WO2023219010A1 - Composition de résine, film, filtre optique, élément d'imagerie à l'état solide, dispositif d'affichage d'images, capteur infrarouge, module d'appareil de prise de vue, et composé - Google Patents

Composition de résine, film, filtre optique, élément d'imagerie à l'état solide, dispositif d'affichage d'images, capteur infrarouge, module d'appareil de prise de vue, et composé Download PDF

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Publication number
WO2023219010A1
WO2023219010A1 PCT/JP2023/016844 JP2023016844W WO2023219010A1 WO 2023219010 A1 WO2023219010 A1 WO 2023219010A1 JP 2023016844 W JP2023016844 W JP 2023016844W WO 2023219010 A1 WO2023219010 A1 WO 2023219010A1
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group
compound
formula
resin composition
substituent
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PCT/JP2023/016844
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English (en)
Japanese (ja)
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一成 八木
直幸 花木
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富士フイルム株式会社
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Publication of WO2023219010A1 publication Critical patent/WO2023219010A1/fr

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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C311/00—Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
    • C07C311/01—Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms
    • C07C311/02—Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
    • C07C311/09—Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton the carbon skeleton being further substituted by at least two halogen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D495/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms
    • C07D495/12—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms in which the condensed system contains three hetero rings
    • C07D495/14—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/10—Compounds having one or more C—Si linkages containing nitrogen having a Si-N linkage
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F220/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00—Other synthetic dyes of known constitution
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/006—Preparation of organic pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B11/00—Filters or other obturators specially adapted for photographic purposes

Definitions

  • the present invention relates to a resin composition containing an infrared absorbing dye.
  • the present invention also relates to a film, an optical filter, a solid-state image sensor, an image display device, an infrared sensor, and a camera module using the resin composition.
  • the invention also relates to compounds.
  • CCDs charge-coupled devices
  • CMOSs complementary metal oxide semiconductors
  • These solid-state image sensors use silicon photodiodes sensitive to infrared rays in their light receiving portions. For this reason, an infrared cut filter may be provided to correct visibility.
  • Infrared cut filters are manufactured using resin compositions containing infrared absorbing dyes and resins.
  • Patent Document 1 describes that an infrared cut filter or the like is manufactured using a resin composition containing an infrared absorbing dye containing an iminium compound and a resin.
  • an object of the present invention is to provide a resin composition that can form a film with excellent heat resistance and light resistance.
  • Another object of the present invention is to provide a film, an optical filter, a solid-state image sensor, an image display device, an infrared sensor, a camera module, and a compound.
  • the present invention provides the following. ⁇ 1> At least one infrared absorbing dye A selected from a dye A1 represented by formula (1) and a dye multimer A2 containing two or more dye structures derived from the dye A1 in one molecule, A resin composition comprising a resin;
  • R L101 to R L105 represent a hydrogen atom or a substituent
  • R L103 and R L104 combine to form a ring.
  • X 101 to X 103 each independently represent a nitrogen atom or -CR X101 -
  • R X101 represents a hydrogen atom or a substituent
  • X 104 and X 105 each independently represent a nitrogen atom or -CR X102 -
  • R represents a hydrogen atom or a substituent
  • R Ar101 and R Ar102 each represent independently represents a hydrogen atom or a substituent
  • n101 represents an integer of 1 to 3
  • Y 101 and Y 102 each independently represent -OR Y101 , -NR Y102 RY103 or -SR Y104
  • R Y101 to R Y104 each independently represent
  • X 103 in the above formula (1) is -CR X101 -, R X101 is a hydrogen atom or a substituent, The resin composition according to ⁇ 1>, wherein L 102 and L 103 are each a sulfur atom.
  • X 103 in the above formula (1) is -CR X101 -
  • R X101 is a hydrogen atom or a substituent
  • L 102 and L 103 are each a sulfur atom
  • R L103 and R L104 are each independently a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, is an aryl group or a heteroaryl group
  • Y 101 and Y 102 are each independently -NR Y102 R Y103
  • R Y102 and R Y103 are each independently a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heteroaryl
  • R Y102 and R Y103 may be bonded via a single bond or a divalent linking group to form a ring.
  • ⁇ 7> The resin composition according to ⁇ 6>, wherein the maximum absorption wavelength of the infrared absorbing agent other than the infrared absorbing dye A is on the shorter wavelength side than the maximum absorption wavelength of the infrared absorbing dye A.
  • ⁇ 8> The resin composition according to any one of ⁇ 1> to ⁇ 7>, wherein the maximum absorption wavelength of the infrared absorbing dye A is in a wavelength range of 700 to 1800 nm.
  • ⁇ 10> A film obtained using the resin composition according to any one of ⁇ 1> to ⁇ 9>.
  • An optical filter comprising the film according to ⁇ 10>.
  • ⁇ 12> A solid-state imaging device comprising the film according to ⁇ 10>.
  • ⁇ 13> An image display device including the film according to ⁇ 10>.
  • Ar 401 represents an aryl group or a heteroaryl group
  • R 401 to R 404 each independently represent a hydrogen atom, an alkyl group, an aryl group or a heteroaryl group
  • R 405 and R 406 each independently represent an alkyl group, an aryl group, a heteroaryl group, an aryloxy group, a heteroaryloxy group, an alkoxy group or a cyano group
  • R 407 and R 408 each independently represent an alkyl group or an aryl group
  • n401 and n402 each independently represent an integer from 0 to 4
  • q4 represents 1 or 2
  • Z 4 represents a q4-valent counteranion.
  • Ar 501 represents an aryl group or a heteroaryl group
  • R 501 to R 504 each independently represent a hydrogen atom, an alkyl group, an aryl group or a heteroaryl group
  • R 505 and R 506 each independently represent an alkyl group, an aryl group, a heteroaryl group, an aryloxy group, a heteroaryloxy group, an alkoxy group or a cyano group
  • n 501 and n 502 each independently represent an integer from 0 to 4
  • q5 represents 1 or 2
  • Z 5 represents a q5-valent counteranion.
  • the present invention it is possible to provide a resin composition that can form a film with excellent heat resistance and light resistance. Further, the present invention can provide a film, an optical filter, a solid-state imaging device, an image display device, an infrared sensor, a camera module, and a compound.
  • FIG. 1 is a schematic diagram showing one embodiment of an infrared sensor.
  • ⁇ is used to include the numerical values described before and after it as a lower limit and an upper limit.
  • the description that does not indicate substituted or unsubstituted includes a group having a substituent (atomic group) as well as a group having no substituent (atomic group).
  • the term "alkyl group” includes not only an alkyl group without a substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
  • exposure includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams, unless otherwise specified.
  • the light used for exposure include actinic rays or radiation such as the bright line spectrum of a mercury lamp, far ultraviolet rays typified by excimer laser, extreme ultraviolet rays (EUV light), X-rays, and electron beams.
  • EUV light extreme ultraviolet rays
  • (meth)acrylate” represents acrylate and/or methacrylate
  • (meth)acrylic represents both acrylic and/or methacrylic
  • (meth)acrylate” represents acrylic and/or methacrylate.
  • Acryloyl refers to acryloyl and/or methacryloyl.
  • the weight average molecular weight and number average molecular weight are defined as polystyrene equivalent values measured by gel permeation chromatography (GPC).
  • GPC gel permeation chromatography
  • Me in the chemical formula represents a methyl group
  • Et represents an ethyl group
  • Bu represents a butyl group
  • Ph represents a phenyl group.
  • infrared rays refer to light (electromagnetic waves) with a wavelength of 700 to 2500 nm.
  • the total solid content refers to the total mass of all components of the composition excluding the solvent.
  • the term "process” is used not only to refer to an independent process, but also to include any process that achieves the intended effect even if it cannot be clearly distinguished from other processes. .
  • the resin composition of the present invention includes at least one infrared absorbing dye A selected from a dye A1 represented by formula (1) and a dye multimer A2 containing two or more dye structures derived from the dye A1 in one molecule; It is characterized by containing a resin.
  • the resin composition of the present invention By using the resin composition of the present invention, a film with excellent heat resistance and light resistance can be formed. It is presumed that the infrared absorbing dye A is likely to form associations in the resin during film formation. By associating infrared absorbing dye A in the resin, the frequency of contact with chemical species that induce decomposition such as oxygen and water is reduced, and the decomposition of infrared absorbing dye A is suppressed, resulting in excellent heat resistance and light resistance. It is presumed that a film could be formed.
  • the resin composition of the present invention can be used as a resin composition for optical filters.
  • Types of optical filters include infrared cut filters and infrared transmission filters.
  • the resin composition of the present invention comprises at least one infrared absorbing dye A2 selected from a dye A1 represented by formula (1) and a dye multimer A2 containing two or more dye structures derived from the above-mentioned dye A1 in one molecule. including.
  • the above-mentioned infrared absorbing dye will also be referred to as a specific infrared absorbing dye.
  • the specific infrared absorbing dye may be a dye or a pigment.
  • the specific infrared absorbing dye preferably has a solubility of 0.1 g/100 g or less at 25° C. in both propylene glycol monomethyl ether acetate and water.
  • the average particle size of the pigment is preferably 20 to 300 nm, more preferably 25 to 250 nm, and even more preferably 30 to 200 nm.
  • the term "average particle size" as used herein means the average particle size of secondary particles which are aggregates of primary pigment particles.
  • the particle size distribution of the secondary particles of the pigment (hereinafter also simply referred to as “particle size distribution”) is such that the secondary particles having an average particle size of ⁇ 100 nm account for 70% by mass or more of the total, preferably 80% by mass or more. It is preferable that it is at least % by mass. Note that the particle size distribution of the secondary particles can be measured using scattering intensity distribution.
  • R L101 to R L105 include alkyl groups, alkenyl groups, alkynyl groups, aryl groups, heteroaryl groups, alkoxy groups, aryloxy groups, and alkenyloxy groups, and it is an alkyl group or an aryl group.
  • the number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4.
  • the alkyl group may be straight, branched or cyclic.
  • the alkenyl group preferably has 2 to 10 carbon atoms, more preferably 2 to 6 carbon atoms, and even more preferably 2 to 4 carbon atoms.
  • the alkenyl group may be either straight or branched.
  • the number of carbon atoms in the alkynyl group is preferably 2 to 10, more preferably 2 to 6, even more preferably 2 to 4.
  • the alkynyl group may be either straight or branched.
  • the number of carbon atoms in the aryl group is preferably 6 to 20, more preferably 6 to 12. Further, the aryl group is preferably a monocyclic aryl group.
  • the heteroaryl group preferably has a 5-membered ring or a 6-membered ring.
  • the hetero atoms constituting the ring of the heteroaryl group are preferably oxygen atoms, nitrogen atoms, and sulfur atoms.
  • the number of heteroatoms constituting the ring of the heteroaryl group is preferably 1 to 3.
  • the number of carbon atoms in the alkoxy group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4.
  • the alkoxy group may be either straight or branched.
  • the number of carbon atoms in the aryloxy group is preferably 6 to 20, more preferably 6 to 12.
  • the alkenyloxy group preferably has 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, and still more preferably 1 to 4 carbon atoms.
  • the alkenyloxy group may be either straight or branched.
  • X 101 to X 103 each independently represent a nitrogen atom or -CR X101 -, and R X101 represents a hydrogen atom or a substituent.
  • R X101 represents a hydrogen atom or a substituent.
  • R represents a substituent represented by R , an alkenyloxy group or an amino group. These groups may further have a substituent.
  • the substituent include the groups listed for the substituent T described later, a group containing an anion described below, and an ethylenically unsaturated bond-containing group.
  • the ethylenically unsaturated bond-containing group include a vinyl group, a (meth)allyl group, a (meth)acryloyl group, and the like.
  • the number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4.
  • the alkyl group may be straight, branched or cyclic.
  • the alkenyl group preferably has 2 to 10 carbon atoms, more preferably 2 to 6 carbon atoms, and even more preferably 2 to 4 carbon atoms.
  • the alkenyl group may be either straight or branched.
  • the number of carbon atoms in the alkynyl group is preferably 2 to 10, more preferably 2 to 6, even more preferably 2 to 4.
  • the alkynyl group may be either straight or branched.
  • the number of carbon atoms in the aryl group is preferably 6 to 20, more preferably 6 to 12.
  • the aryl group is preferably a monocyclic aryl group.
  • the heteroaryl group preferably has a 5-membered ring or a 6-membered ring.
  • the hetero atoms constituting the ring of the heteroaryl group are preferably oxygen atoms, nitrogen atoms, and sulfur atoms.
  • the number of heteroatoms constituting the ring of the heteroaryl group is preferably 1 to 3.
  • the number of carbon atoms in the alkoxy group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4.
  • the alkoxy group may be either straight or branched.
  • the number of carbon atoms in the aryloxy group is preferably 6 to 20, more preferably 6 to 12.
  • the alkenyloxy group preferably has 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, and still more preferably 1 to 4 carbon atoms.
  • the alkenyloxy group may be either straight or branched.
  • R More preferably, it is a monocyclic aryl group having a substituent, even more preferably a monocyclic aryl group having a substituent at the ortho position.
  • substituents include the groups listed in substituent T described below, groups containing anions described below, ethylenically unsaturated bond-containing groups, and alkyl groups, sulfo groups, carboxy groups, salts of carboxy groups, Preferably, it is a salt of a sulfo group, a group containing an anion described below, or a group containing an ethylenically unsaturated bond.
  • X 101 and X 102 in formula (1) are each independently -CR X101 -.
  • R X101 is preferably a hydrogen atom.
  • X 103 in formula (1) is preferably -CR X101 -.
  • R A monocyclic aryl group having a substituent at the ortho position is even more preferable, and a monocyclic aryl group having a substituent at the ortho position is particularly preferable.
  • R X102 represents a hydrogen atom or a substituent. Examples of the substituent represented by R X102 include the groups described above as the substituent represented by R X101 , and the preferred ranges are also the same.
  • L 102 is preferably a sulfur atom because the maximum absorption wavelength can be present on the longer wavelength side.
  • L 103 is preferably a sulfur atom because the maximum absorption wavelength can be present on the longer wavelength side. It is particularly preferable that L 102 and L 103 are each a sulfur atom
  • R Ar101 and R Ar102 examples include the groups described above as the substituent represented by R X101 , and the preferred ranges are also the same.
  • n101 represents an integer from 1 to 3, preferably 1 or 2, and more preferably 1.
  • the number of carbon atoms in the arylene group represented by Ar 101 and Ar 102 in formula (1) is preferably 6 to 20, more preferably 6 to 12. Furthermore, the arylene group is preferably a monocyclic arylene group.
  • the heterocyclic group represented by Ar 101 and Ar 102 in formula (1) is preferably a 5-membered ring or a 6-membered ring.
  • the hetero atoms constituting the ring of the heterocyclic group are preferably oxygen atoms, nitrogen atoms, and sulfur atoms.
  • the number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3.
  • a preferred embodiment includes an embodiment in which Ar 101 and Ar 102 are each independently an arylene group.
  • *2 is preferably a bond with Y 101 or Y 102 in formula (1).
  • Y 101 and Y 102 in formula (1) each independently represent -OR Y101 , -NR Y102 RY103 or -SR Y104, and R Y101 to R Y104 each independently represent a hydrogen atom or an alkyl group. , represents an alkenyl group, an alkynyl group, an aryl group, or a heteroaryl group, and R Y102 and R Y103 may be bonded via a single bond or a divalent linking group to form a ring.
  • R Y101 to R Y104 are each independently preferably an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heteroaryl group, more preferably an alkyl group or an aryl group, and preferably an aryl group. More preferred.
  • the number of carbon atoms in the alkyl group represented by R Y101 to R Y104 is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4.
  • the alkyl group may be straight, branched or cyclic.
  • the alkyl group may further have a substituent. Examples of the substituent include the groups listed for the substituent T described later, a group containing an anion described below, and an ethylenically unsaturated bond-containing group.
  • the alkenyl group represented by R Y101 to R Y104 preferably has 2 to 10 carbon atoms, more preferably 2 to 6 carbon atoms, and still more preferably 2 to 4 carbon atoms.
  • the alkenyl group may be either straight or branched.
  • the alkenyl group may further have a substituent.
  • substituents include the groups listed for the substituent T described later, a group containing an anion described below, and an ethylenically unsaturated bond-containing group.
  • the number of carbon atoms in the alkynyl group represented by R Y101 to R Y104 is preferably 2 to 10, more preferably 2 to 6, and even more preferably 2 to 4.
  • the alkynyl group may be either straight or branched.
  • the alkynyl group may further have a substituent. Examples of the substituent include the groups listed for the substituent T described later, a group containing an anion described below, and an ethylenically unsaturated bond-containing group.
  • the number of carbon atoms in the aryl group represented by R Y101 to R Y104 is preferably 6 to 20, more preferably 6 to 12. Further, the aryl group is preferably a monocyclic aryl group. The aryl group may further have a substituent. Examples of the substituent include the groups listed for the substituent T described later, a group containing an anion described below, and an ethylenically unsaturated bond-containing group.
  • the heteroaryl group represented by R Y101 to R Y104 is preferably a 5-membered ring or a 6-membered ring. The hetero atoms constituting the ring of the heteroaryl group are preferably oxygen atoms, nitrogen atoms, and sulfur atoms.
  • the number of heteroatoms constituting the ring of the heteroaryl group is preferably 1 to 3.
  • the heteroaryl group may further have a substituent. Examples of the substituent include the groups listed for the substituent T described later, a group containing an anion described below, and an ethylenically unsaturated bond-containing group.
  • -NR Y102 R Y102 and R Y103 in R Y103 may be bonded via a single bond or a divalent linking group to form a ring.
  • the divalent linking group include -CR Y111 R Y112 -, -O-, -S-, and a combination of two or more of these.
  • R Y111 and R Y112 each independently represent a hydrogen atom, a halogen atom, an alkyl group, an aryl group, or a heteroaryl group. These groups may further have a substituent. Examples of the substituent include the groups listed for the substituent T described later, a group containing an anion described below, and an ethylenically unsaturated bond-containing group.
  • Y 101 and Y 102 in formula (1) are each independently -NR Y102 R Y103 .
