WO2023184306A1 - 触控显示面板和触控显示装置 - Google Patents

触控显示面板和触控显示装置 Download PDF

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Publication number
WO2023184306A1
WO2023184306A1 PCT/CN2022/084296 CN2022084296W WO2023184306A1 WO 2023184306 A1 WO2023184306 A1 WO 2023184306A1 CN 2022084296 W CN2022084296 W CN 2022084296W WO 2023184306 A1 WO2023184306 A1 WO 2023184306A1
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WIPO (PCT)
Prior art keywords
layer
touch
display substrate
filter
display panel
Prior art date
Application number
PCT/CN2022/084296
Other languages
English (en)
French (fr)
Inventor
李�杰
史大为
张伟
齐智坚
马彬彬
卢玉群
陈昱伶
许桐伟
唐新淞
徐依琳
张林杰
王彦强
王云浩
张芳
郭远征
夏维
Original Assignee
京东方科技集团股份有限公司
重庆京东方显示技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 京东方科技集团股份有限公司, 重庆京东方显示技术有限公司 filed Critical 京东方科技集团股份有限公司
Priority to PCT/CN2022/084296 priority Critical patent/WO2023184306A1/zh
Priority to CN202280000650.9A priority patent/CN117223411A/zh
Publication of WO2023184306A1 publication Critical patent/WO2023184306A1/zh

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means

Definitions

  • the present disclosure relates to the field of display technology, and in particular to a touch display panel and a touch display device.
  • OLED Organic Light-Emitting Diode
  • COE Color Filter on Encapsulation
  • a touch structure layer is also provided on the outside of the color filter to realize touch, thereby forming a film structure in which multi-functional layers are stacked.
  • the present disclosure proposes a touch display panel and a touch display device.
  • the present disclosure provides a touch display panel, including:
  • a display substrate including a plurality of pixel areas and spacers that separate the plurality of pixel areas from each other;
  • a black matrix is located on the light exit side of the display substrate, and the orthographic projection of the black matrix on the display substrate is located in the separation area;
  • the touch structure layer includes a first touch pattern layer located on the light exit side of the display substrate; the first touch pattern layer includes a plurality of first metal lines, and the first metal lines are on the display substrate.
  • the orthographic projection is located within the orthographic projection range of the black matrix on the display substrate, and the first metal line is in contact with the black matrix.
  • the black matrix adopts a black single-layer structure.
  • the touch display panel further includes: a plurality of pixel filter parts, the colors of the plurality of pixel filter parts include a variety of colors, and each of the pixel filter parts is in contact with the display substrate. One of the pixel areas is relatively arranged;
  • the black matrix includes: a first filter pattern and a second filter pattern.
  • the first filter pattern is located on a side of the first touch pattern layer away from the display substrate.
  • the second filter pattern Located on the side of the first filter pattern away from the display substrate, the orthographic projections of the first filter pattern and the second filter pattern on the display substrate cover the first touch pattern layer. Orthographic projection on the display substrate; the first filter pattern includes a plurality of first filter parts, the second filter pattern includes a plurality of second filter parts, the first filter part and the The second filter parts are relatively arranged in one-to-one correspondence;
  • each first filter part and its corresponding second filter part are the same as the materials of the pixel filter parts of the two colors respectively.
  • the black matrix further includes: a light-shielding part, the light-shielding part is a black single-layer structure and has a through hole, and at least a part of the first metal line and the first filter pattern are located there In the through hole, the first metal line and the light shielding part are separated by the first filter pattern.
  • At least a portion of the second filter pattern is located outside the through hole, and a portion of the orthographic projection of the second filter pattern on the display substrate exceeds the through hole and is on the display substrate. orthographic projection on.
  • the plurality of first filter portions of the first filter pattern have the same color; or, at least two of the first filter portions have different colors;
  • the plurality of second filter portions of the second filter pattern have the same color; or, at least two of the second filter portions have different colors.
  • the first touch pattern layer is located on a side of the black matrix close to the display substrate; the touch structure layer further includes:
  • the second touch pattern layer is located on the side of the black matrix away from the display substrate and includes a plurality of second metal lines.
  • the orthographic projections of the plurality of second metal lines on the display substrate are located on the The black matrix is within the orthographic projection range on the display substrate.
  • the refractive index of the surface of the second metal line away from the display substrate is less than 5%.
  • the touch display panel further includes: a cover layer, an orthographic projection of the cover layer on the display substrate covers each of the pixel areas,
  • the black matrix has: a first surface facing away from the display substrate, a second surface facing the display substrate, and a side surface connected between the first surface and the second surface.
  • the black matrix The side of the black matrix includes a first sub-side in contact with the cover layer, and the refractive index of the part of the black matrix close to the first sub-side is smaller than the refractive index of the cover layer, so that the display substrate is irradiated to the At least part of the light from the first sub-side is reflected by the first sub-side in a direction away from the display panel.
  • the covering layer is a continuous film layer
  • the covering layer includes a plurality of covering parts arranged at intervals, and an orthographic projection of each covering part on the display substrate covers at least one of the pixel areas.
  • the first touch graphic layer is located on a side of the black matrix close to the display panel, and the touch display panel further includes:
  • the second touch pattern layer is located on the side of the first touch pattern layer close to the display substrate, and includes a plurality of second metal lines.
  • the plurality of second metal lines are on the front side of the display substrate.
  • the projection is located within the orthographic projection range of the black matrix on the display substrate;
  • An insulating layer is located between the first touch pattern layer and the second touch pattern layer, and the orthographic projection of the insulating layer on the display substrate is located in the separation area.
  • the touch display panel further includes: a cover layer, an orthographic projection of the cover layer on the display substrate covers each of the pixel areas,
  • the insulating layer has: a first surface facing away from the display substrate, a second surface facing the display substrate, and a side surface connected between the first surface and the second surface.
  • the insulating layer The side surface includes a first sub-side surface in contact with the covering layer, and the refractive index of the insulating layer is smaller than the refractive index of the second covering layer, so that the display substrate is irradiated to at least a part of the first sub-side surface. The light is reflected by the first sub-side in a direction away from the display substrate.
  • the covering layer is a continuous film layer
  • the covering layer includes a plurality of covering parts arranged at intervals, and an orthographic projection of each covering part on the display substrate covers at least one of the pixel areas.
  • the touch display panel further includes: a plurality of pixel filter parts, each of the pixel filter parts being arranged opposite to one of the pixel areas of the display substrate;
  • the display substrate includes:
  • a plurality of light-emitting devices are provided on the base substrate, and each of the pixel areas is provided with one of the light-emitting devices;
  • An encapsulation layer arranged on the side of the light-emitting device away from the base substrate;
  • the plurality of pixel filter parts are in contact with the encapsulation layer.
  • the encapsulation layer includes: a first inorganic encapsulation sub-layer, an organic encapsulation sub-layer and a second inorganic encapsulation sub-layer arranged sequentially in a direction away from the base substrate;
  • the second inorganic encapsulation sub-layer is a continuous film layer, and its orthographic projection on the display substrate covers the plurality of pixel areas, and the plurality of pixel filter parts and the second inorganic encapsulation sub-layer touch;
  • the second inorganic encapsulation sub-layer has a plurality of hollow parts, the hollow parts correspond to the pixel areas one-to-one, and at least a part of the filter part contacts the organic encapsulation sub-layer through the hollow parts. .
  • the present disclosure also provides a touch display device, including the above-mentioned touch display panel.
  • FIG. 1A is a schematic diagram of a touch display panel provided in some embodiments of the present disclosure.
  • FIG. 1B is a schematic diagram of area division of a display substrate provided in some embodiments of the present disclosure.
  • FIG. 2A is a schematic diagram of a touch display panel provided in other embodiments of the present disclosure.
  • 2B is a bottom view of the first filter pattern and the second filter pattern provided in some embodiments of the present disclosure.
  • FIG. 2C is a schematic diagram of a touch display panel provided in other embodiments of the present disclosure.
  • FIG. 3 is a schematic diagram of a touch display panel provided in other embodiments of the present disclosure.
  • FIG. 4 is a schematic diagram of a touch display panel provided in other embodiments of the present disclosure.
  • FIG. 5 is a schematic diagram of a touch display panel provided in other embodiments of the present disclosure.
  • FIG. 6 is a schematic diagram of a touch display panel provided in other embodiments of the present disclosure.
  • FIG. 7 is a schematic diagram of a touch display panel provided in other embodiments of the present disclosure.
  • OLED Organic Light-Emitting Diode
  • COE Color Filter on Encapsulation
  • black matrices are formed on the packaging layer of organic light-emitting diodes, eliminating the need to set polarizers for anti-reflection.
  • a touch structure layer is also provided on the packaging layer to realize touch, thereby forming a film layer structure with a multi-functional layer stack.
  • a touch structure layer is first formed on the encapsulation layer, and then a flat layer is formed; then a color filter and a black matrix are formed on the side of the flat layer away from the encapsulation layer.
  • a color filter and a black matrix are formed on the side of the flat layer away from the encapsulation layer.
  • FIG. 1A is a schematic diagram of a touch display panel provided in some embodiments of the present disclosure.
  • the touch display panel includes: a display substrate 10, a black matrix 60 and a touch structure layer.
  • the display substrate 10 may be an OLED display substrate.
  • FIG. 1B is a schematic diagram of the area division of the display substrate provided in some embodiments of the present disclosure. As shown in FIG. 1B , the display substrate includes a plurality of pixel areas P, and a plurality of pixels. The areas P are spaced apart from each other by spacers SP. It should be noted that the number and arrangement of the pixel areas P in FIG. 1B are only exemplary.
  • the display substrate 10 may specifically include: a base substrate 11 and a plurality of light-emitting devices 23 provided on the base substrate 11.
  • One light-emitting device 23 is provided in each pixel area P.
  • the light-emitting devices 23 may For OLED devices, LED devices, etc.
  • the black matrix 60 is located on the light-emitting side of the display substrate 10 , that is, the side where the plurality of light-emitting devices 23 are away from the base substrate 11 .
  • the orthographic projection of the black matrix 60 on the display substrate 10 is located in the spacing area SP.
  • the black matrix 60 may have a grid-like structure, and each mesh of the black matrix 60 corresponds to a pixel area P of the display substrate 10 .
