WO2022130774A1 - Composition, film, filtre optique, élément d'imagerie à semi-conducteurs, dispositif d'affichage d'image et capteur ir - Google Patents

Composition, film, filtre optique, élément d'imagerie à semi-conducteurs, dispositif d'affichage d'image et capteur ir Download PDF

Info

Publication number
WO2022130774A1
WO2022130774A1 PCT/JP2021/038592 JP2021038592W WO2022130774A1 WO 2022130774 A1 WO2022130774 A1 WO 2022130774A1 JP 2021038592 W JP2021038592 W JP 2021038592W WO 2022130774 A1 WO2022130774 A1 WO 2022130774A1
Authority
WO
WIPO (PCT)
Prior art keywords
group
compound
composition
examples
resin
Prior art date
Application number
PCT/JP2021/038592
Other languages
English (en)
Japanese (ja)
Inventor
一成 八木
Original Assignee
富士フイルム株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 富士フイルム株式会社 filed Critical 富士フイルム株式会社
Priority to JP2022569741A priority Critical patent/JPWO2022130774A1/ja
Priority to KR1020237019563A priority patent/KR20230106668A/ko
Publication of WO2022130774A1 publication Critical patent/WO2022130774A1/fr

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • C08L101/12—Compositions of unspecified macromolecular compounds characterised by physical features, e.g. anisotropy, viscosity or electrical conductivity
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0232—Optical elements or arrangements associated with the device

