TW201143018A - A three dimensional chip stacking electronic package with bonding wires - Google Patents

A three dimensional chip stacking electronic package with bonding wires Download PDF

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Publication number
TW201143018A
TW201143018A TW099117357A TW99117357A TW201143018A TW 201143018 A TW201143018 A TW 201143018A TW 099117357 A TW099117357 A TW 099117357A TW 99117357 A TW99117357 A TW 99117357A TW 201143018 A TW201143018 A TW 201143018A
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Taiwan
Prior art keywords
stacked
wafer
telecommunication
package structure
electronic package
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TW099117357A
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Chinese (zh)
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TWI441312B (en
Inventor
Chung-Jung Wu
Kuo-Ning Chiang
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Kuo-Ning Chiang
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Priority to TW099117357A priority Critical patent/TWI441312B/en
Publication of TW201143018A publication Critical patent/TW201143018A/en
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Publication of TWI441312B publication Critical patent/TWI441312B/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/73Means for bonding being of different types provided for in two or more of groups H01L24/10, H01L24/18, H01L24/26, H01L24/34, H01L24/42, H01L24/50, H01L24/63, H01L24/71
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

Abstract

This invention provides the three dimensional chip stacking electronic package, where stacking chip has via structure with conductive material to achieve electrical connection. The package applies electric pads to stack each stacking chips, and utilized wire bonding technology to achieve electrical connection between stacking chip and substrate, where the bonding structure is protected by molding compound. The package can be electrically connected with another substrate to achieve board-level package.

Description

201143018 六、發明說明: 【發明所屬之技術領域】 三維晶片 疊晶片結構與基板接 [0001]本發明系有關一種電子封裝結構,特別是一種 堆疊封裝結構’利用打線方式將堆 合以i索電訊連接之目的。 近年來隨著半導體產業與技術蓬勃發展,未達务"201143018 VI. Description of the Invention: [Technical Field] The three-dimensional wafer stack structure and the substrate are connected [0001] The present invention relates to an electronic package structure, in particular to a stacked package structure The purpose of the connection. In recent years, with the semiconductor industry and technology booming, unfinished business"

電子元件超高電訊接點輪出輸人之需求,並同^半導體 薄短小之產品需求,電子封裝結構由最初之單日兼具t 晶片’二維平面多晶片到目前朝向三維堆疊心= 展’先進封裝結構逐漸發展出如晶圓級封|(Wafe Level Package,WLP)、多晶片封裝 Module, MCM)和系統級封裝(System 1P sip)。其中sip為-廣泛性整合性 age’ 电卞对裝之總稱,包括 二微平面夕晶片到二維立體堆疊封裝接屬其定義範疇。 而三維立體堆疊封裝更為近年來先進㈣發展之主^趨 勢’諸多封裝結構已被大量發展’包含以矽導通孔 (Through Silicon Via’ TSV)堆疊、打線The ultra-high-telecom contacts of electronic components are in turn, and the demand for products is thin and thin. The electronic package structure consists of the original single-day t-chip 'two-dimensional planar multi-chip to the current three-dimensional stacking heart = exhibition 'Advanced packaging structures are gradually developed such as Wafer Level Package (WLP), Multi-Chip Package Module (MCM) and System-in-Package (System 1P sip). Among them, sip is a general term for extensively integrated ages, including two micro-planar wafers to two-dimensional stacked packages. The three-dimensional stacking package is more advanced in recent years. (4) The main trend of development 'Many package structures have been extensively developed' including the inclusion of through silicon vias (Through Silicon Via' TSV)

