WO2023246450A1 - 光学系统及包含其的成像装置和电子设备 - Google Patents

光学系统及包含其的成像装置和电子设备 Download PDF

Info

Publication number
WO2023246450A1
WO2023246450A1 PCT/CN2023/097323 CN2023097323W WO2023246450A1 WO 2023246450 A1 WO2023246450 A1 WO 2023246450A1 CN 2023097323 W CN2023097323 W CN 2023097323W WO 2023246450 A1 WO2023246450 A1 WO 2023246450A1
Authority
WO
WIPO (PCT)
Prior art keywords
lens
optical system
nanostructure
present application
shows
Prior art date
Application number
PCT/CN2023/097323
Other languages
English (en)
French (fr)
Inventor
郝成龙
谭凤泽
朱瑞
朱健
Original Assignee
深圳迈塔兰斯科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CN202221597876.5U external-priority patent/CN217467327U/zh
Priority claimed from CN202210724663.2A external-priority patent/CN115016099A/zh
Application filed by 深圳迈塔兰斯科技有限公司 filed Critical 深圳迈塔兰斯科技有限公司
Publication of WO2023246450A1 publication Critical patent/WO2023246450A1/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below

Definitions

  • the present application relates to the technical field of optical imaging. Specifically, the present application relates to optical systems and imaging devices and electronic equipment including the same.
  • embodiments of the present application provide an optical system, an imaging device and an electronic device including the same.
  • embodiments of the present application provide an optical system, which includes a first lens, a second lens, a third lens, a fourth lens, a fifth lens and a third lens sequentially distributed from the object side to the image side.
  • the first lens is an aspherical refractive lens
  • the second lens is a super lens
  • the remaining lenses are refractive lenses
  • the third lens, the fourth lens, the fifth lens and the third lens are all refractive lenses. All surfaces of the six lenses include at least one aspheric surface, and the aspheric surface includes an inflection point;
  • the first lens has positive power, and the object-side surface of the first lens is convex; the image-side surface of the third lens is convex; the object-side surface of the fourth lens is concave;
  • the curvature radii of the object-side surfaces of the fifth lens and the sixth lens are both negative;
  • the optical system at least satisfies the following relationships: f/EPD ⁇ 3 25° ⁇ HFOV ⁇ 55° 0.05mm ⁇ d2 ⁇ 2mm
  • f is the focal length of the optical system
  • EPD is the entrance pupil diameter of the optical system
  • HFOV is one-half of the maximum field of view of the optical system
  • d 2 is the thickness of the second lens
  • f2 is the focal length of the second lens.
  • the optical system also satisfies the relationship: 0.35 ⁇ R 1o /f 1 ⁇ 0.58;
  • R 1o is the radius of curvature of the object-side surface of the first lens
  • f 1 is the focal length of the first lens
  • the optical system also satisfies: (V 1 +V 4 )/2-V 3 >20;
  • V 1 is the Abbe number of the first lens
  • V 3 is the Abbe number of the third lens
  • V 4 is the Abbe number of the fourth lens.
  • the optical system also satisfies: 0.55 ⁇ ImgH/TTL ⁇ 0.82;
  • ImgH is the maximum imaging height of the optical system
  • TTL is the distance from the object-side surface of the first lens to the imaging surface of the optical system.
  • the optical system further satisfies that: the image-side surface of the fourth lens is concave, and, R 4i ⁇ R 4o >0;
  • R 4o is the radius of curvature of the object-side surface of the fourth lens
  • R 4i is the image-side surface of the fourth lens the radius of curvature
  • the radius of curvature of the image-side surface of the fifth lens is less than zero.
  • the optical system also satisfies: 0.58 ⁇ f 1 /f ⁇ 0.85;
  • f 1 is the focal length of the first lens
  • f is the focal length of the optical system.
  • any one or more of the third lens, the fourth lens, the fifth lens and the sixth lens are aspherical refractive lenses.
  • the super lens includes a base layer and at least one nanostructure layer provided on one side of the base layer;
  • any one of the nanostructure layers includes periodically arranged nanostructures
  • the base layer and the nanostructure layer are configured to transmit radiation in the operating wavelength band of the optical system.
  • the metalens includes at least two nanostructure layers
  • the nanostructures in any two adjacent nanostructure layers are coaxially arranged.
  • the super lens includes at least two nanostructure layers; wherein the nanostructures in any adjacent nanostructure layer are staggered in a direction parallel to the base of the super lens.
  • the arrangement period of the nanostructure is greater than or equal to 0.3 ⁇ c and less than or equal to 2 ⁇ c , where ⁇ c is the center wavelength of the working band of the optical system.
  • the height of the nanostructure is greater than or equal to 0.3 ⁇ c and less than or equal to 2 ⁇ c , where ⁇ c is the center wavelength of the working band of the optical system.
  • the material of the base layer includes any one or more of fused quartz, quartz glass, crown glass, flint glass, sapphire and alkali glass.
  • the material of the nanostructure includes any one or more of fused quartz, quartz glass, crown glass, flint glass, sapphire, crystalline silicon and amorphous silicon.
  • the amorphous silicon may be hydrogenated amorphous silicon.
  • the nanostructure and the base layer are made of the same material.
  • the nanostructure and the base layer are made of different materials.
  • the super lens also includes filler
  • the filler is filled between the nanostructures; the extinction coefficient of the filler to the working waveband of the optical system is less than 0.01.
  • the absolute value of the difference between the refractive index of the filler and the refractive index of the nanostructure is greater than or equal to 0.5.
  • the filling material includes any one or more of air, fused quartz, quartz glass, crown glass, flint glass, sapphire, crystalline silicon and amorphous silicon.
  • the amorphous silicon may be hydrogenated amorphous silicon.
  • the filler material is different from the nanostructure material.
  • the material of the filler is different from the material of the base layer.
  • the hyperlens further includes an anti-reflection coating
  • the anti-reflection film is disposed on the side of the nanostructure layer adjacent to the air; and/or,
  • the antireflection film is disposed on a side of the base layer away from the nanostructure layer.
  • the nanostructures are periodically arranged in the form of superstructural units
  • the shape of the superstructure unit is a close-packed pattern, and the nanostructure is arranged at the vertex and/or center position of the close-packed pattern.
  • the shape of the superstructure unit includes one or a combination of one or more of a sector, a regular quadrilateral, a regular hexagon.
  • the shape of the nanostructure is a polarization-insensitive structure.
  • the shape of the nanostructure includes one or more of a cylindrical shape, a hollow cylindrical shape, a round hole shape, a hollow round hole shape, a square columnar shape, a square hole shape, a hollow square columnar shape and a hollow square hole shape. The combination.
  • phase of the hyperlens also satisfies:
  • the working band of the optical system includes a visible light band and a near-infrared band.
  • an embodiment of the present application further provides a method for processing a super lens, which is used to process a super lens in an optical system as provided in any of the above embodiments.
  • the method includes:
  • Step S1 provide a layer of structural layer material on the base layer
  • Step S2 apply photoresist on the structural layer material and expose the reference structure
  • Step S3 Etch the periodically arranged nanostructures on the structural layer material according to the reference structure to form the nanostructure layer;
  • Step S4 arrange the filler between the nanostructures
  • Step S5 Trim the surface of the filler so that the surface of the filler coincides with the surface of the nanostructure.
  • the method also includes:
  • Step S6 Repeat step S1 to step S5 until the arrangement of all nanostructure layers is completed.
  • inventions of the present application provide an imaging device.
  • the imaging device includes:
  • optical system provided in any of the above embodiments and the photosensitive element disposed on the image plane of the optical system.
  • an embodiment of the present application further provides an electronic device, which includes the imaging device provided in the above embodiment.
  • the optical system provided by the embodiment of the present application provides the main optical power by setting the first lens as an aspherical refractive lens, the second lens as a super lens, and the remaining lenses as refractive lenses, and At least one of all surfaces of the third to sixth lenses is aspherical.
  • the layout method that meets f/EPD ⁇ 3; 25° ⁇ HFOV ⁇ 55°; 0.05mm ⁇ d 2 ⁇ 2mm is adopted to achieve the reduction of the system length and weight of the six-piece optical system while ensuring the imaging quality. Promotes the miniaturization and lightweight of optical systems.
  • the imaging device provided by the embodiment of the present application adopts the optical system provided by the embodiment of the present application.
  • the optical system Compared with traditional optical systems, it has a smaller size, lighter weight, and excellent imaging quality. It is conducive to combining the optical system with a larger-sized sensor and can also reduce the installation space occupied by the optical system in the imaging device. This promotes miniaturization and weight reduction of imaging devices.
  • the electronic device provided by the embodiment of the present application adopts the imaging device provided by the embodiment of the present application. Since the optical system provided by the embodiments of the present application has a smaller volume, lighter weight, and excellent imaging quality than traditional optical systems, it is conducive to combining the optical system with a larger-sized sensor and can also reduce the cost of the optical system. The installation space occupied in imaging devices and electronic equipment. Therefore, the electronic equipment provided by the embodiments of the present application uses the imaging device, which reduces the volume and weight of the imaging device in the electronic equipment, and promotes the miniaturization and lightweight of the electronic equipment.
  • Figure 1 shows an optional structural schematic diagram of the optical system provided by the embodiment of the present application
  • Figure 2 shows another optional structural schematic diagram of the optical system provided by the embodiment of the present application.
  • Figure 3 shows another optional structural schematic diagram of the optical system provided by the embodiment of the present application.
  • Figure 4 shows another optional structural schematic diagram of the optical system provided by the embodiment of the present application.
  • Figure 5 shows another optional structural schematic diagram of the optical system provided by the embodiment of the present application.
  • Figure 6 shows another optional structural schematic diagram of the optical system provided by the embodiment of the present application.
  • Figure 7 shows another optional structural schematic diagram of the optical system provided by the embodiment of the present application.
  • Figure 8 shows another optional structural schematic diagram of the optical system provided by the embodiment of the present application.
  • Figure 9 shows another optional structural schematic diagram of the optical system provided by the embodiment of the present application.
  • Figure 10 shows another optional structural schematic diagram of the optical system provided by the embodiment of the present application.
  • Figure 11 shows an optional structural schematic diagram of the super lens in the optical system provided by the embodiment of the present application.
  • Figure 12 shows an optional structural schematic diagram of the nanostructure in the hyperlens provided by the embodiment of the present application.
  • Figure 13 shows another optional structural schematic diagram of the nanostructure in the super lens provided by the embodiment of the present application.
  • Figure 14 shows a schematic diagram of an optional arrangement of nanostructures in the hyperlens provided by the embodiment of the present application.
  • Figure 15 shows a schematic diagram of yet another optional arrangement of nanostructures in the hyperlens provided by the embodiment of the present application.
  • Figure 16 shows a schematic diagram of yet another optional arrangement of nanostructures in the hyperlens provided by the embodiment of the present application.
  • Figure 17 shows another optional structural schematic diagram of the nanostructure in the super lens provided by the embodiment of the present application.
  • Figure 18 shows another optional structural schematic diagram of the nanostructure in the super lens provided by the embodiment of the present application.
  • Figure 19 shows another optional structural schematic diagram of the nanostructure in the super lens provided by the embodiment of the present application.
  • Figure 20 shows another optional structural schematic diagram of the super lens provided by the embodiment of the present application.
  • Figure 21 shows another optional structural schematic diagram of the super lens provided by the embodiment of the present application.
  • Figure 22 shows another optional structural schematic diagram of the super lens provided by the embodiment of the present application.
  • Figure 23 shows an optional phase diagram of the hyperlens provided by the embodiment of the present application.
  • Figure 24 shows an optional transmittance diagram of the hyperlens provided by the embodiment of the present application.
  • Figure 25 shows another optional phase diagram of the hyperlens provided by the embodiment of the present application.
  • Figure 26 shows another optional transmittance diagram of the hyperlens provided by the embodiment of the present application.
  • Figure 27 shows an optional flow diagram of the super lens processing method provided by the embodiment of the present application.
  • Figure 28 shows another optional flow diagram of the super lens processing method provided by the embodiment of the present application.
  • Figure 29 shows another optional flow diagram of the super lens processing method provided by the embodiment of the present application.
  • Figure 30 shows the second lens in an optional optical system provided by the embodiment of the present application at different wavelengths. Schematic diagram of phase modulation at;
  • Figure 31 shows the astigmatism diagram of an optional optical system provided by the embodiment of the present application.
  • Figure 32 shows a distortion diagram of an optional optical system provided by the embodiment of the present application.
  • Figure 33 shows the broadband matching degree of the second lens in an optional optical system provided by the embodiment of the present application.
  • Figure 34 shows a schematic diagram of the phase modulation of the second lens at different wavelengths in yet another optional optical system provided by the embodiment of the present application;
  • Figure 35 shows the astigmatism diagram of yet another optional optical system provided by the embodiment of the present application.
  • Figure 36 shows the distortion diagram of yet another optional optical system provided by the embodiment of the present application.
  • Figure 37 shows the broadband matching degree of the second lens in an optional optical system provided by the embodiment of the present application.
  • Figure 38 shows a schematic diagram of the phase modulation of the second lens at different wavelengths in yet another optional optical system provided by the embodiment of the present application;
  • Figure 39 shows the astigmatism diagram of yet another optional optical system provided by the embodiment of the present application.
  • Figure 40 shows the distortion diagram of yet another optional optical system provided by the embodiment of the present application.
  • Figure 41 shows the broadband matching degree of the second lens in an optional optical system provided by the embodiment of the present application.
  • Figure 42 shows a schematic diagram of the phase modulation of the second lens at different wavelengths in yet another optional optical system provided by the embodiment of the present application;
  • Figure 43 shows the astigmatism diagram of yet another optional optical system provided by the embodiment of the present application.
  • Figure 44 shows the distortion diagram of yet another optional optical system provided by the embodiment of the present application.
  • Figure 45 shows the broadband matching degree of the second lens in an optional optical system provided by the embodiment of the present application.
  • Figure 46 shows a schematic diagram of the phase modulation of the second lens at different wavelengths in yet another optional optical system provided by the embodiment of the present application;
  • Figure 47 shows the astigmatism diagram of yet another optional optical system provided by the embodiment of the present application.
  • Figure 48 shows the distortion diagram of yet another optional optical system provided by the embodiment of the present application.
  • Figure 49 shows the broadband matching degree of the second lens in an optional optical system provided by the embodiment of the present application.
  • Figure 50 shows a schematic diagram of the phase modulation of the second lens at different wavelengths in yet another optional optical system provided by the embodiment of the present application;
  • Figure 51 shows the astigmatism diagram of yet another optional optical system provided by the embodiment of the present application.
  • Figure 52 shows the distortion diagram of yet another optional optical system provided by the embodiment of the present application.
  • Figure 53 shows the broadband matching degree of the second lens in an optional optical system provided by the embodiment of the present application.
  • Figure 54 shows a schematic diagram of the phase modulation of the second lens at different wavelengths in yet another optional optical system provided by the embodiment of the present application;
  • Figure 55 shows the astigmatism diagram of yet another optional optical system provided by the embodiment of the present application.
  • Figure 56 shows the distortion diagram of yet another optional optical system provided by the embodiment of the present application.
  • Figure 57 shows the broadband matching degree of the second lens in an optional optical system provided by the embodiment of the present application.
  • Figure 58 shows a schematic diagram of the phase modulation of the second lens at different wavelengths in yet another optional optical system provided by the embodiment of the present application;
  • Figure 59 shows the astigmatism diagram of yet another optional optical system provided by the embodiment of the present application.
  • Figure 60 shows the distortion diagram of yet another optional optical system provided by the embodiment of the present application.
  • Figure 61 shows the broadband matching degree of the second lens in an optional optical system provided by the embodiment of the present application.
  • Figure 62 shows a schematic diagram of the phase modulation of the second lens at different wavelengths in yet another optional optical system provided by the embodiment of the present application;
  • Figure 63 shows the astigmatism diagram of yet another optional optical system provided by the embodiment of the present application.
  • Figure 64 shows the distortion diagram of yet another optional optical system provided by the embodiment of the present application.
  • Figure 65 shows the broadband matching degree of the second lens in an optional optical system provided by the embodiment of the present application.
  • Figure 66 shows a schematic diagram of the phase modulation of the second lens at different wavelengths in yet another optional optical system provided by the embodiment of the present application;
  • Figure 67 shows the astigmatism diagram of yet another optional optical system provided by the embodiment of the present application.
  • Figure 68 shows the distortion diagram of yet another optional optical system provided by the embodiment of the present application.
  • Figure 69 shows the broadband matching degree of the second lens in an optional optical system provided by the embodiment of the present application.
  • 201-base layer 202-nanostructure layer; 203-antireflection coating; 204-photoresist; 205-reference structure; 202a-structural layer material;
  • Embodiments are described herein with reference to cross-sectional illustrations that are idealized embodiments. Thus, variations in shape from those shown in the illustrations are contemplated, for example as a result of manufacturing techniques and/or tolerances. Thus, embodiments described herein should not be construed as limited to the particular shapes of regions as illustrated herein but are to include deviations in shapes that result, for example, from manufacturing. For example, regions shown or described as flat may typically have rough and/or non-linear characteristics. Furthermore, the acute angles shown may be rounded. Therefore, the regions shown in the figures are schematic in nature and their shapes are not intended to show the precise shapes of the regions and are not intended to limit the scope of the claims.
  • optical systems using traditional plastic lenses are difficult to achieve breakthroughs in thickness and large curvature due to the limitations of their injection molding processes.
  • optical systems with a six-piece lens structure have different lens thicknesses and large curvatures. It is difficult to break through the distance between each lens and the total length of the system.
  • there are only more than ten kinds of optional materials for plastic lenses which limits the freedom of aberration correction of the optical system.
  • glass-resin hybrid lenses that solve problems such as chromatic aberration to a certain extent
  • aspheric glass processing and injection molding processes still greatly hinder the miniaturization and lightweight of optical systems.
  • huge efforts are required to reduce the total system length of optical systems by 1 mm.
  • the six-piece optical system in the prior art has a low yield rate due to process limitations.
  • inventions of the present application provide an optical system, as shown in Figures 1 to 10.
  • the optical system includes a first lens 10, a second lens 20, and a third lens sequentially distributed from the object side to the image side. 30.
  • the fourth lens 40, the fifth lens 50 and the sixth lens 60 are refractive lenses.