Definitions

  • the present invention relates to a composition containing an infrared absorber and a curable compound.
  • the present invention also relates to a film, an optical filter, a solid-state image sensor, an image display device, and an infrared sensor using the above-mentioned composition.
  • CCD charge-coupled device
  • CMOS complementary metal oxide semiconductor
  • CCD charge-coupled device
  • CMOS complementary metal oxide semiconductor
  • These solid-state image pickup devices use a silicon photodiode having a sensitivity to infrared rays in the light receiving portion thereof. Therefore, an infrared cut filter may be provided to correct the luminosity factor.
  • the infrared cut filter is manufactured using a composition containing an infrared absorber and a curable compound.
  • an infrared transmission filter is also manufactured using a composition containing an infrared absorber and a curable compound.
  • the infrared absorber in the infrared transmission filter, the infrared region of the light (infrared ray) transmitted by the infrared transmission filter can be shifted to the longer wavelength side.
  • an optical filter such as an infrared cut filter or an infrared transmission filter is formed by using a composition containing an infrared absorber and a curable compound.
  • Non-Patent Document 1 describes that a compound having the following structure has a maximum absorption wavelength at a wavelength of 922 nm in dichloromethane and no significant absorption band in the visible region.
  • the present inventor has studied a composition containing an infrared absorber and a curable compound, and found that a film having excellent infrared shielding properties can be formed by using the composition described later, and completes the present invention. It came to. Therefore, the present invention provides the following.
  • a composition containing an infrared absorber and a curable compound contains a compound represented by the formula (1), and contains the compound.
  • the composition in which the content of the compound represented by the above formula (1) in the total solid content of the above composition is 3% by mass or more;
  • Ar 1 and Ar 2 each represent a nitrogen-containing heterocycle which may be condensed to form a polycycle independently.
  • R 1 and R 2 each independently represent a substituent and represent a substituent.
  • n1 and n2 each independently represent an integer of 0 or more, and represent an integer of 0 or more.
  • Y 1 and Y 2 independently represent -O-, -S-, or -NR Y1-, respectively.
  • RY1 represents a hydrogen atom or a substituent and represents X 1 and X 2 each independently represent a hydrogen atom, -BR X1 RX2, or a metal atom to which a ligand may be coordinated.
  • RX1 and RX2 independently represent hydrogen atoms or substituents, respectively.
  • RX1 and RX2 may be combined to form a ring.
  • n1 and n2 in the above equation (1) independently represent integers of 1 or more, respectively.
  • the composition according to ⁇ 1>, wherein R 1 and R 2 of the above formula (1) independently represent an aryl group or a heteroaryl group, respectively.
  • X 1 and X 2 of the above formula (1) independently represent ⁇ BR X1 RX 2, respectively, and RX 1 and RX 2 each independently represent a hydrogen atom or a substituent, and R X 1 and R respectively.
  • RX1 and RX2 independently represent a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, an alkoxy group or an aryloxy group, and RX1 and RX2 are bonded to each other.
  • ⁇ 6> The composition according to any one of ⁇ 1> to ⁇ 5>, wherein the maximum absorption wavelength of the compound represented by the above formula (1) in dichloromethane is in the wavelength range of 1000 to 1600 nm. ..
  • ⁇ 7> The composition according to any one of ⁇ 1> to ⁇ 6>, wherein the infrared absorber contains a compound other than the compound represented by the above formula (1).
  • ⁇ 8> The composition according to any one of ⁇ 1> to ⁇ 7>, further comprising a chromatic colorant.
  • ⁇ 9> The composition according to any one of ⁇ 1> to ⁇ 8>, wherein the curable compound contains a resin having an acid group.
  • ⁇ 10> The composition according to any one of ⁇ 1> to ⁇ 9>, wherein the curable compound contains a polymerizable compound.
  • ⁇ 11> The composition according to any one of ⁇ 1> to ⁇ 10>, wherein the curable compound contains a resin having a glass transition temperature of 150 ° C.
  • ⁇ 12> The composition according to any one of ⁇ 1> to ⁇ 11>, which is for an infrared sensor.
  • ⁇ 13> A film obtained by using the composition according to any one of ⁇ 1> to ⁇ 12>.
  • ⁇ 14> An optical filter containing the film according to ⁇ 13>.
  • ⁇ 15> A solid-state image sensor including the film according to ⁇ 13>.
  • ⁇ 16> An image display device including the film according to ⁇ 13>.
  • ⁇ 17> An infrared sensor including the film according to ⁇ 13>.
  • the present invention it is possible to provide a composition, a film, an optical filter, a solid-state image sensor, an image display device, and an infrared sensor capable of forming a film having excellent infrared shielding properties.
  • the contents of the present invention will be described in detail.
  • "to” is used to mean that the numerical values described before and after it are included as the lower limit value and the upper limit value.
  • the notation not describing substitution and non-substitution also includes a group having a substituent (atomic group) as well as a group having no substituent (atomic group).
  • the "alkyl group” includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
  • the term "exposure” includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams, unless otherwise specified.
  • Examples of the light used for exposure include the emission line spectrum of a mercury lamp, far ultraviolet rays typified by an excima laser, extreme ultraviolet rays (EUV light), X-rays, active rays such as electron beams, or radiation.
  • EUV light extreme ultraviolet rays
  • (meth) acrylate” represents both acrylate and methacrylate, or either
  • “(meth) acrylic” represents both acrylic and methacrylic, or either.
  • Acryloyl "represents both acryloyl and / or methacryloyl.
  • weight average molecular weight and number average molecular weight are defined as polystyrene-equivalent values in gel permeation chromatography (GPC) measurements.
  • GPC gel permeation chromatography
  • Me in the chemical formula represents a methyl group
  • Et represents an ethyl group
  • Bu represents a butyl group
  • Ph represents a phenyl group.
  • infrared rays refer to light (electromagnetic waves) having a wavelength of 700 to 2500 nm.
  • the total solid content means the total mass of all the components of the composition excluding the solvent.
  • the pigment means a coloring material that is difficult to dissolve in a solvent.
  • the term "process" is included in this term not only as an independent process but also as long as the intended action of the process is achieved even if it cannot be clearly distinguished from other processes. ..
  • composition of the present invention is a composition containing an infrared absorber and a curable compound.
  • the infrared absorber contains a compound represented by the formula (1) and contains.
  • the content of the compound represented by the formula (1) in the total solid content of the composition is 3% by mass or more.
  • the composition of the present invention it is possible to form a film having excellent infrared shielding properties.
  • the composition of the present invention contains 3% by mass or more of the compound represented by the formula (1) in the total solid content of the composition. Therefore, it is presumed that when the composition is used to form a film, the association of the compounds represented by the formula (1) is promoted in the film.
  • the absorption peak of the compound represented by the formula (1) is shifted to the long wave side from the single molecule state, and as a result, It is presumed that a film having excellent infrared shielding properties, which can shield infrared rays having a longer wavelength, could be formed.
  • the composition of the present invention can be used as a composition for an optical filter.
  • the optical filter include an infrared cut filter and an infrared transmission filter.
  • the composition of the present invention is preferably used for an infrared sensor. More specifically, it is preferably used as a composition for the above-mentioned optical filter of an infrared sensor having an optical filter.
  • the composition of the present invention comprises an infrared absorber.
  • the infrared absorber used in the composition of the present invention contains a compound represented by the formula (1).
  • the compound represented by the formula (1) is also referred to as a specific infrared absorbing compound.
  • Ar 1 and Ar 2 each independently represent a nitrogen-containing heterocycle.
  • R 1 and R 2 each independently represent a substituent and represent a substituent.
  • n1 and n2 each independently represent an integer of 0 or more, and represent an integer of 0 or more.
  • Y 1 and Y 2 independently represent -O-, -S-, or -NR Y1-, respectively.
  • RY1 represents a hydrogen atom or a substituent and represents X 1 and X 2 each independently represent a hydrogen atom, -BR X1 RX2, or a metal atom to which a ligand may be coordinated.
  • RX1 and RX2 independently represent hydrogen atoms or substituents, respectively.
  • RX1 and RX2 may be combined to form a ring.
  • the nitrogen-containing heterocycle represented by Ar 1 and Ar 2 in the formula (1) may be a monocyclic ring or a condensed ring.
  • the number of condensed rings is preferably 2 to 8, more preferably 2 to 4, and even more preferably 2 or 3.
  • the nitrogen-containing heterocycle represented by Ar 1 and Ar 2 is preferably a nitrogen-containing heteroaromatic ring.
  • the nitrogen-containing heterocycles represented by Ar 1 and Ar 2 include pyrrol ring, imidazole ring, pyrazol ring, oxazole ring, thiazole ring, triazole ring, tetrazole ring, pyridine ring, pyridazine ring, pyrimidine ring, pyrazine ring and the like. Examples thereof include a fused ring containing the ring of.
  • fused ring examples include an indole ring, an isoindole ring, a benzimidazole ring, a benzoxazole ring, a benzothiazole ring, a benzotriazole ring, a purine ring, a quinoline ring, an isoquinoline ring, a quinazoline ring, a quinoxaline ring, a cinnoline ring, and a pteridine ring.
  • indole ring an isoindole ring, a benzimidazole ring, a benzoxazole ring, a benzothiazole ring, a benzotriazole ring, a purine ring, a quinoline ring, an isoquinoline ring, a quinazoline ring, a quinoxaline ring, a cinnoline ring, and a pteridine ring.
  • the nitrogen-containing heterocycle represented by Ar 1 and Ar 2 is preferably a pyrrole ring, an imidazole ring, or a condensed ring containing these rings, and more preferably a pyrrole ring, an imidazole ring, or a condensed ring containing these rings. preferable.
  • R 1 and R 2 of the formula (1) each independently represent a substituent.
  • substituents include the groups mentioned as the substituent T described later, and an aryl group or a heteroaryl group is preferable, and a heteroaryl group is more preferable because the absorption wavelength can be further lengthened.
  • the aryl group preferably has 6 to 20 carbon atoms, more preferably 6 to 12 carbon atoms.
  • the aryl group may have a substituent.
  • the heteroaryl group is preferably a monocyclic or a heteroaryl group of a fused ring having a number of condensations of 2 to 8, and more preferably a heteroaryl group of a single ring or a fused ring having a number of condensations of 2 to 4.
  • the number of heteroatoms constituting the ring of the heteroaryl group is preferably 1 to 3.
  • Examples of the hetero atom constituting the ring of the heteroaryl group include a nitrogen atom, an oxygen atom and a sulfur atom.
  • the number of carbon atoms constituting the ring of the heteroaryl group is preferably 3 to 20, more preferably 3 to 18, and even more preferably 3 to 12.
  • the heteroaryl group is preferably a 5-membered or 6-membered heteroaryl group.
  • Specific examples of the heteroaryl group include a pyrrole ring group, a furan ring group, a thiophene ring group, an imidazole ring group, a pyrazol ring group, an oxazole ring group, a thiazole ring group, a triazole ring group, a tetrazole ring group and a pyridine ring group.
  • the above aryl group and heteroreel group may further have a substituent.
  • Further substituents include -NR 101 R 102 , an alkoxy group and an aryloxy group, and -NR 101 R 102 is preferable because the absorption wavelength can be made longer.
  • R 101 and R 102 each independently represent a hydrogen atom or a substituent, and R 101 and R 102 may be bonded to form a ring.
  • R 101 and R 102 are independent substituents, respectively.
  • substituent represented by R 101 and R 102 include the group mentioned in Substituent T described later, preferably an alkyl group, an alkenyl group, an alkynyl group or an aryl group, and the substituent is an alkyl group or an aryl group. Is more preferable.
  • the number of carbon atoms of the alkyl group represented by R 101 and R 102 is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 6.
  • the alkyl group may be linear, branched or cyclic.
  • the alkyl group may have a substituent. Examples of the substituent include the groups mentioned in Substituent T described later, and a halogen atom, an aryl group, an alkoxy group and the like are preferable. There may be a plurality of substituents.
  • the carbon number of the alkenyl group represented by R 101 and R 102 is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 6.
  • the alkenyl group may be linear, branched or cyclic.
  • the alkenyl group may have a substituent.
  • substituents include the groups mentioned in Substituent T described later, and a halogen atom, an aryl group, an alkoxy group and the like are preferable.
  • the carbon number of the alkynyl group represented by R 101 and R 102 is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 6.
  • the alkynyl group may be linear, branched or cyclic.
  • the alkynyl group may have a substituent. Examples of the substituent include the groups mentioned in Substituent T described later, and a halogen atom, an aryl group, an alkoxy group and the like are preferable.
  • the aryl group represented by R 101 and R 102 preferably has 6 to 20 carbon atoms, more preferably 6 to 12 carbon atoms.
  • the aryl group may have a substituent. Examples thereof include the groups mentioned in Substituent T described later, and halogen atoms, alkyl groups, alkoxy groups and the like are preferable.
  • N1 and n2 in the equation (1) independently represent integers of 0 or more.
  • n1 and n2 are each independently preferably an integer of 1 or more, more preferably an integer of 1 to 3, further preferably 1 or 2, and particularly preferably 1.
  • Y 1 and Y 2 in the formula (1) independently represent —O—, —S—, or —NR Y1-, and RY1 represents a hydrogen atom or a substituent.
  • Examples of the substituent represented by RY1 include the group mentioned as the substituent T described later, preferably an alkyl group, an aryl group or a heteroaryl group, more preferably an alkyl group or an aryl group, and an alkyl group. It is more preferably a group.
  • RY1 is preferably a hydrogen atom or an alkyl group, and more preferably a hydrogen atom.
  • Y 1 and Y 2 of the formula (1) are preferably —O— or —S—, respectively, and more preferably —O—.
  • X 1 and X 2 of the formula (1) independently represent a hydrogen atom, -BR X1 RX2, or a metal atom to which a ligand may be coordinated, and RX1 and RX2 are respectively. It independently represents a hydrogen atom or a substituent, and RX1 and RX2 may be bonded to form a ring. It is preferable that X 1 and X 2 of the formula (1) independently represent -BR X1 R X2 or a metal atom to which a ligand may be coordinated, and have excellent heat resistance. -BR X1 RX2 is more preferred because it can form a film.
  • X 1 of the formula (1) is -BR X1 R X 2 or a metal atom to which the ligand may be coordinated
  • X 1 is coordinated to the nitrogen atom of the nitrogen-containing heterocycle represented by Ar 1 . May be.
  • X 2 in the formula (1) is -BR X1 R X 2 or a metal atom to which the ligand may be coordinated
  • X 2 is coordinated to the nitrogen atom of the nitrogen-containing heterocycle represented by Ar 2 . It may be ranked.
  • substituents include the groups mentioned in the substituent T described later, preferably a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, an alkoxy group or an aryloxy group, and a halogen. It is more preferably an atomic, aryl group or alkoxy group, and further preferably an aryl group or alkoxy group because it is easy to form a film having excellent heat resistance and light resistance.
  • halogen atom examples include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and a fluorine atom is preferable.
  • the number of carbon atoms of the alkyl group and the alkoxy group is preferably 1 to 20, more preferably 1 to 15, further preferably 1 to 6.
  • the alkyl group and the alkoxy group may be linear, branched or cyclic.
  • the alkyl group and the alkoxy group may have a substituent. Examples of the substituent include the groups mentioned in Substituent T, which will be described later, and a halogen atom, an acyl group, or the like is preferable. There may be a plurality of substituents.
  • the alkenyl group preferably has 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, and even more preferably 1 to 6 carbon atoms.
  • the alkenyl group may be linear, branched or cyclic.
  • the alkenyl group may have a substituent. Examples of the substituent include the groups mentioned in the substituent T described later, and a halogen atom, an acyl group, an alkoxy group and the like are preferable. There may be a plurality of substituents.
  • the alkynyl group preferably has 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, and even more preferably 1 to 6 carbon atoms.
  • the alkynyl group may be linear, branched or cyclic.
  • the alkynyl group may have a substituent.
  • substituents include the groups mentioned in the substituent T described later, and a halogen atom, an acyl group, an alkoxy group and the like are preferable.
  • the aryl group and the aryloxy group preferably have 6 to 20 carbon atoms, more preferably 6 to 12 carbon atoms.
  • the aryl group and the aryloxy group may have a substituent. Examples thereof include the groups mentioned in Substituent T described later, and halogen atoms, acyl groups, alkoxy groups and the like are preferable. There may be a plurality of substituents.
  • the heteroaryl group is preferably a monocyclic or a heteroaryl group of a fused ring having a number of condensations of 2 to 8, and more preferably a heteroaryl group of a single ring or a fused ring having a number of condensations of 2 to 4.
  • the number of heteroatoms constituting the ring of the heteroaryl group is preferably 1 to 3.
  • Examples of the hetero atom constituting the ring of the heteroaryl group include a nitrogen atom, an oxygen atom and a sulfur atom, and a nitrogen atom is preferable.
  • the number of carbon atoms constituting the ring of the heteroaryl group is preferably 3 to 20, more preferably 3 to 18, and even more preferably 3 to 12.
  • the heteroaryl group is preferably a 5-membered or 6-membered heteroaryl group.
  • the heteroaryl group may have a substituent. Examples thereof include the groups mentioned in Substituent T described later, and halogen atoms, acyl groups, alkoxy groups and the like are preferable. There may be a plurality of substituents.
  • RX1 and RX2 may be combined to form a ring.
  • Rx represents a substituent
  • Rx 1 to Rx 4 independently represent a hydrogen atom or a substituent
  • x1 to x3 independently represent an integer of 0 to 4
  • * represents an integer of 0 to 4.
  • Examples of the substituent represented by Rx and Rx 1 to Rx 4 include the groups mentioned in the substituent T described later, which are a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, an alkoxy group or an aryl. It is preferably an oxy group, more preferably a halogen atom, an alkyl group or an alkoxy group.
  • the metal atoms represented by X 1 and X 2 include Mg, Al, Si, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Mo, Ru, Rh, Pd, Ag, Pt, Au, Examples thereof include Er and the like, and Zn, Cu or Co is preferable because the atomic radius is appropriate, the stability of the complex is high, and the resistance is enhanced.
  • a ligand may be coordinated to these metal atoms.
  • RX11 and RX12 independently represent an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heteroaryl group, respectively.
  • RX13 to RX15 independently represent a hydroxy group, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, an alkoxy group or an aryloxy group, and RX13 and RX14 are bonded to each other to form a ring. May be formed.
  • Preferred embodiments of the halogen atom, alkyl group, alkenyl group, alkynyl group, aryl group, heteroaryl group, alkoxy group and aryloxy group are the same as those described above as substituents represented by RX1 and RX2 . ..
  • substituent T examples include the following groups.
  • Halogen atom eg, fluorine atom, chlorine atom, bromine atom, iodine atom
