WO2023246353A1 - 一种晶圆干燥设备摆动机构 - Google Patents

一种晶圆干燥设备摆动机构 Download PDF

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Publication number
WO2023246353A1
WO2023246353A1 PCT/CN2023/093358 CN2023093358W WO2023246353A1 WO 2023246353 A1 WO2023246353 A1 WO 2023246353A1 CN 2023093358 W CN2023093358 W CN 2023093358W WO 2023246353 A1 WO2023246353 A1 WO 2023246353A1
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WO
WIPO (PCT)
Prior art keywords
block
swing mechanism
drying equipment
sliding
arm
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Application number
PCT/CN2023/093358
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English (en)
French (fr)
Inventor
钱诚
李刚
周志勇
Original Assignee
江苏亚电科技有限公司
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Publication of WO2023246353A1 publication Critical patent/WO2023246353A1/zh

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B11/00—Machines or apparatus for drying solid materials or objects with movement which is non-progressive
    • F26B11/18—Machines or apparatus for drying solid materials or objects with movement which is non-progressive on or in moving dishes, trays, pans, or other mainly-open receptacles
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B25/00—Details of general application not covered by group F26B21/00 or F26B23/00
    • F26B25/06—Chambers, containers, or receptacles
    • F26B25/14—Chambers, containers, receptacles of simple construction
    • F26B25/18—Chambers, containers, receptacles of simple construction mainly open, e.g. dish, tray, pan, rack
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying

