WO2023190427A1

WO2023190427A1 - Sanitary cleansing device and toilet device

Info

Publication number: WO2023190427A1
Application number: PCT/JP2023/012362
Authority: WO
Inventors: 健太郎山本; 竜馬岸野
Original assignee: 株式会社Lixil
Priority date: 2022-03-28
Filing date: 2023-03-28
Publication date: 2023-10-05
Also published as: JP2023145082A

Abstract

Provided are a sanitary cleansing device and a toilet device that are capable of sufficiently removing filth from a cleansing nozzle or the like. This sanitary cleansing device is provided to a functional part disposed in a toilet bowl and has a function of cleansing a human body, and comprises: a cleansing nozzle 51 capable of moving forward and backward between a housed position and an advance position; and a nozzle-cleaning part 53 that squirts washing water to clean the cleansing nozzle 51. The flow rate of washing water squirted from the nozzle-cleaning part 53 is higher than the flow rate of washing water squirted from the cleansing nozzle 51.

Description

Sanitary cleaning equipment and toilet bowl equipment

The present disclosure relates to sanitary cleaning devices and toilet bowl devices.

A technique for forming a water film on a cleaning nozzle for cleaning private parts in a toilet device has been disclosed (for example, see Patent Document 1).

JP2019-173288A

The conventional water film may not be able to completely remove dirt from cleaning nozzles, etc. An object of the present disclosure is to provide a sanitary cleaning device and a toilet bowl device that can sufficiently remove dirt from cleaning nozzles and the like.

The present disclosure is a sanitary washing device that is provided in a functional part disposed in a toilet bowl and has a human body washing function, and includes a washing nozzle that is configured to be able to move back and forth between a storage position and an advanced position, and a washing nozzle that sprays washing water and The present invention relates to a sanitary cleaning device comprising: a nozzle cleaning section that cleans a cleaning nozzle, and a flow rate of cleaning water spouted from the nozzle cleaning section is greater than a flow rate of cleaning water spouted from the cleaning nozzle.

FIG. 1 is a perspective view of a toilet device according to one embodiment. FIG. 7 is a front view of the functional unit with the cover member removed. FIG. 3 is a front view of the functional unit with the cover member and shutter removed. FIG. 3 is a perspective view of the shutter cleaning section as viewed diagonally from above. FIG. 3 is a perspective view of the front part of the functional section viewed diagonally from below. FIG. 3 is a perspective view of the front part of the functional unit from which the shutter part has been removed, as seen diagonally from below. FIG. 3 is a cross-sectional view of the unitized cleaning nozzle and support frame viewed from the side. FIG. 3 is a perspective view of the nozzle lower cleaning section as viewed obliquely from above. FIG. 7 is a plan view of the functional section from above with the cover member removed. It is a diagram showing a wash water circuit. FIG. 6 is a diagram showing the timing of cleaning operations of the cleaning nozzle, the nozzle cleaning section, and the shutter cleaning section by the cleaning control section. FIG. 7 is a diagram showing the timing of cleaning operations of a cleaning nozzle, a nozzle cleaning section, and a shutter cleaning section by a cleaning control section according to another embodiment.

An embodiment of the toilet device 1 will be described with reference to the drawings. In the following description, the front-back direction when viewed from a user seated on a toilet seat (not shown) is referred to as the front-back direction Y. The left and right direction when viewed from the user seated on the toilet seat is defined as the left and right direction X. The up-down direction along the vertical direction with respect to the floor surface on which the toilet bowl 2 is installed is defined as the up-down direction Z.

As shown in FIG. 1, the toilet device 1 according to the present embodiment includes a toilet bowl 2, a toilet seat (not shown), a toilet lid 3, and a functional section 4. The toilet bowl 2 is formed to open upward. The toilet bowl 2 is made of either ceramic or resin, for example. A toilet seat (not shown) and a toilet lid 3 are rotatably attached to the toilet bowl 2 above the toilet bowl 2 .

As shown in FIGS. 1 and 2, the toilet bowl 2 includes a toilet bowl 21, an upper surface portion 22, a toilet bowl recess 23, and an outer peripheral wall portion 24. The toilet bowl 21 is arranged on the front side of the toilet bowl 2. The toilet bowl 21 has an opening 211 at the top. The outer peripheral wall portion 24 surrounds the outer surface of the toilet bowl 21 and the outside of the piping.