Bonding)堆疊以及引入中介層(Interp〇ser)結構等技 時縮減堆疊封|體於厚戶方 向之尺寸與重量,進而滿足紐封裝結構對於輕薄:小 之需求。 【先前技術】 闕美國專利號7, 615, 413中揭露—種以打線接合方式將各 層堆疊晶片之電子接點與基板連接以達到電訊接合之目 的,如圖一所示;此結構包括:電路板2 ;外部電訊接點 3;電極4;第一接著層6;第一接合導線7;第二接著層9 表單编號A0101 第3頁/共23頁 201143018 ’第二接合導線10 ;密封膠11 ;堆疊形式半導體元件50 ’半導體單元51 ;封裝結構52 ;電路板53 ;第一半導體 單疋54 ;第二半導體單元55 ;密封膠56 ;接著層57 ;接 著層58 ;被動元件59 ;電極6〇。此專利中所利用支打線 接合技術’除了可進行單一種類晶片堆疊封裝,亦可應 用於不同種類晶片’甚至於將封裝結構與晶片堆疊之電 子封裝體。 中華民國專利號J269460中提出一種具導電特性支撐底板 之立體堆疊封裝單元,如圖二所示;其中包含:基板101 ,電訊接點102 ;具電訊傳遞之固著結構103 ;第一封裝 單兀體110 ;第二封裝單元體120。此結構可藉由封裝單 元體兩側之電訊接點達到多晶片堆疊之目的。且該封裝 單兀可應用批量製程之優勢,大幅降低單一封裝單元之 生產成本’並利用具導電特性之支撐底板提供電訊傳遞 ’亦可做為接地端’提高該封裝結構之電氣特性。又該 支撲底板亦為熱之良導體,對於封裝結構散熱效果可有 效提升,同時增進封裝結構之吁靠度壽命。 【發明内容】 [0003]本發明之目的在於提供一製程吁行且可靠度良好之三維 立體晶片堆疊電子封裝結構,除了採用先進矽導通孔製 程來達到晶片堆疊之目的,同時應用技術成熟之打線技 術將堆疊晶片與基板進行電訊接合,以達到電子封裝廣 泛應用之需求。 為達成前述之目的,本發明提出一三維立體晶片堆疊電 子封裝結構’包含有單數或複數個具有單數或複數個石夕 導通孔結構之堆疊晶片,以具絕緣特性之絕緣層包覆晶 表單编號A0101 第4頁/共23頁 201143018 片與導通孔表面,並填入導電材料完成具導電結構之單 數或複數個矽導通孔結構。利用電訊接點接著層結構進 行不同堆疊晶片間電訊接點之連接,並與底層晶片上單 數或複數個電訊接點連接,該底層晶片則以接著層與基 板接合固定。該堆疊晶片之單數或複數個電訊接點以單 數或複數個打線導線,與基板上單數或複數個電訊接點 進行電訊連接。而封膠樹酯材料則用於包覆單數或複數 個打線導線、單數或複數個堆疊晶片以及底層晶片,以 完成本發明之三維立體晶片堆疊電子封裝結構。 【實施方式】 [0004] 本發明揭露一種電子封裝結構,其為一三維立體晶片堆 疊形式電子封裝結構。詳言之,本發明提出一填入導電 材料之矽導通孔結構進行堆疊晶片之電訊連接,進而搭 配打線結構與打線技術與進行電訊連接,並可進一步搭 配其他形式電子封裝結構與其他基本進行連接。此發明 之實施例詳細說明如下,唯所述之實施例只做一說明, 並非用以限定本發明。 [0005] 圖三為本發明之三維立體晶片堆疊封裝結構300之截面圖 ,此封裝結構300主要包含單數或複數個堆疊晶片302堆 疊於單數個底層晶片301之上,其中底層晶片301下表面 利用接著層310與基板350之上表面接合固定,該接著層 310可為任何具黏著效果之膠材,而基板350可為有機基 板如BT、FR4、ABF,或是矽等材料為主之結構。該堆疊 晶片302中具有單數或複數個通孔303,用於製作電訊連 接之導通孔。該導通孔以絕緣層311包覆,且絕緣層311 表單編號A0101 第5頁/共23頁 201143018 同時部分或完全包覆堆疊晶請2,達到保護晶片 電訊之效果;該絕緣層川為任何可達到電訊絕緣 材料’如有機材料BCB(benz〇cycl〇butene)、Bonding) stacking and introduction of interposer structure and other techniques to reduce the size and weight of the stacked package in the direction of the thicker household, thus meeting the needs of the new package structure for thin: small. [Prior Art] U.S. Patent No. 7,615,413 discloses the use of wire bonding to connect the electronic contacts of the stacked chips to the substrate for the purpose of telecommunications bonding, as shown in Figure 1; Board 2; external telecommunication contact 3; electrode 4; first bonding layer 6; first bonding wire 7; second bonding layer 9 Form No. A0101 Page 3 of 23 201143018 'Second bonding wire 10; sealant 11; stacked form semiconductor component 50 'semiconductor unit 51; package structure 52; circuit board 53; first semiconductor unit 54; second semiconductor unit 55; sealant 56; layer 57; then layer 58; passive component 59; 6〇. The wire bonding technique utilized in this patent 'can be applied to a different type of wafer package than a single type of wafer stack package' or even an electronic package in which the package structure and the wafer are stacked. The Republic of China Patent No. J269460 proposes a three-dimensional stacked package unit having a conductive support bottom plate, as shown in FIG. 2; comprising: a substrate 101, a telecommunication contact 102; a fixed structure 103 having a telecommunication transmission; and a first package unit Body 110; second package unit body 120. This structure can achieve multi-wafer stacking by means of telecommunication contacts on both sides of the package unit. Moreover, the package unit can apply the advantages of the batch process, greatly reduce the production cost of the single package unit and provide the telecommunication transmission by using the support substrate with conductive characteristics, or can be used as the ground terminal to improve the electrical characteristics of the package structure. Moreover, the bottom plate is also a good conductor of heat, which can effectively improve the heat dissipation effect of the package structure and improve the service life of the package structure. SUMMARY OF THE INVENTION [0003] The object of the present invention is to provide a process-oriented and reliable three-dimensional wafer stack electronic package structure, in addition to the use of advanced 矽 via hole process to achieve the purpose of wafer stacking, while applying mature technology The technology combines the stacked wafers with the substrate to meet the needs of a wide range of electronic packaging applications. In order to achieve the foregoing objective, the present invention provides a three-dimensional wafer-stack electronic package structure comprising a singular or a plurality of stacked wafers having a singular or plural number of through-hole via structures, and an insulating layer coated with an insulating property. No. A0101 Page 4 of 23 201143018 The surface of the sheet and the via hole is filled with a conductive material to form a singular or plural conductive via structure with a conductive structure. The telecommunications contact layer structure is used to connect the telecommunication contacts between different stacked wafers, and is connected to a single or a plurality of telecommunication contacts on the bottom wafer, and the bottom wafer is bonded to the substrate by the bonding layer. The singular or plurality of telecommunication contacts of the stacked chip are electrically connected to a single or a plurality of telecommunication contacts on the substrate by a single or a plurality of wire bonding wires. The gelatin resin material is used to coat a single or multiple wire conductors, a singular or a plurality of stacked wafers, and an underlying wafer to complete the three-dimensional wafer stack electronic package structure of the present invention. [Embodiment] The present invention discloses an electronic package structure which is a three-dimensional wafer stack form electronic package structure. In detail, the present invention proposes a conductive via structure filled with a conductive material to carry out a telecommunication connection of the stacked wafers, and is further matched with a wire bonding structure and a wire bonding technique, and can be further connected with other basic electronic package structures. . The embodiments of the present invention are described in detail below, but the embodiments are merely illustrative and are not intended to limit the invention. 3 is a cross-sectional view of a three-dimensional wafer stack package structure 300 of the present invention. The package structure 300 mainly includes a single or a plurality of stacked wafers 302 stacked on a single bottom wafer 301, wherein the lower surface of the bottom wafer 301 is utilized. The layer 310 is then bonded to the upper surface of the substrate 350. The adhesive layer 310 can be any adhesive material having an adhesive effect, and the substrate 350 can be an organic substrate such as BT, FR4, ABF, or a material such as germanium. The stacked wafer 302 has a single or a plurality of vias 303 for making vias for telecommunications connections. The via hole is covered by the insulating layer 311, and the insulating layer 311 is in the form of A0101, page 5/23, 201143018, and partially or completely covers the stacked crystal 2 to achieve the effect of protecting the wafer telecommunications; Reaching telecommunications insulation materials such as BCB (benz〇cycl〇butene),

