WO2023185179A1

WO2023185179A1 - Electronic device

Info

Publication number: WO2023185179A1
Application number: PCT/CN2023/070076
Authority: WO
Inventors: 缪灯奎
Original assignee: 荣耀终端有限公司
Priority date: 2022-03-31
Filing date: 2023-01-03
Publication date: 2023-10-05
Also published as: CN116931134A

Abstract

An anti-reflection glass, comprising: a glass substrate (1), a first surface of the glass substrate (1) having a micro-nano structure (11); and a first anti-reflection film layer (2) stacked on the first surface of the glass substrate (1), the first anti-reflection film layer (2) being formed by alternately superposing high-refractive-index layers (21) and low-refractive-index layers (22). Further disclosed are an electronic device display screen and an electronic device. The micro-nano structure (11) of a micron- or nano-sized surface structure is arranged on the surface of the glass substrate (1) to ensure the dense accumulation of atoms in a film layer at a short range and increase the hardness of the film layer, such that the scratch resistance of the surface of a film-coated glass. Meanwhile, an undulating structure at a long range enables the film layer stress to be released locally at a long range, reduces the stress deformation of the glass substrate, such that the glass substrate (1) is not subjected to large stress deformation when a thick anti-reflection film layer is stacked, and can be used in large-sized structures such as electronic device display screens.

Description

Electronic equipment

This application requests the priority of the Chinese patent application submitted to the State Intellectual Property Office of China on March 31, 2022, with the application number 202210343622.9 and the invention title "anti-reflective glass, preparation method thereof, display screen of electronic equipment and electronic equipment" , the entire contents of which are incorporated herein by reference.

Technical field

The present application relates to the technical field of electronic equipment, and in particular to an anti-reflective glass, its preparation method, a display screen of an electronic equipment, and an electronic equipment.

Background technique

With the popularity of touch electronic products, consumers have higher and higher requirements for touch electronic products. There is a cover glass above the screen of touch electronic products. Glass is a light-dense medium. Glass with a refractive index of 1.54 has about 4.2% of reflected light on each surface. In an environment with strong light, for example, under strong sunlight outdoors, strong reflection enters the human eyes, causing glare, causing the eyes to see clearly the displayed content on the screen, making it impossible to read normally, and affecting the use of the product.

Using high refractive index materials and low refractive index materials, alternately superimposed according to the optical film design, an AR (Anti-Reflection) film layer is formed on the glass substrate, which can reduce the reflectivity of the glass and increase the transmittance of the glass. However, The AR film layer is generally thin and easily punctured, causing the glass to be easily scratched and visible scratches to the naked eye. As the use of touch electronic products continues, there will be more and more scratches, affecting the appearance of the touch electronic products. At the same time, scratches will destroy the stress balance of the glass, resulting in a decrease in the impact resistance of the glass.

In order to improve the scratch resistance of the glass substrate, a dense high-hardness material coating can be plated on the surface of the glass substrate. However, the dense high-hardness material coatings will generate repulsive forces and produce compressive stress, causing the glass substrate to The deformation of the material makes it unable to be used on larger-sized structures such as mobile phone covers, but can only be used on small-sized structures such as camera lenses and watch covers.

Contents of the invention

This application provides an anti-reflective glass, a preparation method thereof, a display screen of an electronic device, and an electronic device, which solves the problems of the anti-reflective glass being easily scratched, the impact resistance being reduced, and the glass substrate being easily deformed.

In order to achieve the above objectives, this application provides the following technical solutions:

An anti-reflective glass, including a glass substrate, the first surface of the glass substrate having a micro-nano structure; a first anti-reflective film layer superimposed on the first surface of the glass substrate, the first anti-reflective film is made of high The refractive index layer and the low refractive index layer are alternately superimposed.

In the embodiment of the present application, a micro-nano structure is provided on the surface of the glass substrate. The micro-nano structure is a surface structure of micron or nanometer size, which can ensure the dense accumulation of film atoms in short distances, improve the hardness of the film, thereby improving the scratch resistance of the coated glass surface. At the same time, the long-range undulating structure allows the film lamination stress to be released locally, reducing the stress deformation of the glass substrate. When stacking a thicker anti-reflection film layer, no large stress deformation will occur, so it can be used in electronics. In larger structures such as device displays. .

In some possible implementations, the micro-nano structure is composed of a plurality of micron-sized and/or nano-sized protrusions; or is composed of a plurality of micron-sized and/or nano-sized grooves or depressions. The plurality of protrusions, grooves or depressions may be arranged irregularly or regularly, for example, in an array structure.

In order not to affect the optical performance of the anti-reflective glass, the height of the protrusions is 50-1000nm, the bottom size is 100-3000nm, and the spacing between adjacent protrusions is 100-1000nm. Similarly, when the micro-nano structure is formed by multiple ravines or multiple depressions, the depth and length of the ravines and the distance between adjacent ravines also meet the above dimensions or relationships.

In some possible embodiments, the thickness of the first anti-reflection film layer is 500-3000 nm. When a glass substrate with a micro-nano structure on the surface is superposed with an anti-reflection film layer with a thickness of more than 500 nm, it can reduce the stress of the film layer and the stress deformation of the glass substrate, making it applicable to large-size structures of more than 50 mm.

In some possible embodiments, in the first anti-reflection film layer, the material of the low refractive index layer is Al ₂ O ₃ ; and the material of the high refractive index layer is AlN or AlON. Al ₂ O ₃ has a high hardness, with a Mohs hardness of about 9, which can further improve the scratch resistance of anti-reflective glass.

In some possible implementations, the Mohs hardness of the anti-reflective glass surface under a force of 500g is above 7.

In some possible implementations, when the anti-reflective glass is tested using a glass profile, the deformation amount is less than 0.20 mm when the thickness is 0.55 mm.

In some possible implementations, the Vickers hardness of the anti-reflective glass is above 1100HV.

In some possible implementations, the anti-reflection glass has a reflectivity of <2% and a transmittance of >93% in the light wavelength region of 380 to 780 nm.

The embodiments of the present application also provide a method for preparing anti-reflective glass, which is characterized by including:

Step S1: forming a micro-nano structure on at least one surface of the glass substrate;

Step S2: Superimpose a first anti-reflective film layer on the surface of the glass substrate with a micro-nano structure. The first anti-reflective film is formed by alternately superposing a high refractive index layer and a low refractive index layer.

Specifically, a micro-nano structure can be formed on at least one surface of the glass substrate through a metal mask method, a diamond flying knife, an acid etching method, etc., and a first anti-reflection layer can be superimposed on the surface of the glass substrate with a micro-nano structure using a vacuum deposition method. film layer.