  • the black matrix 60 can be made of black material or other materials, as long as it can prevent crosstalk of the light emitted from different pixel areas P.
  • the touch structure layer is located on the light exit side of the display substrate 10 and is used to sense the touch position.
  • the touch structure layer includes a first touch pattern layer 40.
  • the first touch pattern layer 40 includes a plurality of first metal lines 41.
  • the orthographic projection of the first metal lines 41 on the display substrate 10 is located on the black matrix 60 in the display. Within the orthographic projection range on the substrate 10 , the first metal line 41 is in contact with the black matrix 60 .
  • the first touch pattern layer 40 may be located on a side of the black matrix 60 close to the display substrate 10 .
  • the first touch pattern layer 40 may include a plurality of self-capacitance electrodes, and each self-capacitance electrode may include a plurality of first metal lines 41 .
  • the touch structure layer includes a first touch pattern layer 40 and a second touch pattern layer.
  • the first touch pattern layer 40 includes a plurality of touch driving electrodes
  • the second touch pattern layer includes a plurality of touch driving electrodes.
  • touch sensing electrodes, the touch driving electrodes and the touch sensing electrodes are arranged crosswise and insulated from each other.
  • the touch driving electrodes are metal grid electrodes formed by a plurality of first metal lines 41
  • the touch sensing electrodes are a plurality of second metal lines 41 .
  • the touch structure layer includes a plurality of touch driving electrodes and a plurality of touch sensing electrodes, and each touch driving electrode includes a plurality of driving electrode units and connections between adjacent driving electrode units; each touch The control sensing electrodes include a plurality of sensing electrode units and bridge portions between adjacent sensing electrode units.
  • the driving electrode units, connection portions, and sensing electrode units are all located in the first touch pattern layer 40, and are composed of a plurality of first touch pattern layers 40.
  • a metal grid structure formed by metal lines, a plurality of sensing electrode units located on the second touch pattern layer, and all of them are a metal grid structure formed by a plurality of second metal lines; of course, the driving electrode units and the connecting portion can also be , the sensing electrode unit is disposed in the second touch pattern layer, and a plurality of sensing electrode units is disposed in the first touch pattern layer 40 .
  • the first metal line 41 in the first touch pattern layer 40 is in contact with the black matrix 60 , that is, there is no longer a gap between the first metal line 41 in the first touch pattern layer 40 and the black matrix 60 .
  • Other spacer layers are provided to simplify the structure of the touch display panel and simplify the manufacturing process.
  • the distance between the black matrix 60 and the light-emitting device 23 can be reduced, thereby improving the L-Decay attenuation acceleration of the light-emitting device 23 and the color shift problem of the touch display panel.
  • the touch display panel may further include: a plurality of pixel filter parts 80 , the plurality of pixel filter parts 80 include multiple colors, and each pixel filter part 80 is connected to a pixel area of the display substrate 10 P is arranged relatively, that is, the orthographic projection of each pixel filter portion 80 on the display substrate 10 at least partially overlaps with one pixel area.
  • the plurality of pixel areas P are divided into a plurality of pixel units, each pixel unit includes a red pixel area, a green pixel area and a blue pixel area, and the multiple pixel filter parts 80 may include: red pixels corresponding to the red pixel area
  • the filter portion 80r includes a blue pixel filter portion 80b corresponding to the blue pixel area and a green pixel filter portion 80g corresponding to the green pixel area.
  • the black matrix 60 adopts a black single-layer structure.
  • the material of the black matrix 60 includes black organic materials.
  • the black matrix 60 with a black single-layer structure may be located on the first touch pattern layer 40 The side away from the display substrate 10 .
  • the touch display panel also includes a cover layer 91 , and the orthographic projection of the cover layer 91 on the display substrate 10 covers each pixel area.
  • the covering layer 91 may be a continuous whole layer structure or a discontinuous structure.
  • the covering layer 91 includes a plurality of covering parts, and the orthographic projection of each covering part on the display substrate 10 covers at least one pixel area.
  • the material of the covering layer 91 may include inorganic insulating materials or organic insulating materials.
  • FIG. 2A is a schematic diagram of a touch display panel provided in other embodiments of the present disclosure.
  • FIG. 2B is a bottom view of the first filter pattern and the second filter pattern provided in some embodiments of the present disclosure, as shown in FIG. 2A
  • the black matrix 60 may include: a first filter pattern 61 and a second filter pattern 62 .
  • the first filter pattern 61 is located on the first touch pattern layer away from the display substrate 10
  • the second filter pattern 62 is located on the side of the first filter pattern 61 away from the display substrate 10
  • the orthographic projections of the first filter pattern 61 and the second filter pattern 62 on the display substrate 10 both cover the first filter pattern 61 .
  • the first filter pattern 61 includes a plurality of first filter parts 61a
  • the second filter pattern 62 includes a plurality of second filter parts 62a
  • the first filter pattern 61 includes a plurality of first filter parts 61a.
  • the second filter portion 61a and the second filter portion 62a are arranged oppositely in one-to-one correspondence. For example, when multiple pixel areas are arranged in multiple rows and columns, as shown in FIG. 2B , both the first filter portion 61a and the second filter portion 62a have a strip structure, and the plurality of first filter portions 61a are criss-crossed.
  • first filter part 61a and the second filter part 62a can also be in other shapes.
  • each first filter part 61a and its corresponding second filter part 62a are the same as the materials of the two color pixel filter parts 80 respectively.
  • the material of the first filter part 61a and the pixel filter part of one color is the same, and the second filter part 62a is the same color as the pixel filter portion 80 of another color.
  • the first filter pattern 61 may include a plurality of first filter parts 61a
  • the second filter pattern 62 may include a plurality of second filter parts 62a
  • the colors of the plurality of first filter parts 61a may be the same or different. Not exactly the same; the colors of the plurality of second filter parts 62a are the same or not exactly the same.
  • the materials of the two are the same as the materials of the red pixel filter portion 80r and the green pixel filter portion 80g respectively;
  • the materials of one filter part 61a and its corresponding second filter part 62a are the same as the materials of the red pixel filter part 80r and the blue pixel filter part 80b respectively.
  • the first filter part 61a and the second filter part 62a are respectively used to transmit light of different colors, so that the stack of the first filter pattern 61 and the second filter pattern 62 can also play the role of
  • the first filter part 61a can be manufactured simultaneously with the pixel filter part 80 made of the same material
  • the second filter part 62a can be made with the pixel filter part 80 made of the same material. 80 are manufactured simultaneously, thereby eliminating the need to separately manufacture the first filter part 61a and the second filter part 62a, thus simplifying the manufacturing process.
  • the black matrix 60 may also include: a light-shielding part 63 with a black single-layer structure.
  • the light-shielding part 63 has a through hole, and at least part of the first metal line 41 and the first filter pattern 61 are located in the through hole. , and space the first metal line 41 from the light shielding portion 63 .
  • the material of the light shielding part 63 may contain metal elements (such as Cr elements), so that the black matrix 60 can achieve high OD (optical density, optical density) value and high impedance at the same time.
  • metal elements such as Cr elements
  • the light shielding part 63 has certain weak conductivity.
  • the first filter pattern 61 separates the first metal line 41 from the light shielding part 63 . Therefore, the structure of FIG. 2A can simplify the manufacturing process and prevent the light shielding part 63 from being weakly conductive. Sex affects the touch detection effect.
  • At least part of the second filter pattern 62 may be located outside the through hole, and a part of the orthographic projection of the second filter pattern 62 on the display substrate 10 exceeds the orthographic projection of the through hole on the display substrate 10 , This ensures the overall light-shielding effect of the black matrix 60 .
  • the plurality of first filter parts 61a may be made of the same material and color and be connected as one body; the plurality of second filter parts 62a may be made of the same material and color and be connected as one body.
  • Figure 2C is a schematic diagram of a touch display panel provided in other embodiments of the present disclosure.
  • the touch display panel shown in Figure 2C is the same as the touch display panel shown in Figure 2A.
  • At least two first filter parts 61a have different colors
  • at least two second filter parts 62a have different colors.
  • the first filter portion 61 a of different colors is represented by different hatching lines
  • the second filter portion 62 a of different colors is represented by different hatching lines.
  • the structure of the display substrate 10 may be the same.
  • the display substrate 10 includes: a base substrate 11 and a plurality of light-emitting devices 23 arranged on the base substrate 11. Each pixel area is provided with a light-emitting device 23.
  • the display substrate 10 also includes a plurality of light-emitting devices 23 arranged between the base substrate 11 and the plurality of light-emitting devices 23.
  • the pixel driving circuit has a one-to-one correspondence with the light-emitting device 23.
  • the pixel driving circuit is used to provide a driving current for the light-emitting device 23 to drive the light-emitting device 23 to emit light.
  • the pixel driving circuit includes a plurality of thin film transistors 21 and at least one capacitor Cs.
  • the thin film transistor 21 includes a gate electrode 211 , an active layer 212 , a source electrode 213 and a drain electrode 214 .
  • the active layer 212 Located between the gate electrode 211 and the base substrate 11 .
  • the material of the active layer 212 may include, for example, inorganic semiconductor materials (eg, polysilicon, amorphous silicon, etc.), organic semiconductor materials, and oxide semiconductor materials.
  • the active layer 212 includes a channel portion and a source connection portion and a drain connection portion located on both sides of the channel portion.
  • the source connection portion is connected to the source electrode 213 of the thin film transistor 21
  • the drain connection portion is connected to the source electrode 213 of the thin film transistor 21 .
  • Drain 214 is connected. Both the source connection part and the drain connection part may be doped with impurities (for example, N-type impurities or P-type impurities) that are higher than the impurity concentration of the channel part.
  • the channel part is directly opposite to the gate electrode 211 of the thin film transistor 21. When the voltage signal loaded on the gate electrode 211 reaches a certain value, a carrier path is formed in the channel part, causing the source electrode 213 and the drain electrode 214 of the thin film transistor 21 to conduct Pass.
  • the buffer layer BFL is disposed between the thin film transistor 21 and the base substrate 11 to prevent or reduce the diffusion of metal atoms and/or impurities from the base substrate 11 into the active layer 212 of the thin film transistor 21 .
