WO2023214499A1 - 光渦制御装置および光渦制御方法 - Google Patents
光渦制御装置および光渦制御方法 Download PDFInfo
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- WO2023214499A1 WO2023214499A1 PCT/JP2023/015035 JP2023015035W WO2023214499A1 WO 2023214499 A1 WO2023214499 A1 WO 2023214499A1 JP 2023015035 W JP2023015035 W JP 2023015035W WO 2023214499 A1 WO2023214499 A1 WO 2023214499A1
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/32—Micromanipulators structurally combined with microscopes
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/0005—Adaptation of holography to specific applications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/22—Processes or apparatus for obtaining an optical image from holograms
- G03H1/2294—Addressing the hologram to an active spatial light modulator
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
- G02B21/361—Optical details, e.g. image relay to the camera or image sensor
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/0005—Adaptation of holography to specific applications
- G03H2001/005—Adaptation of holography to specific applications in microscopy, e.g. digital holographic microscope [DHM]
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/0005—Adaptation of holography to specific applications
- G03H2001/0077—Adaptation of holography to specific applications for optical manipulation, e.g. holographic optical tweezers [HOT]
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2210/00—Object characteristics
- G03H2210/62—Moving object
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2222/00—Light sources or light beam properties
- G03H2222/35—Transverse intensity distribution of the light beam
Definitions
- the present disclosure relates to an optical vortex control device and an optical vortex control method.
- the optical vortex has a phase singularity on the propagation axis, has a donut-shaped light intensity distribution in which the light intensity is 0 on the propagation axis and reaches a maximum at a certain distance from the propagation axis.
- a light vortex is unique in that it has a donut-shaped light intensity distribution and also has orbital angular momentum.
- the microscopic object receives angular momentum from the optical vortex and rotates along a trajectory of high light intensity around the propagation axis. That is, the optical vortex can optically trap microscopic objects in a medium and control the movement of the microscopic objects.
- the light vortex irradiated to the microscopic object may not be as desired, and the movement of the microscopic object may not be as desired. It may not be the same. For example, even if you want to move a microscopic object at a constant speed on a perfectly circular trajectory, the trajectory of the microscopic object may become elliptical depending on the performance of the optical components and the adjustment accuracy when constructing the optical system. , the speed may fluctuate.
- Non-Patent Documents 1 to 5 describe techniques for estimating aberrations of an optical system based on intensity information of optical vortices and correcting aberrations based on the estimation results to improve the precision of optical traps. There is. In the techniques described in Non-Patent Documents 4 and 5, the relationship between the aberration correction amount and intensity information is machine learned, and the aberration correction amount is determined from the intensity information.
- Non-Patent Document 6 a modulation pattern presented on a modulation surface of a spatial light modulator is imaged onto a sample surface, and microscopic objects on the sample surface are optically trapped and moved. Then, the modulation pattern is adjusted based on the intensity information of the optical vortex and the motion information of the microscopic body.
- the optical amplitude distribution on the sample surface is made desired. Furthermore, by adjusting the phase distribution of the modulation pattern presented on the modulation surface of the spatial light modulator based on the motion information of the microscopic body (specifically, the angular velocity distribution), the motion of the microscopic body can be controlled as desired. (specifically, to make the orbital angular momentum density distribution (OAM-density) uniform).
- OAM-density orbital angular momentum density distribution
- Non-Patent Documents 1 to 5 require a highly accurate optical device and complicated post-processing in order to obtain the intensity information of the optical vortex generated by a high NA objective lens, which is not easy.
- the technique described in Non-Patent Document 6 has the same problems as the above-mentioned problems that the techniques described in Non-Patent Documents 1 to 5 have, and also has problems in adjusting the modulation pattern presented on the modulation surface of the spatial light modulator. This is also not easy since it is carried out in two stages.
- the purpose of the embodiment is to provide an optical vortex control device and an optical vortex control method that can easily generate a desired optical vortex.
- the embodiment is an optical vortex control device.
- the optical vortex control device includes a light source that outputs light, an optical vortex generator that generates an optical vortex from this light, a condensing optical system that condenses the optical vortex, and an optical vortex that is condensed by the condensing optical system.
- An imaging section that images a moving microscopic object that is optically trapped by the camera and outputs image data, and an optical vortex generating section that analyzes the movement of the microscopic object based on the image data and generates an optical vortex based on the analysis result.
- a control unit that adjusts the phase distribution of the optical vortex.