  • Ar 101 and X 101 may be bonded via a single bond or a divalent linking group to form a 5-membered ring or a 6-membered ring
  • Ar 101 and Y 101 may be bonded via a single bond or a divalent linking group to form a 5-membered ring or a 6-membered ring
  • Ar 102 and X 102 may be bonded via a single bond or a divalent linking group to form a 5-membered ring or a 6-membered ring
  • Ar 102 and Y 102 may be bonded via a single bond or a divalent linking group to form a 5-membered ring or a 6-membered ring.
  • Examples of the above-mentioned divalent linking group include -CR Y121 R Y122 -, -O-, -S-, and a group combining two or more of these.
  • R Y121 and R Y122 each independently represent a hydrogen atom, a halogen atom, an alkyl group, an aryl group, or a heteroaryl group. These groups may further have a substituent. Examples of the substituent include the groups listed for the substituent T described later, a group containing an anion described below, and an ethylenically unsaturated bond-containing group.
  • Z 1 in formula (1) represents a counter ion.
  • Counter ions include counter anions and counter cations.
  • the counter cation may be an inorganic cation or an organic cation.
  • inorganic cations include monovalent metal cations such as Na (sodium) cation, Li (lithium) cation, and K (potassium) cation; Mg (magnesium) cation, Ca (calcium) cation, and Sr (strontium).
  • organic cations examples include ammonium cations (tetraalkylammonium cations, trialkylammonium cations, etc.), imidazolium cations, pyridinium cations (pyridinium cations, N-methylpyridinium cations, N-ethylpyridinium cations, etc.), phosphonium cations, etc. .
  • the counter cation is preferably an inorganic cation, and more preferably a Na cation, Li cation, K cation, Mg cation, or Ba cation, because it can further improve light resistance and heat resistance.
  • the counter anion may be an organic anion or an inorganic anion.
  • Counter anions include the anion represented by formula (AN1), the anion represented by formula (AN2), the anion represented by formula (AN3), the anion represented by formula (AN4), and the anion represented by formula (AN5).
  • R AN1 and R AN2 each independently represent a halogen atom or an alkyl group, and R AN1 and R AN2 may be combined to form a ring;
  • R AN3 to R AN5 each independently represent a halogen atom or an alkyl group, and R AN3 and R AN4 , R AN4 and R AN5 , or R AN3 and R AN5 are bonded together.
  • R AN6 to R AN9 each independently represent a halogen atom, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, or a cyano group
  • RAN10 represents a halogenated hydrocarbon group which may be connected by a linking group having a nitrogen atom or an oxygen atom
  • R AN11 to R AN16 each independently represent a halogen atom or a halogenated hydrocarbon group.
  • the halogen atoms represented by R AN1 and R AN2 in formula (AN1), the halogen atoms represented by R AN3 to R AN5 in formula (AN2), and the halogen atoms represented by R AN6 to R AN9 in formula (AN3) include fluorine. Atom, chlorine atom, bromine atom, and iodine atom are mentioned, and fluorine atom is preferable.
  • the number of carbon atoms in the alkyl group represented by R AN1 and R AN2 in formula (AN1), the alkyl group represented by R AN3 to R AN5 in formula (AN2), and the alkyl group represented by R AN6 to R AN9 in formula (AN3) is , 1 to 10 are preferred, 1 to 6 are more preferred, and 1 to 3 are still more preferred.
  • the alkyl group may be linear, branched, or cyclic, preferably linear or branched, and more preferably linear.
  • the alkyl group may have a substituent or may be unsubstituted.
  • the alkyl group is preferably an alkyl group having a halogen atom as a substituent, and more preferably an alkyl group having a fluorine atom as a substituent (fluoroalkyl group). Further, the fluoroalkyl group is preferably a perfluoroalkyl group.
  • the number of carbon atoms in the aryl group represented by R AN6 to R AN9 in formula (AN3) is preferably 6 to 20, more preferably 6 to 12, and even more preferably 6.
  • the aryl group may have a substituent or may be unsubstituted. Examples of substituents include halogen atoms and alkyl groups.
  • the halogen atom is preferably a fluorine atom.
  • the alkyl group is preferably a fluoroalkyl group.
  • the number of carbon atoms in the alkoxy group represented by R AN6 to R AN9 in formula (AN3) is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 3.
  • the alkoxy group may be linear, branched, or cyclic, preferably linear or branched, and more preferably linear.
  • the alkoxy group may have a substituent or may be unsubstituted. Examples of substituents include halogen atoms and alkyl groups.
  • the halogen atom is preferably a fluorine atom.
  • the alkyl group is preferably a fluoroalkyl group.
  • the number of carbon atoms in the aryloxy group represented by R AN6 to R AN9 in formula (AN3) is preferably 6 to 20, more preferably 6 to 12, and even more preferably 6.
  • the aryloxy group may have a substituent or may be unsubstituted. Examples of substituents include halogen atoms and alkyl groups.
  • the halogen atom is preferably a fluorine atom.
  • the alkyl group is preferably a fluoroalkyl group.
  • R AN1 and R AN2 in formula (AN1) may be combined to form a ring.
  • RAN3 and RAN4 , RAN4 and RAN5 , or RAN3 and RAN5 in formula (AN2) may be bonded to form a ring.
  • RAN10 in formula (AN4) represents a halogenated hydrocarbon group which may be connected by a linking group having a nitrogen atom or an oxygen atom.
  • the halogenated hydrocarbon group refers to a monovalent hydrocarbon group substituted with a halogen atom, and is preferably a monovalent hydrocarbon group substituted with a fluorine atom.
  • the hydrocarbon group include an alkyl group and an aryl group.
  • the monovalent hydrocarbon group substituted with a halogen atom may further have a substituent.
  • the linking group having a nitrogen atom or an oxygen atom include -O-, -CO-, -COO-, -CO-NH-, and the like.
  • R AN11 to R AN16 in formula (AN5) each independently represent a halogen atom or a halogenated hydrocarbon group.
  • the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom, with a fluorine atom being preferred.
  • the halogenated hydrocarbon group is preferably an alkyl group having a halogen atom as a substituent, and more preferably an alkyl group having a fluorine atom as a substituent.
  • heteropolyacid anions and isopolyate anions include tungstate anions ([W 6 O 19 ] 2- , [W 10 O 32 ] 4- , [WO 4 ] 2-, etc.), molybdate anions ([Mo 2 O 7 ] 2- , [Mo 6 O 19 ] 2- , [Mo 8 O 26 ] 4-, etc.), phosphotungstate anions ([PW 4 O 20 ] 4- , [PW 12 O 40 ] 3- , [P 2 W 15 O 56 ] 12- , [P 2 W 17 O 61 ] 10- , [P 2 W 18 O 62 ] 6-, etc.), phosphomolybdate anion ([P 2 Mo 18 O 62 ] 6-) , [PMo 12 O 40 ] 3- ), phosphotungsten molybdate anion ([PW 12-x Mo x O 40 ] 3- (x is an integer from 1 to 11), [P 2 W 18-y Mo y O 62 ] 6- (y is an integer
  • the counter anion may be a divalent or higher anion.
  • divalent or higher anions include anions having two or more monovalent anions in one molecule, such as imide anions, methide anions, borate anions, and sulfonate anions.
  • p1 represents an integer from 0 to 5
  • q1 represents an integer from 1 to 5.
  • p1 is preferably an integer of 0 to 3, more preferably an integer of 0 to 2.
  • q1 is preferably an integer of 1 to 3, more preferably 1 or 2, and even more preferably 1.
  • p1 is an integer of 1 or more
  • the counter ion represented by Z 1 is preferably a counter anion.
  • the product of the valence of the positive charge in [ ] in formula (1) and q1 is preferably the same value as the product of the valence of the charge of the counter anion represented by Z 1 and p1.
  • p1 is an integer of 1 or more
  • the counter ion represented by Z 1 is preferably a counter cation.
  • the product of the negative charge valence in [ ] in formula (1) and q1 is preferably the same value as the product of the charge valence of the counter cation represented by Z 1 and p1.
  • Z 1 is preferably absent, that is, p1 is 0 and q1 is 1.
  • the dye A1 is a dye represented by formula (2).
  • R X111 and R X112 each independently represent a hydrogen atom or a substituent
  • X 203 represents a nitrogen atom or -CR X101 -
  • R X101 represents a hydrogen atom or a substituent
  • X 104 and X 105 each independently represent a nitrogen atom or -CR X102 -
  • R Ar201 and R Ar202 each represent independently represents a hydrogen atom or a substituent
  • n201 represents an integer of 1 to 3
  • Y 201 and Y 202 each independently represent -OR Y101 , -NR Y102 RY
  • L 201 , L 202 , L 203 , X 203 , Y 201 , Y 202 , Z 2 , q2, p2 in formula (2) are the same as L 101 , L 102 , L 103 , X 103 , Y 101 in formula (1 ) , Y 102 , Z 1 , q1, and p1, and the preferred ranges are also the same.
  • R X111 and R X112 in formula (2) include the groups described as the substituent represented by R X101 in formula (1), and the preferred ranges are also the same.
  • R X111 and R X112 in formula (2) are preferably hydrogen atoms.
  • the above X 104 and X 105 have the same meanings as X 104 and X 105 described in formula (1), and the preferred ranges are also the same.
  • R Ar201 , R Ar202 and n201 have the same meanings as R Ar101 , R Ar102 and n101 explained in formula (1), and their preferred ranges are also the same.
  • a preferred embodiment includes an embodiment in which Ar 201 and Ar 202 are each independently an arylene group.
  • *2 is preferably a bond with Y 201 or Y 202 in formula (2).
  • Ar 201 and X 201 may be bonded via a single bond or a divalent linking group to form a 5-membered ring or a 6-membered ring
  • Ar 201 and Y 201 may be bonded via a single bond or a divalent linking group to form a 5-membered ring or a 6-membered ring
  • Ar 202 and X 202 may be bonded via a single bond or a divalent linking group to form a 5-membered ring or a 6-membered ring
  • Ar 202 and Y 202 may be bonded via a single bond or a divalent linking group to form a 5-membered ring or a 6-membered ring.
  • Examples of the above-mentioned divalent linking group include -CR Y121 R Y122 -, -O-, -S-, and a group combining two or more of these.
  • R Y121 and R Y122 each independently represent a hydrogen atom, a halogen atom, an alkyl group, an aryl group, or a heteroaryl group. These groups may further have a substituent. Examples of the substituent include the groups listed for the substituent T described later, a group containing an anion described below, and an ethylenically unsaturated bond-containing group.
  • the dye A1 is a dye (compound) represented by formula (4).
  • the dye (compound) represented by formula (4) is also a compound of the present invention.
  • Ar 401 represents an aryl group or a heteroaryl group
  • R 401 to R 404 each independently represent a hydrogen atom, an alkyl group, an aryl group or a heteroaryl group
  • R 405 and R 406 each independently represent an alkyl group, an aryl group, a heteroaryl group, an aryloxy group, a heteroaryloxy group, an alkoxy group or a cyano group
  • R 407 and R 408 each independently represent an alkyl group or an aryl group
  • n401 and n402 each independently represent an integer from 0 to 4
  • q4 represents 1 or 2
  • Z 4 represents a q4-valent counteranion.
  • the number of carbon atoms in the aryl group represented by Ar 401 is preferably 6 to 20, more preferably 6 to 12. Further, the aryl group is preferably a monocyclic aryl group.
  • the heteroaryl group represented by Ar 401 is preferably a 5-membered ring or a 6-membered ring.
  • the hetero atoms constituting the ring of the heteroaryl group are preferably oxygen atoms, nitrogen atoms, and sulfur atoms.
  • the number of heteroatoms constituting the ring of the heteroaryl group is preferably 1 to 3.
  • the above aryl group and heteroaryl group may further have a substituent.
  • substituents examples include the groups listed for the substituent T described later, a group containing an anion described below, and an ethylenically unsaturated bond-containing group.
  • ethylenically unsaturated bond-containing group examples include a vinyl group, a (meth)allyl group, a (meth)acryloyl group, and the like.
  • Ar 401 is preferably an aryl group, more preferably a monocyclic aryl group, even more preferably a monocyclic aryl group having a substituent, and even more preferably a monocyclic aryl group having a substituent at the ortho position. Particularly preferred is an aryl group.
  • substituents examples include the groups listed in substituent T described below, groups containing anions described below, ethylenically unsaturated bond-containing groups, and alkyl groups, sulfo groups, carboxy groups, salts of carboxy groups, A salt of a sulfo group, a group containing an anion as described below, or a group containing an ethylenically unsaturated bond is preferable.
  • R 401 to R 404 each independently represent a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group, and preferably an alkyl group or an aryl group.
  • the number of carbon atoms in the alkyl group represented by R 401 to R 404 is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4.
  • the alkyl group may be straight, branched or cyclic.
  • the alkyl group may further have a substituent. Examples of the substituent include the groups listed for the substituent T described later, a group containing an anion described below, and an ethylenically unsaturated bond-containing group.
  • the number of carbon atoms in the aryl group represented by R 401 to R 404 is preferably 6 to 20, more preferably 6 to 12. Further, the aryl group is preferably a monocyclic aryl group. The aryl group may further have a substituent. Examples of the substituent include the groups listed for the substituent T described later, a group containing an anion described below, and an ethylenically unsaturated bond-containing group.
  • the heteroaryl group represented by R 401 to R 404 is preferably a 5-membered ring or a 6-membered ring. The hetero atoms constituting the ring of the heteroaryl group are preferably oxygen atoms, nitrogen atoms, and sulfur atoms.
  • the number of heteroatoms constituting the ring of the heteroaryl group is preferably 1 to 3.
  • the heteroaryl group may further have a substituent. Examples of the substituent include the groups listed for the substituent T described later, a group containing an anion described below, and an ethylenically unsaturated bond-containing group.
  • R 405 and R 406 each independently represent an alkyl group, an aryl group, a heteroaryl group, an aryloxy group, a heteroaryloxy group, an alkoxy group, or a cyano group.
  • n401 and n402 each independently represent an integer of 0 to 4, preferably an integer of 0 to 2, more preferably 0 or 1, and even more preferably 0.
  • Examples of the q4-valent counter anion represented by Z 4 include the above-mentioned counter anions.
  • the dye A1 is a dye (compound) represented by formula (5).
  • the dye (compound) represented by formula (5) is also a compound of the present invention.
  • Ar 501 represents an aryl group or a heteroaryl group
  • R 501 to R 504 each independently represent a hydrogen atom, an alkyl group, an aryl group or a heteroaryl group
  • R 505 and R 506 each independently represent an alkyl group, an aryl group, a heteroaryl group, an aryloxy group, a heteroaryloxy group, an alkoxy group or a cyano group
  • n 501 and n 502 each independently represent an integer from 0 to 4
  • q5 represents 1 or 2
  • Z 5 represents a q5-valent counteranion.
  • Ar 501 , R 501 to R 506 , n 501 , n 502 , q5 and Z 5 in formula (5) are the same as Ar 401 , R 401 to R 406 , n 401 , n 402 , q4 and Z 4 in formula (4) It has the same meaning as , and the preferred range is also the same.
  • the specific infrared absorbing dye may be a dye multimer A2 (hereinafter also simply referred to as a dye multimer) containing two or more dye structures derived from the above dye A1 in one molecule.
  • the dye multimer examples include a dye multimer having a repeating unit represented by formula (A) (hereinafter also referred to as dye multimer (A)), a dye multimer having a repeating unit represented by formula (C) ( (hereinafter also referred to as dye multimer (C)), the dye multimer represented by formula (D) (hereinafter also referred to as dye multimer (D)), and dye multimer (A) or dye multimer ( D) is preferred.
  • A dye multimer having a repeating unit represented by formula (A)
  • C dye multimer having a repeating unit represented by formula (C)
  • dye multimer (D) the dye multimer represented by formula (hereinafter also referred to as dye multimer (D)
  • dye multimer (A) or dye multimer ( D) is preferred.
  • the dye multimer (A) contains a repeating unit represented by formula (A).
  • the proportion of the repeating unit represented by formula (A) is preferably 10% by mass or more of all repeating units constituting the dye multimer (A), more preferably 20% by mass or more, even more preferably 30% by mass or more, Particularly preferred is 50% by mass or more.
  • the upper limit can be 100% by mass or less, or 95% by mass or less.
  • a 1 represents a trivalent linking group
  • L 1 represents a single bond or a divalent linking group
  • DyeI represents a dye structure derived from the above dye A1.
  • the trivalent linking group represented by A1 in formula (A) includes a poly(meth)acrylic linking group, a polyalkyleneimine linking group, a polyester linking group, a polyurethane linking group, a polyurea linking group, and a polyamide linking group.
  • Examples include a linking group, a polyether linking group, a polystyrene linking group, a bisphenol linking group, a novolak linking group, and a poly(meth)acrylic linking group is preferred.
  • L 1 in formula (A) represents a single bond or a divalent linking group.
  • R represents a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group.
  • the alkylene group preferably has 1 to 30 carbon atoms.
  • the upper limit is more preferably 25 or less, and even more preferably 20 or less.
  • the lower limit is more preferably 2 or more, and even more preferably 3 or more.
  • the alkylene group may be linear, branched, or cyclic.
  • the alkylene group may have a substituent or may be unsubstituted.
  • the number of carbon atoms in the arylene group is preferably 6 to 20, more preferably 6 to 12.
  • the arylene group may have a substituent or may be unsubstituted.
  • the heterocyclic group preferably has a 5-membered ring or a 6-membered ring.
  • the hetero atoms constituting the ring of the heterocyclic group are preferably oxygen atoms, nitrogen atoms, and sulfur atoms.
  • the number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3.
  • the heterocyclic group may have a substituent or may be unsubstituted.
  • L 1 is preferably an alkylene group, an arylene group, -NH-, -CO-, -O-, -COO-, -OCO-, -S-, or a linking group combining two or more of these; More preferably, the connecting group is a combination of at least one selected from arylene groups and arylene groups and one or more selected from -O-, -COO-, -OCO-, and -S-.
  • the divalent linking group represented by L 1 is also preferably a group containing -S- or -O-.