Definitions

  • This application belongs to the technical field of wafer cleaning, and in particular relates to a swing mechanism of wafer drying equipment.
  • the casing of the wafer cleaning tank is made of metal material.
  • the swing mechanism includes a drive motor, a sliding track, a sliding block, a shaft-connected track and a swing arm.
  • the sliding track is arranged parallel to the shaft-connected track.
  • the sliding track is located above the shaft-connected track.
  • the sliding block is slidably installed on the sliding track.
  • the drive motor is used for The sliding block is controlled to reciprocate on the sliding track.
  • the wafer cassette receiving seat (wafer cassette carrying area) in the swing mechanism lacks flexibility and is inconvenient to install.
  • the installation of the multiple cross beams in the middle is difficult to align.
  • the technical problem to be solved by the present invention is to provide a swing mechanism for wafer drying equipment that is easy to install in order to solve the deficiencies in the prior art.
  • the swing mechanism of the wafer drying equipment of the present invention includes a top mounting plate with a horizontal slide rail, a driving member provided on the top mounting plate, and a driving member slidably provided on the horizontal slide rail and capable of moving along the horizontal slide rail driven by the driving member.
  • the sliding mounting block has an arched sliding arm installed on the sliding mounting block, and a receiving seat is installed on the arched sliding arm. When the driving part works, it can drive the arched sliding arm and the receiving seat to swing;
  • the accommodating seat is used to accommodate the wafer box, including a hollow base in the middle connected to an arched sliding arm, side limiting blocks installed on the base for limiting both sides of the wafer box and a
  • the top block between the side limiting blocks, the side limiting blocks are hollow in the middle, the inner walls of the hollow parts of the two side limiting blocks have oppositely arranged protrusions, the accommodating seat also includes an inner positioning block ;
  • Both ends of the inner positioning block are respectively connected to the protrusions of the side limiting blocks, and the connection points are distributed on both sides of the width direction of the inner positioning block.
  • the top block is installed on both sides of the length direction of the inner positioning block.
  • a width limiting block is further provided between the two side limiting blocks.
  • the bottom of the side limiting block is tenon-jointed with the base.
  • the top surface of the side limiting block is a slope.
  • the top surface of the top block is an inclined surface.
  • the top block is provided with elongated holes along the height direction.
  • the inner positioning block has a material-reducing through hole in the middle that can both reduce weight and allow gas to pass through.
  • the arched sliding arm crosses the top of the tank and extends into the tank to form a first arm located outside the tank and a second arm located inside the tank.
  • the receiving seat is installed at the bottom of the support arm.
  • the first arm is rotatably connected to the rotating mounting base, the first arm has a sliding groove in the middle, and the sliding mounting block is provided with a pulley located in the sliding groove.
  • the sliding mounting block extends downward to form an extension part, and the pulley is provided on the extension part.
  • the inner positioning block serves to position the distance between the two side limit blocks and provides an installation position for the top block.
  • the inner positioning block and the top block are suspended above the hollow part in the middle of the receiving seat.
  • the hollow side The limit block, inner positioning block, and top block form a complete installation structure, which has the installation positioning function, is easy to install, and has the advantages of high structural strength. At the same time, it does not hinder the flow of drying gas and improves the drying effect.
  • the pulley can be kept as far away from the moving center line of the sliding installation block (that is, the center line of the slide rail) as possible, so that the entire pulley and the sliding groove can be coordinated Point lower and increase the amplitude of the swing.
  • Figure 1 is a schematic structural diagram of a swing wafer drying equipment according to an embodiment of the present application
  • FIG 2 is a schematic structural diagram of the swing wafer drying equipment in Figure 1 with the cover removed;
  • FIG. 3 is a schematic structural diagram of the swing mechanism in Embodiment 1 of the present application.
  • Figures 4 and 5 are schematic diagrams of the two swing states of the swing mechanism respectively;
  • Figure 6 is a schematic structural diagram of the receiving seat in Embodiment 1 of the present application.
  • connection should be understood in a broad sense.
  • connection or integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium; it can be an internal connection between two components.
  • This embodiment provides a swing mechanism for wafer drying equipment, as shown in Figures 1, 2, and 3.
