CN110684962B - Airflow dispersion device for coating equipment and application thereof - Google Patents
Airflow dispersion device for coating equipment and application thereof Download PDFInfo
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- CN110684962B CN110684962B CN201910997643.0A CN201910997643A CN110684962B CN 110684962 B CN110684962 B CN 110684962B CN 201910997643 A CN201910997643 A CN 201910997643A CN 110684962 B CN110684962 B CN 110684962B
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45587—Mechanical means for changing the gas flow
- C23C16/45589—Movable means, e.g. fans
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Coating Apparatus (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
The invention provides an airflow dispersion device for coating equipment and application thereof, wherein the airflow dispersion device is connected end to form a mounting cavity and an upper port and a lower port which are communicated with the mounting cavity so as to be used for mounting a bracket of the coating equipment, the airflow dispersion device is provided with an airflow dispersion surface and a plurality of through holes which are arranged on the airflow dispersion surface along the circumferential direction, so that part of the gas filled into a cavity of the coating equipment passes through the through holes to enter the mounting cavity, and the rest part of the gas diffuses along the extending direction of the airflow dispersion surface and enters the mounting cavity from the through holes, so that the gas diffuses to the surface of a base material mounted on the bracket as uniformly as possible, and the coating is coated on the surface of the base material as uniformly as possible.
Description
Technical Field
The invention relates to the field of coating, and further relates to an airflow dispersion device for coating equipment and application thereof.
Background
In recent years, with the development of science and technology, a coating process is widely applied to the fields of aerospace, automobile manufacturing, mechanical rework, hardware tool manufacturing, electronic device manufacturing, fabric manufacturing and the like as an effective method for improving the surface performance of a material.
Generally, in a coating process using a plasma chemical vapor deposition technique, a substrate is placed in a vacuum chamber of a coating apparatus, and the vacuum chamber is evacuated by a vacuum system during coating. Then, the inert gas such as nitrogen or argon and chemical gas monomer raw materials are continuously introduced, plasma environment is provided by electric discharge to activate the chemical monomer materials, and the activated chemical monomer materials are used for generating a polymer film layer on the surface of the substrate. To increase the deposition rate, the chamber is maintained at a lower pressure throughout the coating process.
Because the chamber of the coating apparatus needs to be continuously evacuated during the whole coating process, and the positions of the evacuation port, the gas inlet, and the feed port of the chamber of the coating apparatus are fixed, the chemical gas monomer tends to diffuse from the feed port to the evacuation port in the chamber under the action of pressure, so that the concentrations of the chemical gas monomer in the feed port region and the diffusion direction region are significantly higher than those in other regions in the chamber. In addition, in the process of diffusing the gaseous monomer material along the radial direction, the concentration of the gaseous monomer material is gradually decreased along with the continuous consumption of the coating film.
For example, when a conventional coating apparatus coats a keyboard film, in which a plurality of keyboard films are arranged in the chamber in the circumferential direction and each keyboard film extends in the radial direction, a gaseous monomer is introduced from a feed port at the side of the chamber, reaction off-gas is extracted from an extraction port at the middle of the chamber, the gaseous monomer is easily accumulated in the diffusion direction of the gas flow from the side wall to the middle of the chamber, and the monomer concentration is significantly high particularly at the feed port of the chamber. In order to reduce gas accumulation, it is known to rotate the support in the chamber about its central axis during the coating process so that each substrate is uniformly exposed to the gas in the circumferential direction as much as possible, but the substrate is not uniformly exposed to the gaseous monomer in the radial direction, resulting in a film layer coated on the surface of the substrate being gradually thinner and thicker in the radial direction. Especially for the base materials which are sensitive to colors, such as the keyboard film, the color difference of the two sides of the keyboard film can be seen by naked eyes due to the different thicknesses of the film layers, so that the keyboard film is not attractive, and the user experience is poor.
Disclosure of Invention
The invention aims to provide an air flow guiding and dispersing device for a coating device and application thereof, wherein the air flow guiding and dispersing device is used for blocking and dispersing air filled in a chamber of the coating device and enabling the air to be dispersed to the surface of a base material as uniformly as possible in a coating process, so that the surface of the base material is coated with a coating layer as uniformly as possible, and quality consistency and color uniformity are guaranteed.
Another object of the present invention is to provide an airflow dispersion device for a film coating apparatus and its application, wherein the airflow dispersion device realizes that the surface of the substrate along the radial direction can be coated with a uniform film layer as much as possible by the flowing direction of the dispersion gas, so as to prevent the color difference visible to the naked eye on the surface of the substrate, and ensure the beauty.
Another object of the present invention is to provide a gas flow dispersing device for a film coating apparatus and its application, wherein the gas flow dispersing device can disperse the gas flow in the flowing direction of the gas filled into the chamber, thereby preventing the gas from gathering in the flowing direction, and achieving the effect of dispersing the gas as uniformly as possible.
Another object of the present invention is to provide an airflow dispersion device for a coating apparatus and the application thereof, wherein the airflow dispersion device can be reused and is convenient for maintenance.
The invention also aims to provide an airflow dispersion device for the coating equipment and application thereof, wherein the airflow dispersion device has the advantages of simple structure, strong practicability and low cost.
