯片组(第一叠层组200a以及第二叠层组200b)之间的信号传输路径的长度均基本一致,从而可以更加有效改善信号时间延迟问题。At this time, setting the length of the second lead 320 to be greater than the length of the first lead 310 can facilitate signal transmission between the two stacked chip groups (the first stacked group 200a and the second stacked group 200b). The lengths of the transmission paths are basically the same, which can more effectively improve the signal time delay problem.
具体地,可以配合调整封装基板100的厚度、打线孔100b的厚度等来实现两组叠层芯片组(第一叠层组200a以及第二叠层组200b)之间的信号传输路径的长度均基本一致。Specifically, the thickness of the packaging substrate 100, the thickness of the wiring hole 100b, etc. can be adjusted to achieve the length of the signal transmission path between the two stacked chip groups (the first stacked group 200a and the second stacked group 200b). are basically consistent.
在一个实施例中,请参阅图2,封装基板100内部设有导电层160。导电层160包括第一导电部161以及第二导电部162。第一导电部161可以通过其上方的互连孔连接第一焊盘111。第二导电部162可以通过其下方的互连孔连接第二焊盘112。In one embodiment, please refer to FIG. 2 , a conductive layer 160 is provided inside the packaging substrate 100 . The conductive layer 160 includes a first conductive part 161 and a second conductive part 162 . The first conductive part 161 may be connected to the first pad 111 through an interconnection hole above it. The second conductive part 162 may be connected to the second pad 112 through an interconnection hole thereunder.
具体地,封装基板100上还可以设有第三基板焊盘170。第三基板焊盘170下方可以设有第三焊球180。第三焊球180可以将封装结构焊接在印刷电路板上,从而与外部电路连接。同时,第三基板焊盘170可以通过互连孔连接第一导电部161以及第二导电部162,从而可以从导电层160上获取信号,或者向导电层160传输信号。Specifically, the packaging substrate 100 may also be provided with a third substrate pad 170 . A third solder ball 180 may be provided under the third substrate pad 170 . The third solder ball 180 can solder the package structure to the printed circuit board to connect with external circuits. At the same time, the third substrate pad 170 can connect the first conductive part 161 and the second conductive part 162 through the interconnection hole, so that signals can be obtained from the conductive layer 160 or signals can be transmitted to the conductive layer 160 .
此时,对于第一叠层组200a,其信号传输路径中,第三焊球180依次通过第三基板焊盘170、第一导电部161、第一焊盘111、第一引线310而与第一芯片焊盘211连接,从而与第一叠层组200a的第一芯片210以及第二芯片220之间进行信号传输。At this time, for the first stacked group 200a, in the signal transmission path, the third solder ball 180 passes through the third substrate pad 170, the first conductive part 161, the first pad 111, and the first lead 310 in order to connect with the first lead 310. A chip pad 211 is connected to perform signal transmission with the first chip 210 and the second chip 220 of the first stack group 200a.
对于第二叠层组200b,其信号传输路径中,第三焊球180依次通过第三基板焊盘170、第二导电部162、第二焊盘112、第二引线320而与第一芯片焊盘211连接,从而与第二叠层组200b的第一芯片210以及第二芯片220之间进行信号传输。For the second stacked group 200b, in its signal transmission path, the third solder ball 180 passes through the third substrate pad 170, the second conductive part 162, the second pad 112, and the second lead 320 in order to be bonded to the first chip. The disk 211 is connected to perform signal transmission with the first chip 210 and the second chip 220 of the second stacked group 200b.
作为示例,导电层160与封装基板100正面的距离可以为第一距离。同时,导电层160与封装基板100背面的距离为第二距离。可以设置第一距离等于第二距离。同时,第二引线320的长度等于第一引线310的长度。As an example, the distance between the conductive layer 160 and the front surface of the packaging substrate 100 may be a first distance. At the same time, the distance between the conductive layer 160 and the back surface of the packaging substrate 100 is the second distance. The first distance may be set equal to the second distance. At the same time, the length of the second lead 320 is equal to the length of the first lead 310 .
此时,也可以将实现堆叠在一起的两组叠层芯片组(第一叠层组200a以及第二叠层组200b)之间的信号传输路径的长度均基本一致,从而可以更加有效改善信号时间延迟问题。At this time, the lengths of the signal transmission paths between the two stacked chip groups (the first stacked group 200a and the second stacked group 200b) can also be basically the same, so that the signal can be improved more effectively. Time delay issue.
当然,第一距离与第二距离之间也可以具有一定偏差。此时可以将二者之差控制在第一预设范围内,从而有效控制信号时间延迟问题。第一预设范围可以根据实际要求设定。Of course, there may also be a certain deviation between the first distance and the second distance. At this time, the difference between the two can be controlled within the first preset range, thereby effectively controlling the signal time delay problem. The first preset range can be set according to actual requirements.
第二引线320的长度与第一引线310的长度之间也可以具有一定偏差。此时可以将二者之差控制在第二预设范围内,从而有效控制信号时间延迟问题。第二预设范围可以根据实际要求设定。There may also be a certain deviation between the length of the second lead 320 and the length of the first lead 310 . At this time, the difference between the two can be controlled within the second preset range, thereby effectively controlling the signal time delay problem. The second preset range can be set according to actual requirements.
在一个实施例中,请参阅图3,叠层芯片组200包括堆叠设置的第一叠层组200a以及
第三叠层组200c。第一叠层组200a与第三叠层组200c的第一芯片焊盘211相互键合。In one embodiment, referring to FIG. 3 , the stacked chipset 200 includes a stacked first stacked set 200a and The third stack group 200c. The first chip pads 211 of the first laminate group 200a and the third laminate group 200c are bonded to each other.
