WO2024022217A1 - Camera module and manufacturing method therefor - Google Patents

Camera module and manufacturing method therefor Download PDF

Info

Publication number
WO2024022217A1
WO2024022217A1 PCT/CN2023/108372 CN2023108372W WO2024022217A1 WO 2024022217 A1 WO2024022217 A1 WO 2024022217A1 CN 2023108372 W CN2023108372 W CN 2023108372W WO 2024022217 A1 WO2024022217 A1 WO 2024022217A1
Authority
WO
WIPO (PCT)
Prior art keywords
wafer
photosensitive
camera module
lens
panel
Prior art date
Application number
PCT/CN2023/108372
Other languages
French (fr)
Chinese (zh)
Inventor
陆锡松
俞杰
赵炘沂
管敏
王洋荣
Original Assignee
宁波舜宇光电信息有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CN202210892487.3A external-priority patent/CN117542868A/en
Priority claimed from CN202210892485.4A external-priority patent/CN117542867A/en
Priority claimed from CN202210890904.0A external-priority patent/CN117525095A/en
Priority claimed from CN202210890901.7A external-priority patent/CN117525094A/en
Application filed by 宁波舜宇光电信息有限公司 filed Critical 宁波舜宇光电信息有限公司
Publication of WO2024022217A1 publication Critical patent/WO2024022217A1/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0232Optical elements or arrangements associated with the device