  • alkyl group preferably an alkyl group having 1 to 30 carbon atoms
  • alkenyl group preferably an alkenyl group having 2 to 30 carbon atoms
  • alkynyl group Preferably an alkynyl group having 2 to 30 carbon atoms
  • an aryl group preferably an aryl group having 6 to 30 carbon atoms
  • a heteroaryl group preferably a heteroaryl group having 1 to 30 carbon atoms
  • an amino group preferably an amino group.
  • Amino group having 0 to 30 carbon atoms alkoxy group (preferably alkoxy group having 1 to 30 carbon atoms), aryloxy group (preferably aryloxy group having 6 to 30 carbon atoms), heteroaryloxy group (preferably carbon).
  • a heteroaryloxy group having a number of 1 to 30 an acyl group (preferably an acyl group having 2 to 30 carbon atoms), an alkoxycarbonyl group (preferably an alkoxycarbonyl group having 2 to 30 carbon atoms), and an aryloxycarbonyl group (preferably an acyl group having 2 to 30 carbon atoms).
  • an acylamino group having 2 to 30 carbon atoms an aminocarbonylamino group (preferably an aminocarbonylamino group having 2 to 30 carbon atoms), an alkoxycarbonylamino group (preferably an alkoxycarbonylamino group having 2 to 30 carbon atoms).
  • Aryloxycarbonylamino group (preferably aryloxycarbonylamino group having 7 to 30 carbon atoms), sulfamoyl group (preferably sulfamoyl group having 0 to 30 carbon atoms), sulfamoylamino group (preferably 0 to 30 carbon atoms).
  • Sulfamoylamino group carbamoyl group (preferably carbamoyl group having 1 to 30 carbon atoms), alkylthio group (preferably alkylthio group having 1 to 30 carbon atoms), arylthio group (preferably arylthio group having 6 to 30 carbon atoms).
  • heteroarylthio group preferably a heteroarylthio group having 1 to 30 carbon atoms
  • alkylsulfonyl group preferably an alkylsulfonyl group having 1 to 30 carbon atoms
  • alkylsulfonylamino group preferably 1 to 30 carbon atoms
  • 30 alkylsulfonylamino groups preferably arylsulfonylamino groups with 6 to 30 carbon atoms
  • arylsulfonylamino groups preferably arylsulfonylamino groups with 6 to 30 carbon atoms
  • heteroaryls preferably arylsulfonylamino groups with 6 to 30 carbon atoms
  • a ruhonyl group (preferably a heteroarylsulfonylamino group having 1 to 30 carbon atoms), a heteroarylsulfonylamino group (preferably a heteroarylsulfonylamino group having 1 to 30 carbon atoms), an alkylsulfinyl group (preferably a heteroarylsulfonylamino group having 1 to 30 carbon atoms).
  • Alkyl sulfinyl group arylsulfinyl group (preferably arylsulfinyl group having 6 to 30 carbon atoms), heteroarylsulfinyl group (preferably heteroarylsulfinyl group having 1 to 30 carbon atoms), ureido group (preferably 1 to 30 carbon atoms).
  • ureido groups hydroxy group, nitro group, carboxyl group, sulfo group, phosphoric acid group, carboxylic acid amide group, sulfonic acid amide group, imide group, phosphino group, mercapto group, cyano group, alkylsulfino group, aryl Sulfino group, arylazo group, heteroarylazo group, phosphinyl group, phosphinyloxy group, phosphinylamino group, silyl group, hydrazino group, imino group.
  • These groups may further have a substituent if they are further substitutable groups. Further examples of the substituent include the group described in Substituent T described above.
  • the compound represented by the formula (1) is preferably a compound represented by the formula (1-1).
  • Ar 1 and Ar 2 each independently represent a nitrogen-containing heterocycle.
  • R 3 and R 4 each independently represent a substituent and represent a substituent.
  • n3 and n4 independently represent integers of 0 or more, respectively.
  • Ar 11 and Ar 12 independently represent an aromatic hydrocarbon ring or a complex aromatic ring, respectively.
  • R 11 and R 12 each independently represent a substituent and represent a substituent.
  • n11 and n12 each independently represent an integer of 0 or more, and represent an integer of 0 or more.
  • R 111 to R 114 independently represent a hydrogen atom or a substituent, respectively.
  • R 111 and R 112 , and R 113 and R 114 may be combined to form a ring.
  • Y 1 and Y 2 independently represent -O-, -S-, or -NR Y1-, respectively.
  • RY1 represents a hydrogen atom or a substituent and represents X 1 and X 2 each independently represent a hydrogen atom, -BR X1 RX2, or a metal atom to which a ligand may be coordinated.
  • RX1 and RX2 independently represent hydrogen atoms or substituents, respectively.
  • RX1 and RX2 may be combined to form a ring.
  • Ar 1 , Ar 2 , Y 1 , Y 2 , X 1 and X 2 in equation (1-1) are synonymous with Ar 1 , Ar 2 , Y 1 , Y 2 , X 1 and X 2 in equation (1). And the preferred range is the same.
  • Examples of the substituent represented by R 3 , R 4 , R 11 and R 12 in the formula (1-1) include the groups mentioned in the above-mentioned substituent T.
  • N3 and n4 in the formula (1-1) independently represent integers of 0 or more, preferably 0 to 2, more preferably 0 or 1, and even more preferably 0.
  • N11 and n12 in the formula (1-1) each independently represent an integer of 0 or more, preferably 0 to 2, more preferably 0 or 1, and even more preferably 0.
  • Ar 11 and Ar 12 of the formula (1-1) independently represent an aromatic hydrocarbon ring or a complex aromatic ring, respectively, and are preferably complex aromatic rings.
  • the aromatic hydrocarbon ring and the aromatic heterocycle represented by Ar 11 and Ar 12 may be a monocyclic ring or a condensed ring.
  • the number of condensed rings is preferably 2 to 8, more preferably 2 to 4, and even more preferably 2 or 3.
  • Specific examples of the aromatic hydrocarbon ring include a benzene ring and a naphthalene ring.
  • heteroaromatic ring examples include a pyrrole ring, a furan ring, a thiophene ring, an imidazole ring, a pyrazole ring, an oxazole ring, a thiazole ring, a triazole ring, a tetrazole ring, a pyridine ring, a pyridazine ring, a pyrimidine ring, and a pyrazine ring.
  • a fused ring containing these rings preferably a pyrrole ring, a furan ring or a thiophene ring.
  • R 111 to R 114 of the formula (1-1) each independently represent a hydrogen atom or a substituent, and are preferably substituents.
  • substituents include the groups mentioned in the above-mentioned substituent T, preferably an alkyl group, an alkenyl group, an alkynyl group or an aryl group, and more preferably an alkyl group or an aryl group.
  • the number of carbon atoms of the alkyl group represented by R 111 to R 114 is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 6.
  • the alkyl group and the alkoxy group may be linear, branched or cyclic.
  • the alkyl group and the alkoxy group may have a substituent. Examples of the substituent include the groups mentioned in the above-mentioned substituent T, and a halogen atom, an aryl group, an alkoxy group and the like are preferable. There may be a plurality of substituents.
  • the carbon number of the alkenyl group represented by R 111 to R 114 is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 6.
  • the alkenyl group may be linear, branched or cyclic.
  • the alkenyl group may have a substituent.
  • substituents include the groups mentioned in the above-mentioned substituent T, and a halogen atom, an aryl group, an alkoxy group and the like are preferable.
  • the carbon number of the alkynyl group represented by R 111 to R 114 is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 6.
  • the alkynyl group may be linear, branched or cyclic.
  • the alkynyl group may have a substituent.
  • substituents examples include the groups mentioned in the above-mentioned substituent T, and a halogen atom, an aryl group, an alkoxy group and the like are preferable. There may be a plurality of substituents.
  • the aryl group represented by R 111 to R 114 preferably has 6 to 20 carbon atoms, more preferably 6 to 12 carbon atoms.
  • the aryl group and the aryloxy group may have a substituent. Examples thereof include the groups mentioned in the above-mentioned substituent T, and a halogen atom, an alkyl group, an alkoxy group and the like are preferable. There may be a plurality of substituents.
  • the heteroaryl group represented by R 111 to R 114 is preferably a monocyclic or a heteroaryl group of a condensed ring having a condensation number of 2 to 8, and is a heteroaryl group of a monocycle or a condensed ring having a condensation number of 2 to 4. Is more preferable.
  • the number of heteroatoms constituting the ring of the heteroaryl group is preferably 1 to 3. Examples of the hetero atom constituting the ring of the heteroaryl group include a nitrogen atom, an oxygen atom and a sulfur atom, and a nitrogen atom is preferable.
  • the number of carbon atoms constituting the ring of the heteroaryl group is preferably 3 to 20, more preferably 3 to 18, and even more preferably 3 to 12.
  • the heteroaryl group is preferably a 5-membered or 6-membered heteroaryl group.
  • the heteroaryl group may have a substituent. Examples thereof include the groups mentioned in the above-mentioned substituent T, and a halogen atom, an alkyl group, an alkoxy group and the like are preferable. There may be a plurality of substituents.
  • the maximum absorption wavelength of the specific infrared absorbing compound in dichloromethane is preferably in the wavelength range of 1000 to 1600 nm, more preferably in the wavelength range of 1100 to 1550 nm, and in the wavelength range of 1200 to 1500 nm. Is even more preferable.
  • the slope of the long wavelength end of the absorption spectrum of the specific infrared absorbing compound is steep.
  • the difference between the absorption wavelength of 0.5 on the long wavelength side and the maximum absorption wavelength is preferably 200 nm or less, more preferably 150 nm or less, and more preferably 100 nm or less. Is more preferable.
  • the molar extinction coefficient ( ⁇ ) of the specific infrared absorbing compound is high.
  • the molar extinction coefficient at the maximum absorption wavelength is preferably 20,000 or more, more preferably 50,000 or more, and even more preferably 100,000 or more.
  • Specific examples of the specific infrared absorbing compound include compounds having the following structures.
  • Ph represents a phenyl group.
  • the infrared absorber used in the composition of the present invention can contain a compound other than the above-mentioned specific infrared absorbing compound (hereinafter, also referred to as another infrared absorbing compound).
  • the other infrared absorbing compound may be a compound having a maximum absorption wavelength on the longer wavelength side than the specific infrared absorbing compound, but is excellent in shielding infrared rays in a wide wavelength range and more excellent in light resistance.
  • the other infrared absorbing compound is preferably a compound having a maximum absorption wavelength on the shorter wavelength side than the specific infrared absorbing compound because it can form a film.
  • the difference between the maximum absorption wavelength of the specific infrared absorbing compound and the maximum absorption wavelength of other infrared absorbing compounds is preferably 50 to 800 nm, more preferably 100 to 750 nm, and further preferably 150 to 700 nm. preferable.
  • the maximum absorption wavelength of the other infrared absorbing compound is preferably in the wavelength range of 700 to 1500 nm, more preferably in the wavelength range of 750 to 1400 nm, and in the wavelength range of 800 to 1300 nm. Is more preferable.
  • the other infrared absorbing compound may be a dye or a pigment.
  • Other infrared absorbing compounds include pyrrolopyrrole compounds, cyanine compounds, squarylium compounds, phthalocyanine compounds, naphthalocyanine compounds, quaterylene compounds, merocyanine compounds, croconium compounds, oxonols compounds, iminium compounds, dithiol compounds, triarylmethane compounds, and pyromethene compounds.
  • Azomethine compound, anthraquinone compound, dibenzofuranone compound, dithiolene metal complex, metal oxide, metal boride, etc. which are more likely to promote the association formation of specific infrared absorbing compounds in the film during film formation, and have infrared shielding properties.
  • Pyrrolopyrrole compounds, squalylium compounds, phthalocyanine compounds, and oxonol compounds are preferable, and pyrrolopyrrole compounds are more preferable, because it is easy to form a film having excellent heat resistance and light resistance.
  • Examples of the pyrrolopyrrole compound include the compounds described in paragraphs 0016 to 0058 of JP2009-263614, the compounds described in paragraphs 0037-0052 of JP2011-066731A, and International Publication No. 2015/166783. Examples thereof include the compounds described in paragraphs 0010 to 0033.
  • Examples of the squarylium compound include the compounds described in paragraphs 0044 to 0049 of Japanese Patent Laid-Open No. 2011-208101, the compounds described in paragraphs 0060 to 0061 of Japanese Patent No. 6065169, and paragraph numbers 0040 of International Publication No. 2016/181987. , The compound described in JP-A-2015-176046, the compound described in paragraph No.
  • JP2012-077153 the oxytitanium phthalocyanine described in JP2006-343631, and paragraphs 0013 to 0029 of JP2013-195480.
  • Examples of the naphthalocyanine compound include the compound described in paragraph No. 0093 of JP2012-07715.
  • dithiolene metal complex include the compounds described in Japanese Patent No. 5733804.
  • Examples of the metal oxide include indium tin oxide, antimonthine oxide, zinc oxide, Al-doped zinc oxide, fluorine-doped tin dioxide, niobium-doped titanium dioxide, tungsten oxide and the like.
  • paragraph number 0080 of JP-A-2016-006476 can be referred to, and the contents thereof are incorporated in the present specification.
  • Examples of the metal boride include lanthanum hexaboride. Examples of commercially available lanthanum hexaboride products include LaB 6 -F (manufactured by Nippon Shinkinzoku Co., Ltd.). Further, as the metal boride, the compound described in International Publication No. 2017/11394 can also be used. Examples of commercially available indium tin oxide products include F-ITO (manufactured by DOWA Hi-Tech Co., Ltd.).
  • Examples of other infrared absorbing compounds include the squarylium compound described in JP-A-2017-197437, the squarylium compound described in JP-A-2017-025311, the squarylium compound described in International Publication No. 2016/154782, and patents.
  • Amide-linked squarylium compound a compound having a pyrrole bis-type squarylium skeleton or a croconium skeleton described in JP-A-2017-141215, a dihydrocarbazole-type squarylium compound described in JP-A-2017-082029, JP-A-2017.
  • the content of the infrared absorber is preferably 3% by mass or more, more preferably 3 to 70% by mass, based on the total solid content of the composition of the present invention.
  • the upper limit is preferably 65% by mass or less, and more preferably 60% by mass or less.
  • the lower limit is preferably 4% by mass or more, more preferably 5% by mass or more.
  • the content of the specific infrared absorbing compound is 3% by mass or more in the total solid content of the composition, and more preferably 3 to 70% by mass or more.
  • the upper limit is preferably 65% by mass or less, and more preferably 60% by mass or less.
  • the lower limit is preferably 4% by mass or more, more preferably 5% by mass or more.
  • the composition of the present invention may contain only one specific infrared absorbing compound, or may contain two or more of them. When two or more kinds are contained, it is preferable that the total amount thereof is within the above range.
  • the content of the other infrared absorbing compound is preferably 10 to 1000 parts by mass with respect to 100 parts by mass of the specific infrared absorbing compound.
  • the upper limit is preferably 500 parts by mass or less, and more preferably 300 parts by mass or less.
  • the lower limit is preferably 20 parts by mass or more, more preferably 30 parts by mass or more.
  • the composition of the present invention may contain only one type of other infrared absorbing compound, or may contain two or more types. When two or more kinds are contained, it is preferable that the total amount thereof is within the above range.
  • the composition of the present invention contains a curable compound.
  • the curable compound include polymerizable compounds and resins.
  • the resin may be a non-polymerizable resin (a resin having no polymerizable group) or a polymerizable resin (a resin having a polymerizable group).
  • the polymerizable group include an ethylenically unsaturated bond-containing group, a cyclic ether group, a methylol group, an alkoxymethyl group and the like.
  • Examples of the ethylenically unsaturated bond-containing group include a vinyl group, a vinylphenyl group, a (meth) allyl group, a (meth) acryloyl group, a (meth) acryloyloxy group, a (meth) acryloylamide group, and the like (meth). Allyl groups, (meth) acryloyl groups and (meth) acryloyloxy groups are preferred, and (meth) acryloyloxy groups are more preferred.
  • Examples of the cyclic ether group include an epoxy group and an oxetanyl group, and an epoxy group is preferable.
  • the polymerizable compound preferably contains a polymerizable monomer.
  • the curable compound it is preferable to use a compound containing at least a resin.
  • a resin and a polymerizable monomer (monomer type polymerizable compound) as the curable compound, and the resin and ethylenic property are used. It is more preferable to use a polymerizable monomer (monomer type polymerizable compound) having an unsaturated bond-containing group.
  • polymerizable compound examples include a compound having an ethylenically unsaturated bond-containing group, a compound having a cyclic ether group, a compound having a methylol group, and a compound having an alkoxymethyl group.
  • a compound having an ethylenically unsaturated bond-containing group can be preferably used as a radically polymerizable compound.
  • the compound having a cyclic ether group can be preferably used as a cationically polymerizable compound.
  • Examples of the resin type polymerizable compound include a resin containing a repeating unit having a polymerizable group.
  • the molecular weight of the monomer-type polymerizable compound is preferably less than 2000, more preferably 1500 or less.
  • the lower limit of the molecular weight of the polymerizable monomer is preferably 100 or more, and more preferably 200 or more.
  • the weight average molecular weight (Mw) of the resin-type polymerizable compound is preferably 2000 to 2000000.
  • the upper limit of the weight average molecular weight is preferably 1,000,000 or less, and more preferably 500,000 or less.
  • the lower limit of the weight average molecular weight is preferably 3000 or more, and more preferably 5000 or more.
  • the compound having an ethylenically unsaturated bond-containing group as a polymerizable monomer is preferably a 3- to 15-functional (meth) acrylate compound, and more preferably a 3- to 6-functional (meth) acrylate compound. Specific examples thereof include paragraph numbers 0995 to 0108 of JP2009-288705, paragraphs 0227 of JP2013-029760, paragraphs 0254 to 0257 of JP2008-292970, and paragraphs 0254 to 0257 of JP2013-253224.
  • Examples of the compound having an ethylenically unsaturated bond-containing group include dipentaerythritol tri (meth) acrylate (commercially available KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.) and dipentaerythritol tetra (meth) acrylate (commercially available).
  • KAYARAD D-320 manufactured by Nippon Kayaku Co., Ltd.
  • dipentaerythritol penta (meth) acrylate commercially available KAYARAD D-310; manufactured by Nihon Kayaku Co., Ltd.
  • dipentaerythritol hexa (meth) ) Acrylate (as a commercial product, KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd., NK ester A-DPH-12E; manufactured by Shin-Nakamura Chemical Industry Co., Ltd.)
  • the (meth) acryloyl group of these compounds is ethylene glycol and / Or a compound having a structure bonded via a propylene glycol residue (for example, SR454, SR499 commercially available from Sartmer) and the like.
  • Examples of the compound having an ethylenically unsaturated bond-containing group include diglycerin EO (ethylene oxide) modified (meth) acrylate (commercially available M-460; manufactured by Toa Synthetic) and pentaerythritol tetraacrylate (Shin-Nakamura Chemical Industry Co., Ltd.).
  • diglycerin EO ethylene oxide
  • meth methacrylate
  • pentaerythritol tetraacrylate Shin-Nakamura Chemical Industry Co., Ltd.
  • NK Ester A-TMMT (manufactured by Nippon Kayaku Co., Ltd.), 1,6-hexanediol diacrylate (manufactured by Nippon Kayaku Co., Ltd., KAYARAD HDDA), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), DPHA-40H ( Nippon Kayaku Co., Ltd.), Aronix TO-2349 (Toa Synthetic Co., Ltd.), NK Oligo UA-7200 (Shin-Nakamura Chemical Industry Co., Ltd.), 8UH-1006, 8UH-1012 (Taisei Fine Chemical Co., Ltd.) ), Light acrylate POB-A0, UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600, LINK-202UA (all manufactured by Kyoeisha Chemical Co., Ltd.), etc. are used. You can also do it.
  • Examples of the compound having an ethylenically unsaturated bond-containing group include trimethylolpropane tri (meth) acrylate, trimethylolpropane propylene oxide-modified tri (meth) acrylate, trimethylolpropane ethylene oxide-modified tri (meth) acrylate, and isocyanuric acid. It is also preferable to use a trifunctional (meth) acrylate compound such as an ethylene oxide-modified trimethylolpropane (meth) acrylate or pentaerythritol trimethylolpropane (meth) acrylate.