具体地,此时,第一叠层组200a与第三叠层组200c的第一芯片焊盘211可以直接键合,也可以通过焊料等形成的凸点键合(未图示)。当采用凸点键合方式时,键合前,可以在第一叠层组200a的第一芯片焊盘211上形成凸点,也可以在第三叠层组200c的第一芯片焊盘211上形成凸点,也可以在二者上均形成凸点。Specifically, at this time, the first chip pads 211 of the first stacked group 200a and the third stacked group 200c may be directly bonded, or may be bonded through bumps formed of solder or the like (not shown). When bump bonding is used, bumps may be formed on the first chip pad 211 of the first stack group 200a before bonding, or may be formed on the first chip pad 211 of the third stack group 200c. Bumps can be formed on both.
同时,作为示例,第一叠层组200a的第一芯片210,在设有第一芯片焊盘211的一侧还可以设有第三介质层215。同时,第三叠层组200c的第一芯片210,在设有第一芯片焊盘211的一侧也可以设有第三介质层215。此时,第一叠层组200a与第三叠层组200c的第一芯片焊盘211相互键合的同时,二者的第三介质层215也可以同时键合,从而将第一叠层组200a与第三叠层组200c可靠地连接在一起。Meanwhile, as an example, the first chip 210 of the first stacked group 200a may also be provided with a third dielectric layer 215 on the side where the first chip pad 211 is provided. At the same time, the first chip 210 of the third stacked group 200c may also be provided with a third dielectric layer 215 on the side where the first chip pad 211 is provided. At this time, while the first chip pads 211 of the first stacked group 200a and the third stacked group 200c are bonded to each other, the third dielectric layers 215 of the two can also be bonded at the same time, so that the first stacked group is 200a and the third stack group 200c are reliably connected together.
同时,第一叠层组200a的第一芯片焊盘211可以用于进行打线连接,其长度可以大于第三叠层组200c的第一芯片焊盘211的长度,从而使得第一叠层组200a的第一芯片焊盘211上的同一第一芯片焊盘211在进行键合的同时,还可以方便地用于进行打线连接。At the same time, the first chip pad 211 of the first stack group 200a can be used for wire bonding, and its length can be greater than the length of the first chip pad 211 of the third stack group 200c, so that the first stack group The same first chip pad 211 on the first chip pad 211 of 200a can also be conveniently used for wire bonding while bonding.
此时,在封装结构制备过程中,可以将第三叠层组200c的边缘切除,从而漏出第一叠层组200a的第一芯片焊盘211,而用于打线。可以将第三叠层组200c边缘的第三介质层215去除,从而露出第一叠层组200a的第一芯片焊盘211,而用于打线。At this time, during the preparation process of the packaging structure, the edge of the third stack group 200c can be cut off, thereby exposing the first chip pad 211 of the first stack group 200a for wiring. The third dielectric layer 215 at the edge of the third stack group 200c can be removed, thereby exposing the first chip pad 211 of the first stack group 200a for wiring.
在本实施例中,通过将第一叠层组200a与第三叠层组200c的第一芯片焊盘211相互键合,从而可将二者堆叠。同时,相互键合的第一芯片焊盘211可以使得堆叠在一起的第一叠层组200a与第三叠层组200c之间的信号传输路径的长度均基本一致。此时,既可有效改善信号时间延迟问题,又可以有效提高封装集成度。In this embodiment, by bonding the first chip pads 211 of the first stacked group 200a and the third stacked group 200c to each other, they can be stacked. At the same time, the mutually bonded first chip pads 211 can make the lengths of the signal transmission paths between the stacked first stack group 200a and the third stack group 200c substantially consistent. At this time, the signal time delay problem can be effectively improved, and the packaging integration level can be effectively improved.
这里,可以理解的是,在图中示意的封装结构同时包括第一叠层组200a、第二叠层组200b以及第三叠层组200c。但是,在一些实施例中,封装结构也可以只包括第一叠层组200a与第三叠层组200c。Here, it can be understood that the package structure illustrated in the figure simultaneously includes a first stack group 200a, a second stack group 200b, and a third stack group 200c. However, in some embodiments, the packaging structure may also include only the first stack group 200a and the third stack group 200c.
在一个实施例中,请参阅图1,封装结构还包括封装层500。封装层500覆盖叠层芯片组200以及打引线300,从而对叠层芯片组200内的芯片以及打引线300进行隔氧隔水处理,进而对其进行保护。In one embodiment, referring to FIG. 1 , the packaging structure further includes an packaging layer 500 . The encapsulation layer 500 covers the stacked chipset 200 and the lead wires 300, thereby insulating oxygen and water to the chips in the stacked chipset 200 and the lead wires 300, thereby protecting them.