Definitions

  • the present application relates to the technical field of camera modules, and in particular to a camera module using a wafer-level lens and a manufacturing method thereof.
  • camera modules are increasingly used in a variety of electronic devices, such as mobile phones, tablets, AR/VR, etc.
  • electronic devices have higher volume requirements for camera modules.
  • How to make the size of the camera module smaller so that the camera module can be used in electronic devices with smaller installation space has become particularly important. .
  • this application provides a camera module using a wafer-level lens and a manufacturing method thereof, so as to reduce the size of the camera module and improve the manufacturing efficiency of the camera module.
  • An object of the present application is to provide a camera module that overcomes the shortcomings of the existing technology, reduces the size of the camera module, and simplifies the manufacturing process.
  • a camera module including:
  • Photosensitive component the wafer-level lens is disposed on the photosensitive path of the photosensitive component, the photosensitive component includes a photosensitive chip and a protective cover covered above the photosensitive chip;
  • An encapsulation body is integrally formed on the circumferential side of the wafer-level lens and the circumferential side of the protective cover.
  • the lateral size of the protective cover is smaller than the lateral size of the photosensitive chip, and the package is integrally formed on at least a portion of the front surface of the photosensitive chip.
  • the photosensitive component further includes a side connecting portion, the side connecting portion is integrally formed on the peripheral side of the photosensitive chip, and the lateral size of the side connecting portion is larger than the lateral size of the protective cover,
  • the package body is integrally formed on at least a part of the front surface of the side connecting portion.
  • the camera module further includes a filter element disposed between the wafer-level lens and the photosensitive component, and the package is integrally formed on the peripheral side of the filter element.
  • the photosensitive chip further includes an electrical connection portion disposed on the back side of the photosensitive chip.
  • the photosensitive component further includes a circuit board and electronic components.
  • the circuit board is disposed on the back of the photosensitive chip.
  • the circuit board includes a circuit board body and a bottom packaging part.
  • the photosensitive chip is The electronic component is disposed on the front side of the circuit board body and is electrically connected to the circuit board body through the electrical connection part.
  • the electronic component is disposed on the back side of the circuit board body.
  • the bottom packaging part is integrated through a molding process. Molded on the back side of the circuit board body, the electronic component is molded inside the bottom package part.
  • a method of manufacturing a camera module including:
  • packaging conjoined part is integrally formed on the peripheral side of the wafer-level lens and the protective cover;
  • the module panel is divided along the height direction, and the package conjoined portion and the chip panel are divided to form multiple camera modules.
  • electrical connection parts are provided on the back surfaces of the plurality of photosensitive chips of the chip panel.
  • the chip panel includes a plurality of photosensitive chips and a conjoined portion disposed between the plurality of photosensitive chips.
  • the encapsulation material is a molding material or glue.
  • a camera module including:
  • Photosensitive chip the wafer-level lens is arranged on the photosensitive path of the photosensitive chip
  • a circuit board, the photosensitive chip is disposed on the circuit board;
  • a package body which is integrally formed on the wafer-level lens, the photosensitive chip and the circuit board.
  • the camera module further includes at least one lead, at least one lead is disposed between the photosensitive chip and the circuit board, and at least one lead is wrapped by the package.
  • the package covers at least a portion of the front side of the circuit board, at least a portion of the peripheral side and the front side of the photosensitive chip, and the peripheral side of the wafer-level lens.
  • the photosensitive chip includes a photosensitive area and a non-photosensitive area surrounding the photosensitive area, and the package body extends along a horizontal direction to the non-photosensitive area of the photosensitive chip, and the package body extends along a height The direction extends to the top of the wafer-level lens, and the package is integrally formed on the peripheral side of the photosensitive chip and the peripheral side of the wafer-level lens.
  • the package has vertical outer sides, and the lateral dimensions of the upper portion of the package are equal to the lateral dimensions of the bottom of the package.
  • the outer side of the package is inclined, the outer diameter of the package increases from top to bottom, and the lateral size of the bottom of the package is larger than the lateral size of the upper part of the package.
  • a method of manufacturing a camera module including:
  • a plurality of photosensitive chips are provided on the circuit board panel, and the plurality of photosensitive chips are electrically connected to the circuit board panel;
  • a plurality of wafer-level lenses are provided on a plurality of the photosensitive chips, and the plurality of wafer-level lenses are respectively located on the photosensitive paths of a plurality of the photosensitive chips;
  • packaging material between two adjacent wafer-level lenses and two adjacent photosensitive chips, curing the packaging material to form a packaging conjoined part, the packaging conjoined part is integrally combined with the The wafer-level lens, the photosensitive chip and the circuit board are assembled to form a module assembly;
  • the module panels are divided along the height direction to form multiple camera modules.
  • the packaging material is a molding material
  • the packaging conjoined portion is integrally formed on the wafer-level lens, the photosensitive chip and the circuit board panel through a molding process.
  • the package conjoined portion is cut to form a package body, and the circuit board panel is cut to form a plurality of circuit boards.
  • the package body covers at least part of the front surface of the circuit board, the At least part of the peripheral side and the front side of the photosensitive chip, and the peripheral side of the wafer-level lens.
  • a light-shielding layer is provided on the object side of the module panel, and the light-shielding layer is provided on the top surface of the package conjoined portion, facing toward The wafer-level lens direction extends.
  • a camera module including:
  • Photosensitive component the wafer-level lens is disposed on the photosensitive path of the photosensitive component, the photosensitive component includes a photosensitive chip and a protective cover covered above the photosensitive chip;
  • An encapsulation body is integrally formed on the circumferential side of the wafer-level lens, the circumferential side of the protective cover, and the circumferential side of the photosensitive chip.
  • the package includes an upper package and a lower package.
  • the upper package is integrally formed on the peripheral side of the wafer-level lens and the protective cover.
  • the lower package The body is integrally formed on the peripheral side of the photosensitive chip.
  • the photosensitive component further includes a side connecting portion, the side connecting portion is integrally formed on the peripheral side of the photosensitive chip, and the lower package body is integrally formed on the peripheral side of the side connecting portion.
  • the lateral size of the photosensitive chip is smaller than the lateral size of the protective cover.
  • the photosensitive chip further includes an electrical connection portion disposed on the back side of the photosensitive chip.
  • the camera module further includes a filter element disposed between the wafer-level lens and the photosensitive component, and the upper package is integrally formed on the peripheral side of the filter element.
  • a method of manufacturing a camera module including:
  • the lower packaging conjoined part is integrally molded with the upper packaging conjoined part to form a package conjoined part.
  • the module panels are divided along the height direction to form multiple camera modules.
  • electrical connection portions are provided on the back surfaces of the plurality of photosensitive chips of the chip panel.
  • the chip panel includes a plurality of photosensitive chips and a conjoined portion disposed between the plurality of photosensitive chips.
  • the first packaging material and the second packaging material are made of different materials.
  • a camera module including:
  • a light-transmitting cover plate, the light-transmitting cover plate is fixed on the top surface of the wafer-level lens
  • Photosensitive component the wafer-level lens is disposed on the photosensitive path of the photosensitive component
  • a package body which is integrally formed on a part of the bottom surface of the light-transmitting cover plate, the side surface of the wafer-level lens, and the side surface of the photosensitive component.
  • the lateral size of the light-transmitting cover is larger than the lateral size of the wafer-level lens and the photosensitive component, and the top surface of the wafer-level lens is flat.
  • the light-transmitting cover has an infrared cutoff function.
  • the camera module further includes a light-shielding portion disposed between the wafer-level lens and the light-transmitting cover.
  • the photosensitive component includes a photosensitive chip, a protective cover covering the photosensitive chip, and an electrical connection portion disposed on the back of the photosensitive chip.
  • a method of manufacturing a camera module including:
  • a cover layer Provide a cover layer, a plurality of wafer-level lenses and a plurality of photosensitive components, stack and fix a plurality of the wafer-level lenses and a plurality of the photosensitive components on the cover layer along the height direction to form a
  • a plurality of the wafer-level lenses and a plurality of the photosensitive components are placed upside down on the cover layer at a distance from each other;
  • packaging material between the plurality of wafer-level lenses and the plurality of photosensitive components, so that the packaging material covers the image side of the cover layer, the peripheral side of the wafer-level lens and the On the peripheral side of the photosensitive component, the packaging material is cured to form a packaging conjoined part;
  • the module panel is divided along the height direction, and the package conjoined part and the cover layer are divided to form multiple camera modules.
  • the image side of the cover layer is flat, and the top surface of the wafer-level lens is flat.
  • a light-shielding layer is provided on the cover layer by silk-screen printing, ink coating or glue coating, and a plurality of light holes are reserved on the light-shielding layer to provide light for the wafer-level lens to enter. aisle.
  • the packaging material is a molding material
  • the module panel is placed in a molding mold, and the molding material is injected into the molding mold to make the molding material Flow between the plurality of wafer-level lenses and the plurality of photosensitive components, so that the molding material covers the image side of the cover layer, the peripheral side of the wafer-level lens and the The peripheral side of the photosensitive component.
  • the encapsulating material is glue
  • the glue is filled between the plurality of wafer-level lenses and the plurality of photosensitive components by spraying or dotting glue.
  • this application has at least one of the following technical effects:
  • the package is integrally formed on the peripheral side of the wafer-level lens and the protective cover, so that the package can encapsulate and protect the peripheral sides of the wafer-level lens and the protective cover.
  • the package is integrally formed on the peripheral side of the wafer-level lens, at least part of the peripheral side and front side of the photosensitive chip, and at least part of the front side of the circuit board, so that the package body can encapsulate and protect the wafer-level lens and the photosensitive chip. Peripheral side.
  • the package is integrally formed on the peripheral side of the wafer-level lens, the protective cover and the photosensitive chip, so that the package can be packaged and Protect the wafer-level lens, protective cover and the periphery of the photosensitive chip.
  • cover layer as the assembly reference, multiple separate wafer-level lenses and photosensitive components are fixed upside down on the cover layer, which simplifies the manufacturing process and reduces the requirements for incoming materials for the manufacturing method.
  • the package body is integrally formed on a part of the bottom surface of the light-transmitting cover, the side of the wafer-level lens, and the side of the photosensitive component to encapsulate and protect the wafer-level lens and the photosensitive component.
  • Figure 1 is a schematic cross-sectional view of a wafer-level lens provided according to the present application.
  • FIGS. 2A and 2B are schematic diagrams of the manufacturing method of the lens panel provided according to the present application.
  • Figure 3 is a schematic structural diagram of the lens panel provided according to the present application in the top view direction;
  • 4A, 4B, 4C and 4D are schematic cross-sectional views of four examples of lens panels provided according to the present application.
  • 5A and 5B are two schematic cross-sectional views of a wafer-level lens provided according to the present application.
  • 6A, 6B, 6C and 6D are schematic cross-sectional views of four examples of the first embodiment of the camera module provided according to the present application;
  • Figure 6E is a schematic top view of the photosensitive component in Figure 6A according to the present application.
  • FIG. 7A and 7B are schematic cross-sectional views and top views of the chip panel provided according to the present application.
  • Figure 7C is a schematic top view of the photosensitive chip after the chip panel is divided according to Figures 7A and 7B of the present application;
  • Figure 8 is a schematic diagram of a manufacturing method according to the first embodiment of the camera module provided by the present application.
  • 9A, 9B and 9C are schematic cross-sectional views of three examples of the second embodiment of the camera module provided according to the present application.
  • Figure 10 is a schematic diagram of a manufacturing method according to the second embodiment of the camera module provided by the present application.
  • 11A, 11B and 11C are schematic cross-sectional views of three examples of the third embodiment of the camera module provided according to the present application.
  • Figure 12 is a schematic diagram of the manufacturing method of the third embodiment of the camera module provided by the present application.
  • Figure 13 is a schematic cross-sectional view of a fourth embodiment of a camera module provided according to the present application.
  • Figure 14 is a schematic diagram of a manufacturing method of a fourth embodiment of a camera module provided by this application.
  • the terms “setting”, “installation”, “connecting” and “connecting” should be understood in a broad sense.
  • it can be a fixed connection, It can also be a detachable connection or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, a contact connection or an indirect connection through an intermediate medium; it can be an internal connection between two components.
  • the specific meanings of the above terms in this application can be understood according to specific circumstances.
  • Configured as various units, circuits, or other components may be described or recited as being “configured to” perform one or more tasks.
  • “configured to” is used to imply structure by indicating that the unit/circuit/component includes structure (eg, circuitry) that performs the task or tasks during operation.
  • “configured to” may include general-purpose structures (eg, general-purpose circuitry) manipulated by software and/or firmware to operate in a manner capable of performing the task or tasks to be solved.
  • Configured to may also include adapting a manufacturing process (eg, a semiconductor fabrication facility) to fabricate a device (eg, an integrated circuit) suitable for implementing or performing one or more tasks.
  • the term “if” may be interpreted to mean “when” or “in response to” or “in response to determining” or “in response to detecting”, depending on the context.
  • the phrase “if it is determined" or “if [the stated condition or event] is detected” may be interpreted to mean “when it is determined" or “in response to the determination... ” or “on detection of [stated condition or event]” or “in response to detection of [stated condition or event].”
  • a wafer-level lens 11 according to an embodiment of the present application is illustrated, which includes a wafer-level lens assembly 111 , a support member 112 and a light shielding portion 113 .
  • the support member 112 is disposed on the image side of the wafer-level lens assembly 111, so that the support member 112 supports the wafer-level lens assembly 111 from the image side;
  • the light-shielding portion 113 is disposed on the object side of the wafer-level lens assembly 111 to block light.
  • the wafer-level lens 11 can reduce the stray light entering the wafer-level lens 11 on one side of the light incident direction.
  • the wafer-level lens 11 may not include the support member 112112 and/or the light shielding part 113, thereby reducing the height or simplifying the manufacturing process.
  • the side of the wafer-level lens assembly 111 or the wafer-level lens 11 facing the subject is called the object side, and the side opposite to the object side is the image side.
  • the object side is Refers to the side where the imaging light enters the wafer-level lens assembly 111 or the wafer-level lens 11.
  • the image side refers to the side where the imaging light exits the wafer-level lens assembly 111 or the wafer-level lens 11, that is, the wafer-level lens assembly. 111 or the wafer-level lens 11 faces the side of the image plane. Looking at the direction of the wafer-level lens 11 shown in FIG. 1 , the upper side of the wafer-level lens 11 is the image side, and the lower side of the wafer-level lens 11 is the object side.
  • the wafer-level lens 11 has an optical axis, and the optical axis of the wafer-level lens 11 is also the optical axis of the wafer-level lens assembly 111.
  • the wafer-level lens assembly 111 includes at least one wafer-level lens 1111.
  • the number of wafer-level lenses 1111 in the lens assembly 111 is determined according to the requirements of optical design. The number may be one, two, three, four or more.
  • the wafer-level lens assembly 111 includes a wafer-level lens 1111, and the support 112 and the light-shielding portion 113 are respectively fixed on the image side and the object side of the wafer-level lens 1111; in this application, the wafer-level lens assembly 111 includes at least two wafer-level lenses 1111. The at least two wafer-level lenses 1111 are stacked along the optical axis to form a complete optical system. The support member 112 is fixed to at least two wafers.
  • the wafer-level lens assembly 111 also includes at least one spacer 1113.
  • the spacer 1113 is disposed between adjacent wafer-level lenses 1111.
  • the spacer 1113 supports the adjacent wafer-level lenses 1111 and is suitable for adjusting the crystal.
  • the support member 112 , the light-shielding portion 113 and the spacer 1113 each have a light hole for light to pass through and avoid interference with the wafer-level lens 1111 .
  • the at least two wafer-level lenses 1111 of the wafer-level lens assembly 111 include a first wafer-level lens 1114, a second wafer-level lens 1115, and a third wafer-level lens 1116.
  • the first wafer-level lens 1114, the second wafer-level lens 1115 and the third wafer-level lens 1116 are stacked along the direction of light incidence, and the light shielding part 113 is fixed on the object side of the first wafer-level lens 1114 and supported.
  • the member 112 is fixed to the image side of the third wafer level lens 1116 .
  • the wafer-level lens assembly 111 further includes at least one spacer layer 2112.
  • the spacer layer 2112 may be disposed between the first wafer-level lens 1114 and the second wafer-level lens 1115 and/or be disposed between Between the second wafer-level lens 1115 and the third wafer-level lens 1116 assembly, the spacer layer 2112 supports the adjacent wafer-level lenses 1111 and is suitable for adjusting the spacing between the wafer-level lenses 1111 .
  • the wafer-level lens assembly 111 further includes an adhesive layer, which can be disposed between adjacent wafer-level lenses 1111 for fixing the adjacent wafer-level lenses 1111; the adhesive layer It can also be disposed between the adjacent wafer-level lenses 1111 and the spacers 1113 for fixing the adjacent wafer-level lenses 1111 and the spacers 1113; the adhesive layer can also be disposed between the adjacent wafer-level lenses 1111 and the spacers 1113. between the lens 1111 and the support 112 for fixing the adjacent wafer-level lens 1111 and the support 112; an adhesive layer can also be provided between the adjacent wafer-level lens 1111 and the light shielding part 113 for fixing The adjacent wafer level lens 1111 and the light shielding part 113 are fixed.
  • the materials of the adhesive layers disposed at different positions may be the same or different, depending on the adhesion requirements, and the present application is not limited thereto.
  • the adhesive layer may be glue.
  • the glue When setting the adhesive layer, the glue may be applied continuously or at dot-like intervals, so that at least two wafer-level lenses 1111 and spacer layers 2112 are formed. When fixed, the air located inside can escape; in another example, the adhesive layer can also be a solid glue such as double-sided tape.
  • the wafer-level lens 1111 includes a light-transmitting substrate 11111 and at least one lens unit 11112.
  • the at least one lens unit 11112 is disposed on one or both sides of the light-transmitting substrate 11111.
  • the at least one lens unit 11112 can focus or To diffuse light, at least one lens unit 11112 can be fixed on one or both sides of the light-transmitting substrate 11111 through methods such as bonding, insert injection molding, and integral molding.
  • a wafer-level lens 1111 includes a light-transmitting substrate 11111 and a lens unit 11112 disposed on the object side or image side of the light-transmitting substrate 11111.
  • the wafer-level lens 1111 One side of the wafer-level lens 1111 is a flat surface, and the other side of the wafer-level lens 1111 is a curved surface.
  • a wafer-level lens 1111 includes a light-transmissive substrate 11111 and is disposed on The two lens units 11112 on the object side and image side of the light-transmitting substrate 11111 have curved surfaces on both sides of the wafer-level lens 1111.
  • the curved surface The shape can be spherical, aspherical or free-form.
  • the wafer level lens 11 (wafer level optics) is formed by dividing the lens panel 21.
  • the lens panel 21 includes a plurality of connected wafer level lenses 11. By dividing the lens panel 21, the lens panel 21 can be The wafer-level lens 11 is manufactured in large quantities and at low cost, and the obtained wafer-level lens 11 also has a relatively small size.
  • the manufacturing method of the lens panel 21 includes the following steps S110-S130:
  • Step S110 Provide at least two lens panels 2111.
  • the lens panel 2111 includes a substrate layer 21111 and a plurality of lens units 11112 disposed on one side or both sides of the substrate layer 21111 .
  • the plurality of lens units 11112 are arrayed on the substrate.
  • Layer 21111, each lens unit 11112 has an optical axis perpendicular to the substrate layer 21111.
  • Step S120 Align at least two lens panels 2111 along the height direction. As shown in FIG. 2A , by overlapping the optical axes of the lens units 11112 on adjacent lens panels 2111 , at least two lens panels 2111 are aligned along the height direction, where the height direction refers to perpendicular to the lens panels 2111 (or The direction of the substrate layer 21111).
  • Step S130 Connect at least two lens panels 2111 to form the lens panel 21.
  • at least two aligned lens panels 2111 are fixed in a predetermined position directly or indirectly to form a lens panel 21 , which includes a plurality of wafer-level lenses 11 distributed in an array.
  • step S110 of the manufacturing method of the lens panel 21 may include:
  • step S111 at least one spacer layer 2112 is provided, and the spacer layer 2112 is disposed between adjacent lens panels 2111.
  • the spacing layer 2112 is used to adjust the spacing between adjacent groups of lens panels 2111.
  • the spacing layer 2112 has a plurality of light holes corresponding to the lens units 11112 of the adjacent lens panels 2111, so that light passes through the spacing layer 2112. The multiple light holes pass through, and there is no interference between the spacer layer 2112 and the lens panel 2111.
  • the spacer layer 2112 preferably uses an opaque material to reduce stray light from entering the wafer-level lens 11 .
  • a support layer 212 is provided, and the support layer 212 is disposed on the image side of at least two lens panels 2111.
  • the support layer 212 is used to support at least two lens panels 2111.
  • the support layer 212 has a plurality of light holes corresponding to the lens units 11112 of the adjacent lens panels 2111, so that light passes through the multiple light holes of the support layer 212. through, and there will be no interference between the support layer 212 and the lens panel 2111.
  • the support layer 212 preferably uses an opaque material to reduce stray light from entering the wafer-level lens 11 .
  • a light-shielding layer 213 is provided, and the light-shielding layer 213 is disposed on the object side of at least two lens panels 2111.
  • the light-shielding layer 213 is made of an opaque material, which is used to reduce stray light entering from the light incident direction.
  • the light shielding layer 213 has a plurality of light holes corresponding to the lens units 11112 of the adjacent lens panels 2111, so that light passes through the multiple light holes of the light shielding layer 213, and there is a gap between the light shielding layer 213 and the lens panel 2111. No interference will occur.
  • the light-shielding layer 213 may be pre-formed on the image side of the lens panel 2111 closest to the object side of at least two lens panels 2111 by silk screen printing, ink coating, or glue coating; in this application, In another embodiment of the application, the light-shielding layer 213 may also be pre-formed and then disposed on the object side of at least two lens panels 2111.
  • the final lens panel 21 may only include one of the spacer layer 2112, the support layer 212, and the light shielding layer 213. Or two, or may include a spacer layer 2112, a support layer 212 and a light-shielding layer 213 at the same time.
  • step S110 includes step S111
  • step S120 of the manufacturing method of the lens panel 21 may include:
  • Step S121 align the spacer layer 2112 with the adjacent lens panel 2111 along the height direction. Align the spacer layer 2112 and the adjacent lens panel 2111 so that the multiple light holes of the spacer layer 2112 can face the lens units 11112 on the adjacent lens panel 2111, thereby preventing Interference occurs between the spacer layer 2112 and the lens units 11112 on the adjacent lens panel 2111, or the imaging is affected.
  • step S110 includes step S112
  • step S120 of the manufacturing method of the lens panel 21 may include:
  • Step S122 align the support layer 212 with the adjacent lens panel 2111 along the height direction. Align the support layer 212 and the adjacent lens panel 2111 so that the multiple light holes of the support layer 212 can face the lens units 11112 on the adjacent lens panel 2111, thereby preventing the support layer 212 from interfacing with the adjacent lens panel 2111. Interference occurs between the lens units 11112 on the camera or the imaging is affected.
  • step S110 when step S110 includes step S113, step S120 of the manufacturing method of the lens panel 21 may include:
  • Step S123 align the light shielding layer 213 with the adjacent lens panel 2111 along the height direction. Align the light shielding layer 213 and the adjacent lens panel 2111 so that the multiple light holes of the light shielding layer 213 can face the lens units 11112 on the adjacent lens panel 2111, thereby preventing the light shielding layer 213 from interfacing with the adjacent lens panel 2111. Interference occurs between the lens units 11112 on the camera or the imaging is affected.
  • step S130 of the manufacturing method of the lens panel 21 when the lens panel 21 includes one, two or all of the spacer layer 2112, the support layer 212, and the light shielding layer 213, step S130 can include:
  • Step S131 connect the spacer layer 2112, the support layer 212 or the light-shielding layer 213 to the adjacent lens panel 2111.
  • the spacer layer 2112, the support layer 212 or the light-shielding layer 213 are sequentially superimposed and fixed.
  • the above adjacent components can be fixed by providing an adhesive layer.
  • the obtained lens panel 21 includes a lens assembly panel 211, a support layer 212 and a light shielding layer 213.
  • the lens assembly panel 211 includes at least one lens panel 2111.
  • the support layer 212 The light shielding layer 213 and the light shielding layer 213 are respectively fixed on the image side and the object side of the lens panel 2111 .
  • the lens assembly panel 211 may also include at least one spacer layer 2112.
  • the at least one spacer layer 2112 is disposed between adjacent lens panel panels 2111 and may be fixed by providing an adhesive layer between the spacer layer 2112 and the lens panel 2111. On the lens panel 2111.
  • the manufacturing method of the wafer-level lens 11 includes the following steps S210-220:
  • Step S210 Provide a lens panel 21.
  • Step S220 Divide the lens panel 21 to obtain multiple wafer-level lenses 11. As shown in FIG. 2B , the solid lines are division lines. After division, multiple independent wafer-level lenses 11 can be obtained. The middle of the two solid lines indicates the part to be removed.
  • the lens panel 21 can be obtained through steps S110-S130 of the manufacturing method of the lens panel 21.
  • step S220 at least one of sawing, laser cutting, laser grinding, water punch cutting, milling, micromachining, micro slicing, punching and cutting can be used.
  • the lens panel 21 is divided to obtain the wafer-level lens 11 .
  • the lens assembly panel 211 is divided to form a plurality of wafer-level lens assemblies 111, wherein the lens panel 2111 is divided to form a plurality of wafer-level lenses 1111.
  • the lens panel 2111 The substrate layer 21111 is divided into a plurality of light-transmitting substrates 11111, the spacer layer 2112 is divided into a plurality of spacers 1113; the support layer 212 is divided into a plurality of support members 112; the light-shielding layer 213 is divided into a plurality of light-shielding parts 113 .
  • the segmented wafer-level lens 11 has a rectangular parallelepiped outline, which reduces the difficulty of segmentation.
  • the outline of the wafer-level lens 11 can also have other shapes, such as a hexagonal prism shape, a cylinder shape, and a cutting cylinder. Shape and other shapes, where a cut cylindrical shape refers to a shape in which at least part of the side of the cylinder is cut.
  • the manufacturing method of the lens panel 2111 includes the following steps S310-S320:
  • Step S310 Provide a substrate layer 21111.
  • step S320 multiple lens units 11112 are formed on one side or both sides of the substrate layer 21111.
  • the plurality of lens units 11112 are arranged in an array to facilitate subsequent cutting.
  • the lens units 11112 are made of light-transmitting material, such as resin material.
  • the lens panel 2111 includes a substrate layer 21111 and a plurality of lens units 11112 formed on at least one side of the substrate layer 21111.
  • the lens panel 2111 can be manufactured in a variety of ways.
  • Figures 4A to 4C illustrate this invention. Application for three lens panels 2111.
  • Figure 4A shows the first embodiment of the lens panel 2111 of the present application.
  • the substrate layer 21111 provided in step S310 is flat-shaped.
  • multiple lenses are formed on both sides of the substrate layer 21111.
  • Unit 11112 wherein the optical axes of the plurality of lens units 11112 on both sides of the substrate layer 21111 overlap.
  • the substrate layer 21111 is made of a light-transmitting material suitable for transmitting visible light, such as glass material or resin material.
  • Figure 4B shows the second embodiment of the lens panel 2111 of the present application.
  • the substrate layer 21111 provided in step S310 is flat-shaped.
  • multiple lens units are formed on one side of the substrate layer 21111.
  • the substrate layer 21111 is made of a light-transmitting material suitable for transmitting visible light, such as glass material or resin material.
  • the plurality of lens units 11112 can be disposed on one side or both sides of the substrate layer 21111 through bonding or insert molding. Specifically, in one example, multiple lens units 11112 can be preformed, and then the multiple lens units 11112 can be bonded to one side or both sides of the substrate layer 21111 through optical glue; in another example, the substrate layer 21111 It is arranged in the molding cavity of a lens molding mold, injects liquid lens material (such as resin) from the injection port of the lens molding mold, so that the interior of the molding cavity is filled with lens material, solidifies the lens material, and makes one or both sides of the substrate layer 21111 (
  • one side or both sides refers to the upper surface side and/or the lower surface side of the substrate layer 21111 (which will not be described in detail below) to form a plurality of lens units 11112, thereby obtaining a lens panel 2111,
  • Figure 4C shows the third embodiment of the lens panel 2111 of the present application.
  • the substrate layer 21111 provided in step S310 is flat, and the substrate layer 21111 has a plurality of through holes.
  • step S320 in the substrate layer A plurality of lens units 11112 are formed on both sides of the substrate layer 21111. The optical axes of the multiple lens units 11112 on both sides of the substrate layer 21111 overlap, and the two opposite lens units 11112 are connected through the through holes of the substrate layer 21111.
  • the substrate layer 21111 can be made of a light-transmitting material suitable for transmitting visible light, such as a glass material or a resin material; an opaque material can also be used, which is beneficial to reducing stray light.
  • the plurality of lens units 11112 may be disposed on both sides of the substrate layer 21111 through insert molding.
  • FIG 5A shows the wafer-level lens 11 made by the present application using the lens panel 2111 described in Figure 4A.
  • the wafer-level lens 1111 includes a light-transmitting substrate 11111 and lens units formed on both sides of the light-transmitting substrate 11111. 11112.
  • FIG. 4D shows the fourth embodiment of the lens panel 2111 of the present application.
  • the lens unit 11112 formed on one side or both sides of the substrate layer 21111 includes an imaging part 111121 and a structural part 111122.
  • the lens unit The imaging part 111121 of 11112 is adapted to refract incident light
  • the structural part 111122 of the lens unit 11112 is adapted to support the lens panel 2111 or adjust the distance between adjacent lens panels 2111.
  • the structural part 111122 of the lens unit 11112 can replace the function of the spacer 1113 or the support 112, thereby simplifying the manufacturing process.
  • Figure 5B shows another embodiment of the wafer-level lens 11 of the present application.
  • the wafer-level lens 11 includes a first wafer-level lens 1114, a second wafer-level lens 1115 and a third wafer-level lens 1115.
  • Circle-level lens 1116 wherein the lens unit 11112 located on the image side of the first wafer-level lens 1114, the second wafer-level lens 1115 and the third wafer-level lens 1116 includes an imaging part 111121 and a structural part 111122.
  • the first crystal The round-level lens 1114 is fixed on the image side of the second wafer-level lens 1115 through the structural part 111122, and the second wafer-level lens 1115 is fixed on the image side of the third wafer-level lens 1116 through the structural part 111122, and passes through the first wafer.
  • the structural parts 111122 of the first-level lens 1114 and the second wafer-level lens 1115 respectively adjust the distance between adjacent wafer-level lenses 1111, and the wafer-level lens 11 is supported by the structural part 111122 of the third wafer-level lens 1116.
  • the wafer-level lens 11 also includes a light-shielding portion 113 disposed on the object side of the first wafer-level lens 1114. The light-shielding portion 113 is fixed. On the object side of the first wafer level lens 1114 .
  • the camera module 10 includes a wafer-level lens 11 , a package 12 and a photosensitive component 13 .
  • the round-level lens 11 is disposed on the photosensitive path of the photosensitive component 13
  • the package 12 is disposed on the peripheral side of the wafer-level lens 11 .
  • the photosensitive component 13 is used to convert the optical signal of the subject converged by the wafer-level lens 11 into an electrical signal.
  • the photosensitive component 13 has a front and a back, wherein the front of the photosensitive component 13 faces the wafer-level lens 11 and the back of the photosensitive component 13 Opposite to the front of the photosensitive component 13 , the wafer-level lens 11 is fixed on the front of the photosensitive component 13 .
  • the wafer-level lens 11 is bonded to the front of the photosensitive component 13 through the support 112 , and the wafer-level lens component 111 is installed on the front of the photosensitive component 13 under the action of the support 112 .
  • the photosensitive component 13 includes a photosensitive chip 131 and an electrical connection portion 133 provided on the photosensitive chip 131 , wherein the electrical connection portion 133 can be Other functional components are integrated to further process the electrical signals converted by the photosensitive chip 131 .
  • the photosensitive chip 131 has a front surface facing the wafer-level lens 11 and a back surface opposite to the front surface.
  • the front side of the photosensitive chip 131 includes a photosensitive area and a non-photosensitive area.
  • the non-photosensitive area surrounds the photosensitive area, and the photosensitive area is used for photosensitivity.
  • the electrical connection portion 133 is provided on the back side of the photosensitive chip 131 , wherein the electrical connection portion 133 is implemented as a plurality of solder balls, and the plurality of solder balls can be connected electrically by solder bumps, solder pads, or other methods. Component replacement; in another specific example of the present application, the electrical connection portion 133 is provided in the non-photosensitive area on the front side of the photosensitive chip 131, as shown in FIGS. 11A to 11C , in which the electrical connection portion 133 is implemented as a plurality of solder joints. pads, multiple pads may be replaced with solder bumps, solder pads, or other electrical connection components.
  • the photosensitive chip 131 is packaged in a wafer-level CSP (Chip Scale Package), also known as a wafer-level chip.
  • the photosensitive component 13 further includes a protective cover 132 , which is disposed above the photosensitive chip 131 to protect the photosensitive chip 131 .
  • the protective cover 132 may be made of glass, and the protective cover 132 is fixed to the non-photosensitive area on the front side of the photosensitive chip 131 by adhesion or other means.
  • the wafer-level CSP packaged photosensitive chip 131 is disposed between the protective cover 132 and the electrical connection portion 133 , and the protective cover 132 and the electrical connection portion 133 are disposed oppositely on both sides of the photosensitive chip 131 .
  • the outer side of the wafer-level lens 11 is flush with the outer side of the protective cover 132 .
  • the photosensitive chip 131 in the wafer-level CSP package adopts the method of directly leading out the electrical connection portion 133 on the bottom surface.
  • the photosensitive chip 131 is directly electrically connected to the motherboard of the external electronic device through the electrical connection portion 133 on the bottom surface, which can effectively shorten the signal transmission distance and reduce the cost. Small attenuation, the anti-interference and anti-noise performance of the photosensitive chip 131 can also be improved, and the lateral size of the photosensitive component 13 can also be reduced, making the structure of the photosensitive component 13 more compact.
  • the camera module 10 further includes a filter element 14.
  • the filter element 14 has an infrared cutoff function and is used to filter the incident light entering the photosensitive chip 131. , filtering out stray light such as infrared light that is not needed for imaging in the incident light.
  • the filter element 14 is disposed above the protective cover 132 so that the filter element 14 is located on the photosensitive path of the photosensitive chip 131 , and the filter element 14 is disposed on the wafer-level lens 11 and Between the photosensitive components 13 , that is, along the height direction, the photosensitive component 13 includes a filter element 14 , a protective cover 132 , a photosensitive chip 131 , and an electrical connection part 133 in sequence.
  • the camera module 10 does not have the filter element 14 shown in FIG. 6B .
  • the protective cover 132 has an infrared cutoff function, that is, the protective cover 132 is used as a filter element, so that the protective cover 132 can filter the imaging light entering the photosensitive chip 131.
  • This arrangement method eliminates the need to set up a separate filter element. On the one hand, the cost of the camera module 10 can be reduced, and on the other hand, the overall height of the camera module 10 can be reduced.
  • the infrared cutoff function of the protective cover 132 can be achieved by, for example, the material of the protective cover 132 itself having the function of absorbing infrared rays or the surface of the protective cover 132 being coated with an infrared cutoff film.
  • the filter element is used as the protective cover 132 , so that the filter element and the protective cover 132 are combined into one.
  • the wafer-level lens 11 has an infrared cutoff function.
  • the light-transmitting substrate 11111 of one of the wafer-level lenses 1111 of the wafer-level lens 11 has an infrared cutoff function, so that the wafer-level lens 11 It has an infrared cutoff function to filter the imaging light entering the photosensitive chip 131 .
  • the infrared cutoff function of the light-transmitting substrate 11111 can be achieved by, for example, the material of the light-transmitting substrate 11111 itself having the function of absorbing infrared rays or the surface of the light-transmitting substrate 11111 being coated with an infrared cutoff film. This arrangement method eliminates the need for separate filter elements, which can reduce the cost of the camera module 10 and reduce the overall height of the camera module 10 .
  • the package 12 is integrally formed on the peripheral side of the wafer-level lens 11 .
  • the package 12 is arranged around the peripheral side of the wafer-level lens 11 .
  • the entire package is covered by a package 12 to protect the peripheral side of the wafer-level lens 11.
  • the package 12 is made of an opaque material, thereby preventing stray light from entering the wafer-level optical lens.
  • the package 12 extends toward the image side (downward) and further covers the peripheral side of the protective cover 132.
  • the package 12 is integrally formed on the peripheral sides of the wafer-level lens 11 and the protective cover 132, so that the wafer-level The peripheral sides of the lens 11 and the protective cover 132 are all covered by the package 12 , which can protect the wafer-level lens 11 and the peripheral sides of the protective cover 132 .
  • the lateral size of the protective cover 132 is smaller than the lateral size of the photosensitive chip 131, so that at least a part of the front surface of the photosensitive chip 131 is exposed, so that the package 12 is integrally formed on at least a part of the front surface of the photosensitive chip 131.
  • the package body 12 covers at least part of the front surface of the photosensitive chip 131. Specifically, the outer annular area 1311 of the front surface of the photosensitive chip 131 is not covered by the protective cover 132, so that the package 12 is integrally formed on the peripheral side of the wafer-level lens 11 and the protective cover.
  • the package 12 covers the peripheral side of the wafer-level lens 11 and the peripheral side of the protective cover 132 and the outer annular area 1311 of the front surface of the photosensitive chip 131 .
  • the lateral size refers to the size in the direction perpendicular to the optical axis of the wafer-level lens 11;
  • the outer annular area 1311 refers to the outermost annular area on the front surface of the photosensitive chip 131, which is located on the photosensitive
  • the non-photosensitive area of the chip 131 is shown in Figure 6E.
  • the package 12 is integrally formed around the wafer-level lens 11, the filter element 14 and the protective cover 132, so that the wafer-level lens 11.
  • the peripheral sides of the filter element 14 and the protective cover 132 are all covered by the package 12 .
  • the lateral dimensions of the filter element 14 and the protective cover 132 are the same, and the lateral dimensions of the photosensitive chip 131 are larger than those of the filter element 14 and the protective cover 132 , so that at least part of the front surface of the photosensitive chip 131 is exposed. , so that the package body 12 covers a part of the front surface of the photosensitive chip 131.
  • the outer annular area 1311 of the front surface of the photosensitive chip 131 is not covered by the protective cover 132, so the package body 12 is integrally formed with the wafer-level lens 11 and the light filter.
  • the package 12 covers the wafer-level lens 11, the filter element 14 and the peripheral side of the protective cover 132 and the front surface of the photosensitive chip 131.
  • the wafer-level CSP packaged photosensitive chip 131 can be directly electrically connected to the motherboard of an external electronic device (such as a mobile phone) through the electrical connection portion 133 to achieve circuit conduction of the camera module 10, as shown in Figures 6A to 6C.
  • the photosensitive component 13 further includes a circuit board 135 , the circuit board 135 is disposed on the back of the photosensitive chip 131 , and the electrical connection portion 133 is electrically connected to the circuit board 135 , so that The electrical connection between the photosensitive chip 131 and the circuit board 135 is achieved through the electrical connection portion 133 .
  • the circuit board 135 includes a circuit board main body 1351, a connecting belt 1352 and a connecting plate 1353.
  • the photosensitive chip 131 is disposed on the front side of the circuit board main body 1351 and is electrically connected to the circuit board main body 1351 through the electrical connection part 133.
  • the connecting belt 1352 is connected to and The circuit board main body 1351 and the connecting plate 1353 are electrically connected, so that the connecting strip 1352 transmits the imaging information obtained by the circuit board main body 1351 from the photosensitive chip 131 to the external electronic device through the connector, so that the photosensitive chip 131 packaged in the wafer level CSP can also be It is indirectly electrically connected to the motherboard of the external electronic device through the circuit board 135 .
  • the photosensitive component 13 further includes electronic components, which may be one or more of passive electronic components such as resistors and capacitors, and active electronic components such as drive chips and memory chips.
  • the electronic components are arranged on the connecting strip 1352 and/or the connecting plate 1353 to avoid occupying the space of the circuit board main body 1351, thereby providing sufficient space for the photosensitive chip 131 placed on the circuit board main body 1351. Installation location.
  • the electronic component 134 is disposed on the back of the circuit board body 1351 , that is, the electronic component 134 and the photosensitive chip 131 are disposed on both sides of the circuit board body 1351 .
  • the electronic component 134 and the photosensitive chip 131 are disposed on both sides of the circuit board body 1351 .
  • it can Avoid the placement of the photosensitive chip 131
  • the lateral size of the circuit board body 1351 can be reduced, making the structure of the camera module 10 more compact.
  • the front side of the circuit board main body 1351 refers to the side facing the photosensitive chip 131 or the wafer-level lens 11
  • the back side of the circuit board main body 1351 refers to the side away from the photosensitive chip 131 or the wafer-level lens 11.
  • the circuit board The back side of the main body 1351 is opposite to the front side. Further, the circuit board 135 also includes a bottom packaging part 1354.
  • the bottom packaging part 1354 is disposed on the back of the circuit board body 1351.
  • the bottom packaging part 1354 encapsulates the electronic components 134 disposed on the back of the circuit board body 1351 inside it. Therefore, the electronic component 134 will not be directly exposed to the air, and the electronic component 134 will not be contaminated with dust and other pollutants.
  • the bottom packaging part 1354 is integrally formed on the back of the circuit board body 1351 through a molding process, and the electronic components 134 are molded inside the bottom packaging part 1354 to protect the electronic components 134 .
  • the camera module 10 in the first embodiment is formed by dividing the module panel 20 .
  • the module panel 20 includes a plurality of connected camera modules 10 .
  • This method can manufacture the camera module 10 in batches and at low cost, and the obtained camera module 10 also has a relatively small size.
  • the module panel 20 includes a lens panel 21 stacked along the height direction, a protective layer 22 and a chip panel 24.
  • the chip panel 24 includes a plurality of photosensitive chips 131. After cutting, the chip panel 24 can form a plurality of photosensitive chips as described above.
  • the chip 131 and the lens panel 21 can be cut to form multiple wafer-level lenses 11 as mentioned above.
  • the protective layer 22 can be cut to form multiple protective covers 132 as mentioned above.
  • a single wafer-level lens 11 is located on a single photosensitive chip 131 On the photosensitive path, the protective cover 132 is disposed between the wafer-level lens 11 and the photosensitive chip 131 .
  • the manufacturing method of the camera module 10 includes the following steps S410-S440:
  • Step S410 stack and fix a lens panel 21 , a protective layer 22 and a chip panel 24 along the height direction to form a module panel 20 .
  • the module panel 20 includes a lens panel 21, a protective layer 22 and a chip panel 24 along the height direction, providing a lens panel 21, a protective layer 22 and a chip panel 24.
  • the lens panel 21 is provided with a protective layer 22 and a chip panel 24.
  • the board 21, the protective layer 22 and the chip panel 24 are aligned along the height direction.
  • An adhesive layer is provided between the lens panel 21 and the protective layer 22 to bond and fix the lens panel 21 and the protective layer 22.
  • the protective layer 22 and the chip panel are An adhesive layer is provided between the boards 24 to adhere and fix the protective layer 22 and the chip panel 24.
  • the materials of the adhesive layers at the two locations may be the same or different, and this embodiment is not limited thereto.
  • Step S420 divide the lens panel 21 and the protective layer 22 in the module panel 20 along the height direction to form multiple wafer-level lenses 11 and multiple protective covers 132.
  • Two adjacent wafer-level lenses 11 and An upper dividing groove 26 is formed between two adjacent protective cover plates 132 .
  • the module panel 20 is divided along the height direction from the object side to the image side, and the lens panel 21 and the protective layer 22 are divided to expose the chip panel 24 to form a plurality of upper dividing grooves 26.
  • the upper dividing grooves 26 are formed in adjacent Between the two wafer-level lenses 11 and the two adjacent protective covers 132, the bottom surface of the upper dividing groove 26 is the chip panel 24, and the side surfaces of the upper dividing groove 26 are the wafer-level lenses 11 and the protective covers. 132.
  • Step S430 the upward dividing groove 26 is filled with packaging material, and the packaging material is cured to form a packaging conjoined part 23 .
  • the packaging conjoined part 23 is integrally formed on the peripheral side of the wafer-level lens 11 and the protective cover 132 .
  • the packaging material fills the upper dividing groove 26 and connects the two adjacent wafer-level lenses 11 and the two adjacent protective covers 132 to form a packaging conjoined part 23.
  • the packaging conjoined part 23 covers the wafer-level lenses 11 and Protect the peripheral side of the cover 132 .
  • Step S440 divide the module panel 20 along the height direction, and divide the package conjoined part 23 and the chip panel 24 to form multiple camera modules 10 .
  • the package conjoined portion 23 is divided to form the package 12 in the camera module 10
  • the chip panel 24 is divided to obtain a plurality of independent photosensitive chips 131 .
  • the chip panel 24 includes a plurality of connected photosensitive chips 131.
  • the manufacturing method of the camera module 10 further includes step S450: setting electrical connections on the backs of the multiple photosensitive chips 131 of the chip panel 24. Department 133.
  • An electrical connection portion 133 is provided on the back of the photosensitive chip 131 so that the photosensitive chip 131 can be electrically connected to other components from the back.
  • Step S450 may be located before step S440 or after step S440. In a specific example, when step S450 is located between step S430 and step S440, at this time, the plurality of photosensitive chips 131 are still connected and exist in the form of a chip panel 24. Multiple photosensitizers in the chip panel 24 can be sensitized in batches in the chip panel 24 state.
  • the electrical connection portion 133 is provided on the back of the chip 131, which has higher efficiency; in another specific example, step S450 is located after step S440, and the module panel 20 is first divided along the height direction, and after the division is completed, the independent The electrical connection part 133 is provided on the back of the photosensitive chip 131 of the camera module 10, so as to avoid damage to the electrical connection part 133 caused by division.
  • the manufacturing method of the camera module 10 also includes the step of setting the circuit board 135: further setting the circuit board 135 on the back of the photosensitive chip 131, and the photosensitive chip 131 is electrically connected to the circuit board 135 through the electrical connection part 133.
  • the circuit board 135 includes a circuit board main body 1351, a connecting belt 1352 and a connecting plate 1353.
  • the circuit board main body 1351 is disposed on the back of the photosensitive chip 131 and is electrically connected to the electrical connection part 133.
  • the connecting belt 1352 connects and electrically conducts the circuit board main body 1351. and the connection board 1353, so that the connection belt 1352 transmits the imaging information obtained by the circuit board body 1351 from the photosensitive chip 131 to the external electronic device through the connector.
  • a step of setting the light shielding portion 113 is also included.
  • the light shielding portion 113 is provided on the object side of the wafer-level lens 11 .
  • the step of arranging the light-shielding portion 113 on the object side of the wafer-level lens 11 can also be performed in step S430.
  • the light-shielding portion 113 is formed on the object side of the wafer-level lens 11 through a packaging material, so that the light-shielding portion 113 and the package connecting portion 23 can be formed integrally, simplifying the manufacturing process.
  • the light shielding portion 113 can also be directly formed during the manufacturing process of the lens panel 21 , that is, the lens panel 21 provided in step S410 includes the light shielding portion 113 .
  • the protective layer 22 and the chip panel 24 may be fixed first to form the photosensitive wafer 25, and then the lens panel 21 and the photosensitive wafer 25 may be aligned and fixed; or, The protective layer 22 and the chip panel 24 provided in step S410 have been fixed in advance to form the photosensitive wafer 25.
  • a filter element 14 is further provided, so that the filter element 14 is disposed between the wafer-level lens 11 and the protective layer 22, and infrared cutoff is achieved through the filter element 14. Function. Due to the arrangement of the filter element 14, in step S420, the filter element 14 is also divided. In step S430, the package conjoined part 23 is integrally formed on the wafer-level lens 11, the filter element 14 and the protective cover. The peripheral side of plate 132.
  • the segmentation method may be at least one of sawing, laser cutting, laser grinding, waterjet cutting, milling, micromachining, micro-slicing, punching and cutting, etc.
  • the lens panel 21 and the protective layer 22 are divided.
  • the packaging material filled in the upward dividing groove 26 is a liquid packaging material
  • the packaging conjoined portion 23 is formed after the liquid packaging material is solidified.
  • the packaging material can fully contact the peripheral sides of the wafer-level lens 11 and the protective cover 132.
  • the formed packaging conjoined portion 23 can also completely cover the wafer-level lens 11 and the protective cover 132. The lens 11 and the peripheral side of the protective cover 132 .
  • the packaging material can be glue
  • the upward dividing groove 26 is filled with glue.
  • the packaging conjoined portion 23 formed can be divided to obtain a glue package body, that is, the wafer-level lens 11 is packaged using a glue process or Protect the peripheral side of the cover 132 .
  • the glue is opaque, such as black glue, so that the encapsulation material can reduce stray light entering from the side.
  • the glue can be filled into the upper dividing groove 26 by spraying to avoid the generation of bubbles, or the glue can be filled by dot-like glue drawing.
  • the packaging material may also be a molding material.
  • the module panel 20 is placed in a molding mold, and the molding material is injected into the molding mold to allow the molding material to form in the upper dividing groove 26
  • the upper dividing groove 26 is filled with the molding material, and then the molding material is solidified to form the encapsulating conjoined part 23.
  • the molded package can be obtained by dividing the encapsulating conjoined part 23.
  • the molding material can be solidified by cooling or heating, which is determined by the properties of the molding material.
  • the segmentation may be performed by at least one of sawing, laser cutting, laser grinding, waterjet cutting, milling, micromachining, micro-slicing, punching and other cutting methods. 20 kinds of divided module panels.
  • the dividing method in step S440 can be the same as or different from the dividing method in step S420.
  • different cutting methods and different cutting widths can be selected.
  • the protective layer 22 is cut using a cutting knife.
  • the cutting blade has a sharp blade shape
  • the photosensitive chip 131 will be cut after cutting down the protective layer 22.
  • the width of the dividing part is small, it is easy to cut the circuits in the photosensitive chip 131, or when cutting the protective layer. 22, the circuit damage to the photosensitive chip 131 will also be caused due to cutting too deep.
  • the cutting knife when the width of the cutting portion of the chip panel 24 is greater than or equal to the width of the cutting knife, the cutting knife only cuts the dividing portion; in another example, when the width of the dividing portion of the chip panel 24 is smaller than the width of the cutting knife When the width is too high, the cutting knife may cause damage to the photosensitive chip 131 circuit.
  • the distance between adjacent photosensitive chips 131 can be increased.
  • the width of the dividing portion is 80um-300um. On the one hand, it can meet the cutting requirements and avoid the problem of damage during the cutting process. Damaging the photosensitive chip 131 can, on the other hand, make it possible to cut out as many photosensitive chips 131 as possible from one chip panel 24 .
  • the photosensitive chips 131 are formed on a silicon wafer. Increasing the distance between the photosensitive chips 131 will make it possible to produce more photosensitive chips on one silicon wafer. The number of photosensitive chips 131 is reduced, which increases the manufacturing cost of the photosensitive chip 131 and reduces the manufacturing efficiency. Therefore, the present application provides a new chip panel 24. As shown in FIGS. 7A and 7B, the chip panel 24 includes a plurality of photosensitive chips 131 and a conjoined portion 241 disposed between the plurality of photosensitive chips 131. .
  • a plurality of photosensitive chips 131 are laid on the same horizontal plane, and the connecting portion 241 is provided between two adjacent photosensitive chips 131 to connect and support the plurality of photosensitive chips 131 through the connecting portion 241 .
  • the chip panel 24 is divided by dividing the connecting part 241, and the single photosensitive chip 131 is integrally formed with a side connecting part 136 on its peripheral side, and the side connecting part 136 is arranged around the photosensitive chip 131, as shown in FIG. 7C.
  • the conjoined portion 241 is integrally formed between two adjacent photosensitive chips 131 through a molding process.
  • the width of the conjoined portion 241 is greater than or equal to the width of the cutting knife. The distance between adjacent photosensitive chips 131 and the width of the divided portion are adjusted. Therefore, when cutting the panel, the cutting knife only cuts the conjoined portion 241 of the chip panel 24 and does not cut the photosensitive chip 131 , thereby avoiding damage to the photosensitive chip 131 during the cutting process.
  • the height of the conjoined part 241 is lower than the height of the photosensitive chip 131
  • the side connecting part 136 formed after the conjoined part 241 is divided is lower than the height of the photosensitive chip 131
  • the side connecting part 136 covers
  • the chip panel 24 cuts at least part of the peripheral side of the photosensitive chip 131 to protect the cut photosensitive chip 131; in another specific example of this application, the height of the conjoined portion 241 is equal to the height of the photosensitive chip 131 , thereby providing a flatter mounting surface for the lens panel 21.
  • the side connecting portion 136 formed after the conjoined portion 241 is divided is equal to the height of the photosensitive chip 131.
  • the side connecting portion 136 covers the photosensitive chip 131 after cutting the chip panel 24. all the peripheral sides; in another specific example of the present application, the height of the conjoined portion 241 is higher than the height of the photosensitive chip 131, and the side connecting portion 136 formed after the conjoined portion 241 is divided is higher than the height of the photosensitive chip 131
  • the side connecting portion 136 covers the entire peripheral side of the photosensitive chip 131 cut by the chip panel 24 to protect the cut photosensitive chip 131 .
  • the conjoined portion 241 is higher than the photosensitive chip 131, so when the protective layer 22 is disposed above the photosensitive chip 131, the conjoined portion 241 acts as a support to leave a gap between the protective layer 22 and the photosensitive chip 131.
  • the side connecting portion 136 plays a supporting role to leave a gap between the protective cover 132 and the photosensitive chip 131. .
  • the aforementioned chip panel 24 with the conjoined portion 241 can also be applied to a variety of lens panels 21 .
  • a conjoined portion 241 is provided between two adjacent photosensitive chips 131.
  • the manufacturing method of the chip panel 24 includes the following steps S510-S530:
  • S510 provide multiple photosensitive chips 131 so that the multiple photosensitive chips 131 are laid in the chip forming mold, wherein the multiple photosensitive chips 131 are 131 are located on the same horizontal plane, and a molding flow channel is provided between two adjacent photosensitive chips 131 .
  • a plurality of photosensitive chips 131 are arranged at intervals, and a gap is left between adjacent photosensitive chips 131 to form a molding flow channel for the flow of molding materials during the molding process.
  • a conjoined portion 241 is formed, wherein the conjoined portion 241 covers at least a part of the peripheral side of the photosensitive chip 131 .
  • the photosensitive component 13 also includes a side connecting portion 136.
  • the side connecting portion 136 is integrally formed on the peripheral side of the photosensitive chip 131 to protect the photosensitive chip 131.
  • the lateral size of the side connecting portion 136 is larger than the lateral size of the protective cover 132.
  • the package body 12 is integrally formed on at least a portion of the front surface of the side connecting portion 136 . In this embodiment, the package body 12 covers at least part of the front surface of the side connecting portion 136 .
  • the lateral size of the photosensitive chip 131 is smaller than the lateral size of the protective cover 132 , and the package body 12 is integrally formed on the side connecting portion 136 .
  • the protective cover 132 covers at least a part of the front surface of the side connecting portion 136 . At this time, the portion of the front surface of the side connecting portion 136 that is not covered by the protective cover 132 is covered by the package 12 .
  • the side connecting portion 136 A part of the front side is covered by the package body 12, as shown in FIG. 6C; in another specific example, the lateral size of the photosensitive chip 131 is equal to the lateral size of the protective cover 132, and the package body 12 is integrally formed on the front side of the side connecting portion 136.
  • the front side of the side connecting portion 136 is entirely covered by the package body 12; in another specific example, the lateral size of the photosensitive chip 131 is larger than the lateral size of the protective cover 132, and the package body 12 is integrally formed on the front side of the side connecting portion 136.
  • the entire front surface of the connecting portion 136 is covered by the package 12 , and a part of the front surface of the photosensitive chip 131 is covered by the package 12 .
  • the camera module 10 includes a wafer-level lens 11, a package 12 and a photosensitive component 13.
  • the wafer-level lens 11 is provided On the photosensitive path of the photosensitive component 13 , the package 12 is disposed on the peripheral side of the wafer-level lens 11 and the photosensitive component 13 to protect the peripheral sides of the wafer-level lens 11 and the photosensitive component 13 .
  • the package 12 not only covers the wafer
  • the package 12 also covers the peripheral side of the wafer-level lens 11 and the protective cover 132 and the peripheral side of the photosensitive chip 131.
  • the package 12 is integrally formed on the peripheral side of the wafer-level lens 11 and the photosensitive component 13, making the wafer-level lens 11 and the photosensitive component 13 are all covered by the package 12, which can further protect the peripheral side of the photosensitive chip 131.
  • the lateral size of the photosensitive chip 131 may be greater than, less than, or equal to the lateral size of the protective cover 132 .
  • the specific size is determined by the cutting requirements during the cutting process of the camera module 10 .
  • the package 12 may also be a glue package or a molded package formed by glue or molding material.
  • the package 12 includes an upper package 121 and a lower package 122.
  • the upper package 121 is integrally formed on the peripheral sides of the wafer-level lens 11 and the protective cover 132 and covers the peripheral sides of the wafer-level lens 11 and the protective cover 132.
  • the lower package 122 is integrally formed on the peripheral side of the photosensitive chip 131 and covers the peripheral side of the photosensitive chip 131.
  • the upper package 121 and the lower package 122 are connected and fixed to each other. Specifically, the package body 12 is formed through two solidification processes, and the lower package body 122 is integrally formed on the bottom surface of the upper package body 121 to form the package body 12 .
  • the lateral size of the protective cover 132 is smaller than the lateral size of the photosensitive chip 131
  • the upper package 121 is integrally formed on the peripheral side of the wafer-level lens, the peripheral side of the protective cover and the front side of the photosensitive chip.
  • At least part of the lower package body 122 is integrally formed on the bottom surface of the upper package body 121 and the peripheral side of the photosensitive chip; in another example, the lateral size of the protective cover 132 is equal to the lateral size of the photosensitive chip 131, and the upper package body 121 is integrally formed Molded on the peripheral side of the wafer-level lens and the peripheral side of the protective cover, the lower package 122 is integrally formed on the bottom surface of the upper package 121 and the peripheral side of the photosensitive chip; in another example, the lateral dimensions of the protective cover 132 Larger than the lateral size of the photosensitive chip 131, the upper package 121 is integrally formed on the peripheral side of the wafer-level lens and the protective cover, and the lower package 122 is integrally formed on the bottom surface of the upper package 121 and the protective cover 132. at least a portion of the photosensitive chip and the peripheral side of the photosensitive chip.
  • the photosensitive component 13 further includes a side connecting portion 136 integrally formed on the peripheral side of the photosensitive chip 131 , and the lower package body 122 of the package 12 is integrally formed on the peripheral side of the side connecting portion 136 so that the lower The package body 122 is indirectly integrally formed around the photosensitive chip 131 side.
  • the protective cover 132 covers at least part of the front surface of the side connecting portion 136
  • the lower package body 122 covers the peripheral side of the side connecting portion 136 .
  • the lateral size of the photosensitive chip 131 is smaller than the lateral size of the protective cover 132, so that the photosensitive chip 131 will not be damaged during the cutting process of the protective cover.
  • the lateral size of the side connecting portion 136 is equal to the lateral size of the protective cover 132, and the outer side of the side connecting portion 136 is flush with the outer side of the protective cover 132;
  • the lateral size of the side connecting portion 136 is smaller than the lateral size of the protective cover 132 , and the lower package body 122 is integrally formed on at least a portion of the bottom surface of the protective cover 132 and covers the protective cover 132 At least a part of the bottom surface of this embodiment; in another specific example of this embodiment, as shown in FIG.
  • the lateral size of the side connecting portion 136 is larger than the lateral size of the protective cover 132, and the side connecting portion 136 protrudes from the protective cover 132,
  • the upper package body 121 covers a part of the front surface of the side connecting portion 136 .
  • the manufacturing method of the camera module 10 includes the following steps S610-S650:
  • Step S610 stack and fix a lens panel 21 , a protective layer 22 and a chip panel 24 along the height direction to form a module panel 20 .
  • the module panel 20 includes a lens panel 21, a protective layer 22 and a chip panel 24 along the height direction.
  • the lens panel 21, the protective layer 22 and the chip panel 24 are aligned along the height direction.
  • the lens panel 21, the protective layer 22 and the chip panel 24 are aligned along the height direction.
  • An adhesive layer is disposed between the plate 21 and the protective layer 22 to bond and fix the lens panel 21 and the protective layer 22.
  • An adhesive layer is disposed between the protective layer 22 and the chip panel 24 to bond and fix the protective layer 22 and the chip.
  • the materials of the adhesive layers at two positions of the panel 24 can be the same or different, and this embodiment is not limited thereto.
  • Step S620 divide the lens panel 21 and the protective layer 22 in the module panel 20 along the height direction to form multiple wafer-level lenses 11 and multiple protective covers 132.
  • Two adjacent wafer-level lenses 11 and An upper dividing groove 26 is formed between two adjacent protective cover plates 132 .
  • the module panel 20 is divided along the height direction from the object side to the image side, and the lens panel 21 and the protective layer 22 are divided to expose the chip panel 24 to form a plurality of upper dividing grooves 26.
  • the upper dividing grooves 26 are formed in adjacent Between the two wafer-level lenses 11 and the two adjacent protective covers 132, the bottom surface of the upper dividing groove 26 is the chip panel 24, and the side surfaces of the upper dividing groove 26 are the wafer-level lenses 11 and the protective covers. 132.
  • Step S630 Fill the upper dividing groove 26 with a first packaging material, and solidify the first packaging material to form an upper packaging conjoined portion 231.
  • the first packaging material fills the upper dividing groove 26 and connects two adjacent wafer-level lenses 11 and two adjacent protective covers 132 .
  • Step S640 Divide the chip panel 24 in the module panel 20 along the height direction to form multiple independent photosensitive chips 131, and form a dividing groove 27 between two adjacent photosensitive chips 131.
  • the module panel 20 is divided along the height direction from the image side to the object side, and the chip panel 24 is divided to expose the solidified upper package conjoined portion 231 in the upper dividing groove 26 to form a plurality of lower dividing grooves 27 .
  • the bottom surface of the lower dividing groove 27 is the upper package conjoined part 231 solidified in the upper dividing groove 26
  • the side surface of the lower dividing groove 27 is the photosensitive chip 131 .
  • Step S650 the second packaging material is filled into the downward dividing groove 27, and the second packaging material is cured to form a lower packaging conjoined part (not shown in the drawings).
  • the lower package conjoined part is integrally molded on the upper package conjoined part 231 to form a Encapsulate the joint part 23 .
  • the second packaging material fills the lower dividing groove 27 and connects the two adjacent photosensitive chips 131 and the upper packaging connecting part 231 located in the upper dividing groove 26.
  • the lower packaging connecting part is integrally formed on the bottom surface and the upper packaging connecting part 231.
  • a package connected portion 23 is formed on the peripheral side of the photosensitive chip 131. In other words, in this embodiment, the package connected portion 23 is formed through two solidifications.
  • the first packaging material provided in the upper dividing groove 26 and the second packaging material provided in the lower dividing groove 27 may be the same or different, depending on design requirements.
  • Step S660 Divide the module panel 20 along the height direction to form multiple camera modules 10. Multiple camera modules 10 are formed by dividing the packaged conjoined portion 23 along the height direction, and the packaged bodies 12 of the plurality of camera modules 10 are formed after the packaged conjoined portion 23 is divided.
  • the lens panel 21 and the protective layer 22 in the module panel 20 are divided in step S620, the chip panel 24 in the module panel 20 is divided in step S640, and the module panel 20 is divided in step S660.
  • Three different division methods, two different division methods, or the same division method can be used for division.
  • the width of division in the three steps can also be different, and this application is not limited by this.
  • the peripheral side of the photosensitive chip 131 of the camera module 10 obtained by the above method is also covered by the package 12, thereby providing a more complete The protection reduces the possibility of damage to the photosensitive chip 131 of the camera module 10 during impact.
  • the manufacturing method of the camera module 10 in the second embodiment further includes step S670: setting the electrical connection portion 133 on the back of the photosensitive chip 131.
  • step S670 may be located between step S630 and step S640, so that the electrical connection portions 133 can be provided in batches on the back surfaces of the plurality of photosensitive chips 131 in the chip panel 24, and at the same time, the electrical connection portions 133 can be set. Not affected by the splitting of the chip panel 24 and the cured upper package conjoined portion 231 , the process of splitting the chip panel 24 and curing the first packaging material may cause the flatness of the backside of the chip to decrease; in another specific example, step S670 may be located between step S650 and step S660.
  • the electrical connection part 133 is provided on the back of the photosensitive chip 131, so that the back of multiple photosensitive chips 131 in the module panel 20 can be batched.
  • Providing the electrical connection part 133 is efficient and can prevent damage to the electrical connection part 133 caused by the process of dividing the module panel 20 into multiple independent camera modules 10; in another specific example, step S670 may be located in step S660.
  • the module panel 20 is first divided along the height direction. After the division is completed, the electrical connection part 133 is provided on the back of the photosensitive chip 131 of the independent camera module 10. This can avoid damage to the electrical connection part 133 caused by the division. .
  • the manufacturing method of the camera module 10 further includes a step of setting the circuit board 135 and a step of setting the light shield 113 .
  • the circuit board 135 setting step is performed after step S660, that is, after the division of the module panel 20 is completed.
  • the step of setting the light shielding portion 113 on the object side of the wafer-level lens 11 can be performed after step S660 is completed, that is, after the segmentation of the module panel 20 is completed; in another specific example, In an example, the step of setting the light-shielding portion 113 can also be performed in step 630.
  • the light-shielding portion 113 can be formed on the object side of the wafer-level lens 11 through packaging materials; in a specific example, the light-shielding portion 113 can also be formed on the lens panel. 21 is formed directly during the manufacturing process.
  • step S610 a filter element 14 is further provided, so that the filter element 14 is disposed at the wafer level. Between the lens 11 and the protective layer 22, the filter element 14 realizes the infrared cutoff function. Due to the arrangement of the filter element 14, in step S620, the filter element 14 is also divided.
  • step S630 the first packaging material is solidified, and the upper packaging conjoined portion 231 is integrally formed on the wafer-level lens 11, The filter element 14 and the peripheral side of the protective cover 132 .
  • the packaging material filled in the upper dividing groove 26 and/or the lower dividing groove 27 is (The first encapsulation material and the second encapsulation material) are liquid encapsulation materials. After the liquid encapsulation materials are solidified, the encapsulation connected part 23 is finally formed. With the fluidity of the liquid encapsulation material, the encapsulation material (the first encapsulation material and the second encapsulation material) can fully contact the peripheral sides of the wafer-level lens 11, the protective cover 132 and the photosensitive chip 131. After the liquid encapsulation material is cured, The formed package conjoined portion 23 can also completely cover the peripheral sides of the wafer-level lens 11 , the protective cover 132 and the photosensitive chip 131 .
  • the packaging material may be glue or molding material
  • the first packaging material and the second packaging material provided in the upper dividing groove 26 and the lower dividing groove 27 may be the same or different, that is, the first packaging material and the second packaging material provided in the upper dividing groove 26 and the lower dividing groove 27 may be
  • the first packaging material and the second packaging material in the lower dividing groove 27 are both glue, so that the finally formed packaging joint part 23 is composed of cured glue; or the packaging materials provided in the upper dividing groove 26 and the lower dividing groove 27 can be Both the first encapsulating material and the second encapsulating material are molding materials, so that the finally formed encapsulating conjoined part 23 is composed of cured molding material; or the first encapsulating material disposed in the upper dividing groove 26 can be made of molding material.
  • the second packaging material disposed in the lower dividing groove 27 is glue
  • the finally formed packaging connected part 23 is formed by solidifying the upper molding material to form the upper packaging connected part 231 and the lower glue. It is composed of a lower package connected part; or the first packaging material provided in the upper dividing groove 26 can be glue, and the second packaging material provided in the lower dividing groove 27 can be a molding material, so that the final formed package
  • the conjoined part 23 is composed of an upper package conjoined part 231 formed by curing glue and a lower package conjoined part 231 formed by curing molding material below.
  • Different packaging materials can be selected according to the width and depth of the upper dividing groove 26 and the lower dividing groove 27 formed by the divided module panel 20, for example, for the upper dividing groove 26 or the lower dividing groove 27 with a deeper depth or a narrower width.
  • the chip panel 24 uses the chip panel 24 as shown in FIGS. 7A and 7b so that the photosensitive chip 131 The distance between them can be adjusted again after the chip manufacturing is completed.
  • the chip panel 24 includes a plurality of photosensitive chips 131 and a conjoined portion 241 disposed between the plurality of photosensitive chips 131.
  • the conjoined portion 241 is integrally formed on the two phases. between adjacent photosensitive chips 131 .
  • FIGS. 9B and 9C the camera module 10 manufactured using the chip panel 24 with the conjoined portion 241 is shown in FIGS. 9B and 9C .
  • the peripheral side of the photosensitive chip 131 is covered by the side connecting portion 136
  • the peripheral side of the side connecting portion 136 is covered by the side connecting portion 136 .
  • the package body 12 covers, and the package body 12 indirectly covers the circumferential side of the photosensitive chip 131 by covering the circumferential side of the side connecting portion 136 .
  • the lower package body in the package body 12 covers the circumferential side of the side connecting portion 136 .
  • the side indirectly covers the peripheral side of the photosensitive chip 131 .
  • the lens panel 21 and the chip panel 24 are used to manufacture the camera module 10, which requires full consideration of the lens panel 21 and the chip panel 24. The fit between them requires multiple cuts.
  • This application further provides a more convenient manufacturing method and the camera module 10 manufactured by this method.
  • Figures 11A to 11C show the third embodiment of the camera module 10 of the present application.
  • the camera module 10 uses the COB (Chip On Board) process to manufacture the photosensitive component 13.
  • the camera module 10 includes a wafer-level lens 11, a photosensitive component 13 and a package 12.
  • the wafer-level lens 11 is disposed on the photosensitive path of the photosensitive component 13, and the package 12 is integrally formed between the wafer-level lens 11 and the photosensitive component 13.
  • the photosensitive component 13 that is, the package 12 is integrally connected to the wafer-level lens 11 and the photosensitive component 13 .
  • the photosensitive component 13 includes a circuit board 135 and a photosensitive chip 131 that is electrically connected to the circuit board 135.
  • the photosensitive chip 131 is fixed to the circuit board 135.
  • the back side of the photosensitive chip 131 is bonded to the main body of the circuit board. 1351, so that the photosensitive chip 131 is disposed on the circuit board 135.
  • the photosensitive component 13 also includes at least one lead 137. At least one lead 137 is combined between the photosensitive chip 131 and the circuit board 135 main board for electrically connecting the photosensitive chip 131 and the circuit board 135 main board. At least one lead 137 can be implemented But not limited to gold wire, copper wire, aluminum wire, silver wire, etc.
  • the electrical connection part 133 is disposed in the non-photosensitive area on the front side of the photosensitive chip 131, and the lead 137 electrically connects the circuit board main body 1351 and the electrical connection part 133 to realize the connection between the circuit board main body 1351 and the photosensitive chip 131.
  • the electrical circuit is conducted, wherein the electrical connection 133 may be implemented as a plurality of pads.
  • the lead 137 electrically connects the pad on the circuit board body 1351 and the electrical connection portion 133 of the photosensitive chip 131 to achieve electrical connection.
  • the lateral size of the photosensitive chip 131 is no larger than the lateral size of the circuit board main body 1351, that is, along the height direction, the projection of the photosensitive chip 131 falls in the projection of the circuit board main body 1351, so that the structure of the photosensitive component 13 is more compact. Avoid increasing the lateral size of the photosensitive element 13 .
  • the lateral size of the photosensitive chip 131 is smaller than the lateral size of the circuit board main body 1351 , that is, the photosensitive chip 131 does not completely cover the front side of the circuit board main body 1351 , and the front side of the circuit board main body 1351 is exposed. It can also be said that , the outermost projection of the photosensitive chip 131 in the height direction is located inside the outermost projection of the circuit board body 1351 .
  • One end of the lead 137 is disposed on the front of the photosensitive chip 131, and the other end of the lead 137 is disposed on the front of the circuit board body 1351. This arrangement can leave enough space for the lead 137 to prevent the lead 137 from being bent and damaged.
  • the lateral size of the photosensitive chip 131 is equal to the lateral size of the circuit board main body 1351 , that is, the photosensitive chip 131 completely covers the front side of the circuit board main body 1351 . It can also be said that the photosensitive chip 131 extends along the height direction. The outermost projection overlaps with the outermost projection of the circuit board body 1351 .
  • One end of the lead 137 is set on the front of the photosensitive chip 131, and the other end of the lead 137 is set on the side or back of the circuit board body 1351. This arrangement can reduce the lateral size of the circuit board 135 and avoid increasing the lateral size of the photosensitive component 13. .
  • the wafer-level lens 11 is disposed on the photosensitive chip 131 , the lateral size of the wafer-level lens 11 is smaller than the lateral size of the photosensitive chip 131 , and the wafer-level lens 11 is fixed on the photosensitive chip 131 through the support 112
  • the non-photosensitive area of chip 131 is fixed in a manner Set on the front side of the photosensitive chip 131.
  • the camera module 10 further includes a filter element 14.
  • the filter element 14 is disposed between the wafer-level lens 11 and the photosensitive component 13. The filter element 14 is fixed to the photosensitive chip.
  • the wafer-level lens 11 is fixed on the object side of the filter element 14, so that the wafer-level lens 11 is indirectly fixed on the front side of the photosensitive chip 131; in another embodiment of the present application, the filter element 14 Designed to be smaller, the non-photosensitive area of the photosensitive chip 131 still leaves a certain area for fixing the wafer-level lens 11; in another embodiment of the present application, the wafer-level lens 11 has an infrared cutoff function as mentioned above. , the camera module 10 directly eliminates the filter element, thereby reducing the height of the camera module 10 .
  • the package 12 is integrally formed on the wafer-level lens 11 , the photosensitive chip 131 and the circuit board main body 1351 .
  • the package 12 covers at least part of the circuit board main body 1351 , at least part of the photosensitive chip 131 , and At least a part of the wafer-level lens 11.
  • the package 12 covers at least a part of the front surface of the circuit board body 1351, the peripheral side of the photosensitive chip 131 and at least a part of the non-photosensitive area of the front surface of the photosensitive chip 131, and the peripheral side of the wafer-level lens 11 .
  • the package body 12, the circuit board body 1351, the photosensitive chip 131 and the wafer-level lens 11 are integrated to enhance the structural strength of the camera module 10, making the camera module 10 more compact and miniaturized.
  • the package 12 extends in the horizontal direction between the non-photosensitive area of the photosensitive chip 131 and the circuit board main body 1351, thereby packaging the photosensitive chip 131 in the circuit board main body 1351.
  • the package 12 extends in the height direction on the peripheral side of the wafer-level lens 11, Therefore, the wafer-level lens 11 is packaged in the photosensitive chip 131, which on the one hand increases the structural strength of the camera module 10, and on the other hand makes the camera module 10 more compact in structure and smaller in lateral size.
  • the package 12 surrounds the outside of the photosensitive chip 131 and the outside of the wafer-level lens 11.
  • the package 12 is integrally closed and connected, so that it has good sealing performance, so that the photosensitive chip 131 is in a closed space. within to prevent the photosensitive chip 131 from being contaminated and affecting the imaging effect.
  • the package 12 has a vertical outer side, and the lateral size of the upper part of the package 12 is equal to the lateral size of the bottom of the package 12, as shown in FIGS. 11A and 11B; in this embodiment
  • the outer side of the package 12 is inclined, the outer diameter of the package 12 increases from top to bottom, and the lateral dimension of the bottom of the package 12 is larger than that of the upper part of the package 12 .
  • the lateral size provides enough space for the leads 137 to avoid backlog of the leads 137 and damage to the leads 137 during the molding process of the package 12. At the same time, it provides a smaller head for the camera module 10, so that The camera module 10 is suitable for installation in smaller spaces.
  • the bottom of the package 12 refers to the part of the package 12 located on the side of the photosensitive chip 131
  • the upper part of the package 12 refers to the part located on the side of the wafer-level lens 11 .
  • the electrical connection portion 133 on the photosensitive chip 131, the pad on the circuit board body 1351 and at least one lead 137 are all wrapped by the package 12.
  • the lead 137 is wrapped by the package 12, and the lead 137 is embedded in the package 12. , so that the lead wire 137 will not be directly exposed to the outside, so that the lead wire 137 will not be easily interfered by external factors, causing problems such as deformation and damage.
  • the peripheral side of the light shielding portion 113 of the wafer-level lens 11 is also covered by the package 12 .
  • the top surface of the package 12 is flush with the plane of the light shielding portion 113 .
  • the light shielding portion 113 is disposed on the wafer level lens 11 after the package 12 is integrally formed on the peripheral side of the wafer level lens 11 .
  • the light shielding portion 113 Being fixed on the top surface of the package 12, the light-shielding portion 113 extends toward the direction of the wafer-level lens 11 to play a light-shielding role.
  • the wafer-level lens assembly 111 of the wafer-level lens 11 is located in the object.
  • the peripheral side of the object side of the first wafer-level lens 1111 is flush with the top surface of the package 12, so that the light-shielding portion 113 can also be fixed to the wafer-level lens assembly 111; in another specific example, the wafer-level lens assembly 111 is In the wafer-level lens assembly 111 of the round-level lens 11, the peripheral side of the object side of the first wafer-level lens 1111 located on the object side is lower than the top surface of the package 12, so that the light shielding portion 113 and the wafer-level lens assembly There is a gap between 111.
  • the light-shielding portion 113 of the wafer-level lens 11 can be formed while the package body 12 is integrally formed on the side of the wafer-level lens 11 .
  • the package body 12 covers the wafer-level lens 11 At least a part of the top surface of the wafer-level lens 11 forms a light-shielding portion 113 , and the light-shielding portion 113 and the package 12 are integrally formed on the top surface and peripheral sides of the wafer-level lens 11 .
  • the material of the package 12 can be a molding material, thereby forming a molded package.
  • the package 12 is integrally formed on the wafer-level lens 11, the photosensitive chip 131 and the circuit board main body 1351 through a molding process.
  • the plastic process requires the use of forming molds, which are suitable for making flatter surfaces.
  • the photosensitive chip 131 is moldedly connected to the circuit board body 1351, and the wafer-level lens 11 is moldedly connected to the photosensitive chip 131.
  • the package 12 is molded on the photosensitive chip 131 (Molding on Chip, MOC). Molded on the photosensitive element 13.
  • the material of the package 12 may also be glue, thereby forming a glue package.
  • the circuit board 135 includes a circuit board body 1351, a connecting strip 1352 and a connecting plate 1353.
  • the photosensitive chip 131 is electrically connected to the circuit board body 1351, and the connecting strip 1352 connects and electrically conducts the circuit board body 1351 and the connection plate 1353.
  • Board 1353 as shown in Figure 11A and Figure 11C; in another example of this embodiment, the circuit board 135 includes a circuit board body 1351 and a pad disposed on the back of the circuit board 135, as shown in Figure 11B, a photosensitive chip 131 is disposed on the front of the circuit board main body 1351.
  • the circuit board 135 is electrically connected to external electronic devices through the pads on the back of the circuit board 135.
  • the soldering pads on the back of the circuit board main body 1351 can also be replaced with solder balls or other electrical devices. Connect the media.
  • a manufacturing method of the camera module 10 in the third embodiment is provided: a circuit board 135 is provided, the circuit board 135 includes a circuit board main body 1351, a photosensitive chip 131 is disposed on the circuit board main body 1351, and through the leads 137 The photosensitive chip 131 and the circuit board main body 1351 are electrically connected; the wafer level lens 11 is placed above the photosensitive chip 131; the package 12 is set to cover the wafer level lens 11, the photosensitive chip 131 and the circuit board main body 1351.
  • the wafer-level lens 11 can also be fixed above the photosensitive chip 131 first, and then electrically connect the photosensitive chip 131 and the circuit board main body 1351 through the lead 137, so as to avoid the need for wafer-level lens 131.
  • the setting process of 11 causes damage to lead 137.
  • the method of setting the lead 137 first and then setting the wafer-level lens 11 can prevent the installation of the lead 137 from being hindered by the presence of the wafer-level lens 11, for example, due to the equipment setting the lead 137 interfering with the wafer-level lens 11. Interference causes the wafer-level lens 11 to be impacted.
  • a step of setting a light shielding portion 113 may also be included: setting a light shielding portion 113 on the object side of the camera module 10 to prevent stray light from entering the interior of the camera module 10 .
  • the package body 12 is provided through a molding process, for example, the package body 12 is formed through a molding process (Molding) or an insert molding process (Insert Molding).
  • the circuit board main body 1351, the photosensitive chip 131 and the wafer-level lens 11 are placed in a molding mold, the molding material is filled into the molding mold, and then the molding material is solidified to form the package body 12.
  • the package 12 wraps the circuit board body 1351 , the non-photosensitive area of the photosensitive chip 131 and the peripheral side of the wafer level lens 11 , so that the lens package 12 , the circuit board body 1351 , the photosensitive chip 131 and the wafer level lens 11 are integrated.
  • the molding materials can be resin, nylon, LCP (Liquid Crystal Polymer, liquid crystal polymer), PP (Polypropylene, polypropylene), etc.
  • the camera module 10 in the third embodiment can also be mass-manufactured by panel assembly.
  • a method of manufacturing the camera module 10 in the third embodiment is provided. Referring to FIG. 12 , the method of manufacturing the camera module 10 includes the following steps S710-S750:
  • Step S710 Provide a circuit board panel 28.
  • the circuit board panel 28 includes a plurality of connected circuit boards 135 .
  • the circuit boards 135 include a circuit board main body 1351 .
  • the circuit boards 135 can be connected through the connection between the circuit board main bodies 1351 .
  • step S720 multiple photosensitive chips 131 are arranged on the circuit board panel 28, and the multiple photosensitive chips 131 are electrically connected to the circuit board panel 28.
  • a plurality of photosensitive chips 131 are electrically connected to the circuit board panel 28 through leads 137 .
  • the plurality of photosensitive chips 131 are respectively fixed on the plurality of circuit board bodies 1351 in the circuit board panel 28 , and the plurality of photosensitive chips 131 and the plurality of circuit board bodies 1351 are electrically connected through the leads 137 .
  • step S730 the plurality of wafer-level lenses 11 are respectively arranged on the plurality of photosensitive chips 131, so that the plurality of wafer-level lenses 11 are respectively located on the photosensitive paths of the plurality of photosensitive chips 131.
  • the plurality of wafer-level lenses 11 are respectively fixed to the non-photosensitive areas of the plurality of photosensitive chips 131 through adhesive media.
  • Step S740 Fill the space between the two adjacent wafer-level lenses 11 and the two adjacent photosensitive chips 131 with packaging material, and solidify the packaging material to form a packaging conjoined part 23.
  • the packaging conjoined part 23 is integrated with the wafer.
  • the lens 11, the photosensitive chip 131 and the circuit board panel 28 form a module panel 20.
  • the packaging material may be a liquid packaging material.
  • the packaging material covers the wafer-level lens 11, the photosensitive chip 131 and the circuit board panel 28, and is integrated with the wafer-level lens 11, the photosensitive chip 131 and the circuit board panel 28 after solidification. Circuit board puzzle 28.
  • Step S750 Divide the module panel 20 along the height direction to form multiple camera modules 10.
  • the package conjoined part 23 and the circuit board panel 28 are divided along the height direction to obtain multiple independent camera modules 10.
  • the package conjoined part 23 is divided to form a plurality of independent packages 12, and the circuit board panel 28 is divided.
  • multiple independent circuit boards 135 are formed. Among them, the dotted line shown in Figure 12 is the position of division.
  • the packaging material is a molding material
  • the packaging conjoined portion 23 is integrated with the wafer-level lens 11 , the photosensitive chip 131 and the circuit board panel 28 through a molding process.
  • the circuit board panel 28, the plurality of photosensitive chips 131 fixed on the circuit board panel 28, and the plurality of wafer-level lenses 11 respectively fixed on the plurality of photosensitive chips 131 are placed.
  • the molding material is injected into the molding mold, and the molding material solidifies to form the encapsulating conjoined part 23.
  • the encapsulating conjoined part 23 is integrated with the wafer-level lens 11, the photosensitive chip 131 and the circuit board assembly.
  • the panels 28 form a modular panel 20 .
  • the package 12 obtained by curing and cutting the packaging material composed of the molding material may be called a molded package.
  • step S740 may further include the step of setting a light-shielding layer 213 on the object side of the module panel 20, so that after the module panel 20 is divided, a light-shielding layer 213 including the light-shielding portion 113 can be obtained.
  • the light shielding layer 213 is divided into a plurality of independent light shielding portions 113.
  • the plurality of wafer-level lenses 11 provided in step S730 include light-shielding portions 113 , and the light-shielding portions 113 are disposed on the object side of the wafer-level lens assembly 111 .
  • the wafer-level lens 11 can be fixed on the non-photosensitive area of the photosensitive chip 131 first, and then the photosensitive chip can be 131 is fixed on the circuit board panel 28 to form a semi-finished product integrating the circuit board panel 28, the photosensitive chip 131 and the wafer level lens 11.
  • a fourth embodiment of the camera module 10 of the present application is provided.
  • a cover layer 29 is further introduced as a basis for manufacturing the module panel 20 , and a single wafer-level lens 11 and a single photosensitive component 13 are flipped onto the cover layer 29 .
  • the manufacturing method is the same as that described above.
  • the first, second and third embodiments of the camera module 10 are all different. It is not necessary to specifically adjust the distance between the multiple wafer-level lenses 11 in the lens panel 21, nor to specifically adjust the chip.
  • the distance between the plurality of photosensitive chips 131 in the panel 24 is suitable for reducing the manufacturing cost.
  • FIG. 13 shows a schematic structural diagram of the fourth embodiment of the camera module 10 of the present application.
  • the camera module 10 includes a wafer-level lens 11, a photosensitive component 13, a package 12 and a
  • the light-transmitting cover 15 and the wafer-level lens 11 are arranged on the photosensitive path of the photosensitive component 13.
  • the light-transmitting cover 15 is arranged on the top surface (object side) of the wafer-level lens 11.
  • the package 12 is integrated with the transparent cover 15.
  • the photosensitive component 13 includes a photosensitive chip 131 and an electrical connection part 133 provided on the photosensitive chip 131.
  • the photosensitive chip 131 is electrically connected to an external electronic device through the electrical connection part 133.
  • the photosensitive component 13 further includes a protective cover 132.
  • the electrical connection portion 133 is provided on the back of the photosensitive chip 131.
  • the protective cover 132 is covered on the photosensitive chip 131.
  • the protective cover 132 is provided on the photosensitive chip 131.
  • the top of the chip 131 is used to protect the photosensitive chip 131. That is, in this specific example, the photosensitive chip 131 is packaged in a wafer-level CSP.
  • the photosensitive chip 131 is disposed between the protective cover 132 and the electrical connection part 133.
  • the protective cover The board 132 and the electrical connection portion 133 are disposed oppositely on both sides of the photosensitive chip 131 .
  • the wafer-level lens 11 is fixed to the protective cover 132 of the photosensitive component 13 so as to be disposed on the photosensitive path of the photosensitive component 13 .
  • the wafer-level lens 11 is fixed to the photosensitive component 13 .
  • the photosensitive chip 131 can also be packaged using the COB process.
  • the photosensitive component 13 includes a circuit board 135 , a photosensitive chip 131 electrically connected to the circuit board 135 , and a non-conductor chip disposed on the front side of the photosensitive chip 131 .
  • the lead 137 electrically connects the circuit board 135 and the electrical connection portion 133 to electrically conduct the photosensitive chip 131 and the circuit board 135 .
  • the light-transmitting cover 15 is fixed on the top surface of the wafer-level lens 11.
  • the light-transmitting cover 15 is flat-shaped, and the image side of the light-transmitting cover 15 is flat.
  • the wafer-level lens The top surface of 11 is flat, so that the light-transmitting cover 15 can be stably attached to the top surface of the wafer-level lens 11 .
  • the wafer-level lens 11 includes a first wafer-level lens 1114, a second wafer-level lens 1115, and a third wafer-level lens 1116, wherein the first wafer-level lens 1114, the second wafer-level lens 1115 and the third wafer-level lens 1116.
  • Each of the three wafer-level lenses 1111 includes a light-transmitting substrate 11111 and a lens unit 11112 disposed on one side of the light-transmitting substrate 11111.
  • the lens unit 11112 of the first wafer-level lens 1114 is located on On the image side of the light-transmitting substrate 11111
  • the lens unit 11112 of the second wafer-level lens 1115 is located on the object side of the light-transmitting substrate 11111
  • the lens unit 11112 of the third wafer-level lens 1116 is located on the image side of the light-transmitting substrate 11111.
  • the first wafer-level lens 1114 and the second wafer-level lens 1115 are fixed so that the lens unit 11112 of the first wafer-level lens 1114 faces the lens unit 11112 of the second wafer-level lens 1115.
  • 1115 and the third wafer-level lens 1116 are fixed to each other and the lens unit 11112 of the second wafer-level lens 1115 is opposite to the lens unit 11112 of the third wafer-level lens 1116, wherein the second wafer-level lens 1115 and the third wafer-level lens 1116 are fixed to each other.
  • the wafer-level lens 1116 is fixed by bonding between the light-transmitting substrates 11111.
  • the fixation between the first wafer-level lens 1114, the second wafer-level lens 1115 and the third wafer-level lens 1116 can be completed by an adhesive layer disposed therebetween, wherein the second wafer-level lens 1116 is disposed on the second wafer-level lens 1116.
  • the adhesive layer 1112 provided between the light-transmitting substrate 11111 of the circular-level lens 1115 and the light-transmitting substrate 11111 of the third wafer-level lens 1116 may be formed of optical glue.
  • the first wafer level lens 1114, the second wafer level lens 1115, and the third wafer level lens 1116 form the wafer level lens assembly 111 described herein.
  • the light-transmitting cover 15 can be made of light-transmitting material such as glass, and the light-transmitting cover 15 is suitable for transmitting light.
  • the lateral size of the light-transmitting cover 15 is larger than the lateral size of the wafer-level lens 11 and the photosensitive component 13 , so that along the height direction, from the image side (bottom) of the camera module 10 to the object side (top) See, the light-transmitting cover 15 is exposed, so when the package 12 is installed in the camera module 10 , the package 12 is integrally formed on a part of the bottom surface (image side) of the light-transmitting cover 15 and the periphery of the wafer-level lens 11 side and the peripheral side of the photosensitive element 13 .
  • the package 12 provides circumferential protection for the wafer-level lens 11 and the photosensitive component 13 .
  • the camera module 10 may further have an infrared cutoff function.
  • the light-transmitting cover 15 can be used as a filter element of the camera module 10 by providing the light-transmitting cover 15 with an infrared cutoff function to filter out incident light such as infrared light and other unwanted stray light for imaging; or,
  • the light-transmitting substrate 11111 of any wafer-level lens 1111 in the wafer-level lens 11 can be made to have an infrared cut-off function, so that the wafer-level lens 11 has an infrared cut-off function, thereby filtering the imaging light entering the photosensitive chip 131;
  • the protective cover 132 in the photosensitive assembly 13 can be provided with an infrared cutoff function, that is, the protective cover 132 can be used as a filter element, so that the protective cover 132 can filter the imaging light entering the photosensitive chip 131; or, the protective cover 132 can be used as a filter element.
  • a filter element 14 is further added.
  • the camera module 10 further includes a light-shielding portion 113 , which is used to reduce stray light incident from the object side of the wafer-level lens 11 .
  • the light-shielding portion 113 is disposed between the wafer-level lens 11 and the light-transmitting cover 15 .
  • the light-shielding portion 113 can be the first wafer-level lens preformed on the wafer-level lens 11 by silk printing, ink coating, or glue coating.
  • the light-shielding portion 113 can also be pre-formed and then disposed between the wafer-level lens 11 and the light-transmitting cover 15 .
  • the camera module 10 can be constructed by stacking a single wafer-level lens 11 and a single photosensitive component 13 on the protective cover 132 and integrating the package 12 with the protective cover 132 and the wafer-level lens 13 .
  • the optical lens and the photosensitive component 13 are formed; the camera module 10 can also be manufactured in batches using a panelization method.
  • the manufacturing method of the fourth embodiment of the camera module 10 manufactured in batches using the panelization method includes the following steps S810-S830:
  • Step S810 provide a cover layer 29, multiple wafer-level lenses 11 and multiple photosensitive components 13, stack and fix the multiple wafer-level lenses 11 and multiple photosensitive components 13 on the cover layer 29 along the height direction,
  • a plurality of wafer-level lenses 11 and a plurality of photosensitive components 13 are placed upside down on the cover layer 29 and spaced apart from each other.
  • Multiple wafer-level lenses 11 and multiple photosensitive components 13 are respectively aligned, so that the wafer-level The image plane of the lens 11 overlaps or nearly overlaps with the photosensitive area of the photosensitive chip 131 of the photosensitive component 13.
  • the cover layer 29, the multiple wafer-level lenses 11 and the multiple photosensitive components 13 can be fixed by providing an adhesive layer.
  • the materials of the adhesive layers at the locations can be the same or different.
  • the plurality of wafer-level lenses 11 are spaced apart from each other, the plurality of photosensitive components 13 are spaced apart from each other, and the plurality of wafer-level lenses 11 are not in contact with each other, so that there is a gap (gap) between the plurality of wafer-level lenses 11 , in one example, a plurality of wafer-level lenses 11 are fixed to the cover layer 29 at equal intervals.
  • Step S820 Fill packaging material between the plurality of wafer-level lenses 11 and the plurality of photosensitive components 13, so that the packaging material covers the image side (bottom side) of the plate layer 29, the peripheral side of the wafer-level lenses 11 and the photosensitive components.
  • the cured packaging material forms a packaging connected portion 23.
  • the cured package joint portion 23 is integrally coupled to the image side of the cover layer 29 and the peripheral side of the wafer-level lens 11 and the photosensitive component 13 .
  • the image side of the cover layer 29 refers to the side of the cover layer 29 facing the wafer-level lens 11 , that is, the bottom side of the cover layer 29 .
  • Step S830 divide the module panel 20 along the height direction, and divide the encapsulation conjoined part 23 and the cover layer 29 to form multiple camera modules 10 .
  • the package conjoined portion 23 is divided to form the package body 12 in the camera module 10
  • the cover layer 29 is divided to obtain a plurality of independent light-transmitting cover plates 15 .
  • step S810 during the process of stacking and fixing multiple wafer-level lenses 11 and multiple photosensitive components 13 on the cover layer 29 along the height direction, the multiple wafer-level lenses 11 may first be fixed on the cover upside down.
  • the plurality of photosensitive components 13 are respectively aligned with the plurality of wafer-level lenses 11 and fixed upside down on the image side of the plurality of wafer-level lenses 11;
  • the photosensitive components 13 are respectively fixed to form a module semi-finished product, and then the module semi-finished product is fixed upside down to the cover layer 29, thereby reducing the difficulty of alignment between the wafer-level lens 11 and the photosensitive components 13.
  • the top surface of the wafer-level lens 11 matches the image side of the cover layer 29 , the cover layer 29 is flat, and the image side of the cover layer 29 is flat, so that the top surface is The flat wafer-level lens 11 can be stably attached to the image side of the cover layer 29 .
  • the module panel 20 also includes a light-shielding layer 213 disposed between the wafer-level lens component 111 of the wafer-level lens 11 and the cover layer 29 , which is screen-printed, A light-shielding layer 213 is provided by applying ink or glue, and a plurality of light holes are reserved on the light-shielding layer 213 to provide a channel for light to enter the wafer-level lens 11 .
  • the photosensitive component 13 provided in step S810 includes a photosensitive chip 131 and an electrical connection portion 133 provided on the back of the photosensitive chip 131 .
  • step S810 a plurality of filter elements 14 are further provided, so that the plurality of filter elements 14 are respectively disposed between the plurality of wafer-level lenses 11 and the protective layer 22 .
  • the packaging material filled in step S820 is a liquid packaging material.
  • the packaging conjoined portion 23 is formed. With the fluidity of the liquid encapsulating material, the liquid encapsulating material can fully contact the bottom surface of the cover layer 29 and the peripheral sides of the wafer-level lens 11 and the photosensitive component 13. After the liquid encapsulating material is cured, the formed encapsulating conjoined portion 23 is also It can completely cover the bottom surface of the plate layer 29 and the peripheral sides of the wafer-level lens 11 and the photosensitive component 13 .
  • the packaging material is preferably a material that turns black after curing, so that the package body 12 in the camera module 10 turns black and has a better anti-stray light effect.
  • the packaging material may be glue.
  • the glue is filled between the multiple wafer-level lenses 11 and the multiple photosensitive components 13 .
  • the encapsulation conjoined portion 23 formed can be divided to obtain a glue encapsulation body. That is, a glue process is used to encapsulate the peripheral sides of the wafer-level lens 11 and the photosensitive component 13 .
  • the glue is opaque, such as black glue, so that the encapsulation material can reduce stray light entering from the side.
  • multiple wafer-level lenses 11 can be sprayed Glue is filled between the multiple wafer-level lenses 11 and the multiple photosensitive components 13 to avoid the generation of air bubbles, or glue can be filled between the multiple wafer-level lenses 11 and the multiple photosensitive components 13 in a dot-like manner.
  • the encapsulation material may also be a molding material
  • the module panel 20 is placed in the molding mold and toward the mold.
  • the molding material is injected into the component mold, causing the molding material to flow between the plurality of wafer-level lenses 11 and the plurality of photosensitive components 13, thereby covering the image side (bottom side) of the plate layer 29 with the molding material.
  • the peripheral sides of the wafer-level lens 11 and the peripheral side of the photosensitive component 13 are further solidified to form a package conjoined part 23.
  • the package conjoined part 23 can be divided to obtain a molded package.
  • the molding material can be solidified by cooling or heating, which is determined by the properties of the molding material.
  • Different packaging materials can be selected according to the depth and width of the gaps between the multiple wafer-level lenses 11 and the multiple photosensitive components 13. For example, for a gap with a deeper depth or a narrower width, a packaging material with better fluidity is selected. For gaps that are shallower in depth or wider in width, less fluid encapsulation materials can be used.
  • the third and fourth embodiments of the camera module 10 do not use the lens panel 21 or the chip panel 24 in a paneled state for direct manufacturing, so that the wafer-level lens 11 and the photosensitive chip 131 They can be individually aligned, which reduces assembly tolerances, thereby improving the imaging quality of the camera module 10 .
  • the packaging material is preferably a material that turns black after curing, so that the package 12 in the camera module 10 turns black and has a better anti-stray light effect.
  • adjacent wafer-level lenses 1111 are fixed to each other and form a space filled with air. Since the wafer-level lens 11 or the camera module 10 using the wafer-level lens 11 has to pass through During the baking process, at high temperatures, the air between adjacent wafer-level lenses 1111 expands, which risks causing the relative position between adjacent wafer-level lenses 1111 to change. In order to reduce the above risk, the air between adjacent wafer-level lenses 1111 can be reduced.
  • the surface shapes of the opposite surfaces of adjacent wafer-level lenses 1111 are opposite, such as the imaging shown in Figure 13
  • the image side surface of the first wafer level lens 1114 is concave
  • the object side surface of the second wafer level lens 1115 is convex.
  • the two cooperate with each other to make the first wafer level lens 1115 concave.
  • the average gap between the lens 1114 and the second wafer-level lens 1115 becomes smaller, thereby reducing the air between the first wafer-level lens 1114 and the second wafer-level lens 1115, reducing the risk of image quality degradation at high temperatures. risk.