  • the arched sliding arm 32 on the mounting block 34 has a receiving seat 36 installed on the arched sliding arm 32.
  • the driving member 33 works, it can drive the arched sliding arm 32 to swing together with the receiving seat 36;
  • the accommodation seat 36 is used to accommodate the wafer box 9, and includes a base 360 connected to the arched sliding arm 32, and side limiting blocks installed on the base 360 for limiting both sides of the wafer box. 361 and the top block 363 located between the side limiting blocks 361.
  • the side limiting blocks 361 are hollow in the middle.
  • the inner walls of the hollow portions of the two side limiting blocks 361 have oppositely arranged protrusions.
  • the receiving seat 36 also includes an inner positioning block 362;
  • Both ends of the inner positioning block 362 are respectively connected to the protrusions of the side limiting blocks 361, and the connection points are distributed on both sides of the width direction of the inner positioning block 362.
  • the top block 363 is installed along the length of the inner positioning block 362. direction on both sides. After the wafer box 9 is placed in the receiving seat 36, the top block 363 can lift the wafer in the wafer box 9 to a certain height (slightly lift it up) to improve the drying effect.
  • the center of the receiving seat 36 is hollow to make the drying air flow smoother.
  • the inner positioning block 362 serves to position the distance between the two side limiting blocks 361 and provides an installation position for the top block 363.
  • the inner positioning block 362 and the top block 363 are suspended in the hollow center of the receiving seat 36.
  • the hollow side limit blocks, inner positioning blocks 362, and top blocks 363 form a complete installation structure, which has the installation positioning function, is easy to install, and has the advantages of high structural strength. At the same time, it does not hinder the flow of dry gas, improving the Drying effect.
  • the driving member 33 drives the sliding installation block 34 to move on the slide rail, and then acts on the sliding groove 321 through the pulley 341, thereby causing the receiving seat 36 to swing.
  • Figure 4 is the middle position. At this time, the wafer box 9 can be loaded and unloaded.
  • Figure 5 shows the maximum amplitude of the swing to the right.
  • a width limiting block 364 is also provided between the two side limiting blocks 361, and both ends of the width limiting block 364 are used to abut the side limiting blocks 361 to improve structural stability.
  • the bottom of the side limiting block 361 is tenon-jointed with the base 360 . That is to say, the side limiting block 361 is installed by sliding in from the side, and then tightened by bolts, thereby improving the convenience of installation.
  • the sliding installation block extends downward to form an extension, and a pulley is provided on the extension, which can keep the pulley as far away from the moving center line of the sliding installation block (that is, the center line of the slide rail) as possible, thereby making the matching point of the entire pulley and the sliding groove lower, improving The amplitude of the swing.
  • the top surfaces of the side limiting blocks 361 and the top block 363 are both inclined surfaces, that is, the tops are sharp.
  • the inclined surfaces of the side limiting blocks 361 face each other, making it easier for the wafer box 9 to slide in from the inclined surfaces to play a positioning role.
  • the slope of the top surface of the top block 363 can reduce the contact area with the wafer and improve the drying effect.
  • the top block 363 is provided with elongated holes along the height direction to facilitate adjustment of the installation height of the top block 363 .
  • the material reduction through hole has two functions, one is to reduce the weight, and the other is to allow dry gas to pass from the bottom, and the closer the material reduction through hole is to the top opening, the smaller it is. big.
  • the specific structure of the arched sliding arm 32 is to extend from the outside of the tank 1 to the inside of the tank 1, as shown in Figure 6. Therefore, the arched sliding arm 32 crosses the top of the tank 1 and extends into the tank 1 to form a position at There is a first arm outside the tank body 1 and a second arm located inside the tank body 1.
  • the receiving seat 36 is installed at the bottom of the second arm.
  • the first arm is rotatably connected to the rotating mounting base 35.
  • the first arm has a sliding groove 321 in the middle.
  • the sliding mounting block 34 is provided with a pulley 341 located in the sliding groove 321.
  • the sliding installation block 34 extends downward to form an extension part 342, and the pulley 341 is provided on the extension part 342.
  • the pulley By extending downward on the sliding installation block to form an extension, and providing a pulley on the extension, the pulley can be kept as far away from the moving centerline of the sliding installation block (that is, the centerline of the slide rail) as possible, thereby making the matching point between the entire pulley and the sliding groove more precise. Low to increase the amplitude of the swing.