ABF(Ajin〇m〇t〇 Built—uP Film)、PI(P〇lyimid 等’或二氧化矽等材料。以絕緣材料311包覆之通孔二 至做另-通孔312,用於填人填孔導電材料⑽以達 訊傳輸可貫通堆疊晶謂2之目的。此外,完全或部Z 覆有絕緣層311堆疊晶片3G2,其絕緣層之表面製作有^ 數或複數個第-電訊接點32卜該第—電訊接點32ι完^ 、部份或無覆蓋於絕緣層310之表面,且完全或部分 1覆 於填孔導電材料320 ;此第一電訊接點321可直接製作於 填孔導電材料320上,或經重新佈線處理後製作於絕緣層 310之表面;於另一表面上製作有單數或複數個第二電訊 接點322 ’該第二電訊接點322完全、部份或無覆蓋於絕 緣層310之表面,且完全或部分包覆於填孔導電材料32〇 。於底層機板上則製作有單數或複數個第三電訊接點323ABF (Ajin〇m〇t〇Built-uP Film), PI (P〇lyimid, etc.) or cerium oxide. The through hole 2 is covered with insulating material 311 to make another through hole 312 for filling The hole-filling conductive material (10) can pass through the stacking crystal 2 for the purpose of transmission. Further, the wafer 3G2 is completely or partially covered with an insulating layer 311, and the surface of the insulating layer is formed with a plurality of or a plurality of telecommunication contacts. 32. The first telecommunications contact 32 is completely covered, partially or uncovered on the surface of the insulating layer 310, and completely or partially covered with the filling conductive material 320; the first telecommunication contact 321 can be directly formed in the filling hole The conductive material 320 is formed on the surface of the insulating layer 310 after being rewired; and the singular or plural second telecommunication contacts 322 are formed on the other surface. The second telecommunication contact 322 is completely, partially or not. Covering the surface of the insulating layer 310, and completely or partially covering the hole-filling conductive material 32. On the bottom board, a single or a plurality of third telecommunications contacts 323 are formed.