The toilet recess 23 is arranged along the rear edge of the opening 211 of the toilet bowl 21 and is recessed from the upper surface of the upper surface 22 . As shown in FIG. 2, the toilet recess 23 has a bottom surface 231, a pair of side walls 232, and a rear wall 233 (see FIGS. 8, 9, and 11). In this embodiment, both the upper surface of the upper surface portion 22 of the toilet bowl 2 and the bottom surface 231 of the toilet bowl recess 23 of the toilet bowl 2 are the upper surface of the toilet bowl 2 .

The functional unit 4 is arranged at the rear of the toilet bowl 2, as shown in FIG. In the toilet bowl 2, the functional section 4 is arranged such that most of the rear side thereof is arranged at the rear side of the upper surface part 22 of the toilet bowl 2, and a part of the front side is arranged at the upper part of the toilet bowl recess 23 and the rear side of the toilet bowl 21. placed above. The functional section 4 has a functional section convex section 42 . The functional portion convex portion 42 is formed on the front side of the functional portion 4 so as to protrude below the functional portion 4 . The functional part convex part 42 is arranged in the toilet bowl recess 23 of the toilet bowl 2 when the functional part 4 is installed on the upper surface part 22 of the toilet bowl 2 other than the toilet bowl recess 23 .

The functional unit 4 is configured to include at least a sanitary cleaning device 5 that cleans the user's private parts. As shown in FIGS. 1 and 2, the functional unit 4 includes a functional component including the sanitary cleaning device 5, a base plate 41 (base member), and a cover member 411 that covers the outer shape of the functional unit. . At least some of the functional components of the functional section 4 are arranged on the base plate 41 .

Functional components are installed on the base plate 41 or other installation positions, taking into account various functions and positional relationships with other members. Functional parts include, for example, a heat-retaining device for a toilet seat (not shown), a toilet cleaning device equipped with a cleaning tank, a sanitary cleaning device 5 (see Figure 3) that cleans the user's private parts, a hose, a power supply unit, and the like. , a control circuit board, an electric opening/closing unit that electrically opens and closes the toilet seat and toilet lid 3, a valve unit, and various piping.

The sanitary cleaning device 5 has a human body cleaning function, and as shown in FIG. 3 etc., includes a pair of cleaning nozzles 51 that can move forward and backward, and a shutter part 52 (see FIG. 2) that opens and closes the front opening of the cleaning nozzle 51. , a nozzle cleaning section 53 (see FIG. 7), a shutter cleaning section 6 (see FIG. 2, etc.), a hot air drying device 54, and a cleaning control section 55 (see FIG. 10). In FIG. 3, illustration of the shutter section 52 is omitted.

The pair of cleaning nozzles 51 are arranged at the center of the front side of the functional section 4 in the left-right direction X and are spaced apart in the left-right direction X. The pair of cleaning nozzles 51 are used for anal cleaning and bidet cleaning to clean the private parts of the human body, respectively. The cleaning nozzle 51 discharges cleaning water toward the human body through a nozzle water spout 51a (see FIG. 7) provided at the upper part of the tip side.

The pair of cleaning nozzles 51 can move back and forth between a retracted position shown in FIGS. 3 and 7, and an advanced position that is a position protruding from the shutter part 52 in the forward direction in the longitudinal direction Y from the retracted position, respectively. . The storage position of the cleaning nozzle 51 is a position where the cleaning nozzle 51 is stored inside the shutter section 52. The advanced position of the cleaning nozzle 51 is a position where the cleaning nozzle 51 is advanced forward to clean the user's private parts. A rack of a nozzle drive mechanism (not shown) is provided on the back side of the cleaning nozzle 51.

The nozzle drive mechanism (not shown) includes an elongated rack, a pinion, and a motor. The pinion meshes with the rack and is rotated by the motor. The cleaning nozzle 51 advances diagonally downward with respect to a support frame 501 that is combined with the cleaning nozzle 51 to constitute a cleaning nozzle unit by a nozzle drive mechanism (not shown), so that its tip touches the back surface of the shutter section 52 ( The inner surface) is configured to be pushed from the back side to the front side in Fig. 2.

As shown in FIG. 7, below the cleaning nozzle 51, a nozzle lower cleaning section 536 as a nozzle lower surface cleaning section is provided as a unit with the cleaning nozzle 51. As shown in FIG. 8, the nozzle lower cleaning portions 536 are provided in pairs and are formed in a cylindrical shape having a space through which cleaning water flows. An enlarged water spout 5361 is formed on the end surface of the tip of the nozzle lower cleaning section 536 and constitutes a water spouting hole that widens from the base side toward the end surface of the nozzle lower cleaning section 536 to the left and right. Thereby, the cleaning water is spouted from the enlarged water spout 5361 so as to spread in the left-right direction, and the back side (lower side) of the cleaning nozzle 51 can be cleaned by the width of the cleaning nozzle 51. As a result, the nozzle lower side cleaning section 536 can be made small in shape, and a wide water sprinkling effect on the back side of the cleaning nozzle 51 can be obtained.