  • trifunctional (meth) acrylate compounds include Aronix M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306, and M-305. , M-303, M-452, M-450 (manufactured by Toagosei Co., Ltd.), NK ester A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A -TMM-3LM-N, A-TMPT, TMPT (manufactured by Shin Nakamura Chemical Industry Co., Ltd.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, PET-30 (manufactured by Nippon Kayaku Co., Ltd.) And so on.
  • a compound having an ethylenically unsaturated bond-containing group a compound having an acid group such as a carboxyl group, a sulfo group and a phosphoric acid group can also be used.
  • Examples of commercially available products of such compounds include Aronix M-305, M-510, M-520, Aronix TO-2349 (manufactured by Toagosei Co., Ltd.) and the like.
  • a compound having a caprolactone structure can also be used.
  • the description in paragraphs 0042 to 0045 of JP2013-253224A can be referred to, and the content thereof is incorporated in the present specification.
  • Examples of the compound having a caprolactone structure include DPCA-20, DPCA-30, DPCA-60, DPCA-120, etc., which are commercially available from Nippon Kayaku Co., Ltd. as the KAYARAD DPCA series.
  • a compound having an ethylenically unsaturated bond-containing group and an alkyleneoxy group can also be used.
  • Such a compound is preferably a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group and / or a propyleneoxy group, and is a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group. It is more preferable to have a 3 to 6 functional (meth) acrylate compound having 4 to 20 ethyleneoxy groups.
  • SR-494 manufactured by Sartmer
  • KAYARAD TPA-330 Japan
  • KAYARAD TPA-330 Japan
  • a polymerizable compound having a fluorene skeleton can also be used.
  • examples of commercially available products include Ogsol EA-0200 and EA-0300 (manufactured by Osaka Gas Chemical Co., Ltd., (meth) acrylate monomer having a fluorene skeleton).
  • the compound having an ethylenically unsaturated bond-containing group it is also preferable to use a compound that does not substantially contain an environmentally regulatory substance such as toluene.
  • an environmentally regulatory substance such as toluene.
  • commercially available products of such compounds include KAYARAD DPHA LT and KAYARAD DPEA-12 LT (manufactured by Nippon Kayaku Co., Ltd.).
  • Examples of the compound having a cyclic ether group include a compound having an epoxy group, a compound having an oxetanyl group, and the like, and a compound having an epoxy group is preferable.
  • Examples of the compound having an epoxy group include a compound having 1 to 100 epoxy groups in one molecule.
  • the upper limit of the number of epoxy groups may be, for example, 10 or less, or 5 or less.
  • the lower limit of the number of epoxy groups is preferably two or more.
  • Examples of the compound having an epoxy group include paragraph numbers 0034 to 0036 of JP2013-011869, paragraph numbers 0147 to 0156 of JP2014-043556, and paragraph numbers 0083 to 0092 of JP2014-089408.
  • the described compound, the compound described in JP-A-2017-179172 can also be used, and the contents thereof are incorporated in the present specification.
  • the compound having a cyclic ether group may be a low molecular weight compound (for example, a molecular weight of less than 1000) or a polymer compound (for example, a molecular weight of 1000 or more, and in the case of a polymer, a weight average molecular weight of 1000 or more).
  • the weight average molecular weight of the cyclic ether group is preferably 200 to 100,000, more preferably 500 to 50,000.
  • the upper limit of the weight average molecular weight is preferably 10,000 or less, more preferably 5000 or less, and even more preferably 3000 or less.
  • Examples of the compound having a cyclic ether group include the compounds described in paragraphs 0034 to 0036 of JP2013-011869, the compounds described in paragraphs 0147 to 0156 of JP2014-043556, and JP-A-2014.
  • the compounds described in paragraphs 805 to 0092 of JP-A-089408 and the compounds described in JP-A-2017-179172 can also be used.
  • Examples of the compound having a methylol group include a compound in which the methylol group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring.
  • Examples of the compound having an alkoxymethyl group include a compound in which an alkoxymethyl group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring.
  • Examples of compounds in which an alkoxymethyl group or a methylol group is bonded to a nitrogen atom include alkoxymethylated melamine, methylolated melamine, alkoxymethylated benzoguanamine, methylolated benzoguanamine, alkoxymethylated glycoluril, methylolated glycoluril, and alkoxymethylated.
  • Urea, methylolated urea and the like are preferred.
  • the compounds described in paragraphs 0134 to 0147 of JP-A-2004-295116 and paragraphs 095 to 0126 of JP-A-2014-089408 can also be used.
  • a resin in the composition of the present invention, can be used as the curable compound. It is preferable to use a curable compound containing at least a resin.
  • the resin is blended, for example, for the purpose of dispersing a pigment or the like in a composition or for a binder.
  • a resin mainly used for dispersing a pigment or the like in a composition is also referred to as a dispersant.
  • such an application of the resin is an example, and the resin can be used for purposes other than such an application.
  • the resin having a polymerizable group also corresponds to a polymerizable compound.
  • the weight average molecular weight of the resin is preferably 3000 to 2000000.
  • the upper limit is preferably 1,000,000 or less, more preferably 500,000 or less.
  • the lower limit is preferably 4000 or more, more preferably 5000 or more.
  • the resin examples include (meth) acrylic resin, epoxy resin, en-thiol resin, polycarbonate resin, polyether resin, polyarylate resin, polysulfone resin, polyethersulfone resin, polyphenylene resin, polyarylene ether phosphine oxide resin, and polyimide resin.
  • examples thereof include polyamide resin, polyamideimide resin, polyolefin resin, cyclic olefin resin, polyester resin, styrene resin, vinyl acetate resin, polyvinyl alcohol resin, polyvinyl acetal resin, polyurethane resin, and polyurea resin.
  • One of these resins may be used alone, or two or more thereof may be mixed and used.
  • a norbornene resin is preferable from the viewpoint of improving heat resistance.
  • Examples of commercially available norbornene resins include the ARTON series manufactured by JSR Corporation (for example, ARTON F4520).
  • the resin the resin described in Examples of International Publication No. 2016/08864, the resin described in JP-A-2017-0572565, the resin described in JP-A-2017-032685, and the Japanese Patent Application Laid-Open No. 2017-032685.
  • the resin it is also preferable to use a resin having a glass transition temperature of 150 ° C. or higher.
  • a resin having a glass transition temperature of 150 ° C. or higher By using such a resin, it is easier to promote the formation of associations of specific infrared absorbing compounds in the film during film formation, and it is possible to form a film having excellent infrared shielding property, heat resistance and light resistance.
  • the glass transition temperature of the resin is preferably 180 ° C. or higher, more preferably 200 ° C. or higher.
  • Tg glass transition temperature
  • Tg is the glass transition temperature (unit) of the resin.
  • K glass transition temperature (unit: K) of the homopolymer of each monomer
  • W1 to Wn represent the mass fraction of each monomer in all the monomer components.
  • a resin having an acid group examples include a carboxyl group, a phosphoric acid group, a sulfo group, and a phenolic hydroxy group. These acid groups may be only one kind or two or more kinds.
  • the resin having an acid group can also be used as a dispersant.
  • the acid value of the resin having an acid group is preferably 30 to 500 mgKOH / g.
  • the lower limit is preferably 50 mgKOH / g or more, and more preferably 70 mgKOH / g or more.
  • the upper limit is preferably 400 mgKOH / g or less, more preferably 200 mgKOH / g or less, further preferably 150 mgKOH / g or less, and most preferably 120 mgKOH / g or less.
  • a resin containing a repeating unit derived from a compound represented by the formula (ED1) and / or a compound represented by the formula (ED2) (hereinafter, these compounds may be referred to as “ether dimer”) is used. It is also preferable to include it.
  • R 1 and R 2 each independently represent a hydrocarbon group having 1 to 25 carbon atoms which may have a hydrogen atom or a substituent.
  • R represents a hydrogen atom or an organic group having 1 to 30 carbon atoms.
  • the description in JP-A-2010-168539 can be referred to.
  • paragraph number 0317 of JP2013-209760A can be referred to, and this content is incorporated in the present specification.
  • the resin it is also preferable to use a resin having a polymerizable group.
  • the polymerizable group is preferably an ethylenically unsaturated bond-containing group and a cyclic ether group, and more preferably an ethylenically unsaturated bond-containing group.
  • R 1 represents a hydrogen atom or a methyl group
  • R 21 and R 22 each independently represent an alkylene group
  • n represents an integer of 0 to 15.
  • the alkylene group represented by R 21 and R 22 preferably has 1 to 10 carbon atoms, more preferably 1 to 5 carbon atoms, further preferably 1 to 3 carbon atoms, and particularly preferably 2 or 3 carbon atoms.
  • n represents an integer of 0 to 15, preferably an integer of 0 to 5, more preferably an integer of 0 to 4, and even more preferably an integer of 0 to 3.
  • Examples of the compound represented by the formula (X) include ethylene oxide of paracumylphenol or propylene oxide-modified (meth) acrylate.
  • Examples of commercially available products include Aronix M-110 (manufactured by Toagosei Co., Ltd.).
  • the resin preferably contains a resin as a dispersant.
  • the dispersant include an acidic dispersant (acidic resin) and a basic dispersant (basic resin).
  • the acidic dispersant (acidic resin) represents a resin in which the amount of acid groups is larger than the amount of basic groups.
  • the acidic dispersant (acidic resin) a resin having an acid group content of 70 mol% or more is preferable when the total amount of the acid group and the basic group is 100 mol%.
  • the acid group of the acidic dispersant (acidic resin) is preferably a carboxyl group.
  • the acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mgKOH / g.
  • the basic dispersant represents a resin in which the amount of basic groups is larger than the amount of acid groups.
  • a resin in which the amount of basic groups exceeds 50 mol% is preferable when the total amount of the amount of acid groups and the amount of basic groups is 100 mol%.
  • the basic group contained in the basic dispersant is preferably an amino group.
  • the resin used as the dispersant is a graft resin.
  • the description in paragraphs 0025 to 0094 of JP2012-255128A can be referred to, and the contents thereof are incorporated in the present specification.
  • the resin used as the dispersant is a polyimine-based dispersant containing a nitrogen atom in at least one of the main chain and the side chain.
  • the polyimine-based dispersant has a main chain having a partial structure having a functional group of pKa14 or less, a side chain having 40 to 10,000 atoms, and a basic nitrogen atom in at least one of the main chain and the side chain.
  • the resin to have is preferable.
  • the basic nitrogen atom is not particularly limited as long as it is a nitrogen atom exhibiting basicity.
  • the description in paragraphs 0102 to 0166 of JP2012-255128A can be referred to, and the content thereof is incorporated in the present specification.
  • the resin used as the dispersant is a resin having a structure in which a plurality of polymer chains are bonded to the core portion.
  • a resin include dendrimers (including star-shaped polymers).
  • specific examples of the dendrimer include the polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of JP2013-043962.
  • the resin used as the dispersant is also preferably a resin containing a repeating unit having an ethylenically unsaturated bond-containing group in the side chain.
  • the content of the repeating unit having an ethylenically unsaturated bond-containing group in the side chain is preferably 10 mol% or more, more preferably 10 to 80 mol%, and 20 to 70 in all the repeating units of the resin. It is more preferably mol%.
  • block copolymers (EB-1) to (EB-9) described in paragraph Nos. 0219 to 0221 of Japanese Patent No. 6432077, and resins described in JP-A-2018-087939 polyester imine having a polyester side chain described in WO2016 / 104803, a block copolymer described in WO2019 / 125940, and a block polymer having an acrylamide structural unit described in JP-A-2020-06667.
  • Block polymers having an acrylamide structural unit described in JP-A-2020-066688, dispersants described in International Publication No. 2016/104803, resins described in JP-A-2019-095548, and the like can also be used.
  • Dispersants are also available as commercial products, and specific examples thereof include DISPERBYK series manufactured by Big Chemie Japan, SOLSPERSE series manufactured by Japan Lubrizol, Efka series manufactured by BASF, and Ajinomoto Fine-Techno (Ajinomoto Fine Techno). Examples include the Ajispar series manufactured by Co., Ltd. Further, the product described in paragraph number 0129 of JP2012-137564A and the product described in paragraph number 0235 of JP2017-194662 can also be used as a dispersant.
  • the content of the curable compound is preferably 1 to 95% by mass in the total solid content of the composition.
  • the lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, further preferably 7% by mass or more, and particularly preferably 10% by mass or more.
  • the upper limit is preferably 94% by mass or less, more preferably 90% by mass or less, further preferably 85% by mass or less, and particularly preferably 80% by mass or less.
  • the content of the polymerizable compound is preferably 1 to 85% by mass in the total solid content of the composition.
  • the lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more.
  • the upper limit is preferably 80% by mass or less, more preferably 70% by mass or less.
  • the content of the polymerizable monomer is preferably 1 to 50% by mass based on the total solid content of the composition.
  • the lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more.
  • the upper limit is preferably 30% by mass or less, more preferably 20% by mass or less.
  • the content of the compound having an ethylenically unsaturated bond-containing group is 1 to 70 mass by mass in the total solid content of the composition. % Is preferable.
  • the lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more.
  • the upper limit is preferably 65% by mass or less, more preferably 60% by mass or less.
  • the content of the resin is preferably 1 to 85% by mass in the total solid content of the composition.
  • the lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, further preferably 7% by mass or more, and particularly preferably 10% by mass or more.
  • the upper limit is preferably 80% by mass or less, more preferably 75% by mass or less, further preferably 70% by mass or less, and particularly preferably 40% by mass or less.
  • the content of the resin as a dispersant is preferably 0.1 to 40% by mass in the total solid content of the composition.
  • the upper limit is preferably 25% by mass or less, more preferably 20% by mass or less.
  • the lower limit is preferably 0.5% by mass or more, and more preferably 1% by mass or more.
  • the content of the resin as the dispersant is preferably 1 to 100 parts by mass with respect to 100 parts by mass of the above-mentioned specific infrared absorbing compound.
  • the upper limit is preferably 80 parts by mass or less, more preferably 75 parts by mass or less.
  • the lower limit is preferably 2.5 parts by mass or more, and more preferably 5 parts by mass or more.
  • composition of the present invention may contain only one type of curable compound, or may contain two or more types. When two or more curable compounds are contained, the total amount thereof is preferably in the above range.
  • the composition of the present invention can further contain a dye derivative.
  • Dye derivatives are used as dispersion aids.
  • the dye derivative include compounds having a structure in which an acid group or a basic group is bonded to the dye skeleton.
  • the pigment skeletons constituting the pigment derivatives include squarylium pigment skeleton, pyrolopyrrolop pigment skeleton, diketopyrrolopyrrole pigment skeleton, quinacridone pigment skeleton, anthraquinone pigment skeleton, dianthraquinone pigment skeleton, benzoisoindole pigment skeleton, and thiazine indigo pigment skeleton.
  • Azo pigment skeleton, quinophthalone pigment skeleton, phthalocyanine pigment skeleton, naphthalocyanine pigment skeleton, dioxazine pigment skeleton, perylene pigment skeleton, perinone pigment skeleton, benzoimidazolone pigment skeleton, benzothiazole pigment skeleton, benzoimidazole pigment skeleton and benzoxazole pigment skeleton The squarylium pigment skeleton, the pyrolopyrrolop pigment skeleton, the diketopyrrolopyrrole pigment skeleton, the phthalocyanine pigment skeleton, the quinacridone pigment skeleton and the benzoimidazolone pigment skeleton are preferable, and the squarylium pigment skeleton and the pyrolopyrrolop pigment skeleton are more preferable.
  • Examples of the acid group include a carboxyl group, a sulfo group, a phosphoric acid group, a boronic acid group, a carboxylic acid amide group, a sulfonic acid amide group, an imic acid group and salts thereof.
  • alkali metal ions Li + , Na + , K + , etc.
  • alkaline earth metal ions Ca 2+ , Mg 2+ , etc.
  • ammonium ions imidazolium ions, pyridinium ions, etc.
  • Examples include phosphonium ion.
  • the carboxylic acid amide group a group represented by -NHCOR X1 is preferable.
  • sulfonic acid amide group a group represented by -NHSO 2 RX2 is preferable.
  • imidic acid group a group represented by -SO 2 NHSO 2 R X3 , -CONHSO 2 R X4 , -CONHCOR X5 or -SO 2 NHCOR X6 is preferable, and -SO 2 NHSO 2 R X3 is more preferable.
  • RX1 to RX6 independently represent an alkyl group or an aryl group, respectively.
  • the alkyl group and aryl group represented by RX1 to RX6 may have a substituent.
  • the substituent is preferably a halogen atom, more preferably a fluorine atom.
  • Examples of the basic group include an amino group, a pyridinyl group and a salt thereof, a salt of an ammonium group, and a phthalimidemethyl group.
  • Examples of the atom or atomic group constituting the salt include hydroxide ion, halogen ion, carboxylate ion, sulfonic acid ion, and phenoxide ion.
  • Examples of the dye derivative include the compound described in JP-A-56-118462, the compound described in JP-A-63-246674, the compound described in JP-A No. 01-217777, and JP-A-03-009961. , The compound described in JP-A-03-026767, the compound described in JP-A-03-153780, the compound described in JP-A-03-045662, and JP-A-04-285669. , The compound described in JP-A-06-145546, the compound described in JP-A-06-212588, the compound described in JP-A-06-240158, and the compound described in JP-A-10-030063. , Japanese Patent Application Laid-Open No.
  • the content of the dye derivative is preferably 1 to 50 parts by mass with respect to 100 parts by mass of the above-mentioned specific infrared absorbing compound.
  • the lower limit is preferably 3 parts by mass or more, and more preferably 5 parts by mass or more.
  • the upper limit is preferably 40 parts by mass or less, more preferably 30 parts by mass or less. Only one kind of dye derivative may be used, or two or more kinds may be used. When two or more types are used, the total amount is preferably in the above range.
  • the composition of the present invention preferably contains a solvent.
  • the solvent include water and an organic solvent, and an organic solvent is preferable.
  • the organic solvent include ester-based solvents, ketone-based solvents, alcohol-based solvents, amide-based solvents, ether-based solvents, hydrocarbon-based solvents and the like.
  • paragraph No. 0223 of International Publication No. 2015/166779 can be referred to, the contents of which are incorporated herein.
  • an ester solvent substituted with a cyclic alkyl group and a ketone solvent substituted with a cyclic alkyl group can also be preferably used.
  • organic solvent examples include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2 -Heptanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethylcarbitol acetate, butylcarbi Tall acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, 3-methoxy-N, N-dimethylpropanamide, 3-butoxy-N, N-di
  • aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) as organic solvents may need to be reduced for environmental reasons (for example, 50 parts by mass (parts) with respect to the total amount of organic solvent. Per millision) or less, 10 mass ppm or less, or 1 mass ppm or less).