與絕緣 目的之 該第三電訊接點323部份或完全包覆於底層晶片3〇1上 表面。此具有絕緣層311、通孔303與312、填孔導電材 料320、第一電訊接點321、第二電訊接點322之堆疊晶 片302結構以電訊接點接著層325,由第二電訊接點322 與製作於底層晶片301上之第三電訊接點323進行電訊連 接,此電訊接點接著層325可為任一導電材料,如錫、錫 銀合金、錫鉛合金、電鍍銅等材料。而該堆疊晶片302之 第一電訊接點321則利用單數或複數個打線導線330搭配 打線技術與第四電訊接點324連接,達到與基板350之電 訊連接;其中基板350上製作有完全或部分包覆之單數或 表單編號A0101 第6頁/共23頁 2〇1143〇18 複數個第四電訊接點324。該打線導線330則利用或不利 用封膠樹酯340完全或部分包覆,以保護打線導線330之 使用可靠度。 [〇〇〇6] 前述三維立體晶片堆疊封裝結構300中,堆疊晶片302或 底層晶片301可為主動電子元件、感測元件、測試元件、 微機電晶片或其上電子元件之組合。而該填孔導電材料 320所填充之導電材料可為導電金屬,如錫、鋁、銅、銀 、鎢、鉛或以上金屬材料合金或其他具導電性質之材料 φ 。上述導電材料亦適用於第一電訊接點321、第二電訊接 點322、第三電訊接點323、第四電訊接點324與電訊接 點接著層325等任一與導電相關之結構。 [0007] 述三維立體晶片堆疊封裝結構300之一種可能製造方法可 分為項主要步驟:其一:製作具有通孔303或通孔312之 堆疊晶片302 ;其二:接合無通孔303或無通孔312結構 之底層晶片301於基板350之表面;其三:利用熱壓製程 將單數或複數個堆疊晶片302利用電訊接點接著層325進 行接合;其四:利用打線技術將打線導線330將堆疊結構 之第一電訊接點321與基板350表面之第四電訊接點324 進行連接,並以封膠樹只保護之。 [0008]前述具有通孔303或通孔312之堆疊晶片302之一種可能 製造方法為:利用光微影蝕刻或是雷射製程於以完成電 子凡件功能之堆疊晶片302製作單數或複數個通孔3〇3 ; 接續利賴壓或錢渡製程㈣緣層311製作於堆疊晶片 任-或兩側表面,該絕緣層311可完全或部分包覆堆疊晶 片表面, 表單編號A0101 且該接著層將完全或部份填滿通孔3〇3 ;利用光 第7頁/共23 5 201143018 微影钮刻或是雷射製程,於被絕緣層3ΐι完全或部份填滿 之通孔303中至作用於填滿填孔導電材料挪之通孔川 ’於通孔312結構填入填孔導電材料32〇,如電錄鋼或電 賴製程;接_用電㈣_製程,搭配光微影蚀刻 製程於堆叠晶片302表面製作單數或複數個第-電訊接點 321與第二電訊接點322。 圆冑述無通孔3G3或無通孔312結構之底層晶謂丨,與底 層晶片3〇1與基板350表面接合之一種可能製造方法為: # 利用電鑛或減鐘製程,搭配光微影#刻製程於底層晶片 301表面製作單數或複數個第三電訊接點323 ;接續利用 旋鍍或是熱壓等製程將接著層31〇至做於底層晶片3〇1或 疋基板350之表面,該基板35〇表面以前述相關電訊接點 製程製作單數或複數個第四電訊接點324 ;將底層晶片 301以熱壓或擺置製程與基板35()進行接合。 [0010] 前述將單數或複數個堆疊晶片302利用電訊接點接著層 325進行接合之一種可能製造方法為:利用電鍍或濺鍍等 • 製程將電訊接點接著層325製作於堆疊晶片302表面之第 二電訊接點322,或底層晶片301表面之第三電訊接點 323 ;接續利用熱壓或迴焊製程將堆疊晶片302與底層晶 片301透過電訊接點接著層325進行接合。 [0011] 前述將打線導線330將堆疊結構之第一電訊接點321與基 板350表面之第四電訊接點324進行連接之一種可能製造 方法為:利用打線技術將打線導線330製作於堆疊晶片 302表面上之第一電訊接點321,與基板350表面上之第 四電訊接點324進行連接。該打線導線材料可為金、銀、 表單编號A0101 第8頁/共23頁 201143018 鋁、銅等具導電特性之材料。接續利用模造製程將封膠 樹酯340完全或部分包覆打線導線330、完成堆疊之堆疊 晶片302與底層晶片301結構,以及基板350。 [0012] 圖四為三維立體堆疊封裝結構400應用於球陣列封裝形式 之結構截面圖。此封裝結構具備有三維立體堆疊封裝結 構4〇〇,其第一基板450中具備有聯通為於第一基板450 表面之單數或複數個第四電訊接點424,與單數或複數個 球陣列結構470之電訊連接。該球陣列結構470為用於三 $ 維立體堆疊封裝結構400與第二基板460之電訊連接。此 球陣列封裝形式為應用於板層級封裝之實施例說明,並 非用以限定本發明。 [0013] 圖五為本發明之第二實施例,為利用複數個堆疊晶片所 製作之三維立體晶片堆疊封裝結構500。包括接著於基板 550之底層晶片501,與堆疊於底層晶片501之第一堆疊 晶片502、堆疊於第二堆疊晶片502之第二堆疊晶片503 、堆疊於第二堆疊晶片503之第三堆疊晶片504。接續利 • 用打線導線530將第三堆疊晶片504之電訊接點與基板 550進行電訊連接,再以封膠樹酯540包覆或部份包覆上 述結構。前述之實施例結構僅就三個堆疊晶片進行說明 ,該堆疊晶片數量與其它結構並非用以限定本發明。 [0014] 圖六為本發明之第三實施例,為利用複數個堆疊晶片所 製作之三維立體堆疊封裝結構,搭配應用球陣列封裝形 式之結構截面圖。此封裝結構具備有三維立體堆疊封裝 結構600,其第一基板650與第二基板660之電訊連接則 透過單數或複數個球陣列結構670達到目的。前述之實施 表單编號A0101 第9頁/共23頁 201143018 例結構僅就三個堆疊晶片進行說明,該堆疊晶片數量與 其它結構並非用以限定本發明。 [0015] 圖七為本發明之第四實施例,為利用複數個,且尺寸不 相同之堆疊晶片所製作之三維立體堆疊封裝結構,搭配 應用球陣列封裝形式之結構截面圖。此封裝結構具有三 維立體堆疊封裝結構700,其底層晶片701之尺寸可大於 、等於或小於堆疊晶片702之尺寸,或堆疊晶片702之尺 寸可大於、等於或小於堆疊晶片703之尺寸。前述之實施 例結構僅就堆疊晶片與底層晶片尺寸進行範例說明,並 非用以限定本發明。 [0016] 圖八為本發明之第五實施例,為包含利用重新佈線後電 訊接點之三維立體堆疊封裝結構。此封裝結構具有三維 立體堆疊封裝結構800,其中與打線結構830連接之第一 電訊接點821經由重新佈線結構822,與填孔導電材料 820進行電訊連接。前述之實施例結構僅就重新佈線結構 進行範例說明,並非用以限定本發明。 【圖式簡單說明】 [0017] 本發明之實施例於上述說明中輔以下列圖形,以達詳細 闡述之目的:圖一為習知利用打線技術之三維立體堆疊 電子封裝結構。 [0018] 圖二為習知利用導電性支撐底板之立體堆疊電子封裝結 構。 [0019] 圖三為本發明之第一實施例,為三維立體堆疊封裝結構 之截面圖。 表單编號A0101 第10頁/共23頁 201143018 [0020] 圖四為本發明之第一實施例應用於球陣列封裝形式之結 構截面圖。 [0021] 圖五為本發明之第二實施例,為利用本發明之堆疊晶片 結構進行複數個堆疊晶片之電子封裝結構截面圖。 [0022] 圖六為本發明之第三實施例,為利用本發明之堆疊晶片 結構進行複數個堆疊晶片,且應用於球陣列封裝形式之 電子封裝結構截面圖。 [0023] 圖七為本發明之第四實施例,為利用本發明之堆疊晶片 ® 結構進行複數個尺寸不同之堆疊晶片,其底層晶片尺寸 亦不相同,且應用於球陣列封裝形式之電子封裝結構截 面圖。 [0024] 圖八為本發明之第五實施例,為利用重新佈線結構製作 堆疊晶片表面電訊接點之電子封裝結構截面圖。 【主要元件符號說明】 [0025] 2 電路板 3 外部電訊接點 4 電極 6 第一接著層 7 第一接合導線 9 第二接著層 10 第二接合導線 11 密封膠 50 堆疊形式半導體元件 51 半導體單元 表單编號A0101 第11頁/共23頁 201143018 52 封裝結構 53 電路板 54 第一半導體單元 55 第二半導體單元 56 密封膠 57 接著層 58 接著層 59 被動元件 60 電極The third telecommunications contact 323 for insulation purposes is partially or completely coated on the upper surface of the underlying wafer 3〇1. The stacked wafer 302 having the insulating layer 311, the vias 303 and 312, the via-hole conductive material 320, the first telecommunications contact 321, and the second telecommunications contact 322 is structured by a telecommunication contact layer 325, and the second telecommunications contact The 322 is electrically connected to the third telecommunications contact 323 formed on the bottom wafer 301. The telecommunications contact layer 325 can be any conductive material such as tin, tin-silver alloy, tin-lead alloy, electroplated copper or the like. The first telecommunication contact 321 of the stacked chip 302 is connected to the fourth telecommunication contact 324 by using a singular or a plurality of wire bonding wires 330 to achieve a telecommunication connection with the substrate 350. The substrate 350 is completely or partially fabricated. Wrapped singular or form number A0101 Page 6 / Total 23 pages 2 〇 1143 〇 18 A plurality of fourth telecommunication contacts 324. The wire conductor 330 is fully or partially covered with or without the use of the sealing resin 340 to protect the reliability of the wire bonding 330. [6] In the aforementioned three-dimensional wafer stack package structure 300, the stacked wafer 302 or the underlying wafer 301 may be a combination of active electronic components, sensing components, test components, MEMS wafers or electronic components thereon. The conductive material filled by the hole-filling conductive material 320 may be a conductive metal such as