As shown in FIG. 7, above the cleaning nozzle 51, a nozzle upper cleaning section 535 serving as a nozzle upper surface cleaning section is provided as a unit with the cleaning nozzle 51. A discharge port 5351 is formed in the nozzle upper cleaning section 535 as a through hole that constitutes a water discharge hole. The discharge port 5351 is not wide like the enlarged water spout 5361, and therefore, one discharge port 5351 discharges cleaning water onto the upper surface of the cleaning nozzle 51 in a narrower range than the enlarged water spout 5361. . A plurality of such discharge ports 5351 are formed. Thereby, the front side (upper side) of the cleaning nozzle 51 can be cleaned by the width of the cleaning nozzle 51. Therefore, the nozzle upper cleaning section 535 spews cleaning water at a faster flow rate than the nozzle lower cleaning section 536 and at a larger flow rate (instantaneous flow rate that is the flow rate per unit time). As a result, the nozzle upper side cleaning section 535 can be made small in shape, and a high flow rate effect of discharging cleaning water can be obtained on the upper surface of the cleaning nozzle 51.

Above the cleaning nozzle 51, on the side closer to the base with respect to the tip of the cleaning nozzle 51, a silver ion supply section 537 constituting a sterilizing water supply section is provided as a unit with the cleaning nozzle 51. . The silver ion supply unit 537 supplies silver ions to the cleaning water to turn the cleaning water into sterilized water, which can be discharged from the discharge port 5351 of the nozzle upper cleaning unit 535 to the cleaning nozzle 51 . This makes it possible to sterilize the cleaning nozzle 51.

The shutter section 52 is arranged at the center in the left-right direction X on the front side of the functional section convex section 42. The shutter portion 52 is formed into a plate shape extending in the left-right direction X (lateral direction) of the toilet bowl 2 . When located in the closed position, the shutter portion 52 is formed in a planar shape that slopes downward from the front side toward the rear side (see FIG. 7, etc.).

As the cleaning nozzle 51 moves forward and backward, the shutter section 52 opens and closes the opening 432 of the functional section front frame 43 formed in front of the cleaning nozzle 51 when its back surface is pushed by the cleaning nozzle 51. The functional unit front frame 43 is fixed to the base plate 41. An opening 432 (front opening) that constitutes a front opening of the cleaning nozzle 51 is formed in the functional section front frame 43 . The opening 432 is an open portion formed on the front side of the functional section 4. The shutter section 52 is arranged in the opening 432 of the functional section front frame 43 when located in the closed position.

As shown in FIGS. 2 and 3, the hot air drying device 54 is arranged on the outside of one side in the left-right direction X behind the shutter section 52 located in the closed position. The hot air drying device 54 has a hot air outlet 541. The hot air outlet 541 is formed to open upward behind the opening 432 of the functional unit front frame 43. For example, at a predetermined timing after the cleaning operation of the sanitary cleaning device 5, the hot air drying device 54 blows hot air toward the human body from the hot air outlet 541 while the shutter section 52 is open, or Water droplets can be blown off by blowing warm air onto the back surface of the shutter section 52 after cleaning while the shutter section 52 is closed.

As shown in FIG. 10, the sanitary cleaning device 5 has a cleaning water circuit 56 through which cleaning water flows to clean the cleaning nozzle 51 and the front and back sides of the shutter section 52. The cleaning water circuit 56 supplies cleaning water to the nozzle cleaning section 53 and the shutter cleaning section 6, which serve as device cleaning sections. In this embodiment, cleaning includes cleaning with sterilized water (silver ion water, hypochlorous acid), high temperature water, foam cleaning, and the like.

As shown in FIG. 10, the cleaning water circuit 56 includes a cleaning water supply flow path L1 that supplies cleaning water to the sanitary washing device 5, a left shutter cleaning flow path L2, a right shutter cleaning flow path L3, and a nozzle cleaning flow. It has a path L4. The nozzle cleaning flow path L4 branches into a nozzle upper surface side flow path L41 and a nozzle lower surface side flow path L42. The flow rate of the cleansing water in the cleansing water supply flow path L1 is determined by the flow rate of the cleansing water in the cleansing nozzle water circuit constituted by a hose that distributes the cleansing water spouted toward the human body from the nozzle spout 51a of the cleansing nozzle 51 to the cleansing nozzle 51. more than the flow rate. This makes it possible to clean the cleaning nozzle 51 and the shutter section 52 with a sufficient flow rate of cleaning water. The flow rates of the cleaning water discharged from the nozzle cleaning section 53 and the shutter cleaning section 6 are each larger than the flow rates of the cleaning water discharged from the cleaning nozzle 51. This makes it possible to clean the cleaning nozzle 51 with a sufficient flow rate of water. The above-mentioned "flow rate" means instantaneous flow rate (flow rate per unit time).