  • the first lens 10 is an aspheric refractive lens
  • the second lens 20 is a super lens
  • the remaining lenses are refractive lenses.
  • all surfaces of the third lens 30 , the fourth lens 40 , the fifth lens 50 and the sixth lens 60 include at least one aspherical surface, and the above-mentioned aspherical surface includes an inflection point.
  • the first lens 10 has positive optical power, and the object-side surface of the first lens 10 is convex; the third lens 30
  • the image-side surface of the fourth lens 40 is a convex surface; the object-side surface of the fourth lens 40 is a concave surface; the curvature radii of the object-side surfaces of the fifth lens 50 and the sixth lens 60 are both negative.
  • the optical system provided by the embodiment of the present application also satisfies the following formulas (1-1) to formulas (1-4): f/EPD ⁇ 3;(1-1) 25° ⁇ HFOV ⁇ 55°; (1-2) 0.05mm ⁇ d 2 ⁇ 2mm; (1-3)
  • f is the focal length of the optical system
  • EPD is the entrance pupil diameter of the optical system
  • HFOV is one-half of the maximum field angle of the optical system
  • d 2 is the thickness of the second lens 20
  • f 2 is the thickness of the second lens 20
  • TTL Total Track Length
  • the surface of the refractive lens refers to the object-side surface and the image-side surface of the refractive lens.
  • the second lens 20 is a plane super lens.
  • the second lens 20 is a non-planar super lens.
  • the optical system provided by the embodiment of the present application also satisfies the following formula (2): 0.35 ⁇ R 1o /f 1 ⁇ 0.58; (2)
  • R 1o is the radius of curvature of the object-side surface of the first lens 10 ; f 1 is the focal length of the first lens 10 .
  • the optical system provided by the embodiment of the present application also satisfies the following formula (3): (V 1 +V 4 )/2-V 3 >20; (3)
  • V 1 is the Abbe number of the first lens 10 ;
  • V 3 is the Abbe number of the third lens 30 ;
  • V 4 is the Abbe number of the fourth lens 40 .
  • the optical system provided by the embodiment of the present application satisfies the above formula (3), which can reduce the volume of the optical system, improve the edge image quality of the optical system, and avoid dimming around the image. Moreover, such a layout is conducive to compressing the total system length of the optical system.
  • the optical system also satisfies: 0.55 ⁇ ImgH/TTL ⁇ 0.82; (4)
  • ImgH is the maximum imaging height (Image High) of the optical system; the maximum imaging height refers to one-half the diagonal length of the effective sensing area of the electronic photosensitive element.
  • TTL is the distance from the object-side surface of the first lens 10 to the imaging surface of the optical system.
  • the image-side surface of the fourth lens 40 in the optical system is also concave and satisfies: R 4i ⁇ R 4o >0; (5)
  • R 4o is the radius of curvature of the object-side surface of the fourth lens 40
  • R 4i is the radius of curvature of the image-side surface of the fourth lens 40 . That is, both the object-side surface and the image-side surface of the fourth lens 40 are concave, and the product of the curvature radius of the object-side surface and the image-side surface of the fourth lens 40 is greater than zero.
  • the optical system also satisfies the following formula (6): 0.58 ⁇ f 1 /f ⁇ 0.85; (6)
  • f 1 is the focal length of the first lens 10; f is the focal length of the optical system.
  • the ratio of the focal length of the first lens 10 to the focal length of the optical system satisfies formula (6), which is beneficial to compressing the total system length of the optical system.
  • any one or more of the third lens 30 , the fourth lens 40 , the fifth lens 50 and the sixth lens 60 in the optical system are aspherical refractive lenses.
  • the third to sixth lenses are all aspherical refractive lenses.
  • z is the surface vector parallel to the optical axis of the optical system provided in the embodiment of the present application
  • c is the center point curvature of the aspheric surface (1/R)
  • k is the quadratic surface constant
  • a ⁇ J correspond to higher-order coefficients respectively.
  • the optical system provided by the embodiment of the present application further includes an aperture 70, such as an aperture stop (STO).
  • STO aperture stop
  • the diaphragm 70 can be disposed on one side of any lens in the optical system.
  • the diaphragm 70 is disposed on the side of the first lens 10 close to the object side.
  • Such a layout can be beneficial to controlling the aperture of the entire optical system to prevent the aperture of the optical system from being too large to hinder the Miniaturization of the optical system.
  • the optical system provided by the embodiment of the present application also includes an infrared filter 80 (IR filter).
  • IR filter infrared filter
  • the infrared filter 80 is disposed between the sixth lens 60 and the image plane of the optical system.
  • the infrared filter helps to filter the infrared band radiation in the incident radiation, helps to reduce the heat generated by the incident radiation, and prevents the infrared band radiation from burning the optical system.
  • the sensor downstream of the system is also helpful in reducing the imaging distortion of the optical system, thereby improving the imaging quality of the optical system.
  • the super lens (ie, the second lens 20) provided by the embodiment of the present application will be described in detail.
  • metalens is a specific application of metasurfaces, which modulate the phase, amplitude, and polarization of incident light through periodically arranged subwavelength-sized nanostructures.
  • the super lens (ie, the second lens 20 ) in the optical system includes a base layer 201 and at least one nanostructure layer 202 disposed on one side of the base layer 201 .
  • any one nanostructure layer 202 includes periodically arranged nanostructures 2021.
  • the aforementioned base layer 201 and nanostructure layer 202 are configured to be able to transmit radiation in the working wavelength band of the optical system provided by the embodiment of the present application.
  • the arrangement period of the nanostructures 2021 is greater than or equal to 0.3 ⁇ c and less than or equal to 2 ⁇ c ; wherein, ⁇ c is The central wavelength of the operating band of the optical system.
  • the height of the nanostructure 2021 in any layer of at least one nanostructure layer 202 is greater than or equal to 0.3 ⁇ c and less than or equal to 5 ⁇ c ; where ⁇ c is the optical system The central wavelength of the working band.
  • Figures 12 and 13 show perspective views of the nanostructures 2021 in any nanostructure layer 202 of the hyperlens provided by embodiments of the present application.
  • Figure 12 is a cylindrical structure.
  • the nanostructure 2021 in Figure 13 is a square columnar structure.
  • the super lens also includes a filler 2022, which is filled between the nanostructures 2021, and the material of the filler 2022 has an extinction coefficient of less than 0.01 in the working band.
  • the filler includes air or other materials that are transparent or translucent in the operating band.
  • the absolute value of the difference between the refractive index of the material of the filler 2022 and the refractive index of the nanostructure 2021 should be greater than or equal to 0.5.
  • the filler 2022 in the nanostructure layer 202 farthest from the base layer 201 may be air.
  • the nanostructures 2021 in any layer of at least one nanostructure layer 202 are periodically arranged in the form of superstructure units 2023.
  • the superstructure unit 2023 is a close-packed pattern, and a nanostructure 2021 is provided at the vertex and/or center position of the close-packed pattern.
  • a densely packed pattern refers to one or more patterns that can fill the entire plane without gaps or overlapping.
  • the superstructure units may be arranged in a fan shape. As shown in FIG. 15 , according to the embodiment of the present application, the superstructure units may be arranged in a regular hexagonal array. In addition, as shown in FIG. 16 , according to embodiments of the present application, the superstructure units 2023 may be arranged in a square array. Those skilled in the art should realize that the superstructural unit 2023 included in the nanostructure layer 202 may also include other forms. Array arrangement, all these variations are covered by the scope of this application.
  • the broad spectrum phase of the superstructure unit 2023 and the working band of the superlens provided by the embodiment of the present application also satisfy:
  • r is the radial coordinate of the hyperlens
  • r 0 is the distance from any point on the hyperlens to the center of the hyperlens
  • ⁇ is the operating wavelength of the hyperlens.
  • the nanostructure 2021 provided by the embodiment of the present application can be a polarization-independent structure, and such a structure imposes a propagation phase on the incident light.
  • the nanostructure 2021 can be a positive structure or a negative structure.
  • the shape of the nanostructure 2021 includes a cylinder, a hollow cylinder, a square prism, a hollow square prism, etc.
  • the second lens 20 provided by the embodiment of the present application includes at least two nanostructure layers 202 .
  • the nanostructures 2021 in adjacent nanostructure layers of at least two layers of nanostructures 202 are arranged coaxially.
  • the aforementioned coaxial arrangement means that the nanostructures 2021 in the two adjacent nanostructure layers 202 are arranged in the same period; or the axes of the nanostructures 2021 in the same position in the two adjacent nanostructure layers overlap.
  • the nanostructures 2021 in adjacent nanostructure layers of at least two layers of nanostructures 202 are staggered in a direction parallel to the base of the super lens.
  • Figure 20 shows a perspective view of an alternative three-layer nanostructured layer.
  • the left image in Figure 20 shows a perspective view of an optional three-layer nanostructured layer.
  • the right image in Figure 20 shows a top view of each nanostructure layer.
  • the shape, size or material of the nanostructures 2021 in adjacent nanostructure layers 202 may be the same or different.
  • the fillers 2022 in adjacent nanostructure layers 202 may be the same or different.
  • a to d in FIG. 17 respectively show that the shape of the nanostructure 2021 includes a cylinder, a hollow cylinder, a square column and a hollow square column, and the nanostructure 2021 is filled with fillers 2022 around it.
  • the nanostructure 2021 is disposed at the center of the regular quadrilateral superstructure unit 2023 .
  • a to d in Figure 18 respectively show that the shape of the nanostructure 2021 includes a cylinder, a hollow cylinder, a square cylinder and a hollow square cylinder, and there is no surrounding structure around the nanostructure 2021. Filler 2022.
  • the nanostructure 2021 is disposed at the center of the regular quadrilateral superstructure unit 2023 .
  • a to d in Figure 19 respectively show that the shape of the nanostructure 2021 includes a square column, a cylinder, a hollow square column and a hollow cylinder, and there is no filler 2022 around the nanostructure 2021 .
  • the nanostructure 2021 is disposed at the center of the regular hexagonal superstructure unit 2023 .
  • e in Figure 19 to h in Figure 19 respectively show that the nanostructure 2021 is a negative nanostructure, such as a square hole pillar, a circular hole pillar, a square ring pillar, and a circular ring pillar.
  • the nanostructure 2021 is a negative structure disposed at the center of the regular hexagonal superstructure unit 2023 .
  • the super lens provided by the embodiment of the present application further includes an anti-reflection film 203 .
  • the anti-reflection film 203 is disposed on the side of the base layer 201 away from the nanostructure layer 202; or, the anti-reflection film 203 is disposed on the side of the nanostructure layer 202 adjacent to the air.
  • the function of the anti-reflection coating 203 is to enhance the reflection and anti-reflection of incident radiation.
  • the material of the base layer 201 is a material with an extinction coefficient of less than 0.01 in the working band.
  • the material of the base layer 201 includes any one or a combination of fused quartz, quartz glass, crown glass, flint glass, sapphire, crystalline silicon and amorphous silicon, wherein the amorphous silicon can be hydrogenated Amorphous silicon.
  • the material of the base layer 201 includes any one or a combination of more of fused quartz, quartz glass, crown glass, flint glass, sapphire and alkaline glass.
  • the material of the nanostructure 2021 is the same as the material of the base layer 201 . In some embodiments of the present application, the material of the nanostructure 2021 is different from the material of the base layer 201 .
  • the filler 2022 is made of the same material as the base layer 201 . Optionally, the material of the filler 2022 is different from the material of the base layer 201 .
  • the filler 2022 and the nanostructure 2021 are made of the same material. In some optional implementations of this application, the filler 2022 and the nanostructure 2021 are made of different materials.
  • the material of the filler 2022 is a high transmittance material in the working band, and its extinction coefficient is less than 0.01.
  • materials of the filler 2022 include fused quartz, quartz glass, crown glass, flint glass, sapphire, crystalline silicon and amorphous silicon, wherein the amorphous silicon may be hydrogenated amorphous silicon.
  • the equivalent refractive index range of the super lens provided by the embodiment of the present application is less than 2.
  • the equivalent refractive index range is the maximum refractive index of the metalens minus its minimum refractive index.
  • the phase of the super lens provided by the embodiment of the present application also satisfies Formula (9-1) to Formula (9-8):
  • the phase of the super lens ie, the second lens 20
  • the matching between the actual phase and the ideal phase of the super lens provided by the embodiment of the present application that is, the broadband phase matching degree of the second lens 20 is given by formula (10):
  • the embodiment of the present application provides a super lens, which includes a base layer 201 and two nanostructure layers 202 disposed on the base layer 201, wherein the two layers of nanostructures 202 are sequentially in the direction away from the base layer 201.
  • the specific structural parameters of the super lens are shown in Table 1.
  • Figure 23 shows the phase diagram of the metalens provided in Embodiment 1.
  • the abscissa in Figure 23 is the wavelength of the incident radiation, and the ordinate is the number of the nanostructure 2022.
  • Figure 24 shows a schematic diagram of the transmittance of the super lens provided in Embodiment 1.
  • the abscissa of Figure 24 is the wavelength of the incident radiation, and the ordinate is the number of the nanostructure 2022.
  • the embodiment of the present application exemplarily provides a super lens, which includes a base layer 201 and two nanostructure layers 202 disposed on the base layer 201 , wherein the two layers of nanostructures 202 are along the direction away from the base layer 201 The directions are the first nanostructure layer and the second nanostructure layer in sequence.
  • the specific structural parameters of the super lens are shown in Table 2.
  • Figure 25 shows the phase diagram of the metalens provided in Embodiment 1.
  • the abscissa in Figure 25 is the wavelength of the incident radiation, and the ordinate is the number of the nanostructure 2022.
  • Figure 26 shows a schematic diagram of the transmittance of the super lens provided in Embodiment 1.
  • the abscissa of Figure 26 is the wavelength of the incident radiation, and the ordinate is the number of the nanostructure 2022.
  • the embodiment of the present application also provides a super lens processing method, as shown in Figures 27 to 29.
  • the method at least includes steps S1 to S5.
  • step S1 a layer of structural layer material 202a is provided on the base layer 201.
  • Step S2 apply photoresist 204 on the structural layer material 202a, and expose the reference structure 205.
  • step S3 periodically arranged nanostructures 2021 are etched on the structural layer material 202a according to the reference structure 206 to form the nanostructure layer 202.
  • Step S4 Set fillers 2022 between the nanostructures 2021.
  • Step S5 Trim the surface of the filler 2022 so that the surface of the filler 2022 coincides with the surface of the nanostructure 2021.
  • the method provided by the embodiment of this application also includes:
  • Step S6 Repeat steps S1 to S5 until all nanostructure layers are set.
  • the embodiment of the present application exemplarily provides an optical system, as shown in Figure 1.
  • the optical system includes apertures (STO) arranged sequentially from the object side to the image side (the direction from left to right in Figure 1), The first lens 10 , the second lens 20 , the third lens 30 , the fourth lens 40 , the fifth lens 50 and the sixth lens 60 .
  • an infrared filter is further provided between the sixth lens 60 and the image plane of the optical system.
  • optical system satisfies formula (1-1) to formula (1-4): f/EPD ⁇ 3;(1-1) 25° ⁇ HFOV ⁇ 55°; (1-2) 0.05mm ⁇ d 2 ⁇ 2mm; (1-3)
  • f is the focal length of the optical system
  • EPD is the entrance pupil diameter of the optical system
  • HFOV is one-half of the maximum field angle of the optical system
  • d 2 is the thickness of the second lens 20
  • f 2 is the thickness of the second lens 20 The focal length of the second lens 20.
  • FIG. 3-1 The specific parameters of the optical system provided in Embodiment 3 are shown in Table 3-1.
  • the parameters of each lens in this optical system such as the curvature of the object-side surface and image-side surface, the thickness and refractive index of the lens, are shown in Table 3-2.
  • the aspheric coefficients of each curved surface in this optical system are shown in Table 3-3-1 and Table 3-3-2.
  • Figure 30 shows the phase diagrams of the hyperlens (ie, the second lens 20) in the optical system provided in Embodiment 3 in three different wavelength bands: 486.13nm, 587.56nm, and 656.27nm. It can be seen from Figure 30 that the phases of this optical system in different wavebands all cover the 2 ⁇ phase.
  • FIG. 1 The specific parameters of the optical system provided in Embodiment 3-1.
  • the parameters of each lens in this optical system such as the curvature of the object-side surface and image-side surface, the thickness and refractive index of the lens, are shown in
  • FIG. 31 shows an astigmatism diagram of the optical system provided in Embodiment 3.
  • the astigmatism of this optical system in different fields of view is less than 0.5mm.
  • Figure 32 shows a distortion diagram of the optical system provided by the embodiment of the present application. It can be seen from Figure 32 that the distortion of this optical system under different fields of view is less than 5%.
  • Figure 33 shows the broadband matching degree of the super lens (ie, the second lens 20) in the optical system. In Figure 33, the broadband matching degree of the super lens is greater than 90%. It can be seen from the above that the optical system provided by Embodiment 3 has clear images, excellent astigmatism and distortion control, and excellent imaging quality.
  • the embodiment of the present application exemplarily provides an optical system, as shown in Figure 2.
  • the optical system includes apertures (STO) arranged sequentially from the object side to the image side (the direction from left to right in Figure 2), The first lens 10 , the second lens 20 , the third lens 30 , the fourth lens 40 , the fifth lens 50 and the sixth lens 60 .
  • an infrared filter is also provided between the sixth lens 60 and the image plane of the optical system.
  • the embodiment of this application provides The provided optical system satisfies formula (1-1) to formula (1-4): f/EPD ⁇ 3;(1-1) 25° ⁇ HFOV ⁇ 55°; (1-2) 0.05mm ⁇ d 2 ⁇ 2mm; (1-3)
  • f is the focal length of the optical system
  • EPD is the entrance pupil diameter of the optical system
  • HFOV is one-half of the maximum field angle of the optical system
  • d 2 is the thickness of the second lens 20
  • f 2 is the thickness of the second lens 20 The focal length of the second lens 20.
  • Table 4-1 The specific parameters of the optical system provided in Embodiment 4 are shown in Table 4-1.
  • the parameters of each lens in this optical system such as the curvature of the object-side surface and image-side surface, the thickness and refractive index of the lens, are shown in Table 4-2.
  • the aspheric coefficients of each curved surface in this optical system are shown in Table 4-3-1 and Table 4-3-2.
  • Figure 34 shows the phase diagrams of the hyperlens (ie, the second lens 20) in the optical system provided in Embodiment 4 in three different wavelength bands: 486.13nm, 587.56nm, and 656.27nm. It can be seen from Figure 34 that the phases of this optical system in different wavebands all cover the 2 ⁇ phase.
  • FIG. 1 The specific parameters of the optical system provided in Embodiment 4-1.
  • the parameters of each lens in this optical system such as the curvature of the object-side surface and image-side surface, the thickness and refractive index of the lens, are shown in Table 4-
  • Figure 35 shows an astigmatism diagram of the optical system provided in Embodiment 4. It can be seen from Figure 35 that the astigmatism of this optical system in different fields of view is less than 1mm.
  • Figure 36 shows a distortion diagram of the optical system provided by the embodiment of the present application. It can be seen from Figure 36 that the distortion of this optical system in different fields of view is far less than 5%.
  • Figure 37 shows the broadband matching degree of the super lens (ie, the second lens 20) in the optical system. In Figure 37, the broadband matching degree of the super lens is greater than 90%. It can be seen from the above that the optical system provided by Embodiment 4 has clear images, excellent astigmatism and distortion control, and excellent imaging quality.
  • the embodiment of the present application exemplarily provides an optical system, as shown in Figure 3.
  • the optical system includes apertures (STO) arranged sequentially from the object side to the image side (the direction from left to right in Figure 3), The first lens 10 , the second lens 20 , the third lens 30 , the fourth lens 40 , the fifth lens 50 and the sixth lens 60 .
  • an infrared filter is also provided between the sixth lens 60 and the image plane of the optical system.
  • optical system satisfies formula (1-1) to formula (1-4): f/EPD ⁇ 3;(1-1) 25° ⁇ HFOV ⁇ 55°; (1-2) 0.05mm ⁇ d 2 ⁇ 2mm; (1-3)
