WO2023207892A1 - 光学系统及包含其的成像装置、电子设备 - Google Patents

光学系统及包含其的成像装置、电子设备 Download PDF

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Publication number
WO2023207892A1
WO2023207892A1 PCT/CN2023/090245 CN2023090245W WO2023207892A1 WO 2023207892 A1 WO2023207892 A1 WO 2023207892A1 CN 2023090245 W CN2023090245 W CN 2023090245W WO 2023207892 A1 WO2023207892 A1 WO 2023207892A1
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Prior art keywords
lens
optical system
nanostructure
refractive
hyperlens
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PCT/CN2023/090245
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English (en)
French (fr)
Inventor
郝成龙
谭凤泽
朱瑞
朱健
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深圳迈塔兰斯科技有限公司
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Priority claimed from CN202210461442.0A external-priority patent/CN114660780A/zh
Priority claimed from CN202221011048.9U external-priority patent/CN217639715U/zh
Application filed by 深圳迈塔兰斯科技有限公司 filed Critical 深圳迈塔兰斯科技有限公司
Publication of WO2023207892A1 publication Critical patent/WO2023207892A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/18—Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses

Definitions

  • the present application relates to the technical field of optical imaging. Specifically, the present application relates to optical systems, imaging devices and electronic equipment including the same.
  • the large size and heavy weight of the imaging device in the electronic device hinders the miniaturization and weight reduction of the electronic device.
  • embodiments of the present application provide an optical system and a camera device and electronic equipment including the same.
  • embodiments of the present application provide an optical system, which includes a first lens, a second lens, a third lens and a fourth lens arranged in sequence from the object side to the image side;
  • any one of the first lens, the second lens, the third lens and the fourth lens is a super lens, and the rest are refractive lenses;
  • the object-side surface and the image-side surface of the refractive lens in the optical system each include at least one aspheric surface, and the aspheric surface includes an inflection point;
  • the optical system satisfies: f/EDP ⁇ 3; 25° ⁇ HFOV ⁇ 65°; 0.3 ⁇ f N /f ⁇ 5.5;
  • f is the focal length of the optical system
  • EPD is the entrance pupil diameter of the optical system
  • f N is the focal length of the first refractive lens from the object side to the image side in the optical system
  • HFOV is the optical Half of the system's maximum field of view.
  • the first refractive lens in the optical system from the object side to the image side has positive refractive power.
  • the optical system further includes an aperture
  • the diaphragm is disposed between any two adjacent lenses among the first lens, the second lens, the third lens and the fourth lens.
  • the first refractive lens in the optical system satisfies: R No /f N ⁇ 0.23;
  • R No is the radius of curvature of the object-side surface of the first refractive lens in the optical system
  • f N is the focal length of the first refractive lens
  • the optical system also satisfies: (V N +V N+2 )/2-V N+1 >20;
  • V N is the Abbe number of the first refractive lens in the optical system
  • V N+1 is the Abbe number of the second refractive lens in the optical system
  • V N+2 is the Abbe number of the second refractive lens in the optical system.
  • the Abbe number of the third refractive lens is the Abbe number of the third refractive lens.
  • the optical system also satisfies: 1.2 ⁇ TTL/ImgH ⁇ 2.8;
  • TTL is the total system length of the optical system
  • ImgH is the maximum imaging height of the optical system.
  • the optical system also satisfies: 1.54 ⁇ n N ⁇ 1.6; 1.5 ⁇ n N+1 ⁇ 1.6;
  • n N is the refractive index of the first refractive lens in the optical system
  • n N+1 is the refractive index of the second refractive lens in the optical system.
  • the optical system also satisfies:
  • f ML is the focal length of the super lens
  • f is the focal length of the optical system.
  • the thickness of the super lens is greater than or equal to 0.05 mm and less than or equal to 2 mm.
  • the first lens is a super lens
  • the object-side surface of the second lens is convex and has positive optical power
  • the object-side surface of the third lens is concave
  • the object-side surface of the fourth lens The surface is convex.
  • the thickness of the first lens is greater than or equal to 0.05mm and less than or equal to 1mm.
  • the second lens is a super lens; the object-side surface of the first lens is convex and has positive optical power; the object-side surface of the third lens is concave; and the object-side surface of the fourth lens The surface is convex.
  • the third lens is a super lens; the object-side surface of the first lens is convex and has positive optical power; the object-side surface of the second lens is concave; and the object-side surface of the fourth lens The surface is convex.
  • the fourth lens is a super lens; the object-side surface of the first lens is convex and has positive refractive power; the object-side surface of the second lens is concave; and the object-side surface of the third lens The surface is convex.
  • embodiments of the present application further provide an imaging device, which includes the optical system provided in any of the above embodiments; and a photosensitive element disposed on the image surface of the optical system.
  • an embodiment of the present application further relates to an electronic device.
  • the electronic device includes the imaging device provided in the above embodiment.
  • embodiments of the present application also provide a super lens, which is suitable for the optical system provided in any of the above embodiments.
  • the super lens includes a base layer and at least one nanostructure layer;
  • the at least one nanostructure layer is disposed on one side of the base layer
  • Each of the at least one nanostructure layer includes periodically arranged nanostructures.
  • the metalens includes at least two nanostructure layers
  • Nanostructures in adjacent nanostructure layers of the at least two nanostructure layers are arranged coaxially.
  • the nanostructures are periodically arranged in the form of superstructural units
  • the superstructural unit is a close-packed pattern, and the nanostructure is provided at the vertex and/or center position of the close-packed pattern.
  • the phase of the super lens satisfies at least:
  • the broad spectrum phase of the super structural unit and the operating wavelength of the super lens also satisfy:
  • r is the coordinate of the hyperlens along the radial direction; r 0 is any point on the hyperlens; ⁇ is the operating wavelength.
  • the range of the equivalent refractive index of the super lens is less than 2;
  • the equivalent refractive index range is the maximum refractive index of the super lens minus the minimum refractive index of the super lens.
  • the arrangement period of the nanostructure is greater than or equal to 0.3 ⁇ c and less than or equal to 2 ⁇ c ;
  • ⁇ c is the central wavelength of the working band of the metalens.
  • the height of the nanostructure is greater than or equal to 0.3 ⁇ c and less than or equal to 5 ⁇ c ;
  • ⁇ c is the central wavelength of the working band of the metalens.
  • the shape of the nanostructure is a polarization-independent structure.
  • filling material is also filled between nanostructures in the same nanostructure layer
  • the extinction coefficient of the filling material in the working wavelength band of the super lens is less than 0.01.
  • the filling material is different from the material of the nanostructure.
  • the filling material is different from the material of the base layer.
  • the filling material includes any one or a combination of air, fused quartz, quartz glass, crown glass, flint glass, sapphire, crystalline silicon, amorphous silicon and hydrogenated amorphous silicon.
  • the hyperlens further includes an anti-reflection coating
  • the antireflection film is disposed on a side of the base layer away from the at least one nanostructure layer; or,
  • the anti-reflection film is disposed on the side of the at least one nanostructure layer adjacent to the air.
  • embodiments of the present application also provide a method for processing a hyperlens, which is characterized in that it is applicable to the hyperlens provided in any of the above embodiments, and the method includes:
  • Step S1 provide a layer of structural layer material on the base layer
  • Step S2 apply photoresist on the structural layer material and expose the reference structure
  • Step S3 Etch the nanostructure on the structural layer material according to the reference structure to form a nanostructure layer
  • Step S4 arrange the filling material between the nanostructures
  • Step S5 Trim the surface of the filling material so that the surface of the filling material coincides with the surface of the nanostructure.
  • the method includes:
  • Step S6 Repeat step S1 to step S5 until all nanostructure layers are completed.
  • the optical system provided by the embodiment of the present application is composed of a super lens and the remaining three refractive lenses, and the optical system satisfies f/EDP ⁇ 3;25° ⁇ HFOV ⁇ 65°; 0.3 ⁇ f N /f ⁇ 5.5; This enables the overall system length of the optical system to be reduced while ensuring the imaging effect, and promotes the miniaturization and lightweight of the optical system.
  • the hyperlens provided in the embodiments of the present application increases the aspect ratio of a single nanostructure through at least one nanostructure layer, improves the design freedom of the hyperlens, and breaks through the design of the optical performance of the hyperlens by the hyperlens structure.
  • Figure 1 shows an optional structural schematic diagram of the optical system provided by the embodiment of the present application
  • Figure 2 shows another optional structural schematic diagram of the optical system provided by the embodiment of the present application.
  • Figure 3 shows another optional structural schematic diagram of the optical system provided by the embodiment of the present application.
  • Figure 4 shows another optional structural schematic diagram of the optical system provided by the embodiment of the present application.
  • Figure 5 shows a phase diagram of a super lens in an optional optical system provided by an embodiment of the present application
  • Figure 6 shows the equivalent refractive index diagram of an optional optical system super lens provided by the embodiment of the present application.
  • Figure 7 shows the astigmatism diagram of an optional optical system provided by the embodiment of the present application.
  • Figure 8 shows a field curvature diagram of an optional optical system provided by an embodiment of the present application.
  • Figure 9 shows the modulation transfer function of an optional optical system provided by the embodiment of the present application.
  • Figure 10 shows the phase diagram of the super lens in yet another optional optical system provided by the embodiment of the present application.
  • Figure 11 shows the equivalent refractive index diagram of yet another optional optical system super lens provided by the embodiment of the present application.
  • Figure 12 shows the astigmatism diagram of yet another optional optical system provided by the embodiment of the present application.
  • Figure 13 shows a field curvature diagram of yet another optional optical system provided by an embodiment of the present application.
  • Figure 14 shows the modulation transfer function of yet another optional optical system provided by the embodiment of the present application.
  • Figure 15 shows the phase diagram of the super lens in yet another optional optical system provided by the embodiment of the present application.
  • Figure 16 shows the equivalent refractive index diagram of yet another optional optical system hyperlens provided by the embodiment of the present application.
  • Figure 17 shows the astigmatism diagram of yet another optional optical system provided by the embodiment of the present application.
  • Figure 18 shows a field curvature diagram of yet another optional optical system provided by an embodiment of the present application.
  • Figure 19 shows the modulation transfer function of yet another optional optical system provided by the embodiment of the present application.
  • Figure 20 shows the phase diagram of the super lens in yet another optional optical system provided by the embodiment of the present application.
  • Figure 21 shows the equivalent refractive index diagram of yet another optional optical system super lens provided by the embodiment of the present application.
  • Figure 22 shows the astigmatism diagram of yet another optional optical system provided by the embodiment of the present application.
  • Figure 23 shows a field curvature diagram of yet another optional optical system provided by an embodiment of the present application.
  • Figure 24 shows the modulation transfer function of yet another optional optical system provided by the embodiment of the present application.
  • Figure 25 shows a schematic structural diagram of an optional super lens provided by the embodiment of the present application.
  • Figure 26 shows a schematic structural diagram of yet another optional super lens provided by the embodiment of the present application.
  • Figure 27 shows an optional perspective view of the nanostructure in the hyperlens provided by the embodiment of the present application.
  • Figure 28 shows another optional perspective view of the nanostructure in the hyperlens provided by the embodiment of the present application.
  • Figure 29 shows an optional arrangement schematic diagram of nanostructures in the hyperlens provided by the embodiment of the present application.
  • Figure 30 shows another optional arrangement schematic diagram of the nanostructures in the hyperlens provided by the embodiment of the present application.
  • Figure 31 shows another optional arrangement schematic diagram of nanostructures in the hyperlens provided by the embodiment of the present application.
  • Figure 32 shows an optional structural perspective view of the hyperlens provided by the embodiment of the present application.
  • Figure 33 shows an optional structural schematic diagram of the nanostructure provided by the embodiment of the present application.
  • Figure 34 shows another optional structural schematic diagram of the nanostructure provided by the embodiment of the present application.
  • Figure 35 shows another optional structural schematic diagram of the nanostructure provided by the embodiment of the present application.
  • Figure 36 shows another optional structural schematic diagram of the nanostructure provided by the embodiment of the present application.
  • Figure 37 shows an optional structural schematic diagram of the super lens provided by the embodiment of the present application.
  • Figure 38 shows the matching degree between the phase of the hyperlens and the ideal phase in Embodiment 1 provided by this application;
  • Figure 39 shows the matching degree between the phase of the hyperlens and the ideal phase in Embodiment 2 provided by this application.
  • Figure 40 shows the matching degree between the phase of the hyperlens and the ideal phase in Embodiment 3 provided by this application;
  • Figure 41 shows the matching degree between the phase of the hyperlens and the ideal phase in Embodiment 4 provided by this application;
  • Figure 42 shows an optional flow diagram of the super lens processing method provided by the embodiment of the present application.
  • Figure 43 shows another optional flow diagram of the super lens processing method provided by the embodiment of the present application.
  • Figure 44 shows another optional flow diagram of the super lens processing method provided by the embodiment of the present application.
  • Figure 45 shows an optional phase diagram of the hyperlens provided by the embodiment of the present application.
  • Figure 46 shows an optional transmittance diagram of the hyperlens provided by the embodiment of the present application.
  • Figure 47 shows an optional phase diagram of the hyperlens provided by the embodiment of the present application.
  • Figure 48 shows an optional transmittance diagram of the hyperlens provided by the embodiment of the present application.