The cleaning water circuit 56 includes a nozzle cleaning section 53, a shutter cleaning section 6, a solenoid valve 571, a pressure reducing valve 572, a vacuum breaker 573, and a disc valve 564, and executes each cleaning operation of the sanitary cleaning device 5.

The shutter cleaning left flow path L2, the shutter cleaning right flow path L3, the nozzle cleaning flow path L4, the nozzle upper surface side flow path L41, and the nozzle lower surface side flow path L42 are composed of, for example, rubber hoses. constitutes a water circuit for the device cleaning section as a water circuit different from the water circuit for the cleaning nozzle, which is constituted by a hose that distributes the cleaning water spouted toward the human body from the nozzle spout 51a of the cleaning nozzle 51 to the cleaning nozzle 51. . Here, "different water circuits" means that each water circuit has a water supply valve that can be opened and closed independently, rather than being opened and closed by a common water supply valve. That is, the cleaning water circuit 56 includes a solenoid valve 571, but in the cleaning nozzle water circuit (not shown), there is another water supply valve (cleaning nozzle water supply valve) that can be opened and closed independently of the solenoid valve 571. ) is provided. The shutter cleaning right flow path L3 constitutes a dedicated water circuit that allows cleaning water to flow only to the shutter cleaning section 6. The nozzle cleaning flow path L4 (nozzle upper surface side flow path L41, nozzle lower surface side flow path L42) constitutes a dedicated water circuit that allows cleaning water to flow only to the nozzle cleaning section 53. Thereby, the cleaning by the nozzle cleaning section 53 can be performed simultaneously with the cleaning operation of the cleaning nozzle 51 without reducing the respective flow rates. In addition, it becomes possible to perform nozzle cleaning first and shutter cleaning afterwards, so that dirt generated during nozzle cleaning can be washed away from the outside of the main body of the functional section (base plate 41, cover member 411) by shutter cleaning. becomes possible.

The solenoid valve 571, the pressure reducing valve 572, the vacuum breaker 573, and the disc valve 564 are provided and connected in this order in the wash water supply channel L1. The opening and closing operations of the electromagnetic valve 571 and the disc valve 564 are controlled by the cleaning control section 55. The cleaning control unit 55 controls the opening and closing operations of the electromagnetic valve 571 and the disc valve 564, so that the nozzle cleaning unit 53 and the shutter cleaning unit 6 discharge cleaning water.

The upstream end of the shutter cleaning left flow path L2 is connected to the disk valve 564, and the downstream end of the shutter cleaning left flow path L2 is connected to the inlet 615 at the left end of the shutter cleaning section 6. There is. The upstream end of the shutter cleaning right flow path L3 is connected to the disk valve 564, and the downstream end of the shutter cleaning right flow path L3 is connected to the inlet 616 at the left end of the shutter cleaning section 6. There is. The cleaning water that has flowed into the

inlets

615 and 616 flows through the flow path inside the shutter cleaning section 6 and is spouted from the front water spout 611 and the back water spout 621 of the shutter cleaning section 6 .

The upstream end of the nozzle cleaning channel L4 is connected to the disc valve 564, and the downstream end of the nozzle top surface side channel L41 where the nozzle cleaning channel L4 branches is connected to the nozzle of the nozzle cleaning section 53. It is connected to the upper cleaning section 535, and the downstream end of the nozzle lower surface side flow path L42 is connected to the nozzle lower cleaning section 536 of the nozzle cleaning section 53. The cleaning water that has passed through the nozzle upper cleaning section 535 is discharged onto the upper surface of the cleaning nozzle 51 from the discharge port 5351 of the nozzle upper cleaning section 535. The cleaning water that has passed through the nozzle lower cleaning section 536 is discharged onto the lower surface of the cleaning nozzle 51 from the discharge port 5361 of the nozzle lower cleaning section 536.

The shutter cleaning section 6 cleans the front surface 52a and back surface 52b (see FIG. 7) of the shutter section 52 with the shutter section 52 closing the opening 432. The shutter cleaning section 6 is arranged above the upper end of the shutter section 52. The shutter cleaning unit 6 discharges cleaning water downward to the shutter unit 52 when the shutter unit 52 is located in the closed position where the opening 432 is closed.