- the embodiment is an optical vortex control method.
- the optical vortex control method uses a light source that outputs light, an optical vortex generator that generates an optical vortex from this light, and a condensing optical system that condenses the optical vortex.
- An imaging step in which a microscopic body that is optically trapped by an optical vortex and moves is captured by an imaging unit and outputs image data, and the movement of the microscopic body is analyzed based on the image data, and a light vortex is generated based on the analysis result. and a control step of adjusting the phase distribution of the optical vortex generated by the unit.
- a desired optical vortex can be easily generated.
- FIG. 1 is a diagram showing the configuration of an optical vortex control device 1.
- FIG. 2 is a diagram illustrating optical trapping of a microscopic body 91 by an optical vortex.
- FIG. 3 is a diagram illustrating optical trapping of the microscopic object 91 by an optical vortex.
- FIG. 4 is a diagram showing an example of the intensity distribution of the optical vortex at the sample positions (a) and (b).
- FIG. 5 shows (a) a diagram showing the motion trajectory of a microscopic object before optical vortex generation adjustment when objective lens A is used, and (b) a diagram showing the microscopic object after optical vortex generation adjustment when objective lens A is used.
- FIG. 6 is a graph showing the torque distribution of the microbody before and after the optical vortex generation adjustment when objective lens A is used.
- FIG. 7 shows (a) a diagram showing the motion trajectory of a microscopic object before optical vortex generation adjustment when objective lens B is used, and (b) a diagram showing the microscopic object after optical vortex generation adjustment when objective lens B is used.
- FIG. 8 is a graph showing the torque distribution of the microscopic body before and after the optical vortex generation adjustment when objective lens B is used.
- FIG. 9 shows (a) a diagram showing the motion locus of a microscopic object before optical vortex generation adjustment when objective lens C is used, and (b) a diagram showing the microscopic object after optical vortex generation adjustment when objective lens C is used.
- FIG. 10 is a graph showing the torque distribution of the microscopic body before and after the optical vortex generation adjustment when the objective lens C is used.
- FIG. 11 shows (a) a diagram showing the motion trajectory of a microscopic object before optical vortex generation adjustment when objective lens D is used, and (b) a diagram showing the microscopic object after optical vortex generation adjustment when objective lens D is used.
- FIG. 12 is a graph showing the torque distribution of the microscopic body before and after the optical vortex generation adjustment when the objective lens D is used.
- FIG. 13 shows (a) a diagram showing the motion locus of the microscopic body before optical vortex generation adjustment when objective lens E is used, and (b) a diagram showing the microscopic object after optical vortex generation adjustment when objective lens E is used.
- FIG. 14 is a graph showing the torque distribution of the microscopic body before and after the optical vortex generation adjustment when the objective lens E is used.
- FIG. 15 is a diagram showing an example of an adjustment pattern for adjusting optical vortex generation.
- FIG. 16 is a table summarizing the ellipticity and torque distribution dispersion values before and after the optical vortex generation adjustment when using each of the objective lenses A to E.
- FIG. 1 is a diagram showing the configuration of the optical vortex control device 1.
- the optical vortex control device 1 is a device that controls the movement of microscopic objects in a medium in a sample 90, and includes a light source 10, an optical vortex generation section 20, lenses 30 to 33, an aperture 34, a dichroic mirror 40, an illumination section 50, It includes an imaging section 60 and a control section 70.
- the medium in sample 90 is liquid or gas.
- the shape of the microscopic bodies in the medium is arbitrary, and may be, for example, a sphere, a cube, a cone, or the like.
- the material of the microscopic body is also arbitrary, and may be, for example, polystyrene beads, glass, crystal, or the like.
- a microscopic object has a size and weight such that it can be optically trapped by an optical vortex in a medium.
- the light source 10 outputs light.
- light source 10 is a laser light source that produces coherent light.
- the light output from the light source 10 preferably has a wavelength at which heat absorption by the medium in the sample 90 is small.
- the optical vortex generator 20 is optically connected to the light source 10.
- the optical vortex generation unit 20 receives the light output from the light source 10, generates an optical vortex, and outputs the generated optical vortex.
- the optical vortex generated by the optical vortex generator 20 is a light beam having a helical wavefront, and is, for example, a Laguerre-Gauss beam or a Bessel beam.
- a diffractive optical element, a spatial light modulator, or the like is preferably used as the optical vortex generator 20 preferably used.