According to one aspect of the present invention, the present invention provides an airflow dispersion device for a film plating apparatus, wherein the airflow dispersion device forms a mounting cavity for mounting a bracket of the film plating apparatus, and the airflow dispersion device has an airflow dispersion surface and a plurality of through holes arranged along a circumferential direction on the airflow dispersion surface, so that part of the gas filled in a chamber of the film plating apparatus enters the mounting cavity through the through holes, and the gas is diffused to the surface of a substrate mounted on the bracket as uniformly as possible.
In some embodiments, the airflow dispersion device further has an upper port and a lower port communicated with the mounting cavity, so that the rest of the gas filled into the chamber of the coating equipment is diffused along the extending direction of the airflow dispersion surface and enters the mounting cavity from the ports.
In some embodiments, the airflow dispersion device includes a high end portion, a middle end portion and a low end portion, wherein the high end portion, the middle end portion and the low end portion are sequentially and integrally connected to form the airflow dispersion surface, and the number of the through holes located at the middle end portion is greater than the number of the through holes located at the high end portion and the low end portion of the airflow dispersion surface, respectively.
In some embodiments, the airflow dispersion device includes a high end portion, a middle end portion and a low end portion, wherein the high end portion, the middle end portion and the low end portion are sequentially and integrally connected to form the airflow dispersion surface, and the aperture of the through hole located at the middle end portion is larger than the aperture of the through hole located at the high end portion and the aperture of the through hole located at the low end portion of the airflow dispersion surface.
In some embodiments, the number and the diameter of the through holes at the high end portion are the same as those of the through holes at the low end portion.
In some embodiments, the air deflector is adhesively joined together end-to-end and forms a cylindrical structure.
In some embodiments, the airflow dispersion device further comprises a first radial shield, wherein the first radial shield extends radially inward along the top end of the airflow dispersion device and forms the through opening.
In some embodiments, the high end has at least one connector, wherein the connector is adhesively attached to the first radial shield.
In some embodiments, the first radial shield is implemented as an annular structure having a radial width.
In some embodiments, the airflow dispersion device further comprises a second radial shield, wherein the second radial shield is removably mounted to the bottom end of the airflow dispersion device, wherein the second radial shield extends radially inward along the bottom end of the airflow dispersion device and forms the opening.
In some embodiments, the second radial shield comprises a radially extending portion and a connecting portion, wherein the connecting portion is connected to the radially extending portion perpendicularly, wherein the connecting portion is adapted to be mounted to a bottom end of the airflow dispersion device, and wherein the radially extending portion extends radially inward along the bottom end of the airflow dispersion device.
In some embodiments, the second radial shield is equal in radial width to the first radial shield.
According to another aspect of the present invention, the present invention further provides a film coating apparatus, wherein the film coating apparatus includes a chamber, a power supply and a support, wherein the film coating apparatus further includes the airflow dispersion device, and the airflow dispersion device is disposed on the support.
According to another aspect of the present invention, the present invention further provides a method for manufacturing an airflow dispersion device for a coating apparatus, comprising the steps of:
A. the coating equipment comprises an airflow dispersion device and a coating device, wherein the airflow dispersion device is of a cylindrical structure and forms a mounting cavity for mounting a bracket of the coating equipment, and the airflow dispersion device is provided with an airflow dispersion surface and a plurality of through holes which are arranged along the circumferential direction and are positioned on the airflow dispersion surface.
In some embodiments, the number of through holes at the middle end of the air dispersion surface is greater than the number of through holes at the high and low ends of the air dispersion surface, respectively.
In some embodiments, the aperture of the through hole at the middle end of the air flow dispersion surface is larger than the aperture of the through hole at the high end and the low end of the air flow dispersion surface, respectively.
In some embodiments, the number and the diameter of the through holes at the high end of the air flow dispersing surface are the same as those of the through holes at the low end of the air flow dispersing surface.
In some embodiments, further comprising the step of: a first radial shielding piece extends radially inwards to the high end of the airflow dispersion device and forms a through hole communicated with the installation cavity.
In some embodiments, further comprising the step of: and detachably mounting a second radial shielding piece on the lower end part of the airflow dispersion device, wherein the second radial shielding piece extends inwards along the lower end part in the radial direction and forms a through hole communicated with the mounting cavity.
Drawings
Fig. 1 is a schematic structural view of an airflow dispersion device applied to a coating apparatus according to a preferred embodiment of the present invention.
Fig. 2 is a schematic structural diagram of the airflow dispersion device and the bracket according to the above preferred embodiment of the present invention.
Fig. 3 is a schematic structural diagram of the airflow dispersion device according to the above preferred embodiment of the present invention.
Fig. 4 is a schematic plan view of the airflow dispersion device according to the above preferred embodiment of the present invention.
Fig. 5 is a perspective view of the airflow dispersion device according to the above preferred embodiment of the present invention.
Fig. 6 is a schematic structural view of a second radial shield of the airflow dispersion device according to the above preferred embodiment of the present invention.
Fig. 7 is a schematic airflow diagram of the airflow dispersion device for dispersing airflow according to the above preferred embodiment of the present invention.