  • the number of atoms constituting the chain connecting DyeI and A 1 is preferably 2 or more, more preferably 3 or more.
  • the upper limit can be, for example, 30 or less, or 25 or less.
  • the dye structure derived from dye A1 represented by DyeI in formula (A) is preferably a residue obtained by removing one hydrogen atom from the dye (dye A1) represented by formula (1) described above. Furthermore, any of the sites X 101 to X 103 , L 101 to L 103 , Ar 101 , Ar 102 , Y 101 , and Y 102 in formula (1) includes a connecting portion with L 1 in formula (A). More preferably, X 103 in formula (1) includes a linkage with L 1 in formula (A).
  • the dye multimer (A) may contain other repeating units in addition to the repeating unit represented by formula (A).
  • Examples of other repeating units include repeating units having a polymerizable group and repeating units having an acid group.
  • the polymerizable group include ethylenically unsaturated bond-containing groups such as a vinyl group, a (meth)allyl group, and a (meth)acryloyl group.
  • the acid group include a carboxy group, a sulfo group, and a phosphoric acid group.
  • the proportion of repeating units having a polymerizable group is preferably 50% by mass or less of all repeating units constituting the dye multimer (A).
  • the lower limit is preferably 1% by mass or more, more preferably 3% by mass or more.
  • the upper limit is preferably 35% by mass or less, more preferably 30% by mass or less.
  • the proportion of repeating units having acid groups is preferably 50% by mass or less of all repeating units constituting the dye multimer (A).
  • the lower limit is preferably 1% by mass or more, more preferably 3% by mass or more.
  • the upper limit is preferably 35% by mass or less, more preferably 30% by mass or less.
  • the dye multimer (A) is produced by (1) a method of synthesizing dye A1 having a polymerizable group by addition polymerization, (2) a method of synthesizing a dye A1 having a polymerizable group, and (2) a polymer having a highly reactive functional group such as an isocyanate group, an acid anhydride group, or an epoxy group. It can be synthesized by a method such as a method of reacting a highly reactive functional group with a dye A1 having a reactive functional group (hydroxy group, primary or secondary amino group, carboxy group, etc.).
  • the dye multimer (A) is preferably a radical polymer obtained by radical polymerization using dye A1 having an ethylenically unsaturated bond.
  • the dye multimer (C) contains a repeating unit represented by formula (C).
  • the proportion of the repeating unit represented by formula (C) is preferably 10% by mass or more of all the repeating units constituting the dye multimer (C), more preferably 20% by mass or more, even more preferably 30% by mass or more, Particularly preferred is 50% by mass or more.
  • the upper limit can be 100% by mass or less, or 95% by mass or less.
  • L 3 represents a single bond or a divalent linking group
  • DyeIII represents the dye structure derived from the above dye A1
  • m represents 0 or 1.
  • L 3 in formula (C) represents a single bond or a divalent linking group.
  • Each R independently represents a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group.
  • the number of carbon atoms in the alkyl group and alkylene group is preferably 1 to 30.
  • the upper limit is more preferably 25 or less, and even more preferably 20 or less.
  • the lower limit is more preferably 2 or more, and even more preferably 3 or more.
  • the alkyl group and alkylene group may be linear, branched, or cyclic.
  • the number of carbon atoms in the aryl group and arylene group is preferably 6 to 20, more preferably 6 to 12.
  • the heterocyclic group preferably has a 5-membered ring or a 6-membered ring.
  • the hetero atoms constituting the ring of the heterocyclic group are preferably oxygen atoms, nitrogen atoms, and sulfur atoms.
  • the number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3.
  • the alkylene group, arylene group, heterocyclic group, alkyl group and aryl group may be unsubstituted or may have a substituent. Examples of the substituent include the groups listed below for substituent T, a polymerizable group, and an acid group.
  • L 3 in formula (C) is an alkylene group, an arylene group, -NH-, -CO-, -O-, -COO-, -OCO-, -S-, -SO 2 -, or a combination of two or more of these.
  • a linking group is preferred.
  • the dye structure derived from dye A1 represented by DyeIII of formula (C) is preferably a residue obtained by removing two hydrogen atoms from the dye (dye A1) represented by formula (1) described above. Furthermore, any of the sites X 101 to X 103 , L 101 to L 103 , Ar 101 , Ar 102 , Y 101 , and Y 102 in formula (1) includes a connecting portion with L 1 in formula (A). It is preferable.
  • n in formula (C) represents 0 or 1, and 1 is preferable.
  • the dye multimer (C) may contain other repeating units described for the dye multimer (A).
  • the dye multimer (D) is a compound represented by formula (D).
  • L 4 represents a (n+k)-valent linking group
  • n represents an integer from 2 to 20
  • k represents an integer from 0 to 20
  • DyeIV represents the dye structure derived from the above dye A1
  • P 4 represents a substituent
  • Each of the n DyeIVs may be different, When k is 2 or more, the plurality of P4s may be different from each other, n+k represents an integer from 2 to 20.
  • n is preferably 2 to 14, more preferably 2 to 8, particularly preferably 2 to 7, and even more preferably 2 to 6.
  • k is preferably 0 to 13.
  • the lower limit can be 1 or more, or 2 or more.
  • the upper limit is preferably 10 or less, more preferably 8 or less, even more preferably 7 or less, and even more preferably 6 or less.
  • the (n+k)-valent linking group represented by L 4 in formula (D) includes 1 to 100 carbon atoms, 0 to 10 nitrogen atoms, 0 to 50 oxygen atoms, 1 Mention may be made of groups consisting of from 3 to 200 hydrogen atoms and from 0 to 20 sulfur atoms.
  • the (n+k)-valent linking group is preferably the following structural unit or a group formed by combining two or more of the following structural units (which may form a ring structure). * in the formula below represents a bond.
  • the (n+k)-valent linking group represented by L 4 is preferably a linking group derived from a polyfunctional thiol, a linking group derived from a polyfunctional alcohol, or a linking group derived from an acid anhydride, More preferably, it is a linking group derived from a polyfunctional thiol.
  • the (n+k)-valent linking group represented by L 4 is preferably a group represented by any one of formulas (Za-1) to (Za-5).
  • La 2 represents a divalent group
  • Ta 2 represents a single bond or a divalent linking group
  • the two Ta 2s present may be the same or different from each other.
  • La 3 represents a trivalent group
  • Ta 3 represents a single bond or a divalent linking group
  • the three Ta 3s present may be the same or different from each other.
  • La 4 represents a tetravalent group
  • Ta 4 represents a single bond or a divalent linking group
  • the four Ta 4s present may be the same or different from each other. .
  • La 5 represents a pentavalent group
  • Ta 5 represents a single bond or a divalent linking group
  • the five Ta 5s present may be the same or different from each other.
  • La 6 represents a hexavalent group
  • Ta 6 represents a single bond or a divalent linking group
  • the six Ta 6s present may be the same or different from each other.
  • * represents a bond.
  • Each R independently represents a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group.
  • the number of carbon atoms in the alkyl group and alkylene group is preferably 1 to 30.
  • the upper limit is more preferably 25 or less, and even more preferably 20 or less.
  • the lower limit is more preferably 2 or more, and even more preferably 3 or more.
  • the alkyl group and alkylene group may be linear, branched, or cyclic.
  • the number of carbon atoms in the aryl group and arylene group is preferably 6 to 20, more preferably 6 to 12.
  • the heterocyclic group preferably has a 5-membered ring or a 6-membered ring.
  • the hetero atoms constituting the ring of the heterocyclic group are preferably oxygen atoms, nitrogen atoms, and sulfur atoms.
  • the number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3.
  • the alkylene group, arylene group, heterocyclic group, alkyl group and aryl group may be unsubstituted or may have a substituent. Examples of the substituent include the groups listed below for substituent T, a polymerizable group, and an acid group.
  • Examples of the trivalent group represented by La 3 include a group obtained by removing one hydrogen atom from the above divalent linking group.
  • Examples of the tetravalent group represented by La 4 include a group obtained by removing two hydrogen atoms from the above divalent linking group.
  • Examples of the pentavalent group represented by La 5 include a group obtained by removing three hydrogen atoms from the above divalent linking group.
  • Examples of the hexavalent group represented by La 6 include a group obtained by removing four hydrogen atoms from the above divalent linking group.
  • the trivalent to hexavalent groups represented by La 3 to La 6 may have the above-mentioned substituents.
  • (n+k)-valent linking groups include the linking groups described in paragraph numbers 0071 to 0072 of JP-A No. 2008-222950, and the linking groups described in paragraph number 0176 of JP-A No. 2013-029760. , and the linking groups described in paragraph numbers 0022 to 0024 of International Publication No. 2016/031442.
  • the dye structure derived from dye A1 represented by Dye IV of formula (D) is preferably a residue obtained by removing one hydrogen atom from the dye (dye A1) represented by formula (1) described above. Furthermore, any of the sites X 101 to X 103 , L 101 to L 103 , Ar 101 , Ar 102 , Y 101 , and Y 102 in formula (1) includes a connecting portion with L 1 in formula (A). More preferably, X 103 in formula (1) includes a linkage with L 1 in formula (A).
  • substituent represented by P 4 in formula (D) examples include the groups listed below for substituent T, acid groups, and polymerizable groups. Further, the substituent represented by P 4 may be a monovalent polymer chain having a repeating unit. The monovalent polymer chain having repeating units is preferably a monovalent polymer chain having repeating units derived from a vinyl compound. When k is 2 or more, the k P4s may be the same or different.
  • P 4 When P 4 is a monovalent polymer chain having repeating units and k is 1, P 4 contains 2 to 20 repeating units (preferably 2 to 15 repeating units, more preferably 2 to 15 repeating units) derived from a vinyl compound. It is preferable to use a monovalent polymer chain having 1 to 10 polymer chains. In addition, when P 4 is a monovalent polymer chain having repeating units and k is 2 or more, the average number of vinyl compound-derived repeating units in k P 4 is 2 to 20 ( The number is preferably 2 to 15, more preferably 2 to 10. When P 4 is a monovalent polymer chain having repeating units, the number of repeating units and the average value of the number of repeating units can be determined by nuclear magnetic resonance (NMR).
  • NMR nuclear magnetic resonance
  • examples of the repeating unit constituting P 4 include other repeating units explained in explaining the embodiment of the dye multimer (A) mentioned above. . It is preferable that the other repeating unit has one or more types selected from the above-mentioned repeating unit having an acid group and repeating unit having a polymerizable group.
  • the proportion of the repeating unit containing an acid group is preferably 10 to 80 mol%, and 10 to 65 mol%, based on the total repeating units of P 4 . is more preferable.
  • the proportion of the repeating unit having a polymerizable group is preferably 10 to 80 mol%, and 10 to 65 mol%, based on the total repeating units of P 4 . % is more preferable.
  • substituent T examples include the following groups.
  • Halogen atom e.g. fluorine atom, chlorine atom, bromine atom, iodine atom
  • alkyl group preferably an alkyl group having 1 to 30 carbon atoms
  • alkenyl group preferably an alkenyl group having 2 to 30 carbon atoms
  • alkynyl group preferably an alkynyl group having 2 to 30 carbon atoms
  • an aryl group preferably an aryl group having 6 to 30 carbon atoms
  • an amino group preferably an amino group having 0 to 30 carbon atoms
  • an alkoxy group preferably an amino group having 0 to 30 carbon atoms
  • 1 to 30 alkoxy groups aryloxy groups (preferably aryloxy groups having 6 to 30 carbon atoms), heteroaryloxy groups
  • acyl groups preferably acyl groups having 2 to 30 carbon atoms
  • alkoxycarbonyl groups preferably is an alkoxycarbonyl group having 2 to 30 carbon
  • atoms or atomic groups constituting the salts include alkali metal ions (Li + , Na + , K + , etc.), alkaline earth metal ions ( Ca 2+ , Mg 2+ , etc.), ammonium ions (tetraalkylammonium ions, trialkylammonium ions, etc.), imidazolium ions, pyridinium ions (pyridinium ions, N-methylpyridinium ions, N-ethylpyridinium ions, etc.), phosphonium ions, etc. can be mentioned.
  • These groups may further have a substituent when the group is a substitutable group. Examples of the substituent include the groups described above for the substituent T.
  • anion-containing group examples include a group represented by formula (P-1) and a group represented by formula (P-2).
  • Lp 1 in formula (P-1) represents a single bond or a divalent linking group.
  • the divalent linking group represented by Lp 1 is an alkylene group having 1 to 6 carbon atoms, an arylene group having 6 to 12 carbon atoms, -NR Lp1 -, -O-, -S-, -CO-, -SO 2 - Or a group consisting of a combination thereof, etc. can be mentioned.
  • At least some of the hydrogen atoms in the alkylene group are preferably substituted with fluorine atoms, and more preferably a perfluoroalkylene group.
  • alkylene groups include difluoromethylene groups, tetrafluoroethylene groups, hexafluoropropylene groups, and the like. It is preferable that at least some of the hydrogen atoms of the arylene group are substituted with fluorine atoms.
  • Specific examples of such an arylene group include a tetrafluorophenylene group, a hexafluoro-1-naphthylene group, a hexafluoro-2-naphthylene group, and the like.
  • Lp 1 in formula (P-1) is a single bond, a group consisting of a combination of -NR Lp1 -, -SO 2 and an alkylene group containing a fluorine atom, or a combination of -O- and an arylene group containing a fluorine atom. or a group consisting of a combination of -NR Lp1 -, -SO 2 and an alkylene group containing a fluorine atom.
  • Xp 1 in formula (P-1) represents -SO 3 - , -COO - , -PO 4 H - or an anion containing a boron atom, and is preferably -SO 3 - or -COO - .
  • Lp 2 in formula (P-2) represents a single bond or a divalent linking group, and is preferably a single bond.
  • Examples of the divalent linking group represented by Lp 2 include an alkylene group having 1 to 6 carbon atoms, an arylene group having 6 to 12 carbon atoms, -O-, -S-, or a group consisting of a combination thereof.
  • Lp 3 in formula (P-2) represents -SO 2 - or -CO-, and preferably -SO 2 -.
  • G in formula (P-2) represents a carbon atom or a nitrogen atom, and is preferably a nitrogen atom.
  • n in formula (P-2) represents 2 when G is a carbon atom, and represents 1 when G is a nitrogen atom.
  • Rp 1 in formula (P-2) represents an alkyl group containing a fluorine atom or an aryl group containing a fluorine atom.
  • the number of carbon atoms in the alkyl group containing a fluorine atom represented by Rp 1 is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 3.
  • the number of carbon atoms in the fluorine atom-containing aryl group represented by Rp 1 is preferably 6 to 20, more preferably 6 to 14, and even more preferably 6 to 10.
  • the alkyl group containing a fluorine atom and the aryl group containing a fluorine atom may further have a substituent. Examples of the substituent include the groups listed above for the substituent T.
  • the LUMO (Lowest Unoccupied Molecular Orbital) level of the dye A1 is high.
  • the LUMO level of the dye A1 is preferably ⁇ 6.5 eV or higher, more preferably ⁇ 6.0 eV or higher, and still more preferably ⁇ 5.5 eV or higher.
  • the LUMO level of the dye A1 is determined by, for example, optimizing the structure of the cation moiety of the dye A1 using the quantum chemical calculation program Gaussian09 under conditions of functional B3LYP/basis set 6-31g(d)/vacuum. It can be determined by performing calculations.
  • Specific examples of specific infrared absorbing dyes include compounds having the structures shown below. Resonance structures of these compounds are also mentioned as specific examples of specific compounds. In the structural formula shown below, Bu represents a butyl group and Ph represents a phenyl group.
  • the compound represented by formula (4) can be synthesized using a known method according to the following synthesis scheme, for example.
  • the types and amounts of the solvent, catalyst, and reagent used, as well as synthesis conditions such as reaction time and reaction temperature, can be adjusted as appropriate.
  • Compound 4A is reacted with a brominating agent such as N-bromosuccinimide (NBS) to provide compound 4B. Thereafter, bispinacolborane is reacted in the presence of a palladium catalyst to obtain 4C in which bromine is replaced with boron.
  • the bromine moiety of Compound 4D synthesized by a known method is lithiated with alkyllithium, and then reacted with a dichlorosilicon compound to obtain Compound 4E.
  • Compound 4E is reacted with an alkyllithium and then reacted with 1,2-dibromo-1,1,2,2,-tetrachloroethane to obtain compound 4F.
  • Compound 4C and Compound 4F are reacted in the presence of a palladium catalyst (Suzuki-Miyaura reaction conditions) to obtain Compound 4G.
  • Compound 4G is reacted under acidic conditions to deprotect the acetal moiety, and compound 4H is synthesized.
  • Compound 4I is obtained by reacting Compound 4H with a Grignard reagent. Thereafter, a reaction is performed under acidic conditions to obtain compound 4J.
  • a salt compound having the desired anion By reacting Compound 4J with a salt compound having the desired anion, a compound represented by formula (4) in which the chloride anion is replaced with the desired anion can be obtained.
  • the compound represented by formula (5) can be synthesized in the same manner except for using thionyl chloride instead of the dichlorosilicon compound in the compound 4E synthesis step in the synthesis of the compound represented by formula (4).
  • a compound represented by formula (5) can be synthesized using the formula (5).
  • the maximum absorption wavelength of the specific infrared absorbing dye is preferably in a wavelength range of 700 to 1800 nm, more preferably in a wavelength range of 1000 to 1800 nm, and even more preferably in a wavelength range of 1030 to 1750 nm. , it is even more preferable that the wavelength be in the range of 1050 to 1700 nm, and still more preferably be in the wavelength range of 1070 to 1650 nm.
  • the ratio of the absorbance A max at the maximum absorption wavelength of the specific infrared absorbing dye to the absorbance A max +200 at the maximum absorption wavelength + 200 nm, A max + 200 /A max is preferably 4.5 or more, and preferably 10 or more. is more preferable, and even more preferably 30 or more.
  • the upper limit is preferably 90 or less, for example. According to this aspect, it is possible to form an optical filter with excellent contrast between infrared transmittance and light blocking performance.