在一个实施例中,请参阅图8,还提供一种封装结构的制备方法,包括:In one embodiment, referring to Figure 8, a method for preparing a packaging structure is also provided, including:
步骤S10,请参阅图9以及图10,提供第一晶片10、第二晶片20以及封装基板100,第一晶片10包括多个第一芯片210,第一芯片210的一面设有第一接触垫212,第二晶片20包括多个第二芯片220,第二芯片220的一面设有第二接触垫221,封装基板100内部设有凹槽100a,且包括第一基板焊盘110;Step S10, please refer to FIG. 9 and FIG. 10 to provide a first wafer 10, a second wafer 20 and a packaging substrate 100. The first wafer 10 includes a plurality of first chips 210, and a first contact pad is provided on one side of the first chip 210. 212. The second chip 20 includes a plurality of second chips 220. The second chip 220 is provided with a second contact pad 221 on one side. The package substrate 100 is provided with a groove 100a inside and includes the first substrate pad 110;
步骤S20,请参阅图10,通过第一接触垫221与第二接触垫212,将第一晶片10与第二晶片20键合,且于第一芯片210内形成第一通孔210a,且于第一通孔210a内形成第一导电互连结构213,并于第一芯片210的另一面形成第一芯片焊盘211,第一通孔210a连通至第一接触垫212,第一芯片焊盘211电连接第一导电互连结构213;Step S20, please refer to FIG. 10, the first chip 10 and the second chip 20 are bonded through the first contact pad 221 and the second contact pad 212, and the first through hole 210a is formed in the first chip 210, and A first conductive interconnection structure 213 is formed in the first through hole 210a, and a first chip bonding pad 211 is formed on the other side of the first chip 210. The first through hole 210a is connected to the first contact pad 212, and the first chip bonding pad 211 electrically connects the first conductive interconnection structure 213;
步骤S30,请参阅图11,将键合在一起的第一晶片10与第二晶片20进行切割,从而形成叠层芯片组200;
Step S30, please refer to FIG. 11, cutting the first wafer 10 and the second wafer 20 bonded together to form a stacked chipset 200;
步骤S60,请参阅图1,将叠层芯片组200放置于凹槽100a内;Step S60, please refer to Figure 1, place the stacked chipset 200 in the groove 100a;
步骤S70,请参阅图1,通过打引线300连接第一基板焊盘110与第一芯片焊盘211。Step S70 , please refer to FIG. 1 , connecting the first substrate pad 110 and the first chip pad 211 through the lead wire 300 .
其中,在步骤S10中,请参阅图9,第一接触垫212、第二接触垫221的材料均可以包括金属材料,如Au、Ni、W、Cu、Al等。二者可以相同,也可以不同,这里对比不作限制。In step S10 , please refer to FIG. 9 . The materials of the first contact pad 212 and the second contact pad 221 may include metal materials, such as Au, Ni, W, Cu, Al, etc. The two can be the same or different, and there is no restriction on the comparison here.
作为示例,第一接触垫212位于第一芯片210的正面,第二接触垫221位于第二芯片220的正面。As an example, the first contact pad 212 is located on the front side of the first chip 210 , and the second contact pad 221 is located on the front side of the second chip 220 .
请参阅图9,封装基板100可以包括但不限于为陶瓷基板。例如,其还可以为玻璃基板等。封装基板100内部设有凹槽100a。凹槽100a可以通过对封装基板100进行机械加工形成。Referring to FIG. 9 , the packaging substrate 100 may include, but is not limited to, a ceramic substrate. For example, it may also be a glass substrate or the like. The package substrate 100 is provided with a groove 100a inside. The groove 100a may be formed by machining the package substrate 100.
在步骤S20中,请参阅图10,第一晶片10与第二晶片20的键合、第一通孔210a的形成、第一芯片焊盘211的形成的步骤之间并没有必然的顺序,可以根据需求进行选择。In step S20 , please refer to FIG. 10 . There is no necessary sequence between the steps of bonding the first wafer 10 and the second wafer 20 , forming the first through hole 210 a , and forming the first chip pad 211 . Choose based on your needs.
第一晶片10与第二晶片20的键合过程中,第二接触垫221与第一接触垫212可以直接键合,也可以通过焊料等形成的凸点键合(未图示)。当采用凸点键合方式时,键合前,可以在第二接触垫221上形成凸点,也可以在第一接触垫212上形成凸点,也可以在第二接触垫221与第一接触垫212上均形成凸点。During the bonding process of the first wafer 10 and the second wafer 20 , the second contact pad 221 and the first contact pad 212 may be bonded directly or through bumps formed by solder or the like (not shown). When bump bonding is used, bumps can be formed on the second contact pad 221 before bonding, bumps can also be formed on the first contact pad 212, or bumps can be formed between the second contact pad 221 and the first contact pad 212. Bumps are formed on the pads 212 .
作为示例,第一芯片210设有第一接触垫212的一面还可以设有第一介质层214,第二芯片220设有第二接触垫221的一面还可以设有第二介质层222。As an example, the side of the first chip 210 provided with the first contact pad 212 may also be provided with a first dielectric layer 214 , and the side of the second chip 220 provided with the second contact pad 221 may also be provided with a second dielectric layer 222 .
此时,第一晶片10与第二晶片20在通过第一接触垫212与第二接触垫221键合的同时,还可以通过第一介质层214与第二介质层222键合。At this time, while the first wafer 10 and the second wafer 20 are bonded through the first contact pad 212 and the second contact pad 221 , they can also be bonded through the first dielectric layer 214 and the second dielectric layer 222 .
同时,作为示例,第一通孔210a可以为硅通孔。第一通孔210a内填充的第一导电互连结构213材料也可以包括金属材料,如Au、Ni、W、Cu、Al等。Meanwhile, as an example, the first through hole 210a may be a through silicon via. The material of the first conductive interconnection structure 213 filled in the first through hole 210a may also include metal materials, such as Au, Ni, W, Cu, Al, etc.
同时,第一芯片焊盘211材料也可以包括金属材料,如Au、Ni、W、Cu、Al等。At the same time, the material of the first chip pad 211 may also include metal materials, such as Au, Ni, W, Cu, Al, etc.
作为示例,第一芯片焊盘211可以覆盖第一通孔210a,从而使得第一芯片焊盘211与第一导电互连结构213可以直接连接。当然,第一芯片焊盘211与第一导电互连结构213也可以通过其他的导电线路连接,这里对此不作限制。As an example, the first chip pad 211 may cover the first through hole 210a, so that the first chip pad 211 and the first conductive interconnection structure 213 may be directly connected. Of course, the first chip pad 211 and the first conductive interconnection structure 213 can also be connected through other conductive lines, which is not limited here.