Embodiments of the present application also provide an electronic device display screen and electronic device, including the anti-reflective glass described in the above technical solution or the anti-reflective glass prepared by the preparation method described in the above technical solution. The above-mentioned anti-reflective glass has small stress deformation, low reflectivity, high transmittance, good scratch resistance and high hardness, and can be used as a display screen for electronic devices, such as small-sized displays such as watches or Large-size displays such as mobile phones. Specifically, the anti-reflective glass can be used as an outer screen of a display screen of an electronic device. Electronic devices using the above-mentioned anti-reflective glass as a display screen will not cause glare under strong sunlight, making it easier for users to see the content displayed on the screen clearly and improving the product use experience. In addition, electronic equipment display screens have good scratch resistance and are not prone to scratches visible to the naked eye. They do not affect the appearance of electronic equipment and do not reduce the impact resistance of glass.

Description of drawings

Figure 1 is a schematic diagram of the stacked structure of AR coated glass;

Figure 2 is a schematic diagram of the laminated structure of hard AR coated glass;

Figure 3 is a schematic diagram of the laminated structure of the anti-reflective glass provided by the embodiment of the present application;

Figure 4 is a schematic diagram of the first micro-nano structure on the surface of the glass substrate provided by this application;

Figure 5 is a schematic diagram of the second micro-nano structure on the surface of the glass substrate provided by this application;

Figure 6 is a schematic diagram of the third micro-nano structure on the surface of the glass substrate provided by this application;

Figure 7 is a schematic diagram of the first alternating structure of the first anti-reflection film layer provided by this application;

Figure 8 is a schematic diagram of the second alternating structure of the first anti-reflection film layer provided by this application;

Figure 9 is a schematic diagram of the third alternating structure of the first anti-reflection film layer provided by this application;

Figure 10 is a schematic diagram of the preparation process of anti-reflective glass provided by the embodiment of the present application;

Figure 11 is a schematic flow chart of forming a surface micro-nano structure using a metal mask method according to an embodiment of the present application;

Figure 12 is a scanning electron microscope photograph of the glass substrate prepared in Example 1 of the present invention;

Figure 13 is the CAV scanning result of the anti-reflective glass of Example 1 of the present application;

Figure 14 is a scanning electron microscope photograph of the glass substrate prepared in Example 2 of the present invention;

Figure 15 is the CAV scanning result of the anti-reflective glass of Example 2 of the present application;

Figure 16 is a schematic structural diagram of a mobile phone.

Detailed ways

The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present application. The terminology used in the following examples is for the purpose of describing specific embodiments only and is not intended to limit the application. As used in the specification and appended claims of this application, the singular expressions "a", "an", "said", "above", "the" and "the" are intended to also Expressions such as "one or more" are included unless the context clearly indicates otherwise. It should also be understood that in the embodiments of this application, "one or more" refers to one, two or more than two. The "first", "second" and similar words used in the embodiments of this application do not indicate any order, quantity or importance, but are only used to distinguish different components.

Reference in this specification to "one embodiment" or "some embodiments" or the like means that a particular feature, structure or characteristic described in connection with the embodiment is included in one or more embodiments of the application. Therefore, the phrases "in one embodiment", "in some embodiments", "in other embodiments", "in other embodiments", etc. appearing in different places in this specification are not necessarily References are made to the same embodiment, but rather to "one or more but not all embodiments" unless specifically stated otherwise. The terms “including,” “includes,” “having,” and variations thereof all mean “including but not limited to,” unless otherwise specifically emphasized.

In the embodiments of this application, words such as "exemplary" or "for example" are used to represent examples, illustrations or explanations. Any embodiment or design described as "exemplary" or "such as" in the embodiments of the present application is not to be construed as preferred or advantageous over other embodiments or designs. Rather, use of the words "exemplary" or "such as" is intended to present the concept in a concrete manner.

In the embodiment of the present application, the cover is part of the display screen of the electronic device, and can also be called the outer screen of the display screen, and is used to protect the inner screen with the display function in the display screen.

In the embodiments of this application, high refractive index and low refractive index refer to the relative values of the refractive indexes to each other, for example, high refractive index > low refractive index. Correspondingly, high refractive index materials and low refractive index materials refer to the relative values of the refractive index of different materials. In one or more embodiments, the low refractive index is about 1.3 to 1.7 or 1.3 to 1.75, and the low refractive index material includes a material with a refractive index of about 1.3 to 1.7 or 1.3 to 1.75; the high refractive index is about 1.7 to 2.5, High refractive index materials include materials with a refractive index of about 1.7 to 2.5.

In the embodiment of this application, the transmission of glass refers to the property of light passing through the glass, expressed as transmittance; the reflection of glass refers to the light blocked by the glass and reflected at a certain angle, expressed as reflectivity; the refractive index of glass It refers to the ratio of the propagation speed of light in vacuum to the propagation speed of light in glass.

In the embodiment of this application, the glass substrate refers to glass without anti-reflection treatment, including ordinary glass, tempered glass, etc., wherein tempered glass is chemically strengthened glass obtained by chemical strengthening treatment such as ion exchange of ordinary glass.

Glass is a light-dense medium with a refractive index of 1.54. In a strong light environment, about 4.2% of the reflected light from each surface is reflected into the human eye, causing glare and making it difficult for the eyes to see clearly the display content on the screen. Use of electronic products. In order to reduce the reflectivity of glass and increase the transmittance of glass, high refractive index materials (high refractive index 1) and low refractive index materials (low refractive index 1) are generally used, which are alternately superimposed on the glass substrate (substrate) according to the optical film design to form a AR coated glass is shown in Figure 1. Figure 1 is a schematic diagram of the stacked structure of AR coated glass. When the reflectivity of the glass substrate is 8.4%, the reflectivity after double-sided coating is <1%; when the transmittance of the glass substrate is 93%, the transmittance after double-sided coating is >98%; and the thickness of the film layer is generally less than 300nm, the deformation of the glass substrate caused by the stress of the film layer can be ignored, and it does not affect the application of glass in larger structures, such as being used as cover glass for mobile phones. However, the film layer is thin and easily punctured, and the coated glass is more susceptible to scratches than the glass substrate.

In order to improve the scratch resistance of AR coated glass, a hard film layer can be inserted into the AR film layer to form a hard AR film layer. See Figure 2. Figure 2 is a schematic diagram of the stacked structure of hard AR coated glass. Using high refractive index materials (high refractive index 1) and low refractive index materials (low refractive index 1), they are alternately stacked on the glass substrate (substrate) according to the optical film design, and a hard film layer is inserted as an anti-scratch layer to form Hard AR coated glass. On the one hand, the hard AR film layer can reduce the reflectivity of the glass. When the reflectance of the glass substrate is 8.4%, the reflectivity after double-sided coating is <1%; on the other hand, it can increase the transmittance of the glass. When the transmittance of the glass substrate is 93% , the transmittance after double-sided coating is >98%; on the other hand, it can improve the scratch resistance of the glass. However, the thickness of the hard film layer is generally 500-5000nm, making the thickness of the entire hard AR film layer greater than 800nm, and the glass substrate deformation caused by the stress of the film layer is large. For example, when the hard AR film layer is 800nm thick, The 0.55mm thick tempered glass used as a mobile phone cover has a deformation ratio of 0.4mm, exceeding the standard tolerance of 0.2mm. This kind of glass cannot be used in larger-sized structures and can only be used in small-sized structures smaller than 50mm such as camera lenses and watch covers.