Detailed Description
The following description is presented to disclose the invention so as to enable any person skilled in the art to practice the invention. The preferred embodiments in the following description are given by way of example only, and other obvious variations will occur to those skilled in the art. The basic principles of the invention, as defined in the following description, may be applied to other embodiments, variations, modifications, equivalents, and other technical solutions without departing from the spirit and scope of the invention.
It will be understood by those skilled in the art that in the present disclosure, the terms "longitudinal," "lateral," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like are used in an orientation or positional relationship indicated in the drawings for ease of description and simplicity of description, and do not indicate or imply that the referenced devices or components must be in a particular orientation, constructed and operated in a particular orientation, and thus the above terms are not to be construed as limiting the present invention.
It is understood that the terms "a" and "an" should be interpreted as meaning that a number of one element or element is one in one embodiment, while a number of other elements is one in another embodiment, and the terms "a" and "an" should not be interpreted as limiting the number.
In the description herein, references to the description of the term "one embodiment," "some embodiments," "an example," "a specific example," or "some examples," etc., mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above are not necessarily intended to refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, various embodiments or examples and features of different embodiments or examples described in this specification can be combined and combined by one skilled in the art without contradiction.
Referring to fig. 1 to 7, an airflow diffuser 100 according to a preferred embodiment of the present invention is shown, wherein the airflow diffuser 100 is used in a coating apparatus 500, wherein the coating apparatus 500 has a chamber 510 and at least one support 520, wherein the support 520 is disposed in the chamber 510, and wherein the support 520 is used for supporting at least one substrate, as shown in fig. 1. The chamber 510 is adapted to be filled with a gas 800 to coat the substrate by the coating apparatus 500, wherein the gas flow dispersing device 100 is disposed in the chamber 510 to prevent the gas 800 from gathering in a diffusion direction, so that the gas 800 is diffused as uniformly as possible to the surface of the substrate in the chamber 510, and the surface of the substrate is coated with a film layer as uniformly as possible to ensure uniform quality and uniform color.
For example, the chamber 510 has a pumping port for connecting a pumping pump for continuously pumping the gas in the chamber 510 outwards through the pumping port at a certain rate, a gas inlet for introducing a pipe for delivering an inert gas such as nitrogen or argon to fill the chamber 510 with the inert gas such as nitrogen or argon, and at least one material inlet for introducing a chemical gas material to fill the chamber 510 with the chemical gas material to provide a plasma environment and to generate the film on the surface of the substrate by a discharge reaction.
Typically, the feed port and the gas inlet are adjacent, wherein the feed port is remote from the pumping port, wherein the gas diffuses from the gas inlet and the feed port in the direction of the pumping port, wherein the support 520 and the substrate are placed between the feed port and the pumping port of the chamber 510, i.e., to ensure as far as possible that the gas reacts at the surface of the substrate and generates the protrusions. In order to prevent the gas 800 from gathering in the diffusion direction, the gas diffusion device 100 is disposed between the feed opening and the pumping opening of the chamber 510, wherein the gas diffusion device 100 is disposed between the feed opening and the support 520, and preferably, the gas diffusion device 100 is disposed between the feed opening and the support 520 in a vertical state, so that the gas 800 can be uniformly diffused to all the substrates mounted on the support 520.
In this embodiment, the inlet and the inlet are disposed on the sidewall of the chamber 510, wherein the pumping port is disposed in the middle of the chamber 510, wherein the pumping port may be formed by a pumping column that is vertical to the middle of the chamber 510, such that the gas 800 is diffused from the sidewall of the chamber 510 toward the middle, wherein the support 520 is disposed between the middle and the sidewall of the chamber 510 for being located in the diffusion direction of the gas, wherein the support 520 rotates around its central axis, such that all the substrates supported on the support 520 can be uniformly and uniformly located in the diffusion direction of the gas. It will be understood by those skilled in the art that the relative positions of the feed port, the gas inlet, and the pumping port can be adjusted, such as the feed port and the gas inlet are located in the middle or the top or bottom wall of the chamber, and the pumping port is located in the side wall or the top or bottom wall of the chamber, etc., without limitation.
Alternatively, the substrate may be a keyboard membrane, wherein the frame 520 has a plurality of support cavities 521 arranged along a circumferential direction and a central axis 522, wherein a plurality of substrates are mounted in the support cavities 521 arranged along the circumferential direction, wherein the substrates extend inward along a radial direction, that is, each substrate extends radially outward along the radial direction with the central axis 522 of the frame 520 as a symmetry axis. During coating, the holder 520 rotates around the central axis 522, wherein each substrate axially rotates around the central axis 522. Alternatively, the support chamber 521 is provided as a vertical chamber, wherein the substrate is held vertically to the support chamber 521. Alternatively, to reduce the vertical height of the support 520, the support chamber 521 is configured as an arc-shaped chamber, wherein the substrate is mounted to the support chamber 521 in an arc so as to be fittingly mounted to the support 520.