  • the buffer layer BFL may include inorganic materials such as silicon oxide, silicon nitride, and/or silicon oxynitride, and may be formed as a multi-layer or a single layer.
  • the first gate insulating layer GI1 is provided on the side of the active layer 212 away from the base substrate 11 .
  • the material of the first gate insulating layer GI1 may include silicon compounds and metal oxides.
  • the material of the first gate insulating layer GI1 includes silicon oxynitride, silicon oxide, silicon nitride, silicon oxycarbide, silicon nitride carbide, aluminum oxide, aluminum nitride, tantalum oxide, hafnium oxide, zirconium oxide, titanium oxide, etc.
  • the first gate insulating layer GI1 may be a single layer or multiple layers.
  • the gate electrode 211 of the thin film transistor 21 and the first electrode plate Cs1 of the capacitor Cs are arranged in the same layer and are located on the side of the first gate insulating layer GI1 away from the base substrate 11 .
  • the materials of the gate 211 and the first electrode plate Cs1 may include, for example, metal, metal alloy, metal nitride, conductive metal oxide, transparent conductive material, etc.
  • the second gate insulating layer GI2 is disposed on the side of the gate electrode 211 away from the base substrate 11 .
  • the material of the second gate insulating layer GI2 may include, for example, silicon nitride oxide, silicon oxide, silicon nitride, silicon oxycarbide, silicon nitride carbide, etc. .
  • the second electrode plate Cs2 of the capacitor Cs is disposed on the side of the second gate insulating layer GI2 away from the base substrate 11, and its material can be the same as the material of the first electrode plate Cs1. For details, see the conductive materials listed above.
  • the interlayer insulating layer ILD is disposed on the side of the second electrode plate Cs2 of the capacitor Cs away from the base substrate 11 .
  • the material of the interlayer insulating layer ILD may include, for example, silicon compounds, metal oxides, etc. Specifically, the silicon compounds and metal oxides listed above can be selected, which will not be described again here.
  • the first source-drain conductive layer is disposed on the side of the interlayer insulating layer ILD away from the base substrate 11 .
  • the first source-drain conductive layer may include a source electrode 213 and a drain electrode 214 of each transistor.
  • the source electrode 213 is electrically connected to the source electrode connection part
  • the drain electrode 214 is electrically connected to the drain electrode connection part.
  • the first source-drain conductive layer may include metal, alloy, metal nitride, conductive metal oxide, transparent conductive material, etc.
  • the first source-drain conductive layer may be a single layer or multiple layers made of metal, such as Mo/Al. /Mo or Ti/Al/Ti.
  • the passivation layer PVX is disposed on the side of the source-drain conductive layer away from the base substrate 11 .
  • the material of the passivation layer PVX may include, for example, silicon oxynitride, silicon oxide, silicon nitride, etc.
  • the second source-drain conductive layer is disposed on the side of the passivation layer PVX away from the base substrate 11 , and may include conductive structures such as transfer electrodes 22 .
  • the second source-drain conductive layer may include metal, alloy, metal nitride, conductive metal oxide, transparent conductive material, etc.
  • the planarization layer PLN is disposed on the side of the passivation layer PVX away from the base substrate 11.
  • the planarization layer PLN can be made of organic insulating materials.
  • the organic insulating materials include polyimide, epoxy resin, and acrylic. , polyester, photoresist, polyacrylate, polyamide, silicone and other resin materials, etc.
  • the pixel definition layer PDL is located on a side of the planarization layer PLN away from the base substrate 11.
  • the pixel definition layer PDL has a plurality of pixel openings for accommodating light-emitting devices.
  • the light-emitting device 23 includes: a first electrode 231, a second electrode 232, and a light-emitting functional layer 233 located between the first electrode 231 and the second electrode 232.
  • the first electrode 231 is an anode
  • the second electrode 232 is a cathode.
  • the first electrode 231 is a reflective electrode made of metal material
  • the second electrode 232 is a transparent electrode made of transparent conductive material (for example, indium tin oxide).
  • the light-emitting functional layer 233 may include a hole injection layer, a hole transport layer, a light-emitting layer, an electron transport layer and an electron injection layer stacked in sequence.
  • the first electrode 231 is located between the pixel definition layer PDL and the planarization layer PLN, and is connected to the transfer electrode 22 through the via hole on the planarization layer PLN, and is further connected to the drain electrode 214 of the thin film transistor 21 through the transfer electrode 22 . A portion of the first electrode 231 is exposed by the pixel opening.
  • the second electrodes 232 of the plurality of light emitting devices 23 may be formed into an integrated structure.
  • the light-emitting device 23 is an OLED device, in which case the light-emitting layer adopts an organic light-emitting material; or the light-emitting device 23 is a QLED (Quantum Dot Light Emitting Diodes, quantum dot light-emitting diode) device, in which case the light-emitting layer adopts quantum dots.
  • Luminescent material The color of the light emitted by each light-emitting device 23 is the same as the color of the corresponding pixel filter portion.
  • the display substrate 10 may also include an encapsulation layer 30 covering the pixel definition layer PDL and a plurality of light-emitting devices 23 for encapsulating the light-emitting devices 23 to protect them from the external environment.
  • the water vapor and/or oxygen in the light emitting device 23 is corroded.
  • the encapsulation layer 30 includes a plurality of encapsulation sub-layers arranged in a stack.
  • the multiple encapsulation sub-layers include: a first inorganic encapsulation sub-layer 31, a second inorganic encapsulation sub-layer 32 and an organic encapsulation sub-layer 33,
  • the second inorganic encapsulation sub-layer 32 is located on the side of the first inorganic encapsulation sub-layer 31 away from the base substrate 11
  • the organic encapsulation sub-layer 33 is located between the first inorganic encapsulation sub-layer 31 and the second inorganic encapsulation sub-layer 32 .
  • Both the first inorganic encapsulation sub-layer 31 and the second inorganic encapsulation sub-layer 32 can be made of highly dense inorganic materials such as silicon oxynitride, silicon oxide, and silicon nitride.
  • the organic encapsulation sub-layer 33 can be made of a polymer material containing a desiccant, or a polymer material that can block water vapor.
  • polymer resin can be used to relieve the stress of the first inorganic encapsulation sub-layer 31 and the second inorganic encapsulation sub-layer 32, and water-absorbing materials such as desiccant can also be included to absorb water molecules and/or oxygen molecules that invade the interior.
  • the display substrate 10 may further include a spacer layer (not shown), which is located between the pixel definition layer PDL and the encapsulation layer 30 .
  • the spacer layer may further increase the path for external water vapor or oxygen to enter the display area. , thereby protecting the light-emitting device 23 in the display area.
  • the second inorganic encapsulation sub-layer 32 may be a continuous entire film layer, and a first touch graphic layer 40 and the encapsulation layer 30 may be provided with Buffer layer; of course, the first touch graphic layer 40 and the pixel filter part 80 can be directly disposed on the encapsulation layer 30 and in contact with the second inorganic encapsulation sub-layer 32, thereby reducing the overall thickness of the touch display panel; Moreover, the distance between the black matrix 60 and the light-emitting device 23 can be reduced, and the problems of excessive L-Decay attenuation and color shift of the light-emitting device can be improved.
  • FIG 3 is a schematic diagram of a touch display panel provided in other embodiments of the present disclosure.
  • the touch display panel shown in Figure 3 is similar to the touch display panel shown in Figure 2A. The difference is that the touch display panel shown in Figure 3
  • the touch structure layer in the touch display panel may also include a second touch pattern layer 50.
  • the second touch pattern layer is located on the side of the first touch pattern layer 40 close to the display substrate 10 and includes a plurality of second metal lines 51.
  • the orthographic projection of each second metal line 51 on the display substrate 10 is located at The black matrix 60 is within the orthographic projection range on the display substrate 10 .
  • a first insulation layer 90 may be disposed between the second touch pattern layer 50 and the first touch pattern layer 40 .
  • the first touch pattern layer 40 may include a plurality of touch driving electrodes
  • the second touch pattern layer 50 may include a plurality of touch sensing electrodes.
  • the first insulating layer 90 will The graphic layer 40 and the second touch graphic layer 50 are insulated and spaced apart; alternatively, one of the first touch graphic layer 40 and the second touch graphic layer 50 includes: the driving electrode unit and the connection portion of the touch driving electrode; The sensing electrode unit of the touch sensing electrode; the other one of the first touch pattern layer 40 and the second touch pattern layer 50 includes: a bridge portion of the touch sensing electrode. At this time, the bridge portion passes through the first insulating layer 90 The via holes on the sensor are connected to the sensing electrodes.
  • FIG 4 is a schematic diagram of a touch display panel provided in other embodiments of the present disclosure.
  • the touch display panel shown in Figure 4 is similar to the touch display panel shown in Figure 3, both including: a display substrate 10, and a The touch structure layer, the black matrix 60 , the plurality of pixel filter portions 80 and the cover layer 91 on the light exit side of the display substrate 10 .
  • the touch structure layer includes a first touch pattern layer 40 and a second touch pattern layer 50.
  • the first touch pattern layer 40 includes a plurality of first metal lines 41
  • the second touch pattern layer 50 includes a plurality of first metal lines 41.
  • the orthographic projections of the two metal lines 51 , the first metal line 41 and the second metal line 51 on the display substrate 10 are all located within the orthographic projection range of the black matrix 60 on the display substrate 10 .
  • the differences between Figure 4 and Figure 3 are introduced below.
  • the second touch pattern layer 50 is located on the side of the first touch pattern layer 40 away from the display substrate 10 , and the black matrix 60 is located between the first touch pattern layer 40 and the second touch pattern layer 50 .
  • the black matrix 60 can be used to separate the first touch pattern layer 40 and the second touch pattern layer 50 without the need to form an additional insulation layer between the first touch pattern layer 40 and the second touch pattern layer 50 .
  • the refractive index of the surface of the second metal line 51 away from the display substrate 10 can be set below 5% to prevent the second metal line from The reflection of external ambient light by line 51 affects the display effect.
  • the second metal line 51 may include a stack of multiple metal layers, wherein the metal layer farthest from the display substrate 10 adopts a black metal layer, and at least one of the remaining metal layers adopts a metal layer with higher conductivity.