tin, aluminum, copper, silver, tungsten, lead or a metal material of the above or other conductive material φ. The conductive material is also applicable to any conductive-related structure such as the first telecommunications contact 321, the second telecommunications contact 322, the third telecommunications contact 323, the fourth telecommunications contact 324, and the telecommunication contact layer 325. [0007] One possible manufacturing method of the three-dimensional wafer stack package structure 300 can be divided into main steps: one: fabricating a stacked wafer 302 having through holes 303 or vias 312; second: bonding without vias 303 or none The underlying wafer 301 of the via 312 structure is on the surface of the substrate 350; third: the singular or plural stacked wafers 302 are bonded by the telecommunication contact layer 325 by a hot stamping process; and the fourth: using the wire bonding technique to wire the wire 330 The first telecommunication contact 321 of the stack structure is connected to the fourth telecommunication contact 324 on the surface of the substrate 350, and is only protected by the sealant tree. [0008] One possible fabrication method of the stacked wafer 302 having the via 303 or the via 312 is to use a photolithography or laser process to form a singular or plural number of stacked wafers 302 for performing electronic component functions. The hole 3〇3; the continuous pressure or the money process (4) edge layer 311 is formed on the stacked wafer side - or both sides, the insulating layer 311 can completely or partially cover the stacked wafer surface, the form number A0101 and the layer will Completely or partially fill the through hole 3〇3; use the light on page 7/total 23 5 201143018 lithography button or laser process, in the through hole 303 which is completely or partially filled by the insulating layer 3ΐ Filling the hole-filled conductive material with the hole-through hole 312 structure, filling the hole-filled conductive material 32〇, such as electro-recording steel or electric ray process; connecting _ electricity (four) _ process, with photolithography etching process A singular or plural number of telecommunication contacts 321 and a second telecommunication contact 322 are formed on the surface of the stacked wafer 302. A possible method for manufacturing the surface of the underlying wafer 3〇1 and the substrate 350 is as follows: #Using an electric or reduced clock process, with light lithography The engraving process is performed on the surface of the bottom wafer 301 to form a single or a plurality of third telecommunication contacts 323; and subsequently, the bonding layer 31 is formed on the surface of the underlying wafer 3〇1 or the germanium substrate 350 by spin coating or hot pressing. A plurality of or a plurality of fourth telecommunication contacts 324 are formed on the surface of the substrate 35 by the associated telecommunications contact process; and the underlying wafer 301 is bonded to the substrate 35 () by a hot pressing or arranging process. [0010] One possible manufacturing method for bonding the singular or plural stacked wafers 302 using the telecommunication contact layer 325 is to form the telecommunication contact layer 325 on the surface of the stacked wafer 302 by electroplating or sputtering. The second telecommunications contact 322, or the third telecommunications contact 323 on the surface of the bottom wafer 301, continues to bond the stacked wafer 302 and the bottom wafer 301 through the telecommunication contact layer 325 by a hot press or reflow process. [0011] One possible manufacturing method of connecting the first telecommunication contact 321 of the stacked structure to the fourth telecommunication contact 321 of the surface of the substrate 350 is to make the wire bonding wire 330 on the stacked chip 302 by using a wire bonding technique. The first telecommunication contact 321 on the surface is connected to the fourth telecommunication contact 324 on the surface of the substrate 350. The wire material can be gold, silver, form number A0101, page 8 / 23 pages 201143018 Aluminum, copper and other materials with conductive properties. The encapsulating resin 340 is completely or partially covered with the wire bonding wire 330, the stacked stacked wafer 302 and the underlying wafer 301 structure, and the substrate 350 are successively formed by a molding process. 4 is a structural cross-sectional view of a three-dimensional stacked package structure 400 applied to a ball array package form. The package structure is provided with a three-dimensional stacked package structure, and the first substrate 450 is provided with a single or a plurality of fourth telecommunication contacts 424 connected to the surface of the first substrate 450, and a singular or plural ball array structure. 