- a spatial light modulator has a plurality of pixels arranged two-dimensionally, and can modulate at least the phase of light in each pixel and output the modulated light.
- the spatial light modulator may also be capable of modulating the amplitude of light at each pixel. If such a spatial light modulator is used as the optical vortex generator 20, optical vortices of various shapes can be easily generated according to the modulation pattern to be set without changing the optical system, and optical vortices of various shapes can be easily generated without changing the optical system.
- Various assessments can be made of the state of the body's light traps.
- the spatial light modulator used as the optical vortex generator 20 may be of a transmission type or a reflection type, and in the latter case, an LCOS-SLM (Liquid Crystal on Silicon - Spatial Light Modulator).
- LCOS-SLM Liquid Crystal on Silicon - Spatial Light Modulator
- FIG. 1 a reflective spatial light modulator is shown as the optical vortex generator 20.
- the light output from the light source 10 is obliquely incident on the optical vortex generator 20, but the light may be incident on the optical vortex generator 20 at an angle closer to perpendicular.
- the lens 31, the aperture 34, the lens 32, the dichroic mirror 40, and the objective lens 30 constitute a condensing optical system that guides the optical vortex output from the optical vortex generator 20 to a microscopic object in the medium of the sample 90.
- the rear focal position of the lens 31 and the front focal position of the lens 32 match each other.
- the aperture 34 has an opening at the back focal position of the lens 31.
- the lenses 31 and 32 are arranged so that the modulation surface of the optical vortex generator 20 and the pupil plane of the objective lens 30 are in a conjugate positional relationship with each other, and the image of the optical vortex output from the optical vortex generator 20 is transferred to the objective lens. The image is formed near the pupil plane of 30.
- the dichroic mirror 40 reflects the light arriving from the lens 32 to the objective lens 30.
- the objective lens 30 focuses the optical vortex onto the microscopic objects in the medium of the sample 90 to optically trap the microscopic objects.
- a ⁇ /4 plate or a ⁇ /2 plate may be placed on the optical path of the optical vortex before it enters the objective lens 30 to control the rotational shape (circle, ellipse) of the microscopic body.
- the illumination unit 50 is provided on the opposite side of the objective lens 30 with the sample 90 in between, and outputs illumination light to the sample 90. It is preferable that the illumination unit 50 outputs light of a wavelength different from the wavelength of the light output from the light source 10.
- a white light source a mercury lamp, a laser light source, or the like is used.
- the imaging unit 60 images the optically trapped and moving microscopic body illuminated by the illumination unit 50 via the objective lens 30, dichroic mirror 40, and lens 33, and outputs image data.
- a CCD camera, a CMOS camera, or the like is used as the imaging unit 60.
- Dichroic mirror 40 transmits light from sample 90 illuminated by illumination section 50 .
- the control unit 70 analyzes the movement of the microscopic body based on the image data output from the imaging unit 60.
- the control unit 70 controls the movement of the microscopic body by adjusting the phase distribution of the optical vortex generated by the optical vortex generation unit 20 based on the analysis result.
- a computer or the like is used as the control unit 70.
- the control unit 70 includes a processing unit including, for example, a CPU or FPGA, which analyzes the movement of the microscopic body and adjusts the generation of the optical vortex, and a processing unit that analyzes the movement of the microscopic body and adjusts the generation of the optical vortex, which is imaged by the imaging unit 60.
- a display unit such as a liquid crystal display that displays modulation patterns and adjustment patterns for adjustment, an input unit such as a keyboard or mouse that receives adjustment conditions for optical vortex generation, instructions to start adjustment, etc., and a processing unit. It includes a storage unit including a hard disk drive, RAM, etc. that stores processing programs and various data.
- FIGS. 2 and 3 are diagrams illustrating optical trapping of the microscopic body 91 by an optical vortex.
- FIG. 2 shows a view in a direction perpendicular to the propagation axis of the optical vortex L.
- FIG. 3 shows a view of the optical vortex L as seen in the propagation axis direction, and a donut-shaped region of the optical vortex L with high light intensity is indicated by hatching.
- the optical vortex L can optically trap the microscopic object 91 in the medium 92 of the sample 90, and the microscopic object 91 can be rotated around the propagation axis. can.
- the rotational movement of the microscopic body 91 is, for example, a circular movement or an elliptical movement.
- FIGS. 4(a) and 4(b) are diagrams showing an example of the intensity distribution of the optical vortex at the sample position. This figure shows the light intensity on a plane perpendicular to the propagation axis using shading, and the closer the color is to white, the higher the light intensity is.
