WO2023273446A1 - Atomic layer deposition device - Google Patents

Atomic layer deposition device Download PDF

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Publication number
WO2023273446A1
WO2023273446A1 PCT/CN2022/083415 CN2022083415W WO2023273446A1 WO 2023273446 A1 WO2023273446 A1 WO 2023273446A1 CN 2022083415 W CN2022083415 W CN 2022083415W WO 2023273446 A1 WO2023273446 A1 WO 2023273446A1
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WO
WIPO (PCT)
Prior art keywords
carrier
reaction chamber
support net
outer support
atomic layer
Prior art date
Application number
PCT/CN2022/083415
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French (fr)
Chinese (zh)
Inventor
陈蓉
邵华晨
刘潇
向俊任
李嘉伟
弋戈
Original Assignee
华中科技大学
华中科技大学无锡研究院
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Application filed by 华中科技大学, 华中科技大学无锡研究院 filed Critical 华中科技大学
Publication of WO2023273446A1 publication Critical patent/WO2023273446A1/en

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523Pulsed gas flow or change of composition over time
    • C23C16/45525Atomic layer deposition [ALD]
    • C23C16/45544Atomic layer deposition [ALD] characterized by the apparatus
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4417Methods specially adapted for coating powder
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523Pulsed gas flow or change of composition over time
    • C23C16/45525Atomic layer deposition [ALD]
    • C23C16/45544Atomic layer deposition [ALD] characterized by the apparatus
    • C23C16/45546Atomic layer deposition [ALD] characterized by the apparatus specially adapted for a substrate stack in the ALD reactor
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally

Definitions

  • the invention relates to the technical field of atomic layer deposition, in particular to an atomic layer deposition device.
  • Atomic layer deposition is a technology that coats substances layer by layer on the surface of a substrate in the form of a monoatomic film. It has the characteristics of nano-controllable film thickness and good uniformity, so it is widely used in micro-nano electronic devices, solar energy Batteries and other fields.
  • the principle of atomic layer deposition is to introduce a precursor into a vacuum chamber to undergo chemical adsorption with the substrate to be coated. After cleaning the chamber with an inert gas, another precursor is introduced into the chamber to chemically react with the product of the previous stage. These two stages constitute an atomic layer deposition reaction cycle, that is, the growth of a single-layer film, and the desired thickness of the film is achieved by controlling the number of cycles.
  • there are many devices specialized for atomic layer deposition there are many devices specialized for atomic layer deposition. However, these devices have a relatively single scope of application for the object to be coated, and can only be used for deposition of a single type of object to be coated.
  • the present invention proposes an atomic layer deposition device, which can deposit different types of objects to be coated, and has a wider application range.
  • Atomic layer deposition equipment including:
  • reaction chamber includes a reaction chamber main body and a door, the interior of the reaction chamber main body forms a reaction chamber, the reaction chamber main body is provided with an air inlet and an air extraction port, the door and the reaction chamber
  • the main body of the chamber is detachably connected;
  • the mounting frame is fixedly connected to the chamber door, and when the chamber door is connected to the reaction chamber main body, the mounting frame is located inside the reaction chamber;
  • a first carrier the first carrier is used to carry a block-shaped object to be covered, and the first carrier is detachably connected to the mounting frame;
  • a second carrier the second carrier is used to carry the powdery object to be coated, and the second carrier is detachably connected to the installation frame;
  • the first carrier is fixedly connected to the installation frame
  • the second carrier is connected to the installation frame, and the driving member is connected to the second carrier, and the driving member is used to drive the second carrier relative to the The mount turns.
  • the first bearing member is provided with a plurality of grooves, and the grooves are used for accommodating the block-shaped object to be covered.
  • the first carrier in the first use state, is connected to the installation frame by a threaded fastener; or, the first carrier is snap-connected to the installation frame; Alternatively, the first carrier and the installation frame are fixed by magnetic attraction.
  • the second carrier in the second use state, is connected to the installation frame through a bearing, and the rotating shaft of the second carrier is connected to the driving member.
  • the second carrier further includes an air extraction pipe, the air extraction pipe is connected to the air extraction port, the air extraction pipe is arranged coaxially with the rotating shaft, and the two are respectively located on the second The two ends of the bearing along the axial direction.
  • the central area of the mounting frame is provided with a through receiving groove
  • the second carrier is located in the receiving groove, and along the axial direction, two ends of the receiving groove are respectively provided with An installation groove
  • the bearing is sleeved on both the rotating shaft and the exhaust pipe, and the bearing is interference fit with the corresponding installation groove.
  • the second carrier includes an inner support net and an outer support net arranged radially, and a first end cover and a second end cover connected to both ends of the two respectively, the inner support Both the net and the outer support net are hollowed out, the inner support net is covered with an inner filter net, the outer support net is covered with an outer filter net, and the inner filter net and the outer support net An accommodating cavity for accommodating the powdery object to be coated is formed between the nets, and a suction cavity communicating with the suction pipe is formed inside the inner support net.
  • the outer support net includes a first end plate of the outer support net, the first end cover is detachably connected to the first end plate of the outer support net, and the rotating shaft is arranged on the first end plate of the outer support net. On the end cover, the rotating shaft is detachably connected to the inner support net.
  • the outer support net further includes a second end plate of the outer support net, the second end cover is detachably connected to the second end plate of the outer support net, and the exhaust pipe is arranged on the second end plate of the outer support net.
  • a notch is provided on the second end plate of the outer support net, and the edge of the notch is projected along the axial direction on a side of the accommodating cavity close to the outer support net.
  • the second carrier includes an inner filter net and an outer filter net arranged radially, and a first end cap and a second end cap respectively connected to both ends of the two, the inner filter net Both the outer filter and the outer filter are sintered filter, and an accommodating cavity for accommodating the powder to be coated is formed between the inner filter and the outer filter, and the inside of the inner filter is formed An air extraction cavity communicated with the air extraction pipe.
  • quartz glass is installed on the main body of the reaction chamber, and an infrared heating lamp is arranged outside the main body of the reaction chamber, and the infrared heating lamp can heat the reaction chamber through the quartz glass.
  • the above-mentioned atomic layer deposition device is provided with a first carrier and a second carrier. If the bulk object to be coated is to be deposited, the first carrier can be fixedly installed on the mounting frame; if the powder To deposit the coating, you can choose to install the second carrier on the mounting frame, and connect the second carrier to the driving part, and drive the second carrier to rotate through the driving part, and the powder to be coated scattered to avoid agglomeration. Therefore, the device can not only deposit the bulk object to be coated, but also deposit the powdery object to be coated, as long as the corresponding carrier is selected and installed according to the shape of the object to be coated, which makes the device The scope of application is wider.
  • FIG. 1 is a schematic structural diagram of an atomic layer deposition apparatus in an embodiment of the present invention when the first carrier and the second carrier are not installed;
  • Fig. 2 is a structural schematic view of the second carrier installed on the mounting frame in an embodiment of the present invention
  • Fig. 3 is a structural schematic diagram of the installation of the first carrier on the mounting frame in an embodiment of the present invention
  • Fig. 4 is an exploded view of the second carrier in Fig. 2 (some parts are omitted);
  • Fig. 5 is an exploded view of another angle of the second carrier in Fig. 2 (some parts are omitted);
  • FIG. 6 is a top view of the second carrier in FIG. 2 (some components are omitted).
  • Reaction chamber main body 110 air inlet 111, air extraction port 112, chamber door 120, through hole 121, reaction chamber body 130, quartz glass 140;
  • Second carrier 400 outer support net 410, outer support net side plate 411, outer support net first end plate 412, outer support net second end plate 413, gap 4131, inner support net 420, outer filter net 430, inner Filter screen 440, first end cap 451, second end cap 452, rotating shaft 460, special-shaped groove 461, air extraction pipe 470, accommodating cavity 481, air extraction cavity 482, filter screen fixing clip 490;
  • Driving member 510 shaft coupling 520, first bearing 530, second bearing 540;
  • Bracket 610 Bracket 610, slider 620, slide rail 630.
  • first and second are used for descriptive purposes only, and cannot be interpreted as indicating or implying relative importance or implicitly specifying the quantity of indicated technical features.
  • the features defined as “first” and “second” may explicitly or implicitly include at least one of these features.
  • “plurality” means at least two, such as two, three, etc., unless specifically defined otherwise.
  • the first feature may be in direct contact with the first feature or the first and second feature may be in direct contact with the second feature through an intermediary. touch.
  • “above”, “above” and “above” the first feature on the second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature.
  • “Below”, “beneath” and “beneath” the first feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is less horizontally than the second feature.
  • FIG. 1 is a structural diagram of the atomic layer deposition apparatus in an embodiment of the present invention when the first carrier and the second carrier are not installed
  • Fig. 2 is the second carrier in an embodiment of the present invention
  • FIG. 3 is a schematic diagram of the structure of the first bearing member installed on the installation frame in an embodiment of the present invention.
  • An atomic layer deposition apparatus provided by an embodiment of the present invention includes components such as a reaction chamber, a mounting frame 200, a first carrier 300, a second carrier 400, and a driving member 510.
  • the reaction chamber includes a reaction chamber main body 110 and a chamber door 120.
  • the interior of the chamber body 110 is hollow to form a reaction chamber 130 , and one side is open.
  • the chamber door 120 is detachably connected to the reaction chamber body 110. When the chamber door 120 is connected to the reaction chamber body 110, the chamber door 120 seals the opening of the reaction chamber body 110, and the reaction chamber body 130 forms a closed chamber.
  • the main body of the reaction chamber 110 is provided with an air inlet 111 and an air extraction port 112 , the gas can enter the reaction chamber 130 through the air inlet 111 and be drawn out of the reaction chamber 130 through the air extraction port 112 .
  • the mounting frame 200 is fixedly connected to the chamber door 120, and the mounting frame 200 is located inside the chamber door 120. Specifically, the mounting frame 200 is fixedly connected to the inner side wall of the chamber door 120.
  • the installation frame 200 is located in the reaction chamber 130 .
  • the first carrier 300 is used to carry block-shaped objects to be coated
  • the second carrier 400 is used to carry powdery objects to be coated. Both the first carrier 300 and the second carrier 400 are detachable from the mounting frame 200
  • one of the first carrier 300 and the second carrier 400 is installed on the mounting frame 200 .
  • the first carrier 300 is installed on the installation frame 200 and the two are fixedly connected, at this time, atomic layer deposition can be performed on the bulk object to be coated.
  • the second carrier 400 is installed on the mounting frame 200, at this time, atomic layer deposition can be performed on the powdery object to be coated, and the driving member 510 is also connected to the second carrier 400, and the driving member 510 can The second carrier 400 is driven to rotate relative to the mounting frame 200 .