  • the second metal line 51 adopts a stack of MoOx/Al/Ti or a stack of MoOx/Al/MoOx, and its surface reflectivity is about 4.2%.
  • the black matrix 60 has a first surface s1 facing away from the display substrate 10 , a second surface facing the display substrate 10 , and a side surface connected between the first surface s1 and the second surface s2 . Furthermore, the first surface s1 of the black matrix 60 is higher than the surface of the pixel filter 80 and away from the display substrate 10 , so that a part of the side surface of the black matrix 60 is in contact with the cover layer 91 . As shown in FIG. 4 , the side surface of the black matrix 60 It includes a first sub-side s3 in contact with the covering layer 91 .
  • the refractive index of the part of the black matrix 60 close to the first sub-side s3 is smaller than the refractive index of the cover layer 91 , so that the display substrate 10 irradiates at least a part of the first sub-side s3 and total reflection occurs on the first sub-side s3 . Thereby, it is reflected by the first sub-side surface s3 in a direction away from the display substrate 10 , thereby improving the brightness of the touch display panel.
  • the first sub-side s3 may be an inclined plane, or may be a concave or convex arc surface, as long as at least part of the light emitted from the display substrate 10 can be totally reflected by the first sub-side s3.
  • the refractive index of the part of the black matrix 60 close to the first sub-side s3 may be 1.5 ⁇ 1.6, and the refractive index of the covering layer 91 may be 1.7 ⁇ 1.8.
  • the black matrix 60 may adopt a black single-layer structure, for example, may adopt a black organic insulating material.
  • the black matrix 60 can also adopt the structure of the black matrix 60 in FIG. 2 (that is, including the light shielding part 63, the first filter pattern 61 and the second filter pattern 62).
  • the first metal line 41 The first filter pattern 61 is located on a side close to the display substrate 10
  • the second metal line 51 is located on a side of the second filter pattern 62 away from the display substrate 10 .
  • the refractive index of the light shielding part 63 may be set to be greater than the refractive index of the covering layer 91 so that the surface of the light shielding part 63 in contact with the covering layer 91 forms a total reflection surface.
  • the covering layer 91 can be the same as the covering layer 91 in FIG. 3 , and both use a whole layer of film.
  • Figure 5 is a schematic diagram of a touch display panel provided in other embodiments of the present disclosure.
  • the touch display panel shown in Figure 5 is similar to the touch display panel shown in Figure 4.
  • the only difference is that in Figure 5,
  • the covering layer 91 is no longer a continuous film layer, but includes a plurality of covering portions 91a arranged at intervals, and the orthographic projection of each covering portion 91a on the display substrate 10 covers at least one pixel area.
  • the plurality of covering portions 91a may be formed using a photolithography patterning process.
  • FIG. 6 is a schematic diagram of a touch display panel provided in other embodiments of the present disclosure.
  • the touch display panel shown in FIG. 6 is similar to FIG. 4 and includes: a display substrate 10 and a touch screen located on the light emitting side of the display substrate 10 A control structure layer, a black matrix 60, a plurality of pixel filter parts 80 and a cover layer 91.
  • the touch structure layer includes a first touch pattern layer 40 and a second touch pattern layer 50.
  • the first touch pattern layer 40 includes a plurality of first metal lines 41
  • the second touch pattern layer 50 includes a plurality of first metal lines 41.
  • the orthographic projections of the two metal lines 51 , the first metal line 41 and the second metal line 51 on the display substrate 10 are all located within the orthographic projection range of the black matrix 60 on the display substrate 10 .
  • a cover layer 91 is provided on the side of the black matrix 60 away from the display substrate 10 , and the orthographic projection of the cover layer 91 on the display substrate 10 covers each pixel area.
  • the second touch pattern layer 50 is located on the side of the first touch pattern layer 40 close to the display substrate 10 , and a second insulation is provided between the second touch pattern layer 50 and the first touch pattern layer 40 .
  • Layer 93, the orthographic projection of the second insulating layer 93 on the display substrate 10 is located in the separation area.
  • the second insulating layer 93 has a first surface s4 facing away from the display substrate 10 , a second surface s5 facing the display substrate 10 , and a side surface connected between the first surface s4 and the second surface s5 .
  • the side surface of the second insulating layer 93 includes a first sub-side surface s6 in contact with the cover layer 91 .
  • the refractive index of the second insulating layer 93 is smaller than the refractive index of the covering layer 91 , so that at least part of the light irradiated from the display substrate 10 to the first sub-side s6 of the second insulating layer 93 occurs on the first sub-side s6 Total reflection, thereby being reflected by the first sub-side s6 in a direction away from the display substrate 10 .
  • the first metal line 41 and the second metal line 51 are both located on the side of the black matrix 60 close to the display substrate 10 and do not receive ambient light. Therefore, the first metal line There are no special requirements on the reflectivity of 41 and the second metal line 51, and the materials of the two may or may not include black metal.
  • the covering layer 91 may be provided as a continuous entire film layer, or may include multiple spaced covering portions.
  • the structure of the display substrate 10 is the same as that of the display substrate 10 in FIGS. 1 and 2A .
  • the pixel filter portion 80 can be in contact with the second encapsulation sub-layer 32 .
  • FIG. 7 is a schematic diagram of a touch display panel provided in other embodiments of the present disclosure.
  • the touch display panel shown in FIG. 7 is similar to FIG. 4 .
  • the only difference is that in FIG. 7 , the second The packaging sub-layer 32 is no longer a continuous entire film layer, but has multiple hollow parts. Each hollow part corresponds to a pixel filter part 80.
  • the pixel filter part 80 communicates with the organic packaging sub-layer 32 through the corresponding hollow part. touch.
  • the second encapsulation sub-layer 32 and the first touch pattern layer 40 can be produced separately using two patterning processes; they can also be formed using the same patterning process.
  • the distance between the pixel filter part 80 and the light-emitting device 23 is further reduced; in addition, the pixel filter part 80 and the organic packaging sub-layer 32 are both made of organic materials, and the refractive index of the two is relatively Therefore, the total reflection of the light from the light-emitting device 23 at the interface between the pixel filter portion 80 and the organic packaging sub-layer 32 can be reduced, thereby improving the light extraction efficiency.
  • the refractive index of the pixel filter part 80 and the refractive index of the organic encapsulation sub-layer 32 are both between 1.5 and 1.65.
  • the covering layer 91 may be provided as a continuous entire film layer, or may include multiple spaced covering portions.
  • Each touch display panel shown in FIGS. 4 to 7 may also include an adhesive layer 92 and a cover plate.
  • the adhesive layer 92 is located on the side of the cover layer 91 away from the display substrate 10
  • the cover plate is located on the adhesive layer 92 The side away from the display substrate 10 is bonded to the adhesive layer 92 .
  • the adhesive layer 92 may be optical glue
  • the cover may be a glass substrate or a flexible substrate made of flexible material.
  • the above-mentioned adhesive layer and cover plate may also be included in the touch display panel shown in FIG. 1 , FIG. 2A and FIG. 2C .
  • the structure of the touch display panel in the above embodiments is only an exemplary implementation adopted to illustrate the principles of the present disclosure.
  • the structure of the touch display panel can be modified without departing from the present disclosure.
  • Various modifications and improvements may be made without departing from the spirit and substance of the invention.
  • the second touch pattern layer can be omitted, and the first touch pattern layer can be configured as a plurality of self-capacitance electrodes.
  • An embodiment of the present disclosure also provides a touch display device, which includes the touch display panel in the above embodiment.
  • the touch display device can be an OLED panel, a QLED display panel, a mobile phone, a tablet computer, a television, a monitor, a notebook computer, a digital photo frame, a navigator, or any other product or component with a display function.