Preferably, the air deflector 100 is mounted on the outer side of the bracket 520, wherein the air deflector 100 is implemented in a ring structure or a cylindrical structure, and wherein the air deflector 100 is annularly wrapped on the outer side of the bracket 520. Alternatively, the support 520 is implemented as a cylindrical structure and forms at least one support cavity, wherein the substrate is placed in the support cavity 521 of the support 520, and wherein the airflow dispersion device 100 is implemented as a circular ring-like structure that is fittingly wrapped around the outside of the support 520. Alternatively, the bracket 520 may be implemented as a square column structure, wherein the bracket 520 is implemented as a square ring structure that is fittingly wrapped around the outer side of the bracket 520, etc., without being limited thereto. Optionally, the airflow dispersion device 100 remains fixed relative to the bracket 520, and when the bracket 520 rotates, the airflow dispersion device 100 rotates synchronously with the bracket 520. Optionally, the airflow dispersion device 100 is fixed to the chamber 510, wherein the airflow dispersion device 100 does not contact the bracket 520, such that the airflow dispersion device 100 remains fixed at all times and does not rotate as the bracket 520 rotates.
As shown in fig. 7, further, the airflow dispersion device 100 has an airflow dispersion surface 101 and a plurality of through holes 102 located on the airflow dispersion surface 101 and arranged along the circumferential direction, wherein the airflow dispersion device 100 forms a mounting cavity 110 and two through holes 120 respectively located on the upper side and the lower side and communicating with the mounting cavity 110, wherein the bracket 520 is mounted on the mounting cavity 110, wherein the airflow dispersion surface 101 is located between the charging opening (and the feeding opening) of the chamber 510 and the bracket 520, and wherein the airflow dispersion surface 101 is perpendicular to the diffusion direction of the gas 800 charged into the chamber 510. When the gas 800 is filled into the chamber 510, part of the gas diffuses to the supporting cavity 521 of the bracket 520 in the mounting cavity 110 through the through holes 102, and the rest of the gas diffuses along the extending direction of the gas flow dispersing surface 101 and diffuses to the supporting cavity 521 of the bracket 520 in the mounting cavity 110 from the through holes 120 at the upper and lower sides, so that the gas filled into the chamber 510 of the coating equipment 500 is dispersed, the gas is prevented from gathering in the diffusing direction, and the gas can diffuse to the surface of the substrate as uniformly as possible, so that the surface of the substrate is coated with the film layer as uniformly as possible, the quality is ensured to be as uniform as possible, and the color is as uniform as possible.
It is understood that the through holes 102 may be uniformly arranged along the circumferential direction on the same plane of the gas flow dispersing surface 101 to ensure that the amount of the gas 800 passing through the through holes 102 at any position on the circumferential direction on the same plane of the gas flow dispersing surface 101 is as uniform as possible. That is, when the support 520 drives the substrate to rotate in the mounting cavity 110 of the gas flow dispersing device 100, the amount of the gas 800 filled in the chamber 510 passing through the through holes 102 at any position in the circumferential direction on the same plane of the gas flow dispersing device 100 is substantially the same, and the rest of the gas enters the mounting cavity 110 along the through holes 120 at the upper and lower sides, so that the concentration of the gas on the same plane around each substrate in the mounting cavity 100 is substantially the same.
As shown in fig. 2 and 3, further, the airflow dispersion device 100 includes a high end portion 10, a middle end portion 20 and a low end portion 30, wherein the high end portion 10, the middle end portion 20 and the low end portion 30 are integrally connected in sequence and respectively form an upper region, a middle region and a lower region of the airflow dispersion surface 101, wherein the number of the through holes 102 of the high end portion 10 and the number of the through holes 102 of the low end portion 30 are smaller than the number of the through holes 102 of the middle end portion 20, or the aperture of the through holes 102 of the high end portion 10 and the aperture of the through holes 102 of the low end portion 30 are smaller than the aperture of the through holes 102 of the middle end portion 20, so that the amount of the gas 800 passing through the middle end portion 20 is larger than the amount of the gas passing through the high end portion 10 or the low end portion 30, thereby balancing the upper region, the middle region and the lower region in the mounting cavity 110, The gas concentrations in the lower and middle regions are made to be as uniform as possible in the entire installation chamber 100. It is understood that the high end portion 10 and the low end portion 30 having a smaller number of through holes 102 or a smaller diameter may be located adjacent to the loading position of the coating apparatus while the middle end portion 20 is located farther from the loading position of the coating apparatus.
That is, since the gas that does not pass through the through holes 102 is diffused into the mounting cavity 110 along the through holes 120 on the upper and lower sides of the gas flow dispersing device 100, it may be caused that the concentration of the gas in the upper or lower area of the installation cavity 110 near the through-holes 120 is higher than that in the middle area, and in order to balance the gas concentrations in the upper, middle and lower areas in the installation cavity 110, the number of the through-holes 102 in the middle area (i.e., the middle end portion 20) of the gas flow dispersing surface 101 is greater than that in the upper area (i.e., the high end portion 10) or the lower area (i.e., the low end portion 30), or the aperture of the through hole 102 located in the middle area of the air flow dispersion surface 101 is larger than that of the through hole 102 located in the upper or lower area, thereby increasing the amount of gas 800 that passes through the through-holes 102 in the central region of the gas flow dispersion surface 101.