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Lens Barrels (AREA)

Abstract

Disclosed in the present application is a camera module. The camera module comprises: a wafer-level lens; a photosensitive assembly, wherein the wafer-level lens is arranged on a photosensitive path of the photosensitive assembly, and the photosensitive assembly comprises a photosensitive chip and a protective cover plate covering the photosensitive chip; and a packaging body, which is integrally formed on the peripheral side of the wafer-level lens and the peripheral side of the protective cover plate. In addition, further disclosed is a manufacturing method for a camera module. The camera module and the manufacturing method disclosed in the present application can reduce the size of the camera module and simplify a manufacturing process.

Description

一种摄像模组及其制造方法A camera module and its manufacturing method 技术领域Technical field
本申请涉及摄像模组技术领域,尤其涉及一种采用晶圆级镜头的摄像模组及其制造方法。The present application relates to the technical field of camera modules, and in particular to a camera module using a wafer-level lens and a manufacturing method thereof.
背景技术Background technique
随着摄像技术的发展,摄像模组被越来越多的应用于各式各样的电子设备中,例如手机、平板、AR/VR等。在其中,一些电子设备对摄像模组的体积要求变得更高,如何使摄像模组的尺寸变得更小,使摄像模组能够被应用于安装空间更小的电子设备中变得尤为重要。With the development of camera technology, camera modules are increasingly used in a variety of electronic devices, such as mobile phones, tablets, AR/VR, etc. Among them, some electronic devices have higher volume requirements for camera modules. How to make the size of the camera module smaller so that the camera module can be used in electronic devices with smaller installation space has become particularly important. .
因此,本申请提供一种采用晶圆级镜头的摄像模组及其制造方法,以使摄像模组的尺寸得以降低,并使得摄像模组的制造效率得以提升。Therefore, this application provides a camera module using a wafer-level lens and a manufacturing method thereof, so as to reduce the size of the camera module and improve the manufacturing efficiency of the camera module.
发明内容Contents of the invention
本申请的一个目的在于提供一种摄像模组,其克服现有技术的不足,使得摄像模组的尺寸得以被减小,使得制造流程简化。An object of the present application is to provide a camera module that overcomes the shortcomings of the existing technology, reduces the size of the camera module, and simplifies the manufacturing process.
根据本申请的一个方面,提供一种摄像模组,包括:According to one aspect of this application, a camera module is provided, including:
晶圆级镜头;Wafer-level lenses;
感光组件,所述晶圆级镜头被设置于所述感光组件的感光路径上,所述感光组件包括感光芯片和被盖设于所述感光芯片上方的保护盖板;Photosensitive component, the wafer-level lens is disposed on the photosensitive path of the photosensitive component, the photosensitive component includes a photosensitive chip and a protective cover covered above the photosensitive chip;
封装体,所述封装体一体成型于所述晶圆级镜头的周侧和所述保护盖板的周侧。An encapsulation body, the encapsulation body is integrally formed on the circumferential side of the wafer-level lens and the circumferential side of the protective cover.
在一些实施例中,所述保护盖板的横向尺寸小于所述感光芯片的横向尺寸,所述封装体一体成型于所述感光芯片的正面的至少一部分。In some embodiments, the lateral size of the protective cover is smaller than the lateral size of the photosensitive chip, and the package is integrally formed on at least a portion of the front surface of the photosensitive chip.
在一些实施例中,所述感光组件还包括侧连部,所述侧连部一体成型于所述感光芯片的周侧,所述侧连部的横向尺寸大于所述保护盖板的横向尺寸,所述封装体一体成型于所述侧连部的正面的至少一部分。In some embodiments, the photosensitive component further includes a side connecting portion, the side connecting portion is integrally formed on the peripheral side of the photosensitive chip, and the lateral size of the side connecting portion is larger than the lateral size of the protective cover, The package body is integrally formed on at least a part of the front surface of the side connecting portion.
在一些实施例中,所述摄像模组还包括被设置于所述晶圆级镜头和所述感光组件之间的滤光元件,所述封装体一体成型于所述滤光元件的周侧。In some embodiments, the camera module further includes a filter element disposed between the wafer-level lens and the photosensitive component, and the package is integrally formed on the peripheral side of the filter element.
在一些实施例中,所述感光芯片还包括被设置于所述感光芯片的背面的电连接部。In some embodiments, the photosensitive chip further includes an electrical connection portion disposed on the back side of the photosensitive chip.
在一些实施例中,所述感光组件还包括线路板和电子元件,所述线路板被设置于所述感光芯片的背面,所述线路板包括线路板主体和底封装部,所述感光芯片被设置于所述线路板主体的正面并通过所述电连接部电连接于所述线路板主体,所述电子元件被设置于所述线路板主体的背面,所述底封装部通过模塑工艺一体成型于所述线路板主体的背面,所述电子元件被模塑于所述底封装部的内部。In some embodiments, the photosensitive component further includes a circuit board and electronic components. The circuit board is disposed on the back of the photosensitive chip. The circuit board includes a circuit board body and a bottom packaging part. The photosensitive chip is The electronic component is disposed on the front side of the circuit board body and is electrically connected to the circuit board body through the electrical connection part. The electronic component is disposed on the back side of the circuit board body. The bottom packaging part is integrated through a molding process. Molded on the back side of the circuit board body, the electronic component is molded inside the bottom package part.
根据本申请的另一个方面,提供一种摄像模组的制造方法,包括:According to another aspect of the present application, a method of manufacturing a camera module is provided, including:
沿高度方向堆叠并固定一镜头拼板、一保护层和一芯片拼板形成一模组拼板; Stack and fix a lens panel, a protective layer and a chip panel along the height direction to form a module panel;
沿高度方向分割所述模组拼板中的所述镜头拼板和所述保护层以形成多个晶圆级镜头和多个保护盖板,相邻的两个所述晶圆级镜头和相邻的两个所述保护盖板之间形成一上分割槽;Divide the lens panel and the protective layer in the module panel along the height direction to form a plurality of wafer-level lenses and a plurality of protective cover plates, two adjacent wafer-level lenses and phase An upper dividing groove is formed between two adjacent protective covers;
向所述上分割槽中填充封装材料,固化所述封装材料形成一封装连体部,所述封装连体部一体成型于所述晶圆级镜头和所述保护盖板的周侧;Filling the upper dividing groove with packaging material, and curing the packaging material to form a packaging conjoined part, the packaging conjoined part is integrally formed on the peripheral side of the wafer-level lens and the protective cover;
沿高度方向分割所述模组拼板,分割所述封装连体部和所述芯片拼板,以形成多个摄像模组。The module panel is divided along the height direction, and the package conjoined portion and the chip panel are divided to form multiple camera modules.
在一些实施例中,在所述固化所述封装材料形成所述封装连体部的步骤后,在所述芯片拼板的多个感光芯片的背面设置电连接部。In some embodiments, after the step of curing the encapsulation material to form the encapsulation conjoined part, electrical connection parts are provided on the back surfaces of the plurality of photosensitive chips of the chip panel.
在一些实施例中,所述芯片拼板包括多个感光芯片和被设置于多个所述感光芯片之间的连体部。In some embodiments, the chip panel includes a plurality of photosensitive chips and a conjoined portion disposed between the plurality of photosensitive chips.
在一些实施例中,所述封装材料为模塑材料或者胶水。In some embodiments, the encapsulation material is a molding material or glue.
根据本申请的另一个方面,提供一种摄像模组,包括:According to another aspect of the present application, a camera module is provided, including:
晶圆级镜头;Wafer-level lenses;
感光芯片,所述晶圆级镜头被设置于所述感光芯片的感光路径上;Photosensitive chip, the wafer-level lens is arranged on the photosensitive path of the photosensitive chip;
线路板,所述感光芯片被设置于所述线路板;A circuit board, the photosensitive chip is disposed on the circuit board;
封装体,所述封装体一体成型于所述晶圆级镜头、所述感光芯片和所述线路板。A package body, which is integrally formed on the wafer-level lens, the photosensitive chip and the circuit board.
在一些实施例中,所述摄像模组进一步包括至少一引线,至少一所述引线被设置于所述感光芯片和所述线路板之间,至少一所述引线被所述封装体包裹。In some embodiments, the camera module further includes at least one lead, at least one lead is disposed between the photosensitive chip and the circuit board, and at least one lead is wrapped by the package.
在一些实施例中,所述封装体包覆所述线路板的正面的至少一部分、所述感光芯片的周侧和正面的至少一部分、以及所述晶圆级镜头的周侧。In some embodiments, the package covers at least a portion of the front side of the circuit board, at least a portion of the peripheral side and the front side of the photosensitive chip, and the peripheral side of the wafer-level lens.
在一些实施例中,所述感光芯片包括感光区和围绕所述感光区的非感光区,所述封装体沿水平方向延伸至所述感光芯片的所述非感光区,所述封装体沿高度方向延伸至所述晶圆级镜头的顶部,所述封装体一体成型于所述感光芯片的周侧和所述晶圆级镜头的周侧。In some embodiments, the photosensitive chip includes a photosensitive area and a non-photosensitive area surrounding the photosensitive area, and the package body extends along a horizontal direction to the non-photosensitive area of the photosensitive chip, and the package body extends along a height The direction extends to the top of the wafer-level lens, and the package is integrally formed on the peripheral side of the photosensitive chip and the peripheral side of the wafer-level lens.
在一些实施例中,所述封装体具有竖直的外侧面,所述封装体的上部的横向尺寸等于所述封装体的底部的横向尺寸。In some embodiments, the package has vertical outer sides, and the lateral dimensions of the upper portion of the package are equal to the lateral dimensions of the bottom of the package.
在一些实施例中,所述封装体的外侧面呈倾斜状,所述封装体的外径由上到下增大,所述封装体的底部的横向尺寸大于所述封装体的上部的横向尺寸。In some embodiments, the outer side of the package is inclined, the outer diameter of the package increases from top to bottom, and the lateral size of the bottom of the package is larger than the lateral size of the upper part of the package. .
根据本申请的另一个方面,提供一种摄像模组的制造方法,包括:According to another aspect of the present application, a method of manufacturing a camera module is provided, including:
提供一线路板拼板;Provide a circuit board panel;
在所述线路板拼板上设置多个感光芯片,将多个所述感光芯片电连接于所述线路板拼板;A plurality of photosensitive chips are provided on the circuit board panel, and the plurality of photosensitive chips are electrically connected to the circuit board panel;
在多个所述感光芯片上设置多个晶圆级镜头,多个所述晶圆级镜头分别位于多个所述感光芯片的感光路径上;A plurality of wafer-level lenses are provided on a plurality of the photosensitive chips, and the plurality of wafer-level lenses are respectively located on the photosensitive paths of a plurality of the photosensitive chips;
向相邻的两个所述晶圆级镜头和相邻的两个所述感光芯片之间填充封装材料,固化所述封装材料形成封装连体部,所述封装连体部一体结合于所述晶圆级镜头、所述感光芯片和所述线路板拼板,以形成一模组拼板;Filling packaging material between two adjacent wafer-level lenses and two adjacent photosensitive chips, curing the packaging material to form a packaging conjoined part, the packaging conjoined part is integrally combined with the The wafer-level lens, the photosensitive chip and the circuit board are assembled to form a module assembly;
沿高度方向分割所述模组拼板,以形成多个摄像模组。 The module panels are divided along the height direction to form multiple camera modules.
在一些实施例中,所述封装材料为模塑材料,所述封装连体部通过模塑工艺一体成型于所述晶圆级镜头、所述感光芯片和所述线路板拼板。In some embodiments, the packaging material is a molding material, and the packaging conjoined portion is integrally formed on the wafer-level lens, the photosensitive chip and the circuit board panel through a molding process.
在一些实施例中,所述封装连体部切割后形成封装体,所述线路板拼板切割后形成多个线路板,所述封装体包覆所述线路板的正面的至少一部分、所述感光芯片的周侧和正面的至少一部分、以及所述晶圆级镜头的周侧。In some embodiments, the package conjoined portion is cut to form a package body, and the circuit board panel is cut to form a plurality of circuit boards. The package body covers at least part of the front surface of the circuit board, the At least part of the peripheral side and the front side of the photosensitive chip, and the peripheral side of the wafer-level lens.
在一些实施例中,在所述形成模组拼板的步骤后,在所述模组拼板的物侧设置遮光层,所述遮光层被设置于所述封装连体部的顶面,朝向所述晶圆级镜头方向延伸。In some embodiments, after the step of forming the module panel, a light-shielding layer is provided on the object side of the module panel, and the light-shielding layer is provided on the top surface of the package conjoined portion, facing toward The wafer-level lens direction extends.
根据本申请的另一个方面,提供一种摄像模组,包括:According to another aspect of the present application, a camera module is provided, including:
晶圆级镜头;Wafer-level lenses;
感光组件,所述晶圆级镜头被设置于所述感光组件的感光路径上,所述感光组件包括感光芯片和被盖设于所述感光芯片上方的保护盖板;Photosensitive component, the wafer-level lens is disposed on the photosensitive path of the photosensitive component, the photosensitive component includes a photosensitive chip and a protective cover covered above the photosensitive chip;
封装体,所述封装体一体成型于所述晶圆级镜头的周侧、所述保护盖板的周侧和所述感光芯片的周侧。An encapsulation body is integrally formed on the circumferential side of the wafer-level lens, the circumferential side of the protective cover, and the circumferential side of the photosensitive chip.
在一些实施例中,所述封装体包括上封装体和下封装体,所述上封装体一体成型于所述晶圆级镜头的周侧和所述保护盖板的周侧,所述下封装体一体成型于所述感光芯片的周侧。In some embodiments, the package includes an upper package and a lower package. The upper package is integrally formed on the peripheral side of the wafer-level lens and the protective cover. The lower package The body is integrally formed on the peripheral side of the photosensitive chip.
在一些实施例中,所述感光组件还包括侧连部,所述侧连部一体成型于所述感光芯片的周侧,所述下封装体一体成型于所述侧连部的周侧。In some embodiments, the photosensitive component further includes a side connecting portion, the side connecting portion is integrally formed on the peripheral side of the photosensitive chip, and the lower package body is integrally formed on the peripheral side of the side connecting portion.
在一些实施例中,所述感光芯片的横向尺寸小于所述保护盖板的横向尺寸。In some embodiments, the lateral size of the photosensitive chip is smaller than the lateral size of the protective cover.
在一些实施例中,所述感光芯片还包括被设置于所述感光芯片的背面的电连接部。In some embodiments, the photosensitive chip further includes an electrical connection portion disposed on the back side of the photosensitive chip.
在一些实施例中,所述摄像模组还包括被设置于所述晶圆级镜头和所述感光组件之间的滤光元件,所述上封装体一体成型于所述滤光元件的周侧。In some embodiments, the camera module further includes a filter element disposed between the wafer-level lens and the photosensitive component, and the upper package is integrally formed on the peripheral side of the filter element. .
根据本申请的另一个方面,提供一种摄像模组的制造方法,包括:According to another aspect of the present application, a method of manufacturing a camera module is provided, including:
沿高度方向堆叠并固定一镜头拼板、一保护层和一芯片拼板形成一模组拼板;Stack and fix a lens panel, a protective layer and a chip panel along the height direction to form a module panel;
沿高度方向分割所述模组拼板中的所述镜头拼板和所述保护层以形成多个晶圆级镜头和多个保护盖板,相邻的两个所述晶圆级镜头和相邻的两个所述保护盖板之间形成一上分割槽;Divide the lens panel and the protective layer in the module panel along the height direction to form a plurality of wafer-level lenses and a plurality of protective cover plates, two adjacent wafer-level lenses and phase An upper dividing groove is formed between two adjacent protective covers;
向所述上分割槽中填充第一封装材料,固化所述第一封装材料形成一上封装连体部;Fill the upper dividing groove with a first packaging material, and solidify the first packaging material to form an upper packaging conjoined part;
沿高度方向分割所述模组拼板中的所述芯片拼板以形成多个独立的感光芯片,相邻的两个所述感光芯片之间形成一下分割槽;Divide the chip panel in the module panel along the height direction to form a plurality of independent photosensitive chips, and form a dividing groove between two adjacent photosensitive chips;
向所述下分割槽中填充第二封装材料,固化所述第二封装材料形成一下封装连体部,所述下封装连体部一体成型于所述上封装连体部形成一封装连体部;Fill the lower dividing groove with a second packaging material, and solidify the second packaging material to form a lower packaging conjoined part. The lower packaging conjoined part is integrally molded with the upper packaging conjoined part to form a package conjoined part. ;
沿高度方向分割所述模组拼板,以形成多个摄像模组。The module panels are divided along the height direction to form multiple camera modules.
在一些实施例中,在所述固化所述第一封装材料形成所述上封装连体部的步骤后,在所述芯片拼板的多个感光芯片的背面设置电连接部。In some embodiments, after the step of curing the first encapsulation material to form the upper encapsulation conjoined portion, electrical connection portions are provided on the back surfaces of the plurality of photosensitive chips of the chip panel.
在一些实施例中,所述芯片拼板包括多个感光芯片和被设置于多个所述感光芯片之间的连体部。In some embodiments, the chip panel includes a plurality of photosensitive chips and a conjoined portion disposed between the plurality of photosensitive chips.
在一些实施例中,所述第一封装材料与所述第二封装材料采用不同的材料。 In some embodiments, the first packaging material and the second packaging material are made of different materials.
根据本申请的另一个方面,提供一种摄像模组,包括:According to another aspect of the present application, a camera module is provided, including:
晶圆级镜头;Wafer-level lenses;
透光盖板,所述透光盖板被固定于所述晶圆级镜头的顶面;A light-transmitting cover plate, the light-transmitting cover plate is fixed on the top surface of the wafer-level lens;
感光组件,所述晶圆级镜头被设置于所述感光组件的感光路径上;Photosensitive component, the wafer-level lens is disposed on the photosensitive path of the photosensitive component;
封装体,所述封装体一体成型于所述透光盖板的底面的一部分、所述晶圆级镜头的侧面和所述感光组件的侧面。A package body, which is integrally formed on a part of the bottom surface of the light-transmitting cover plate, the side surface of the wafer-level lens, and the side surface of the photosensitive component.
在一些实施例中,所述透光盖板的横向尺寸大于所述晶圆级镜头和所述感光组件的横向尺寸,所述晶圆级镜头的顶面为平面。In some embodiments, the lateral size of the light-transmitting cover is larger than the lateral size of the wafer-level lens and the photosensitive component, and the top surface of the wafer-level lens is flat.
在一些实施例中,所述透光盖板具有红外截止功能。In some embodiments, the light-transmitting cover has an infrared cutoff function.
在一些实施例中,所述摄像模组还包括遮光部,所述遮光部被设置于所述晶圆级镜头和所述透光盖板之间。In some embodiments, the camera module further includes a light-shielding portion disposed between the wafer-level lens and the light-transmitting cover.
在一些实施例中,所述感光组件包括感光芯片、被盖设于所述感光芯片上方的保护盖板和被设置于所述感光芯片的背面的电连接部。In some embodiments, the photosensitive component includes a photosensitive chip, a protective cover covering the photosensitive chip, and an electrical connection portion disposed on the back of the photosensitive chip.
根据本申请的另一个方面,提供一种摄像模组的制造方法,包括:According to another aspect of the present application, a method of manufacturing a camera module is provided, including:
提供一盖板层、多个晶圆级镜头和多个感光组件,沿高度方向堆叠并固定多个所述晶圆级镜头和多个所述感光组件于所述盖板层上,以形成一模组拼板,多个所述晶圆级镜头和多个所述感光组件被相互间隔地倒置于所述盖板层上;Provide a cover layer, a plurality of wafer-level lenses and a plurality of photosensitive components, stack and fix a plurality of the wafer-level lenses and a plurality of the photosensitive components on the cover layer along the height direction to form a In a module panel, a plurality of the wafer-level lenses and a plurality of the photosensitive components are placed upside down on the cover layer at a distance from each other;
向多个所述晶圆级镜头和多个所述感光组件之间填充封装材料,使所述封装材料包覆所述盖板层的像侧、所述晶圆级镜头的周侧和所述感光组件的周侧,固化所述封装材料形成一封装连体部;Filling packaging material between the plurality of wafer-level lenses and the plurality of photosensitive components, so that the packaging material covers the image side of the cover layer, the peripheral side of the wafer-level lens and the On the peripheral side of the photosensitive component, the packaging material is cured to form a packaging conjoined part;
沿高度方向分割所述模组拼板,分割所述封装连体部和所述盖板层,以形成多个摄像模组。The module panel is divided along the height direction, and the package conjoined part and the cover layer are divided to form multiple camera modules.
在一些实施例中,所述盖板层的像侧面为平面,所述晶圆级镜头的顶面为平面。In some embodiments, the image side of the cover layer is flat, and the top surface of the wafer-level lens is flat.
在一些实施例中,所述盖板层上通过丝印、涂墨或者涂胶的方式设置一遮光层,所述遮光层上预留多个通光孔以提供所述晶圆级镜头光线入射的通道。In some embodiments, a light-shielding layer is provided on the cover layer by silk-screen printing, ink coating or glue coating, and a plurality of light holes are reserved on the light-shielding layer to provide light for the wafer-level lens to enter. aisle.
在一些实施例中,所述封装材料为模塑材料,将所述模组拼板设置于模组成型模具中,向所述模组成型模具注入所述模塑材料,使所述模塑材料在多个所述晶圆级镜头和多个所述感光组件之间流动,从而将所述模塑材料包覆所述盖板层的像侧、所述晶圆级镜头的周侧和所述感光组件的周侧。In some embodiments, the packaging material is a molding material, the module panel is placed in a molding mold, and the molding material is injected into the molding mold to make the molding material Flow between the plurality of wafer-level lenses and the plurality of photosensitive components, so that the molding material covers the image side of the cover layer, the peripheral side of the wafer-level lens and the The peripheral side of the photosensitive component.
在一些实施例中,所述封装材料为胶水,通过喷雾或者点状画胶的方式在多个所述晶圆级镜头和多个所述感光组件之间填充所述胶水。In some embodiments, the encapsulating material is glue, and the glue is filled between the plurality of wafer-level lenses and the plurality of photosensitive components by spraying or dotting glue.
与现有技术相比,本申请具有下列至少一个技术效果:Compared with the existing technology, this application has at least one of the following technical effects:
1、通过封装体一体成型于晶圆级镜头的周侧和保护盖板的周侧,使封装体可以封装并保护晶圆级镜头和保护盖板的周侧。1. The package is integrally formed on the peripheral side of the wafer-level lens and the protective cover, so that the package can encapsulate and protect the peripheral sides of the wafer-level lens and the protective cover.
2、通过填充封装连体部的形式制成模组拼板再分割的方式,简化制造的流程。2. By filling and encapsulating the conjoined parts to form module panels and then dividing them, the manufacturing process is simplified.
3、通过封装体一体成型于晶圆级镜头的周侧、感光芯片的周侧和正面的至少一部分、以及线路板正面的至少一部分,使封装体可以封装并保护晶圆级镜头和感光芯片的周侧。3. The package is integrally formed on the peripheral side of the wafer-level lens, at least part of the peripheral side and front side of the photosensitive chip, and at least part of the front side of the circuit board, so that the package body can encapsulate and protect the wafer-level lens and the photosensitive chip. Peripheral side.
4、通过封装体一体成型于晶圆级镜头的周侧、保护盖板和感光芯片的周侧,使封装体可以封装并 保护晶圆级镜头、保护盖板和感光芯片的周侧。4. The package is integrally formed on the peripheral side of the wafer-level lens, the protective cover and the photosensitive chip, so that the package can be packaged and Protect the wafer-level lens, protective cover and the periphery of the photosensitive chip.
5、通过以盖板层为组装基准,将多个分体的晶圆级镜头和感光组件倒置的固定于盖板层上,使得制造流程简化,使得制造方法对来料的要求降低。5. By using the cover layer as the assembly reference, multiple separate wafer-level lenses and photosensitive components are fixed upside down on the cover layer, which simplifies the manufacturing process and reduces the requirements for incoming materials for the manufacturing method.
6、通过使封装体一体成型于透光盖板的底面的一部分、晶圆级镜头的侧面和感光组件的侧面,以封装并保护晶圆级镜头和感光组件。6. The package body is integrally formed on a part of the bottom surface of the light-transmitting cover, the side of the wafer-level lens, and the side of the photosensitive component to encapsulate and protect the wafer-level lens and the photosensitive component.
在以下描述中部分地阐述了另外的实施方案和特征,并且本领域技术人员在审阅说明书之后将明白或者通过所公开的主题的实践来学习这些实施方案和特征。可通过参考构成本申请的一部分的说明书和附图的其余部分来实现本公开的特点和优点的进一步理解。Additional embodiments and features are set forth in part in the description that follows, and will be apparent to those skilled in the art upon review of the specification, or may be learned by practice of the disclosed subject matter. A further understanding of the features and advantages of the present disclosure can be achieved by reference to the remainder of the specification and drawings, which form a part of this application.
附图说明Description of drawings
图1是根据本申请提供的晶圆级镜头的截面示意图;Figure 1 is a schematic cross-sectional view of a wafer-level lens provided according to the present application;
图2A和图2B是根据本申请提供的镜头拼板的制造方法示意图;2A and 2B are schematic diagrams of the manufacturing method of the lens panel provided according to the present application;
图3是根据本申请提供的透镜拼板的俯视方向的结构示意图;Figure 3 is a schematic structural diagram of the lens panel provided according to the present application in the top view direction;
图4A、图4B、图4C和图4D是根据本申请提供的透镜拼板的四个示例的截面示意图;4A, 4B, 4C and 4D are schematic cross-sectional views of four examples of lens panels provided according to the present application;
图5A和图5B是根据本申请提供的晶圆级镜头的两个截面示意图;5A and 5B are two schematic cross-sectional views of a wafer-level lens provided according to the present application;
图6A、图6B、图6C和图6D是根据本申请提供的摄像模组的第一实施例的四个示例的截面示意图;6A, 6B, 6C and 6D are schematic cross-sectional views of four examples of the first embodiment of the camera module provided according to the present application;
图6E是根据本申请图6A中感光组件的俯视示意图;Figure 6E is a schematic top view of the photosensitive component in Figure 6A according to the present application;
图7A和图7B是根据本申请提供的芯片拼板的截面示意图和俯视示意图;7A and 7B are schematic cross-sectional views and top views of the chip panel provided according to the present application;
图7C是根据本申请图7A和图7B所示意的芯片拼板分割后的感光芯片的俯视示意图;Figure 7C is a schematic top view of the photosensitive chip after the chip panel is divided according to Figures 7A and 7B of the present application;
图8是根据本申请提供的摄像模组的第一实施例的制造方法示意图;Figure 8 is a schematic diagram of a manufacturing method according to the first embodiment of the camera module provided by the present application;
图9A、图9B和图9C是根据本申请提供的摄像模组的第二实施例的三个示例的截面示意图;9A, 9B and 9C are schematic cross-sectional views of three examples of the second embodiment of the camera module provided according to the present application;
图10是根据本申请提供的摄像模组的第二实施例的制造方法示意图;Figure 10 is a schematic diagram of a manufacturing method according to the second embodiment of the camera module provided by the present application;
图11A、图11B和图11C是根据本申请提供的摄像模组的第三实施例的三个示例的截面示意图;11A, 11B and 11C are schematic cross-sectional views of three examples of the third embodiment of the camera module provided according to the present application;
图12是根据本申请提供的摄像模组的第三实施例的制造方法示意图;Figure 12 is a schematic diagram of the manufacturing method of the third embodiment of the camera module provided by the present application;
图13是根据本申请提供的摄像模组的第四实施例的截面示意图;Figure 13 is a schematic cross-sectional view of a fourth embodiment of a camera module provided according to the present application;
图14是根据本申请提供的摄像模组的第四实施例的制造方法示意图。Figure 14 is a schematic diagram of a manufacturing method of a fourth embodiment of a camera module provided by this application.
具体实施方式Detailed ways
下面,结合具体实施方式,对本申请做进一步描述,需要说明的是,在不相冲突的前提下,以下描述的各实施例之间或各技术特征之间可以任意组合形成新的实施例。Below, the present application will be further described with reference to specific implementation modes. It should be noted that, on the premise that there is no conflict, the various embodiments or technical features described below can be arbitrarily combined to form new embodiments.
“包括”,该术语是开放式的。如在所附权利要求书中所使用的,该术语不排除附加结构或步骤。 "Including", the term is open-ended. As used in the appended claims, this term does not exclude additional structures or steps.
在本申请的描述中,需要说明的是,对于方位词,如有术语“中心”、“横向”、“纵向”、“长度”、“宽度”、“厚度”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”、“顺时针”、“逆时针”等指示方位和位置关系为基于附图所示的方位或位置关系,仅是为了便于叙述本申请和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定方位构造和操作,不能理解为限制本申请的具体保护范围。In the description of this application, it should be noted that for directional words, such as the terms "center", "transverse", "vertical", "length", "width", "thickness", "upper", "lower" , "Front", "Back", "Left", "Right", "Vertical", "Horizontal", "Top", "Bottom", "Inside", "Outside", "Clockwise", "Counterclockwise" ", etc. indicate the orientation and positional relationship based on the orientation or positional relationship shown in the drawings. They are only for the convenience of describing the present application and simplifying the description. They do not indicate or imply that the device or element referred to must have a specific orientation or be in a specific orientation. The construction and operation shall not be construed as limiting the specific scope of protection of this application.
需要说明的是,本申请的说明书和权利要求书中的术语“第一”、“第二”等是用于区别类似的对象,而不必用于描述特定的顺序或先后次序。It should be noted that the terms "first", "second", etc. in the description and claims of this application are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence.
本申请的说明书和权利要求书中的术语“包括”和“具有”以及他们的任何变形,意图在于覆盖不排他的包含,例如,包含了一系列步骤或单元的过程、方法、系统、产品或设备不必限于清楚地列出的那些步骤或单元,而是可包括没有清楚地列出的或对于这些过程、方法、产品或设备固有的其它步骤或单元。The terms "comprising" and "having" and any variations thereof in the description and claims of this application are intended to cover a non-exclusive inclusion, for example, a process, method, system, product or product that includes a series of steps or units. Apparatus are not necessarily limited to those steps or elements expressly listed, but may include other steps or elements not expressly listed or inherent to such processes, methods, products or devices.
需要说明的是,如在本申请中使用的,用语“基本上”、“大约”以及类似的用语用作表近似的用语,而不用作表程度的用语,并且旨在说明将由本领域普通技术人员认识到的、测量值或计算值中的固有偏差。It should be noted that, as used in this application, the terms "substantially", "approximately" and similar terms are used to indicate approximation, rather than to indicate degree, and are intended to illustrate what would be expected by ordinary skill in the art. Inherent bias in measured or calculated values recognized by personnel.
在本申请的描述中,还需要说明的是,除非另有明确的规定和限定,术语“设置”、“安装”、“相连”、“连接”应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或一体地连接;可以是机械连接,也可以是电连接;可以是直接相连,也可以是接触连接或通过中间媒介间接相连,可以是两个元件内部的连通。对于本领域的普通技术人员而言,可以根据具体情况理解上述术语在本申请中的具体含义。In the description of this application, it should also be noted that, unless otherwise clearly stated and limited, the terms "setting", "installation", "connecting" and "connecting" should be understood in a broad sense. For example, it can be a fixed connection, It can also be a detachable connection or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, a contact connection or an indirect connection through an intermediate medium; it can be an internal connection between two components. For those of ordinary skill in the art, the specific meanings of the above terms in this application can be understood according to specific circumstances.
“被配置为”,各种单元、电路或其他部件可被描述为或叙述为“被配置为”执行一项或多项任务。在此类上下文中,“被配置为”用于通过指示单元/电路/部件包括在操作期间执行这一项或多项任务的结构(例如,电路)来暗指该结构。此外,“被配置为”可包括由软件和/或固件操纵的通用结构(例如,通用电路)以能够执行待解决的一项或多项任务的方式操作。“被配置为”还可包括调整制造过程(例如,半导体制作设施),以制造适用于实现或执行一项或多项任务的设备(例如,集成电路)。"Configured as," various units, circuits, or other components may be described or recited as being "configured to" perform one or more tasks. In such contexts, "configured to" is used to imply structure by indicating that the unit/circuit/component includes structure (eg, circuitry) that performs the task or tasks during operation. Additionally, "configured to" may include general-purpose structures (eg, general-purpose circuitry) manipulated by software and/or firmware to operate in a manner capable of performing the task or tasks to be solved. "Configured to" may also include adapting a manufacturing process (eg, a semiconductor fabrication facility) to fabricate a device (eg, an integrated circuit) suitable for implementing or performing one or more tasks.
在本文描述中所使用的术语只是为了描述特定实施方案,而并非旨在进行限制。如说明书和所附权利要求中所使用的那样,单数形式的“一个”、“一种”和“该”旨在也涵盖复数形式,除非上下文以其他方式明确地指示。还将理解的是,本文中所使用的术语“和/或”是指并且涵盖相关联地列出的项目中的一个或多个项目的任何和全部可能的组合。还将理解的是,术语“包括”和/或“包含”在本说明书中使用时是指定存在所陈述的特征、整数、步骤、操作、元件和/或部件,但是并不排除存在或添加一个或多个其他特征、整数、步骤、操作、元件、部件和/或其分组。The terminology used in the description herein is for the purpose of describing particular embodiments only and is not intended to be limiting. As used in the specification and the appended claims, the singular forms "a," "an," and "the" are intended to cover the plural forms as well, unless the context clearly dictates otherwise. It will also be understood that the term "and/or" as used herein refers to and encompasses any and all possible combinations of one or more of the associated listed items. It will also be understood that the terms "comprises" and/or "comprising" when used in this specification specify the presence of stated features, integers, steps, operations, elements and/or parts, but do not exclude the presence or addition of a or multiple other features, integers, steps, operations, elements, parts, and/or groupings thereof.
如本文中所用,根据上下文,术语“如果”可以被解释为意思是“当...时”或“在...时”或“响应于确定”或“响应于检测到”。类似地,根据上下文,短语“如果确定...”或“如果检测到[所陈述的条件或事件]”可被解释为是指“在确定...时”或“响应于确定...”或“在检测到[所陈述的条件或事件]时”或“响应于检测到[所陈述的条件或事件]”。As used herein, the term "if" may be interpreted to mean "when" or "in response to" or "in response to determining" or "in response to detecting", depending on the context. Similarly, depending on the context, the phrase "if it is determined..." or "if [the stated condition or event] is detected" may be interpreted to mean "when it is determined..." or "in response to the determination... ” or “on detection of [stated condition or event]” or “in response to detection of [stated condition or event].”
图1至图14示出了本申请的晶圆级镜头11、镜头拼板21、透镜拼板2111、摄像模组10以及摄像模组10的制造方法的示意图。如图1所示,根据本申请实施例的晶圆级镜头11被阐明,其包括一晶圆级透镜组件111、一支撑件112以及一遮光部113。其中,支撑件112被设置于晶圆级透镜组件111的像侧,从而支撑件112从像侧支撑晶圆级透镜组件111;遮光部113被设置于晶圆级透镜组件111的物侧,遮光部 113可以减少晶圆级镜头11在光线入射方向一侧的杂光进入。在本申请的一些实施例中,晶圆级镜头11也可以不包括支撑件112112和/或遮光部113,从而降低高度或者简化制造工艺。1 to 14 show schematic diagrams of the wafer-level lens 11, the lens panel 21, the lens panel 2111, the camera module 10 and the manufacturing method of the camera module 10 of the present application. As shown in FIG. 1 , a wafer-level lens 11 according to an embodiment of the present application is illustrated, which includes a wafer-level lens assembly 111 , a support member 112 and a light shielding portion 113 . Among them, the support member 112 is disposed on the image side of the wafer-level lens assembly 111, so that the support member 112 supports the wafer-level lens assembly 111 from the image side; the light-shielding portion 113 is disposed on the object side of the wafer-level lens assembly 111 to block light. department 113 can reduce the stray light entering the wafer-level lens 11 on one side of the light incident direction. In some embodiments of the present application, the wafer-level lens 11 may not include the support member 112112 and/or the light shielding part 113, thereby reducing the height or simplifying the manufacturing process.
为了便于描述,在本申请中,以晶圆级透镜组件111或者晶圆级镜头11朝向被摄物的一侧为物侧,与物侧相反的一侧即为像侧,换言之,物侧是指成像光线入射晶圆级透镜组件111或者晶圆级镜头11的一侧,像侧是指成像光线出射晶圆级透镜组件111或者晶圆级镜头11的一侧,也即晶圆级透镜组件111或者晶圆级镜头11朝向像面的一侧。以图1所示意的晶圆级镜头11的方向来看,晶圆级镜头11的上侧即为像侧,晶圆级镜头11的下侧即为物侧。For the convenience of description, in this application, the side of the wafer-level lens assembly 111 or the wafer-level lens 11 facing the subject is called the object side, and the side opposite to the object side is the image side. In other words, the object side is Refers to the side where the imaging light enters the wafer-level lens assembly 111 or the wafer-level lens 11. The image side refers to the side where the imaging light exits the wafer-level lens assembly 111 or the wafer-level lens 11, that is, the wafer-level lens assembly. 111 or the wafer-level lens 11 faces the side of the image plane. Looking at the direction of the wafer-level lens 11 shown in FIG. 1 , the upper side of the wafer-level lens 11 is the image side, and the lower side of the wafer-level lens 11 is the object side.
晶圆级镜头11具有一光轴,晶圆级镜头11的光轴也是晶圆级透镜组件111的光轴,具体地,晶圆级透镜组件111包括至少一晶圆级透镜1111,晶圆级透镜组件111中晶圆级透镜1111的数量根据光学设计的需求而定,其数量可以为一,也可以是二、三、四或者更多。在本申请的一个实施例中,晶圆级透镜组件111包括一片晶圆级透镜1111,支撑件112和遮光部113分别被固定于晶圆级透镜1111的像侧和物侧;在本申请的另一个实施例中,晶圆级透镜组件111包括至少二晶圆级透镜1111,至少二晶圆级透镜1111沿光轴叠设,构成完整的光学系统,支撑件112被固定于至少二晶圆级透镜1111中最靠近像侧的晶圆级透镜1111的像侧,遮光部113被固定于至少二晶圆级透镜1111中最靠近物侧的晶圆级透镜1111的物侧,在一个具体示例中,晶圆级透镜组件111还包括至少一间隔件1113,间隔件1113被设置于相邻的晶圆级透镜1111之间,间隔件1113支撑相邻的晶圆级透镜1111并适于调整晶圆级透镜1111之间的间距。值得一提的是,在本申请的一个实施例中,支撑件112、遮光部113和间隔件1113分别具有一通光孔以用于光线通过和避免与晶圆级透镜1111发生干涉。The wafer-level lens 11 has an optical axis, and the optical axis of the wafer-level lens 11 is also the optical axis of the wafer-level lens assembly 111. Specifically, the wafer-level lens assembly 111 includes at least one wafer-level lens 1111. The number of wafer-level lenses 1111 in the lens assembly 111 is determined according to the requirements of optical design. The number may be one, two, three, four or more. In one embodiment of the present application, the wafer-level lens assembly 111 includes a wafer-level lens 1111, and the support 112 and the light-shielding portion 113 are respectively fixed on the image side and the object side of the wafer-level lens 1111; in this application In another embodiment, the wafer-level lens assembly 111 includes at least two wafer-level lenses 1111. The at least two wafer-level lenses 1111 are stacked along the optical axis to form a complete optical system. The support member 112 is fixed to at least two wafers. On the image side of the wafer-level lens 1111 closest to the image side among the first-level lenses 1111 , the light shielding portion 113 is fixed on the object side of the wafer-level lens 1111 closest to the object side among at least two wafer-level lenses 1111 . In a specific example, Among them, the wafer-level lens assembly 111 also includes at least one spacer 1113. The spacer 1113 is disposed between adjacent wafer-level lenses 1111. The spacer 1113 supports the adjacent wafer-level lenses 1111 and is suitable for adjusting the crystal. The distance between circular lenses 1111. It is worth mentioning that, in one embodiment of the present application, the support member 112 , the light-shielding portion 113 and the spacer 1113 each have a light hole for light to pass through and avoid interference with the wafer-level lens 1111 .
在本申请的一个实施例中,晶圆级透镜组件111的至少二晶圆级透镜1111包括一第一晶圆级透镜1114、一第二晶圆级透镜1115和一第三晶圆级透镜1116,第一晶圆级透镜1114、第二晶圆级透镜1115和第三晶圆级透镜1116沿光线入射的方向叠设,遮光部113被固定于第一晶圆级透镜1114的物侧,支撑件112被固定于第三晶圆级透镜1116的像侧。在一个具体示例中,晶圆级透镜组件111还包括至少一间隔层2112,间隔层2112可以被设置于第一晶圆级透镜1114和第二晶圆级透镜1115之间和/或被设置于第二晶圆级透镜1115和第三晶圆级透镜1116组件之间,间隔层2112支撑相邻的晶圆级透镜1111并适于调整晶圆级透镜1111之间的间距。In one embodiment of the present application, the at least two wafer-level lenses 1111 of the wafer-level lens assembly 111 include a first wafer-level lens 1114, a second wafer-level lens 1115, and a third wafer-level lens 1116. , the first wafer-level lens 1114, the second wafer-level lens 1115 and the third wafer-level lens 1116 are stacked along the direction of light incidence, and the light shielding part 113 is fixed on the object side of the first wafer-level lens 1114 and supported. The member 112 is fixed to the image side of the third wafer level lens 1116 . In a specific example, the wafer-level lens assembly 111 further includes at least one spacer layer 2112. The spacer layer 2112 may be disposed between the first wafer-level lens 1114 and the second wafer-level lens 1115 and/or be disposed between Between the second wafer-level lens 1115 and the third wafer-level lens 1116 assembly, the spacer layer 2112 supports the adjacent wafer-level lenses 1111 and is suitable for adjusting the spacing between the wafer-level lenses 1111 .
在本申请中,晶圆级透镜组件111还包括粘接层,粘接层可以被设置于相邻的晶圆级透镜1111之间以用于固定相邻的晶圆级透镜1111;粘接层还可以被设置于相邻的晶圆级透镜1111和间隔件1113之间以用于固定相邻的晶圆级透镜1111和间隔件1113;粘接层还可以被设置于相邻的晶圆级透镜1111和支撑件112之间以用于固定相邻的晶圆级透镜1111和支撑件112;粘接层还可以被设置于相邻的晶圆级透镜1111和遮光部113之间以用于固定相邻的晶圆级透镜1111和遮光部113。需要注意的是,被设置于不同位置的粘接层的材料可以相同或者不同,具体由粘接的需求决定,本申请并不受此所限。在一个示例中,粘接层可以是胶水,在设置粘接层时,可以连续的涂布胶水,也可以呈点状的间隔涂布胶水,从而使至少二晶圆级透镜1111和间隔层2112在固定时,位于内部的空气可以逃出;在另一个示例中,粘接层也可以是例如双面胶等固体胶。In this application, the wafer-level lens assembly 111 further includes an adhesive layer, which can be disposed between adjacent wafer-level lenses 1111 for fixing the adjacent wafer-level lenses 1111; the adhesive layer It can also be disposed between the adjacent wafer-level lenses 1111 and the spacers 1113 for fixing the adjacent wafer-level lenses 1111 and the spacers 1113; the adhesive layer can also be disposed between the adjacent wafer-level lenses 1111 and the spacers 1113. between the lens 1111 and the support 112 for fixing the adjacent wafer-level lens 1111 and the support 112; an adhesive layer can also be provided between the adjacent wafer-level lens 1111 and the light shielding part 113 for fixing The adjacent wafer level lens 1111 and the light shielding part 113 are fixed. It should be noted that the materials of the adhesive layers disposed at different positions may be the same or different, depending on the adhesion requirements, and the present application is not limited thereto. In one example, the adhesive layer may be glue. When setting the adhesive layer, the glue may be applied continuously or at dot-like intervals, so that at least two wafer-level lenses 1111 and spacer layers 2112 are formed. When fixed, the air located inside can escape; in another example, the adhesive layer can also be a solid glue such as double-sided tape.
在本申请中,晶圆级透镜1111包括一透光基板11111和至少一透镜单元11112,至少一透镜单元11112被设置于透光基板11111的一侧或两侧,至少一透镜单元11112可以会聚或者发散光线,至少一透镜单元11112可以通过例如粘接、嵌件注塑、一体成型等方式固定于透光基板11111的一侧或两侧。在本申请的一个实施例中,其中一晶圆级透镜1111包括一透光基板11111和被设置于透光基板11111物侧或者像侧的一透镜单元11112,换言之,该晶圆级透镜1111的一侧为平面面型,而该晶圆级透镜1111的另一侧为曲面面型;在本申请的另一个实施例中,其中一晶圆级透镜1111包括一透光基板11111和被设置于透光基板11111的物侧以及像侧的二透镜单元11112,该晶圆级透镜1111的两侧均为曲面面型。在本申请中,曲面面 型可以是球面、非球面或者自由曲面等形状。In this application, the wafer-level lens 1111 includes a light-transmitting substrate 11111 and at least one lens unit 11112. The at least one lens unit 11112 is disposed on one or both sides of the light-transmitting substrate 11111. The at least one lens unit 11112 can focus or To diffuse light, at least one lens unit 11112 can be fixed on one or both sides of the light-transmitting substrate 11111 through methods such as bonding, insert injection molding, and integral molding. In one embodiment of the present application, a wafer-level lens 1111 includes a light-transmitting substrate 11111 and a lens unit 11112 disposed on the object side or image side of the light-transmitting substrate 11111. In other words, the wafer-level lens 1111 One side of the wafer-level lens 1111 is a flat surface, and the other side of the wafer-level lens 1111 is a curved surface. In another embodiment of the present application, a wafer-level lens 1111 includes a light-transmissive substrate 11111 and is disposed on The two lens units 11112 on the object side and image side of the light-transmitting substrate 11111 have curved surfaces on both sides of the wafer-level lens 1111. In this application, the curved surface The shape can be spherical, aspherical or free-form.
在本申请中,晶圆级镜头11(wafer level optics)是通过分割镜头拼板21而成的,镜头拼板21包括多个相连的晶圆级镜头11,通过分割镜头拼板21的方式可以大量、低成本的制造晶圆级镜头11,获得的晶圆级镜头11还具有相对较小的尺寸。In this application, the wafer level lens 11 (wafer level optics) is formed by dividing the lens panel 21. The lens panel 21 includes a plurality of connected wafer level lenses 11. By dividing the lens panel 21, the lens panel 21 can be The wafer-level lens 11 is manufactured in large quantities and at low cost, and the obtained wafer-level lens 11 also has a relatively small size.
进一步地,提供一种镜头拼板21的制造方法,参照图2A和图2B所示,镜头拼板21的制造方法包括以下步骤S110-S130:Further, a method of manufacturing the lens panel 21 is provided. Referring to FIGS. 2A and 2B , the manufacturing method of the lens panel 21 includes the following steps S110-S130:
步骤S110,提供至少二透镜拼板2111。如图3至图4C所示,该透镜拼板2111包括一基板层21111和被设置于该基板层21111的一侧或两侧的多个透镜单元11112,多个透镜单元11112阵列的分布于基板层21111,每个透镜单元11112具有一垂直于基板层21111的光轴。Step S110: Provide at least two lens panels 2111. As shown in FIGS. 3 to 4C , the lens panel 2111 includes a substrate layer 21111 and a plurality of lens units 11112 disposed on one side or both sides of the substrate layer 21111 . The plurality of lens units 11112 are arrayed on the substrate. Layer 21111, each lens unit 11112 has an optical axis perpendicular to the substrate layer 21111.
步骤S120,沿高度方向对齐至少二透镜拼板2111。如图2A所示,通过使相邻的透镜拼板2111上的透镜单元11112的光轴重叠,沿高度方向对齐至少二透镜拼板2111,其中,高度方向是指垂直于透镜拼板2111(或者基板层21111)的方向。Step S120: Align at least two lens panels 2111 along the height direction. As shown in FIG. 2A , by overlapping the optical axes of the lens units 11112 on adjacent lens panels 2111 , at least two lens panels 2111 are aligned along the height direction, where the height direction refers to perpendicular to the lens panels 2111 (or The direction of the substrate layer 21111).
步骤S130,连接至少二透镜拼板2111,形成镜头拼板21。通过设置粘接层直接或者间接地使对齐的至少二透镜拼板2111按照预定的位置固定,形成镜头拼板21,镜头拼板21包括多个呈阵列分布的晶圆级镜头11。Step S130: Connect at least two lens panels 2111 to form the lens panel 21. By providing an adhesive layer, at least two aligned lens panels 2111 are fixed in a predetermined position directly or indirectly to form a lens panel 21 , which includes a plurality of wafer-level lenses 11 distributed in an array.
在本申请的一个实施例中,镜头拼板21的制造方法的步骤S110可以包括:In one embodiment of the present application, step S110 of the manufacturing method of the lens panel 21 may include:
步骤S111,提供至少一间隔层2112,间隔层2112被设置于相邻的透镜拼板2111之间。间隔层2112用于调整相邻的透镜拼板2111组之间的间距,间隔层2112具有多个与相邻的透镜拼板2111的透镜单元11112相对应的通光孔,从而光线从间隔层2112的多个通光孔通过,且间隔层2112与透镜拼板2111之间不会发生干涉。在本申请的一个具体示例中,间隔层2112优选使用不透光材料,以减小杂光进入晶圆级镜头11。In step S111, at least one spacer layer 2112 is provided, and the spacer layer 2112 is disposed between adjacent lens panels 2111. The spacing layer 2112 is used to adjust the spacing between adjacent groups of lens panels 2111. The spacing layer 2112 has a plurality of light holes corresponding to the lens units 11112 of the adjacent lens panels 2111, so that light passes through the spacing layer 2112. The multiple light holes pass through, and there is no interference between the spacer layer 2112 and the lens panel 2111. In a specific example of this application, the spacer layer 2112 preferably uses an opaque material to reduce stray light from entering the wafer-level lens 11 .
步骤S112,提供一支撑层212,支撑层212被设置于至少二透镜拼板2111的像侧。支撑层212用于支撑至少二透镜拼板2111,支撑层212具有多个与相邻的透镜拼板2111的透镜单元11112相对应的通光孔,从而光线从支撑层212的多个通光孔通过,且支撑层212与透镜拼板2111之间不会发生干涉。在本申请的一个具体示例中,支撑层212优选使用不透光材料,以减小杂光进入晶圆级镜头11。In step S112, a support layer 212 is provided, and the support layer 212 is disposed on the image side of at least two lens panels 2111. The support layer 212 is used to support at least two lens panels 2111. The support layer 212 has a plurality of light holes corresponding to the lens units 11112 of the adjacent lens panels 2111, so that light passes through the multiple light holes of the support layer 212. through, and there will be no interference between the support layer 212 and the lens panel 2111. In a specific example of this application, the support layer 212 preferably uses an opaque material to reduce stray light from entering the wafer-level lens 11 .