  • the first carrier 300 and the second carrier 400 are provided. If the bulk object to be coated is to be deposited, the first carrier 300 can be fixedly installed on the mounting frame 200; To deposit the powdery object to be coated, you can choose to install the second carrier 400 on the mounting frame 200, and connect the second carrier 400 to the driving member 510, and drive the second carrier 400 to rotate through the driving member 510 , break up the powder to be coated to avoid powder agglomeration. Therefore, the device can not only deposit bulk objects to be coated, but also deposit powdery objects to be coated, and can disperse powdery objects to be coated, which meets the requirements of powdery objects to be coated. It is required that before deposition, it is only necessary to select and install the corresponding carrier according to the shape of the object to be coated, which makes the device more applicable.
  • the first carrier 300 is provided with a plurality of grooves, and the grooves are used to accommodate block-shaped objects to be covered.
  • the first carrier 300 is provided with a first groove 310 and a second groove 320, the size of the first groove 310 is slightly larger than the size of the second groove 320, and the appropriate size can be selected according to the size of the block to be covered. and place it in the selected groove.
  • the positions of the first groove 310 and the second groove 320 are not limited to those shown in the drawings, and the number is not limited to two.
  • the shape of the block to be coated is not limited, and may be plate-like, columnar, spherical or other shapes.
  • one of the length and width of the groove is approximately equal to the size of the block to be covered in one direction, so that the block to be covered can be limited to a certain extent to prevent the gas from blowing through the block to be covered.
  • the air pressure is too high to push the block to be wrapped to shift its position and break away from the groove.
  • the first carrier 300 and the mounting frame 200 can be connected by threaded fasteners. Specifically, the first carrier 300 is placed on the top of the installation frame 200, and the two are fixed by screws. Alternatively, in some embodiments, the installation between the first bearing member 300 and the installation frame 200 may also be realized through snap connection. Alternatively, in some embodiments, the first bearing member 300 and the installation frame 200 may also be fixed by magnetic attraction, for example, magnetic members are provided on both of them for adsorption and fixation.
  • FIG. 4 is an exploded view of the second carrier in Fig. 2 (some parts are omitted)
  • Fig. 5 is an exploded view of the second carrier in Fig. 2 from another angle (some parts are omitted )
  • FIG. 6 is a top view of the second carrier in FIG. 2 (some components are omitted).
  • the driving part 510 can drive the second carrier 400 to rotate relative to the mounting frame 200.
  • the powdery object to be coated is continuously rolled up and down in the second carrier 400, which can prevent the powder from agglomerating , it can also increase the contact probability between the powder and the precursor gas, so that the contact reaction between the powder and the precursor gas is more sufficient, and the deposition effect is better.
  • the driving member 510 can be a rotating motor or a rotating cylinder, and the rotating shaft 460 of the second carrier 400 passes through the through hole 121 provided on the chamber door 120, and is connected with the output shaft of the driving member 510 through a coupling 520 .
  • a transmission assembly can also be provided between the driving member 510 and the second carrier 400 , for example, a gear set or a timing belt and other components are provided between the two, and the deceleration or speed-up can be realized through the transmission assembly.
  • the second carrier 400 further includes an exhaust pipe 470, which communicates with the air outlet 112 provided on the reaction chamber main body 110, and can connect components such as a vacuum pump to the air outlet 112. The gas flowing through the powder in the second carrier 400 is sucked away.
  • the air extraction pipe 470 is arranged coaxially with the rotating shaft 460 .
  • the rotating shaft 460 is located at one end of the second carrier 400
  • the air extraction pipe 470 is located at the other end of the second carrier 400 .
  • the exhaust pipe 470 and the rotating shaft 460 are arranged at both ends respectively, and the distance between the two is far away.
  • the temperature in the exhaust pipe 470 is not easily affected by the cooling, and the precursor is pumped through the exhaust pipe 470.
  • walking it is not easy to condense because the temperature is too low, so that it is not easy to block the exhaust pipe 470 .
  • the two ends are separately arranged to reduce the sealing requirements at the air extraction pipe 470, and there is no need to set a magnetic fluid sealing structure with a relatively complicated structure, which can simplify the structure and reduce Cost and difficulty of assembly.
  • the magnetic fluid sealing structure will fail when it exceeds 120 ° C.
  • there is no need to set a magnetic fluid sealing structure so the upper limit of the deposition temperature can be increased, so that the device can be used for high-temperature atomic layer deposition, and the application range of the device is wider. wide.
  • a central area of the installation frame 200 is provided with a through receiving groove 210 , and along the axial direction, two ends of the receiving groove 210 are respectively provided with an installation groove 220 .
  • the second supporting member 400 is located in the receiving groove 210 , and the rotating shaft 460 and the exhaust pipe 470 are respectively installed in the corresponding installing groove 220 .
  • the rotating shaft 460 is connected to the corresponding installation groove 220 through the first bearing 530 , and the first bearing 530 is in interference fit with the installation groove 220 .
  • the air suction pipe 470 is connected with the corresponding mounting groove 220 through the second bearing 540, and the interference fit between the second bearing 540 and the mounting groove 220.
  • the first bearing 530 and the second bearing 540 should be snapped into the corresponding installation groove 220; if the bulky object to be coated is to be deposited, the first The bearing 530 and the second bearing 540 are removed from the corresponding installation slots 220, and then the first bearing member 300 is installed, which is very convenient to operate.
  • the second carrier 400 includes components such as an inner support net 420 , an outer support net 410 , an inner filter net 440 , an outer filter net 430 , a first end cover 451 and a second end cover 452 .
  • Both the inner support net 420 and the outer support net 410 are in the shape of a hollow cylinder with two ends open, and the outer support net 410 is arranged radially outside the inner support net 420 with a gap between them.
  • the inner filter 440 is sleeved on the outside of the inner support net 420 , and the two are attached and fixedly connected.
  • the outer filter 430 is sleeved on the outside of the outer support net 410 , and the two are attached and fixedly connected.
  • the inner support net 420 can support and fix the inner filter net 440 to avoid its deformation.
  • the outer support net 410 can support and fix the outer filter net 430 .
  • Both the inner support net 420 and the outer support net 410 are hollowed out, and the side walls of both are provided with radially penetrating holes.
  • the first end cover 451 is fixed on one end of the inner support net 420 and the outer support net 410
  • the second end cover 452 is fixed on the other end.
  • An accommodating cavity 481 is formed between the inner filter net 440 and the outer support net 410
  • an air extraction cavity 482 is formed inside the inner support net 420 , and the air extraction cavity 482 communicates with the air extraction pipe 470 .
  • the powdery object to be coated is placed in the housing cavity 481, and the inner filter 440 and the outer filter 430 are both made of high-mesh filters, which can block the powdery object to be coated and prevent it from leaking inward into the pump.
  • the air cavity 482 is drawn away, and it is prevented from leaking outward to the outside of the second carrier 400 .
  • the powdery object to be coated is placed in the containing cavity 481, the vacuum pump is connected to the gas extraction port 112 provided on the reaction chamber main body 110, and different precursors are alternately fed from the air inlet provided on the reaction chamber main body 110.
  • Port 111 enters the reaction chamber 130, passes through the outer filter 430 and the outer support 410 in turn, and then enters the accommodating chamber 481, contacts with the powder and performs coating deposition, and the excess precursor passes through the inner filter 440 and the inner support in turn.
  • the net 420 then enters the suction cavity 482 and is sucked away through the suction pipe 470 .
  • the inner filter 440 is fixed to the outside of the inner support net 420 through a filter fixing clip 490 .
  • the inner filter 440 matches the shape and size of the outer wall of the inner support 420, the inner filter 440 is sleeved on the outer wall of the inner support 420, and then the filter fixing clamp 490 is fixed to the outside of the inner filter 440, Just lock it tight.
  • the outer filter screen 430 is also fixed on the outside of the outer support net 410 by the filter screen fixing clip 490.
  • the outer support net 410 includes a first end plate 412 of the outer support net, and the first end plate 412 of the outer support net is integrally connected to the side plate 411 of the outer support net one end.
  • the rotating shaft 460 is disposed on the first end cover 451 , and the first end cover 451 is detachably connected to the first end plate 412 of the outer support net.
  • the rotating shaft 460 is detachably connected to the inner supporting net 420, specifically, the rotating shaft 460 passes through the first end plate 412 of the outer supporting net, and the part of the rotating shaft 460 located inside the first end plate 412 of the outer supporting net is inserted into the inner supporting net 420, and Interference fit, a sealing ring is arranged between the two.
  • the first end plate 412 of the outer support net is connected to the first end cover 451 through threaded fasteners.
  • the part of the rotating shaft 460 located inside the first end plate 412 of the outer support net is inserted into the inner support net 420.
  • the diameter gradually decreases, that is, this part is provided with a slope, so that the support net 420 can be easily moved from The first end plate 412 of the outer support net is removed.
  • the outer support net 410 also includes a second end plate 413 of the outer support net, and the second end plate 413 of the outer support net and the first end plate 412 of the outer support net are respectively connected to the side plates 411 of the outer support net. both ends.
  • the second end cover 452 is detachably connected with the second end plate 413 of the outer support network
  • the air extraction pipe 470 is arranged on the second end cover 452
  • the end of the air extraction pipe 470 is fixedly connected with the inner support network 420, for example, the end of the air extraction pipe 470
  • the suction pipe 470 is hollow inside, and passes through the second end plate 413 of the outer support net, and the part of the suction pipe 470 located inside the second end plate 413 of the outer support net is inserted into the inner support net 420, And interference fit, a sealing ring is arranged between the two.
  • the second end plate 413 of the outer support net is connected to the second end cover 452 through threaded fasteners.
  • the second end plate 413 of the outer support net is provided with a notch 4131, the notch 4131 is circular, and the projection of the edge of the notch 4131 along the axial direction is located in the housing cavity 481 on the side close to the outer support net 410, that is, the radius of the notch 4131 is set larger.
  • the powder is put into the accommodating cavity 481 from the notch 4131 first, and then the second end cover 452 is installed on the second end plate 413 of the outer support net.
  • the second end cover 452 When taking out the powder, the second end cover 452 is removed from the second end plate 413 of the outer support net, and at the same time, the inner support net 420 and the inner filter net 440 are taken out together, and then the powder is poured out.
  • the portion of the rotating shaft 460 that is located inside the first end plate 412 of the outer support net is provided with a slope, so when the second end cover 452 is removed, the inner support net 420 is more easily connected to the first end plate of the outer support net. 412 Separation.
  • the rotating shaft 460 is provided with a special-shaped groove 461, and the special-shaped groove 461 is a blind hole with a stepped surface, which can limit the position when connected with the coupling 520.
  • the second carrier 400 includes components such as an inner filter 440 , an outer filter 430 , a first end cover 451 and a second end cover 452 .
  • Both the inner filter 440 and the outer filter 430 are hollow cylinders with two ends open, and the outer filter 430 is arranged radially outside the inner filter 440 with a gap between them.