It should be noted that the number, the aperture and the density of the through holes 102 of the high end portion 10, the middle end portion 20 and the low end portion 30 can be respectively preset according to actual requirements so as to adjust the amount of the gas respectively passing through the high end portion 10, the middle end portion 20 and the low end portion 30 and entering the mounting cavity 110. In the present embodiment, the heights of the high end portion 10, the middle end portion 20 and the low end portion 30 are substantially the same, wherein the number, the aperture and the density of the through holes 102 of the high end portion 10 and the low end portion 30 are substantially the same, wherein the number and the density of the through holes 102 of the middle end portion 20 are greater than the number and the density of the through holes 102 of the high end portion 10, and the aperture is kept the same.
It is understood that the coating apparatus 500 is a vacuum coating apparatus, wherein the coating apparatus 500 provides the chamber 510 with a higher vacuum degree, i.e. the chamber 510 is not an absolute vacuum, for example, the vacuum degree of the chamber 510 is approximately 0.1 to 20Pa, and the coating tool 100 and the substrate are put into the chamber 510 together after being assembled to complete coating. Optionally, the coating type of the coating apparatus 500 may be vacuum ion evaporation, magnetron sputtering, MBE molecular beam epitaxy, PLD laser sputtering deposition, physical vapor deposition, or plasma chemical vapor deposition, and the working principle thereof is not described herein again. Optionally, the film layer includes a film, a thin film, a nano film layer, or the like, which is plated on the surface of the substrate. Alternatively, the film layer may be implemented as an organic silicon nano-protection film layer, an organic silicon hard nano-protection film layer, a composite structure high insulation hard nano-protection film layer, a high insulation nano-protection film layer having a modulated structure, a plasma polymerization film layer, a gradient increasing structure liquid-proof film layer, a gradient decreasing structure liquid-proof film layer, a film layer with controllable cross-linking degree, a waterproof click-through resistant film layer, a low adhesion corrosion resistant film layer, a liquid-proof film layer having a multi-layer structure, a polyurethane nano-film layer, an acrylamide nano-film layer, an antistatic liquid-proof nano-film layer, an epoxy nano-film layer, a high transparent low color difference nano-film layer, a high adhesion aging resistant nano-film layer, a silicon-containing copolymer nano-film layer, a polyimide nano-film layer, or the like. Accordingly, the coating apparatus 500 may be implemented to coat the surface of the substrate with any one or more of the above-described films or film layers, etc., to improve the surface properties of the substrate, without being limited thereto.
Further, the air dispersion guide device 100 is connected end to form the mounting cavity 110 and a connection end 130, wherein the size of the mounting cavity 110 of the air dispersion guide device 100 is slightly larger than that of the bracket 520 to fit the bracket 520, and the air dispersion guide device 100 is overlapped end to form the connection end 130. Preferably, the connection of the connection ends 130 is implemented as an adhesive connection, such as a seamless adhesive connection, i.e., the air deflector 100 is overlapped and adhered together end to end. In the manufacturing process, the adhering surfaces of the head end and the tail end of the airflow dispersion device 100 are cleaned by alcohol, and after being dried in the sun, the head end and the tail end of the airflow dispersion device 100 are overlapped and adhered together by using ABS glue or solid glue, so that the connecting end 130 and the mounting cavity 110 with a preset shape and size are formed, so that the airflow dispersion device 100 can be detachably sleeved outside the bracket 520, and the airflow dispersion device 100 is convenient to clean or replace, and the like. Optionally, the connection end 130 may also be formed by sewing, clamping, welding, or integrally connecting. Alternatively, the connecting end 130 of the airflow dispersion device 100 may be detachably connected to the bracket 520, which is not limited herein.
It should be noted that, by adjusting and changing the area of the connecting end 130, that is, adjusting and changing the area of the overlapping surface of the head end and the tail end of the airflow dispersion device 100, the size of the mounting cavity 110 of the airflow dispersion device 100 can be adjusted to adaptively mount the brackets 520 with different sizes, which is more compatible and has a wider application range.
The airflow dispersion device 100 may be made of the same material as the bracket 520. The airflow dispersion device 100 is made of a flexible material and has a certain toughness, for example, the airflow dispersion device is made of a plastic material with a certain thickness, wherein the head and the tail of the airflow dispersion device 100 are bonded to form the installation cavity 110 and then can be fixed and molded. That is, in the manufacturing process, the through hole 102 is opened on a flexible material with a square plane structure, and then the flexible material is bonded end to form the airflow dispersion device 100 with a cylindrical structure having the mounting cavity 110.
As shown in fig. 5, further, the airflow dispersion device 100 further includes a first radial shield 40, wherein the first radial shield 40 is connected to the top edge of the high end portion 10 and extends radially inward to form the through opening 120, wherein the first radial shield 40 is an annular structure, wherein the radial dimension of the first radial shield 40 is smaller than the radial dimension of the mounting cavity 120, and wherein the first radial shield 40 is effective to make the concentration of the gas in the radial direction in the mounting cavity 110 as uniform as possible, so that the surface of the substrate in the radial direction can be coated with a uniform film layer as possible, thereby preventing the color difference of the substrate surface from being visible to the naked eye, and ensuring the aesthetic appearance.