  • Embodiments are described herein with reference to cross-sectional illustrations that are idealized embodiments. Therefore, it is foreseen that Shape variations from those shown are, for example, the result of manufacturing techniques and/or tolerances. Thus, embodiments described herein should not be construed as limited to the particular shapes of regions as illustrated herein but are to include deviations in shapes that result, for example, from manufacturing. For example, regions shown or described as flat may typically have rough and/or non-linear characteristics. Furthermore, the acute angles shown may be rounded. Therefore, the regions shown in the figures are schematic in nature and their shapes are not intended to show the precise shapes of the regions and are not intended to limit the scope of the claims.
  • the embodiment of the present application provides an optical system, as shown in Figures 1 to 4.
  • the optical system includes a first lens 10, a second lens 20, a third lens 30 and a fourth lens arranged in sequence from the object side to the image side.
  • Lens 40 a fourth lens arranged in sequence from the object side to the image side.
  • any one of the first lens 10 , the second lens 20 , the third lens 30 and the fourth lens 40 in the optical system is a super lens, and the remaining three lenses are all refractive lenses.
  • At least one of the object-side surface and the image-side surface of each refractive lens in the optical system includes an aspherical surface, and the aforementioned aspherical surface includes an inflection point.
  • the optical system satisfies: f/EDP ⁇ 3; (1) 25° ⁇ HFOV ⁇ 65°; (2) 0.3 ⁇ f N /f ⁇ 5.5; (3)
  • f is the focal length of the optical system
  • EPD is the entrance pupil diameter of the optical system
  • f N is the focal length of the first refractive lens from the object side to the image side in the optical system
  • HFOV is Half the maximum field of view of the optical system.
  • N represents the order of the first refractive lens in the entire optical system from the object side to the image side.
  • the focal length of the first refractive lens is f 1
  • the focal length of the first refractive lens is f 2 .
  • the optical system provided by the embodiment of the present application further includes an aperture 50 .
  • the position of the diaphragm 50 in the optical system affects the aperture of the optical system. Generally, the closer the aperture 50 is to the object side, the smaller the aperture of the optical system, and vice versa.
  • the diaphragm 50 is provided between the first lens 10 and the second lens 20 .
  • diaphragm 50 is an aperture diaphragm (STO).
  • the optical system provided by the embodiment of the present application also includes an infrared filter (IR filter).
  • IR filter infrared filter
  • the function of the infrared filter is to block visible light and improve the night vision function of the optical system.
  • the thickness of the super lens in the optical system is greater than or equal to 0.05 mm and less than or equal to 2 mm.
  • the optical system also satisfies:
  • f ML is the focal length of the super lens
  • f is the focal length of the optical system provided by the embodiment of the present application.
  • the first refractive lens in the optical system from the object side to the image side has positive refractive power.
  • the object-side surface of the first refractive lens is convex.
  • the first refractive lens in the optical system satisfies: R No /f N ⁇ 0.23; (5)
  • R No is the radius of curvature of the first refractive object-side surface in the optical system
  • f N is the focal length of the first refractive lens in the optical system.
  • N represents the order of the first refractive lens in the entire optical system from the object side to the image side.
  • the optical system provided by the embodiments of the present application also satisfies: (V N +V N+2 )/2-V N+1 >20; (6)
  • V N is the Abbe number of the first refractive lens in the optical system
  • V N+1 is the Abbe number of the second refractive lens in the optical system
  • V N+2 is the third refractive lens in the optical system.
  • N represents the order of the first refractive lens in the entire optical system from the object side to the image side.
  • the first lens 10 is a super lens in the optical system and the second lens 20 is a first refractive lens
  • the Abbe number of the first refractive lens is V 1
  • the Abbe number of the second refractive lens is V 1 .
  • the number is V 3
  • the Abbe number of the third refractive lens is V 4 .
  • the optical system also satisfies: 1.2 ⁇ TTL/ImgH ⁇ 2.8; (7)
  • TTL is the total system length of the optical system provided in the embodiment of the present application
  • ImgH is the maximum imaging height of the optical system.
  • the optical system also satisfies: 1.54 ⁇ n N ⁇ 1.6; (8) 1.5 ⁇ n N+1 ⁇ 1.6; (9)
  • n N is the refractive index of the first refractive lens in the optical system
  • n N+1 is the refractive index of the second refractive lens in the optical system.
  • the aspheric surface in the implementation of the present application is as shown in formula (10):
  • z is the surface vector parallel to the optical axis of the refractive lens
  • c is the curvature of the center point of the refractive lens
  • k is the quadratic surface constant
  • a ⁇ J respectively correspond to higher-order coefficients.
  • the equivalent refractive index range of the super lens is less than 2.
  • the equivalent refractive index range is the maximum refractive index of the metalens minus its minimum refractive index.
  • FIG. 1 shows an optical system, which includes a first lens 10 , a second lens 20 , a third lens 30 and a fourth lens 40 arranged in sequence from the object side to the image side.
  • the first lens 10 is a super lens
  • the second lens 20 the third lens 30 and the fourth lens 40 are refractive lenses.
  • the object-side surface of the second lens 20 is convex and has positive refractive power; the object-side surface of the third lens 30 is concave; and the object-side surface of the fourth lens 40 is convex.
  • At least one of the object-side surface and the image-side surface of each refractive lens among the second lens 20 , the third lens 30 and the fourth lens 40 includes an aspherical surface, and the aforementioned aspherical surface includes an inflection point.
  • the optical system satisfies: f/EDP ⁇ 3; (1) 25° ⁇ HFOV ⁇ 65°; (2) 0.3 ⁇ f 2 /f ⁇ 5.5; (3-1)
  • f is the focal length of the optical system
  • EPD is the entrance pupil diameter of the optical system (Entrance Pupil Diameter)
  • f 2 is the focal length of the second lens 20 in the optical system
  • HFOV is half of the maximum field of view of the optical system.
  • the system parameters of the optical system provided in Embodiment 1 of the present application are as shown in Table 1-1.
  • the parameters of each lens surface in this optical system are shown in Table 1-2, and the aspheric coefficients of each refractive lens are shown in Table 1-3.
  • Figure 5 shows the phase diagrams of the hyperlens (ie, the first lens 10) in the optical system at three optional operating wavelengths (486.13nm, 587.25nm, 656.27nm).
  • Figure 6 shows an equivalent refractive index diagram of the hyperlens in the optical system. It can be seen from Figure 6 that the equivalent refractive index of the hyperlens in this optical system is less than 2.
  • the thickness of the super lens (ie, the first lens 10 ) in the optical system is greater than or equal to 0.05 mm and less than or equal to 1 mm.
  • the optical system also meets: R 2o /f 2 ⁇ 0.35; (5-1)
  • R 2o is the radius of curvature of the first refractive object-side surface in the optical system
  • f 2 is the focal length of the first refractive lens in the optical system.
  • the optical system also satisfies: (V 2 +V 4 )/2-V 3 >20; (6-1)
  • V 2 is the Abbe number of the first refractive lens (i.e., the second lens 20 ) in the optical system
  • V 3 is the Abbe number of the second refractive lens (i.e., the third lens 30 ) in the optical system
  • V4 is the Abbe number of the third refractive lens (ie, the fourth lens 40) in the optical system.
  • the optical system also satisfies: 1.54 ⁇ n 2 ⁇ 1.6; (8-1) 1.5 ⁇ n 3 ⁇ 1.6; (9-1)
  • n 2 is the refractive index of the first refractive lens (ie, the second lens 20 ) in the optical system
  • n 3 is the refractive index of the second refractive lens (ie, the third lens 30 ) in the optical system.
  • the optical system also satisfies:
  • TTL is the total system length of the optical system provided in the embodiment of the present application
  • ImgH is the maximum imaging height of the optical system.
  • FIG. 7 shows an astigmatism diagram of the optical system according to an embodiment of the present application.
  • the meridional astigmatism of this optical system is less than 0.1, and the sagittal astigmatism is less than 0.05.
  • the field curvature (i.e. distortion) of the optical system See Figure 8.
  • the distortion of this optical system in the entire field of view is less than 5%.
  • Figure 9 shows the modulation transfer function of the optical system. According to Figure 9, the modulation transfer function of the optical system in each field of view is close to the diffraction limit. To sum up, the imaging effect of this optical system is good, and the astigmatism and field curvature control are excellent.
  • L represents the lens
  • the number represents the order of the lens from the object side to the image side in the optical system provided in the embodiment of the present application
  • o represents the object side surface
  • i represents the image side surface.
  • L 1o represents the object-side surface of the first lens 10
  • L 1i represents the image-side surface of the first lens 10
  • Embodiment 2 provides an optional optical system.
  • the structure of the optical system is shown in Figure 2.
  • the system includes a first lens 10, a second lens 20, a third lens 30 and a fourth lens 40 arranged in sequence from the object side to the image side.
  • the second lens 20 is a super lens, and the first lens 10 , the third lens 30 and the fourth lens 40 are refractive lenses.
  • the object-side surface of the first lens 10 is convex and has positive refractive power; the object-side surface of the third lens 30 is concave; and the object-side surface of the fourth lens 40 is convex.
  • At least one of the object-side surface and the image-side surface of each refractive lens among the first lens 10 , the third lens 30 and the fourth lens 40 includes an aspherical surface, and the aforementioned aspherical surface includes an inflection point.
  • the optical system satisfies: f/EDP ⁇ 3; (1) 25° ⁇ HFOV ⁇ 65°; (2) 0.55 ⁇ f 1 /f ⁇ 5.2 (3-2)
  • f is the focal length of the optical system
  • EPD is the entrance pupil diameter of the optical system
  • f 1 is the focal length of the first lens 10 in the optical system
  • HFOV is the maximum field of view of the optical system. half.
  • the system parameters of the optical system provided in Embodiment 2 of this application are shown in Table 2-1.
  • the parameters of each lens surface are shown in Table 2-2, and the aspherical coefficients of each refractive lens are shown in Table 2-3.
  • Figure 10 shows the phase diagrams of the super lens (ie, the second lens 20) in the optical system at three optional operating wavelengths (486.13nm, 587.25nm, 656.27nm).
  • Figure 11 shows the equivalent refractive index diagram of the hyperlens in this optical system. It can be seen from Figure 11 that the equivalent refractive index of the hyperlens in this optical system is less than 2.
  • the thickness of the super lens (ie, the second lens 20) in the optical system is greater than or equal to 0.05 mm and less than or equal to 2 mm.
  • the optical system also meets: R 1o /f 1 ⁇ 0.4; (5-2)
  • R 1o is the radius of curvature of the first refractive object-side surface in the optical system
  • f 1 is the focal length of the first refractive lens in the optical system.
  • the optical system also satisfies: (V 1 +V 4 )/2-V 3 >20; (6-2)
  • V 2 is the Abbe number of the first refractive lens (i.e., the first lens 10 ) in the optical system
  • V 3 is the Abbe number of the second refractive lens (i.e., the third lens 30 ) in the optical system
  • V4 is the Abbe number of the third refractive lens (ie, the fourth lens 40) in the optical system.
  • the optical system also satisfies: 1.54 ⁇ n 1 ⁇ 1.6; (8-2) 1.5 ⁇ n 3 ⁇ 1.6; (9-2)
  • n 2 is the refractive index of the first refractive lens (ie, the first lens 10 ) in the optical system
  • n 3 is the refractive index of the second refractive lens (ie, the third lens 30 ) in the optical system.
  • the optical system also satisfies: 1.2 ⁇ TTL/ImgH ⁇ 2.8; (7)
  • TTL is the total system length of the optical system provided in the embodiment of the present application
  • ImgH is the maximum imaging height of the optical system.
  • Figure 12 shows an astigmatism diagram of the optical system according to an embodiment of the present application. It can be seen from Figure 12 that the meridional astigmatism of this optical system is less than 0.1, and the sagittal astigmatism is less than 0.1.
  • the field curvature (distortion) of this optical system is shown in Figure 13. As can be seen from Figure 13, the distortion of this optical system in the entire field of view is less than 10%.
  • Figure 14 shows the modulation transfer function of the optical system. According to Figure 14, the modulation transfer function of the optical system in each field of view is close to the diffraction limit. To sum up, the imaging effect of this optical system is good, astigmatism and field curvature are controlled Excellent production.
  • L represents the lens
  • the number represents the order of the lens from the object side to the image side in the optical system provided by the embodiment of the present application
  • o represents the object side surface
  • i represents the image side surface.
  • L 1o represents the object-side surface of the first lens 10
  • L 1i represents the image-side surface of the first lens 10
  • Embodiment 3 provides an optional optical system. See Figure 3 for the structure of the optical system.
  • the system includes a first lens 10, a second lens 20, a third lens 30 and a fourth lens 40 arranged in sequence from the object side to the image side.
  • the third lens 30 is a super lens
  • the first lens 10, the second lens 20 and the fourth lens 40 are refractive lenses.
  • the object-side surface of the first lens 10 is convex and has positive refractive power; the object-side surface of the second lens 20 is concave; and the object-side surface of the fourth lens 40 is convex.
  • At least one of the object-side surface and the image-side surface of each refractive lens among the first lens 10 , the second lens 20 , and the fourth lens 40 includes an aspherical surface, and the aforementioned aspherical surface includes an inflection point.
  • the optical system satisfies: f/EDP ⁇ 3; (1) 25° ⁇ HFOV ⁇ 65°; (2) 0.5 ⁇ f 1 /f ⁇ 5 (3-3)
  • f is the focal length of the optical system
  • EPD is the entrance pupil diameter of the optical system
  • f 1 is the focal length of the first lens 10 in the optical system
  • HFOV is the maximum field of view of the optical system. half.
  • the system parameters of the optical system provided in Embodiment 3 of this application are shown in Table 3-1.
  • the parameters of each lens surface are shown in Table 3-2, and the aspherical coefficients of each refractive lens are shown in Table 3-3.
  • Figure 15 shows the phase diagrams of the hyperlens (ie, the third lens 30) in the optical system at three optional operating wavelengths (486.13nm, 587.25nm, 656.27nm).
  • Figure 16 shows the equivalent refractive index diagram of the super lens in the optical system. It can be seen from Figure 16 that the equivalent refractive index of the hyperlens in this optical system is less than 2.
  • the thickness of the super lens (ie, the third lens 30 ) in the optical system is greater than or equal to 0.05 mm and less than or equal to 2 mm.
  • the optical system also meets: R 1o /f 1 ⁇ 0.23; (5-3)
  • R 1o is the curvature radius of the object-side surface of the first refractive lens (i.e., the first lens 10) in the optical system;
  • f 1 is the first refractive lens (i.e., the first lens 10) in the optical system.
  • the optical system also satisfies: (V 1 +V 4 )/2-V 2 >20; (6-3)
  • V 2 is the Abbe number of the first refractive lens (i.e., the first lens 10 ) in the optical system;
  • V 2 is the Abbe number of the second refractive lens (i.e., the second lens 20 ) in the optical system;
  • V4 is the Abbe number of the third refractive lens (ie, the fourth lens 40) in the optical system.
  • the optical system also satisfies: 1.54 ⁇ n 1 ⁇ 1.6; (8-3) 1.5 ⁇ n 2 ⁇ 1.6; (9-3)