  • f is the focal length of the optical system
  • EPD is the entrance pupil diameter of the optical system
  • HFOV is one-half of the maximum field angle of the optical system
  • d 2 is the thickness of the second lens 20
  • f 2 is the thickness of the second lens 20 The focal length of the second lens 20.
  • FIG. 5-1 The specific parameters of the optical system provided in Embodiment 5 are shown in Table 5-1.
  • the parameters of each lens in this optical system such as the curvature of the object-side surface and image-side surface, the thickness and refractive index of the lens, are shown in Table 5-2.
  • the aspheric coefficients of each curved surface in this optical system are shown in Table 5-3-1 and Table 5-3-2.
  • Figure 38 shows the phase diagrams of the hyperlens (ie, the second lens 20) in the optical system provided in Embodiment 5 in three different wavelength bands: 486.13nm, 587.56nm, and 656.27nm. It can be seen from Figure 38 that the phases of this optical system in different wavebands all cover the 2 ⁇ phase.
  • FIG. 1 The specific parameters of the optical system provided in Embodiment 5-1.
  • the parameters of each lens in this optical system such as the curvature of the object-side surface and image-side surface, the thickness and refractive index of the lens, are shown in
  • Figure 39 shows an astigmatism diagram of the optical system provided in Embodiment 5.
  • the astigmatism of this optical system in different fields of view is less than 0.5mm.
  • Figure 40 shows a distortion diagram of the optical system provided by the embodiment of the present application. It can be seen from Figure 40 that the distortion of this optical system under different fields of view is less than 5%.
  • Figure 41 shows the broadband matching degree of the super lens (ie, the second lens 20) in the optical system. In Figure 41, the broadband matching degree of the super lens is greater than 90%. It can be seen from the above that the optical system provided by Embodiment 5 has clear images, excellent astigmatism and distortion control, and excellent imaging quality. Table 5-1
  • the embodiment of the present application exemplarily provides an optical system, as shown in Figure 4.
  • the optical system includes apertures (STO) arranged sequentially from the object side to the image side (the direction from left to right in Figure 4), The first lens 10 , the second lens 20 , the third lens 30 , the fourth lens 40 , the fifth lens 50 and the sixth lens 60 .
  • an infrared filter is also provided between the sixth lens 60 and the image plane of the optical system.
  • optical system satisfies formula (1-1) to formula (1-4): f/EPD ⁇ 3;(1-1) 25° ⁇ HFOV ⁇ 55°; (1-2) 0.05mm ⁇ d 2 ⁇ 2mm; (1-3)
  • f is the focal length of the optical system
  • EPD is the entrance pupil diameter of the optical system
  • HFOV is one-half of the maximum field angle of the optical system
  • d 2 is the thickness of the second lens 20
  • f 2 is the thickness of the second lens 20 The focal length of the second lens 20.
  • the specific parameters of the optical system provided in Embodiment 6 are shown in Table 6-1.
  • the parameters of each lens in this optical system such as the curvature of the object-side surface and image-side surface, the thickness and refractive index of the lens, are shown in Table 6-2.
  • the aspheric coefficients of each curved surface in this optical system are shown in Table 6-3-1 and Table 6-3-2.
  • Figure 42 shows the phase diagrams of the hyperlens (ie, the second lens 20) in the optical system provided in Embodiment 6 at three different wavelength bands of 486.13nm, 587.56nm and 656.27nm respectively. It can be seen from Figure 42 that the phases of this optical system in different wavebands all cover the 2 ⁇ phase.
  • FIG 43 shows an astigmatism diagram of the optical system provided in Embodiment 6.
  • the astigmatism of this optical system in different fields of view is less than 0.5mm.
  • Figure 44 shows a distortion diagram of the optical system provided by the embodiment of the present application. It can be seen from Figure 44 that the distortion of this optical system in different fields of view is far less than 5%.
  • Figure 45 shows the broadband matching degree of the super lens (ie, the second lens 20) in the optical system. In Figure 45, the broadband matching degree of the super lens is greater than 90%. It can be seen from the above that the optical system provided by Embodiment 6 has clear images, excellent astigmatism and distortion control, and excellent imaging quality.
  • the embodiment of the present application exemplarily provides an optical system, as shown in Figure 5.
  • the optical system includes apertures (STO) arranged sequentially from the object side to the image side (the direction from left to right in Figure 5), The first lens 10 , the second lens 20 , the third lens 30 , the fourth lens 40 , the fifth lens 50 and the sixth lens 60 .
  • an infrared filter is also provided between the sixth lens 60 and the image plane of the optical system.
  • optical system satisfies formula (1-1) to formula (1-4): f/EPD ⁇ 3;(1-1) 25° ⁇ HFOV ⁇ 55°; (1-2) 0.05mm ⁇ d 2 ⁇ 2mm; (1-3)
  • f is the focal length of the optical system
  • EPD is the entrance pupil diameter of the optical system
  • HFOV is one-half of the maximum field angle of the optical system
  • d 2 is the thickness of the second lens 20
  • f 2 is the thickness of the second lens 20 The focal length of the second lens 20.
  • Table 7-1 The specific parameters of the optical system provided in Embodiment 7 are shown in Table 7-1.
  • the parameters of each lens in this optical system such as the curvature of the object-side surface and image-side surface, the thickness and refractive index of the lens, are shown in Table 7-2.
  • the aspheric coefficients of each curved surface in this optical system are shown in Table 7-3-1 and Table 7-3-2.
  • Figure 46 shows the phase diagrams of the hyperlens (ie, the second lens 20) in the optical system provided in Embodiment 7 in three different wavelength bands: 486.13nm, 587.56nm, and 656.27nm. It can be seen from Figure 46 that the phases of this optical system in different wavebands all cover the 2 ⁇ phase.
  • FIG. 1 The specific parameters of the optical system provided in Embodiment 7-1.
  • the parameters of each lens in this optical system such as the curvature of the object-side surface and image-side surface, the thickness and refractive index of the lens, are shown in
  • FIG 47 shows an astigmatism diagram of the optical system provided in Embodiment 7.
  • the astigmatism of this optical system in different fields of view is less than 0.5mm.
  • Figure 48 shows a distortion diagram of the optical system provided by the embodiment of the present application. It can be seen from Figure 48 that the distortion of this optical system under different fields of view is less than 5%.
  • Figure 49 shows the broadband matching degree of the super lens (ie, the second lens 20) in the optical system. In Figure 49, the broadband matching degree of the super lens is greater than 90%. It can be seen from the above that the optical system provided in Embodiment 7 has clear images, excellent astigmatism and distortion control, and excellent imaging quality.
  • the embodiment of the present application exemplarily provides an optical system, as shown in Figure 6 .
  • the optical system includes a first lens 10 arranged sequentially from the object side to the image side (the direction from left to right in Figure 6 ). (STO), the second lens 20 , the third lens 30 , the fourth lens 40 , the fifth lens 50 and the sixth lens 60 .
  • STO the second lens 20
  • the third lens 30 the fourth lens 40
  • the fifth lens 50 the sixth lens 60
  • an infrared filter is also provided between the sixth lens 60 and the image plane of the optical system.
  • optical system satisfies formula (1-1) to formula (1-4): f/EPD ⁇ 3;(1-1) 25° ⁇ HFOV ⁇ 55°; (1-2) 0.05mm ⁇ d 2 ⁇ 2mm; (1-3)
  • f is the focal length of the optical system
  • EPD is the entrance pupil diameter of the optical system
  • HFOV is one-half of the maximum field angle of the optical system
  • d 2 is the thickness of the second lens 20
  • f 2 is the thickness of the second lens 20 The focal length of the second lens 20.
  • Table 8-1 The specific parameters of the optical system provided in Embodiment 8 are shown in Table 8-1.
  • the parameters of each lens in this optical system such as the curvature of the object-side surface and image-side surface, the thickness and refractive index of the lens, are shown in Table 8-2.
  • the aspheric coefficients of each curved surface in this optical system are shown in Table 8-3-1 and Table 8-3-2.
  • Figure 50 shows the phase diagrams of the hyperlens (ie, the second lens 20) in the optical system provided in Embodiment 8 at three different wavelength bands: 486.13nm, 587.56nm, and 656.27nm. It can be seen from Figure 50 that the phases of this optical system in different wavebands all cover the 2 ⁇ phase.
  • FIG. 1 The specific parameters of the optical system provided in Embodiment 8-1.
  • the parameters of each lens in this optical system such as the curvature of the object-side surface and image-side surface, the thickness and refractive index of the lens, are shown in
  • Figure 51 shows an astigmatism diagram of the optical system provided in Embodiment 8. As can be seen from Figure 51, the astigmatism of this optical system in different fields of view is less than 0.5mm.
  • Figure 52 shows a distortion diagram of the optical system provided by the embodiment of the present application. It can be seen from Figure 52 that the distortion of this optical system under different fields of view is less than 5%.
  • Figure 53 shows the broadband matching degree of the super lens (ie, the second lens 20) in the optical system. In Figure 53, the broadband matching degree of the super lens is greater than 90%. It can be seen from the above that the optical system provided in Embodiment 8 has clear images, excellent astigmatism and distortion control, and excellent imaging quality.
  • the embodiment of the present application exemplarily provides an optical system, as shown in Figure 7.
  • the optical system includes a first lens 10 arranged sequentially from the object side to the image side (the direction from left to right in Figure 7). (STO), the second lens 20 , the third lens 30 , the fourth lens 40 , the fifth lens 50 and the sixth lens 60 .
  • an infrared filter is also provided between the sixth lens 60 and the image plane of the optical system.
  • optical system satisfies formula (1-1) to formula (1-4): f/EPD ⁇ 3;(1-1) 25° ⁇ HFOV ⁇ 55°; (1-2) 0.05mm ⁇ d 2 ⁇ 2mm; (1-3)
  • f is the focal length of the optical system
  • EPD is the entrance pupil diameter of the optical system
  • HFOV is one-half of the maximum field angle of the optical system
  • d 2 is the thickness of the second lens 20
  • f 2 is the thickness of the second lens 20 The focal length of the second lens 20.
  • FIG. 9-1 The specific parameters of the optical system provided in Embodiment 9 are shown in Table 9-1.
  • the parameters of each lens in this optical system such as the curvature of the object-side surface and image-side surface, the thickness and refractive index of the lens, are shown in Table 8-2.
  • the aspheric coefficients of each curved surface in this optical system are shown in Table 9-3-1 and Table 9-3-2.
  • Figure 54 shows the phase diagrams of the hyperlens (ie, the second lens 20) in the optical system provided in Embodiment 9 in three different wavelength bands: 486.13nm, 587.56nm, and 656.27nm. It can be seen from Figure 54 that the phases of this optical system in different wavebands all cover the 2 ⁇ phase.
  • FIG. 9-1 The specific parameters of the optical system provided in Embodiment 9-1.
  • the parameters of each lens in this optical system such as the curvature of the object-side surface and image-side surface, the thickness and refractive index of the lens, are
  • FIG. 55 shows an astigmatism diagram of the optical system provided in Embodiment 8. As can be seen from Figure 55, the astigmatism of this optical system in different fields of view is less than 0.5mm.
  • Figure 56 shows a distortion diagram of the optical system provided by the embodiment of the present application. It can be seen from Figure 56 that the distortion of this optical system under different fields of view is less than 5%.
  • Figure 57 shows that the broadband matching degree of the super lens (ie, the second lens 20) in this optical system is greater than 90%. It can be seen from the above that the optical system provided in Embodiment 9 has clear images, excellent astigmatism and distortion control, and excellent imaging quality.
  • the embodiment of the present application exemplarily provides an optical system, as shown in Figure 8.
  • the optical system includes a first lens 10 arranged sequentially from the object side to the image side (the direction from left to right in Figure 8). (STO), the second lens 20 , the third lens 30 , the fourth lens 40 , the fifth lens 50 and the sixth lens 60 .
  • STO the object side to the image side
  • the second lens 20 the third lens 30
  • the fourth lens 40 the fifth lens 50
  • the sixth lens 60 the sixth lens 60
  • an infrared filter is also provided between the sixth lens 60 and the image plane of the optical system.
  • optical system satisfies formula (1-1) to formula (1-4): f/EPD ⁇ 3;(1-1) 25° ⁇ HFOV ⁇ 55°; (1-2) 0.05mm ⁇ d 2 ⁇ 2mm; (1-3)
  • f is the focal length of the optical system
  • EPD is the entrance pupil diameter of the optical system
  • HFOV is one-half of the maximum field angle of the optical system
  • d 2 is the thickness of the second lens 20
  • f 2 is the thickness of the second lens 20 The focal length of the second lens 20.
  • the specific parameters of the optical system provided in Embodiment 10 are shown in Table 10-1.
  • the parameters of each lens in this optical system such as the curvature of the object-side surface and image-side surface, the thickness and refractive index of the lens, are shown in Table 8-2.
  • the aspheric coefficients of each curved surface in this optical system are shown in Table 10-3-1 and Table 10-3-2.
  • Figure 58 shows the phase diagrams of the hyperlens (ie, the second lens 20) in the optical system provided in Embodiment 10 in three different wavelength bands of 486.13nm, 587.56nm and 656.27nm respectively. It can be seen from Figure 58 that the phases of this optical system in different wavebands cover Cover the 2 ⁇ phase.
  • FIG. 59 shows an astigmatism diagram of the optical system provided in Embodiment 10. As can be seen from Figure 59, the astigmatism of this optical system in different fields of view is less than 0.5mm.
  • Figure 60 shows a distortion diagram of the optical system provided by the embodiment of the present application. It can be seen from Figure 60 that the distortion of this optical system under different fields of view is less than 5%.
  • Figure 61 shows the broadband matching degree of the super lens (ie, the second lens 20) in this optical system. In Figure 61, the broadband matching degree of the super lens is greater than 90%. It can be seen from the above that the optical system provided by Embodiment 10 has clear images, excellent astigmatism and distortion control, and excellent imaging quality.
  • the embodiment of the present application exemplarily provides an optical system, as shown in Figure 9.
  • the optical system includes apertures (STO) arranged sequentially from the object side to the image side (the direction from left to right in Figure 9), The first lens 10 , the second lens 20 , the third lens 30 , the fourth lens 40 , the fifth lens 50 and the sixth lens 60 .
  • an infrared filter is also provided between the sixth lens 60 and the image plane of the optical system.
  • optical system satisfies formula (1-1) to formula (1-4): f/EPD ⁇ 3;(1-1) 25° ⁇ HFOV ⁇ 55°; (1-2) 0.05mm ⁇ d 2 ⁇ 2mm; (1-3)
  • f is the focal length of the optical system
  • EPD is the entrance pupil diameter of the optical system
  • HFOV is one-half of the maximum field angle of the optical system
  • d 2 is the thickness of the second lens 20
  • f 2 is the thickness of the second lens 20 The focal length of the second lens 20.
  • the specific parameters of the optical system provided in Embodiment 11 are shown in Table 11-1.
  • the parameters of each lens in this optical system such as the curvature of the object-side surface and image-side surface, the thickness and refractive index of the lens, are shown in Table 8-2.
  • the aspheric coefficients of each curved surface in this optical system are shown in Table 11-3-1 and Table 11-3-2.
  • Figure 62 shows the phase diagrams of the hyperlens (ie, the second lens 20) in the optical system provided in Embodiment 11 in three different wavelength bands of 486.13nm, 587.56nm and 656.27nm respectively. It can be seen from Figure 62 that the phases of this optical system in different wavebands all cover the 2 ⁇ phase.
  • FIG. 63 shows an astigmatism diagram of the optical system provided in Embodiment 11. It can be seen from Figure 63 that the astigmatism of this optical system in different fields of view is less than 0.5mm.
  • Figure 64 shows a distortion diagram of the optical system provided by the embodiment of the present application. It can be seen from Figure 64 that the distortion of this optical system under different fields of view is less than 5%.
  • Figure 65 shows the broadband matching degree of the super lens (ie, the second lens 20) in the optical system. In Figure 65, the broadband matching degree of the super lens is greater than 90%. It can be seen from the above that the optical system provided in Embodiment 11 has clear images, excellent astigmatism and distortion control, and excellent imaging quality.
  • the embodiment of the present application exemplarily provides an optical system, as shown in Figure 10.
  • the optical system includes The diaphragm (STO), the first lens 10, the second lens 20, the third lens 30, the fourth lens 40, the fifth lens 50 and the Sixth lens 60 .
  • an infrared filter is also provided between the sixth lens 60 and the image plane of the optical system.
  • the optical system provided by the embodiment of the present application satisfies formula (1-1) to formula (1-4): f/EPD ⁇ 3;(1-1) 25° ⁇ HFOV ⁇ 55°; (1-2) 0.05mm ⁇ d 2 ⁇ 2mm; (1-3)
  • f is the focal length of the optical system
  • EPD is the entrance pupil diameter of the optical system
  • HFOV is one-half of the maximum field angle of the optical system
  • d 2 is the thickness of the second lens 20
  • f 2 is the thickness of the second lens 20 The focal length of the second lens 20.
  • the specific parameters of the optical system provided in Embodiment 12 are shown in Table 12-1.
  • the parameters of each lens in this optical system such as the curvature of the object-side surface and image-side surface, the thickness and refractive index of the lens, are shown in Table 12-2.
  • the aspheric coefficients of each curved surface in this optical system are shown in Table 12-3-1 and Table 12-3-2.
  • Figure 66 shows the phase diagrams of the super lens (ie, the second lens 20) in the optical system provided in Embodiment 6 in three different wavelength bands: 486.13 nm, 587.56 nm, and 656.27 nm. It can be seen from Figure 66 that the phases of this optical system in different wavebands all cover the 2 ⁇ phase.
  • FIG. 67 shows an astigmatism diagram of the optical system provided in Embodiment 12. It can be seen from Figure 67 that the astigmatism of this optical system in different fields of view is less than 0.5mm.
  • Figure 68 shows a distortion diagram of the optical system provided by the embodiment of the present application. It can be seen from Figure 68 that the distortion of this optical system under different fields of view is less than 5%.
  • Figure 69 shows the broadband matching degree of the super lens (ie, the second lens 20) in the optical system. In Figure 69, the broadband matching degree of the super lens is greater than 90%. It can be seen from the above that the optical system provided in Embodiment 12 has clear images, excellent astigmatism and distortion control, and excellent imaging quality.
  • embodiments of the present application provide an imaging device, which includes the optical system provided in any of the above embodiments and a photosensitive element disposed on the image plane of the above optical system.
  • the photosensitive element is an electronic photosensitive element, such as a Charge-Coupled Device (CCD) and a Complementary Metal-Oxide-Semiconductor (CMOS).
  • CCD Charge-Coupled Device
  • CMOS Complementary Metal-Oxide-Semiconductor
  • an embodiment of the present application further provides an electronic device, which includes the imaging device provided in the above embodiment.
  • hyperlens provided by any embodiment of the present application can be processed through semiconductor technology, and has the advantages of light weight, thin thickness, simple structure and process, low cost, and high consistency in mass production.
  • the optical system provided by the embodiment of the present application provides the main optical power by setting the first lens as an aspherical refractive lens, the second lens as a super lens, and the remaining lenses as refractive lenses, and At least one of all surfaces of the third to sixth lenses is aspherical.
  • the layout method that meets f/EPD ⁇ 3; 25° ⁇ HFOV ⁇ 55°; 0.05mm ⁇ d 2 ⁇ 2mm is adopted to achieve the reduction of the system length and weight of the six-piece optical system while ensuring the imaging quality. Promotes the miniaturization and lightweight of optical systems.
  • the imaging device provided by the embodiment of the present application adopts the optical system provided by the embodiment of the present application.
  • the optical system has a smaller volume and lighter weight, and has excellent imaging quality, which is conducive to making the optical system and
  • the combination of larger sensors can also reduce the installation space occupied by the optical system in the imaging device, thereby promoting the miniaturization and lightweight of the imaging device.
  • the electronic device provided by the embodiment of the present application adopts the imaging device provided by the embodiment of the present application. Since the optical system provided by the embodiments of the present application has a smaller volume, lighter weight, and excellent imaging quality than traditional optical systems, it is conducive to combining the optical system with a larger-sized sensor and can also reduce the cost of the optical system.
  • imaging equipment The installation space occupied in the device and electronic equipment. Therefore, the electronic equipment provided by the embodiments of the present application uses the imaging device, which reduces the volume and weight of the imaging device in the electronic equipment, and promotes the miniaturization and lightweight of the electronic equipment.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)