  • the content of the specific infrared absorbing dye is preferably 1% by mass or more, more preferably 2% by mass or more, and even more preferably 5% by mass or more based on the total solid content of the resin composition.
  • the upper limit of the content of the specific infrared absorbing dye is preferably 50% by mass or less, more preferably 40% by mass or less, and even more preferably 30% by mass or less.
  • the resin composition may contain only one type of specific infrared absorbing dye, or may contain two or more types. When two or more types are included, it is preferable that their total amount falls within the above range.
  • the resin composition of the present invention can contain an infrared absorber (another infrared absorber) other than the above-mentioned specific infrared absorbing dye. Furthermore, by containing other infrared absorbers, it is possible to form a film that can block infrared rays in a wider wavelength range.
  • Other infrared absorbers may be dyes or pigments.
  • the maximum absorption wavelength of the other infrared absorbent is preferably within a wavelength range of 700 to 1800 nm, more preferably within a wavelength range of 1000 to 1800 nm, and even more preferably within a wavelength range of 1030 to 1750 nm.
  • the wavelength range is from 1050 to 1700 nm, even more preferably from 1070 to 1650 nm.
  • the maximum absorption wavelength of the other infrared absorbing agent is preferably on the shorter wavelength side than the maximum absorption wavelength of the above-mentioned specific infrared absorbing dye.
  • the difference between the maximum absorption wavelength of other infrared absorbers and the maximum absorption wavelength of the above-mentioned specific infrared absorbing dye is 50 to 1000 nm because it is possible to form a film that can block infrared rays in a wider wavelength range. It is preferable that there be.
  • the upper limit is preferably 800 nm or less, more preferably 500 nm or less.
  • the lower limit is preferably 100 nm or more, more preferably 150 nm or more.
  • infrared absorbers include pyrrolopyrrole compounds, polymethine compounds, squarylium compounds, phthalocyanine compounds, naphthalocyanine compounds, quaterylene compounds, merocyanine compounds, croconium compounds, oxonol compounds, iminium compounds, dithiol compounds, triarylmethane compounds, and pyrromethene compounds. , azomethine compounds, anthraquinone compounds, dibenzofuranone compounds, dithiolene metal complexes, metal oxides, metal borides, and the like. As other infrared absorbers, polymethine compounds, squarylium compounds, and oxonol compounds are preferably used.
  • These compounds generally tend to have low heat resistance and light resistance, but by using them together with the above-mentioned specific infrared-absorbing dyes, they can be adsorbed to the aggregates of the above-mentioned specific infrared-absorbing dyes during film formation. It is presumed that the specific infrared absorbing dye forms an association with the specific infrared absorbing dye, and it is possible to form a film with excellent light resistance and heat resistance, so that the effects of the present invention are more significantly exhibited.
  • Examples of pyrrolopyrrole compounds include compounds described in paragraph numbers 0016 to 0058 of JP2009-263614A, compounds described in paragraphs 0037 to 0052 of JP2011-068731A, and compounds described in WO2015/166873A. Examples include compounds described in paragraph numbers 0010 to 0033. Examples of squarylium compounds include compounds described in paragraph numbers 0044 to 0049 of JP-A No. 2011-208101, compounds described in paragraph numbers 0060 to 0061 of Japanese Patent No. 6065169, and paragraph number 0040 of International Publication No. 2016/181987.
  • 2012-077153 oxytitanium phthalocyanine described in JP-A 2006-343631, and paragraphs 0013 to 0029 of JP-A 2013-195480.
  • the vanadium phthalocyanine compound described in Patent No. 6081771 and the compound described in International Publication No. 2020/071470.
  • naphthalocyanine compounds include compounds described in paragraph number 0093 of JP-A No. 2012-077153.
  • dithiolene metal complex include compounds described in Japanese Patent No. 5733804.
  • metal oxide examples include indium tin oxide, antimony tin oxide, zinc oxide, Al-doped zinc oxide, fluorine-doped tin dioxide, niobium-doped titanium dioxide, and tungsten oxide.
  • metal borides include lanthanum boride.
  • Commercially available lanthanum boride products include LaB 6 -F (manufactured by Nippon Shinkinzoku Co., Ltd.).
  • a metal boride the compound described in International Publication No. 2017/119394 can also be used.
  • commercially available indium tin oxide products include F-ITO (manufactured by DOWA Hitech Co., Ltd.).
  • infrared absorbers include squarylium compounds described in JP2017-197437A, squarylium compounds described in JP2017-025311A, squarylium compounds described in International Publication No. 2016/154782, and Japanese Patent No. 5884953.
  • Linked squarylium compounds compounds having a pyrrole bis-type squarylium skeleton or croconium skeleton described in JP 2017-141215, dihydrocarbazole bis-type squarylium compounds described in JP 2017-082029, JP 2017-068120 Asymmetric compounds described in paragraph numbers 0027 to 0114 of the publication, pyrrole ring-containing compounds (carbazole type) described in JP 2017-067963, phthalocyanine compounds described in Patent No. 6251530, etc. are used. You can also do that.
  • tungsten oxide represented by the following formula described in paragraph number 0025 of European Patent No. 3,628,645 can also be used.
  • M 1 and M 2 represent ammonium cations or metal cations, a is 0.01 to 0.5, b is 0 to 0.5, c is 1, and d is 2.5 to 3.
  • e is 0.01 to 0.75, n is 1, 2 or 3, m is 1, 2 or 3, and R represents a hydrocarbon group which may have a substituent. represent.
  • the content of the other infrared absorbing agent is preferably 5 to 500 parts by mass based on 100 parts by mass of the above-mentioned specific infrared absorbing dye.
  • the upper limit is preferably 200 parts by mass or less, more preferably 100 parts by mass or less.
  • the lower limit is preferably 10 parts by mass or more, more preferably 15 parts by mass or more.
  • the total content of the above-mentioned specific infrared absorbing dye and other infrared absorbing agent is preferably 2% by mass or more, more preferably 5% by mass or more, and 10% by mass or more based on the total solid content of the resin composition. More preferably, it is at least % by mass.
  • the upper limit of the total content is preferably 50% by mass or less, more preferably 40% by mass or less, and even more preferably 30% by mass or less.
  • the resin composition of the present invention contains a resin.
  • the resin is blended, for example, for dispersing pigments and the like in a resin composition or for use as a binder.
  • a resin used mainly for dispersing pigments and the like in a resin composition is also referred to as a dispersant.
  • this use of the resin is just one example, and the resin can also be used for purposes other than this use.
  • the weight average molecular weight of the resin is preferably 3,000 to 2,000,000.
  • the upper limit is preferably 1,000,000 or less, more preferably 500,000 or less.
  • the lower limit is preferably 4000 or more, more preferably 5000 or more.
  • resins include (meth)acrylic resin, epoxy resin, ene thiol resin, polycarbonate resin, polyether resin, polyarylate resin, polysulfone resin, polyethersulfone resin, polyphenylene resin, polyarylene ether phosphine oxide resin, polyimide resin, Examples include polyamide resin, polyamideimide resin, polyolefin resin, cyclic olefin resin, polyester resin, styrene resin, vinyl acetate resin, polyvinyl alcohol resin, polyvinyl acetal resin, polyurethane resin, and polyurea resin. One type of these resins may be used alone, or two or more types may be used in combination.
  • norbornene resin is preferable from the viewpoint of improving heat resistance.
  • Commercially available norbornene resins include, for example, the ARTON series manufactured by JSR Corporation (eg, ARTON F4520).
  • the resins include the resin described in the examples of International Publication No. 2016/088645, the resin described in JP 2017-057265, the resin described in JP 2017-032685, and the resin described in JP 2017-032685.
  • a resin having a fluorene skeleton can also be preferably used.
  • the description in US Patent Application Publication No. 2017/0102610 can be referred to, the contents of which are incorporated herein.
  • examples of the resin include resins described in paragraphs 0199 to 0233 of JP2020-186373A, alkali-soluble resins described in JP2020-186325A, and Korean Patent Publication No. 10-2020-0078339.
  • the resin represented by Formula 1, the resin described in JP-A No. 2021-134350, can also be used.
  • a resin having acid groups examples include a carboxy group, a phosphoric acid group, a sulfo group, and a phenolic hydroxy group. The number of these acid groups may be one, or two or more.
  • a resin having an acid group can also be used as a dispersant.
  • the acid value of the resin having acid groups is preferably 30 to 500 mgKOH/g.
  • the lower limit is preferably 50 mgKOH/g or more, more preferably 70 mgKOH/g or more.
  • the upper limit is preferably 400 mgKOH/g or less, more preferably 200 mgKOH/g or less, even more preferably 150 mgKOH/g or less, and most preferably 120 mgKOH/g or less.
  • a resin containing a repeating unit derived from a compound represented by formula (ED1) and/or a compound represented by formula (ED2) (hereinafter, these compounds may be referred to as "ether dimer") is used. It is also preferable to include.
  • R 1 and R 2 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms which may have a substituent.
  • R represents a hydrogen atom or an organic group having 1 to 30 carbon atoms.
  • the description in JP-A No. 2010-168539 can be referred to.
  • paragraph number 0317 of JP-A-2013-029760 can be referred to, the contents of which are incorporated herein.
  • the resin it is also preferable to use a resin having a polymerizable group.
  • the polymerizable group is preferably an ethylenically unsaturated bond-containing group and a cyclic ether group, and more preferably an ethylenically unsaturated bond-containing group.
  • R 1 represents a hydrogen atom or a methyl group
  • R 21 and R 22 each independently represent an alkylene group
  • n represents an integer of 0 to 15.
  • the alkylene group represented by R 21 and R 22 preferably has 1 to 10 carbon atoms, more preferably 1 to 5 carbon atoms, even more preferably 1 to 3 carbon atoms, and particularly 2 or 3 carbon atoms.
  • n represents an integer of 0 to 15, preferably an integer of 0 to 5, more preferably an integer of 0 to 4, even more preferably an integer of 0 to 3.
  • Examples of the compound represented by formula (X) include ethylene oxide- or propylene oxide-modified (meth)acrylate of paracumylphenol.
  • Commercially available products include Aronix M-110 (manufactured by Toagosei Co., Ltd.).
  • the resin composition of the present invention preferably contains a resin as a dispersant.
  • the dispersant include acidic dispersants (acidic resins) and basic dispersants (basic resins).
  • the acidic dispersant (acidic resin) refers to a resin in which the amount of acid groups is greater than the amount of basic groups.
  • the acidic dispersant (acidic resin) is preferably a resin in which the amount of acid groups is 70 mol % or more when the total amount of acid groups and basic groups is 100 mol %.
  • the acid group that the acidic dispersant (acidic resin) has is preferably a carboxy group.
  • the acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mgKOH/g.
  • the basic dispersant refers to a resin in which the amount of basic groups is greater than the amount of acid groups.
  • the basic dispersant (basic resin) is preferably a resin in which the amount of basic groups exceeds 50 mol% when the total amount of acid groups and basic groups is 100 mol%.
  • the basic group that the basic dispersant has is preferably an amino group.
  • the resin used as a dispersant is a graft resin.
  • the descriptions in paragraphs 0025 to 0094 of JP-A No. 2012-255128 can be referred to, the contents of which are incorporated herein.
  • the resin used as a dispersant is a polyimine-based dispersant containing a nitrogen atom in at least one of the main chain and the side chain.
  • the polyimine dispersant has a main chain having a partial structure having a functional group with a pKa of 14 or less, a side chain having 40 to 10,000 atoms, and a basic nitrogen atom in at least one of the main chain and the side chain.
  • the resin has The basic nitrogen atom is not particularly limited as long as it exhibits basicity.
  • the resin used as the dispersant has a structure in which a plurality of polymer chains are bonded to the core portion.
  • resins include dendrimers (including star-shaped polymers).
  • specific examples of dendrimers include polymer compounds C-1 to C-31 described in paragraph numbers 0196 to 0209 of JP-A No. 2013-043962.
  • the resin used as a dispersant is also preferably a resin containing a repeating unit having an ethylenically unsaturated bond-containing group in its side chain.
  • the content of the repeating unit having an ethylenically unsaturated bond-containing group in its side chain is preferably 10 mol% or more, more preferably 10 to 80 mol%, and more preferably 20 to 70 mol% of the total repeating units of the resin. More preferably, it is mol%.
  • resins described in JP 2018-087939, block copolymers (EB-1) to (EB-9) described in paragraph numbers 0219 to 0221 of Patent No. 6432077, and international publication Polyethyleneimine having a polyester side chain described in No. 2016/104803, block copolymer described in International Publication No. 2019/125940, block polymer having an acrylamide structural unit described in JP 2020-066687, A block polymer having an acrylamide structural unit described in JP-A No. 2020-066688, a dispersant described in International Publication No. 2016/104803, etc. can also be used.
  • Dispersants are also available as commercial products, and specific examples include the DISPERBYK series manufactured by BYK Chemie, the SOLSPERSE series manufactured by Japan Lubrizol, the Efka series manufactured by BASF, and Ajinomoto Fine Techno Co., Ltd. Examples include the Ajisper series manufactured by Manufacturer. Further, the product described in paragraph number 0129 of JP 2012-137564A and the product described in paragraph number 0235 of JP 2017-194662A can also be used as a dispersant.
  • the content of the resin in the total solid content of the resin composition is preferably 1 to 95% by mass.
  • the lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, even more preferably 7% by mass or more, and particularly preferably 10% by mass or more.
  • the upper limit is preferably 90% by mass or less, more preferably 85% by mass or less.
  • the content of the resin in the total solid content of the resin composition is preferably 1 to 75% by mass.
  • the upper limit is preferably 70% by mass or less, more preferably 65% by mass or less.
  • the lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, even more preferably 7% by mass or more, and particularly preferably 10% by mass or more.
  • the content of the resin as a dispersant in the total solid content of the resin composition is preferably 0.1 to 40% by mass.
  • the upper limit is preferably 25% by mass or less, more preferably 20% by mass or less.
  • the lower limit is preferably 0.5% by mass or more, more preferably 1% by mass or more.
  • the content of the resin as a dispersant is preferably 1 to 200 parts by weight per 100 parts by weight of the pigment.
  • the upper limit is preferably 150 parts by mass or less, more preferably 125 parts by mass or less, and even more preferably 100 parts by mass or less.
  • the lower limit is preferably 2.5 parts by mass or more, more preferably 5 parts by mass or more, and even more preferably 10 parts by mass or more.
  • the resin composition of the present invention may contain only one type of resin, or may contain two or more types of resin. When two or more types of resin are included, the total amount thereof is preferably within the above range.
  • the resin composition of the present invention contains a solvent.
  • the solvent include water and organic solvents, with organic solvents being preferred.
  • the organic solvent include ester solvents, ketone solvents, alcohol solvents, amide solvents, ether solvents, and hydrocarbon solvents.
  • paragraph number 0223 of International Publication No. 2015/166779 can be referred to, the contents of which are incorporated herein.
  • Ester solvents substituted with a cyclic alkyl group and ketone solvents substituted with a cyclic alkyl group can also be preferably used.
  • organic solvents include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2 -Heptanone, 2-pentanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol Acetate, butyl carbitol acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, 3-methoxy-N,N-dimethylpropanamide, 3-butoxy-N
  • aromatic hydrocarbons benzene, toluene, xylene, ethylbenzene, etc.
  • organic solvents for environmental reasons (for example, 50 mass ppm (parts) based on the total amount of organic solvents). per million), 10 mass ppm or less, and 1 mass ppm or less).
  • an organic solvent with a low metal content it is preferable to use an organic solvent with a low metal content, and the metal content of the organic solvent is preferably 10 mass ppb (parts per billion) or less, for example. If necessary, an organic solvent at a mass ppt (parts per trillion) level may be used, and such an organic solvent is provided by Toyo Gosei Co., Ltd. (Kagaku Kogyo Nippo, November 13, 2015).
  • Examples of methods for removing impurities such as metals from organic solvents include distillation (molecular distillation, thin film distillation, etc.) and filtration using a filter.
  • the filter pore diameter of the filter used for filtration is preferably 10 ⁇ m or less, more preferably 5 ⁇ m or less, and even more preferably 3 ⁇ m or less.
  • the material of the filter is preferably polytetrafluoroethylene, polyethylene, or nylon.
  • the organic solvent may contain isomers (compounds with the same number of atoms but different structures). Moreover, only one type of isomer may be included, or multiple types may be included.
  • the content of peroxide in the organic solvent is 0.8 mmol/L or less, and it is more preferable that the organic solvent contains substantially no peroxide.
  • the content of the solvent in the resin composition is preferably 10 to 97% by mass.
  • the lower limit is preferably 30% by mass or more, more preferably 40% by mass or more, even more preferably 50% by mass or more, even more preferably 60% by mass or more, and 70% by mass. It is particularly preferable that it is above.
  • the upper limit is preferably 96% by mass or less, more preferably 95% by mass or less.
  • the composition may contain only one kind of solvent, or may contain two or more kinds. When two or more types are included, it is preferable that their total amount falls within the above range.
  • the resin composition of the present invention can further contain a pigment derivative.
  • Pigment derivatives are used as dispersion aids.
  • Examples of pigment derivatives include compounds having a structure in which an acid group or a basic group is bonded to a pigment skeleton.
  • the pigment skeletons constituting the pigment derivatives include squarylium pigment skeleton, pyrrolopyrrole pigment skeleton, diketopyrrolopyrrole pigment skeleton, quinacridone pigment skeleton, anthraquinone pigment skeleton, dianthraquinone pigment skeleton, benzisoindole pigment skeleton, and thiazine indigo pigment skeleton.
  • azo dye skeleton quinophthalone dye skeleton, phthalocyanine dye skeleton, naphthalocyanine dye skeleton, dioxazine dye skeleton, perylene dye skeleton, perinone dye skeleton, benzimidazolone dye skeleton, benzothiazole dye skeleton, benzimidazole dye skeleton and benzoxazole dye skeleton can be mentioned.
  • Examples of the acid group include a carboxyl group, a sulfo group, a phosphoric acid group, a boronic acid group, a carboxylic acid amide group, a sulfonic acid amide group, an imide acid group, and salts thereof.