Abstract

一种晶圆干燥设备摆动机构，具有用于容纳晶圆盒（9）的容纳座（36），容纳座（36）包括与拱形滑动臂（32）连接的中间镂空的底座（360），安装在底座（360）上的用于对晶圆盒的两侧分别进行限位的侧限位块（361）、位于侧限位块（361）之间的顶块（363）和内定位块（362）。内定位块（362）用于定位两个侧限位块（361）的距离，为顶块（363）提供安装位置，内定位块（362）和顶块（363）悬浮于容纳座（36）中间镂空部分之上。中空的侧限位块（361）、内定位块（362）、顶块（363）形成一整套安装结构，具有安装定位功能，安装简便、结构强度较高，同时还不阻碍干燥气体的流动，提高了干燥效果。

Description

一种晶圆干燥设备摆动机构 技术领域
本申请属于晶圆清洗技术领域，尤其是涉及一种晶圆干燥设备摆动机构。
 背景技术
对于半导体晶圆清洗而言，晶圆需要碱性清洗液清洗、纯水清洗、氢氟酸清洗、臭氧水清洗、干燥等过程，晶圆干燥一般是晶圆清洗的最后步骤，能够去除晶圆表面残留的清洗液，防止晶圆氧化，控制表面的水分及表面洁净度。中国专利文献CN114496847A公开了一种设置于清洗槽内部的摆动机构，摆动机构上设置有两个晶圆盒承载区，晶圆盒承载区用于放置晶圆盒。
晶圆清洗槽的外壳采用金属材料制作而成。摆动机构包括驱动电机、滑动轨道、滑动块、轴接轨道及摆动臂，滑动轨道与轴接轨道平行设置，滑动轨道位于轴接轨道的上方，滑动块滑动安装于滑动轨道上，驱动电机用于控制滑动块在滑动轨道上进行往复运动。
然后，该摆动机构中的晶圆盒容纳座（晶圆盒承载区）灵活性不足，安装不方便，尤其是是中间的多跟横梁的安装难以对齐。
 技术问题
本发明要解决的技术问题是：为解决现有技术中的不足，从而提供一种安装方便的晶圆干燥设备摆动机构。
 技术解决方案
本发明解决其技术问题所采用的技术方案是：
本发明的晶圆干燥设备摆动机构，包括，具有水平滑轨的顶部安装板，设置在顶部安装板上的驱动件，滑动设置在水平滑轨上的能够在驱动件驱动下沿水平滑轨移动的滑动安装块，安装在滑动安装块上的拱形滑动臂，拱形滑动臂上安装有容纳座，驱动件工作时能够带动拱形滑动臂连同容纳座摆动；
所述容纳座，用于容纳晶圆盒，包括与拱形滑动臂连接的中间镂空的底座，安装在底座上的用于对晶圆盒的两侧分别进行限位的侧限位块和位于侧限位块之间的顶块，所述侧限位块中间为中空，两个所述侧限位块的中空部分的内壁上具有相对设置的凸起，所述容纳座还包括内定位块；
所述内定位块的两端分别与所述侧限位块的凸起连接，且连接点分布在内定位块宽度方向的两侧，所述顶块安装于内定位块长度方向的两边。
优选地，本发明的晶圆干燥设备摆动机构，两个所述侧限位块之间还设置有宽度限位块。
优选地，本发明的晶圆干燥设备摆动机构，所述侧限位块底部与底座榫接。
优选地，本发明的晶圆干燥设备摆动机构，侧限位块的顶面为斜面。
优选地，本发明的晶圆干燥设备摆动机构，所述顶块的顶面为斜面。
优选地，本发明的晶圆干燥设备摆动机构，所述顶块沿高度方向设置有长条孔。
优选地，本发明的晶圆干燥设备摆动机构，所述内定位块中间具有兼具降低重量和供气体通过作用的减材通孔。
优选地，本发明的晶圆干燥设备摆动机构，拱形滑动臂越过槽体的顶部并延伸到槽体内形成位于槽体外部的第一支臂和位于槽体内部的第二支臂，第二支臂的底部安装有所述容纳座。
优选地，本发明的晶圆干燥设备摆动机构，第一支臂转动连接于转动安装座上，第一支臂中间具有滑动槽，所述滑动安装块上设置有位于滑动槽内的滑轮.
优选地，本发明的晶圆干燥设备摆动机构，所述滑动安装块向下方延伸形成延伸部，所述滑轮设置在延伸部上。
 有益效果
本发明的有益效果是：
本发明的晶圆干燥设备摆动机构，内定位块起到了定位两个侧限位块距离，为顶块提供安装位置，内定位块和顶块悬浮于容纳座中间镂空部分之上，中空的侧限位块、内定位块、顶块形成一整套安装结构，具有安装定位功能，安装简便，结构强度较高的优点，同时还不阻碍干燥气体的流动，提高了干燥效果。此外，通过在滑动安装块上向下方延伸形成延伸部，延伸部上设置滑轮，能够使滑轮尽量远离滑动安装块的移动中线（也即滑轨的中线），从而使整个滑轮和滑动槽的配合点更低，提高摆动的幅度。
 附图说明
下面结合附图和实施例对本申请的技术方案进一步说明。
图1是本申请实施例的摇摆式晶圆干燥设备的结构示意图；
图2是图1中去掉盖体后的摇摆式晶圆干燥设备的结构示意图；
图3是本申请实施例1中摇摆机构的结构示意图；
[根据细则91更正 12.05.2023]
图4和图5分别为摇摆机构摆动的两个状态的示意图；
[根据细则91更正 12.05.2023]
图6是本申请实施例1中容纳座的结构示意图；
图中的附图标记为：
1　槽体；
2　盖体；
3　摇摆机构；
9　晶圆盒；
21　气体管路；
31　顶部安装板；
32　拱形滑动臂；
33　驱动件；
34　滑动安装块；
35　转动安装座；
36　容纳座；
321　滑动槽；
341　滑轮；
342  延伸部；
360  底座；