在步骤S30中,请参阅图11,进行切割处理之后,可以形成多个叠层芯片组200。In step S30 , please refer to FIG. 11 , after performing the cutting process, multiple stacked chip sets 200 may be formed.
在步骤S60,请参阅图1,可以通过导电胶或非导电胶,将叠层芯片组200粘接于凹槽100a内。In step S60 , please refer to FIG. 1 , the stacked chipset 200 can be bonded in the groove 100 a through conductive glue or non-conductive glue.
在步骤S70中,请参阅图1,进行打线工艺,形成连接第一基板焊盘110与第一芯片焊盘211的打引线。In step S70 , referring to FIG. 1 , a wiring process is performed to form a wiring line connecting the first substrate pad 110 and the first chip pad 211 .
步骤S70之后,还可以包括:After step S70, it may also include:
步骤S80,于所述叠层芯片组200以及所述打引线300上形成封装层500。Step S80 , forming a packaging layer 500 on the stacked chipset 200 and the lead wires 300 .
在本实施例中,同一第一基板焊盘110与其连接的第一芯片210以及第二芯片220之间的信号传输路径的长度基本一致,从而可以有效改善时间延迟问题。In this embodiment, the lengths of the signal transmission paths between the same first substrate pad 110 and the first chip 210 and the second chip 220 connected thereto are basically the same, thereby effectively improving the time delay problem.
同时,在本实施例中,由于叠层芯片组200放置于封装基板100的凹槽100a内,从而从可以有效降低第一芯片210上的第一芯片焊盘211与封装基板100上的第一基板焊盘
110之间的高度差。此时,连接第一芯片焊盘211与第一基板焊盘110的打引线300的长度可以被有效降低,从而减少了第一基板焊盘110与其连接的第一芯片210以及第二芯片220之间的信号传输路径的长度,从而有效降低了信号传输路径中的电阻。At the same time, in this embodiment, since the stacked chipset 200 is placed in the groove 100a of the packaging substrate 100, the first chip pad 211 on the first chip 210 and the first chip pad 211 on the packaging substrate 100 can be effectively reduced. Substrate Pad height difference between 110. At this time, the length of the lead wire 300 connecting the first chip bonding pad 211 and the first substrate bonding pad 110 can be effectively reduced, thereby reducing the length of the first chip 210 and the second chip 220 connected to the first substrate bonding pad 110. The length of the signal transmission path between them effectively reduces the resistance in the signal transmission path.
在一个实施例中,请参阅图9,封装基板100内部还设有打线孔100b,打线孔100b位于凹槽100a下方,且与凹槽100a连通。In one embodiment, please refer to FIG. 9 , the packaging substrate 100 is also provided with wiring holes 100b inside, and the wiring holes 100b are located below the groove 100a and connected with the groove 100a.
同时,叠层芯片组200包括第一叠层组200a以及第二叠层组200b。第一叠层组200a以及第二叠层组200b可以为步骤S30进行切割处理后形成的多个叠层芯片组200中的其中两个。Meanwhile, the stacked chipset 200 includes a first stacked group 200a and a second stacked group 200b. The first stacked group 200a and the second stacked group 200b may be two of the plurality of stacked chip groups 200 formed after the cutting process in step S30.
第一基板焊盘110包括第一焊盘111以及第二焊盘112。第一焊盘111位于封装基板100的正面,第二焊盘112位于封装基板100的背面。打引线300包括第一引线310以及第二引线320。The first substrate pad 110 includes a first pad 111 and a second pad 112 . The first bonding pad 111 is located on the front side of the packaging substrate 100 , and the second bonding pad 112 is located on the back side of the packaging substrate 100 . The lead wire 300 includes a first lead wire 310 and a second lead wire 320 .
同时,请参阅图1,步骤S30之后,还包括:At the same time, please refer to Figure 1. After step S30, it also includes:
步骤S40,将第一叠层组200a的第二芯片220与第二叠层组200b的第二芯片220连接。作为示例,可以通过粘接层400将二者连接。Step S40: Connect the second chip 220 of the first stacked group 200a to the second chip 220 of the second stacked group 200b. As an example, the two may be connected through an adhesive layer 400 .
步骤S60,包括:将第二叠层组200b的第一芯片210粘接于凹槽100a底部。Step S60 includes: bonding the first chip 210 of the second stack group 200b to the bottom of the groove 100a.
步骤S70,包括:Step S70 includes:
步骤S71,通过第一引线310连接第一焊盘111与第一叠层组200a的第一芯片焊盘211;Step S71, connect the first bonding pad 111 and the first chip bonding pad 211 of the first stacked group 200a through the first lead 310;
步骤S72,通过第二引线320穿过打线孔100b而连接第二焊盘112与第二叠层组200b的第一芯片焊盘211。Step S72: Connect the second bonding pad 112 to the first chip bonding pad 211 of the second stacked group 200b by passing the second lead wire 320 through the wiring hole 100b.
其中,步骤S71与步骤S72之间没有必然的顺序,可以根据实际情况进行设置。There is no necessary sequence between step S71 and step S72 and can be set according to the actual situation.
具体地,作为示例,封装基板100还可以包括第二基板焊盘120以及基板通孔100c。第二基板焊盘120位于封装基板100的背面,其与第一基板焊盘110中的第二焊盘112位于封装基板100的同一面,可以同时加工形成。Specifically, as an example, the package substrate 100 may further include a second substrate pad 120 and a substrate through hole 100c. The second substrate pad 120 is located on the back side of the packaging substrate 100, and is located on the same surface of the packaging substrate 100 as the second pad 112 of the first substrate pad 110, and can be processed and formed at the same time.