  • n 2 is the refractive index of the first refractive lens (ie, the first lens 10 ) in the optical system; n 2 is the refractive index of the second refractive lens (ie, the second lens 20 ) in the optical system.
  • the optical system also satisfies: 1.2 ⁇ TTL/ImgH ⁇ 2.8; (7)
  • TTL is the total system length of the optical system provided in the embodiment of the present application
  • ImgH is the maximum imaging height of the optical system.
  • Figure 17 shows an astigmatism diagram of the optical system according to an embodiment of the present application. It can be seen from Figure 17 that the meridional astigmatism of this optical system is less than 0.1, and the sagittal astigmatism is less than 0.1.
  • the field curvature (distortion) of this optical system is shown in Figure 18. As can be seen from Figure 18, the distortion of this optical system at a field of view of 0.7 is less than 5%.
  • Figure 19 shows the modulation transfer function of the optical system. According to Figure 19, the modulation transfer function of the optical system in each field of view is shown in Figure 19. The transfer functions are all close to the diffraction limit. To sum up, the imaging effect of this optical system is good, and the astigmatism and field curvature control are excellent.
  • L represents the lens
  • the number represents the order of the lens from the object side to the image side in the optical system provided in the embodiment of the present application
  • o represents the object side surface
  • i represents the image side surface.
  • L 1o represents the object-side surface of the first lens 10
  • L 1i represents the image-side surface of the first lens 10
  • Embodiment 4 provides an optional optical system. See Figure 4 for the structure of the optical system.
  • the system includes a first lens 10, a second lens 20, a third lens 30 and a fourth lens 40 arranged in sequence from the object side to the image side.
  • the fourth lens 40 is a super lens
  • the first lens 10, the second lens 20 and the third lens 30 are refractive lenses.
  • the object-side surface of the first lens 10 is convex and has positive refractive power; the object-side surface of the second lens 20 is concave; and the object-side surface of the third lens 30 is convex.
  • At least one of the object-side surface and the image-side surface of each refractive lens among the first lens 10 , the second lens 20 and the third lens 30 includes an aspherical surface, and the aforementioned aspherical surface includes an inflection point.
  • the optical system satisfies: f/EDP ⁇ 3; (1) 25° ⁇ HFOV ⁇ 65°; (2) 0.5 ⁇ f 1 /f ⁇ 3.2 (3-4)
  • f is the focal length of the optical system
  • EPD is the entrance pupil diameter of the optical system
  • f 1 is the focal length of the first lens 10 in the optical system
  • HFOV is the maximum field of view of the optical system. half.
  • the system parameters of the optical system provided in Embodiment 4 of this application are shown in Table 4-1.
  • the parameters of each lens surface in this optical system are shown in Table 4-2, and the aspheric coefficients of each refractive lens are shown in Table 4-3.
  • Fig. 20 shows that the hyperlens (i.e., the fourth lens 40) in the optical system is in three optional positions.
  • Phase diagram of the operating wavelengths (486.13nm, 587.25nm, 656.27nm).
  • Figure 21 shows an equivalent refractive index diagram of the hyperlens in the optical system. It can be seen from Figure 21 that the equivalent refractive index of the hyperlens in this optical system is less than 2.
  • the thickness of the super lens (ie, the third lens 30 ) in the optical system is greater than or equal to 0.05 mm and less than or equal to 2 mm.
  • the optical system also meets: R 1o /f 1 ⁇ 0.55; (5-4)
  • R 1o is the curvature radius of the object-side surface of the first refractive lens (i.e., the first lens 10) in the optical system;
  • f 1 is the first refractive lens (i.e., the first lens 10) in the optical system.
  • the optical system also satisfies: (V 1 +V 3 )/2-V 2 >20; (6-4)
  • V 2 is the Abbe number of the first refractive lens (i.e., the first lens 10 ) in the optical system
  • V 2 is the Abbe number of the second refractive lens (i.e., the second lens 20 ) in the optical system
  • V 3 is the Abbe number of the third refractive lens (ie, the third lens 30 ) in the optical system.
  • the optical system also satisfies: 1.54 ⁇ n 1 ⁇ 1.6; (8-4) 1.5 ⁇ n 2 ⁇ 1.6; (9-4)
  • n 2 is the refractive index of the first refractive lens (ie, the first lens 10 ) in the optical system; n 2 is the refractive index of the second refractive lens (ie, the second lens 20 ) in the optical system.
  • the optical system also satisfies: 1.2 ⁇ TTL/ImgH ⁇ 2.8; (7)
  • TTL is the total system length of the optical system provided in the embodiment of the present application
  • ImgH is the maximum imaging height of the optical system.
  • Figure 22 shows an astigmatism diagram of the optical system according to an embodiment of the present application. It can be seen from Figure 22 that the meridional astigmatism of this optical system is less than 0.1, and the sagittal astigmatism is less than 0.1.
  • the field curvature (distortion) of this optical system is shown in Figure 23. As can be seen from Figure 23, the distortion of this optical system at a field of view of 0.7 is less than 5%.
  • Figure 24 shows the modulation transfer function of the optical system. According to Figure 24, the modulation transfer function of the optical system in each field of view is close to the diffraction limit. To sum up, the imaging effect of this optical system is good, and the astigmatism and field curvature control are excellent.
  • L represents the lens
  • the number represents the order of the lens from the object side to the image side in the optical system provided in the embodiment of the present application
  • o represents the object side surface
  • i represents the image side surface.
  • L 1o represents the object-side surface of the first lens 10
  • L 1i represents the image-side surface of the first lens 10
  • An embodiment of the present application also provides an imaging device, which includes the optical system provided in any of the above embodiments; and a photosensitive element disposed on the image surface of the optical system.
  • An embodiment of the present application further provides an electronic device, which includes the imaging device provided in the above embodiment.
  • metalens are a specific application of metasurfaces, which modulate the phase, amplitude, and polarization of incident light through periodically arranged subwavelength-sized nanostructures.
  • the metalens provided in any of the above embodiments includes a base layer 11 and at least one nanostructure layer 12.
  • at least one nanostructure layer 12 is disposed on one side of the base layer 11; each layer of the at least one nanostructure layer 12 includes periodically arranged nanostructures 1201.
  • Figures 27 and 28 show perspective views of the nanostructures 1201 in any nanostructure layer 12 of the hyperlens used in the optical system provided by the embodiment of the present application.
  • filling material 1202 may be filled between the nanostructures on the super lens, and the filling material 1202 includes air or other materials that are transparent or translucent in the working band.
  • the absolute value of the difference between the refractive index of the filled material and the refractive index of the nanostructure should be greater than or equal to 0.5.
  • the filling material in the nanostructure layer 12 farthest from the base layer 11 may be air.
  • the nanostructures 1201 in any nanostructure layer 12 are periodically arranged in the form of superstructure units 121 .
  • the above-mentioned superstructure unit 121 is a close-packed pattern, and a nanostructure 1201 is provided at the vertex and/or center position of the close-packed pattern.
  • the densely packed graphic fingers is one or more shapes that can fill the entire plane without gaps or overlapping.
  • the superstructure units may be arranged in a fan shape. As shown in FIG. 30 , according to the embodiment of the present application, the superstructure units may be arranged in a regular hexagonal array. In addition, as shown in FIG. 31 , according to embodiments of the present application, the superstructure units may be arranged in a square array. Those skilled in the art will recognize that the superstructural units included in the microstructure layer may also include other forms of array arrangements, and all such variations are covered by the scope of the present application.
  • the broad spectrum phase of the superstructure unit 121 and the working band of the superlens provided by the embodiment of the present application also satisfy: Among them, r is the coordinate of the hyperlens along the radial direction; r 0 is any point on the hyperlens; ⁇ is the operating wavelength.
  • the nanostructure 1201 provided by the embodiment of the present application can be a polarization-independent structure, and such a structure imposes a propagation phase on the incident light.
  • the nanostructure 1201 may be a positive structure or a negative structure.
  • the shape of the nanostructure 1201 includes a cylinder, a hollow cylinder, a square prism, a hollow square prism, etc.
  • FIG. 32 shows a perspective view of the three nanostructure layers 12 in the hyperlens provided by the embodiment of the present application.
  • the super lens provided by the embodiment of the present application includes at least two layers of nanostructures 12 .
  • the nanostructures in adjacent nanostructure layers of at least two layers of nanostructures 12 are arranged coaxially.
  • the aforementioned coaxial arrangement means that the nanostructures in the two adjacent nanostructure layers 12 have the same arrangement period; or the axes of the nanostructures at the same position in the two adjacent nanostructure layers overlap, as shown in Figure 26 or Figure 32 .
  • Figure 32 shows a perspective view of three nanostructured layers.
  • the shape, size or material of the nanostructures 12 in adjacent nanostructure layers 12 may be the same or different.
  • Figures 33a to 33d respectively show a cylinder, a hollow cylinder, a square cylinder and a hollow square cylinder filled with filling material.
  • the nanostructure 1021 is disposed at the center of the regular quadrilateral superstructure unit 121 .
  • Figures 34a to 34d respectively illustrate a cylinder, a hollow cylinder, a square cylinder and a hollow square cylinder with filling material.
  • the nanostructure 1021 is disposed at the center of the regular quadrilateral superstructure unit 121 .
  • Figures 35a to 35d respectively illustrate a cylinder without filling material, a hollow cylinder, a square cylinder and a hollow square cylinder.
  • the nanostructure 1021 is disposed at the center of the regular hexagonal superstructure unit 121 .
  • Figures 36a to 36d respectively show negative nanostructures without filling materials, such as square hole pillars, circular hole pillars, square ring pillars and circular ring pillars.
  • the nanostructure 1021 is a negative structure located at the center of the regular hexagonal superstructure unit 121 .
  • the arrangement period of the nanostructures 1201 in any nanostructure layer 12 is greater than or equal to 0.3 ⁇ c and less than or equal to 2 ⁇ c .
  • the height of the nanostructure 1201 in any nanostructure layer 12 is greater than or equal to 0.3 ⁇ c and less than or equal to 5 ⁇ c .
  • ⁇ c is the center wavelength of the working band of the super lens provided in this application.
  • the material of the base layer 11 is a material with an extinction coefficient of less than 0.1 in the working band.
  • the material of the base layer 11 includes fused quartz, quartz glass, crown glass, flint glass, sapphire, crystalline silicon, amorphous silicon and hydrogenated amorphous silicon.
  • the material of the base layer 11 includes fused quartz, quartz glass, crown glass, flint glass, sapphire and alkali glass.
  • the material of the nanostructure 1201 and the material of the base layer 11 may be the same or different.
  • the material of the filling material 1202 and the material of the base layer 11 may be the same or different.
  • the materials of the filling material 1202 and the nanostructure 1201 may be the same or different.
  • the filling material 1202 is made of a high transmittance material in the working band, and its extinction coefficient is less than 0.01.
  • materials of the filling material 1202 include fused quartz, quartz glass, crown glass, flint glass, sapphire, crystalline silicon, amorphous silicon, and hydrogenated amorphous silicon.
  • the equivalent refractive index range of the super lens provided by the embodiment of the present application is less than 2.
  • the equivalent refractive index range is the maximum refractive index of the metalens minus its minimum refractive index.
  • the phase of the super lens provided by the embodiment of the present application also satisfies Formula (11-1) to Formula (11-8):
  • a 1 or b 1 is less than zero.
  • a 2 or b 2 is less than zero.
  • the phase of the metalens can be expressed by high-order polynomials, including odd-order polynomials and even-order polynomials.
  • the hyperlens provided by the embodiment of the present application further includes an anti-reflection film 13 .
  • the anti-reflection film 13 is disposed on the side of the base layer 11 away from the at least one nanostructure layer 12; or, the anti-reflection film 13 is disposed on the side of the at least one nanostructure layer 12 adjacent to the air.
  • the function of the anti-reflection coating 13 is to enhance the reflection and anti-reflection of incident radiation.
  • Equation 12 the matching degree between the phase of the hyperlens and the broadband phase provided by any of the above embodiments is as shown in Equation 12:
  • ⁇ max 700nm
  • ⁇ min 400nm
  • ⁇ the and ⁇ real are the theoretical target phase and the actual database phase respectively.
  • Figures 38 to 41 show the matching degree between the phase of the hyperlens and the ideal phase in Examples 1 to 4 provided in this application.
  • Embodiments of the present application also provide a method for processing a hyperlens, which is applicable to the hyperlens provided in any of the above embodiments. As shown in Figures 42 and 43, the method includes at least step S1 to step S5.
  • step S1 a layer of structural layer material 12a is provided on the base layer 11.
  • Step S2 apply photoresist 14 on the structural layer material 12a, and expose the reference structure 1401.
  • step S3 the nanostructure 1201 is etched on the structural layer material 12a according to the reference structure 1401 to form the nanostructure layer 12.
  • Step S4 Filling material 1202 is provided between nanostructures 1201.
  • Step S5 Trim the surface of the filling material 1202 so that the surface of the filling material 1202 coincides with the surface of the nanostructure 1201.
  • the method provided by the embodiment of the present application also includes:
  • Step S6 Repeat steps S1 to S5 until all nanostructure layers are set.
  • the embodiment of this application provides an optional super lens, and the parameters of the super lens are shown in Table 5-1.
  • the phase and transmittance of this metalens are shown in Figure 45 and Figure 46 respectively.
  • the embodiment of this application provides an optional super lens, and the parameters of the super lens are shown in Table 6-1.
  • the phase and transmittance of this metalens are shown in Figure 47 and Figure 48 respectively.
  • the broad spectrum phase response and wavelength of any superstructural unit in Example 6 satisfy:
  • hyperlens provided by the embodiments of the present application can be processed through semiconductor technology, and has the advantages of light weight, thin thickness, simple structure and process, low cost, and high consistency in mass production.
  • the optical system provided by the embodiment of the present application is composed of a super lens and the remaining three refractive lenses, and the optical system satisfies f/EDP ⁇ 3;25° ⁇ HFOV ⁇ 65°; 0.3 ⁇ f N /f ⁇ 5.5; thus achieving the reduction of the total length of the optical system while ensuring the imaging effect, and promoting the improvement of the optical system.
  • the hyperlens provided in the embodiments of the present application increases the aspect ratio of a single nanostructure through at least one nanostructure layer, improves the design freedom of the hyperlens, and breaks through the design of the optical performance of the hyperlens by the hyperlens structure.