In the present embodiment, as a specific example, the radial width of the first radial shielding member 40 is 44mm, wherein the diameter of the through opening 120, i.e. the inner diameter of the first radial shielding member 40, is 265mm, and wherein the diameter of the installation cavity 510, i.e. the outer diameter of the first radial shielding member 40, is less than or equal to 365 mm. Of course, it should be understood by those skilled in the art that the radial width of the first radial shield 40 can be preset to achieve the adjustment of the gas concentration of the gas in the radial direction in the installation cavity 110, without limitation.
Preferably, the top edge of the high end 10 has at least one connector 11, wherein the connector 11 is adhesively connected to the first radial shield 40 and keeps the first radial shield 40 relatively fixed. In this embodiment, the connecting members 11 are uniformly arranged and extend radially along the top edge of the high end portion 10, wherein the connecting members 11 and the first radial shielding member 40 are adhesively connected in a surface-to-surface contact manner, so as to improve the fixing effect and prevent the first radial shielding member 40 from falling off. Alternatively, the connection 11 can be glued to the upper or lower side of the first radial shield 40.
Alternatively, the connecting piece 11 may be implemented as a circular ring structure integrally connected to the high end portion 10. Alternatively, the connecting member 11 may be implemented as a toothed ring structure integrally connected to the height part 10, etc., without being limited thereto.
Alternatively, the connection element 11 may be provided by the first radial shield 40, wherein the first radial shield 40 is fixedly connected to the high end 10 via the connection element 11. For example, the connecting member 11 is integrally connected to the first radial direction shield 40, wherein the connecting member 11 is adhesively connected to the inner side surface or the outer side surface of the high end portion 10, without being limited thereto.
As shown in fig. 6, the airflow dispersion device 100 further includes a second radial shielding element 50, wherein the second radial shielding element 50 is detachably mounted on a bottom edge of the lower end portion 30 and extends toward a radially inward direction to form the through opening 120, wherein the lower end portion 30 is detachably sleeved on the mounting groove 51 of the second radial shielding element 50, and after being detached, the lower end portion 30 forms a mounting opening 31 communicated with the mounting cavity 110 for detaching or mounting the bracket 520 to the mounting cavity 110.
In the embodiment, the radial width of the second radial shield 50 is smaller than the radial dimension of the mounting cavity 110, wherein the first radial shield 40 and the second radial shield 50 can cooperate with each other to effectively uniform the concentration of the gas in the radial direction in the mounting cavity 110, so that the surface of the substrate in the radial direction can be coated with a uniform film layer as much as possible, thereby preventing the color difference of the substrate surface from being visible to naked eyes and ensuring the aesthetic appearance. It will be appreciated that the radial width of the second radial shield 50 can be preset to form the through opening 120 of a preset size.
Further, the second radial shield 50 has a radial extension 51 and a connecting portion 52, wherein the connecting portion 52 is adhesively connected to an outer diameter edge of the radial extension 51, wherein the connecting portion 52 is adapted to fit snugly around a bottom edge of the lower end portion 30, wherein the connecting portion 52 is perpendicular to the radial extension 51, wherein the radial extension 51 extends radially inward toward the mounting cavity 110, wherein the connecting portion 52 is implemented as a circular ring structure matching with the bottom edge of the lower end portion 11, wherein the connecting portion 52 is connected with the bottom edge of the lower end portion 11 by interference fit, so that the second radial shield 50 and the bottom edge of the lower end portion 11 can be detached or mounted by manual force to facilitate detachment and mounting. Alternatively, the connecting portion 52 may be formed of a rectangular piece of flexible material joined end-to-end and adhesively bonded to form an attachment end 521. Alternatively, the joint end 521 may be formed by a snap-fit connection, an integral connection, or a seam connection.
Preferably, the cross section of the second radial shield 50 in the radial direction is an L-shaped section, wherein the connecting portion 52 is fitted with interference fit outside the bottom edge of the lower end portion 30. Alternatively, the connecting portion 52 may be implemented to fit inside the bottom edge of the lower end portion 30 in an interference fit manner.
As shown in fig. 4, it is worth mentioning that when the second radial shield 50 is mounted to the lower end portion 30, the connecting portion 52 avoids the through hole 102 at the lower end portion 30 to prevent the through hole 102 from being shielded. Preferably, the upper side 522 of the connecting portion 52 is just circumscribed with the through hole 102 on the same circumferential plane of the lower end portion 30 without shielding the through hole 102.
When installed, the second radial shield 50 is not mounted to the lower end portion 30 such that the mounting opening 31 of the lower end portion 30 is fully exposed, and a worker can mount the bracket 520 to the mounting chamber 110 through the mounting opening 31, and then, the worker mounts the second radial shield 50 to the lower end portion 30 such that the mounting opening 31 is shielded by the radial extension 51 to form the through opening 120.
It is understood that the radial extension 51 and the first radial shield 40 may have the same radial width, i.e. the size of the through openings 120 on the upper and lower sides of the airflow dispersing device 100 is the same. Alternatively, the radial width of the radial extension 51 and the radial width of the first radial shielding element 40 may be different, that is, the size of the through openings 120 on the upper and lower sides of the airflow dispersion device 100 is different.