同时,第二基板焊盘120通过基板通孔100c与第一基板焊盘110的第一焊盘111连接,从而可将信号引入至第一焊盘111,或者接收第一焊盘111上的信号。At the same time, the second substrate pad 120 is connected to the first pad 111 of the first substrate pad 110 through the substrate through hole 100c, so that the signal can be introduced to the first pad 111 or the signal on the first pad 111 can be received. .
具体地,基板通孔100c内可以设置第三导电互连结构130,第三导电互连结构130连接第二基板焊盘120与第一基板焊盘110的第一焊盘111。Specifically, a third conductive interconnection structure 130 may be disposed in the substrate through hole 100c, and the third conductive interconnection structure 130 connects the second substrate pad 120 and the first pad 111 of the first substrate pad 110 .
此时,可以设置第二引线320的长度大于第一引线310的长度,配合调整封装基板厚度、打线孔100b的厚度等,来实现堆叠在一起的两组叠层芯片组(第一叠层组200a以及第二叠层组200b)之间的信号传输路径的长度均基本一致,从而可以更加有效改善信号时间延迟问题。At this time, the length of the second lead 320 can be set to be greater than the length of the first lead 310, and the thickness of the packaging substrate, the thickness of the wiring hole 100b, etc. can be adjusted to realize two sets of stacked chips (the first stack). The lengths of the signal transmission paths between the group 200a and the second stacked group 200b) are basically the same, so that the signal time delay problem can be more effectively improved.
在一个实施例中,叠层芯片组200包括第一叠层组200a以及第三叠层组200c。第一叠层组200a以及第三叠层组200c可以为步骤S30进行切割处理后形成的多个叠层芯片组200中的其中两个。In one embodiment, the stacked chipset 200 includes a first stacked group 200a and a third stacked group 200c. The first stacked group 200a and the third stacked group 200c may be two of the plurality of stacked chip groups 200 formed after the cutting process in step S30.
同时,请参阅图3,步骤S30之后,还包括:At the same time, please refer to Figure 3. After step S30, it also includes:
步骤S50,将第一叠层组200a的第一芯片焊盘211与第三叠层组200c的第一芯片焊
盘211键合。Step S50: Bond the first chip pad 211 of the first stack group 200a to the first chip of the third stack group 200c. Disk 211 bonding.
作为示例,第一叠层组200a的第一芯片210,在设有第一芯片焊盘211的一侧还可以设有第三介质层215。同时,第三叠层组200c的第一芯片210,在设有第一芯片焊盘211的一侧也可以设有第三介质层215。此时,第一叠层组200a与第三叠层组200c的第一芯片焊盘211相互键合的同时,二者的第三介质层215也可以同时键合,从而将第一叠层组200a与第三叠层组200c可靠地连接在一起。As an example, the first chip 210 of the first stack group 200a may also be provided with a third dielectric layer 215 on the side where the first chip pad 211 is provided. At the same time, the first chip 210 of the third stacked group 200c may also be provided with a third dielectric layer 215 on the side where the first chip pad 211 is provided. At this time, while the first chip pads 211 of the first stacked group 200a and the third stacked group 200c are bonded to each other, the third dielectric layers 215 of the two can also be bonded at the same time, so that the first stacked group is 200a and the third stack group 200c are reliably connected together.
同时,步骤S70包括:At the same time, step S70 includes:
步骤S73,通过打引线300连接第一基板焊盘110与第一叠层组200a的第一芯片焊盘211。Step S73, connect the first substrate pad 110 and the first chip pad 211 of the first stacked group 200a through the wire 300.
在本实施例中,通过将第一叠层组200a与第三叠层组200c的第一芯片焊盘211相互键合,从而可将二者堆叠。同时,相互键合的第一芯片焊盘211可以使得堆叠在一起的第一叠层组200a与第三叠层组200c之间的信号传输路径的长度均基本一致。此时,既可有效改善信号时间延迟问题,又可以有效提高封装集成度。In this embodiment, by bonding the first chip pads 211 of the first stacked group 200a and the third stacked group 200c to each other, they can be stacked. At the same time, the mutually bonded first chip pads 211 can make the lengths of the signal transmission paths between the stacked first stack group 200a and the third stack group 200c substantially consistent. At this time, the signal time delay problem can be effectively improved, and the packaging integration level can be effectively improved.
上所述实施例的各技术特征可以进行任意的组合,为使描述简洁,未对上述实施例各个技术特征所有可能的组合都进行描述,然而,只要这些技术特征的组合不存在矛盾,都应当认为是本说明书记载的范围。The technical features of the above embodiments can be combined in any way. To simplify the description, not all possible combinations of the technical features of the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, all possible combinations should be used. It is considered to be within the scope of this manual.
以上所述实施例仅表达了本公开的几种实施方式,其描述较为具体和详细,但并不能因此而理解为对申请专利范围的限制。应当指出的是,对于本领域的普通技术人员来说,在不脱离本公开构思的前提下,还可以做出若干变形和改进,这些都属于本公开的保护范围。因此,本公开专利的保护范围应以所附权利要求为准。
The above-described embodiments only express several implementation modes of the present disclosure, and their descriptions are relatively specific and detailed, but should not be construed as limiting the scope of the patent application. It should be noted that, for those of ordinary skill in the art, several modifications and improvements can be made without departing from the concept of the present disclosure, and these all fall within the protection scope of the present disclosure. Therefore, the protection scope of the patent disclosed should be determined by the appended claims.