Refer to Figure 3, which is a schematic diagram of the laminated structure of the anti-reflective glass provided by the embodiment of the present application. The anti-reflective glass includes: a glass substrate 1, the first surface of the glass substrate has a micro-nano structure 11; a first anti-reflective film layer 2 superimposed on the first surface of the glass substrate 1, the first anti-reflective film layer 2 is superimposed on the first surface of the glass substrate 1. The reflective film layer is formed by alternately stacking high refractive index layers 21 and low refractive index layers 22 .

As the main material, the glass substrate 1 only needs to have a high transmittance. In one embodiment, the transmittance of the glass substrate 1 is greater than or equal to 85% in a light wavelength region ranging from 380 to 780 nm. In other embodiments, the transmittance of the glass substrate 1 in the light wavelength range of 380 to 780 nm is greater than or equal to 90%, or even greater than or equal to 92%. In one embodiment, the reflectivity of the glass substrate 1 in the light wavelength region ranging from 380 to 780 nm is ≤15%. In other embodiments, the reflectivity of the glass substrate 1 in the light wavelength region ranging from 380 to 780 nm is ≤10%.

The glass substrate 1 may be ordinary glass, or may be tempered glass obtained by ion exchange treatment of ordinary glass. A typical chemical composition of the glass substrate 1 includes SiO ₂ , B ₂ O ₃ , Al ₂ O ₃ , alkali metal oxides and alkaline earth metal oxides. In other embodiments, the glass substrate 1 may also include other chemical compositions as needed. , such as rare earth oxides or other divalent metal oxides.

When the glass substrate 1 is tempered glass, the tempered glass can be prepared according to the following method: preheat ordinary glass and then perform ion exchange treatment, and then sequentially pickle and alkali wash to obtain tempered glass. Wherein, the ion exchange treatment is specifically: treatment in an ion exchange treatment agent, the ion exchange agent includes KNO ₃ , NaNO ₃ , H ₂ SiO ₃ , La ₂ O ₃ and KOH, and the temperature of the ion exchange treatment is 435 to 445 ℃, the time is 1.8~22h. Specifically, the ion exchanger includes 165-185 parts by mass of KNO ₃ , 14-18 parts by mass of NaNO ₃ , 3-5 parts by mass of H ₂ SiO ₃ , 0.05-0.15 parts by mass of La ₂ O ₃ and 4 to 8 parts by mass of KOH. The tempered glass prepared by the above method has good strength and impact resistance and is not easily broken.

In one embodiment, the thickness of the glass substrate 1 is 0.4mm˜0.7mm. In other embodiments, the thickness of the glass substrate 1 is 0.45mm˜0.65mm.

The surface of the glass substrate 1 has a micro-nano structure 11. The micro-nano structure 11 is a surface structure of micron and/or nanometer size, which can ensure the dense accumulation of atoms in the short-range upper film layer, improve the hardness of the film layer, thereby improving the scratch resistance of the coated glass surface. , at the same time, the long-range undulating structure allows the film lamination stress to be released locally, reducing the stress deformation of the glass substrate 1, and will not produce large stress deformation when stacking a thicker anti-reflection film layer, so it can be used In larger structures such as electronic device displays.

In one embodiment, the surface of the glass substrate 1 has a plurality of micron and/or nanometer-sized protrusions, and the plurality of protrusions constitute a micro-nano structure on the surface of the glass substrate 1 . Referring to Figure 4, Figure 4 is a schematic diagram of the first micro-nano structure on the surface of a glass substrate provided by this application. The bottom size of the protrusion 41 is larger than the top size, and may be truncated cone-shaped, pyramid-shaped or steamed bun-shaped. In other embodiments, the bottom size of the protrusion is the same as the top size, and may be rectangular, cylindrical, etc. In one embodiment, the height of the protrusions is 50 to 1000 nm. In other embodiments, in order to avoid affecting the optical properties of the anti-reflective glass, such as not increasing its reflectivity and not reducing its transmittance, the protrusions are The height can be 100~800nm, or it can be 150~700nm, or it can be 200~600nm, or it can be 250~500nm, or it can be 300~400nm. In one embodiment, the bottom size of the protrusions is 100 to 3000 nm. In other embodiments, in order to avoid affecting the optical properties of the anti-reflective glass, such as not increasing its reflectivity and not reducing its transmittance, the protrusions are The bottom size can be 150~2000nm, or it can be 200~1500nm, or it can be 250~1000nm, or it can be 300~800nm, or it can be 350~500nm. In one embodiment, the spacing between adjacent protrusions is 100 to 1000 nm. In other embodiments, in order to avoid affecting the optical properties of the anti-reflective glass, for example, without increasing its reflectivity or reducing its transmittance, adjacent protrusions are The spacing between the protrusions may be 150-800 nm, or may be 200-600 nm, or may be 250-500 nm, or may be 300-400 nm.

In one embodiment, the plurality of protrusions can be arranged irregularly and dispersed on the surface of the glass substrate. In other embodiments, the plurality of protrusions may be arranged in a regular manner, for example, in an array, that is, the plurality of protrusions are arranged in an array or a quasi-array arrangement. Using multiple protrusions as micro-nano structures on the surface of the glass substrate makes it easier to form regular structures, such as array structures, which is beneficial to the release of stress in the film layer and reduces the stress deformation of the glass substrate.

The glass substrate 1 with a micro-nano structure on the surface has high gloss and transmittance. In one embodiment, the glass substrate 1 with a micro-nano structure on the surface has a transmittance of greater than or equal to 380 nm in the light wavelength range of 380 to 780 nm. 85% is even greater than or equal to 90%, or greater than or equal to 92%. In one embodiment, the glossiness of the glass substrate 1 with micro-nano structures on the surface is greater than 85, or even greater than 90.

In other embodiments, the surface of the glass substrate 1 has a plurality of micron and/or nanometer-sized grooves, and the plurality of grooves constitute a micro-nano structure on the surface of the glass substrate 1 . Referring to Figure 5, Figure 5 is a schematic diagram of the second micro-nano structure on the surface of the glass substrate provided by this application. The bottom size of the gully 51 is smaller than the top size, that is, its cross-section may be inverted truncated cone shape, inverted pyramid shape or inverted steamed bun shape. In other embodiments, the bottom size of the gully is the same as the top size, and its cross-section is rectangular, cylindrical, etc. In one embodiment, the depth of the groove is 50-1000 nm. In other embodiments, in order to avoid affecting the optical properties of the anti-reflective glass, such as not increasing its reflectivity and not reducing its transmittance, the depth of the groove is It can be 100~800nm, or it can be 150~700nm, or it can be 200~600nm, or it can be 250~500nm, or it can be 300~400nm. In one embodiment, the length of the groove is 100-3000 nm. In other embodiments, in order to avoid affecting the optical properties of the anti-reflective glass, such as not increasing its reflectivity and not reducing its transmittance, the length of the groove is It can be 150-2000nm, or it can be 200-1500nm, or it can be 250-1000nm, or it can be 300-800nm, or it can be 350-500nm. In one embodiment, the width of the groove top is 100-3000 nm. In other embodiments, in order to avoid affecting the optical properties of the anti-reflective glass, such as not increasing its reflectivity and not reducing its transmittance, the width of the groove top is The width can be 150~2000nm, or it can be 200~1500nm, or it can be 250~1000nm, or it can be 300~800nm, or it can be 350~500nm. In one embodiment, the distance between adjacent grooves is 100 to 1000 nm. In other embodiments, in order to avoid affecting the optical performance of the anti-reflective glass, such as not increasing its reflectivity and not reducing its transmittance, the adjacent grooves are The spacing between them can be 150~800nm, or it can be 200~600nm, or it can be 250~500nm, or it can be 300~400nm.