- the optical vortex has a donut-shaped light intensity distribution in which the light intensity is maximum at a certain distance in the radial direction from the propagation axis.
- Both of the light intensity distributions in FIGS. 4(a) and 4(b) are intended to generate a perfect circular light intensity distribution in which the light intensity is maximum at a certain distance in the radial direction from the propagation axis. The idea is to move a microscopic object optically trapped in a perfect circular orbit.
- the light intensity distribution shown in FIG. 4(a) has a lower roundness than the light intensity distribution shown in FIG. It will be very different.
- the reason why the light intensity distribution differs from the desired one is thought to be due to aberrations in the optical system caused by limitations in the performance of the optical components that make up the optical system of the optical vortex control device and in the adjustment accuracy when constructing the optical system. .
- the aberration of the optical system is corrected based on the motion information of the optically trapped microscopic object, thereby bringing the light intensity distribution at the sample position closer to the desired one.
- the optical vortex control method of this embodiment includes an imaging step and a control step.
- the imaging unit 60 images the optically trapped and moving microscopic body and outputs image data.
- the motion of the microscopic body is analyzed based on the image data, and the phase distribution of the optical vortex generated by the optical vortex generator 20 is adjusted based on the analysis result.
- the optical vortex generator 20 may include one spatial light modulator, or may include two spatial light modulators that are optically connected in series.
- the adjustment pattern (phase distribution) for adjusting the optical vortex generation obtained based on the analysis result of the movement of the microscopic body is used for adjusting the optical vortex generation before adjustment. What is necessary is to superimpose the modulation pattern on the modulation pattern for , and make one spatial light modulator present the modulation pattern after superimposition.
- the optical vortex generation unit 20 includes two spatial light modulators
- one spatial light modulator is made to present a modulation pattern for optical vortex generation before adjustment, and based on the analysis result of the movement of the microscopic body. What is necessary is to have the other spatial light modulator present the adjustment pattern (phase distribution) for optical vortex generation adjustment determined by the method.
- control unit 70 preferably analyzes any one of the movement trajectory, position distribution, and torque distribution of the microscopic body as the movement of the microscopic body. Further, as the motion of the microscopic body, the sum of squares of the difference between the motion trajectory of the microscopic body and a desired trajectory may be analyzed, and any parameter related to the motion can be analyzed.
- control unit 70 preferably analyzes either the velocity distribution or the angular velocity of the microscopic object as the movement of the microscopic object.
- control unit 70 preferably determines the movement of the microscopic body based on a function whose variable is any one of the motion locus, position distribution, velocity distribution, angular velocity, and torque distribution of the microscopic body. To analyze.
- the motion trajectory of the microscopic object obtained based on image data is approximated by an ellipse, and the ellipticity, which is the ratio of the short axis to the long axis of the ellipse, is determined.
- the position distribution of microscopic objects for example, the circumferential direction around the propagation axis is divided into multiple sections at fixed angles, and in which of the multiple sections the microscopic object is present in each frame of image data can be determined.
- the position distribution of the microscopic bodies in the circumferential direction around the propagation axis is determined by determining whether
- the circumferential direction around the propagation axis is divided into multiple sections at fixed angles, and the torque of the microscopic object is determined in each of the multiple sections based on image data. Then, find the torque distribution of the microscopic body in the circumferential direction around the propagation axis.
- the imaging unit 60 acquires image data at a constant frame rate using a plurality of pixels arranged two-dimensionally on an imaging surface that receives light from a microscopic body. Since the motion information of the microscopic body is acquired based on this image data, it is preferable that the following relationship exists between the exposure time of each frame and the motion of the microscopic body.
- the position of the center of gravity of the micro object is determined by calculating the center of gravity for the image of the micro object in each frame image.
- the exposure time of each frame is too long, the distance the microscopic object moves during the exposure becomes long, and the image of the microscopic object stretches in the direction of movement, making it difficult to accurately determine the position of the center of gravity of the microscopic object. It becomes difficult.
- the moving distance of the microscopic object within the exposure time is smaller than the size of the image of the microscopic object on each frame image.
- position information of the microscopic object can be obtained with an accuracy below the diffraction limit. Note that the moving distance of the microscopic body within the exposure time depends on the amount of optical vortex light.