Abstract

一种光学系统及包含其的成像装置、电子设备，光学系统包括从物侧到像侧依次设置的第一透镜（10）、第二透镜（20）、第三透镜（30）和第四透镜（40）；其中，第一透镜（10）、第二透镜（20）、第三透镜（30）和第四透镜（40）中的任一为超透镜，其余均为折射透镜；光学系统中的折射透镜的物侧表面和像侧表面中均包括至少一个非球面，非球面包括一个反曲点；光学系统满足：f/EDP＜3；25°≤HFOV≤65°；0.3≤f N/f≤5.5；其中，f为光学系统的焦距；EPD为光学系统的入瞳口径；f N为光学系统中从物侧到像侧的第一片折射透镜的焦距；HFOV为光学系统的最大视场角的一半。

Description

光学系统及包含其的成像装置、电子设备 技术领域
本申请涉及光学成像的技术领域，具体地，本申请涉及光学系统及包含其的摄像装置、电子设备。
背景技术
随着科学技术的发展，电子设备越来越追求小型化和轻量化。
然而，电子设备中的摄像装置，尤其是摄像装置中的光学系统的体积大、重量沉阻碍了电子设备的小型化和轻量化。
因此，亟需一种小型化的光学系统。
发明内容
为了解决现有技术中投影系统的小型化受透镜数量及镜头体积所限制的问题，本申请实施例提供了一种光学系统及包含其的摄像装置、电子设备。
第一方面本申请实施例提供了一种光学系统，所述光学系统包括从物侧到像侧依次设置的第一透镜、第二透镜、第三透镜和第四透镜；
其中，所述第一透镜、第二透镜、第三透镜和第四透镜中的任一为超透镜，其余均为折射透镜；
所述光学系统中的折射透镜的物侧表面和像侧表面中均包括至少一个非球面，所述非球面包括一个反曲点；
所述光学系统满足：
f/EDP<3；
25°≤HFOV≤65°；
0.3≤fN/f≤5.5；
其中，f为所述光学系统的焦距；EPD为所述光学系统的入瞳口径；fN为所述光学系统中从物侧到像侧的第一片折射透镜的焦距；HFOV为所述光学系统的最大视场角的一半。
可选地，所述光学系统中从物侧到像侧的第一片折射透镜具有正光焦度。
可选地，所述光学系统还包括光阑；
所述光阑被设置于所述第一透镜、所述第二透镜、所述第三透镜和所述第四透镜中任意两个相邻透镜之间。
可选地，所述光学系统中的第一片折射透镜满足：
RNo/fN≥0.23；
其中，RNo为所述光学系统中第一片折射透的物侧表面的曲率半径；fN为所述第一片折射透镜的焦距。
可选地，所述光学系统还满足：
(VN+VN+2)/2-VN+1>20；
其中，VN为所述光学系统中第一片折射透镜的阿贝数；VN+1为所述光学系统中第二片折射透镜的阿贝数；VN+2为所述光学系统中第三片折射透镜的阿贝数。
可选地，所述光学系统还满足：
1.2<TTL/ImgH<2.8；
其中，TTL为所述光学系统的系统总长；ImgH为所述光学系统的最大成像高度。
可选地，所述光学系统还满足：
1.54≤nN≤1.6；
1.5≤nN+1≤1.6；
其中，nN为所述光学系统中第一片折射透镜的折射率；nN+1为所述光学系统中第二片折射透镜的折射率。
可选地，所述光学系统还满足：
|fML|/f>10；
其中，fML为所述超透镜的焦距；f为所述光学系统的焦距。
可选地，所述超透镜的厚度大于或等于0.05mm，且小于或等于2mm。
可选地，所述第一透镜为超透镜；所述第二透镜的物侧表面为凸面，具有正光焦度；所述第三透镜的物侧表面为凹面；所述第四透镜的物侧表面为凸面。
可选地，所述第一透镜的厚度大于或等于0.05mm，且小于或等于1mm。
可选地，所述第二透镜为超透镜；所述第一透镜的物侧表面为凸面，具有正光焦度；所述第三透镜的物侧表面为凹面；所述第四透镜的物侧表面为凸面。
可选地，所述第三透镜为超透镜；所述第一透镜的物侧表面为凸面，具有正光焦度；所述第二透镜的物侧表面为凹面；所述第四透镜的物侧表面为凸面。
可选地，所述第四透镜为超透镜；所述第一透镜的物侧表面为凸面，具有正光焦度；所述第二透镜的物侧表面为凹面；所述第三透镜的物侧表面为凸面。
第二方面，本申请实施例还提供了一种成像装置，所述成像装置包括上述任一实施例提供的光学系统；以及，设置于所述光学系统像面上的感光元件。
第三方面，本申请实施例还一种电子设备，所述电子设备包括上述实施例提供的成像装置。
第四方面，本申请实施例还提供了一种超透镜，适用于如上述任一实施例提供的光学系统，所述超透镜包括基底层和至少一层纳米结构层；
所述至少一层纳米结构层被设置于所述基底层的一侧；
所述至少一层纳米结构层中的每一层均包括周期性排列的纳米结构。
可选地，所述超透镜包括至少两层纳米结构层；
所述至少两层纳米结构层中相邻的纳米结构层中的纳米结构共轴排列。
可选地，所述纳米结构以超结构单元的形式周期性排列；
所述超结构单元为可密堆积图形，所述可密堆积图形的顶点和/或中心位置设置有所述纳米结构。
可选地，所述超透镜的相位至少满足：