Claims (20)
- 一种封装结构,包括:A packaging structure including:封装基板(100),内部设有凹槽(100a),且包括第一基板焊盘(110);The packaging substrate (100) is provided with a groove (100a) inside and includes a first substrate pad (110);叠层芯片组(200),放置于所述凹槽(100a)内,包括:The stacked chipset (200) is placed in the groove (100a) and includes:第一芯片(210),包括第一芯片焊盘(211)与第一接触垫(212),所述第一接触垫(212)与所述第一芯片焊盘(211)分别位于所述第一芯片(210)的相背的两面,且所述第一接触垫(212)为所述第一芯片(210)的信号传输端,所述第一芯片(210)设有第一通孔(210a),所述第一通孔(210a)连通至所述第一接触垫(212),且所述第一通孔(210a)内填充第一导电互连结构(213),所述第一导电互连结构(213)电连接所述第一芯片焊盘(211);The first chip (210) includes a first chip bonding pad (211) and a first contact pad (212). The first contact pad (212) and the first chip bonding pad (211) are respectively located on the first chip bonding pad (211). Two opposite sides of a chip (210), and the first contact pad (212) is the signal transmission end of the first chip (210). The first chip (210) is provided with a first through hole ( 210a), the first through hole (210a) is connected to the first contact pad (212), and the first through hole (210a) is filled with a first conductive interconnect structure (213), the first A conductive interconnect structure (213) electrically connects the first chip pad (211);第二芯片(220),包括第二接触垫(221),所述第二接触垫(221)位于所述第二芯片(220)靠近所述第一芯片(210)的一面,并与所述第一接触垫(212)键合,且所述第二接触垫(221)为所述第二芯片(220)的信号传输端;The second chip (220) includes a second contact pad (221). The second contact pad (221) is located on a side of the second chip (220) close to the first chip (210) and is connected to the first chip (210). The first contact pad (212) is bonded, and the second contact pad (221) is the signal transmission end of the second chip (220);打引线(300),连接所述第一基板焊盘(110)与所述第一芯片焊盘(211)。Draw leads (300) to connect the first substrate pad (110) and the first chip pad (211).
- 根据权利要求1所述的封装结构,其中,所述第一接触垫(212)位于所述第一芯片(210)的正面,所述第二接触垫(221)位于所述第二芯片(220)的正面。The package structure according to claim 1, wherein the first contact pad (212) is located on the front side of the first chip (210), and the second contact pad (221) is located on the second chip (220). ) of the front.
- 根据权利要求1所述的封装结构,其中,第一接触垫(212)在第一芯片(210)的背面,且第二接触垫(221)在第二芯片(220)的背面。The package structure of claim 1, wherein the first contact pad (212) is on the back side of the first chip (210), and the second contact pad (221) is on the back side of the second chip (220).
- 根据权利要求1所述的封装结构,其中,第一接触垫(212)位于第一芯片(210)背面,第二接触垫(221)位于第二芯片(220)正面。The packaging structure of claim 1, wherein the first contact pad (212) is located on the back side of the first chip (210), and the second contact pad (221) is located on the front side of the second chip (220).
- 根据权利要求1所述的封装结构,其中,第一接触垫(212)位于第一芯片(210)正面,第二接触垫(221)位于第二芯片(220)背面。The packaging structure of claim 1, wherein the first contact pad (212) is located on the front side of the first chip (210), and the second contact pad (221) is located on the back side of the second chip (220).
- 根据权利要求1至5任一项所述的封装结构,其中,所述第一芯片焊盘(211)覆盖所述第一通孔(210a)。The packaging structure according to any one of claims 1 to 5, wherein the first chip pad (211) covers the first through hole (210a).
- 根据权利要求1-6任一项所述的封装结构,其中,The packaging structure according to any one of claims 1-6, wherein,所述第一芯片(210)还包括第一介质层(214),所述第一介质层(214)与所述第一接触垫(212)位于所述第一芯片(210)的同一面,The first chip (210) also includes a first dielectric layer (214), the first dielectric layer (214) and the first contact pad (212) are located on the same surface of the first chip (210),所述第二芯片(220)还包括第二介质层(222),所述第一介质层(214)与所述第二接触垫(221)位于所述第二芯片(220)的同一面;The second chip (220) also includes a second dielectric layer (222), the first dielectric layer (214) and the second contact pad (221) are located on the same surface of the second chip (220);在所述第一接触垫(212)与所述第二接触垫(221)键合的同时,所述第一介质层(214)与所述第二介质层(222)键合。While the first contact pad (212) and the second contact pad (221) are bonded, the first dielectric layer (214) and the second dielectric layer (222) are bonded.
- 根据权利要求1-7任一项所述的封装结构,其中,所述封装基板(100)内部还设有打线孔(100b),所述打线孔(100b)位于所述凹槽(100a)下方,且与所述凹槽(100a)连通。The packaging structure according to any one of claims 1 to 7, wherein the packaging substrate (100) is also provided with wiring holes (100b) inside, and the wiring holes (100b) are located in the groove (100a). ) below, and communicates with the groove (100a).