- the velocity vector of the microscopic object can be determined based on the position of the center of gravity of the microscopic object in the images of the frame at time t1 and the next frame at time t2, and furthermore, the velocity vector distribution of the microscopic object in the circumferential direction can be calculated. You can ask for it. However, if the difference between time t1 and time t2 is too large, it becomes difficult to distinguish the direction of rotation (clockwise/counterclockwise) of the microscopic body.
- the product of the average angular velocity of the rotational motion of the microscopic body and the exposure time of each frame is smaller than 180°.
- the control unit 70 uses one or more of these analysis results.
- the optical vortex generation by the optical vortex generator 20 is adjusted so that the evaluation value based on the analysis result is minimized.
- the optical vortex generation unit 20 when using a plurality of analysis results, for example, the optical vortex generation unit 20 generates an optical vortex so that the linear sum of evaluation values based on each analysis result is used as an evaluation function, and the value of this evaluation function becomes the minimum. Adjust.
- a dispersion evaluation value B representing the degree of variation in the speed of movement of the microscopic body is determined based on the dispersion value of the position distribution or torque distribution of the microscopic body.
- an evaluation function expressed by the formula ⁇ A+ ⁇ B is obtained using the coefficients ⁇ and ⁇ . Then, the optical vortex generation by the optical vortex generator 20 is adjusted so that the value of this evaluation function becomes the minimum value.
- control unit 70 when the control unit 70 obtains an adjustment pattern for adjusting the optical vortex generation by the optical vortex generation unit 20 based on the analysis result, it is preferable that the control unit 70 expresses the adjustment pattern using a Zernike polynomial. In addition, it is preferable to obtain the adjustment pattern using an optimization method.
- the Zernike polynomial is an orthogonal polynomial defined on the unit circle, and is represented by two exponents (non-negative integer n, integer m) and two variables (radius ⁇ , argument ⁇ ).
- Zernike polynomials are used particularly in the field of optics to analytically handle axially symmetric optical aberrations based on diffraction theory. Furthermore, Zernike polynomials can also be used to represent an aberration correction pattern.
- an annealing method for example, an annealing method, a genetic algorithm, a blind search, etc. can be used.
- a coefficient of each aberration component can be obtained using an optimization method.
- the control unit 70 superimposes the adjustment pattern for optical vortex generation adjustment obtained based on the analysis result of the movement of the microscopic body on the modulation pattern for optical vortex generation before adjustment, and controls the superposition.
- the optical vortex generator 20 is caused to present the subsequent modulation pattern.
- the control section 70 can adjust the optical vortex generation by the optical vortex generation section 20 and control the movement of the microscopic body.
- the adjustment pattern may include both amplitude distribution and phase distribution, but may include only phase distribution.
- the same person constructed the optical system of the optical vortex control device 1 using four objective lenses B to E.
- the optical system of the optical vortex control device 1 was constructed by another person. Further, among the five objective lenses A to E, four objective lenses A to D had the same specifications, but the other objective lens E had different specifications.
- the four objective lenses A to D are plan semi-apochromatic objective lenses corrected for chromatic aberration and curvature of field, and have high transmittance in a wide band from the ultraviolet region to the near-infrared region.
- Plan semi-apochromatic objective lenses have higher specifications than achromatic objective lenses, and are suitable for use in optical vortex generation.
- Objective lens E is an achromatic objective lens that corrects chromatic aberration in the visible range, and is the most common objective lens.
- Achromatic objective lenses are said to be unsuitable for photography because when focused on the center of the field of view, the periphery becomes blurred.
- a spatial light modulator was used as the optical vortex generator 20, and the hologram to be displayed was designed using the Kirk-Jones method.
- the design parameters were a declination index of 2, a radial index of 0, and a beam size radius of 2.00 mm.
- the radius of the optical vortex generated on the pupil plane of the objective lens is preferably 20% or more of the radius of the pupil plane.
- polystyrene beads with a diameter of 0.40 ⁇ m were used as the microscopic bodies 91, and pure water was used as the medium 92.
- Microscopic objects (polystyrene beads) floating in the medium (pure water) were optically trapped by an optical vortex focused by an objective lens.
- the optical vortex is Optical vortex generation by the generation unit 20 .
- the position of the center of gravity of the microscopic object in each frame of image data is plotted as a point on the xy plane, the motion trajectory of the microscopic object is approximated by an ellipse, and the minor axis of the ellipse and The ellipticity, which is the ratio to the major axis, was determined.
- An ellipticity evaluation value A was determined based on this ellipticity.