In order to facilitate the dismounting of the second radial shield 50 by the operator, the outer surface of the connecting portion 52 of the second radial shield 50 is roughened to increase the roughness of the outer surface of the connecting portion 52. Preferably, the roughness of the outer surface of the connecting portion 52 is equal to or greater than ra 3.2.
According to another aspect of the present invention, the present embodiment further provides a method for manufacturing the airflow dispersion device 100, including the steps of:
s01, connecting the airflow dispersion device 100 end to form a cylindrical structure to form the mounting cavity 110 for mounting the bracket 520, wherein the airflow dispersion device 100 has the airflow dispersion surface 101 and the plurality of through holes 102 arranged along the circumferential direction on the airflow dispersion surface 101.
Wherein the number, aperture and density of the through holes 102 located at the high end 10 of the airflow dispersion surface 101 are the same as the number, aperture and density of the through holes 102 located at the low end 30 of the airflow dispersion surface 101, wherein the number of the through holes 102 located at the middle end 20 of the airflow dispersion surface 10 is greater than the number of the through holes 102 located at the high end 10 of the airflow dispersion surface 101, or the aperture of the through holes 102 located at the middle end 20 of the airflow dispersion surface 10 is greater than the aperture of the through holes 102 located at the high end 10 of the airflow dispersion surface 101.
S02, extending the first radial shield 40 radially inwards of the high end 10 and forming the through opening 120 communicating with the upper side of the mounting cavity 110.
S03, removably mounting the second radial shield 50 to the lower end 30, wherein the second radial shield 50 extends radially inwardly of the lower end 30 and forms the through opening 120 communicating with the underside of the mounting cavity 110.
According to another aspect of the present invention, the present embodiment further provides the coating apparatus 500, wherein the coating apparatus includes: a chamber, a power source, the support 520 and the gas flow diversion device 100, wherein the chamber has the chamber 510 for being pumped in and out, wherein the support 520 is disposed in the chamber 510, wherein the power source is used for providing radio frequency and/or pulse voltage, wherein the gas flow diversion device 100 is disposed in the support 520 for preventing gas from gathering in a diffusion direction, so that gas is diffused as uniformly as possible to the substrate mounted on the support 520 for coating the surface of the substrate with a uniform film.
It will be appreciated by persons skilled in the art that the embodiments of the invention described above and shown in the drawings are given by way of example only and are not limiting of the invention. The objects of the invention have been fully and effectively accomplished. The functional and structural principles of the present invention have been shown and described in the examples, and any variations or modifications of the embodiments of the present invention may be made without departing from the principles.
Claims (16)
1. The airflow dispersion device is used for coating equipment and is characterized by forming a mounting cavity for mounting a support of the coating equipment, wherein the airflow dispersion device is provided with an airflow dispersion surface and a plurality of through holes which are arranged on the airflow dispersion surface along the circumferential direction, so that part of the gas filled into the chamber of the coating equipment enters the mounting cavity through the through holes to uniformly diffuse the gas to the surface of a substrate mounted on the support; the airflow dispersion device is also provided with an upper port and a lower port which are communicated with the mounting cavity, so that the rest part of the gas in the gas filled into the chamber of the coating equipment can be diffused along the extending direction of the airflow dispersion surface and enter the mounting cavity from the ports; wherein the air flow dispersion devices are spliced together end to form a cylindrical structure;
wherein the airflow dispersion device further comprises a first radial shield, wherein the first radial shield extends radially inward along the top end of the airflow dispersion device and forms the through opening;
wherein the airflow dispersion device further comprises a second radial shield, wherein the second radial shield is detachably mounted to the bottom end of the airflow dispersion device, and wherein the second radial shield extends radially inward along the bottom end of the airflow dispersion device and forms the through opening.
2. The airflow dispersion device of claim 1, wherein said airflow dispersion device comprises a high end portion, a middle end portion and a low end portion, wherein said high end portion, said middle end portion and said low end portion are sequentially and integrally connected to form said airflow dispersion surface, and wherein the number of said through holes at said middle end portion is greater than the number of said through holes at said high end portion and said low end portion of said airflow dispersion surface, respectively.
3. The airflow dispersion device of claim 1, wherein said airflow dispersion device comprises a high end portion, a middle end portion and a low end portion, wherein said high end portion, said middle end portion and said low end portion are sequentially and integrally connected to form said airflow dispersion surface, and wherein the aperture of said through hole at said middle end portion is larger than the aperture of said through hole at said high end portion and said low end portion of said airflow dispersion surface, respectively.
4. The airflow dispersion device according to claim 2 or 3, wherein the number and the diameter of the through holes at the high end are the same as those of the through holes at the low end.
5. The airflow deflector of claim 2, wherein the high end portion has at least one connector, wherein the connector is adhesively attached to the first radial shield.
6. The airflow dispersion device of claim 1, wherein said first radial shield is implemented as an annular structure having a radial width.