470 telecommunications connection. The ball array structure 470 is a telecommunications connection for the three-dimensional three-dimensional stacked package structure 400 and the second substrate 460. This ball array package is described for the embodiment of the board level package and is not intended to limit the invention. [0013] FIG. 5 is a second embodiment of the present invention, which is a three-dimensional wafer stack package structure 500 fabricated using a plurality of stacked wafers. An underlying wafer 501 followed by a substrate 550, a first stacked wafer 502 stacked on the underlying wafer 501, a second stacked wafer 503 stacked on the second stacked wafer 502, and a third stacked wafer 504 stacked on the second stacked wafer 503 are included. . Successively, the telecommunication contacts of the third stacked wafer 504 are electrically connected to the substrate 550 by wire bonding wires 530, and then the structure is covered or partially covered with the sealing resin 540. The foregoing embodiment structure is described with respect to only three stacked wafers, and the number of stacked wafers and other structures are not intended to limit the present invention. 6 is a third embodiment of the present invention, which is a structural cross-sectional view of a three-dimensional stacked package structure fabricated by using a plurality of stacked wafers in combination with a ball array package. The package structure is provided with a three-dimensional stacked package structure 600, and the telecommunication connection between the first substrate 650 and the second substrate 660 is achieved through the singular or plural ball array structure 670. The foregoing implementation form number A0101 Page 9 of 23 201143018 The example structure is described with respect to only three stacked wafers, and the number of stacked wafers and other structures are not intended to limit the present invention. 7 is a fourth embodiment of the present invention, which is a structural cross-sectional view of a three-dimensional stacked package structure fabricated by using a plurality of stacked wafers of different sizes, in combination with a ball array package. The package structure has a three-dimensional stacked package structure 700, the size of the bottom wafer 701 can be greater than, equal to, or smaller than the size of the stacked wafer 702, or the size of the stacked wafer 702 can be greater than, equal to, or smaller than the size of the stacked wafer 703. The foregoing embodiment structure is merely illustrative of the stacked wafer and underlying wafer dimensions and is not intended to limit the invention. [0016] FIG. 8 is a fifth embodiment of the present invention, which is a three-dimensional stacked package structure including a communication contact after rewiring. The package structure has a three-dimensional stacked package structure 800, wherein the first telecommunications contact 821 connected to the wire bonding structure 830 is electrically connected to the hole-filled conductive material 820 via the rewiring structure 822. The foregoing embodiment structure is merely illustrative of the rewiring structure and is not intended to limit the present invention. BRIEF DESCRIPTION OF THE DRAWINGS [0017] The embodiments of the present invention are supplemented by the following figures in the above description for the purpose of detailed explanation: FIG. 1 is a three-dimensional stacked electronic package structure using a wire bonding technique. [0018] FIG. 2 is a perspective view of a three-dimensional stacked electronic package structure utilizing a conductive support substrate. [0019] FIG. 3 is a cross-sectional view showing a three-dimensional stacked package structure according to a first embodiment of the present invention. Form No. A0101 Page 10 of 23 201143018 [0020] FIG. 4 is a cross-sectional view showing the structure of a first embodiment of the present invention applied to a ball array package. [0021] FIG. 5 is a cross-sectional view showing an electronic package structure of a plurality of stacked wafers using the stacked wafer structure of the present invention in accordance with a second embodiment of the present invention. 6 is a cross-sectional view of an electronic package structure in which a plurality of stacked wafers are applied by the stacked wafer structure of the present invention and applied to a ball array package form, in accordance with a third embodiment of the present invention. [0023] FIG. 7 is a fourth embodiment of the present invention, in which a plurality of stacked wafers of different sizes are used for the stacked wafers of the present invention, and the underlying wafers are also different in size, and are applied to electronic packages of ball array packages. Structural section view. 8 is a cross-sectional view of an electronic package structure for fabricating a stacked wafer surface telecommunication contact using a rewiring structure according to a fifth embodiment of the present invention. [Main component symbol description] [0025] 2 circuit board 3 external telecommunication contact 4 electrode 6 first bonding layer 7 first bonding wire 9 second bonding layer 10 second bonding wire 11 sealing paste 50 stacked semiconductor element 51 semiconductor unit Form No. A0101 Page 11 / Total 23 Page 201143018 52 Package Structure 53 Circuit Board 54 First Semiconductor Unit 55 Second Semiconductor Unit 56 Sealant 57 Next Layer 58 Next Layer 59 Passive Element 60 Electrode