步骤S113,提供一遮光层213,遮光层213被设置于至少二透镜拼板2111的物侧。遮光层213采用不透光材料,其用于减少从光线入射方向进入的杂光。遮光层213具有多个与相邻的透镜拼板2111的透镜单元11112相对应的通光孔,从而光线从遮光层213的多个通光孔通过,且遮光层213与透镜拼板2111之间不会发生干涉。在本申请的一个实施例中,遮光层213可以是以丝印、涂墨或者涂胶的方式预先形成于至少二透镜拼板2111中最靠近物侧的透镜拼板2111的像侧面上;在本申请的另一个实施方式中,遮光层213也可以是先预制成型,而后被设置于至少二透镜拼板2111的物侧。In step S113, a light-shielding layer 213 is provided, and the light-shielding layer 213 is disposed on the object side of at least two lens panels 2111. The light-shielding layer 213 is made of an opaque material, which is used to reduce stray light entering from the light incident direction. The light shielding layer 213 has a plurality of light holes corresponding to the lens units 11112 of the adjacent lens panels 2111, so that light passes through the multiple light holes of the light shielding layer 213, and there is a gap between the light shielding layer 213 and the lens panel 2111. No interference will occur. In one embodiment of the present application, the light-shielding layer 213 may be pre-formed on the image side of the lens panel 2111 closest to the object side of at least two lens panels 2111 by silk screen printing, ink coating, or glue coating; in this application, In another embodiment of the application, the light-shielding layer 213 may also be pre-formed and then disposed on the object side of at least two lens panels 2111.
需要注意的是,步骤S111、步骤S112、步骤S113之间并无先后顺序,也没有相互关联,即最终形成的镜头拼板21可以仅包括间隔层2112、支撑层212、遮光层213中的一个或者两个,也可以同时包括间隔层2112、支撑层212和遮光层213。It should be noted that there is no order or correlation between steps S111, S112 and S113, that is, the final lens panel 21 may only include one of the spacer layer 2112, the support layer 212, and the light shielding layer 213. Or two, or may include a spacer layer 2112, a support layer 212 and a light-shielding layer 213 at the same time.
在本申请的一个实施例中,当步骤S110包括步骤S111时,镜头拼板21的制造方法的步骤S120可以包括:In one embodiment of the present application, when step S110 includes step S111, step S120 of the manufacturing method of the lens panel 21 may include:
步骤S121,使间隔层2112沿高度方向与相邻的透镜拼板2111对齐。对齐间隔层2112和相邻的透镜拼板2111,使间隔层2112的多个通光孔可以与相邻透镜拼板2111上的透镜单元11112相对,进而防止 间隔层2112与相邻透镜拼板2111上的透镜单元11112之间发生干涉或者导致成像受影响。Step S121, align the spacer layer 2112 with the adjacent lens panel 2111 along the height direction. Align the spacer layer 2112 and the adjacent lens panel 2111 so that the multiple light holes of the spacer layer 2112 can face the lens units 11112 on the adjacent lens panel 2111, thereby preventing Interference occurs between the spacer layer 2112 and the lens units 11112 on the adjacent lens panel 2111, or the imaging is affected.
在本申请的一个实施例中,当步骤S110包括步骤S112,镜头拼板21的制造方法的步骤S120可以包括:In one embodiment of the present application, when step S110 includes step S112, step S120 of the manufacturing method of the lens panel 21 may include:
步骤S122,使支撑层212沿高度方向与相邻的透镜拼板2111对齐。对齐支撑层212和相邻的透镜拼板2111,使支撑层212的多个通光孔可以与相邻透镜拼板2111上的透镜单元11112相对,进而防止支撑层212与相邻透镜拼板2111上的透镜单元11112之间发生干涉或者导致成像受影响。Step S122, align the support layer 212 with the adjacent lens panel 2111 along the height direction. Align the support layer 212 and the adjacent lens panel 2111 so that the multiple light holes of the support layer 212 can face the lens units 11112 on the adjacent lens panel 2111, thereby preventing the support layer 212 from interfacing with the adjacent lens panel 2111. Interference occurs between the lens units 11112 on the camera or the imaging is affected.
在本申请的一个实施例中,当步骤S110包括步骤S113,镜头拼板21的制造方法的步骤S120可以包括:In one embodiment of the present application, when step S110 includes step S113, step S120 of the manufacturing method of the lens panel 21 may include:
步骤S123,使遮光层213沿高度方向与相邻的透镜拼板2111对齐。对齐遮光层213和相邻的透镜拼板2111,使遮光层213的多个通光孔可以与相邻透镜拼板2111上的透镜单元11112相对,进而防止遮光层213与相邻透镜拼板2111上的透镜单元11112之间发生干涉或者导致成像受影响。Step S123, align the light shielding layer 213 with the adjacent lens panel 2111 along the height direction. Align the light shielding layer 213 and the adjacent lens panel 2111 so that the multiple light holes of the light shielding layer 213 can face the lens units 11112 on the adjacent lens panel 2111, thereby preventing the light shielding layer 213 from interfacing with the adjacent lens panel 2111. Interference occurs between the lens units 11112 on the camera or the imaging is affected.
在本申请的一个实施例中,在镜头拼板21的制造方法的步骤S130中,当镜头拼板21包括间隔层2112、支撑层212、遮光层213中的一个、两个或者全部时,步骤S130可以包括:In one embodiment of the present application, in step S130 of the manufacturing method of the lens panel 21, when the lens panel 21 includes one, two or all of the spacer layer 2112, the support layer 212, and the light shielding layer 213, step S130 can include:
步骤S131,使间隔层2112、支撑层212或者遮光层213与相邻的透镜拼板2111连接。换言之,使至少二透镜拼板2111与间隔层2112、支撑层212、遮光层213三者中的一个、两个或者全部依次叠加固定,例如可以通过设置粘接层固定上述相邻的部件。Step S131, connect the spacer layer 2112, the support layer 212 or the light-shielding layer 213 to the adjacent lens panel 2111. In other words, at least two lens panels 2111 and one, two or all of the spacer layer 2112, the support layer 212 and the light shielding layer 213 are sequentially superimposed and fixed. For example, the above adjacent components can be fixed by providing an adhesive layer.
在一个具体实施例中,通过步骤S110-S130,得到的镜头拼板21包括透镜组件拼板211、支撑层212和遮光层213,透镜组件拼板211包括至少一透镜拼板2111,支撑层212和遮光层213分别被固定于透镜拼板2111的像侧和物侧。透镜组件拼板211还可以包括至少一间隔层2112,至少一间隔层2112被设置于相邻的透镜拼板2111之间并可以通过在间隔层2112和透镜拼板2111之间设置粘接层固定在透镜拼板2111上。In a specific embodiment, through steps S110-S130, the obtained lens panel 21 includes a lens assembly panel 211, a support layer 212 and a light shielding layer 213. The lens assembly panel 211 includes at least one lens panel 2111. The support layer 212 The light shielding layer 213 and the light shielding layer 213 are respectively fixed on the image side and the object side of the lens panel 2111 . The lens assembly panel 211 may also include at least one spacer layer 2112. The at least one spacer layer 2112 is disposed between adjacent lens panel panels 2111 and may be fixed by providing an adhesive layer between the spacer layer 2112 and the lens panel 2111. On the lens panel 2111.
更进一步地,提供一种晶圆级镜头11的制造方法,参照图2B所示,晶圆级镜头11的制造方法包括以下步骤S210-220:Furthermore, a manufacturing method of the wafer-level lens 11 is provided. Referring to FIG. 2B , the manufacturing method of the wafer-level lens 11 includes the following steps S210-220:
步骤S210,提供一镜头拼板21。Step S210: Provide a lens panel 21.
步骤S220,分割镜头拼板21,获得多个晶圆级镜头11。如图2B所示,实线为分割线,分割后可以得到多个独立的晶圆级镜头11,其中,两根实线中间表示要去除的部分。Step S220: Divide the lens panel 21 to obtain multiple wafer-level lenses 11. As shown in FIG. 2B , the solid lines are division lines. After division, multiple independent wafer-level lenses 11 can be obtained. The middle of the two solid lines indicates the part to be removed.
在本申请的一个实施例中,镜头拼板21可以通过镜头拼板21的制造方法的步骤S110-S130获得。In one embodiment of the present application, the lens panel 21 can be obtained through steps S110-S130 of the manufacturing method of the lens panel 21.
在本申请的一个实施例中,在步骤S220中,可以通过锯切、激光切割、激光磨削、水冲切割、铣切、微机械加工、微切片、冲孔切割等方式中的至少一种分割镜头拼板21,从而获取晶圆级镜头11。In one embodiment of the present application, in step S220, at least one of sawing, laser cutting, laser grinding, water punch cutting, milling, micromachining, micro slicing, punching and cutting can be used. The lens panel 21 is divided to obtain the wafer-level lens 11 .
在本申请中,分割镜头拼板21后,透镜组件拼板211被分割形成多个晶圆级透镜组件111,其中,透镜拼板2111被分割形成多个晶圆级透镜1111,透镜拼板2111中的基板层21111被分割成多个透光基板11111,间隔层2112被分割形成多个间隔件1113;支撑层212被分割形成多个支撑件112;遮光层213被分割形成多个遮光部113。分割后的晶圆级镜头11具有长方体轮廓,这样使得分割的难度降低,在本申请的其他示例中晶圆级镜头11的轮廓还可以有其他形状,例如六棱柱形状、圆柱体形状、切割圆柱形状等形状,其中切割圆柱形状是指圆柱的侧面被切割至少一部分的形状。In this application, after the lens panel 21 is divided, the lens assembly panel 211 is divided to form a plurality of wafer-level lens assemblies 111, wherein the lens panel 2111 is divided to form a plurality of wafer-level lenses 1111. The lens panel 2111 The substrate layer 21111 is divided into a plurality of light-transmitting substrates 11111, the spacer layer 2112 is divided into a plurality of spacers 1113; the support layer 212 is divided into a plurality of support members 112; the light-shielding layer 213 is divided into a plurality of light-shielding parts 113 . The segmented wafer-level lens 11 has a rectangular parallelepiped outline, which reduces the difficulty of segmentation. In other examples of this application, the outline of the wafer-level lens 11 can also have other shapes, such as a hexagonal prism shape, a cylinder shape, and a cutting cylinder. Shape and other shapes, where a cut cylindrical shape refers to a shape in which at least part of the side of the cylinder is cut.
如图3至图4C所示,进一步提供一种透镜拼板2111的制造方法,透镜拼板2111的制造方法包括以下步骤S310-S320: As shown in Figures 3 to 4C, a method of manufacturing the lens panel 2111 is further provided. The manufacturing method of the lens panel 2111 includes the following steps S310-S320:
步骤S310,提供一基板层21111。Step S310: Provide a substrate layer 21111.
步骤S320,在基板层21111的一侧或者两侧形成多个透镜单元11112。其中,多个透镜单元11112呈阵列排布,从而便于后续的切割,透镜单元11112采用透光材料,例如树脂材料。In step S320, multiple lens units 11112 are formed on one side or both sides of the substrate layer 21111. The plurality of lens units 11112 are arranged in an array to facilitate subsequent cutting. The lens units 11112 are made of light-transmitting material, such as resin material.
透镜拼板2111包括基板层21111和形成于基板层21111的至少一侧的多个透镜单元11112,在本申请中,透镜拼板2111可以采用多种制造方式,图4A至图4C示出了本申请的三种透镜拼板2111。The lens panel 2111 includes a substrate layer 21111 and a plurality of lens units 11112 formed on at least one side of the substrate layer 21111. In this application, the lens panel 2111 can be manufactured in a variety of ways. Figures 4A to 4C illustrate this invention. Application for three lens panels 2111.
图4A示出了本申请透镜拼板2111的第一实施例,参照图4A,步骤S310所提供的基板层21111呈平板状,在步骤S320中,在基板层21111的两侧分别形成多个透镜单元11112,其中,基板层21111两侧的多个透镜单元11112的光轴重叠。需要注意的是,在本实施例中,基板层21111采用例如玻璃材料或者树脂材料等适于透过可见光的透光材料。Figure 4A shows the first embodiment of the lens panel 2111 of the present application. Referring to Figure 4A, the substrate layer 21111 provided in step S310 is flat-shaped. In step S320, multiple lenses are formed on both sides of the substrate layer 21111. Unit 11112, wherein the optical axes of the plurality of lens units 11112 on both sides of the substrate layer 21111 overlap. It should be noted that in this embodiment, the substrate layer 21111 is made of a light-transmitting material suitable for transmitting visible light, such as glass material or resin material.
图4B示出了本申请透镜拼板2111的第二实施例,参照图4B,步骤S310所提供的基板层21111呈平板状,在步骤S320中,在基板层21111的一侧形成多个透镜单元11112。需要注意的是,在本实施例中,基板层21111采用采用例如玻璃材料或者树脂材料等适于透过可见光的透光材料。Figure 4B shows the second embodiment of the lens panel 2111 of the present application. Referring to Figure 4B, the substrate layer 21111 provided in step S310 is flat-shaped. In step S320, multiple lens units are formed on one side of the substrate layer 21111. 11112. It should be noted that in this embodiment, the substrate layer 21111 is made of a light-transmitting material suitable for transmitting visible light, such as glass material or resin material.
在透镜拼板2111的第一实施例和第二实施例中,多个透镜单元11112可以通过粘接或者嵌件成型(InsertMolding)的方式被设置于基板层21111的一侧或者两侧。具体地,在一个示例中,可以预制成型多个透镜单元11112,而后通过光学胶将多个透镜单元11112粘接在基板层21111的一侧或者两侧;在另一个示例中,将基板层21111设置于一透镜成型模具的成型腔中,从透镜成型模具的注入口注入液态透镜材料(例如树脂),使成型腔内部充满透镜材料,固化透镜材料,使基板层21111的一侧或者两侧(这里一侧或者两侧是指基板层21111的上表面侧和/或下表面侧,下文不再赘述)形成多个透镜单元11112,进而得到透镜拼板2111,In the first and second embodiments of the lens panel 2111, the plurality of lens units 11112 can be disposed on one side or both sides of the substrate layer 21111 through bonding or insert molding. Specifically, in one example, multiple lens units 11112 can be preformed, and then the multiple lens units 11112 can be bonded to one side or both sides of the substrate layer 21111 through optical glue; in another example, the substrate layer 21111 It is arranged in the molding cavity of a lens molding mold, injects liquid lens material (such as resin) from the injection port of the lens molding mold, so that the interior of the molding cavity is filled with lens material, solidifies the lens material, and makes one or both sides of the substrate layer 21111 ( Here one side or both sides refers to the upper surface side and/or the lower surface side of the substrate layer 21111 (which will not be described in detail below) to form a plurality of lens units 11112, thereby obtaining a lens panel 2111,
图4C示出了本申请透镜拼板2111的第三实施例,参照图4C,步骤S310所提供的基板层21111呈平板状,基板层21111具有多个通孔,在步骤S320中,在基板层21111的两侧分别形成多个透镜单元11112,其中,基板层21111两侧的多个透镜单元11112的光轴重叠,相对的两个透镜单元11112穿过基板层21111的通孔相连。需要注意的是,在本实施例中,基板层21111可以采用例如玻璃材料或者树脂材料等适于透过可见光的透光材料;也可以使用不透光的材料,从而有利于降低杂光。在本实施方式中,多个透镜单元11112可以通过嵌件成型的方式被设置于基板层21111的两侧。Figure 4C shows the third embodiment of the lens panel 2111 of the present application. Referring to Figure 4C, the substrate layer 21111 provided in step S310 is flat, and the substrate layer 21111 has a plurality of through holes. In step S320, in the substrate layer A plurality of lens units 11112 are formed on both sides of the substrate layer 21111. The optical axes of the multiple lens units 11112 on both sides of the substrate layer 21111 overlap, and the two opposite lens units 11112 are connected through the through holes of the substrate layer 21111. It should be noted that in this embodiment, the substrate layer 21111 can be made of a light-transmitting material suitable for transmitting visible light, such as a glass material or a resin material; an opaque material can also be used, which is beneficial to reducing stray light. In this embodiment, the plurality of lens units 11112 may be disposed on both sides of the substrate layer 21111 through insert molding.
图5A示出了本申请采用图4A所述透镜拼板2111制成的晶圆级镜头11,其中,晶圆级透镜1111包括透光基板11111和形成于透光基板11111的两侧的透镜单元11112。Figure 5A shows the wafer-level lens 11 made by the present application using the lens panel 2111 described in Figure 4A. The wafer-level lens 1111 includes a light-transmitting substrate 11111 and lens units formed on both sides of the light-transmitting substrate 11111. 11112.
进一步参照图4D和图5B,图4D示出本申请透镜拼板2111的第四实施例,形成于基板层21111的一侧或者两侧的透镜单元11112包括成像部分111121和结构部分111122,透镜单元11112的成像部分111121适于折射入射光线,透镜单元11112的结构部分111122适于支撑透镜拼板2111或者调整相邻透镜拼板2111之间的距离。在本申请的一些实施例中,透镜单元11112的结构部分111122可以替代间隔件1113或者支撑件112的作用,从而简化制造的过程。Referring further to FIG. 4D and FIG. 5B, FIG. 4D shows the fourth embodiment of the lens panel 2111 of the present application. The lens unit 11112 formed on one side or both sides of the substrate layer 21111 includes an imaging part 111121 and a structural part 111122. The lens unit The imaging part 111121 of 11112 is adapted to refract incident light, and the structural part 111122 of the lens unit 11112 is adapted to support the lens panel 2111 or adjust the distance between adjacent lens panels 2111. In some embodiments of the present application, the structural part 111122 of the lens unit 11112 can replace the function of the spacer 1113 or the support 112, thereby simplifying the manufacturing process.
图5B示出了本申请的晶圆级镜头11的另一实施例,如图5B所示,晶圆级镜头11包括第一晶圆级透镜1114、第二晶圆级透镜1115和第三晶圆级透镜1116,其中,位于第一晶圆级透镜1114、第二晶圆级透镜1115和第三晶圆级透镜1116的像侧的透镜单元11112包括成像部分111121和结构部分111122,第一晶圆级透镜1114通过结构部分111122固定于第二晶圆级透镜1115的像侧,第二晶圆级透镜1115通过结构部分111122固定于第三晶圆级透镜1116的像侧,通过第一晶圆级透镜1114和第二晶圆级透镜1115的结构部分111122分别调整相邻晶圆级透镜1111之间的距离,通过第三晶圆级透镜1116的结构部分111122支撑晶圆级镜头11。晶圆级镜头11还包括一设置于第一晶圆级透镜1114物侧的遮光部113,遮光部113固定 于第一晶圆级透镜1114的物侧。Figure 5B shows another embodiment of the wafer-level lens 11 of the present application. As shown in Figure 5B, the wafer-level lens 11 includes a first wafer-level lens 1114, a second wafer-level lens 1115 and a third wafer-level lens 1115. Circle-level lens 1116, wherein the lens unit 11112 located on the image side of the first wafer-level lens 1114, the second wafer-level lens 1115 and the third wafer-level lens 1116 includes an imaging part 111121 and a structural part 111122. The first crystal The round-level lens 1114 is fixed on the image side of the second wafer-level lens 1115 through the structural part 111122, and the second wafer-level lens 1115 is fixed on the image side of the third wafer-level lens 1116 through the structural part 111122, and passes through the first wafer. The structural parts 111122 of the first-level lens 1114 and the second wafer-level lens 1115 respectively adjust the distance between adjacent wafer-level lenses 1111, and the wafer-level lens 11 is supported by the structural part 111122 of the third wafer-level lens 1116. The wafer-level lens 11 also includes a light-shielding portion 113 disposed on the object side of the first wafer-level lens 1114. The light-shielding portion 113 is fixed. On the object side of the first wafer level lens 1114 .
进一步地,提供本申请一摄像模组10的第一实施例,如图6A至6D所示,该摄像模组10包括一晶圆级镜头11、一封装体12以及一感光组件13,该晶圆级镜头11被设置于感光组件13的感光路径上,该封装体12被设置于晶圆级镜头11的周侧。Further, a first embodiment of a camera module 10 of the present application is provided. As shown in FIGS. 6A to 6D , the camera module 10 includes a wafer-level lens 11 , a package 12 and a photosensitive component 13 . The round-level lens 11 is disposed on the photosensitive path of the photosensitive component 13 , and the package 12 is disposed on the peripheral side of the wafer-level lens 11 .
感光组件13用于将晶圆级镜头11会聚的被摄物的光信号转变为电信号,感光组件13具有正面和背面,其中感光组件13的正面朝向晶圆级镜头11,感光组件13的背面与感光组件13的正面相对,晶圆级镜头11被固定于感光组件13的正面。在本申请的一具体示例中,晶圆级镜头11通过支撑件112粘接于感光组件13的正面,晶圆级透镜组件111在支撑件112的作用下被安装于感光组件13的正面。The photosensitive component 13 is used to convert the optical signal of the subject converged by the wafer-level lens 11 into an electrical signal. The photosensitive component 13 has a front and a back, wherein the front of the photosensitive component 13 faces the wafer-level lens 11 and the back of the photosensitive component 13 Opposite to the front of the photosensitive component 13 , the wafer-level lens 11 is fixed on the front of the photosensitive component 13 . In a specific example of this application, the wafer-level lens 11 is bonded to the front of the photosensitive component 13 through the support 112 , and the wafer-level lens component 111 is installed on the front of the photosensitive component 13 under the action of the support 112 .
具体地,如图6A至6C所示,在本申请的一个实施例中,感光组件13包括一感光芯片131及一被设置于感光芯片131的电连接部133,其中,电连接部133上可集成有其他功能元件用以进一步处理感光芯片131转变的电信号。Specifically, as shown in FIGS. 6A to 6C , in one embodiment of the present application, the photosensitive component 13 includes a photosensitive chip 131 and an electrical connection portion 133 provided on the photosensitive chip 131 , wherein the electrical connection portion 133 can be Other functional components are integrated to further process the electrical signals converted by the photosensitive chip 131 .
感光芯片131具有朝向于晶圆级镜头11的正面和与正面相对的背面。感光芯片131的正面包括一感光区和一非感光区,非感光区环绕于感光区的外围,感光区用于进行感光作用。The photosensitive chip 131 has a front surface facing the wafer-level lens 11 and a back surface opposite to the front surface. The front side of the photosensitive chip 131 includes a photosensitive area and a non-photosensitive area. The non-photosensitive area surrounds the photosensitive area, and the photosensitive area is used for photosensitivity.
在本申请一具体示例中,电连接部133被设置于感光芯片131的背面,其中,电连接部133被实施为多个焊球,多个焊球可用焊料凸块、焊料垫或其它电连接元件替代;在本申请另一具体示例中,电连接部133被设置于感光芯片131的正面的非感光区,如图11A至图11C所示,其中,电连接部133被实施为多个焊盘,多个焊盘可用焊料凸块、焊料垫或其它电连接元件替代。In a specific example of this application, the electrical connection portion 133 is provided on the back side of the photosensitive chip 131 , wherein the electrical connection portion 133 is implemented as a plurality of solder balls, and the plurality of solder balls can be connected electrically by solder bumps, solder pads, or other methods. Component replacement; in another specific example of the present application, the electrical connection portion 133 is provided in the non-photosensitive area on the front side of the photosensitive chip 131, as shown in FIGS. 11A to 11C , in which the electrical connection portion 133 is implemented as a plurality of solder joints. pads, multiple pads may be replaced with solder bumps, solder pads, or other electrical connection components.
更具体地,在本申请的一个实施例中,感光芯片131采用晶圆级CSP(Chip Scale Package)封装,也被称为晶圆级芯片。感光组件13进一步包括一保护盖板132,该保护盖板132被盖设于感光芯片131上方,用于保护感光芯片131。在本申请一具体示例中,保护盖板132可以为玻璃材质,保护盖板132被采用粘接等方式固定于感光芯片131的正面的非感光区。即晶圆级CSP封装的感光芯片131被设置于保护盖板132与电连接部133之间,保护盖板132与电连接部133被相对地设置于感光芯片131的两侧。在本申请的一个实施例中,晶圆级镜头11的外侧面与保护盖板132的外侧面齐平。More specifically, in one embodiment of the present application, the photosensitive chip 131 is packaged in a wafer-level CSP (Chip Scale Package), also known as a wafer-level chip. The photosensitive component 13 further includes a protective cover 132 , which is disposed above the photosensitive chip 131 to protect the photosensitive chip 131 . In a specific example of this application, the protective cover 132 may be made of glass, and the protective cover 132 is fixed to the non-photosensitive area on the front side of the photosensitive chip 131 by adhesion or other means. That is, the wafer-level CSP packaged photosensitive chip 131 is disposed between the protective cover 132 and the electrical connection portion 133 , and the protective cover 132 and the electrical connection portion 133 are disposed oppositely on both sides of the photosensitive chip 131 . In one embodiment of the present application, the outer side of the wafer-level lens 11 is flush with the outer side of the protective cover 132 .
晶圆级CSP封装的感光芯片131采用底面直接引出电连接部133的方式,感光芯片131直接通过底面的电连接部133电连接于外部电子设备的主板,可以有效缩短信号的传导距离,而减小衰减,且使感光芯片131的抗干扰、抗噪性能也能得到提升,亦减小感光组件13的横向尺寸,使得感光组件13的结构更加紧凑。The photosensitive chip 131 in the wafer-level CSP package adopts the method of directly leading out the electrical connection portion 133 on the bottom surface. The photosensitive chip 131 is directly electrically connected to the motherboard of the external electronic device through the electrical connection portion 133 on the bottom surface, which can effectively shorten the signal transmission distance and reduce the cost. Small attenuation, the anti-interference and anti-noise performance of the photosensitive chip 131 can also be improved, and the lateral size of the photosensitive component 13 can also be reduced, making the structure of the photosensitive component 13 more compact.
如图6B所示,在本申请的一个实施例中,该摄像模组10进一步包括一滤光元件14,滤光元件14具有红外截止功能,其用于对进入感光芯片131的入射光线进行过滤,滤除入射光线中例如红外光线等成像不需要的杂光。在本申请的一具体示例中,滤光元件14被设置于保护盖板132的上方,使得滤光元件14位于感光芯片131的感光路径上,滤光元件14被设置于晶圆级镜头11和感光组件13之间,即沿高度方向感光组件13依次包括滤光元件14、保护盖板132、感光芯片131、电连接部133。As shown in Figure 6B, in one embodiment of the present application, the camera module 10 further includes a filter element 14. The filter element 14 has an infrared cutoff function and is used to filter the incident light entering the photosensitive chip 131. , filtering out stray light such as infrared light that is not needed for imaging in the incident light. In a specific example of this application, the filter element 14 is disposed above the protective cover 132 so that the filter element 14 is located on the photosensitive path of the photosensitive chip 131 , and the filter element 14 is disposed on the wafer-level lens 11 and Between the photosensitive components 13 , that is, along the height direction, the photosensitive component 13 includes a filter element 14 , a protective cover 132 , a photosensitive chip 131 , and an electrical connection part 133 in sequence.
而在图6A所示意的实施例中,摄像模组10不具有图6B所示出的滤光元件14,为使图6A所示意的摄像模组10具有红外截止功能,在一个具体示例中,保护盖板132具有红外截止功能,即将保护盖板132作为滤光元件,从而使得保护盖板132可以对于进入感光芯片131的成像光线进行过滤,这种设置方式免去了单独设置滤光元件,一方面可以降低摄像模组10的成本,另一方面可以降低摄像模组10的整体高度。保护盖板132的红外截止功能可以通过例如保护盖板132材料本身具有吸收红外线的功能或者保护盖板132的表面镀有红外截止膜实现。换言之,也可以认为图6A所示出的实施例中,使用滤光元件作为保护盖板132,使滤光元件和保护盖板132合二为一。 In the embodiment shown in FIG. 6A , the camera module 10 does not have the filter element 14 shown in FIG. 6B . In order to make the camera module 10 shown in FIG. 6A have an infrared cutoff function, in a specific example, The protective cover 132 has an infrared cutoff function, that is, the protective cover 132 is used as a filter element, so that the protective cover 132 can filter the imaging light entering the photosensitive chip 131. This arrangement method eliminates the need to set up a separate filter element. On the one hand, the cost of the camera module 10 can be reduced, and on the other hand, the overall height of the camera module 10 can be reduced. The infrared cutoff function of the protective cover 132 can be achieved by, for example, the material of the protective cover 132 itself having the function of absorbing infrared rays or the surface of the protective cover 132 being coated with an infrared cutoff film. In other words, it can also be considered that in the embodiment shown in FIG. 6A , the filter element is used as the protective cover 132 , so that the filter element and the protective cover 132 are combined into one.
在另一个具体示例中,晶圆级镜头11具有红外截止功能,具体地,晶圆级镜头11的其中一晶圆级透镜1111的透光基板11111具有红外截止功能,从而使得晶圆级镜头11具有红外截止功能,从而对于进入感光芯片131的成像光线进行过滤。透光基板11111的红外截止功能可以通过例如透光基板11111材料本身具有吸收红外线的功能或者透光基板11111的表面镀有红外截止膜实现。这种设置方式免去了单独设置滤光元件,一方面可以降低摄像模组10的成本,另一方面可以降低摄像模组10的整体高度。In another specific example, the wafer-level lens 11 has an infrared cutoff function. Specifically, the light-transmitting substrate 11111 of one of the wafer-level lenses 1111 of the wafer-level lens 11 has an infrared cutoff function, so that the wafer-level lens 11 It has an infrared cutoff function to filter the imaging light entering the photosensitive chip 131 . The infrared cutoff function of the light-transmitting substrate 11111 can be achieved by, for example, the material of the light-transmitting substrate 11111 itself having the function of absorbing infrared rays or the surface of the light-transmitting substrate 11111 being coated with an infrared cutoff film. This arrangement method eliminates the need for separate filter elements, which can reduce the cost of the camera module 10 and reduce the overall height of the camera module 10 .
继续参照图6A至图6C,封装体12一体成型于晶圆级镜头11的周侧,在一个示例中,封装体12环绕晶圆级镜头11的周侧设置,晶圆级镜头11的周侧全部被封装体12包覆以保护晶圆级镜头11的周侧,封装体12采用不透光的材料,从而可以防止杂光入射晶圆级光学镜头。Continuing to refer to FIGS. 6A to 6C , the package 12 is integrally formed on the peripheral side of the wafer-level lens 11 . In one example, the package 12 is arranged around the peripheral side of the wafer-level lens 11 . The entire package is covered by a package 12 to protect the peripheral side of the wafer-level lens 11. The package 12 is made of an opaque material, thereby preventing stray light from entering the wafer-level optical lens.
进一步地,封装体12向像侧(向下)延伸,进一步包覆保护盖板132的周侧,封装体12一体成型于晶圆级镜头11和保护盖板132的周侧,使晶圆级镜头11和保护盖板132的周侧全部被封装体12包覆,这样可以保护晶圆级镜头11和保护盖板132的周侧。在本实施例中,保护盖板132的横向尺寸小于感光芯片131的横向尺寸,使感光芯片131的正面的至少一部分露出,从而封装体12一体成型于感光芯片131的正面的至少一部分,封装体12包覆感光芯片131的正面的至少一部分,具体地,感光芯片131正面的外侧环形区域1311未被保护盖板132遮盖,从而封装体12一体成型于晶圆级镜头11的周侧和保护盖板132的周侧和感光芯片131正面的外侧环形区域1311,封装体12包覆晶圆级镜头11的周侧和保护盖板132的周侧和感光芯片131正面的外侧环形区域1311。需要说明的是,在本申请中,横向尺寸是指垂直晶圆级镜头11的光轴的方向上的尺寸;外侧环形区域1311是指感光芯片131的正面上最外侧的环形区域,其位于感光芯片131的非感光区,如图6E所示意。Further, the package 12 extends toward the image side (downward) and further covers the peripheral side of the protective cover 132. The package 12 is integrally formed on the peripheral sides of the wafer-level lens 11 and the protective cover 132, so that the wafer-level The peripheral sides of the lens 11 and the protective cover 132 are all covered by the package 12 , which can protect the wafer-level lens 11 and the peripheral sides of the protective cover 132 . In this embodiment, the lateral size of the protective cover 132 is smaller than the lateral size of the photosensitive chip 131, so that at least a part of the front surface of the photosensitive chip 131 is exposed, so that the package 12 is integrally formed on at least a part of the front surface of the photosensitive chip 131. The package body 12 covers at least part of the front surface of the photosensitive chip 131. Specifically, the outer annular area 1311 of the front surface of the photosensitive chip 131 is not covered by the protective cover 132, so that the package 12 is integrally formed on the peripheral side of the wafer-level lens 11 and the protective cover. The package 12 covers the peripheral side of the wafer-level lens 11 and the peripheral side of the protective cover 132 and the outer annular area 1311 of the front surface of the photosensitive chip 131 . It should be noted that in this application, the lateral size refers to the size in the direction perpendicular to the optical axis of the wafer-level lens 11; the outer annular area 1311 refers to the outermost annular area on the front surface of the photosensitive chip 131, which is located on the photosensitive The non-photosensitive area of the chip 131 is shown in Figure 6E.
当晶圆级镜头11进一步包括滤光元件14时,如图6B所示,封装体12一体成型于晶圆级镜头11、滤光元件14和保护盖板132的周侧,使晶圆级镜头11、滤光元件14和保护盖板132的周侧全部被封装体12包覆。在本实施例中,滤光元件14和保护盖板132的横向尺寸相同,感光芯片131的横向尺寸大于滤光元件14和保护盖板132的横向尺寸,使感光芯片131的正面的至少一部分露出,从而封装体12包覆感光芯片131的正面的一部分,具体地,感光芯片131正面的外侧环形区域1311未被保护盖板132遮盖,从而封装体12一体成型于晶圆级镜头11、滤光元件14和保护盖板132的周侧和感光芯片131正面的外侧环形区域1311,封装体12包覆晶圆级镜头11、滤光元件14和保护盖板132的周侧和感光芯片131正面的外侧环形区域1311。When the wafer-level lens 11 further includes the filter element 14, as shown in FIG. 6B, the package 12 is integrally formed around the wafer-level lens 11, the filter element 14 and the protective cover 132, so that the wafer-level lens 11. The peripheral sides of the filter element 14 and the protective cover 132 are all covered by the package 12 . In this embodiment, the lateral dimensions of the filter element 14 and the protective cover 132 are the same, and the lateral dimensions of the photosensitive chip 131 are larger than those of the filter element 14 and the protective cover 132 , so that at least part of the front surface of the photosensitive chip 131 is exposed. , so that the package body 12 covers a part of the front surface of the photosensitive chip 131. Specifically, the outer annular area 1311 of the front surface of the photosensitive chip 131 is not covered by the protective cover 132, so the package body 12 is integrally formed with the wafer-level lens 11 and the light filter. The peripheral side of the element 14 and the protective cover 132 and the outer annular area 1311 of the front surface of the photosensitive chip 131. The package 12 covers the wafer-level lens 11, the filter element 14 and the peripheral side of the protective cover 132 and the front surface of the photosensitive chip 131. Outer annular area 1311.
晶圆级CSP封装的感光芯片131可以直接通过电连接部133电连接于外部电子设备(例如手机)的主板,以实现摄像模组10的电路导通,如图6A至图6C所示。在本申请的另一个实施例中,如图6D所示,感光组件13进一步包括一线路板135,线路板135被设置于感光芯片131的背面,电连接部133电连接于线路板135,从而通过电连接部133实现感光芯片131和线路板135之间的电路导通。其中,线路板135包括线路板主体1351、连接带1352和连接板1353,感光芯片131被设置于线路板主体1351的正面并通过电连接部133电连接于线路板主体1351,连接带1352连接并电导通线路板主体1351和连接板1353,从而连接带1352将线路板主体1351从感光芯片131获取的成像信息通过该连接器向外部电子设备传输,从而晶圆级CSP封装的感光芯片131也可以通过线路板135间接地电连接于外部电子设备的主板。The wafer-level CSP packaged photosensitive chip 131 can be directly electrically connected to the motherboard of an external electronic device (such as a mobile phone) through the electrical connection portion 133 to achieve circuit conduction of the camera module 10, as shown in Figures 6A to 6C. In another embodiment of the present application, as shown in FIG. 6D , the photosensitive component 13 further includes a circuit board 135 , the circuit board 135 is disposed on the back of the photosensitive chip 131 , and the electrical connection portion 133 is electrically connected to the circuit board 135 , so that The electrical connection between the photosensitive chip 131 and the circuit board 135 is achieved through the electrical connection portion 133 . Among them, the circuit board 135 includes a circuit board main body 1351, a connecting belt 1352 and a connecting plate 1353. The photosensitive chip 131 is disposed on the front side of the circuit board main body 1351 and is electrically connected to the circuit board main body 1351 through the electrical connection part 133. The connecting belt 1352 is connected to and The circuit board main body 1351 and the connecting plate 1353 are electrically connected, so that the connecting strip 1352 transmits the imaging information obtained by the circuit board main body 1351 from the photosensitive chip 131 to the external electronic device through the connector, so that the photosensitive chip 131 packaged in the wafer level CSP can also be It is indirectly electrically connected to the motherboard of the external electronic device through the circuit board 135 .
感光组件13进一步包括电子元件,电子元件可以是电阻、电容等无源电子器件和驱动芯片、存储芯片等有源电子器件中的一种或者多种。在本申请的一具体示例中,电子元件被设置于连接带1352和/或连接板1353上,以避免占用线路板主体1351的空间,进而为安置于线路板主体1351的感光芯片131提供足够的安装位置。The photosensitive component 13 further includes electronic components, which may be one or more of passive electronic components such as resistors and capacitors, and active electronic components such as drive chips and memory chips. In a specific example of the present application, the electronic components are arranged on the connecting strip 1352 and/or the connecting plate 1353 to avoid occupying the space of the circuit board main body 1351, thereby providing sufficient space for the photosensitive chip 131 placed on the circuit board main body 1351. Installation location.
继续参照图6D,在本申请的另一具体示例中,电子元件134被设置于线路板主体1351的背面,即电子元件134与感光芯片131被设置于线路板主体1351的两侧,一方面可以避让感光芯片131的安置位 置,另一方面可以减小线路板主体1351的横向尺寸,使得摄像模组10的结构更加紧凑。其中,线路板主体1351的正面是指其面向感光芯片131或者晶圆级镜头11的一侧,线路板主体1351的背面是指其远离感光芯片131或者晶圆级镜头11的一侧,线路板主体1351的背面与正面相对。进一步地,线路板135还包括一底封装部1354,底封装部1354设置于线路板主体1351的背面,底封装部1354将设置于线路板主体1351的背面的电子元件134包覆于其内部,以使得电子元件134不会直接暴露于空气内,电子元件134不会沾染灰尘等污染物。例如,在本申请的一个实施例中,底封装部1354通过模塑工艺一体成型于线路板主体1351的背面,电子元件134被模塑于底封装部1354的内部,可以保护电子元件134。Continuing to refer to FIG. 6D , in another specific example of the present application, the electronic component 134 is disposed on the back of the circuit board body 1351 , that is, the electronic component 134 and the photosensitive chip 131 are disposed on both sides of the circuit board body 1351 . On the one hand, it can Avoid the placement of the photosensitive chip 131 On the other hand, the lateral size of the circuit board body 1351 can be reduced, making the structure of the camera module 10 more compact. Among them, the front side of the circuit board main body 1351 refers to the side facing the photosensitive chip 131 or the wafer-level lens 11, and the back side of the circuit board main body 1351 refers to the side away from the photosensitive chip 131 or the wafer-level lens 11. The circuit board The back side of the main body 1351 is opposite to the front side. Further, the circuit board 135 also includes a bottom packaging part 1354. The bottom packaging part 1354 is disposed on the back of the circuit board body 1351. The bottom packaging part 1354 encapsulates the electronic components 134 disposed on the back of the circuit board body 1351 inside it. Therefore, the electronic component 134 will not be directly exposed to the air, and the electronic component 134 will not be contaminated with dust and other pollutants. For example, in one embodiment of the present application, the bottom packaging part 1354 is integrally formed on the back of the circuit board body 1351 through a molding process, and the electronic components 134 are molded inside the bottom packaging part 1354 to protect the electronic components 134 .
在本申请中,第一实施例中的摄像模组10是通过分割模组拼板20而成的,模组拼板20包括多个相连的摄像模组10,通过分割模组拼板20的方式可以批量、低成本的制造摄像模组10,获得的摄像模组10还具有相对较小的尺寸。In this application, the camera module 10 in the first embodiment is formed by dividing the module panel 20 . The module panel 20 includes a plurality of connected camera modules 10 . By dividing the module panel 20 This method can manufacture the camera module 10 in batches and at low cost, and the obtained camera module 10 also has a relatively small size.
模组拼板20包括沿高度方向堆叠的镜头拼板21、保护层22和芯片拼板24,芯片拼板24包括多个感光芯片131,芯片拼板24切割后可形成多个如前述的感光芯片131,镜头拼板21切割后可形成多个如前述的晶圆级镜头11,保护层22切割后可以形成多个如前述的保护盖板132,单个晶圆级镜头11位于单个感光芯片131的感光路径上,保护盖板132被设置于晶圆级镜头11和感光芯片131之间。The module panel 20 includes a lens panel 21 stacked along the height direction, a protective layer 22 and a chip panel 24. The chip panel 24 includes a plurality of photosensitive chips 131. After cutting, the chip panel 24 can form a plurality of photosensitive chips as described above. The chip 131 and the lens panel 21 can be cut to form multiple wafer-level lenses 11 as mentioned above. The protective layer 22 can be cut to form multiple protective covers 132 as mentioned above. A single wafer-level lens 11 is located on a single photosensitive chip 131 On the photosensitive path, the protective cover 132 is disposed between the wafer-level lens 11 and the photosensitive chip 131 .
进一步地,提供一种第一实施例中的摄像模组10的制造方法,参照图8所示,摄像模组10的制造方法包括以下步骤S410-S440:Further, a method of manufacturing the camera module 10 in the first embodiment is provided. Referring to FIG. 8 , the manufacturing method of the camera module 10 includes the following steps S410-S440:
步骤S410,沿高度方向堆叠并固定一镜头拼板21、一保护层22和一芯片拼板24形成一模组拼板20。如图8所示,该模组拼板20沿高度方向包括镜头拼板21、保护层22和芯片拼板24,提供一镜头拼板21、一保护层22和一芯片拼板24,镜头拼板21、保护层22和芯片拼板24沿高度方向对齐,镜头拼板21和保护层22之间设置有一粘接层以粘接固定镜头拼板21和保护层22,保护层22和芯片拼板24之间设置有一粘接层以粘接固定保护层22和芯片拼板24,两处位置的粘接层的材质可以相同或者不同,本实施例并不受此所限。Step S410 , stack and fix a lens panel 21 , a protective layer 22 and a chip panel 24 along the height direction to form a module panel 20 . As shown in Figure 8, the module panel 20 includes a lens panel 21, a protective layer 22 and a chip panel 24 along the height direction, providing a lens panel 21, a protective layer 22 and a chip panel 24. The lens panel 21 is provided with a protective layer 22 and a chip panel 24. The board 21, the protective layer 22 and the chip panel 24 are aligned along the height direction. An adhesive layer is provided between the lens panel 21 and the protective layer 22 to bond and fix the lens panel 21 and the protective layer 22. The protective layer 22 and the chip panel are An adhesive layer is provided between the boards 24 to adhere and fix the protective layer 22 and the chip panel 24. The materials of the adhesive layers at the two locations may be the same or different, and this embodiment is not limited thereto.
步骤S420,沿高度方向分割模组拼板20中的镜头拼板21和保护层22以形成多个晶圆级镜头11和多个保护盖板132,相邻的两个晶圆级镜头11和相邻的两个保护盖板132之间形成一上分割槽26。从物侧向像侧沿高度方向分割模组拼板20,分割镜头拼板21和保护层22并使芯片拼板24露出,形成多个上分割槽26,上分割槽26形成于相邻的两个晶圆级镜头11和相邻的两个保护盖板132之间,其中,上分割槽26的底面为芯片拼板24,上分割槽26的侧面为晶圆级镜头11和保护盖板132。Step S420, divide the lens panel 21 and the protective layer 22 in the module panel 20 along the height direction to form multiple wafer-level lenses 11 and multiple protective covers 132. Two adjacent wafer-level lenses 11 and An upper dividing groove 26 is formed between two adjacent protective cover plates 132 . The module panel 20 is divided along the height direction from the object side to the image side, and the lens panel 21 and the protective layer 22 are divided to expose the chip panel 24 to form a plurality of upper dividing grooves 26. The upper dividing grooves 26 are formed in adjacent Between the two wafer-level lenses 11 and the two adjacent protective covers 132, the bottom surface of the upper dividing groove 26 is the chip panel 24, and the side surfaces of the upper dividing groove 26 are the wafer-level lenses 11 and the protective covers. 132.
步骤S430,向上分割槽26中填充封装材料,固化封装材料形成一封装连体部23,封装连体部23一体成型于晶圆级镜头11和保护盖板132的周侧。封装材料充满上分割槽26并连接相邻的两个晶圆级镜头11和相邻的两个保护盖板132形成一封装连体部23,封装连体部23包覆晶圆级镜头11和保护盖板132的周侧。Step S430 , the upward dividing groove 26 is filled with packaging material, and the packaging material is cured to form a packaging conjoined part 23 . The packaging conjoined part 23 is integrally formed on the peripheral side of the wafer-level lens 11 and the protective cover 132 . The packaging material fills the upper dividing groove 26 and connects the two adjacent wafer-level lenses 11 and the two adjacent protective covers 132 to form a packaging conjoined part 23. The packaging conjoined part 23 covers the wafer-level lenses 11 and Protect the peripheral side of the cover 132 .
步骤S440,沿高度方向分割模组拼板20,分割封装连体部23和芯片拼板24,以形成多个摄像模组10。封装连体部23被分割后形成摄像模组10中的封装体12,芯片拼板24被分割后适于得到多个独立的感光芯片131。Step S440 , divide the module panel 20 along the height direction, and divide the package conjoined part 23 and the chip panel 24 to form multiple camera modules 10 . The package conjoined portion 23 is divided to form the package 12 in the camera module 10 , and the chip panel 24 is divided to obtain a plurality of independent photosensitive chips 131 .
芯片拼板24包括多个相连的感光芯片131,在本实施例的一个示例中,摄像模组10的制造方法还包括步骤S450:在芯片拼板24的多个感光芯片131的背面设置电连接部133。在感光芯片131的背面设置电连接部133,使得感光芯片131可以从背面电连接于其他元件。步骤S450可以位于步骤S440之前或者位于步骤S440之后,在一个具体示例中,步骤S450位于步骤S430和步骤S440之间时,此时多个感光芯片131仍然保持相连以芯片拼板24的形式存在,可以在芯片拼板24状态下批量给芯片拼板24中的多个感光 芯片131的背面设置电连接部133,具有较高的效率;在另一个具体示例中,步骤S450位于步骤S440之后,先沿高度方向分割模组拼板20,在完成分割后,再得到的独立的摄像模组10的感光芯片131的背面设置电连接部133,这样可以避免分割对电连接部133造成损伤。The chip panel 24 includes a plurality of connected photosensitive chips 131. In an example of this embodiment, the manufacturing method of the camera module 10 further includes step S450: setting electrical connections on the backs of the multiple photosensitive chips 131 of the chip panel 24. Department 133. An electrical connection portion 133 is provided on the back of the photosensitive chip 131 so that the photosensitive chip 131 can be electrically connected to other components from the back. Step S450 may be located before step S440 or after step S440. In a specific example, when step S450 is located between step S430 and step S440, at this time, the plurality of photosensitive chips 131 are still connected and exist in the form of a chip panel 24. Multiple photosensitizers in the chip panel 24 can be sensitized in batches in the chip panel 24 state. The electrical connection portion 133 is provided on the back of the chip 131, which has higher efficiency; in another specific example, step S450 is located after step S440, and the module panel 20 is first divided along the height direction, and after the division is completed, the independent The electrical connection part 133 is provided on the back of the photosensitive chip 131 of the camera module 10, so as to avoid damage to the electrical connection part 133 caused by division.
在本实施例的一个示例中,摄像模组10的制造方法还包括线路板135设置步骤:在感光芯片131的背面进一步设置线路板135,感光芯片131通过电连接部133电连接于线路板135。其中,线路板135包括线路板主体1351、连接带1352和连接板1353,线路板主体1351设置于感光芯片131的背面并电连接于电连接部133,连接带1352连接并电导通线路板主体1351和连接板1353,从而连接带1352将线路板主体1351从感光芯片131获取的成像信息通过该连接器向外部电子设备传输。In an example of this embodiment, the manufacturing method of the camera module 10 also includes the step of setting the circuit board 135: further setting the circuit board 135 on the back of the photosensitive chip 131, and the photosensitive chip 131 is electrically connected to the circuit board 135 through the electrical connection part 133. . Among them, the circuit board 135 includes a circuit board main body 1351, a connecting belt 1352 and a connecting plate 1353. The circuit board main body 1351 is disposed on the back of the photosensitive chip 131 and is electrically connected to the electrical connection part 133. The connecting belt 1352 connects and electrically conducts the circuit board main body 1351. and the connection board 1353, so that the connection belt 1352 transmits the imaging information obtained by the circuit board body 1351 from the photosensitive chip 131 to the external electronic device through the connector.
在本实施例的一个示例中,还包括一遮光部113设置步骤。在一个具体示例中,在完成模组拼板20的分割后,在晶圆级镜头11的物侧设置遮光部113。在另一个示例中,在晶圆级镜头11的物侧设置遮光部113的步骤还可以在步骤S430进行,例如,通过封装材料在晶圆级镜头11的物侧形成遮光部113,使遮光部113和封装连体部23可以一体形成,简化制造的工艺。在本实施例的再一个示例中,遮光部113还可以在镜头拼板21的制造过程中直接形成,即步骤S410所提供的镜头拼板21中即包括遮光部113。In an example of this embodiment, a step of setting the light shielding portion 113 is also included. In a specific example, after the segmentation of the module panel 20 is completed, the light shielding portion 113 is provided on the object side of the wafer-level lens 11 . In another example, the step of arranging the light-shielding portion 113 on the object side of the wafer-level lens 11 can also be performed in step S430. For example, the light-shielding portion 113 is formed on the object side of the wafer-level lens 11 through a packaging material, so that the light-shielding portion 113 and the package connecting portion 23 can be formed integrally, simplifying the manufacturing process. In another example of this embodiment, the light shielding portion 113 can also be directly formed during the manufacturing process of the lens panel 21 , that is, the lens panel 21 provided in step S410 includes the light shielding portion 113 .
在本实施例的一个示例中,在步骤S410中,可以先将保护层22和芯片拼板24固定形成感光晶圆25,而后再将镜头拼板21和感光晶圆25对齐并固定;或者,步骤S410中提供的保护层22和芯片拼板24已经预先固定形成感光晶圆25。In an example of this embodiment, in step S410, the protective layer 22 and the chip panel 24 may be fixed first to form the photosensitive wafer 25, and then the lens panel 21 and the photosensitive wafer 25 may be aligned and fixed; or, The protective layer 22 and the chip panel 24 provided in step S410 have been fixed in advance to form the photosensitive wafer 25.