  • the first end cover 451 is fixed on one end of the inner filter 440 and the outer filter 430
  • the second end cover 452 is fixed on the other end.
  • An accommodating cavity 481 is formed between the inner filter 440 and the outer filter 430
  • an air extraction cavity 482 is formed inside the inner filter 440 , and the air extraction cavity 482 communicates with the air extraction pipe 470 .
  • the powdery object to be coated is placed in the housing cavity 481, and the inner filter 440 and the outer filter 430 are both made of high-mesh filters, which can block the powdery object to be coated and prevent it from leaking inward into the pump.
  • the air cavity 482 is drawn away, and it is prevented from leaking outward to the outside of the second carrier 400 .
  • Both the inner filter 440 and the outer filter 430 are made of sintered filter, which has high strength and is not easily deformed.
  • quartz glass 140 is installed on the reaction chamber body 110 , and an infrared heating lamp is arranged outside the reaction chamber body 110 , and the infrared heating lamp can heat the reaction chamber 130 through the quartz glass 140 .
  • the heating speed of infrared heating is faster, and there is no need to customize the heating jacket according to the size of the reaction chamber like resistance heating, and there is no need to set a special fixed structure, which can simplify the structure.
  • a bracket 610 fixedly connected to the chamber door 120 and the driving member 510
  • a slider 620 is fixedly connected to the bottom of the bracket 610
  • the slider 620 is slidably connected to the slide rail 630 .
  • the chamber door 120 When using the atomic layer deposition apparatus in the above-mentioned embodiment for atomic layer deposition, first connect the chamber door 120 to the reaction chamber main body 110 to check whether the apparatus is operating normally, and then vacuumize the reaction chamber 130 through the pumping port 112 . Then the chamber door 120 is separated from the reaction chamber main body 110, and the corresponding carrier is selected according to the shape of the object to be coated. If it is a block object to be coated, the first carrier 300 is fixed on the mounting frame 200; if it is For the powdery object to be coated, install the second carrier 400 on the mounting frame 200 . Next, the powdery object to be coated will be described as an example.
  • the chamber door 120 Connect the chamber door 120 to the reaction chamber main body 110 again, use an infrared heating lamp to heat the reaction chamber body 130, and turn on the driver 510 to drive the second carrier 400 to rotate (if it is the first carrier 300, the driver 510 not open).
  • the carrier gas can be nitrogen or inert gas, and the carrier gas can be passed through first to clean the interior and remove impurities. Then the first precursor is mixed into the carrier gas and passed into the air inlet 111 together.
  • the first precursor is adsorbed on the surface of the powdery object to be coated for deposition, and the excess first precursor flows from the pumping cavity 482 into the pumping pipe 470 and was drawn out.
  • the second carrier 400 continues to rotate, the first precursor can fully contact and absorb the powdery object to be coated.
  • the first precursor is stopped, and the carrier gas is still fed in, and the interior is purged and cleaned by the carrier gas.
  • the second precursor is mixed into the carrier gas and passed into the air inlet 111 together.
  • the second precursor and the first precursor undergo a chemical reaction on the surface of the powder to be coated, and the reaction product is the coating material.
  • the excess second precursor flows from the pumping chamber 482 into the pumping tube 470 and is pumped out. After a period of time, the second precursor is stopped, and the carrier gas is still fed in, and the interior is purged and cleaned by the carrier gas.
  • This is an atomic layer deposition cycle, that is, a thin film with an atomic layer thickness is deposited on the surface of the object to be coated. In the experiment, the number of deposited layers was controlled by controlling the number of cycles to achieve the expected coating thickness.

Abstract

The present invention relates to an atomic layer deposition device, wherein a reaction chamber comprises a reaction chamber main body and a cavity door, a reaction cavity is formed inside the reaction chamber main body, an air inlet and an air extraction opening are provided in the reaction chamber main body, and the cavity door is detachably connected to the reaction chamber main body; a mounting frame is fixedly connected to the cavity door, and when the cavity door is connected to the reaction chamber main body, the mounting frame is located inside the reaction cavity; a first bearing member is configured to bear a block-shaped object to be coated, and the first bearing member is detachably connected to the mounting frame; a second bearing member is configured to bear a powdery object to be coated, and the second bearing member is detachably connected to the mounting frame; in a first use state, the first bearing member is fixedly connected to the mounting frame; and in a second use state, the second bearing member is connected to the mounting frame, a driving member is connected to the second bearing member, and the driving member is configured to drive the second bearing member to rotate relative to the mounting frame. The atomic layer deposition device can perform deposition on different types of objects to be coated, and has a wider application range.

Description

原子层沉积装置ALD 技术领域technical field
本发明涉及原子层沉积技术领域,特别是涉及原子层沉积装置。The invention relates to the technical field of atomic layer deposition, in particular to an atomic layer deposition device.
背景技术Background technique
原子层沉积是一种将物质以单原子膜形式一层一层的镀在基底表面的技术,其具有薄膜厚度纳米可控,均匀性好等特点,因此被广泛应用于微纳米电子器件,太阳能电池等领域。原子层沉积的原理是将前驱体通入真空腔体中与待包覆基体发生化学吸附,伴随惰性气体清洗腔体之后,另一前驱体通入腔体与上阶段生成物发生化学反应。这两个阶段组成一个原子层沉积反应循环,也即单层薄膜生长,通过控制循环的次数来达到所需厚度的薄膜。在相关技术中,存在许多专门进行原子层沉积的装置,然而,这些装置对于待包覆物的适用范围较为单一,仅能用于单一类型的待包覆物的沉积。Atomic layer deposition is a technology that coats substances layer by layer on the surface of a substrate in the form of a monoatomic film. It has the characteristics of nano-controllable film thickness and good uniformity, so it is widely used in micro-nano electronic devices, solar energy Batteries and other fields. The principle of atomic layer deposition is to introduce a precursor into a vacuum chamber to undergo chemical adsorption with the substrate to be coated. After cleaning the chamber with an inert gas, another precursor is introduced into the chamber to chemically react with the product of the previous stage. These two stages constitute an atomic layer deposition reaction cycle, that is, the growth of a single-layer film, and the desired thickness of the film is achieved by controlling the number of cycles. In the related art, there are many devices specialized for atomic layer deposition. However, these devices have a relatively single scope of application for the object to be coated, and can only be used for deposition of a single type of object to be coated.
发明内容Contents of the invention
基于此,本发明提出一种原子层沉积装置,可以对不同类型的待包覆物进行沉积,适用范围更广。Based on this, the present invention proposes an atomic layer deposition device, which can deposit different types of objects to be coated, and has a wider application range.
原子层沉积装置,包括:Atomic layer deposition equipment, including:
反应室,所述反应室包括反应室主体与腔门,所述反应室主体的内部形成反应腔体,所述反应室主体上设有进气口与抽气口,所述腔门与所述反应室主体可拆卸连接;A reaction chamber, the reaction chamber includes a reaction chamber main body and a door, the interior of the reaction chamber main body forms a reaction chamber, the reaction chamber main body is provided with an air inlet and an air extraction port, the door and the reaction chamber The main body of the chamber is detachably connected;
安装架,所述安装架与所述腔门固定连接,所述腔门与所述反应室主体连接 时,所述安装架位于所述反应腔体的内部;a mounting frame, the mounting frame is fixedly connected to the chamber door, and when the chamber door is connected to the reaction chamber main body, the mounting frame is located inside the reaction chamber;
第一承载件,所述第一承载件用于承载块状待包覆物,所述第一承载件与所述安装架可拆卸连接;A first carrier, the first carrier is used to carry a block-shaped object to be covered, and the first carrier is detachably connected to the mounting frame;
第二承载件,所述第二承载件用于承载粉状待包覆物,所述第二承载件与所述安装架可拆卸连接;A second carrier, the second carrier is used to carry the powdery object to be coated, and the second carrier is detachably connected to the installation frame;
驱动件;driver;
第一使用状态下,所述第一承载件与所述安装架固定连接;In the first use state, the first carrier is fixedly connected to the installation frame;
第二使用状态下,所述第二承载件与所述安装架连接,且所述驱动件与所述第二承载件连接,所述驱动件用于驱动所述第二承载件相对于所述安装架转动。In the second use state, the second carrier is connected to the installation frame, and the driving member is connected to the second carrier, and the driving member is used to drive the second carrier relative to the The mount turns.
在其中一个实施例中,所述第一承载件上设有多个凹槽,所述凹槽用于容纳所述块状待包覆物。In one of the embodiments, the first bearing member is provided with a plurality of grooves, and the grooves are used for accommodating the block-shaped object to be covered.
在其中一个实施例中,所述第一使用状态下,所述第一承载件与所述安装架通过螺纹紧固件连接;或者,所述第一承载件与所述安装架卡扣连接;或者,所述第一承载件与所述安装架通过磁吸固定。In one of the embodiments, in the first use state, the first carrier is connected to the installation frame by a threaded fastener; or, the first carrier is snap-connected to the installation frame; Alternatively, the first carrier and the installation frame are fixed by magnetic attraction.
在其中一个实施例中,所述第二使用状态下,所述第二承载件与所述安装架之间通过轴承连接,所述第二承载件的转轴与所述驱动件连接。In one of the embodiments, in the second use state, the second carrier is connected to the installation frame through a bearing, and the rotating shaft of the second carrier is connected to the driving member.
在其中一个实施例中,所述第二承载件还包括抽气管,所述抽气管与所述抽气口连接,所述抽气管与所述转轴同轴设置,且二者分别位于所述第二承载件沿轴向的两端。In one of the embodiments, the second carrier further includes an air extraction pipe, the air extraction pipe is connected to the air extraction port, the air extraction pipe is arranged coaxially with the rotating shaft, and the two are respectively located on the second The two ends of the bearing along the axial direction.
在其中一个实施例中,所述安装架的中心区域设有贯通的容纳槽,所述第二承载件位于所述容纳槽内,沿所述轴向,所述容纳槽的两端各设有一个安装槽,所述转轴与所述抽气管上均套设有所述轴承,所述轴承与对应的所述安装槽过盈配合。In one of the embodiments, the central area of the mounting frame is provided with a through receiving groove, the second carrier is located in the receiving groove, and along the axial direction, two ends of the receiving groove are respectively provided with An installation groove, the bearing is sleeved on both the rotating shaft and the exhaust pipe, and the bearing is interference fit with the corresponding installation groove.