101 基板 102 電訊接點 103 具電訊傳遞之固著結構 110 第一封裝單元體 120 第二封裝單元體 300 三維立體晶片堆疊封裝結構 301 底層晶片 302 堆疊晶片101 substrate 102 telecommunication contact 103 fixed structure with telecommunication transmission 110 first package unit body 120 second package unit body 300 three-dimensional wafer stack package structure 301 underlying wafer 302 stacked wafer

303 通孔 310 接著層 311 絕緣層 312 通孔 320 填孔導電材料 321 第一電訊接點 322 第二電訊接點 323 第三電訊接點 324 第四電訊接點 表單編號A0101 第12頁/共23頁 201143018 325 電訊接點接著層 330 打線導線 340 封膠樹酯 350 基板 400 三維立體堆疊封裝結構 424 第四電訊接點 450 第一基板 460 第二基板 470 球陣列結構303 through hole 310 next layer 311 insulating layer 312 through hole 320 filling conductive material 321 first telecommunication contact 322 second telecommunication contact 323 third telecommunication contact 324 fourth telecommunication contact form number A0101 12/23 Page 201143018 325 Telecommunications contact layer Next layer 330 Wire conductor 340 Sealing resin 350 Substrate 400 Three-dimensional stacked package structure 424 Fourth telecommunications junction 450 First substrate 460 Second substrate 470 Ball array structure