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Abstract

公开了一种触控显示面板和触控显示装置，触控显示面板包括：显示基板，包括多个像素区、以及将所述多个像素区彼此间隔开的间隔区；黑矩阵，位于所述显示基板的出光侧，且所述黑矩阵在所述显示基板上的正投影位于所述间隔区；触控结构层，包括位于所述显示基板出光侧的第一触控图形层；所述第一触控图形层包括多条第一金属线，所述第一金属线在所述显示基板上的正投影位于所述黑矩阵在所述显示基板上的正投影范围内，且所述第一金属线与所述黑矩阵接触。

Description

触控显示面板和触控显示装置 技术领域
本公开涉及显示技术领域，具体涉及一种触控显示面板和触控显示装置。
背景技术
有机发光二极管(Organic Light-Emitting Diode，OLED)面板以其自发光、功耗低、轻薄、可绕性、色彩绚丽、对比度高、响应速率快等优势，受到广泛的关注。在一些产品中，在有机发光二极管的封装层上形成彩色滤光片(Color Filter on Encapsulation，COE)，从而无需通过设置偏光片来抗反射。另外，在一些产品中，还在彩色滤光片外侧设置触控结构层，来实现触控，从而可以形成多功能层堆叠的膜层结构。
发明内容
本公开提出了一种触控显示面板和触控显示装置。
本公开提供一种触控显示面板，包括：
显示基板，包括多个像素区、以及将所述多个像素区彼此间隔开的间隔区；
黑矩阵，位于所述显示基板的出光侧，且所述黑矩阵在所述显示基板上的正投影位于所述间隔区；
触控结构层，包括位于所述显示基板出光侧的第一触控图形层；所述第一触控图形层包括多条第一金属线，所述第一金属线在所述显示基板上的正投影位于所述黑矩阵在所述显示基板上的正投影范围内，且所述第一金属线与所述黑矩阵接触。
在一些实施例中，所述黑矩阵采用黑色单层结构。
在一些实施例中，所述触控显示面板还包括：多个像素滤光部，所述 多个像素滤光部的颜色包括多种，且每个所述像素滤光部与所述显示基板的一个所述像素区相对设置；
所述黑矩阵包括：第一滤光图形和第二滤光图形，所述第一滤光图形位于所述第一触控图形层远离所述显示基板的一侧，所述第二滤光图形位于第一滤光图形远离所述显示基板的一侧，所述第一滤光图形和所述第二滤光图形在所述显示基板上的正投影均覆盖所述第一触控图形层在所述显示基板上的正投影；所述第一滤光图形包括多个第一滤光部，所述第二滤光图形包括多个第二滤光部，所述第一滤光部与所述第二滤光部一一对应地相对设置；
每个所述第一滤光部与其对应的第二滤光部的材料，分别与两种颜色的像素滤光部的材料相同。
在一些实施例中，所述黑矩阵还包括：遮光部，所述遮光部为黑色单层结构且具有通孔，所述第一金属线和所述第一滤光图形的至少一部分均位于所述通孔内，且将所述第一金属线与所述遮光部被所述第一滤光图形间隔开。
在一些实施例中，所述第二滤光图形的至少一部分位于所述通孔外，且所述第二滤光图形在所述显示基板上的正投影的一部分超出通孔在所述显示基板上的正投影。
在一些实施例中，所述第一滤光图形的多个第一滤光部的颜色相同；或者，至少两个所述第一滤光部的颜色不同；
所述第二滤光图形的多个第二滤光部的颜色相同；或者，至少两个所述第二滤光部的颜色不同。
在一些实施例中，所述第一触控图形层位于所述黑矩阵靠近所述显示基板的一侧；所述触控结构层还包括：
第二触控图形层，位于所述黑矩阵远离所述显示基板的一侧，且包括多条第二金属线，所述多条第二金属线在所述显示基板上的正投影位于所 述黑矩阵在所述显示基板上的正投影范围内。
在一些实施例中，所述第二金属线远离所述显示基板的表面的折射率小于5％。
在一些实施例中，所述触控显示面板还包括：覆盖层，所述覆盖层在所述显示基板上的正投影覆盖每个所述像素区，
所述黑矩阵具有：背向所述显示基板的第一表面、朝向所述显示基板的第二表面、以及连接在所述第一表面与所述第二表面之间的侧面，所述黑矩阵的侧面包括与所述覆盖层接触的第一子侧面，所述黑矩阵靠近所述第一子侧面的部分的折射率小于所述覆盖层的折射率，以使所述显示基板照射至所述第一子侧面的至少一部分光线，被所述第一子侧面朝远离所述显示面板的方向反射。
在一些实施例中，所述覆盖层为连续膜层；
或者，所述覆盖层包括间隔设置的多个覆盖部，每个所述覆盖部在所述显示基板上的正投影覆盖至少一个所述像素区。
在一些实施例中，所述第一触控图形层位于所述黑矩阵靠近所述显示面板的一侧，所述触控显示面板还包括：
第二触控图形层，位于所述第一触控图形层靠近所述显示基板的一侧，且包括多条第二金属线，所述多条第二金属线在所述显示基板上的正投影位于所述黑矩阵在所述显示基板上的正投影范围内；
绝缘层，位于所述第一触控图形层与所述第二触控图形层之间，所述绝缘层在所述显示基板上的正投影位于所述间隔区。
在一些实施例中，所述触控显示面板还包括：覆盖层，所述覆盖层在所述显示基板上的正投影覆盖每个所述像素区，
所述绝缘层具有：背向所述显示基板的第一表面、朝向所述显示基板的第二表面、以及连接在所述第一表面与所述第二表面之间的侧面，所述绝缘层的侧面包括与所述覆盖层接触的第一子侧面，所述绝缘层的折射率 小于所述第二覆盖层的折射率，以使所述显示基板照射至所述第一子侧面的至少一部分光线，被所述第一子侧面朝远离所述显示基板的方向反射。
在一些实施例中，所述覆盖层为连续膜层；
或者，所述覆盖层包括间隔设置的多个覆盖部，每个所述覆盖部在所述显示基板上的正投影覆盖至少一个所述像素区。
在一些实施例中，所述触控显示面板还包括：多个像素滤光部，每个所述像素滤光部与所述显示基板的一个所述像素区相对设置；
所述显示基板包括：
衬底基板；
多个发光器件，设置在所述衬底基板上，每个所述像素区均设置有一个所述发光器件；
封装层，设置在所述发光器件远离所述衬底基板的一侧；
其中，所述多个像素滤光部与所述封装层接触。
在一些实施例中，所述封装层包括：沿远离所述衬底基板的方向依次设置的：第一无机封装子层、有机封装子层和第二无机封装子层；
其中，所述第二无机封装子层为连续膜层，其在所述显示基板上的正投影覆盖所述多个像素区，所述多个像素滤光部与所述第二无机封装子层接触；
或者，所述第二无机封装子层具有多个镂空部，所述镂空部与所述像素区一一对应，所述滤光部的至少一部分通过所述镂空部与所述有机封装子层接触。
本公开还提供一种触控显示装置，包括上述的触控显示面板。
附图说明
附图是用来提供对本公开的进一步理解，并且构成说明书的一部分，与下面的具体实施方式一起用于解释本公开，但并不构成对本公开的限制。 在附图中：
图1A为本公开的一些实施例中提供的触控显示面板的示意图。
图1B为本公开的一些实施例中提供的显示基板的区域划分示意图。
图2A为本公开的另一些实施例中提供的触控显示面板的示意图。
图2B为本公开的一些实施例中提供的第一滤光图形和第二滤光图形的仰视图。
图2C为本公开的另一些实施例中提供的触控显示面板的示意图。
图3为本公开的另一些实施例中提供的触控显示面板的示意图。
图4为本公开的另一些实施例中提供的触控显示面板的示意图。
图5为本公开的另一些实施例中提供的触控显示面板的示意图。
图6为本公开的另一些实施例中提供的触控显示面板的示意图。
图7为本公开的另一些实施例中提供的触控显示面板的示意图。
具体实施方式
为使本公开实施例的目的、技术方案和优点更加清楚，下面将结合本公开实施例的附图，对本公开实施例的技术方案进行清楚、完整地描述。显然，所描述的实施例是本公开的一部分实施例，而不是全部的实施例。基于所描述的本公开的实施例，本领域普通技术人员在无需创造性劳动的前提下所获得的所有其他实施例，都属于本公开保护的范围。
这里用于描述本公开的实施例的术语并非旨在限制和/或限定本公开的范围。例如，除非另外定义，本公开使用的技术术语或者科学术语应当为本公开所属领域内具有一般技能的人士所理解的通常意义。应该理解的是，本公开中使用的“第一”、“第二”以及类似的词语并不表示任何顺序、数量或者重要性，而只是用来区分不同的组成部分。除非上下文另外清楚地指出，否则单数形式“一个”、“一”或者“该”等类似词语也不表示数量限制，而是表示存在至少一个。“包括”或者“包含”等类似的词语意指出 现在“包括”或者“包含”前面的元件或者物件涵盖出现在“包括”或者“包含”后面列举的元件或者物件及其等同，并不排除其他元件或者物件。“连接”或者“相连”等类似的词语并非限定于物理的或者机械的连接，而是可以包括电性的连接，不管是直接的还是间接的。“上”、“下”、“左”、“右”等仅用于表示相对位置关系，当被描述对象的绝对位置改变后，则所述相对位置关系也可能相应地改变。
在下面的描述中，当元件或层被称作“在”另一元件或层“上”或“连接到”另一元件或层时，该元件或层可以直接在所述另一元件或层上、直接连接到所述另一元件或层，或者可以存在中间元件或中间层。然而，当元件或层被称作“直接在”另一元件或层“上”、“直接连接到”另一元件或层时，不存在中间元件或中间层。术语“和/或”包括一个或更多个相关列出项的任意和全部组合。
有机发光二极管(Organic Light-Emitting Diode，OLED)面板以其自发光、功耗低、轻薄、可绕性、色彩绚丽、对比度高、响应速率快等优势，受到广泛的关注。在一些产品中，在有机发光二极管的封装层上形成彩色滤光片(Color Filter on Encapsulation，COE)和黑矩阵，从而无需通过设置偏光片来抗反射。另外，在一些产品中，还在封装层上设置触控结构层，来实现触控，从而可以形成多功能层堆叠的膜层结构。通常，在显示面板制作过程中，先在封装层上形成触控结构层，之后形成平坦层；再在平坦层远离封装层的一侧形成彩色滤光片和黑矩阵。但这样会导致工艺较为复杂，并且，当黑矩阵与有机发光二极管较远时，会导致有机发光二极管的L-Decay衰减加快，并容易产生色偏现象。
图1A为本公开的一些实施例中提供的触控显示面板的示意图，如图1A所示，触控显示面板包括：显示基板10、黑矩阵60和触控结构层。
其中，显示基板10可以为OLED显示基板，图1B为本公开的一些实施例中提供的显示基板的区域划分示意图，如图1B所示，显示基板包括多 个像素区P、以及将多个像素区P彼此间隔开的间隔区SP。需要说明的是，图1B中的像素区P的数量和排列方式仅为示例性说明。