Abstract

本申请提供了光学系统及包含其的成像装置和电子设备，属于光学成像的技术领域，包括沿物方到像方的第一、二、三、四、五和第六透镜；第一透镜为非球面折射透镜；第二透镜为超透镜；其余透镜均为折射透镜，第三至第六透镜的所有表面中包括至少一个非球面，非球面包含一个反曲点；第一透镜具有正光焦度，第一透镜的物侧和第三透镜的像侧为凸面；第四透镜的物侧为凹面；第五透镜和第六透镜的物侧曲率半径均为负；满足：25°≤HFOV≤55°；0.05mm≤d2≤2mm；|f2|/f≥10；其中，f为光学系统焦距；EPD为入瞳直径；HFOV为最大视场角的一半；d2为第二透镜厚度；f2为第二透镜焦距，实现了小型化。

Description

光学系统及包含其的成像装置和电子设备 技术领域
本申请涉及光学成像的技术领域，具体地，本申请涉及光学系统及包含其的成像装置和电子设备。
背景技术
随着半导体制造业的进步，图像传感器的像素尺寸不断缩小，对光学系统的成像性能要求也越来越高。
然而，要实现光学系统的高性能通常的做法是增加光学系统中年透镜的数量。从而不可避免地造成了光学系统的尺寸和重量的增加。
因此，保证成像质量的同时实现光学系统的小型化和轻量化成为亟待解决的问题。
发明内容
为了解决现有技术中透镜数量增加造成光学系统尺寸和重量增加的问题，本申请实施例提供了一种光学系统及包含其的成像装置及电子设备。
第一方面，本申请实施例提供了一种光学系统，所述光学系统包括沿物方到像方依次分布的第一透镜、第二透镜、第三透镜、第四透镜、第五透镜和第六透镜；
其中，所述第一透镜为非球面折射透镜；所述第二透镜为超透镜；其余透镜均为折射透镜，并且，所述第三透镜、第四透镜、所述第五透镜和所述第六透镜的所有表面中包括至少一个非球面，所述非球面包含一个反曲点；
所述第一透镜具有正光焦度，并且所述第一透镜的物侧表面为凸面；所述第三透镜的像侧表面为凸面；所述第四透镜的物侧表面为凹面；所述第五透镜和所述第六透镜的物侧表面的曲率半径均为负；
所述光学系统至少满足如下关系：
f/EPD＜3
25°≤HFOV≤55°
0.05mm≤d2≤2mm
|f2|/f≥10；
其中，f为所述光学系统的焦距；EPD为所述光学系统的入瞳直径；HFOV为所述光学系统的最大视场角的二分之一；d2为所述第二透镜的厚度；f2为所述第二透镜的焦距。
可选地，所述光学系统还满足关系：
0.35≤R1o/f1≤0.58；
其中，R1o为所述第一透镜的物侧表面的曲率半径；f1为所述第一透镜的焦距。
可选地，所述光学系统还满足：
(V1+V4)/2-V3＞20；
其中，V1为所述第一透镜的阿贝数；V3为所述第三透镜的阿贝数；V4为所述第四透镜的阿贝数。
可选地，所述光学系统还满足：
0.55＜ImgH/TTL＜0.82；
其中，ImgH为所述光学系统的最大成像高度；TTL为所述第一透镜的物侧表面到所述光学系统成像面的距离。
可选地，所述光学系统还满足：所述第四透镜的像侧表面为凹面，并且，
R4i×R4o＞0；
其中，R4o为所述第四透镜的物侧表面的曲率半径；R4i为所述第四透镜的像侧表面 的曲率半径。
可选地，所述第五透镜的像侧表面的曲率半径均小于零。
可选地，所述光学系统还满足：
0.58≤f1/f≤0.85；
其中，f1为所述第一透镜的焦距；f为所述光学系统的焦距。
可选地，所述第三透镜、所述第四透镜、所述第五透镜和第六透镜中的任意一个或多个为非球面折射透镜。
可选地，所述超透镜包括基底层和至少一层设置于所述基底层一侧的纳米结构层；
其中，任一层所述纳米结构层包括周期性排列的纳米结构；
所述基底层和所述纳米结构层被配置为能够透过所述光学系统的工作波段的辐射。
可选地，所述超透镜包括至少两层纳米结构层；
其中，任意相邻的两层纳米结构层中的纳米结构同轴设置。
可选地，所述超透镜包括至少两层纳米结构层；其中，任意相邻的纳米结构层中的纳米结构沿平行于所述超透镜的基底的方向错位排列。
可选地，所述纳米结构的排列周期大于或等于0.3λc且小于或等于2λc，其中，λc为所述光学系统的工作波段的中心波长。
可选地，所述纳米结构的高度大于或等于0.3λc且小于或等于2λc，其中，λc为所述光学系统的工作波段的中心波长。
可选地，所述基底层的材料包括熔融石英、石英玻璃、冕牌玻璃、火石玻璃、蓝宝石和碱性玻璃中的任意一种或多种。
可选地，所述纳米结构的材料包括熔融石英、石英玻璃、冕牌玻璃、火石玻璃、蓝宝石、晶体硅和非晶硅中的任意一种或多种。所述非晶硅可以是氢化非晶硅。
可选地，所述纳米结构与所述基底层的材质相同。
可选地，所述纳米结构和所述基底层的材质不同。
可选地，所述超透镜还包括填充物；
所述填充物填充于所述纳米结构之间；所述填充物对所述光学系统的工作波段的消光系数小于0.01。
可选地，所述填充物的折射率与所述纳米结构的折射率的差值的绝对值大于或等于0.5。
可选地，所述填充物的材料包括空气、熔融石英、石英玻璃、冕牌玻璃、火石玻璃、蓝宝石、晶体硅和非晶硅中的任意一种或多种。所述非晶硅可以是氢化非晶硅。
可选地，所述填充物的材料与所述纳米结构的材料不同。
可选地，所述填充物的材料与所述基底层的材料不同。
可选地，所述超透镜还包括增透膜；
其中，所述增透膜被设置于所述纳米结构层与空气相邻的一侧；和/或，
所述增透膜被设置于所述基底层远离所述纳米结构层的一侧。
可选地，所述纳米结构以超结构单元的形式周期性排列；
所述超结构单元的形状为可密堆积图形，所述纳米结构被设置于所述可密堆积图形的顶点和/或中心位置。
可选地，所述超结构单元的形状包括扇形、正四边形、正六边形中的一种或多种的组合。
可选地，所述纳米结构的形状为偏振不敏感结构。
可选地，所述纳米结构的形状包括圆柱形、中空圆柱形、圆孔形、中空圆孔形、方柱形、方孔形、中空方柱形和中空方孔中的一种或多种的组合。
可选地，所述超透镜的相位还满足：