在本实施例的一个示例中,在步骤S410中,进一步提供一滤光元件14,使滤光元件14被设置于晶圆级镜头11和保护层22之间,通过滤光元件14实现红外截止功能。而由于滤光元件14的设置,因此,在步骤S420中,滤光元件14同样被分割,在步骤S430中,封装连体部23一体成型于晶圆级镜头11、滤光元件14和保护盖板132的周侧。In an example of this embodiment, in step S410, a filter element 14 is further provided, so that the filter element 14 is disposed between the wafer-level lens 11 and the protective layer 22, and infrared cutoff is achieved through the filter element 14. Function. Due to the arrangement of the filter element 14, in step S420, the filter element 14 is also divided. In step S430, the package conjoined part 23 is integrally formed on the wafer-level lens 11, the filter element 14 and the protective cover. The peripheral side of plate 132.
在本实施例的一个示例中,在步骤S420中,可以通过锯切、激光切割、激光磨削、水冲切割、铣切、微机械加工、微切片、冲孔切割等分割方式中的至少一种分割镜头拼板21和保护层22。In an example of this embodiment, in step S420, the segmentation method may be at least one of sawing, laser cutting, laser grinding, waterjet cutting, milling, micromachining, micro-slicing, punching and cutting, etc. The lens panel 21 and the protective layer 22 are divided.
在本实施例的一个示例中,在步骤S430中,向上分割槽26中填充的封装材料为液态封装材料,固化液态封装材料后形成封装连体部23。借助液态封装材料的流动性,封装材料可以与晶圆级镜头11和保护盖板132的周侧充分接触,在固化液态封装材料后,形成的封装连体部23也能够完全包覆晶圆级镜头11和保护盖板132的周侧。In an example of this embodiment, in step S430, the packaging material filled in the upward dividing groove 26 is a liquid packaging material, and the packaging conjoined portion 23 is formed after the liquid packaging material is solidified. With the fluidity of the liquid packaging material, the packaging material can fully contact the peripheral sides of the wafer-level lens 11 and the protective cover 132. After the liquid packaging material is cured, the formed packaging conjoined portion 23 can also completely cover the wafer-level lens 11 and the protective cover 132. The lens 11 and the peripheral side of the protective cover 132 .
在一个具体示例中,封装材料可以是胶水,向上分割槽26中填充胶水,胶水固化后形成的封装连体部23被分割后可以得到胶水封装体,即采用胶水工艺封装晶圆级镜头11或者保护盖板132的周侧。具体地,胶水采用不透光的胶水,例如黑色的胶水,以使封装材料可以减少杂光从侧面进入。进一步地,为使胶水完整的填充上分割槽26,避免上分割槽26中存在气泡,使得固化后形成的封装连体部23不能完全包覆晶圆级镜头11或者保护盖板132的周侧,可以以喷雾的方式填充胶水于上分割槽26中,从而避免气泡的产生,或者也可以以点状画胶的方式填充胶水。In a specific example, the packaging material can be glue, and the upward dividing groove 26 is filled with glue. After the glue is cured, the packaging conjoined portion 23 formed can be divided to obtain a glue package body, that is, the wafer-level lens 11 is packaged using a glue process or Protect the peripheral side of the cover 132 . Specifically, the glue is opaque, such as black glue, so that the encapsulation material can reduce stray light entering from the side. Furthermore, in order to completely fill the upper dividing groove 26 with glue and avoid the presence of air bubbles in the upper dividing groove 26, the encapsulated conjoined part 23 formed after curing cannot completely cover the wafer-level lens 11 or the peripheral side of the protective cover 132. , the glue can be filled into the upper dividing groove 26 by spraying to avoid the generation of bubbles, or the glue can be filled by dot-like glue drawing.
在另一个具体示例中,封装材料也可以是模塑材料,将模组拼板20设置于模组成型模具中,向模组成型模具中注入模塑材料,使模塑材料在上分割槽26中流动,从而将模塑材料填充满上分割槽26,进而固化模塑材料形成封装连体部23,分割该封装连体部23可以得到模塑封装体。借由模组成型模具封装模组拼板20,在晶圆级镜头11侧边形成的模塑封装体具有更为平整的顶表面。其中,可以通过冷却或者加热的方式固化模塑材料,具体由模塑材料的性质决定。In another specific example, the packaging material may also be a molding material. The module panel 20 is placed in a molding mold, and the molding material is injected into the molding mold to allow the molding material to form in the upper dividing groove 26 The upper dividing groove 26 is filled with the molding material, and then the molding material is solidified to form the encapsulating conjoined part 23. The molded package can be obtained by dividing the encapsulating conjoined part 23. By molding the mold package module panel 20 , the molded package formed on the side of the wafer-level lens 11 has a flatter top surface. Among them, the molding material can be solidified by cooling or heating, which is determined by the properties of the molding material.
在本实施例的一个示例中,在步骤S440中,可以通过锯切、激光切割、激光磨削、水冲切割、铣切、微机械加工、微切片、冲孔切割等分割方式中的至少一种分割模组拼板20。 In an example of this embodiment, in step S440, the segmentation may be performed by at least one of sawing, laser cutting, laser grinding, waterjet cutting, milling, micromachining, micro-slicing, punching and other cutting methods. 20 kinds of divided module panels.
值得注意的是,在本实施例中,步骤S440中的分割方式可以与步骤S420中的分割方式相同或者不同,在面对不同的切割对象时,可以选择不同的切割方式和不同的切割宽度。It is worth noting that in this embodiment, the dividing method in step S440 can be the same as or different from the dividing method in step S420. When facing different cutting objects, different cutting methods and different cutting widths can be selected.
值得注意的是,芯片拼板24中相邻的两感光芯片131之间具有一分割部,通过切割分割部使感光芯片131分离,但在实际的制造过程中,在使用切割刀切割保护层22时,由于切割刀的刀刃为尖刃状,下切分割保护层22后会切割到感光芯片131,而当分割部的宽度较小时,容易切伤感光芯片131中的线路,或者,在切割保护层22的过程中由于切割过深,也会造成感光芯片131的线路损伤。在一个示例中,当芯片拼板24的切割部的宽度大于等于切割刀的宽度时,切割刀仅切割分割部;在另一个示例中,当芯片拼板24的分割部的宽度小于切割刀的宽度时,切割刀有造成感光芯片131线路损伤的风险。It is worth noting that there is a dividing part between two adjacent photosensitive chips 131 in the chip panel 24, and the photosensitive chips 131 are separated by cutting the dividing part. However, in the actual manufacturing process, the protective layer 22 is cut using a cutting knife. When the cutting blade has a sharp blade shape, the photosensitive chip 131 will be cut after cutting down the protective layer 22. When the width of the dividing part is small, it is easy to cut the circuits in the photosensitive chip 131, or when cutting the protective layer. 22, the circuit damage to the photosensitive chip 131 will also be caused due to cutting too deep. In one example, when the width of the cutting portion of the chip panel 24 is greater than or equal to the width of the cutting knife, the cutting knife only cuts the dividing portion; in another example, when the width of the dividing portion of the chip panel 24 is smaller than the width of the cutting knife When the width is too high, the cutting knife may cause damage to the photosensitive chip 131 circuit.
为避免造成感光芯片131线路损伤,可以使相邻感光芯片131之间的距离增大,在一具体示例中,分割部的宽度为80um-300um,一方面可以满足切割需求,避免在切割过程中损伤感光芯片131,另一方面可以使得一个芯片拼板24中可以切割出尽可能多的感光芯片131。In order to avoid circuit damage to the photosensitive chips 131, the distance between adjacent photosensitive chips 131 can be increased. In a specific example, the width of the dividing portion is 80um-300um. On the one hand, it can meet the cutting requirements and avoid the problem of damage during the cutting process. Damaging the photosensitive chip 131 can, on the other hand, make it possible to cut out as many photosensitive chips 131 as possible from one chip panel 24 .
然而,在通过常规的芯片制造工艺获取芯片拼板24的方式中,在硅晶圆上形成感光芯片131,增大感光芯片131之间的距离会使得一片硅晶圆上能够产出的感光芯片131的数量减少,如此,使得感光芯片131的制造成本变高,并使制造效率降低。因此,本申请提供了一种新的芯片拼板24,如图7A和图7B所示,芯片拼板24包括多个感光芯片131和被设置于多个感光芯片131之间的连体部241。多个感光芯片131铺设于同一水平面内,连体部241设置于相邻两个感光芯片131之间,以通过连体部241对多个感光芯片131进行连接和支撑。通过分割连体部241分割芯片拼板24,得到的单个感光芯片131的周侧一体成型一侧连部136,侧连部136围绕感光芯片131设置,如图7C所示。However, in the way of obtaining the chip panel 24 through a conventional chip manufacturing process, the photosensitive chips 131 are formed on a silicon wafer. Increasing the distance between the photosensitive chips 131 will make it possible to produce more photosensitive chips on one silicon wafer. The number of photosensitive chips 131 is reduced, which increases the manufacturing cost of the photosensitive chip 131 and reduces the manufacturing efficiency. Therefore, the present application provides a new chip panel 24. As shown in FIGS. 7A and 7B, the chip panel 24 includes a plurality of photosensitive chips 131 and a conjoined portion 241 disposed between the plurality of photosensitive chips 131. . A plurality of photosensitive chips 131 are laid on the same horizontal plane, and the connecting portion 241 is provided between two adjacent photosensitive chips 131 to connect and support the plurality of photosensitive chips 131 through the connecting portion 241 . The chip panel 24 is divided by dividing the connecting part 241, and the single photosensitive chip 131 is integrally formed with a side connecting part 136 on its peripheral side, and the side connecting part 136 is arranged around the photosensitive chip 131, as shown in FIG. 7C.
在本申请的一个实施例中,连体部241通过模塑工艺一体成型于两相邻的感光芯片131之间,连体部241的宽度大于等于切割刀的宽度,通过连体部241的宽度调整相邻的感光芯片131之间的距离和分割部的宽度。从而在进行拼板切割时,切割刀仅切割芯片拼板24的连体部241部分,而不会切割到感光芯片131部分,进而避免了在切割过程中损坏感光芯片131。In one embodiment of the present application, the conjoined portion 241 is integrally formed between two adjacent photosensitive chips 131 through a molding process. The width of the conjoined portion 241 is greater than or equal to the width of the cutting knife. The distance between adjacent photosensitive chips 131 and the width of the divided portion are adjusted. Therefore, when cutting the panel, the cutting knife only cuts the conjoined portion 241 of the chip panel 24 and does not cut the photosensitive chip 131 , thereby avoiding damage to the photosensitive chip 131 during the cutting process.
在本申请的一个具体示例中,连体部241的高度低于感光芯片131的高度,连体部241被分割后形成的侧连部136低于感光芯片131的高度,侧连部136包覆芯片拼板24切割后的感光芯片131的周侧的至少部分,以对切割后的感光芯片131形成保护;在本申请的另一个具体示例中,连体部241的高度等于感光芯片131的高度,进而为镜头拼板21提供更加平整的安装面,连体部241被分割后形成的侧连部136等于感光芯片131的高度,侧连部136包覆芯片拼板24切割后的感光芯片131的周侧的全部;在本申请的再一个具体示例中,连体部241的高度高于感光芯片131的高度,连体部241被分割后形成的侧连部136高于感光芯片131的高度,侧连部136包覆芯片拼板24切割后的感光芯片131的周侧的全部,以对切割后的感光芯片131形成保护。连体部241高于感光芯片131,从而当保护层22被设置于感光芯片131的上方时,连体部241起到支撑做作用,使保护层22和感光芯片131之间留有间隙,也即当侧连部136高于感光芯片131,当保护盖板132被设置在感光芯片131的上方时,侧连部136起到支撑作用,使保护盖板132和感光芯片131之间留有间隙。In a specific example of this application, the height of the conjoined part 241 is lower than the height of the photosensitive chip 131 , the side connecting part 136 formed after the conjoined part 241 is divided is lower than the height of the photosensitive chip 131 , and the side connecting part 136 covers The chip panel 24 cuts at least part of the peripheral side of the photosensitive chip 131 to protect the cut photosensitive chip 131; in another specific example of this application, the height of the conjoined portion 241 is equal to the height of the photosensitive chip 131 , thereby providing a flatter mounting surface for the lens panel 21. The side connecting portion 136 formed after the conjoined portion 241 is divided is equal to the height of the photosensitive chip 131. The side connecting portion 136 covers the photosensitive chip 131 after cutting the chip panel 24. all the peripheral sides; in another specific example of the present application, the height of the conjoined portion 241 is higher than the height of the photosensitive chip 131, and the side connecting portion 136 formed after the conjoined portion 241 is divided is higher than the height of the photosensitive chip 131 The side connecting portion 136 covers the entire peripheral side of the photosensitive chip 131 cut by the chip panel 24 to protect the cut photosensitive chip 131 . The conjoined portion 241 is higher than the photosensitive chip 131, so when the protective layer 22 is disposed above the photosensitive chip 131, the conjoined portion 241 acts as a support to leave a gap between the protective layer 22 and the photosensitive chip 131. That is, when the side connecting portion 136 is higher than the photosensitive chip 131 and when the protective cover 132 is disposed above the photosensitive chip 131, the side connecting portion 136 plays a supporting role to leave a gap between the protective cover 132 and the photosensitive chip 131. .
采用前述带有连体部241的芯片拼板24,还可以适用于多种镜头拼板21。例如,当晶圆级镜头11的尺寸增大,与两个相邻的晶圆级镜头11相对的两个相邻的感光芯片131之间距离也需要随之增大。本申请中在两个相邻的感光芯片131之间设置连体部241,通过调整连体部241的宽度进而调整两个相邻的感光芯片131之间的距离,从而芯片拼板24可以适用不同规格的镜头拼板21,可适用性及灵活性更高。The aforementioned chip panel 24 with the conjoined portion 241 can also be applied to a variety of lens panels 21 . For example, when the size of the wafer-level lens 11 increases, the distance between two adjacent photosensitive chips 131 facing two adjacent wafer-level lenses 11 also needs to increase accordingly. In this application, a conjoined portion 241 is provided between two adjacent photosensitive chips 131. By adjusting the width of the conjoined portion 241 and thereby adjusting the distance between the two adjacent photosensitive chips 131, the chip panel 24 can be applied Lens panels 21 of different specifications provide greater applicability and flexibility.
进一步地,芯片拼板24的制造方法包括以下步骤S510-S530:Further, the manufacturing method of the chip panel 24 includes the following steps S510-S530:
S510,提供多个感光芯片131,使多个感光芯片131被铺设于芯片成型模具中,其中多个感光芯片 131位于同一水平面上,相邻的两个感光芯片131之间设置有模塑流道。多个感光芯片131间隔设置,相邻感光芯片131之间留有间距以形成模塑工艺中供模塑材料流动的模塑流道。S510, provide multiple photosensitive chips 131 so that the multiple photosensitive chips 131 are laid in the chip forming mold, wherein the multiple photosensitive chips 131 are 131 are located on the same horizontal plane, and a molding flow channel is provided between two adjacent photosensitive chips 131 . A plurality of photosensitive chips 131 are arranged at intervals, and a gap is left between adjacent photosensitive chips 131 to form a molding flow channel for the flow of molding materials during the molding process.
S520,向芯片成型模具中注入模塑材料,使得模塑材料可以在模塑流道内流动,并填充满整个模塑流道。S520, inject molding material into the chip molding mold so that the molding material can flow in the molding flow channel and fill the entire molding flow channel.
S530,模塑材料冷却后形成连体部241,其中连体部241包覆感光芯片131的周侧的至少一部分。S530 , after the molding material is cooled, a conjoined portion 241 is formed, wherein the conjoined portion 241 covers at least a part of the peripheral side of the photosensitive chip 131 .
进一步参照图6C,提供一第一实施例的摄像模组10的变形实施方式。感光组件13还包括一侧连部136,侧连部136一体成型于感光芯片131的周侧,起到保护感光芯片131的作用,侧连部136的横向尺寸大于保护盖板132的横向尺寸,封装体12一体成型于侧连部136的正面的至少一部分。在本实施方式中,封装体12包覆侧连部136的正面的至少一部分,在一个具体示例中,感光芯片131的横向尺寸小于保护盖板132的横向尺寸,封装体12一体成型于侧连部136的正面的一部分,保护盖板132覆盖侧连部136的正面的至少一部分,此时,侧连部136的正面未被保护盖板132覆盖的部分被封装体12覆盖,侧连部136的正面的一部分被封装体12覆盖,如图6C所示意;在另一个具体示例中,感光芯片131的横向尺寸等于保护盖板132的横向尺寸,封装体12一体成型于侧连部136的正面,侧连部136的正面全部被封装体12覆盖;在另一个具体示例中,感光芯片131的横向尺寸大于保护盖板132的横向尺寸,封装体12一体成型于侧连部136的正面,侧连部136的正面全部被封装体12覆盖,感光芯片131的正面的一部分被封装体12覆盖。Referring further to FIG. 6C , a modified implementation of the camera module 10 of the first embodiment is provided. The photosensitive component 13 also includes a side connecting portion 136. The side connecting portion 136 is integrally formed on the peripheral side of the photosensitive chip 131 to protect the photosensitive chip 131. The lateral size of the side connecting portion 136 is larger than the lateral size of the protective cover 132. The package body 12 is integrally formed on at least a portion of the front surface of the side connecting portion 136 . In this embodiment, the package body 12 covers at least part of the front surface of the side connecting portion 136 . In a specific example, the lateral size of the photosensitive chip 131 is smaller than the lateral size of the protective cover 132 , and the package body 12 is integrally formed on the side connecting portion 136 . The protective cover 132 covers at least a part of the front surface of the side connecting portion 136 . At this time, the portion of the front surface of the side connecting portion 136 that is not covered by the protective cover 132 is covered by the package 12 . The side connecting portion 136 A part of the front side is covered by the package body 12, as shown in FIG. 6C; in another specific example, the lateral size of the photosensitive chip 131 is equal to the lateral size of the protective cover 132, and the package body 12 is integrally formed on the front side of the side connecting portion 136. , the front side of the side connecting portion 136 is entirely covered by the package body 12; in another specific example, the lateral size of the photosensitive chip 131 is larger than the lateral size of the protective cover 132, and the package body 12 is integrally formed on the front side of the side connecting portion 136. The entire front surface of the connecting portion 136 is covered by the package 12 , and a part of the front surface of the photosensitive chip 131 is covered by the package 12 .
图9A至图10示意了本申请摄像模组10的第二实施例,该摄像模组10包括一晶圆级镜头11、一封装体12以及一感光组件13,该晶圆级镜头11被设置于感光组件13的感光路径上,该封装体12被设置于晶圆级镜头11和感光组件13的周侧以保护晶圆级镜头11和感光组件13的周侧。9A to 10 illustrate the second embodiment of the camera module 10 of the present application. The camera module 10 includes a wafer-level lens 11, a package 12 and a photosensitive component 13. The wafer-level lens 11 is provided On the photosensitive path of the photosensitive component 13 , the package 12 is disposed on the peripheral side of the wafer-level lens 11 and the photosensitive component 13 to protect the peripheral sides of the wafer-level lens 11 and the photosensitive component 13 .
与图6A至图6D所示意的摄像模组10的第一实施例不同的是,在图9A所示出的本申请摄像模组10的第二实施例中,封装体12不仅包覆晶圆级镜头11和保护盖板132的周侧,封装体12还包覆了感光芯片131的周侧,封装体12一体成型于晶圆级镜头11和感光组件13的周侧,使晶圆级镜头11和感光组件13的周侧全部被封装体12包覆,这样可以进一步保护感光芯片131的周侧。其中,感光芯片131的横向尺寸可以大于、小于或者等于保护盖板132的横向尺寸,具体尺寸由摄像模组10在切割过程中,由切割需求决定。在本申请摄像模组10的第二实施例中,封装体12也可以是通过胶水或者模塑材料形成的胶水封装体或者模塑封装体。Different from the first embodiment of the camera module 10 shown in FIGS. 6A to 6D , in the second embodiment of the camera module 10 of the present application shown in FIG. 9A , the package 12 not only covers the wafer The package 12 also covers the peripheral side of the wafer-level lens 11 and the protective cover 132 and the peripheral side of the photosensitive chip 131. The package 12 is integrally formed on the peripheral side of the wafer-level lens 11 and the photosensitive component 13, making the wafer-level lens 11 and the photosensitive component 13 are all covered by the package 12, which can further protect the peripheral side of the photosensitive chip 131. The lateral size of the photosensitive chip 131 may be greater than, less than, or equal to the lateral size of the protective cover 132 . The specific size is determined by the cutting requirements during the cutting process of the camera module 10 . In the second embodiment of the camera module 10 of the present application, the package 12 may also be a glue package or a molded package formed by glue or molding material.
封装体12包括上封装体121和下封装体122,上封装体121一体成型于晶圆级镜头11和保护盖板132的周侧并包覆晶圆级镜头11和保护盖板132的周侧,下封装体122一体成型于感光芯片131的周侧并包覆感光芯片131的周侧,上封装体121和下封装体122相互连接并固定。具体地,封装体12通过两次固化形成,下封装体122一体成型于上封装体121的底面形成封装体12。The package 12 includes an upper package 121 and a lower package 122. The upper package 121 is integrally formed on the peripheral sides of the wafer-level lens 11 and the protective cover 132 and covers the peripheral sides of the wafer-level lens 11 and the protective cover 132. The lower package 122 is integrally formed on the peripheral side of the photosensitive chip 131 and covers the peripheral side of the photosensitive chip 131. The upper package 121 and the lower package 122 are connected and fixed to each other. Specifically, the package body 12 is formed through two solidification processes, and the lower package body 122 is integrally formed on the bottom surface of the upper package body 121 to form the package body 12 .
在本实施例的一个示例中,保护盖板132的横向尺寸小于感光芯片131的横向尺寸,上封装体121一体成型于晶圆级镜头的周侧、保护盖板的周侧和感光芯片的正面的至少一部分,下封装体122一体成型于上封装体121的底面和感光芯片的周侧;在另一个示例中,保护盖板132的横向尺寸等于感光芯片131的横向尺寸,上封装体121一体成型于晶圆级镜头的周侧和保护盖板的周侧,下封装体122一体成型于上封装体121的底面和感光芯片的周侧;在再一个示例中,保护盖板132的横向尺寸大于感光芯片131的横向尺寸,上封装体121一体成型于晶圆级镜头的周侧和保护盖板的周侧,下封装体122一体成型于上封装体121的底面、保护盖板132的底面的至少一部分和感光芯片的周侧。In one example of this embodiment, the lateral size of the protective cover 132 is smaller than the lateral size of the photosensitive chip 131 , and the upper package 121 is integrally formed on the peripheral side of the wafer-level lens, the peripheral side of the protective cover and the front side of the photosensitive chip. At least part of the lower package body 122 is integrally formed on the bottom surface of the upper package body 121 and the peripheral side of the photosensitive chip; in another example, the lateral size of the protective cover 132 is equal to the lateral size of the photosensitive chip 131, and the upper package body 121 is integrally formed Molded on the peripheral side of the wafer-level lens and the peripheral side of the protective cover, the lower package 122 is integrally formed on the bottom surface of the upper package 121 and the peripheral side of the photosensitive chip; in another example, the lateral dimensions of the protective cover 132 Larger than the lateral size of the photosensitive chip 131, the upper package 121 is integrally formed on the peripheral side of the wafer-level lens and the protective cover, and the lower package 122 is integrally formed on the bottom surface of the upper package 121 and the protective cover 132. at least a portion of the photosensitive chip and the peripheral side of the photosensitive chip.
继续参照图9B至9C,感光组件13还包括一一体成型于感光芯片131的周侧的侧连部136,封装体12的下封装体122一体成型于侧连部136的周侧以使下封装体122间接地一体成型于感光芯片131的周 侧。在本实施例中,保护盖板132覆盖侧连部136的正面的至少一部分,下封装体122包覆侧连部136的周侧。其中,感光芯片131的横向尺寸小于保护盖板132的横向尺寸,从而使得在切割保护盖板的过程中,感光芯片131不会受到损伤。Continuing to refer to FIGS. 9B to 9C , the photosensitive component 13 further includes a side connecting portion 136 integrally formed on the peripheral side of the photosensitive chip 131 , and the lower package body 122 of the package 12 is integrally formed on the peripheral side of the side connecting portion 136 so that the lower The package body 122 is indirectly integrally formed around the photosensitive chip 131 side. In this embodiment, the protective cover 132 covers at least part of the front surface of the side connecting portion 136 , and the lower package body 122 covers the peripheral side of the side connecting portion 136 . The lateral size of the photosensitive chip 131 is smaller than the lateral size of the protective cover 132, so that the photosensitive chip 131 will not be damaged during the cutting process of the protective cover.
如图9B所示,在本实施例的一个具体示例中,侧连部136的横向尺寸等于保护盖板132的横向尺寸,侧连部136的外侧面与保护盖板132的外侧面齐平;在本实施例的另一个具体示例中,侧连部136的横向尺寸小于保护盖板132的横向尺寸,下封装体122一体成型于保护盖板132的底面的至少一部分并包覆保护盖板132的底面的至少一部分;在本实施例的再一个具体示例中,如图9C所示,侧连部136的横向尺寸大于保护盖板132的横向尺寸,侧连部136突出于保护盖板132,上封装体121包覆侧连部136的正面的一部分。As shown in Figure 9B, in a specific example of this embodiment, the lateral size of the side connecting portion 136 is equal to the lateral size of the protective cover 132, and the outer side of the side connecting portion 136 is flush with the outer side of the protective cover 132; In another specific example of this embodiment, the lateral size of the side connecting portion 136 is smaller than the lateral size of the protective cover 132 , and the lower package body 122 is integrally formed on at least a portion of the bottom surface of the protective cover 132 and covers the protective cover 132 At least a part of the bottom surface of this embodiment; in another specific example of this embodiment, as shown in FIG. 9C , the lateral size of the side connecting portion 136 is larger than the lateral size of the protective cover 132, and the side connecting portion 136 protrudes from the protective cover 132, The upper package body 121 covers a part of the front surface of the side connecting portion 136 .
进一步地,提供一种第二实施例中的摄像模组10的制造方法,参照图10所示,摄像模组10的制造方法包括以下步骤S610-S650:Further, a method of manufacturing the camera module 10 in the second embodiment is provided. Referring to FIG. 10 , the manufacturing method of the camera module 10 includes the following steps S610-S650:
步骤S610,沿高度方向堆叠并固定一镜头拼板21、一保护层22和一芯片拼板24形成一模组拼板20。如图10所示,该模组拼板20沿高度方向包括镜头拼板21、保护层22和芯片拼板24,镜头拼板21、保护层22和芯片拼板24沿高度方向对齐,镜头拼板21和保护层22之间设置有一粘接层以粘接固定镜头拼板21和保护层22,保护层22和芯片拼板24之间设置有一粘接层以粘接固定保护层22和芯片拼板24,两处位置的粘接层的材质可以相同或者不同,本实施例并不受此所限。Step S610 , stack and fix a lens panel 21 , a protective layer 22 and a chip panel 24 along the height direction to form a module panel 20 . As shown in Figure 10, the module panel 20 includes a lens panel 21, a protective layer 22 and a chip panel 24 along the height direction. The lens panel 21, the protective layer 22 and the chip panel 24 are aligned along the height direction. The lens panel 21, the protective layer 22 and the chip panel 24 are aligned along the height direction. An adhesive layer is disposed between the plate 21 and the protective layer 22 to bond and fix the lens panel 21 and the protective layer 22. An adhesive layer is disposed between the protective layer 22 and the chip panel 24 to bond and fix the protective layer 22 and the chip. The materials of the adhesive layers at two positions of the panel 24 can be the same or different, and this embodiment is not limited thereto.
步骤S620,沿高度方向分割模组拼板20中的镜头拼板21和保护层22以形成多个晶圆级镜头11和多个保护盖板132,相邻的两个晶圆级镜头11和相邻的两个保护盖板132之间形成一上分割槽26。从物侧向像侧沿高度方向分割模组拼板20,分割镜头拼板21和保护层22并使芯片拼板24露出,形成多个上分割槽26,上分割槽26形成于相邻的两个晶圆级镜头11和相邻的两个保护盖板132之间,其中,上分割槽26的底面为芯片拼板24,上分割槽26的侧面为晶圆级镜头11和保护盖板132。Step S620, divide the lens panel 21 and the protective layer 22 in the module panel 20 along the height direction to form multiple wafer-level lenses 11 and multiple protective covers 132. Two adjacent wafer-level lenses 11 and An upper dividing groove 26 is formed between two adjacent protective cover plates 132 . The module panel 20 is divided along the height direction from the object side to the image side, and the lens panel 21 and the protective layer 22 are divided to expose the chip panel 24 to form a plurality of upper dividing grooves 26. The upper dividing grooves 26 are formed in adjacent Between the two wafer-level lenses 11 and the two adjacent protective covers 132, the bottom surface of the upper dividing groove 26 is the chip panel 24, and the side surfaces of the upper dividing groove 26 are the wafer-level lenses 11 and the protective covers. 132.
步骤S630,向上分割槽26中填充第一封装材料,固化第一封装材料形成一上封装连体部231。第一封装材料充满上分割槽26并连接相邻的两个晶圆级镜头11和相邻的两个保护盖板132。Step S630: Fill the upper dividing groove 26 with a first packaging material, and solidify the first packaging material to form an upper packaging conjoined portion 231. The first packaging material fills the upper dividing groove 26 and connects two adjacent wafer-level lenses 11 and two adjacent protective covers 132 .
步骤S640,沿高度方向分割模组拼板20中的芯片拼板24以形成多个独立的感光芯片131,相邻的两个感光芯片131之间形成一下分割槽27。从像侧向物侧沿高度方向分割模组拼板20,分割芯片拼板24并使上分割槽26中固化的上封装连体部231露出,形成多个下分割槽27,下分割槽27形成于相邻的两个感光芯片131之间,其中,下分割槽27的底面为上分割槽26中固化的上封装连体部231,下分割槽27的侧面为感光芯片131。Step S640: Divide the chip panel 24 in the module panel 20 along the height direction to form multiple independent photosensitive chips 131, and form a dividing groove 27 between two adjacent photosensitive chips 131. The module panel 20 is divided along the height direction from the image side to the object side, and the chip panel 24 is divided to expose the solidified upper package conjoined portion 231 in the upper dividing groove 26 to form a plurality of lower dividing grooves 27 . Formed between two adjacent photosensitive chips 131 , the bottom surface of the lower dividing groove 27 is the upper package conjoined part 231 solidified in the upper dividing groove 26 , and the side surface of the lower dividing groove 27 is the photosensitive chip 131 .
步骤S650,向下分割槽27中填充第二封装材料,固化第二封装材料形成一下封装连体部(附图未示出),下封装连体部一体成型于上封装连体部231形成一封装连体部23。第二封装材料充满下分割槽27并连接相邻的两个感光芯片131和位于上分割槽26中上封装连体部231,下封装连体部一体成型于上封装连体部231的底面和感光芯片131的周侧,形成封装连体部23,换言之,在本实施例中,封装连体部23通过两次固化形成。其中,设置于上分割槽26中的第一封装材料和设置于下分割槽27中的第二封装材料可以相同或者不同,根据设计的需要决定。Step S650, the second packaging material is filled into the downward dividing groove 27, and the second packaging material is cured to form a lower packaging conjoined part (not shown in the drawings). The lower package conjoined part is integrally molded on the upper package conjoined part 231 to form a Encapsulate the joint part 23 . The second packaging material fills the lower dividing groove 27 and connects the two adjacent photosensitive chips 131 and the upper packaging connecting part 231 located in the upper dividing groove 26. The lower packaging connecting part is integrally formed on the bottom surface and the upper packaging connecting part 231. A package connected portion 23 is formed on the peripheral side of the photosensitive chip 131. In other words, in this embodiment, the package connected portion 23 is formed through two solidifications. The first packaging material provided in the upper dividing groove 26 and the second packaging material provided in the lower dividing groove 27 may be the same or different, depending on design requirements.
步骤S660,沿高度方向分割模组拼板20,以形成多个摄像模组10。通过沿高度方向分割封装连体部23,形成多个摄像模组10,封装连体部23被分割后形成多个摄像模组10的封装体12。Step S660: Divide the module panel 20 along the height direction to form multiple camera modules 10. Multiple camera modules 10 are formed by dividing the packaged conjoined portion 23 along the height direction, and the packaged bodies 12 of the plurality of camera modules 10 are formed after the packaged conjoined portion 23 is divided.
在本实施例中,步骤S620中分割模组拼板20中的镜头拼板21和保护层22、步骤S640中分割模组拼板20中的芯片拼板24和步骤S660分割模组拼板20可以采用三种不同的分割方式、两种不同分割方式或者同一种分割方式进行分割,在三个步骤中分割的宽度也可以不相同,本申请并不受此所限。 In this embodiment, the lens panel 21 and the protective layer 22 in the module panel 20 are divided in step S620, the chip panel 24 in the module panel 20 is divided in step S640, and the module panel 20 is divided in step S660. Three different division methods, two different division methods, or the same division method can be used for division. The width of division in the three steps can also be different, and this application is not limited by this.
相较于第一实施例中的摄像模组10,在本实施例中,通过上述方法获得的摄像模组10的感光芯片131的周侧也被封装体12所包覆,从而提供了更完备的保护使得摄像模组10在撞击的过程中,感光芯片131受损的可能性降低。Compared with the camera module 10 in the first embodiment, in this embodiment, the peripheral side of the photosensitive chip 131 of the camera module 10 obtained by the above method is also covered by the package 12, thereby providing a more complete The protection reduces the possibility of damage to the photosensitive chip 131 of the camera module 10 during impact.
在本实施例的一个示例中,第二实施例中的摄像模组10的制造方法还包括步骤S670:在感光芯片131的背面设置电连接部133。在一个具体示例中,步骤S670可以位于步骤S630和步骤S640之间,从而可以批量的给芯片拼板24中的多个感光芯片131的背面设置电连接部133,同时使设置电连接部133时不受芯片拼板24的分割和固化的上封装连体部231的影响,分割芯片拼板24和固化第一封装材料的过程可能导致芯片背面的平整度下降;在另一个具体示例中,步骤S670可以位于步骤S650和步骤S660之间,在固化第二封装材料后,在感光芯片131的背面设置电连接部133,从而可以批量的给模组拼板20中的多个感光芯片131的背面设置电连接部133,高效的同时可以防止将模组拼板20分割成多个独立的摄像模组10的过程造成电连接部133的损伤;在再一个具体示例中,步骤S670可以位于步骤S660之后,先沿高度方向分割模组拼板20,在完成分割后,再得到的独立的摄像模组10的感光芯片131的背面设置电连接部133,这样可以避免分割对电连接部133造成损伤。In an example of this embodiment, the manufacturing method of the camera module 10 in the second embodiment further includes step S670: setting the electrical connection portion 133 on the back of the photosensitive chip 131. In a specific example, step S670 may be located between step S630 and step S640, so that the electrical connection portions 133 can be provided in batches on the back surfaces of the plurality of photosensitive chips 131 in the chip panel 24, and at the same time, the electrical connection portions 133 can be set. Not affected by the splitting of the chip panel 24 and the cured upper package conjoined portion 231 , the process of splitting the chip panel 24 and curing the first packaging material may cause the flatness of the backside of the chip to decrease; in another specific example, step S670 may be located between step S650 and step S660. After the second encapsulation material is cured, the electrical connection part 133 is provided on the back of the photosensitive chip 131, so that the back of multiple photosensitive chips 131 in the module panel 20 can be batched. Providing the electrical connection part 133 is efficient and can prevent damage to the electrical connection part 133 caused by the process of dividing the module panel 20 into multiple independent camera modules 10; in another specific example, step S670 may be located in step S660. After that, the module panel 20 is first divided along the height direction. After the division is completed, the electrical connection part 133 is provided on the back of the photosensitive chip 131 of the independent camera module 10. This can avoid damage to the electrical connection part 133 caused by the division. .
与第一实施例中的摄像模组10的制造方法相似的,在本实施例的一个示例中,摄像模组10的制造方法还包括线路板135设置步骤和遮光部113设置步骤。线路板135设置步骤在步骤S660之后进行,即在完成模组拼板20的分割后进行。在一个具体示例中,在晶圆级镜头11的物侧设置遮光部113的遮光部113设置步骤可以在完成步骤S660之后进行,即在完成模组拼板20的分割后进行;在另一个具体示例中,遮光部113设置步骤还可以在步骤630进行,例如,通过封装材料在晶圆级镜头11的物侧形成遮光部113;在在一个具体示例中,遮光部113还可以在镜头拼板21的制造过程中直接形成。Similar to the manufacturing method of the camera module 10 in the first embodiment, in an example of this embodiment, the manufacturing method of the camera module 10 further includes a step of setting the circuit board 135 and a step of setting the light shield 113 . The circuit board 135 setting step is performed after step S660, that is, after the division of the module panel 20 is completed. In a specific example, the step of setting the light shielding portion 113 on the object side of the wafer-level lens 11 can be performed after step S660 is completed, that is, after the segmentation of the module panel 20 is completed; in another specific example, In an example, the step of setting the light-shielding portion 113 can also be performed in step 630. For example, the light-shielding portion 113 can be formed on the object side of the wafer-level lens 11 through packaging materials; in a specific example, the light-shielding portion 113 can also be formed on the lens panel. 21 is formed directly during the manufacturing process.
与第一实施例中的摄像模组10的制造方法相似的,在本实施例的一个示例中,在步骤S610中,进一步提供一滤光元件14,使滤光元件14被设置于晶圆级镜头11和保护层22之间,通过滤光元件14实现红外截止功能。而由于滤光元件14的设置,因此,在步骤S620中,滤光元件14同样被分割,在步骤S630中,第一封装材料固化,上封装连体部231一体成型于晶圆级镜头11、滤光元件14和保护盖板132的周侧。Similar to the manufacturing method of the camera module 10 in the first embodiment, in an example of this embodiment, in step S610, a filter element 14 is further provided, so that the filter element 14 is disposed at the wafer level. Between the lens 11 and the protective layer 22, the filter element 14 realizes the infrared cutoff function. Due to the arrangement of the filter element 14, in step S620, the filter element 14 is also divided. In step S630, the first packaging material is solidified, and the upper packaging conjoined portion 231 is integrally formed on the wafer-level lens 11, The filter element 14 and the peripheral side of the protective cover 132 .
与第一实施例中的摄像模组10的制造方法相似的,在本实施例的一个示例中,在步骤S630和步骤S650中,向上分割槽26和/或下分割槽27中填充的封装材料(第一封装材料和第二封装材料)为液态封装材料,固化液态的封装材料后最终形成封装连体部23。借助液态封装材料的流动性,封装材料(第一封装材料和第二封装材料)可以与晶圆级镜头11、保护盖板132和感光芯片131的周侧充分接触,在固化液态封装材料后,形成的封装连体部23也能够完全包覆晶圆级镜头11、保护盖板132和感光芯片131的周侧。Similar to the manufacturing method of the camera module 10 in the first embodiment, in an example of this embodiment, in step S630 and step S650, the packaging material filled in the upper dividing groove 26 and/or the lower dividing groove 27 is (The first encapsulation material and the second encapsulation material) are liquid encapsulation materials. After the liquid encapsulation materials are solidified, the encapsulation connected part 23 is finally formed. With the fluidity of the liquid encapsulation material, the encapsulation material (the first encapsulation material and the second encapsulation material) can fully contact the peripheral sides of the wafer-level lens 11, the protective cover 132 and the photosensitive chip 131. After the liquid encapsulation material is cured, The formed package conjoined portion 23 can also completely cover the peripheral sides of the wafer-level lens 11 , the protective cover 132 and the photosensitive chip 131 .
封装材料可以是胶水或者模塑材料,设置于上分割槽26和设置于下分割槽27中的第一封装材料和第二封装材料可以相同或者不同,即,可以使设置于上分割槽26和下分割槽27中的第一封装材料和第二封装材料均为胶水,使最终形成的封装连体部23由固化的胶水构成;或者可以使设置于上分割槽26和下分割槽27中的第一封装材料和第二封装材料均为模塑材料,使最终形成的封装连体部23由固化的模塑材料构成;或者可以使设置于上分割槽26中的第一封装材料为模塑材料,使设置于下分割槽27中的第二封装材料为胶水,使最终形成的封装连体部23由位于上方的模塑材料固化形成的上封装连体部231和位于下方的胶水固化形成的下封装连体部组成;又或者可以使设置于上分割槽26中的第一封装材料为胶水,使设置于下分割槽27中的第二封装材料为模塑材料,使最终形成的封装连体部23由位于上方的胶水固化形成的上封装连体部231和位于下方的模塑材料固化形成的下封装连体部组成。设置不同的封装材料可以依据分割模组拼板20形成的上分割槽26和下分割槽27的宽度、深度进行选择,例如对于深度较深或宽度较窄的上分割槽26或者下分割槽27选择流动性较好的封装材料,而对于深度较浅或宽度较宽的上分割槽26或者下分割槽27可以使用流动性较差的封装材料,从而使第一封装材料与第二封装材料采用不同的材料。 The packaging material may be glue or molding material, and the first packaging material and the second packaging material provided in the upper dividing groove 26 and the lower dividing groove 27 may be the same or different, that is, the first packaging material and the second packaging material provided in the upper dividing groove 26 and the lower dividing groove 27 may be The first packaging material and the second packaging material in the lower dividing groove 27 are both glue, so that the finally formed packaging joint part 23 is composed of cured glue; or the packaging materials provided in the upper dividing groove 26 and the lower dividing groove 27 can be Both the first encapsulating material and the second encapsulating material are molding materials, so that the finally formed encapsulating conjoined part 23 is composed of cured molding material; or the first encapsulating material disposed in the upper dividing groove 26 can be made of molding material. material, the second packaging material disposed in the lower dividing groove 27 is glue, and the finally formed packaging connected part 23 is formed by solidifying the upper molding material to form the upper packaging connected part 231 and the lower glue. It is composed of a lower package connected part; or the first packaging material provided in the upper dividing groove 26 can be glue, and the second packaging material provided in the lower dividing groove 27 can be a molding material, so that the final formed package The conjoined part 23 is composed of an upper package conjoined part 231 formed by curing glue and a lower package conjoined part 231 formed by curing molding material below. Different packaging materials can be selected according to the width and depth of the upper dividing groove 26 and the lower dividing groove 27 formed by the divided module panel 20, for example, for the upper dividing groove 26 or the lower dividing groove 27 with a deeper depth or a narrower width. Choose a packaging material with better fluidity, and use a packaging material with poor fluidity for the upper dividing groove 26 or the lower dividing groove 27 with a shallow depth or a wide width, so that the first packaging material and the second packaging material are Different materials.
与第一实施例中的摄像模组10的制造方法相似的,在本实施例的一个示例中,芯片拼板24使用了如图7A和7b所示意的芯片拼板24,以使感光芯片131之间的距离可以在完成芯片制造后被再度调整,芯片拼板24包括多个感光芯片131,以及设置于多个感光芯片131之间的连体部241,连体部241一体成型于两相邻的感光芯片131之间。最终,使用具有连体部241的芯片拼板24制造得到的摄像模组10如图9B和9C所示,感光芯片131的周侧被侧连部136包覆,侧连部136的周侧被封装体12包覆,封装体12通过包覆侧连部136的周侧间接地包覆感光芯片131的周侧,具体地,封装体12中的下封装体通过包覆侧连部136的周侧间接地包覆感光芯片131的周侧。Similar to the manufacturing method of the camera module 10 in the first embodiment, in an example of this embodiment, the chip panel 24 uses the chip panel 24 as shown in FIGS. 7A and 7b so that the photosensitive chip 131 The distance between them can be adjusted again after the chip manufacturing is completed. The chip panel 24 includes a plurality of photosensitive chips 131 and a conjoined portion 241 disposed between the plurality of photosensitive chips 131. The conjoined portion 241 is integrally formed on the two phases. between adjacent photosensitive chips 131 . Finally, the camera module 10 manufactured using the chip panel 24 with the conjoined portion 241 is shown in FIGS. 9B and 9C . The peripheral side of the photosensitive chip 131 is covered by the side connecting portion 136 , and the peripheral side of the side connecting portion 136 is covered by the side connecting portion 136 . The package body 12 covers, and the package body 12 indirectly covers the circumferential side of the photosensitive chip 131 by covering the circumferential side of the side connecting portion 136 . Specifically, the lower package body in the package body 12 covers the circumferential side of the side connecting portion 136 . The side indirectly covers the peripheral side of the photosensitive chip 131 .
在前述摄像模组10的第一实施例或者第二实施例中,均采用镜头拼板21和芯片拼板24进行摄像模组10的制造,其需要充分考虑镜头拼板21和芯片拼板24之间的配合以及需要进行多次切割。本申请进一步提供更为便捷的制造方法和通过该方法制造的摄像模组10。其中,图11A至图11C示出了本申请的摄像模组10的第三实施例,该摄像模组10采用COB(Chip On Board)工艺进行感光组件13的制造,如图所示,摄像模组10包括一晶圆级镜头11、一感光组件13及一封装体12,其中,晶圆级镜头11被设置于感光组件13的感光路径上,封装体12一体成型于晶圆级镜头11和感光组件13上,即封装体12一体封装地连接于晶圆级镜头11和感光组件13。In the first embodiment or the second embodiment of the aforementioned camera module 10, the lens panel 21 and the chip panel 24 are used to manufacture the camera module 10, which requires full consideration of the lens panel 21 and the chip panel 24. The fit between them requires multiple cuts. This application further provides a more convenient manufacturing method and the camera module 10 manufactured by this method. Among them, Figures 11A to 11C show the third embodiment of the camera module 10 of the present application. The camera module 10 uses the COB (Chip On Board) process to manufacture the photosensitive component 13. As shown in the figure, the camera module 10 The group 10 includes a wafer-level lens 11, a photosensitive component 13 and a package 12. The wafer-level lens 11 is disposed on the photosensitive path of the photosensitive component 13, and the package 12 is integrally formed between the wafer-level lens 11 and the photosensitive component 13. The photosensitive component 13 , that is, the package 12 is integrally connected to the wafer-level lens 11 and the photosensitive component 13 .
感光组件13包括线路板135和被电连接于线路板135的感光芯片131,感光芯片131被固定于线路板135,在本申请一具体示例中,感光芯片131的背面被粘接于线路板主体1351的正面,以使得感光芯片131被设置于线路板135上。The photosensitive component 13 includes a circuit board 135 and a photosensitive chip 131 that is electrically connected to the circuit board 135. The photosensitive chip 131 is fixed to the circuit board 135. In a specific example of this application, the back side of the photosensitive chip 131 is bonded to the main body of the circuit board. 1351, so that the photosensitive chip 131 is disposed on the circuit board 135.
进一步地,感光组件13还包括至少一引线137,至少一引线137结合于感光芯片131和线路板135主板之间,用于电连接感光芯片131和线路板135主板,至少一引线137可以被实施但不限于金线、铜线、铝线、银线等。Further, the photosensitive component 13 also includes at least one lead 137. At least one lead 137 is combined between the photosensitive chip 131 and the circuit board 135 main board for electrically connecting the photosensitive chip 131 and the circuit board 135 main board. At least one lead 137 can be implemented But not limited to gold wire, copper wire, aluminum wire, silver wire, etc.
在本实施例中,电连接部133被设置于感光芯片131的正面的非感光区,引线137电连接线路板主体1351和电连接部133,以实现线路板主体1351和感光芯片131之间的电路导通,其中电连接部133可以被实施为多个焊盘。具体地,引线137电连接线路板主体1351上的焊盘和感光芯片131的电连接部133以实现电连接。In this embodiment, the electrical connection part 133 is disposed in the non-photosensitive area on the front side of the photosensitive chip 131, and the lead 137 electrically connects the circuit board main body 1351 and the electrical connection part 133 to realize the connection between the circuit board main body 1351 and the photosensitive chip 131. The electrical circuit is conducted, wherein the electrical connection 133 may be implemented as a plurality of pads. Specifically, the lead 137 electrically connects the pad on the circuit board body 1351 and the electrical connection portion 133 of the photosensitive chip 131 to achieve electrical connection.
更具体地,感光芯片131的横向尺寸不大于线路板主体1351的横向尺寸,即沿高度方向,感光芯片131的投影落在线路板主体1351的投影中,以使得感光组件13的结构更加紧凑,避免增加感光组件13的横向尺寸。More specifically, the lateral size of the photosensitive chip 131 is no larger than the lateral size of the circuit board main body 1351, that is, along the height direction, the projection of the photosensitive chip 131 falls in the projection of the circuit board main body 1351, so that the structure of the photosensitive component 13 is more compact. Avoid increasing the lateral size of the photosensitive element 13 .
在本实施例的一个具体示例中,感光芯片131的横向尺寸小于线路板主体1351的横向尺寸,即感光芯片131没有完全覆盖线路板主体1351的正面,线路板主体1351的正面露出,也可以说,沿高度方向上感光芯片131的最外侧的投影位于线路板主体1351的最外侧的投影内侧。引线137的一端设置于感光芯片131的正面,引线137的另一端设置于线路板主体1351的正面,这种设置方式能够为引线137留有足够的空间位置,避免引线137发生弯折而损坏。In a specific example of this embodiment, the lateral size of the photosensitive chip 131 is smaller than the lateral size of the circuit board main body 1351 , that is, the photosensitive chip 131 does not completely cover the front side of the circuit board main body 1351 , and the front side of the circuit board main body 1351 is exposed. It can also be said that , the outermost projection of the photosensitive chip 131 in the height direction is located inside the outermost projection of the circuit board body 1351 . One end of the lead 137 is disposed on the front of the photosensitive chip 131, and the other end of the lead 137 is disposed on the front of the circuit board body 1351. This arrangement can leave enough space for the lead 137 to prevent the lead 137 from being bent and damaged.
在本实施例的另一个具体示例中,感光芯片131的横向尺寸等于线路板主体1351的横向尺寸,即感光芯片131完全覆盖线路板主体1351的正面,也可以说,沿高度方向上感光芯片131的最外侧的投影与线路板主体1351的最外侧的投影重叠。引线137的一端设置于感光芯片131的正面,引线137的另一端设置于线路板主体1351的侧面或背面,这种设置方式能够减小线路板135的横向尺寸,避免感光组件13横向尺寸的增加。In another specific example of this embodiment, the lateral size of the photosensitive chip 131 is equal to the lateral size of the circuit board main body 1351 , that is, the photosensitive chip 131 completely covers the front side of the circuit board main body 1351 . It can also be said that the photosensitive chip 131 extends along the height direction. The outermost projection overlaps with the outermost projection of the circuit board body 1351 . One end of the lead 137 is set on the front of the photosensitive chip 131, and the other end of the lead 137 is set on the side or back of the circuit board body 1351. This arrangement can reduce the lateral size of the circuit board 135 and avoid increasing the lateral size of the photosensitive component 13. .