  • Atoms or atomic groups constituting the salt include alkali metal ions (Li + , Na + , K + , etc.), alkaline earth metal ions (Ca 2+ , Mg 2+ , etc.), ammonium ions, imidazolium ions, pyridinium ions, Examples include phosphonium ions.
  • As the carboxylic acid amide group a group represented by -NHCOR A1 is preferable.
  • a group represented by -NHSO 2 R A2 is preferable.
  • the imide acid group is preferably a group represented by -SO 2 NHSO 2 R A3 , -CONHSO 2 R A4 , -CONHCOR A5 or -SO 2 NHCOR A6 , and -SO 2 NHSO 2 R A3 is more preferred.
  • R A1 to R A6 each independently represent an alkyl group or an aryl group.
  • the alkyl group and aryl group represented by R A1 to R A6 may have a substituent.
  • the substituent is preferably a halogen atom, more preferably a fluorine atom.
  • Examples of the basic group include an amino group, a pyridinyl group and its salts, an ammonium group salt, and a phthalimidomethyl group.
  • Examples of atoms or atomic groups constituting the salt include hydroxide ions, halogen ions, carboxylate ions, sulfonate ions, and phenoxide ions.
  • pigment derivatives include compounds described in Examples below.
  • Compounds described in JP-A-10-195326, paragraph numbers 0086 to 0098 of International Publication No. 2011/024896, and paragraph numbers 0063 to 0094 of International Publication No. 2012/102399 are also included, and the contents of these are incorporated herein by reference. be incorporated into.
  • the content of the pigment derivative is preferably 1 to 50 parts by weight based on 100 parts by weight of the pigment.
  • the lower limit is preferably 3 parts by mass or more, more preferably 5 parts by mass or more.
  • the upper limit is preferably 40 parts by mass or less, more preferably 30 parts by mass or less. Only one type of pigment derivative may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount falls within the above range.
  • the resin composition of the present invention can further contain a polymerizable compound.
  • the polymerizable compound include a compound having an ethylenically unsaturated bond-containing group, a compound having a cyclic ether group, a compound having a methylol group, a compound having an alkoxymethyl group, and the like.
  • the ethylenically unsaturated bond-containing group include a vinyl group, a (meth)allyl group, a (meth)acryloyl group, and the like.
  • the cyclic ether group include an epoxy group and an oxetanyl group. It is also preferable that the polymerizable compound is a radically polymerizable compound.
  • the radically polymerizable compound include compounds having an ethylenically unsaturated bond-containing group.
  • the polymerizable compound may be in any chemical form such as a monomer, prepolymer, or oligomer, but monomers are preferred.
  • the molecular weight of the monomer-type polymerizable compound is preferably less than 2,000, more preferably 1,500 or less.
  • the lower limit of the molecular weight of the polymerizable monomer is preferably 100 or more, more preferably 200 or more.
  • the compound having an ethylenically unsaturated bond-containing group as a polymerizable monomer is preferably a 3- to 15-functional (meth)acrylate compound, more preferably a 3- to 6-functional (meth)acrylate compound.
  • Specific examples include paragraph numbers 0095 to 0108 of JP 2009-288705, paragraph 0227 of JP 2013-029760, paragraph 0254 to 0257 of JP 2008-292970, and JP 2013-253224. Described in paragraph numbers 0034 to 0038 of the publication, paragraph number 0477 of JP 2012-208494, JP 2017-048367, JP 6057891, JP 6031807, JP 2017-194662. , the contents of which are incorporated herein.
  • Examples of compounds having an ethylenically unsaturated bond-containing group include dipentaerythritol tri(meth)acrylate (commercially available product: KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetra(meth)acrylate (commercially available)
  • Examples of commercially available products include KAYARAD D-320 (manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol penta(meth)acrylate (commercially available products are KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), and dipentaerythritol hexa (meth) ) acrylate (commercially available products are KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.; NK ester A-DPH-12E; manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), and the (meth)acryloyl group
  • diglycerin EO (ethylene oxide) modified (meth)acrylate commercially available product is M-460; manufactured by Toagosei
  • pentaerythritol tetraacrylate Shin Nakamura Chemical Co., Ltd.
  • NK ester A-TMMT 1,6-hexanediol diacrylate
  • RP-1040 manufactured by Nippon Kayaku Co., Ltd.
  • Aronix TO-2349 manufactured by Nippon Kayaku Co., Ltd.
  • NK Oligo UA-7200 Shin Nakamura Chemical Co., Ltd.
  • 8UH-1006, 8UH-1012 Taisei Fine Chemical Co., Ltd.
  • Examples of compounds having an ethylenically unsaturated bond-containing group include trimethylolpropane tri(meth)acrylate, trimethylolpropanepropylene oxide-modified tri(meth)acrylate, trimethylolpropaneethylene oxide-modified tri(meth)acrylate, and isocyanuric acid ethylene oxide-modified tri(meth)acrylate. It is also preferable to use trifunctional (meth)acrylate compounds such as (meth)acrylate and pentaerythritol tri(meth)acrylate. Commercially available trifunctional (meth)acrylate compounds include Aronix M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306, M-305.
  • M-303, M-452, M-450 (manufactured by Toagosei Co., Ltd.), NK ester A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A -TMM-3LM-N, A-TMPT, TMPT (manufactured by Shin Nakamura Chemical Co., Ltd.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, PET-30 (manufactured by Nippon Kayaku Co., Ltd.) Examples include.
  • the compound having an ethylenically unsaturated bond-containing group may further have an acid group such as a carboxy group, a sulfo group, or a phosphoric acid group.
  • an acid group such as a carboxy group, a sulfo group, or a phosphoric acid group.
  • Commercially available products of such compounds include Aronix M-305, M-510, M-520, Aronix TO-2349 (manufactured by Toagosei Co., Ltd.), and the like.
  • a compound having a caprolactone structure can also be used.
  • the description in paragraphs 0042 to 0045 of JP-A No. 2013-253224 can be referred to, the contents of which are incorporated herein.
  • Examples of compounds having a caprolactone structure include DPCA-20, DPCA-30, DPCA-60, and DPCA-120, which are commercially available as a series from Nippon Kayaku Co., Ltd.
  • a compound having an ethylenically unsaturated bond-containing group and an alkyleneoxy group can also be used.
  • Such a compound is preferably a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group and/or a propyleneoxy group, and preferably a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group. More preferably, it is a 3- to 6-functional (meth)acrylate compound having 4 to 20 ethyleneoxy groups.
  • SR-494 a tetrafunctional (meth)acrylate having four ethyleneoxy groups manufactured by Sartomer, and trifunctional (meth)acrylate having three isobutyleneoxy groups manufactured by Nippon Kayaku Co., Ltd.
  • examples include KAYARAD TPA-330.
  • a polymerizable compound having a fluorene skeleton can also be used.
  • Commercially available products include Ogsol EA-0200 and EA-0300 (manufactured by Osaka Gas Chemical Co., Ltd., (meth)acrylate monomer having a fluorene skeleton).
  • the compound having an ethylenically unsaturated bond-containing group it is also preferable to use a compound substantially free of environmentally regulated substances such as toluene.
  • Commercially available products of such compounds include KAYARAD DPHA LT, KAYARAD DPEA-12 LT (manufactured by Nippon Kayaku Co., Ltd.), and the like.
  • Examples of the compound having a cyclic ether group include a compound having an epoxy group, a compound having an oxetanyl group, etc., and a compound having an epoxy group is preferable.
  • Examples of compounds having epoxy groups include compounds having 1 to 100 epoxy groups in one molecule.
  • the upper limit of the number of epoxy groups can be, for example, 10 or less, or 5 or less.
  • the lower limit of the number of epoxy groups is preferably 2 or more.
  • the compound having a cyclic ether group may be a low molecular compound (for example, molecular weight less than 1000) or a macromolecule (for example, molecular weight 1000 or more, in the case of a polymer, the weight average molecular weight is 1000 or more).
  • the weight average molecular weight of the cyclic ether group is preferably 200 to 100,000, more preferably 500 to 50,000.
  • the upper limit of the weight average molecular weight is preferably 10,000 or less, more preferably 5,000 or less, and even more preferably 3,000 or less.
  • Examples of compounds having a cyclic ether group include compounds described in paragraph numbers 0034 to 0036 of JP-A No. 2013-011869, compounds described in paragraph numbers 0147 to 0156 of JP-A-2014-043556, and JP-A No. 2014. Compounds described in paragraph numbers 0085 to 0092 of JP-A-089408 and compounds described in JP-A-2017-179172 can also be used.
  • Examples of compounds having a methylol group include compounds in which a methylol group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring.
  • Examples of compounds having an alkoxymethyl group include compounds in which an alkoxymethyl group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring.
  • Compounds in which an alkoxymethyl group or a methylol group is bonded to a nitrogen atom include alkoxymethylated melamine, methylolated melamine, alkoxymethylated benzoguanamine, methylolated benzoguanamine, alkoxymethylated glycoluril, methylolated glycoluril, alkoxymethylated Preferred are urea and methylolated urea. Further, compounds described in paragraphs 0134 to 0147 of JP-A No. 2004-295116 and paragraphs 0095 to 0126 of JP-A No. 2014-089408 can also be used.
  • the content of the polymerizable compound in the total solid content of the resin composition is preferably 0.1 to 50% by mass.
  • the lower limit is preferably 0.5% by mass or more, more preferably 1% by mass or more, and even more preferably 3% by mass or more.
  • the upper limit is preferably 40% by mass or less, more preferably 30% by mass or less, and even more preferably 25% by mass or less.
  • the resin composition of the present invention may contain only one kind of polymerizable compound, or may contain two or more kinds of polymerizable compounds. When two or more types of polymerizable compounds are included, it is preferable that the total amount thereof falls within the above range.
  • the resin composition of the present invention contains a polymerizable compound
  • the photopolymerization initiator is not particularly limited and can be appropriately selected from known photopolymerization initiators. For example, compounds having photosensitivity to light in the ultraviolet to visible range are preferred.
  • the photopolymerization initiator is preferably a radical photopolymerization initiator.
  • photopolymerization initiators include halogenated hydrocarbon derivatives (e.g., compounds with a triazine skeleton, compounds with an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole compounds, oxime compounds, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, ⁇ -hydroxyketone compounds, ⁇ -aminoketone compounds, and the like.
  • halogenated hydrocarbon derivatives e.g., compounds with a triazine skeleton, compounds with an oxadiazole skeleton, etc.
  • acylphosphine compounds e.g., acylphosphine compounds, hexaarylbiimidazole compounds, oxime compounds, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, ⁇ -hydroxyketone compounds, ⁇ -aminoketone compounds, and the like.
  • photopolymerization initiators include trihalomethyltriazine compounds, benzyl dimethyl ketal compounds, ⁇ -hydroxyketone compounds, ⁇ -aminoketone compounds, acylphosphine compounds, phosphine oxide compounds, metallocene compounds, oxime compounds, and hexaarylbylene compounds.
  • imidazole compounds onium compounds, benzothiazole compounds, benzophenone compounds, acetophenone compounds, cyclopentadiene-benzene-iron complexes, halomethyloxadiazole compounds and 3-aryl substituted coumarin compounds, oxime compounds, ⁇ -hydroxyketones
  • the compound is more preferably a compound selected from a compound, an ⁇ -aminoketone compound, and an acylphosphine compound, and even more preferably an oxime compound.
  • photopolymerization initiators compounds described in paragraphs 0065 to 0111 of JP-A-2014-130173, compounds described in Japanese Patent No. 6301489, MATERIAL STAGE 37 to 60p, vol. 19, No.
  • hexaarylbiimidazole compounds include 2,2',4-tris(2-chlorophenyl)-5-(3,4-dimethoxyphenyl)-4,5-diphenyl-1,1'-biimidazole, etc. can be mentioned.
  • ⁇ -hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, Omnirad 127 (manufactured by IGM Resins B.V.), Irgacure 184, and Irgacure 1. 173, Irgacure 2959, Irgacure 127 (all BASF (manufactured by a company).
  • Commercially available ⁇ -aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, Omnirad 379EG (manufactured by IGM Resins B.V.), Irgacure 907, and Irgacure.
  • acylphosphine compounds include Omnirad 819, Omnirad TPO (manufactured by IGM Resins B.V.), Irgacure 819, Irgacure TPO (manufactured by BASF), and the like.
  • Examples of oxime compounds include the compounds described in JP-A No. 2001-233842, the compounds described in JP-A No. 2000-080068, the compounds described in JP-A No. 2006-342166, and the compounds described in J. C. S. Perkin II (1979, pp. 1653-1660); C. S. Perkin II (1979, pp. 156-162), Journal of Photopolymer Science and Technology (1995, pp. 202-232), JP-A-2000 - Compounds described in Publication No. 066385, Compounds described in Japanese Patent Publication No. 2004-534797, compounds described in Japanese Patent Application Publication No. 2006-342166, compounds described in Japanese Patent Application Publication No. 2017-019766, compounds described in Japanese Patent No.
  • oxime compounds include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, 2-ethoxycarbonyloxyimino -1-phenylpropan-1-one, 1-[4-(phenylthio)phenyl]-3-cyclohexyl-propane-1,2-dione-2-(O-acetyloxime), and the like.
  • an oxime compound having a fluorene ring can also be used.
  • oxime compounds having a fluorene ring include compounds described in JP-A No. 2014-137466, compounds described in Japanese Patent No. 6636081, compounds described in Korean Patent Publication No. 10-2016-0109444, and Examples include fluorenylaminoketone photoinitiators described in Table 2020-507664 and oxime ester compounds described in International Publication No. 2021/023144.
  • an oxime compound having a skeleton in which at least one benzene ring of the carbazole ring is a naphthalene ring is also possible.
  • Specific examples of such oxime compounds include compounds described in International Publication No. 2013/083505.
  • an oxime compound having a fluorine atom can also be used as a photopolymerization initiator.
  • oxime compounds having a fluorine atom include compounds described in JP-A No. 2010-262028, compounds 24, 36 to 40 described in Japanese Patent Application Publication No. 2014-500852, and compounds described in JP-A No. 2013-164471. Examples include compound (C-3).
  • an oxime compound having a nitro group can be used as the photopolymerization initiator. It is also preferable that the oxime compound having a nitro group is in the form of a dimer.
  • Specific examples of oxime compounds having a nitro group include compounds described in paragraph numbers 0031 to 0047 of JP 2013-114249, paragraphs 0008 to 0012, and 0070 to 0079 of JP 2014-137466, Examples include compounds described in paragraph numbers 0007 to 0025 of Japanese Patent No. 4223071, and Adeka Arcles NCI-831 (manufactured by ADEKA Corporation).
  • an oxime compound having a benzofuran skeleton can also be used.
  • Specific examples include OE-01 to OE-75 described in International Publication No. 2015/036910.
  • photopolymerization initiator it is also possible to use an oxime compound in which a substituent having a hydroxy group is bonded to a carbazole skeleton.
  • photopolymerization initiators include compounds described in International Publication No. 2019/088055.
  • oxime compounds preferably used in the present invention are shown below, but the present invention is not limited thereto.
  • the oxime compound is preferably a compound having a maximum absorption wavelength in a wavelength range of 350 to 500 nm, more preferably a compound having a maximum absorption wavelength in a wavelength range of 360 to 480 nm.
  • the molar extinction coefficient of the oxime compound at a wavelength of 365 nm or 405 nm is preferably high, more preferably from 1000 to 300,000, even more preferably from 2000 to 300,000, and even more preferably from 5000 to 200,000. It is particularly preferable that there be.
  • the molar extinction coefficient of a compound can be measured using a known method. For example, it is preferable to measure with a spectrophotometer (Cary-5 spectrophotometer manufactured by Varian) using an ethyl acetate solvent at a concentration of 0.01 g/L.
  • a difunctional, trifunctional or more functional photoradical polymerization initiator may be used as the photopolymerization initiator.
  • a radical photopolymerization initiator two or more radicals are generated from one molecule of the radical photopolymerization initiator, so that good sensitivity can be obtained.
  • the crystallinity decreases and the solubility in solvents improves, making it difficult to precipitate over time, thereby improving the stability of the resin composition over time.
  • Specific examples of bifunctional or trifunctional or more functional photoradical polymerization initiators include those listed in Japanese Patent Publication No. 2010-527339, Japanese Patent Publication No. 2011-524436, International Publication No.
  • the content of the photopolymerization initiator is preferably 0.1 to 40% by weight, more preferably 0.5 to 35% by weight, and even more preferably 1 to 30% by weight based on the total solid content of the resin composition.
  • the resin composition may contain only one type of photopolymerization initiator, or may contain two or more types of photopolymerization initiators. When two or more types are included, it is preferable that their total amount falls within the above range.
  • the resin composition of the present invention contains a compound having a cyclic ether group, it is preferable that it further contains a curing agent.
  • the curing agent include amine compounds, acid anhydride compounds, amide compounds, phenol compounds, polyhydric carboxylic acids, and thiol compounds.
  • Specific examples of the curing agent include succinic acid, trimellitic acid, pyromellitic acid, N,N-dimethyl-4-aminopyridine, pentaerythritol tetrakis (3-mercaptopropionate), and the like.
  • the curing agent compounds described in paragraph numbers 0072 to 0078 of JP-A No. 2016-075720 and compounds described in JP-A No.
  • the content of the curing agent is preferably 0.01 to 20 parts by weight, more preferably 0.01 to 10 parts by weight, and 0.1 to 6.0 parts by weight per 100 parts by weight of the compound having a cyclic ether group. is even more preferable.
  • the resin composition of the present invention can contain a chromatic colorant.
  • a chromatic colorant means a colorant other than a white colorant and a black colorant.
  • the chromatic colorant is preferably a colorant having absorption in a wavelength range of 400 nm or more and less than 650 nm.
  • Chromatic colorants include red colorants, green colorants, blue colorants, yellow colorants, purple colorants, and orange colorants.
  • the chromatic colorant may be a pigment or a dye.
  • a pigment and a dye may be used together.
  • the pigment may be either an inorganic pigment or an organic pigment.