- the circumferential direction around the propagation axis is divided into 72 sections at a constant angle of 5 degrees, and the torque of the microscopic object is calculated in each section based on the image data.
- the torque distribution of the microscopic body in the circumferential direction around the propagation axis was determined.
- a dispersion evaluation value B was determined based on the dispersion value of this torque distribution.
- FIG. 5(a) is a diagram showing the movement locus of the microscopic body before optical vortex generation adjustment when objective lens A is used.
- FIG. 5(b) is a diagram showing the movement locus of the microscopic object after optical vortex generation adjustment when objective lens A is used.
- FIG. 6 is a graph showing the torque distribution of the microbody before and after the optical vortex generation adjustment when objective lens A is used.
- FIG. 7(a) is a diagram showing the movement locus of the microbody before optical vortex generation adjustment when objective lens B is used.
- FIG. 7(b) is a diagram showing the movement locus of the microscopic object after optical vortex generation adjustment when objective lens B is used.
- FIG. 8 is a graph showing the torque distribution of the microscopic body before and after the optical vortex generation adjustment when objective lens B is used.
- FIG. 9(a) is a diagram showing the movement locus of the microscopic body before adjusting the optical vortex generation when the objective lens C is used.
- FIG. 9(b) is a diagram showing the movement locus of the microscopic body after adjusting the optical vortex generation when the objective lens C is used.
- FIG. 10 is a graph showing the torque distribution of the microscopic body before and after the optical vortex generation adjustment when the objective lens C is used.
- FIG. 11(a) is a diagram showing the movement locus of the microscopic body before optical vortex generation adjustment when objective lens D is used.
- FIG. 11(b) is a diagram showing the movement locus of the microscopic body after adjusting the optical vortex generation when the objective lens D is used.
- FIG. 12 is a graph showing the torque distribution of the microscopic body before and after the optical vortex generation adjustment when the objective lens D is used.
- FIG. 13(a) is a diagram showing the movement locus of the microscopic body before optical vortex generation adjustment when objective lens E is used.
- FIG. 13(b) is a diagram showing the movement locus of the microscopic body after adjusting the optical vortex generation when the objective lens E is used.
- FIG. 14 is a graph showing the torque distribution of the microscopic body before and after the optical vortex generation adjustment when the objective lens E is used.
- FIG. 6 are graphs in which the horizontal axis represents the angular position in the circumferential direction around the propagation axis, and the vertical axis represents the torque.
- FIG. 15 is a diagram showing an example of an adjustment pattern for adjusting optical vortex generation. This adjustment pattern is a phase distribution expressed by a Zernike polynomial.
- FIG. 16 is a table summarizing the ellipticity and torque distribution dispersion values before and after the optical vortex generation adjustment when using each of the objective lenses A to E.
- the ellipticity could be brought closer to 1 after the optical vortex generation adjustment compared to before the optical vortex generation adjustment, and the motion locus of the microscopic body could be brought closer to a perfect circle.
- the dispersion value of the torque distribution of the microscopic object in the circumferential direction around the propagation axis can be reduced, and the speed of the microscopic object's motion can be kept at a constant value. I was able to get close to.
- an optical vortex that can bring the movement of an optically trapped microscopic body closer to the desired one, regardless of the performance of the optical components that make up the optical system or the adjustment accuracy when constructing the optical system. and can be adjusted.
- Non-Patent Documents 1 to 6 it is not easy to adjust the generation of optical vortices because a highly accurate optical device and complicated post-processing are required to obtain the intensity information of optical vortices. On the other hand, in this embodiment, there is no need to acquire intensity information of the optical vortex, so it is easy to adjust the generation of the optical vortex.
- Non-Patent Document 6 since the modulation pattern presented to the spatial light modulator is adjusted in two stages: amplitude distribution adjustment and phase distribution adjustment, it is not easy to adjust optical vortex generation. On the other hand, in this embodiment, only the phase distribution adjustment is required, so that the optical vortex generation can be easily adjusted. Further, in this embodiment, only phase distribution adjustment is required, which is also preferable in that light loss can be suppressed.
- optical vortex control device and the optical vortex control method are not limited to the embodiments and configuration examples described above, and various modifications are possible.
- the optical vortex control device of the first aspect according to the above embodiment includes a light source that outputs light, an optical vortex generator that generates an optical vortex from the light, a condensing optical system that condenses the optical vortex, and a condensing optical system.