501 底層晶片 502 第一堆疊晶片 503 第二堆疊晶片 504 第三堆疊晶片 530 打線導線 540 封勝樹酉旨 550 基板 600 三維立體堆疊封裝結構501 bottom wafer 502 first stacked wafer 503 second stacked wafer 504 third stacked wafer 530 wire bonding wire 540 Fengsheng tree 550 substrate 600 three-dimensional stacked package structure

650 第一基板 660 第二基板 670 球陣列結構 700 三維立體堆疊封裝結構 701 底層晶片 702 堆疊晶片 703 堆疊晶片 800 三維立體堆疊封裝結構 820 填孔導電材料 表單編號A0101 第13頁/共23頁 201143018650 First substrate 660 Second substrate 670 Ball array structure 700 Three-dimensional stacked package structure 701 Underlying wafer 702 Stacked wafer 703 Stacked wafer 800 Three-dimensional stacked package structure 820 Filled hole conductive material Form No. A0101 Page 13 of 23 201143018

821 第一電訊接點 822 重新佈線結構 830 打線導線 表單编號A0101 第14頁/共23頁821 First telecommunications contact 822 Rewiring structure 830 Wire drawing Form No. A0101 Page 14 of 23

Claims (1)

201143018 七、申請專利範圍: 1 . 一種電子封裝結構,至少包含:單數個底層晶片,表面具 有單數或複數個電訊接點,其藉由接著層與基板接合;該 基板具有單數或複數個電訊接點;單數或複數個堆疊晶片 ,其堆疊於底層晶片之表面,達到三維立體堆疊封裝結構 之目的;該堆疊晶片中具有單數或複數個通孔,且完全或 部分包覆以絕緣層;該絕緣層結構具有單數或複數個通孔 ,用於填入填孔導電材料;該填孔導電材料之表面與絕緣 層表面完全或部分包覆有電訊接點,使堆疊晶片具有單數 ® 或複數個電訊接點;電訊接點可直接製作在填孔導電材料 表面,或經由重新佈線處理後製作於它處;此電訊接點藉 由電訊接點接著層與不同層之堆疊晶片,或底層晶片進行 連接;堆疊晶片表面之電訊接點透過打線導線與基板之電 訊接點進行電訊連接;透過製作封膠樹酯將上述支結構進 行部分或完全包覆。 2. 如申請專利範為第1項之電子封裝結構,其中所述之電訊 φ 連接,可包含導電、絕緣、接地等連接目的。 3. 如申請專利範為第1項之電子封裝結構,其中所述之基板 ,可為有機基板如FR4 ' BT、_ABF,或為矽、砷化鎵,或 其他材料或上述材料之組合。 4. 如申請專利範為第1項之電子封裝結構,其中所述具有導 電性質之填孔導電材料,可為銅、錫、銀、鉛、鎢或以上 金屬材料合金或其他具有導電性之材料組合。 5. 如申請專利範為第1項之電子封裝結構,其中所述之堆疊 晶片與底層晶片可為主動電子元件、感測元件、測試元件 表單編號A0101 第15頁/共23頁 201143018 、為機電源建或以上電子元件之組合。 6. 如申請專利範為第1項之電子封裝結構,其中所述之通孔 結構,可利用如雷射鑽孔、光微影蝕刻、機械鑽孔或其他 方式製作。 7. 如申請專利範為第1項之電子封裝結構,其中所述之接著 層,可為BCB、ABF、PI或其他具有黏著性之材料。 8. 如申請專利範為第1項之電子封裝結構,其中所述之堆疊 或接合製程,可利用如熱壓、迴焊或其他方式製作。 9. 一種電子封裝結構,至少包含:單數個底層晶片,表面具 有單數或複數個電訊接點,其藉由接著層與基板接合;該 基板具有單數或複數個電訊接點;單數或複數個堆疊晶片 ,其堆疊於底層晶片之表面,達到三維立體堆疊封裝結構 之目的;該堆疊晶片中具有單數或複數個通孔,且完全或 部分包覆以絕緣層;該絕緣層結構具有單數或複數個通孔 ,用於填入填孔導電材料;該填孔導電材料之表面與絕緣 層表面完全或部分包覆有電訊接點,使堆疊晶片具有單數 或複數個電訊接點;此電訊接點藉由電訊接點接著層與不 同層之堆疊晶片,或底層晶片進行連接;堆疊晶片表面之 電訊接點透過打線導線與基板之電訊接點進行電訊連接; 透過製作封膠樹酯將上述支結構進行部分或完全包覆;前 述之三維立體堆疊封裝結構可藉由其他電子封裝形式,與 另一基板進行電訊連接。 10 .如申請專利範為第9項之電子封裝結構,其中所述之電訊 連接,可包含導電、絕緣、接地等連接目的。 11 .如申請專利範為第9項之電子封裝結構,其中所述之其他 電子封裝形式,可包含球陣列封裝、針陣列封裝、打線封 表單編號A0101 第16頁/共23頁 201143018 裝或其它電子封裝形式,或上述電子封裝形式之組合。201143018 VII. Patent application scope: 1. An electronic package structure comprising at least: a single bottom wafer having a single or multiple telecommunication contacts on the surface, which is bonded to the substrate by an adhesive layer; the substrate has a single or multiple telecommunication connections a single or a plurality of stacked wafers stacked on the surface of the underlying wafer for the purpose of a three-dimensional stacked package structure; the stacked wafer has a single or a plurality of through holes, and is completely or partially covered with an insulating layer; the insulation The layer structure has a single or a plurality of through holes for filling the hole-filling conductive material; the surface of the hole-filled conductive material and the surface of the insulating layer are completely or partially covered with telecommunication contacts, so that the stacked wafer has a single number or a plurality of telecommunications Contact; the telecommunication contact can be directly fabricated on the surface of the hole-filled conductive material or fabricated by rewiring; the telecommunication contact is connected to the stacked wafer of different layers or the underlying wafer by the telecommunication contact layer The telecommunication contacts on the surface of the stacked wafer are connected to the telecommunications contacts of the substrate through the wire bonding wires; Sealant resin support structure to carry out the above-described partially or completely coated. 2. If the patent application is the electronic package structure of item 1, the telecommunications φ connection may include the purpose of connection such as conduction, insulation, and grounding. 3. The electronic package structure of claim 1, wherein the substrate is an organic substrate such as FR4 'BT, _ABF, or germanium, gallium arsenide, or other materials or a combination thereof. 4. The electronic package structure according to claim 1, wherein the hole-filled conductive material having conductive properties may be copper, tin, silver, lead, tungsten or a metal material of the above or other conductive material. combination. 5. The electronic package structure of claim 1, wherein the stacked wafer and the bottom wafer are active electronic components, sensing components, and test component form number A0101, page 15 / 23, 201143018, for the machine Power supply or a combination of the above electronic components. 6. The electronic package structure of claim 1, wherein the through-hole structure can be fabricated by, for example, laser drilling, photolithographic etching, mechanical drilling, or the like. 7. The electronic package structure of claim 1, wherein the adhesive layer is BCB, ABF, PI or other adhesive material. 8. The electronic package structure of claim 1, wherein the stacking or bonding process is performed by, for example, hot pressing, reflow soldering or the like. 9. An electronic package structure comprising: a plurality of underlying wafers having a singular or plurality of telecommunication contacts on the surface, the substrate being bonded to the substrate by a bonding layer; the substrate having a single or a plurality of telecommunication contacts; the singular or plural stacking a wafer stacked on the surface of the bottom wafer to achieve a three-dimensional stacked package structure; the stacked wafer has a single or a plurality of through holes, and is completely or partially covered with an insulating layer; the insulating layer structure has a single or a plurality of a through hole for filling the hole-filled conductive material; the surface of the hole-filled conductive material and the surface of the insulating layer are completely or partially covered with telecommunication contacts, so that the stacked wafer has a single number or a plurality of telecommunication contacts; the telecommunication contact borrows The telecommunication contact layer is connected to the stacked wafers of different layers or the underlying wafer; the telecommunication contacts on the surface of the stacked wafer are electrically connected to the telecommunication contacts of the substrate through the wire bonding wires; the above-mentioned supporting structure is carried out by making the sealing resin Partially or completely covered; the aforementioned three-dimensional stacked package structure can be formed by another electronic package form, and another Board telecommunication connection. 10. The electronic package structure of claim 9, wherein the telecommunications connection may include a conductive, insulating, grounding, etc. connection purpose. 11. The electronic package structure of claim 9, wherein the other electronic package form may include a ball array package, a needle array package, a wire seal form number A0101, page 16 / 23 pages 201143018, or other Electronic package form, or a combination of the above electronic package forms. 表單編號A0101 第17頁/共23頁Form No. A0101 Page 17 of 23
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Cited By (3)

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CN106704843A (en) * 2015-11-16 2017-05-24 江昆渊 Full-ambient-light LED lamp tube
TWI636537B (en) * 2016-07-14 2018-09-21 國立清華大學 Electronic device of fan-out type multi-wafer stack package and method of forming the same
WO2024032023A1 (en) * 2022-08-08 2024-02-15 长鑫存储技术有限公司 Package structure and preparation method therefor

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Publication number Priority date Publication date Assignee Title
US9735131B2 (en) 2015-11-10 2017-08-15 Taiwan Semiconductor Manufacturing Company, Ltd. Multi-stack package-on-package structures

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106704843A (en) * 2015-11-16 2017-05-24 江昆渊 Full-ambient-light LED lamp tube
CN106704843B (en) * 2015-11-16 2019-06-21 江昆渊 Full-ambient-light LED lamp tube
TWI636537B (en) * 2016-07-14 2018-09-21 國立清華大學 Electronic device of fan-out type multi-wafer stack package and method of forming the same
WO2024032023A1 (en) * 2022-08-08 2024-02-15 长鑫存储技术有限公司 Package structure and preparation method therefor

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