- 根据权利要求8所述的封装结构,其中,The packaging structure according to claim 8, wherein:所述叠层芯片组(200)包括堆叠设置的第一叠层组(200a)以及第二叠层组(200b),所述第一叠层组(200a)的所述第二芯片(220)与所述第二叠层组(200b)的所述第二 芯片(220)连接,且所述第二叠层组(200b)的第一芯片(210)粘接于所述凹槽(100a)底部;The stacked chip set (200) includes a first stacked set (200a) and a second stacked set (200b), and the second chip (220) of the first stacked set (200a) with the second laminate group (200b) The chips (220) are connected, and the first chip (210) of the second laminate group (200b) is bonded to the bottom of the groove (100a);所述第一基板焊盘(110)包括第一焊盘(111)以及第二焊盘(112),所述第一焊盘(111)位于所述封装基板(100)的正面,所述第二焊盘(112)位于所述封装基板(100)的背面;The first substrate pad (110) includes a first pad (111) and a second pad (112). The first pad (111) is located on the front side of the package substrate (100). Two pads (112) are located on the back side of the packaging substrate (100);所述打引线(300)包括第一引线(310)以及第二引线(320),所述第一引线(310)连接所述第一焊盘(111)与所述第一叠层组(200a)的第一芯片焊盘(211),所述第二引线(320)穿过所述打线孔(100b)而连接所述第二焊盘(112)与所述第二叠层组(200b)的第一芯片焊盘(211)。The lead wire (300) includes a first lead wire (310) and a second lead wire (320). The first lead wire (310) connects the first bonding pad (111) and the first stacked group (200a). ) of the first chip pad (211), the second lead (320) passes through the wiring hole (100b) to connect the second pad (112) and the second stacked group (200b) ) of the first chip pad (211).
- 根据权利要求9所述的封装结构,其中,所述封装结构包括粘接层(400),所述第一叠层组(200a)的所述第二芯片(220)位于所述粘接层(400)的一侧,所述第二叠层组(200b)的所述第二芯片(220)位于所述粘接层(400)的另一侧。The packaging structure according to claim 9, wherein the packaging structure includes an adhesive layer (400), and the second chip (220) of the first stacked group (200a) is located on the adhesive layer (400). 400), the second chip (220) of the second laminate group (200b) is located on the other side of the adhesive layer (400).
- 根据权利要求9或10所述的封装结构,其中,所述封装基板(100)还包括第二基板焊盘(120)以及基板通孔(100c),所述第二基板焊盘(120)位于所述封装基板(100)的背面,且通过所述基板通孔(100c)与所述第一焊盘(111)连接。The packaging structure according to claim 9 or 10, wherein the packaging substrate (100) further includes a second substrate pad (120) and a substrate through hole (100c), the second substrate pad (120) is located The back side of the package substrate (100) is connected to the first pad (111) through the substrate through hole (100c).
- 根据权利要求11所述的封装结构,其中,所述第二引线(320)的长度大于所述第一引线(310)的长度。The package structure according to claim 11, wherein the length of the second lead (320) is greater than the length of the first lead (310).
- 根据权利要求9所述的封装结构,其中,The packaging structure according to claim 9, wherein:所述封装基板(100)内部设有导电层(160),所述导电层(160)包括第一导电部(161)以及第二导电部(162),所述第一导电部(161)通过位于其上方的互连孔连接所述第一焊盘(111),所述第二导电部(162)通过位于其下方的互连孔连接所述第二焊盘(112)。A conductive layer (160) is provided inside the packaging substrate (100). The conductive layer (160) includes a first conductive part (161) and a second conductive part (162). The first conductive part (161) passes through The interconnection hole located above it is connected to the first pad (111), and the second conductive portion (162) is connected to the second pad (112) through the interconnection hole located below it.
- 根据权利要求13所述的封装结构,其中,所述第一导电部(161)与所述封装基板(100)正面的距离为第一距离,所述第二导电部(162)与所述封装基板(100)背面的距离为第二距离,所述第一距离等于所述第二距离。The packaging structure according to claim 13, wherein the distance between the first conductive part (161) and the front surface of the packaging substrate (100) is a first distance, and the distance between the second conductive part (162) and the package substrate is a first distance. The distance between the back surface of the substrate (100) is a second distance, and the first distance is equal to the second distance.
- 根据权利要求14所述的封装结构,其中,所述第二引线(320)的长度等于所述第一引线(310)的长度。The package structure of claim 14, wherein the length of the second lead (320) is equal to the length of the first lead (310).
- 根据权利要求1-15任一项所述的封装结构,其中,The packaging structure according to any one of claims 1-15, wherein,所述叠层芯片组(200)包括堆叠设置的第一叠层组(200a)以及第三叠层组(200c),所述第一叠层组(200a)的所述第一芯片焊盘(211)与所述第三叠层组(200c)的所述第一芯片焊盘(211)键合,所述打引线(300)连接所述第一基板焊盘(110)与所述第一叠层组(200a)的所述第一芯片焊盘(211)。The stacked chip set (200) includes a first stacked set (200a) and a third stacked set (200c), and the first chip pad (200a) of the first stacked set (200a) 211) is bonded to the first chip pad (211) of the third stack group (200c), and the lead wire (300) connects the first substrate pad (110) and the first The first chip pad (211) of the stack stack (200a).
- 根据权利要求16所述的封装结构,其中,The packaging structure according to claim 16, wherein:所述第三叠层组(200c)以及所述第一叠层组(200a)中,所述第一芯片(210)在设有第一芯片焊盘(211)的一侧还设有第三介质层(215),所述第一叠层组(200a)的第三介质层(215)与所述第三叠层组(200c)的所述第三介质层(215)键合。 In the third laminated group (200c) and the first laminated group (200a), the first chip (210) is also provided with a third chip on the side where the first chip pad (211) is provided. Dielectric layer (215), the third dielectric layer (215) of the first stack group (200a) is bonded to the third dielectric layer (215) of the third stack group (200c).