在一些实施例中，显示基板10具体可以包括：衬底基板11、以及设置在衬底基板11上的多个发光器件23，每个像素区P中设置有一个发光器件23，发光器件23可以为OLED器件、LED器件等。
黑矩阵60位于显示基板10的出光侧，即多个发光器件23远离衬底基板11的一侧。黑矩阵60在显示基板10上的正投影位于间隔区SP。其中，黑矩阵60可以呈网格状结构，黑矩阵60的每个网孔对应显示基板10的一个像素区P。
在本公开实施例中，黑矩阵60可以采用黑色材料制成，也可以采用其他材料制成，只要能够防止不同像素区P的出射光线发生串扰即可。
触控结构层位于显示基板10的出光侧，用于感测触摸位置。其中，触控结构层包括第一触控图形层40，第一触控图形层40包括多条第一金属线41，第一金属线41在显示基板10上的正投影位于黑矩阵60在显示基板10上的正投影范围内，且第一金属线41与黑矩阵60接触。其中，第一触控图形层40可以位于黑矩阵60靠近显示基板10的一侧。
在一些实施例中，第一触控图形层40可以包括多个自电容电极，每个自电容电极均包括多条第一金属线41。在另一些实施例中，触控结构层包括第一触控图形层40和第二触控图形层，第一触控图形层40包括多个触控驱动电极，第二触控图形层包括多个触控感应电极，触控驱动电极和触控感应电极交叉设置，且绝缘间隔，触控驱动电极为多条第一金属线41形成的金属网格电极，触控感应电极为多条第二金属线形成的金属网格电极。或者，触控结构层包括多个触控驱动电极和多个触控感应电极，每个触控驱动电极包括多个驱动电极单元、以及位于相邻驱动电极单元之间的连接部；每个触控感应电极包括多个感应电极单元、以及位于相邻的感应电极单元之间的桥接部，驱动电极单元、连接部、感应电极单元均位于第一触 控图形层40，且均为多条第一金属线形成的金属网格结构，多个感应电极单元位于第二触控图形层，且均为多条第二金属线形成的金属网格结构；当然，也可以将驱动电极单元、连接部、感应电极单元设置在第二触控图形层中，将多个感应电极单元设置在第一触控图形层40中。
在本公开实施例中，第一触控图形层40中的第一金属线41与黑矩阵60接触，即，第一触控图形层40的第一金属线41与黑矩阵60之间不再设置其他间隔层，从而简化触控显示面板的结构，简化制作工艺。并且，可以减小黑矩阵60与发光器件23之间的距离，从而改善发光器件23的L-Decay衰减加快和触控显示面板的色偏问题。
如图1A所示，触控显示面板还可以包括：多个像素滤光部80，多个像素滤光部80的颜色包括多种，每个像素滤光部80与显示基板10的一个像素区P相对设置，即，每个像素滤光部80在显示基板10上的正投影与一个像素区至少部分重叠。例如，多个像素区P分为多个像素单元，每个像素单元包括红色像素区、绿色像素区和蓝色像素区，多个像素滤光部80可以包括：对应于红色像素区的红色像素滤光部80r，对应于蓝色像素区的蓝色像素滤光部80b和对应于绿色像素区的绿色像素滤光部80g。
在一些实施例中，如图1A所示，黑矩阵60采用黑色单层结构，例如黑矩阵60的材料包括黑色的有机材料。
其中，当第一触控图形层40包括多个自电容电极，每个自电容电极包括多条第一金属线41时，采用黑色单层结构的黑矩阵60可以位于第一触控图形层40远离显示基板10的一侧。
如图1A所示，触控显示面板还包括覆盖层91，覆盖层91在显示基板10上的正投影覆盖每个像素区。其中，覆盖层91可以为连续的整层结构，也可以为非连续结构，例如，覆盖层91包括多个覆盖部，每个覆盖部在显示基板10上的正投影覆盖至少一个像素区。其中，覆盖层91的材料可以包括无机绝缘材料或有机绝缘材料。
图2A为本公开的另一些实施例中提供的触控显示面板的示意图，图2B为本公开的一些实施例中提供的第一滤光图形和第二滤光图形的仰视图，如图2A和图2B所示，在另一些实施例中，黑矩阵60可以包括：第一滤光图形61和第二滤光图形62，第一滤光图形61位于第一触控图形层远离显示基板10的一侧，第二滤光图形62位于第一滤光图形61远离显示基板10的一侧，第一滤光图形61和第二滤光图形62在显示基板10上的正投影均覆盖第一触控图形层40在显示基板10上的正投影，第一滤光图形61包括多个第一滤光部61a，第二滤光图形62包括多个第二滤光部62a，第一滤光部61a与第二滤光部62a一一对应地相对设置。例如，当多个像素区排列为多行多列时，如图2B所示，第一滤光部61a和第二滤光部62a均为条状结构，多个第一滤光部61a纵横交错，形成网格状结构；多个第二滤光部62a纵横交错，形成网格状结构。当然，第一滤光部61a和第二滤光部62a也可以为其他形状。
其中，每个第一滤光部61a与其对应的第二滤光部62a的材料，分别与两种颜色的像素滤光部80的材料相同。
也就是说，对于任意一个第一滤光部61a与其对应的第二滤光部62a而言，第一滤光部61a与其中一种颜色的像素滤光部的材料相同，第二滤光部62a与另一种颜色的像素滤光部80的颜色相同。可选地，第一滤光图形61可以包括多个第一滤光部61a，第二滤光图形62可以包括多个第二滤光部62a，多个第一滤光部61a的颜色相同或不完全相同；多个第二滤光部62a的颜色相同或不完全相同。例如，对于其中一个第一滤光部61a与其相应的第二滤光部62a而言，二者的材料分别与红色像素滤光部80r和绿色像素滤光部80g的材料相同；对于另一个第一滤光部61a与其相应的第二滤光部62a而言，二者的材料分别与红色像素滤光部80r和蓝色像素滤光部80b的材料相同。
这种情况下，第一滤光部61a和第二滤光部62a分别用于透过不同颜色 的光线，从而使得第一滤光图形61和第二滤光图形62的叠层同样能够起到遮光作用，并且，在触控显示面板的制备过程中，第一滤光部61a可以和与其材料的像素滤光部80同步制作，第二滤光部62a可以和与其材料相同的像素滤光部80同步制作，从而无需单独制作第一滤光部61a和第二滤光部62a，进而简化了制作工艺。
如图2A所示，黑矩阵60还可以包括：采用黑色单层结构的遮光部63，遮光部63具有通孔，第一金属线41和第一滤光图形61的至少一部分均位于通孔内，且将第一金属线41与遮光部63间隔开。
其中，遮光部63的材料中可以含有金属元素(例如Cr元素)，以使黑矩阵60可以同时达到高OD(optical density，光密度)值和高阻抗，但是，这种情况下，也会导致遮光部63具有一定的弱导电性。而图2A所示的实施例中，第一滤光图形61将第一金属线41与遮光部63间隔开，因此，图2A的结构可以在简化制备工艺的同时，防止遮光部63的弱导电性对触控检测效果造成影响。
如图2A所示，第二滤光图形62在至少一部分可以位于通孔外，且第二滤光图形62在显示基板10上的正投影的一部分超出通孔在显示基板10上的正投影，从而保证黑矩阵60整体的遮光效果。
在一些实施例中，多个第一滤光部61a的材料、颜色可以相同，并连接为一体；多个第二滤光部62a的材料、颜色可以相同，并连接为一体。
图2C为本公开的另一些实施例中提供的触控显示面板的示意图，图2C所示的触控显示面板与图2A中所示的触控显示面板相同，区别仅在于，图2C中，至少两个第一滤光部61a的颜色不同，至少两个第二滤光部62a的颜色不同。图2C中，不同颜色的第一滤光部61a用不同的剖面线表示，不同颜色的第二滤光部62a采用不同剖面线表示。
在图1A、图2A和图2C所示的触控显示面板中，显示基板10的结构可以相同，具体地，如图1A、图2A和图2C所示，显示基板10包括：衬 底基板11和设置在衬底基板11上的多个发光器件23，每个像素区均设置有一个发光器件23，另外，显示基板10还包括设置在衬底基板11与多个发光器件23之间的多个像素驱动电路，像素驱动电路与发光器件23一一对应，像素驱动电路用于为发光器件23提供驱动电流，以驱动发光器件23发光。例如，像素驱动电路包括多个薄膜晶体管21和至少一个电容Cs。
如图1A、图2A和图2C所示，薄膜晶体管21包括栅极211、有源层212、源极213和漏极214，以薄膜晶体管21采用顶栅型薄膜晶体管为例，有源层212位于栅极211与衬底基板11之间。有源层212的材料可以包括例如无机半导体材料(例如，多晶硅、非晶硅等)、有机半导体材料、氧化物半导体材料。有源层212包括沟道部和位于该沟道部两侧的源极连接部和漏极连接部，源极连接部与薄膜晶体管21的源极213连接，漏极连接部与薄膜晶体管21的漏极214连接。源极连接部和漏极连接部均可以掺杂有比沟道部的杂质浓度高的杂质(例如，N型杂质或P型杂质)。沟道部与薄膜晶体管21的栅极211正对，当栅极211加载的电压信号达到一定值时，沟道部中形成载流子通路，使薄膜晶体管21的源极213和漏极214导通。
缓冲层BFL设置在薄膜晶体管21与衬底基板11之间，用于防止或减少金属原子和/或杂质从衬底基板11扩散到薄膜晶体管21的有源层212中。缓冲层BFL可以包括诸如氧化硅、氮化硅和/或氮氧化硅的无机材料，并且可以形成为多层或单层。
第一栅绝缘层GI1设置在有源层212远离衬底基板11的一侧。第一栅绝缘层GI1的材料可以包括硅化合物、金属氧化物。例如，第一栅绝缘层GI1的材料包括氮氧化硅、氧化硅、氮化硅、碳氧化硅、氮碳化硅、氧化铝、氮化铝、氧化钽、氧化铪、氧化锆、氧化钛等。另外，第一栅绝缘层GI1可以为单层或多层。
薄膜晶体管21的栅极211、电容Cs的第一电极板Cs1同层设置并位于第一栅绝缘层GI1远离衬底基板11的一侧。栅极211、第一电极板Cs1的 材料可以包括例如金属、金属合金、金属氮化物、导电金属氧化物、透明导电材料等。
第二栅绝缘层GI2设置在栅极211远离衬底基板11的一侧，第二栅绝缘层GI2的材料可以包括例如氮氧化硅、氧化硅、氮化硅、碳氧化硅、氮碳化硅等。
电容Cs的第二电极板Cs2设置在第二栅绝缘层GI2远离衬底基板11的一侧，其材料可以与第一电极板Cs1的材料相同，具体参见上文中所列举的导电材料。
层间绝缘层ILD设置在电容Cs的第二电极板Cs2远离衬底基板11的一侧，层间绝缘层ILD的材料可以包括例如硅化合物、金属氧化物等。具体可以选择上文所列举的硅化合物和金属氧化物，这里不再赘述。