在其中一个实施例中,所述第二承载件包括沿径向设置的内支撑网与外支撑网,以及分别连接于二者的两端的第一端盖与第二端盖,所述内支撑网与所述外支撑网均呈镂空状,所述内支撑网的外部套设有内过滤网,所述外支撑网的外部套设有外过滤网,所述内过滤网与所述外支撑网之间形成用于容纳所述粉状待包覆物的容纳腔体,所述内支撑网的内部形成与所述抽气管连通的抽气腔体。In one of the embodiments, the second carrier includes an inner support net and an outer support net arranged radially, and a first end cover and a second end cover connected to both ends of the two respectively, the inner support Both the net and the outer support net are hollowed out, the inner support net is covered with an inner filter net, the outer support net is covered with an outer filter net, and the inner filter net and the outer support net An accommodating cavity for accommodating the powdery object to be coated is formed between the nets, and a suction cavity communicating with the suction pipe is formed inside the inner support net.
在其中一个实施例中,所述外支撑网包括外支撑网第一端板,所述第一端盖与所述外支撑网第一端板可拆卸连接,所述转轴设置于所述第一端盖上,所述转轴与所述内支撑网可拆卸连接。In one of the embodiments, the outer support net includes a first end plate of the outer support net, the first end cover is detachably connected to the first end plate of the outer support net, and the rotating shaft is arranged on the first end plate of the outer support net. On the end cover, the rotating shaft is detachably connected to the inner support net.
在其中一个实施例中,所述外支撑网还包括外支撑网第二端板,所述第二端盖与所述外支撑网第二端板可拆卸连接,所述抽气管设置于所述第二端盖上,所述外支撑网第二端板上设有缺口,所述缺口的边缘沿轴向的投影位于所述容纳腔体内靠近所述外支撑网的一侧。In one of the embodiments, the outer support net further includes a second end plate of the outer support net, the second end cover is detachably connected to the second end plate of the outer support net, and the exhaust pipe is arranged on the second end plate of the outer support net. On the second end cover, a notch is provided on the second end plate of the outer support net, and the edge of the notch is projected along the axial direction on a side of the accommodating cavity close to the outer support net.
在其中一个实施例中,所述第二承载件包括沿径向设置内过滤网与外过滤网,以及分别连接于二者的两端的第一端盖与第二端盖,所述内过滤网与所述外过滤网均为烧结过滤网,所述内过滤网与所述外过滤网之间形成用于容纳所述粉状待包覆物的容纳腔体,所述内过滤网的内部形成与所述抽气管连通的抽气腔体。In one of the embodiments, the second carrier includes an inner filter net and an outer filter net arranged radially, and a first end cap and a second end cap respectively connected to both ends of the two, the inner filter net Both the outer filter and the outer filter are sintered filter, and an accommodating cavity for accommodating the powder to be coated is formed between the inner filter and the outer filter, and the inside of the inner filter is formed An air extraction cavity communicated with the air extraction pipe.
在其中一个实施例中,所述反应室主体上安装有石英玻璃,所述反应室主体的外部设置有红外加热灯,所述红外加热灯能够透过所述石英玻璃对所述反应腔体加热。In one of the embodiments, quartz glass is installed on the main body of the reaction chamber, and an infrared heating lamp is arranged outside the main body of the reaction chamber, and the infrared heating lamp can heat the reaction chamber through the quartz glass. .
上述原子层沉积装置,设置了第一承载件与第二承载件,若要对块状待包覆物进行沉积,则可以选择将第一承载件固定安装至安装架上;若要对粉状待包覆物进行沉积,则可以选择将第二承载件安装至安装架上,并将第二承载件与驱动 件连接,通过驱动件驱动第二承载件转动,将粉状待包覆物打散,以免发生结块。因此,该装置既可以对块状待包覆物进行沉积,也可以对粉状待包覆物进行沉积,只要根据待包覆物的形态选择安装对应的承载件即可,这使得该装置的适用范围更广。The above-mentioned atomic layer deposition device is provided with a first carrier and a second carrier. If the bulk object to be coated is to be deposited, the first carrier can be fixedly installed on the mounting frame; if the powder To deposit the coating, you can choose to install the second carrier on the mounting frame, and connect the second carrier to the driving part, and drive the second carrier to rotate through the driving part, and the powder to be coated scattered to avoid agglomeration. Therefore, the device can not only deposit the bulk object to be coated, but also deposit the powdery object to be coated, as long as the corresponding carrier is selected and installed according to the shape of the object to be coated, which makes the device The scope of application is wider.
附图说明Description of drawings
图1为本发明一实施例中的原子层沉积装置未安装第一承载件与第二承载件时的结构示意图;FIG. 1 is a schematic structural diagram of an atomic layer deposition apparatus in an embodiment of the present invention when the first carrier and the second carrier are not installed;
图2为本发明一实施例中第二承载件安装至安装架上的结构示意图;Fig. 2 is a structural schematic view of the second carrier installed on the mounting frame in an embodiment of the present invention;
图3为本发明一实施例中第一承载件安装至安装架上的结构示意图;Fig. 3 is a structural schematic diagram of the installation of the first carrier on the mounting frame in an embodiment of the present invention;
图4为图2中第二承载件的爆炸图(省略部分部件);Fig. 4 is an exploded view of the second carrier in Fig. 2 (some parts are omitted);
图5为图2中第二承载件的另一角度的爆炸图(省略部分部件);Fig. 5 is an exploded view of another angle of the second carrier in Fig. 2 (some parts are omitted);
图6为图2中第二承载件的俯视图(省略部分部件)。FIG. 6 is a top view of the second carrier in FIG. 2 (some components are omitted).
附图标记:Reference signs:
反应室主体110、进气口111、抽气口112、腔门120、通孔121、反应腔体130、石英玻璃140;Reaction chamber main body 110, air inlet 111, air extraction port 112, chamber door 120, through hole 121, reaction chamber body 130, quartz glass 140;
安装架200、容纳槽210、安装槽220;Mounting frame 200, receiving groove 210, mounting groove 220;
第一承载件300、第一凹槽310、第二凹槽320;The first carrier 300, the first groove 310, the second groove 320;
第二承载件400、外支撑网410、外支撑网侧板411、外支撑网第一端板412、外支撑网第二端板413、缺口4131、内支撑网420、外过滤网430、内过滤网440、第一端盖451、第二端盖452、转轴460、异形槽461、抽气管470、容纳腔体481、抽气腔体482、滤网固定卡箍490; Second carrier 400, outer support net 410, outer support net side plate 411, outer support net first end plate 412, outer support net second end plate 413, gap 4131, inner support net 420, outer filter net 430, inner Filter screen 440, first end cap 451, second end cap 452, rotating shaft 460, special-shaped groove 461, air extraction pipe 470, accommodating cavity 481, air extraction cavity 482, filter screen fixing clip 490;
驱动件510、联轴器520、第一轴承530、第二轴承540; Driving member 510, shaft coupling 520, first bearing 530, second bearing 540;
支架610、滑块620、滑轨630。Bracket 610, slider 620, slide rail 630.
具体实施方式detailed description
为使本发明的上述目的、特征和优点能够更加明显易懂,下面结合附图对本发明的具体实施方式做详细的说明。在下面的描述中阐述了很多具体细节以便于充分理解本发明。但是本发明能够以很多不同于在此描述的其它方式来实施,本领域技术人员可以在不违背本发明内涵的情况下做类似改进,因此本发明不受下面公开的具体实施例的限制。In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. However, the present invention can be implemented in many other ways different from those described here, and those skilled in the art can make similar improvements without departing from the connotation of the present invention, so the present invention is not limited by the specific embodiments disclosed below.
在本发明的描述中,需要理解的是,术语“中心”、“纵向”、“横向”、“长度”、“宽度”、“厚度”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”、“顺时针”、“逆时针”、“轴向”、“径向”、“周向”等指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本发明和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本发明的限制。In describing the present invention, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " Back", "Left", "Right", "Vertical", "Horizontal", "Top", "Bottom", "Inner", "Outer", "Clockwise", "Counterclockwise", "Axial" , "radial", "circumferential" and other indicated orientations or positional relationships are based on the orientations or positional relationships shown in the drawings, which are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying the referred device or Elements must have certain orientations, be constructed and operate in certain orientations, and therefore should not be construed as limitations on the invention.
此外,术语“第一”、“第二”仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括至少一个该特征。在本发明的描述中,“多个”的含义是至少两个,例如两个,三个等,除非另有明确具体的限定。In addition, the terms "first" and "second" are used for descriptive purposes only, and cannot be interpreted as indicating or implying relative importance or implicitly specifying the quantity of indicated technical features. Thus, the features defined as "first" and "second" may explicitly or implicitly include at least one of these features. In the description of the present invention, "plurality" means at least two, such as two, three, etc., unless specifically defined otherwise.
在本发明中,除非另有明确的规定和限定,术语“安装”、“相连”、“连接”、“固定”等术语应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或成一体;可以是机械连接,也可以是电连接;可以是直接相连,也可以通过中间媒介间接相连,可以是两个元件内部的连通或两个元件的相互作用关系,除非另有明确的限定。对于本领域的普通技术人员而言,可以根据具体情况理解上述术语在本发明中的具体含义。In the present invention, unless otherwise clearly specified and limited, terms such as "installation", "connection", "connection" and "fixation" should be understood in a broad sense, for example, it can be a fixed connection or a detachable connection , or integrated; it may be mechanically connected or electrically connected; it may be directly connected or indirectly connected through an intermediary, and it may be the internal communication of two components or the interaction relationship between two components, unless otherwise specified limit. Those of ordinary skill in the art can understand the specific meanings of the above terms in the present invention according to specific situations.
在本发明中,除非另有明确的规定和限定,第一特征在第二特征“上”或“下”可以是第一和第二特征直接接触,或第一和第二特征通过中间媒介间接 接触。而且,第一特征在第二特征“之上”、“上方”和“上面”可是第一特征在第二特征正上方或斜上方,或仅仅表示第一特征水平高度高于第二特征。第一特征在第二特征“之下”、“下方”和“下面”可以是第一特征在第二特征正下方或斜下方,或仅仅表示第一特征水平高度小于第二特征。In the present invention, unless otherwise clearly specified and limited, the first feature may be in direct contact with the first feature or the first and second feature may be in direct contact with the second feature through an intermediary. touch. Moreover, "above", "above" and "above" the first feature on the second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. "Below", "beneath" and "beneath" the first feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is less horizontally than the second feature.
需要说明的是,当元件被称为“固定于”或“设置于”另一个元件,它可以直接在另一个元件上或者也可以存在居中的元件。当一个元件被认为是“连接”另一个元件,它可以是直接连接到另一个元件或者可能同时存在居中元件。本文所使用的术语“垂直的”、“水平的”、“上”、“下”、“左”、“右”以及类似的表述只是为了说明的目的,并不表示是唯一的实施方式。It should be noted that when an element is referred to as being “fixed on” or “disposed on” another element, it may be directly on the other element or there may be an intervening element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or intervening elements may also be present. As used herein, the terms "vertical", "horizontal", "upper", "lower", "left", "right" and similar expressions are for the purpose of illustration only and are not intended to represent the only embodiment.