其中，r为所述超透镜中心到任一纳米结构中心的距离；λ为所述超透镜的工作波长，为任一与工作波长相关的相位，(x，y)为所述超透镜上的坐标，fML为所述超透镜的焦距，ai和bi为实数系数。
可选地，所述超结构单元的宽谱相位与所述超透镜的工作波长还满足：
其中，r为所述超透镜沿径向的坐标；r0为所述超透镜上任一点；λ为工作波长。
可选地，所述超透镜的等效折射率的范围小于2；
所述等效折射率范围为所述超透镜的最大折射率减去所述超透镜的最小折射率。
可选地，所述纳米结构的排列周期大于或等于0.3λc，且小于或等于2λc；
其中，λc为所述超透镜工作波段的中心波长。
可选地，所述纳米结构的高度大于或等于0.3λc，且小于或等于5λc；
其中，λc为所述超透镜工作波段的中心波长。
可选地，所述纳米结构的形状为偏振不相关结构。
可选地，处于同一纳米结构层的纳米结构之间还填充有填充材料；
所述填充材料对所述超透镜工作波段的消光系数小于0.01。
可选地，所述填充材料与所述纳米结构的材料不同；并且，
所述填充材料与所述基底层的材料不同。
可选地，所述填充材料包括空气、熔融石英、石英玻璃、冕牌玻璃、火石玻璃、蓝宝石、晶体硅、非晶硅和氢化非晶硅中的任意一种或多种的组合。
可选地，所述超透镜还包括增透膜；
所述增透膜被设置于所述基底层远离所述至少一层纳米结构层的一侧；或者，
所述增透膜被设置于所述至少一层纳米结构层与空气相邻的一侧。
第五方面，本申请实施例还提供了一种超透镜的加工方法，其特征在于，适用于上述任一实施例提供的超透镜，所述方法包括：
步骤S1，在所述基底层上设置一层结构层材料；
步骤S2，在所述结构层材料上涂覆光刻胶，并曝光出参考结构；
步骤S3，依据所述参考结构在所述结构层材料上刻蚀出所述纳米结构，以形成纳米结构层；
步骤S4，在所述纳米结构之间设置所述填充材料；
步骤S5，修整所述填充材料的表面，使所述填充材料的表面与所述纳米结构的表面重合。
可选地，所述方法包括：
步骤S6，重复所述步骤S1至所述步骤S5，直至完成所有纳米结构层。
本申请实施例提供的光学系统，由一个超透镜和其余三个折射透镜结合，并使该光学系统满足f/EDP<3；25°≤HFOV≤65°；0.3≤fN/f≤5.5；从而实现了在保证成像效果的前提下缩小光学系统的系统总长，促进了光学系统的小型化和轻量化。
本申请实施例提供的超透镜，通过至少一层纳米结构层增加了单个纳米结构的深宽比，提高了超透镜的设计自由度，突破了超透镜结构对超透镜光学性能的设计。
附图说明
所包括的附图用于提供本申请的进一步理解，并且被并入本说明书中构成本说明书的一部分。附图示出了本申请的实施方式，连同下面的描述一起用于说明本申请的原理。
图1示出了本申请实施例提供的光学系统的的一种可选的结构示意图；
图2示出了本申请实施例提供的光学系统的的又一种可选的结构示意图；
图3示出了本申请实施例提供的光学系统的的又一种可选的结构示意图；
图4示出了本申请实施例提供的光学系统的的又一种可选的结构示意图；
图5示出了本申请实施例提供的一种可选的光学系统中超透镜的的相位图；
图6示出了本申请实施例提供的一种可选的光学系统超透镜的等效折射率图；
图7示出了本申请实施例提供的一种可选的光学系统的像散图；
图8示出了本申请实施例提供的一种可选的光学系统的场曲图；
图9示出了本申请实施例提供的一种可选的光学系统的调制传递函数；
图10示出了本申请实施例提供的又一种可选的光学系统中超透镜的相位图；
图11示出了本申请实施例提供的又一种可选的光学系统超透镜的等效折射率图；
图12示出了本申请实施例提供的又一种可选的光学系统的像散图；
图13示出了本申请实施例提供的又一种可选的光学系统的场曲图；
图14示出了本申请实施例提供的又一种可选的光学系统的调制传递函数；
图15示出了本申请实施例提供的又一种可选的光学系统中超透镜的相位图；
图16示出了本申请实施例提供的又一种可选的光学系统超透镜的等效折射率图；
图17示出了本申请实施例提供的又一种可选的光学系统的像散图；
图18示出了本申请实施例提供的又一种可选的光学系统的场曲图；
图19示出了本申请实施例提供的又一种可选的光学系统的调制传递函数；
图20示出了本申请实施例提供的又一种可选的光学系统中超透镜的相位图；
图21示出了本申请实施例提供的又一种可选的光学系统超透镜的等效折射率图；
图22示出了本申请实施例提供的又一种可选的光学系统的像散图；
图23示出了本申请实施例提供的又一种可选的光学系统的场曲图；
图24示出了本申请实施例提供的又一种可选的光学系统的调制传递函数；
图25示出了本申请实施例提供的一种可选的超透镜的结构示意图；
图26示出了本申请实施例提供的又一种可选的超透镜的结构示意图；
图27示出了本申请实施例提供的超透镜中纳米结构的一种可选的透视图；
图28示出了本申请实施例提供的超透镜中纳米结构的又一种可选的透视图；
图29示出了本申请实施例提供的超透镜中纳米结构的一种可选的排列示意图；
图30示出了本申请实施例提供的超透镜中纳米结构的又一种可选的排列示意图；
图31示出了本申请实施例提供的超透镜中纳米结构的又一种可选的排列示意图；
图32示出了本申请实施例提供的超透镜的一种可选的结构透视图；
图33示出了本申请实施例提供的纳米结构的一种可选的结构示意图；
图34示出了本申请实施例提供的纳米结构的又一种可选的结构示意图；
图35示出了本申请实施例提供的纳米结构的又一种可选的结构示意图；
图36示出了本申请实施例提供的纳米结构的又一种可选的结构示意图；
图37示出了本申请实施例提供的超透镜的一种可选的结构示意图；
图38示出了本申请提供的实施例1中超透镜的相位与理想相位的匹配度；
图39示出了本申请提供的实施例2中超透镜的相位与理想相位的匹配度；
图40示出了本申请提供的实施例3中超透镜的相位与理想相位的匹配度；
图41示出了本申请提供的实施例4中超透镜的相位与理想相位的匹配度；
图42示出了本申请实施例提供的超透镜加工方法的一种可选的流程示意图；
图43示出了本申请实施例提供的超透镜加工方法的又一种可选的流程示意图；
图44示出了本申请实施例提供的超透镜加工方法的又一种可选的流程示意图；
图45示出了本申请实施例提供的超透镜的一种可选的相位图；
图46示出了本申请实施例提供的超透镜的一种可选的透过率图；
图47示出了本申请实施例提供的超透镜的一种可选的相位图；
图48示出了本申请实施例提供的超透镜的一种可选的透过率图。
图中附图标记分别表示：
10-第一透镜；20-第二透镜；30-第三透镜；40-第四透镜；50-光阑；
11-基底层；12-纳米结构层；13-增透膜；12a-纳米结构材料；
121-超结构单元；1201-纳米结构；1202-填充材料。
具体实施方式
现将在下文中参照附图更全面地描述本申请，在附图中示出了各实施方式。然而，本申请可以以许多不同的方式实施，并且不应被解释为限于本文阐述的实施方式。相反，这些实施方式被提供使得本申请将是详尽的和完整的，并且将向本领域技术人员全面传达本申请的范围。通篇相同的附图标记表示相同的部件。再者，在附图中，为了清楚地说明，部件的厚度、比率和尺寸被放大。
本文使用的术语仅用于描述具体实施方式的目的，而非旨在成为限制。除非上下文清楚地另有所指，否则如本文使用的“一”、“一个”、“该”和“至少之一”并非表示对数量的限制，而是旨在包括单数和复数二者。例如，除非上下文清楚地另有所指，否则“一个部件”的含义与“至少一个部件”相同。“至少之一”不应被解释为限制于数量“一”。“或”意指“和/或”。术语“和/或”包括相关联的列出项中的一个或更多个的任何和全部组合。
除非另有限定，否则本文使用的所有术语，包括技术术语和科学术语，具有与本领域技术人员所通常理解的含义相同的含义。如共同使用的词典中限定的术语应被解释为具有与相关的技术上下文中的含义相同的含义，并且除非在说明书中明确限定，否者不在理想化的或者过于正式的意义上将这些术语解释为具有正式的含义。
“包括”或“包含”的含义指明了性质、数量、步骤、操作、部件、部件或它们的组合，但是并未排除其他的性质、数量、步骤、操作、部件、部件或它们的组合。
本文参照作为理想化的实施方式的截面图描述了实施方式。从而，预见到作 为例如制造技术和/或公差的结果的、相对于图示的形状变化。因此，本文描述的实施方式不应被解释为限于如本文示出的区域的具体形状，而是应包括因例如制造导致的形状的偏差。例如，被示出或描述为平坦的区域可以典型地具有粗糙和/或非线性特征。而且，所示出的锐角可以被倒圆。因此，图中所示的区域在本质上是示意性的，并且它们的形状并非旨在示出区域的精确形状并且并非旨在限制权利要求的范围。
在下文中，将参照附图描述根据本申请的示例性实施方式。
随着科学技术的发展，电子设备越来越追求小型化和轻量化。一方面，使用传统塑胶透镜的光学系统由于其注塑工艺的限制，很难在厚度和大曲率面上有所突破，从而导致四片式透镜结构的光学系统在各透镜厚度、各透镜间隔和系统总长度上难以突破；另一方面，塑胶镜片可选材料也只有十多种，从而限制了系统像差校正的自由度。目前虽然有玻璃树脂混合镜片在一定程度上解决了色差等问题，但注塑工艺仍然极大地妨碍了光学系统的小型化和轻量化。现如今，光学系统的总长度每缩小1毫米均要付出巨大的努力。例如，相关技术中有一种采用四片式结构的光学系统的总长度在3.53mm以上，整个系统由于工艺限制，很难将厚度做到2.5mm以下。
本申请实施例提供了一种光学系统，如图1至图4所示，该光学系统包括从物侧到像侧依次设置的第一透镜10、第二透镜20、第三透镜30和第四透镜40。
具体而言，该光学系统中第一透镜10、第二透镜20、第三透镜30和第四透镜40中的任意一个透镜为超透镜，其余三个透镜均为折射透镜。该光学系统中每个折射透镜的物侧表面和像侧表面中的至少一个包含非球面，并且前述非球面包括一个反曲点。并且，该光学系统满足：
f/EDP<3；  (1)
25°≤HFOV≤65°；  (2)
0.3≤fN/f≤5.5；  (3)
其中，f为该光学系统的焦距；EPD为该光学系统的入瞳口径(Entrance Pupil Diameter)；fN为该光学系统中从物侧到像侧的第一片折射透镜的焦距；HFOV为该光学系统的最大视场角的一半。N表示从物侧到像侧，该光学系统中的第一片折射透镜在整个光学系统中的顺序。例如，当第一透镜10为该光学系统中的 第一片折射透镜时，第一片折射透镜的焦距为f1；当第二透镜20为该光学系统中第一片折射透镜时，第一片折射透镜的焦距为f2。
在一种可选的实施方式中，本申请实施例提供的光学系统中还包括光阑50。光阑50在该光学系统中的位置影响该光学系统的口径。一般地，光阑50的位置越靠近物侧，则光学系统的口径越小，反之亦然。可选地，光阑50被设置在第一透镜10和第二透镜20之间。示例性地，光阑50为孔径光阑(STO)。
根据本申请的实施方式，参见图1至图4，本申请实施例提供的光学系统还包括红外滤光片(IR filter)。红外滤光片的作用是屏蔽可见光，用于提高光学系统的夜视功能。
本申请一些实施方式中，该光学系统中超透镜的厚度大于或等于0.05mm，且小于或等于2mm。根据本申请的实施方式，该光学系统还满足：
|fML|/f>10；  (4)
其中，fML为该超透镜的焦距；f为本申请实施例提供的光学系统的焦距。
在一种可选的实施方式中，该光学系统中从物侧到像侧的第一片折射透镜具有正光焦度。示例性的，前述第一折射透镜的物侧表面为凸面。
根据本申请的实施方式，可选地，该光学系统中的第一片折射透镜满足：
RNo/fN≥0.23；  (5)
公式(5)中，RNo为该光学系统中第一片折射透的物侧表面的曲率半径；fN为该光学系统中第一片折射透镜的焦距。N表示从物侧到像侧，该光学系统中的第一片折射透镜在整个光学系统中的顺序。
本申请一些可选的实施例中，参见图1至图4，本申请实施例提供的光学系统还满足：
(VN+VN+2)/2-VN+1>20；  (6)
其中，VN为该光学系统中第一片折射透镜的阿贝数；VN+1为该光学系统中第二片折射透镜的阿贝数；VN+2为该光学系统中第三片折射透镜的阿贝数。N表示从物侧到像侧，该光学系统中的第一片折射透镜在整个光学系统中的顺序。例如，当第一透镜10为该光学系统中的超透镜时，第二透镜20为第一片折射透镜，则第一片折射透镜的阿贝数为V1，第二片折射透镜的阿贝数为V3，第三片折射透镜的阿贝数为V4。
根据本申请的实施方式，可选地，该光学系统还满足：
1.2<TTL/ImgH<2.8；  (7)
其中，TTL为本申请实施例提供的光学系统的系统总长；ImgH为该光学系统的最大成像高度。
根据本申请的实施方式，可选地，该光学系统还满足：
1.54≤nN≤1.6；  (8)
1.5≤nN+1≤1.6；  (9)
其中，nN为该光学系统中第一片折射透镜的折射率；nN+1为该光学系统中第二片折射透镜的折射率。
根据本申请的实施方式，本申请实施中非球面如公式(10)所示：
其中，z为平行于折射透镜光轴的表面矢量，c为折射透镜中心点的曲率，k为二次曲面常数，A～J分别对应高阶系数。
可选地，本申请实施例提供的光学系统中，超透镜的等效折射率范围小于2。等效折射率范围为超透镜的最大折射率减去其最小折射率。
实施例1
参见图1，本申请一种示例的实施例提供了一种光学系统。图1示出了一种光学系统，该系统包括从物侧到像侧依次设置的第一透镜10、第二透镜20、第三透镜30和第四透镜40。其中，第一透镜10为超透镜，第二透镜20、第三透镜30和第四透镜40为折射透镜。其中，第二透镜20的物侧表面为凸面，具有正光焦度；第三透镜30的物侧表面为凹面；第四透镜40的物侧表面为凸面。第二透镜20、第三透镜30和第四透镜40中每个折射透镜的物侧表面和像侧表面中的至少一个包含非球面，并且前述非球面包括一个反曲点。并且，该光学系统满足：
f/EDP<3；  (1)
25°≤HFOV≤65°；  (2)
0.3≤f2/f≤5.5；  (3-1)
其中，f为该光学系统的焦距；EPD为该光学系统的入瞳口径(Entrance Pupil  Diameter)；f2为该光学系统中第二透镜20的焦距；HFOV为该光学系统的最大视场角的一半。
本申请实施例1所提供的光学系统的系统参数如表1-1所示。该光学系统中各个透镜表面的参数如表1-2所示，各个折射透镜中非球面系数如表1-3所示。参见图5，图5示出了该光学系统中超透镜(即第一透镜10)分别在三个可选的工作波长(486.13nm、587.25nm、656.27nm)的相位图。参见图6，图6示出了该光学系统中超透镜的等效折射率图。由图6可知，该光学系统中超透镜的等效折射率小于2。
可选地，该光学系统中超透镜(即第一透镜10)的厚度大于或等于0.05mm，且小于或等于1mm。可选地，该光学系统还满足：
R2o/f2≥0.35；  (5-1)
公式(5-1)中，R2o为该光学系统中第一片折射透的物侧表面的曲率半径；f2为该光学系统中第一片折射透镜的焦距。
根据本申请的实施方式，该光学系统还满足：
(V2+V4)/2-V3>20；  (6-1)
其中，V2为该光学系统中第一片折射透镜(即第二透镜20)的阿贝数；V3为该光学系统中第二片折射透镜(即第三透镜30)的阿贝数；V4为该光学系统中第三片折射透镜(即第四透镜40)的阿贝数。
根据本申请的实施方式，该光学系统还满足：
1.54≤n2≤1.6；  (8-1)
1.5≤n3≤1.6；  (9-1)
其中，n2为该光学系统中第一片折射透镜(即第二透镜20)的折射率；n3为该光学系统中第二片折射透镜(即第三透镜30)的折射率。
根据本申请的实施方式，该光学系统还满足：
1.2<TTL/ImgH<2.8；  (7)
其中，TTL为本申请实施例提供的光学系统的系统总长；ImgH为该光学系统的最大成像高度。
根据本申请的实施方式，图7示出了该光学系统的像散图。由图7可知，该光学系统的子午像散小于0.1，弧矢像散小于0.05。该光学系统的场曲(即畸变) 参见图8。由图8可知，该光学系统在全视场的畸变小于5％。图9示出了该光学系统的调制传递函数，根据图9所示，该光学系统在各个视场的调制传递函数均接近衍射极限。综上所述，该光学系统的成像效果良好，像散和场曲控制优秀。
表1-1
表1-2
表1-3