361　侧限位块；
362　内定位块；
363　顶块；
364　宽度限位块。
 本发明的最佳实施方式
需要说明的是，在不冲突的情况下，本申请中的实施例及实施例中的特征可以相互组合。
在本申请的描述中，需要理解的是，术语“中心”、“纵向”、“横向”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本申请和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请保护范围的限制。此外，术语“第一”、“第二”等仅用于描述目的，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”等的特征可以明示或者隐含地包括一个或者更多个该特征。在本发明创造的描述中，除非另有说明，“多个”的含义是两个或两个以上。
在本申请的描述中，需要说明的是，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通。对于本领域的普通技术人员而言，可以通过具体情况理解上述术语在本申请中的具体含义。
下面将参考附图并结合实施例来详细说明本申请的技术方案。
实施例
本实施例提供一种晶圆干燥设备摆动机构，如图1和图2和图3所示，
具有水平滑轨的顶部安装板31，设置在顶部安装板上的驱动件33，滑动设置在水平滑轨上的能够在驱动件33驱动下沿水平滑轨移动的滑动安装块34，安装在滑动安装块34上的拱形滑动臂32，拱形滑动臂32上安装有容纳座36，驱动件33工作时能够带动拱形滑动臂32连同容纳座36摆动；
所述容纳座36，用于容纳晶圆盒9，包括与拱形滑动臂32连接的底座360，安装在底座360上的用于对晶圆盒的两侧分别进行限位的侧限位块361和位于侧限位块361之间的顶块363，所述侧限位块361中间为中空，两个所述侧限位块361的中空部分的内壁上具有相对设置的凸起，所述容纳座36还包括内定位块362；
所述内定位块362的两端分别与所述侧限位块361的凸起连接，且连接点分布在内定位块362宽度方向的两侧，所述顶块363安装于内定位块362长度方向的两边。晶圆盒9置入容纳座36后，顶块363能够将晶圆盒9内的晶圆顶起一定高度（轻微顶起），以提高干燥效果。容纳座36中间镂空，使干燥气流更加顺畅。
本实施例的晶圆干燥设备摆动机构，内定位块362起到了定位两个侧限位块361距离，为顶块363提供安装位置，内定位块362和顶块363悬浮于容纳座36中间镂空部分之上，中空的侧限位块、内定位块362、顶块363形成一整套安装结构，具有安装定位功能，安装简便，结构强度较高的优点，同时不阻碍干燥气体的流动，提高了干燥效果。
如图4和5所示，驱动件33带动滑动安装块34在滑轨上运动，进而通过滑轮341作用于滑动槽321，进而使容纳座36发生摆动，其中图4为位于正中间的位置，此时可以供晶圆盒9上下料，图5是向右摆动的最大幅度。
进一步地，两个所述侧限位块361之间还设置有宽度限位块364，利用宽度限位块364两端抵靠侧限位块361，提高结构稳定性。 
进一步地，所述侧限位块361底部与底座360榫接。也即所述侧限位块361通过侧面滑入而进行安装，再由螺栓紧固，提高安装便捷性。
滑动安装块向下方延伸形成延伸部，延伸部上设置滑轮，能够使滑轮尽量远离滑动安装块的移动中线（也即滑轨的中线），从而使整个滑轮和滑动槽的配合点更低，提高摆动的幅度。
侧限位块361和顶块363的顶面均设置为斜面，也即顶部尖锐。侧限位块361的斜面相向，便于使晶圆盒9从斜面滑入，起到定位作用。顶块363顶面的斜面可以减少与晶圆的接触面积，提高干燥效果。
所述顶块363沿高度方向设置有长条孔，以便于调节顶块363安装高度。
所述内定位块362中间具有减材通孔，减材通孔的作用有二，其一是降低重量，其二是供干燥气体从底部通过，且减材通孔的越靠近顶面开口越大。
拱形滑动臂32的具体结构是为了能够从槽体1外部延伸到槽体1内部，如图6所示，因此拱形滑动臂32越过槽体1的顶部并延伸到槽体1内形成位于槽体1外部的第一支臂和位于槽体1内部的第二支臂，第二支臂的底部安装有所述容纳座36。第一支臂转动连接于转动安装座35上，第一支臂中间具有滑动槽321，所述滑动安装块34上设置有位于滑动槽321内的滑轮341。所述滑动安装块34向下方延伸形成延伸部342，所述滑轮341设置在延伸部342上。通过在滑动安装块上向下方延伸形成延伸部，延伸部上设置滑轮，能够使滑轮尽量远离滑动安装块的移动中线（也即滑轨的中线），从而使整个滑轮和滑动槽的配合点更低，提高摆动的幅度。
以上述依据本申请的理想实施例为启示，通过上述的说明内容，相关工作人员完全可以在不偏离本项申请技术思想的范围内，进行多样的变更以及修改。本项申请的技术性范围并不局限于说明书上的内容，必须要根据权利要求范围来确定其技术性范围。
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Claims (10)