参阅图1至图3,图1为本发明一实施例中的原子层沉积装置未安装第一承载件与第二承载件时的结构示意图,图2为本发明一实施例中第二承载件安装至安装架上的结构示意图,图3为本发明一实施例中第一承载件安装至安装架上的结构示意图。本发明一实施例提供的原子层沉积装置包括反应室、安装架200、第一承载件300、第二承载件400与驱动件510等部件,反应室包括反应室主体110与腔门120,反应室主体110的内部中空,以形成反应腔体130,且一侧呈开口状。腔门120与反应室主体110可拆卸连接,腔门120与反应室主体110连接时,腔门120将反应室主体110的开口处封堵,反应腔体130形成封闭腔体。反应室主体110上设有进气口111与抽气口112,气体可以从进气口111进入反应腔体130,并且可以从抽气口112被抽离反应腔体130。安装架200与腔门120固定连接,且安装架200位于腔门120的内侧,具体地,安装架200与腔门120的内侧壁固定连接,因此,腔门120与反应室主体110连接时,安装架200会位于反应腔体130内。第一承载件300用于承载块状待包覆物,第二承载件400用于承载粉状待包覆物,第一承载件300、第二承载件400二者均与安装架200可拆卸连接,在进行原子层沉积时,第一承载件300、第二承载件400其中一个安装至安装架200上。具体地,第一使用状态下,第一承载件300安装至安装架200上,且二者之间固定连接,此时可以对块状待包覆物进行原子层沉积。第二使用状态下,第二承载件400安装至安装架200上,此时可以对粉状待包覆物进行原子层沉积,并且驱动件510也与第二承载件400连接,驱 动件510可以驱动第二承载件400相对于安装架200进行转动。Referring to Fig. 1 to Fig. 3, Fig. 1 is a structural diagram of the atomic layer deposition apparatus in an embodiment of the present invention when the first carrier and the second carrier are not installed, and Fig. 2 is the second carrier in an embodiment of the present invention A schematic diagram of the structure installed on the installation frame. FIG. 3 is a schematic diagram of the structure of the first bearing member installed on the installation frame in an embodiment of the present invention. An atomic layer deposition apparatus provided by an embodiment of the present invention includes components such as a reaction chamber, a mounting frame 200, a first carrier 300, a second carrier 400, and a driving member 510. The reaction chamber includes a reaction chamber main body 110 and a chamber door 120. The interior of the chamber body 110 is hollow to form a reaction chamber 130 , and one side is open. The chamber door 120 is detachably connected to the reaction chamber body 110. When the chamber door 120 is connected to the reaction chamber body 110, the chamber door 120 seals the opening of the reaction chamber body 110, and the reaction chamber body 130 forms a closed chamber. The main body of the reaction chamber 110 is provided with an air inlet 111 and an air extraction port 112 , the gas can enter the reaction chamber 130 through the air inlet 111 and be drawn out of the reaction chamber 130 through the air extraction port 112 . The mounting frame 200 is fixedly connected to the chamber door 120, and the mounting frame 200 is located inside the chamber door 120. Specifically, the mounting frame 200 is fixedly connected to the inner side wall of the chamber door 120. Therefore, when the chamber door 120 is connected to the reaction chamber main body 110, The installation frame 200 is located in the reaction chamber 130 . The first carrier 300 is used to carry block-shaped objects to be coated, and the second carrier 400 is used to carry powdery objects to be coated. Both the first carrier 300 and the second carrier 400 are detachable from the mounting frame 200 To connect, when performing atomic layer deposition, one of the first carrier 300 and the second carrier 400 is installed on the mounting frame 200 . Specifically, in the first use state, the first carrier 300 is installed on the installation frame 200 and the two are fixedly connected, at this time, atomic layer deposition can be performed on the bulk object to be coated. In the second use state, the second carrier 400 is installed on the mounting frame 200, at this time, atomic layer deposition can be performed on the powdery object to be coated, and the driving member 510 is also connected to the second carrier 400, and the driving member 510 can The second carrier 400 is driven to rotate relative to the mounting frame 200 .
上述实施例中,设置了第一承载件300与第二承载件400,若要对块状待包覆物进行沉积,则可以选择将第一承载件300固定安装至安装架200上;若要对粉状待包覆物进行沉积,则可以选择将第二承载件400安装至安装架200上,并将第二承载件400与驱动件510连接,通过驱动件510驱动第二承载件400转动,将粉状待包覆物打散,以免粉末发生结块。因此,该装置既可以对块状待包覆物进行沉积,也可以对粉状待包覆物进行沉积,且能对粉状待包覆物进行打散,符合粉状待包覆物沉积的要求,沉积前只要根据待包覆物的形态选择安装对应的承载件即可,这使得该装置的适用范围更广。In the above-mentioned embodiment, the first carrier 300 and the second carrier 400 are provided. If the bulk object to be coated is to be deposited, the first carrier 300 can be fixedly installed on the mounting frame 200; To deposit the powdery object to be coated, you can choose to install the second carrier 400 on the mounting frame 200, and connect the second carrier 400 to the driving member 510, and drive the second carrier 400 to rotate through the driving member 510 , break up the powder to be coated to avoid powder agglomeration. Therefore, the device can not only deposit bulk objects to be coated, but also deposit powdery objects to be coated, and can disperse powdery objects to be coated, which meets the requirements of powdery objects to be coated. It is required that before deposition, it is only necessary to select and install the corresponding carrier according to the shape of the object to be coated, which makes the device more applicable.
参阅图3,在一些实施例中,第一承载件300上设有多个凹槽,凹槽用于容纳块状待包覆物。具体地,第一承载件300上设有第一凹槽310与第二凹槽320,第一凹槽310的尺寸略大于第二凹槽320,可以根据块状待包覆物的尺寸选择合适的凹槽,并将其置于选定的凹槽内即可。第一凹槽310与第二凹槽320的位置不限于附图所示方式,数量也不限于两个。需要说明的是,块状待包覆物的形状不做限制,可以是板状,也可以是柱状,还可以是球状或其他形状。优选地,凹槽的长度与宽度中的一个与块状待包覆物一个方向的尺寸大致相等,如此,可以对块状待包覆物进行一定程度的限位,以免气体吹过块状待包覆物时气压过大将块状待包覆物推动而发生位置偏移并脱离凹槽。Referring to FIG. 3 , in some embodiments, the first carrier 300 is provided with a plurality of grooves, and the grooves are used to accommodate block-shaped objects to be covered. Specifically, the first carrier 300 is provided with a first groove 310 and a second groove 320, the size of the first groove 310 is slightly larger than the size of the second groove 320, and the appropriate size can be selected according to the size of the block to be covered. and place it in the selected groove. The positions of the first groove 310 and the second groove 320 are not limited to those shown in the drawings, and the number is not limited to two. It should be noted that the shape of the block to be coated is not limited, and may be plate-like, columnar, spherical or other shapes. Preferably, one of the length and width of the groove is approximately equal to the size of the block to be covered in one direction, so that the block to be covered can be limited to a certain extent to prevent the gas from blowing through the block to be covered. When wrapping, the air pressure is too high to push the block to be wrapped to shift its position and break away from the groove.
参阅图3,在一些实施例中,第一使用状态下,将第一承载件300固定安装至安装架200上时,可以使第一承载件300与安装架200通过螺纹紧固件连接。具体地,第一承载件300放置于安装架200的顶部,二者之间通过螺钉进行固定。或者,在一些实施例中,第一承载件300与安装架200之间也可以通过卡扣连接实现安装。或者,在一些实施例中,第一承载件300与安装架200也可以通过磁吸固定,例如,在二者上均设置磁性件进行吸附固定。Referring to FIG. 3 , in some embodiments, in the first use state, when the first carrier 300 is fixedly installed on the mounting frame 200 , the first carrier 300 and the mounting frame 200 can be connected by threaded fasteners. Specifically, the first carrier 300 is placed on the top of the installation frame 200, and the two are fixed by screws. Alternatively, in some embodiments, the installation between the first bearing member 300 and the installation frame 200 may also be realized through snap connection. Alternatively, in some embodiments, the first bearing member 300 and the installation frame 200 may also be fixed by magnetic attraction, for example, magnetic members are provided on both of them for adsorption and fixation.
参阅图2、图4至图6,图4为图2中第二承载件的爆炸图(省略部分部件),图5为图2中第二承载件的另一角度的爆炸图(省略部分部件),图6为图2中第二承载件的俯视图(省略部分部件)。在一些实施例中,第二使用状态下,将第二承载件400固定安装至安装架200上时,第二承载件400与安装架 200之间通过轴承连接,第二承载件400的转轴460与驱动件510连接。沉积过程中,驱动件510可以驱动第二承载件400相对于安装架200进行转动,转动过程中,粉状待包覆物在第二承载件400内不断的上下翻滚,可以防止粉末发生结块,还能增大粉末与前驱体气体的接触概率,使粉末与前驱体气体更加充分的接触反应,使沉积效果较好。具体地,驱动件510可以为旋转电机或旋转气缸等部件,第二承载件400的转轴460穿过腔门120上设置的通孔121,并与驱动件510的输出轴通过联轴器520连接。在一些实施例中,还可以在驱动件510与第二承载件400之间设置传动组件,例如,在二者之间设置齿轮组或同步带等部件,通过传动组件实现减速或增速。Referring to Fig. 2, Fig. 4 to Fig. 6, Fig. 4 is an exploded view of the second carrier in Fig. 2 (some parts are omitted), and Fig. 5 is an exploded view of the second carrier in Fig. 2 from another angle (some parts are omitted ), and FIG. 6 is a top view of the second carrier in FIG. 2 (some components are omitted). In some embodiments, in the second use state, when the second carrier 400 is fixedly installed on the mounting frame 200, the second carrier 400 and the mounting frame 200 are connected by a bearing, and the rotating shaft 460 of the second carrier 400 Connect with the driver 510. During the deposition process, the driving part 510 can drive the second carrier 400 to rotate relative to the mounting frame 200. During the rotation, the powdery object to be coated is continuously rolled up and down in the second carrier 400, which can prevent the powder from agglomerating , it can also increase the contact probability between the powder and the precursor gas, so that the contact reaction between the powder and the precursor gas is more sufficient, and the deposition effect is better. Specifically, the driving member 510 can be a rotating motor or a rotating cylinder, and the rotating shaft 460 of the second carrier 400 passes through the through hole 121 provided on the chamber door 120, and is connected with the output shaft of the driving member 510 through a coupling 520 . In some embodiments, a transmission assembly can also be provided between the driving member 510 and the second carrier 400 , for example, a gear set or a timing belt and other components are provided between the two, and the deceleration or speed-up can be realized through the transmission assembly.