表1-2和表1-3的表面编号中，L表示透镜，数字表示该透镜在本申请实施例提供的光学系统中从物侧到像侧的顺序，o表示物侧表面，i表示像侧表面。例如，L1o表示第一透镜10的物侧表面，L1i表示第一透镜10的像侧表面，其余透镜表面以此类推。
实施例2
如图2所示，实施例2提供了一种可选的光学系统。该光学系统的结构如图2所示，该系统包括从物侧到像侧依次设置的第一透镜10、第二透镜20、第三透镜30和第四透镜40。其中，第二透镜20为超透镜，第一透镜10、第三透镜30和第四透镜40为折射透镜。其中，第一透镜10的物侧表面为凸面，具有正光焦度；第三透镜30的物侧表面为凹面；第四透镜40的物侧表面为凸面。第一透镜10、第三透镜30和第四透镜40中每个折射透镜的物侧表面和像侧表面中的至少一个包含非球面，并且前述非球面包括一个反曲点。并且，该光学系统满足：
f/EDP<3；  (1)
25°≤HFOV≤65°；  (2)
0.55≤f1/f≤5.2  (3-2)
其中，f为该光学系统的焦距；EPD为该光学系统的入瞳口径(Entrance Pupil Diameter)；f1为该光学系统中第一透镜10的焦距；HFOV为该光学系统的最大视场角的一半。
本申请实施例2所提供的光学系统的系统参数如表2-1所示。该光学系统中 各个透镜表面的参数如表2-2所示，各个折射透镜中非球面系数如表2-3所示。参见图10，图10示出了该光学系统中超透镜(即第二透镜20)分别在三个可选的工作波长(486.13nm、587.25nm、656.27nm)的相位图。参见图11，图11示出了该光学系统中超透镜的等效折射率图。由图11可知，该光学系统中超透镜的等效折射率小于2。
可选地，该光学系统中超透镜(即第二透镜20)的厚度大于或等于0.05mm，且小于或等于2mm。可选地，该光学系统还满足：
R1o/f1≥0.4；  (5-2)
公式(5-2)中，R1o为该光学系统中第一片折射透的物侧表面的曲率半径；f1为该光学系统中第一片折射透镜的焦距。
根据本申请的实施方式，该光学系统还满足：
(V1+V4)/2-V3>20；  (6-2)
其中，V2为该光学系统中第一片折射透镜(即第一透镜10)的阿贝数；V3为该光学系统中第二片折射透镜(即第三透镜30)的阿贝数；V4为该光学系统中第三片折射透镜(即第四透镜40)的阿贝数。
根据本申请的实施方式，该光学系统还满足：
1.54≤n1≤1.6；  (8-2)
1.5≤n3≤1.6；  (9-2)
其中，n2为该光学系统中第一片折射透镜(即第一透镜10)的折射率；n3为该光学系统中第二片折射透镜(即第三透镜30)的折射率。
根据本申请的实施方式，该光学系统还满足：
1.2<TTL/ImgH<2.8；  (7)
其中，TTL为本申请实施例提供的光学系统的系统总长；ImgH为该光学系统的最大成像高度。
根据本申请的实施方式，图12示出了该光学系统的像散图。由图12可知，该光学系统的子午像散小于0.1，弧矢像散小于0.1。该光学系统的场曲(即畸变)参见图13。由图13可知，该光学系统在全视场的畸变小于10％。图14示出了该光学系统的调制传递函数，根据图14所示，该光学系统在各个视场的调制传递函数均接近衍射极限。综上所述，该光学系统的成像效果良好，像散和场曲控 制优秀。
表2-1
表2-2
表2-3