- an imaging unit that images a moving microscopic object that is optically trapped by a light vortex focused by the system and outputs image data;
- a control unit that adjusts the phase distribution of the optical vortex generated by the optical vortex generator.
- the optical vortex generator in the configuration of the first aspect, has a plurality of pixels arranged two-dimensionally, and modulates at least the phase of light in each pixel and outputs the spatial light modulation unit. It is also possible to have a configuration including a container.
- control unit in the configuration of the second aspect, the control unit superimposes the adjustment pattern for optical vortex generation adjustment on the modulation pattern for optical vortex generation, and the modulation pattern after the superimposition. It is also possible to have a configuration in which the spatial light modulator is made to present the information.
- control section in the configuration of the third aspect, may be configured to obtain the adjustment pattern as a phase distribution.
- control unit in the configuration of the third or fourth aspect, may be configured to obtain the adjustment pattern using Zernike polynomials.
- control unit may be configured to obtain the adjustment pattern using an optimization method.
- control unit selects one of the motion trajectory, position distribution, and torque distribution of the microscopic body as the movement of the microscopic body. It may also be configured to analyze.
- control unit is configured to analyze either a velocity distribution or an angular velocity of the microscopic body as the movement of the microscopic body. Good too.
- the control unit controls the movement trajectory, position distribution, velocity distribution, angular velocity, and torque distribution of the microscopic object as the movement of the microscopic object.
- a configuration may be adopted in which analysis is performed based on a function that uses any one of them as a variable.
- the optical vortex control method of the first aspect uses a light source that outputs light, an optical vortex generator that generates an optical vortex from this light, and a condensing optical system that condenses the optical vortex.
- An imaging step in which a moving microscopic object is optically trapped by a light vortex focused by the optical optical system and outputted to image data, and an imaging step in which the movement of the microscopic object is analyzed based on the image data and the and a control step of adjusting the phase distribution of the optical vortex generated by the optical vortex generator based on the analysis result.
- the optical vortex generator in the configuration of the first aspect, has a plurality of pixels arranged two-dimensionally, and modulates at least the phase of light in each pixel and outputs the spatial light modulator. It is also possible to have a configuration including a container.
- an adjustment pattern for optical vortex generation adjustment is superimposed on a modulation pattern for optical vortex generation, and the modulation pattern after the superimposition is It is also possible to have a configuration in which the spatial light modulator is made to present the information.
- the adjustment pattern may be determined as a phase distribution in the control step.
- the adjustment pattern may be determined using Zernike polynomials in the control step.
- the adjustment pattern may be determined using an optimization method in the control step.
- any one of the movement trajectory, position distribution, and torque distribution of the minute body is determined as the movement of the minute body. It may also be configured to analyze.
- the movement trajectory, position distribution, velocity distribution, angular velocity, and torque distribution of the minute body are controlled as the movement of the minute body.
- a configuration may be adopted in which analysis is performed based on a function that uses any one of them as a variable.
- the embodiments can be used as an optical vortex control device and an optical vortex control method that can easily generate a desired optical vortex.
- Optical vortex control device 10... Light source, 20... Optical vortex generation part, 30-33... Lens, 34... Aperture, 40... Dichroic mirror, 50... Illumination part, 60... Imaging part, 70... Control part, 90... sample, 91... microscopic body, 92... medium.