其中，r为所述超透镜的中心到任一纳米结构的距离；λ为所述超透镜的工作波长；为任一与所述超透镜工作波长相关的相位；(x，y)为超透镜镜面坐标，f2为所述超透镜的焦距；ai和bi为实数系数。
可选地，所述光学系统的工作波段包括可见光波段和近红外波段。
第二方面，本申请实施例还一种超透镜的加工方法，用于加工过如上述任一实施例提供的光学系统中的超透镜，所述方法包括：
步骤S1，在所述基底层上设置一层结构层材料；
步骤S2，在所述结构层材料上涂覆光刻胶，并曝光出参考结构；
步骤S3，依据所述参考结构在所述结构层材上刻蚀出周期性排列的所述纳米结构，以形成所述纳米结构层；
步骤S4，在所述纳米结构之间设置所述填充物；
步骤S5，修整所述填充物的表面，使所述填充物的表面与所述纳米结构的表面重合。
可选地，所述方法还包括：
步骤S6，重复所述步骤S1至所述步骤S5，直至完成所有纳米结构层的设置。
第三方面，本申请实施例又提供了一种成像装置，所述成像装置包括：
如上述任一实施例提供的光学系统和设置于所述光学系统的像面上的感光元件。
第四方面，本申请实施例又提供了一种电子设备，所述电子设备包括如上述实施例提供的成像装置。
综上所述，本申请实施例提供的光学系统，通过将第一透镜设置为非球面折射透镜以提供主要的光焦度，将第二透镜设置为超透镜，其余透镜设置为折射透镜，且第三至第六透镜的所有表面中至少一个为非球面。并且采用满足f/EPD＜3；25°≤HFOV≤55°；0.05mm≤d2≤2mm的布局方式，实现了在保证成像质量的前提下，压缩六片式光学系统的系统长度和重量，促进了光学系统的小型化和轻量化。
本申请实施例提供的成像装置，采用本申请实施例提供的光学系统，该光学系统 相比传统的光学系统具有更小的体积、更轻的重量，且成像质量优异，有利于使光学系统与更大尺寸的传感器结合，也能够减少光学系统在成像装置中所占用的安装空间，从而促进了成像装置的小型化和轻量化。
本申请实施例提供的电子设备，采用本申请实施例提供的成像装置。由于本申请实施例提供的光学系统相比传统的光学系统具有更小的体积、更轻的重量，且成像质量优异，有利于使光学系统与更大尺寸的传感器结合，也能够减少光学系统在成像装置和电子设备中所占用的安装空间。因此，本申请实施例提供的电子设备采用该成像装置，降低了成像装置在电子设备中所占的体积和重量，促进了电子设备的小型化和轻量化。
附图说明
所包括的附图用于提供本申请的进一步理解，并且被并入本说明书中构成本说明书的一部分。附图示出了本申请的实施方式，连同下面的描述一起用于说明本申请的原理。
图1示出了本申请实施例提供的光学系统的一种可选的结构示意图；
图2示出了本申请实施例提供的光学系统的又一种可选的结构示意图；
图3示出了本申请实施例提供的光学系统的又一种可选的结构示意图；
图4示出了本申请实施例提供的光学系统的又一种可选的结构示意图；
图5示出了本申请实施例提供的光学系统的又一种可选的结构示意图；
图6示出了本申请实施例提供的光学系统的又一种可选的结构示意图；
图7示出了本申请实施例提供的光学系统的又一种可选的结构示意图；
图8示出了本申请实施例提供的光学系统的又一种可选的结构示意图；
图9示出了本申请实施例提供的光学系统的又一种可选的结构示意图；
图10示出了本申请实施例提供的光学系统的又一种可选的结构示意图；
图11示出了本申请实施例提供的光学系统中的超透镜的一种可选的结构示意图；
图12示出了本申请实施例提供的超透镜中纳米结构的一种可选的结构示意图；
图13示出了本申请实施例提供的超透镜中纳米结构的又一种可选的结构示意图；
图14示出了本申请实施例提供的超透镜中纳米结构的一种可选的排列方式示意图；
图15示出了本申请实施例提供的超透镜中纳米结构的又一种可选的排列方式示意图；
图16示出了本申请实施例提供的超透镜中纳米结构的又一种可选的排列方式示意图；
图17示出了本申请实施例提供的超透镜中纳米结构的又一种可选的结构示意图；
图18示出了本申请实施例提供的超透镜中纳米结构的又一种可选的结构示意图；
图19示出了本申请实施例提供的超透镜中纳米结构的又一种可选的结构示意图；
图20示出了本申请实施例提供的超透镜的又一种可选的结构示意图；
图21示出了本申请实施例提供的超透镜的又一种可选的结构示意图；
图22示出了本申请实施例提供的超透镜的又一种可选的结构示意图；
图23示出了本申请实施例提供的超透镜的一种可选的相位示意图；
图24示出了本申请实施例提供的超透镜的一种可选的透过率示意图；
图25示出了本申请实施例提供的超透镜的又一种可选的相位示意图；
图26示出了本申请实施例提供的超透镜的又一种可选的透过率示意图；
图27示出了本申请实施例提供的超透镜加工方法的一种可选的流程示意图；
图28示出了本申请实施例提供的超透镜加工方法的又一种可选的流程示意图；
图29示出了本申请实施例提供的超透镜加工方法的又一种可选的流程示意图；
图30示出了本申请实施例提供的一种可选的光学系统中的第二透镜在不同波长 处的相位调制示意图；
图31示出了本申请实施例提供的一种可选的光学系统的像散图；
图32示出了本申请实施例提供的一种可选的光学系统的畸变图；
图33示出了本申请实施例提供的一种可选的光学系统中第二透镜的宽带匹配度；
图34示出了本申请实施例提供的又一种可选的光学系统中的第二透镜在不同波长处的相位调制示意图；
图35示出了本申请实施例提供的又一种可选的光学系统的像散图；
图36示出了本申请实施例提供的又一种可选的光学系统的畸变图；
图37示出了本申请实施例提供的一种可选的光学系统中第二透镜的宽带匹配度；
图38示出了本申请实施例提供的又一种可选的光学系统中的第二透镜在不同波长处的相位调制示意图；
图39示出了本申请实施例提供的又一种可选的光学系统的像散图；
图40示出了本申请实施例提供的又一种可选的光学系统的畸变图；
图41示出了本申请实施例提供的一种可选的光学系统中第二透镜的宽带匹配度；
图42示出了本申请实施例提供的又一种可选的光学系统中的第二透镜在不同波长处的相位调制示意图；
图43示出了本申请实施例提供的又一种可选的光学系统的像散图；
图44示出了本申请实施例提供的又一种可选的光学系统的畸变图；
图45示出了本申请实施例提供的一种可选的光学系统中第二透镜的宽带匹配度；
图46示出了本申请实施例提供的又一种可选的光学系统中的第二透镜在不同波长处的相位调制示意图；
图47示出了本申请实施例提供的又一种可选的光学系统的像散图；
图48示出了本申请实施例提供的又一种可选的光学系统的畸变图；
图49示出了本申请实施例提供的一种可选的光学系统中第二透镜的宽带匹配度；
图50示出了本申请实施例提供的又一种可选的光学系统中的第二透镜在不同波长处的相位调制示意图；
图51示出了本申请实施例提供的又一种可选的光学系统的像散图；
图52示出了本申请实施例提供的又一种可选的光学系统的畸变图；
图53示出了本申请实施例提供的一种可选的光学系统中第二透镜的宽带匹配度；
图54示出了本申请实施例提供的又一种可选的光学系统中的第二透镜在不同波长处的相位调制示意图；
图55示出了本申请实施例提供的又一种可选的光学系统的像散图；
图56示出了本申请实施例提供的又一种可选的光学系统的畸变图；
图57示出了本申请实施例提供的一种可选的光学系统中第二透镜的宽带匹配度；
图58示出了本申请实施例提供的又一种可选的光学系统中的第二透镜在不同波长处的相位调制示意图；
图59示出了本申请实施例提供的又一种可选的光学系统的像散图；
图60示出了本申请实施例提供的又一种可选的光学系统的畸变图；
图61示出了本申请实施例提供的一种可选的光学系统中第二透镜的宽带匹配度；
图62示出了本申请实施例提供的又一种可选的光学系统中的第二透镜在不同波长处的相位调制示意图；
图63示出了本申请实施例提供的又一种可选的光学系统的像散图；
图64示出了本申请实施例提供的又一种可选的光学系统的畸变图；
图65示出了本申请实施例提供的一种可选的光学系统中第二透镜的宽带匹配度；
图66示出了本申请实施例提供的又一种可选的光学系统中的第二透镜在不同波长处的相位调制示意图；
图67示出了本申请实施例提供的又一种可选的光学系统的像散图；
图68示出了本申请实施例提供的又一种可选的光学系统的畸变图；
图69示出了本申请实施例提供的一种可选的光学系统中第二透镜的宽带匹配度。
图中附图标记分别表示：
10-第一透镜；20-第二透镜；30-第三透镜；40-第四透镜；50-第五透镜；60-第六透镜；70-光阑；80-红外滤波器；
201-基底层；202-纳米结构层；203-增透膜；204-光刻胶；205-参考结构；202a-结构层材料；
2021-纳米结构；2022-填充物；2023-超结构单元。
具体实施方式
现将在下文中参照附图更全面地描述本申请，在附图中示出了各实施方式。然而，本申请可以以许多不同的方式实施，并且不应被解释为限于本文阐述的实施方式。相反，这些实施方式被提供使得本申请将是详尽的和完整的，并且将向本领域技术人员全面传达本申请的范围。通篇相同的附图标记表示相同的部件。再者，在附图中，为了清楚地说明，部件的厚度、比率和尺寸被放大。
本文使用的术语仅用于描述具体实施方式的目的，而非旨在成为限制。除非上下文清楚地另有所指，否则如本文使用的“一”、“一个”、“该”和“至少之一”并非表示对数量的限制，而是旨在包括单数和复数二者。例如，除非上下文清楚地另有所指，否则“一个部件”的含义与“至少一个部件”相同。“至少之一”不应被解释为限制于数量“一”。“或”意指“和/或”。术语“和/或”包括相关联的列出项中的一个或更多个的任何和全部组合。
除非另有限定，否则本文使用的所有术语，包括技术术语和科学术语，具有与本领域技术人员所通常理解的含义相同的含义。如共同使用的词典中限定的术语应被解释为具有与相关的技术上下文中的含义相同的含义，并且除非在说明书中明确限定，否则不在理想化的或者过于正式的意义上将这些术语解释为具有正式的含义。
“包括”或“包含”的含义指明了性质、数量、步骤、操作、部件、部件或它们的组合，但是并未排除其他的性质、数量、步骤、操作、部件、部件或它们的组合。
本文参照作为理想化的实施方式的截面图描述了实施方式。从而，预见到作为例如制造技术和/或公差的结果的、相对于图示的形状变化。因此，本文描述的实施方式不应被解释为限于如本文示出的区域的具体形状，而是应包括因例如制造导致的形状的偏差。例如，被示出或描述为平坦的区域可以典型地具有粗糙和/或非线性特征。而且，所示出的锐角可以被倒圆。因此，图中所示的区域在本质上是示意性的，并且它们的形状并非旨在示出区域的精确形状并且并非旨在限制权利要求的范围。
在下文中，将参照附图描述根据本申请的示例性实施方式。
在光学系统的小型化进程中，使用传统塑胶透镜的光学系统由于其注塑工艺的限制，很难在厚度和大曲率方面有所突破，从而导致六片式透镜结构的光学系统在各透镜厚度、各透镜间隔和系统总长上难以突破。另一方面，塑胶透镜的可选材料只有十多种，从而限制了光学系统像差校正的自由度。目前，虽然有玻璃树脂混合镜片在一定程度上解决了色差等问题，但非球面玻璃加工、注塑工艺仍然极大地妨碍了光学系统的小型化和轻量化。现如今，光学系统的系统总长每缩小1毫米都要付出巨大的努力。并且现有技术的六片式光学系统受工艺的限制导致良品率低。
第一方面，本申请实施例提供了一种光学系统，如图1至图10所示，该光学系统包括沿物方到像方依次分布的第一透镜10、第二透镜20、第三透镜30、第四透镜40、第五透镜50和第六透镜60。其中，第一透镜10为非球面折射透镜，第二透镜20为超透镜，其余透镜均为折射透镜。并且，第三透镜30、第四透镜40、第五透镜50和第六透镜60的所有表面中包括至少一个非球面，上述非球面包含一个反曲点。
第一透镜10具有正光焦度，并且第一透镜10的物侧表面为凸面；第三透镜30 的像侧表面为凸面；第四透镜40的物侧表面为凹面；第五透镜50和第六透镜60的物侧表面的曲率半径均为负。并且，本申请实施例提供的光学系统还满足如下公式(1-1)至公式(1-4)：
f/EPD＜3；(1-1)
25°≤HFOV≤55°；(1-2)
0.05mm≤d2≤2mm；(1-3)
|f2|/f≥10；(1-4)
其中，f为该光学系统的焦距；EPD为该光学系统的入瞳直径；HFOV为该光学系统的最大视场角的二分之一；d2为第二透镜20的厚度；f2为第二透镜20的焦距。这样的布局方式有利于减少该光学系统的系统总长。若超出上述公式(1-1)至(1-4)，则会降低该光学系统的分辨率并使系统总长增加。上述系统总长(TTL，Total Track Length)指的是第一透镜10的物侧表面到该光学系统的像面的距离。上述折射透镜的表面是指折射透镜的物侧表面和像侧表面。关于超透镜的结构示意图请参见图11至图29。本申请实施例中优选第二透镜20为平面超透镜。可选地，第二透镜20为非平面超透镜。
在一种可选的实施方式中，本申请实施例提供的光学系统还满足如下公式(2)：
0.35≤R1o/f1≤0.58；(2)
其中，R1o为第一透镜10的物侧表面的曲率半径；f1为第一透镜10的焦距。
根据本申请的实施方式，可选地，本申请实施例提供的光学系统还满足如下公式(3)：
(V1+V4)/2-V3＞20；(3)
其中，V1为第一透镜10的阿贝数；V3为第三透镜30的阿贝数；V4为第四透镜40的阿贝数。本申请实施例提供的光学系统满足上述公式(3)可以减小光学系统的体积，且可以改善该光学系统成像的边缘图像质量，避免图像周边昏暗。并且，如此布局有利于压缩该光学系统的系统总长。
本申请一些可选的实施例中，该光学系统还满足：
0.55＜ImgH/TTL＜0.82；(4)
其中，ImgH为该光学系统的最大成像高度(Image High)；最大成像高度是指电子感光元件的有效感测区域对角线长度的二分之一。TTL为所述第一透镜10的物侧表面到该光学系统成像面的距离。
本申请又一些可选的实施方式中，该光学系统中第四透镜40的像侧表面也为凹面，并且满足：
R4i×R4o＞0；(5)
其中，R4o为第四透镜40的物侧表面的曲率半径；R4i为第四透镜40的像侧表面的曲率半径。也就是说，第四透镜40的物侧表面和像侧表面均为凹面，并且，第四透镜40的物侧表面的曲率半径和像侧表面的曲率半径的乘积大于零。
根据本申请又一些可选的实施方式，该光学系统还满足如下公式(6)：
0.58≤f1/f≤0.85；(6)
其中，f1为第一透镜10的焦距；f为该光学系统的焦距。第一透镜10的焦距与该光学系统的焦距的比值满足公式(6)有利于压缩该光学系统的系统总长。
根据本申请一些可选的实施例，该光学系统中第三透镜30、第四透镜40、第五透镜50和第六透镜60中的任意一个或多个为非球面折射透镜。示例性地，本申请实施例提供的光学系统中，第三至第六透镜均为非球面折射透镜。
本申请实施例提供的光学系统中，除第二透镜20之外所有透镜的物侧表面和像侧表面中的非球面如公式(7)所示：
公式(7)中，z为平行于本申请实施例提供的光学系统的光轴的表面矢量，c为该非球面的中心点曲率(1/R)，k为二次曲面常数，A～J分别对应高阶系数。
在一些可选的实施方式中，本申请实施例提供的光学系统还包括光阑70，例如孔径光阑(STO)。理论上光阑70可以设置于该光学系统中任意一个透镜的一侧。可选地，本申请实施例的光学系统中光阑70设置于第一透镜10靠近物方的一侧，如此布局可以有利于控制整个光学系统的口径，以避免该光学系统口径过大从而阻碍该光学系统的小型化。
在又一些可选的实施方式中，本申请实施例提供的光学系统还包括红外滤波器80(IR filter)。示例性地，红外滤波器80被设置于第六透镜60和该光学系统的像面之间。示例性地，当该光学系统的工作波段为可见光波段时，红外滤波片有助于过滤入射辐射中的红外波段辐射，有利于减少入射辐射产生的热量，避免红外波段辐射灼烧设置于该光学系统下游的传感器，也有利于减少该光学系统成像的失真，从而提高该光学系统的成像质量。
接下来对本申请实施例提供的超透镜(即第二透镜20)进行详细描述。可以理解的是，超透镜为超表面的一种具体应用，超表面通过周期性排列的亚波长尺寸纳米结构对入射光的相位、幅度和偏振进行调制。根据本申请的实施方式，如图11所示，该光学系统中的超透镜(即第二透镜20)包括基底层201和至少一层设置于基底层201一侧的纳米结构层202。其中，任意一层纳米结构层202包括周期性排列的纳米结构2021。前述基底层201和纳米结构层202被配置为能够透过本申请实施例提供的光学系统的工作波段的辐射。
根据本申请的实施方式，可选地，至少一层纳米结构层202中的任一层中，纳米结构2021的排列周期大于或等于0.3λc，且小于或等于2λc；其中，λc为该光学系统的工作波段的中心波长。
根据本申请的实施方式，可选地，至少一层纳米结构层202的任一层中纳米结构2021的高度大于或等于0.3λc，且小于或等于5λc；其中，λc为该光学系统的工作波段的中心波长。
图12和图13示出了本申请实施例提供的超透镜的任一层纳米结构层202中纳米结构2021的透视图。可选地，图12为圆柱形结构。可选地，图13中的纳米结构2021为正方柱形结构。可选地，如图12和图13所示，该超透镜还包括填充物2022，填充物2022填充于纳米结构2021之间，并且，填充物2022的材料对工作波段的消光系数小于0.01。可选地，填充物包括空气或在工作波段透明或半透明的其他材料。根据本申请的实施方式，填充物2022的材料的折射率与纳米结构2021的折射率之间的差值的绝对值应大于或等于0.5。示例性地，当本申请实施例提供的超透镜具有至少两层纳米结构层202时，距离基底层201最远的纳米结构层202中的填充物2022可以是空气。
本申请一些可选的实施例中，如图14至图16所示，至少一层纳米结构层202的任意一层中的纳米结构2021以超结构单元2023的形式周期性排列。该超结构单元2023为可密堆积图形，该可密堆积图形的顶点和/或中心位置设置有纳米结构2021。本申请实施例中，可密堆积图形指的是一种或多种可以无缝隙不重叠地填充整个平面的图形。
如图14所示，根据本申请的实施方式，超结构单元可以布置成扇形。如图15所示，根据本申请的实施方式，超结构单元可以布置成正六边形的阵列。此外，如图16所示，根据本申请的实施方式，超结构单元2023可以布置成正方形的阵列。本领域技术人员应认识到，纳米结构层202中包括的超结构单元2023还可以包括其他形式 的阵列布置，所有这些变型方案均涵盖于本申请的范围内。
可选地，本申请实施例提供的超结构单元2023的宽谱相位与超透镜的工作波段还满足：
公式(8)中，r为该超透镜沿径向的坐标；r0为该超透镜上任一点到该超透镜中心的距离；λ为该超透镜的工作波长。
示例性地，本申请实施例提供的纳米结构2021可以是偏振无关结构，此类结构对入射光施加一个传播相位。根据本申请的实施方式，如图17、图18和图19所示，纳米结构2021可以是正结构，也可以是负结构。例如，纳米结构2021的形状包括圆柱、中空圆柱、正方形棱柱、中空正方形棱柱等。
更有利地，如图20所示，本申请实施例提供的第二透镜20包括至少两层纳米结构层202。可选地，参见图21中的(a)，至少两层纳米结构202中相邻的纳米结构层中的纳米结构2021共轴排列。前述共轴排列是指相邻两层的纳米结构层202中的纳米结构2021排列周期相同；或相邻两层纳米结构层中同一位置的纳米结构2021的轴线重合。可选地，参见图21中的(b)，至少两层纳米结构202中相邻的纳米结构层中的纳米结构2021沿平行于超透镜的基底的方向错位排列。这种排列方式有利于突破加工工艺对超透镜中纳米结构的深宽比的限制，从而实现更高的设计自由度。图20示出了一种可选的三层纳米结构层的透视图。图20中左图示出了一种可选的三层纳米结构层的透视图。图20中右图示出了每一层纳米结构层的俯视图。根据本申请的实施方式，相邻的纳米结构层202中的纳米结构2021的形状、尺寸或材料可以相同，也可以不同。根据本申请的实施方式，相邻的纳米结构层202中的填充物2022可以相同，也可以不同。
示例性地，图17中的a至图17中的d分别示出了纳米结构2021的形状包括圆柱、中空圆柱、正方形柱和中空正方形柱，且纳米结构2021周围填充有填充物2022。图17中，纳米结构2021被设置于正四边形的超结构单元2023的中心位置。在本申请的可选实施例中，图18中的a至图18中的d分别示出了有纳米结构2021的形状包括圆柱、中空圆柱、正方形柱和中空正方形柱，且纳米结构2021周围无填充物2022。图18中，纳米结构2021被设置于正四边形的超结构单元2023的中心位置。
根据本申请的实施方式，图19中的a至图19中的d分别示出了纳米结构2021的形状包括正方形柱、圆柱、中空正方形柱和中空圆柱，且纳米结构2021的周围无填充物2022。图19中的a至图19中的d中，纳米结构2021被设置于正六边形的超结构单元2023的中心位置。可选地，图19中的e至图19中的h分别示出了纳米结构2021为负纳米结构，如正方形孔柱、圆形孔柱、正方形环柱和圆形环柱。图19中的e至图19中的h中，纳米结构2021为设置于正六边形的超结构单元2023中心位置的负结构。
在一种可选的实施方式中，如图22所示，本申请实施例提供的超透镜还包括增透膜203。增透膜203被设置于基底层201远离纳米结构层202的一侧；或者，增透膜203被设置于纳米结构层202与空气相邻的一侧。增透膜203的作用是对入射的辐射起到增透减反的作用。
根据本申请的实施方式，可选地，基底层201的材料为对工作波段消光系数小于0.01的材料。例如，基底层201的材料包括熔融石英、石英玻璃、冕牌玻璃、火石玻璃、蓝宝石、晶体硅和非晶硅中的任意一种或多种的组合，其中，所述非晶硅可以是氢化非晶硅。再例如，当该超透镜的工作波段为可见光波段时，基底层201的材料包括熔融石英、石英玻璃、冕牌玻璃、火石玻璃、蓝宝石和碱性玻璃中的任意一种或多种的组合。在本申请的一些实施例中，纳米结构2021的材料与基底层201的材料相同。在本申请的又一些实施例中，纳米结构2021的材料与基底层201的材料不同。 可选地，填充物2022的材料与基底层201的材料相同。可选地，填充物2022的材料与基底层201的材料不同。
应理解，在本申请一些可选的实施方式中，填充物2022与纳米结构2021的材质相同。在本申请又一些可选的实施方式中，填充物2022与纳米结构2021的材质不同。示例性地，填充物2022的材料为工作波段的高透过率材料，其消光系数小于0.01。示例性地，填充物2022的材料包括熔融石英、石英玻璃、冕牌玻璃、火石玻璃、蓝宝石、晶体硅和非晶硅，其中所述非晶硅可以是氢化非晶硅。
可选地，本申请实施例提供的超透镜的等效折射率范围小于2。等效折射率范围为超透镜的最大折射率减去其最小折射率。根据本申请的实施方式，本申请实施例提供的超透镜的相位还满足公式(9-1)至公式(9-8)：