表2-2和表2-3的表面编号中，L表示透镜，数字表示该透镜在本申请实施例提供的光学系统中从物侧到像侧的顺序，o表示物侧表面，i表示像侧表面。例如，L1o表示第一透镜10的物侧表面，L1i表示第一透镜10的像侧表面，其余透镜表面以此类推。
实施例3
如图3所示，实施例3提供了一种可选的光学系统。该光学系统的结构参见图3，该系统包括从物侧到像侧依次设置的第一透镜10、第二透镜20、第三透镜30和第四透镜40。其中，第三透镜30为超透镜，第一透镜10、第二透镜20和第四透镜40为折射透镜。其中，第一透镜10的物侧表面为凸面，具有正光焦度；第二透镜20的物侧表面为凹面；第四透镜40的物侧表面为凸面。第一透镜10、第二透镜20和第四透镜40中每个折射透镜的物侧表面和像侧表面中的至少一个包含非球面，并且前述非球面包括一个反曲点。并且，该光学系统满足：
f/EDP<3；  (1)
25°≤HFOV≤65°；  (2)
0.5≤f1/f≤5  (3-3)
其中，f为该光学系统的焦距；EPD为该光学系统的入瞳口径(Entrance Pupil Diameter)；f1为该光学系统中第一透镜10的焦距；HFOV为该光学系统的最大视场角的一半。
本申请实施例3所提供的光学系统的系统参数如表3-1所示。该光学系统中 各个透镜表面的参数如表3-2所示，各个折射透镜中非球面系数如表3-3所示。参见图15，图15示出了该光学系统中超透镜(即第三透镜30)分别在三个可选的工作波长(486.13nm、587.25nm、656.27nm)的相位图。参见图16，图16示出了该光学系统中超透镜的等效折射率图。由图16可知，该光学系统中超透镜的等效折射率小于2。
可选地，该光学系统中超透镜(即第三透镜30)的厚度大于或等于0.05mm，且小于或等于2mm。可选地，该光学系统还满足：
R1o/f1≥0.23；  (5-3)
公式(5-1)中，R1o为该光学系统中第一片折射透镜(即第一透镜10)的物侧表面的曲率半径；f1为该光学系统中第一片折射透镜(即第一透镜10)的焦距。
根据本申请的实施方式，该光学系统还满足：
(V1+V4)/2-V2>20；  (6-3)
其中，V2为该光学系统中第一片折射透镜(即第一透镜10)的阿贝数；V2为该光学系统中第二片折射透镜(即第二透镜20)的阿贝数；V4为该光学系统中第三片折射透镜(即第四透镜40)的阿贝数。
根据本申请的实施方式，该光学系统还满足：
1.54≤n1≤1.6；  (8-3)
1.5≤n2≤1.6；  (9-3)
其中，n2为该光学系统中第一片折射透镜(即第一透镜10)的折射率；n2为该光学系统中第二片折射透镜(即第二透镜20)的折射率。
根据本申请的实施方式，该光学系统还满足：
1.2<TTL/ImgH<2.8；  (7)
其中，TTL为本申请实施例提供的光学系统的系统总长；ImgH为该光学系统的最大成像高度。
根据本申请的实施方式，图17示出了该光学系统的像散图。由图17可知，该光学系统的子午像散小于0.1，弧矢像散小于0.1。该光学系统的场曲(即畸变)参见图18。由图18可知，该光学系统在0.7视场的畸变小于5％。图19示出了该光学系统的调制传递函数，根据图19所示，该光学系统在各个视场的调制传 递函数均接近衍射极限。综上所述，该光学系统的成像效果良好，像散和场曲控制优秀。
表3-1
表3-2
表3-3

表3-2和表3-3的表面编号中，L表示透镜，数字表示该透镜在本申请实施例提供的光学系统中从物侧到像侧的顺序，o表示物侧表面，i表示像侧表面。例如，L1o表示第一透镜10的物侧表面，L1i表示第一透镜10的像侧表面，其余透镜表面以此类推。
实施例4
如图4所示，实施例4提供了一种可选的光学系统。该光学系统的结构参见图4，该系统包括从物侧到像侧依次设置的第一透镜10、第二透镜20、第三透镜30和第四透镜40。其中，第四透镜40为超透镜，第一透镜10、第二透镜20和第三透镜30为折射透镜。其中，第一透镜10的物侧表面为凸面，具有正光焦度；第二透镜20的物侧表面为凹面；第三透镜30的物侧表面为凸面。第一透镜10、第二透镜20和第三透镜30中每个折射透镜的物侧表面和像侧表面中的至少一个包含非球面，并且前述非球面包括一个反曲点。并且，该光学系统满足：
f/EDP<3；  (1)
25°≤HFOV≤65°；  (2)
0.5≤f1/f≤3.2  (3-4)
其中，f为该光学系统的焦距；EPD为该光学系统的入瞳口径(Entrance Pupil Diameter)；f1为该光学系统中第一透镜10的焦距；HFOV为该光学系统的最大视场角的一半。
本申请实施例4所提供的光学系统的系统参数如表4-1所示。该光学系统中各个透镜表面的参数如表4-2所示，各个折射透镜中非球面系数如表4-3所示。参见图20，图20示出了该光学系统中超透镜(即第四透镜40)分别在三个可选 的工作波长(486.13nm、587.25nm、656.27nm)的相位图。参见图21，图21示出了该光学系统中超透镜的等效折射率图。由图21可知，该光学系统中超透镜的等效折射率小于2。
可选地，该光学系统中超透镜(即第三透镜30)的厚度大于或等于0.05mm，且小于或等于2mm。可选地，该光学系统还满足：
R1o/f1≥0.55；  (5-4)
公式(5-1)中，R1o为该光学系统中第一片折射透镜(即第一透镜10)的物侧表面的曲率半径；f1为该光学系统中第一片折射透镜(即第一透镜10)的焦距。
根据本申请的实施方式，该光学系统还满足：
(V1+V3)/2-V2>20；  (6-4)
其中，V2为该光学系统中第一片折射透镜(即第一透镜10)的阿贝数；V2为该光学系统中第二片折射透镜(即第二透镜20)的阿贝数；V3为该光学系统中第三片折射透镜(即第三透镜30)的阿贝数。
根据本申请的实施方式，该光学系统还满足：
1.54≤n1≤1.6；  (8-4)
1.5≤n2≤1.6；  (9-4)
其中，n2为该光学系统中第一片折射透镜(即第一透镜10)的折射率；n2为该光学系统中第二片折射透镜(即第二透镜20)的折射率。
根据本申请的实施方式，该光学系统还满足：
1.2<TTL/ImgH<2.8；  (7)
其中，TTL为本申请实施例提供的光学系统的系统总长；ImgH为该光学系统的最大成像高度。
根据本申请的实施方式，图22示出了该光学系统的像散图。由图22可知，该光学系统的子午像散小于0.1，弧矢像散小于0.1。该光学系统的场曲(即畸变)参见图23。由图23可知，该光学系统在0.7视场的畸变小于5％。图24示出了该光学系统的调制传递函数，根据图24所示，该光学系统在各个视场的调制传递函数均接近衍射极限。综上所述，该光学系统的成像效果良好，像散和场曲控制优秀。
表4-1
表4-2
表4-3

表4-2和表4-3的表面编号中，L表示透镜，数字表示该透镜在本申请实施例提供的光学系统中从物侧到像侧的顺序，o表示物侧表面，i表示像侧表面。例如，L1o表示第一透镜10的物侧表面，L1i表示第一透镜10的像侧表面，其余透镜表面以此类推。
上述实施例1至实施例4中提供的超透镜的相位与理想相位的匹配度分别如图42-图45所示。
本申请实施例还提供了一种成像装置，该成像装置包括上述任一实施例提供的光学系统；以及，设置于该光学系统像面上的感光元件。
本申请实施例还一种电子设备，该电子设备包括上述实施例提供的成像装置。
接下来结合图25至图37对本申请实施例提供的超透镜进行描述。
具体而言，超透镜为超表面的一种具体应用，超表面通过周期性排列的亚波长尺寸纳米结构对入射光的相位、幅度和偏振进行调制。根据本申请的实施方式，如图25和图26所示，上述任一实施例提供的超透镜包括基底层11和至少一层纳米结构层12。其中，至少一层纳米结构层12倍设置于基底层11的一侧；至少一层纳米结构层12中的每一层均包括周期性排列的纳米结构1201。图27和图28示出了本申请实施例提供的光学系统所采用的超透镜中任一层纳米结构层12中纳米结构1201的透视图。可选地，超透镜上各纳米结构之间还可填充有填充材料1202，填充材料1202包括空气或在工作波段透明或半透明的其他材料。根据本申请的实施方式，所填充的材料的折射率与纳米结构的折射率之间的差值的绝对值应大于或等于0.5。当本申请实施例提供的超透镜具有至少两层纳米结构层12时，距离基底层11最远的纳米结构层12中填充材料可以是空气。可选地，如图29至图31所示，任一纳米结构层12中的纳米结构1201以超结构单元121的形式周期性排列。上述超结构单元121为可密堆积图形，该可密堆积图形的顶点和/或中心位置设置有纳米结构1201。本申请实施例中，可密堆积图形指 的是一种或多种可以无缝隙不重叠地填充整个平面的图形。
如图29所示，根据本申请的实施方式，超结构单元可以布置成扇形。如图30所示，根据本申请的实施方式，超结构单元可以布置成正六边形的阵列。此外，如图31所示，根据本申请的实施方式，超结构单元可以布置成正方形的阵列。本领域技术人员应认识到，微结构层中包括的超结构单元还可以包括其他形式的阵列布置，所有这些变型方案均涵盖于本申请的范围内。
可选地，本申请实施例提供的超结构单元121的宽谱相位与超透镜的工作波段还满足：其中，r为所述超透镜沿径向的坐标；r0为所述超透镜上任一点；λ为工作波长。
本申请实施例提供的纳米结构1201可以是偏振无关结构，此类结构对入射光施加一个传播相位。根据本申请的实施方式，纳米结构1201可以是正结构，也可以是负结构。例如，纳米结构1201的形状包括圆柱、中空圆柱、正方形棱柱、中空正方形棱柱等。示例性地，图32给出了本申请实施例提供的超透镜中三层纳米结构层12的透视图。
可选择地，如图26所示，本申请实施例提供的超透镜包括至少两层纳米结构12。其中，至少两层纳米结构12中相邻的纳米结构层中的纳米结构共轴排列。前述共轴排列是指相邻两层的纳米结构层12中的纳米结构排列周期相同；或相邻两层纳米结构层中同一位置的纳米结构的轴线重合，如图26或图32所示。图32示出了三层纳米结构层的透视图。根据本申请的实施方式，相邻的纳米结构层12中的纳米结构12的形状、尺寸或材料可以相同，也可以不同。
示例性地，图33a至图33d分别示出了有填充材料的圆柱、中空圆柱、正方形柱和中空正方形柱。图33中，纳米结构1021被设置于正四边形的超结构单元121的中心位置。在本申请的一些实施例中，图34a至图34d分别示出了有填充材料的圆柱、中空圆柱、正方形柱和中空正方形柱。图34中，纳米结构1021被设置于正四边形的超结构单元121的中心位置。
根据本申请的实施方式，图35a至图35d分别示出了无填充材料的圆柱、中空圆柱、正方形柱和中空正方形柱。图35中，纳米结构1021被设置于正六边形的超结构单元121的中心位置。可选地，图36a至图36d分别示出了无填充材料的负纳米结构，如正方形孔柱、圆形孔柱、正方形环柱和圆形环柱。图36中， 纳米结构1021为设置于正六边形的超结构单元121中心位置的负结构。
根据本申请的实施方式，任意一层纳米结构层12中纳米结构1201的排列周期大于或等于0.3λc，且小于或等于2λc。可选地，任意一层纳米结构层12中纳米结构1201的高度大于或等于0.3λc，且小于或等于5λc。λc为本申请提供的超透镜的工作波段的中心波长。
根据本申请的实施方式，基底层11的材质为对工作波段消光系数小于0.1的材料。例如，基底层11的材料包括熔融石英、石英玻璃、冕牌玻璃、火石玻璃、蓝宝石、晶体硅、非晶硅和氢化非晶硅。再例如，当超透镜的工作波段为可见光波段时，基底层11的材料包括熔融石英、石英玻璃、冕牌玻璃、火石玻璃、蓝宝石和碱性玻璃。纳米结构1201的材质与基底层11的材料可以相同，也可以不同。可选地，填充材料1202的材质与基底层11的材料可以相同，也可以不同。
应理解，填充材料1202与纳米结构1201的材质可以相同，也可以不同。可选地，填充材料1202的材料为工作波段的高透过率材料，其消光系数小于0.01。示例性地，填充材料1202的材料包括熔融石英、石英玻璃、冕牌玻璃、火石玻璃、蓝宝石、晶体硅、非晶硅和氢化非晶硅。
可选地，本申请实施例提供的超透镜的等效折射率范围小于2。等效折射率范围为超透镜的最大折射率减去其最小折射率。根据本申请的实施方式，本申请实施例提供的超透镜的相位还满足公式(11-1)至公式(11-8)：