In one embodiment, the plurality of grooves can be arranged irregularly and dispersed on the surface of the glass substrate. In other embodiments, the plurality of ravines may be arranged in a regular manner, for example, in a staggered manner or in an array. Using multiple grooves as the surface micro-nano structure of the glass substrate can be formed in more diverse ways, such as using acid treatment to obtain multiple irregular grooves, or using a diamond flying knife to obtain regular grooves, etc.

In other embodiments, the surface of the glass substrate 1 has a plurality of micron and/or nanometer-sized depressions, and the plurality of depressions constitute a micro-nano structure on the surface of the glass substrate 1 . Referring to Figure 6, Figure 6 is a schematic diagram of the third micro-nano structure on the surface of the glass substrate provided by the present application. The bottom size of the depression 61 is smaller than the top size, and may be in the shape of an inverted cone, an inverted pyramid or an inverted steamed bun. In other embodiments, the bottom size of the depression is the same as the top size, and may be rectangular, cylindrical, etc. In one embodiment, the depth of the recess is 50-1000 nm. In other embodiments, in order to avoid affecting the optical properties of the anti-reflective glass, such as not increasing its reflectivity and not reducing its transmittance, the depth of the recess is It can be 100~800nm, or it can be 150~700nm, or it can be 200~600nm, or it can be 250~500nm, or it can be 300~400nm. In one embodiment, the top size of the recess is 100 to 3000 nm. In other embodiments, in order to avoid affecting the optical performance of the anti-reflective glass, such as not increasing its reflectivity and not reducing its transmittance, the recessed top size is 100 to 3000 nm. The top size can be 150-2000nm, or it can be 200-1500nm, or it can be 250-1000nm, or it can be 300-800nm, or it can be 350-500nm. In one embodiment, the spacing between adjacent recesses is 100 to 1000 nm. In other embodiments, in order to avoid affecting the optical properties of the anti-reflective glass, such as not increasing its reflectivity and not reducing its transmittance, the adjacent recesses are The spacing between them can be 150~800nm, or it can be 200~600nm, or it can be 250~500nm, or it can be 300~400nm.

In one embodiment, the plurality of depressions can be arranged irregularly and dispersed on the surface of the glass substrate. In other embodiments, the plurality of depressions may be arranged regularly, for example, in an array. Using multiple depressions as the surface micro-nano structure of the glass substrate is beneficial to retaining the surface structure of the glass substrate, such as retaining the ion exchange layer on the surface of the tempered glass substrate, so that the glass substrate maintains good mechanical properties.

The micro-nano structure on the surface of the glass substrate 1 can be obtained through surface processing methods well known to those skilled in the art such as metal masks, diamond flying knives, acid etching, etc. This application has no special restrictions on this.

For example, a typical process of using a metal mask to obtain surface micro-nano structures is as follows: a metal film, such as an indium film, is coated on a glass substrate, and then heated to shrink the metal film, and the remaining metal film is deplated after plasma etching, i.e. Glass substrates with micro-nano structures on the surface can be obtained.

A typical process of using a diamond flying knife to obtain surface micro-nano structures is: placing the glass substrate on the workbench, using a diamond tool to fly-cut it to form a micro-groove structure array, prism matrix, micro-structure linear layer and other surfaces. structure.

A typical process of using acid etching to obtain surface micro-nano structures is: soaking the glass substrate in a mixture of hydrofluoric acid and sulfuric acid for 5 to 30 minutes, cleaning and drying.

The anti-reflective glass also includes a first anti-reflective film layer 2 superimposed on the surface of the glass substrate 1. The first anti-reflective film layer 2 is formed by alternately superposing a high refractive index layer 21 and a low refractive index layer 22, which can reduce the reflectivity of the glass. , increase the transmittance of glass. In one embodiment, the thickness of the first anti-reflection film layer 2 is 500-3000 nm. In other embodiments, the thickness of the first anti-reflection film layer 2 may be 600-2500 nm, or may be 700-2000 nm, or may be It is 800~1500nm, or it can be 900~1200nm.

In the first anti-reflection film layer 2, the period of alternating superposition of the high refractive index layer 21 and the low refractive index layer 22 and the thickness of each layer can be designed according to the optical requirements through film layer design software, such as TFC, Macleod, etc. This application is There are no special restrictions. Specifically, the period in which the high refractive index layer 21 and the low refractive index layer 22 are alternately superposed may be an integer number of periods or a non-integer number of periods. For example, the stacked structure of the first anti-reflection film layer 2 can be: high refractive index layer 21/low refractive index layer 22/high refractive index layer 21/low refractive index layer 22.../high refractive index layer 21/low refractive index Index layer 22/high refractive index layer 21/low refractive index layer 22, as shown in Figure 7; it can also be: high refractive index layer 21/low refractive index layer 22/high refractive index layer 21/low refractive index layer 22... .../high refractive index layer 21/low refractive index layer 22/high refractive index layer 21/low refractive index layer 22/high refractive index layer 21, as shown in Figure 8, or it can be: low refractive index layer 22/high refractive index Index layer 21/low refractive index layer 22/high refractive index layer 21/low refractive index layer 22.../high refractive index layer 21/low refractive index layer 22/high refractive index layer 21/low refractive index layer 22, as shown in the figure 9 shown.

In one embodiment, the materials of each high refractive index layer in the first anti-reflection film layer 2 are the same, and the materials of each low refractive index layer are the same. In other embodiments, the materials of each high refractive index layer in the first anti-reflection film layer 2 are the same, and the materials of each low refractive index layer are different; or, the materials of each high refractive index layer in the first anti-reflection film layer 2 are different. , the materials of each low refractive index layer are the same; or, the materials of each high refractive index layer in the first anti-reflection film layer 2 are different, and the materials of each low refractive index layer are also different.

In one embodiment, in the first anti-reflection film layer 2, the refractive index of the high refractive index layer material is 1.9-2.3; the refractive index of the low refractive index layer material is 1.6-1.8. Specifically, the materials of the high refractive index layer include but are not limited to Nb ₂ O ₅ , TiO ₂ , Ta ₂ O ₅ , Si ₃ N ₄ , ZrO ₂ , AlN or AlON; the materials of the low refractive index layer include But it is not limited to SiO ₂ , MgF ₂ or Al ₂ O ₃ . Further, in the first anti-reflection film layer 2, the material of the low refractive index layer is Al ₂ O ₃ ; the material of the high refractive index layer is AlN or AlON. The hardness of Al ₂ O ₃ is relatively high, Mohs. The hardness is about 9, which can improve the scratch resistance of glass.