In the present embodiment, “the state in which the shutter portion 52 closes the opening portion 432” or “the case where the shutter portion 52 is located in the closed position where the opening portion 432 is closed” means that the shutter portion 52 completely closes the opening portion 432. It doesn't have to be closed. “The state in which the shutter portion 52 closes the opening portion 432” or “the case where the shutter portion 52 is located in the closed position where the opening portion 432 is closed” means that, for example, the shutter portion 52 is pushed by the cleaning nozzle 51 and opens slightly. This also includes a state in which the shutter portion 52 substantially closes the opening portion 432.

As shown in FIGS. 5, 6, and 7, the shutter cleaning section 6 includes a front cleaning water spouting section 61 (front side cleaning section), a back cleaning water spouting section 62 (back side cleaning section), and a receiving section 64. It has a cleaning part fixed part 66.

The front cleaning water spouting section 61 has a plurality of front water spouting ports 611, as shown in FIGS. 5 and 6. The plurality of front water spouts 611 spout cleaning water onto the front surface 52 a of the shutter section 52 . The back surface cleaning water spouting section 62 has a plurality of back surface water spouts 621. The plurality of back surface water spouts 621 discharge cleaning water onto the back surface 52b of the shutter section 52. The front surface 52a and the back surface 52b of the shutter section 52 are subjected to hydrophilic treatment to spread the washing water, or are textured. Such hydrophilic treatment may be applied only to at least one of the front surface 52a and the rear surface 52b, and the hydrophilic treatment is not limited to texturing.

The front cleaning water spouting section 61 and the back cleaning water spouting section 62 spout the cleaning water that has been temporarily distributed to the cleaning water distribution section 63. As shown in FIGS. 2 and 3, the cleaning water flow section 63 is arranged inside the cover member 411 at the upper part of the front part of the functional section 4. As shown in FIGS. The cleaning water flow section 63 is formed in a hollow shape extending in the left-right direction X. The lower surface 632 of the wash water flow section 63 is formed into a planar shape that has a width in the front-rear direction Y and extends in the left-right direction X.

A plurality of front water spouts 611 of the front surface cleaning water spouting section 61 and a plurality of back surface water spouts 621 of the back surface cleaning water spouting section 62 are formed on the lower surface 632 of the cleaning water distribution section 63 . As shown in FIG. 4, both ends of the cleaning water flow section 63 in the left-right direction X are connected to the downstream end of the shutter cleaning left channel L2 and the downstream end of the shutter cleaning right channel L3, respectively. It has an inlet 615 and an inlet 616. The inlet 615 and the inlet 616 are integrally welded to the shutter cleaning section 6. Washing water is introduced into the washing water distribution section 63 via the shutter washing left flow path L2 and the shutter washing right flow path L3, and is distributed therethrough. The cleaning water temporarily distributed to the cleaning water distribution section 63 is delivered to the shutter section 52 by the plurality of front water spouts 611 of the front surface cleaning water spouting section 61 and the plurality of back surface water spouts 621 of the back surface cleaning water spouting section 62. Water is sprayed towards the target.

As shown in FIGS. 5 and 6, the plurality of front water spouts 611 and the plurality of back water spouts 621 are arranged in two rows, front and back, on the lower surface 632 of the wash water flow section 63. The plurality of front water spouts 611 are arranged on the front side in the front-rear direction Y of the lower surface 632 of the wash water distribution section 63, and the plurality of back water spouts 621 are arranged on the rear side in the front-rear direction Y. The plurality of front water spouts 611 and the plurality of back water spouts 621 are arranged in a straight line in the left-right direction X, staggered so that their positions in the left-right direction X do not overlap in the area where the shutter section 52 in the left-right direction X is provided. placed side by side.

As shown in FIG. 7, the plurality of front water outlets 611 are through holes that diagonally penetrate the lower surface 632 of the cleaning water circulating section 63 in the vertical direction Z, on the front side of the lower surface 632 of the cleaning water circulating section 63 in the front-rear direction Y. formed by. As shown in FIG. 5, the plurality of front water spouts 611 open downward so that cleaning water flows along the front surface 52a of the shutter section 52 when the shutter section 52 is in the closed position.

The plurality of front water outlets 611 open downward, which is the direction along the upper bent portion 521 of the shutter portion 52. As a result, the cleaning water spouted from the plurality of front water spouts 611 is spouted along the upper bent portion 521 of the shutter section 52 and flows along the front surface 52a of the shutter section 52. 52a can be cleaned. Since the water spouting direction from the water spout 611 and the front surface 52a of the shutter section 52 are parallel, it is possible to make the shutter section 52 less susceptible to variations. Furthermore, even if the washing water is spouted from the front water spout 611 and the back water spout 621 with the shutter section 52 removed, the washing water from the plurality of front water spouts 611 and the back water spout 621 may be applied to the human body. You can avoid getting infected.

