WO2023237313A1 - Ombrographie à plusieurs longueurs d'onde pour une source de rayonnement euv - Google Patents
Ombrographie à plusieurs longueurs d'onde pour une source de rayonnement euv Download PDFInfo
- Publication number
- WO2023237313A1 WO2023237313A1 PCT/EP2023/063396 EP2023063396W WO2023237313A1 WO 2023237313 A1 WO2023237313 A1 WO 2023237313A1 EP 2023063396 W EP2023063396 W EP 2023063396W WO 2023237313 A1 WO2023237313 A1 WO 2023237313A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- radiation
- fuel
- wavelength
- target location
- emitting device
- Prior art date
Links
- 230000005855 radiation Effects 0.000 title claims abstract description 282
- 239000000446 fuel Substances 0.000 claims abstract description 157
- 238000000034 method Methods 0.000 claims abstract description 24
- 238000001900 extreme ultraviolet lithography Methods 0.000 claims abstract description 3
- 230000003287 optical effect Effects 0.000 claims description 13
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- 238000001228 spectrum Methods 0.000 description 22
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- 230000008016 vaporization Effects 0.000 description 12
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- 238000009826 distribution Methods 0.000 description 11
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- 238000002955 isolation Methods 0.000 description 2
- 230000015654 memory Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000000087 stabilizing effect Effects 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
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- 239000004973 liquid crystal related substance Substances 0.000 description 1
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Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
- H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- X-Ray Techniques (AREA)
Abstract
La présente invention concerne un système de métrologie (100, 300, 400) permettant d'analyser le combustible à un emplacement cible dans une source de rayonnement EUV. Le système de métrologie comprend au moins un dispositif émetteur de rayonnement (105, 110, 115, 305, 310, 315, 405, 410, 415) conçu pour émettre un rayonnement dirigé vers l'emplacement cible (120, 320, 420). Le système de métrologie comprend également au moins un dispositif sensible au rayonnement (150, 350, 450) conçu pour détecter le rayonnement de l'au moins un dispositif émetteur de rayonnement ayant traversé le combustible à l'emplacement cible. L'au moins un dispositif d'émission de rayonnement est conçu pour émettre un rayonnement d'au moins deux longueurs d'onde différentes. Une source de rayonnement (SO) pour un appareil de lithographie EUV, et un procédé d'analyse d'un combustible à un emplacement cible dans une telle source de rayonnement EUV sont également divulgués.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP22178178.4 | 2022-06-09 | ||
| EP22178178 | 2022-06-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2023237313A1 true WO2023237313A1 (fr) | 2023-12-14 |
Family
ID=82016398
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/EP2023/063396 WO2023237313A1 (fr) | 2022-06-09 | 2023-05-17 | Ombrographie à plusieurs longueurs d'onde pour une source de rayonnement euv |
Country Status (1)
| Country | Link |
|---|---|
| WO (1) | WO2023237313A1 (fr) |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5604588A (en) | 1995-07-20 | 1997-02-18 | United States Of America As Represented By The Secretary Of The Army | Imaging plasma in nonlinear limiter cells |
| US8809823B1 (en) * | 2013-09-26 | 2014-08-19 | Asml Netherlands B.V. | System and method for controlling droplet timing and steering in an LPP EUV light source |
| US9778022B1 (en) | 2016-09-14 | 2017-10-03 | Asml Netherlands B.V. | Determining moving properties of a target in an extreme ultraviolet light source |
| WO2019057409A1 (fr) * | 2017-09-20 | 2019-03-28 | Asml Netherlands B.V. | Source de rayonnement |
| US20200057381A1 (en) | 2018-08-14 | 2020-02-20 | Taiwan Semiconductor Manufacturing Co., Ltd. | Process system and operating method thereof |
| US10955751B2 (en) * | 2017-11-09 | 2021-03-23 | Gigaphoton Inc. | Extreme ultraviolet light generation apparatus and electronic device manufacturing method |
| WO2022008145A1 (fr) | 2020-07-06 | 2022-01-13 | Asml Netherlands B.V. | Systèmes et procédés d'alignement de laser sur une gouttelette |
| WO2022023201A1 (fr) * | 2020-07-30 | 2022-02-03 | Asml Netherlands B.V. | Métrologie cible de source de lumière euv |
-
2023
- 2023-05-17 WO PCT/EP2023/063396 patent/WO2023237313A1/fr unknown
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5604588A (en) | 1995-07-20 | 1997-02-18 | United States Of America As Represented By The Secretary Of The Army | Imaging plasma in nonlinear limiter cells |
| US8809823B1 (en) * | 2013-09-26 | 2014-08-19 | Asml Netherlands B.V. | System and method for controlling droplet timing and steering in an LPP EUV light source |
| US9778022B1 (en) | 2016-09-14 | 2017-10-03 | Asml Netherlands B.V. | Determining moving properties of a target in an extreme ultraviolet light source |
| WO2019057409A1 (fr) * | 2017-09-20 | 2019-03-28 | Asml Netherlands B.V. | Source de rayonnement |
| US10955751B2 (en) * | 2017-11-09 | 2021-03-23 | Gigaphoton Inc. | Extreme ultraviolet light generation apparatus and electronic device manufacturing method |
| US20200057381A1 (en) | 2018-08-14 | 2020-02-20 | Taiwan Semiconductor Manufacturing Co., Ltd. | Process system and operating method thereof |
| WO2022008145A1 (fr) | 2020-07-06 | 2022-01-13 | Asml Netherlands B.V. | Systèmes et procédés d'alignement de laser sur une gouttelette |
| WO2022023201A1 (fr) * | 2020-07-30 | 2022-02-03 | Asml Netherlands B.V. | Métrologie cible de source de lumière euv |
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