  • an inorganic pigment or an organic-inorganic pigment partially substituted with an organic chromophore can also be used. By replacing inorganic pigments or organic-inorganic pigments with organic chromophores, hue design can be facilitated.
  • the average primary particle diameter of the pigment is preferably 1 to 200 nm.
  • the lower limit is preferably 5 nm or more, more preferably 10 nm or more.
  • the upper limit is preferably 180 nm or less, more preferably 150 nm or less, and even more preferably 100 nm or less.
  • the average primary particle diameter of the pigment can be determined from a photograph obtained by observing the primary particles of the pigment using a transmission electron microscope. Specifically, the projected area of the primary particles of the pigment is determined, and the corresponding circular equivalent diameter is calculated as the primary particle diameter of the pigment.
  • the average primary particle diameter in the present invention is the arithmetic mean value of the primary particle diameters of 400 pigment primary particles.
  • the primary particles of pigment refer to independent particles without agglomeration.
  • the crystallite size determined from the half-width of the peak derived from any crystal plane in the X-ray diffraction spectrum when the CuK ⁇ ray of the pigment is used as the X-ray source is preferably 0.1 nm to 100 nm, and preferably 0.1 nm to 100 nm.
  • the thickness is more preferably 5 nm to 50 nm, even more preferably 1 nm to 30 nm, and particularly preferably 5 nm to 25 nm.
  • the specific surface area of the pigment is preferably 1 to 300 m 2 /g.
  • the lower limit is preferably 10 m 2 /g or more, more preferably 30 m 2 /g or more.
  • the upper limit is preferably 250 m 2 /g or less, more preferably 200 m 2 /g or less.
  • the value of the specific surface area is determined according to DIN 66131: determination of the specific surface area of solids by gas adsorption according to the BET (Brunauer, Emmett and Teller) method. Determination of specific surface area of solids by adsorption).
  • the chromatic colorant preferably contains a pigment.
  • the content of pigment in the chromatic colorant is preferably 50% by mass or more, more preferably 70% by mass or more, even more preferably 80% by mass or more, and even more preferably 90% by mass or more. It is particularly preferable. Examples of pigments include those shown below.
  • red pigments C. I. Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64 (phthalocyanine type), 65 (phthalocyanine type), 66 (phthalocyanine type), etc.
  • green pigments C. I. Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60 (triarylmethane type), 61 (xanthene type), etc.
  • purple pigments C. I. Pigment Blue 1,2,15,15:1,15:2,15:3,15:4,15:6,16,22,29,60,64,66,79,80,87 (monoazo type), 88 (methine type), etc. (the above are blue pigments).
  • halogenated zinc phthalocyanine pigments have an average number of halogen atoms in one molecule of 10 to 14, an average number of bromine atoms of 8 to 12, and an average of 2 to 5 chlorine atoms. You can also use Specific examples include compounds described in International Publication No. 2015/118720.
  • a green pigment a compound described in Chinese Patent Application No. 106909027, a phthalocyanine compound having a phosphoric acid ester as a ligand described in International Publication No. 2012/102395, a phthalocyanine compound described in JP-A No.
  • a phthalocyanine compound a phthalocyanine compound described in JP 2018-180023, a compound described in JP 2019-038958, a core-shell type dye described in JP 2020-076995, etc. can also be used.
  • an aluminum phthalocyanine compound having a phosphorus atom can also be used as the blue pigment.
  • Specific examples include compounds described in paragraph numbers 0022 to 0030 of JP-A No. 2012-247591 and paragraph number 0047 of JP-A No. 2011-157478.
  • JP 2018-062644 The quinophthalone compound described in JP 2018-203798, the quinophthalone compound described in JP 2018-062578, and Japanese Patent No. 6432076.
  • red pigment As a red pigment, a diketopyrrolopyrrole compound in which at least one bromine atom is substituted in the structure described in JP 2017-201384, a diketopyrrolopyrrole compound described in paragraph numbers 0016 to 0022 of Patent No. 6248838, Diketopyrrolopyrrole compounds described in International Publication No. 2012/102399, diketopyrrolopyrrole compounds described in International Publication No. 2012/117965, naphthol azo compounds described in JP2012-229344A, Patent No. 6516119 Red pigment described in the publication, red pigment described in Patent No.
  • the descriptions in Japanese Patent No. 6561862, Japanese Patent No. 6413872, Japanese Patent No. 6281345, and Japanese Patent Application Laid-open No. 2020-026503 can be referred to. Incorporated herein.
  • the crystallite size in the plane direction corresponding to the maximum peak in the X-ray diffraction pattern among the eight planes ( ⁇ 1 ⁇ 1 ⁇ 1) of the crystal lattice planes is 140 ⁇ or less. It is also preferable to use one.
  • Dyes can also be used as chromatic colorants. There are no particular restrictions on the dye, and any known dye can be used. For example, pyrazole azo dyes, anilinoazo dyes, triarylmethane dyes, anthraquinone dyes, anthrapyridone dyes, benzylidene dyes, oxonol dyes, pyrazolotriazole azo dyes, pyridone azo dyes, cyanine dyes, and phenothiazines. Examples include pyrrolopyrazole azomethine dyes, xanthene dyes, phthalocyanine dyes, benzopyran dyes, indigo dyes, pyrromethene dyes, and the like.
  • Pigment multimers can also be used as chromatic colorants.
  • the dye multimer is preferably a dye that is dissolved in a solvent. Further, the dye multimer may form particles. When the dye multimer is in the form of particles, it is usually used in a state of being dispersed in a solvent.
  • the dye multimer in a particle state can be obtained, for example, by emulsion polymerization, and specific examples include the compound and manufacturing method described in JP-A No. 2015-214682.
  • the dye multimer has two or more dye structures in one molecule, and preferably has three or more dye structures. The upper limit is not particularly limited, but may be 100 or less.
  • the plurality of dye structures contained in one molecule may be the same dye structure or may be different dye structures.
  • the weight average molecular weight (Mw) of the dye multimer is preferably 2,000 to 50,000.
  • the lower limit is more preferably 3,000 or more, and even more preferably 6,000 or more.
  • the upper limit is more preferably 30,000 or less, and even more preferably 20,000 or less.
  • Dye multimers are described in JP 2011-213925, JP 2013-041097, JP 2015-028144, JP 2015-030742, WO 2016/031442, etc. Compounds can also be used.
  • Chromatic colorants include triarylmethane dye polymers described in Korean Patent Publication No. 10-2020-0028160, xanthene compounds described in JP 2020-117638, and International Publication No. 2020/174991.
  • phthalocyanine compounds, isoindoline compounds or their salts described in JP-A No. 2020-160279, compounds represented by formula 1 described in Korean Published Patent No. 10-2020-0069442, Korean Published Patent No. 10- Compounds represented by formula 1 described in Korean Publication No. 2020-0069730, compounds represented by formula 1 described in Korean Publication Patent No. 10-2020-0069070, and compounds represented by formula 1 described in Korean Publication Patent No. 10-2020-0069067. Compound represented by formula 1 described in Korean Patent Publication No.
  • halogenated zinc phthalocyanine pigment described in Patent No. 6809649, JP 2020-180176 Isoindoline compounds described in JP-A No. 2021-187913, phenothiazine compounds described in JP-A No. 2021-187913, halogenated zinc phthalocyanine described in International Publication No. 2022/004261, and halogenated compounds described in International Publication No. 2021/250883.
  • Zinc phthalocyanine can be used.
  • the other colorant may be a rotaxane, and the dye skeleton may be used in the cyclic structure of the rotaxane, in the rod-like structure, or in both structures.
  • the content of the chromatic colorant is preferably 1 to 50% by mass based on the total solid content of the resin composition of the present invention.
  • the total amount thereof is preferably within the above range.
  • the resin composition of the present invention does not substantially contain a chromatic colorant.
  • the case where the resin composition of the present invention does not substantially contain a chromatic colorant means that the content of the chromatic colorant in the total solid content of the resin composition of the present invention is 0.5% by mass or less. It is preferably 0.1% by mass or less, and more preferably does not contain a chromatic colorant.
  • the resin composition of the present invention can also contain a coloring material that transmits infrared rays and blocks visible light (hereinafter also referred to as a coloring material that blocks visible light).
  • a resin composition containing a coloring material that blocks visible light is preferably used as a resin composition for forming an infrared transmission filter.
  • the coloring material that blocks visible light is preferably a coloring material that absorbs light in the wavelength range from violet to red. Further, the coloring material that blocks visible light is preferably a coloring material that blocks light in a wavelength range of 450 to 650 nm. Further, the coloring material that blocks visible light is preferably a coloring material that transmits light with a wavelength of 900 to 1500 nm.
  • the coloring material that blocks visible light preferably satisfies at least one of the following requirements (A) and (B).
  • B Contains an organic black colorant.
  • Examples of the chromatic colorant include those mentioned above.
  • Examples of the organic black colorant include bisbenzofuranone compounds, azomethine compounds, perylene compounds, and azo compounds, with bisbenzofuranone compounds and perylene compounds being preferred.
  • Examples of bisbenzofuranone compounds include compounds described in Japanese Patent Application Publication No. 2010-534726, Japanese Patent Application Publication No. 2012-515233, and Japanese Patent Application Publication No. 2012-515234, and for example, as "Irgaphor Black" manufactured by BASF. available.
  • Examples of perylene compounds include compounds described in paragraph numbers 0016 to 0020 of JP-A No. 2017-226821, C.I. I. Pigment Black 31, 32, etc.
  • Examples of the azomethine compound include compounds described in JP-A-01-170601 and JP-A-02-034664, and are available as "Chromofine Black A1103" manufactured by Dainichiseika Kaisha, Ltd., for example.
  • examples of the combination of chromatic colorants include the following embodiments (1) to (8).
  • An embodiment containing a green colorant, a blue colorant, a purple colorant, and a red colorant An embodiment containing a green colorant, a blue colorant, a purple colorant, and a red colorant.
  • Embodiment containing a purple colorant and an orange colorant Embodiment containing a green colorant, a purple colorant, and a red colorant.
  • Embodiment containing a green colorant and a red colorant Embodiment containing a green colorant and a red colorant.
  • the content of the coloring material that blocks visible light is preferably 1 to 50% by mass based on the total solid content of the resin composition.
  • the lower limit is preferably 5% by mass or more, more preferably 10% by mass or more, even more preferably 20% by mass or more, and particularly preferably 30% by mass or more.
  • the resin composition of the present invention does not substantially contain a coloring material that blocks visible light.
  • a coloring material that blocks visible light means that the content of the colorant that blocks visible light in the total solid content of the resin composition of the present invention is This means 0.5% by mass or less, preferably 0.1% by mass or less, and more preferably no coloring material that blocks visible light.
  • the resin composition of the present invention contains a surfactant.
  • a surfactant various surfactants such as fluorine surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, and silicone surfactants can be used.
  • the surfactant is preferably a silicone surfactant or a fluorine surfactant. Examples of the surfactant include the surfactants described in paragraph numbers 0238 to 0245 of International Publication No. 2015/166779, the contents of which are incorporated herein.
  • fluorine-based surfactants examples include surfactants described in paragraph numbers 0060 to 0064 of JP 2014-041318 (corresponding paragraph numbers 0060 to 0064 of WO 2014/017669), and the like; Examples include the surfactants described in paragraph numbers 0117 to 0132 of Publication No. 132503 and the surfactants described in JP-A-2020-008634, the contents of which are incorporated herein.
  • Commercially available fluorosurfactants include Megafac F-171, F-172, F-173, F-176, F-177, F-141, F-142, F-143, F-144.
  • fluorine-based surfactants there are also acrylic compounds that have a molecular structure with a functional group containing a fluorine atom, and when heated, the functional group containing a fluorine atom is cut off and the fluorine atom volatizes. It can be used suitably.
  • fluorine-based surfactants include the Megafac DS series manufactured by DIC Corporation (Kagaku Kogyo Nippo (February 22, 2016), Nikkei Sangyo Shimbun (February 23, 2016)), An example is DS-21.
  • fluorinated surfactant it is also preferable to use a polymer of a fluorine atom-containing vinyl ether compound having a fluorinated alkyl group or a fluorinated alkylene ether group and a hydrophilic vinyl ether compound as the fluorinated surfactant.
  • fluorine-based surfactants include the fluorine-based surfactants described in JP-A No. 2016-216602, the content of which is incorporated herein.
  • a block polymer can also be used as the fluorosurfactant.
  • a fluorine-based surfactant a (meth) having a repeating unit derived from a (meth)acrylate compound having a fluorine atom and two or more (preferably five or more) alkyleneoxy groups (preferably ethyleneoxy group, propyleneoxy group)
  • a fluorine-containing polymer compound containing a repeating unit derived from an acrylate compound can also be preferably used.
  • the fluorine-containing surfactants described in paragraph numbers 0016 to 0037 of JP-A-2010-032698 and the following compounds are also exemplified as the fluorine-containing surfactant used in the present invention.
  • the weight average molecular weight of the above compound is preferably 3,000 to 50,000, for example 14,000. In the above compounds, % indicating the proportion of repeating units is mol%.
  • a fluoropolymer having an ethylenically unsaturated bond-containing group in its side chain can also be used as the fluorinated surfactant.
  • Specific examples include compounds described in paragraph numbers 0050 to 0090 and paragraph numbers 0289 to 0295 of JP-A No. 2010-164965, Megafac RS-101, RS-102, RS-718K manufactured by DIC Corporation, Examples include RS-72-K.
  • the fluorine-based surfactant compounds described in paragraph numbers 0015 to 0158 of JP-A No. 2015-117327 can also be used.
  • a fluorine-containing imide salt compound represented by formula (fi-1) is also preferable to use as a surfactant.
  • m represents 1 or 2
  • n represents an integer of 1 to 4
  • a represents 1 or 2
  • X a+ represents an a-valent metal ion, a primary ammonium ion, or Represents a secondary ammonium ion, tertiary ammonium ion, quaternary ammonium ion or NH 4 + .
  • nonionic surfactants include glycerol, trimethylolpropane, trimethylolethane, and their ethoxylates and propoxylates (e.g., glycerol propoxylate, glycerol ethoxylate, etc.), polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, Polyoxyethylene oleyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene nonylphenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitan fatty acid ester, Pluronic L10, L31, L61, L62, 10R5, 17R2, 25R2 (BASF Tetronic 304, 701, 704, 901, 904, 150R1 (manufactured by BASF), Solsperse 20000 (manufactured by Japan Lubrizol Co., Ltd.), NCW-101, NCW-1001, NCW-1002 (manufactured by Japan
  • cationic surfactant examples include tetraalkylammonium salts, alkylamine salts, benzalkonium salts, alkylpyridium salts, imidazolium salts, and the like. Specific examples include dihydroxyethylstearylamine, 2-heptadecenyl-hydroxyethylimidazoline, lauryldimethylbenzylammonium chloride, cetylpyridinium chloride, stearamidemethylpyridium chloride, and the like.
  • Anionic surfactants include dodecylbenzenesulfonic acid, sodium dodecylbenzenesulfonate, sodium lauryl sulfate, sodium alkyldiphenyl ether disulfonate, sodium alkylnaphthalenesulfonate, sodium dialkylsulfosuccinate, sodium stearate, potassium oleate, sodium dioctyl Sulfosuccinate, sodium polyoxyethylene alkyl ether sulfate, sodium polyoxyethylene alkyl ether sulfate, sodium polyoxyethylene alkyl phenyl ether sulfate, sodium dialkyl sulfosuccinate, sodium stearate, sodium oleate, t-octylphenoxyethoxypolyethoxyethyl Examples include sodium sulfate salt.
  • silicone surfactants examples include SH8400, SH8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, SF 8419 OIL (manufactured by Dow Toray Industries, Inc.), TSF-4440, TSF-4300 , TSF-4445, TSF-4460, TSF-4452 (manufactured by Momentive Performance Materials), KP-341, KF-6000, KF-6001, KF-6002, KF-6003 (manufactured by Shin-Etsu Chemical Co., Ltd.) Co., Ltd.), BYK-307, BYK-322, BYK-323, BYK-330, BYK-3760, BYK-UV3510 (manufactured by BYK-Chemie Co., Ltd.), and the like.
  • a compound having the following structure can also be used as the silicone surfactant.
  • the content of the surfactant is preferably 0.001 to 1% by mass, more preferably 0.001 to 0.5% by mass, and even more preferably 0.001 to 0.2% by mass based on the total solid content of the resin composition.
  • the resin composition may contain only one type of surfactant, or may contain two or more types of surfactant. When two or more types are included, it is preferable that their total amount falls within the above range.
  • the resin composition of the present invention can contain a polymerization inhibitor.
  • Polymerization inhibitors include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis(3-methyl-6-tert-butylphenol), Examples include 2,2'-methylenebis(4-methyl-6-t-butylphenol) and N-nitrosophenylhydroxyamine salts (ammonium salts, cerous salts, etc.), with p-methoxyphenol being preferred.
  • the content of the polymerization inhibitor is preferably 0.0001 to 5% by mass based on the total solid content of the resin composition.
  • the resin composition may contain only one kind of polymerization inhibitor, or may contain two or more kinds of polymerization inhibitors. When two or more types are included, it is preferable that their total amount falls within the above range.
  • the resin composition of the present invention can contain a silane coupling agent.
  • a silane coupling agent means a silane compound having a hydrolyzable group and other functional groups.
  • hydrolyzable group refers to a substituent that is directly bonded to a silicon atom and can form a siloxane bond through at least one of a hydrolysis reaction and a condensation reaction. Examples of the hydrolyzable group include a halogen atom, an alkoxy group, an acyloxy group, and an alkoxy group is preferred. That is, the silane coupling agent is preferably a compound having an alkoxysilyl group.
  • Examples of functional groups other than hydrolyzable groups include vinyl groups, (meth)acryloyl groups, mercapto groups, epoxy groups, oxetanyl groups, amino groups, ureido groups, sulfide groups, isocyanate groups, and phenyl groups. (meth)acryloyl group and epoxy group are preferred.
  • Examples of the silane coupling agent include compounds described in paragraph numbers 0018 to 0036 of JP-A No. 2009-288703, and compounds described in paragraph numbers 0056 to 0066 of JP-A No. 2009-242604, the contents of which are incorporated herein by reference. Incorporated into the specification.