  • an organic solvent having a low metal content it is preferable to use an organic solvent having a low metal content, and the metal content of the organic solvent is preferably, for example, 10 mass ppb (parts per billion) or less. If necessary, an organic solvent at the mass ppt (parts per tension) level may be used, and such an organic solvent is provided by, for example, Toyo Synthetic Co., Ltd. (The Chemical Daily, November 13, 2015).
  • Examples of the method for removing impurities such as metals from the organic solvent include distillation (molecular distillation, thin film distillation, etc.) and filtration using a filter.
  • the filter pore diameter of the filter used for filtration is preferably 10 ⁇ m or less, more preferably 5 ⁇ m or less, and even more preferably 3 ⁇ m or less.
  • the filter material is preferably polytetrafluoroethylene, polyethylene or nylon.
  • the organic solvent may contain isomers (compounds having the same number of atoms but different structures). Further, only one kind of isomer may be contained, or a plurality of kinds may be contained.
  • the content of peroxide in the organic solvent is preferably 0.8 mmol / L or less, and more preferably substantially free of peroxide.
  • the content of the solvent in the composition is preferably 10 to 97% by mass.
  • the lower limit is preferably 30% by mass or more, more preferably 40% by mass or more, further preferably 50% by mass or more, further preferably 60% by mass or more, and 70% by mass. The above is particularly preferable.
  • the upper limit is preferably 96% by mass or less, and more preferably 95% by mass or less.
  • the composition may contain only one type of solvent, or may contain two or more types of solvent. When two or more kinds are contained, it is preferable that the total amount thereof is within the above range.
  • the composition of the present invention contains a polymerizable compound
  • the photopolymerization initiator is not particularly limited and may be appropriately selected from known photopolymerization initiators. For example, a compound having photosensitivity to light rays in the ultraviolet region to the visible region is preferable.
  • the photopolymerization initiator is preferably a photoradical polymerization initiator.
  • photopolymerization initiator examples include halogenated hydrocarbon derivatives (for example, compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazoles, oxime compounds, organic peroxides, and thio compounds. , Ketone compounds, aromatic onium salts, ⁇ -hydroxyketone compounds, ⁇ -aminoketone compounds and the like.
  • the photopolymerization initiator is a trihalomethyltriazine compound, a benzyldimethylketal compound, an ⁇ -hydroxyketone compound, an ⁇ -aminoketone compound, an acylphosphine compound, a phosphine oxide compound, a metallocene compound, an oxime compound, or a triarylimidazole.
  • Dimer, onium compound, benzothiazole compound, benzophenone compound, acetophenone compound, cyclopentadiene-benzene-iron complex, halomethyloxadiazole compound and 3-aryl substituted coumarin compound are preferable, and oxime compound and ⁇ -hydroxyketone compound are preferable.
  • ⁇ -Aminoketone compound, and a compound selected from an acylphosphine compound are more preferable, and an oxime compound is further preferable.
  • the photopolymerization initiator the compound described in paragraphs 0065 to 0111 of JP-A-2014-130173, the compound described in Japanese Patent No. 6301489, MATERIAL STAGE 37-60p, vol. 19, No. Peroxide-based photopolymerization initiator described in 3, 2019, photopolymerization initiator described in International Publication No. 2018/221177, photopolymerization initiator described in International Publication No. 2018/110179, JP-A-2019-043864.
  • Examples thereof include the above-mentioned aminoacetophenone-based initiators having an oxazolidine group, the oxime-based photopolymerization initiators described in JP-A-2013-190459, and the contents thereof are incorporated in the present specification.
  • ⁇ -hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, Omnirad 127 (above, IGM Resins B.V.), Irgacure 184, Irgacure 1173, Irgacure27, Irgacure29. (Manufactured by the company) and the like.
  • Commercially available ⁇ -aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, Omnirad 379EG (above, IGM Resins BV), Irgacure 907, Irgacure 369, Irgacure 369, Irger Made) and so on.
  • acylphosphine compounds examples include Omnirad 819, Omnirad TPO (above, manufactured by IGM Resins BV), Irgacure 819, and Irgacure TPO (above, manufactured by BASF).
  • Examples of the oxime compound include the compound described in JP-A-2001-233842, the compound described in JP-A-2000-080068, the compound described in JP-A-2006-342166, and J. Am. C. S. The compound according to Perkin II (1979, pp. 1653-1660), J. Mol. C. S. The compound described in Perkin II (1979, pp. 156-162), the compound described in Journal of Photopolisr Science and Technology (1995, pp. 202-232), the compound described in JP-A-2000-066385, the compound described in JP-A-2000-066385. Compounds described in JP-A-2004-534797, compounds described in JP-A-2017-109766, compounds described in Japanese Patent No.
  • oxime compound examples include 3-benzoyloxyiminobutane-2-one, 3-acetoxyiminobutane-2-one, 3-propionyloxyiminobutane-2-one, 2-acetoxyiminopentane-3-one, and the like.
  • 2-acetoxyimino-1-phenylpropane-1-one 2-benzoyloxyimino-1-phenylpropane-1-one, 3- (4-toluenesulfonyloxy) iminobutane-2-one, and 2-ethoxycarbonyloxy Examples thereof include imino-1-phenylpropane-1-one.
  • an oxime compound having a fluorene ring can also be used.
  • Specific examples of the oxime compound having a fluorene ring include the compound described in JP-A-2014-137466, the compound described in Japanese Patent No. 6636081, and the compound described in Korean Patent Publication No. 10-2016-0109444. Will be.
  • an oxime compound having a skeleton in which at least one benzene ring of the carbazole ring is a naphthalene ring can also be used.
  • Specific examples of such an oxime compound include the compounds described in International Publication No. 2013/083505.
  • an oxime compound having a fluorine atom can also be used as the photopolymerization initiator.
  • Specific examples of the oxime compound having a fluorine atom are described in the compounds described in JP-A-2010-262028, compounds 24, 36-40 described in JP-A-2014-500852, and JP-A-2013-164471.
  • Compound (C-3) and the like can be mentioned.
  • an oxime compound having a nitro group can be used as the photopolymerization initiator.
  • the oxime compound having a nitro group is also preferably a dimer.
  • Specific examples of the oxime compound having a nitro group include the compounds described in paragraphs 0031 to 0047 of JP2013-114249A and paragraphs 0008-0012 and 0070-0079 of JP-A-2014-137466. Examples thereof include the compound described in paragraphs 0007 to 0025 of Japanese Patent No. 4223071, ADEKA ARKULS NCI-831 (manufactured by ADEKA Corporation).
  • an oxime compound having a benzofuran skeleton can also be used.
  • Specific examples include OE-01 to OE-75 described in International Publication No. 2015/036910.
  • an oxime compound in which a substituent having a hydroxy group is bonded to the carbazole skeleton can also be used.
  • Examples of such a photopolymerization initiator include the compounds described in International Publication No. 2019/088055.
  • the oxime compound is preferably a compound having a maximum absorption wavelength in the wavelength range of 350 to 500 nm, and more preferably a compound having a maximum absorption wavelength in the wavelength range of 360 to 480 nm.
  • the molar extinction coefficient of the oxime compound at a wavelength of 365 nm or a wavelength of 405 nm is preferably high, more preferably 1000 to 300,000, still more preferably 2000 to 300,000, and more preferably 5000 to 200,000. It is particularly preferable to have.
  • the molar extinction coefficient of a compound can be measured using a known method. For example, it is preferable to measure at a concentration of 0.01 g / L using an ethyl acetate solvent with a spectrophotometer (Cary-5 spectrophotometer manufactured by Varian).
  • a bifunctional or trifunctional or higher photoradical polymerization initiator may be used as the photopolymerization initiator.
  • two or more radicals are generated from one molecule of the photoradical polymerization initiator, so that good sensitivity can be obtained.
  • the crystallinity is lowered, the solubility in a solvent or the like is improved, the precipitation is less likely to occur with time, and the stability of the composition with time can be improved.
  • Specific examples of the bifunctional or trifunctional or higher functional photo-radical polymerization initiators include Japanese Patent Publication No. 2010-527339, Japanese Patent Publication No. 2011-524436, International Publication No.
  • the photoinitiator described in paragraphs 0020 to 0033, the photopolymerization initiator (A) described in paragraphs 0017 to 0026 of JP-A-2017-151342, is described in Japanese Patent No. 6469669. Examples thereof include an oxime ester-based photoinitiator.
  • the content of the photopolymerization initiator is preferably 0.1 to 40% by mass, more preferably 0.5 to 35% by mass, still more preferably 1 to 30% by mass in the total solid content of the composition.
  • the composition may contain only one kind of photopolymerization initiator, or may contain two or more kinds of photopolymerization initiators. When two or more kinds are contained, it is preferable that the total amount thereof is within the above range.
  • composition of the present invention contains a compound having a cyclic ether group
  • a curing agent examples include amine compounds, acid anhydride compounds, amide compounds, phenol compounds, polyvalent carboxylic acids, thiol compounds and the like.
  • Specific examples of the curing agent include succinic acid, trimellitic acid, pyromellitic acid, N, N-dimethyl-4-aminopyridine, pentaerythritol tetrakis (3-mercaptopropionate) and the like.
  • the curing agent the compounds described in paragraphs 0072 to 0078 of JP-A-2016-07520 and the compounds described in JP-A-2017-036379 can also be used.
  • the content of the curing agent is preferably 0.01 to 20 parts by mass, more preferably 0.01 to 10 parts by mass, and 0.1 to 6.0 parts by mass with respect to 100 parts by mass of the compound having a cyclic ether group. Is even more preferable.
  • the composition of the present invention can contain a chromatic colorant.
  • the chromatic colorant means a colorant other than the white colorant and the black colorant.
  • the chromatic colorant is preferably a colorant having absorption in a wavelength range of 400 nm or more and less than 650 nm.
  • the chromatic colorant examples include a red colorant, a green colorant, a blue colorant, a yellow colorant, a purple colorant, and an orange colorant.
  • the chromatic colorant may be a pigment or a dye. Pigments and dyes may be used in combination. Further, the pigment may be either an inorganic pigment or an organic pigment. Further, as the pigment, an inorganic pigment or a material in which a part of the organic-inorganic pigment is replaced with an organic chromophore can also be used. By replacing inorganic pigments and organic-inorganic pigments with organic chromophores, hue design can be facilitated.
  • the average primary particle size of the pigment is preferably 1 to 200 nm.
  • the lower limit is preferably 5 nm or more, more preferably 10 nm or more.
  • the upper limit is preferably 180 nm or less, more preferably 150 nm or less, still more preferably 100 nm or less.
  • the primary particle size of the pigment can be obtained from an image photograph obtained by observing the primary particles of the pigment with a transmission electron microscope. Specifically, the projected area of the primary particles of the pigment is obtained, and the corresponding circle-equivalent diameter is calculated as the primary particle diameter of the pigment.
  • the average primary particle size in the present invention is an arithmetic average value of the primary particle size for the primary particles of 400 pigments.
  • the primary particles of the pigment refer to independent particles without aggregation.
  • the chromatic colorant preferably contains a pigment.
  • the content of the pigment in the chromatic colorant is preferably 50% by mass or more, more preferably 70% by mass or more, further preferably 80% by mass or more, and further preferably 90% by mass or more. Is particularly preferred. Examples of the pigment include those shown below.
  • halogenated zinc phthalocyanine has an average number of halogen atoms in one molecule of 10 to 14, a bromine atom of 8 to 12, and a chlorine atom of 2 to 5 on average. Pigments can also be used. Specific examples include the compounds described in International Publication No. 2015/118720. Further, as a green colorant, the compound described in Chinese Patent Application No. 1069090227, the phthalocyanine compound having a phosphoric acid ester as a ligand according to International Publication No. 2012/102395, and Japanese Patent Application Laid-Open No. 2019-008014. The phthalocyanine compound of JP-A-2018-180023, the compound described in JP-A-2019-038958, the core-shell dye described in JP-A-2020-076955, and the like can also be used.
  • an aluminum phthalocyanine compound having a phosphorus atom can also be used. Specific examples thereof include the compounds described in paragraph numbers 0022 to 0030 of JP2012-247591A and paragraph numbers 0047 of JP2011-157478A.
  • JP-A-2013-209435 the quinophthalone compound described in JP-A-2013-181015
  • the quinophthalone compound described in JP-A-2013-061622 A quinophthalone compound described in JP2013-032486, a quinophthalone compound described in JP2012-226110A, a quinophthalone compound described in JP-A-2008-074987, and a quinophthalone compound described in JP-A-2008-081565.
  • a red colorant As a red colorant, a diketopyrrolopyrrole compound in which at least one bromine atom is substituted in the structure described in JP-A-2017-201384, and a diketopyrrolopyrrole compound described in paragraphs 0016 to 0022 of Patent No. 6248838. , Diketopyrrolopyrrole compound described in WO2012 / 102399, diketopyrrolopyrrole compound described in WO2012 / 117965, naphtholazo compound described in JP2012-229344, patent No. 6516119.
  • the descriptions of Japanese Patent No. 6561862, Japanese Patent No. 6413872, Japanese Patent No. 6281345, and Japanese Patent Application Laid-Open No. 2020-026503 can be referred to. Incorporated herein.
  • the pyrrolopyrrole pigment the crystallite size in the plane direction corresponding to the maximum peak in the X-ray diffraction pattern among the eight planes ( ⁇ 1 ⁇ 1 ⁇ 1) of the crystal lattice planes is 140 ⁇ or less. It is also preferable to use some. Further, it is also preferable to set the physical characteristics of the pyrrolopyrrole pigment as described in paragraphs 0028 to 0073 of JP-A-2020-097744.
  • Dyes can also be used as the chromatic colorant.
  • the dye is not particularly limited, and known dyes can be used.
  • pyrazole azo dyes for example, pyrazole azo dyes, anilino azo dyes, triarylmethane dyes, anthraquinone dyes, anthrapyridone dyes, benziliden dyes, oxonol dyes, pyrazolotriazole azo dyes, pyridone azo dyes, cyanine dyes, phenothiazines.
  • Examples thereof include dyes, pyropyrazole azomethine dyes, xanthene dyes, phthalocyanine dyes, benzopyran dyes, indigo dyes, and pyromethene dyes.
  • the dyes include a thiazole compound described in JP-A-2012-158649, an azo compound described in JP-A-2011-184493, an azo compound described in JP-A-2011-145540, and a Korean published patent No. 10.
  • a thiazole compound described in JP-A-2012-158649 an azo compound described in JP-A-2011-184493
  • an azo compound described in JP-A-2011-145540 an azo compound described in JP-A-2011-145540
  • Korean published patent No. 10 -The triarylmethane dye polymer described in Japanese Patent Application Laid-Open No. 2020-0028160 and the xanthene compound described in JP-A-2020-117638 can also be preferably used.
  • the chromatic colorant the phthalocyanine compound described in International Publication No. 2020/174991 can be used.
  • the content of the chromatic colorant is preferably 1 to 50% by mass in the total solid content of the composition of the present invention.
  • the composition of the present invention contains two or more kinds of chromatic colorants, it is preferable that the total amount thereof is within the above range.
  • the composition of the present invention may also contain a coloring material that transmits infrared rays to block visible light (hereinafter, also referred to as a coloring material that blocks visible light).
  • a composition containing a coloring material that blocks visible light is preferably used as a composition for forming an infrared transmission filter.
  • the color material that blocks visible light is preferably a color material that absorbs light in the wavelength range from purple to red. Further, the color material that blocks visible light is preferably a color material that blocks light in the wavelength region of 450 to 650 nm. Further, the color material that blocks visible light is preferably a color material that transmits light having a wavelength of 900 to 1500 nm.
  • the coloring material that blocks visible light preferably satisfies at least one of the following requirements (A) and (B).
  • B Contains an organic black colorant.
  • Examples of the chromatic colorant include those described above.
  • Examples of the organic black colorant include bisbenzofuranone compound, azomethin compound, perylene compound, azo compound and the like, and bisbenzofuranone compound and perylene compound are preferable.
  • Examples of the bisbenzofuranone compound include the compounds described in JP-A-2010-534726, JP-A-2012-515233, JP-A-2012-515234, etc., for example, as "Irgaphor Black” manufactured by BASF. It is available.
  • Examples of the perylene compound include the compounds described in paragraphs 0016 to 0020 of JP-A-2017-226821, C.I. I. Pigment Black 31, 32 and the like can be mentioned.
  • Examples of the azomethin compound include the compounds described in JP-A No. 01-17601, JP-A-02-0346664, and the like, and can be obtained as, for example, "Chromofine Black A1103" manufactured by Dainichiseika.
  • Examples of the combination of chromatic colorants in the case of forming black color by the combination of two or more kinds of chromatic colorants include the following embodiments (1) to (8).
  • the content of the coloring material that blocks visible light is preferably 1 to 50% by mass in the total solid content of the composition.
  • the lower limit is preferably 5% by mass or more, more preferably 10% by mass or more, further preferably 20% by mass or more, and particularly preferably 30% by mass or more.
  • the composition of the present invention preferably contains a surfactant.
  • a surfactant various surfactants such as a fluorine-based surfactant, a nonionic surfactant, a cationic surfactant, an anionic surfactant, and a silicone-based surfactant can be used.
  • the surfactant is preferably a silicone-based surfactant or a fluorine-based surfactant. Examples of the surfactant include the surfactant described in paragraph Nos. 0238 to 0245 of International Publication No. 2015/16677, and the surfactant described in JP-A-2020-008634, and the contents thereof are described in the present invention. Incorporated into the specification.
  • fluorine-based surfactant examples include the surfactants described in paragraphs 0060 to 0064 of Japanese Patent Laid-Open No. 2014-041318 (paragraphs 0060 to 0064 of International Publication No. 2014/017669) and the like, Japanese Patent Application Laid-Open No. 2011-.
  • the surfactants described in paragraphs 0117 to 0132 of Japanese Patent Application Laid-Open No. 132503 and the surfactants described in JP-A-2020-008634 are mentioned, and the contents thereof are incorporated in the present specification.
  • fluorine-based surfactants include, for example, Megafax F-171, F-172, F-173, F-176, F-177, F-141, F-142, F-143, F-144. , F-437, F-475, F-477, F-479, F-482, F-554, F-555-A, F-556, F-557, F-558, F-559, F-560.
  • a fluorine-based surfactant an acrylic compound having a molecular structure having a functional group containing a fluorine atom and in which a portion of the functional group containing a fluorine atom is cut off and the fluorine atom volatilizes when heat is applied is also available.
  • a fluorine-based surfactant include the Megafuck DS series manufactured by DIC Corporation (The Chemical Daily (February 22, 2016), Nikkei Sangyo Shimbun (February 23, 2016)), for example, Megafuck. DS-21 can be mentioned.
  • fluorine-based surfactant it is also preferable to use a polymer of a fluorine atom-containing vinyl ether compound having a fluorinated alkyl group or a fluorinated alkylene ether group and a hydrophilic vinyl ether compound.
  • a fluorine-based surfactant include the fluorine-based surfactants described in JP-A-2016-216602, the contents of which are incorporated in the present specification.
  • a block polymer can also be used as the fluorosurfactant.