在一些实施例中,第二承载件400还包括抽气管470,抽气管470与反应室主体110上设置的抽气口112连通,可以将真空泵等部件连接于抽气口112处,经抽气管470将第二承载件400内流经粉末后的气体抽走。抽气管470与转轴460同轴设置,沿第二承载件400的轴向,转轴460位于第二承载件400的一端,抽气管470位于第二承载件400的另一端。在驱动件510工作时,通常需要对转矩输入端,即转轴460所在区域进行降温,以免部件温度过高发生故障。本实施例中,将抽气管470与转轴460分别设置于两端,二者间距较远,对转轴460区域进行降温时,抽气管470内温度不易受降温影响,前驱体经抽气管470被抽走时,不易因温度过低而冷凝,从而不易堵塞抽气管470。其次,和抽气管470与转轴460设置于同一端相比,二者分设于两端对于抽气管470处的密封要求有所降低,无需设置结构较为复杂的磁流体密封结构,可以简化结构,降低成本与装配难度。再者,磁流体密封结构在超过120℃时会失效,本实施例中无需设置磁流体密封结构,则可以提高沉积的温度上限,使该装置可以用于高温原子层沉积,装置的适用范围更广。In some embodiments, the second carrier 400 further includes an exhaust pipe 470, which communicates with the air outlet 112 provided on the reaction chamber main body 110, and can connect components such as a vacuum pump to the air outlet 112. The gas flowing through the powder in the second carrier 400 is sucked away. The air extraction pipe 470 is arranged coaxially with the rotating shaft 460 . Along the axial direction of the second carrier 400 , the rotating shaft 460 is located at one end of the second carrier 400 , and the air extraction pipe 470 is located at the other end of the second carrier 400 . When the driving member 510 is working, it is usually necessary to cool down the torque input end, that is, the area where the rotating shaft 460 is located, so as to prevent components from becoming overheated and malfunctioning. In this embodiment, the exhaust pipe 470 and the rotating shaft 460 are arranged at both ends respectively, and the distance between the two is far away. When cooling the area of the rotating shaft 460, the temperature in the exhaust pipe 470 is not easily affected by the cooling, and the precursor is pumped through the exhaust pipe 470. When walking, it is not easy to condense because the temperature is too low, so that it is not easy to block the exhaust pipe 470 . Secondly, compared with the air extraction pipe 470 and the rotating shaft 460 being arranged at the same end, the two ends are separately arranged to reduce the sealing requirements at the air extraction pipe 470, and there is no need to set a magnetic fluid sealing structure with a relatively complicated structure, which can simplify the structure and reduce Cost and difficulty of assembly. Furthermore, the magnetic fluid sealing structure will fail when it exceeds 120 ° C. In this embodiment, there is no need to set a magnetic fluid sealing structure, so the upper limit of the deposition temperature can be increased, so that the device can be used for high-temperature atomic layer deposition, and the application range of the device is wider. wide.
具体地,在一些实施例中,安装架200的中心区域设有贯通的容纳槽210,沿轴向,容纳槽210的两端各设有一个安装槽220。第二承载件400位于容纳槽210内,转轴460与抽气管470分别安装于对应的安装槽220内。转轴460与对应的安装槽220之间通过第一轴承530连接,第一轴承530与该安装槽220之间过盈配合。抽气管470与对应的安装槽220之间通过第二轴承540连接,第 二轴承540与该安装槽220之间过盈配合。因此,若要对粉状待包覆物进行沉积,将第一轴承530与第二轴承540卡入对应的安装槽220内即可;若要对块状待包覆物进行沉积,将第一轴承530与第二轴承540从对应的安装槽220内拆除,再安装上第一承载件300即可,操作十分方便。Specifically, in some embodiments, a central area of the installation frame 200 is provided with a through receiving groove 210 , and along the axial direction, two ends of the receiving groove 210 are respectively provided with an installation groove 220 . The second supporting member 400 is located in the receiving groove 210 , and the rotating shaft 460 and the exhaust pipe 470 are respectively installed in the corresponding installing groove 220 . The rotating shaft 460 is connected to the corresponding installation groove 220 through the first bearing 530 , and the first bearing 530 is in interference fit with the installation groove 220 . The air suction pipe 470 is connected with the corresponding mounting groove 220 through the second bearing 540, and the interference fit between the second bearing 540 and the mounting groove 220. Therefore, if the powdery object to be coated is to be deposited, the first bearing 530 and the second bearing 540 should be snapped into the corresponding installation groove 220; if the bulky object to be coated is to be deposited, the first The bearing 530 and the second bearing 540 are removed from the corresponding installation slots 220, and then the first bearing member 300 is installed, which is very convenient to operate.
具体地,在一些实施例中,第二承载件400包括内支撑网420、外支撑网410、内过滤网440、外过滤网430、第一端盖451与第二端盖452等部件。内支撑网420与外支撑网410均呈两端开口的空心圆柱状,外支撑网410沿径向设置于内支撑网420的外部,二者之间具有间隙。内过滤网440套设于内支撑网420的外部,二者贴合且固定连接,外过滤网430套设于外支撑网410的外部,二者贴合且固定连接。内支撑网420可以对内过滤网440进行支撑固定,以免其发生变形,类似的,外支撑网410可以对外过滤网430进行支撑固定。内支撑网420与外支撑网410均呈镂空状,二者的侧壁上均设有沿径向贯通的孔位,孔位形状不做限制,可以为圆形、条形或方形等形状。第一端盖451固定于内支撑网420与外支撑网410的一端,第二端盖452固定于另一端。内过滤网440与外支撑网410之间形成容纳腔体481,内支撑网420的内部形成抽气腔体482,抽气腔体482与抽气管470连通。粉状待包覆物被放置于容纳腔体481内,内过滤网440与外过滤网430均选用高目数过滤网,可以对粉状待包覆物进行阻隔,防止其朝内泄露进入抽气腔体482而被抽走,并防止其朝外泄露至第二承载件400的外部。Specifically, in some embodiments, the second carrier 400 includes components such as an inner support net 420 , an outer support net 410 , an inner filter net 440 , an outer filter net 430 , a first end cover 451 and a second end cover 452 . Both the inner support net 420 and the outer support net 410 are in the shape of a hollow cylinder with two ends open, and the outer support net 410 is arranged radially outside the inner support net 420 with a gap between them. The inner filter 440 is sleeved on the outside of the inner support net 420 , and the two are attached and fixedly connected. The outer filter 430 is sleeved on the outside of the outer support net 410 , and the two are attached and fixedly connected. The inner support net 420 can support and fix the inner filter net 440 to avoid its deformation. Similarly, the outer support net 410 can support and fix the outer filter net 430 . Both the inner support net 420 and the outer support net 410 are hollowed out, and the side walls of both are provided with radially penetrating holes. The first end cover 451 is fixed on one end of the inner support net 420 and the outer support net 410 , and the second end cover 452 is fixed on the other end. An accommodating cavity 481 is formed between the inner filter net 440 and the outer support net 410 , and an air extraction cavity 482 is formed inside the inner support net 420 , and the air extraction cavity 482 communicates with the air extraction pipe 470 . The powdery object to be coated is placed in the housing cavity 481, and the inner filter 440 and the outer filter 430 are both made of high-mesh filters, which can block the powdery object to be coated and prevent it from leaking inward into the pump. The air cavity 482 is drawn away, and it is prevented from leaking outward to the outside of the second carrier 400 .
进行原子层沉积时,粉状待包覆物放置于容纳腔体481内,真空泵连接于反应室主体110上设置的抽气口112处,不同的前驱体交替从反应室主体110上设置的进气口111处进入反应腔体130内,依次经过外过滤网430与外支撑网410后进入容纳腔体481,与粉末接触并进行包覆沉积,多余的前驱体依次经过内过滤网440与内支撑网420后进入抽气腔体482,并经抽气管470被抽走。When performing atomic layer deposition, the powdery object to be coated is placed in the containing cavity 481, the vacuum pump is connected to the gas extraction port 112 provided on the reaction chamber main body 110, and different precursors are alternately fed from the air inlet provided on the reaction chamber main body 110. Port 111 enters the reaction chamber 130, passes through the outer filter 430 and the outer support 410 in turn, and then enters the accommodating chamber 481, contacts with the powder and performs coating deposition, and the excess precursor passes through the inner filter 440 and the inner support in turn. The net 420 then enters the suction cavity 482 and is sucked away through the suction pipe 470 .
在一些实施例中,内过滤网440通过滤网固定卡箍490固定于内支撑网420的外部。具体地,内过滤网440与内支撑网420的外壁的形状尺寸匹配,将内过滤网440套设于内支撑网420的外壁处,再将滤网固定卡箍490固定内过滤网440外部,将其锁紧即可。类似的,外过滤网430也通过滤网固定卡箍490固定 于外支撑网410的外部。In some embodiments, the inner filter 440 is fixed to the outside of the inner support net 420 through a filter fixing clip 490 . Specifically, the inner filter 440 matches the shape and size of the outer wall of the inner support 420, the inner filter 440 is sleeved on the outer wall of the inner support 420, and then the filter fixing clamp 490 is fixed to the outside of the inner filter 440, Just lock it tight. Similarly, the outer filter screen 430 is also fixed on the outside of the outer support net 410 by the filter screen fixing clip 490.
参阅图2、图4至图6,具体地,在一些实施例中,外支撑网410包括外支撑网第一端板412,外支撑网第一端板412一体连接于外支撑网侧板411的一端。转轴460设置于第一端盖451上,第一端盖451与外支撑网第一端板412可拆卸连接。转轴460与内支撑网420可拆卸连接,具体地,转轴460穿过外支撑网第一端板412,转轴460上位于外支撑网第一端板412内侧的部分插入内支撑网420内,且过盈配合,二者之间设置有密封圈。同时,外支撑网第一端板412与第一端盖451通过螺纹紧固件连接。优选地,转轴460上位于外支撑网第一端板412内侧的部分在插入内支撑网420的方向上,直径逐渐减小,即这部分设置有斜度,如此,可以便于将支撑网420从外支撑网第一端板412上拆除。Referring to Fig. 2, Fig. 4 to Fig. 6, specifically, in some embodiments, the outer support net 410 includes a first end plate 412 of the outer support net, and the first end plate 412 of the outer support net is integrally connected to the side plate 411 of the outer support net one end. The rotating shaft 460 is disposed on the first end cover 451 , and the first end cover 451 is detachably connected to the first end plate 412 of the outer support net. The rotating shaft 460 is detachably connected to the inner supporting net 420, specifically, the rotating shaft 460 passes through the first end plate 412 of the outer supporting net, and the part of the rotating shaft 460 located inside the first end plate 412 of the outer supporting net is inserted into the inner supporting net 420, and Interference fit, a sealing ring is arranged between the two. At the same time, the first end plate 412 of the outer support net is connected to the first end cover 451 through threaded fasteners. Preferably, the part of the rotating shaft 460 located inside the first end plate 412 of the outer support net is inserted into the inner support net 420. The diameter gradually decreases, that is, this part is provided with a slope, so that the support net 420 can be easily moved from The first end plate 412 of the outer support net is removed.