  • the content of the silane coupling agent is preferably 0.01 to 15.0% by mass, more preferably 0.05 to 10.0% by mass based on the total solid content of the resin composition.
  • the resin composition may contain only one type of silane coupling agent, or may contain two or more types. When two or more types are included, it is preferable that their total amount falls within the above range.
  • the resin composition of the present invention can contain an ultraviolet absorber.
  • the ultraviolet absorber include conjugated diene compounds, aminodiene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, hydroxyphenyltriazine compounds, indole compounds, triazine compounds, dibenzoyl compounds, and the like. Specific examples of such compounds include paragraph numbers 0038 to 0052 of JP2009-217221A, paragraphs 0052 to 0072 of JP2012-208374A, and paragraphs 0317 to 0317 of JP2013-068814A.
  • UV absorbers include the Tinuvin series and Uvinul series manufactured by BASF.
  • examples of the benzotriazole compound include the MYUA series manufactured by Miyoshi Yushi (Kagaku Kogyo Nippo, February 1, 2016).
  • the ultraviolet absorbers include compounds described in paragraph numbers 0049 to 0059 of Patent No. 6268967, compounds described in paragraph numbers 0059 to 0076 of International Publication No.
  • the content of the ultraviolet absorber is preferably 0.01 to 30% by mass, more preferably 0.05 to 25% by mass based on the total solid content of the resin composition.
  • the resin composition may contain only one type of ultraviolet absorber, or may contain two or more types of ultraviolet absorbers. When two or more types are included, it is preferable that their total amount falls within the above range.
  • the resin composition of the present invention can contain an antioxidant.
  • the antioxidant include phenolic antioxidants, amine antioxidants, phosphorus antioxidants, sulfur antioxidants, and the like.
  • examples of phenolic antioxidants include hindered phenol compounds.
  • the phenolic antioxidant is preferably a compound having a substituent at a site adjacent to the phenolic hydroxy group (ortho position).
  • the above-mentioned substituents are preferably substituted or unsubstituted alkyl groups having 1 to 22 carbon atoms.
  • the antioxidant is a compound having a phenol group and a phosphite group in the same molecule.
  • antioxidants include, for example, Adekastab AO-20, Adekastab AO-30, Adekastab AO-40, Adekastab AO-50, Adekastab AO-50F, Adekastab AO-60, Adekastab AO-60G, Adekastab AO-80. , ADEKA STAB AO-330, ADEKA STAB AO-412S, ADEKA STAB 2112, ADEKA STAB PEP-36, ADEKA STAB HP-10 (manufactured by ADEKA Co., Ltd.), and JP-650 (manufactured by Johoku Kagaku Kogyo Co., Ltd.).
  • the antioxidants include compounds described in paragraph numbers 0023 to 0048 of Patent No.
  • the content of the antioxidant is preferably 0.01 to 20% by mass, more preferably 0.3 to 15% by mass based on the total solid content of the resin composition.
  • the resin composition may contain only one type of antioxidant, or may contain two or more types of antioxidant. When two or more types are included, it is preferable that their total amount falls within the above range.
  • the resin composition of the present invention may contain sensitizers, curing accelerators, fillers, thermosetting accelerators, plasticizers, and other auxiliary agents (e.g., conductive particles, antifoaming agents, flame retardants, (leveling agents, peeling accelerators, fragrances, surface tension regulators, chain transfer agents, etc.) may also be included.
  • auxiliary agents e.g., conductive particles, antifoaming agents, flame retardants, (leveling agents, peeling accelerators, fragrances, surface tension regulators, chain transfer agents, etc.
  • the resin composition of the present invention may contain a latent antioxidant, if necessary.
  • a latent antioxidant is a compound whose moiety that functions as an antioxidant is protected with a protecting group, and is heated at 100 to 250°C or heated at 80 to 200°C in the presence of an acid/base catalyst. Examples include compounds that function as antioxidants by removing protective groups. Examples of the latent antioxidant include compounds described in WO 2014/021023, WO 2017/030005, and JP 2017-008219. Commercially available latent antioxidants include Adeka Arcles GPA-5001 (manufactured by ADEKA Co., Ltd.).
  • the container for storing the resin composition of the present invention is not particularly limited, and any known container can be used.
  • the inner wall of the container is preferably made of glass, stainless steel, etc. for the purpose of preventing metal elution from the inner wall of the container, increasing stability of the resin composition over time, and suppressing component deterioration.
  • the resin composition of the present invention can be prepared by mixing the above-mentioned components.
  • the resin composition may be prepared by dissolving or dispersing all the components in a solvent at the same time, or, if necessary, two or more solutions or dispersions containing each component as appropriate may be prepared. may be prepared in advance and mixed at the time of use (at the time of application) to prepare a resin composition.
  • the preparation of the resin composition may include a process of dispersing the pigment.
  • mechanical forces used for dispersing pigments include compression, squeezing, impact, shearing, cavitation, and the like.
  • Specific examples of these processes include bead mills, sand mills, roll mills, ball mills, paint shakers, microfluidizers, high speed impellers, sand grinders, flow jet mixers, high pressure wet atomization, ultrasonic dispersion, and the like.
  • pulverizing pigments in a sand mill (bead mill) it is preferable to use small-diameter beads or increase the filling rate of the beads, thereby increasing the pulverizing efficiency.
  • the process and dispersion machine for dispersing pigments are described in ⁇ Complete Works of Dispersion Technology, Published by Information Technology Corporation, July 15, 2005'' and ⁇ Dispersion technology centered on suspension (solid/liquid dispersion system) and industrial
  • the process and dispersion machine described in Paragraph No. 0022 of JP 2015-157893 A, "Practical Application Comprehensive Data Collection, Published by Management Development Center Publishing Department, October 10, 1978" can be suitably used.
  • the pigment may be subjected to a finer treatment in a salt milling step. For the materials, equipment, processing conditions, etc.
  • Bead materials used for dispersion include zirconia, agate, quartz, titania, tungsten carbide, silicon nitride, alumina, stainless steel, and glass.
  • an inorganic compound having a Mohs hardness of 2 or more can also be used for the beads.
  • the resin composition may contain 1 to 10,000 ppm of the beads.
  • any filter that has been conventionally used for filtration and the like can be used without particular limitation.
  • fluororesins such as polytetrafluoroethylene (PTFE), polyamide resins such as nylon (e.g. nylon-6, nylon-6,6), polyolefin resins (high density, ultra-high molecular weight) such as polyethylene, polypropylene (PP), etc.
  • filters using materials such as polyolefin resin (including polyolefin resin). Among these materials, polypropylene (including high-density polypropylene) and nylon are preferred.
  • the pore diameter of the filter is preferably 0.01 to 7.0 ⁇ m, more preferably 0.01 to 3.0 ⁇ m, and even more preferably 0.05 to 0.5 ⁇ m. If the pore diameter of the filter is within the above range, fine foreign matter can be removed more reliably.
  • the pore size value of the filter reference can be made to the nominal value of the filter manufacturer.
  • various filters provided by Nippon Pole Co., Ltd. DFA4201NXEY, DFA4201NAEY, DFA4201J006P, etc.
  • Advantech Toyo Co., Ltd., Nippon Entegris Co., Ltd. (formerly Nippon Microlith Co., Ltd.), Kitz Microfilter Co., Ltd., etc. can be used. .
  • fibrous filter media include polypropylene fibers, nylon fibers, and glass fibers.
  • Commercially available products include the SBP type series (SBP008, etc.), the TPR type series (TPR002, TPR005, etc.), and the SHPX type series (SHPX003, etc.) manufactured by Loki Techno.
  • filters When using filters, different filters (for example, a first filter and a second filter, etc.) may be combined. At that time, filtration with each filter may be performed only once, or may be performed two or more times. Further, filters having different pore diameters within the above-mentioned range may be combined. Alternatively, only the dispersion liquid may be filtered with the first filter, and then filtered with the second filter after other components are mixed.
  • filters for example, a first filter and a second filter, etc.
  • the membrane of the present invention is obtained from the resin composition of the present invention described above.
  • the film of the present invention can be preferably used as an optical filter.
  • Applications of the optical filter are not particularly limited, but include infrared cut filters, infrared transmission filters, and the like.
  • Examples of the infrared cut filter include an infrared cut filter on the light receiving side of the solid-state image sensor (for example, an infrared cut filter for a wafer level lens, etc.), and an infrared cut filter on the back side of the solid-state image sensor (opposite side to the light receiving side).
  • infrared cut filters for environmental light sensors (for example, illuminance sensors that detect the illuminance and color tone of the environment in which the information terminal device is placed and adjust the color tone of the display, and color correction sensors that adjust the color tone). It will be done. In particular, it can be preferably used as an infrared cut filter on the light receiving side of a solid-state image sensor. Examples of the infrared transmission filter include a filter that can block visible light and selectively transmit infrared rays having a specific wavelength or more.
  • the film of the present invention may have a pattern or may be a film without a pattern (flat film). Further, the membrane of the present invention may be used by being laminated on a support, or the membrane of the present invention may be used by being peeled off from the support. Examples of the support include semiconductor base materials such as silicon substrates and transparent base materials.
  • a charge coupled device CCD
  • CMOS complementary metal oxide semiconductor
  • transparent conductive film etc.
  • CCD charge coupled device
  • CMOS complementary metal oxide semiconductor
  • a partition wall that isolates each pixel may be formed on the semiconductor substrate. Examples of the partition wall include metals, metal oxides, black matrices, and the like.
  • an undercoat layer may be provided on the semiconductor substrate, if necessary, for improving adhesion with the upper layer, preventing substance diffusion, or flattening the substrate surface.
  • the transparent substrate used as the support is not particularly limited as long as it is made of a material that can transmit at least visible light.
  • Examples include base materials made of materials such as glass and resin.
  • resins include polyester resins such as polyethylene terephthalate and polybutylene terephthalate, polyolefin resins such as polyethylene, polypropylene, and ethylene vinyl acetate copolymers, acrylic resins such as norbornene resins, polyacrylates, and polymethyl methacrylates, urethane resins, and vinyl chloride resins. , fluororesin, polycarbonate resin, polyvinyl butyral resin, polyvinyl alcohol resin, and the like.
  • glass examples include soda lime glass, borosilicate glass, alkali-free glass, quartz glass, and glass containing copper.
  • glass containing copper examples include phosphate glass containing copper, fluorophosphate glass containing copper, and the like.
  • a commercially available glass containing copper can also be used. Examples of commercially available glass containing copper include NF-50 (manufactured by AGC Techno Glass Co., Ltd.).
  • the thickness of the film of the present invention can be adjusted as appropriate depending on the purpose.
  • the thickness of the film can be 200 ⁇ m or less, 150 ⁇ m or less, 120 ⁇ m or less, 20 ⁇ m or less, 10 ⁇ m or less, and 5 ⁇ m or less. You can also do it.
  • the lower limit of the film thickness is preferably 0.1 ⁇ m or more, more preferably 0.2 ⁇ m or more.
  • the film of the present invention When the film of the present invention is used as an infrared cut filter, it is preferable that the film of the present invention has a maximum absorption wavelength in a wavelength range of 650 to 1500 nm (preferably a wavelength of 660 to 1200 nm, more preferably a wavelength of 660 to 1000 nm).
  • the average transmittance of light with a wavelength of 420 to 550 nm is preferably 50% or more, more preferably 70% or more, even more preferably 80% or more, and especially 85% or more.
  • the transmittance over the entire wavelength range of 420 to 550 nm is preferably 50% or more, more preferably 70% or more, and even more preferably 80% or more.
  • the film of the present invention preferably has a transmittance of 15% or less at at least one point in the wavelength range of 650 to 1500 nm (preferably wavelength 660 to 1200 nm, more preferably wavelength 660 to 1000 nm), and preferably 10% or less.
  • the content is more preferably 5% or less, and even more preferably 5% or less.
  • the film of the present invention preferably has an average absorbance of less than 0.030, more preferably less than 0.025, in the wavelength range of 420 to 550 nm, when the absorbance at the maximum absorption wavelength is 1.
  • the film of the present invention preferably has, for example, any one of the following spectral properties (i1) to (i3).
  • a film having such spectral characteristics can block light in a wavelength range of 400 to 850 nm and transmit light with a wavelength exceeding 950 nm.
  • the maximum value of transmittance in the wavelength range of 400 to 950 nm is 20% or less (preferably 15% or less, more preferably 10% or less), and the minimum value of transmittance in the wavelength range of 1100 to 1500 nm is 70% or more (preferably 75% or more, more preferably 80% or more).
  • a film having such spectral characteristics can block light in a wavelength range of 400 to 950 nm and transmit light with a wavelength exceeding 1050 nm.
  • the maximum value of transmittance in the wavelength range of 400 to 1050 nm is 20% or less (preferably 15% or less, more preferably 10% or less), and the minimum value of transmittance in the wavelength range of 1200 to 1500 nm is 70% or more (preferably 75% or more, more preferably 80% or more).
  • a film having such spectral characteristics can block light in the wavelength range of 400 to 1050 nm and transmit light with a wavelength exceeding 1150 nm.
  • the film of the present invention can also be used in combination with a color filter containing a chromatic colorant.
  • a color filter can be manufactured using a coloring composition containing a chromatic colorant.
  • the color filter is preferably disposed on the optical path of the film of the present invention.
  • the film of the present invention may be formed on a support different from the support on which the color filter is formed, and the film of the present invention may be formed on a support different from the support on which the color filter is formed.
  • Other members for example, microlenses, flattening layers, etc. constituting the solid-state imaging device may be interposed between the film and the color filter.
  • the film of the present invention is suitable for solid-state imaging devices such as CCDs (charge-coupled devices) and CMOSs (complementary metal oxide semiconductors) (the imaging section uses compound semiconductors such as InGaAs, organic semiconductors, quantum dots, etc. in addition to Si). It can be used in various devices such as infrared sensors, light emitting devices, optical communication devices (both transmitting and receiving), and image display devices.
  • CCDs charge-coupled devices
  • CMOSs complementary metal oxide semiconductors
  • the imaging section uses compound semiconductors such as InGaAs, organic semiconductors, quantum dots, etc. in addition to Si). It can be used in various devices such as infrared sensors, light emitting devices, optical communication devices (both transmitting and receiving), and image display devices.
  • the film of the present invention can be manufactured through a step of applying the resin composition of the present invention.
  • Examples of the support include those mentioned above.
  • a method for applying the resin composition a known method can be used. For example, drop casting method; slit coating method; spray method; roll coating method; spin coating method; casting coating method; slit and spin method; Various methods such as inkjet (for example, on-demand method, piezo method, thermal method), ejection printing such as nozzle jet, flexo printing, screen printing, gravure printing, reverse offset printing, metal mask printing, etc. Examples include printing method; transfer method using a mold etc.; nanoimprint method.
  • the application method for inkjet is not particularly limited, and for example, the method shown in "Expanding and Usable Inkjet - Infinite Possibilities Seen in Patents," Published February 2005, Sumibe Techno Research (especially from page 115). 133 pages), and methods described in JP-A No. 2003-262716, JP-A No. 2003-185831, JP-A No. 2003-261827, JP-A No. 2012-126830, JP-A No. 2006-169325, etc. Can be mentioned.
  • the resin composition layer formed by applying the resin composition may be dried (prebaked).
  • the prebaking temperature is preferably 150°C or lower, more preferably 120°C or lower, and even more preferably 110°C or lower.
  • the lower limit can be, for example, 50°C or higher, or 80°C or higher.
  • the prebake time is preferably 10 seconds to 3000 seconds, more preferably 40 to 2500 seconds, and even more preferably 80 to 220 seconds. Drying can be performed using a hot plate, oven, or the like.
  • the film manufacturing method may further include a step of forming a pattern.
  • the pattern forming method include a pattern forming method using a photolithography method and a pattern forming method using a dry etching method, and a pattern forming method using a photolithography method is preferable. Note that when the film of the present invention is used as a flat film, the step of forming a pattern may not be performed. Hereinafter, the process of forming a pattern will be described in detail.
  • the pattern forming method using the photolithography method includes a step of exposing a resin composition layer formed by applying the resin composition of the present invention to light in a pattern (exposure step), and developing the unexposed portions of the resin composition layer. It is preferable to include a step of removing and forming a pattern (developing step). If necessary, a step of baking the developed pattern (post-bake step) may be provided. Each step will be explained below.
  • the resin composition layer is exposed in a pattern.
  • the resin composition layer can be exposed in a pattern by exposing the resin composition layer to light through a mask having a predetermined mask pattern using a stepper exposure machine, a scanner exposure machine, or the like. This allows the exposed portion to be cured.
  • Radiation (light) that can be used during exposure includes g-line, i-line, etc. Furthermore, light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 to 300 nm) can also be used. Examples of light with a wavelength of 300 nm or less include KrF rays (wavelength 248 nm), ArF rays (wavelength 193 nm), and KrF rays (wavelength 248 nm). Furthermore, a long-wave light source of 300 nm or more can also be used.
  • pulse exposure is an exposure method in which exposure is performed by repeating light irradiation and pauses in short cycles (for example, on the millisecond level or less).
  • the irradiation amount is, for example, preferably 0.03 to 2.5 J/cm 2 , more preferably 0.05 to 1.0 J/cm 2 .
  • the oxygen concentration at the time of exposure can be appropriately selected, and in addition to being carried out in the atmosphere, for example, in a low oxygen atmosphere with an oxygen concentration of 19% by volume or less (for example, 15% by volume, 5% by volume, or substantially
  • the exposure may be performed in an oxygen-free environment (in the absence of oxygen), or in a high oxygen atmosphere with an oxygen concentration of more than 21 volume % (for example, 22 volume %, 30 volume %, or 50 volume %).
  • the exposure illuminance can be set as appropriate, and is usually selected from the range of 1000W/m 2 to 100000W/m 2 (for example, 5000W/m 2 , 15000W/m 2 , or 35000W/m 2 ). I can do it.
  • the oxygen concentration and the exposure illuminance may be appropriately combined.