其中，r为所述超透镜中心到任一纳米结构中心的距离；λ为所述超透镜的工作波长，为任一与工作波长相关的相位，(x，y)为所述超透镜上的坐标，fML为所述超透镜的焦距，ai和bi为实数系数。公式(11-1)至公式(11-3)、公式(11-7)和公式(11-8)中，a1或b1小于零。公式(11-4)至公式(11-6)中，a2或b2小于零。超透镜的相位可以用高次多项式表达，高次多项式包括奇次多项式和偶次多项式。为了不破坏超透镜相位的旋转对称性，通常只能对偶次多项式对应的相位进行优化，这大大降低了超透镜的设计自由度。而上述公式(11-1)至公式(11-8)中，公式(11-4)至公式(11-6)相比其余公式，能够对满足奇次多项式的相位进行优化而不破坏超透镜相位的旋转对称性，从而大大提高了超透镜的优化自由度。
在一种可选的实施方式中，如图37所示，本申请实施例提供的超透镜还包括增透膜13。增透膜13被设置于基底层11远离至少一层纳米结构层12的一侧；或者，增透膜13被设置于至少一层纳米结构层12与空气相邻的一侧。增透膜13的作用是对入射的辐射起到增透减反的作用。
根据本申请的实施方式，上述任一实施例提供的超透镜的相位与宽带相位的匹配度如公式12所示：
公式12中，λmax＝700nm，λmin＝400nm，φthe与φreal分别为理论目标相位和实际数据库内相位。图38至图41示出了本申请提供的实施例1至实施例4中超透镜的相位与理想相位的匹配度。
本申请实施例还提供了一种超透镜的加工方法，适用于上述任一实施例所提供的超透镜。如图42和图43所示，该方法至少包括步骤S1至步骤S5。
步骤S1，在基底层11上设置一层结构层材料12a。
步骤S2，在结构层材料12a上涂覆光刻胶14，并曝光出参考结构1401。
步骤S3，依据参考结构1401在结构层材料12a上刻蚀出纳米结构1201，以形成纳米结构层12。
步骤S4，在纳米结构1201之间设置填充材料1202。
步骤S5，修整填充材料1202的表面，使填充材料1202的表面与纳米结构1201的表面重合。
可选地，如图42和图44所示，本申请实施例提供的方法还包括：
步骤S6，重复步骤S1至步骤S5，直至完成所有纳米结构层的设置。
实施例5
本申请实施例提供了一种可选的超透镜，该超透镜的参数如表5-1所示。该超透镜的相位和透过率分别如图45和图46所示。
实施例5中任意超结构单元的宽谱相位响应与波长满足：
表5-1

实施例6
本申请实施例提供了一种可选的超透镜，该超透镜的参数如表6-1所示。该超透镜的相位和透过率分别如图47和图48所示。实施例6中任意超结构单元的宽谱相位响应与波长满足：
表6-1
需要注意的是，本申请实施例提供的超透镜可以通过半导体工艺加工，具有重量轻、厚度薄、构及工艺简单、成本低及量产一致性高等优点。
综上所述，本申请实施例提供的光学系统，由一个超透镜和其余三个折射透镜结合，并使该光学系统满足f/EDP<3；25°≤HFOV≤65°；0.3≤fN/f≤5.5；从而实现了在保证成像效果的前提下缩小光学系统的系统总长，促进了光学系统的 小型化和轻量化。
本申请实施例提供的超透镜，通过至少一层纳米结构层增加了单个纳米结构的深宽比，提高了超透镜的设计自由度，突破了超透镜结构对超透镜光学性能的设计。
以上所述，仅为本申请实施例的具体实施方式，但本申请实施例的保护范围并不局限于此，任何熟悉本技术领域的技术人员在本申请实施例披露的技术范围内，可轻易想到变化或替换，都应涵盖在本申请实施例的保护范围之内。因此，本申请实施例的保护范围应以权利要求的保护范围为准。

Claims (31)

  1. 一种光学系统，其特征在于，所述光学系统包括从物侧到像侧依次设置的第一透镜(10)、第二透镜(20)、第三透镜(30)和第四透镜(40)；
    其中，所述第一透镜(10)、所述第二透镜(20)、所述第三透镜(30)和所述第四透镜(40)中的任一为超透镜，其余均为折射透镜；
    所述光学系统中每个折射透镜的物侧表面和像侧表面中的至少一个包括非球面，所述非球面包括一个反曲点；
    所述光学系统满足：
    f/EDP<3；
    25°≤HFOV≤65°；
    0.3≤fN/f≤5.5；
    其中，f为所述光学系统的焦距；EPD为所述光学系统的入瞳口径；fN为所述光学系统中从物侧到像侧的第一片折射透镜的焦距；HFOV为所述光学系统的最大视场角的一半。
  2. 如权利要求1所述的光学系统，其特征在于，所述光学系统中从物侧到像侧的第一片折射透镜具有正光焦度。
  3. 如权利要求1所述的光学系统，其特征在于，所述光学系统还包括光阑(50)；
    所述光阑(50)被设置于所述第一透镜(10)、所述第二透镜(20)、所述第三透镜(30)和所述第四透镜(40)中任意两个相邻透镜之间。
  4. 如权利要求1所述的光学系统，其特征在于，所述光学系统中的第一片折射透镜满足：
    RNo/fN≥0.23；
    其中，RNo为所述光学系统中第一片折射透的物侧表面的曲率半径；fN为所述第一片折射透镜的焦距。
  5. 如权利要求1所述的光学系统，其特征在于，所述光学系统还满足：
    (VN+VN+2)/2-VN+1>20；
    其中，VN为所述光学系统中第一片折射透镜的阿贝数；VN+1为所述光学系统中第二片折射透镜的阿贝数；VN+2为所述光学系统中第三片折射透镜的阿贝数。
  6. 如权利要求1所述的光学系统，其特征在于，所述光学系统还满足：
    1.2<TTL/ImgH<2.8；
    其中，TTL为所述光学系统的系统总长；ImgH为所述光学系统的最大成像高度。
  7. 如权利要求1所述的光学系统，其特征在于，所述光学系统还满足：
    1.54≤nN≤1.6；
    1.5≤nN+1≤1.6；
    其中，nN为所述光学系统中第一片折射透镜的折射率；nN+1为所述光学系统中第二片折射透镜的折射率。
  8. 如权利要求1所述的光学系统，其特征在于，所述光学系统还满足：
    |fML|/f>10；
    其中，fML为所述超透镜的焦距；f为所述光学系统的焦距。
  9. 如权利要求1所述的光学系统，其特征在于，所述超透镜的厚度大于或等于0.05mm，且小于或等于2mm。
  10. 如权利要求1-9任一所述的光学系统，其特征在于，所述第一透镜(10)为超透镜；所述第二透镜(20)的物侧表面为凸面，具有正光焦度；所述第三透镜(30)的物侧表面为凹面；所述第四透镜(40)的物侧表面为凸面。
  11. 如权利要求10所述的光学系统，其特征在于，所述第一透镜(10)的厚度大于或等于0.05mm，且小于或等于1mm。
  12. 如权利要求1-9任一所述的光学系统，其特征在于，所述第二透镜(20)为超透镜；所述第一透镜(10)的物侧表面为凸面，具有正光焦度；所述第三透镜(30)的物侧表面为凹面；所述第四透镜(40)的物侧表面为凸面。
  13. 如权利要求1-9任一所述的光学系统，其特征在于，所述第三透镜(30)为超透镜；所述第一透镜(10)的物侧表面为凸面，具有正光焦度；所述第二透镜(20)的物侧表面为凹面；所述第四透镜(40)的物侧表面为凸面。
  14. 如权利要求1-9任一所述的光学系统，其特征在于，所述第四透镜(40)为超透镜；所述第一透镜(10)的物侧表面为凸面，具有正光焦度；所述第二透镜(20)的物侧表面为凹面；所述第三透镜(30)的物侧表面为凸面。
  15. 一种成像装置，其特征在于，所述成像装置包括如权利要求1-14中任一所述的光学系统；以及，设置于所述光学系统像面上的感光元件。
  16. 一种电子设备，其特征在于，所述电子设备包括如权利要求15所述的成像装置。
  17. 一种超透镜，其特征在于，适用于如权利要求1-16中任一所述的光学系统，所述超透镜包括基底层(11)和至少一层纳米结构层(12)；
    其中，所述至少一层纳米结构层(12)被设置于所述基底层(11)的一侧；
    所述至少一层纳米结构层(12)中的每一层均包括周期性排列的纳米结构(1201)。
  18. 如权利要求17所述的超透镜，其特征在于，所述超透镜包括至少两层纳米结构层(12)；
    所述至少两层纳米结构层(12)中相邻的纳米结构层中的纳米结构(1201)共轴排列。
  19. 如权利要求17所述的超透镜，其特征在于，所述纳米结构(1201)以超结构单元(121)的形式周期性排列；
    所述超结构单元(121)为可密堆积图形，所述可密堆积图形的顶点和/或中心位置设置有所述纳米结构(1201)。
  20. 如权利要求17-19任一所述的超透镜，其特征在于，所述超透镜的相位至少满足：







    其中，r为所述超透镜中心到任一纳米结构中心的距离；λ为所述超透镜的工作波长，为任一与工作波长相关的相位，(x，y)为所述超透镜上的坐标， fML为所述超透镜的焦距，ai和bi为实数系数。
  21. 如权利要求19所述的超透镜，其特征在于，所述超结构单元(121)的宽谱相位与所述超透镜的工作波长还满足：
    其中，r为所述超透镜沿径向的坐标；r0为所述超透镜上任一点；λ为工作波长。
  22. 如权利要求17-19任一所述的超透镜，其特征在于，所述超透镜的等效折射率的范围小于2；
    所述等效折射率范围为所述超透镜的最大折射率减去所述超透镜的最小折射率。
  23. 如权利要求17-19任一所述的超透镜，其特征在于，所述纳米结构(1201)的排列周期大于或等于0.3λc，且小于或等于2λc；
    其中，λc为所述超透镜工作波段的中心波长。
  24. 如权利要求17-19任一所述的超透镜，其特征在于，所述纳米结构(1201)的高度大于或等于0.3λc，且小于或等于5λc；
    其中，λc为所述超透镜工作波段的中心波长。
  25. 如权利要求17-19任一所述的超透镜，其特征在于，所述纳米结构(1201)的形状为偏振不相关结构。
  26. 如权利要求17-19任一所述的超透镜，其特征在于，处于同一纳米结构 层的纳米结构之间还填充有填充材料(1202)；
    所述填充材料(1202)对所述超透镜工作波段的消光系数小于0.01。
  27. 如权利要求26所述的超透镜，其特征在于，所述填充材料(1202)与所述纳米结构(1201)的材料不同；并且，
    所述填充材料(1202)与所述基底层(11)的材料不同。
  28. 如权利要求26所述的超透镜，其特征在于，所述填充材料(1202)包括空气、熔融石英、石英玻璃、冕牌玻璃、火石玻璃、蓝宝石、晶体硅和非晶硅中的任意一种或多种的组合。
  29. 如权利要求17-19任一所述的超透镜，其特征在于，所述超透镜还包括增透膜(13)；
    所述增透膜(13)被设置于所述基底层(11)远离所述至少一层纳米结构层(12)的一侧；或者，
    所述增透膜(13)被设置于所述至少一层纳米结构层(12)与空气相邻的一侧。
  30. 一种超透镜的加工方法，其特征在于，适用于如权利要求26-29所述的超透镜，所述方法包括：
    步骤S1，在所述基底层(11)上设置一层结构层材料(12a)；
    步骤S2，在所述结构层材料(12a)上涂覆光刻胶(14)，并曝光出参考结构(1401)；
    步骤S3，依据所述参考结构在所述结构层材料(12a)上刻蚀出所述纳米结构(1201)，以形成所述纳米结构层(12)；
    步骤S4，在所述纳米结构(1201)之间设置所述填充材料(1202)；
    步骤S5，修整所述填充材料(1202)的表面，使所述填充材料(1202)的表面与所述纳米结构(1201)的表面重合。
  31. 如权利要求30所述的方法，其特征在于，所述方法还包括：
    步骤S6，重复所述步骤S1至所述步骤S5，直至完成所有纳米结构层的设置。
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