进一步地,在一些实施例中,外支撑网410还包括外支撑网第二端板413,外支撑网第二端板413与外支撑网第一端板412分别连接于外支撑网侧板411的两端。第二端盖452与外支撑网第二端板413可拆卸连接,抽气管470设置于第二端盖452上,抽气管470的端部与内支撑网420固定连接,例如,抽气管470的端部与内支撑网420之间过盈配合,或者,二者通过粘接固定。具体地,在一些实施例中,抽气管470内部中空,其穿过外支撑网第二端板413,抽气管470上位于外支撑网第二端板413内侧的部分插入内支撑网420内,且过盈配合,二者之间设置有密封圈。同时,外支撑网第二端板413与第二端盖452通过螺纹紧固件连接。外支撑网第二端板413上设有缺口4131,缺口4131呈圆形,缺口4131的边缘沿轴向的投影位于容纳腔体481内靠近外支撑网410的一侧,即缺口4131半径设置的较大。如此,向容纳腔体481内放入粉末,以及完成沉积后从容纳腔体481内取出粉末时都更加方便。具体地,放入粉末时,先将粉末从缺口4131处放入容纳腔体481内,然后将第二端盖452安装至外支撑网第二端板413上。取出粉末时,将第二端盖452从外支撑网第二端板413上拆下,拆下的同时,将内支撑网420与内过滤网440一起带出,然后倾倒出粉末。如前所述,转轴460上位于外支撑网第一端板412内侧的部分设置有斜度,因此,在拆下第二端盖452时,内支撑网420更易与外支撑网第一端板412分离。Further, in some embodiments, the outer support net 410 also includes a second end plate 413 of the outer support net, and the second end plate 413 of the outer support net and the first end plate 412 of the outer support net are respectively connected to the side plates 411 of the outer support net. both ends. The second end cover 452 is detachably connected with the second end plate 413 of the outer support network, the air extraction pipe 470 is arranged on the second end cover 452, and the end of the air extraction pipe 470 is fixedly connected with the inner support network 420, for example, the end of the air extraction pipe 470 There is an interference fit between the end and the inner support net 420, or the two are fixed by bonding. Specifically, in some embodiments, the suction pipe 470 is hollow inside, and passes through the second end plate 413 of the outer support net, and the part of the suction pipe 470 located inside the second end plate 413 of the outer support net is inserted into the inner support net 420, And interference fit, a sealing ring is arranged between the two. At the same time, the second end plate 413 of the outer support net is connected to the second end cover 452 through threaded fasteners. The second end plate 413 of the outer support net is provided with a notch 4131, the notch 4131 is circular, and the projection of the edge of the notch 4131 along the axial direction is located in the housing cavity 481 on the side close to the outer support net 410, that is, the radius of the notch 4131 is set larger. In this way, it is more convenient to put the powder into the accommodating cavity 481 and take out the powder from the accommodating cavity 481 after the deposition is completed. Specifically, when putting in the powder, the powder is put into the accommodating cavity 481 from the notch 4131 first, and then the second end cover 452 is installed on the second end plate 413 of the outer support net. When taking out the powder, the second end cover 452 is removed from the second end plate 413 of the outer support net, and at the same time, the inner support net 420 and the inner filter net 440 are taken out together, and then the powder is poured out. As mentioned above, the portion of the rotating shaft 460 that is located inside the first end plate 412 of the outer support net is provided with a slope, so when the second end cover 452 is removed, the inner support net 420 is more easily connected to the first end plate of the outer support net. 412 Separation.
优选地,转轴460上设有异形槽461,异形槽461为盲孔,具有台阶面,与 联轴器520连接时可以进行限位。Preferably, the rotating shaft 460 is provided with a special-shaped groove 461, and the special-shaped groove 461 is a blind hole with a stepped surface, which can limit the position when connected with the coupling 520.
在一些实施例中,第二承载件400包括内过滤网440、外过滤网430、第一端盖451与第二端盖452等部件。内过滤网440、外过滤网430均呈两端开口的空心圆柱状,外过滤网430沿径向设置于内过滤网440的外部,二者之间具有间隙。第一端盖451固定于内过滤网440与外过滤网430的一端,第二端盖452固定于另一端。内过滤网440与外过滤网430之间形成容纳腔体481,内过滤网440的内部形成抽气腔体482,抽气腔体482与抽气管470连通。粉状待包覆物被放置于容纳腔体481内,内过滤网440与外过滤网430均选用高目数过滤网,可以对粉状待包覆物进行阻隔,防止其朝内泄露进入抽气腔体482而被抽走,并防止其朝外泄露至第二承载件400的外部。内过滤网440、外过滤网430均选用烧结过滤网,此类过滤网的强度较高,不易变形。In some embodiments, the second carrier 400 includes components such as an inner filter 440 , an outer filter 430 , a first end cover 451 and a second end cover 452 . Both the inner filter 440 and the outer filter 430 are hollow cylinders with two ends open, and the outer filter 430 is arranged radially outside the inner filter 440 with a gap between them. The first end cover 451 is fixed on one end of the inner filter 440 and the outer filter 430 , and the second end cover 452 is fixed on the other end. An accommodating cavity 481 is formed between the inner filter 440 and the outer filter 430 , and an air extraction cavity 482 is formed inside the inner filter 440 , and the air extraction cavity 482 communicates with the air extraction pipe 470 . The powdery object to be coated is placed in the housing cavity 481, and the inner filter 440 and the outer filter 430 are both made of high-mesh filters, which can block the powdery object to be coated and prevent it from leaking inward into the pump. The air cavity 482 is drawn away, and it is prevented from leaking outward to the outside of the second carrier 400 . Both the inner filter 440 and the outer filter 430 are made of sintered filter, which has high strength and is not easily deformed.
参阅图1,在一些实施例中,反应室主体110上安装有石英玻璃140,反应室主体110的外部设置有红外加热灯,红外加热灯能够透过石英玻璃140对反应腔体130加热。与电阻加热等方式相比,采用红外加热的加热速度较快,且无需像电阻加热那样按照反应室的尺寸定制加热套,也无需设置专门的固定结构,可以简化结构。Referring to FIG. 1 , in some embodiments, quartz glass 140 is installed on the reaction chamber body 110 , and an infrared heating lamp is arranged outside the reaction chamber body 110 , and the infrared heating lamp can heat the reaction chamber 130 through the quartz glass 140 . Compared with resistance heating and other methods, the heating speed of infrared heating is faster, and there is no need to customize the heating jacket according to the size of the reaction chamber like resistance heating, and there is no need to set a special fixed structure, which can simplify the structure.
在一些实施例中,还设有与腔门120、驱动件510均固定连接的支架610,支架610的底部固定连接有滑块620,滑块620与滑轨630滑动连接。推动腔门120,使其靠近或远离反应室主体110时,滑块620将会沿滑轨630滑动,以进行导向。In some embodiments, there is also a bracket 610 fixedly connected to the chamber door 120 and the driving member 510 , a slider 620 is fixedly connected to the bottom of the bracket 610 , and the slider 620 is slidably connected to the slide rail 630 . When the chamber door 120 is pushed to approach or move away from the reaction chamber body 110 , the slider 620 will slide along the slide rail 630 for guidance.
使用上述一实施例中的原子层沉积装置进行原子层沉积时,先将腔门120与反应室主体110连接,检查装置是否正常运行,经抽气口112将反应腔体130抽真空。然后将腔门120与反应室主体110分离,根据待包覆物的形态选择对应的承载件,若为块状待包覆物,则将第一承载件300固定于安装架200上;若为粉状待包覆物,则将第二承载件400安装于安装架200上。接下来以粉状待包覆物为例进行说明。再次将腔门120与反应室主体110连接,使用红外加热灯对反应腔体130进行加热,并开启驱动件510,驱动第二承载件400转动(若为第一承载件300,则驱动件510不开启)。将载气经进气口111通入反应腔体 130内,载气流入容纳腔体481与粉状待包覆物接触后,经抽气腔体482流入抽气管470,从抽气口112被抽出。载气可以为氮气或惰性气体,先通入载气可以对内部进行清洁,去除杂质。然后将第一前驱体混入载气,一起通入进气口111,第一前驱体吸附于粉状待包覆物表面进行沉积,多余的第一前驱体从抽气腔体482流入抽气管470并被抽出。随着第二承载件400不断转动,第一前驱体能充分与粉状待包覆物接触并吸附。一段时间后,停止通入第一前驱体,载气依然继续通入,通过载气对内部进行吹扫清洁。吹扫一段时间后,将第二前驱体混入载气,一起通入进气口111,第二前驱体与第一前驱体在待包覆粉末表面发生化学反应,反应产物即为包覆材料,多余的第二前驱体从抽气腔体482流入抽气管470并被抽出。一段时间后,停止通入第二前驱体,载气依然继续通入,通过载气对内部进行吹扫清洁。如此为一个原子层沉积循环,即在待包覆物表面沉积了一个原子层厚度的薄膜。实验中,通过控制循环次数控制沉积层数,进而达到预期的包覆厚度。待沉积完成,载气吹扫一段时间后,关闭真空泵,停止从抽气口112抽出气体,载气继续通入进行返气,使内部气压逐渐与大气压相等后,将腔门120与反应室主体110分离,降温至常温,并拆除第二承载件400,打开第二端盖452,将产物从外支撑网第二端板413上的缺口4131处倒出即可。When using the atomic layer deposition apparatus in the above-mentioned embodiment for atomic layer deposition, first connect the chamber door 120 to the reaction chamber main body 110 to check whether the apparatus is operating normally, and then vacuumize the reaction chamber 130 through the pumping port 112 . Then the chamber door 120 is separated from the reaction chamber main body 110, and the corresponding carrier is selected according to the shape of the object to be coated. If it is a block object to be coated, the first carrier 300 is fixed on the mounting frame 200; if it is For the powdery object to be coated, install the second carrier 400 on the mounting frame 200 . Next, the powdery object to be coated will be described as an example. Connect the chamber door 120 to the reaction chamber main body 110 again, use an infrared heating lamp to heat the reaction chamber body 130, and turn on the driver 510 to drive the second carrier 400 to rotate (if it is the first carrier 300, the driver 510 not open). Pass the carrier gas into the reaction chamber 130 through the gas inlet 111, and after the carrier gas flows into the accommodating chamber 481 and contacts the powdery object to be coated, it flows into the suction pipe 470 through the pumping cavity 482, and is drawn out from the gas pumping port 112 . The carrier gas can be nitrogen or inert gas, and the carrier gas can be passed through first to clean the interior and remove impurities. Then the first precursor is mixed into the carrier gas and passed into the air inlet 111 together. The first precursor is adsorbed on the surface of the powdery object to be coated for deposition, and the excess first precursor flows from the pumping cavity 482 into the pumping pipe 470 and was drawn out. As the second carrier 400 continues to rotate, the first precursor can fully contact and absorb the powdery object to be coated. After a period of time, the first precursor is stopped, and the carrier gas is still fed in, and the interior is purged and cleaned by the carrier gas. After purging for a period of time, the second precursor is mixed into the carrier gas and passed into the air inlet 111 together. The second precursor and the first precursor undergo a chemical reaction on the surface of the powder to be coated, and the reaction product is the coating material. The excess second precursor flows from the pumping chamber 482 into the pumping tube 470 and is pumped out. After a period of time, the second precursor is stopped, and the carrier gas is still fed in, and the interior is purged and cleaned by the carrier gas. This is an atomic layer deposition cycle, that is, a thin film with an atomic layer thickness is deposited on the surface of the object to be coated. In the experiment, the number of deposited layers was controlled by controlling the number of cycles to achieve the expected coating thickness. After the deposition is completed and the carrier gas is purged for a period of time, turn off the vacuum pump, stop pumping out the gas from the pumping port 112, and continue to pass the carrier gas in for return gas, so that the internal pressure is gradually equal to the atmospheric pressure, and then the chamber door 120 and the reaction chamber main body 110 are connected. Separate, cool down to normal temperature, remove the second carrier 400, open the second end cover 452, and pour the product out from the gap 4131 on the second end plate 413 of the outer support net.