上述公式(9-1)至(9-8)中，r为超透镜的中心到任一纳米结构中心的距离；λ为超透镜的工作波长，为任一与工作波长相关的相位，(x，y)为超透镜上的坐标(在一些情况下可以理解为基底层201表面的坐标)，f2为超透镜的焦距，ai和bi为实数系数。超透镜(即第二透镜20)的相位可以用高次多项式表达，高次多项式包括奇次多项式和偶次多项式。为了不破坏超透镜相位的旋转对称性，通常只能对偶次多项式对应的相位进行优化，这大大降低了超透镜的设计自由度。而上述公式(9-1)至公式(9-8)中，公式(9-4)至公式(9-6)相比其余公式，能够对满足奇次多项式的相位进行优化而不破坏超透镜相位的旋转对称性，从而大大提高了超透镜的优化自由度。
可选地，本申请实施例提供的超透镜的实际相位与理想相位的匹配，也就是第二透镜20的宽带相位匹配度由公式(10)给出：
公式(10)中λmax和λmin分别为超透镜的工作波段的上限和下限，例如λmax＝700nm， λmin＝400nm。与分别为理论目标相位和实际数据库内相位。
实施例1
本申请实施例提供了一种超透镜，该超透镜包括基底层201和设置于基底层201上的两层纳米结构层202，其中两层纳米结构202中沿着远离基底层201的方向依次为第一纳米结构层和第二纳米结构层。该超透镜的具体结构参数如表1所示。图23示出了实施例1提供的超透镜的相位图，图23的横坐标为入射辐射的波长，纵坐标为纳米结构2022的编号。图24示出了实施例1提供的超透镜的透过率示意图，图24的横坐标为入射辐射的波长，纵坐标为纳米结构2022的编号。
表1
实施例2
本申请实施例示例性地提供了一种超透镜，该超透镜包括基底层201和设置于基底层201上的两层纳米结构层202，其中两层纳米结构202中沿着远离基底层201的方向依次为第一纳米结构层和第二纳米结构层。该超透镜的具体结构参数如表2所示。图25示出了实施例1提供的超透镜的相位图，图25的横坐标为入射辐射的波长，纵坐标为纳米结构2022的编号。图26示出了实施例1提供的超透镜的透过率示意图，图26的横坐标为入射辐射的波长，纵坐标为纳米结构2022的编号。
表2