In a typical embodiment, the first anti-reflection film layer 2 _has Al ₂ O ₃ /AlN/Al ₂ O ₃ /AlN/Al 2 O 3 /AlN/ _{Al 2} _O ₃ /AlN/Al ₂ O ₃ or Al ₂ O ₃ /AlN/Al ₂ O ₃ /AlN/Al ₂ O ₃ /AlN/Al ₂ O ₃ /AlN/Al ₂ O ₃ /AlN/Al ₂ O ₃ stacked structure, which makes the obtained anti-reflection Glass has low reflectivity, high transmittance, good scratch resistance and high hardness.

In a typical embodiment, the first anti-reflection film layer 2 _has SiO ₂ /Nb ₂ O ₅ /SiO 2 /Nb 2 O 5 /SiO ₂ /Nb ₂ O ₅ /SiO ₂ / _Nb ₂ _O ₅ /SiO ₂ /Si ₃ N ₄ laminate structure, this structure makes the anti-reflection glass have lower reflectivity, higher hardness and good friction resistance.

In one embodiment, the anti-reflective glass is single-sided coated glass, that is, the first surface of the glass substrate 1 is superimposed with the first anti-reflective film layer 2 . In other embodiments, the anti-reflective glass may be double-sided coated glass, that is, a first anti-reflective film layer is superimposed on the first surface of the glass substrate 1 and a second anti-reflective film layer is superimposed on the second surface corresponding to the first surface. Reflective coating layer, double-sided coated glass has lower reflectivity and higher transmittance. Those skilled in the art can understand that the second anti-reflective film layer and the first anti-reflective film layer may be the same or different; when the second anti-reflective film layer is different from the first anti-reflective film layer, the second anti-reflective film layer The arrangement of the layers refers to the arrangement of the first anti-reflection film layer above, which will not be described again in this application.

In some possible implementations, the anti-reflective glass is tested with a haze meter or gloss meter, and its glossiness is greater than 85. In some possible embodiments, the glossiness of the anti-reflective glass is greater than 88, which is more conducive to obtaining higher transmittance and lower reflectivity.

In one possible implementation, the anti-reflective glass is tested by Vickers indentation hardness, with an indentation depth less than or equal to about 100 nm measured on the surface and a hardness greater than or equal to about 1100 HV. In one embodiment, the anti-reflective glass has a Vickers hardness greater than 1150 HV.

In one possible implementation, the surface hardness of the anti-reflective glass is tested with a Mohs hardness pen. Under a force of 500g, a Mohs hardness pen with a Mohs hardness of 7 scratches the glass surface, and no scratches are visible to the naked eye under 800lux light.

In some embodiments, the optical properties of the anti-reflection glass are tested with a spectrophotometer. The reflectance of the single-sided coating in the light wavelength range of 380 to 780 nm is <2%, and the transmittance of the single-sided coating is >93%; the light wavelength of 940nm is transparent. Rate＞92%.

In some embodiments, according to the International Commission on Illumination, under normal incidence conditions, in the (L*, a*, b*) chromaticity system, a colorimeter is used to test the anti-reflective glass, and its reflection color value a value is ±2 , b value ±2, transmitted color value a value ±1, b value ±1.

In some embodiments, a 10Kg force is applied on a marble surface with a surface roughness of 5.6um and a 5*5cm anti-reflective glass with a stroke of 10cm and a back and forth cycle. After 40 cycles of friction, there are no visible scratches under 800lux light.

In some embodiments, the glass deformation amount is less than 0.20 mm using a glass profile test (CAV scan) for anti-reflective glass. In some embodiments, the deformation of the anti-reflective glass is less than 0.1 mm.

In this application, the first anti-reflection film layer 2 can be sequentially coated on the glass substrate 1 by magnetron sputtering. The coating parameters can be selected according to the film layer system. There are no special restrictions in this application.

The embodiments of the present application also provide a method for preparing the above-mentioned anti-reflective glass, the schematic flow diagram of which is shown in Figure 10, including the following steps:

Step S2: Superimpose the first anti-reflection film layer on the surface of the glass substrate with micro-nano structure.

First, a micro-nano structure is formed on at least one surface of the glass substrate. Specifically, it can be obtained by surface processing methods well known to those skilled in the art such as metal mask, diamond flying knife, acid etching, etc., and micro grooves are formed on the surface of the glass substrate. Micro-nano structures such as groove structure arrays, prism matrices, microstructure linear layers, and protrusions distributed in arrays.

In a specific implementation, a metal mask can be used to obtain a micro-nano structure. The flow diagram is shown in Figure 11, which includes the following steps:

Step S11, forming a metal film on at least one surface of the glass substrate;

Step S12: Process the metal film to form metal nanoparticles;

Step S13: Perform plasma etching on the glass obtained in step S12 to construct a nanoprotrusion array structure on the glass surface;

Step S14: Strip the metal on the glass surface obtained in step S13.

In one embodiment, taking metal indium as an example, a metal indium film is first formed on at least one surface of the glass substrate by vacuum sputtering or other methods, and then is treated, such as heat treatment, to cause the metal indium film to heat shrink to form a similar shape. The nanoparticles are arranged in an array, and then the glass substrate is plasma etched. The surface of the glass substrate covered with indium nanoparticles will not be etched, and the surface of the glass substrate not covered with indium nanoparticles will be etched, thereby forming a convex surface. Surface structure: after deplating indium nanoparticles, a glass substrate with a micro-nano structure can be obtained, and the surface has protrusions arranged in a similar array.

The embodiments of the present application have no special restrictions on the parameters for forming the metal indium film by vacuum sputtering, and those skilled in the art can select them according to needs. In order to subsequently form metal nanoparticles, in one embodiment, the thickness of the metal indium film is 3 to 8 nm.

After the indium film is formed, it is heat treated to form indium nanoparticles. The embodiments of the present application have no special restrictions on the parameters of the heat treatment. Those skilled in the art can choose according to needs. For example, the heating rate of the heat treatment is 15-25°C/min, heating to 100-200°C, and keeping the temperature for 5-10 minutes. . In order not to affect the optical properties of the final product, the indium nanoparticles are evenly distributed and have a diameter of 50 to 70nm.

The purpose of plasma etching is to etch the surface of the glass substrate that is not covered by the indium nanoparticles, so that the surface of the glass substrate covered by the indium nanoparticles forms protrusions. The embodiments of the present application have no special restrictions on the parameters of the plasma etching. Those skilled in the art can set the parameters according to the expected size of the bumps, control the etching thickness, and obtain bumps that do not affect the optical performance of the final product.

Finally, the indium nanoparticles on the surface of the glass substrate are removed, for example, by deplating, and a glass substrate with a micro-nano structure on the surface can be obtained.