As shown in FIG. 7, the plurality of back water spouts 621 are located on the rear side of the front water spout 611 on the lower surface 632 of the washing water circulating portion 63 in the front-rear direction Y, and are located above and below the lower surface 632 of the washing water circulating portion 63. It is formed by a through hole that penetrates diagonally in the Z direction. As shown in FIG. 5, the plurality of back water spouts 621 are arranged downwardly so that cleaning water flows along the back surface 52b (see FIG. 7) of the shutter section 52 when the shutter section 52 is in the closed position. Open towards.

The plurality of back water outlets 621 open downward, which is the direction along the back surface 52b of the shutter section 52. As a result, the cleaning water spouted from the plurality of back water spouts 621 is spouted along the back surface 52b of the shutter section 52, and flows along the back surface 52b of the shutter section 52, thereby cleaning the back surface 52b of the shutter section 52. Can be washed. Further, the direction of this opening is the direction in which the shutter cleaning section 6 discharges cleaning water in a direction where electrical components (not shown) housed inside the functional section 4 are not arranged. Here, the "direction in which electrical components are not arranged" refers to not only the direction in which electrical components are not arranged on the extension line of the direction of washing water discharged from the shutter cleaning section 6, but also the direction in which electrical components are This also includes the direction in which the discharged cleaning water does not come into contact with electrical components. Therefore, it is possible to prevent the electrical components from being exposed to water.

In addition, a plurality of front water spouts 611 and back water spouts 621 are formed on the lower surface 632, and since the number of nozzle water spouts 51a of the cleaning nozzle 51 is smaller and the total opening area is smaller, the shutter cleaning portion The flow rate of the cleaning water discharged from the nozzle cleaning section 53 is faster than the flow rate of the cleaning water discharged from the nozzle cleaning section 53. This makes it possible to obtain a strong cleaning effect on the cleaning nozzle 51. Further, the flow rate of cleaning water discharged from the shutter cleaning section 6 is greater than the flow rate of cleaning water discharged from the nozzle cleaning section 53. This makes it possible to sufficiently clean the front and back surfaces of the shutter section 52, which has a larger surface area than the cleaning nozzle 51.

As shown in FIG. 4, a pair of receiving parts 64 are provided in the central part of the shutter cleaning part 6 at a predetermined interval in the longitudinal direction of the shutter cleaning part 6. The receiving part 64 is formed of a plate-shaped member that is integrally fixed to the shutter cleaning part 6 and has a positional relationship perpendicular to the longitudinal direction of the shutter cleaning part 6.

A rotary shaft engaging portion 643 is formed at the upper front portion of the receiving portion 64 and is constituted by a notch with which the rotary shaft 583 of the shutter portion 52 can be removably engaged. The rotation shaft 583 of the shutter section 52 engages with the rotation shaft engagement section 643, so that the shutter section 52 is rotatably supported by the shutter cleaning section 6. Thereby, the shutter section 52 can be made into an integral part with the shutter cleaning section 6, and variations in the shutter section 52, which is the target of water spouting, can be minimized.

The rear end portion 642 of the receiving portion 64 is in contact with the support frame 501 that supports the cleaning nozzle 51. Thereby, the shutter cleaning section 6 is supported by the base plate 41 at a position away from the inlet 615 and the inlet 616 welded to the shutter cleaning section 6. Therefore, when attaching the shutter section 52 to the shutter arm 58 that pushes the rotation shaft 583 into the rotation shaft engagement section 643 and engages it, the receiving section 64 that comes into contact with the support frame 501 resists the pushing force. , it becomes possible to suppress the shutter cleaning section 6 from being bent.

As shown in FIG. 7, the rear end portion 642 of the receiving portion 64 comes into contact with the support frame 501 that is unitized with the cleaning nozzle 51. Thereby, the shutter cleaning section 6 is positioned with respect to the cleaning nozzle 51. Therefore, it is possible to suppress variations in the position of the shutter cleaning section 6 with respect to the cleaning nozzle 51.

The cleaning part fixed part 66 is provided integrally with the shutter cleaning part 6 at a position closer to the center in the longitudinal direction of the shutter cleaning part 6 than the inlet 615 and the inlet 616 of the shutter cleaning part 6. The cleaning section fixed portion 66 is fixed to the base plate 41 with screws, and thereby the shutter cleaning section 6 is fixed to the base plate 41.