本申请实施例还提供了一种超透镜的加工方法，如图27至图29所示，该方法至少包括步骤S1至步骤S5。
步骤S1，在基底层201上设置一层结构层材料202a。
步骤S2，在结构层材料202a上涂覆光刻胶204，并曝光出参考结构205。
步骤S3，依据参考结构206在结构层材料202a上刻蚀出周期性排列的纳米结构2021，以形成纳米结构层202。
步骤S4，在纳米结构2021之间设置填充物2022。
步骤S5，修整填充物2022的表面，使填充物2022的表面与纳米结构2021的表面重合。
可选地，如图28所示，本申请实施例提供的方法还包括：
步骤S6，重复步骤S1至步骤S5，直至完成所有纳米结构层的设置。
实施例3
本申请实施例示例性地提供了一种光学系统，如图1所示，该光学系统包括沿着物方到像方(图1中从左到右的方向)依次排列的光阑(STO)、第一透镜10、第二透镜20、第三透镜30、第四透镜40、第五透镜50和第六透镜60。可选地，如图1所示，第六透镜60和该光学系统的像面之间还设置有红外滤波器。本申请实施例提供的光学系统满足公式(1-1)至公式(1-4)：
f/EPD＜3；(1-1)
25°≤HFOV≤55°；(1-2)
0.05mm≤d2≤2mm；(1-3)
|f2|/f≥10；(1-4)
其中，f为该光学系统的焦距；EPD为该光学系统的入瞳直径；HFOV为该光学系统的最大视场角的二分之一；d2为第二透镜20的厚度；f2为第二透镜20的焦距。
实施例3提供的光学系统的具体参数如表3-1所示。该光学系统中各个透镜的参数，例如物侧表面和像侧表面的曲率、透镜的厚度和折射率等参数如表3-2所示。该光学系统中各个曲面的非球面系数如表3-3-1和表3-3-2所示。图30示出了实施例3提供的光学系统中超透镜(即第二透镜20)分别在486.13nm、587.56nm和656.27nm三个不同波段的相位图。由图30可知，该光学系统在不同波段的相位均覆盖2π相位。图31示出了实施例3提供的光学系统的像散图。由图31可知，该光学系统在不同视场下的像散均小于0.5mm。图32示出了本申请实施例提供的光学系统的畸变图。由图32可知该光学系统在不同视场下的畸变均小于5％。图33示出了该光学系统中超透镜(即第二透镜20)的宽带匹配度，图33中，该超透镜的宽带匹配度大于90％。由上可知，实施例3提供的光学系统成像清晰，像散和畸变控制优秀，成像质量优异。
表3-1
表3-2
表3-3-1
表3-3-2
实施例4
本申请实施例示例性地提供了一种光学系统，如图2所示，该光学系统包括沿着物方到像方(图2中从左到右的方向)依次排列的光阑(STO)、第一透镜10、第二透镜20、第三透镜30、第四透镜40、第五透镜50和第六透镜60。可选地，如图2所示，第六透镜60和该光学系统的像面之间还设置有红外滤波器。本申请实施例提 供的光学系统满足公式(1-1)至公式(1-4)：
f/EPD＜3；(1-1)
25°≤HFOV≤55°；(1-2)
0.05mm≤d2≤2mm；(1-3)
|f2|/f≥10；(1-4)
其中，f为该光学系统的焦距；EPD为该光学系统的入瞳直径；HFOV为该光学系统的最大视场角的二分之一；d2为第二透镜20的厚度；f2为第二透镜20的焦距。
实施例4提供的光学系统的具体参数如表4-1所示。该光学系统中各个透镜的参数，例如物侧表面和像侧表面的曲率、透镜的厚度和折射率等参数如表4-2所示。该光学系统中各个曲面的非球面系数如表4-3-1和表4-3-2所示。图34示出了实施例4提供的光学系统中超透镜(即第二透镜20)分别在486.13nm、587.56nm和656.27nm三个不同波段的相位图。由图34可知，该光学系统在不同波段的相位均覆盖2π相位。图35示出了实施例4提供的光学系统的像散图。由图35可知，该光学系统在不同视场下的像散均小于1mm。图36示出了本申请实施例提供的光学系统的畸变图。由图36可知该光学系统在不同视场下的畸变均远小于5％。图37示出了该光学系统中超透镜(即第二透镜20)的宽带匹配度，图37中，该超透镜的宽带匹配度大于90％。由上可知，实施例4提供的光学系统成像清晰，像散和畸变控制优秀，成像质量优异。
表4-1
表4-2
表4-3-1
表4-3-2
实施例5
本申请实施例示例性地提供了一种光学系统，如图3所示，该光学系统包括沿着物方到像方(图3中从左到右的方向)依次排列的光阑(STO)、第一透镜10、第二透镜20、第三透镜30、第四透镜40、第五透镜50和第六透镜60。可选地，如图3所示，第六透镜60和该光学系统的像面之间还设置有红外滤波器。本申请实施例提供的光学系统满足公式(1-1)至公式(1-4)：
f/EPD＜3；(1-1)
25°≤HFOV≤55°；(1-2)
0.05mm≤d2≤2mm；(1-3)
|f2|/f≥10；(1-4)
其中，f为该光学系统的焦距；EPD为该光学系统的入瞳直径；HFOV为该光学系统的最大视场角的二分之一；d2为第二透镜20的厚度；f2为第二透镜20的焦距。
实施例5提供的光学系统的具体参数如表5-1所示。该光学系统中各个透镜的参数，例如物侧表面和像侧表面的曲率、透镜的厚度和折射率等参数如表5-2所示。该光学系统中各个曲面的非球面系数如表5-3-1和表5-3-2所示。图38示出了实施例5提供的光学系统中超透镜(即第二透镜20)分别在486.13nm、587.56nm和656.27nm三个不同波段的相位图。由图38可知，该光学系统在不同波段的相位均覆盖2π相位。图39示出了实施例5提供的光学系统的像散图。由图39可知，该光学系统在不同视场下的像散均小于0.5mm。图40示出了本申请实施例提供的光学系统的畸变图。由图40可知该光学系统在不同视场下的畸变均小于5％。图41示出了该光学系统中超透镜(即第二透镜20)的宽带匹配度，图41中，该超透镜的宽带匹配度大于90％。由上可知，实施例5提供的光学系统成像清晰，像散和畸变控制优秀，成像质量优异。 表5-1
表5-2
表5-3-1
表5-3-2

实施例6
本申请实施例示例性地提供了一种光学系统，如图4所示，该光学系统包括沿着物方到像方(图4中从左到右的方向)依次排列的光阑(STO)、第一透镜10、第二透镜20、第三透镜30、第四透镜40、第五透镜50和第六透镜60。可选地，如图4所示，第六透镜60和该光学系统的像面之间还设置有红外滤波器。本申请实施例提供的光学系统满足公式(1-1)至公式(1-4)：
f/EPD＜3；(1-1)
25°≤HFOV≤55°；(1-2)
0.05mm≤d2≤2mm；(1-3)
|f2|/f≥10；(1-4)
其中，f为该光学系统的焦距；EPD为该光学系统的入瞳直径；HFOV为该光学系统的最大视场角的二分之一；d2为第二透镜20的厚度；f2为第二透镜20的焦距。
实施例6提供的光学系统的具体参数如表6-1所示。该光学系统中各个透镜的参数，例如物侧表面和像侧表面的曲率、透镜的厚度和折射率等参数如表6-2所示。该光学系统中各个曲面的非球面系数如表6-3-1和表6-3-2所示。图42示出了实施例6提供的光学系统中超透镜(即第二透镜20)分别在486.13nm、587.56nm和656.27nm三个不同波段的相位图。由图42可知，该光学系统在不同波段的相位均覆盖2π相位。图43示出了实施例6提供的光学系统的像散图。由图43可知，该光学系统在不同视场下的像散均小于0.5mm。图44示出了本申请实施例提供的光学系统的畸变图。由图44可知该光学系统在不同视场下的畸变均远小于5％。图45示出了该光学系统中超透镜(即第二透镜20)的宽带匹配度，图45中，该超透镜的宽带匹配度大于90％。由上可知，实施例6提供的光学系统成像清晰，像散和畸变控制优秀，成像质量优异。
表6-1
表6-2

表6-3-1
表6-3-2
实施例7
本申请实施例示例性地提供了一种光学系统，如图5所示，该光学系统包括沿着物方到像方(图5中从左到右的方向)依次排列的光阑(STO)、第一透镜10、第二透镜20、第三透镜30、第四透镜40、第五透镜50和第六透镜60。可选地，如图50所示，第六透镜60和该光学系统的像面之间还设置有红外滤波器。本申请实施例提供的光学系统满足公式(1-1)至公式(1-4)：
f/EPD＜3；(1-1)
25°≤HFOV≤55°；(1-2)
0.05mm≤d2≤2mm；(1-3)
|f2|/f≥10；(1-4)
其中，f为该光学系统的焦距；EPD为该光学系统的入瞳直径；HFOV为该光学系统的最大视场角的二分之一；d2为第二透镜20的厚度；f2为第二透镜20的焦距。
实施例7提供的光学系统的具体参数如表7-1所示。该光学系统中各个透镜的参数，例如物侧表面和像侧表面的曲率、透镜的厚度和折射率等参数如表7-2所示。该光学系统中各个曲面的非球面系数如表7-3-1和表7-3-2所示。图46示出了实施例7提供的光学系统中超透镜(即第二透镜20)分别在486.13nm、587.56nm和656.27nm三个不同波段的相位图。由图46可知，该光学系统在不同波段的相位均覆盖2π相位。图47示出了实施例7提供的光学系统的像散图。由图47可知，该光学系统在不同视场下的像散均小于0.5mm。图48示出了本申请实施例提供的光学系统的畸变图。由图48可知该光学系统在不同视场下的畸变均小于5％。图49示出了该光学系统中超透镜(即第二透镜20)的宽带匹配度，图49中，该超透镜的宽带匹配度大于90％。由上可知，实施例7提供的光学系统成像清晰，像散和畸变控制优秀，成像质量优异。
表7-1
表7-2
表7-3-1

表7-3-2
实施例8
本申请实施例示例性地提供了一种光学系统，如图6所示，该光学系统包括沿着物方到像方(图6中从左到右的方向)依次排列的第一透镜10、光阑(STO)、第二透镜20、第三透镜30、第四透镜40、第五透镜50和第六透镜60。可选地，如图3所示，第六透镜60和该光学系统的像面之间还设置有红外滤波器。本申请实施例提供的光学系统满足公式(1-1)至公式(1-4)：
f/EPD＜3；(1-1)
25°≤HFOV≤55°；(1-2)
0.05mm≤d2≤2mm；(1-3)
|f2|/f≥10；(1-4)
其中，f为该光学系统的焦距；EPD为该光学系统的入瞳直径；HFOV为该光学系统的最大视场角的二分之一；d2为第二透镜20的厚度；f2为第二透镜20的焦距。
实施例8提供的光学系统的具体参数如表8-1所示。该光学系统中各个透镜的参数，例如物侧表面和像侧表面的曲率、透镜的厚度和折射率等参数如表8-2所示。该光学系统中各个曲面的非球面系数如表8-3-1和表8-3-2所示。图50示出了实施例8提供的光学系统中超透镜(即第二透镜20)分别在486.13nm、587.56nm和656.27nm三个不同波段的相位图。由图50可知，该光学系统在不同波段的相位均覆盖2π相位。图51示出了实施例8提供的光学系统的像散图。由图51可知，该光学系统在不同视场下的像散均小于0.5mm。图52示出了本申请实施例提供的光学系统的畸变图。由图52可知该光学系统在不同视场下的畸变均小于5％。图53示出了该光学系统中超透镜(即第二透镜20)的宽带匹配度，图53中，该超透镜的宽带匹配度大于90％。由上可知，实施例8提供的光学系统成像清晰，像散和畸变控制优秀，成像质量优异。
表8-1

表8-2
表8-3-1
表8-3-2
实施例9
本申请实施例示例性地提供了一种光学系统，如图7所示，该光学系统包括沿着物方到像方(图7中从左到右的方向)依次排列的第一透镜10、光阑(STO)、第二透镜20、第三透镜30、第四透镜40、第五透镜50和第六透镜60。可选地，如图7所示，第六透镜60和该光学系统的像面之间还设置有红外滤波器。本申请实施例提供的光学系统满足公式(1-1)至公式(1-4)：
f/EPD＜3；(1-1)
25°≤HFOV≤55°；(1-2)
0.05mm≤d2≤2mm；(1-3)
|f2|/f≥10；(1-4)
其中，f为该光学系统的焦距；EPD为该光学系统的入瞳直径；HFOV为该光学系统的最大视场角的二分之一；d2为第二透镜20的厚度；f2为第二透镜20的焦距。
实施例9提供的光学系统的具体参数如表9-1所示。该光学系统中各个透镜的参数，例如物侧表面和像侧表面的曲率、透镜的厚度和折射率等参数如表8-2所示。该光学系统中各个曲面的非球面系数如表9-3-1和表9-3-2所示。图54示出了实施例9提供的光学系统中超透镜(即第二透镜20)分别在486.13nm、587.56nm和656.27nm三个不同波段的相位图。由图54可知，该光学系统在不同波段的相位均覆盖2π相位。图55示出了实施例8提供的光学系统的像散图。由图55可知，该光学系统在不同视场下的像散均小于0.5mm。图56示出了本申请实施例提供的光学系统的畸变图。由图56可知该光学系统在不同视场下的畸变均小于5％。图57示出了该光学系统中超透镜(即第二透镜20)的宽带匹配度大于90％。由上可知，实施例9提供的光学系统成像清晰，像散和畸变控制优秀，成像质量优异。
表9-1
表9-2

表9-3-1
表9-3-2
实施例10
本申请实施例示例性地提供了一种光学系统，如图8所示，该光学系统包括沿着物方到像方(图8中从左到右的方向)依次排列的第一透镜10、光阑(STO)、第二透镜20、第三透镜30、第四透镜40、第五透镜50和第六透镜60。可选地，如图8所示，第六透镜60和该光学系统的像面之间还设置有红外滤波器。本申请实施例提供的光学系统满足公式(1-1)至公式(1-4)：
f/EPD＜3；(1-1)
25°≤HFOV≤55°；(1-2)
0.05mm≤d2≤2mm；(1-3)
|f2|/f≥10；(1-4)
其中，f为该光学系统的焦距；EPD为该光学系统的入瞳直径；HFOV为该光学系统的最大视场角的二分之一；d2为第二透镜20的厚度；f2为第二透镜20的焦距。
实施例10提供的光学系统的具体参数如表10-1所示。该光学系统中各个透镜的参数，例如物侧表面和像侧表面的曲率、透镜的厚度和折射率等参数如表8-2所示。该光学系统中各个曲面的非球面系数如表10-3-1和表10-3-2所示。图58示出了实施例10提供的光学系统中超透镜(即第二透镜20)分别在486.13nm、587.56nm和656.27nm三个不同波段的相位图。由图58可知，该光学系统在不同波段的相位均覆 盖2π相位。图59示出了实施例10提供的光学系统的像散图。由图59可知，该光学系统在不同视场下的像散均小于0.5mm。图60示出了本申请实施例提供的光学系统的畸变图。由图60可知该光学系统在不同视场下的畸变均小于5％。图61示出了该光学系统中超透镜(即第二透镜20)的宽带匹配度。图61中，该超透镜的宽带匹配度大于90％。由上可知，实施例10提供的光学系统成像清晰，像散和畸变控制优秀，成像质量优异。
表10-1
表10-2
表10-3-1

表10-3-2
实施例11
本申请实施例示例性地提供了一种光学系统，如图9所示，该光学系统包括沿着物方到像方(图9中从左到右的方向)依次排列的光阑(STO)、第一透镜10、第二透镜20、第三透镜30、第四透镜40、第五透镜50和第六透镜60。可选地，如图9所示，第六透镜60和该光学系统的像面之间还设置有红外滤波器。本申请实施例提供的光学系统满足公式(1-1)至公式(1-4)：
f/EPD＜3；(1-1)
25°≤HFOV≤55°；(1-2)
0.05mm≤d2≤2mm；(1-3)
|f2|/f≥10；(1-4)
其中，f为该光学系统的焦距；EPD为该光学系统的入瞳直径；HFOV为该光学系统的最大视场角的二分之一；d2为第二透镜20的厚度；f2为第二透镜20的焦距。
实施例11提供的光学系统的具体参数如表11-1所示。该光学系统中各个透镜的参数，例如物侧表面和像侧表面的曲率、透镜的厚度和折射率等参数如表8-2所示。该光学系统中各个曲面的非球面系数如表11-3-1和表11-3-2所示。图62示出了实施例11提供的光学系统中超透镜(即第二透镜20)分别在486.13nm、587.56nm和656.27nm三个不同波段的相位图。由图62可知，该光学系统在不同波段的相位均覆盖2π相位。图63示出了实施例11提供的光学系统的像散图。由图63可知，该光学系统在不同视场下的像散均小于0.5mm。图64示出了本申请实施例提供的光学系统的畸变图。由图64可知该光学系统在不同视场下的畸变均小于5％。图65示出了该光学系统中超透镜(即第二透镜20)的宽带匹配度，图65中，该超透镜的宽带匹配度大于90％。由上可知，实施例11提供的光学系统成像清晰，像散和畸变控制优秀，成像质量优异。
表11-1
表11-2
表11-3-1
表11-3-2
实施例12
本申请实施例示例性地提供了一种光学系统，如图10所示，该光学系统包括沿 着物方到像方(图10中从左到右的方向)依次排列的光阑(STO)、第一透镜10、第二透镜20、第三透镜30、第四透镜40、第五透镜50和第六透镜60。可选地，如图10所示，第六透镜60和该光学系统的像面之间还设置有红外滤波器。本申请实施例提供的光学系统满足公式(1-1)至公式(1-4)：
f/EPD＜3；(1-1)
25°≤HFOV≤55°；(1-2)
0.05mm≤d2≤2mm；(1-3)
|f2|/f≥10；(1-4)
其中，f为该光学系统的焦距；EPD为该光学系统的入瞳直径；HFOV为该光学系统的最大视场角的二分之一；d2为第二透镜20的厚度；f2为第二透镜20的焦距。
实施例12提供的光学系统的具体参数如表12-1所示。该光学系统中各个透镜的参数，例如物侧表面和像侧表面的曲率、透镜的厚度和折射率等参数如表12-2所示。该光学系统中各个曲面的非球面系数如表12-3-1和表12-3-2所示。图66示出了实施例6提供的光学系统中超透镜(即第二透镜20)分别在486.13nm、587.56nm和656.27nm三个不同波段的相位图。由图66可知，该光学系统在不同波段的相位均覆盖2π相位。图67示出了实施例12提供的光学系统的像散图。由图67可知，该光学系统在不同视场下的像散均小于0.5mm。图68示出了本申请实施例提供的光学系统的畸变图。由图68可知该光学系统在不同视场下的畸变均小于5％。图69示出了该光学系统中超透镜(即第二透镜20)的宽带匹配度，图69中，该超透镜的宽带匹配度大于90％。由上可知，实施例12提供的光学系统成像清晰，像散和畸变控制优秀，成像质量优异。
表12-1
表12-2