  1. 一种晶圆干燥设备摆动机构，其特征在于，包括：
    具有水平滑轨的顶部安装板（31），设置在顶部安装板上的驱动件（33），滑动设置在水平滑轨上的能够在驱动件（33）驱动下沿水平滑轨移动的滑动安装块（34），安装在滑动安装块（34）上的拱形滑动臂（32），拱形滑动臂（32）上安装有容纳座（36），驱动件（33）工作时能够带动拱形滑动臂（32）连同容纳座（36）摆动；
    所述容纳座（36），用于容纳晶圆盒（9），包括与拱形滑动臂（32）连接的中间镂空的底座（360），安装在底座（360）上的用于对晶圆盒的两侧分别进行限位的侧限位块（361）和位于侧限位块（361）之间的顶块（363），所述侧限位块（361）中间为中空，两个所述侧限位块（361）的中空部分的内壁上具有相对设置的凸起，所述容纳座（36）还包括内定位块（362）；
    所述内定位块（362）的两端分别与所述侧限位块（361）的凸起连接，且连接点分布在内定位块（362）宽度方向的两侧，所述顶块（363）安装于内定位块（362）长度方向的两边。
  2. 根据权利要求1所述的晶圆干燥设备摆动机构，其特征在于，两个所述侧限位块（361）之间还设置有宽度限位块（364）。 
  3. 根据权利要求2所述的晶圆干燥设备摆动机构，其特征在于，所述侧限位块（361）底部与底座（360）榫接。
  4. 根据权利要求1所述的晶圆干燥设备摆动机构，其特征在于，侧限位块（361）的顶面为斜面。
  5. 根据权利要求1所述的晶圆干燥设备摆动机构，其特征在于，所述顶块（363）的顶面为斜面。
  6. 根据权利要求1所述的晶圆干燥设备摆动机构，其特征在于，所述顶块（363）沿高度方向设置有长条孔。
  7. 根据权利要求1所述的晶圆干燥设备摆动机构，其特征在于，所述内定位块（362）中间具有兼具降低重量和供气体通过作用的减材通孔。
  8. 根据权利要求1所述的晶圆干燥设备摆动机构，其特征在于，拱形滑动臂（32）越过槽体（1）的顶部并延伸到槽体（1）内形成位于槽体（1）外部的第一支臂和位于槽体（1）内部的第二支臂，第二支臂的底部安装有所述容纳座（36）。
  9. 根据权利要求8所述的晶圆干燥设备摆动机构，其特征在于，第一支臂转动连接于转动安装座（35）上，第一支臂中间具有滑动槽（321），所述滑动安装块（34）上设置有位于滑动槽（321）内的滑轮（341）。
  10. 根据权利要求9所述的晶圆干燥设备摆动机构，其特征在于，所述滑动安装块（34）向下方延伸形成延伸部（342），所述滑轮（341）设置在延伸部（342）上。
PCT/CN2023/093358 2022-06-22 2023-05-11 一种晶圆干燥设备摆动机构 WO2023246353A1 (zh)

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