It is understandable that during the heat treatment of the metal indium film to form indium nanoparticles, part of the metal indium film may not be thermally shrunk to form nanoparticles, but may exist in the form of a residual metal indium layer. In the subsequent plasma During the processing and deplating process, the surface of the glass substrate covered with the metallic indium layer and the surface of the glass substrate covered with indium nanoparticles will undergo the same changes, and finally a glass substrate with a micro-nano structure on the surface will be obtained.

After obtaining a glass substrate with a micro-nano structure on the surface, an anti-reflective film is superimposed on the surface to obtain anti-reflective glass. Embodiments of the present application can form an anti-reflective film on the surface of a glass substrate through deposition, such as vacuum deposition, including chemical vapor deposition, physical vapor deposition, thermal deposition, electron beam evaporation deposition or atomic layer deposition, etc., or through the use of liquid-based Methods such as spray coating, dip coating, spin coating or slit coating (for example, using sol-gel materials), etc.

Specifically, in embodiments of the present application, software such as TFCALC and Macleod can be used to design the film system according to optical requirements, and then deposit the film system according to the designed film structure. In one embodiment, a vacuum sputtering coating machine can be used for coating, and the coating parameters can be selected according to the materials of each layer of the film structure. This application has no special restrictions on this. For example, the coating parameters of the AlN layer can be: sputtering power of the aluminum target: 7000~8000W, Ar flow: 100~150sccm, _N2 flow: 100~120sccm, and RadicalSource power: 4000~5000W. The coating parameters of the Al ₂ O ₃ layer can be: sputtering power of the aluminum target: 7500~8500W, Ar flow: 200~300sccm, _O2 flow: 100~150sccm; RadicalSource power: 4000~5000W. The anti-reflective glass provided by this application sets a micro-nano structure on the surface of the glass substrate and then superimposes the first anti-reflective film layer. On the one hand, it can ensure the dense accumulation of atoms in the short-range upper film layer and improve the scratch resistance of the coated glass surface. On the other hand, The long-range undulating structure allows the film lamination stress to be released locally and reduces the stress deformation of the glass substrate. On this basis, a thicker hard anti-reflection film layer, such as a thickness of more than 500nm, can be superimposed on the glass substrate to reduce the reflectivity of the glass, increase the scratch resistance of the glass, and at the same time reduce the stress deformation of the glass substrate. Not only It can be used in small-sized structures <50mm such as camera lenses and watch covers, and can also be used in larger-sized structures such as electronic equipment covers.

In addition, the material of the low refractive index layer in the first anti-reflection film layer can be Al ₂ O ₃ with higher hardness, which further increases the hardness of the anti-reflection film layer, thereby improving the scratch resistance of the anti-reflection glass.

The anti-reflective glass provided by this application has low reflectivity, good scratch resistance and small stress deformation. It can not only be used in small-sized structures <50mm such as camera lenses and watch covers, but can also be used in In larger structures such as electronic equipment covers.

Specifically, the anti-reflective glass provided by this application can be used as a cover for electronic equipment. It will not cause glare under strong sunlight, making it easier for users to see the content displayed on the screen clearly, and improving the user experience of the product. In addition, the electronic equipment cover has good scratch resistance and is not prone to visible scratches. It does not affect the appearance of the electronic equipment and does not reduce the impact resistance of the glass.

The electronic device mentioned in this application can be any device with communication and storage functions, such as smartphones, cellular phones, cordless phones, Session Initiation Protocol (Session Initiation Protocol, SIP) phones, tablet computers, personal digital assistants (Personal Digital Assistant) ,PAD), notebook computers, digital cameras, e-book readers, portable multimedia players, handheld devices with wireless communication capabilities, computing devices or other processing devices connected to wireless modems, vehicle-mounted devices, wearable devices, 5G terminal devices etc., the embodiments of the present application are not limited to this.

The anti-reflective glass provided by the present application, its preparation method, the display screen of the electronic device and the electronic device will be described in detail below with reference to the examples.

In the following examples, the glass substrate is 0.55mm thick tempered glass; the glossiness is tested by a gloss meter; the Vickers hardness is tested by a Vickers indentation instrument; the Mohs hardness is tested by a Mohs hardness pen; and the optical properties are tested by spectroscopy. Photometer test; color value is tested by colorimeter.

Example 1

Step 1: Vacuum sputter the metal indium film on the glass substrate. The specific steps are as follows:

Set the film thickness of 5nm metal indium and input it into the coating machine, set the process parameters: background vacuum 5.0×10 ^-4 Pa; set the temperature to: 80°C;

Radio frequency magnetron sputtering (RF) is used for pretreatment before coating. Specific parameters: Radical Source power: 4500W; Ar flow: 0sccm; _O2 flow: 120sccm; _N2 flow: 0sccm; Time: 240s;

Indium film coating parameters: Indium target sputtering power: 3000W; Ar flow rate: 120sccm.

Load the glass substrate to be coated onto the substrate holder, put it into the above-mentioned coating equipment, close the door and evacuate, enter the coating program, click film formation to start, and complete the coating;

Step 2: Heat the metal indium film layer to shrink it into a ball. The specific steps are as follows:

1) After the coating is completed, turn off the indium target and gas, wait until the vacuum reaches 5.0×10 ^-3 Pa, heat the metal indium film at a heating rate of 20°C/min, heat to 120°C and keep it warm for 7 minutes to obtain the glass substrate template. There are metal indium nanoparticles on the surface of the template, the nanoparticles are evenly distributed and have a diameter of 50-70nm;

2) Air intake, cooling time: 5 minutes, air intake time: 3 minutes;

3) Take the slices and transfer them to plasma etching equipment;

Step 3: Perform plasma etching on the glass substrate template. The specific steps are as follows:

1) The parameters of plasma etching are:

The background vacuum is 5.0×10 ^-3 Pa; the reactive ion etching power is 500W, the chamber pressure is 10Pa, the argon flow rate is 40sccm, the trifluoromethane flow rate is 5sccm, the etching time is 10min, and a nano-protrusion array structure is constructed on the glass surface;

2) Air intake, cooling time: 5 minutes, air intake time: 3 minutes;

3) Take the film.

Step 4: Clean and remove the residual metal indium on the surface of the glass substrate template. The specific steps are as follows:

At normal temperature, the residual metal indium is deplated, and then the glass surface is cleaned with pure water to obtain a glass substrate with a micro-nano structure on the surface.

The surface of the glass substrate was observed with a scanning electron microscope, and the results are shown in Figure 12. Figure 12 is a scanning electron microscope photo of the glass substrate prepared in Example 1 of the present invention. As can be seen from Figure 12, the surface of the glass substrate has nano-sized protrusions in an array-like structure. The nano-protrusions are similar to a truncated cone shape, and the bottom size is larger than the top size. The nano-protrusions are 120 nm high and the bottom size is 200 nm.

The performance of the glass substrate was tested. Its transmittance to light with a wavelength of 550 nm was 90%, its reflectance was 3%, and its glossiness was 92.