表12-3-1
表12-3-2
第三方面，本申请实施例又提供了一种成像装置，该成像装置包括上述任一实施例提供的光学系统和设置于前述光学系统的像面上的感光元件。优选地，感光元件为电子感光元件，例如电荷耦合元件(CCD，Charge-Coupled Device)和互补金属氧化物半导体(CMOS，Complementary Metal-Oxide-Semiconductor)等。
第四方面，本申请实施例又提供了一种电子设备，该电子设备包括上述实施例提供的成像装置。
需要注意的是，本申请任意实施例提供的超透镜可以通过半导体工艺加工，具有重量轻、厚度薄、构及工艺简单、成本低及量产一致性高等优点。
综上所述，本申请实施例提供的光学系统，通过将第一透镜设置为非球面折射透镜以提供主要的光焦度，将第二透镜设置为超透镜，其余透镜设置为折射透镜，且第三至第六透镜的所有表面中至少一个为非球面。并且采用满足f/EPD＜3；25°≤HFOV≤55°；0.05mm≤d2≤2mm的布局方式，实现了在保证成像质量的前提下，压缩六片式光学系统的系统长度和重量，促进了光学系统的小型化和轻量化。
本申请实施例提供的成像装置，采用本申请实施例提供的光学系统，该光学系统相比传统的光学系统具有更小的体积、更轻的重量，且成像质量优异，有利于使光学系统与更大尺寸的传感器结合，也能够减少光学系统在成像装置中所占用的安装空间，从而促进了成像装置的小型化和轻量化。
本申请实施例提供的电子设备，采用本申请实施例提供的成像装置。由于本申请实施例提供的光学系统相比传统的光学系统具有更小的体积、更轻的重量，且成像质量优异，有利于使光学系统与更大尺寸的传感器结合，也能够减少光学系统在成像装 置和电子设备中所占用的安装空间。因此，本申请实施例提供的电子设备采用该成像装置，降低了成像装置在电子设备中所占的体积和重量，促进了电子设备的小型化和轻量化。
以上所述，仅为本申请实施例的具体实施方式，但本申请实施例的保护范围并不局限于此，任何熟悉本技术领域的技术人员在本申请实施例披露的技术范围内，可轻易想到变化或替换，都应涵盖在本申请实施例的保护范围之内。因此，本申请实施例的保护范围应以权利要求的保护范围为准。

Claims (30)

  1. 一种光学系统，其特征在于，所述光学系统包括沿物方到像方依次分布的第一透镜(10)、第二透镜(20)、第三透镜(30)、第四透镜(40)、第五透镜(50)和第六透镜(60)；
    其中，所述第一透镜(10)为非球面折射透镜；所述第二透镜(20)为超透镜；其余透镜均为折射透镜，并且，第三透镜(30)、第四透镜(40)、所述第五透镜(50)和所述第六透镜(60)的所有表面中包括至少一个非球面，所述非球面包含一个反曲点；
    所述第一透镜(10)具有正光焦度，并且所述第一透镜(10)的物侧表面为凸面；所述第三透镜(30)的像侧表面为凸面；所述第四透镜(40)的物侧表面为凹面；所述第五透镜(50)和所述第六透镜(60)的物侧表面的曲率半径均为负；
    所述光学系统至少满足如下关系：
    f/EPD<3；
    25°≤HFOV≤55°；
    0.05mm≤d2≤2mm；
    |f2|/f≥10；
    其中，f为所述光学系统的焦距；EPD为所述光学系统的入瞳直径；HFOV为所述光学系统的最大视场角的二分之一；d2为所述第二透镜(20)的厚度；f2为所述第二透镜(20)的焦距。
  2. 如权利要求1所述的光学系统，其特征在于，所述光学系统还满足关系：
    0.35≤R1o/f1≤0.58；
    其中，R1o为所述第一透镜(10)的物侧表面的曲率半径；f1为所述第一透镜(10)的焦距。
  3. 如权利要求1所述的光学系统，其特征在于，所述光学系统还满足：
    (V1+V4)/2-V3>20；
    其中，V1为所述第一透镜(10)的阿贝数；V3为所述第三透镜(30)的阿贝数；V4为所述第四透镜(40)的阿贝数。
  4. 如权利要求1所述的光学系统，其特征在于，所述光学系统还满足：
    0.55<ImgH/TTL<0.82；
    其中，ImgH为所述光学系统的最大成像高度；TTL为所述第一透镜(10)的物侧表面到所述光学系统成像面的距离。
  5. 如权利要求1所述的光学系统，其特征在于，所述光学系统还满足：所述第四透镜(40)的像侧表面为凹面，并且，
    R4i×R4o>0；
    其中，R4o为所述第四透镜(40)的物侧表面的曲率半径；R4i为所述第四透镜(40)的像侧表面的曲率半径。
  6. 如权利要求1所述的光学系统，其特征在于，所述第五透镜(50)的像侧表面的曲率半径均小于零。
  7. 如权利要求1所述的光学系统，其特征在于，所述光学系统还满足：
    0.58≤f1/f≤0.85；
    其中，f1为所述第一透镜(10)的焦距；f为所述光学系统的焦距。
  8. 如权利要求1所述的光学系统，其特征在于，所述第三透镜(30)、所述第四透镜(40)、所述第五透镜(50)和所述第六透镜(60)中的任意一个或多个为非球面折射透镜。
  9. 如权利要求1-8中任一所述的光学系统，其特征在于，所述超透镜包括基底层(201)和至少一层设置于所述基底层(201)一侧的纳米结构层(202)；
    其中，任一层所述纳米结构层(202)包括周期性排列的纳米结构(2021)；
    所述基底层(201)和所述纳米结构层(202)被配置为能够透过所述光学系统的工作波段的辐射。
  10. 如权利要求9所述的光学系统，其特征在于，所述超透镜包括至少两层纳米结构层(202)；
    其中，任意相邻的两层纳米结构层(202)中的纳米结构同轴设置。
  11. 如权利要求9所述的光学系统，其特征在于，所述超透镜包括至少两层纳米结构层(202)；其中，任意相邻的纳米结构层(202)中的纳米结构沿平行于所述超透镜的基底的方向错位排列。
  12. 如权利要求9所述的光学系统，其特征在于，所述纳米结构(2021)的排列周期大于或等于0.3λc且小于或等于2λc，其中，λc为所述光学系统的工作波段的中心波长。
  13. 如权利要求9所述的光学系统，其特征在于，所述纳米结构(2021)的高度大于或等于0.3λc且小于或等于2λc，其中，λc为所述光学系统的工作波段的中心波长。
  14. 如权利要求9所述的光学系统，其特征在于，所述基底层(201)的材料包括熔融石英、石英玻璃、冕牌玻璃、火石玻璃、蓝宝石和碱性玻璃中的任意一种或多种。
  15. 如权利要求9所述的光学系统，其特征在于，所述纳米结构(2021)与所述基底层(201)的材质相同。
  16. 如权利要求9所述的光学系统，其特征在于，所述纳米结构(2021)和所述基底层(201)的材质不同。
  17. 如权利要求9所述的光学系统，其特征在于，所述超透镜还包括填充物(2022)；
    所述填充物(2022)填充于所述纳米结构(2021)之间；所述填充物(2022)对所述光学系统的工作波段的消光系数小于0.01。
  18. 如权利要求17所述的光学系统，其特征在于，所述填充物(2022)的折射率与所述纳米结构(2021)的折射率的差值的绝对值大于或等于0.5。
  19. 如权利要求17所述的光学系统，其特征在于，所述填充物(2022)的材料与所述纳米结构(2021)的材料不同。
  20. 如权利要求17所述的光学系统，其特征在于，所述填充物(2022)的材料与所述基底层(201)的材料不同。
  21. 如权利要求9所述的光学系统，其特征在于，所述超透镜还包括增透膜(203)；
    其中，所述增透膜(203)被设置于所述纳米结构层(202)与空气相邻的一侧；和/或，
    所述增透膜(203)被设置于所述基底层(201)远离所述纳米结构层(202)的一侧。
  22. 如权利要求9所述的光学系统，其特征在于，所述纳米结构(2021)以超结构单元(2023)的形式周期性排列；
    所述超结构单元(2023)的形状为可密堆积图形，所述纳米结构(2021)被设置于所述可密堆积图形的顶点和/或中心位置。
  23. 如权利要求22所述的光学系统，其特征在于，所述超结构单元(2023)的形状包括扇形、正四边形、正六边形中的一种或多种的组合。
  24. 如权利要求9所述的光学系统，其特征在于，所述纳米结构(2021)的形状为偏振不敏感结构。
  25. 如权利要求9所述的光学系统，其特征在于，所述超透镜的相位还满足：







    其中，r为所述超透镜的中心到任一纳米结构的距离；λ为所述超透镜的工作波长；为任一与所述超透镜工作波长相关的相位；(x，y)为超透镜镜面坐标，f2为所述超透镜的焦距；ai和bi为实数系数。
  26. 如权利要求8所述的光学系统，其特征在于，所述光学系统的工作波段包括可见光波段和近红外波段。
  27. 一种超透镜的加工方法，其特征在于，用于加工过如权利要求17所述的光学系统中的超透镜，所述方法包括：
    步骤S1，在所述基底层(201)上设置一层结构层材料(202a)；
    步骤S2，在所述结构层材料(202a)上涂覆光刻胶(204)，并曝光出参考结构(205)；
    步骤S3，依据所述参考结构(205)在所述结构层材(202a)上刻蚀出周期性排列的所述纳米结构(2021)，以形成所述纳米结构层(202)；
    步骤S4，在所述纳米结构(2021)之间设置所述填充物(2022)；
    步骤S5，修整所述填充物(2022)的表面，使所述填充物(2022)的表面与所述纳米结构(2021)的表面重合。
  28. 如权利要求27所述的方法，其特征在于，所述方法还包括：
    步骤S6，重复所述步骤S1至所述步骤S5，直至完成所有纳米结构层的设置。
  29. 一种成像装置，其特征在于，所述成像装置包括：
    如权利要求1-26任一所述的光学系统和设置于所述光学系统的像面上的感光元件。
  30. 一种电子设备，其特征在于，所述电子设备包括如权利要求29所述的成像装置。
PCT/CN2023/097323 2022-06-24 2023-05-31 光学系统及包含其的成像装置和电子设备 WO2023246450A1 (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
CN202221597876.5U CN217467327U (zh) 2022-06-24 2022-06-24 光学系统及包含其的成像装置和电子设备
CN202221597876.5 2022-06-24
CN202210724663.2A CN115016099A (zh) 2022-06-24 2022-06-24 光学系统及包含其的成像装置和电子设备
CN202210724663.2 2022-06-24

Publications (1)

Publication Number Publication Date
WO2023246450A1 true WO2023246450A1 (zh) 2023-12-28

Family

ID=89379118

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2023/097323 WO2023246450A1 (zh) 2022-06-24 2023-05-31 光学系统及包含其的成像装置和电子设备

Country Status (1)

Country Link
WO (1) WO2023246450A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117930472A (zh) * 2024-03-25 2024-04-26 武汉宇熠科技有限公司 一种红外共焦的安防镜头

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120328240A1 (en) * 2010-02-12 2012-12-27 The Regents Of The University Of California Metamaterial-based optical lenses
CN109196387A (zh) * 2016-04-05 2019-01-11 哈佛学院院长及董事 用于亚波长分辨率成像的超透镜
CN112630868A (zh) * 2019-10-08 2021-04-09 三星电子株式会社 超透镜和包括超透镜的光学装置
CN112748521A (zh) * 2019-10-30 2021-05-04 三星电子株式会社 透镜组件以及包括透镜组件的电子设备
CN113655549A (zh) * 2021-07-09 2021-11-16 湖南大学 一种基于超构表面的偏振消色差光学成像系统
CN114415386A (zh) * 2022-02-25 2022-04-29 深圳迈塔兰斯科技有限公司 准直光源系统
CN114578642A (zh) * 2022-04-08 2022-06-03 深圳迈塔兰斯科技有限公司 一种投影系统
CN115016099A (zh) * 2022-06-24 2022-09-06 深圳迈塔兰斯科技有限公司 光学系统及包含其的成像装置和电子设备

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120328240A1 (en) * 2010-02-12 2012-12-27 The Regents Of The University Of California Metamaterial-based optical lenses
CN109196387A (zh) * 2016-04-05 2019-01-11 哈佛学院院长及董事 用于亚波长分辨率成像的超透镜
CN112630868A (zh) * 2019-10-08 2021-04-09 三星电子株式会社 超透镜和包括超透镜的光学装置
CN112748521A (zh) * 2019-10-30 2021-05-04 三星电子株式会社 透镜组件以及包括透镜组件的电子设备
CN113655549A (zh) * 2021-07-09 2021-11-16 湖南大学 一种基于超构表面的偏振消色差光学成像系统
CN114415386A (zh) * 2022-02-25 2022-04-29 深圳迈塔兰斯科技有限公司 准直光源系统
CN114578642A (zh) * 2022-04-08 2022-06-03 深圳迈塔兰斯科技有限公司 一种投影系统
CN115016099A (zh) * 2022-06-24 2022-09-06 深圳迈塔兰斯科技有限公司 光学系统及包含其的成像装置和电子设备

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117930472A (zh) * 2024-03-25 2024-04-26 武汉宇熠科技有限公司 一种红外共焦的安防镜头
CN117930472B (zh) * 2024-03-25 2024-05-28 武汉宇熠科技有限公司 一种红外共焦的安防镜头

Similar Documents

Publication Publication Date Title
CN217467326U (zh) 光学系统及包含其的成像装置、电子设备
CN107065141B (zh) 成像镜头
WO2019210738A1 (zh) 光学成像镜头
CN217467327U (zh) 光学系统及包含其的成像装置和电子设备
TWI427354B (zh) 攝像用光學透鏡組
TWI424189B (zh) 成像光學鏡頭
CN217639612U (zh) 复合透镜及包含其的光学系统、成像装置和电子设备
CN115032766A (zh) 光学系统及包含其的成像装置、电子设备
WO2019100768A1 (zh) 光学成像镜头
CN115016099A (zh) 光学系统及包含其的成像装置和电子设备
WO2019137246A1 (zh) 光学成像镜头
TWI479185B (zh) 可攜式電子裝置與其光學成像鏡頭（一）
CN217639715U (zh) 光学系统与其中的超透镜及包含其的成像装置、电子设备
WO2019052144A1 (zh) 光学成像镜头
WO2023246450A1 (zh) 光学系统及包含其的成像装置和电子设备
WO2023207892A1 (zh) 光学系统及包含其的成像装置、电子设备
CN114660780A (zh) 光学系统及包含其的成像装置、电子设备
CN114859447A (zh) 复合透镜及包含其的光学系统
WO2023109412A1 (zh) 一种基于超构表面的超广角宽带偏振成像系统及探测设备
WO2019052179A1 (zh) 成像透镜组
CN115185071B (zh) 光学镜头
CN108717227B (zh) 一种超广角镜头
CN117331195A (zh) 一种红外成像光学系统、镜头
TWI457632B (zh) 成像系統鏡組
CN114779437A (zh) 光学系统

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 23826099

Country of ref document: EP

Kind code of ref document: A1