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Optics & Photonics (AREA)
- Microscoopes, Condenser (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
Abstract
Description
Claims (18)
- 光を出力する光源と、
前記光から光渦を生成する光渦生成部と、
前記光渦を集光する集光光学系と、
前記集光光学系により集光された光渦により光トラップされて運動する微小体を撮像して画像データを出力する撮像部と、
前記画像データに基づいて前記微小体の運動を解析して、当該解析結果に基づいて前記光渦生成部により生成される光渦の位相分布を調整する制御部と、
を備える、光渦制御装置。 - 前記光渦生成部は、2次元配列された複数の画素を有し各画素において少なくとも光の位相を変調して出力する空間光変調器を含む、請求項1に記載の光渦制御装置。
- 前記制御部は、光渦生成の為の変調パターンに光渦生成調整の為の調整パターンを重畳して、その重畳後の変調パターンを前記空間光変調器に提示させる、請求項2に記載の光渦制御装置。
- 前記制御部は、前記調整パターンを位相分布として求める、請求項3に記載の光渦制御装置。
- 前記制御部は、ゼルニケ多項式を用いて前記調整パターンを求める、請求項3または4に記載の光渦制御装置。
- 前記制御部は、最適化法を用いて前記調整パターンを求める、請求項3~5の何れか1項に記載の光渦制御装置。
- 前記制御部は、前記微小体の運動として、前記微小体の運動軌跡、位置分布およびトルク分布のうちの何れかを解析する、請求項1~6の何れか1項に記載の光渦制御装置。
- 前記制御部は、前記微小体の運動として、前記微小体の速度分布および角速度のうちの何れかを解析する、請求項1~6の何れか1項に記載の光渦制御装置。
- 前記制御部は、前記微小体の運動として、前記微小体の運動軌跡、位置分布、速度分布、角速度およびトルク分布のうちの何れかを変数とする関数に基づいて解析する、請求項1~6の何れか1項に記載の光渦制御装置。
- 光を出力する光源と、前記光から光渦を生成する光渦生成部と、前記光渦を集光する集光光学系とを用い、
前記集光光学系により集光された光渦により光トラップされて運動する微小体を撮像部により撮像して画像データを出力する撮像ステップと、
前記画像データに基づいて前記微小体の運動を解析して、当該解析結果に基づいて前記光渦生成部により生成される光渦の位相分布を調整する制御ステップと、
を備える、光渦制御方法。 - 前記光渦生成部は、2次元配列された複数の画素を有し各画素において少なくとも光の位相を変調して出力する空間光変調器を含む、請求項10に記載の光渦制御方法。
- 前記制御ステップにおいて、光渦生成の為の変調パターンに光渦生成調整の為の調整パターンを重畳して、その重畳後の変調パターンを前記空間光変調器に提示させる、請求項11に記載の光渦制御方法。
- 前記制御ステップにおいて、前記調整パターンを位相分布として求める、請求項12に記載の光渦制御方法。
- 前記制御ステップにおいて、ゼルニケ多項式を用いて前記調整パターンを求める、請求項12または13に記載の光渦制御方法。
- 前記制御ステップにおいて、最適化法を用いて前記調整パターンを求める、請求項12~14の何れか1項に記載の光渦制御方法。
- 前記制御ステップにおいて、前記微小体の運動として、前記微小体の運動軌跡、位置分布およびトルク分布のうちの何れかを解析する、請求項10~15の何れか1項に記載の光渦制御方法。
- 前記制御ステップにおいて、前記微小体の運動として、前記微小体の速度分布および角速度のうちの何れかを解析する、請求項10~15の何れか1項に記載の光渦制御方法。
- 前記制御ステップにおいて、前記微小体の運動として、前記微小体の運動軌跡、位置分布、速度分布、角速度およびトルク分布のうちの何れかを変数とする関数に基づいて解析する、請求項10~15の何れか1項に記載の光渦制御方法。
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| DE112023001326.8T DE112023001326T5 (de) | 2022-05-02 | 2023-04-13 | Vorrichtung und Verfahren zur Steuerung optischer Wirbel |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005037682A (ja) * | 2003-07-14 | 2005-02-10 | Hamamatsu Photonics Kk | 計算機ホログラム作成方法 |
| JP2011133580A (ja) * | 2009-12-22 | 2011-07-07 | Olympus Corp | ホログラム像投影方法およびホログラム像投影装置 |
| JP2015085300A (ja) * | 2013-11-01 | 2015-05-07 | 浜松ホトニクス株式会社 | 微小体制御装置 |
| JP2020204735A (ja) * | 2019-06-18 | 2020-12-24 | パナソニックIpマネジメント株式会社 | 光ピンセット装置 |
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| JPH06110371A (ja) * | 1992-09-30 | 1994-04-22 | Fujitsu Ltd | 立体表示方法及び装置 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005037682A (ja) * | 2003-07-14 | 2005-02-10 | Hamamatsu Photonics Kk | 計算機ホログラム作成方法 |
| JP2011133580A (ja) * | 2009-12-22 | 2011-07-07 | Olympus Corp | ホログラム像投影方法およびホログラム像投影装置 |
| JP2015085300A (ja) * | 2013-11-01 | 2015-05-07 | 浜松ホトニクス株式会社 | 微小体制御装置 |
| JP2020204735A (ja) * | 2019-06-18 | 2020-12-24 | パナソニックIpマネジメント株式会社 | 光ピンセット装置 |
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| CN119137523A (zh) | 2024-12-13 |
| JPWO2023214499A1 (ja) | 2023-11-09 |
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