  • a fluorine-based surfactant it has a repeating unit derived from a (meth) acrylate compound having a fluorine atom and 2 or more (preferably 5 or more) alkyleneoxy groups (preferably ethyleneoxy groups and propyleneoxy groups) (meth).
  • a fluorine-containing polymer compound containing a repeating unit derived from an acrylate compound can also be preferably used.
  • the fluorine-containing surfactants described in paragraphs 0016 to 0037 of JP-A-2010-032698 and the following compounds are also exemplified as the fluorine-based surfactants used in the present invention.
  • the weight average molecular weight of the above compounds is preferably 3000 to 50,000, for example 14000.
  • % indicating the ratio of the repeating unit is mol%.
  • a fluorine-based surfactant a fluorine-containing polymer having an ethylenically unsaturated bond-containing group in the side chain can also be used. Specific examples thereof include the compounds described in paragraphs 0050 to 0090 and 0289 to 0295 of JP2010-164965, Megafuck RS-101, RS-102, RS-718K, manufactured by DIC Corporation. RS-72-K and the like can be mentioned. Further, as the fluorine-based surfactant, the compounds described in paragraphs 0015 to 0158 of JP-A-2015-117327 can also be used.
  • a fluorine-containing imide salt compound represented by the formula (fi-1) is also preferable to use as a surfactant.
  • m represents 1 or 2
  • n represents an integer of 1 to 4
  • a represents 1 or 2
  • X a + represents a-valent metal ion, primary ammonium ion, and first. Represents a secondary ammonium ion, a tertiary ammonium ion , a quaternary ammonium ion or NH 4+ .
  • Nonionic surfactants include glycerol, trimethylolpropane, trimethylolethane, their ethoxylates and propoxylates (eg, glycerol propoxylates, glycerol ethoxylates, etc.), polyoxyethylene lauryl ethers, polyoxyethylene stearyl ethers, etc.
  • cationic surfactant examples include tetraalkylammonium salt, alkylamine salt, benzalkonium salt, alkylpyridium salt, imidazolium salt and the like. Specific examples thereof include dihydroxyethylstearylamine, 2-heptadecenyl-hydroxyethylimidazoline, lauryldimethylbenzylammonium chloride, cetylpyridinium chloride, stealamidemethylpyridium chloride and the like.
  • Anionic surfactants include dodecylbenzene sulfonic acid, sodium dodecylbenzene sulfonate, sodium lauryl sulfate, sodium alkyldiphenyl ether disulfonate, sodium alkylnaphthalene sulfonate, sodium dialkyl sulfosuccinate, sodium stearate, potassium oleate, sodium dioctyl.
  • Sulfonate sodium polyoxyethylene alkyl ether sulfate, sodium polyoxyethylene alkylate sulfate, sodium polyoxyethylene alkylphenyl ether sulfate, sodium dialkyl sulfosuccinate, sodium stearate, sodium oleate, t-octylphenoxyethoxypolyethoxyethyl Examples include sodium sulfate.
  • Silicone-based surfactants include DC3PA, SH7PA, DC11PA, SH21PA, SH28PA, SH29PA, SH30PA, SH8400, SH 8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, SF 84 -Specialty Materials Co., Ltd.), TSF-4300, TSF-4445, TSF-4460, TSF-4452 (all manufactured by Momentive Performance Materials Co., Ltd.), KP-341, KF-6000, KF-6001, KF-6002, KF-6003 (above, manufactured by Shin-Etsu Chemical Co., Ltd.), BYK-307, BYK-322, BYK-323, BYK-330, BYK-333, BYK-3760, BYK-UV3510 (above, Big Chemie) (Manufactured by the company) and the like.
  • a compound having the following structure can also be used as the silicone-based surfactant.
  • the content of the surfactant is preferably 0.001 to 1% by mass, more preferably 0.001 to 0.5% by mass, still more preferably 0.001 to 0.2% by mass in the total solid content of the composition. ..
  • the composition may contain only one type of surfactant, or may contain two or more types of surfactant. When two or more kinds are contained, it is preferable that the total amount thereof is within the above range.
  • the composition of the present invention can contain a polymerization inhibitor.
  • the polymerization inhibitor include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis (3-methyl-6-tert-butylphenol), and the like.
  • examples thereof include 2,2'-methylenebis (4-methyl-6-t-butylphenol) and N-nitrosophenylhydroxyamine salt (ammonium salt, first cerium salt, etc.), and p-methoxyphenol is preferable.
  • the content of the polymerization inhibitor is preferably 0.0001 to 5% by mass based on the total solid content of the composition.
  • the composition may contain only one type of polymerization inhibitor, or may contain two or more types. When two or more kinds are contained, it is preferable that the total amount thereof is within the above range.
  • the composition of the present invention can contain a silane coupling agent.
  • the silane coupling agent means a silane compound having a hydrolyzable group and other functional groups.
  • the hydrolyzable group refers to a substituent that is directly linked to a silicon atom and can form a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction.
  • the hydrolyzable group include a halogen atom, an alkoxy group, an acyloxy group and the like, and an alkoxy group is preferable. That is, the silane coupling agent is preferably a compound having an alkoxysilyl group.
  • Examples of the functional group other than the hydrolyzable group include a vinyl group, a styryl group, a (meth) acryloyl group, a mercapto group, an epoxy group, an oxetanyl group, an amino group, a ureido group, a sulfide group, an isocyanate group and a phenyl group. And the like, the (meth) acryloyl group and the epoxy group are preferable.
  • Examples of the silane coupling agent include the compounds described in paragraphs 0018 to 0036 of JP2009-288703 and the compounds described in paragraphs 0056 to 0066 of JP2009-242604. Incorporated in the specification.
  • the content of the silane coupling agent is preferably 0.01 to 15.0% by mass, more preferably 0.05 to 10.0% by mass, based on the total solid content of the composition.
  • the composition may contain only one type of silane coupling agent, or may contain two or more types. When two or more kinds are contained, it is preferable that the total amount thereof is within the above range.
  • the composition of the present invention can contain an ultraviolet absorber.
  • the ultraviolet absorber include conjugated diene compounds, aminodiene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, hydroxyphenyltriazine compounds, indole compounds, and triazine compounds. Specific examples of such compounds include paragraph numbers 0038 to 0052 of JP2009-217221A, paragraph numbers 0052 to 0072 of JP2012-208374A, and paragraph numbers 0317 to JP2013-066814. 0334, the compounds described in paragraph numbers 0061 to 0080 of JP 2016-162946 are mentioned, and their contents are incorporated in the present specification.
  • UV-503 manufactured by Daito Kagaku Co., Ltd.
  • Tinuvin series manufactured by BASF
  • Uvinul series examples of the benzotriazole compound
  • the MYUA series made of Miyoshi Oil & Fat (The Chemical Daily, February 1, 2016).
  • the ultraviolet absorber is a compound described in paragraphs 0049 to 0059 of Japanese Patent No. 6268967, a compound described in paragraph numbers 0059 to 0076 of International Publication No. 2016/181987, and International Publication No. 2020/137819.
  • the thioaryl group-substituted benzotriazole type ultraviolet absorber described in 1 can also be used.
  • the content of the ultraviolet absorber is preferably 0.01 to 30% by mass, more preferably 0.05 to 25% by mass, based on the total solid content of the composition.
  • the composition may contain only one type of ultraviolet absorber, or may contain two or more types. When two or more kinds are contained, it is preferable that the total amount thereof is within the above range.
  • the composition of the present invention can contain an antioxidant.
  • the antioxidant include phenol compounds, phosphite ester compounds, thioether compounds and the like.
  • the phenol compound any phenol compound known as a phenolic antioxidant can be used.
  • Preferred phenolic compounds include hindered phenolic compounds.
  • a compound having a substituent at a site (ortho position) adjacent to the phenolic hydroxy group is preferable.
  • a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms is preferable.
  • the antioxidant a compound having a phenol group and a phosphite ester group in the same molecule is also preferable.
  • a phosphorus-based antioxidant can also be preferably used.
  • a phosphorus-based antioxidant Tris [2-[[2,4,8,10-tetrakis (1,1-dimethylethyl) dibenzo [d, f] [1,3,2] dioxaphosphepine-6] -Il] Oxy] Ethyl] amine, Tris [2-[(4,6,9,11-tetra-tert-butyldibenzo [d, f] [1,3,2] dioxaphosphepin-2-yl] ) Oxy] ethyl] amine, ethylbis phosphite (2,4-di-tert-butyl-6-methylphenyl) and the like.
  • antioxidants include, for example, Adekastab AO-20, Adekastab AO-30, Adekastab AO-40, Adekastab AO-50, Adekastab AO-50F, Adekastab AO-60, Adekastab AO-60G, and Adekastab AO-80. , ADEKA STAB AO-330 (above, manufactured by ADEKA Corporation) and the like. Further, as the antioxidant, the compounds described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, the compounds described in International Publication No. 2017/006600, and the compounds described in International Publication No. 2017/164024 are used. It can also be used.
  • the content of the antioxidant is preferably 0.01 to 20% by mass, more preferably 0.3 to 15% by mass, based on the total solid content of the composition.
  • the composition may contain only one type of antioxidant, or may contain two or more types. When two or more kinds are contained, it is preferable that the total amount thereof is within the above range.
  • compositions of the present invention include sensitizers, cure accelerators, fillers, thermosetting accelerators, plasticizers and other auxiliaries (eg, conductive particles, defoamers, flame retardants, leveling). Agents, peeling accelerators, fragrances, surface tension modifiers, chain transfer agents, etc.) may be contained. By appropriately containing these components, properties such as film physical characteristics can be adjusted. These components are described in, for example, paragraph No. 0183 or later of JP2012-003225A (paragraph number 0237 of the corresponding US Patent Application Publication No. 2013/0034812), paragraph 2008-250074. The description of numbers 0101 to 0104, 0107 to 0109, etc.
  • the composition of the present invention may contain a latent antioxidant, if necessary.
  • the latent antioxidant is a compound in which the site that functions as an antioxidant is protected by a protecting group, and is heated at 100 to 250 ° C. or at 80 to 200 ° C. in the presence of an acid / base catalyst. This includes compounds in which the protecting group is desorbed and functions as an antioxidant.
  • Examples of the latent antioxidant include compounds described in International Publication No. 2014/021023, International Publication No. 2017/030005, and JP-A-2017-008219.
  • Examples of commercially available products of latent antioxidants include ADEKA ARKULS GPA-5001 (manufactured by ADEKA Corporation).
  • the storage container for the composition of the present invention is not particularly limited, and a known storage container can be used.
  • a storage container for the purpose of suppressing impurities from being mixed into raw materials and compositions, a multi-layer bottle in which the inner wall of the container is composed of 6 types and 6 layers of resin and a bottle in which 6 types of resin are composed of 7 layers are used. It is also preferable to use it. Examples of such a container include the container described in Japanese Patent Application Laid-Open No. 2015-123351.
  • the inner wall of the container is preferably made of glass or stainless steel for the purpose of preventing metal elution from the inner wall of the container, improving the stability of the composition over time, and suppressing the deterioration of the components.
  • composition of the present invention can be prepared by mixing the above-mentioned components.
  • all the components may be dissolved or dispersed in a solvent at the same time to prepare the composition, or if necessary, two or more solutions or dispersions in which each component is appropriately mixed may be prepared in advance. They may be prepared and mixed at the time of use (at the time of application) to prepare a composition.
  • a process of dispersing the pigment may be included.
  • the mechanical force used for dispersing the pigment includes compression, squeezing, impact, shearing, cavitation and the like.
  • Specific examples of these processes include bead mills, sand mills, roll mills, ball mills, paint shakers, microfluidizers, high speed impellers, sand grinders, flow jet mixers, high pressure wet atomization, ultrasonic dispersion and the like.
  • the process and disperser for dispersing pigments are "Dispersion Technology Complete Works, Published by Information Organization Co., Ltd., July 15, 2005" and "Dispersion technology centered on suspension (solid / liquid dispersion system) and industrial". Practical application The process and disperser described in Paragraph No. 0022 of Japanese Patent Application Laid-Open No.
  • the pigment may be miniaturized in the salt milling step.
  • the materials, equipment, processing conditions, etc. used in the salt milling step for example, the descriptions in JP-A-2015-194521 and JP-A-2012-046629 can be referred to.
  • any filter that has been conventionally used for filtration or the like can be used without particular limitation.
  • fluororesins such as polytetrafluoroethylene (PTFE) and polyvinylidene fluoride (PVDF), polyamide resins such as nylon (eg, nylon-6, nylon-6,6), and polyolefin resins such as polyethylene and polypropylene (PP).
  • PTFE polytetrafluoroethylene
  • PVDF polyvinylidene fluoride
  • nylon eg, nylon-6, nylon-6,6)
  • polyolefin resins such as polyethylene and polypropylene (PP).
  • filters using materials such as (including high-density, ultra-high molecular weight polyethylene resin).
  • polypropylene (including high-density polypropylene) and nylon are preferable.
  • the pore diameter of the filter is preferably 0.01 to 7.0 ⁇ m, more preferably 0.01 to 3.0 ⁇ m, and even more preferably 0.05 to 0.5 ⁇ m. If the pore diameter of the filter is within the above range, fine foreign matter can be removed more reliably.
  • the nominal value of the filter manufacturer can be referred to.
  • various filters provided by Nippon Pole Co., Ltd. DFA4201NIEY, DFA4201NAEY, DFA4201J006P, etc.
  • Advantech Toyo Co., Ltd. Japan Entegris Co., Ltd. (formerly Nippon Microlith Co., Ltd.), KITZ Microfilter Co., Ltd., etc.
  • KITZ Microfilter Co., Ltd. etc.
  • a fiber-like filter medium As the filter.
  • the fiber-like filter medium include polypropylene fiber, nylon fiber, glass fiber and the like.
  • examples of commercially available products include SBP type series (SBP008, etc.), TPR type series (TPR002, TPR005, etc.) and SHPX type series (SHPX003, etc.) manufactured by Roki Techno Co., Ltd.
  • filters for example, a first filter and a second filter
  • the filtration with each filter may be performed only once or twice or more.
  • filters having different pore diameters may be combined within the above-mentioned range.
  • the filtration with the first filter may be performed only on the dispersion liquid, and after mixing the other components, the filtration may be performed with the second filter.
  • the film of the present invention is obtained from the above-mentioned composition of the present invention.
  • the film of the present invention can be preferably used as an optical filter.
  • the use of the optical filter is not particularly limited, and examples thereof include an infrared cut filter and an infrared transmission filter.
  • the infrared cut filter include an infrared cut filter on the light receiving side of the solid-state image sensor (for example, for an infrared cut filter for a wafer level lens) and an infrared cut filter on the back surface side (opposite to the light receiving side) of the solid-state image sensor.
  • Infrared cut filter for ambient light sensor for example, an illuminance sensor that adjusts the color tone of the display by detecting the illuminance and color tone of the environment where the information terminal device is placed, and a color correction sensor that adjusts the color tone. Be done. In particular, it can be preferably used as an infrared cut filter on the light receiving side of the solid-state image sensor. Examples of the infrared transmission filter include a filter that shields visible light and can selectively transmit infrared rays having a specific wavelength or higher.
  • the film of the present invention preferably has an average transmittance in the wavelength range of 700 to 1500 nm of less than 10%, and more preferably less than 5%.
  • the film of the present invention may have a pattern or may be a film without a pattern (flat film). Further, the film of the present invention may be laminated on a support and used, or the film of the present invention may be peeled off from the support and used. Examples of the support include a semiconductor base material such as a silicon substrate and a transparent base material.
  • a charge-coupled device (CCD), a complementary metal oxide semiconductor (CMOS), a transparent conductive film, or the like may be formed on the semiconductor base material used as the support. Further, a black matrix that separates each pixel may be formed on the semiconductor base material. Further, a base layer may be formed on the surface of the semiconductor base material. The surface contact angle of the base layer is preferably 20 to 70 ° when measured with diiodomethane. Further, it is preferably 30 to 80 ° when measured with water.
  • the transparent base material used as a support is not particularly limited as long as it is made of a material capable of transmitting at least visible light.
  • a base material made of a material such as glass or resin can be mentioned.
  • the resin include polyester resins such as polyethylene terephthalate and polybutylene terephthalate, polyolefin resins such as polyethylene, polypropylene and ethylene vinyl acetate copolymers, norbornene resins, polyacrylates and acrylic resins such as polymethylmethacrylate, urethane resins and vinyl chloride resins. , Fluorine resin, polycarbonate resin, polyvinyl butyral resin, polyvinyl alcohol resin and the like.
  • Examples of the glass include soda lime glass, borosilicate glass, non-alkali glass, quartz glass, and glass containing copper.
  • Examples of the copper-containing glass include copper-containing phosphate glass and copper-containing fluoride glass.
  • As the glass containing copper a commercially available product can also be used. Examples of commercially available copper-containing glass include NF-50 (manufactured by AGC Technoglass Co., Ltd.) and the like.
  • the thickness of the film of the present invention can be appropriately adjusted according to the purpose.
  • the thickness of the film is preferably 20 ⁇ m or less, more preferably 10 ⁇ m or less, still more preferably 5 ⁇ m or less.
  • the lower limit of the film thickness is preferably 0.1 ⁇ m or more, more preferably 0.2 ⁇ m or more.
  • the film of the present invention can also be used in combination with a color filter containing a chromatic colorant.
  • the color filter can be produced by using a coloring composition containing a chromatic colorant.
  • the color filter is arranged on the optical path of the film of the present invention.
  • the film of the present invention may be formed on a support different from the support on which the color filter is formed.
  • Other members for example, a microlens, a flattening layer, etc. constituting the solid-state image sensor may be interposed between the film and the color filter.
  • the film of the present invention can be used for solid-state image pickup devices such as CCD (charge-coupled device) and CMOS (complementary metal oxide semiconductor), and various devices such as infrared sensors and image display devices.
  • CCD charge-coupled device
  • CMOS complementary metal oxide semiconductor
  • the film of the present invention can be produced through a step of applying the composition of the present invention.
  • Examples of the support include those described above.
  • a method for applying the composition a known method can be used. For example, a drop method (drop cast); a slit coat method; a spray method; a roll coat method; a rotary coating method (spin coating); a cast coating method; a slit and spin method; a pre-wet method (for example, JP-A-2009-145395). Methods described in the publication); Inkjet (for example, on-demand method, piezo method, thermal method), ejection system printing such as nozzle jet, flexographic printing, screen printing, gravure printing, reverse offset printing, metal mask printing, etc. Various printing methods; transfer method using a mold or the like; nano-imprint method and the like can be mentioned.
  • the method of application in inkjet is not particularly limited, and is, for example, the method shown in "Expandable / usable inkjet-infinite possibilities seen in patents-, published in February 2005, Sumi Betechno Research" (especially from page 115). Page 133), JP-A-2003-262716, JP-A-2003-185831, JP-A-2003-261827, JP-A-2012-126830, JP-A-2006-169325, and the like. Can be mentioned.
  • the composition layer formed by applying the composition may be dried (prebaked).