Step 5: Perform hard AR coating on the glass substrate with micro-nano structure on the surface. The specific steps are as follows:

1) Based on the design of the film system based on TFCALC, the average single-sided transmittance from 380 to 780nm is required to be greater than 93%. Due to the high transmittance requirements in the visible light band, the film stack 2H is used, and L is selected with high hardness and relatively low refractive index. Al ₂ O ₃ , H is selected as AlN, and the initial film system HL is formed in the optical thin film software, thus forming a stacked film system of L and H, and then the band optimization conditions are entered in the continuous target to ensure that the transmittance meets the requirements; Then enter the LAB value requirements in the color target to ensure that the color is colorless. The film system structure obtained after a series of optimized designs is shown in Table 1. Table 1 is the AR film system structure provided in Embodiment 1 of the present invention:

Table 1 AR film system structure provided in Embodiment 1 of the present invention

膜层材料Film material	Al ₂O ₃ Al ₂ O ₃	AlNAlN	Al ₂O ₃ Al ₂ O ₃	AlNAlN	Al ₂O ₃ Al ₂ O ₃	AlNAlN	Al ₂O ₃ Al ₂ O ₃	AlNAlN	Al ₂O ₃ Al ₂ O ₃
膜厚nmFilm thickness nm	133.19133.19	16.6316.63	40.0540.05	151.03151.03	45.2545.25	33.6233.62	32.2832.28	70.670.6	80.180.1

2) Transfer the glass with micro-nano structure on the surface prepared in step 4 to the coating machine, input the designed film thickness into the coating machine, and then set the process parameters: background vacuum 5.0×10 ^-4 Pa; temperature setting: 80°C ; Use RF for pre-treatment before coating. Specific parameters: RadicalSource power: 4500W; Ar flow: 0sccm; O ₂ flow: 120sccm; N ₂ flow: 0sccm; Time: 240s;

The coating parameters of the AlN layer are: sputtering power of the aluminum target: 7500W, Ar flow: 120sccm, _N2 flow: 80sccm, RadicalSource power: 4500W;

Coating parameters of Al ₂ O ₃ layer: Sputtering power of aluminum target: 8000W, Ar flow: 250sccm, O ₂ flow: 120sccm; Power of RadicalSource: 4500W;

Coating is performed to obtain a structure of glass substrate (0.55mm)/Al ₂ O ₃ (133.19nm)/AlN (16.63nm)/Al ₂ O ₃ (40.05nm)/AlN (151.03nm)/Al ₂ O ₃ (45.25 nm)/AlN(33.62nm)/Al ₂ O ₃ (32.28nm)/AlN (70.6nm)/Al ₂ O ₃ (80.1nm) anti-reflective glass.

The obtained anti-reflective glass was tested for performance and the results are as follows:

Its glossiness is 95;

Vickers hardness is 1170HV;

Under 500g force, a Mohs hardness pen with a Mohs hardness of 7 scratches the glass surface, and there is no scratch visible to the naked eye under 800lux light; on a marble surface with a surface roughness of 5.6μm, a 10Kg force is applied to the 5*5cm glass, the stroke is 10cm, and the round trip is After one cycle and 40 cycles of rubbing, there are no visible scratches under 800lux light.

In the light wavelength range of 380 to 780nm, the reflectance of the single-sided coating is 0.46%, the transmittance of the single-sided coating is 94.34%, and the transmittance of 940nm light is 92.6%;

Under normal incidence conditions, in the (L*, a*, b*) chromaticity system, the reflected color value a value is ±2, the b value is ±2, and the transmitted color value a value is ±1, and the b value is ±1.

The stress deformation of the glass substrate is measured using a glass profile test (CAV scan). The glass deformation amount is less than 0.20 mm, as shown in Figure 13. Figure 13 is the CAV scan result of the anti-reflective glass in Example 1 of the present application.

Example 2

Set the film thickness of 10nm metal indium and input it into the coating machine, and then set the process parameters: background vacuum 5.0×10 ^-4 Pa; temperature setting: 80°C;

RF is used for pre-treatment before coating. Specific parameters: RadicalSource power: 4500W Ar flow: 0sccm; _O2 flow: 120sccm; _N2 flow: 0sccm; Time: 240s;

Indium film coating parameters: Indium target sputtering power: 3000W, Ar flow rate: 120sccm.

Step 2: Heat the metal indium film layer to shrink it. The specific steps are as follows:

1) After the coating is completed, turn off the indium target and gas, wait until the vacuum reaches 5.0×10 ^-3 Pa, heat the metal indium film at a heating rate of 20°C/min, heat to 120°C and keep it warm for 7 minutes to obtain the glass substrate template. There are metal indium nanoparticles on the surface of the template, the nanoparticles are evenly distributed and have a diameter of 120-150nm;

2) Air intake, cooling time: 5 minutes, air intake time: 3 minutes;

3) Take the slices and transfer them to plasma etching equipment;

1) The parameters of plasma etching are:

The background vacuum is 5.0×10 ^-3 Pa; the reactive ion etching power is 500W, the chamber pressure is 10Pa, the argon flow rate is 40sccm, the trifluoromethane flow rate is 10sccm, the etching time is 8min, and a nano-protrusion array structure is constructed on the glass surface;

3) Air intake, cooling time 5min, air intake time: 3min;

4) Take the film.

Step 4: Clean and remove the residual metal indium film on the surface of the glass substrate template. The specific steps are as follows:

At normal temperature, the residual metal indium film layer is deplated, and then the glass surface is cleaned with pure water to obtain a glass substrate with a micro-nano structure on the surface.

The surface of the glass substrate was observed with a scanning electron microscope, and the results are shown in Figure 14. Figure 14 is a scanning electron microscope photo of the glass substrate prepared in Example 2 of the present invention. As can be seen from Figure 14, the surface of the glass substrate has nano-sized protrusions in an array-like structure. The nano-protrusions are similar to a truncated cone shape, and the bottom size is larger than the top size. The nano-protrusions are 100 nm high and the bottom size is 400 nm.

The performance of the glass substrate was tested. Its transmittance to light with a wavelength of 550 nm was 90%, its reflectance was 1%, and its glossiness was 85.

1) Based on the design of the film system based on TFCALC, the average single-sided transmittance from 380 to 780nm is required to be greater than 93%. Due to the high transmittance requirements in the visible light band, the film stack 2H is used, and L is selected with high hardness and relatively low refractive index. Al ₂ O ₃ , H is selected as AlN, and the initial film system HL is formed in the optical thin film software, thus forming a stacked film system of L and H, and then the band optimization conditions are entered in the continuous target to ensure that the transmittance meets the requirements; Then enter the LAB value requirements in the color target to ensure that the color is colorless. The film system structure obtained after a series of optimized designs is shown in Table 2. Table 2 is the AR film system structure provided in Embodiment 2 of the present invention:

Table 2 AR film system structure provided in Embodiment 2 of the present invention

膜层材料Film material	Al ₂O ₃ Al ₂ O ₃	AlNAlN	Al ₂O ₃ Al ₂ O ₃	AlNAlN	Al ₂O ₃ Al ₂ O ₃	AlNAlN	Al ₂O ₃ Al ₂ O ₃	AlNAlN	Al ₂O ₃ Al ₂ O ₃	AlNAlN	Al ₂O ₃ Al ₂ O ₃
膜厚nmFilm thickness nm	7878	125125	151151	272272	150150	131131	180180	21twenty one	188188	4747	8383

Coating parameters of AlN layer: Sputtering power of aluminum target: 7500W; Ar flow rate: 120sccm, _N2 flow rate: 80sccm; RadicalSource power: 4500W;

Coating parameters of Al ₂ O ₃ layer: sputtering power of aluminum target: 8000W; Ar flow rate: 250 sccm, O ₂ flow rate: 120 sccm; RadicalSource power: 4500W.