7. The airflow deflector of claim 1, wherein the second radial shield comprises a radially extending portion and a connecting portion, wherein the connecting portion is connected to the radially extending portion at a right angle, wherein the connecting portion is adapted to be mounted to a bottom end of the airflow deflector, wherein the radially extending portion extends radially inward along the bottom end of the airflow deflector.
8. The airflow deflector of claim 1, wherein the second radial shield is equal in radial width to the first radial shield.
9. A filming equipment, wherein the filming equipment includes cavity, power and support, its characterized in that, wherein the filming equipment further includes: an airflow deflector as claimed in any one of claims 1 to 8.
10. The plating device according to claim 9, wherein the air-flow dispersion device comprises a high end portion, a middle end portion, and a low end portion, wherein the high end portion, the middle end portion, and the low end portion are integrally connected in this order to form the air-flow dispersion surface, wherein the number of the through holes at the middle end portion is larger than the number of the through holes at the high end portion and the low end portion of the air-flow dispersion surface, respectively.
11. The plating device according to claim 9, wherein the air-flow dispersion device comprises a high end portion, a middle end portion, and a low end portion, wherein the high end portion, the middle end portion, and the low end portion are integrally connected in this order to form the air-flow dispersion surface, and wherein the through-holes at the middle end portion have larger diameters than those at the high end portion and the low end portion of the air-flow dispersion surface, respectively.
12. A manufacturing method of an airflow dispersion device for coating equipment is characterized by comprising the following steps: forming an airflow dispersion device with a cylindrical structure and forming a mounting cavity of a bracket for mounting the coating equipment, wherein the airflow dispersion device is provided with an airflow dispersion surface and a plurality of through holes which are arranged along the circumferential direction of the airflow dispersion surface, so that part of the gas filled into the chamber of the coating equipment passes through the through holes and enters the mounting cavity; the airflow dispersion device is also provided with an upper port and a lower port which are communicated with the mounting cavity, so that the rest part of the gas in the gas filled into the chamber of the coating equipment can be diffused along the extending direction of the airflow dispersion surface and enter the mounting cavity from the ports;
the manufacturing method further comprises the steps of:
a first radial shielding piece extends radially inwards to the high end part of the airflow dispersion guide device and forms the through hole communicated with the mounting cavity;
and detachably mounting a second radial shielding piece on the lower end part of the airflow dispersion device, wherein the second radial shielding piece extends inwards along the lower end part in the radial direction and forms the through hole communicated with the mounting cavity.
13. The method of manufacturing an airflow dispersion device according to claim 12, wherein the number of through holes located at the middle end portion of the airflow dispersion surface is greater than the number of through holes located at the high end portion and the low end portion of the airflow dispersion surface, respectively.
14. The method of manufacturing an airflow dispersion device according to claim 12, wherein the through-holes at the middle end of the airflow dispersion surface have larger hole diameters than the through-holes at the high and low ends of the airflow dispersion surface, respectively.
15. The method of manufacturing an airflow dispersion device according to claim 12, wherein the number and the diameter of the through holes at the high end of the airflow dispersion surface are the same as those of the through holes at the low end of the airflow dispersion surface.
16. The method of claim 12, wherein the second radial shield is of equal radial width to the first radial shield.
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| CN201910997643.0A CN110684962B (en) | 2019-10-21 | 2019-10-21 | Airflow dispersion device for coating equipment and application thereof |
| TW109136424A TWI768515B (en) | 2019-10-21 | 2020-10-21 | Air diffuser for coating equipment and its application |
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| CN108690972A (en) * | 2018-08-06 | 2018-10-23 | 长江存储科技有限责任公司 | Gas injection tube and film deposition device for film deposition device |
| CN110344002A (en) * | 2019-06-11 | 2019-10-18 | 惠科股份有限公司 | Evaporation device and evaporation method |
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| JPS601952B2 (en) * | 1980-01-25 | 1985-01-18 | 三菱電機株式会社 | plasma etching equipment |
| FR2882064B1 (en) * | 2005-02-17 | 2007-05-11 | Snecma Propulsion Solide Sa | PROCESS FOR THE DENSIFICATION OF THIN POROUS SUBSTRATES BY CHEMICAL VAPOR PHASE INFILTRATION AND DEVICE FOR LOADING SUCH SUBSTRATES |
| CN105296957B (en) * | 2014-06-04 | 2019-01-18 | 北京北方华创微电子装备有限公司 | A kind of reaction chamber |
| CN106756888B (en) * | 2016-11-30 | 2018-07-13 | 江苏菲沃泰纳米科技有限公司 | A kind of nano-coating equipment rotation frame equipments for goods |
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| CN108690972A (en) * | 2018-08-06 | 2018-10-23 | 长江存储科技有限责任公司 | Gas injection tube and film deposition device for film deposition device |
| CN110344002A (en) * | 2019-06-11 | 2019-10-18 | 惠科股份有限公司 | Evaporation device and evaporation method |
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Denomination of invention: Air flow dispersion device and its application for coating equipment Granted publication date: 20220329 Pledgee: Wuxi Branch of China CITIC Bank Co.,Ltd. Pledgor: Jiangsu feiwotai nanotechnology Co.,Ltd. Registration number: Y2024980016337 |