A shutter arm 58 that supports the shutter section 52 is fixed to the back surface 52b of the shutter section 52. The shutter arm 58 includes a supported portion 581 extending in the longitudinal direction of the shutter portion 52 and a pair of plate-shaped shutter fixing portions 582 extending downward from both ends of the supported portion 581. The shutter part 52 is fixed to the lower part of the shutter fixing part 582, and thereby the shutter arm 58 supports the shutter part 52. A rotating shaft 583 passes through the supported portion 581 . The rotating shaft 583 engages with the rotating shaft engaging portion 643. Thereby, the shutter section 52 and the shutter arm 58 are rotatably supported with respect to the receiving section 64.

Next, the timing of the cleaning operation of the cleaning nozzle 51, the nozzle cleaning section 53, and the shutter cleaning section 6 by the cleaning control section 55 will be explained.
The cleaning control unit 55 controls each cleaning operation of the sanitary cleaning device 5, as shown in FIG. The cleaning control unit 55 controls the cleaning water circuit 56 to execute control related to cleaning the sanitary cleaning device 5 .

First, the cleaning control unit 55 performs control to perform pre-cleaning by discharging cleaning water from the cleaning nozzle 51 and the nozzle cleaning unit 53 when the cleaning nozzle 51 is in the storage position (“storage” in FIG. 11). Next, the cleaning control unit 55 moves the cleaning nozzle 51 forward to an advanced position (“cleaning position” in FIG. 11) that is a position that protrudes from the shutter unit 52, and sprays cleaning water from the cleaning nozzle 51 so that the user can control to perform a private part cleaning operation ("butt cleaning" in FIG. 11) to clean the private parts of the user.

Next, the cleaning control unit 55 controls the cleaning nozzle 51 to retreat and return the cleaning nozzle 51 to the storage position ("storage" in FIG. 11). At the same time, the cleaning control unit 55 discharges cleaning water from the nozzle upper cleaning unit 535 and the nozzle lower cleaning unit 536 of the nozzle cleaning unit 53, and cleansing the cleaning nozzle 51 on the way back to the storage position and the cleaning nozzle 51 returning to the storage position. Control is performed to clean the cleaning nozzle 51 that is in the same state. Then, the cleaning control unit 55 ends discharging the cleaning water from the nozzle upper cleaning unit 535 and the nozzle lower cleaning unit 536 of the nozzle cleaning unit 53.

Next, the cleaning control unit 55 controls the shutter unit 52 in the closed state to start discharging cleaning water from the front water outlet 611 and the back water outlet 621 of the shutter cleaning unit 6. This allows the cleaning water to flow along the front surface 52a and the rear surface 52b of the shutter section 52, making it possible to avoid the cleaning water from strongly contacting the shutter section 52 and scattering.

Then, after a predetermined period of time has elapsed, the cleaning control unit 55 performs control to end spouting of cleaning water from the front water spout 611 and the back water spout 621 of the shutter cleaning unit 6. That is, after the nozzle cleaning section 53 starts cleaning the cleaning nozzle 51, the shutter cleaning section 6 starts cleaning the shutter section 52, and after the nozzle cleaning section 53 finishes cleaning the cleaning nozzle 51, the shutter cleaning starts. The cleaning of the shutter section 52 by the section 6 is completed. Thereby, when dirt scattered by washing the washing nozzle 51 adheres to the shutter section 52, it is possible to remove the dirt by washing the shutter section 52.

Thereafter, after the user dismounts from the toilet seat, the cleaning control unit 55 controls the cleaning nozzle 51 to advance to the advanced position ("cleaning position" in FIG. 11). Next, the cleaning control unit 55 controls the cleaning nozzle 51 to retreat and return the cleaning nozzle 51 to the storage position ("storage" in FIG. 11). At the same time, the cleaning control unit 55 performs control to perform post-cleaning by discharging cleaning water from the nozzle cleaning unit 53.

The amount, flow rate (instantaneous flow rate), and flow velocity of the cleaning water discharged by the nozzle cleaning section 53 in the post-cleaning are larger than the amount of cleaning water discharged by the nozzle cleaning section 53 in the pre-cleaning. This makes it possible to use more cleaning water in the post-cleaning performed on the cleaning nozzle 51 immediately after dirt has been removed than in the pre-cleaning performed on the cleaning nozzle 51 that is hardly dirty. .