  • the illumination intensity may be 10,000 W/m 2 at an oxygen concentration of 10% by volume, or 20,000 W/m 2 at an oxygen concentration of 35% by volume.
  • the unexposed portions of the resin composition layer after exposure are removed by development to form a pattern.
  • the unexposed portions of the resin composition layer can be removed by development using a developer.
  • the temperature of the developer is preferably, for example, 20 to 30°C.
  • the development time is preferably 20 to 180 seconds.
  • the process of shaking off the developer every 60 seconds and supplying a new developer may be repeated several times.
  • Examples of the developer include organic solvents, alkaline developers, and alkaline developers are preferably used.
  • an alkaline aqueous solution (alkaline developer) prepared by diluting an alkaline agent with pure water is preferable.
  • alkaline agents include ammonia, ethylamine, diethylamine, dimethylethanolamine, diglycolamine, diethanolamine, hydroxyamine, ethylenediamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, and tetrabutylammonium hydroxide.
  • alkaline compounds examples include alkaline compounds and inorganic alkaline compounds such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, sodium silicate, and sodium metasilicate.
  • alkali agent compounds with a large molecular weight are preferable from the environmental and safety standpoints.
  • the concentration of the alkaline agent in the alkaline aqueous solution is preferably 0.001 to 10% by mass, more preferably 0.01 to 1% by mass.
  • the developer may further contain a surfactant.
  • the surfactant nonionic surfactants are preferred.
  • the developing solution may be manufactured as a concentrated solution and then diluted to a required concentration before use.
  • the dilution ratio is not particularly limited, but can be set, for example, in the range of 1.5 to 100 times. It is also preferable to wash (rinse) with pure water after development. Further, rinsing is preferably performed by supplying a rinsing liquid to the developed resin composition layer while rotating the support on which the developed resin composition layer is formed.
  • the nozzle that discharges the rinsing liquid from the center of the support it is also preferable to move the nozzle that discharges the rinsing liquid from the center of the support to the peripheral edge of the support.
  • the nozzle may be moved while gradually decreasing its moving speed.
  • Additional exposure processing and post-bake are post-development curing processing to complete curing.
  • the heating temperature in post-baking is, for example, preferably 100 to 240°C, more preferably 200 to 240°C.
  • Post-baking can be carried out in a continuous or batch manner using a heating means such as a hot plate, convection oven (hot air circulation dryer), or high-frequency heater to maintain the developed film under the above conditions.
  • the light used for exposure is preferably light with a wavelength of 400 nm or less. Further, the additional exposure process may be performed by the method described in Korean Patent Publication No. 10-2017-0122130.
  • Pattern formation by the dry etching method involves coating the resin composition on a support and curing the resin composition layer to form a cured material layer, and then forming a patterned photo on this cured material layer. This can be carried out by a method such as forming a resist layer, and then dry etching the cured material layer using an etching gas using the patterned photoresist layer as a mask. In forming the photoresist layer, it is preferable to perform a prebaking process. Regarding pattern formation by the dry etching method, the descriptions in paragraphs 0010 to 0067 of JP-A No. 2013-064993 can be referred to, and the contents thereof are incorporated into the present specification.
  • optical filter of the present invention has the film of the present invention described above.
  • Types of optical filters include infrared cut filters and infrared transmission filters.
  • the optical filter of the invention may further include a copper-containing layer, a dielectric multilayer film, an ultraviolet absorbing layer, and the like.
  • the ultraviolet absorbing layer include the absorbing layers described in paragraph numbers 0040 to 0070 and 0119 to 0145 of International Publication No. 2015/099060.
  • the dielectric multilayer film include the dielectric multilayer films described in paragraph numbers 0255 to 0259 of JP-A No. 2014-041318.
  • a glass substrate made of glass containing copper (copper-containing glass substrate) or a layer containing a copper complex (copper complex-containing layer) can also be used.
  • Examples of the copper-containing glass substrate include phosphate glass containing copper, fluorophosphate glass containing copper, and the like.
  • Commercially available copper-containing glasses include NF-50 (manufactured by AGC Techno Glass Co., Ltd.), BG-60, BG-61 (all manufactured by Schott Co., Ltd.), and CD5000 (manufactured by HOYA Co., Ltd.).
  • Preferred base materials include transparent base materials made of materials such as glass and resin, and it is also preferred to form a film directly on various elements.
  • resins examples include polyester resins such as polyethylene terephthalate and polybutylene terephthalate, polyolefin resins such as polyethylene, polypropylene, and ethylene vinyl acetate copolymers, acrylic resins such as norbornene resins, polyacrylates, and polymethyl methacrylates, urethane resins, and vinyl chloride resins. , fluororesin, polycarbonate resin, polyvinyl butyral resin, polyvinyl alcohol resin, and the like.
  • the glass include soda lime glass, borosilicate glass, alkali-free glass, quartz glass, and glass containing copper.
  • the solid-state imaging device of the present invention includes the film of the present invention described above.
  • the structure of the solid-state image sensor is not particularly limited as long as it has the film of the present invention and functions as a solid-state image sensor. For example, the following configurations may be mentioned.
  • the device On the support, there is a transfer electrode made of polysilicon or the like and a plurality of photodiodes that constitute the light-receiving area of the solid-state image sensor, and a light-shielding material made of tungsten or the like with only the light-receiving part of the photodiode opened above the photodiode and the transfer electrode.
  • the device has a device protective film made of silicon nitride or the like formed to cover the entire surface of the light shielding film and the photodiode light receiving part on the light shielding film, and has the film of the present invention on the device protective film. be.
  • the color filter may have a structure in which a film forming each pixel is embedded in a space partitioned into, for example, a lattice shape by partition walls.
  • the partition wall preferably has a lower refractive index than each pixel. Examples of imaging devices having such a structure include devices described in Japanese Patent Application Laid-open Nos. 2012-227478 and 2014-179577.
  • the image display device of the present invention includes the film of the present invention.
  • Examples of the image display device include a liquid crystal display device and an organic electroluminescence (organic EL) display device.
  • organic EL organic electroluminescence
  • image display devices see, for example, “Electronic Display Devices (written by Akio Sasaki, published by Industrial Research Institute Co., Ltd., 1990)” and “Display Devices (written by Junaki Ibuki, published by Sangyo Tosho Co., Ltd., published in 1989). Publication)” etc.
  • liquid crystal display devices are described, for example, in “Next Generation Liquid Crystal Display Technology (edited by Tatsuo Uchida, published by Kogyo Chosenkai Co., Ltd., 1994)”.
  • the image display device may include a white organic EL element.
  • the white organic EL element preferably has a tandem structure.
  • Japanese Patent Application Laid-open No. 2003-045676 supervised by Akiyoshi Mikami, "The forefront of organic EL technology development - High brightness, high precision, long life, collection of know-how", Technical Information Association, It is described in pages 326-328, 2008, etc.
  • the spectrum of white light emitted by the organic EL element preferably has strong maximum emission peaks in the blue region (430 to 485 nm), green region (530 to 580 nm), and yellow region (580 to 620 nm). In addition to these emission peaks, it is more preferable to have a maximum emission peak in the red region (650 to 700 nm).
  • the film of the present invention can also be used as an infrared transmitting film provided in an opening for infrared communication formed in a frame portion of a protective plate for a display device.
  • the infrared sensor of the present invention includes the film of the present invention described above.
  • the configuration of the infrared sensor is not particularly limited as long as it functions as an infrared sensor. EMBODIMENT OF THE INVENTION Hereinafter, one embodiment of the infrared sensor of this invention is described using drawings.
  • numeral 110 is a solid-state image sensor.
  • An infrared cut filter 111 and an infrared transmission filter 114 are arranged on the imaging area of the solid-state image sensor 110.
  • a color filter 112 is arranged on the infrared cut filter 111.
  • a microlens 115 is arranged on the incident light hv side of the color filter 112 and the infrared transmission filter 114.
  • a flattening layer 116 is formed to cover the microlens 115.
  • the infrared cut filter 111 can be formed using the resin composition of the present invention.
  • the color filter 112 is a color filter in which pixels that transmit and absorb light of a specific wavelength in the visible region are formed, and there is no particular limitation, and a conventionally known color filter for forming pixels can be used. For example, a color filter in which red (R), green (G), and blue (B) pixels are formed is used. For example, the descriptions in paragraph numbers 0214 to 0263 of JP-A No. 2014-043556 can be referred to, and the contents thereof are incorporated herein.
  • the characteristics of the infrared transmission filter 114 are selected depending on the emission wavelength of the infrared LED used.
  • the infrared transmission filter 114 can be formed using the resin composition of the present invention.
  • an infrared cut filter other than the infrared cut filter 111 may be further disposed on the flattening layer 116.
  • Other infrared cut filters include those having a layer containing copper and/or a dielectric multilayer film. Details of these are mentioned above.
  • a dual band pass filter may be used as another infrared cut filter.
  • the camera module of the present invention includes a solid-state image sensor and the above-described film of the present invention.
  • the camera module further includes a lens and a circuit that processes images obtained from the solid-state image sensor.
  • the solid-state image sensor used in the camera module may be the solid-state image sensor according to the present disclosure described above, or may be a known solid-state image sensor.
  • the lens used in the camera module and the circuit that processes the image obtained from the solid-state image sensor known ones can be used.
  • camera modules described in JP-A No. 2016-006476 and JP-A No. 2014-197190 can be referred to, and the contents thereof are incorporated into this specification.
  • the film of the present invention can also be used in light emitting devices.
  • the structure of the light emitting element is not particularly limited as long as it functions as a light emitting element, and light emitting diodes (LEDs), organic light emitting diodes (OLEDs), quantum dot light emitting diodes (QLEDs), vertical cavity surface emitting lasers ( VICSEL), etc.
  • the film of the present invention may be formed directly on the light emitting element, or may be placed on the light emitting path.
  • the film of the present invention can also be used in optical communication devices.
  • the configuration of the optical communication element is not particularly limited as long as it functions as an optical communication element, and may be either a transmitting element or a receiving element.
  • Examples of the optical communication device include an infrared remote control, an infrared transceiver, an optical interposer, and an optical interconnection.
  • the film of the present invention may be formed directly on the receiving element, directly on the transmitting element, or placed on the transmitting/receiving path.
  • the weight average molecular weight of the resin was measured using HPC-8220GPC (manufactured by Tosoh Corporation) as a measuring device, TSKguardcolumn SuperHZ-L as a guard column, and TSKgel SuperHZM-M, TSKgel SuperHZ4000, TSKgel SuperH as a column.
  • pigment 017, 018 Compounds 017, 018 (infrared absorbing pigments) shown in the specific examples of the specific infrared absorbing pigments mentioned above IR101 to IR103: Compounds with the following structure (infrared absorbing dyes) PB15:6: C. I. Pigment Blue 15:6 (blue colorant) PR254: C. I. Pigment Red 254 (red colorant)
  • Dis-001 Resin with the following structure (the numerical value appended to the main chain is the molar ratio, and the numerical value appended to the side chain is the number of repeating units.
  • Weight average molecular weight 25,000 Dis-002: Resin with the following structure (the numerical value appended to the main chain is the molar ratio, and the numerical value appended to the side chain is the number of repeating units. Weight average molecular weight 9800)
  • ⁇ Manufacture of resin composition Materials other than the solvents shown in the table below are mixed in the proportions shown in the table below, the solvents shown in the table below are added to adjust the solid content concentration to 20% by mass, and the mixture is stirred to form nylon with a pore size of 0.45 ⁇ m. filter (manufactured by Nippon Pall Co., Ltd.) to produce a resin composition.
  • the numerical values in the blending amount column in the table are values in parts by mass in terms of solid content.
  • B001 Polymethyl methacrylate (weight average molecular weight 24,000, dispersity 1.8)
  • B003 Resin with the following structure (the numbers added to the main chain are the molar ratio of repeating units, weight average molecular weight 15000, dispersity 2.1)
  • B004 Resin with the following structure (weight average molecular weight 25,000, degree of dispersion 2.2, glass transition temperature 310°C)
  • (Polymerizable compound) M-1 Aronix M-305 (manufactured by Toagosei Co., Ltd., a mixture of pentaerythritol triacrylate and pentaerythritol tetraacrylate.
  • pentaerythritol triacrylate The content of pentaerythritol triacrylate is 55% by mass to 63% by mass.
  • M-2 KAYARAD RP-1040 (manufactured by Nippon Kayaku Co., Ltd., ethylene oxide modified pentaerythritol tetraacrylate)
  • M-3 Aronix M-510 (manufactured by Toagosei Co., Ltd., polybasic acid-modified acrylic oligomer)
  • EPICLON N-695 manufactured by DIC Corporation, o-cresol novolac type epoxy compound
  • C-1 Irgacure OXE01 (manufactured by BASF, oxime ester compound)
  • C-2 Irgacure OXE02 (manufactured by BASF, oxime ester compound)
  • F-1 Megafac RS-72-K (manufactured by DIC Corporation, fluorine-based surfactant)
  • F-2 Compound with the following structure (weight average molecular weight 14,000, the numerical value of % indicating the proportion of repeating units is mol%)
  • F-3 KF-6001 (manufactured by Shin-Etsu Chemical Co., Ltd., polydimethylsiloxane modified with carbinol at both ends, hydroxyl value 62 mgKOH/g, silicone surfactant)
  • U-1 Uvinul3050 (manufactured by BASF)
  • the transmittance of the glass substrate on which the above film was formed was measured in the wavelength range of 400 to 2000 nm using an ultraviolet-visible near-infrared spectrophotometer U-4100 (manufactured by Hitachi High-Tech Corporation).
  • the wavelength at which the transmittance is 20% ( ⁇ L20 ) and the wavelength at which the transmittance is 90% ( ⁇ L90 ), which is on the longer wavelength side than the maximum absorption wavelength, and the maximum absorption The wavelength at which the transmittance is 20% ( ⁇ S20 ) and the wavelength at which the transmittance is 90% ( ⁇ S90 ), which are shorter than the wavelength, are determined, and the rectangularity of each light-shielding area is determined using the following criteria. was evaluated.
  • the transmittance of the glass substrate on which the above film was formed was measured in the wavelength range of 400 to 2000 nm using an ultraviolet-visible near-infrared spectrophotometer U-4100 (manufactured by Hitachi High-Tech Corporation). Next, the glass substrate on which the above film was formed was irradiated with a xenon lamp at 100,000 lux for 20 hours (equivalent to 2 million lux ⁇ h), and the transmittance of the film after irradiation with the xenon lamp was measured.
  • the amount of change in transmittance ( ⁇ T) at each wavelength in the wavelength range of 800 to 2000 nm before and after irradiation with a xenon lamp is determined, and the light resistance is evaluated using the following criteria based on the largest value of ⁇ T in the entire measurement wavelength range. did. The smaller the value of ⁇ T, the better the light resistance.
  • Amount of change in transmittance ( ⁇ T)
  • the examples were excellent in evaluation of light resistance and heat resistance. Furthermore, the examples had excellent evaluation of rectangularity on the long wavelength side, had a steep slope of transmittance on the long wavelength side with respect to the maximum absorption wavelength, and had excellent contrast between transmittance and light shielding properties. Further, for the films obtained using the resin compositions of Examples 28 and 53, the average transmittance in the wavelength range of 400 to 1000 nm was less than 5%.
  • the plate was heated at 100° C. for 2 minutes.
  • FPA-3000i5+ manufactured by Canon Inc.
  • a 2 ⁇ m Bayer pattern was exposed through a mask at an exposure dose of 1000 mJ/cm 2 .
  • paddle development was performed at 23° C. for 60 seconds using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide (TMAH).
  • TMAH tetramethylammonium hydroxide
  • 110 solid-state image sensor
  • 111 infrared cut filter
  • 112 color filter
  • 114 infrared transmission filter
  • 115 microlens
  • 116 flattening layer

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  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
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Abstract

L'invention concerne une composition de résine qui contient : au moins une sorte de matériau colorant absorbant les infrarouges (A) choisie parmi un matériau colorant (A1) représenté par la formule (1), et un multimère de matériau colorant (A2) contenant au moins deux structures de matériau colorant dérivées du matériau colorant (A1) dans chaque molécule ; et une résine. L'invention concerne également un film, un filtre optique, un élément d'imagerie à l'état solide, un dispositif d'affichage d'images, un capteur infrarouge, un module d'appareil de prise de vue et un composé
PCT/JP2023/016844 2022-05-13 2023-04-28 Composition de résine, film, filtre optique, élément d'imagerie à l'état solide, dispositif d'affichage d'images, capteur infrarouge, module d'appareil de prise de vue, et composé WO2023219010A1 (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2022079118 2022-05-13
JP2022-079118 2022-05-13
JP2023-025232 2023-02-21
JP2023025232 2023-02-21

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WO2023219010A1 true WO2023219010A1 (fr) 2023-11-16

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007233368A (ja) * 2006-02-01 2007-09-13 Toyobo Co Ltd 近赤外線吸収フィルム
WO2017155042A1 (fr) * 2016-03-09 2017-09-14 国立大学法人名古屋大学 Composé de dithiénophosphorine et colorant fluorescent produit à l'aide de celui-ci
JP2019040109A (ja) * 2017-08-28 2019-03-14 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物及びカラーフィルタ
WO2021176755A1 (fr) * 2020-03-04 2021-09-10 国立大学法人京都大学 Composé de dithiénophosphorine, et matériau incolore absorbant le proche infrarouge et matériau électrochromique utilisant chacun celui-ci

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007233368A (ja) * 2006-02-01 2007-09-13 Toyobo Co Ltd 近赤外線吸収フィルム
WO2017155042A1 (fr) * 2016-03-09 2017-09-14 国立大学法人名古屋大学 Composé de dithiénophosphorine et colorant fluorescent produit à l'aide de celui-ci
JP2019040109A (ja) * 2017-08-28 2019-03-14 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物及びカラーフィルタ
WO2021176755A1 (fr) * 2020-03-04 2021-09-10 国立大学法人京都大学 Composé de dithiénophosphorine, et matériau incolore absorbant le proche infrarouge et matériau électrochromique utilisant chacun celui-ci

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