  • the prebake temperature is preferably 150 ° C. or lower, more preferably 120 ° C. or lower, still more preferably 110 ° C. or lower.
  • the lower limit can be, for example, 50 ° C. or higher, or 80 ° C. or higher.
  • the prebake time is preferably 10 seconds to 3000 seconds, more preferably 40 to 2500 seconds, and even more preferably 80 to 220 seconds. Drying can be performed on a hot plate, an oven, or the like.
  • the film manufacturing method may further include a step of forming a pattern.
  • the pattern forming method include a pattern forming method using a photolithography method and a pattern forming method using a dry etching method, and a pattern forming method using a photolithography method is preferable.
  • the film of the present invention is used as a flat film, it is not necessary to perform the step of forming a pattern.
  • the process of forming the pattern will be described in detail.
  • the pattern forming method in the photolithography method includes a step of exposing the composition layer formed by applying the composition of the present invention in a pattern (exposure step) and developing and removing the composition layer of the unexposed portion. It is preferable to include a step of forming a pattern (development step). If necessary, a step of baking the developed pattern (post-baking step) may be provided. Hereinafter, each step will be described.
  • the composition layer is exposed in a pattern.
  • the composition layer can be exposed in a pattern by exposing the composition layer through a mask having a predetermined mask pattern using a stepper exposure machine, a scanner exposure machine, or the like. As a result, the exposed portion can be cured.
  • Examples of radiation (light) that can be used for exposure include g-line and i-line. Further, light having a wavelength of 300 nm or less (preferably light having a wavelength of 180 to 300 nm) can also be used. Examples of the light having a wavelength of 300 nm or less include KrF line (wavelength 248 nm), ArF line (wavelength 193 nm) and the like, and KrF line (wavelength 248 nm) is preferable. Further, a long wave light source having a diameter of 300 nm or more can also be used.
  • pulse exposure is an exposure method of a method in which light irradiation and pause are repeated in a cycle of a short time (for example, a millisecond level or less).
  • the irradiation amount is, for example, preferably 0.03 to 2.5 J / cm 2 , more preferably 0.05 to 1.0 J / cm 2 .
  • the oxygen concentration at the time of exposure can be appropriately selected, and in addition to the oxygen concentration performed in the atmosphere, for example, in a low oxygen atmosphere having an oxygen concentration of 19% by volume or less (for example, 15% by volume, 5% by volume, or substantially). It may be exposed in an oxygen-free environment), or may be exposed in a high oxygen atmosphere (for example, 22% by volume, 30% by volume, or 50% by volume) in which the oxygen concentration exceeds 21% by volume.
  • the exposure illuminance can be set as appropriate, and is usually selected from the range of 1000 W / m 2 to 100,000 W / m 2 (for example, 5000 W / m 2 , 15,000 W / m 2 , or 35,000 W / m 2 ). Can be done.
  • the oxygen concentration and the exposure illuminance may be appropriately combined with each other.
  • the oxygen concentration may be 10% by volume and the illuminance may be 10,000 W / m 2
  • the oxygen concentration may be 35% by volume and the illuminance may be 20000 W / m 2 .
  • the composition layer in the unexposed portion of the exposed composition layer is developed and removed to form a pattern.
  • the development and removal of the composition layer in the unexposed portion can be performed using a developing solution.
  • the composition layer of the unexposed portion in the exposure step is eluted in the developer, and only the photocured portion remains on the support.
  • the temperature of the developer is preferably, for example, 20 to 30 ° C.
  • the development time is preferably 20 to 180 seconds. Further, in order to improve the residue removability, the steps of shaking off the developer every 60 seconds and supplying a new developer may be repeated several times.
  • Examples of the developing solution include organic solvents and alkaline developing solutions, and alkaline developing solutions are preferably used.
  • the alkaline developer an alkaline aqueous solution (alkaline developer) obtained by diluting an alkaline agent with pure water is preferable.
  • the alkaline agent include ammonia, ethylamine, diethylamine, dimethylethanolamine, diglycolamine, diethanolamine, hydroxyamine, ethylenediamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, and tetrabutylammonium hydroxide.
  • Ethyltrimethylammonium hydroxide Ethyltrimethylammonium hydroxide, benzyltrimethylammonium hydroxide, dimethylbis (2-hydroxyethyl) ammonium hydroxide, choline, pyrrole, piperidine, 1,8-diazabicyclo [5.4.0] -7-undecene and other organic substances.
  • alkaline compounds examples include alkaline compounds and inorganic alkaline compounds such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogencarbonate, sodium silicate and sodium metasilicate.
  • the alkaline agent a compound having a large molecular weight is preferable in terms of environment and safety.
  • the concentration of the alkaline agent in the alkaline aqueous solution is preferably 0.001 to 10% by mass, more preferably 0.01 to 1% by mass.
  • the developer may further contain a surfactant.
  • a surfactant a nonionic surfactant is preferable.
  • the developer may be once produced as a concentrated solution and diluted to a concentration required for use.
  • the dilution ratio is not particularly limited, but can be set in the range of, for example, 1.5 to 100 times. It is also preferable to wash (rinse) with pure water after development.
  • the rinsing is performed by supplying the rinsing liquid to the developed composition layer while rotating the support on which the developed composition layer is formed. It is also preferable to move the nozzle for discharging the rinse liquid from the central portion of the support to the peripheral edge of the support. At this time, when moving the nozzle from the central portion of the support to the peripheral portion, the nozzle may be moved while gradually reducing the moving speed. By rinsing in this way, in-plane variation of the rinse can be suppressed. Further, the same effect can be obtained by gradually reducing the rotation speed of the support while moving the nozzle from the central portion of the support to the peripheral portion.
  • Additional exposure processing and post-baking are post-development curing treatments to complete the curing.
  • the heating temperature in the post-bake is, for example, preferably 100 to 240 ° C, more preferably 200 to 240 ° C.
  • Post-baking can be performed continuously or in batch using a heating means such as a hot plate, a convection oven (hot air circulation type dryer), or a high frequency heater so that the above conditions are met for the developed film. can.
  • the light used for exposure is preferably light having a wavelength of 400 nm or less. Further, the additional exposure process may be performed by the method described in Korean Patent Publication No. 10-2017-0122130.
  • the composition layer formed by applying the above composition on the support is cured to form a cured product layer, and then the photoresist layer patterned on the cured product layer is formed. Then, using the patterned photoresist layer as a mask, the cured product layer can be dry-etched with an etching gas. In forming the photoresist layer, it is preferable to perform a prebaking treatment.
  • the description in paragraphs 0010 to 0067 of JP2013-064993 can be referred to, and this content is incorporated in the present specification.
  • the optical filter of the present invention has the above-mentioned film of the present invention.
  • Examples of the optical filter include an infrared cut filter and an infrared transmission filter.
  • the optical filter of the present invention may further have a copper-containing layer, a dielectric multilayer film, an ultraviolet absorbing layer, and the like, in addition to the film of the present invention described above.
  • the ultraviolet absorbing layer include the absorbing layer described in paragraphs 0040 to 0070 and 0119 to 0145 of International Publication No. 2015/09960.
  • the dielectric multilayer film include the dielectric multilayer films described in paragraphs 0255 to 0259 of Japanese Patent Application Laid-Open No. 2014-041318.
  • a glass substrate made of copper-containing glass (copper-containing glass substrate) or a layer containing a copper complex (copper complex-containing layer) can also be used.
  • Examples of the copper-containing glass substrate include copper-containing phosphate glass and copper-containing fluoride glass.
  • Examples of commercially available copper-containing glass products include NF-50 (manufactured by AGC Technoglass Co., Ltd.), BG-60, BG-61 (all manufactured by Schott AG), CD5000 (manufactured by HOYA Corporation), and the like.
  • the solid-state image sensor of the present invention includes the film of the present invention described above.
  • the configuration of the solid-state image sensor is not particularly limited as long as it has the film of the present invention and functions as a solid-state image sensor. For example, the following configuration can be mentioned.
  • the support has a transfer electrode formed of a plurality of photodiodes constituting the light receiving area of the solid-state image sensor and polyvinyl, etc., and the photodiode and the transfer electrode are made of tungsten or the like in which only the light receiving portion of the photodiode is opened.
  • the present invention has a light-shielding film to be formed, has a device protective film formed of silicon nitride or the like formed on the light-shielding film so as to cover the entire surface of the light-shielding film and a photodiode light-receiving portion, and has the present invention on the device protective film. It is a configuration having a diode.
  • a configuration having a condensing means for example, a microlens or the like; the same applies hereinafter) on the device protective film under the film of the present invention (on the side closer to the support), or condensing on the film of the present invention.
  • the color filter may have a structure in which a film forming each pixel is embedded in a space partitioned by a partition wall, for example, in a grid pattern.
  • the partition wall preferably has a lower refractive index than each pixel. Examples of the image pickup apparatus having such a structure include the apparatus described in JP-A-2012-227478 and JP-A-2014-179757.
  • the image display device of the present invention includes the film of the present invention.
  • Examples of the image display device include a liquid crystal display device and an organic electroluminescence (organic EL) display device.
  • organic EL organic electroluminescence
  • the image display device for example, “Electronic Display Device (Akio Sasaki, Kogyo Chosakai Co., Ltd., published in 1990)", “Display Device (Junaki Ibuki, Sangyo Tosho Co., Ltd., 1989)” Issuance) ”and so on.
  • the liquid crystal display device is described in, for example, “Next Generation Liquid Crystal Display Technology (edited by Tatsuo Uchida, Kogyo Chosakai Co., Ltd., published in 1994)”.
  • the liquid crystal display device to which the present invention can be applied is not particularly limited, and can be applied to, for example, various types of liquid crystal display devices described in the above-mentioned "next-generation liquid crystal display technology".
  • the image display device may have a white organic EL element.
  • the white organic EL element preferably has a tandem structure.
  • Japanese Patent Application Laid-Open No. 2003-045676 supervised by Akiyoshi Mikami, "Frontiers of Organic EL Technology Development-High Brightness, High Precision, Long Life, Know-how Collection-", Technical Information Association, It is described on pages 326 to 328, 2008 and the like.
  • the spectrum of white light emitted by the organic EL element preferably has a strong maximum emission peak in the blue region (430 to 485 nm), the green region (530 to 580 nm), and the yellow region (580 to 620 nm). In addition to these emission peaks, those having a maximum emission peak in the red region (650 to 700 nm) are more preferable.
  • the infrared sensor of the present invention includes the film of the present invention described above.
  • the configuration of the infrared sensor is not particularly limited as long as it functions as an infrared sensor.
  • an embodiment of the infrared sensor of the present invention will be described with reference to the drawings.
  • reference numeral 110 is a solid-state image sensor.
  • An infrared cut filter 111 and an infrared transmission filter 114 are arranged on the image pickup region of the solid-state image sensor 110.
  • a color filter 112 is arranged on the infrared cut filter 111.
  • a microlens 115 is arranged on the incident light h ⁇ side of the color filter 112 and the infrared transmission filter 114.
  • the flattening layer 116 is formed so as to cover the microlens 115.
  • the infrared cut filter 111 can be formed by using the composition of the present invention.
  • the color filter 112 is a color filter on which pixels that transmit and absorb light having a specific wavelength in the visible region are formed, and is not particularly limited, and a conventionally known color filter for pixel formation can be used. For example, a color filter in which red (R), green (G), and blue (B) pixels are formed is used. For example, the description in paragraphs 0214 to 0263 of JP2014-043556 can be referred to, and this content is incorporated in the present specification.
  • the characteristics of the infrared transmission filter 114 are selected according to the emission wavelength of the infrared LED used.
  • the infrared transmission filter 114 can be formed by using the composition of the present invention.
  • an infrared cut filter (another infrared cut filter) different from the infrared cut filter 111 may be further arranged on the flattening layer 116.
  • Other infrared cut filters include those having a copper-containing layer and / or a dielectric multilayer film. These details include those mentioned above. Further, as another infrared cut filter, a dual bandpass filter may be used.
  • a column temperature of 40 ° C. 10 ⁇ L of a tetrahydrofuran solution having a sample concentration of 0.1% by mass was injected into the column, and tetrahydrofuran was flown as an elution solvent at a flow rate of 0.35 mL / min, and RI (differential refractometer) was applied.
  • the sample peak was detected by a detector, and the calculation was performed using a calibration curve prepared using standard polystyrene.
  • ⁇ Preparation of pigment dispersion> Mix the materials shown in the table below in the blending amounts shown in the table below, and use bead mills (high-pressure disperser with decompression mechanism NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.)) using zirconia beads with a diameter of 0.3 mm. Each pigment dispersion was prepared by mixing and dispersing for 3 hours.
  • PR254 C.I. I. Pigment Red 254 (red pigment)
  • PB15: 6 C.I. I. Pigment Blue 15: 6 (blue pigment)
  • (Dispersant) D-1 Resin having the following structure (the numerical value added to the main chain is the molar ratio, and the numerical value added to the side chain is the number of repeating units.
  • D-2 Resin having the following structure (the numerical value added to the main chain is the molar ratio, and the numerical value added to the side chain is the number of repeating units. Weight average molecular weight 28000)
  • composition Materials other than the solvents shown in the table below are mixed at the ratios shown in the table below, and the solvents shown in the table below are added to prepare the solid content concentration to 20% by mass, and then the mixture is stirred to make nylon with a pore size of 0.45 ⁇ m.
  • the composition was prepared by filtering with a filter (manufactured by Nippon Pole Co., Ltd.).
  • the numerical value in the compounding amount column in the table is the value of the mass part in the solid content conversion value.
  • B001 Polymethyl methacrylate (weight average molecular weight 24000, dispersion 1.8, glass transition temperature 75 ° C)
  • B002 Resin having the following structure (resin having an acid group. The numerical value added to the main chain is the molar ratio of the repeating unit. Weight average molecular weight 20000, dispersity 1.9, glass transition temperature 100 ° C.)
  • B003 Resin having the following structure (resin having an acid group. The numerical value added to the main chain is the molar ratio of the repeating unit, weight average molecular weight 15000, dispersion degree 2.1, glass transition temperature 120 ° C.).
  • B004 Resin having the following structure (polyimide resin, weight average molecular weight 25000, dispersity 2.2, glass transition temperature 310 ° C.)
  • M-1 Aronix M-305 (Mixture of pentaerythritol triacrylate and pentaerythritol tetraacrylate manufactured by Toagosei Co., Ltd. The content of pentaerythritol triacrylate is 55% by mass to 63% by mass).
  • M-2 KAYARAD RP-1040 (manufactured by Nippon Kayaku Co., Ltd., ethylene oxide-modified pentaerythritol tetraacrylate)
  • M-3 Aronix M-510 (manufactured by Toagosei Co., Ltd., polybasic acid-modified acrylic oligomer)
  • C-1 Irgure OXE01 (BASF, oxime ester-based initiator)
  • C-2 Irgure OXE02 (BASF, oxime ester-based initiator)
  • F-1 Megafuck RS-72-K (manufactured by DIC Corporation, fluorine-based surfactant)
  • F-2 Compound with the following structure (weight average molecular weight 14000,% value indicating the ratio of repeating units is mol%)
  • F-3 KF-6001 (manufactured by Shin-Etsu Chemical Co., Ltd., both-terminal carbinol-modified polydimethylsiloxane, hydroxyl value 62 mgKOH / g)
  • U-1 Uvinul3050 (made by BASF, UV absorber)
  • U-2 Tinuvin477 (made by BASF, hydroxyphenyltriazine-based UV absorber)
  • U-3 Tinuvin326 (made by BASF, UV absorber)
  • EP-1 Compound with the following structure (epoxy compound, weight average molecular weight 4000)
  • EP-2 EHPE3150 (manufactured by Daicel Corporation, 1,2-epoxy-4- (2-oxylanyl) cyclohexane adduct of 2,2-bis (hydroxymethyl) -1-butanol)
  • the transmittance in the wavelength range of 400 to 1600 nm was measured using an ultraviolet-visible near-infrared spectrophotometer (U-4100, manufactured by Hitachi High-Technologies Corporation), and the wavelength was measured.
  • U-4100 ultraviolet-visible near-infrared spectrophotometer
  • the average value of the transmittance in the range of 1000 to 1200 nm was obtained, and the infrared shielding property was evaluated according to the following criteria.
  • B The average value of transmittance is 5% or more and less than 10%
  • C The average value of transmittance is 10% or more
  • the transmittance of the glass substrate on which the above film was formed was measured in the wavelength range of 400 to 1600 nm using an ultraviolet-visible near-infrared spectrophotometer (U-4100, manufactured by Hitachi High-Technologies Corporation). Next, the glass substrate on which the above film was formed was irradiated with light at 100,000 lux for 20 hours (equivalent to 2 million lux ⁇ h) using a xenon lamp, and then the transmittance of the film after irradiation with the xenon lamp was measured. ..
  • the amount of change in transmittance ( ⁇ T1) at each wavelength in the wavelength range of 1000 to 1500 nm before and after irradiation with a xenon lamp was determined, and the light resistance was evaluated according to the following criteria based on the largest value of ⁇ T1 in the entire measurement wavelength range. .. The smaller the value of ⁇ T1, the better the light resistance.
  • Change of transmittance ( ⁇ T1)
  • the transmittance of the glass substrate on which the above film was formed was measured in the wavelength range of 400 to 1600 nm using an ultraviolet-visible near-infrared spectrophotometer (U-4100, manufactured by Hitachi High-Technologies Corporation). Next, the glass substrate on which the above film was formed was heated at 200 ° C. for 10 minutes using a hot plate.
  • the amount of change in transmittance ( ⁇ T2) at each wavelength in the wavelength range of 1000 to 1500 nm before and after heating was determined, and the heat resistance was evaluated according to the following criteria based on the largest value of ⁇ T2 in the entire measurement wavelength range. The smaller the value of ⁇ T2, the better the heat resistance.
  • a pattern (pixel) was formed by heating at 200 ° C. for 5 minutes on a hot plate.
  • the glass substrate on which the pixels were formed was observed with a microscope at a magnification of 10000 times, and the pattern forming property was evaluated according to the following evaluation criteria.
  • the composition of the example was able to form a film having excellent infrared shielding property.
  • 110 Solid-state image sensor
  • 111 Infrared cut filter
  • 112 Color filter
  • 114 Infrared transmission filter
  • 115 Microlens
  • 116 Flattening layer