Next, the cleaning control unit 55 controls the silver ion supply unit 537 to supply silver ions to the cleaning water after the post-cleaning, and uses the cleaning water as sterilization water to direct the cleaning nozzle 51 to the nozzle upper cleaning unit 535. Control is performed to discharge water from the discharge port 5351. That is, the silver ion supply section 537 and the nozzle upper cleaning section 535 as a sterilized water supply section discharge sterilized water to the cleaning nozzle 51 after the user takes off the toilet bowl and after the post-cleaning. do. This makes it possible to sterilize the cleaning nozzle 51 with sterilizing water in a state where dirt has been reliably removed by post-cleaning and when the user is not seated. Therefore, although a predetermined time is required for sterilization, this predetermined time can be secured after discharging the sterilization water.

Preferred embodiments of the present disclosure have been described. The present disclosure is not limited to the embodiments described above, and can be modified as appropriate.
For example, as another embodiment, as shown in FIG. 12, after finishing the private part cleaning operation ("butt cleaning" in FIG. 12) of discharging cleaning water from the cleaning nozzle 51 to clean the user's private parts, In addition, after the cleaning nozzle 51 has started to be cleaned by discharging cleaning water from the nozzle upper cleaning unit 535 and the nozzle lower cleaning unit 536 of the nozzle cleaning unit 53, the cleaning nozzle 51 is in the retracted position (in FIG. 12). Before moving to "storage"), disinfection water is spouted to the cleaning nozzle 51 and then cleaning is started. After the cleaning of the cleaning nozzle 51 by discharging cleaning water from the nozzle upper cleaning section 535 and the nozzle lower cleaning section 536 of the nozzle cleaning section 53 is finished, the post-cleaning may be finished. Even in this case, application of sterilizing water to the cleaning nozzle 51 can be completed after cleaning of the cleaning nozzle 51 is completed.
For example, the configuration may include a cover cleaning section that sprays cleaning water to clean the cover member 411 serving as the main body cover, and a dedicated water circuit that flows the cleaning water only to the cover cleaning section. In this case, the cover cleaning section may clean the main body cover after the shutter cleaning section cleans the shutter section.
Further, for example, a configuration may be adopted in which the base cleaning unit includes a base cleaning unit that sprays cleaning water to clean the base member, and has a dedicated water circuit that flows the cleaning water only to the base cleaning unit. In this case, the base cleaning section may clean the base member after the shutter cleaning section cleans the shutter section.

1 Toilet bowl device, 2 Toilet bowl, 4 Functional part, 5 Sanitary cleaning device, 6 Shutter cleaning part (device cleaning part), 41 Base plate (base member), 51 Cleaning nozzle, 52 Shutter part, 53 Nozzle cleaning part (device cleaning part) , 61 Front cleaning water spouting part (front side cleaning part), 62 Back cleaning water spouting part (back side cleaning part), 64 Receiving part, 535 Nozzle upper cleaning part (sterilizing water supply part), 536 Nozzle lower cleaning part, 537 Silver ion Supply section (sterilized water supply section), L2 Shutter cleaning left flow path (equipment cleaning section water circuit), L3 Shutter cleaning right flow path (equipment cleaning section water circuit), L4 Nozzle cleaning flow path (equipment cleaning section water circuit)

Claims

A sanitary cleaning device that is installed in a functional part placed in a toilet bowl and has a human body cleaning function,
a cleaning nozzle configured to be able to move forward and backward between a retracted position and an advanced position;
a nozzle cleaning section that sprays cleaning water to clean the cleaning nozzle;
A sanitary cleaning device in which a flow rate of cleaning water spouted from the nozzle cleaning section is greater than a flow rate of cleaning water spouted from the cleaning nozzle.
The nozzle cleaning section includes a nozzle top cleaning section that sprays cleaning water to clean the top surface of the cleaning nozzle, and a nozzle bottom cleaning section that sprays cleaning water to clean the bottom surface of the cleaning nozzle.
The sanitary cleaning device according to claim 1, wherein the nozzle upper surface cleaning section discharges cleaning water at a faster flow rate than the nozzle lower surface cleaning section.
The sanitary cleaning device according to claim 2, wherein the nozzle upper surface cleaning section discharges cleaning water at a higher flow rate than the nozzle lower surface cleaning section.
The sanitary cleaning device according to claim 2 or 3, wherein the water spouting hole of the nozzle lower surface cleaning section has a water spout that spouts cleaning water so as to spread from the nozzle lower surface cleaning section.
The sanitary cleaner according to any one of claims 2 to 4, wherein the water spouting hole of the nozzle upper surface cleaning section has a water spout that spouts cleaning water to a narrower range than the cleaning water spouted from the water spouting hole of the nozzle lower surface cleaning section. cleaning equipment.
toilet bowl and
a functional section located at the rear of the toilet;
A toilet device comprising the sanitary cleaning device according to any one of claims 1 to 5.