- 一种封装结构的制备方法,包括:A method for preparing a packaging structure, including:提供第一晶片(10)、第二晶片(20)以及封装基板(100),第一晶片(10)包括多个第一芯片(210),所述第一芯片(210)的一面设有第一接触垫(212),所述第二晶片(20)包括多个第二芯片(220),第二芯片(220)的一面设有第二接触垫(221),所述封装基板(100)内部设有凹槽(100a),且包括第一基板焊盘(110);A first wafer (10), a second wafer (20) and a packaging substrate (100) are provided. The first wafer (10) includes a plurality of first chips (210). One side of the first chip (210) is provided with a third A contact pad (212), the second chip (20) includes a plurality of second chips (220), a second contact pad (221) is provided on one side of the second chip (220), the packaging substrate (100) A groove (100a) is provided inside and includes a first substrate pad (110);通过所述第一接触垫(212)与所述第二接触垫(221),将所述第一晶片(10)与所述第二晶片(20)键合,且于所述第一芯片(210)内形成第一通孔(210a),且于所述第一通孔(210a)内形成第一导电互连结构(213),并于所述第一芯片(210)的另一面形成第一芯片焊盘(211),所述第一通孔(210a)连通至第一接触垫(212),所述第一芯片焊盘(211)电连接所述第一导电互连结构(213);The first wafer (10) and the second wafer (20) are bonded through the first contact pad (212) and the second contact pad (221), and are bonded to the first chip (20). A first through hole (210a) is formed in the first through hole (210a), a first conductive interconnect structure (213) is formed in the first through hole (210a), and a first conductive interconnect structure (213) is formed on the other side of the first chip (210). A chip pad (211), the first through hole (210a) is connected to the first contact pad (212), the first chip pad (211) is electrically connected to the first conductive interconnect structure (213) ;将键合在一起的所述第一晶片(10)与所述第二晶片(20)进行切割,从而形成叠层芯片组(200);Cutting the first wafer (10) and the second wafer (20) bonded together to form a stacked chip set (200);将所述叠层芯片组(200)放置于所述凹槽(100a)内;Place the stacked chipset (200) in the groove (100a);通过打引线(300)连接所述第一基板焊盘(110)与所述第一芯片焊盘(211)。The first substrate pad (110) and the first chip pad (211) are connected through wires (300).
- 根据权利要求18所述的封装结构的制备方法,其中,所述封装基板(100)内部还设有打线孔(100b),所述打线孔(100b)位于所述凹槽(100a)下方,且与所述凹槽(100a)连通,所述叠层芯片组(200)包括第一叠层组(200a)以及第二叠层组(200b),所述第一基板焊盘(110)包括第一焊盘(111)以及第二焊盘(112),所述打引线(300)包括第一引线(310)以及第二引线(320);The method of preparing a packaging structure according to claim 18, wherein the packaging substrate (100) is further provided with wiring holes (100b) inside, and the wiring holes (100b) are located below the groove (100a) , and connected with the groove (100a), the laminated chip set (200) includes a first laminated group (200a) and a second laminated group (200b), and the first substrate pad (110) It includes a first bonding pad (111) and a second bonding pad (112), and the lead wire (300) includes a first lead wire (310) and a second lead wire (320);所述将键合在一起的所述第一晶片(10)与所述第二晶片(20)进行切割之后,还包括:After cutting the first wafer (10) and the second wafer (20) bonded together, the method further includes:将所述第一叠层组(200a)的所述第二芯片(220)与所述第二叠层组(200b)的所述第二芯片(220)连接;Connect the second chip (220) of the first stacked group (200a) to the second chip (220) of the second stacked group (200b);所述将所述叠层芯片组(200)放置于所述凹槽(100a)内,包括:The placing of the stacked chipset (200) in the groove (100a) includes:将所述第二叠层组(200b)的第一芯片(210)粘接于所述凹槽(100a)底部;Bond the first chip (210) of the second laminate group (200b) to the bottom of the groove (100a);所述通过打引线(300)连接所述第一基板焊盘(110)与所述第一芯片焊盘(211),包括:The connecting of the first substrate pad (110) and the first chip pad (211) by wiring (300) includes:通过所述第一引线(310)连接所述第一焊盘(111)与所述第一叠层组(200a)的第一芯片焊盘(211);Connect the first bonding pad (111) and the first chip bonding pad (211) of the first stacked group (200a) through the first lead (310);通过所述第二引线(320)穿过所述打线孔(100b)而连接所述第二焊盘(112)与所述第二叠层组(200b)的第一芯片焊盘(211)。The second bonding pad (112) and the first chip bonding pad (211) of the second stacked group (200b) are connected by the second lead (320) passing through the wiring hole (100b). .
- 根据权利要求18或19所述的封装结构的制备方法,其中,所述叠层芯片组(200)包括第一叠层组(200a)以及第三叠层组(200c),The method for manufacturing a packaging structure according to claim 18 or 19, wherein the stacked chip set (200) includes a first stacked set (200a) and a third stacked set (200c),所述将键合在一起的所述第一晶片(10)与所述第二晶片(20)进行切割之后,还包括:After cutting the first wafer (10) and the second wafer (20) bonded together, the method further includes:将所述第一叠层组(200a)的所述第一芯片焊盘(211)与所述第三叠层组(200c)的所述第一芯片焊盘(211)键合; Bonding the first chip pad (211) of the first stack group (200a) to the first chip pad (211) of the third stack group (200c);所述通过打引线(300)连接所述第一基板焊盘(110)与所述第一芯片焊盘(211),包括:The connecting of the first substrate pad (110) and the first chip pad (211) by wiring (300) includes:通过打引线(300)连接所述第一基板焊盘(110)与所述第一叠层组(200a)的所述第一芯片焊盘(211)。 The first substrate pad (110) and the first chip pad (211) of the first stacked group (200a) are connected through a wire (300).
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