Coating is carried out to obtain a structure of glass substrate (0.55mm)/Al ₂ O ₃ (78nm)/AlN (125nm)/Al ₂ O ₃ (151nm)/AlN (272nm)/Al ₂ O ₃ (150nm)/AlN ( 131nm)/Al ₂ O ₃ (180nm)/AlN (21nm)/Al ₂ O ₃ (188nm)/AlN (47nm)/Al ₂ O ₃ (83nm) anti-reflective glass.

Its glossiness is 89;

Vickers hardness is 1138HV; under 500g force, a Mohs hardness pen with a Mohs hardness of 7 scratches the glass surface, and no scratches are visible to the naked eye under 800lux light; on a marble surface with a surface roughness of 5.6um, a 10Kg force is applied to 5*5cm glass , the stroke is 10cm, and the back and forth is one cycle. After 40 cycles of friction, there are no visible scratches under 800lux light.

In the light wavelength range of 380 to 780nm, the reflectance of the single-sided coating is 0.2%, the transmittance of the single-sided coating is 91.8%, and the transmittance of 940nm light is 91.5%;

The stress deformation of the glass substrate is measured using a glass profile test (CAV scan). The glass deformation amount is less than 0.10 mm, as shown in Figure 15. Figure 15 is the CAV scan result of the anti-reflective glass of Example 2 of the present application.

The above-mentioned anti-reflective glass is used for the cover of electronic equipment such as mobile phones. See Figure 16. Figure 16 is a schematic structural diagram of a mobile phone. The mobile phone 100 includes a screen 10. The outer screen (i.e. cover) of the screen 10 is composed of the above-mentioned Made of anti-reflective glass. The surface of the external screen is flat and basically non-deformed; when the user uses the phone, it will not cause glare under strong sunlight, and the user can clearly see the content displayed on the screen, and the product usage experience is good. At the same time, the outer screen of the phone has good scratch resistance, and it is not prone to visible scratches without a film. The phone looks better after long-term use.

The above are only specific implementations of the present application, but the protection scope of the present application is not limited thereto. Any changes or substitutions within the technical scope disclosed in the present application shall be covered by the protection scope of the present application. . Therefore, the protection scope of this application should be subject to the protection scope of the claims.

Claims

An anti-reflective glass, including a glass substrate, the first surface of the glass substrate having a micro-nano structure; a first anti-reflective film layer superimposed on the first surface of the glass substrate, the first anti-reflective film is made of high The refractive index layer and the low refractive index layer are alternately superimposed.
The anti-reflective glass according to claim 1, wherein the micro-nano structure is composed of a plurality of micron-sized and/or nano-sized protrusions.
The anti-reflective glass according to claim 2, wherein the plurality of protrusions are distributed in an array.
The anti-reflective glass according to claim 3, wherein the height of the protrusions is 50-1000 nm; the bottom size of the protrusions is 100-3000 nm; and the spacing between adjacent protrusions is 100-1000 nm.
The anti-reflective glass according to claim 1, wherein the micro-nano structure is composed of a plurality of micron-sized and/or nano-sized trenches.
The anti-reflective glass according to claim 5, characterized in that the depth of the gully is 50-1000nm; the length of the gully is 100-3000nm; the width of the top of the gully is 150-2000; the width of the adjacent ravines is The spacing is 100~1000nm.
The anti-reflective glass according to claim 1, wherein the micro-nano structure is composed of a plurality of micron-sized and/or nano-sized depressions.
The anti-reflective glass according to claim 7, wherein the plurality of depressions are distributed in an array.
The anti-reflective glass according to claim 8, wherein the depth of the depression is 50-1000 nm; the size of the top of the depression is 100-3000 nm; and the spacing between adjacent depressions is 100-1000 nm.
The anti-reflective glass according to any one of claims 1 to 9, characterized in that the glass substrate is tempered glass.
The anti-reflective glass according to any one of claims 1 to 9, wherein the thickness of the first anti-reflective film layer is 500 to 3000 nm.
The anti-reflective glass according to any one of claims 1 to 9, characterized in that in the first anti-reflective film layer, the refractive index of the high refractive index layer material is 1.9-2.3; the refractive index of the low refractive index layer material is The rate is 1.6~1.8.
The anti-reflective glass according to claim 12, wherein the material of the high refractive index layer is Nb 2 O 5 , TiO 2 , Ta 2 O 5 , Si 3 N 4 , ZrO 2 , AlN or AlON; The material of the low refractive index layer is SiO 2 , MgF 2 or Al 2 O 3 .
The anti-reflective glass according to claim 13, wherein the material of the low refractive index layer is Al 2 O 3 and the material of the high refractive index layer is AlN or AlON.
The anti-reflective glass according to any one of claims 1 to 9, characterized in that a second anti-reflective film layer is superimposed on the second surface of the glass substrate corresponding to the first surface.
An anti-reflective glass, including a glass substrate, the first surface of the glass substrate having a micro-nano structure; an anti-reflective film layer superimposed on the first surface of the glass substrate;

The anti-reflective glass surface has a Mohs hardness of 7 or more under a force of 500g.
The anti-reflective glass according to claim 16, wherein when the anti-reflective glass is tested using a glass profile, the deformation amount is less than 0.20 mm when the thickness is 0.55 mm.
The anti-reflection glass according to claim 17, wherein the Vickers hardness of the anti-reflection glass is 1100HV or more.
The anti-reflection glass according to claim 18, wherein the anti-reflection glass has a reflectance of <2% and a transmittance of >93% in the light wavelength region of 380 to 780 nm.
A method for preparing anti-reflective glass, which is characterized by including:

Form micro-nano structures on at least one surface of the glass substrate;

A first anti-reflective film layer is superimposed on the surface of a glass substrate with a micro-nano structure. The first anti-reflective film is formed by alternately superposing a high refractive index layer and a low refractive index layer.
The preparation method according to claim 20, characterized in that forming the micro-nano structure on at least one surface of the glass substrate is to form the micro-nano structure on at least one surface of the glass substrate through a metal mask method; or using a diamond flying knife to form the micro-nano structure on the glass substrate. At least one surface of the substrate forms a micro-nano structure; or at least one surface of the glass substrate is etched with acid to form a micro-nano structure.
An electronic device display screen, including the anti-reflective glass described in any one of claims 1 to 19 or the anti-reflective glass prepared by the preparation method described in claims 20 or 21.
An electronic device, comprising the display screen of claim 22.