在本实施例的一个示例中,晶圆级镜头11被设置于感光芯片131上,晶圆级镜头11的横向尺寸小于感光芯片131的横向尺寸,晶圆级镜头11通过支撑件112固定于感光芯片131的非感光区的方式被固 定于感光芯片131的正面。在本实施例的另一个示例中,摄像模组10还包括一滤光元件14,滤光元件14被设置于晶圆级镜头11和感光组件13之间,滤光元件14被固定于感光芯片131的正面,晶圆级镜头11被固定于滤光元件14的物侧面从而晶圆级镜头11被间接地固定于感光芯片131的正面;在本申请的再一个实施例中,滤光元件14被设计的较小,感光芯片131的非感光区仍然留有一定的区域用于固定晶圆级镜头11;在本申请的再一个实施例中,晶圆级镜头11如前述的具有红外截止功能,摄像模组10直接省去滤光元件,从而降低了摄像模组10的高度。In an example of this embodiment, the wafer-level lens 11 is disposed on the photosensitive chip 131 , the lateral size of the wafer-level lens 11 is smaller than the lateral size of the photosensitive chip 131 , and the wafer-level lens 11 is fixed on the photosensitive chip 131 through the support 112 The non-photosensitive area of chip 131 is fixed in a manner Set on the front side of the photosensitive chip 131. In another example of this embodiment, the camera module 10 further includes a filter element 14. The filter element 14 is disposed between the wafer-level lens 11 and the photosensitive component 13. The filter element 14 is fixed to the photosensitive chip. On the front side of 131, the wafer-level lens 11 is fixed on the object side of the filter element 14, so that the wafer-level lens 11 is indirectly fixed on the front side of the photosensitive chip 131; in another embodiment of the present application, the filter element 14 Designed to be smaller, the non-photosensitive area of the photosensitive chip 131 still leaves a certain area for fixing the wafer-level lens 11; in another embodiment of the present application, the wafer-level lens 11 has an infrared cutoff function as mentioned above. , the camera module 10 directly eliminates the filter element, thereby reducing the height of the camera module 10 .
继续参照图11A至图11C,封装体12一体成型于晶圆级镜头11、感光芯片131和线路板主体1351,封装体12包覆线路板主体1351的至少一部分、感光芯片131的至少一部分、以及晶圆级镜头11的至少一部分,在一个具体示例中,封装体12包覆线路板主体1351的正面的至少一部分,感光芯片131的周侧和感光芯片131的正面的非感光区的至少一部分,以及晶圆级镜头11的周侧。Continuing to refer to FIGS. 11A to 11C , the package 12 is integrally formed on the wafer-level lens 11 , the photosensitive chip 131 and the circuit board main body 1351 . The package 12 covers at least part of the circuit board main body 1351 , at least part of the photosensitive chip 131 , and At least a part of the wafer-level lens 11. In a specific example, the package 12 covers at least a part of the front surface of the circuit board body 1351, the peripheral side of the photosensitive chip 131 and at least a part of the non-photosensitive area of the front surface of the photosensitive chip 131, and the peripheral side of the wafer-level lens 11 .
可以理解的是,封装体12、线路板主体1351、感光芯片131和晶圆级镜头11一体结合,增强摄像模组10的结构强度,使摄像模组10的结构更紧凑,实现小型化。It can be understood that the package body 12, the circuit board body 1351, the photosensitive chip 131 and the wafer-level lens 11 are integrated to enhance the structural strength of the camera module 10, making the camera module 10 more compact and miniaturized.
封装体12沿水平方向延伸于感光芯片131的非感光区和线路板主体1351,从而将感光芯片131封装于线路板主体1351,封装体12沿高度方向延伸于晶圆级镜头11的周侧,从而将晶圆级镜头11封装于感光芯片131,一方面增加了摄像模组10的结构强度,另一方面使得摄像模组10的结构更加紧凑,横向尺寸更小。The package 12 extends in the horizontal direction between the non-photosensitive area of the photosensitive chip 131 and the circuit board main body 1351, thereby packaging the photosensitive chip 131 in the circuit board main body 1351. The package 12 extends in the height direction on the peripheral side of the wafer-level lens 11, Therefore, the wafer-level lens 11 is packaged in the photosensitive chip 131, which on the one hand increases the structural strength of the camera module 10, and on the other hand makes the camera module 10 more compact in structure and smaller in lateral size.
进一步地,封装体12围绕于感光芯片131的外侧和晶圆级镜头11的外侧,特别地,封装体12一体地闭合连接,使其具有良好的密封性,从而使得感光芯片131处于一封闭空间内,避免感光芯片131受到污染而影响成像效果。Further, the package 12 surrounds the outside of the photosensitive chip 131 and the outside of the wafer-level lens 11. In particular, the package 12 is integrally closed and connected, so that it has good sealing performance, so that the photosensitive chip 131 is in a closed space. within to prevent the photosensitive chip 131 from being contaminated and affecting the imaging effect.
在本实施例的一个示例中,封装体12具有竖直的外侧面,封装体12的上部的横向尺寸等于封装体12的底部的横向尺寸,如图11A和图11B所示;在本实施例的另一个示例中,如图11C所示,封装体12的外侧面呈倾斜状,封装体12的外径由上到下增大,封装体12的底部的横向尺寸大于封装体12的上部的横向尺寸,从而在为引线137提供足够的设置空间以避免封装体12成型的过程中对引线137造成积压而造成引线137损坏的同时,为摄像模组10提供了一个较小的头部,使摄像模组10适于安装进更小的空间中。其中,封装体12的底部是指封装体12位于感光芯片131的侧边的部分,而封装体12的上部是指位于晶圆级镜头11的侧边的部分。In one example of this embodiment, the package 12 has a vertical outer side, and the lateral size of the upper part of the package 12 is equal to the lateral size of the bottom of the package 12, as shown in FIGS. 11A and 11B; in this embodiment In another example, as shown in FIG. 11C , the outer side of the package 12 is inclined, the outer diameter of the package 12 increases from top to bottom, and the lateral dimension of the bottom of the package 12 is larger than that of the upper part of the package 12 . The lateral size provides enough space for the leads 137 to avoid backlog of the leads 137 and damage to the leads 137 during the molding process of the package 12. At the same time, it provides a smaller head for the camera module 10, so that The camera module 10 is suitable for installation in smaller spaces. The bottom of the package 12 refers to the part of the package 12 located on the side of the photosensitive chip 131 , and the upper part of the package 12 refers to the part located on the side of the wafer-level lens 11 .
进一步地,感光芯片131上的电连接部133、线路板主体1351上的焊盘和至少一引线137均被封装体12包裹,通过封装体12包覆引线137,引线137被嵌入封装体12中,使得引线137不会被直接暴露在外部,从而引线137不易受到外部因素干扰导致变形、损伤等问题。Further, the electrical connection portion 133 on the photosensitive chip 131, the pad on the circuit board body 1351 and at least one lead 137 are all wrapped by the package 12. The lead 137 is wrapped by the package 12, and the lead 137 is embedded in the package 12. , so that the lead wire 137 will not be directly exposed to the outside, so that the lead wire 137 will not be easily interfered by external factors, causing problems such as deformation and damage.
具体地,晶圆级镜头11的遮光部113的周侧同样被封装体12所包覆,如图11A所示,封装体12的顶面与遮光部113的平面齐平。在本实施例的另一个示例中,遮光部113在封装体12一体成型于晶圆级镜头11的周侧后设置于晶圆级镜头11上,如图11B和图11C所示,遮光部113被固定于封装体12的顶面,遮光部113向晶圆级镜头11方向延伸,从而起到遮光的作用,在一个具体示例中,晶圆级镜头11的晶圆级透镜组件111中位于物侧的第一片晶圆级透镜1111的物侧面的周侧齐平于封装体12的顶面,从而遮光部113还可以固定于该晶圆级透镜组件111;在另一个具体示例中,晶圆级镜头11的晶圆级透镜组件111中位于物侧的第一片晶圆级透镜1111的物侧面的周侧低于封装体12的顶面,从而遮光部113和该晶圆级透镜组件111之间设有间隙。在本实施例的再一个示例中,晶圆级镜头11的遮光部113可以在封装体12一体成型于晶圆级镜头11的侧面的同时形成,具体地,封装体12包覆晶圆级镜头11的顶面的至少一部分形成遮光部113,遮光部113和封装体12一体成型于晶圆级镜头11的顶面和周侧。 Specifically, the peripheral side of the light shielding portion 113 of the wafer-level lens 11 is also covered by the package 12 . As shown in FIG. 11A , the top surface of the package 12 is flush with the plane of the light shielding portion 113 . In another example of this embodiment, the light shielding portion 113 is disposed on the wafer level lens 11 after the package 12 is integrally formed on the peripheral side of the wafer level lens 11 . As shown in FIGS. 11B and 11C , the light shielding portion 113 Being fixed on the top surface of the package 12, the light-shielding portion 113 extends toward the direction of the wafer-level lens 11 to play a light-shielding role. In a specific example, the wafer-level lens assembly 111 of the wafer-level lens 11 is located in the object. The peripheral side of the object side of the first wafer-level lens 1111 is flush with the top surface of the package 12, so that the light-shielding portion 113 can also be fixed to the wafer-level lens assembly 111; in another specific example, the wafer-level lens assembly 111 is In the wafer-level lens assembly 111 of the round-level lens 11, the peripheral side of the object side of the first wafer-level lens 1111 located on the object side is lower than the top surface of the package 12, so that the light shielding portion 113 and the wafer-level lens assembly There is a gap between 111. In another example of this embodiment, the light-shielding portion 113 of the wafer-level lens 11 can be formed while the package body 12 is integrally formed on the side of the wafer-level lens 11 . Specifically, the package body 12 covers the wafer-level lens 11 At least a part of the top surface of the wafer-level lens 11 forms a light-shielding portion 113 , and the light-shielding portion 113 and the package 12 are integrally formed on the top surface and peripheral sides of the wafer-level lens 11 .
在本实施例中,封装体12的材料可以为模塑材料,从而形成模塑封装体,封装体12通过模塑工艺一体成型于晶圆级镜头11、感光芯片131和线路板主体1351,模塑工艺需要使用成型模具,适于制成更平整的表面。感光芯片131模塑地连接于线路板主体1351,晶圆级镜头11模塑地连接于感光芯片131,特别地,封装体12以模塑于感光芯片131的方式(Molding on Chip,MOC)模塑于感光组件13。In this embodiment, the material of the package 12 can be a molding material, thereby forming a molded package. The package 12 is integrally formed on the wafer-level lens 11, the photosensitive chip 131 and the circuit board main body 1351 through a molding process. The plastic process requires the use of forming molds, which are suitable for making flatter surfaces. The photosensitive chip 131 is moldedly connected to the circuit board body 1351, and the wafer-level lens 11 is moldedly connected to the photosensitive chip 131. In particular, the package 12 is molded on the photosensitive chip 131 (Molding on Chip, MOC). Molded on the photosensitive element 13.
在本实施例的其他实施方式中,封装体12的材料也可以为胶水,从而形成胶水封装体。In other implementations of this embodiment, the material of the package 12 may also be glue, thereby forming a glue package.
在本实施例的一个示例中,线路板135包括线路板主体1351、连接带1352和连接板1353,感光芯片131电连接于线路板主体1351,连接带1352连接并电导通线路板主体1351和连接板1353,如图11A和图11C所示;在本实施例的另一个示例中,线路板135包括线路板主体1351和被设置于线路板135背面的焊盘,如图11B所示,感光芯片131被设置于线路板主体1351的正面,线路板135通过位于线路板135背面的焊盘与外部电子设备电连接,其中,线路板主体1351背面的焊盘也可以被替换为焊球或者其他电连接介质。In an example of this embodiment, the circuit board 135 includes a circuit board body 1351, a connecting strip 1352 and a connecting plate 1353. The photosensitive chip 131 is electrically connected to the circuit board body 1351, and the connecting strip 1352 connects and electrically conducts the circuit board body 1351 and the connection plate 1353. Board 1353, as shown in Figure 11A and Figure 11C; in another example of this embodiment, the circuit board 135 includes a circuit board body 1351 and a pad disposed on the back of the circuit board 135, as shown in Figure 11B, a photosensitive chip 131 is disposed on the front of the circuit board main body 1351. The circuit board 135 is electrically connected to external electronic devices through the pads on the back of the circuit board 135. The soldering pads on the back of the circuit board main body 1351 can also be replaced with solder balls or other electrical devices. Connect the media.
进一步地,提供第三实施例中的摄像模组10一种制造方法:提供一线路板135,线路板135包括一线路板主体1351,在线路板主体1351上设置一感光芯片131,通过引线137电连接感光芯片131和线路板主体1351;将晶圆级镜头11设置于感光芯片131的上方;设置封装体12包覆晶圆级镜头11、感光芯片131和线路板主体1351。Further, a manufacturing method of the camera module 10 in the third embodiment is provided: a circuit board 135 is provided, the circuit board 135 includes a circuit board main body 1351, a photosensitive chip 131 is disposed on the circuit board main body 1351, and through the leads 137 The photosensitive chip 131 and the circuit board main body 1351 are electrically connected; the wafer level lens 11 is placed above the photosensitive chip 131; the package 12 is set to cover the wafer level lens 11, the photosensitive chip 131 and the circuit board main body 1351.
在本实施例的一个示例中,也可以先将晶圆级镜头11先固定在感光芯片131的上方,然后再通过引线137电连接感光芯片131和线路板主体1351,这样可以避免晶圆级镜头11的设置过程造成引线137的损伤。而先设置引线137再设置晶圆级镜头11的方式则可以防止由于晶圆级镜头11的存在而导致引线137的设置受到阻碍的问题,例如由于设置引线137的设备与晶圆级镜头11发生干涉,导致晶圆级镜头11受到撞击。In an example of this embodiment, the wafer-level lens 11 can also be fixed above the photosensitive chip 131 first, and then electrically connect the photosensitive chip 131 and the circuit board main body 1351 through the lead 137, so as to avoid the need for wafer-level lens 131. The setting process of 11 causes damage to lead 137. The method of setting the lead 137 first and then setting the wafer-level lens 11 can prevent the installation of the lead 137 from being hindered by the presence of the wafer-level lens 11, for example, due to the equipment setting the lead 137 interfering with the wafer-level lens 11. Interference causes the wafer-level lens 11 to be impacted.
在本实施例的一个示例中,还可以包括一遮光部113设置步骤:在摄像模组10的物侧设置一遮光部113,以避免杂光进入摄像模组10的内部。In an example of this embodiment, a step of setting a light shielding portion 113 may also be included: setting a light shielding portion 113 on the object side of the camera module 10 to prevent stray light from entering the interior of the camera module 10 .
在本实施例的上述方法中,封装体12的设置通过模塑工艺进行,例如通过模压工艺(Molding)或者嵌入成型工艺(Insert Molding)形成封装体12。具体地,将线路板主体1351、感光芯片131和晶圆级镜头11放置于一模组成型模具中,将模塑材料填入到模组成型模具中,再固化模塑材料形成封装体12,封装体12包裹线路板主体1351、感光芯片131的非感光区域和晶圆级镜头11的周侧,以使镜头封装体12、线路板主体1351、感光芯片131和晶圆级镜头11一体结合。其中,模塑材料可以选择树脂、尼龙、LCP(Liquid Crystal Polymer,液晶高分子聚合物)、PP(Polypropylene,聚丙烯)等。In the above method of this embodiment, the package body 12 is provided through a molding process, for example, the package body 12 is formed through a molding process (Molding) or an insert molding process (Insert Molding). Specifically, the circuit board main body 1351, the photosensitive chip 131 and the wafer-level lens 11 are placed in a molding mold, the molding material is filled into the molding mold, and then the molding material is solidified to form the package body 12. The package 12 wraps the circuit board body 1351 , the non-photosensitive area of the photosensitive chip 131 and the peripheral side of the wafer level lens 11 , so that the lens package 12 , the circuit board body 1351 , the photosensitive chip 131 and the wafer level lens 11 are integrated. Among them, the molding materials can be resin, nylon, LCP (Liquid Crystal Polymer, liquid crystal polymer), PP (Polypropylene, polypropylene), etc.
值得一提的是,第三实施例中的摄像模组10同样也可以采用拼板的方式批量制造。提供一种第三实施例中的摄像模组10的制造方法,参照图12所示,摄像模组10的制造方法包括以下步骤S710-S750:It is worth mentioning that the camera module 10 in the third embodiment can also be mass-manufactured by panel assembly. A method of manufacturing the camera module 10 in the third embodiment is provided. Referring to FIG. 12 , the method of manufacturing the camera module 10 includes the following steps S710-S750:
步骤S710,提供一线路板拼板28。线路板拼板28包括多个相连的线路板135,线路板135包括线路板主体1351,线路板135之间可以通过线路板主体1351之间的连接相连。Step S710: Provide a circuit board panel 28. The circuit board panel 28 includes a plurality of connected circuit boards 135 . The circuit boards 135 include a circuit board main body 1351 . The circuit boards 135 can be connected through the connection between the circuit board main bodies 1351 .
步骤S720,在线路板拼板28上设置多个感光芯片131,将多个感光芯片131电连接于线路板拼板28。其中,多个感光芯片131通过引线137与线路板拼板28电连接。具体地,将多个感光芯片131分别固定于线路板拼板28中的多个线路板主体1351上,通过引线137将多个感光芯片131和多个线路板主体1351之间电导通。In step S720, multiple photosensitive chips 131 are arranged on the circuit board panel 28, and the multiple photosensitive chips 131 are electrically connected to the circuit board panel 28. Among them, a plurality of photosensitive chips 131 are electrically connected to the circuit board panel 28 through leads 137 . Specifically, the plurality of photosensitive chips 131 are respectively fixed on the plurality of circuit board bodies 1351 in the circuit board panel 28 , and the plurality of photosensitive chips 131 and the plurality of circuit board bodies 1351 are electrically connected through the leads 137 .
步骤S730,将多个晶圆级镜头11分别设置于多个感光芯片131上,使多个晶圆级镜头11分别位于多个感光芯片131的感光路径上。在一个示例中,多个晶圆级镜头11分别通过粘接介质固定于多个感光芯片131的非感光区。 In step S730, the plurality of wafer-level lenses 11 are respectively arranged on the plurality of photosensitive chips 131, so that the plurality of wafer-level lenses 11 are respectively located on the photosensitive paths of the plurality of photosensitive chips 131. In one example, the plurality of wafer-level lenses 11 are respectively fixed to the non-photosensitive areas of the plurality of photosensitive chips 131 through adhesive media.
步骤S740,向相邻的两个晶圆级镜头11和相邻的两个感光芯片131之间填充封装材料,固化封装材料形成一封装连体部23,封装连体部23一体结合于晶圆级镜头11、感光芯片131和线路板拼板28,以形成一模组拼板20。在本实施例中,封装材料可以为液态封装材料,封装材料包覆晶圆级镜头11、感光芯片131和线路板拼板28并在固化后一体结合于晶圆级镜头11、感光芯片131和线路板拼板28。Step S740: Fill the space between the two adjacent wafer-level lenses 11 and the two adjacent photosensitive chips 131 with packaging material, and solidify the packaging material to form a packaging conjoined part 23. The packaging conjoined part 23 is integrated with the wafer. The lens 11, the photosensitive chip 131 and the circuit board panel 28 form a module panel 20. In this embodiment, the packaging material may be a liquid packaging material. The packaging material covers the wafer-level lens 11, the photosensitive chip 131 and the circuit board panel 28, and is integrated with the wafer-level lens 11, the photosensitive chip 131 and the circuit board panel 28 after solidification. Circuit board puzzle 28.
步骤S750,沿高度方向分割模组拼板20,以形成多个摄像模组10。沿高度方向分割封装连体部23和线路板拼板28,得到多个独立的摄像模组10,封装连体部23被分割后形成多个独立的封装体12,线路板拼板28被分割后形成多个独立的线路板135。其中,图12中所示虚线即为分割的位置。Step S750: Divide the module panel 20 along the height direction to form multiple camera modules 10. The package conjoined part 23 and the circuit board panel 28 are divided along the height direction to obtain multiple independent camera modules 10. The package conjoined part 23 is divided to form a plurality of independent packages 12, and the circuit board panel 28 is divided. Finally, multiple independent circuit boards 135 are formed. Among them, the dotted line shown in Figure 12 is the position of division.
在本实施例的一个示例中,封装材料为模塑材料,封装连体部23通过模塑工艺一体结合于晶圆级镜头11、感光芯片131和线路板拼板28。具体地,在步骤S740中,将线路板拼板28、被固定于线路板拼板28上的多个感光芯片131和被分别固定于多个感光芯片131上的多个晶圆级镜头11放置于模组成型模具中,将模塑材料注入模组成型模具中,模塑材料固化形成封装连体部23,封装连体部23一体结合于晶圆级镜头11、感光芯片131和线路板拼板28形成一模组拼板20。由模塑材料组成的封装材料在固化、切割后得到的封装体12可以称为模塑封装体。In one example of this embodiment, the packaging material is a molding material, and the packaging conjoined portion 23 is integrated with the wafer-level lens 11 , the photosensitive chip 131 and the circuit board panel 28 through a molding process. Specifically, in step S740, the circuit board panel 28, the plurality of photosensitive chips 131 fixed on the circuit board panel 28, and the plurality of wafer-level lenses 11 respectively fixed on the plurality of photosensitive chips 131 are placed. In the molding mold, the molding material is injected into the molding mold, and the molding material solidifies to form the encapsulating conjoined part 23. The encapsulating conjoined part 23 is integrated with the wafer-level lens 11, the photosensitive chip 131 and the circuit board assembly. The panels 28 form a modular panel 20 . The package 12 obtained by curing and cutting the packaging material composed of the molding material may be called a molded package.
在本实施例的一个示例中,步骤S740中还可以进一步包括步骤:在模组拼板20的物侧设置一遮光层213,从而在分割模组拼板20后,可以得到包括遮光部113的摄像模组10,其中,遮光层213被分割后成为多个独立的遮光部113。In an example of this embodiment, step S740 may further include the step of setting a light-shielding layer 213 on the object side of the module panel 20, so that after the module panel 20 is divided, a light-shielding layer 213 including the light-shielding portion 113 can be obtained. In the camera module 10, the light shielding layer 213 is divided into a plurality of independent light shielding portions 113.
在本实施例的一个示例中,步骤S730提供的多个晶圆级镜头11即包括有遮光部113,遮光部113被设置于晶圆级透镜组件111的物侧。In an example of this embodiment, the plurality of wafer-level lenses 11 provided in step S730 include light-shielding portions 113 , and the light-shielding portions 113 are disposed on the object side of the wafer-level lens assembly 111 .
值得一提的是,步骤S710、步骤S720和步骤S730之间并无先后顺序,也没有相互关联,例如可以先将晶圆级镜头11固定于感光芯片131的非感光区,而后再将感光芯片131固定于线路板拼板28,形成一线路板拼板28、感光芯片131和晶圆级镜头11集成的半成品即可。It is worth mentioning that there is no sequence or correlation between steps S710, S720 and S730. For example, the wafer-level lens 11 can be fixed on the non-photosensitive area of the photosensitive chip 131 first, and then the photosensitive chip can be 131 is fixed on the circuit board panel 28 to form a semi-finished product integrating the circuit board panel 28, the photosensitive chip 131 and the wafer level lens 11.
进一步地,如图13和图14所示,提供本申请的摄像模组10的第四实施例。在本实施例中,进一步引入一盖板层29作为模组拼板20制造的基准,使用单个晶圆级镜头11和单个感光组件13倒装于盖板层29上,其制造的方法与前述摄像模组10的第一实施例、第二实施例和第三实施例均不相同,其不必特意调整镜头拼板21中的多个晶圆级镜头11之间的距离,也不必特意调整芯片拼板24中的多个感光芯片131之间的距离,适于使制造的成本降低。Further, as shown in Figures 13 and 14, a fourth embodiment of the camera module 10 of the present application is provided. In this embodiment, a cover layer 29 is further introduced as a basis for manufacturing the module panel 20 , and a single wafer-level lens 11 and a single photosensitive component 13 are flipped onto the cover layer 29 . The manufacturing method is the same as that described above. The first, second and third embodiments of the camera module 10 are all different. It is not necessary to specifically adjust the distance between the multiple wafer-level lenses 11 in the lens panel 21, nor to specifically adjust the chip. The distance between the plurality of photosensitive chips 131 in the panel 24 is suitable for reducing the manufacturing cost.
图13示出了本申请的摄像模组10的第四实施例的结构示意图,如图所示,该摄像模组10包括一晶圆级镜头11、一感光组件13、一封装体12以及一透光盖板15,晶圆级镜头11被设置于感光组件13的感光路径上,透光盖板15被设置于晶圆级镜头11的顶面(物侧),封装体12一体结合于透光盖板15、晶圆级镜头11和感光组件13。Figure 13 shows a schematic structural diagram of the fourth embodiment of the camera module 10 of the present application. As shown in the figure, the camera module 10 includes a wafer-level lens 11, a photosensitive component 13, a package 12 and a The light-transmitting cover 15 and the wafer-level lens 11 are arranged on the photosensitive path of the photosensitive component 13. The light-transmitting cover 15 is arranged on the top surface (object side) of the wafer-level lens 11. The package 12 is integrated with the transparent cover 15. Optical cover 15, wafer-level lens 11 and photosensitive component 13.
感光组件13包括一感光芯片131及一被设置于感光芯片131的电连接部133,感光芯片131通过电连接部133与外部电子设备电连接。在一个具体示例中,感光组件13还包括保护盖板132,电连接部133被设置于感光芯片131的背面,保护盖板132被盖设于感光芯片131上,保护盖板132被设置于感光芯片131的上方,用于保护感光芯片131,即,在该具体示例中,感光芯片131采用晶圆级CSP封装,感光芯片131被设置于保护盖板132与电连接部133之间,保护盖板132与电连接部133被相对地设置于感光芯片131的两侧。在该具体示例中,晶圆级镜头11被固定于感光组件13的保护盖板132从而被设置于感光组件13的感光路径上,晶圆级镜头11被固定于感光组件13。在本实施例的其他示例中,感光芯片131还可以采用COB工艺进行封装,感光组件13包括线路板135、被电连接于线路板135的感光芯片131、被设置于感光芯片131的正面的非感光区的电连接部133和用于电连接感光芯片131和线路板135的至少一引线137, 引线137电连接线路板135和电连接部133从而电导通感光芯片131和线路板135。The photosensitive component 13 includes a photosensitive chip 131 and an electrical connection part 133 provided on the photosensitive chip 131. The photosensitive chip 131 is electrically connected to an external electronic device through the electrical connection part 133. In a specific example, the photosensitive component 13 further includes a protective cover 132. The electrical connection portion 133 is provided on the back of the photosensitive chip 131. The protective cover 132 is covered on the photosensitive chip 131. The protective cover 132 is provided on the photosensitive chip 131. The top of the chip 131 is used to protect the photosensitive chip 131. That is, in this specific example, the photosensitive chip 131 is packaged in a wafer-level CSP. The photosensitive chip 131 is disposed between the protective cover 132 and the electrical connection part 133. The protective cover The board 132 and the electrical connection portion 133 are disposed oppositely on both sides of the photosensitive chip 131 . In this specific example, the wafer-level lens 11 is fixed to the protective cover 132 of the photosensitive component 13 so as to be disposed on the photosensitive path of the photosensitive component 13 . The wafer-level lens 11 is fixed to the photosensitive component 13 . In other examples of this embodiment, the photosensitive chip 131 can also be packaged using the COB process. The photosensitive component 13 includes a circuit board 135 , a photosensitive chip 131 electrically connected to the circuit board 135 , and a non-conductor chip disposed on the front side of the photosensitive chip 131 . The electrical connection part 133 of the photosensitive area and at least one lead 137 for electrically connecting the photosensitive chip 131 and the circuit board 135, The lead 137 electrically connects the circuit board 135 and the electrical connection portion 133 to electrically conduct the photosensitive chip 131 and the circuit board 135 .
透光盖板15被固定于晶圆级镜头11的顶面,透光盖板15呈平板状,透光盖板15的像侧面为平面,在本实施例的一个示例中,晶圆级镜头11的顶面为平面,从而使得透光盖板15可以平稳的贴附在晶圆级镜头11的顶面。具体地,晶圆级镜头11包括第一晶圆级透镜1114、第二晶圆级透镜1115和第三晶圆级透镜1116,其中,第一晶圆级透镜1114、第二晶圆级透镜1115和第三晶圆级透镜1116三个晶圆级透镜1111均包括透光基板11111和被设置于透光基板11111一侧的透镜单元11112,其中,第一晶圆级透镜1114的透镜单元11112位于透光基板11111的像侧,第二晶圆级透镜1115的透镜单元11112位于透光基板11111的物侧,第三晶圆级透镜1116的透镜单元11112位于透光基板11111的像侧。第一晶圆级透镜1114和第二晶圆级透镜1115相固定并使第一晶圆级透镜1114的透镜单元11112与第二晶圆级透镜1115的透镜单元11112相对,第二晶圆级透镜1115和第三晶圆级透镜1116相互固定并使第二晶圆级透镜1115的透镜单元11112与第三晶圆级透镜1116的透镜单元11112相背,其中第二晶圆级透镜1115和第三晶圆级透镜1116通过透光基板11111之间的粘接完成固定。在本实施例中,第一晶圆级透镜1114、第二晶圆级透镜1115和第三晶圆级透镜1116之间的固定可以通过设置在其间的粘接层完成,其中设置于第二晶圆级透镜1115的透光基板11111和设置于第三晶圆级透镜1116的透光基板11111之间的粘接层1112可以由光学胶形成。第一晶圆级透镜1114、第二晶圆级透镜1115和第三晶圆级透镜1116形成本申请所述的晶圆级透镜组件111。The light-transmitting cover 15 is fixed on the top surface of the wafer-level lens 11. The light-transmitting cover 15 is flat-shaped, and the image side of the light-transmitting cover 15 is flat. In an example of this embodiment, the wafer-level lens The top surface of 11 is flat, so that the light-transmitting cover 15 can be stably attached to the top surface of the wafer-level lens 11 . Specifically, the wafer-level lens 11 includes a first wafer-level lens 1114, a second wafer-level lens 1115, and a third wafer-level lens 1116, wherein the first wafer-level lens 1114, the second wafer-level lens 1115 and the third wafer-level lens 1116. Each of the three wafer-level lenses 1111 includes a light-transmitting substrate 11111 and a lens unit 11112 disposed on one side of the light-transmitting substrate 11111. The lens unit 11112 of the first wafer-level lens 1114 is located on On the image side of the light-transmitting substrate 11111, the lens unit 11112 of the second wafer-level lens 1115 is located on the object side of the light-transmitting substrate 11111, and the lens unit 11112 of the third wafer-level lens 1116 is located on the image side of the light-transmitting substrate 11111. The first wafer-level lens 1114 and the second wafer-level lens 1115 are fixed so that the lens unit 11112 of the first wafer-level lens 1114 faces the lens unit 11112 of the second wafer-level lens 1115. 1115 and the third wafer-level lens 1116 are fixed to each other and the lens unit 11112 of the second wafer-level lens 1115 is opposite to the lens unit 11112 of the third wafer-level lens 1116, wherein the second wafer-level lens 1115 and the third wafer-level lens 1116 are fixed to each other. The wafer-level lens 1116 is fixed by bonding between the light-transmitting substrates 11111. In this embodiment, the fixation between the first wafer-level lens 1114, the second wafer-level lens 1115 and the third wafer-level lens 1116 can be completed by an adhesive layer disposed therebetween, wherein the second wafer-level lens 1116 is disposed on the second wafer-level lens 1116. The adhesive layer 1112 provided between the light-transmitting substrate 11111 of the circular-level lens 1115 and the light-transmitting substrate 11111 of the third wafer-level lens 1116 may be formed of optical glue. The first wafer level lens 1114, the second wafer level lens 1115, and the third wafer level lens 1116 form the wafer level lens assembly 111 described herein.
透光盖板15可以采用例如玻璃等透光材料制成,透光盖板15适于透过光线。在本实施例中,透光盖板15的横向尺寸大于晶圆级镜头11和感光组件13的横向尺寸,从而沿高度方向,从摄像模组10的像侧(下方)向物侧(上方)看,透光盖板15露出,从而当封装体12设置在摄像模组10中时,封装体12一体成型于透光盖板15的底面(像侧)的一部分、晶圆级镜头11的周侧和感光组件13的周侧。封装体12提供了晶圆级镜头11和感光组件13周侧方向的保护。The light-transmitting cover 15 can be made of light-transmitting material such as glass, and the light-transmitting cover 15 is suitable for transmitting light. In this embodiment, the lateral size of the light-transmitting cover 15 is larger than the lateral size of the wafer-level lens 11 and the photosensitive component 13 , so that along the height direction, from the image side (bottom) of the camera module 10 to the object side (top) See, the light-transmitting cover 15 is exposed, so when the package 12 is installed in the camera module 10 , the package 12 is integrally formed on a part of the bottom surface (image side) of the light-transmitting cover 15 and the periphery of the wafer-level lens 11 side and the peripheral side of the photosensitive element 13 . The package 12 provides circumferential protection for the wafer-level lens 11 and the photosensitive component 13 .
在本实施例中,摄像模组10还可以进一步具有红外截止功能。具体地,可以通过使透光盖板15具有红外截止功能,使透光盖板15作为摄像模组10的滤光元件,滤除入射光线中例如红外光线等成像不需要的杂光;或者,可以使晶圆级镜头11中的任一晶圆级透镜1111的透光基板11111具有红外截止功能,从而使得晶圆级镜头11具有红外截止功能,从而对于进入感光芯片131的成像光线进行过滤;或者,可以使感光组件13中的保护盖板132具有红外截止功能,即将保护盖板132作为滤光元件,从而使得保护盖板132可以对于进入感光芯片131的成像光线进行过滤;又或者,可以进一步增加一滤光元件14,滤光元件14具有红外截止功能,在一个具体示例中,滤光元件14被设置于保护盖板132的上方,使得滤光元件14位于感光芯片131的感光路径上。In this embodiment, the camera module 10 may further have an infrared cutoff function. Specifically, the light-transmitting cover 15 can be used as a filter element of the camera module 10 by providing the light-transmitting cover 15 with an infrared cutoff function to filter out incident light such as infrared light and other unwanted stray light for imaging; or, The light-transmitting substrate 11111 of any wafer-level lens 1111 in the wafer-level lens 11 can be made to have an infrared cut-off function, so that the wafer-level lens 11 has an infrared cut-off function, thereby filtering the imaging light entering the photosensitive chip 131; Alternatively, the protective cover 132 in the photosensitive assembly 13 can be provided with an infrared cutoff function, that is, the protective cover 132 can be used as a filter element, so that the protective cover 132 can filter the imaging light entering the photosensitive chip 131; or, the protective cover 132 can be used as a filter element. A filter element 14 is further added. The filter element 14 has an infrared cutoff function. In a specific example, the filter element 14 is disposed above the protective cover 132 so that the filter element 14 is located on the photosensitive path of the photosensitive chip 131 .
进一步地,摄像模组10还包括一遮光部113,遮光部113用减小从晶圆级镜头11物侧入射的杂光。遮光部113被设置于晶圆级镜头11和透光盖板15之间,遮光部113可以是以丝印、涂墨或者涂胶的方式预先形成于晶圆级镜头11的第一晶圆级透镜1114的物侧或者保护盖板132的像侧,遮光部113也可以是先预制成型,而后被设置于晶圆级镜头11和透光盖板15之间。Furthermore, the camera module 10 further includes a light-shielding portion 113 , which is used to reduce stray light incident from the object side of the wafer-level lens 11 . The light-shielding portion 113 is disposed between the wafer-level lens 11 and the light-transmitting cover 15 . The light-shielding portion 113 can be the first wafer-level lens preformed on the wafer-level lens 11 by silk printing, ink coating, or glue coating. On the object side of 1114 or the image side of the protective cover 132 , the light-shielding portion 113 can also be pre-formed and then disposed between the wafer-level lens 11 and the light-transmitting cover 15 .
在本实施例中,摄像模组10可以通过将单个的晶圆级镜头11和单个的感光组件13叠设于保护盖板132上并通过封装体12一体结合于保护盖板132、晶圆级光学镜头和感光组件13形成;摄像模组10也可以采用拼板方式批量制造。In this embodiment, the camera module 10 can be constructed by stacking a single wafer-level lens 11 and a single photosensitive component 13 on the protective cover 132 and integrating the package 12 with the protective cover 132 and the wafer-level lens 13 . The optical lens and the photosensitive component 13 are formed; the camera module 10 can also be manufactured in batches using a panelization method.
参照图14所示,采用拼板方式批量制造的摄像模组10的第四实施例的制造方法包括以下步骤S810-S830:Referring to FIG. 14 , the manufacturing method of the fourth embodiment of the camera module 10 manufactured in batches using the panelization method includes the following steps S810-S830:
步骤S810,提供一盖板层29、多个晶圆级镜头11和多个感光组件13,沿高度方向堆叠并固定多个晶圆级镜头11和多个感光组件13于盖板层29上,以形成一模组拼板20,多个晶圆级镜头11和多个感光组件13被相互间隔地倒置于盖板层29上。多个晶圆级镜头11和多个感光组件13分别对齐,使晶圆级 镜头11的像面与感光组件13的感光芯片131的感光区重叠或者接近重叠,盖板层29、多个晶圆级镜头11和多个感光组件13之间可以通过设置粘接层固定,两处位置的粘接层的材质可以相同或者不同。多个晶圆级镜头11之间相互间隔,多个感光组件13之间相互间隔,多个晶圆级镜头11之间相互不接触,使多个晶圆级镜头11之间存在间距(间隙),在一个示例中,多个晶圆级镜头11之间等间距地固定于盖板层29。Step S810, provide a cover layer 29, multiple wafer-level lenses 11 and multiple photosensitive components 13, stack and fix the multiple wafer-level lenses 11 and multiple photosensitive components 13 on the cover layer 29 along the height direction, To form a module panel 20 , a plurality of wafer-level lenses 11 and a plurality of photosensitive components 13 are placed upside down on the cover layer 29 and spaced apart from each other. Multiple wafer-level lenses 11 and multiple photosensitive components 13 are respectively aligned, so that the wafer-level The image plane of the lens 11 overlaps or nearly overlaps with the photosensitive area of the photosensitive chip 131 of the photosensitive component 13. The cover layer 29, the multiple wafer-level lenses 11 and the multiple photosensitive components 13 can be fixed by providing an adhesive layer. The materials of the adhesive layers at the locations can be the same or different. The plurality of wafer-level lenses 11 are spaced apart from each other, the plurality of photosensitive components 13 are spaced apart from each other, and the plurality of wafer-level lenses 11 are not in contact with each other, so that there is a gap (gap) between the plurality of wafer-level lenses 11 , in one example, a plurality of wafer-level lenses 11 are fixed to the cover layer 29 at equal intervals.
步骤S820,向多个晶圆级镜头11和多个感光组件13之间填充封装材料,使封装材料包覆盖板层29的像侧(底侧)、晶圆级镜头11的周侧和感光组件13的周侧,固化封装材料形成一封装连体部23。固化后的封装连体部23一体结合于盖板层29的像侧和晶圆级镜头11和感光组件13的周侧。盖板层29的像侧是指盖板层29朝向晶圆级镜头11的一侧,也即盖板层29的底侧。Step S820: Fill packaging material between the plurality of wafer-level lenses 11 and the plurality of photosensitive components 13, so that the packaging material covers the image side (bottom side) of the plate layer 29, the peripheral side of the wafer-level lenses 11 and the photosensitive components. On the peripheral side of the component 13, the cured packaging material forms a packaging connected portion 23. The cured package joint portion 23 is integrally coupled to the image side of the cover layer 29 and the peripheral side of the wafer-level lens 11 and the photosensitive component 13 . The image side of the cover layer 29 refers to the side of the cover layer 29 facing the wafer-level lens 11 , that is, the bottom side of the cover layer 29 .
步骤S830,沿高度方向分割模组拼板20,分割封装连体部23和盖板层29,以形成多个摄像模组10。封装连体部23被分割后形成摄像模组10中的封装体12,盖板层29被分割后适于得到多个独立的透光盖板15。Step S830 , divide the module panel 20 along the height direction, and divide the encapsulation conjoined part 23 and the cover layer 29 to form multiple camera modules 10 . The package conjoined portion 23 is divided to form the package body 12 in the camera module 10 , and the cover layer 29 is divided to obtain a plurality of independent light-transmitting cover plates 15 .
在步骤S810中,在沿高度方向堆叠并固定多个晶圆级镜头11和多个感光组件13于盖板层29上的过程中,可以先将多个晶圆级镜头11倒置地固定于盖板层29,再将多个感光组件13分别与多个晶圆级镜头11对齐并倒置地固定于多个晶圆级镜头11的像侧;也可以先将多个晶圆级镜头11和多个感光组件13分别固定形成一模组半成品,而后再将该模组半成品倒置地固定于盖板层29,从而可以降低晶圆级镜头11和感光组件13之间的对齐难度。In step S810 , during the process of stacking and fixing multiple wafer-level lenses 11 and multiple photosensitive components 13 on the cover layer 29 along the height direction, the multiple wafer-level lenses 11 may first be fixed on the cover upside down. On the plate layer 29, the plurality of photosensitive components 13 are respectively aligned with the plurality of wafer-level lenses 11 and fixed upside down on the image side of the plurality of wafer-level lenses 11; The photosensitive components 13 are respectively fixed to form a module semi-finished product, and then the module semi-finished product is fixed upside down to the cover layer 29, thereby reducing the difficulty of alignment between the wafer-level lens 11 and the photosensitive components 13.
在本实施例的一个示例中,晶圆级镜头11的顶面与盖板层29的像侧面相匹配,盖板层29呈平板状,盖板层29的像侧面为平面,从而顶面为平面的晶圆级镜头11可以平稳的贴附于盖板层29的像侧面上。In an example of this embodiment, the top surface of the wafer-level lens 11 matches the image side of the cover layer 29 , the cover layer 29 is flat, and the image side of the cover layer 29 is flat, so that the top surface is The flat wafer-level lens 11 can be stably attached to the image side of the cover layer 29 .
在本实施例的一个示例中,模组拼板20还包括设置于晶圆级镜头11的晶圆级透镜组件111和盖板层29之间的遮光层213,盖板层29上通过丝印、涂墨或者涂胶的方式设置一遮光层213,遮光层213上预留多个通光孔以提供晶圆级镜头11光线入射的通道。In an example of this embodiment, the module panel 20 also includes a light-shielding layer 213 disposed between the wafer-level lens component 111 of the wafer-level lens 11 and the cover layer 29 , which is screen-printed, A light-shielding layer 213 is provided by applying ink or glue, and a plurality of light holes are reserved on the light-shielding layer 213 to provide a channel for light to enter the wafer-level lens 11 .
在本实施例中,由于采用倒置的方式将晶圆级镜头11和感光组件13固定于盖板层29,感光组件13的电连接部133在制造过程中不易受到损伤,因此,在一个示例中,步骤S810提供的感光组件13包括感光芯片131和被设置于感光芯片131背面的电连接部133。In this embodiment, since the wafer-level lens 11 and the photosensitive component 13 are fixed to the cover layer 29 in an inverted manner, the electrical connection portion 133 of the photosensitive component 13 is less susceptible to damage during the manufacturing process. Therefore, in one example, , the photosensitive component 13 provided in step S810 includes a photosensitive chip 131 and an electrical connection portion 133 provided on the back of the photosensitive chip 131 .
在本实施例的一个示例中,在步骤S810中,进一步提供多个滤光元件14,使多个滤光元件14被分别设置于多个晶圆级镜头11和保护层22之间。In an example of this embodiment, in step S810 , a plurality of filter elements 14 are further provided, so that the plurality of filter elements 14 are respectively disposed between the plurality of wafer-level lenses 11 and the protective layer 22 .
在本实施例的一个示例中,在步骤S820中填充的封装材料为液态封装材料,固化液态封装材料后形成封装连体部23。借助液态封装材料的流动性,液态封装材料可以与盖板层29的底面和晶圆级镜头11、感光组件13的周侧充分接触,在固化液态封装材料后,形成的封装连体部23也能够完全包覆盖板层29的底面和晶圆级镜头11、感光组件13的周侧。封装材料优选固化后呈黑色的材料,从而使摄像模组10中的封装体12呈黑色,具有较好的防杂光作用。In an example of this embodiment, the packaging material filled in step S820 is a liquid packaging material. After the liquid packaging material is cured, the packaging conjoined portion 23 is formed. With the fluidity of the liquid encapsulating material, the liquid encapsulating material can fully contact the bottom surface of the cover layer 29 and the peripheral sides of the wafer-level lens 11 and the photosensitive component 13. After the liquid encapsulating material is cured, the formed encapsulating conjoined portion 23 is also It can completely cover the bottom surface of the plate layer 29 and the peripheral sides of the wafer-level lens 11 and the photosensitive component 13 . The packaging material is preferably a material that turns black after curing, so that the package body 12 in the camera module 10 turns black and has a better anti-stray light effect.
在一个具体示例中,封装材料可以是胶水,向多个晶圆级镜头11和多个感光组件13之间填充胶水,胶水固化后形成的封装连体部23被分割后可以得到胶水封装体,即采用胶水工艺封装晶圆级镜头11和感光组件13的周侧。具体地,胶水采用不透光的胶水,例如黑色的胶水,以使封装材料可以减少杂光从侧面进入。进一步地,为避免上胶水中存在气泡,使得固化后形成的封装连体部23不能完全包覆晶圆级镜头11和感光组件13的侧面,可以以喷雾的方式在多个晶圆级镜头11和多个感光组件13之间填充胶水,从而避免气泡的产生,或者也可以以点状画胶的方式在多个晶圆级镜头11和多个感光组件13之间填充胶水。In a specific example, the packaging material may be glue. The glue is filled between the multiple wafer-level lenses 11 and the multiple photosensitive components 13 . After the glue is cured, the encapsulation conjoined portion 23 formed can be divided to obtain a glue encapsulation body. That is, a glue process is used to encapsulate the peripheral sides of the wafer-level lens 11 and the photosensitive component 13 . Specifically, the glue is opaque, such as black glue, so that the encapsulation material can reduce stray light entering from the side. Furthermore, in order to avoid the existence of bubbles in the glue and prevent the encapsulation conjoined portion 23 formed after curing from completely covering the sides of the wafer-level lens 11 and the photosensitive component 13 , multiple wafer-level lenses 11 can be sprayed Glue is filled between the multiple wafer-level lenses 11 and the multiple photosensitive components 13 to avoid the generation of air bubbles, or glue can be filled between the multiple wafer-level lenses 11 and the multiple photosensitive components 13 in a dot-like manner.
在另一个具体示例中,封装材料也可以是模塑材料,将模组拼板20设置于模组成型模具中,向模 组成型模具中注入模塑材料,使模塑材料在多个晶圆级镜头11和多个感光组件13之间流动,从而将模塑材料包覆盖板层29的像侧(底侧)、晶圆级镜头11的周侧和感光组件13的周侧进而固化模塑材料形成封装连体部23,分割该封装连体部23可以得到模塑封装体。其中,可以通过冷却或者加热的方式固化模塑材料,具体由模塑材料的性质决定。In another specific example, the encapsulation material may also be a molding material, and the module panel 20 is placed in the molding mold and toward the mold. The molding material is injected into the component mold, causing the molding material to flow between the plurality of wafer-level lenses 11 and the plurality of photosensitive components 13, thereby covering the image side (bottom side) of the plate layer 29 with the molding material. The peripheral sides of the wafer-level lens 11 and the peripheral side of the photosensitive component 13 are further solidified to form a package conjoined part 23. The package conjoined part 23 can be divided to obtain a molded package. Among them, the molding material can be solidified by cooling or heating, which is determined by the properties of the molding material.
设置不同的封装材料可以依据多个晶圆级镜头11和多个感光组件13之间的间隙深度和宽度进行选择,例如对于深度较深或宽度较窄的间隙选择流动性较好的封装材料,而对于深度较浅或宽度较宽的间隙可以使用流动性较差的封装材料。Different packaging materials can be selected according to the depth and width of the gaps between the multiple wafer-level lenses 11 and the multiple photosensitive components 13. For example, for a gap with a deeper depth or a narrower width, a packaging material with better fluidity is selected. For gaps that are shallower in depth or wider in width, less fluid encapsulation materials can be used.
在本申请中,摄像模组10的第三实施例和第四实施例并没有采用拼板状态的镜头拼板21或者芯片拼板24进行直接的制造,使得晶圆级镜头11和感光芯片131之间可以单独的对齐,减小了组装公差,从而可以使摄像模组10的成像品质提升。In this application, the third and fourth embodiments of the camera module 10 do not use the lens panel 21 or the chip panel 24 in a paneled state for direct manufacturing, so that the wafer-level lens 11 and the photosensitive chip 131 They can be individually aligned, which reduces assembly tolerances, thereby improving the imaging quality of the camera module 10 .
值得注意的是,在本申请中,封装材料优选固化后呈黑色的材料,从而使摄像模组10中的封装体12呈黑色,具有较好的防杂光作用。It is worth noting that in this application, the packaging material is preferably a material that turns black after curing, so that the package 12 in the camera module 10 turns black and has a better anti-stray light effect.
值得注意的是,在本申请中,相邻晶圆级透镜1111之间相互固定并形成一充满空气的空间,而由于晶圆级镜头11或者采用晶圆级镜头11的摄像模组10要经过烘烤环节,在高温下,相邻晶圆级透镜1111之间的空气发生膨胀,从而有导致相邻晶圆级透镜1111之间的相对位置发生变化的风险。为减低上述风险,可以使相邻晶圆级透镜1111之间的空气减小,在一个实施例中,使相邻晶圆级透镜1111的相对面的面型相反,例如图13所示意的摄像模组10,使第一晶圆级透镜1114的像侧面的面型为凹面,而使第二晶圆级透镜1115的物侧面的面型为凸面,两者相互配合,使第一晶圆级透镜1114和第二晶圆级透镜1115之间的平均间隙变小,从而使第一晶圆级透镜1114和第二晶圆级透镜1115之间的空气变少,减少在高温下成像品质下降的风险。It is worth noting that in this application, adjacent wafer-level lenses 1111 are fixed to each other and form a space filled with air. Since the wafer-level lens 11 or the camera module 10 using the wafer-level lens 11 has to pass through During the baking process, at high temperatures, the air between adjacent wafer-level lenses 1111 expands, which risks causing the relative position between adjacent wafer-level lenses 1111 to change. In order to reduce the above risk, the air between adjacent wafer-level lenses 1111 can be reduced. In one embodiment, the surface shapes of the opposite surfaces of adjacent wafer-level lenses 1111 are opposite, such as the imaging shown in Figure 13 In the module 10, the image side surface of the first wafer level lens 1114 is concave, and the object side surface of the second wafer level lens 1115 is convex. The two cooperate with each other to make the first wafer level lens 1115 concave. The average gap between the lens 1114 and the second wafer-level lens 1115 becomes smaller, thereby reducing the air between the first wafer-level lens 1114 and the second wafer-level lens 1115, reducing the risk of image quality degradation at high temperatures. risk.
以上描述了本申请的基本原理、主要特征和本申请的优点。本行业的技术人员应该了解,本申请不受上述实施例的限制,上述实施例和说明书中描述的只是本申请的原理,在不脱离本申请精神和范围的前提下本申请还会有各种变化和改进,这些变化和改进都落入要求保护的本申请的范围内。本申请要求的保护范围由所附的权利要求书及其等同物界定。 The above describes the basic principles, main features and advantages of the present application. Those skilled in the industry should understand that the present application is not limited by the above-mentioned embodiments. What is described in the above-mentioned embodiments and descriptions is only the principle of the present application. The present application will have various applications without departing from the spirit and scope of the present application. changes and improvements that fall within the scope of the claimed application. The scope of protection claimed in this application is defined by the appended claims and their equivalents.