第一源漏导电层设置在层间绝缘层ILD远离衬底基板11的一侧。第一源漏导电层可以包括各晶体管的源极213和漏极214，源极213与源极连接部电连接，漏极214与漏极连接部电连接。第一源漏导电层可以包括金属、合金、金属氮化物、导电金属氧化物、透明导电材料等，例如，第一源漏导电层可以为金属构成的单层或多层，例如为Mo/Al/Mo或Ti/Al/Ti。
钝化层PVX设置在源漏导电层远离衬底基板11的一侧，钝化层PVX的材料可以包括例如氮氧化硅、氧化硅、氮化硅等。
第二源漏导电层设置在钝化层PVX远离衬底基板11的一侧，其可以包括转接电极22等导电结构。第二源漏导电层可以包括金属、合金、金属氮化物、导电金属氧化物、透明导电材料等。
平坦化层PLN设置在钝化层PVX远离衬底基板11的一侧，平坦化层PLN可以采用有机绝缘材料制成，例如，该有机绝缘材料包括聚酰亚胺、环氧树脂、压克力、聚酯、光致抗蚀剂、聚丙烯酸酯、聚酰胺、硅氧烷等树脂类材料等。
像素界定层PDL位于平坦化层PLN远离衬底基板11的一侧，像素界 定层PDL具有多个用于容纳发光器件的像素开口。发光器件23包括：第一电极231、第二电极232以及位于第一电极231与第二电极232之间的发光功能层233。例如，第一电极231为阳极，第二电极232为阴极。可选地，第一电极231为金属材料制作的反射电极，第二电极232为透明导电材料(例如，氧化铟锡)制作的透明电极。发光功能层233可以包括依次叠置的：空穴注入层、空穴传输层、发光层、电子传输层和电子注入层。第一电极231位于像素界定层PDL与平坦化层PLN之间，并通过平坦化层PLN上的过孔与转接电极22连接，进而通过转接电极22与薄膜晶体管21的漏极214连接。第一电极231的一部分被像素开口暴露出。多个发光器件23的第二电极232可以形成为一体结构。
可选地，发光器件23为OLED器件，此时，发光层采用有机发光材料；或者，发光器件23为QLED(Quantum Dot Light Emitting Diodes，量子点发光二极管)器件，此时，发光层采用量子点发光材料。每个发光器件23所发射的光线颜色与相应的像素滤光部的颜色相同。
如图1A、图2A和图2C所示，显示基板10还可以包括封装层30，封装层30覆盖像素界定层PDL和多个发光器件23，用于对发光器件23进行封装，以防止外界环境中的水汽和/或氧气侵蚀发光器件23。在一些实施例中，封装层30包括层叠设置的多个封装子层，例如，多个封装子层包括：第一无机封装子层31、第二无机封装子层32和有机封装子层33，第二无机封装子层32位于第一无机封装子层31的远离衬底基板11的一侧，有机封装子层33位于第一无机封装子层31与第二无机封装子层32之间。第一无机封装子层31和第二无机封装子层32均可以采用氮氧化硅、氧化硅、氮化硅等致密性高的无机材料制成。有机封装子层33可以采用含有干燥剂的高分子材料制成，或采用可阻挡水汽的高分子材料制成。例如，采用高分子树脂，从而可以缓解第一无机封装子层31和第二无机封装子层32的应力，还可以包括干燥剂等吸水性材料以吸收侵入内部的水分子和/或氧气 分子。
在一些实施例中，显示基板10还可以包括隔垫层(未示出)，其位于像素界定层PDL与封装层30之间，隔垫层可以进一步增加外界的水汽或氧气进入显示区的路径，从而保护显示区中的发光器件23。
在图1和图2A、图2C所示的触控显示面板中，第二无机封装子层32可以为连续的整层膜层，第一触控图形层40与封装层30之间可以设置有缓冲层；当然，第一触控图形层40和像素滤光部80可以直接设置在封装层30上，并与第二无机封装子层32接触，从而可以减小触控显示面板的整体厚度；且可以减小黑矩阵60与发光器件23之间的距离，改善发光器件的L-Decay衰减过快以及色偏的问题。
图3为本公开的另一些实施例中提供的触控显示面板的示意图，图3所示的触控显示面板与图2A所示的触控显示面板相似，区别在于，图3所示的触控显示面板中的触控结构层除了包括第一触控图形层40，还可以包括第二触控图形层50。其中，第二触控图形层位于第一触控图形层40靠近显示基板10的一侧，且包括多条第二金属线51，每条第二金属线51在显示基板10上的正投影位于黑矩阵60在显示基板10上的正投影范围内。
如图3所示，第二触控图形层50与第一触控图形层40之间还可以设置有第一绝缘层90。如上文所述，第一触控图形层40可以包括多个触控驱动电极，第二触控图形层50可以包括多个触控感应电极，此时，第一绝缘层90将第一触控图形层40和第二触控图形层50绝缘间隔开；或者，第一触控图形层40和第二触控图形层50中的一者包括：触控驱动电极的驱动电极单元和连接部以及触控感应电极的感应电极单元；第一触控图形层40和第二触控图形层50中的另一者包括：触控感应电极的桥接部，此时，桥接部通过第一绝缘层90上的过孔与感应电极连接。
图4为本公开的另一些实施例中提供的触控显示面板的示意图，图4所示的触控显示面板与图3所示的触控显示面板类似，均包括：显示基板 10，以及位于显示基板10出光侧的触控结构层、黑矩阵60、多个像素滤光部80和覆盖层91。其中，触控结构层包括第一触控图形层40和第二触控图形层50，第一触控图形层40包括多条第一金属线41，第二触控图形层50包括多条第二金属线51，第一金属线41和第二金属线51在显示基板10上的正投影均位于黑矩阵60在显示基板10上的正投影范围内。下面对图4与图3的区别进行介绍。
如图4所示，第二触控图形层50位于第一触控图形层40远离显示基板10的一侧，黑矩阵60位于第一触控图形层40和第二触控图形层50之间。这样可以利用黑矩阵60将第一触控图形层40和第二触控图形层50间隔开，而无需再另外制作第一触控图形层40与第二触控图形层50之间的绝缘层。
其中，当第二触控图形层50位于黑矩阵60远离显示基板10的一侧时，可以将第二金属线51远离显示基板10的表面的折射率设置在5％以下，以防止第二金属线51对外界环境光的反射影响显示效果。在一些示例中，第二金属线51可以包括多层金属层的叠层，其中最远离显示基板10的金属层采用黑色金属层，其余金属层中的至少一者采用导电率较高的金属层，例如，第二金属线51采用MoOx/Al/Ti的叠层或MoOx/Al/MoOx的叠层，其表面反射率约为4.2％。
另外，如图4所示，黑矩阵60具有：背向显示基板10的第一表面s1、朝向显示基板10的第二表面、以及连接在第一表面s1与第二表面s2之间的侧面。并且，黑矩阵60的第一表面s1高于像素滤光部80远离显示基板10的表面，从而使黑矩阵60的侧面的一部分与覆盖层91接触，如图4所示，黑矩阵60的侧面包括与覆盖层91接触的第一子侧面s3。并且，黑矩阵60靠近第一子侧面s3的部分的折射率小于覆盖层91的折射率，以使显示基板10照射至第一子侧面s3的至少一部分，在第一子侧面s3发生全反射，从而被第一子侧面s3朝远离显示基板10的方向反射，进而提高触控显 示面板的亮度。
其中，第一子侧面s3可以为倾斜的平面，也可以为内凹或外凸的弧面，只要能够使显示基板10出射的至少一部分光线在第一子侧面s3发生全反射即可。
在一个示例中，黑矩阵60靠近第一子侧面s3的部分的折射率可以为1.5～1.6，覆盖层91的折射率可以为1.7～1.8。
需要说明的是，在图4所示的触控显示面板中，黑矩阵60可以采用黑色的单层结构，例如，可以采用黑色有机绝缘材料。当然，黑矩阵60也可以采用图2中的黑矩阵60的结构(即，包括遮光部63、第一滤光图形61和第二滤光图形62)，这种情况下，第一金属线41位于第一滤光图形61靠近显示基板10的一侧，第二金属线51位于第二滤光图形62远离显示基板10的一侧。并且，可以将遮光部63的折射率设置为大于覆盖层91的折射率，以使遮光部63与覆盖层91接触的表面形成全反射面。
在图4中，覆盖层91可以与图3中的覆盖层91相同，均采用整层的膜层。
图5为本公开的另一些实施例中提供的触控显示面板的示意图，图5所示的触控显示面板与图4所示的触控显示面板类似，区别仅在于，在图5中，覆盖层91不再是连续的膜层，而是包括间隔设置的多个覆盖部91a，每个覆盖部91a在显示基板10上的正投影覆盖至少一个像素区。
其中，多个覆盖部91a可以采用光刻构图工艺形成。
图6为本公开的另一些实施例中提供的触控显示面板的示意图，图6所示的触控显示面板与图4类似，均包括：显示基板10，以及位于显示基板10出光侧的触控结构层、黑矩阵60、多个像素滤光部80和覆盖层91。其中，触控结构层包括第一触控图形层40和第二触控图形层50，第一触控图形层40包括多条第一金属线41，第二触控图形层50包括多条第二金属线51，第一金属线41和第二金属线51在显示基板10上的正投影均位于黑 矩阵60在显示基板10上的正投影范围内。黑矩阵60远离显示基板10的一侧设置有覆盖层91，覆盖层91在显示基板10上的正投影覆盖每个像素区。下面对图6与图5的区别进行介绍。
在图6中，第二触控图形层50位于第一触控图形层40靠近显示基板10的一侧，第二触控图形层50与第一触控图形层40之间设置有第二绝缘层93，第二绝缘层93在显示基板10上的正投影位于间隔区。
第二绝缘层93具有：背向显示基板10的第一表面s4、朝向显示基板10的第二表面s5、以及连接在第一表面s4与第二表面s5之间的侧面。第二绝缘层93的侧面包括与覆盖层91接触的第一子侧面s6。其中，第二绝缘层93的折射率小于覆盖层91的折射率，以使所述显示基板10照射至第二绝缘层93的第一子侧面s6的至少一部分光线，在第一子侧面s6发生全反射，从而被第一子侧面s6朝远离显示基板10的方向反射。
在图6所示的触控显示面板中，第一金属线41和第二金属线51均位于黑矩阵60靠近显示基板10的一侧，不会接收到环境光，因此，对第一金属线41和第二金属线51的反射率并无特别要求，二者的材料可以包括黑色的金属，也可以不包括黑色的金属。
在图6所示的触控显示面板中，覆盖层91可以设置为连续的整层膜层，也可以包括间隔的多个覆盖部。
在图4至图6中，显示基板10的结构与图1和图2A中的显示基板10结构相同，具体参见上文描述，并且，在图4至图6中，像素滤光部80均可以与第二封装子层32接触。
图7为本公开的另一些实施例中提供的触控显示面板的示意图，图7所示的触控显示面板与图4类似，区别仅在于，在图7中，显示基板10中的第二封装子层32不再是连续的整层膜层，而是具有多个镂空部，每个镂空部对应一个像素滤光部80，像素滤光部80通过相应的镂空部与有机封装子层32接触。