Landscapes

  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Computer Hardware Design (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Solid State Image Pick-Up Elements (AREA)

Abstract

L'invention concerne une composition pouvant former un film présentant d'excellentes propriétés de blocage de l'IR. L'invention concerne également un film, un filtre optique, un élément d'imagerie à semi-conducteurs, un dispositif d'affichage d'image et un capteur IR. La composition contient un absorbeur d'IR et un composé durcissable. L'absorbeur d'IR contient un composé représenté par la formule (1), et la teneur en composé représenté par la formule (1) est d'au moins 3 % en masse de la teneur totale en matières solides de la composition.
PCT/JP2021/038592 2020-12-16 2021-10-19 Composition, film, filtre optique, élément d'imagerie à semi-conducteurs, dispositif d'affichage d'image et capteur ir WO2022130774A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2022569741A JPWO2022130774A1 (fr) 2020-12-16 2021-10-19
KR1020237019563A KR20230106668A (ko) 2020-12-16 2021-10-19 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시 장치 및 적외선 센서

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020208235 2020-12-16
JP2020-208235 2020-12-16

Publications (1)

Publication Number Publication Date
WO2022130774A1 true WO2022130774A1 (fr) 2022-06-23

Family

ID=82059742

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2021/038592 WO2022130774A1 (fr) 2020-12-16 2021-10-19 Composition, film, filtre optique, élément d'imagerie à semi-conducteurs, dispositif d'affichage d'image et capteur ir

Country Status (4)

Country Link
JP (1) JPWO2022130774A1 (fr)
KR (1) KR20230106668A (fr)
TW (1) TW202229233A (fr)
WO (1) WO2022130774A1 (fr)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011157478A (ja) * 2010-02-01 2011-08-18 Toyo Ink Sc Holdings Co Ltd 着色組成物、カラーフィルタ用感光性着色組成物、カラーフィルタおよびカラー表示装置
WO2016194527A1 (fr) * 2015-05-29 2016-12-08 富士フイルム株式会社 Multimère colorant absorbant dans le proche infrarouge, composition, film, filtre optique, procédé et dispositif de formation de motif
WO2018043185A1 (fr) * 2016-08-29 2018-03-08 富士フイルム株式会社 Composition, film, filtre de blocage proche infrarouge, procédé de formation de motif, stratifié, élément d'imagerie à semi-conducteurs, dispositif d'affichage d'image, module de caméra et capteur infrarouge
WO2018043218A1 (fr) * 2016-08-30 2018-03-08 富士フイルム株式会社 Composition photosensible, film durci, filtre optique, corps stratifié, procédé de formation de motif, élément d'imagerie à semi-conducteurs, dispositif d'affichage d'image et capteur infrarouge
CN112358493A (zh) * 2020-11-16 2021-02-12 南京林业大学 一种基于氟硼配合物的小分子光热试剂及其制备方法和应用

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011157478A (ja) * 2010-02-01 2011-08-18 Toyo Ink Sc Holdings Co Ltd 着色組成物、カラーフィルタ用感光性着色組成物、カラーフィルタおよびカラー表示装置
WO2016194527A1 (fr) * 2015-05-29 2016-12-08 富士フイルム株式会社 Multimère colorant absorbant dans le proche infrarouge, composition, film, filtre optique, procédé et dispositif de formation de motif
WO2018043185A1 (fr) * 2016-08-29 2018-03-08 富士フイルム株式会社 Composition, film, filtre de blocage proche infrarouge, procédé de formation de motif, stratifié, élément d'imagerie à semi-conducteurs, dispositif d'affichage d'image, module de caméra et capteur infrarouge
WO2018043218A1 (fr) * 2016-08-30 2018-03-08 富士フイルム株式会社 Composition photosensible, film durci, filtre optique, corps stratifié, procédé de formation de motif, élément d'imagerie à semi-conducteurs, dispositif d'affichage d'image et capteur infrarouge
CN112358493A (zh) * 2020-11-16 2021-02-12 南京林业大学 一种基于氟硼配合物的小分子光热试剂及其制备方法和应用

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
SHIMOGAWA HIROYUKI, MURATA YASUJIRO, WAKAMIYA ATSUSHI: "NIR-Absorbing Dye Based on BF 2 -Bridged Azafulvene Dimer as a Strong Electron-Accepting Unit", ORGANIC LETTERS, vol. 20, no. 17, 7 September 2018 (2018-09-07), US , pages 5135 - 5138, XP055933025, ISSN: 1523-7060, DOI: 10.1021/acs.orglett.8b02056 *

Also Published As

Publication number Publication date
TW202229233A (zh) 2022-08-01
KR20230106668A (ko) 2023-07-13
JPWO2022130774A1 (fr) 2022-06-23

Similar Documents

Publication Publication Date Title
JP7049272B2 (ja) 樹脂組成物、樹脂膜、樹脂膜の製造方法、光学フィルタ、固体撮像素子、画像表示装置、および、赤外線センサ
JP6934021B2 (ja) 組成物、膜、光学フィルタ、パターン形成方法、固体撮像素子、画像表示装置および赤外線センサ
WO2021215133A1 (fr) Composition colorante, film, filtre optique, élément d'imagerie à semi-conducteurs et dispositif d'affichage d'image
JPWO2019065021A1 (ja) 樹脂組成物、膜、光学フィルタ、固体撮像素子、画像表示装置および赤外線センサ
JP6931700B2 (ja) 組成物、膜、赤外線透過フィルタ、固体撮像素子、画像表示装置および赤外線センサ
WO2022065215A1 (fr) Composition, film, filtre optique, capteur d'imagerie à semi-conducteurs, dispositif d'affichage d'image, capteur infrarouge, module de caméra, composé et absorbeur d'infrarouge
JP2024025792A (ja) 赤外線吸収組成物、膜、光学フィルタ、固体撮像素子、画像表示装置および赤外線センサ
JP2024040152A (ja) 着色組成物、膜、カラーフィルタおよび固体撮像素子
JP6976341B2 (ja) 近赤外線吸収有機顔料、樹脂組成物、近赤外線吸収有機顔料の製造方法、近赤外線吸収有機顔料の分光調整方法、膜、積層体、近赤外線カットフィルタ、近赤外線透過フィルタ、固体撮像素子、画像表示装置および赤外線センサ
WO2020036037A1 (fr) Composition, film, filtre optique, corps stratifié, élément d'imagerie à semi-conducteurs, dispositif d'affichage d'image et capteur infrarouge
JP6976309B2 (ja) 硬化性組成物、硬化膜、近赤外線カットフィルタ、固体撮像素子、画像表示装置および赤外線センサ
WO2022064896A1 (fr) Composition, film, filtre optique, élément d'imagerie à semi-conducteurs, dispositif d'affichage d'image, capteur infrarouge, module de caméra, composé et absorbant infrarouge
JPWO2020022248A1 (ja) 硬化性組成物、膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置
WO2020013089A1 (fr) Composition colorante, film, filtre coloré, procédé de production d'un filtre coloré, élément d'imagerie à semi-conducteurs et dispositif d'affichage d'image
JP7095091B2 (ja) 感光性組成物、膜、カラーフィルタ、固体撮像素子及び画像表示装置
WO2022130774A1 (fr) Composition, film, filtre optique, élément d'imagerie à semi-conducteurs, dispositif d'affichage d'image et capteur ir
WO2022131191A1 (fr) Composition, membrane, filtre optique, élément de capture d'image solide, appareil d'affichage d'image et capteur de rayons infrarouges
WO2022130773A1 (fr) Composition, film, filtre optique, élément d'imagerie à semi-conducteurs, dispositif d'affichage d'image et capteur infrarouge
WO2023286582A1 (fr) Composition, film, filtre optique, élément d'imagerie à semi-conducteurs, dispositif d'affichage d'image, capteur infrarouge, module de caméra et composé
WO2023042605A1 (fr) Composition, film, filtre optique, élément d'imagerie à semi-conducteurs, dispositif d'affichage d'image et capteur infrarouge
WO2022191044A1 (fr) Composition, film, filtre optique, élément d'imagerie à l'état solide, dispositif d'affichage d'image, capteur infrarouge, module de caméra, composé, et agent absorbant l'infrarouge
WO2023145699A1 (fr) Composition absorbant les infrarouges, film, filtre optique, élément d'imagerie à semi-conducteurs, dispositif d'affichage d'image, capteur infrarouge et module de caméra
WO2023145700A1 (fr) Composition absorbant les infrarouges, film, filtre optique, élément d'imagerie à semi-conducteurs, dispositif d'affichage d'image, capteur infrarouge et module de caméra
WO2023162791A1 (fr) Composition absorbant les infrarouges, absorbeur infrarouge, film, filtre optique et élément d'imagerie à semi-conducteurs
WO2023176609A1 (fr) Composition, film, filtre optique, élément d'imagerie à semi-conducteurs, dispositif d'affichage d'image, capteur infrarouge, module de caméra et composé

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 21906138

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2022569741

Country of ref document: JP

Kind code of ref document: A

ENP Entry into the national phase

Ref document number: 20237019563

Country of ref document: KR

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 21906138

Country of ref document: EP

Kind code of ref document: A1