Claims (40)

  1. 一种摄像模组,其特征在于,包括:A camera module, characterized by including:
    晶圆级镜头;Wafer-level lenses;
    感光组件,所述晶圆级镜头被设置于所述感光组件的感光路径上,所述感光组件包括感光芯片和被盖设于所述感光芯片上方的保护盖板;Photosensitive component, the wafer-level lens is disposed on the photosensitive path of the photosensitive component, the photosensitive component includes a photosensitive chip and a protective cover covered above the photosensitive chip;
    封装体,所述封装体一体成型于所述晶圆级镜头的周侧和所述保护盖板的周侧。An encapsulation body, the encapsulation body is integrally formed on the circumferential side of the wafer-level lens and the circumferential side of the protective cover.
  2. 根据权利要求1所述的摄像模组,其中,所述保护盖板的横向尺寸小于所述感光芯片的横向尺寸,所述封装体一体成型于所述感光芯片的正面的至少一部分。The camera module according to claim 1, wherein the lateral size of the protective cover is smaller than the lateral size of the photosensitive chip, and the package is integrally formed on at least a part of the front surface of the photosensitive chip.
  3. 根据权利要求1所述的摄像模组,其中,所述感光组件还包括侧连部,所述侧连部一体成型于所述感光芯片的周侧,所述侧连部的横向尺寸大于所述保护盖板的横向尺寸,所述封装体一体成型于所述侧连部的正面的至少一部分。The camera module according to claim 1, wherein the photosensitive component further includes a side connecting portion, the side connecting portion is integrally formed on the peripheral side of the photosensitive chip, and the lateral size of the side connecting portion is larger than the side connecting portion. The lateral dimension of the protective cover is protected, and the package body is integrally formed on at least a part of the front surface of the side connecting portion.
  4. 根据权利要求1至3任一所述的摄像模组,其中,所述摄像模组还包括被设置于所述晶圆级镜头和所述感光组件之间的滤光元件,所述封装体一体成型于所述滤光元件的周侧。The camera module according to any one of claims 1 to 3, wherein the camera module further includes a filter element disposed between the wafer-level lens and the photosensitive component, and the package is integrated Molded on the peripheral side of the filter element.
  5. 根据权利要求1至3任一所述的摄像模组,其中,所述感光芯片还包括被设置于所述感光芯片的背面的电连接部。The camera module according to any one of claims 1 to 3, wherein the photosensitive chip further includes an electrical connection portion provided on the back side of the photosensitive chip.
  6. 根据权利要求5所述的摄像模组,其中,所述感光组件还包括线路板和电子元件,所述线路板被设置于所述感光芯片的背面,所述线路板包括线路板主体和底封装部,所述感光芯片被设置于所述线路板主体的正面并通过所述电连接部电连接于所述线路板主体,所述电子元件被设置于所述线路板主体的背面,所述底封装部通过模塑工艺一体成型于所述线路板主体的背面,所述电子元件被模塑于所述底封装部的内部。The camera module according to claim 5, wherein the photosensitive component further includes a circuit board and electronic components, the circuit board is disposed on the back of the photosensitive chip, the circuit board includes a circuit board body and a bottom package part, the photosensitive chip is disposed on the front surface of the circuit board main body and is electrically connected to the circuit board main body through the electrical connection part, the electronic component is disposed on the back surface of the circuit board main body, and the bottom The packaging part is integrally formed on the back side of the circuit board body through a molding process, and the electronic components are molded inside the bottom packaging part.
  7. 一种摄像模组的制造方法,其特征在于,包括:A method of manufacturing a camera module, which is characterized by including:
    沿高度方向堆叠并固定一镜头拼板、一保护层和一芯片拼板形成一模组拼板;Stack and fix a lens panel, a protective layer and a chip panel along the height direction to form a module panel;
    沿高度方向分割所述模组拼板中的所述镜头拼板和所述保护层以形成多个晶圆级镜头和多个保护盖板,相邻的两个所述晶圆级镜头和相邻的两个所述保护盖板之间形成一上分割槽;Divide the lens panel and the protective layer in the module panel along the height direction to form a plurality of wafer-level lenses and a plurality of protective cover plates, two adjacent wafer-level lenses and phase An upper dividing groove is formed between two adjacent protective covers;
    向所述上分割槽中填充封装材料,固化所述封装材料形成一封装连体部,所述封装连体部一体成型于所述晶圆级镜头和所述保护盖板的周侧;Filling the upper dividing groove with packaging material, and solidifying the packaging material to form a packaging conjoined part, the packaging conjoined part is integrally formed on the peripheral side of the wafer-level lens and the protective cover;
    沿高度方向分割所述模组拼板,分割所述封装连体部和所述芯片拼板,以形成多个摄像模组。The module panel is divided along the height direction, and the package conjoined portion and the chip panel are divided to form multiple camera modules.
  8. 根据权利要求7所述的摄像模组的制造方法,其中,在所述固化所述封装材料形成所述封装连体部的步骤后,在所述芯片拼板的多个感光芯片的背面设置电连接部。The manufacturing method of a camera module according to claim 7, wherein after the step of curing the packaging material to form the packaging conjoined portion, electrical circuits are provided on the backs of the plurality of photosensitive chips of the chip panel. Connector.
  9. 根据权利要求7所述的摄像模组的制造方法,其中,所述芯片拼板包括多个感光芯片和被设置于多个所述感光芯片之间的连体部。The method of manufacturing a camera module according to claim 7, wherein the chip panel includes a plurality of photosensitive chips and a conjoined portion disposed between the plurality of photosensitive chips.
  10. 根据权利要求7至9任一所述的摄像模组的制造方法,其中,所述封装材料为模塑材料或者胶水。The manufacturing method of a camera module according to any one of claims 7 to 9, wherein the packaging material is a molding material or glue.
  11. 一种摄像模组,其特征在于,包括:A camera module, characterized by including:
    晶圆级镜头;Wafer-level lenses;
    感光芯片,所述晶圆级镜头被设置于所述感光芯片的感光路径上; Photosensitive chip, the wafer-level lens is arranged on the photosensitive path of the photosensitive chip;
    线路板,所述感光芯片被设置于所述线路板;A circuit board, the photosensitive chip is disposed on the circuit board;
    封装体,所述封装体一体成型于所述晶圆级镜头、所述感光芯片和所述线路板。A package body, which is integrally formed on the wafer-level lens, the photosensitive chip and the circuit board.
  12. 根据权利要求11所述的摄像模组,其中,所述摄像模组进一步包括至少一引线,至少一所述引线被设置于所述感光芯片和所述线路板之间,至少一所述引线被所述封装体包裹。The camera module of claim 11, wherein the camera module further includes at least one lead, at least one of the leads is disposed between the photosensitive chip and the circuit board, and at least one of the leads is The package is wrapped.
  13. 根据权利要求11所述的摄像模组,其中,所述封装体包覆所述线路板的正面的至少一部分、所述感光芯片的周侧和正面的至少一部分、以及所述晶圆级镜头的周侧。The camera module according to claim 11, wherein the package covers at least part of the front surface of the circuit board, at least part of the peripheral side and front surface of the photosensitive chip, and the wafer-level lens. Peripheral side.
  14. 根据权利要求13所述的摄像模组,其中,所述感光芯片包括感光区和围绕所述感光区的非感光区,所述封装体沿水平方向延伸至所述感光芯片的所述非感光区,所述封装体沿高度方向延伸至所述晶圆级镜头的顶部,所述封装体一体成型于所述感光芯片的周侧和所述晶圆级镜头的周侧。The camera module according to claim 13, wherein the photosensitive chip includes a photosensitive area and a non-photosensitive area surrounding the photosensitive area, and the package extends in a horizontal direction to the non-photosensitive area of the photosensitive chip , the package extends along the height direction to the top of the wafer-level lens, and the package is integrally formed on the peripheral side of the photosensitive chip and the peripheral side of the wafer-level lens.
  15. 根据权利要求14所述的摄像模组,其中,所述封装体具有竖直的外侧面,所述封装体的上部的横向尺寸等于所述封装体的底部的横向尺寸。The camera module according to claim 14, wherein the package body has a vertical outer side, and the lateral size of the upper part of the package body is equal to the lateral size of the bottom part of the package body.
  16. 根据权利要求14所述的摄像模组,其中,所述封装体的外侧面呈倾斜状,所述封装体的外径由上到下增大,所述封装体的底部的横向尺寸大于所述封装体的上部的横向尺寸。The camera module according to claim 14, wherein the outer surface of the package is inclined, the outer diameter of the package increases from top to bottom, and the lateral dimension of the bottom of the package is larger than the The lateral dimension of the upper part of the package.
  17. 一种摄像模组的组装方法,其特征在于,包括:A method of assembling a camera module, which is characterized by including:
    提供一线路板拼板;Provide a circuit board panel;
    在所述线路板拼板上设置多个感光芯片,将多个所述感光芯片电连接于所述线路板拼板;A plurality of photosensitive chips are provided on the circuit board panel, and the plurality of photosensitive chips are electrically connected to the circuit board panel;
    在多个所述感光芯片上设置多个晶圆级镜头,多个所述晶圆级镜头分别位于多个所述感光芯片的感光路径上;A plurality of wafer-level lenses are provided on a plurality of the photosensitive chips, and the plurality of wafer-level lenses are respectively located on the photosensitive paths of a plurality of the photosensitive chips;
    向相邻的两个所述晶圆级镜头和相邻的两个所述感光芯片之间填充封装材料,固化所述封装材料形成封装连体部,所述封装连体部一体结合于所述晶圆级镜头、所述感光芯片和所述线路板拼板,以形成一模组拼板;Filling packaging material between two adjacent wafer-level lenses and two adjacent photosensitive chips, curing the packaging material to form a packaging conjoined part, the packaging conjoined part is integrally combined with the The wafer-level lens, the photosensitive chip and the circuit board are assembled to form a module assembly;
    沿高度方向分割所述模组拼板,以形成多个摄像模组。The module panels are divided along the height direction to form multiple camera modules.
  18. 根据权利要求17所述的摄像模组的组装方法,其中,所述封装材料为模塑材料,所述封装连体部通过模塑工艺一体成型于所述晶圆级镜头、所述感光芯片和所述线路板拼板。The assembly method of a camera module according to claim 17, wherein the packaging material is a molding material, and the packaging conjoined part is integrally formed on the wafer-level lens, the photosensitive chip and the The circuit board is assembled into panels.
  19. 根据权利要求18所述的摄像模组的组装方法,其中,所述封装连体部切割后形成封装体,所述线路板拼板切割后形成多个线路板,所述封装体包覆所述线路板的正面的至少一部分、所述感光芯片的周侧和正面的至少一部分、以及所述晶圆级镜头的周侧。The assembly method of a camera module according to claim 18, wherein the package conjoined portion is cut to form a package body, the circuit board panel is cut to form a plurality of circuit boards, and the package body covers the At least part of the front side of the circuit board, at least part of the peripheral side and the front side of the photosensitive chip, and the peripheral side of the wafer-level lens.
  20. 根据权利要求19所述的摄像模组的组装方法,其中,在所述形成模组拼板的步骤后,在所述模组拼板的物侧设置遮光层,所述遮光层被设置于所述封装连体部的顶面,朝向所述晶圆级镜头方向延伸。The method of assembling a camera module according to claim 19, wherein after the step of forming the module panel, a light-shielding layer is provided on the object side of the module panel, and the light-shielding layer is provided on the object side of the module panel. The top surface of the package joint portion extends toward the wafer-level lens.
  21. 一种摄像模组,其特征在于,包括:A camera module, characterized by including:
    晶圆级镜头;Wafer-level lenses;
    感光组件,所述晶圆级镜头被设置于所述感光组件的感光路径上,所述感光组件包括感光芯片和被盖设于所述感光芯片上方的保护盖板; Photosensitive component, the wafer-level lens is disposed on the photosensitive path of the photosensitive component, the photosensitive component includes a photosensitive chip and a protective cover covered above the photosensitive chip;
    封装体,所述封装体一体成型于所述晶圆级镜头的周侧、所述保护盖板的周侧和所述感光芯片的周侧。An encapsulation body is integrally formed on the circumferential side of the wafer-level lens, the circumferential side of the protective cover, and the circumferential side of the photosensitive chip.
  22. 根据权利要求21所述的摄像模组,其中,所述封装体包括上封装体和下封装体,所述上封装体一体成型于所述晶圆级镜头的周侧和所述保护盖板的周侧,所述下封装体一体成型于所述感光芯片的周侧。The camera module according to claim 21, wherein the package includes an upper package and a lower package, and the upper package is integrally formed on the peripheral side of the wafer-level lens and the protective cover. On the peripheral side, the lower package body is integrally formed on the peripheral side of the photosensitive chip.
  23. 根据权利要求22所述的摄像模组,其中,所述感光组件还包括侧连部,所述侧连部一体成型于所述感光芯片的周侧,所述下封装体一体成型于所述侧连部的周侧。The camera module according to claim 22, wherein the photosensitive component further includes a side connecting portion, the side connecting portion is integrally formed on the peripheral side of the photosensitive chip, and the lower package body is integrally formed on the side. The surrounding side of the company headquarters.
  24. 根据权利要求23所述的摄像模组,其中,所述感光芯片的横向尺寸小于所述保护盖板的横向尺寸。The camera module according to claim 23, wherein the lateral size of the photosensitive chip is smaller than the lateral size of the protective cover.
  25. 根据权利要求21至24任一所述的摄像模组,其中,所述感光芯片还包括被设置于所述感光芯片的背面的电连接部。The camera module according to any one of claims 21 to 24, wherein the photosensitive chip further includes an electrical connection portion provided on the back side of the photosensitive chip.
  26. 根据权利要求21至24任一所述的摄像模组,其中,所述摄像模组还包括被设置于所述晶圆级镜头和所述感光组件之间的滤光元件,所述上封装体一体成型于所述滤光元件的周侧。The camera module according to any one of claims 21 to 24, wherein the camera module further includes a filter element disposed between the wafer-level lens and the photosensitive component, and the upper package body It is integrally formed on the peripheral side of the filter element.
  27. 一种摄像模组的制造方法,其特征在于,包括:A method of manufacturing a camera module, which is characterized by including:
    沿高度方向堆叠并固定一镜头拼板、一保护层和一芯片拼板形成一模组拼板;Stack and fix a lens panel, a protective layer and a chip panel along the height direction to form a module panel;
    沿高度方向分割所述模组拼板中的所述镜头拼板和所述保护层以形成多个晶圆级镜头和多个保护盖板,相邻的两个所述晶圆级镜头和相邻的两个所述保护盖板之间形成一上分割槽;Divide the lens panel and the protective layer in the module panel along the height direction to form a plurality of wafer-level lenses and a plurality of protective cover plates, two adjacent wafer-level lenses and phase An upper dividing groove is formed between two adjacent protective covers;
    向所述上分割槽中填充第一封装材料,固化所述第一封装材料形成一上封装连体部;Fill the upper dividing groove with a first packaging material, and solidify the first packaging material to form an upper packaging conjoined part;
    沿高度方向分割所述模组拼板中的所述芯片拼板以形成多个独立的感光芯片,相邻的两个所述感光芯片之间形成一下分割槽;Divide the chip panel in the module panel along the height direction to form a plurality of independent photosensitive chips, and form a dividing groove between two adjacent photosensitive chips;
    向所述下分割槽中填充第二封装材料,固化所述第二封装材料形成一下封装连体部,所述下封装连体部一体成型于所述上封装连体部形成一封装连体部;Fill the lower dividing groove with a second packaging material, and solidify the second packaging material to form a lower packaging conjoined part. The lower packaging conjoined part is integrally molded with the upper packaging conjoined part to form a package conjoined part. ;
    沿高度方向分割所述模组拼板,以形成多个摄像模组。The module panels are divided along the height direction to form multiple camera modules.
  28. 根据权利要求27所述的摄像模组的制造方法,其中,在所述固化所述第一封装材料形成所述上封装连体部的步骤后,在所述芯片拼板的多个感光芯片的背面设置电连接部。The manufacturing method of a camera module according to claim 27, wherein after the step of curing the first packaging material to form the upper packaging conjoined portion, the plurality of photosensitive chips of the chip panel are An electrical connection part is provided on the back.
  29. 根据权利要求27所述的摄像模组的制造方法,其中,所述芯片拼板包括多个感光芯片和被设置于多个所述感光芯片之间的连体部。The manufacturing method of a camera module according to claim 27, wherein the chip panel includes a plurality of photosensitive chips and a conjoined portion disposed between the plurality of photosensitive chips.
  30. 根据权利要求27至29任一所述的摄像模组的制造方法,其中,所述第一封装材料与所述第二封装材料采用不同的材料。The manufacturing method of a camera module according to any one of claims 27 to 29, wherein the first packaging material and the second packaging material are made of different materials.
  31. 一种摄像模组,其特征在于,包括:A camera module, characterized by including:
    晶圆级镜头;Wafer-level lenses;
    透光盖板,所述透光盖板被固定于所述晶圆级镜头的顶面;A light-transmitting cover plate, the light-transmitting cover plate is fixed on the top surface of the wafer-level lens;
    感光组件,所述晶圆级镜头被设置于所述感光组件的感光路径上;Photosensitive component, the wafer-level lens is disposed on the photosensitive path of the photosensitive component;
    封装体,所述封装体一体成型于所述透光盖板的底面的一部分、所述晶圆级镜头的侧面和所述感光组件的侧面。A package body, which is integrally formed on a part of the bottom surface of the light-transmitting cover plate, the side surface of the wafer-level lens, and the side surface of the photosensitive component.
  32. 根据权利要求31所述的摄像模组,其中,所述透光盖板的横向尺寸大于所述晶圆级镜头和所述感 光组件的横向尺寸,所述晶圆级镜头的顶面为平面。The camera module according to claim 31, wherein the transverse size of the transparent cover is larger than that of the wafer-level lens and the sensor. The lateral dimensions of the optical component, the top surface of the wafer-level lens is flat.
  33. 根据权利要求31所述的摄像模组,其中,所述透光盖板具有红外截止功能。The camera module according to claim 31, wherein the light-transmitting cover has an infrared cutoff function.
  34. 根据权利要求31至33任一所述的摄像模组,其中,所述摄像模组还包括遮光部,所述遮光部被设置于所述晶圆级镜头和所述透光盖板之间。The camera module according to any one of claims 31 to 33, wherein the camera module further includes a light-shielding portion, the light-shielding portion being disposed between the wafer-level lens and the light-transmitting cover.
  35. 根据权利要求31至33任一所述的摄像模组,其中,所述感光组件包括感光芯片、被盖设于所述感光芯片上方的保护盖板和被设置于所述感光芯片的背面的电连接部。The camera module according to any one of claims 31 to 33, wherein the photosensitive component includes a photosensitive chip, a protective cover disposed above the photosensitive chip, and a circuit disposed on the back of the photosensitive chip. Connector.
  36. 一种摄像模组的制造方法,其特征在于,包括:A method of manufacturing a camera module, which is characterized by including:
    提供一盖板层、多个晶圆级镜头和多个感光组件,沿高度方向堆叠并固定多个所述晶圆级镜头和多个所述感光组件于所述盖板层上,以形成一模组拼板,多个所述晶圆级镜头和多个所述感光组件被相互间隔地倒置于所述盖板层上;Provide a cover layer, a plurality of wafer-level lenses and a plurality of photosensitive components, stack and fix a plurality of the wafer-level lenses and a plurality of the photosensitive components on the cover layer along the height direction to form a In a module panel, a plurality of the wafer-level lenses and a plurality of the photosensitive components are placed upside down on the cover layer at a distance from each other;
    向多个所述晶圆级镜头和多个所述感光组件之间填充封装材料,使所述封装材料包覆所述盖板层的像侧、所述晶圆级镜头的周侧和所述感光组件的周侧,固化所述封装材料形成一封装连体部;Filling packaging material between the plurality of wafer-level lenses and the plurality of photosensitive components, so that the packaging material covers the image side of the cover layer, the peripheral side of the wafer-level lens and the On the peripheral side of the photosensitive component, the packaging material is cured to form a packaging conjoined part;
    沿高度方向分割所述模组拼板,分割所述封装连体部和所述盖板层,以形成多个摄像模组。The module panel is divided along the height direction, and the package conjoined part and the cover layer are divided to form multiple camera modules.
  37. 根据权利要求36所述的摄像模组的制造方法,其中,所述盖板层的像侧面为平面,所述晶圆级镜头的顶面为平面。The manufacturing method of a camera module according to claim 36, wherein the image side of the cover layer is a flat surface, and the top surface of the wafer-level lens is a flat surface.
  38. 根据权利要求36所述的摄像模组的制造方法,其中,所述盖板层上通过丝印、涂墨或者涂胶的方式设置一遮光层,所述遮光层上预留多个通光孔以提供所述晶圆级镜头光线入射的通道。The manufacturing method of a camera module according to claim 36, wherein a light-shielding layer is provided on the cover layer by silk screen printing, ink coating or glue coating, and a plurality of light holes are reserved on the light-shielding layer. Provide a channel for light from the wafer-level lens to enter.
  39. 根据权利要求36至39任一所述的摄像模组的制造方法,其中,所述封装材料为模塑材料,将所述模组拼板设置于模组成型模具中,向所述模组成型模具注入所述模塑材料,使所述模塑材料在多个所述晶圆级镜头和多个所述感光组件之间流动,从而将所述模塑材料包覆所述盖板层的像侧、所述晶圆级镜头的周侧和所述感光组件的周侧。The manufacturing method of a camera module according to any one of claims 36 to 39, wherein the packaging material is a molding material, the module panel is placed in a molding mold, and the module is molded The mold is injected with the molding material, causing the molding material to flow between the plurality of wafer-level lenses and the plurality of photosensitive components, thereby covering the image of the cover layer with the molding material. side, the peripheral side of the wafer-level lens and the peripheral side of the photosensitive component.
  40. 根据权利要求36至39任一所述的摄像模组的制造方法,其中,所述封装材料为胶水,通过喷雾或者点状画胶的方式在多个所述晶圆级镜头和多个所述感光组件之间填充所述胶水。 The manufacturing method of a camera module according to any one of claims 36 to 39, wherein the packaging material is glue, and the plurality of wafer-level lenses and the plurality of The glue is filled between the photosensitive components.
PCT/CN2023/108372 2022-07-27 2023-07-20 Camera module and manufacturing method therefor WO2024022217A1 (en)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
CN202210890901.7 2022-07-27
CN202210892487.3A CN117542868A (en) 2022-07-27 2022-07-27 Camera module and manufacturing method thereof
CN202210892485.4A CN117542867A (en) 2022-07-27 2022-07-27 Camera module and manufacturing method thereof
CN202210890904.0A CN117525095A (en) 2022-07-27 2022-07-27 Camera module and manufacturing method thereof
CN202210890901.7A CN117525094A (en) 2022-07-27 2022-07-27 Camera module and manufacturing method thereof
CN202210892487.3 2022-07-27
CN202210892485.4 2022-07-27
CN202210890904.0 2022-07-27