其中，第二封装子层32和第一触控图形层40可以利用两次构图工艺分别制作；也可以利用同一次构图工艺形成。
在图7所示的触控显示面板中，像素滤光部80和发光器件23的距离进一步降低；另外，像素滤光部80和有机封装子层32均采用有机材料，二者的折射率较为接近，从而可以减少发光器件23的光线在像素滤光部80与有机封装子层32之间的界面发生全反射的情况，提高光取出效率。在一个示例中，像素滤光部80的折射率和有机封装子层32的折射率均在1.5～1.65之间。
在图7所示的触控显示面板中，覆盖层91可以设置为连续的整层膜层，也可以包括间隔的多个覆盖部。
在图4至图7所示的各触控显示面板中，还可以包括粘结层92和盖板，粘结层92位于覆盖层91远离显示基板10的一侧，盖板位于粘结层92远离显示基板10的一侧，并与粘结层92粘结。粘结层92可以采用光学胶，盖板可以采用玻璃基板或柔性材料制作的柔性基板。当然，在图1、图2A和图2C所示的触控显示面板中，也可以包括上述粘结层和盖板。
需要说明的是，上述各实施例中的触控显示面板的结构，仅是为了说明本公开的原理而采用的示例性实施方式，对于本领域内的普通技术人员而言，在不脱离本公开的精神和实质的情况下，可以做出各种变型和改进。例如，对于图4至图7所示的触控显示面板，其可以省去第二触控图形层，并将第一触控图形层设置为多个自电容电极。
本公开实施例还提供一种触控显示装置，其包括上述实施例中的触控显示面板。所述触控显示装置可以为OLED面板、QLED显示面板、手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪等任何具有显示功能的产品或部件。
可以理解的是，以上实施方式仅仅是为了说明本公开的原理而采用的示例性实施方式，然而本公开并不局限于此。对于本领域内的普通技术人 员而言，在不脱离本公开的精神和实质的情况下，可以做出各种变型和改进，这些变型和改进也视为本公开的保护范围。

Claims (16)

  1. 一种触控显示面板，包括：
    显示基板，包括多个像素区、以及将所述多个像素区彼此间隔开的间隔区；
    黑矩阵，位于所述显示基板的出光侧，且所述黑矩阵在所述显示基板上的正投影位于所述间隔区；
    触控结构层，包括位于所述显示基板出光侧的第一触控图形层；所述第一触控图形层包括多条第一金属线，所述第一金属线在所述显示基板上的正投影位于所述黑矩阵在所述显示基板上的正投影范围内，且所述第一金属线与所述黑矩阵接触。
  2. 根据权利要求1所述的触控显示面板，其中，所述黑矩阵采用黑色单层结构。
  3. 根据权利要求1所述的触控显示面板，其中，所述触控显示面板还包括：多个像素滤光部，所述多个像素滤光部的颜色包括多种，且每个所述像素滤光部与所述显示基板的一个所述像素区相对设置；
    所述黑矩阵包括：第一滤光图形和第二滤光图形，所述第一滤光图形位于所述第一触控图形层远离所述显示基板的一侧，所述第二滤光图形位于第一滤光图形远离所述显示基板的一侧，所述第一滤光图形和所述第二滤光图形在所述显示基板上的正投影均覆盖所述第一触控图形层在所述显示基板上的正投影；所述第一滤光图形包括多个第一滤光部，所述第二滤光图形包括多个第二滤光部，所述第一滤光部与所述第二滤光部一一对应地相对设置；
    每个所述第一滤光部与其对应的第二滤光部的材料，分别与两种颜色的像素滤光部的材料相同。
  4. 根据权利要求3所述的触控显示面板，其中，所述黑矩阵还包括：遮光部，所述遮光部为黑色单层结构且具有通孔，所述第一金属线和所述第一滤光图形的至少一部分均位于所述通孔内，且将所述第一金属线与所述遮光部被所述第一滤光图形间隔开。
  5. 根据权利要求4所述的触控显示面板，其中，所述第二滤光图形的至少一部分位于所述通孔外，且所述第二滤光图形在所述显示基板上的正投影的一部分超出通孔在所述显示基板上的正投影。
  6. 根据权利要求3所述的触控显示面板，其中，所述第一滤光图形的多个第一滤光部的颜色相同；或者，至少两个所述第一滤光部的颜色不同；
    所述第二滤光图形的多个第二滤光部的颜色相同；或者，至少两个所述第二滤光部的颜色不同。
  7. 根据权利要求1至6中任一项所述的触控显示面板，其中，所述第一触控图形层位于所述黑矩阵靠近所述显示基板的一侧；所述触控结构层还包括：
    第二触控图形层，位于所述黑矩阵远离所述显示基板的一侧，且包括多条第二金属线，所述多条第二金属线在所述显示基板上的正投影位于所述黑矩阵在所述显示基板上的正投影范围内。
  8. 根据权利要求7所述的触控显示面板，其中，所述第二金属线远离所述显示基板的表面的折射率小于5％。
  9. 根据权利要求1至8中任一项所述的触控显示面板，其中，所述触 控显示面板还包括：覆盖层，所述覆盖层在所述显示基板上的正投影覆盖每个所述像素区，
    所述黑矩阵具有：背向所述显示基板的第一表面、朝向所述显示基板的第二表面、以及连接在所述第一表面与所述第二表面之间的侧面，所述黑矩阵的侧面包括与所述覆盖层接触的第一子侧面，所述黑矩阵靠近所述第一子侧面的部分的折射率小于所述覆盖层的折射率，以使所述显示基板照射至所述第一子侧面的至少一部分光线，被所述第一子侧面朝远离所述显示面板的方向反射。
  10. 根据权利要求9所述的触控显示面板，其中，所述覆盖层为连续膜层；
    或者，所述覆盖层包括间隔设置的多个覆盖部，每个所述覆盖部在所述显示基板上的正投影覆盖至少一个所述像素区。
  11. 根据权利要求1至6中任一项所述的触控显示面板，其中，所述第一触控图形层位于所述黑矩阵靠近所述显示面板的一侧，所述触控显示面板还包括：
    第二触控图形层，位于所述第一触控图形层靠近所述显示基板的一侧，且包括多条第二金属线，所述多条第二金属线在所述显示基板上的正投影位于所述黑矩阵在所述显示基板上的正投影范围内；
    绝缘层，位于所述第一触控图形层与所述第二触控图形层之间，所述绝缘层在所述显示基板上的正投影位于所述间隔区。
  12. 根据权利要求11所述的触控显示面板，其中，所述触控显示面板还包括：覆盖层，所述覆盖层在所述显示基板上的正投影覆盖每个所述像素区，
    所述绝缘层具有：背向所述显示基板的第一表面、朝向所述显示基板的第二表面、以及连接在所述第一表面与所述第二表面之间的侧面，所述绝缘层的侧面包括与所述覆盖层接触的第一子侧面，所述绝缘层的折射率小于所述第二覆盖层的折射率，以使所述显示基板照射至所述第一子侧面的至少一部分光线，被所述第一子侧面朝远离所述显示基板的方向反射。
  13. 根据权利要求12所述的触控显示面板，其中，所述覆盖层为连续膜层；
    或者，所述覆盖层包括间隔设置的多个覆盖部，每个所述覆盖部在所述显示基板上的正投影覆盖至少一个所述像素区。
  14. 根据权利要求1至13中任一项所述的触控显示面板，其中，所述触控显示面板还包括：多个像素滤光部，每个所述像素滤光部与所述显示基板的一个所述像素区相对设置；
    所述显示基板包括：
    衬底基板；
    多个发光器件，设置在所述衬底基板上，每个所述像素区均设置有一个所述发光器件；
    封装层，设置在所述发光器件远离所述衬底基板的一侧；
    其中，所述多个像素滤光部与所述封装层接触。
  15. 根据权利要求14所述的触控显示面板，其中，所述封装层包括：沿远离所述衬底基板的方向依次设置的：第一无机封装子层、有机封装子层和第二无机封装子层；
    其中，所述第二无机封装子层为连续膜层，其在所述显示基板上的正投影覆盖所述多个像素区，所述多个像素滤光部与所述第二无机封装子层 接触；
    或者，所述第二无机封装子层具有多个镂空部，所述镂空部与所述像素区一一对应，所述滤光部的至少一部分通过所述镂空部与所述有机封装子层接触。
  16. 一种触控显示装置，包括权利要求1至15中任一项所述的触控显示面板。
PCT/CN2022/084296 2022-03-31 2022-03-31 触控显示面板和触控显示装置 WO2023184306A1 (zh)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011170252A (ja) * 2010-02-22 2011-09-01 Dainippon Printing Co Ltd タッチパネルセンサ一体型カラーフィルタの製造方法
CN111668277A (zh) * 2020-06-24 2020-09-15 湖北长江新型显示产业创新中心有限公司 显示装置
CN112698746A (zh) * 2020-12-29 2021-04-23 厦门天马微电子有限公司 一种触控显示面板及其驱动方法、触控显示装置
CN113644219A (zh) * 2021-08-10 2021-11-12 京东方科技集团股份有限公司 显示面板及显示装置
CN114690946A (zh) * 2020-12-31 2022-07-01 乐金显示有限公司 触摸显示装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011170252A (ja) * 2010-02-22 2011-09-01 Dainippon Printing Co Ltd タッチパネルセンサ一体型カラーフィルタの製造方法
CN111668277A (zh) * 2020-06-24 2020-09-15 湖北长江新型显示产业创新中心有限公司 显示装置
CN112698746A (zh) * 2020-12-29 2021-04-23 厦门天马微电子有限公司 一种触控显示面板及其驱动方法、触控显示装置
CN114690946A (zh) * 2020-12-31 2022-07-01 乐金显示有限公司 触摸显示装置
CN113644219A (zh) * 2021-08-10 2021-11-12 京东方科技集团股份有限公司 显示面板及显示装置

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