以上所述实施例的各技术特征可以进行任意的组合,为使描述简洁,未对上述实施例中的各个技术特征所有可能的组合都进行描述,然而,只要这些技术特征的组合不存在矛盾,都应当认为是本说明书记载的范围。The technical features of the above-mentioned embodiments can be combined arbitrarily. To make the description concise, all possible combinations of the technical features in the above-mentioned embodiments are not described. However, as long as there is no contradiction in the combination of these technical features, should be considered as within the scope of this specification.
以上所述实施例仅表达了本发明的几种实施方式,其描述较为具体和详细,但并不能因此而理解为对发明专利范围的限制。应当指出的是,对于本领域的普通技术人员来说,在不脱离本发明构思的前提下,还可以做出若干变形和改进,这些都属于本发明的保护范围。因此,本发明专利的保护范围应以所附权利要求为准。The above-mentioned embodiments only express several implementation modes of the present invention, and the descriptions thereof are relatively specific and detailed, but should not be construed as limiting the patent scope of the invention. It should be pointed out that those skilled in the art can make several modifications and improvements without departing from the concept of the present invention, and these all belong to the protection scope of the present invention. Therefore, the protection scope of the patent for the present invention should be based on the appended claims.

Claims (11)

  1. 原子层沉积装置,其特征在于,包括:The atomic layer deposition device is characterized in that it comprises:
    反应室,所述反应室包括反应室主体与腔门,所述反应室主体的内部形成反应腔体,所述反应室主体上设有进气口与抽气口,所述腔门与所述反应室主体可拆卸连接;A reaction chamber, the reaction chamber includes a reaction chamber main body and a door, the interior of the reaction chamber main body forms a reaction chamber, the reaction chamber main body is provided with an air inlet and an air extraction port, the door and the reaction chamber The main body of the chamber is detachably connected;
    安装架,所述安装架与所述腔门固定连接,所述腔门与所述反应室主体连接时,所述安装架位于所述反应腔体的内部;a mounting frame, the mounting frame is fixedly connected to the chamber door, and when the chamber door is connected to the main body of the reaction chamber, the mounting frame is located inside the reaction chamber;
    第一承载件,所述第一承载件用于承载块状待包覆物,所述第一承载件与所述安装架可拆卸连接;A first carrier, the first carrier is used to carry a block-shaped object to be covered, and the first carrier is detachably connected to the mounting frame;
    第二承载件,所述第二承载件用于承载粉状待包覆物,所述第二承载件与所述安装架可拆卸连接;A second carrier, the second carrier is used to carry the powdery object to be coated, and the second carrier is detachably connected to the installation frame;
    驱动件;driver;
    第一使用状态下,所述第一承载件与所述安装架固定连接;In the first use state, the first carrier is fixedly connected to the installation frame;
    第二使用状态下,所述第二承载件与所述安装架连接,且所述驱动件与所述第二承载件连接,所述驱动件用于驱动所述第二承载件相对于所述安装架转动。In the second use state, the second carrier is connected to the installation frame, and the driving member is connected to the second carrier, and the driving member is used to drive the second carrier relative to the The mount turns.
  2. 根据权利要求1所述的原子层沉积装置,其特征在于,所述第一承载件上设有多个凹槽,所述凹槽用于容纳所述块状待包覆物。The atomic layer deposition apparatus according to claim 1, wherein a plurality of grooves are provided on the first carrier, and the grooves are used to accommodate the block-shaped object to be coated.
  3. 根据权利要求1所述的原子层沉积装置,其特征在于,所述第一使用状态下,所述第一承载件与所述安装架通过螺纹紧固件连接;或者,所述第一承载件与所述安装架卡扣连接;或者,所述第一承载件与所述安装架通过磁吸固定。The atomic layer deposition apparatus according to claim 1, characterized in that, in the first use state, the first carrier is connected to the mounting frame by a threaded fastener; or, the first carrier It is snap-connected with the installation frame; or, the first carrier is fixed with the installation frame through magnetic attraction.
  4. 根据权利要求1所述的原子层沉积装置,其特征在于,所述第二使用状态下,所述第二承载件与所述安装架之间通过轴承连接,所述第二承载件的转轴与所述驱动件连接。The atomic layer deposition apparatus according to claim 1, characterized in that, in the second use state, the second carrier is connected to the mounting bracket through a bearing, and the rotating shaft of the second carrier is connected to the The driver is connected.
  5. 根据权利要求4所述的原子层沉积装置,其特征在于,所述第二承载件 还包括抽气管,所述抽气管与所述抽气口连接,所述抽气管与所述转轴同轴设置,且二者分别位于所述第二承载件沿轴向的两端。The atomic layer deposition apparatus according to claim 4, wherein the second carrier further comprises an air extraction pipe, the air extraction pipe is connected to the air extraction port, and the air extraction pipe is arranged coaxially with the rotating shaft, And the two are respectively located at two ends of the second bearing member along the axial direction.
  6. 根据权利要求5所述的原子层沉积装置,其特征在于,所述安装架的中心区域设有贯通的容纳槽,所述第二承载件位于所述容纳槽内,沿所述轴向,所述容纳槽的两端各设有一个安装槽,所述转轴与所述抽气管上均套设有所述轴承,所述轴承与对应的所述安装槽过盈配合。The atomic layer deposition apparatus according to claim 5, characterized in that, the central area of the installation frame is provided with a through accommodation groove, the second carrier is located in the accommodation groove, along the axial direction, the Two ends of the receiving groove are respectively provided with a mounting groove, and the bearings are sheathed on the rotating shaft and the exhaust pipe, and the bearings are interference-fitted with the corresponding mounting grooves.
  7. 根据权利要求5所述的原子层沉积装置,其特征在于,所述第二承载件包括沿径向设置的内支撑网与外支撑网,以及分别连接于二者的两端的第一端盖与第二端盖,所述内支撑网与所述外支撑网均呈镂空状,所述内支撑网的外部套设有内过滤网,所述外支撑网的外部套设有外过滤网,所述内过滤网与所述外支撑网之间形成用于容纳所述粉状待包覆物的容纳腔体,所述内支撑网的内部形成与所述抽气管连通的抽气腔体。The atomic layer deposition apparatus according to claim 5, wherein the second carrier comprises an inner support net and an outer support net radially arranged, and a first end cap and an outer support net respectively connected to both ends of the two. The second end cap, the inner support net and the outer support net are both hollowed out, the inner support net is covered with an inner filter net, and the outer support net is covered with an outer filter net, so An accommodating cavity for accommodating the powdery object to be coated is formed between the inner filter net and the outer support net, and an air extraction cavity communicated with the air extraction pipe is formed inside the inner support net.
  8. 根据权利要求7所述的原子层沉积装置,其特征在于,所述外支撑网包括外支撑网第一端板,所述第一端盖与所述外支撑网第一端板可拆卸连接,所述转轴设置于所述第一端盖上,所述转轴与所述内支撑网可拆卸连接。The atomic layer deposition apparatus according to claim 7, wherein the outer support net comprises a first end plate of the outer support net, and the first end cover is detachably connected to the first end plate of the outer support net, The rotating shaft is arranged on the first end cover, and the rotating shaft is detachably connected with the inner supporting net.
  9. 根据权利要求8所述的原子层沉积装置,其特征在于,所述外支撑网还包括外支撑网第二端板,所述第二端盖与所述外支撑网第二端板可拆卸连接,所述抽气管设置于所述第二端盖上,所述外支撑网第二端板上设有缺口,所述缺口的边缘沿轴向的投影位于所述容纳腔体内靠近所述外支撑网的一侧。The atomic layer deposition apparatus according to claim 8, wherein the outer support net further comprises a second end plate of the outer support net, and the second end cover is detachably connected to the second end plate of the outer support net , the exhaust pipe is arranged on the second end cover, a notch is provided on the second end plate of the outer support net, and the edge of the notch along the axial projection is located in the accommodating cavity close to the outer support side of the net.
  10. 根据权利要求5所述的原子层沉积装置,其特征在于,所述第二承载件包括沿径向设置内过滤网与外过滤网,以及分别连接于二者的两端的第一端盖与第二端盖,所述内过滤网与所述外过滤网均为烧结过滤网,所述内过滤网与所述外过滤网之间形成用于容纳所述粉状待包覆物的容纳腔体,所述内过滤网的 内部形成与所述抽气管连通的抽气腔体。The atomic layer deposition apparatus according to claim 5, wherein the second carrier includes an inner filter and an outer filter arranged radially, and a first end cap and a second end cap respectively connected to both ends of the two. Two end caps, the inner filter and the outer filter are sintered filters, and an accommodating cavity for accommodating the powder to be coated is formed between the inner filter and the outer filter , the inside of the inner filter screen forms a suction cavity communicated with the suction pipe.
  11. 根据权利要求1所述的原子层沉积装置,其特征在于,所述反应室主体上安装有石英玻璃,所述反应室主体的外部设置有红外加热灯,所述红外加热灯能够透过所述石英玻璃对所述反应腔体加热。The atomic layer deposition device according to claim 1, wherein quartz glass is installed on the main body of the reaction chamber, and an infrared heating lamp is arranged on the outside of the main body of the reaction chamber, and the infrared heating lamp can pass through the Quartz glass heats the reaction chamber.
PCT/CN2022/083415 2021-07-02 2022-03-28 Atomic layer deposition device WO2023273446A1 (en)

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