Publications (1)

Publication Number Publication Date
WO2024022217A1 true WO2024022217A1 (en) 2024-02-01

Family

ID=89705415

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2023/108372 WO2024022217A1 (en) 2022-07-27 2023-07-20 Camera module and manufacturing method therefor

Country Status (1)

Country Link
WO (1) WO2024022217A1 (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101304037A (en) * 2007-05-10 2008-11-12 夏普株式会社 Image capture device module, manufacturing method thereof and electronic information device
US20100032781A1 (en) * 2008-08-08 2010-02-11 Samsung Electro-Mechanics Co., Ltd. Camera module and method of manufacturing the same
KR20100042445A (en) * 2008-10-16 2010-04-26 삼성전기주식회사 The camera module manufacturing method which uses the wafer level package
US20110156187A1 (en) * 2009-12-31 2011-06-30 Kingpak Technology Inc. Image sensor packaging structure with predetermined focal length
US20120112365A1 (en) * 2010-03-26 2012-05-10 Infineon Technologies Ag Semiconductor Packages and Methods For Producing The Same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101304037A (en) * 2007-05-10 2008-11-12 夏普株式会社 Image capture device module, manufacturing method thereof and electronic information device
US20100032781A1 (en) * 2008-08-08 2010-02-11 Samsung Electro-Mechanics Co., Ltd. Camera module and method of manufacturing the same
KR20100042445A (en) * 2008-10-16 2010-04-26 삼성전기주식회사 The camera module manufacturing method which uses the wafer level package
US20110156187A1 (en) * 2009-12-31 2011-06-30 Kingpak Technology Inc. Image sensor packaging structure with predetermined focal length
US20120112365A1 (en) * 2010-03-26 2012-05-10 Infineon Technologies Ag Semiconductor Packages and Methods For Producing The Same

Similar Documents

Publication Publication Date Title
KR100652375B1 (en) Image sensor module structure comprising a wire bonding package and method of manufacturing the same
US6885107B2 (en) Flip-chip image sensor packages and methods of fabrication
KR100575094B1 (en) Module for optical device, and manufacturing method therefor
US8092734B2 (en) Covers for microelectronic imagers and methods for wafer-level packaging of microelectronics imagers
US7968961B2 (en) Solid-state image pickup device and method for manufacturing the same
JP4618639B2 (en) Manufacturing method of semiconductor device
US20060043555A1 (en) Sensor package
JP2004296453A (en) Solid-state imaging device, semiconductor wafer, optical device module, method of manufacturing the solid-state imaging device, and method of manufacturing the optical device module
JPWO2008032404A1 (en) Semiconductor device and manufacturing method thereof
WO2004107738A1 (en) Imaging device and its manufacturing method
US20100155917A1 (en) Semiconductor device and method for fabricating the same
JP2008277593A (en) Circuit board, optical device employing the same, camera module, and manufacturing method for the circuit board
CN111900181A (en) Wafer level packaging method for image sensing chip
CN112635505A (en) Packaging structure and packaging method
JP2003332542A (en) Semiconductor device and method of manufacturing the same
JP2004031499A (en) Solid-state imaging device and method of manufacturing the same
WO2024022217A1 (en) Camera module and manufacturing method therefor
JP2005217337A (en) Optical device
CN101366118A (en) Solid-state imaging device and manufacturing method thereof
CN213936192U (en) Packaging structure
JP2004096638A (en) Imaging device and manufacturing method therefor
WO2009137022A1 (en) Camera system including radiation shield and method of shielding radiation
CN117542868A (en) Camera module and manufacturing method thereof
CN117525094A (en) Camera module and manufacturing method thereof
CN117525095A (en) Camera module and manufacturing method thereof

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 23845428

Country of ref document: EP

Kind code of ref document: A1